Cleaning device and cleaning method for a nozzle

Abstract

The present disclosure relates to a cleaning device and a cleaning method for a nozzle. The cleaning device comprises a body for surrounding the nozzle, the body comprising a body inlet and a body outlet; at least one row of first flow channels for passing cleaning agent, the first flow channels being arranged circumferentially along the outer side of the body, and the outlets of the first flow channels being in communication with the body, the positions of the outlets of the first flow channels forming cleaning positions. The cleaning device and the cleaning method of the present disclosure can precisely clean and maintain the nozzle, ensure the cleanliness of the nozzle, and thus ensure the production yield and production efficiency of products.

Description

Technical Field

[0001] The embodiments of the present disclosure relate to the field of semiconductor manufacturing technology, and more particularly to a nozzle cleaning device and a cleaning method. Background Art

[0002] In the semiconductor device manufacturing process, wafer processing is typically performed using a variety of nozzles that spray corresponding reagents. For example, in the photolithography process, developer nozzles spray developer onto the wafer surface. The liquid outlets of these nozzles are close to the wafer, and the mixture on the wafer surface can splash and adhere to these nozzles and their surroundings, causing contamination. In actual production, maintenance shutdowns are often performed based on actual product defects, or scheduled maintenance. Wiping and cleaning the nozzles is not only difficult to do properly, but also seriously affects product yield and machine production capacity. Summary of the Invention

[0003] The following is a summary of the subject matter described in detail herein. This summary is not intended to limit the scope of the claims.

[0004] The embodiments of the present disclosure provide a nozzle cleaning device and a cleaning method, which can automatically clean and maintain the nozzle to ensure the cleanliness of the nozzle, thereby ensuring the production yield and production efficiency of the product.

[0005] A first aspect of an embodiment of the present disclosure provides a nozzle cleaning device, the nozzle cleaning device comprising:

[0006] a body, configured to surround the nozzle, the body comprising a body inlet and a body outlet;

[0007] At least one row of first flow channels is used to introduce cleaning agent. The first flow channels are arranged along the outer circumference of the body, and the outlets of the first flow channels are connected to the body. The outlet positions of the first flow channels form cleaning positions.

[0008] According to some embodiments of the present disclosure, the cleaning device further includes:

[0009] a second flow channel for introducing a desiccant, the second flow channel being arranged along the inner circumference of the body, and an outlet of the second flow channel being in communication with the body;

[0010] The outlet of the first flow channel is lower than the outlet of the second flow channel.

[0011] According to some embodiments of the present disclosure, the cleaning agent includes a liquid cleaning agent and / or a gaseous cleaning agent.

[0012] According to some embodiments of the present disclosure, the body includes a first side wall and a second side wall, and a hollow channel between the first side wall and the second side wall forms an inlet of the second flow channel.

[0013] According to some embodiments of the present disclosure, the first sidewall and the second sidewall are annular structures.

[0014] According to some embodiments of the present disclosure, the outlet direction of the first flow channel is inclined relative to the body; and / or,

[0015] An outlet direction of the second flow channel is parallel to an inlet direction of the body.

[0016] According to some embodiments of the present disclosure, the nozzle is a developing nozzle of a developing solution spraying system, the cleaning agent includes developing solution, pure water and a surfactant, and the mass percentage of the developing solution is 2 to 40%.

[0017] According to some embodiments of the present disclosure, the first flow channel further includes at least one circulation pipeline for introducing the cleaning agent, and the outlet of each of the circulation pipelines is connected to the outlet of the first flow channel.

[0018] According to some embodiments of the present disclosure, the at least one flow line comprises:

[0019] A developer circulation pipeline, used for introducing the developer;

[0020] a water circulation pipeline, for introducing the pure water, wherein the outlet of the water circulation pipeline is higher than the outlet of the developer circulation pipeline;

[0021] The surfactant circulation pipeline is used for introducing the surfactant, and the outlet of the surfactant circulation pipeline is located between the outlet of the water circulation pipeline and the outlet of the developer circulation pipeline.

[0022] A second aspect of the embodiments of the present disclosure provides a nozzle cleaning method, the cleaning method comprising:

[0023] Place the nozzle along the body inlet of the body into the cleaning position in the body, and the body surrounds the nozzle;

[0024] The cleaning agent is introduced into the body from the outer side of the body in a circumferential direction in at least one row, and the nozzle is cleaned from the cleaning position;

[0025] The cleaning agent flows out through the main body outlet.

[0026] According to some embodiments of the present disclosure, the cleaning method further comprises:

[0027] The desiccant is introduced into the body from the inner circumference of the body, and the cleaned nozzle is dried from a position higher than the cleaning position;

[0028] The desiccant flows out through the main body outlet.

[0029] According to some embodiments of the present disclosure, the cleaning agent is inclined relative to the body to clean the nozzle, and the drying agent is parallel to the body inlet of the body to dry the cleaned nozzle.

[0030] According to some embodiments of the present disclosure, the cleaning agent is introduced into the body in multiple rows, wherein the flow rate of the cleaning agent in each row gradually decreases in a direction along the body outlet.

