Furnace tube structure and heating furnace

Abstract

The application belongs to the technical field of semiconductor manufacturing, and discloses a furnace tube structure and a heating furnace, which comprise an outer tube and an inner tube. One end of the outer tube is a closed end, and the other end is an open end. The inner tube is open at both ends and forms a reaction chamber inside. The inner tube is arranged in the outer tube, and a buffer space is formed between the inner side wall of the outer tube and the outer side wall of the inner tube. The reaction chamber is connected to the buffer space, and a flow disturbing member is arranged in the buffer space. The flow disturbing member reduces the flow rate of process gas flowing from the reaction chamber into the buffer space. The flow direction of the process gas is configured as the direction of flowing from the reaction chamber into the buffer space. The furnace tube structure can improve the uniformity of process gas distribution in the inner cavity, ensure that the material substrate is in full contact with the process gas and reacts, and improve the uniformity of the film coating of the material substrate.

Description

Technical Field

[0001] This invention relates to the field of semiconductor manufacturing technology, and in particular to a furnace tube structure and a heating furnace. Background Technology

[0002] Semiconductor and photovoltaic materials typically require multiple processing steps before being applied to products. Currently, CVD (Continuous Chemical Deposition) and diffusion processes are generally used in heated furnaces to deposit thin films of uniform thickness on the material surface. The equipment used in these processes mainly includes an automated loading and unloading system, a quartz boat, a reaction chamber, a special gas system, a vacuum system, and a control system, with the reaction chamber being one of the core components. The material is carried in a quartz boat, and the automated loading and unloading system delivers the material-loaded quartz boat into the reaction chamber, where multiple chemical reactions occur under high-temperature conditions, depositing a thin film. The uniformity of the deposited film thickness, the deposition rate, and the utilization efficiency of the reactants largely depend on the uniformity of the gas field within the reaction chamber.

[0003] Traditional heating furnaces typically employ a single-layer quartz tube within the hot zone, with the reaction chamber being the internal space of this tube. The tube has an inlet and an outlet structure at each end. When the quartz boat, along with the material, is introduced into the reaction chamber, process gas is introduced through the inlet structure, while the outlet structure, connected to a tail pump, removes the gas. During the reaction, the quartz boat and material occupy a large portion of the reaction chamber, and the material is densely distributed. The reaction between the process gas and the material requires a considerable time. However, once the process gas enters the reaction chamber, it is rapidly drawn away from the top and bottom by the external outlet pump, disrupting the gas uniformity and causing inconsistent flow rates. Consequently, most of the process gas that has not yet reacted with the material or has only partially reacted is directly extracted from the reaction chamber, resulting in insufficient contact and incomplete reaction. This ultimately leads to uneven coating on the material, affecting the quality of the finished product.

[0004] Therefore, there is an urgent need for a furnace tube structure and heating furnace to solve the above problems. Summary of the Invention

[0005] According to one aspect of the present invention, the object is to provide a furnace tube structure that can improve the uniformity of process gas distribution in its inner cavity, ensure sufficient contact and reaction between the material substrate and the process gas, and improve the uniformity of coating on the material substrate.

[0006] To achieve this objective, the present invention adopts the following technical solution:

[0007] Furnace tube structure, including:

[0008] The outer tube has one closed end and the other open end;

[0009] An inner tube, open at both ends, forms a reaction chamber inside the outer tube. The inner tube is disposed within the outer tube, and a buffer space is formed between the inner wall of the outer tube and the outer wall of the inner tube. The reaction chamber is connected to the buffer space. A flow-delaying element is provided in the buffer space to reduce the flow velocity of the process gas flowing from the reaction chamber into the buffer space. The flow direction of the process gas is configured to flow into the reaction chamber and out of the buffer space.

[0010] As a preferred embodiment of the furnace tube structure provided by the present invention, the flow disturbance component includes a fixed ring disposed in the buffer space. The fixed ring is disposed in the buffer space, is arranged around the outer periphery of the inner tube, and abuts against the inner wall of the outer tube. A flow equalization hole is formed on the fixed ring, and the flow equalization hole allows the process gas to pass through.

