Pattern exposure apparatus and pattern exposure method

Abstract

A pattern exposure apparatus having a drawing unit that draws a pattern on a substrate has: a first light source device that emits a first light beam; a second light source device that emits a second light beam; a light beam combining section that combines the first light beam from the first light source device and the second light beam from the second light source device in a manner so as to be incident on the drawing unit; a light beam shape deformation section that deforms the cross-sectional shape of each of the first light beam and the second light beam incident on the light beam combining section in a manner so as to be different from each other; and a control device that controls in a manner so as to draw at least an edge portion of the pattern drawn on the substrate using either one or both of the first point light and the second point light.

Description

Technical Field

[0001] The present invention relates to a pattern exposure apparatus and a pattern exposure method for exposing patterns of electronic devices, etc., on a substrate using a drawing beam whose intensity is modulated according to drawing data. Background Technology

[0002] Conventionally, in the process of manufacturing micro-electronic devices on a substrate, photolithography is performed. This photolithography process includes: an exposure step, in which an exposure beam (light beam, electron beam, etc.) corresponding to the pattern of the electronic device (a pattern specifying the shape of wiring layers, electrode layers, semiconductor layers, insulating layers, etc.) is irradiated onto a resist layer on the substrate, which serves as a photosensitive layer; and a development step, in which the exposed substrate is developed, and the pattern appears through the residual film portion and the removal portion of the resist layer. As an exposure apparatus used in this exposure step, a maskless method is known that dynamically modulates the intensity of the exposure beam based on drawing data (CAD data) corresponding to the pattern to be exposed. As one maskless method, a point scanning method drawing apparatus, such as a laser beam printer, is known that uses a rotating multifaceted mirror to scan point light whose intensity is modulated in response to the drawing data at high speed. In dot scanning, the intensity of tiny circular dots projected onto the surface of the photosensitive substrate is switched on / off based on digital drawing data (binary information in bitmap form). Therefore, when tiny oblique lines (edges tilted relative to the scanning direction of the dots) are drawn, stepped jagged edges are easily produced at the edges of the oblique line pattern formed by the resist layer after development.

[0003] To reduce such jagged edges, laser beam printers, for example, as disclosed in Japanese Patent Application Publication No. 5-232414, have known laser recording apparatuses that transmit a beam from a semiconductor laser, modulated according to an image signal (description data), through a variable aperture element composed of an optical micro-shutter array made of electro-optic crystal, to a rotating polygon mirror. The beam reflected by the rotating polygon mirror is then imaged as a point on a photosensitive substrate via an imaging lens (fθ lens) or the like. This variable aperture element is configured to change the aperture amount and aperture position by utilizing electro-optic modulation (polarization switching), thereby changing the size and center position of the beam. Thus, in Japanese Patent Application Publication No. 5-232414, the beam diameter (dot diameter) in the sub-scanning direction on the photosensitive substrate surface is variable, allowing multiple gray levels to be set within a single point. Furthermore, the center position of the beam is variable in the sub-scanning direction, thereby changing the recording spacing of the points in the sub-scanning direction, resulting in image output with reduced jagged edges.

[0004] When using a variable aperture element, as described in Japanese Patent Application Publication No. 5-232414, a portion of the beam cross-section is inevitably blocked, reducing the light intensity at points on the photoreceptor surface. Therefore, in Japanese Patent Application Publication No. 5-232414, a photoelectric negative feedback loop is established to control the drive current of the semiconductor laser by monitoring a portion of the light output from the semiconductor laser through a light-receiving element, making the received signal equal to the emission level command signal, thus correcting for light intensity fluctuations (reduction). However, when the light output from the semiconductor laser is initially set relatively high to minimize the time required to output an image to the photoreceptor, there is a limit to the increase in the semiconductor laser's light output corresponding to the amount of light intensity loss caused by the variable aperture element. Furthermore, in Japanese Patent Application Publication No. 5-232414, to reduce jagged edges, the dots projected onto the photoreceptor are kept circular, dots of different diameters are connected, and adjacent dots are not necessarily connected to each other. Therefore, in methods such as Japanese Patent Application Publication No. 5-232414, where the diameter of the dots is different, there is a concern that when forming fine electronic patterns, especially wiring patterns with thin line widths, a portion of the pattern may be broken. Summary of the Invention

[0005] A first aspect of the present invention is a pattern exposure apparatus comprising a drawing unit that scans a spot light formed by a light beam supplied from a light source device along a main scanning direction to draw a pattern on a substrate. The pattern exposure apparatus comprises: a first light source device emitting a first light beam; a second light source device emitting a second light beam; a beam combining unit that combines the first light beam from the first light source device and the second light beam from the second light source device such that they are respectively incident on the drawing unit; a beam shape deformation unit that makes the cross-sectional shapes of the first light beam and the second light beam incident on the beam combining unit different from each other, such that the shape of the first spot light formed by the first light beam projected onto the substrate is different from the shape of the second spot light formed by the second light beam; and a control device that controls the drawing of at least the edge portion of the pattern drawn on the substrate using either or both of the first spot light and the second spot light.

[0006] A second aspect of the present invention is a pattern exposure apparatus having a drawing unit that scans point light formed by a light beam supplied from a light source device along a main scanning direction to draw a pattern on a substrate. The pattern exposure apparatus includes: a light splitting section that splits a light beam with a circular cross-sectional shape emitted from the light source device into a first light beam and a second light beam; and a first light beam shape deformation section disposed in the optical path of the first light beam to deform the cross-sectional shape of the first light beam from a circle, so that the shape of a first point light generated on the substrate by the projection of the first light beam becomes a first shape; the second aspect... A beam shape deformation section is disposed in the optical path of the second beam, which deforms the cross-sectional shape of the second beam from a circle, so that the shape of the second point light generated on the substrate by the projection of the second beam becomes a second shape different from the first shape; a beam combining section combines the first beam from the first beam shape deformation section and the second beam from the second beam shape deformation section in such a way that they are incident on the drawing unit; and a control device controls the drawing of a pattern on the substrate using either the first point light or the second point light.

[0007] The third aspect of the present invention is a pattern exposure method that uses a drawing unit to draw a pattern on the substrate by scanning a spot light formed by a light beam supplied from a light source device along a main scanning direction based on pixel information of each pixel specified in drawing data. When the column of pixels scanned along the main scanning direction includes edge pixels that form the edge portion of a pattern that extends obliquely to the main scanning direction, the shape of the spot light projected onto the edge pixels is set to at least a groove or an elongated ellipse with the major axis inclined in the direction of the oblique extension of the pattern.

[0008] A fourth aspect of the present invention is a pattern exposure apparatus having a drawing unit that scans a spot light formed by a light beam supplied from a light source device along a main scanning direction to draw a pattern on a substrate. The pattern exposure apparatus has a beam shape deformation section, to which the light beam from the light source device is incident. The beam shape deformation section guides the beam, after deforming the cross-sectional shape of the beam, to the drawing unit. The beam shape deformation section deforms the cross-sectional shape of the beam from a circle to a non-circular shape. Attached Figure Description

[0009] Figure 1 This is a perspective view showing the general overall structure of the pattern exposure apparatus of the first embodiment.

[0010] Figure 2 It is shown Figure 1A perspective view of the schematic internal structure of MU1, a representative of the four depiction units MU1 to MU4 shown.

[0011] Figure 3A , Figure 3B It is an exaggerated way of showing through Figure 2 The diagram shows the state of the three beams B1a, B1b, and B1c of the beam expander BEX within the depiction unit MU1.

[0012] Figure 4 It is shown Figure 1 A schematic diagram of the light source devices LS1A, LS1B, LS1C and the beam combining unit BD1A.

[0013] Figures 5A-5C It is shown schematically. Figure 4 A diagram showing the arrangement of optical components within the beam shape deformation section 10B (or 10C).

[0014] Figure 6 It is shown schematically. Figure 1 A three-dimensional view of the configuration of the optical components and the optical path in the beam switching unit BD1B shown.

[0015] Figure 7A , Figure 7B It exaggerates the incident light onto... Figure 6 The diagram shows the state of the diffracted beams of the three beams LB1a, LB1b, and LB1c of the primary acousto-optic modulation element AM3, directed toward the branches of the corresponding depicting unit MU3.

[0016] Figure 8 This is a perspective view showing the states of beams Bna, Bnb, and Bnc incident from beam switching units BD1B and BD2B onto drawing units MU1 to MU4, respectively.

[0017] Figure 9A An example of line and spatial patterns PT1, PT2, PT3 exposed on a sheet substrate P is shown. Figure 9B This shows an example of a pixel map (bitmap) on the depiction data of a magnified portion of the pattern.

[0018] Figure 10 It is an explanation and description Figure 9A , Figure 9B A diagram showing the action of a portion of the diagonal pattern in pattern PT2.

[0019] Figure 11 It is an explanation used for depiction Figure 9B The diagram shown is a portion of the depiction data of the bitmap information corresponding to the pixel columns (data columns) AL1 and AL2, respectively.

[0020] Figure 12A This is a diagram showing the optical path within the beam switching section BD1B (BD2B) of Modified Example 1. Figure 12B It shows through Figure 12A The diagram shows the configuration of point lights SPa, SPb, and SPc projected onto the sheet substrate P.

[0021] Figure 13 It is shown schematically. Figures 5A-5C A diagram showing the structure of a modified example of the beam compression system OM2.

[0022] Figure 14 It is shown Figure 4 A diagram showing the structure of the second embodiment of the beam combining section BD1A (BD2A) shown.

[0023] Figure 15 This indicates that it was used. Figure 14 Beam combining section BD1A, Figure 6 The diagram shows an example of the drawing operation of the beam switching unit BD1B and the drawing unit MU3 (or MU1).

[0024] Figure 16 This is a diagram illustrating an example of a special exposure technique that increases the exposure of the peripheral edges of multiple rectangular patterns arranged in a matrix.

[0025] Figure 17 This is a diagram showing the schematic structure of the beam combining section in Modified Example 4, which uses only two light source devices.

[0026] Figures 18A to 18D Is using Figure 17 The structure schematically illustrates the combination of the long axis directions of point lights SPb and SPc, which are switched according to the directionality of the edge of the pattern.

[0027] Figure 19 This is a schematic diagram illustrating a modified example of an optical structure that uses a beam LBe from a single light source LSe to create two slotted (elongated elliptical) point lights SPb and SPc.

[0028] Figure 20 This is a schematic diagram showing a modified example of the structure of a light source device and a beam combining section BD1A (BD2A) including beam shape deformation sections 10B and 10C. Detailed Implementation

[0029] Regarding the pattern exposure apparatus and method of the present invention, preferred embodiments are disclosed, with reference to the accompanying drawings. Figure 1The following is a detailed description. Furthermore, the present invention is not limited to these embodiments, and includes various modifications or alterations. That is, the structural elements described below include elements readily conceived by those skilled in the art, substantially the same elements, and the structural elements described below can be appropriately combined. Additionally, various omissions, substitutions, or changes to structural elements can be made without departing from the spirit of the present invention.

[0030] Example 1

[0031] Figure 1 This is a perspective view showing the general overall structure of the pattern exposure apparatus of the first embodiment. Figure 1 As shown, the pattern exposure apparatus of this embodiment exposes various patterns corresponding to electronic devices (display devices, wiring devices, sensor devices, etc.) in a maskless manner by scanning a photosensitive layer (resist layer) coated on a flexible, elongated sheet substrate P (hereinafter also simply referred to as substrate P). Such pattern exposure apparatuses are disclosed, for example, in International Publication Nos. 2015 / 152218, 2015 / 166910, 2016 / 152758, and 2017 / 057415.

[0032] like Figure 1 As shown, the pattern exposure apparatus EX of this embodiment is installed on the ground in a location (such as a factory) parallel to the XY plane of a vertical coordinate system XYZ with the direction of gravity as the Z-axis. The exposure apparatus EX includes: a rotating cylinder DR, which stably supports a sheet substrate P and transports it along its length at a constant speed; four drawing units MU1 to MU4, which draw patterns on the photosensitive layer of the sheet substrate P; and three light source devices LS1A, LS1B, and LS1C (hereinafter collectively referred to as light source device LS1), which supply drawing beams B1 and B3 to the odd-numbered drawing units MU1 and MU3, respectively. Figure 1 (Not shown in the figure); three light source devices LS2A, LS2B, and LS2C (collectively referred to as light source device LS2 in the general sense), which are used to supply drawing beams B2 and B4 (in the even-numbered drawing units MU2 and MU4) for drawing, respectively. Figure 1 (Not shown in the figure); beam combining units BD1A and BD2A; and beam switching units BD1B and BD2B.

[0033] The beam combining unit BD1A combines the beams from each of the light source devices LS1A, LS1B, and LS1C under prescribed conditions (described in detail later) and sends them to the beam switching unit BD1B. For the beams from each of the light source devices LS1B and LS1C, the cross-sectional shape is transformed from a circle to a slot shape (elongated ellipse). Similarly, the beam combining unit BD2A combines the beams from each of the light source devices LS2A, LS2B, and LS2C under prescribed conditions (described in detail later) and sends them to the beam switching unit BD2B. For the beams from each of the light source devices LS2B and LS2C, the cross-sectional shape is transformed from a circle to a slot shape (elongated ellipse). However, the cross-sectional shape of the beams from each of the light source devices LS1A and LS2A remains approximately circular. The light source devices LS1 and LS2 are fiber amplifier laser light sources disclosed, for example, in International Publication No. 2015 / 166910 and International Publication No. 2017 / 057415. Based on the depicted data (pixel bit data represented by the two values ​​"0" and "1"), they cause an ultraviolet beam with a center wavelength below 400 nm to pulse oscillate at hundreds of MHz (e.g., 400 MHz).

[0034] The beam switching unit BD1B has a primary acousto-optic modulation element and a second-stage acousto-optic modulation element arranged to allow the three synthesized beams to pass through in series simultaneously or not simultaneously. The beam deflected by the primary acousto-optic modulation element is sent to the odd-numbered drawing unit MU3, and the beam deflected by the second-stage acousto-optic modulation element is sent to the odd-numbered drawing unit MU1. Similarly, the beam switching unit BD2B has a primary acousto-optic modulation element and a second-stage acousto-optic modulation element arranged to allow the three synthesized beams to pass through in series simultaneously or not simultaneously. The beam deflected by the primary acousto-optic modulation element is sent to the even-numbered drawing unit MU4, and the beam deflected by the second-stage acousto-optic modulation element is sent to the even-numbered drawing unit MU2.