[0031] According to some embodiments of the present disclosure, the nozzle is a developing nozzle of a developing solution spraying system, the cleaning agent includes developing solution, pure water and a surfactant, and the mass percentage of the developing solution is 2 to 40%.

[0032] According to some embodiments of the present disclosure, the process of cleaning the nozzle using the cleaning agent includes:

[0033] Allowing the developer to enter the cleaning position to clean the nozzle;

[0034] The surfactant is made to enter the cleaning position from a position higher than or equal to the developer outlet to clean the nozzle after being cleaned by the developer;

[0035] The pure water is allowed to enter the cleaning position from a position higher than or equal to the surfactant outflow outlet to clean the nozzle after the surfactant is cleaned.

[0036] According to some embodiments of the present disclosure, while the developer is used to clean the nozzle, the developer is sprayed out from the interior of the nozzle, wherein the concentration of the developer sprayed out of the nozzle is greater than or equal to the concentration of the developer entering the cleaning position.

[0037] The cleaning device and cleaning method of the disclosed embodiments can perform precise flow cleaning and maintenance on the nozzle, ensuring the cleanliness of the nozzle, thereby ensuring the production yield and production efficiency of the product.

[0038] Still other aspects will become apparent upon reading and understanding the accompanying drawings and detailed description. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] The accompanying drawings, which are incorporated into and constitute a part of the specification, illustrate embodiments of the present disclosure and, together with the description, are used to explain the principles of the embodiments of the present disclosure. In these drawings, similar reference numerals are used to represent similar elements. The drawings described below are some embodiments of the present disclosure, but not all embodiments. For those of ordinary skill in the art, other drawings can be derived from these drawings without inventive effort.

[0040] Figure 1 is a schematic structural diagram of a cleaning device according to an exemplary embodiment;

[0041] Figure 2 According to an exemplary embodiment Figure 1 A top view of

[0042] Figure 3 According to an exemplary embodiment Figure 2 A-direction view;

[0043] Figure 4-6 FIG. 2 is a BB cross-sectional view of a cleaning device according to an exemplary embodiment;

[0044] Figure 7 is a schematic diagram showing a cleaning device in use according to an exemplary embodiment;

[0045] Figure 8 is a flow chart of a cleaning method according to an exemplary embodiment;

[0046] Figure 9 is a supplementary flow chart of a cleaning method according to an exemplary embodiment;

[0047] Figure 10 is a flow chart of a cleaning method according to an exemplary embodiment.

[0048] Reference numerals:

[0049] 1. Main body; 101. Main body outlet; 102. Main body inlet; 11. First side wall; 12. Second side wall; 2. First flow channel; 20. Circulation pipeline; 201. Developer circulation pipeline; 202. Water circulation pipeline; 203. Surfactant circulation pipeline; 3. Second flow channel. DETAILED DESCRIPTION

[0050] In order to make the purpose, technical solutions and advantages of the embodiments of the present disclosure clearer, the technical solutions in the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings in the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by those skilled in the art without making creative work are within the scope of protection of the present disclosure. It should be noted that, in the absence of conflict, the embodiments in the present disclosure and the features in the embodiments can be arbitrarily combined with each other.

[0051] The disclosed embodiments provide a nozzle cleaning device and method, primarily for various nozzles used in semiconductor manufacturing processes, such as photoresist supply nozzles, developer supply nozzles, and cleaning fluid supply nozzles. The disclosed embodiments utilize a flowing cleaning agent to thoroughly clean contaminants adhering to the exterior of the nozzle, and then utilize a flowing desiccant to clean residual liquid cleaning agent and the like on the exterior of the nozzle, thereby achieving dynamic cleaning of the nozzle surface and ensuring its cleanliness, thereby ensuring product production yield, while also improving cleaning efficiency and, consequently, production efficiency.

[0052] Figure 1 A schematic structural diagram of a cleaning device according to an embodiment of the present disclosure is shown. Figure 2 In an exemplary embodiment Figure 1 A top view of Figure 3 In an exemplary embodiment Figure 2 A-direction view, Figure 4-6 BB sectional views of the cleaning device according to an exemplary embodiment are shown respectively. Figure 7 The following is a schematic diagram showing the use of the cleaning device according to an exemplary embodiment. The nozzle cleaning device and cleaning method proposed in the present disclosure are described below with reference to the accompanying drawings and specific embodiments, taking the developer nozzle of a developer spraying system as an example to be cleaned.

[0053] comprehensive Figure 1-4 As shown, the nozzle cleaning device of the embodiment of the present disclosure includes: a body 1 and at least one row of first flow channels 2.

[0054] like Figure 1 As shown, the body 1 is used to surround the nozzle and be close to the nozzle, and the body 1 includes a body outlet 101 and a body inlet 102. Exemplarily, the body outlet 101 and the body inlet 102 are located at the bottom and the top of the body 1 respectively.