[0011] As a preferred embodiment of the furnace tube structure provided by the present invention, there are multiple flow equalization holes, and the multiple flow equalization holes are evenly spaced along the circumference of the fixed ring.

[0012] As a preferred embodiment of the furnace tube structure provided by the present invention, the distance from the fixing ring to the open end of the outer tube is greater than the distance from the fixing ring to the closed end of the outer tube.

[0013] As a preferred embodiment of the furnace tube structure provided by the present invention, the inner tube is coaxially disposed within the outer tube.

[0014] As a preferred embodiment of the furnace tube structure provided by the present invention, the furnace tube structure further includes an inlet / outlet gas mechanism, which is disposed at the open end of the outer tube. The process gas enters the reaction chamber through the inlet / outlet gas mechanism, flows into the buffer space along the reaction chamber, and is discharged by the inlet / outlet gas mechanism.

[0015] As a preferred embodiment of the furnace tube structure provided by the present invention, the gas inlet and outlet mechanism includes a first flange that is kept in a fixed state. The first flange abuts against the open end of the outer tube and is configured to connect an external process gas source and the reaction chamber, and to connect a vacuum pump and the buffer space. Both the outer tube and the inner tube are fixed and tightly connected to the first flange.

[0016] As a preferred embodiment of the furnace tube structure provided by the present invention, the first flange has an air inlet and an air outlet, and the first flange is provided with a first docking channel communicating with the air inlet, the air inlet communicating with the air inlet pipe, and the air outlet communicating with the buffer space.

[0017] As a preferred embodiment of the furnace tube structure provided by the present invention, the gas inlet and outlet mechanism further includes a second flange, which abuts against the side of the first flange away from the outer tube. When the second flange is in contact with the first flange, the second flange at least closes the opening of the inner tube.

[0018] As a preferred embodiment of the furnace tube structure provided by the present invention, the second flange is provided with a second docking channel. One end of the second docking channel is connected to the first docking channel, and the other end is connected to the reaction chamber. The second docking channel allows the process gas flowing from the first docking channel into the second docking channel to flow into the reaction chamber in a first direction.

[0019] According to another aspect of the present invention, the object is to provide a heating furnace comprising the furnace tube structure and furnace body as described in any of the above embodiments.

[0020] The beneficial effects of this invention are:

[0021] The furnace tube structure provided by this invention includes an outer tube and an inner tube. One end of the outer tube is closed, and the other end is open. The inner tube is open at both ends, forming a reaction chamber inside. The inner tube is disposed within the outer tube, and a buffer space is formed between the inner wall of the outer tube and the outer wall of the inner tube. A flow-deflecting element is provided in this buffer space to reduce the flow velocity of the process gas flowing from the reaction chamber into the buffer space. The flow direction of the process gas is configured to flow into the reaction chamber and out of the buffer space. After entering the reaction chamber, the process gas flows deeper into the inner tube, diffusing and filling the entire reaction chamber during this process, making full contact with the material matrix in the reaction chamber. After passing through the material matrix, the process gas can only flow back from the buffer space to the open end of the outer tube and be discharged. The presence of the buffer space causes the process gas to change from turbulent to laminar flow when it is extracted, resulting in a stable flow rate, improved gas field uniformity, and extended residence time of the process gas in the reaction chamber. This ensures that the material substrate and the process gas react fully, thereby improving the uniformity of the coating on the material substrate. Attached Figure Description

[0022] To more clearly illustrate the technical solutions in the embodiments of the present invention, the accompanying drawings used in the description of the embodiments of the present invention will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the content of the embodiments of the present invention and these drawings without creative effort.

[0023] Figure 1 This is a cross-sectional view of the furnace tube structure provided in an embodiment of the present invention;

[0024] Figure 2This is a schematic diagram of the structure of the first flange provided in an embodiment of the present invention;

[0025] Figure 3 This is a schematic diagram of the structure of the second flange provided in an embodiment of the present invention;

[0026] Figure 4 This is a schematic diagram of the inner tube structure provided in an embodiment of the present invention;

[0027] Figure 5 This is a cross-sectional view of the first flange provided in an embodiment of the present invention;

[0028] Figure 6 This is a schematic diagram of the structure of the fixing ring provided in an embodiment of the present invention;

[0029] Figure 7 This is a front view of the heating furnace provided in an embodiment of the present invention;

[0030] Figure 8 yes Figure 6 Sectional view along the AA direction.

