Cleaning system and base station therefor, cleaning control method

Abstract

This invention discloses a cleaning system, its base station, and a cleaning control method. The base station of the cleaning system includes: a base station body with an upper and lower water level for supplying clean water and / or discharging wastewater to at least two cleaning devices, which can be active or passive cleaning devices; at least one first water supply interface located on the base station body within the area of ​​the upper and lower water level, for connecting to the clean water tank of the cleaning device; and at least one first drainage interface located on the base station body within the area of ​​the upper and lower water level, for connecting to the wastewater tank of the cleaning device. In the technical solution proposed by this invention, the base station body has an upper and lower water level that can supply clean water and / or discharge wastewater to at least two cleaning devices. This eliminates the need for a separate base station for each cleaning device, thereby reducing the space occupied by the cleaning system and lowering costs.

Description

Technical Field

[0001] This invention relates to the field of cleaning equipment, and in particular to a cleaning system, its base station, and a cleaning control method. Background Technology

[0002] Cleaning equipment is increasingly entering homes, replacing manual sweeping and cleaning of floors and carpets, becoming a helpful tool in people's lives. Household cleaning equipment can generally be divided into portable active cleaning equipment and handheld passive cleaning equipment.

[0003] Mobile active cleaning systems offer sweeping and cleaning functions, such as sweeping up coarse dirt, hair, and paper scraps into a collection box, and using a mop to wet-clean the floor to further remove fine particles. These systems can intelligently and automatically clean the floor using a mapping / navigation system, requiring no manual intervention. However, due to limitations in their structure, size, and technology, mobile active cleaning systems cannot completely remove stubborn stains.

[0004] Handheld passive cleaning devices can also perform sweeping and cleaning functions. When cleaning specific stubborn stains, by inputting control signals, a built-in cleaning fluid application system can apply cleaning fluid to the roller brush and / or the surface to be cleaned, softening the stubborn stains and causing them to detach from the surface, achieving better cleaning results. This makes them a good complement to mobile autonomous cleaning devices.

[0005] Both mobile self-cleaning devices and handheld passive cleaning devices require corresponding base stations for maintenance. This maintenance includes, for example, garbage collection, self-cleaning, water filling, drainage, drying and / or charging. When users configure both active and passive cleaning devices, corresponding base stations need to be configured for each device. This results in a large number of base stations being configured indoors, occupying a large amount of indoor space, and the overall cost of configuring base stations is high.

[0006] The above content is only used to help understand the technical solution of this application and does not represent an admission that the above content is prior art. Summary of the Invention

[0007] The main objective of this invention is to provide a base station for a clean system, which aims to solve the technical problems mentioned in the background art.

[0008] To achieve the above objectives, the base station of the cleaning system proposed in this invention includes:

[0009] The base station body has an upper and lower water level, which is used to supply clean water to at least two cleaning devices and / or discharge sewage. The cleaning devices are active cleaning devices or passive cleaning devices.

[0010] At least one first water supply interface is provided on the base station body and located in the area where the upper and lower water levels are located. The first water supply interface is used to connect to the clean water tank of the cleaning equipment.

[0011] At least one first drainage port is provided on the base station body and located in the area where the upper and lower water levels are located. The first drainage port is used to communicate with the sewage tank of the cleaning equipment.

[0012] In some embodiments, the base station body is provided with a first water supply interface, which is used to communicate with the clean water tank of any one of the at least two cleaning devices.

[0013] In some embodiments, the base station body is provided with at least two first water supply interfaces, each of the at least two first water supply interfaces corresponding to at least two cleaning devices, and each first water supply interface is used to connect to the clean water tank of the corresponding cleaning device.

[0014] In some embodiments, the base station body is further provided with a first water supply channel and a first water control switch. One end of the first water supply channel is connected to a water source, and the other end is connected to the first water supply interface. The first water control switch is provided in the first water supply channel or the first water supply interface and is used to control the opening and closing of the first water supply interface and / or the flow rate of clean water flowing out of the first water supply interface.

[0015] In some embodiments, the base station of the cleaning system further includes a first water pump, which is disposed on the base station body. When the first water control switch is turned on, clean water is delivered to the clean water tank of the cleaning equipment by the first water pump.

[0016] In some embodiments, the base station body is further provided with at least one set of cleaning agent components. The cleaning agent components include a cleaning agent bottle and an infusion channel. One end of the infusion channel is connected to the outlet of the cleaning agent bottle, and the other end is connected to the first water supply channel. The cleaning liquid in the cleaning agent bottle is delivered to the first water supply channel through the infusion channel.

[0017] In some embodiments, the cleaning agent assembly further includes a liquid control switch disposed on the infusion channel for controlling the connection or disconnection between the infusion channel and the first water supply channel.

[0018] In some embodiments, the base station body is provided with at least one clean water tank, the at least one clean water tank is disposed inside the base station body, one end of the first water supply channel is connected to the water outlet of the clean water tank, and the other end is connected to the first water supply interface.

[0019] In some embodiments, the base station body is provided with a self-cleaning area, a second water supply interface and a nozzle. The nozzle is located in the self-cleaning area, and the second water supply interface is connected to the nozzle. When the cleaning device is located in the self-cleaning area, water is sprayed towards the cleaning device through the nozzle for cleaning.

[0020] In some embodiments, the self-cleaning area includes multiple sub-cleaning areas, which are spaced apart. Each sub-cleaning area is equipped with a nozzle. The nozzle is connected to a second water supply interface through a second water supply channel. A second water control switch is provided on the second water supply channel. One end of the second water supply channel is connected to a water source, and the other end is connected to the nozzle through the second water supply interface. The second water control switch is located in the second water supply channel or the nozzle and is used to control the on / off state of the nozzle and / or the flow rate of clean water flowing out of the nozzle.

[0021] In some embodiments, the second water control switch is a multi-way valve.

[0022] In some embodiments, the base station body is provided with multiple third water supply channels, multiple third water control switches and multiple nozzles. The multiple third water supply channels, multiple third water control switches and multiple nozzles correspond one-to-one. One end of each third water supply channel is connected to a water source and the other end is connected to a nozzle. The third water control switch is located in the third water supply channel or nozzle.

[0023] In some embodiments, the base station of the cleaning system further includes a pressure reducing device disposed between the nozzle and the water source.

[0024] In some embodiments, the base station body is provided with a first drainage port, which is used to communicate with the sewage tank of any one of the at least two cleaning devices.

[0025] In some embodiments, the base station body is provided with at least two first drainage interfaces, each of the at least two first drainage interfaces corresponding to one of the at least two cleaning devices, and each first drainage interface is used to connect to the sewage tank of the corresponding cleaning device.