[0035] The rotating cylinder DR has: a cylindrical outer peripheral surface with a certain radius extending from the rotation center line AXo, which is parallel to the Y-axis of the XY plane; and a shaft Sft, which protrudes coaxially with the rotation center line AXo towards both ends of the rotating cylinder DR in the Y direction. A sheet substrate P is tightly supported along the outer peripheral surface of approximately half a circumference of the rotating cylinder DR in the longitudinal direction, and is conveyed at a constant speed in the longitudinal direction by the constant speed rotation of the rotating cylinder DR caused by the rotational torque from a rotational drive motor (not shown). It should be noted that the substrate P is made of resin materials such as PET (polyethylene terephthalate) film, PEN (polyethylene naphthalate) film, and polyimide film. Alternatively, it can be, for example, an extremely thin sheet of flexible glass material with a thickness of less than 100 μm, a thin sheet of metal material such as stainless steel formed by rolling, or paper containing cellulose nanofibers.

[0036] Multiple drawing units MU1 to MU4 are arranged in the space above the rotating cylinder DR along the Y direction. However, each of the odd-numbered drawing units MU1 and MU3 and each of the even-numbered drawing units MU2 and MU4 are symmetrically arranged with respect to a central plane parallel to the YZ plane and containing the rotation center line AXo when viewed in the XZ plane. The odd-numbered drawing units MU1 and MU3 are respectively configured such that beams B1 and B3 projected onto the sheet substrate P (beam B3 in...) Figure 1 The extension of the center line (not shown in the figure) is directed toward the rotation center line AXo, and when viewed in the XZ plane, it is tilted counterclockwise by a certain angle (θu) from the center plane. Similarly, the even-numbered drawing units MU2 and MU4 are configured as follows: beams B2 and B4 projected onto the sheet substrate P (beam B4 in...) Figure 1 The extension of the center line (not shown in the figure) is directed toward the rotation center line AXo, and when viewed in the XZ plane, it is tilted clockwise at a certain angle (θu) from the center line.

[0037] The drawing units MU1 to MU4, as disclosed in International Publication Nos. 2016 / 152758 and 2019 / 082850, respectively, include multiple mirrors, multiple lenses, a rotating polyhedron PM, and a telecentric fθ lens system FT. The extensions of the center lines of the beams B1 and B3 emitted from the beam switching unit BD1B and incident on the corresponding odd-numbered drawing units MU1 and MU3, and the extensions of the center lines of the beams B2 and B4 emitted from the beam switching unit BD2B and incident on the corresponding even-numbered drawing units MU2 and MU4, are set to intersect the rotation center line AXo of the rotating cylinder DR. Furthermore, by rotating the rotating polyhedron PM of each of the drawing units MU1 to MU4, the drawing lines SL1 to SL4 (SL3 and SL4 not shown), which are the trajectories of the point lights B1 to B4 scanning on the sheet substrate P, are set to be parallel to the Y-axis.

[0038] The patterns drawn by the drawing lines SL1 to SL4 are successively exposed in the Y direction as the sheet substrate P moves along its length. Furthermore, within the drawing units MU1 to MU4, a vertical coordinate system XtYtZt is defined by a Zt axis parallel to the incident light beams B1 to B4, and Xt and Yt axes perpendicular to the Zt axis, respectively. Therefore, the Yt axis of this vertical coordinate system XtYtZt is parallel to the Y axis of the vertical coordinate system XYZ, and the vertical coordinate system XtYtZt is tilted at a certain angle (θu) about the Y axis relative to the XY plane of the vertical coordinate system XYZ.

[0039] Figure 2 It is shown Figure 1 A perspective view of the schematic internal structure of MU1, a representative of the depiction units MU1 to MU4 shown. Figure 2 The structure of the drawing unit MU1 is substantially the same as that disclosed in, for example, International Publication No. 2016 / 152758, and will therefore be described simply. The beam B1 from the beam switching unit BD1B includes at least one of three beams B1a, B1b, and B1c generated during pattern drawing by beams emitted from the three light source devices LS1A, LS1B, and LS1C, respectively. The three beams B1a, B1b, and B1c (collectively referred to as beam B1) are all parallel beams with a diameter of 1 mm or less, and are incident on the reflector M10 within the drawing unit MU1 at a predetermined angle to each other. The beam B1, reflected 90 degrees by the reflector M10, passes through a beam expander (magnification system) BEX formed by lenses LGa and LGb arranged along the optical axis AXu1, and is then reflected 90 degrees by the reflector M11 before being incident on the polarizing beam splitter PBS.

[0040] Since beam B1 is linearly polarized in a direction perpendicular to the Zt axis, it is effectively reflected by the polarizing beam splitter PBS, reflected 90 degrees by mirror M12, and then travels in the -Zt direction. It is then reflected 90 degrees by mirror M13 and travels in the +Xt direction. The beam B1 reflected by mirror M13 passes through the 1 / 4 wavelength (λ / 4) plate QP and the first cylindrical lens CYa, and is reflected by mirror M14, reaching one reflecting surface Rp1 of the rotating polygon mirror PM. The beam B1 reflected by the reflecting surface Rp1 of the rotating polygon mirror PM is deflected in the XtYt plane by the rotation of the rotating polygon mirror PM, and then incident on the telecentric fθ lens system FT with an optical axis AXf1 parallel to the Xt axis.

[0041] Immediately following the fθ lens system FT, a reflecting mirror M15 is positioned to bend the optical axis AXf1 by 90 degrees. The light beam B1 emitted from the fθ lens system FT is reflected by the reflecting mirror M15 at a 90-degree angle parallel to the Zt axis. A second cylindrical lens CYb is positioned between the reflecting mirror M15 and the sheet substrate P. The light beam B1 emitted from the fθ lens system FT (comprising at least one of three beams B1a, B1b, and B1c) is focused onto the sheet substrate P as at least one of point beams SPa, SPb, and SPc. These point beams SPa, SPb, and SPc are scanned one-dimensionally along a drawing line (scanning line) SL1 parallel to the Yt axis (Y-axis) by rotating the rotating polygon mirror PM. Furthermore, Figure 2 Line LE1 in the diagram represents the rotation center line when the drawing unit MU1, which includes the optical components from the mirror M10 to the second cylindrical lens CYb, is rotated slightly to tilt the drawing line SL1. The extension of line LE1 passes through the midpoint of the drawing line SL1 in the Yt direction and is coaxially set with the optical axis of the lens system in the beam switching unit BD1B that emits the beam B1 (the entirety of B1a, B1b, and B1c) incident on the mirror M10.

[0042] exist Figure 2 In the depiction unit MU1 shown, a lens system LGc and a photoelectric sensor DT, positioned opposite the reflector M12 and separated by a polarizing beam splitter PBS, receive reflected light generated from the sheet substrate P by the projection of the point light SP. By analyzing the waveform of the photoelectric signal from the photoelectric sensor DT, the positional information of the pattern formed on the sheet substrate P can be obtained. Furthermore, in Figure 2In this structure, the inner surface OPa of the beam expander BEX is the rear focal point of lens LGa and is set as the front focal point of lens LGb. Beam B1 (at least one of B1a, B1b, and B1c) is focused at surface OPa onto a beam waist with a cross-sectional dimension of tens of μm. Surface OPa ultimately forms an optical conjugate relationship (imaging relationship) with the surface of the sheet substrate P. The cross-sectional dimensions (diameter, etc.) of beams B1a, B1b, and B1c passing through lens LGb become parallel beams magnified to several mm or more. Furthermore, the first cylindrical lens CYa, the second cylindrical lens CYb, and the fθ lens system FT cooperate to correct for positional variations in the Xt direction of the point light SP (drawing line SL1) caused by differences in the tilt of each reflecting surface of the rotating polygon mirror PM.

[0043] Figure 3A , Figure 3B It is an exaggerated way of showing through Figure 2 A diagram showing the state of beams B1 (B1a, B1b, B1c) of the beam expander BEX within the depicting unit MU1. Figure 3A In this embodiment, the structure of the beam expander BEX is the same as that in the other depiction units MU2, MU3, and MU4. Therefore, the beam incident on the beam expander BEX is generally represented as Bn (n = 1 to 4), and the three beams contained in beam Bn are also generally represented as Bna, Bnb, and Bnc (n = 1 to 4). Furthermore, the optical axis is also generally represented as AXun (n = 1 to 4). In this embodiment, the beams Bna (n = 1 to 4) incident from the light source devices LS1A and LS2A to the lens LGa of the beam expander BEX via the beam combining units BD1A and BD2A and the beam switching units BD1B and BD2B, respectively, are set to be coaxial with the optical axis AXun (n = 1 to 4).

[0044] On the other hand, the beams Bnb (n=1 to 4) generated from the light source devices LS1B and LS2B via the beam combining units BD1A and BD2A and the beam switching units BD1B and BD2B, respectively, are incident on the lens LGa of the beam expander BEX at a certain angle relative to the optical axis AXun (n=1 to 4) within a plane containing the optical axis AXun (n=1 to 4) parallel to the XtYt plane. Similarly, the beams Bnc (n=1 to 4) generated from the respective light source devices LS1C and LS2C via the beam combining units BD1A and BD2A and the beam switching units BD1B and BD2B, are incident on the lens LGa of the beam expander BEX at a certain angle relative to the optical axis AXun (n=1 to 4) within a plane containing the optical axis AXun (n=1 to 4) parallel to the XtYt plane. Two beams, Bnb and Bnc (n=1 to 4), incident on the beam expander BEX, are incident on the lens LGa with symmetrical inclinations across the optical axis AXun (n=1 to 4) or beam Bna (n=1 to 4).

[0045] Since the light beam Bna (n = 1 to 4) incident on lens LGa is a parallel beam, therefore... Figure 3B As shown, on the plane OPa corresponding to the pupil plane in the beam expander BEX, a circular point SPa' formed by the waist of the beam Bna is formed on the optical axis AXun (n = 1 to 4). Similarly, the beams Bnb and Bnc (n = 1 to 4) incident on the lens LGa are also parallel beams, therefore, on the plane OPa inside the beam expander BEX, as... Figure 3B As shown, point SPb' formed by the waist of beam Bnb and point SPc' formed by the waist of beam Bnc are located symmetrically in the Yt direction, separated by the optical axis AXun (point SPa'). As explained previously, the cross-sectional shapes of beams Bnb and Bnc are shaped into grooves (elongated ellipses) by beam combining sections BD1A and BD2A, respectively, and therefore points SPb' and SPc' also become grooves (elongated ellipses).

[0046] However, the major axis of the cross-sectional distribution of the groove-shaped (elongated elliptical) point SPb' is set at +45 degrees relative to the Yt axis within the surface OPa, while the major axis of the cross-sectional distribution of the groove-shaped (elongated elliptical) point SPc' is set at -45 degrees relative to the Yt axis within the surface OPa. Furthermore, within the surface OPa, the center point of the cross-sectional distribution of point SPb' is set to be located away from the center point (optical axis AXun) of the cross-sectional distribution of the circular point SPa' at a distance Δyb', and the center point of the cross-sectional distribution of point SPc' is set to be located away from the center point (optical axis AXun) of the cross-sectional distribution of point SPa' at a distance Δyc'.

[0047] The beams Bna, Bnb, and Bnc, which converge at surface OPa, diverge simultaneously and are incident on lens LGb of the beam expander BEX. At this time, in the optical path from lens LGa to lens LGb, the principal rays (central rays) of each beam Bna, Bnb, and Bnc are set to be approximately parallel to the optical axis AXun. Beam Bna, having passed through lens LGb, becomes a parallel beam with an enlarged circular cross-sectional distribution and propagates coaxially with the optical axis AXun. Furthermore, beams Bnb and Bnc, having passed through lens LGb, become parallel beams with enlarged groove-shaped (elongated elliptical) cross-sectional distributions and propagate at an angle relative to the optical axis AXun. As previously... Figure 2 As explained, the surface OPa ultimately becomes optically conjugate with the surface of the sheet substrate P. Therefore, the projected images of points SPa', SPb', and SPc' formed on the surface OPa are respectively used as imaging systems formed by lens LGb, the first cylindrical lens CYa, the fθ lens system FT, and the second cylindrical lens CYb as... Figure 2 The point lights SPa, SPb, and SPc are reduced and imaged on the sheet-like substrate P.

[0048] In this embodiment, such as Figure 3B As shown, the distance Δyb' between points SPa' and SPb' in the Yt direction, i.e., the center distance between point beams SPa and SPb projected onto the surface of the sheet substrate P in the Yt direction (main scanning direction), is... Figure 3A The principal ray (central ray) of the beam Bnb shown is proportional to the sine of the tilt angle relative to the optical axis AXun. Similarly, the distance Δyc' in the Yt direction between points SPa' and SPc' on surface OPa, i.e., the center distance in the Yt direction (main scanning direction) between point beams SPa and SPc projected onto the surface of the sheet substrate P, is proportional to... Figure 3A The principal ray (central ray) of the beam Bnc shown is proportional to the sine of the tilt angle relative to the optical axis AXun. Furthermore, the point rays SPa, SPb, and SPc projected onto the sheet-like substrate P are respectively... Figure 3A The cross-sectional shapes and configurations of the points SPa', SPb', and SPc' are similar. In addition, at least one of the point lights SPa, SPb, and SPc is selected according to the shape of the depicted pattern and projected onto the sheet substrate P.

[0049] In the above structure, a surface OPa conjugate to the surface of the sheet substrate P (the imaging surface of point lights SPa, SPb, and SPc) is formed within the drawing unit MU1 (and similarly within the other units MU2 to MU4). However, the lens LGa of the beam expander BEX can also be positioned outside the drawing unit MU1, with the mirror M10 within the drawing unit MU1 located between surface OPa and lens LGa. Furthermore, the beam expander BEX is not limited to a magnification system and can also be an equivalent magnification relay system.

[0050] Next, refer to Figure 4 , Figures 5A-5C This indicates that it will come from Figure 1 The structure of the beam combining section BD1A is formed by combining the three beams LB1a, LB1b, and LB1c of the light source device LS1 (LS1A, LS1B, LS1C) with a specified cross-sectional distribution and a specified cross-angle. Figure 4 The diagram shows the approximate configuration of the light source devices LS1A, LS1B, LS1C and the beam combining unit BD1A as observed in the XY plane. Figures 5A-5C It is shown schematically. Figure 4 A diagram showing the arrangement of optical components within the beam shape deformation section 10B (or 10C). Additionally, Figure 1 The arrangement and structure of the light source devices LS2A, LS2B, LS2C and the beam combining unit BD2A shown are similar to... Figure 4 same.

[0051] The light source devices LS1A, LS1B, and LS1C are identical fiber amplifier laser light sources, capable of oscillating high-brightness ultraviolet pulse beams with emission times of approximately tens of picoseconds in response to individual clock pulses of a shared clock signal CLK. For practicality and stability, the frequency of the clock signal CLK is set to approximately 400MHz, for example. Bitstream-like depiction signals SDa, SDb, and SDc are supplied to the light source devices LS1A, LS1B, and LS1C, respectively, serially reading the pixel bit data ("0" or "1") of the depiction data (in bitmap form) along the depiction lines. Details of this depiction operation will be described later.