[0031] In the picture:

[0032] 1. Furnace body; 2. Furnace body sealing ring;

[0033] 100. Outer tube; 110. Buffer space;

[0034] 200, Inner tube; 210, Reaction chamber; 220, Mounting groove; 230, Inner tube boss;

[0035] 300. Inlet / outlet mechanism; 310. First flange; 311. Flange body; 3111. Flow equalization ring groove; 3112. First docking channel; 3113. Third docking channel; 3114. First abutting ring platform; 3115. Second abutting ring platform; 3116. Inner pipe mounting groove; 3117. Outer pipe mounting groove; 312. Extraction pipe; 313. Inlet pipe; 320. Second flange; 321. Second docking channel; 3211. Inlet section; 3212. Ventilation section; 3213. Outlet section; 322. First sealing groove; 323. Second sealing groove; 324. Thermocouple through hole;

[0036] 400, fixed ring; 410, flow equalization hole. Detailed Implementation

[0037] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative of the invention and not intended to limit it. Furthermore, it should be noted that, for ease of description, the accompanying drawings show only the parts relevant to the present invention, and not all of the structures.

[0038] In the description of this invention, unless otherwise explicitly specified and limited, the terms "connected," "linked," and "fixed" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0039] In this invention, unless otherwise explicitly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature directly below or diagonally below the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0040] In the description of this embodiment, the terms "upper," "lower," "right," and "left," etc., refer to the orientation or positional relationship shown in the accompanying drawings. They are used only for ease of description and simplification of operation, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the present invention. In addition, the terms "first" and "second" are used only for distinction in description and have no special meaning.

[0041] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.

[0042] Figure 1 A cross-sectional view of a furnace tube structure provided in an embodiment of the present invention is shown. (Refer to...) Figure 1This embodiment provides a furnace tube structure, which includes an outer tube 100, an inner tube 200, and an inlet / outlet gas mechanism 300. The outer tube 100 is a cylindrical blind tube, with one end open to form an open end and the other end closed to form a closed end. The inner tube 200 is a cylindrical through tube inserted into the outer tube 100. The inner tube 200 has openings at both ends and is hollow inside, forming a reaction chamber 210. The material matrix is ​​located in the reaction chamber 210 under the support of a quartz boat. The diameter of the inner tube 200 is smaller than the diameter of the outer tube 100, and the length of the inner tube 200 is smaller than the length of the outer tube 100. An annular buffer space 110 is formed between the inner wall of the outer tube 100 and the outer wall of the inner tube 200. The reaction chamber 210 is connected to the buffer space 110 through an opening at one end of the inner tube 200. The buffer space 110 is equipped with a flow-delaying element to reduce the flow rate of the process gas flowing from the reaction chamber 210 into the buffer space 110. The flow direction of the process gas is configured to flow into the reaction chamber 210 and out of the buffer space 110. An inlet / outlet mechanism 300 is located at the open end of the outer tube 100, providing a channel for the process gas to enter the reaction chamber 210 and extracting the process gas that has made sufficient contact with the material substrate and entered the buffer space 110. In this embodiment, the material substrate is a silicon wafer.

[0043] Specifically, the process gas is introduced into one end of the inner tube 200 through the inlet / outlet mechanism 300, enters the reaction chamber 210, flows through the reaction chamber 210 along a first direction, flows from the end opening of the inner tube 200 to the buffer space 110, and finally exits through the inlet / outlet mechanism 300. This first direction is parallel to the length direction of the inner tube 200. Due to the presence of the buffer space 110, the process gas changes from turbulent to laminar flow when extracted, resulting in a stable flow velocity, improved gas field uniformity, and extended residence time of the process gas in the reaction chamber 210. This ensures sufficient reaction between the material substrate and the process gas, improving the uniformity of the coating on the material substrate.