[0055] The main body 1 has a relatively large volume to accommodate the nozzle. Furthermore, in some embodiments, the shape of the main body 1 can be adapted to the outer shape of the nozzle, allowing the surfaces of the main body 1 and the nozzle to be equally close, thereby improving cleaning efficiency and reducing cleaning costs. The nozzle to be cleaned enters the main body 1 through the main body inlet 102 for cleaning.

[0056] like Figures 1 to 4 As shown, the first flow channel 2 is used to introduce a cleaning agent. The first flow channel 2 is arranged along the outer circumference of the main body 1, and the outlet of the first flow channel 2 is connected to the main body 1. The outlet position of the first flow channel 2 forms a cleaning position, thereby, the cleaning agent flows to clean the peripheral surface of the nozzle located in the main body 1. The cleaning agent can be accurately aligned with the contaminants on the nozzle surface, improve the cleaning effect through chemical action and physical impact, and then be discharged through the main body outlet 101.

[0057] In an embodiment, a single row of first flow channels 2 may be provided, or multiple rows of first flow channels 2 may be spaced apart in the height direction (in the direction from the main body inlet to the main body outlet), such as two rows, three rows, or five rows. The flow rates of the cleaning agents in the multiple rows of first flow channels 2 may be the same, and in some embodiments, the flow rates may be different. For example, the flow rate may gradually decrease in the direction of the main body outlet 101. When the flow rate decreases as the flow rate decreases downward in the direction of the main body outlet 101, the impact of the cleaning agent flow rate on the nozzle surface is smaller, thereby not only improving the cleanliness of the nozzle surface by repeatedly cleaning the nozzle surface, but also reducing the impact on the nozzle closer to the nozzle, thereby maintaining the stability of the nozzle.

[0058] exist Figure 5 In the illustrated embodiment, the cleaning device of the disclosed embodiment further includes a second flow channel 3 arranged circumferentially along the inner side of the body 1 for introducing a desiccant. This allows the desiccant to be closer to the nozzle surface, thereby drying the nozzle after cleaning. The disclosed embodiment can effectively control the flow direction of the desiccant, blowing the desiccant from above the nozzle to create a positive or negative pressure environment within the body 1. This, under the action of external forces and gravity, dries any residual liquid remaining on the nozzle surface. In some embodiments, the desiccant can be a gaseous desiccant with excellent stability, such as nitrogen or clean air.

[0059] like Figure 5 As shown, the outlet of the second flow channel 3 is connected to the body 1, ensuring rapid drying of the nozzle surface in the body 1. The desiccant enters the body 1 through the second flow channel 3, dries the nozzle in the body 1, and is then discharged through the body outlet 101.

[0060] like Figure 5 As shown, in the cleaning device of the embodiment of the present disclosure, when the first flow channel 2 and the second flow channel 3 are included, the outlet of the first flow channel 2 is lower than the outlet of the second flow channel 3 to ensure that the desiccant fully dries the nozzle surface, avoids splashing of the cleaning agent during the flow cleaning process or cleaning agent residue after cleaning, and fully ensures the cleaning effect of the nozzle.

[0061] like Figure 5As shown, in an exemplary embodiment, the cleaning agent includes a liquid cleaning agent or a gaseous cleaning agent, that is, the liquid cleaning agent or the gaseous cleaning agent can be introduced into the first flow channel 2 to perform flow cleaning on the nozzle located in the main body 1. For example, taking the developer nozzle of the developer spraying system as an example, the liquid cleaning agent can include at least one of the developer, surfactant, pure water and other cleaning agents with a mass percentage of 2 to 40%; the gaseous cleaning agent can be an inert gas or nitrogen. The liquid cleaning agent within this range can excellently remove pollutants on the surface of the nozzle, wherein the surfactant can be a non-ionic surfactant. The non-ionic surfactant has excellent surface activity and a unique molecular structure, will not introduce metal ion impurities, and can ensure the cleaning effect. For example, optionally, there are alkoxylate surfactants, fatty acid ester surfactants, amide surfactants and alcohol surfactants.

[0062] In other embodiments, the cleaning agent may also include a liquid cleaning agent and a gaseous cleaning agent. For example, the liquid cleaning agent and the gaseous cleaning agent may be alternately introduced into the first flow channel 2, and the nozzle is cleaned by the liquid cleaning agent and the gaseous cleaning agent alternately. The gaseous cleaning agent can prevent the liquid cleaning agent from remaining on the nozzle surface, thereby improving the cleaning effect.

[0063] like Figures 1 to 5 As shown, the cleaning device provided by the embodiment of the present disclosure can realize the fluidity of liquid cleaning agents and gaseous cleaning agents during the cleaning process by setting the main body inlet 102 located at a low position and the first flow channel 2 higher than the main body outlet 101, realize dynamic cleaning of unidirectional flow, avoid impurities such as particulate matter cleaned from the nozzle from remaining on the nozzle surface for a second time, ensure the cleaning effect, ensure the surface cleanliness of the nozzle, and thus ensure the yield of the produced products; at the same time, improve the cleaning efficiency, and thus improve the production efficiency.