[0052] A beam LB1a (a parallel beam with a circular cross-section of approximately 0.5 to 1 mm in diameter, corresponding to the beam Bna supplied to the drawing units MU1 and MU3) from the light source device LS1A is incident on the beam shape deformation section 10A. The beam LB1a is as described previously... Figure 3A , Figure 3BAs explained, the cross-sectional distribution can remain approximately circular, so the beam shape deformation section 10A can be omitted. However, it is provided to ensure that the optical path length of the lens system within the beam shape deformation sections 10B and 10C, which are incident on other beams LB1b and LB1c, is consistent. The beam shape deformation section 10B, which receives the beam LB1b (a parallel beam with a circular cross-section of approximately 0.5 to 1 mm in diameter, corresponding to the beam Bnb supplied to the drawing units MU1 and MU3) from the light source device LS1B, is transformed into a parallel beam with a groove-shaped (elongated elliptical) cross-sectional distribution. Similarly, the beam shape deformation section 10C, which receives the beam LB1c (a parallel beam with a circular cross-section of approximately 0.5 to 1 mm in diameter, corresponding to the beam Bnc supplied to the drawing units MU1 and MU3) from the light source device LS1C, is transformed into a parallel beam with a groove-shaped (elongated elliptical) cross-sectional distribution.

[0053] The beam LB1b, advancing in the +X direction from the beam shape deformation section 10B, is reflected at a right angle by mirror M2B in the XY plane and advances in the +Y direction, and is further reflected at a right angle by mirror M3B and advances in the +X direction. The beam LB1c, advancing in the +X direction from the beam shape deformation section 10C, is reflected at a right angle by mirror M2C in the XY plane and advances in the -Y direction, and is further reflected at a right angle by mirror M3C and advances in the +X direction. The beam LB1a from the beam shape deformation section 10A passes through the gap in the Y direction between mirrors M3B and M3C and advances in the +X direction in a parallel state with a constant Y-direction interval with the other beams LB1b and LB1c. The three beams LB1a, LB1b, and LB1c (all parallel beams) arranged at a narrow interval in the Y direction in the XY plane are respectively incident on the parallel plate 12A made of quartz and the wedge-shaped prisms 12B and 12C.

[0054] Parallel plate 12A is positioned perpendicular to beam LB1a, allowing direct transmission. However, wedge-shaped prisms 12B and 12C, due to the non-parallel incident and exit surfaces of the beams forming a defined angle (apex angle) in the XY plane, cause beam LB1b, passing through prism 12B, to refract in the XY plane in a manner similar to beam LB1a, and beam LB1c, passing through prism 12C, to refract in the XY plane in a manner similar to beam LB1a. The three beams LB1a, LB1b, and LB1c, passing through parallel plate 12A, prisms 12B, and 12C, are reflected in the -Y direction by mirror M4, intersect at surface OPm, separate again, and then enter lens GK1. The front focal point of lens GK1 is set at the position of surface OPm.

[0055] Therefore, the beams LB1a, LB1b, and LB1c passing through lens GK1 converge at the rear focal point of lens GK1, forming a waist. The principal ray (central ray) of beam LB1a is coaxial with the optical axis AXs of lens GK1, while the principal rays (central rays) of beams LB1b and LB1c are parallel to each other at a certain interval from the optical axis AXs. Furthermore, within plane OPm, the three beams LB1a, LB1b, and LB1c (each a parallel beam) overlap at the optical axis AXs. Therefore, within plane OPm, the intensity distribution of beam LB1a (circular cross-section) overlaps with the intensity distribution of beams LB1b and LB1c (grooved (elongated elliptical) cross-sections with their major axes approximately 90 degrees apart. Additionally, in this embodiment, the incident light is set according to the apex angles of prisms 12B and 12C. Figure 3A , Figure 3B The tilt angles of the two beams Bnb and Bnc of the lens LGa of the beam expander BEX of the depicting unit MU1 (MU2~MU4) relative to the optical axis AXun.

[0056] exist Figure 4 In this process, the clock signal CLK is output from the clock generation unit 100A installed in the control device 100, and the drawing signals SDa, SDb, and SDc are output from the drawing data storage unit 100B installed in the control device 100. The control device 100 includes a switching control unit 100C, which controls the switching of the clock signal CLK from the clock generation unit 100A installed in the control device 100. Figure 1 The acousto-optic modulation element of the beam switching unit BD1B (and BD2B as well) shown is driven by a driving signal; the drawing unit control unit 100D controls... Figure 2 The illustrated depiction units MU1 and MU3 (and MU2 and MU4 as well) contain rotating motors for each polygon mirror PM, or receive origin signals (timing signals) generated at each reflecting surface of the polygon mirror PM; and a rotating cylinder control unit 100E, which controls... Figure 1 The rotating cylinder DR shown is powered by a rotating motor, or receives measurement information from an encoder that measures its rotational angular position.

[0057] Figure 4The depiction data storage unit 100B, as shown, responds to the origin signal (timing signal) received by the depiction unit control unit 100D and begins reading out a depiction data column (serial bit column) based on the point lights SP1, SPb, SPc along the depiction lines SL1, SL3 (and SL2, SL4 as well). It also performs an address switching operation on the depiction data column to be read out based on the encoder measurement information received by the rotary cylinder control unit 100E. Furthermore, the switching control unit 100C also responds to the origin signals (timing signals) received by the depiction unit control unit 100D from the respective depiction units MU1, MU3 (MU2, MU4) and controls the on / off switching of the acousto-optic modulation element within the beam switching unit BD1B (BD2B).

[0058] Figures 5A-5C The detailed optical structures of beam shape deformers 10B and 10C are shown, each having a basic structure of beam amplification system OM1, beam compression system OM2, and beam reduction system OM3. The beam amplification system OM1 and beam reduction system OM3 on the beam shape deformer 10B side, arranged along the optical axis AXb, and the beam amplification system OM1 and beam reduction system OM3 on the beam shape deformer 10C side, arranged along the optical axis AXc, are all constructed using the same optical components. Furthermore, Figure 5A and Figure 5B This is a view taken from the direction in which the beam shape deformation parts 10B and 10C are rotated 90 degrees around the optical axis AXb (AXc).

[0059] The beam magnification system OM1, which receives the beam LB1b (LB1c) from the light source device LS1B (LS1C), consists of a spherical negative lens 10G1 and a spherical positive lens 10G2, converting it into a parallel beam that magnifies the diameter of the cross-sectional distribution of the beam LB1b (LB1c) to a distribution BVa several times or more. The beam compression system OM2 consists of two cylindrical lenses 10G3 and 10G4 arranged along the optical axis AXb (AXc). Cylindrical lens 10G3 is a convex lens that has no refractive power in the direction of the generatrix Ds and positive refractive power in directions perpendicular to both the generatrix Ds and the optical axis AXb (AXc). Cylindrical lens 10G4 is a concave lens that has no refractive power in the direction of the generatrix Ds and negative refractive power in directions perpendicular to both the generatrix Ds and the optical axis AXb (AXc).

[0060] The amplified beam LB1b (LB1c) from the beam amplification system OM1 passes as a parallel beam through cylindrical lenses 10G3 and 10G4, but as... Figure 5AAs shown, in the plane parallel to the generatrix Ds containing the optical axis AXb (AXc), the cylindrical lenses 10G3 and 10G4 function only as parallel plates, and thus are incident on the next beam reduction system OM3 in this parallel state. On the other hand, as Figure 5B As shown, the magnified beam LB1b (LB1c), within a plane containing the optical axis AXb (AXc) and perpendicular to the generatrix Ds, is refracted by cylindrical lenses 10G3 and 10G4, resulting in a parallel beam with reduced width before entering the next beam-reducing system OM3. Therefore, the beam LB1b (LB1c) emitted from cylindrical lens 10G4 has a cross-section shaped into a groove-like (elongated elliptical) distribution BVb.

[0061] The beam reduction system OM3 consists of a spherical positive lens 10G5 and a spherical negative lens 10G6 arranged along the optical axis AXb (AXc), and converts the cross-sectional distribution of the beam LB1b (LB1c) emitted as a parallel beam from the beam compression system OM2 into an isotropically reduced parallel beam. The cross-sectional distribution of the beam LB1b (LB1c) emitted from the negative lens 10G6 is a groove-shaped (elongated elliptical) shape with the direction of the generatrix Ds as the major axis. As an example, the width in the major axis direction is set to be approximately the same as the diameter of the circular cross-sectional distribution of the beam LB1a emitted from the beam shape deformation section 10A. In addition, the width in the minor axis direction of the cross-sectional distribution of the beam LB1b (LB1c) emitted from the negative lens 10G6 is set to approximately 1 / 4 to 1 / 6 of the width in the major axis direction.

[0062] In the above Figures 5A-5C In the structure, the directions of the generatrices Ds of the cylindrical lenses 10G3 and 10G4 in the beam compression system OM2 on the beam shape deformation section 10B side and the directions of the generatrices Ds of the cylindrical lenses 10G3 and 10G4 in the beam compression system OM2 on the beam shape deformation section 10C side are set such that they form approximately 90 degrees when viewed in a plane perpendicular to the optical axes AXb and AXc. This state is set as follows: Figure 5C As shown, for example from Figure 4 When observed from the sides of mirrors M2B and M2C, the generatrix Ds of cylindrical lenses 10G3 and 10G4 on the beam shape deformation section 10B side rotates counterclockwise by 45 degrees from the Y-axis, and the generatrix Ds of cylindrical lenses 10G3 and 10G4 on the beam shape deformation section 10C side rotates clockwise by 45 degrees from the Y-axis. As a result, the major axis direction of the groove-shaped (elongated elliptical) cross-sectional distribution of the beam LB1b emitted from the beam shape deformation section 10B forms an angle of approximately 90 degrees with the major axis direction of the groove-shaped (elongated elliptical) cross-sectional distribution of the beam LB1c emitted from the beam shape deformation section 10C.

[0063] in addition, Figure 4The beam shape deformation section 10A shown is designed to make the optical path length consistent with other beam shape deformation sections 10B and 10C, thus replacing... Figure 5A , Figure 5B The beam compression system OM2 (two cylindrical lenses 10G3 and 10G4) shown is inserted into a simple parallel plate (quartz). Therefore, the beam shape deformation section 10A consists of the beam magnification system OM1, the parallel plate, and the beam reduction system OM3. However, the beam shape deformation section 10A itself can be omitted when it is not necessary to make the optical path length consistent. In addition, the incident or exit surface of any one or both of the two cylindrical lenses 10G3 and 10G4 can not be a perfectly cylindrical surface, like an aspherical lens, but an approximate cylindrical surface approximated by a higher-order function, etc.

[0064] In this embodiment, such as Figure 5C As shown, the generatrix Ds of the two cylindrical lenses 10G3 and 10G4 is set at approximately 45 degrees from the Y-axis. However, by integrally holding the two cylindrical lenses 10G3 and 10G4 within the lens barrel and configuring the lens barrel to rotate around the optical axis AXb (AXc), the major axis direction of the slotted (elongated elliptical) point beams SPb and SPc can be set (rotated) to any direction on the sheet substrate P. Furthermore, Figure 1 The structure of the beam combining section BD2A shown is such that it enables... Figure 4 The beam combining section BD1A shown is configured to rotate 180 degrees around an axis parallel to the Z-axis. The beam shape deformation sections 10A, 10B, and 10C within the beam combining section BD2A are also configured to rotate 180 degrees around the Z-axis. Figures 5A-5C The optical components shown are constructed in the same manner.

[0065] exist Figures 5A-5C In the structure, a beam amplification system OM1 is provided before the beam compression system OM2, and a beam reduction system OM3 is provided after it. However, these systems can be omitted, and the beam shape deformation parts 10B and 10C can be formed solely by the beam compression system OM2. However, when it is necessary to adjust the size (especially the length in the major axis direction) of the slotted (or elongated elliptical) point beams SPb and SPc that are ultimately projected onto the sheet substrate P, by providing the beam amplification system OM1 and the beam reduction system OM3, the size of the point beams SPb and SPc can be set to the desired size.

[0066] Next, refer to Figure 6 ,right Figure 1 The detailed structures of the beam switching units BD1B and BD2B shown will be explained. The basic structures of the beam switching units BD1B and BD2B are the same, in... Figure 1 In this configuration, the beam switching unit BD2B is arranged such that the entire beam switching unit BD1B rotates 180 degrees around an axis parallel to the Z-axis. Therefore, as a representative example, based on... Figure 6 The structure of the beam switching unit BD1B will be explained. Figure 6 It shows from Figure 4 The diagram shows a three-dimensional representation of the approximate optical path from lens GK1 in the beam combining section BD1A to the beam switching section BD1B, up to the odd-numbered drawing units MU1 and MU3. The vertical coordinate system XYZ is set to... Figure 1 The coordinate system XYZ is the same.

[0067] The light beams LB1 (LB1a, LB1b, LB1c) from lens GK1 travel parallel to the optical axis AXs in the -Y direction, are reflected perpendicularly in the -Z direction by beam splitter M40, and deflected in the -X direction by mirrors M41 and M42 before entering lens GK2. Beam splitter M40 ensures that a fraction of the light from beams LB1 (LB1a, LB1b, LB1c) becomes the transmitted measurement beam MLB, while the remaining light is reflected in the -Z direction. The measurement beam MLB is then incident on a beam monitoring system (not shown), which measures the light quantity (intensity or energy) of each of the three beams LB1a, LB1b, and LB1c, as well as changes in their positional relationships.

[0068] exist Figure 6 In the diagram, the surface OPs between beam splitter M40 and mirror M41 is the location of the rear focal point of lens GK1. On surface OPs, the beam waists (points) of beams LB1a, LB1b, and LB1c are as described previously. Figure 3B They are arranged in the Y direction. The principal ray (central ray) of the beam LB1a, which diverges from surface OPs, is coaxial with the optical axis AXs. The principal rays (central rays) of the beams LB1b and LB1c, which also diverge from surface OPs, are parallel to the optical axis AXs. The beams LB1a, LB1b, and LB1c of the lens GK2, positioned so that the front focal point is surface OPs, are converted into parallel beams, and... Figure 6 The XY planes are inclined at a predetermined angle to each other.