[0044] Figure 2 This diagram illustrates the structure of the first flange provided in an embodiment of the present invention. Figure 3 A schematic diagram of the structure of the second flange provided in an embodiment of the present invention is shown. (Refer to...) Figures 1-3 The gas inlet / outlet mechanism 300 is located at the open end of the outer pipe 100. The process gas enters the reaction chamber 210 through the gas inlet / outlet mechanism 300, flows through the reaction chamber 210 in the first direction and flows through the buffer space 110 in the opposite direction of the first direction, and is discharged by the gas inlet / outlet mechanism 300.

[0045] Specifically, the inlet / outlet gas mechanism 300 includes a first flange 310 and a second flange 320. The first flange 310 abuts against the open ends of the outer pipe 100 and the inner pipe 200, and is configured to connect an external process gas source and the reaction chamber 210, as well as a vacuum pump and the buffer space 110. The first flange 310 includes a flange body 311, a vacuum pipe 312, and an inlet pipe 313. The flange body 311 has an inlet and an outlet. The inlet connects to the inlet pipe 313, and the outlet connects to the buffer space 110 and the vacuum pipe 312. The vacuum pipe 312 connects to the vacuum pump, and the inlet pipe 313 connects to the external process gas source. In this embodiment, the inlet pipe 313 can be a VCR combination connector, and the vacuum pipe 312 can be a KF welded joint. When the second flange 320 is in contact with the first flange 310, the second flange 320 at least closes the opening of the inner pipe 200.

[0046] More specifically, the extraction pipe 312 and the intake pipe 313 are respectively connected to the flange body 311, and are positioned opposite each other on the periphery of the flange body 311. The flange body 311 is connected to the open ends of the outer pipe 100 and the inner pipe 200. The second flange 320 abuts against the side of the first flange 310 opposite to the outer pipe 100 and is configured to block an opening in the inner pipe 200. It should be understood that this opening refers to the opening near the open end of the second flange 320.

[0047] More specifically, Figure 4 This diagram illustrates the structure of the inner tube provided in an embodiment of the present invention. (Refer to...) Figure 2 and Figure 4Both the outer tube 100 and the inner tube 200 are fixedly and tightly connected to the first flange 310. Specifically, the flange body 311 is provided with an inner tube mounting groove 3116 and an outer tube mounting groove 3117. The inner tube 200 is installed in the inner tube mounting groove 3116, and the outer tube 100 is installed in the outer tube mounting groove 3117. The end of the inner tube 200 is provided with an inner tube boss 230. The inner tube 200 is located in the inner tube mounting groove 3116 of the flange body 311, and the inner side wall of the inner tube mounting groove 3116 is provided with a first abutment ring 3114. When the inner tube 200 is inserted into the inner tube mounting groove 3116 of the flange body 311, the inner tube boss 230 of the inner tube 200 abuts against the first abutment ring 3114. Through the above arrangement, the positioning reliability of the inner tube 200 on the flange body 311 can be improved, and axial movement of the inner tube 200 and the flange body 311 can be prevented. Furthermore, the open end of the outer tube 100 is located in the outer tube mounting groove 3117. The inner sidewall of the outer tube mounting groove 3117 is provided with a second abutment ring 3115 around its circumference, and the outer tube 100 has an outer tube boss around its circumference at the opening. When the open end of the outer tube 100 is located in the outer tube mounting groove 3117, the outer tube boss abuts against the second abutment ring 3115. Through the above arrangement, the reliability of the installation of the open end of the outer tube 100 in the outer tube mounting groove 3117 can be improved.

[0048] More specifically, a uniform flow annular groove 3111 is formed concentrically with the flange body 311 on one side of the outer pipe 200. The uniform flow annular groove 3111 is located between the inner pipe mounting groove 3116 and the outer pipe mounting groove 3117. This uniform flow annular groove 3111 connects the buffer space 110 and the air outlet of the flange body 311, which is connected to the extraction pipe 312. The uniform flow annular groove 3111 allows for circulating air intake when the air outlet is drawing in air, effectively preventing gas deposition. Compared to single-hole extraction, the uniform flow annular groove 3111 enables a more uniform extraction process in the buffer space 110, thereby ensuring more uniform extraction at the tail end of the inner pipe 200 and further improving the gas uniformity of the inner pipe 200.