[0026] In some embodiments, the base station of the cleaning system further includes a first drainage channel and a fourth water control switch. One end of the first drainage channel is connected to the first drainage interface, and the fourth water control switch is disposed in the first drainage channel or the first drainage interface to control the opening and closing of the first drainage interface and / or the flow rate of sewage flowing out of the first drainage interface.

[0027] In some embodiments, the base station of the cleaning system further includes a second water pump, which is disposed within the base station body. When the fourth water control switch is turned on, the wastewater in the wastewater tank of the cleaning equipment is discharged through the second water pump.

[0028] In some embodiments, the base station body is provided with a self-cleaning area and a second drainage interface, the second drainage interface being located within the self-cleaning area, and wastewater within the self-cleaning area being discharged through the second drainage interface.

[0029] In some embodiments, the base station of the cleaning system further includes at least one wastewater tank, which is disposed within the base station body. One end of the first drainage channel is connected to the inlet of the wastewater tank, and the other end is connected to the first drainage interface; and / or, the second drainage interface is connected to the wastewater tank through a second drainage channel.

[0030] In some embodiments, a detection element is provided in the upper and lower water level areas, the detection element being used to detect whether the at least two cleaning devices are located at the upper and lower water levels and the device type of the at least two cleaning devices.

[0031] In some embodiments, the base station body is provided with a first selection module, which is used for users to manually select and determine the water supply and drainage priorities of each of the cleaning devices.

[0032] To achieve the above objectives, the present invention further proposes a cleaning system, the cleaning system including the aforementioned base station, the base station comprising:

[0033] The base station body has an upper and lower water level, which is used to supply clean water to at least two cleaning devices and / or discharge sewage. The cleaning devices are active cleaning devices or passive cleaning devices.

[0034] At least one first water supply interface is provided on the base station body and located in the area where the upper and lower water levels are located. The first water supply interface is used to connect to the clean water tank of the cleaning equipment.

[0035] At least one first drainage port is provided on the base station body and located in the area where the upper and lower water levels are located. The first drainage port is used to communicate with the sewage tank of the cleaning equipment.

[0036] In some embodiments, a first water level sensor is provided in the clean water tank of the cleaning device to detect the water level in the clean water tank of the cleaning device. When the water level in the clean water tank of the cleaning device is lower than a preset value, water is added to the cleaning device at the upper and lower water levels. When the water level in the clean water tank of the cleaning device is higher than the preset value, water addition is stopped.

[0037] In some embodiments, a second water level sensor is provided in the wastewater tank of the cleaning equipment to detect the water level in the wastewater tank of the cleaning equipment. When the water level in the wastewater tank of the cleaning equipment is higher than a preset value, the cleaning equipment drains water at the upper and lower water levels. When the water in the wastewater tank of the cleaning equipment is emptied, the drainage stops.

[0038] In some embodiments, the wastewater tank of the cleaning equipment is equipped with a wastewater detection sensor for detecting the degree of dirtiness of the wastewater in the wastewater tank of the cleaning equipment.

[0039] In some embodiments, the cleaning equipment is provided with a second selection module, which is used for users to manually select and determine the water supply and drainage priorities of each of the cleaning equipment.

[0040] To achieve the above objectives, the present invention further proposes a cleaning control method applied to a base station, the base station comprising a base station body and a cleaning position disposed at the bottom of the base station body, comprising:

[0041] Obtain first information about the current cleaning device located at the cleaning position, the first information including the type of the current cleaning device;

[0042] The self-cleaning mode is determined based on the first information obtained, and the current cleaning equipment is self-cleaned under the determined self-cleaning mode.

[0043] In some embodiments, the step of determining the self-cleaning mode based on the acquired first information includes:

[0044] Based on a predetermined mapping relationship between type and self-cleaning mode, determine the self-cleaning mode corresponding to the type of the current cleaning device;

[0045] Alternatively, the first information may also include the degree of dirtiness of the cleaning components of the current cleaning equipment, and the step of determining the self-cleaning mode based on the acquired first information includes:

[0046] Based on a predetermined mapping relationship between the type and degree of dirt and the self-cleaning mode, the type and degree of dirt of the current cleaning device and the corresponding self-cleaning mode are determined.

[0047] In some embodiments, the cleaning position includes a self-cleaning area, the base station further includes a water supply component and a water spray component communicating with the water supply component, the self-cleaning area of ​​the cleaning position is provided with at least one water spray hole, the water spray component includes a nozzle that is connected to each of the water spray holes, and a water control switch corresponding to each nozzle, each water control switch controlling its corresponding nozzle; the step of performing self-cleaning care on the current cleaning device in a determined self-cleaning mode includes:

[0048] Determine each water control switch and cleaning duration corresponding to the determined self-cleaning mode, and control each determined water control switch to remain open within the determined cleaning duration;

[0049] Alternatively, the cleaning position includes at least two self-cleaning zones, and the base station further includes a water supply component and a water spray component connected to the water supply component. Each self-cleaning zone of the cleaning position is provided with at least one water spray hole. The water spray component includes nozzles that are connected to each of the water spray holes, and multiple water control switches that correspond to each of the self-cleaning zones. Each water control switch controls each nozzle of its corresponding self-cleaning zone. The step of performing self-cleaning care on the current cleaning equipment in a determined self-cleaning mode includes:

[0050] Determine the water control switch and cleaning duration corresponding to the determined self-cleaning mode, and control the determined water control switch to remain open continuously within the determined cleaning duration.

[0051] In the technical solution proposed in this invention, an upper and lower water level is provided inside the base station body. This upper and lower water level can supply clean water and / or discharge sewage to at least two cleaning devices. In this way, it is not necessary to configure a base station for each cleaning device, thereby reducing the space occupied by the cleaning system and also reducing the cost of the entire cleaning system. Attached Figure Description

[0052] Figure 1 This is a schematic diagram of the base station structure of the cleaning system in the first embodiment of the present invention;

[0053] Figure 2 This is a schematic diagram of the base station structure of the cleaning system in the second embodiment of the present invention;

[0054] Figure 3 This is a schematic diagram of the base station structure of the cleaning system in the third embodiment of the present invention;

[0055] Figure 4 This is a schematic diagram of the base station structure of the cleaning system in the fourth embodiment of the present invention;

[0056] Figure 5 This is a schematic diagram of the base station structure of the cleaning system in the fifth embodiment of the present invention;

[0057] Figure 6 This is a schematic diagram of the base station structure of the cleaning system in the sixth embodiment of the present invention;

[0058] Figure 7 This is a schematic diagram of the base station structure of the cleaning system in the seventh embodiment of the present invention;

[0059] Figure 8 This is a schematic diagram of the base station structure of the cleaning system in the eighth embodiment of the present invention;

[0060] Figure 9 This is a schematic diagram of the self-cleaning device in the first embodiment of the present invention;

[0061] Figure 10 This is a schematic diagram of the self-cleaning device in the second embodiment of the present invention;

[0062] Figure 11 This is a flowchart of the cleaning control method in the first embodiment of the present invention. Detailed Implementation

[0063] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and intended to explain the present invention, and should not be construed as limiting the present invention. All other embodiments obtained by those skilled in the art based on the embodiments of the present invention without inventive effort are within the scope of protection of the present invention.