[0069] The light beams LB1a, LB1b, and LB1c, passing through lens GK2 in the -X direction, are incident on the primary acousto-optic modulator AM3. At this point, the acousto-optic modulator AM3 is positioned at the rear focal point of lens GK2, with the three beams LB1a, LB1b, and LB1c intersecting in a plane parallel to the XY plane within the crystal of the acousto-optic modulator AM3. Therefore, through the relay optical system composed of lenses GK1 and GK2, Figure 4The surface OPm shown is conjugate with the primary acousto-optic modulator AM3. The acousto-optic modulator AM3 is configured such that it exhibits Bragg diffraction relative to the incident beam, with its diffraction direction being the -Z direction. Furthermore, during the period when the acousto-optic modulator AM3 is in the ON state (the state in which a high-frequency drive signal is applied), the incident beams LB1a, LB1b, and LB1c each generate a 0th-order beam (parallel beam) and a 1st-order diffracted beam (parallel beam). These 0th-order and 1st-order diffracted beams are reflected back by mirrors M43 and M44, propagating in the +X direction and incident on lens GK3.

[0070] Since the front focal point of lens GK3 is set within the crystal of acousto-optic modulation element AM3, the principal rays (central rays) of the 0th order beams LB1a, LB1b, and LB1c, which propagate from lens GK3 in the +X direction, and the principal rays (central rays) of their respective 1st order diffracted beams, are parallel to the optical axis AXs and separated from each other in the YZ plane (the plane perpendicular to the optical axis AXs). The 1st order diffracted beams of LB1a, LB1b, and LB1c are selectively reflected in the -Z direction by the 45-degree reflecting surface of the reflection mirror IM3, which is located at the rear focal point of lens GK3. The 0th order beams of LB1a, LB1b, and LB1c pass through the space above the reflection mirror IM3 in the +Z direction. Furthermore, when using the acousto-optic modulation element AM3 under Bragg diffraction conditions, the amount of light generated by the 1st order diffracted beam is 80-90% of the incident beam, with the remainder being the amount of light from the 0th order beam.

[0071] Here, refer to Figure 7A , Figure 7B It details the state of each beam in the optical path from the acousto-optic modulation element AM3 to the incident mirror IM3. Figure 7A This is a diagram showing the light path observed within the XY plane. Figure 7B This is a diagram showing the optical path as observed within the XZ plane. For example... Figure 7A As shown, when observed in the XY plane, the parallel beams LB1a, LB1b, and LB1c intersect at position Pe (the position of the rear focal point of lens GK2 and the front focal point of lens GK3) within the crystal of the acousto-optic modulation element AM3. Figure 7BAs shown, when the incident light beams LB1a, LB1b, and LB1c are observed in the XZ plane along the optical axis AXs, the light beams LB1a, LB1b, and LB1c generated from the AM3 in the on state are the 0th order beam B3ao and the 1st order diffracted beam B3a, the 0th order beam B3bo and the 1st order diffracted beam B3b, and the 0th order beam B3co and the 1st order diffracted beam B3c. The 1st order diffracted beams B3a, B3b, and B3c are deflected in the -Z direction at a specified diffraction angle relative to the respective 0th order beams.

[0072] When observed in the XY plane, the 0th order beam B3ao and the 1st order diffracted beams B3a, B3bo and B3b, and B3co and B3c are respectively in an overlapping state. The 0th order beams B3ao, B3bo, and B3co, passing through lens GK3, become convergent beams and propagate parallel to the optical axis AXs in the XY plane. After reaching the reflective surface Pso (the position of the rear focal point of lens GK3), they become beams that diverge in the space above the +Z direction of lens IM3. The 1st order diffracted beams B3a, B3b, and B3c, also passing through lens GK3, become convergent beams and propagate parallel to the optical axis AXs in a path that moves a certain distance from the optical axis AXs towards the -Z direction. They become beams that waist at surface Pso and are reflected in the -Z direction by the reflective surface of lens IM3.

[0073] The first-order diffracted beams B3a, B3b, and B3c (with parallel central rays) reflected by the reflecting surface of the incident mirror IM3 become divergent beams, pointing towards the depicting unit MU3. Figure 7A , Figure 7B In the middle, the optical axis AXu3 of the optical path from the incident mirror IM3 toward the depicting unit MU3 is the same as the previous one. Figure 2 , Figure 3A , Figure 3B The optical axis AXun of the beam expander BEX (lenses LGa, LGb) described in the text corresponds to that of the beam expander BEX.

[0074] Return to Figure 6 The explanation is as follows: When the acousto-optic modulation element AM3 is in the off state (no high-frequency drive signal is applied), each of the three incident light beams LB1a, LB1b, and LB1c is not diffracted and passes directly through and into the lens GK3, along the path of... Figure 7A , Figure 7BThe zero-order beams B3ao, B3bo, and B3co, as shown, follow the same optical path through the space above the incident mirror IM3 to reach the reflecting mirror M45. The reflecting mirror M45 reflects the three beams LB1a, LB1b, and LB1c (each with its central rays parallel to each other in the XY plane) in the -Y direction towards the reflecting mirror M46. The reflecting mirror M46 further reflects the beams LB1a, LB1b, and LB1c in the -X direction towards the lens GK4. The position of the front focal point of the lens GK4 is set at the waist of the beam formed near the reflecting surface of the incident mirror IM3 or its pole (within the...). Figure 7A , Figure 7B (The same position as face Pso in the middle).

[0075] The beam LB1a passing through lens GK4 is converted into a parallel beam and propagates coaxially with the optical axis AXs. Beams LB1b and LB1c passing through lens GK4 are also converted into parallel beams and propagate obliquely in the XY plane, intersecting beam LB1a (optical axis AXs). An acousto-optic modulation element AM1 is positioned at the rear focal point of lens GK4. The three beams LB1a, LB1b, and LB1c (parallel beams) emitted from lens GK4 are then... Figure 7A The states shown also cross within the crystal of the acousto-optic modulation element AM1. When the acousto-optic modulation element AM1 is in the ON state, the signal from the acousto-optic modulation element AM1 and... Figure 7A , Figure 7B Under the same conditions, the 0th order beam B1ao and the 1st order diffracted beam B1a of beam LB1a, the 0th order beam B1bo and the 1st order diffracted beam B1b of beam LB1b, and the 0th order beam B1co and the 1st order diffracted beam B1c of beam LB1c are emitted.

[0076] The zero-order beams B1ao, B1bo, and B1co (all parallel beams) emitted from the acousto-optic modulation element AM1, and the first-order diffracted beams B1a, B1b, and B1c (all parallel beams) deflected at a specified diffraction angle in the -Z direction, are reflected by mirrors M47 and M48, refracted in the XY plane, and then propagate in the +X direction, incident on lens GK5. The front focal point of lens GK5 is set within the crystal of the acousto-optic modulation element AM1, and a reflection mirror IM1, identical to the previous reflection mirror IM3, is positioned at the rear focal point of lens GK5. Similar to the previous... Figure 7A , Figure 7BSimilarly, in the state described above, when the acousto-optic modulation element AM1 is in the on state, the first diffracted beams B1a, B1b, and B1c converge at the beam waist at a position near the 45-degree reflecting surface of the incident mirror IM1 or its pole, and are reflected in the -Z direction along the optical axis AXu1 on the side of the depicting unit MU1. Furthermore, in the above structure, the acousto-optic modulation elements AM1 and AM3 are configured as conjugates through a relay optical system (imaging system) based on two lenses GK3 and GK4 of equal magnification.

[0077] Depend on Figure 6 , Figure 7A , Figure 7B The beams Bna, Bnb, and Bnc (n=1 to 4) reflected by the odd-numbered side mirrors IM1 and IM3 (even-numbered side mirrors IM2 and IM4) are each parallel to the optical axis AXun (n=1 to 4), but are divergent beams. Therefore, in order to convert beams Bna, Bnb, and Bnc into mutually intersecting parallel beams, a beam switching unit BD1B and BD2B is installed at the end of their optical paths. Figure 8 That kind of lens is GK6. Figure 8 This is a perspective view showing the states of beams Bna, Bnb, and Bnc incident from beam switching units BD1B and BD2B onto the lens LGa of the beam expander BEX of each of the depicting units MU1 to MU4.

[0078] exist Figure 8 In the process, the light beam Bna (divergent beam) incident on lens GK6 coaxially with the optical axis AXun becomes a parallel beam (approximately 1mm in diameter) from lens GK6, and is... Figure 2 The mirror M10 shown reflects light at a right angle in the -Xt direction and is incident on the lens LGa of the beam expander BEX coaxially with the optical axis AXun. The surface Pe' set in the optical path between the lens GK6 and the lens LGa is the position of the rear focal point of the lens GK6 and the position of the front focal point of the lens LGa.

[0079] In addition, the front focal point of the GK6 lens is set at Figure 7A , Figure 7B The position of surface Pso is shown. Therefore, the incident light beams Bnb and Bnc (divergent beams) on lens GK6 are converted into parallel beams (approximately 1 mm in diameter) by lens GK6, and intersect at the position of optical axis AXun within surface Pe'. They are reflected by mirror M10 and pass through lens LGa of beam expander BEX, and are guided into drawing unit MUn (n = 1~4). The light beams Bna, Bnb, and Bnc passing through lens LGa of beam expander BEX are as previously described. Figure 3A , Figure 3BAs explained, it advances parallel to the optical axis AXun and converges on the surface OPa in such a way that it becomes points SPa', SPb', and SPc' respectively.

[0080] As stated above Figures 1 to 8 An example of the operation of a pattern exposure apparatus EX, configured in this way, to draw a pattern on a sheet substrate P, illustrating the drawing process. Figure 9A , Figure 9B That kind of pattern. Figure 9A The diagram shows the line and space (L&S) patterns PT1, PT2, and PT3 formed by eight lines exposed on a sheet substrate P. Figure 9B This shows pixel map (bitmap) information on the depiction data of a portion of the magnified area Acc of the pattern. This pixel map information is pre-stored in previous... Figure 4 The drawing data storage unit 100B is located within the control device 100 shown.

[0081] exist Figure 9A In this design, pattern PT1 is an L&S pattern consisting of eight 20μm wide black lines extending linearly in the Xt direction (sub-scanning direction) and spaced 20μm apart in the Yt direction (main scan direction). Pattern PT3 is an L&S pattern consisting of eight 10μm wide black lines extending linearly in the Yt direction and spaced 10μm apart in the Xt direction. Furthermore, pattern PT2 is an L&S pattern where the eight lines of patterns PT1 and PT3 are connected by eight lines inclined at approximately 45 degrees relative to the Xt and Yt directions. The linewidth of each of the eight black lines in pattern PT2 is set to approximately 10μm, and the spacing is set to approximately 21.3μm. This structure of patterns PT1, PT2, and PT3 is repeatedly used as wiring layers in electronic devices.

[0082] exist Figure 9A Within the area Acc shown, the diagonal line PT2a of pattern PT2 and the straight line PT3a extending along the Yt direction of pattern PT3 are connected at approximately 135 degrees, and the diagonal line PT2b of pattern PT2 and the straight line PT3b extending along the Yt direction of pattern PT3 are connected at approximately 135 degrees. In this case, as... Figure 9BAs shown, in the pixel map (bitmap) corresponding to region Acc, the size of one pixel Pic is defined as, for example, a 2×2μm square on the sheet substrate P. Therefore, the linewidth direction (Xt direction) of each of the lines PT3a and PT3b is set to 5 pixels (5Pic), as indicated by the shading. Furthermore, the spacing width in the Xt direction between the lines PT3a and PT3b is also set to 5 pixels (5Pic). On the other hand, the linewidth of the 45-degree diagonal lines PT2a and PT2b is set to approximately 10μm, so the size in the Yt direction (or Xt direction) is approximately 14.1μm, and 7 pixels (7Pic), as indicated by the shading, are set in both the Yt and Xt directions.

[0083] exist Figure 9B In this context, a pixel (Pic) is defined by a single bit of "0" or "1" in its depiction data. For example, when pixel Pic is "1", any one of the spot lights SPa, SPb, and SPc performs pulse exposure on the sheet substrate P in response to the clock pulse of the clock signal CLK. At this time, regarding... Figure 9B The depiction data in the region Acc is set to the -Yt direction in the main scanning direction of the point light ( Figure 9B In the case of (from left to right), the data is depicted by a line representing a data column, for example... Figure 9B The pixel bit information in data columns AL1 and AL2 is read out sequentially from left to right in response to the clock signal CLK. This read bit information serves as... Figure 4 The bitstream-like depiction signals SDa, SDb, and SDc shown are applied to the light source devices LS1A, LS1B, and LS1C. Additionally, data columns AL1 and AL2 are respectively... Figure 1 , Figure 2 The maximum length of the depicted line SLn (n = 1 to 4) in the Yt direction is set to Lmy (μm), and the number of pixels with a value of Lmy / Ypi is set to Ypi (μm) when the pixel size in the Yt direction of pixel Pic is set to Ypi (μm).

[0084] In this embodiment, for example, any one of the odd-numbered drawing units MU1, MU3, and MU5 is used in the description of... Figure 9A When exposing a pattern containing diagonal lines, the pattern is drawn by selectively and rapidly switching between a circular spot light SPa based on a beam LB1a from the light source device LS1A, a slotted spot light SPb based on a beam LB1b from the light source device LS1B, and a slotted spot light SPc based on a beam LB1c from the light source device LS1C. Therefore, in this embodiment, when exposing the pattern... Figure 9BThe depiction data shown is set as the basic depiction data (basic data column ALx). When the address of the pixel arranged in the Xt direction is set to x, three data columns are generated and stored: the first data column ALxa, which corresponds to the pattern part that should be depicted by the circular point light SPPa; the second data column ALxb, which corresponds to the pattern part that should be depicted by the slotted point light SPb at a tilt of -45 degrees; and the third data column ALxc, which corresponds to the pattern part that should be depicted by the slotted point light SPc at a tilt of +45 degrees.

[0085] Figure 10 To describe as an example Figure 9B This diagram illustrates the action of a portion of the diagonal line pattern in pattern PT2. Figure 10 In this design, the dimensions Xpi in the Xt direction and Ypi in the Yt direction of the pixel Pic on the sheet substrate P are set to Xpi = Ypi. The effective size (diameter) of the circular point light Spa is set to be equal to or slightly larger than the dimensions Xpi and Ypi of the pixel Pic. This effective diameter refers to the value that becomes 1 / e of the peak intensity when the intensity distribution of the point light Spa is set to a Gaussian or approximately Gaussian distribution. 2 Or half the horizontal diameter. In addition, the effective size of the long axis of each of the slot-shaped (elongated elliptical) point lights SPb and SPc, which are tilted at 45 degrees, is also set to be equal to or slightly larger than the size Xpi, Ypi of the square pixel Pic or the diagonal size of the pixel Pic (approximately 1.4 times Xpi, Ypi).

[0086] Furthermore, the center of point light SPb is set to be separated from the center of point light SPa by a distance ΔYb in the -Yt direction, and the center of point light SPc is set to be separated from the center of point light SPa by a distance ΔYc in the +Yt direction. Figure 10 In this example, for ease of understanding, the intervals ΔYb and ΔYc are equal and set to a value of 2 pixels, i.e., 2·Ypi. However, if the intervals ΔYb and ΔYc are known in advance, they can be more than 2 pixels. Furthermore, the effective size (diameter) of the circular dot light Spa is within ±50% (preferably within ±30%) of the size of the pixel Pic set on the sheet substrate P.