[0049] Preferably, the end of the air outlet near the uniform flow annular groove 3111 is a stepped through hole. This design further enhances the uniformity of the circulating air intake process, enables axial air intake, and improves exhaust efficiency.

[0050] More specifically, refer to Figure 1The flange body 311 also has a first docking channel 3112 communicating with the air inlet, which connects to the air inlet pipe 313. The second flange 320 has a second docking channel 321, which is C-shaped and includes an inlet section 3211, a venting section 3212, and an outlet section 3213 connected in sequence. Both the inlet section 3211 and the outlet section 3213 are opened along the thickness direction of the second flange 320. When the flange body 311 and the second flange 320 are assembled, and the flange body 311 is installed at the opening end of the inner pipe 200 and the outer pipe 100, the inlet section 3211 can connect to the first docking channel 3112, and the outlet section 3213 can connect to the reaction chamber 210.

[0051] Optionally, the flange body 311 also has a third docking channel 3113. The first docking channel 3112 is a straight channel, opened radially along the flange body 311. The third docking channel 3113 and the first docking channel 3112 are connected to each other at an angle and are opened along the thickness direction of the flange body 311. In this embodiment, the included angle between the third docking channel 3113 and the first docking channel 3112 is a right angle. When the second flange 320 is connected to the flange body 311, the third docking channel 3113 can connect to the inlet section 3211 of the second docking channel 321. Through the above arrangement, the first docking channel 3112 can connect to the second docking channel 321, allowing the process gas flowing from the first docking channel 3112 into the second docking channel 321 to flow into the reaction chamber 210 in the first direction, further ensuring the uniformity of gas diffusion.

[0052] Optionally, the second flange 320 is provided with a first sealing groove 322 and a second sealing groove 323 concentrically arranged around one side of the flange body 311. Sealing O-rings are respectively embedded in the first sealing groove 322 and the second sealing groove 323. When the second flange 320 is pressed against the flange body 311, the second mating channel 321 is located between the first sealing groove 322 and the second sealing groove 323. The sealing O-rings in the first sealing groove 322 prevent process gas in the second mating channel 321 from flowing into the buffer space 110; simultaneously, the sealing O-rings in the second sealing groove 323 prevent process gas in the second mating channel 321 from leaking into the external environment. Furthermore, when pressed against the flange body 311 under the action of a power source, the sealing O-rings in the first sealing groove 322 and the second sealing groove 323 undergo elastic deformation, thereby sealing the second flange 320 and the flange body 311 and ensuring the airtightness of the reaction chamber 210.

[0053] Optionally, the second flange 320 is also provided with a thermocouple through hole 324. The thermocouple through hole 324 is located at the geometric center of the second flange 320, and the thermocouple can be inserted into the reaction chamber 210 through the thermocouple through hole 324. The thermocouple is provided with a sealing ring, which can fit tightly against the inner wall of the thermocouple through hole 324 to ensure the vacuum degree of the reaction chamber 210.

[0054] The gas inlet and outlet process of the furnace tube structure is as follows: The process gas first enters the flange body 311 from the inlet pipe 313, passes through the inlet port, inlet pipe 313, first docking channel 3112, third docking channel 3113 and second docking channel 321 and directly enters the inner tube 200 along the first direction. At this time, the reaction chamber 210 is in a vacuum state, and the density of the introduced process gas is low. Under the premise of the suction of the tail pump and the continuous supply of process gas from the external process gas source, the space in the entire outer tube 100 tends to be balanced and stable. The process gas will expand and diffuse, filling the entire inner cavity of the outer tube 100. Then, under the action of the tail pump, the process gas flows through the reaction chamber 210 along the first direction and enters the buffer space 110. The buffer space 110 can slow down the speed at which the process gas is extracted and increase the residence time of the process gas in the reaction chamber 210. Finally, the process gas in the buffer space 110 is discharged through the outlet and the extraction pipe 312.