[0064] It should be noted that all directional indications (such as up, down, left, right, front, back, etc.) in the embodiments of the present invention are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indication will also change accordingly.

[0065] It should also be noted that when a component is described as "fixed to" or "set on" another component, it can be directly on the other component or there may be an intervening component present. When a component is described as "connected to" another component, it can be directly connected to the other component or there may be an intervening component present.

[0066] Furthermore, the use of terms such as "first" and "second" in this invention is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined with "first" or "second" may explicitly or implicitly include at least one of that feature. Additionally, the technical solutions of the various embodiments can be combined with each other, but only on the basis of being achievable by those skilled in the art. When the combination of technical solutions is contradictory or impossible to implement, such a combination of technical solutions should be considered non-existent and not within the scope of protection claimed by this invention.

[0067] Please see Figure 1 This invention proposes a base station for a cleaning system, comprising:

[0068] The base station body 1 has an upper and lower water level 2 inside the base station body 1. The upper and lower water level 2 is used to supply clean water to at least two cleaning devices and / or discharge sewage. The cleaning devices are active cleaning devices or passive cleaning devices.

[0069] At least one first water supply interface 3 is provided on the base station body 1 and located in the area where the upper and lower water levels 2 are located. The first water supply interface 3 is used to connect to the clean water tank of the cleaning equipment.

[0070] At least one first drainage port 4 is provided on the base station body 1 and located in the area where the upper and lower water levels 2 are located. The first drainage port 4 is used to connect to the sewage tank of the cleaning equipment.

[0071] In this embodiment, the cleaning equipment includes a clean water tank and a wastewater tank. The clean water tank contains clean water used for cleaning the floor, and the wastewater tank collects wastewater generated during floor cleaning. When the cleaning equipment is performing cleaning work, it needs to add clean water to the clean water tank and also drain the wastewater from the clean water tank to ensure that the wastewater tank has enough volume to collect the wastewater.

[0072] The base station proposed in this invention includes a base station body 1, an upper and lower water level 2, at least one first water supply interface 3, and at least one first drainage interface 4. The upper and lower water level 2 can supply clean water to at least two cleaning devices and / or discharge wastewater. The at least two cleaning devices can be all active cleaning devices, all passive cleaning devices, or a combination of both. The at least two cleaning devices can also be two different types of cleaning devices. The first water supply interface 3 is used to supply water to the clean water tank of the cleaning device, and the second water supply interface is used to drain water from the wastewater tank of the cleaning device.

[0073] The first water supply interface 3 can be directly connected to an indoor faucet via a pipe, or a clean water tank can be installed inside the base station body 1, with the first water supply interface 3 connected to the clean water tank via a pipe. The first drainage interface 4 can be directly connected to an indoor floor drain via a pipe to discharge sewage into the floor drain through the base station, or a sewage tank can be installed inside the base station body 1, with the first drainage interface 4 connected to the sewage tank via a pipe to discharge sewage into the sewage tank of the base station.

[0074] In the technical solution proposed in this invention, a water level 2 is provided inside the base station body 1. The water level 2 can supply clean water and / or discharge sewage to at least two cleaning devices. In this way, it is not necessary to configure a base station for each cleaning device, thereby reducing the space occupied by the cleaning system and also reducing the cost of the entire cleaning system.

[0075] In some embodiments, see Figure 1 The base station body 1 proposed in this invention is provided with a first water supply interface 3, which is used to connect to the clean water tank of any one of at least two cleaning devices.

[0076] In this embodiment, at least two cleaning devices share a single water supply interface for their clean water tanks. The inlets of the clean water tanks of at least two cleaning devices are compatible with the first water supply interface 3, and the inlet positions of the clean water tanks of at least two cleaning devices are identical after placement in the base station. For example, the base station may be equipped with two cleaning devices, namely a first cleaning device and a second cleaning device. The inlet of the clean water tank of the first cleaning device is compatible with the first water supply interface 3, allowing the clean water tank of the first cleaning device to be supplied with water through the first water supply interface 3. Similarly, the inlet of the clean water tank of the second cleaning device is compatible with the first water supply interface 3, allowing the clean water tank of the second cleaning device to be supplied with water through the second water supply interface.

[0077] In some embodiments, see Figure 2 The base station body 1 proposed in this invention is provided with at least two first water supply interfaces 3, and the at least two first water supply interfaces 3 correspond one-to-one with at least two cleaning devices. Each first water supply interface 3 is used to connect to the clean water tank of the corresponding cleaning device.

[0078] In this embodiment, the base station body 1 is provided with multiple different water supply interfaces, each corresponding to a cleaning device. For example, the base station body 1 is provided with three first water supply interfaces 3, namely first water supply interface 3A, first water supply interface 3B and first water supply interface 3C. The three first water supply interfaces 3 correspond to three cleaning devices, namely the first cleaning device, the second cleaning device and the third cleaning device. When the first cleaning device supplies water, it is connected to the clean water tank of the first cleaning device through the first water supply interface 3A. When the second cleaning device supplies water, it is connected to the clean water tank of the second cleaning device through the first water supply interface 3B. When the third cleaning device supplies water, it is connected to the clean water tank of the third cleaning device through the first water supply interface 3C.

[0079] In some embodiments, see Figure 3 The base station body 1 proposed in this invention is further provided with a first water supply channel 5 and a first water control switch 6. One end of the first water supply channel 5 is connected to a water source, and the other end is connected to a first water supply interface 3. The first water control switch 6 is set in the first water supply channel 5 or the first water supply interface 3 to control the opening and closing of the first water supply interface 3 and / or the flow rate of clean water flowing out of the first water supply interface 3.

[0080] In this embodiment, the first water supply interface 3 is connected to a water source through the first water supply channel 5. The water source can be clean water stored inside the base station body 1 or clean water outside the base station body 1. Those skilled in the art can design it according to the actual situation. When the base station body 1 supplies water to the cleaning equipment, the first water control switch 6 can control the opening and closing of the first water supply interface 3, and can also control the opening degree of the first water supply interface 3, that is, the flow rate of clean water flowing out of the first water supply interface 3.

[0081] In some embodiments, see Figure 3 The base station of the cleaning system proposed in this invention also includes a first water pump 7, which is installed in the base station body 1. When the first water control switch 6 is turned on, clean water is delivered to the clean water tank of the cleaning equipment through the first water pump 7.

[0082] In this embodiment, when it is necessary to supply clean water to the cleaning equipment, the first water supply interface 3 is connected to the water inlet of the clean water tank of the cleaning equipment, and then the first water control switch 6 is turned on. Then the clean water is pumped into the clean water tank of the cleaning equipment through the first water supply channel 5 by the first water pump 7.