[0087] like Figure 10As shown, for a diagonal pattern tilted at -45 degrees, a slotted point light SPb tilted at -45 degrees is selected and pulsed in response to each clock pulse of the clock signal CLK (400MHz). The pulsed illumination of point light SPb (and other point lights SPa and SPc) is set to be two pulses per pixel Pic in the main scanning direction (Yt direction). Specifically, during the period Tck (2.5ns) of the clock signal CLK, the scanning speed of point light SPb (SPa, SPc) is set to 0.5·Ypi / Tck (μm / ns) by setting the rotation speed of the polygon mirror PM, so that point light SPb (SPa, SPc) moves half of the dimension Ypi in the Yt direction of pixel Pic.

[0088] Similarly, regarding the Xt direction (sub-scan direction), such as Figure 10 As shown, the moving speed of the sheet substrate P in the Xt direction, i.e., the rotating cylinder DR, is also set by setting two drawing lines SL1a and SL1b for one pixel Pic. Figure 1 The rotational speed of the polyhedron PM. The drawing lines SL1a and SL1b are generated by the reflection of the incident light beam B1b (and other light beams B1a and B1c) onto the drawing unit MU1 (and the other drawing units MU2 to MU4) by the adjacent reflecting surfaces in the rotational direction of the polyhedron PM. Therefore, when the polyhedron PM has eight reflecting surfaces, the speed relationship is set to half the dimension Xpi of the pixel Pic in the Xt direction of the sheet substrate P during the 45° rotation of the polyhedron PM.

[0089] exist Figure 10 In this process, the pulsed emission of the light source device LS1B is controlled based on the bit value "1" in the drawing signal SDb based on pixel bit information and the clock pulse of the clock signal CLK, so that a slotted point light SPb at a tilt of -45 degrees is illuminated along the data column AL1 towards the diagonal pattern section (pixel Pic with black dots). During this period, as... Figure 10 As shown, the pixel bit information of the drawing signals SDa and SDc applied to each of the other light source devices LS1A and LS1C becomes the bit value "0", so pulse irradiation based on point light SPa and SPc is not performed.

[0090] like Figure 10 As shown, by selectively setting the pixel bit information of the same pixel contained in each of the depicting signals SDa, SDb, and SDc to any one of the three point lights SPa, SPb, and SPc, it is possible to select any one of the three point lights containing the same pixel. Figure 9AThe diagonal pattern PT2 and the line patterns PT1 and PT3 containing straight lines in the Xt or Yt direction, respectively, reduce the jagged edges of the exposed pattern.

[0091] Figure 11 It is an explanation used for depiction Figure 9B The data depicting a portion of the diagonal line shown is related to... Figure 9B The image shows the state of the pixel bit information (depicting signals SDa, SDb, and SDc) corresponding to the pixel data columns AL1 and AL2 within the region Acc. Data column AL1 or AL2, arranged in a column along the main scan direction, includes portions of diagonal lines PT2a and PT2b and a portion of straight line PT3b. Within data columns AL1 and AL2, Figure 9B The region Acc is defined by 37 pixels in the main scanning direction. If a drawing signal SDa is generated from the design data column AL1 for pattern drawing via point light SPa, then it becomes the initial readout. Figure 9B The leftmost pixels 1 to 4 store a bit value "0" (non-description), pixels 5 to 11 (7 pixels of shadow) store a bit value "1" (description) corresponding to the diagonal line PT2a, pixels 12 to 27 store a bit value "0" (non-description), and pixels 28 to 37 store a bit value "1" (description) corresponding to the left edge pixel of the diagonal line PT2b and the straight line PT3b.

[0092] Similarly, in design data column AL2, which is offset by one level in the sub-scanning direction relative to design data column AL1, the bit value "1" (drawing) corresponding to the diagonal line PT2a is stored in pixels 6 to 12 (shaded pixels), the bit value "0" (non-drawing) is stored in pixels 13 to 28, and the bit value "1" (drawing) corresponding to the left edge pixel of diagonal line PT2b and line PT3b is stored in pixels 29 to 37.

[0093] As in the previous Figure 10 As explained, the oblique line PT2a, tilted at -45 degrees, is exposed using the spot light SPb. Therefore, in the data column of the drawing signal SDb corresponding to the design data column AL1 (drawing signal SDa), the bit value "1" is set for pixels 3 to 9 (7 pixels). For example, in... Figure 10 As explained, since the point light SPb is set to a position in the main scanning direction that precedes the point light SPa by 2 pixels (ΔYb) for pattern drawing, the data column for generating the drawing signal SDb is set with bit values ​​such that it precedes the data column AL1 for generating the drawing signal SDa by 2 pixels (2 bits) overall.

[0094] Furthermore, in the design data column AL1, the 28th pixel stores a bit value "1" for the left edge pixel of the diagonal line PT2b, and the next 29 pixels onwards store a bit value "1" corresponding to the straight line PT3b. To expose the 28th pixel in the design data column AL1 with two pulses of the spot light SPb, the 28th pixel is set to a bit value "0" (non-drawing) in the drawing signal SDa generated from the design data column AL1, and then set to a bit value "1" for the next 29 pixels onwards. Also, in the data column that generates the drawing signal SDb, the 26th pixel, which precedes the 28th pixel in the design data column AL1, is set to a bit value "1".

[0095] In addition, Figure 9B In the region Acc shown, since there is no pattern with a +45 degree diagonal line, therefore, the generated... Figure 11 In the drawing signal SDc, all pixels in the data column are set to bit value "0" (non-drawing). Furthermore, when drawing a slanted line (or slanted edge) at a +45 degree angle using the point light SPc, specific pixels in the data column of the drawing signal SDc are set to bit value "1". In this case, since the point light SPc is positioned to draw the pattern in the main scanning direction at a position delayed by 2 pixels (ΔYc) compared to the point light SPa, the data column of the drawing signal SDc is set with bit values ​​such that it is shifted backward (delayed) by 2 pixels (2 bits) relative to the data column AL1 of the drawing signal SDa.

[0096] Similarly, in the data column AL2, in the data column of the drawing signal SDb, which corresponds to the design data column AL2 (drawing signal SDa) two pixels ahead, the bit value "1" is set for pixels 4 to 10 (7 pixels). Furthermore, in the design data column AL1, the left edge pixel of the diagonal line PT2b is located at pixel 29. Therefore, in the data column of the drawing signal SDb, the bit value "1" is set for the 27th pixel, which precedes the design data column, and the bit value "0" is set for the 28th pixel and thereafter. On the other hand, in the drawing signal SDa generated from the design data column AL1, the 29th pixel is set to bit value "0" (non-drawing), and the bit value "1" is set for the 30th pixel and thereafter.

[0097] As described above, the depiction signals SDa, SDb, and SDc are generated by shifting the data columns (AL1, AL2, etc.) read out every two clock pulses of the clock signal CLK during one scan of the point lights SPa, SPb, and SPc by bits, corresponding to the relative intervals ΔYb and ΔYc in the main scanning direction of the point lights SPa, SPb, and SPc. Point lights SPb and SPc are offset by an interval (ΔYb + ΔYc) in the main scanning direction; therefore, the data columns used to generate depiction signals SDb and SDc are shifted by an amount equivalent to the interval (ΔYb + ΔYc) in bits (in this case, 4 pixels).

[0098] In this embodiment, even when the pattern to be drawn includes oblique lines or sloping edges, it is possible to accurately switch between drawing based on circular point lights SPA and drawing based on sloping groove-shaped (elongated elliptical) point lights SPb or SPc in pixel units of the drawing data. In particular, by making the effective diameter φs of point light SPA approximately the same as the dimensions (length in the major axis direction) of point lights SPb and SPc without significant change, jagged edges generated in oblique lines and sloping edges can be reduced, and linewidth can be accurately maintained. Furthermore, in Figure 4 , Figures 5A-5C In the structure of the beam combining section BD1A (BD1B) shown, the polarization states (directions of linearly polarized light) of the beams LB1a, LB1b, and LB1c from the three light source devices LS1A, LS1B, and LS1C (LS2A, LS2B, and LS2C) are made consistent and incident on the primary acousto-optic modulation element AM3 (AM4).

[0099] Furthermore, in this embodiment, the major axis of each of the slotted (elongated elliptical) spot lights SPb and SPc is tilted at 45 degrees relative to the main scanning direction (or sub-scanning direction). This is because 45-degree tilted wiring and pattern edges are commonly used in pattern designs for many electronic devices, especially wiring designs. However, even if the pattern to be drawn includes wiring (line patterns) or pattern edges that deviate from 45 degrees (the tilt angle relative to the main scanning direction or sub-scanning direction), if the angle β is in the range of |β-45°|≤20°, that is, in the range of 25°≤β≤65°, then by selectively exposing the slotted (elongated elliptical) spot lights SPb and SPc at a 45-degree tilt, the effect of reducing the jaggedness of the tilted edges can be obtained.

[0100] Furthermore, in this embodiment, as in the previous... Figures 5A-5CAs explained, by rotating the beam compression system OM2 around the optical axis AXb (AXc), the major axis directions of the point lights SPb and SPc can be set to any direction (practically, a range of 0° to 90° is sufficient). Therefore, the angles of the diagonal lines and inclined edges appearing in the pattern for electronic devices exposed on the sheet substrate P relative to the main scanning direction (Yt direction) can be calculated to determine the angle with the highest frequency (high-frequency angle), and the major axis directions of the point lights SPb and SPc can be set in a manner corresponding to this high-frequency angle. Alternatively, the beam compression system OM2 can be rotated without rotating, and a trapezoidal prism or an image rotator with three reflective surfaces can be placed after the beam compression system OM2 and rotated around the optical axis AXb (AXc).

[0101] Variation Example 1

[0102] In Modification 1, the acousto-optic modulation elements AM1 and AM3 (AM2 and AM4) in the beam switching section BD1B (BD2B) are respectively changed from the previous... Figure 6 The state shown is rotated 90° around the optical axis AXs. Figure 12A The object is observed in the XY plane of the vertical coordinate system XYZ. Figure 6 The optical path diagram of the primary acousto-optic modulation element AM3, lens GK3, and reflection mirror IM3, with the addition of reflectors M30 and M32, is shown below. Figure 12B It shows through Figure 12A The diagram shows the configuration of point lights SPa, SPb, and SPc projected onto the sheet substrate P.

[0103] In this variation, such as Figure 12B As shown, the three spot lights SPa, SPb, and SPc are arranged at a predetermined interval in the sub-scanning direction (Xt direction). Here, as an example, relative to the drawing lines SLna (n=1 to 4) formed by the circular spot light SPa, the drawing lines SLnb (n=1 to 4) formed by the slotted spot light SPb at a tilt of -45 degrees are set at a position shifted in the -Xt direction by an interval ΔXb equivalent to 5 lines, and the drawing lines SLnc (n=1 to 4) formed by the slotted spot light SPc at a tilt of +45 degrees are set at a position shifted in the +Xt direction by an interval ΔXc equivalent to 5 lines. Furthermore, as previously stated... Figure 10 As explained, the spacing in the Xt direction of the drawing lines based on the point light scanned by the adjacent reflective surfaces of the polygonal mirror PM is set to 1 / 2 of the size Xpi in the Xt direction of the pixel Pic.

[0104] To arrange three point lights SPa, SPb, and SPc in the Xt direction, such as Figure 12A As shown, make Figure 6The primary acousto-optic modulator AM3 (and the subsequent acousto-optic modulator AM1) shown are rotated 90 degrees around the optical axis AXs, setting the diffraction direction of the acousto-optic modulator AM3 (AM1) to the -Y direction within the XY plane. Furthermore, the position Pe (refer to...) within the crystal of the acousto-optic modulator AM3 (AM1) is... Figure 7A , Figure 7B The three intersecting beams LB1a, LB1b, and LB1c (parallel beams) are also incident on the acousto-optic modulation element AM3 (AM1) along planes parallel to the XZ plane. Therefore, for example, from... Figure 4 In the optical path from the parallel plate 12A, wedge prisms 12B and 12C to the primary acousto-optic modulation element AM3, an image rotator is provided to rotate the optical path of the three beams LB1a, LB1b and LB1c by 90 degrees around the optical axis (beam LB1a).

[0105] Therefore, from the acousto-optic modulation element AM3 in the on-state, the incident beams LB1a, LB1b, and LB1c emit their respective 0th-order beams B3ao, B3bo, and B3co (all parallel beams), and beams B3a, B3b, and B3c (all parallel beams), which are deflected in the -Y direction at a specified diffraction angle, as 1st-order diffraction beams. Figure 7A , Figure 7B Similarly, the zero-order beams B3ao, B3bo, and B3co, and beams B3a, B3b, and B3c, respectively, pass through lens GK3 and are focused in such a way that the reflecting surface Pso of the incident mirror IM3 becomes the beam waist. For example... Figure 12A As shown, in this modified example, the reflecting surface of the incident mirror IM3 is set at a 45-degree angle relative to the XZ and YZ planes, and the light beams B3a, B3b, and B3c are reflected in the -Y direction, respectively.

[0106] The central rays of beams B3a, B3b, and B3c passing through lens GK3 are each parallel to the optical axis AXs. The beams B3a, B3b, and B3c (each diverging beam) reflected by mirror IM3... Figure 12A The light beams are projected onto reflector M30 in an overlapping state in the Z direction, causing the light path to bend 90 degrees in the -X direction. The light beams B3a, B3b, and B3c reflected by reflector M30 are then reflected in the -Z direction by reflector M32, which has a reflecting surface tilted at 45 degrees relative to both the XY and YZ planes. When observed in the XY plane, the central rays of each of the beams B3a, B3b, and B3c, immediately after being reflected by reflector M32, are arranged at predetermined intervals in the X direction.

[0107] The beam B3a reflected by mirror M32 and Figure 7A , Figure 7B The optical axis shown is AXu3 (or Figure 8The optical axis shown (AXun) is coaxial with, and Figure 8 Similarly, the light beams are incident on lens GK6. The beams B3b and B3c, reflected by mirror M32, are sandwiched between their central rays. Figure 7A , Figure 7B The optical axis shown is AXu3 (or Figure 8 As shown, the optical axis (AXun) is symmetrically separated in the X direction when incident on... Figure 8 The lens shown is GK6. Therefore, regarding the transmission... Figure 8 The lens LGa shown in the diagram focuses light beams B3a, B3b, and B3c on the plane OPa. Point SPa' of beam B3a is located on the optical axis AXun, point SPb' of beam B3b is located at a specified distance away from the optical axis AXun in the +Z direction, and point SPc' of beam B3c is located at a specified distance away from the optical axis AXun in the -Z direction.