[0064] During the actual cleaning process, the outlet position of the first flow channel 2 is adapted to the position of the nozzle in the main body 1 to form a cleaning position. For example, by moving the position of the nozzle up and down, the position to be cleaned is stopped at the outlet position of the first flow channel 2. In some embodiments, the cleaning position may be higher than the part to be cleaned on the surface of the nozzle. When there are multiple rows of first flow channels 2, it means that the cleaning position of the first flow channel 2 in the top row is higher than the part to be cleaned on the surface of the nozzle. For example, in the actual production process, the height of the mixture on the surface of the wafer splashing and adhering to the surrounding of the developing nozzle is not higher than 1 / 2 of the height of the developing nozzle. Then, during the cleaning process of the side wall of the developing nozzle, the position where the developing nozzle enters the main body 1 is such that at least 1 / 2 of the height of the developing nozzle outlet upwards needs to be lower than the outlet position of the first flow channel 2 to ensure that the developer splashed around the developing nozzle is fully cleaned and the cleanliness of the developing nozzle is ensured.

[0065] like Figure 5As shown, in the cleaning device provided in the embodiment of the present disclosure, the body 1 includes a first side wall 11 and a second side wall 12. The hollow channel between the first side wall 11 and the second side wall 12 forms the inlet of the second flow channel 3. The outlet of the first flow channel 2 is located on the first side wall 11 and is arranged lower than the inlet of the second flow channel 3.

[0066] like Figure 5 As shown, in the embodiment of the present disclosure, the bottom end of the first side wall 11 forms the body outlet 101 of the body 1, the top end of the second side wall 12 forms the body inlet 102 of the body 1, and the bottom end of the second side wall 12 forms the inlet of the nozzle. Among them, the body inlet 102, the inlet of the nozzle and the body outlet 101 are connected. The nozzle enters the body 1 after passing through the body inlet 102 and the inlet formed by the bottom end of the second side wall 12 in sequence, and then the nozzle is flow-cleaned with a cleaning agent. After cleaning, the cleaning agent carries the cleaned particles and other impurities and is discharged through the body outlet 101. The body outlet 101 can be connected to a post-processing device (not shown in the figure), and the used cleaning agent is purified or recycled by the post-processing device to avoid causing environmental pollution while saving energy and production costs.

[0067] like Figure 5 As shown, in the cleaning device provided in the embodiment of the present disclosure, the first side wall 11 is an annular structure whose shape is adapted to the shape of the nozzle, for example, an annular structure with a rectangular cross-section, and the outer dimensions of the first side wall 11 are larger than the outer dimensions of the nozzle, so that the liquid cleaning agent and / or gaseous cleaning agent entering the main body 1 through the first flow channel 2 flows between the first side wall 11 and the developing nozzle to the main body outlet 101, thereby realizing dynamic cleaning of the nozzle with unidirectional flow.

[0068] In other embodiments, if the nozzle is a cylindrical or truncated cone structure, the first side wall 11 can be adapted to be a cylindrical or truncated cone structure, so that the first side wall 11 surrounds the nozzle to be cleaned and adapts to the structure of the nozzle to ensure the cleaning effect of the nozzle.

[0069] For example, the shape of the body inlet 102 is adapted to the shape of the nozzle. For example, the second side wall 12 is an annular structure, and the shape and structure of the second side wall 12 are adapted to the shape and structure of the nozzle, that is, the shape of the longitudinal section of the second side wall 12 can be set according to the longitudinal section shape of the nozzle. Figure 1 and Figure 4 As shown, the longitudinal section of the nozzle is a trapezoidal structure, and the longitudinal section of the second side wall 12 in the corresponding direction is also a trapezoidal structure, and the inner wall size of the annular structure of the second side wall 12 is larger than the outer size of the nozzle.

[0070] Exemplarily, in the embodiment of the present disclosure, the outlet of the first flow channel 2 and / or the outlet of the second flow channel 3 can both be an annular structure arranged along the circumference of the first side wall 11 to ensure that the liquid cleaning agent and / or gaseous cleaning agent flowing out through the first flow channel 2, and the desiccant flowing out through the second flow channel 3 can fully clean and dry the nozzle surface to ensure the cleaning effect; at the same time, the number of excessive openings on the main body 1 can be reduced, thereby ensuring that the cleaning agent and desiccant are all aimed at impurities attached to the surface of the part to be cleaned, avoiding inadequate cleaning.

[0071] In an exemplary embodiment, the outlet direction of the first flow channel 2 is inclined relative to the main body 1, and the outlet direction of the first flow channel 2 forms an acute angle with the entry direction of the main body inlet 102. The cleaning agent flowing out of the first flow channel 2 can contact the nozzle surface in an inclined state, ensuring the cleaning effect and avoiding reverse splashing on the outer wall of the nozzle, which would affect the cleaning effect. The outlet direction of the second flow channel 3 is parallel to the inlet direction of the main body 1. The desiccant flowing out of the second flow channel 3 is close to and parallel to the side wall of the nozzle, and under the action of external force and gravity, it can easily carry away the residual cleaning agent.