[0083] In some embodiments, see Figure 4 The base station body 1 proposed in this invention is also provided with at least one set of cleaning agent components. The cleaning agent components include a cleaning agent bottle 8 and an infusion channel 9. One end of the infusion channel 9 is connected to the outlet of the cleaning agent bottle 8, and the other end is connected to the first water supply channel 5. The cleaning liquid in the cleaning agent bottle 8 is transported to the first water supply channel 5 through the infusion channel 9.

[0084] In this embodiment, a certain amount of cleaning agent is added to the clean water when cleaning the floor. The cleaning agent can be added directly to the water source or in the water flow path. Those skilled in the art can design according to the actual situation. Preferably, the cleaning agent proposed in this invention is delivered to the first water supply channel 5 through the infusion channel 9, so that the cleaning agent mixes with the clean water in the water path to form a cleaning solution for cleaning the floor.

[0085] In some embodiments, see Figure 4 The cleaning agent assembly proposed in this invention also includes a liquid control switch 10, which is disposed on the infusion channel 9 and is used to control the connection and disconnection between the infusion channel 9 and the first water supply channel 5.

[0086] In this embodiment, when the liquid control switch 10 is completely closed, the passage between the infusion channel 9 and the first water supply channel 5 is blocked, preventing the cleaning agent from entering the first water supply channel 5 to mix with the water and form a cleaning agent. When the liquid control switch 10 is completely open, the passage between the infusion channel 9 and the first water supply channel 5 is opened, allowing the cleaning agent to enter the first water supply channel 5 and mix with the water to form a cleaning agent. Furthermore, the liquid control switch 10 proposed in this invention can also control the opening degree of the outlet of the infusion channel 9 to control the flow rate of the cleaning agent flowing out of the outlet of the infusion channel 9. Optionally, the cleaning agent bottle 8 proposed in this invention is placed upside down inside the base station body 1, and the cleaning agent in the cleaning bottle flows into the infusion channel 9 under the action of gravity.

[0087] In some embodiments, see Figure 3 The base station body 1 proposed in this invention is provided with at least one clean water tank 20. The at least one clean water tank 20 is installed inside the base station body 1. One end of the first water supply channel 5 is connected to the water outlet of the clean water tank 20, and the other end is connected to the first water supply interface 3.

[0088] In this embodiment, a clean water tank 20 is provided inside the base station body 1. The clean water tank 20 is used to store clean water. One end of the first water supply channel 5 is connected to the clean water tank 20, and the other end is connected to the first water supply interface 3. The clean water in the clean water tank 20 inside the base station body 1 is transported to the clean water tank 20 of the cleaning equipment through the first water supply channel 5.

[0089] In some embodiments, the base station body 1 proposed in this invention is provided with a self-cleaning area, a second water supply interface 50 and a nozzle 30. The nozzle 30 is located in the self-cleaning area, and the second water supply interface 50 is connected to the nozzle 30. When the cleaning device is located in the self-cleaning area, water is sprayed towards the cleaning device through the nozzle 30 for cleaning.

[0090] In this embodiment, the cleaning equipment includes cleaning components, such as a rag, a roller, or a roller. After cleaning the floor, these components need to perform self-cleaning. Therefore, the present invention provides a self-cleaning area, a second water supply interface 50, and a nozzle 30 within the base station body 1. The nozzle 30 receives water through the second water supply interface 50 and is located within the self-cleaning area to spray water jets towards it. Specifically, when the cleaning equipment is located within the self-cleaning area, water is supplied to the nozzle 30 through the second water supply interface 50, causing the nozzle 30 to spray water towards the cleaning components of the cleaning equipment, thereby achieving the cleaning purpose of the cleaning components. It should be noted that the self-cleaning area is formed at the upper and lower positions, meaning it is part of the upper and lower water levels 2.

[0091] In some embodiments, see Figure 5 The self-cleaning area proposed in this invention includes multiple sub-cleaning areas, which are spaced apart. Each sub-cleaning area is equipped with a nozzle 30. The nozzle 30 is connected to a second water supply interface 50 through a second water supply channel 40. A second water control switch 60 is provided on the second water supply channel 40. One end of the second water supply channel 40 is connected to a water source, and the other end is connected to the nozzle 30 through the second water supply interface 50. The second water control switch 60 is located in the second water supply channel 40 or the nozzle 30 and is used to control the on / off state of the nozzle 30 and / or the flow rate of clean water flowing out of the nozzle 30.

[0092] In this embodiment, the self-cleaning area includes multiple sub-cleaning areas, which are spaced apart. Each sub-cleaning area is equipped with a nozzle 30, which is connected to the second water supply interface 50 via the second water supply channel 40. For example, there are three sub-cleaning areas and three cleaning devices. The three sub-cleaning areas are designated as the first sub-cleaning area, the second sub-cleaning area, and the third sub-cleaning area. The three cleaning devices are designated as the first cleaning device, the second cleaning device, and the third cleaning device. When the first cleaning device is located in the self-cleaning area, it performs self-cleaning through the nozzle 30 in the first sub-cleaning area. When the second cleaning device is located in the self-cleaning area, it performs self-cleaning through the nozzle 30 in the second sub-cleaning area. When the third cleaning device is located in the self-cleaning area, it performs self-cleaning through the nozzle 30 in the third sub-cleaning area.

[0093] Furthermore, a second water control switch 60 is provided at the second water supply channel 40 or the nozzle 30 to control the on / off state of the nozzle 30 and / or the flow rate of clean water from the nozzle 30. When self-cleaning of the cleaning equipment is required, the second water supply channel 40 is first opened by the second water control switch 60, and then clean water is delivered to the nozzle 30 through the second water supply channel 40 by power, so that the nozzle 30 sprays water toward the cleaning components of the cleaning equipment.

[0094] In some embodiments, see Figure 6 The second water control switch 60 proposed in this invention is a multi-way valve.

[0095] In some embodiments, see Figure 7 The base station body 1 proposed in this invention is provided with multiple third water supply channels 70, multiple third water control switches 80 and multiple nozzles 30. The multiple third water supply channels 70, multiple third water control switches 80 and multiple nozzles 30 correspond one-to-one. One end of each third water supply channel 70 is connected to a water source and the other end is connected to a nozzle 30. The third water control switch 80 is located in the third water supply channel 70 or the nozzle 30.

[0096] In this embodiment, the self-cleaning area is equipped with multiple nozzles 30, multiple third water supply channels 70, and multiple third water control switches 80. One end of each third water supply channel 70 is connected to a water source, and the other end is connected to a nozzle 30. Each nozzle 30 delivers clean water through its corresponding third water supply channel 70. Preferably, each third water supply channel 70 or each third water control switch 80 is equipped with a third water control switch 80, which controls the on / off state of the third water supply channel 70 and / or the flow rate of clean water from the nozzle 30. Furthermore, by activating different third water control switches 80, different cleaning devices can be cleaned, since different cleaning devices occupy different spray nozzles.