[0055] In practical operation, the first flange 310 is fixed in the heating furnace, while the second flange 320 is movable to open or close the furnace tubes, thereby allowing the quartz boat to be placed in and removed. However, during the opening or closing of the second flange 320, the first flange 310 remains fixed. This embodiment addresses this by placing the inlet and outlet on the peripheral surface of the first flange 310, which remains fixed. This prevents the inlet pipe 313 and the exhaust pipe 312 from moving with the opening and closing of the second flange 320, thus extending their service life and preventing changes in their positions from affecting the distribution of process gas in the reaction chamber 210.

[0056] Continue to refer to Figure 1 The inner tube 200 is coaxially disposed within the outer tube 100, and a buffer space 110 of uniform width can be formed between the inner tube 200 and the outer tube 100. The process gas can flow uniformly in the buffer space 110, avoiding uneven flow and eddy currents caused by the change in diameter of the flow space. This ensures that the process gas flows in the buffer space 110 as laminar flow, stabilizes its flow velocity, and increases the uniformity of the process gas field.

[0057] Specifically, Figure 6 A schematic diagram of the fixing ring provided in an embodiment of the present invention is shown. (Refer to...) Figure 1 , Figure 4 and Figure 6 The aforementioned agitator includes a retaining ring 400. This retaining ring 400 is disposed within the buffer space 110. The distance from the retaining ring 400 to the open end of the outer tube 100 is greater than the distance from the retaining ring 400 to the closed end of the outer tube 100; that is, the retaining ring 400 is positioned closer to the tail end of the inner tube 200. It has a semi-circular structure, encircling a portion of the outer periphery of the inner tube 200 and abutting against the inner wall of the outer tube 100. The retaining ring 400 provides support for the inner tube 200, ensuring the stability of its installation within the outer tube 100. In other embodiments, the retaining ring 400 may also be an annular structure, entirely encircling the outer periphery of the inner tube 200.

[0058] To be more specific, continue to refer to Figure 4 The inner tube 200 has an annular mounting groove 220, and the retaining ring 400 is fitted into the mounting groove 220. With the above configuration, the inner tube 200 and the retaining ring 400 are detachably connected, which facilitates disassembly and cleaning of both, as well as replacement and installation of both.

[0059] More specifically, the fixing ring 400 has multiple flow equalization holes 410 configured to allow the process gas to pass through. A pressure difference exists between the flow equalization holes 410 and the process gas outlet, so most of the process gas can only pass through the flow equalization holes 410 on the fixing ring 400, thereby extending the residence time of the process gas in the reaction chamber 210 and ensuring sufficient contact and reaction between the process gas and the silicon wafer. Furthermore, the fixing ring 400 forms an obstruction in the buffer space 110. Under the premise of controlling the flow rate of the process gas entering the inner tube 200 and the pumping speed of the pump, the flow rate of the process gas entering the reaction chamber 210 is approximately equal to the flow rate of the process gas leaving the buffer space 110. The entire outer tube 10 and the process gas in the reaction chamber 210 are in a dynamic equilibrium state, ensuring the uniformity of the gas field and allowing the process gas to fully contact and react with the silicon wafer, resulting in more uniform coating on the silicon wafer.

[0060] Preferably, a plurality of flow equalization holes 410 are evenly spaced along the circumference of the fixed ring 400. This further increases the flow uniformity of the process gas as it passes through the fixed ring 400.

[0061] Figure 6 This shows a front view of the heating furnace provided in an embodiment of the present invention; Figure 7 Show Figure 6 Sectional view along the AA direction. (Refer to...) Figure 6 and Figure 7This embodiment also provides a heating furnace. The heating furnace includes a furnace body 1 and the furnace tube structure provided in this embodiment. A thermal field is formed inside the furnace body 1. The inner tube 200 and outer tube 100 of the furnace tube structure are installed in the thermal field. A first flange 310 in the furnace tube structure is fixed to the furnace body 1 to keep the first flange 310 in a fixed state. For example, the flange body 311 is first connected to the outer wall of the furnace body 1 with a locating pin, and then tightened with screws to achieve a reliable connection.

[0062] Specifically, refer to Figure 7 The heating furnace also includes a furnace body sealing ring 2. The furnace body sealing ring 2 is clamped at the contact point between the inner wall of the outer tube 100 and the open end of the furnace body, and is pressed between the side of the open end of the outer tube 100 and the open end of the furnace body by the first flange 310, ensuring the sealing of the inside of the furnace body 1 and the reliability of the furnace tube structure installed on the furnace body 1.