[0072] like Figure 5 As shown, in an exemplary embodiment, the top of the first side wall 11 is connected to the top of the second side wall 12. When the second flow channel 3 is included, the inlet of the second flow channel 3 is arranged between the top of the first side wall 11 and the top of the second side wall 12. The first side wall 11 and the second side wall 12 can be a separate structure or an integrally formed structure.

[0073] In an exemplary embodiment, at least two connecting portions are spaced apart between the top of the first side wall 11 and the top of the second side wall 12. When the second flow channel 3 is included, two adjacent connecting portions are connected to the body outlet 101, serving as the inlet of the second flow channel 3.

[0074] The first side wall 11 , the connecting portion, and the second side wall 12 may be split structures. For example, the first side wall 11 and the second side wall 12 may be split structures, and the top of the first side wall 11 and the top of the second side wall 12 may be connected by at least two spaced connecting portions.

[0075] The first sidewall 11, the connecting portion between the first and second sidewalls 11, 12, and the second sidewall 12 can be integrally formed, for example, by bending or stamping. For example, the first and second sidewalls 11, 12 are integrally formed with a shared top portion, with a plurality of vents spaced apart between the top portions. When the second flow channel 3 is included, the plurality of vents can serve as the inlet of the second flow channel 3, and the structure between two adjacent vents serves as the connecting portion.

[0076] For example, at least two connecting plates can be spaced apart between the first side wall 11 and the second side wall 12, with one side of the connecting plate connected to the first side wall 11 and the other side connected to the second side wall 12. The length of the connecting plate aligns with the flow direction of the gaseous cleaning agent. When the second flow channel 3 is included, the portion between two adjacent connecting plates, the first side wall 11 and the second side wall 12 together form the second flow channel 3.

[0077] In the cleaning device provided in the embodiment of the present disclosure, when the second flow channel 3 is included, the outlet of the first flow channel 2 is provided on the first side wall 11 and communicates with the main body outlet 101 through the first side wall 11 .

[0078] In an exemplary embodiment of the present disclosure, the cleaning agent includes a developer, pure water, and a surfactant, wherein the mass percentage of the developer is 2 to 40%.

[0079] In practical applications, the liquid cleaning agent flowing out through the first flow channel 2 may have a single component or may include multiple components. Figure 6 and Figure 7 As shown, to facilitate control of the composition and dosage of the liquid cleaning agent, the first flow channel 2 further includes at least one circulation conduit 20 for introducing the cleaning agent. The outlet of each circulation conduit 20 is connected to the outlet of the first flow channel 2. Different liquid cleaning agent compositions can be provided in different circulation conduits 20 according to actual cleaning needs.

[0080] like Figure 4 and Figure 5 As shown, in the embodiment of the present disclosure, when the first flow channel 2 includes a circulation pipeline 20, these cleaning agents can be circulated through the circulation pipeline 20 in sequence. In some other embodiments, such as Figure 6 and Figure 7 As shown, the first flow channel 2 may include multiple, for example, developer circulation pipeline 201, water circulation pipeline 202 and surfactant circulation pipeline 203, which are used to circulate developer, pure water, and surfactant respectively, thereby realizing the automatic cleaning process. When the first flow channel 2 includes multiple circulation pipelines, these multiple circulation pipelines are integrated into one flow channel, which can ensure that these cleaning agents always clean the nozzle from the same cleaning position without causing the problem of inconsistent cleaning height.

[0081] In some embodiments, when multiple cleaning agents are circulated sequentially through multiple circulation pipes, in order to avoid contamination of the cleaning agent used last time by the cleaning agent used next time and to complete the cleaning of the first flow channel 2 at the same time, these multiple circulation pipes can be arranged according to different outlet heights, for example, Figure 6 and Figure 7As shown, the outlet of water circulation conduit 202 is higher than the outlet of developer circulation conduit 201, and the outlet of surfactant circulation conduit 203 is located between the outlets of water circulation conduit 202 and developer circulation conduit 201. In actual use, the developer nozzle is cleaned using developer, surfactant, and pure water in sequence. This ensures that the final step of each cleaning process using a detergent is to use pure water through first flow channel 2. This ensures that the developer nozzle is cleaned effectively while also cleaning the interior of first flow channel 2, ensuring that the first flow channel 2 is clean.

[0082] The nozzle cleaning device provided in the embodiment of the present disclosure not only realizes unidirectional flow cleaning of the nozzle, improving the cleaning efficiency and cleaning effect, but also can select the composition and dosage of the liquid cleaning agent according to the difficulty of cleaning the nozzle, further ensuring the cleaning effect, thereby ensuring product yield and improving economic benefits.

[0083] The embodiment of the present disclosure also provides a nozzle cleaning method for automatic cleaning. The cleaning method is performed by the cleaning device described above. Figure 8 This is a flow chart of a cleaning method according to an exemplary embodiment, with reference to Figure 1-Figure 5 As shown, the cleaning method provided in the embodiment of the present disclosure includes the following steps:

[0084] Step S110 , placing the nozzle along the main body inlet 102 of the main body 1 into the cleaning position inside the main body 1 , with the main body 1 surrounding the nozzle;

[0085] In step S120 , the cleaning agent is introduced into the main body 1 from the outer circumference of the main body 1 in at least one row, and the nozzle is cleaned from the cleaning position; the cleaning agent flows out through the main body outlet 101 .