[0097] In some embodiments, the base station of the cleaning system proposed in this invention further includes a pressure reducing device disposed between the nozzle 30 and the water source.

[0098] In this embodiment, a pressure-reducing device is provided between the nozzle 30 and the water source to reduce water pressure impact. Furthermore, the pressure-reducing device can be internal or external; those skilled in the art can design it according to actual conditions. The internal and external placement are referenced to the base station body 1. Optionally, the pressure-reducing device proposed in this invention is specifically a pressure-reducing valve.

[0099] In some embodiments, see Figure 1 The base station body 1 proposed in this invention is provided with a first drainage interface 4, which is used to connect to the sewage tank of any one of at least two cleaning devices.

[0100] In this embodiment, at least two cleaning devices share a single drain interface for their wastewater tanks. The outlets of the wastewater tanks of at least two cleaning devices are compatible with the first drain interface 4, and the outlet positions of the wastewater tanks of at least two cleaning devices are consistent after placement in the base station. For example, the base station is equipped with two cleaning devices, namely a first cleaning device and a second cleaning device. The outlet of the wastewater tank of the first cleaning device is compatible with the first drain interface 4, allowing the wastewater tank of the first cleaning device to be supplied with water through the first drain interface 4. Similarly, the outlet of the wastewater tank of the second cleaning device is compatible with the first drain interface 4, allowing the wastewater tank of the second cleaning device to be supplied with water through the second drain interface.

[0101] In some embodiments, see Figure 2 The base station body 1 proposed in this invention is provided with at least two first drainage interfaces 4, and the at least two first drainage interfaces 4 correspond one-to-one with at least two cleaning devices. Each first drainage interface 4 is used to connect to the sewage tank of the corresponding cleaning device.

[0102] In this embodiment, the base station body 1 is provided with multiple different drainage interfaces, each corresponding to a cleaning device. For example, the base station body 1 is provided with three first drainage interfaces 4, namely first drainage interface 4A, first drainage interface 4B and first drainage interface 4C. The three first drainage interfaces 4 correspond to three cleaning devices, namely the first cleaning device, the second cleaning device and the third cleaning device. When the first cleaning device drains water, it is connected to the wastewater tank of the first cleaning device through the first drainage interface 4A. When the second cleaning device drains water, it is connected to the wastewater tank of the second cleaning device through the first drainage interface 4B. When the third cleaning device drains water, it is connected to the wastewater tank of the third cleaning device through the first drainage interface 4C.

[0103] In some embodiments, see Figure 8 The base station of the cleaning system proposed in this invention also includes a first drainage channel 90 and a fourth water control switch 10A. One end of the first drainage channel 90 is connected to the first drainage interface 4. The fourth water control switch 10A is set in the first drainage channel 90 or the first drainage interface 4 and is used to control the opening and closing of the first drainage interface 4 and / or the flow rate of sewage flowing out of the first drainage interface 4.

[0104] In this embodiment, the first drainage interface 4 discharges sewage through the first drainage channel 90. One end of the first drainage channel 90 is connected to the first drainage interface 4, and the other end is used to connect to the floor drain in the room so that the sewage collected by the cleaning equipment can be directly discharged into the floor drain. Alternatively, the other end is used to connect to the sewage tank installed in the base station body 1 so that the sewage collected by the cleaning equipment can be discharged into the sewage tank in the base station body 1.

[0105] Furthermore, a fourth water control switch 10A is provided at the first drainage channel 90 or the first drainage interface 4. The fourth water control switch 10A can control the opening and closing of the first drainage interface 4 and / or the flow rate of sewage flowing out of the first drainage interface 4.

[0106] In some embodiments, see Figure 8 The base station of the cleaning system proposed in this invention also includes a second water pump 10B, which is installed inside the base station body 1. When the fourth water control switch 10A is opened, the sewage in the sewage tank of the cleaning equipment is discharged through the second water pump 10B.

[0107] In this embodiment, when it is necessary to discharge sewage from the cleaning equipment, the first drain interface 4 is connected to the drain outlet of the sewage tank of the cleaning equipment, and then the fourth water control switch 10A is turned on. Then, the sewage is pumped into the sewage tank of the base station body 1 through the first drain channel 90 by the second water pump 10B.

[0108] In some embodiments, the base station body 1 proposed in this invention is provided with a self-cleaning area and a second drainage interface. The second drainage interface is located within the self-cleaning area, and sewage within the self-cleaning area is discharged through the second drainage interface.

[0109] In this embodiment, the base station body 1 is provided with a self-cleaning area and a second drainage interface. After the cleaning equipment cleans the ground, it needs to clean its cleaning components. When the cleaning equipment is in the self-cleaning area, the cleaning components of the cleaning equipment are cleaned by the clean water supplied by the clean water tank 20. The wastewater generated after cleaning will be discharged through the second drainage interface. The wastewater can be discharged into the wastewater tank in the base station body 1 through the second drainage interface, or it can be discharged into the floor drain in the room. Those skilled in the art can design according to the actual situation.

[0110] In some embodiments, see Figure 8 The base station of the cleaning system proposed in this invention also includes at least one sewage tank 10C, which is disposed in the base station body 1. One end of the first drainage channel 90 is connected to the inlet of the sewage tank 10C, and the other end is connected to the first drainage interface 4; and / or, the second drainage interface is connected to the sewage tank 10C through the second drainage channel.

[0111] In this embodiment, the wastewater tank 10C is used to collect wastewater from the cleaning equipment's wastewater tank 10C and wastewater generated during the cleaning equipment's self-cleaning process. The wastewater tank 10C is located inside the base station body 1. One end of the first drainage channel 90 is connected to the wastewater tank 10C, and the other end is connected to the first drainage interface 4. Wastewater collected by the cleaning equipment is discharged into the wastewater tank 10C of the base station body 1 via the first drainage interface 4 and then through the first drainage channel 90. One end of the second drainage channel is connected to the second drainage interface, and the other end is connected to the wastewater tank 10C. Wastewater generated during the cleaning equipment's self-cleaning process is discharged into the wastewater tank 10C of the base station body 1 via the second drainage interface.

[0112] In some embodiments, a detection element is provided in the upper and lower water level 2 area proposed in this invention. The detection element is used to detect whether at least two cleaning devices are located at the upper and lower water levels 2 and the device type of at least two cleaning devices.

[0113] In this embodiment, a detection device is set in the underwater water level area. The detection device can detect in real time whether there is a cleaning device that needs to be cleaned by water supply and drainage at the upper and lower water levels 2. When the cleaning device is detected to be located in the upper and lower water level 2 area, the type of the cleaning device is further detected, such as active cleaning device or passive cleaning device.