[0108] Through the above Figure 12A Such a structure can separate the point lights SPa, SPb, and SPc projected onto the sheet-like substrate P as follows: Figure 12B They are arranged in that way along the sub-scanning direction (Xt direction). In this variation, as... Figure 12B As shown, the projection positions of the slot-shaped (elongated elliptical) point lights SPb and SPc, relative to the projection position of the circular point light SPa, are staggered by intervals ΔXb and ΔXc in the Xt direction, spanning multiple (in this case, five) drawing lines. Therefore, the data columns in the diagonal pattern drawn by each point light SPb and SPc, or the drawing signal corresponding to the inclined edge, are used to generate... Figure 11 The data columns depicting the signals SDb and SDc shown are relative to the data columns corresponding to the pattern depicted by the point light SPa (used for generating...). Figure 11 The data column depicting the signal SDa shown is stored by shifting it in the sub-scanning direction (Xt direction) by an amount equivalent to the intervals ΔXb and ΔXc.

[0109] Variation Example 2

[0110] In the previous Figures 5A-5C In the beam compression system OM2 shown, two cylindrical lenses 10G3 and 10G4 are used to compress the cross-sectional shape (circular) of the incident beams LB1b and LB1c in one dimension, but other optical elements can also be used. Figure 13 This is a schematic diagram illustrating the structure of this modified example of the beam compression system OM2. In this modified example, the beam is compressed by incident light... Figures 5A-5CThe beam compression system OM2 is composed of a one-dimensional microprism array or a one-dimensional Fresnel lens, which is the amplified circular cross-section beam LB1b (LB1c) of the beam amplification system OM1, and a cylindrical lens 10G4' with negative optical power. When the optical element 10G3' is set as a one-dimensional microprism array, if... Figure 13 When viewed from within the paper, the configuration consists of multiple prisms with a fine wedge-shaped cross-section that extend one-dimensionally in a direction perpendicular to the paper, arranged symmetrically across the optical axis AXb (AXc). As the direction moves away from the optical axis AXb (AXc), the apex angle of the wedge of the prism becomes larger.

[0111] Therefore, within the cross-section of the incident beam LB1b (LB1c), as it moves away from the optical axis AXb (AXc) of the optical element 10G3', the refraction angle of the prism increases, and the beam LB1b (LB1c) is compressed (converged) towards the optical axis AXb (AXc). The cylindrical lens 10G4' causes the compressed (converged) beam LB1b (LB1c) to diverge in a manner that makes it a substantially parallel beam. Furthermore, when in conjunction with... Figure 13 When observed in a plane perpendicular to the paper and containing the optical axis AXb (AXc), neither the optical element 10G3' nor the cylindrical lens 10G4' has optical power (refractive power), so the incident beam LB1b (LB1c) travels directly as a parallel beam.

[0112] As a result, the intensity distribution within the cross-section of the beam LB1b (LB1c) emitted from the cylindrical lens 10G4' becomes groove-shaped (elongated elliptical). Furthermore, when using a one-dimensional Fresnel lens as the optical element 10G3', the cross-sectional shape of the beam LB1b (LB1c) emitted from the cylindrical lens 10G4' can also be made groove-shaped (elongated elliptical) through approximately the same action. In this modified example, by rotating the entire beam compression system OM2 based on the optical element 10G3' and the cylindrical lens 10G4' around the optical axis AXb (AXc), the major axis directions of the groove-shaped (elongated elliptical) point beams SPb and SPc projected onto the sheet substrate P can be tilted relative to the main scanning direction (Yt direction). Moreover, the cylindrical lens 10G4' can also be a one-dimensional Fresnel lens with negative optical power (refractive force). In addition, the incident surface (or exit surface) of the cylindrical lens 10G4' may not be a perfectly cylindrical surface, but rather an approximate cylindrical surface approximated by a higher-order function, similar to that of an aspherical lens.

[0113] Example 2

[0114] In the previous first embodiment and its variations, the light beams LB1a (LB2a) from the light source device LS1A (LS2A) for generating circular point light SPa, LB1b (LB2b) from the light source device LS1B (LS2B) for generating grooved point light SPb, and LB1c (LB2c) from the light source device LS1C (LS2C) for generating grooved point light SPc intersect within the crystals of the acousto-optic modulation elements AM1 to AM4 in the beam switching sections BD1B and BD2B, respectively. Figure 4 The beam combining sections BD1A and BD2A are configured with optical paths. In this embodiment, the optical axes AXs (see reference) within the beam switching section BD1B (BD2B) are connected to the three beams LB1a (LB2a), LB1b (LB2b), and LB1c (LB2c) incident on the acousto-optic modulation elements AM1 to AM4. Figure 6 Coaxial synthesis.

[0115] Figure 14 It shows that it will come from Figure 4 This diagram illustrates the structure of a second embodiment where the beams LB1a, LB1b, and LB1c of each of the beam shape deformation sections 10A, 10B, and 10C are coaxially combined. In this embodiment, coaxial combining is achieved by rapidly switching the polarization states of the beams LB1a, LB1b, and LB1c using electro-optic elements. Figure 14 In the process, the P-polarized light beam LB1a from the light source device LS1A, incident on the beam shape deformer 10A, is incident on the first surface of the polarization beam splitter BS1 via lenses 10G5 and 10G6 of the beam reduction system OM3. The P-polarized light beam LB1b from the light source device LS1B, incident on the beam shape deformer 10B, is converted into S-polarized light via lenses 10G5 and 10G6 of the beam reduction system OM3 and the half-wavelength plate HWP, and then incident on the second surface perpendicular to the first surface of the polarization beam splitter BS1.

[0116] A P-polarized light beam LB1a incident on the first surface of polarization beamsplitter BS1 passes through the polarization separation surface of polarization beamsplitter BS1 and is incident on the first electro-optic element EOa. Electro-optic element EOa switches the direction of the linearly polarized light of the incident beam according to the on / off state of the driving signal SSa, which applies an electric field to the internal crystal. Therefore, when the driving signal SSa is off, electro-optic element EOa allows the P-polarized light beam LB1a, which has passed through polarization beamsplitter BS1, to pass directly through and be incident on the second polarization beamsplitter BS2. Since the second polarization beamsplitter BS2 is also configured to transmit P-polarized light and reflect S-polarized light, the P-polarized light beam LB1a passes through polarization beamsplitter BS2 and is incident on the second electro-optic element EOb.

[0117] The second electro-optic element EOb is identical to the first electro-optic element EOa, switching the polarization state of the incident beam by turning on / off the driving signal SSb. When the driving signal SSb is off, the electro-optic element EOb allows the P-polarized beam LB1a from the polarization beam splitter BS2 to pass directly through and enter the third polarization beam splitter BS3. Since the third polarization beam splitter BS3 is also configured to transmit P-polarized light and reflect S-polarized light, the P-polarized beam LB1a passes through the polarization beam splitter BS3 and travels coaxially with the optical axis AXs in the subsequent beam switching section BD1B (BD2B).

[0118] On the other hand, the beam LB1b, which becomes S-polarized from the beam shape deformation section 10B and is incident on the polarization beam splitter BS1, is reflected by the polarization separation surface of the polarization beam splitter BS1 and then incident on the electro-optic element EOa. When the drive signal SSa is off, the S-polarized beam LB1b passes directly through the electro-optic element EOa and is incident on the same incident surface as the beam LB1a of the polarization beam splitter BS2. Almost all of the S-polarized beam LB1b incident on the polarization beam splitter BS2 is reflected and incident on the beam trap TRa, where it is absorbed.

[0119] Furthermore, the P-polarized beam LB1c from the light source device LS1C, incident on the beam shape deformation section 10C, is converted into S-polarized light by the lenses 10G5 and 10G6 and the half-wavelength plate HWP of the beam reduction system OM3 and is reflected at a right angle by the mirror M40A, incident on the second surface of the polarization beam splitter BS2 (the surface opposite to the beam trap TRa). Since the polarization beam splitter BS2 reflects the S-polarized light, the S-polarized beam LB1c is reflected in such a way that it becomes an optical path coaxial with the other beams LB1a and LB1b, and is incident on the electro-optic element EOb. When the drive signal SSb is off, the electro-optic element EOb allows the S-polarized beam LB1c from the polarization beam splitter BS2 to pass directly through and be incident on the third polarization beam splitter BS3. Since the third polarization beam splitter BS3 is also configured to reflect S-polarized light, the S-polarized beam LB1c is reflected by the polarization beam splitter BS3 and absorbed by the beam trap TRb.

[0120] As described above, when the drive signals SSa and SSb applied to the two electro-optic elements EOa and EOb in the series configuration are both off, only the P-polarized beam LB1a from the light source device LS1A is emitted coaxially with the optical axis AXs from the polarization beam splitter BS3. Next, the case where the drive signal SSa applied to the first electro-optic element EOa is on and the drive signal SSb applied to the second electro-optic element EOb is off will be described. In this case, the P-polarized beam LB1a incident on the first electro-optic element EOa via the polarization beam splitter BS1 is switched to S-polarized light. Therefore, the S-polarized beam LB1a is reflected by the second polarization beam splitter BS2 and absorbed by the beam trap TRa.

[0121] On the other hand, the S-polarized beam LB1b, reflected by polarization beam splitter BS1 and incident on the first electro-optic element EOa, is switched to P-polarized light. Therefore, the P-polarized beam LB1b directly passes through the second polarization beam splitter BS2, the second electro-optic element EOb, and the third polarization beam splitter BS3, and exits coaxially with the optical axis AXs. Meanwhile, at this time, the S-polarized beam LB1c from the beam shape deformation section 10C is reflected by the second polarization beam splitter BS2 via mirror M40A, directly passes through the second electro-optic element EOb (which is in the off state), is reflected by the third polarization beam splitter BS3, and is absorbed by the beam trap TRb. As described above, when the electro-optic element EOa is in the on state and the electro-optic element EOb is in the off state, only the P-polarized beam LB1b exits coaxially with the optical axis AXs from the third polarization beam splitter BS3.

[0122] Next, the case where driving signals SSa and SSb are applied with both the first electro-optic element EOa and the second electro-optic element EOb in the ON state will be explained. In this case, since the electro-optic element EOa is in the ON state, the P-polarized beam LB1a from the beam shape deformer 10A is converted to S-polarized light by the electro-optic element EOa after passing through the polarization beam splitter BS1, and is therefore reflected by the polarization beam splitter BS1 and absorbed by the beam trap TRa. Meanwhile, the S-polarized beam LB1b from the beam shape deformer 10B is converted to P-polarized light by the electro-optic element EOa after being reflected by the polarization beam splitter BS1, and thus passes through the next polarization beam splitter BS2. However, the P-polarized beam LB1b passing through the polarization beam splitter BS2 is converted to S-polarized light by the second electro-optic element EOb in the ON state, and is therefore reflected by the polarization beam splitter BS3 and absorbed by the beam trap TRb.

[0123] On the other hand, the S-polarized beam LB1c from the beam shape deformation section 10C, after being reflected by the mirror M40A and the polarization beam splitter BS2, is converted into P-polarized light by the electro-optic element EOb in the on state, and thus passes through the next polarization beam splitter BS3 and is emitted coaxially with the optical axis AXs. Thus, in this embodiment, the polarization beam splitters BS1, BS2, BS3, and the electro-optic elements EOa and EOb function as a beam combining section that combines three beams LB1a, LB1b, and LB1c in a manner that proceeds along the optical axis AXs.

[0124] In this embodiment, to coaxially combine beams LB1a, LB1b, and LB1c from three light source devices LS1A, LS1B, and LS1C respectively, with the same linear polarization state, two electro-optic elements EOa and EOb are used. Therefore, in Figure 4 In the drawing data storage unit 100B within the control device 100 shown, information (bitmap information) regarding the on / off state of the drive signals SSa and SSb (high voltage DC potential) applied to the electro-optic elements EOa and EOb respectively is stored in association with the pixel map information of the pattern to be drawn.

[0125] As above Figure 14 As shown, by combining polarization beam splitters BS1, BS2, BS3 and electro-optic elements EOa, EOb, any one of the beams LB1a, LB1b, LB1c from the light source devices LS1A, LS1B, LS1C can be coaxially incident on the primary acousto-optic modulation element AM3 of the beam switching unit BD1B. Furthermore, to achieve coaxial synthesis, an amplitude-splitting type beam splitter without polarization separation characteristics is not used, thus suppressing the light intensity attenuation of each of the beams LB1a, LB1b, LB1c, and ensuring that their polarization directions are the same (P-polarization). Therefore, since the diffraction efficiencies of the beams LB1a, LB1b, LB1c passing through the acousto-optic modulation element AM3 (AM1) are the same, deviations in the light intensity (Spa, SPb, SPc) of the point lights projected onto the sheet substrate P can be suppressed.

[0126] Figure 15 This indicates that it was used. Figure 14 Beam combining section BD1A, Figure 6 This diagram illustrates an example of the pattern drawing operation of the beam switching unit BD1B and the drawing unit MU3 (or MU1). In this embodiment, the three LB1a, LB1b, and LB1c incident on the beam switching unit BD1B (acousto-optic modulation elements AM3, AM1) are respectively set coaxially with the optical axis AXs, so the three point lights SPa, SPb, and SPc are also projected onto the same position in the main scanning direction on the drawing line SL3 (SL1).

[0127] exist Figure 15 As an example, this example shows a pattern in which a rectangular pattern portion PT4, a line pattern portion PT5 extending in the Yt direction, and a diagonal pattern portion PT6 are connected in the Yt direction by a drawing unit MU3. Pattern portion PT4 has an inclined edge portion E4a that is inclined relative to the drawing line SL3 of the drawing unit MU3, and an edge portion E4b that extends linearly in the Xt direction. Diagonal pattern portion PT6 has inclined edge portions E6a and E6b that are inclined in the opposite direction to the inclined edge portion E4a.

[0128] about Figure 15 Such a pattern, when drawn along the drawing line SL3, in the area Ar1 on the drawing line SL3 that crosses the sloping edge E4a, is similar to the previous one. Figure 10 Similarly, pattern drawing is performed using a slotted (elongated elliptical) point light SPb tilted at -45 degrees, according to the pixel information of the drawing signal SDb and the clock signal CLK (SDb∩CLK) (pulsed emission of light source device LS1B). In region Ar2 on the drawing line SL3 containing the edge portion E4b of pattern portion PT4, pattern drawing is performed using a circular point light SPa, according to the pixel information of the drawing signal SDa and the clock signal CLK (SDa∩CLK) (pulsed emission of light source device LS1A). Furthermore, in region Ar3 on the drawing line SL3 containing the tilted edge portions E6a and E6b of pattern portion PT6, pattern drawing is performed using a slotted (elongated elliptical) point light SPc tilted at +45 degrees, according to the pixel information of the drawing signal SDc and the clock signal CLK (SDc∩CLK) (pulsed emission of light source device LS1C).