[0086] For example, using the developer nozzle of the developer spraying system as an example, the developer spraying system is operated to move the nozzle to be cleaned into the main body 1. The nozzle's position is adjusted so that the nozzle to be cleaned is slightly lower than the cleaning position, that is, the outlet position of the first flow channel 2 of the cleaning device. The cleaning process then begins, with the cleaning agent introduced into the first flow channel 2, entering the cleaning position, and cleaning the circumferential surface of the nozzle.

[0087] When there are multiple rows of first flow channels 2, the multiple rows of first flow channels 2 are arranged side by side in the height direction. The flow rates of the cleaning agents in the multiple first flow channels 2 can be the same or different. For example, in the direction along the main body outlet 101, the cleaning agents in each row of the first flow channels 2 are arranged in a manner of decreasing flow rate. Since the greater the flow rate, the greater the impact of the cleaning agent on the part to be cleaned; and as the cleaning agent flows and flushes, the lower the position of the part to be cleaned, the lower the corresponding cleaning agent flow rate. It is actually a superposition of cleaning agents in multiple first flow channels 2 to improve the cleanliness after cleaning, and at the same time it can also protect the stability of the nozzle and avoid excessive impact damage or deformation to the nozzle due to excessively high flow rate of the cleaning agent.

[0088] In the embodiment of the present disclosure, the cleaning agent may include only liquid cleaning agent or gaseous cleaning agent, or may include liquid cleaning agent and gaseous cleaning agent, and the liquid cleaning agent and the gaseous cleaning agent are alternately introduced into the first flow channel 2.

[0089] In step S110 , the nozzle is placed into the body 1 through the body inlet 102 and the inlet formed at the bottom end of the second side wall 12 in sequence, and the nozzle surface is ensured to be lower than the outlet of the second flow channel 3 .

[0090] In the embodiment of the present disclosure, for example, the cleaning time and the cleaning flow rate can be set according to the frequency of cleaning of the nozzle, the difficulty of cleaning, etc. Exemplarily, it can be selected to be set to 1s-20s. For example, in step S120, a liquid cleaning agent with a preset concentration, preset composition, and preset flow rate is selected, and the liquid cleaning agent is introduced into the first flow channel 2 for 1s-20s, such as 10s, 12s, and then stopped. For another example, in step S120, a liquid cleaning agent with a preset concentration, preset composition, and preset flow rate is first selected, and the liquid cleaning agent is introduced into the first flow channel 2 for 1s-20s, such as 8s, 9s; and then a gaseous cleaning agent with a preset composition, preset pressure, and preset flow rate is selected, and the gaseous cleaning agent is introduced into the first flow channel 2 for 1s-10s, such as 10s.

[0091] The cleaning method provided in the embodiment of the present disclosure surrounds the nozzle with the body and utilizes the cleaning agent flowing in the first flow channel 2 to perform unidirectional flow dynamic cleaning on the nozzle, thereby fully ensuring the cleaning effect and improving the cleaning efficiency and product yield.

[0092] Figure 9 is a supplementary flow chart of a cleaning method according to an exemplary embodiment, referring to Figure 1-3 、 Figure 5 as well as Figure 9 As shown, the cleaning method further includes, after step S120:

[0093] In step S130 , a desiccant is introduced into the main body 1 from the inner circumference of the main body 1 , and the cleaned nozzle is dried from a position higher than the cleaning position; the desiccant flows out through the main body outlet 101 .

[0094] By introducing a desiccant into the second flow channel 3 of the cleaning device, the desiccant is used to dry the portion to be cleaned after cleaning, so as to prevent the cleaning agent from remaining on the nozzle surface and affecting the cleaning effect.

[0095] In the embodiment of the present disclosure, the drying time can be set according to the concentration, composition, etc. of the cleaning agent. Exemplarily, it can be set to 2s-30s. For example, in step S130, a gaseous desiccant with a preset pressure of, for example, 5-40Pa and a preset flow rate of, for example, 100-1000ml / min is selected, and is passed into the second flow channel 3 for 2s-30s, for example, 12s, 16s, 18s, and then a cleaning process is terminated. Among them, exemplarily, nitrogen can be selected as the gaseous desiccant, and nitrogen with a pressure of 32Pa is passed into the second flow channel 3 at a flow rate of 560ml / min, and the passage time is 12s.

[0096] The cleaning method provided in the embodiment of the present disclosure first performs unidirectional flow dynamic cleaning on the nozzle using a liquid cleaning agent, and then uses a gaseous desiccant to perform unidirectional cleaning on the residual liquid cleaning agent, thereby fully ensuring the cleaning effect and improving the cleaning efficiency and product yield.

[0097] like Figure 10 As shown, in some embodiments, for example, the developing nozzle of the developing solution spraying system is taken as the cleaning object, and the cleaning agent uses 2-40% by mass of developing solution, pure water and surfactant. Figure 10 A flowchart showing the implementation of cleaning the developing nozzle with a cleaning agent is shown.