[0114] In some embodiments, the base station body 1 proposed in this invention is provided with a first selection module, which is used for users to manually select and determine the water supply and drainage priorities of each cleaning device.

[0115] In this embodiment, a first selection module is provided on the base station body 1. Users can manually select and determine the water supply and drainage priorities of each cleaning device on the base station body 1 through this first selection module. For example, if there are three cleaning devices: a first cleaning device, a second cleaning device, and a third cleaning device, when the user selects the second cleaning device for water supply and drainage maintenance, the base station body 1 will send a corresponding instruction to the second cleaning device. Upon receiving the instruction, the second cleaning device will move to the water supply and drainage area to perform the maintenance. If the first cleaning device is already in the water supply and drainage area before the user selects the second cleaning device for water supply and drainage maintenance, when the user selects and determines to perform the maintenance on the second cleaning device, the base station body 1 will first send an instruction to the first cleaning device to move it out of the water supply and drainage area, and then send another instruction to the second cleaning device to move it to the water supply and drainage area.

[0116] The present invention further proposes a cleaning system including a base station, the specific structure of which is as described in the above embodiments. Since the cleaning system adopts all the technical solutions of all the above embodiments, it has at least all the technical effects brought about by the technical solutions of the above embodiments, which will not be described in detail here.

[0117] In some embodiments, the clean water tank 20 of the cleaning device proposed in this invention is provided with a first water level sensor for detecting the water level in the clean water tank 20 of the cleaning device. When the water level in the clean water tank 20 of the cleaning device is lower than a preset value, water is added to the cleaning device at the upper and lower water levels 2. When the water level in the clean water tank 20 of the cleaning device is higher than the preset value, water addition is stopped.

[0118] In some embodiments, a second water level sensor is provided in the wastewater tank 10C of the cleaning equipment to detect the water level in the wastewater tank 10C of the cleaning equipment. When the water level in the wastewater tank 10C of the cleaning equipment is higher than a preset value, the cleaning equipment drains water at the upper and lower water levels 2. The drainage stops when the water in the wastewater tank 10C of the cleaning equipment is emptied.

[0119] In some embodiments, the wastewater tank 10C of the cleaning equipment proposed in this invention is provided with a wastewater detection sensor for detecting the degree of dirtiness of the wastewater in the wastewater tank 10C of the cleaning equipment.

[0120] In some embodiments, the cleaning equipment proposed in this invention is provided with a second selection module, which is used for users to manually select and determine the water supply and drainage priorities of each cleaning device.

[0121] In this embodiment, a second selection module is provided on the cleaning equipment. Users can manually select and determine the water supply and drainage priorities of each cleaning device through this module. For example, if there are three cleaning devices—a first cleaning device, a second cleaning device, and a third cleaning device—when the user selects the second cleaning device for water supply and drainage maintenance, the cleaning device will move to the water supply and drainage area to perform the maintenance. If the first cleaning device is already in the water supply and drainage area before the user selects the second cleaning device for water supply and drainage maintenance, the second cleaning device will first send a command to the first cleaning device or the base station 1 to cause the first cleaning device to move out of the water supply and drainage area. After the first cleaning device moves out, the second cleaning device will move to the water supply and drainage area.

[0122] The present invention further proposes a self-cleaning device, please refer to [link / reference]. Figure 9-10The system includes a first tray 100, which has at least two cleaning structures adapted to the self-cleaning of cleaning components in different types of cleaning equipment. These at least two cleaning structures include a first cleaning structure Q adapted to the self-cleaning of cleaning components in a first cleaning device, and a second cleaning structure G adapted to the self-cleaning of cleaning components in a second cleaning device; that is, the first cleaning structure Q is used for self-cleaning of cleaning components in the first cleaning device, and the second cleaning structure G is used for self-cleaning of cleaning components in the second cleaning device. In this embodiment, the first tray 100 is shown with only the first cleaning structure Q and the second cleaning structure G as an example; of course, in other embodiments, the first tray 100 may have more cleaning structures.

[0123] In this embodiment, the first cleaning device and the second cleaning device are two different types of cleaning devices; for example, the first cleaning device can be a cleaning robot and any autonomous cleaning device, and the second cleaning device can be a handheld device and any cleaning device with a handle, including steam mops, floor scrubbers, vacuum cleaners, mops and brooms; or, for example, the first cleaning device includes handheld devices and any cleaning device with a handle, including steam mops, floor scrubbers, vacuum cleaners, mops and brooms, and the second cleaning device includes cleaning robots and any autonomous cleaning device.

[0124] The self-cleaning device of this embodiment features multiple (two or more) cleaning structures on the first tray 100. Each cleaning structure is adapted to the self-cleaning of cleaning components from different types of cleaning equipment. The base station equipped with this self-cleaning device is compatible with the self-cleaning of cleaning components from various types of cleaning equipment. When a user has multiple cleaning devices installed indoors, only one base station equipped with this self-cleaning device is needed to meet the self-cleaning requirements of all the devices. Therefore, when a user has both a cleaning robot and a handheld cleaning device installed indoors, only one base station equipped with this self-cleaning device is required. The base station, through the first cleaning structure Q and the second cleaning structure G on the first tray 100 of the self-cleaning device, satisfies the self-cleaning requirements of both the cleaning robot and the handheld cleaning device, reducing the number of base stations required indoors, lowering the overall cost of the cleaning system (including the base station and the various cleaning devices), and reducing the space occupied by the base station indoors.

[0125] In some embodiments, the first tray 100 includes a self-cleaning area S, and at least two cleaning structures are disposed in the self-cleaning area S. See also Figure 9The figure shows a scenario where two cleaning structures are housed in a single self-cleaning area S. Of course, this figure only illustrates two cleaning structures in one self-cleaning area S; in other embodiments, even more cleaning structures can be housed in one self-cleaning area S. This embodiment, by placing multiple cleaning structures in the same self-cleaning area S, significantly reduces the size of the first tray 100, reduces the space occupied by the self-cleaning device on the base station, and further reduces the overall size of the base station, thereby achieving the effect of further reducing the base station's footprint in indoor space.

[0126] In some embodiments, the first tray 100 includes at least two self-cleaning areas S, each self-cleaning area S having a cleaning structure. See also... Figure 10 The figure shows two cleaning structures located in two self-cleaning areas S. Of course, this figure only shows two self-cleaning areas S as an example; in other embodiments, there can be more self-cleaning areas S. This embodiment ensures that the various cleaning structures do not interfere with each other by setting them in their respective self-cleaning areas S, allowing each cleaning structure to provide the optimal self-cleaning effect for the corresponding cleaning equipment components.