[0063] It should be noted that this embodiment does not limit the type of heating furnace. That is to say, the furnace tube structure can be used in vertical heating furnaces, horizontal heating furnaces or other heating furnaces. This embodiment does not limit the application scenarios of the furnace tube structure.

[0064] Obviously, the above embodiments of the present invention are merely examples for clearly illustrating the present invention, and are not intended to limit the implementation of the present invention. Those skilled in the art will be able to make various obvious changes, readjustments, and substitutions without departing from the scope of protection of the present invention. It is neither necessary nor possible to exhaustively describe all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention should be included within the scope of protection of the claims of the present invention.

Claims

1. A furnace tube structure, characterized in that, include: The outer tube (100) has one closed end and the other open end; An inner tube (200) is open at both ends and forms a reaction chamber (210) inside. The inner tube (200) is located inside the outer tube (100). A buffer space (110) is formed between the inner wall of the outer tube (100) and the outer wall of the inner tube (200). The reaction chamber (210) is connected to the buffer space (110). A flow-delaying element is provided in the buffer space (110) to reduce the flow rate of the process gas flowing from the reaction chamber (210) into the buffer space (110). The flow direction of the process gas is configured to flow into the reaction chamber (210) and out of the buffer space (110). The flow-disrupting component includes a fixed ring (400) disposed in the buffer space (110). The fixed ring (400) is arranged around the outer periphery of the inner tube (200) and abuts against the inner wall of the outer tube (100). A flow-equalizing hole (410) is opened on the fixed ring (400) for the process gas to pass through. The distance from the fixed ring (400) to the open end of the outer tube (100) is greater than the distance from the fixed ring (400) to the closed end of the outer tube (100).

2. The furnace tube structure according to claim 1, characterized in that, There are multiple flow equalization holes (410), and the multiple flow equalization holes (410) are evenly spaced along the circumference of the fixing ring (400).

3. The furnace tube structure according to claim 1, characterized in that, The inner tube (200) is coaxially disposed in the outer tube (100).

4. The furnace tube structure according to claim 1, characterized in that, The furnace tube structure also includes an inlet / outlet gas mechanism (300), which is located at the open end of the outer tube (100). The process gas enters the reaction chamber (210) through the inlet / outlet gas mechanism (300), flows into the buffer space (110) along the reaction chamber (210), and is discharged by the inlet / outlet gas mechanism (300).

5. The furnace tube structure according to claim 4, characterized in that, The gas inlet / outlet mechanism (300) includes a first flange (310) that is kept in a fixed state. The first flange (310) abuts against the open end of the outer pipe (100) and is configured to connect an external process gas source and the reaction chamber (210), and to connect a vacuum pump and the buffer space (110). The outer pipe (100) and the inner pipe (200) are both fixed and tightly connected to the first flange (310).

6. The furnace tube structure according to claim 5, characterized in that, The first flange (310) has an air inlet and an air outlet, and the first flange (310) is provided with a first docking channel (3112) communicating with the air inlet. The air inlet is connected to the air inlet pipe (313), and the air outlet is connected to the buffer space (110).

7. The furnace tube structure according to claim 6, characterized in that, The air inlet / outlet mechanism (300) further includes a second flange (320), which abuts against the side of the first flange (310) away from the outer tube (100). When the second flange (320) is in contact with the first flange (310), the second flange (320) at least closes the opening of the inner tube (200).

8. The furnace tube structure according to claim 7, characterized in that, The second flange (320) is provided with a second docking channel (321). One end of the second docking channel (321) is connected to the first docking channel (3112), and the other end is connected to the reaction chamber (210). The second docking channel (321) allows the process gas flowing from the first docking channel (3112) into the second docking channel (321) to flow into the reaction chamber (210) in a first direction.

9. A heating furnace, characterized in that, Includes the furnace tube structure and furnace body (1) as described in any one of claims 1-8, wherein the furnace tube structure is disposed in the furnace body (1).

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