[0129] In the case of such a pattern depiction, regarding the application respectively to Figure 14 During the period from time Ts1 before the projection of point light SPb in region Ar1 to time Ts2 when the projection of point light SPb is switched on, only drive signal SSa is turned on. During the period from time Ts3 before the projection of point light SPc in region Ar3 to time Ts4 when the drawing of the tilted pattern portion PT6 in region Ar3 ends, both drive signals SSa and SSb are turned on.

[0130] Furthermore, the upper limit of the switching response frequency of electro-optic elements EOa and EOb is often lower than the pulse emission frequency of the light source devices LS1B and LS1C, which is 400MHz (period 2.5ns). Therefore, a time width (Ts2-Ts1 or Ts4-Ts3) that is greater than the minimum time width required for the drive signals SSa and SSb to be in the on state is set, and regions Ar1 and Ar3 (sloping edges E4a, E6a, and E6b) are set to enter this time width.

[0131] As described above, when depicting a pattern including a thin-lined oblique pattern portion PT6 and an inclined edge portion E4a, a circular spot light SPa and inclined groove-shaped (elongated elliptical) spot lights SPb and SPc are selectively projected at the same position in the main scanning direction. Therefore, as in Figure 11 As explained, it is not necessary to shift the data columns of the pixel bit information of the multiple pixels Pic arranged along the drawing line SLn by an amount equivalent to the number of pixels at intervals ΔYb and ΔYc. Therefore, the labor required to generate each data column is reduced.

[0132] Variation Example 3

[0133] As in the first embodiment described above, when configured to simultaneously scan multiple point lights SPa, SPb, and SPc on a sheet substrate P by rotating the faceted mirror PM, differences in sensitivity and thickness of the photosensitive layer (photoresist layer) formed on the surface of the sheet substrate P can be easily addressed. For example, in an exposure apparatus that uses only a single point light SPa (circle) for pattern drawing, the light beam LB1a emitted from the light source device LS1A is adjusted to the highest possible brightness in order to shorten the exposure processing time. Therefore, among the photoresists that can be used, there are recommended sensitivity ranges and recommended thickness ranges corresponding to the light intensity of the light beam LB1a. If the sensitivity of the photoresist layer used is quite low, or significantly thicker than the recommended thickness, it is difficult to increase the light intensity of the light beam LB1a (point light SPa), thus significantly reducing the rotation speed of the faceted mirror PM (scanning speed of the point light SPa) and the moving speed of the sheet substrate P in the sub-scanning direction.

[0134] That is, the supply exposure amount (supply dose) determined by the light intensity of the spot light SPa and the scanning exposure state (speed, etc.) is adjusted to match the necessary exposure amount (necessary dose) determined by the sensitivity and thickness of the resist layer formed on the sheet substrate P. In the first embodiment, any one, any two, or all of the three spot lights SPa, SPb, and SPc can be selectively projected from the drawing units MU1 to MU4, thus significantly expanding the adjustment range of the supply dose. Furthermore, the spot lights SPa, SPb, and SPc can be pulsed onto the sheet substrate P at high speed in units of pixels Pic in the drawing data, thus enabling, for example, a special exposure method that imparts a larger dose than usual to pixels corresponding to the edge of the pattern or pixels adjacent to it.

[0135] Figure 16 This diagram illustrates an example of a special exposure operation using the exposure apparatus of the first embodiment or variation 1, which increases the exposure amount applied to the peripheral edges of a plurality of rectangular patterns arranged in a matrix. The special exposure method, for example, as disclosed in International Publication No. 2019 / 049940, can be used when the resist layer formed on the sheet substrate P is negative and its thickness is several times to about 10 times that of a typical thickness (0.8 μm to 2 μm).

[0136] exist Figure 16 In this embodiment, when a pixel Pic in the depiction data is set to be 2 μm square on the sheet substrate P, the rectangular pattern PT7 is defined as having a size of 9 pixels (18 μm) in the Yt direction and 11 pixels (22 μm) in the Xt direction, and is arranged in a matrix with intervals of 3 pixels (6 μm) in both the Xt and Yt directions. Each rectangular pattern PT7 consists of a peripheral edge portion PT7a composed of pixels arranged linearly in both the Xt and Yt directions, and a rectangular pattern portion PT7b composed of 7 pixels × 9 pixels on its inner side. Assuming that the point lights SPa, SPb, and SPc are scanned, for example, along the depiction lines SL3a and SL3b of the depiction unit MU3 using the exposure apparatus of the first embodiment.

[0137] In this modified example, for each pixel (on-hook pixel) constituting the inner rectangular pattern portion PT7b, two pulses of circular spot light SPa are applied in both the Xt and Yt directions. For each pixel (on-hook pixel) constituting the peripheral edge portion PT7a, two pulses of groove-shaped (elongated elliptical) spot light SPb and SPc are applied in both the Xt and Yt directions, respectively, in addition to the two pulses of circular spot light SPa. Therefore, on the drawing line SL3a, based on the drawing signal SDa and the clock signal CLK, 18 pulses of circular spot light SPa corresponding to the entire width (9 pixels) of the rectangular pattern PT7 in the Xt direction are applied.

[0138] Furthermore, on the drawing line SL3a, in order to additionally expose the first pixel of the peripheral edge portion PT7a on the +Yt direction side constituting the rectangular pattern PT7 and the ninth pixel of the peripheral edge portion PT7a on the -Yt direction side, the amount of the two pulses SPb and SPc applied to the first pixel and the ninth pixel respectively is based on the drawing signals SDb, SDc and the clock signal CLK. Additionally, in the first embodiment, the three pulses SPa, SPb, and SPc are as described previously. Figure 10 As explained, the offset in the Yt direction is ΔYb and ΔYc, therefore, in this modified example, it is also as follows. Figure 11 As explained, the offset of the position (position of the bit) of the data column information corresponding to the pixel bit information depicting signals SDa, SDb, and SDc is the number of pixels corresponding to the interval ΔYb and ΔYc.

[0139] Furthermore, on the drawing line SL3b, an additional exposure is applied to a column of nine pixels arranged in the Yt direction as peripheral edge portion PT7a on the Xt direction side of the rectangular pattern PT7. Therefore, on the drawing line SL3b, in such a way that all pixels from the first pixel of the peripheral edge portion PT7a on the +Yt direction side of the rectangular pattern PT7 to the ninth pixel of the peripheral edge portion PT7a on the -Yt direction side are additionally exposed, the light intensity of each illumination point SPa, SPb, SPc of the nine pixels from the first pixel to the ninth pixel is 2 pulses based on the drawing signals SDa, SDb, SDc and the clock signal CLK.

[0140] In this modified example, the pixel to be exposed (the active pixel) is continuously illuminated by a circular spot light SPPa, a slotted spot light SPb tilted at -45 degrees, and a slotted spot light SPc tilted at +45 degrees. Therefore, with the light intensity of each spot light being the same, the pixel to be exposed is given a maximum exposure of about 3 times. However, there are also cases where the exposure required for the additional exposure is only about 1.5 times or 2 times. In this case, a light-reducing component that can variably adjust the beam intensity can be provided in the optical path of the beams LB1b and LB1c emitted from the light source devices LS1B and LS1C, so that the light intensity of the slotted spot lights SPb and SPc used in the additional exposure is reduced to about 25% and 50% of the light intensity of the spot light SPPa, respectively. As such a light-reducing component, it is preferable to have a structure in which the beams LB1b and LB1c from the light source devices LS1B (LS1C) pass through in the order of a rotatable half-wave plate and a polarizing beam splitter. In this case, by rotating the 1 / 2 wavelength plate around the center ray of the beam, the intensity of the beam reflected (or transmitted) by the polarizing beam splitter can be continuously adjusted within a range of, for example, 10% to 90%.

[0141] In this modified example, during additional exposure, slotted point lights SPb and SPc, tilted at +45 degrees, are overlapped and irradiated onto the pixels constituting the peripheral edge portion PT7a. Therefore, the light intensity distribution caused by the overlap of the two point lights SPb and SPc is approximately a quadrilateral with rounded corners. Thus, within the entire device formation area to be exposed on the sheet substrate P, as... Figure 16 As shown, when only the peripheral edge portion PT7a extending along the Xt and Yt directions is included, but the inclined edge portion and the diagonal pattern are not included, the pixels (connected pixels) of the peripheral edge portion PT7a can also be exposed by the overlap of two point lights SPb and SPc.

[0142] Variation Example 4

[0143] In the first embodiment, the second embodiment, and various modifications described above, the acousto-optic modulation elements AM1 and AM3 (AM2 and AM4), arranged in series within the beam switching unit BD1B (BD2B), switch and supply three beams Bna, Bnb, and Bnc (n = 1 to 4) generated from the three light source devices LS1A, LS1B, and LS1C (LS2A, LS2B, and LS2C) to one of the multiple drawing units MUn. However, it is also possible to configure the beams used for drawing from the two light source devices to be directly supplied to one drawing unit without going through the beam switching unit BD1B (BD2B).

[0144] Figure 17 This is a diagram showing a schematic structure of the beam combining section in Modification Example 4, which uses only two light source devices. Figure 17 In the middle, compared with the previous Figure 1 , Figure 4 Components shown are labeled with the same reference numerals, and their detailed descriptions are omitted. In this modified example, the light beams LB1b and LB1c from the two light source devices LS1B and LS1C are reflected by mirrors M50 and M52 respectively and incident on the light source. Figure 4 (as well as Figures 5A-5C The beam shape deformation parts 10B and 10C are shown in the diagram. Additionally, in... Figure 17 In the process, the light beam LB1b from the light source device LS1B is emitted in the +X direction parallel to the XY plane of the vertical coordinate system XYZ, and the light beam LB1c from the light source device LS1C is emitted in the -X direction parallel to the XY plane with an arrangement approximately coaxial with the light beam LB1b.

[0145] The beam compression system OM2 (see reference) is installed in the beam shape deformation section 10B. Figures 5A-5C The overall configuration is set to be able to orbit the central ray of the incident beam LB1b. Figures 5A-5CThe optical axis AXb rotates. The beam compression system OM2 is configured to rotate 45° at a time via a drive mechanism 20B that includes an actuator such as a motor or air piston. Therefore, the beam LB1b emitted from the beam shape deformation section 10B in the +Y direction is converted into a parallel beam with a groove-shaped (elongated elliptical) cross-sectional distribution in the YZ plane. Similarly, the beam compression system OM2 (see reference 10C) installed in the beam shape deformation section 10C rotates 45° at a time. Figures 5A-5C The entire beam is configured to be able to orbit the central ray of the incident beam LB1c. Figures 5A-5C The optical axis AXc rotates and is set to rotate 45° each time by a drive mechanism 20C that includes actuators such as a motor and an air piston. Therefore, the beam LB1c emitted from the beam shape deformation section 10C in the +Y direction is converted into a parallel beam with a cross-sectional distribution in the YZ plane that is groove-shaped (long elliptical).

[0146] The beam LB1b from the beam shape deformer 10B is reflected in the +X direction by the reflector M51 and then projected onto one reflecting surface of the V-shaped reflector M54. Similarly, the beam LB1c from the beam shape deformer 10C is reflected in the -X direction by the reflector M53 and then projected onto the other reflecting surface of the V-shaped reflector M54. One reflecting surface and the other reflecting surface of the V-shaped reflector M54 are set to intersect at a predetermined angle to form a [symmetric structure]. Figure 17 The Z-axis parallel edge line in the image. The edge line (parallel to the Z-axis) of the V-shaped reflector M54 is set as follows: Figure 17 When viewed in the XY plane, for example, relative to the optical axis AXu1 of the depiction unit MU1 (refer to...) Figure 2 )vertical.

[0147] The light beams LB1b and LB1c, reflected by one surface of the V-shaped mirror M54 and the other surface of the V-shaped mirror M54 respectively, pass through mirrors M51, M53, and M54. They propagate in the +Y direction, parallel to and symmetrically approaching the optical axis AXu1 in the XY plane, and are incident on prism block 22. Prism block 22 has ridges extending parallel to the Z-axis in a manner perpendicular to the optical axis AXu1, causing the incident light beams LB1b and LB1c to be refracted (deflected) towards the optical axis AXu1 by a predetermined angle (e.g., less than 1°). The two light beams LB1b and LB1c passing through prism block 22 are incident on the plane Pe' (perpendicular to the optical axis AXu1). Figure 8 The plane Pe' in the middle intersects with the optical axis AXu1 and then advances while expanding and incident on the drawing unit MU1.

[0148] With the above structure, on the sheet substrate P, only the two point beams SPb and SPc formed by the beams LB1b and LB1c projected from the drawing unit MU1 converge. In this modified example, each of the two point beams SPb and SPc has a groove-shaped (elongated elliptical) intensity distribution, and the long axis direction of this distribution can be changed by 45° each time on the sheet substrate P by the drive mechanisms 20B and 20C. In addition, the amount of change in the rotation angle of the beam compression system OM2 in the beam shape deformation section 10B and 10C based on the drive mechanisms 20B and 20C can be set in 12 stages of 15° each within a range of ±90°, or it can be set steplessly to any angle.

[0149] In this modified example, when drawing a pattern using only two slotted (elongated elliptical) point lights SPb and SPc, it is determined beforehand which pattern portion (a straight edge extending in the main scanning direction or the sub-scanning direction, or an inclined edge, etc.) is contained in the pattern to be drawn by the drawing unit MU1 at which position in the sub-scanning direction on the sheet substrate P. Correspondingly, the drive mechanisms 20B and 20C rotate the major axis of each point light SPb and SPc beforehand (just before drawing the corresponding edge portion). As in the previous... Figure 9A As explained in the text, 45-degree diagonal lines are frequently used in the wiring patterns within electronic devices. Figure 9A In addition to PT2, line patterns and pattern edges are also used that are inclined at about 30 degrees or 60 degrees relative to the main scanning direction or the sub-scanning direction. Considering this, it is preferable that the long axis of each of the point lights SPb and SPc with groove-shaped (elongated elliptical) intensity distribution is inclined at a range of +25 degrees to 65 degrees or -25 degrees to 65 degrees relative to the main scanning direction or the sub-scanning direction.

[0150] Figures 18A to 18D This diagram schematically illustrates the combination of the long axis directions of the point lights SPb and SPc, which switch according to the directionality of the edge of the pattern. Figure 18A Compared to the previous Figure 10 Similarly, the states described above represent the cases where the centers of point lights SPb tilted at -45 degrees and SPc tilted at +45 degrees are located in the Yt(Y) direction on a single drawing line SLn at intervals of (ΔYb+ΔYc). The pattern drawn by the drawing unit MU1 is as described above. Figure 16 As explained, in the case where the structure consists only of straight edge portions extending in the Xt and Yt directions, the pulsed emission of light beams LB1b and LB1c from the light source devices LS1B and LS1C is controlled, so that point lights SPb and SPc, tilted at ±45 degrees, are projected overlappingly onto the connected pixels in all pixel Pics of the depicted data that should be illuminated. Furthermore, as... Figure 18A As shown, the initial state is set as follows: the point light SPb is tilted at -45 degrees and the point light SPc is tilted at +45 degrees.