[0127] In some embodiments, each self-cleaning zone S of the first tray 100 is provided with at least one water spray hole for water supply. When the self-cleaning device is installed on a base station, the base station supplies water to each self-cleaning zone S through the water spray hole of each self-cleaning zone S, so as to supply water for the cleaning components of the cleaning device to self-clean in the self-cleaning zone S.

[0128] See Figure 9 In this embodiment, the first tray 100 includes only one self-cleaning area S, and both the first cleaning structure Q and the second cleaning structure G are located in this self-cleaning area S. The first cleaning structure Q includes a protrusion 01 and a groove 02, with the groove 02 partially surrounding the protrusion 01, and the protrusion 01 having several protrusions D. The second cleaning structure G extends from one side of the first cleaning structure Q to the other side, and is located within the first cleaning structure Q. When a cleaning component (e.g., a mop) of the cleaning device self-cleans on the first cleaning structure Q, the protrusions D on the protrusion 01 scrape the dirt and debris on the cleaning component, causing it to fall into the groove 02 more quickly, resulting in faster and better self-cleaning. The second cleaning structure G extends from one side of the first cleaning structure Q to the other side and is used for self-cleaning of longer cleaning components (e.g., a roller brush).

[0129] See Figure 10In this embodiment, the first tray 100 includes two self-cleaning areas S. One self-cleaning area S is provided with a first cleaning structure Q, and the other self-cleaning area S is provided with a second cleaning structure G. The first cleaning structure Q includes a protrusion 01 and a groove 02. The groove 02 is partially surrounding the protrusion 01, and the protrusion 01 has several raised dots D. When a cleaning component (e.g., a mop) of the cleaning device self-cleans on the first cleaning structure Q, the raised dots D on the protrusion 01 scrape away dirt and debris from the cleaning component, causing it to fall into the groove 02 more quickly, resulting in faster and more effective self-cleaning. The second cleaning structure G is arranged adjacent to the first cleaning structure Q, maintaining the compactness of the structural design of the first tray 100 and preventing the first tray 100 from becoming too large.

[0130] Furthermore, in some embodiments, the first cleaning device is a cleaning robot, and the first cleaning structure Q includes a first sub-cleaning structure Q1 and a second sub-cleaning structure Q2 arranged side by side. Both the first sub-cleaning structure Q1 and the second sub-cleaning structure Q2 include a protrusion O1 and a groove O2. The first sub-cleaning structure Q1 and the second cleaning structure Q2 respectively correspond to the self-cleaning of two side-by-side cleaning components (e.g., mops) of the cleaning robot. The second cleaning device is a handheld cleaning device, and the second cleaning structure G includes a second rinsing groove for accommodating the roller brush of the second cleaning device.

[0131] In some embodiments, the self-cleaning device further includes a second tray, with a first tray 100 disposed within the second tray. A water collection chamber is provided between the first tray 100 and the second tray. The first tray 100 has a drain hole K communicating with the water collection chamber, and the second tray has a drain hole communicating with the water collection chamber. During self-cleaning, wastewater generated during cleaning on the first tray 100 falls into the water collection chamber through the drain hole K, preventing secondary contamination of the cleaning component by used wastewater during the self-cleaning process. This allows for faster self-cleaning, thereby improving self-cleaning efficiency and reducing water consumption. Water accumulated in the water collection chamber can be simultaneously recycled to the wastewater tank 10C of the base station through the drain hole during the self-cleaning process, or recycled to the wastewater tank 10C of the base station through the drain hole after self-cleaning is completed.

[0132] In some embodiments, the first tray 100 and the second tray are detachably connected. This detachable connection makes it easier to assemble and disassemble the first tray 100 and the second tray, so as to regularly clean the garbage or pollutants accumulated in the first tray 100 and the water collection chamber. Furthermore, if the first tray 100 or the second tray is damaged or broken, a new first tray 100 or a new second tray can be replaced separately, reducing replacement costs.

[0133] In some embodiments, the first tray 100 and the second tray can also be integrally formed, reducing the number of parts of the self-cleaning device, facilitating the installation of the self-cleaning device during base station production, and improving installation efficiency.

[0134] Please see Figure 11 The present invention further proposes a cleaning control method applied to a base station, the base station including a base station body 1 and a cleaning position disposed at the bottom of the base station body 1, characterized in that it includes:

[0135] Step S10: Obtain first information of the current cleaning device located at the cleaning position, the first information including the type of the current cleaning device;

[0136] When a cleaning device is detected in a cleaning station, for example by a presence detection device installed in the cleaning station, first information about the current cleaning device in the cleaning station is obtained. This first information includes the type of the current cleaning device. The current cleaning device in the cleaning station can be a first cleaning device that enters the cleaning station from a side entrance or exit, or a second cleaning device that enters the cleaning station from a receiving slot. The type of cleaning device includes at least cleaning robots and handheld cleaning devices. The first information can also be identified by the presence detection device installed in the cleaning station. This presence detection device can be a sensor assembly, for example, a sensor assembly including a first sensor to detect whether a cleaning device is in the cleaning station and a second sensor to detect the type of cleaning device in the cleaning station.

[0137] Step S20: Determine the self-cleaning mode based on the first information obtained, and perform self-cleaning care on the current cleaning equipment in the determined self-cleaning mode.

[0138] After obtaining the first information of the current cleaning equipment, the base station determines the self-cleaning mode corresponding to the first information, and then performs self-cleaning maintenance on the current cleaning equipment according to the determined self-cleaning mode. The self-cleaning mode may include at least one parameter information such as water control switch information, cleaning time, and water supply flow rate; different types of cleaning equipment correspond to different self-cleaning modes, and different self-cleaning modes include different parameter information.

[0139] The self-cleaning method of this embodiment obtains first information about the current cleaning device located in the cleaning position, determines the corresponding self-cleaning mode based on the first information, and performs self-cleaning care on the current cleaning device. This enables the corresponding self-cleaning mode to be used for different cleaning devices, making it more intelligently applicable to the care of various cleaning devices.

[0140] In some embodiments, the step of determining a self-cleaning mode based on the acquired first information includes:

[0141] Based on the predetermined mapping relationship between type and self-cleaning mode, determine the self-cleaning mode corresponding to the current type of cleaning equipment.

[0142] The base station stores a mapping table between types and self-cleaning modes. After obtaining the type of the current cleaning device located in the cleaning position, the self-cleaning mode corresponding to the type of the current cleaning device can be determined through this mapping table.

[0143] In some embodiments, the first information further includes the degree of dirtiness of the cleaning components of the current cleaning device, and the step of determining the self-cleaning mode based on the acquired first information includes:

[0144] Based on the predetermined type and the mapping relationship between the degree of dirt and the self-cleaning mode, determine the type of cleaning equipment and the self-cleaning mode corresponding to the degree of dirt.