[0098] S121, allowing the developer to enter the cleaning position to clean the nozzle;

[0099] S122, allowing the surfactant to enter the cleaning position from a position higher than or equal to the developer outlet to clean the nozzle after the developer is cleaned;

[0100] S123, allowing pure water to enter the cleaning position from a position higher than or equal to the surfactant outflow outlet to clean the nozzle after the surfactant has been cleaned.

[0101] Reference Figure 5 、 Figure 6 and Figure 7As shown, the corresponding cleaning agent can be introduced through one or more circulation pipes 201, 202, 203 on the first flow channel 2 of the cleaning device. When there is only one circulation pipe, it can be introduced in sequence. At this time, the outflow positions of each cleaning agent are the same. When the outlet positions of these circulation pipes 201, 202, 203 are arranged according to different outlet heights, mutual contamination between cleaning agents is avoided, automatic cleaning is achieved, and the cleaning of the first flow channel 2 is completed while cleaning, thereby improving the cleaning efficiency. It should be noted that, whether in one or more circulation pipes 20, these are all integrated into the first flow channel 2 and enter the main body 1 through the outlet of the first flow channel 2, thereby reducing the formation of too many openings on the main body 1. These cleaning agents always clean the nozzle from the same cleaning position. These cleaning agents can all be aimed at the contaminants on the nozzle surface, avoiding the problems of inconsistent cleaning height and inadequate cleaning.

[0102] like Figure 6 and Figure 7 As shown, after the developing nozzle moves to the cleaning position within the main body 1, the cleaning process begins. In step S121, developer liquid is introduced into the developer liquid circulation pipeline 201, then passes through the first flow channel 2 and into the cleaning position, where it cleans the circumferential surface of the nozzle and removes most contaminants. The developer liquid has a mass percentage of 2-40%, for example, 4%, 10%, or 15%. A developer liquid within this range achieves a balance between cleaning effectiveness and cost.

[0103] In some embodiments, while the developer nozzle is being cleaned with developer, developer is sprayed from the interior of the developer nozzle to prevent the cleaning developer from contaminating the interior of the developer nozzle. Furthermore, to prevent contamination of the interior of the developer nozzle, the concentration of the developer sprayed from the developer nozzle is greater than or equal to the concentration of the developer entering the cleaning station through the first flow channel 2. The concentration of the developer sprayed from the interior of the developer nozzle is the same as that used in semiconductor manufacturing processes. The concentration of the developer entering the cleaning station should not be too high to ensure effective cleaning and save costs.

[0104] Afterwards, enter step S122, and pass the surfactant into the surfactant circulation pipeline 203, and then pass through the first flow channel 2 to the cleaning position to clean the nozzle after the developer is cleaned. At this time, on the one hand, the surfactant can enhance the cleaning effect and effectively remove the pollutants that have not been cleaned after the developer is cleaned. On the other hand, the outflow outlet of the surfactant is higher than the outflow outlet of the developer, so that the developer used last time in the first flow channel 2 can be cleared.

[0105] Next, step S123 begins, where pure water is introduced into water circulation line 202, then through first flow channel 2 and into the cleaning position to clean the nozzles after the surfactant cleaning. At this point, in the final cleaning step, the pure water not only removes any remaining contaminants from the developing nozzle surface, completing the cleaning process, but also because the pure water outflow is higher than the surfactant outflow, thus completing the cleaning of first flow channel 2.

[0106] The nozzle cleaning method provided in the embodiment of the present disclosure can achieve unidirectional flow cleaning of the nozzle by providing a main body with a first flow channel and a second flow channel, thereby improving the cleaning effect and cleaning efficiency, and increasing product yield and production efficiency.

[0107] The various embodiments or implementation methods in this specification are described in a progressive manner. Each embodiment focuses on the differences from other embodiments, and the same or similar parts between the various embodiments can be referenced to each other.

[0108] In the description of this specification, reference to the terms "embodiment", "exemplary embodiment", "some embodiments", "illustrative embodiment", "example", etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present disclosure.

[0109] In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any suitable manner in any one or more embodiments or examples.

[0110] In the description of the present disclosure, it should be noted that the terms "center", "up", "down", "left", "right", "vertical", "horizontal", "inside", "outside", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation. Therefore, they cannot be understood as limitations on the present disclosure.

[0111] It is to be understood that the terms "first", "second", etc. used in the present disclosure can be used to describe various structures in the present disclosure, but these structures are not limited by these terms. These terms are only used to distinguish a first structure from another structure.

[0112] In one or more of the accompanying drawings, identical elements are represented by similar reference numerals. For clarity, many parts in the accompanying drawings are not drawn to scale. In addition, certain well-known parts may not be shown. For simplicity, a structure obtained after several steps may be described in a single figure. Many specific details of the present disclosure, such as device structure, materials, dimensions, processing techniques, and technologies, are described below to facilitate a clearer understanding of the present disclosure. However, as will be appreciated by those skilled in the art, the present disclosure may be practiced without following these specific details.

[0113] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present disclosure, rather than to limit them. Although the present disclosure has been described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein with equivalents. However, these modifications or replacements do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present disclosure.

Claims

1. A nozzle cleaning device, characterized in that: The nozzle cleaning device comprises: a body, configured to surround the nozzle, the body comprising a body inlet and a body outlet; Multiple rows of first flow channels are arranged at intervals along the direction from the main body inlet to the main body outlet, wherein the flow rates of the cleaning agent in the multiple rows of first flow channels are different, and the flow rate is lower as it goes downwards in the direction of the main body outlet, for introducing the cleaning agent. The first flow channels are arranged along the outer circumference of the main body, and the outlet of the first flow channel is connected to the main body, and the outlet direction of the first flow channel forms an acute angle with the entry direction of the main body inlet, and the outlet position of the first flow channel forms a cleaning position, and the cleaning position of the first flow channel in the top row is higher than the part to be cleaned on the nozzle surface.

2. The cleaning device according to claim 1, characterized in that The cleaning device also includes: a second flow channel for introducing a desiccant, the second flow channel being arranged along the inner circumference of the body, and an outlet of the second flow channel being in communication with the body; The outlet of the first flow channel is lower than the outlet of the second flow channel.

3. The cleaning device according to claim 1, characterized in that The cleaning agent includes a liquid cleaning agent and / or a gaseous cleaning agent.

4. The cleaning device according to claim 2, characterized in that: The body includes a first side wall and a second side wall, and a hollow channel between the first side wall and the second side wall forms an inlet of the second flow channel.

5. The cleaning device according to claim 4, characterized in that The first side wall and the second side wall are annular structures.

6. The cleaning device according to claim 2, characterized in that: An outlet direction of the second flow channel is parallel to an inlet direction of the body.

7. The cleaning device according to any one of claims 1 to 6, characterized in that: The nozzle is a developing nozzle of a developing solution spraying system, the cleaning agent comprises developing solution, pure water and a surfactant, and the mass percentage of the developing solution is 2-40%.

8. The cleaning device according to claim 7, characterized in that: The first flow channel further includes at least one circulation pipeline for introducing the cleaning agent, and the outlet of each circulation pipeline is connected to the outlet of the first flow channel.

9. The cleaning device according to claim 8, characterized in that: The at least one flow line comprises: A developer circulation pipeline, used for introducing the developer; a water circulation pipeline, for introducing the pure water, wherein the outlet of the water circulation pipeline is higher than the outlet of the developer circulation pipeline; The surfactant circulation pipeline is used for introducing the surfactant, and the outlet of the surfactant circulation pipeline is located between the outlet of the water circulation pipeline and the outlet of the developer circulation pipeline.

10. A method for cleaning a nozzle, characterized in that: The nozzle cleaning method comprises: The nozzle is placed in a cleaning position in the body along the body inlet of the body, wherein the body surrounds the nozzle, wherein a plurality of rows of first flow channels are arranged at intervals in a direction from the body inlet toward the body outlet, and the cleaning position of the first flow channels in the uppermost row is higher than the part to be cleaned on the surface of the nozzle; The cleaning agent enters the body from the outer circumference of the body through the first flow channel and cleans the nozzle from the cleaning position; the flow rate of the cleaning agent in the multiple rows of first flow channels is different, and the flow rate decreases as it goes downward along the direction of the body outlet; The cleaning agent flows out through the main body outlet.

11. The cleaning method according to claim 10, characterized in that: The cleaning method further comprises: The desiccant is introduced into the body from the inner circumference of the body, and the cleaned nozzle is dried from a position higher than the cleaning position; The desiccant flows out through the main body outlet.

12. The cleaning method according to claim 11, characterized in that The cleaning agent is in an inclined state relative to the main body to clean the nozzle, and the drying agent is in a parallel state relative to the main body inlet to dry the cleaned nozzle.

13. The cleaning method according to claim 10, characterized in that The first flow channel includes a plurality of flow pipes, through which a plurality of cleaning agents flow in sequence.

14. The cleaning method according to any one of claims 10 to 13, characterized in that: The nozzle is a developing nozzle of a developing solution spraying system, the cleaning agent comprises developing solution, pure water and a surfactant, and the mass percentage of the developing solution is 2-40%.

15. The cleaning method according to claim 14, characterized in that: The process of cleaning the nozzle using the cleaning agent includes: Allowing the developer to enter the cleaning position to clean the nozzle; The surfactant is made to enter the cleaning position from a position higher than or equal to the developer outlet to clean the nozzle after being cleaned by the developer; The pure water is allowed to enter the cleaning position from a position higher than or equal to the surfactant outflow outlet to clean the nozzle after the surfactant is cleaned.

16. The cleaning method according to claim 14, characterized in that While the nozzle is cleaned with developer, the developer is sprayed out from the interior of the nozzle, wherein the concentration of the developer sprayed out of the nozzle is greater than or equal to the concentration of the developer entering the cleaning position.

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