[0145] The degree of dirtiness (i.e., cleanliness) of the cleaning components of the current cleaning equipment can be obtained from the dirtiness information fed back by the equipment's self-test (e.g., sensors on the equipment that detect the degree of dirtiness), or from the dirtiness detection sensors or cleanliness detection sensors installed in the cleaning position. The base station stores a mapping table between the type and degree of dirtiness and the self-cleaning mode. That is, a combination of type and degree of dirtiness corresponds to a self-cleaning mode. After obtaining the type and degree of dirtiness of the current cleaning equipment located in the cleaning position, the corresponding self-cleaning mode can be determined through this mapping table.

[0146] In some embodiments, the cleaning position includes a self-cleaning area, and the base station further includes a water supply component and a water spray component connected to the water supply component. The self-cleaning area of ​​the cleaning position is provided with at least one water spray hole. The water spray component includes a nozzle 30 that is connected to each of the water spray holes, and a water control switch corresponding to each nozzle 30. Each water control switch controls its corresponding nozzle 30. The steps of performing self-cleaning care on the current cleaning equipment in a determined self-cleaning mode include:

[0147] The system determines the water control switches and cleaning duration corresponding to the defined self-cleaning mode, and controls the water control switches to remain open within the defined cleaning duration.

[0148] Alternatively, the cleaning station includes at least two self-cleaning zones, and the base station also includes a water supply component and a water spray component connected to the water supply component. Each self-cleaning zone of the cleaning station is provided with at least one water spray hole. The water spray component includes a nozzle 30 that is connected to each water spray hole, and multiple water control switches that correspond to each self-cleaning zone. Each water control switch controls each nozzle 30 of its corresponding self-cleaning zone. The steps for performing self-cleaning maintenance on the current cleaning equipment in a defined self-cleaning mode include:

[0149] The water control switch and cleaning duration corresponding to the determined self-cleaning mode are determined, and the determined water control switch is kept open continuously within the determined cleaning duration.

[0150] Different self-cleaning modes contain different parameter information, including water control switch information and cleaning duration information. From the parameter information contained in the determined self-cleaning mode, the water control switches that need to be turned on and the opening duration of the water control switches (i.e., cleaning duration) are determined, and the determined water control switches are controlled to remain open continuously within the determined cleaning duration.

[0151] Of course, in other embodiments, the self-cleaning care of the current cleaning device using a defined self-cleaning mode can also be other cleaning methods.

[0152] The above are only some or preferred embodiments of the present invention. Neither the text nor the drawings should limit the scope of protection of the present invention. All equivalent structural transformations made using the content of the present invention's specification and drawings under the overall concept of the present invention, or direct / indirect applications in other related technical fields, are included within the scope of protection of the present invention.

Claims

1. A base station of a cleaning system, characterized in that, include: The base station body has an upper and lower water level, which is used to supply clean water to at least two cleaning devices and / or discharge sewage. The cleaning devices are active cleaning devices or passive cleaning devices. At least one first water supply interface is provided on the base station body and located in the area where the upper and lower water levels are located. The first water supply interface is used to connect to the clean water tank of the cleaning equipment. At least one first drainage port is provided on the base station body and located in the area where the upper and lower water levels are located. The first drainage port is used to communicate with the sewage tank of the cleaning equipment. The self-cleaning device includes a first tray with at least two cleaning structures. The first tray includes at least one self-cleaning area, and the at least two cleaning structures are all located in the self-cleaning area. Each of the cleaning structures is adapted to the self-cleaning of cleaning components of different types of cleaning equipment.

2. The base station according to claim 1, characterized in that, The base station body is also provided with a first water supply channel and a first water control switch. One end of the first water supply channel is connected to a water source, and the other end is connected to the first water supply interface. The first water control switch is set in the first water supply channel or the first water supply interface to control the opening and closing of the first water supply interface and / or the flow rate of clean water flowing out of the first water supply interface.

3. The base station according to claim 1, characterized in that, The base station body is also provided with at least one cleaning agent assembly. The cleaning agent assembly includes a cleaning agent bottle and an infusion channel. One end of the infusion channel is connected to the outlet of the cleaning agent bottle, and the other end is connected to a first water supply channel. The cleaning liquid in the cleaning agent bottle is delivered to the first water supply channel through the infusion channel.

4. The base station according to claim 1, characterized in that, The base station body is equipped with a second water supply interface and a nozzle. The nozzle is located in the self-cleaning area. The second water supply interface is connected to the nozzle. When the cleaning device is located in the self-cleaning area, water is sprayed towards the cleaning device through the nozzle for cleaning.

5. The base station according to claim 1, characterized in that, It also includes a first drainage channel and a fourth water control switch. One end of the first drainage channel is connected to the first drainage interface. The fourth water control switch is installed in the first drainage channel or the first drainage interface and is used to control the opening and closing of the first drainage interface and / or the flow rate of sewage flowing out of the first drainage interface.

6. The base station according to claim 1, characterized in that, The base station body is provided with a second drainage interface, which is located in the self-cleaning area, and the sewage in the self-cleaning area is discharged through the second drainage interface.

7. A cleaning system, characterized in that, Includes cleaning equipment and a base station as described in any one of claims 1-6.

8. A cleaning control method applied to a base station, the base station comprising a base station body and a cleaning position disposed at the bottom end of the base station body, characterized in that, include: Obtain first information about the current cleaning device located at the cleaning position, the first information including the type of the current cleaning device; The self-cleaning mode is determined based on the first information obtained, and the current cleaning equipment is self-cleaned and maintained in the determined self-cleaning mode. The cleaning position includes at least two self-cleaning areas. The base station also includes a first tray, a water supply component, and a water spray component connected to the water supply component. The first tray is provided with at least two cleaning structures, which are all located in the self-cleaning areas. Each cleaning structure is adapted to the self-cleaning of cleaning components of different types of cleaning equipment. Each self-cleaning area of ​​the cleaning position is provided with at least one water spray hole. The water spray component includes nozzles that are connected to each of the water spray holes, and multiple water control switches that correspond to each of the self-cleaning areas. Each water control switch controls each nozzle in its corresponding self-cleaning area. The steps of performing self-cleaning care on the current cleaning equipment in a defined self-cleaning mode include: Determine the water control switch and cleaning duration corresponding to the determined self-cleaning mode, and control the determined water control switch to remain open continuously within the determined cleaning duration.

9. The cleaning control method according to claim 8, characterized in that, The step of determining the self-cleaning mode based on the acquired first information includes: Based on a predetermined mapping relationship between type and self-cleaning mode, determine the self-cleaning mode corresponding to the type of the current cleaning device; Alternatively, the first information may also include the degree of dirtiness of the cleaning components of the current cleaning equipment, and the step of determining the self-cleaning mode based on the acquired first information includes: Based on a predetermined mapping relationship between the type and degree of dirt and the self-cleaning mode, the type and degree of dirt of the current cleaning device and the corresponding self-cleaning mode are determined.

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