[0151] Figure 18B This shows the state where the point light SPc is rotated 90 degrees counterclockwise from its initial tilt angle by the drive mechanism 20C. Figure 18C This illustrates the state where the point light SPb is rotated 90 degrees clockwise from its initial tilt angle via the drive mechanism 20B. (As shown...) Figure 18B or Figure 18C As shown, by tilting two point lights SPb and SPc in the same direction and projecting them onto the connected pixels (Pic) of the tilted edge or diagonal pattern in an overlapping manner, the exposure of the pixels at the edge can be increased.

[0152] in addition, Figure 18D The diagram illustrates the states where point light SPb is rotated 45 degrees clockwise from its initial tilt position, and point light SPc is rotated 45 degrees counterclockwise from its initial tilt position, via drive mechanisms 20B and 20C. Figure 18D In this case, both point lights SPb and SPc are set to have their major axis direction perpendicular to the drawing line SLn. Figure 18D The setting is particularly suitable for drawing straight line patterns that extend in a direction parallel or perpendicular to the drawing line SLn.

[0153] As described above, the change (switching) of the long axis direction of the rotating point lights SPb and SPc in the beam compression system OM2 based on the drive mechanisms 20B and 20C cannot be performed in a single scan of the point lights SPb and SPc along the drawing line SLn. Therefore, the switching operation is performed if necessary when the time required for the switching operation in the long axis direction of the point lights SPb and SPc is shortened relative to the time it takes for the sheet substrate P to move in a region where no pattern drawing is performed (a region with discontinuous pixel continuity that is not irradiated by the point light pulses SPb and SPc).

[0154] Modified Example 5

[0155] Figure 19This diagram schematically illustrates the optical structure for creating two slotted (elongated elliptical) point beams SPb and SPc using a beam LBe from a single light source device LSe. For ease of explanation, it is assumed that the beam LBe from the light source device LSe is emitted parallel to the X-axis of the vertical coordinate system XYZ. The light source device LSe is the same fiber amplifier laser source (oscillating ultraviolet pulses at a frequency of 400MHz with a wavelength of 355nm) as the previously described light source devices LS1B and LS1C. The P-polarized beam LBe (a parallel beam with a circular cross-sectional distribution of approximately 0.5–1 mm in diameter) from the light source device LSe is incident on the optical structure of the previously described light source device LSe. Figure 14 The electro-optic element EOc described above is the same as the electro-optic element EOa and EOb. When the electro-optic element EOc is driven by a driving signal SSc (a high voltage DC potential) (in the on state), it converts the incident light beam LBe from P-polarized light to S-polarized light and emits it. When the driving signal SSc is not applied (in the off state), it directly emits the P-polarized light beam LBe.

[0156] The light beam LBe from the electro-optic element EOc, traveling parallel to the Y-axis in the +Y direction, is bent into a right angle by the reflector M55 and then incident on the beam amplification system OM1 (see reference). Figures 5A-5C The beam amplification system OM1 magnifies the diameter of the incident beam LBe into a parallel beam magnified approximately 10 times and directs it towards the polarizing beam splitter BS4. The polarizing beam splitter BS4, acting as the beam divider, allows the beam LBe to pass directly when it is P-polarized and reflects it at a right angle when it is S-polarized. Here, if the P-polarized beam LBe passing through the polarizing beam splitter BS4 is designated as beam LB1c, and the S-polarized beam LBe reflected by the polarizing beam splitter BS4 is designated as beam LB1b, then the split beams LB1c and LB1b will travel in different optical paths.

[0157] The beam LB1b (S-polarized light) from polarization beam splitter BS4 passes through the half-wave plate HWP, is converted into P-polarized light with its polarization direction rotated by 90 degrees, and then enters the beam compression system OM2b, which functions as a beam shape deformer. Similarly, the beam LB1c (P-polarized light) from polarization beam splitter BS4 passes through the half-wave plate HWP, is converted into S-polarized light with its polarization direction rotated by 90 degrees, and then enters the beam compression system OM2c, which also functions as a beam shape deformer. Beam compression systems OM2b and OM2c are respectively derived from the previous... Figures 5A-5C or Figure 13 The optical components shown are similarly configured to form a relative 90-degree angle around the central rays (optical axes) of each beam LB1b and LB1c.

[0158] The beam LB1b, having passed through the beam compression system OM2b, is reflected at a right angle by the mirror M57 in a manner parallel to the Y-axis and propagates in the +Y direction, entering the polarization beam splitter BS5. Simultaneously, the beam LB1c, traveling in the -X direction through the beam compression system OM2c, enters the polarization beam splitter BS5. The polarization beam splitter BS5, serving as a beam combining unit, is configured to allow the P-polarized beam LB1b to pass through, reflect the S-polarized beam LB1c, and coaxially combine the beams LB1b and LB1c. The beams LB1b and LB1c emitted from the polarization beam splitter BS5 in the +Y direction pass through... Figures 5A-5C The beam reduction system OM3, which has the same structure as shown, is converted into a parallel beam that reduces the beam diameter to about 1 / 10.

[0159] Beams LB1b and LB1c, passing through beam reduction system OM3, are split into beams B1b and B1c by amplitude-splitting beam splitter BS6, respectively, and are incident on the drawing unit MU1 coaxially with the optical axis AXu1. Additionally, beam LB1a (a parallel beam with a circular cross-section distribution of approximately 0.5 to 1 mm in diameter) from light source device LS1A, which is manufactured with the same characteristics as light source device LSe, is reflected by beam splitter BS6, becoming beam B1a, and is also incident on the drawing unit MU1 coaxially with the optical axis AXu1. Beam splitter BS6 is configured to coaxially combine the three beams B1a, B1b, and B1c, but approximately half of the light intensity of each of the incident beams B1a, B1b, and B1c is absorbed by beam trap TRc located on the -X side of beam splitter BS6.

[0160] In this modified example, when the electro-optic element EOc is in the off state and the pixel value of the drawing signal SDc supplied to the light source device LSe is "1", the light source device LSe emits a pulsed light beam LBe. Since the electro-optic element EOc is in the off state, the beam LBe (P-polarized light) passes through the polarization beam splitter BS4, is converted into S-polarized light by the 1 / 2 wavelength plate HWP, is reflected by the polarization beam splitter BS5 by the beam compression system OM2c, and becomes the beam B1c that generates the point light SPc by the beam reduction system OM3 and the beam splitter BS6, and is supplied to the drawing unit MU1. When the electro-optic element EOc is in the on state and the pixel value of the drawing signal SDb supplied to the light source device LSe is "1", the light source device LSe emits a pulsed light beam LBe. Since the electro-optic element EOc is in the ON state, the P-polarized beam LBe is converted into S-polarized light, reflected by the polarization beam splitter BS4, and converted back into P-polarized light by the 1 / 2 wavelength plate HWP. It then passes through the beam compression system OM2b and the polarization beam splitter BS5, and through the beam reduction system OM3 and the beam splitter BS6 to become the beam B1b that generates the point light SPb, which is then supplied to the drawing unit MU1.

[0161] In this variation, an electro-optic element EOc is also used to switch between point light SPb and point light SPc. Therefore, in Figure 4 In the drawing data storage unit 100B within the control device 100 shown, information (bitmap information) regarding the on / off state of the drive signal SSc applied to the electro-optic element EOc is stored in association with the pixel map information of the pattern to be drawn. By switching the electro-optic element EOc on / off, the direction of the linearly polarized light of the beam LB1b emitted from the beam compression system OM2b, which serves as a beam shape deformation unit, is complementaryly switched with the direction of the linearly polarized light of the beam LB1c emitted from the beam compression system OM2c, which also serves as a beam shape deformation unit.

[0162] In this modified example, the circular point light SPa of the beam B1a from the light source device LS1A responds to the pixel bit value "1" of the drawing signal SDa and the clock signal CLK, and can always be projected onto the sheet substrate P as pulse light. On the other hand, the point light SPb formed by the beam B1b generated from the beam LBe from the light source device LSe and the point light SPc formed by the beam B1c are projected onto the sheet substrate P as pulse light only by switching between the off and on states of the electro-optic element EOc, responding to the pixel bit value "1" of the drawing signals SDb and SDc and the clock signal CLK.

[0163] Therefore, in this modified example, for edge pixels forming inclined edges or diagonal patterns, it is possible to overlap exposure not only with slot-shaped (elongated elliptical) point lights SPb or SPc, but also with circular point lights SPa. In this case, it is also possible to increase the exposure of edge pixels and reduce the jaggedness of the edges.

[0164] Variation Example 6

[0165] Figure 20 This diagram schematically illustrates the structure of a modified example of a light source device and a beam combining section BD1A (BD2A) including beam shape deformation sections 10B and 10C. In this modified example, it is configured to transmit light from... Figure 19 The light source device LSe shown has a beam LBe and a light source from... Figure 4 The light source device LS1A shown generates a circular point light SPa and two slotted (elongated elliptical) point lights SPb and SPc from its beam LB1a, and also uses... Figure 6 The beam switching unit BD1B (BD2B) shown can perform pattern exposure for each of the multiple drawing units MU1 to MU4.

[0166] exist Figure 20 In this process, a beam of light LBe (a parallel beam with a circular cross-section of approximately 0.5–1 mm in diameter) emitting pulses at a frequency of 400 MHz in the ultraviolet wavelength region from the light source LSe is incident on the acousto-optic modulation element AM5 under Bragg diffraction conditions. The acousto-optic modulation element AM5 is switched between an on state (diffraction light generation state) and an off state by a drive signal SSe. When the acousto-optic modulation element AM5 is off, the incident beam LBe passes directly through and is coaxially incident on the lens GK7. The acousto-optic modulation element AM5 is positioned at the front focal point of the lens GK7, and the reflection mirror IM5 is positioned at the rear focal point of the lens GK7. Therefore, Figure 20 The configurations of the AM5 acousto-optic modulation element, GK7 lens, and IM5 mirror are the same as before. Figure 7A , Figure 7B The configurations of the acousto-optic modulation element AM3, lens GK3, and incident mirror IM3 described herein are identical.

[0167] The light beam LBe, passing through the disconnected acousto-optic modulator AM5 and then through lens GK7, converges in the space above the incident mirror IM5 in a waisted manner, and then diverges while being incident on lens GK9 coaxially with the optical axis. The front focal point of lens GK9 is configured to coincide with the rear focal point of lens GK7. At the rear focal point of lens GK9, it is switched between an on state (diffraction light generation state) and an off state according to the drive signal SSf, and an acousto-optic modulator AM6 configured under Bragg diffraction conditions is provided. The light beam LBe passing through lens GK9 becomes a parallel beam with the same beam diameter as the beam incident on the primary acousto-optic modulator AM5.

[0168] When the acousto-optic modulation element AM6 is in the ON state, such as Figure 20 As shown, a beam LB1c (parallel beam) is generated as the first diffracted beam of beam LBe. Beam LB1c passes through lens GK10, converges at the position of the reflector IM6 in a waisted manner, and is reflected at a right angle by the reflector IM6, then enters lens GK11 coaxially with the optical axis. Here, an acousto-optic modulation element AM6 is positioned at the front focal point of lens GK10, and the reflector IM6 is positioned at the rear focal point of lens GK10. Furthermore, the position of the front focal point of lens GK11 is set to be the same as the position of the rear focal point of lens GK10 (the position of the reflector IM6). Therefore, beam LB1c, after passing through lens GK11, becomes a parallel beam again, is reflected by the reflector M59, and enters the previous... Figure 4 ( Figures 5A-5C )or Figure 13 The beam shape deformation section 10C shown.

[0169] On the other hand, when the primary acousto-optic modulation element AM5 is in the on state, a beam LB1b is generated as a first-order diffracted beam of the beam LBe incident on the acousto-optic modulation element AM5. This beam LB1b (parallel beam) is converged by lens GK7, reflected by mirror IM5, and incident on lens GK8 in a state coaxial with the optical axis. The front focal point of lens GK8 is set at the position of the rear focal point of lens GK7 (the position of mirror IM5), so the beam LB1b passing through lens GK8 becomes a parallel beam again, is reflected by mirror M58, and incident on the previous... Figure 4 ( Figures 5A-5C )or Figure 13 The beam shape deformation section 10B shown.

[0170] Figure 20 The beam shape deformation parts 10B and 10C shown can also be as before. Figure 13As explained, by rotating the beam compression system OM2 of each of the drive mechanisms 20B and 20C, the compression directions of beams LB1b and LB1c rotate around the optical axis. The beams LB1b and LB1c emitted from the beam shape deformation sections 10B and 10C respectively interact with... Figure 4 Similarly, after being reflected by mirrors M3B and M3C, it passes through wedge-shaped prisms 12B and 12C, advancing at a predetermined angle to the optical axis AXs of the beam switching unit BD1B (BD2B). Furthermore, with... Figure 4 Similarly, the light beam LB1a from the light source device LS1A passes between reflectors M3B and M3C in a manner coaxial with the optical axis AXs of the beam switching unit BD1B (BD2B). This light beam LB1a and... Figure 4 Similarly, it is supplied to the beam switching unit BD1B (BD2B) via the parallel plate 12A.

[0171] Based on the above structure, in this modified example, any one of the following can be selectively projected from the drawing units MU1 and MU3 (MU2 and MU4): a circular point light SPa based on beam LB1a (LB2a), a slotted (elliptical) point light SPb based on beam LB1b (LB2b) tilted at -45 degrees, and a slotted (elliptical) point light SPb based on beam LB1c (LB2c) tilted at +45 degrees onto the sheet substrate P. Alternatively, any one of the slotted (elliptical) point lights SPb and SPc and the circular point light SPa can be simultaneously projected onto the sheet substrate P.

[0172] When the pulse oscillation frequency Fp of the light source device LS1A and the light source device LSe is set to 400MHz, considering Figure 20 The highest switching frequency Fss of the acousto-optic modulation elements AM5 and AM6 shown is approximately 50MHz to 100MHz. The timing of applying the drive signals SSc and SSd, which switch the acousto-optic modulation elements AM5 and AM6 to the on or off state respectively, is relative to the position of the edge pixel or diagonal pattern that should be depicted by the slotted (elongated elliptical) point lights SPb and SPc, for example, with... Figure 15 The drive signals SSa and SSb described above are also executed a few pixels in advance. For example, when irradiating each point light SPa, SPb, and SPc with n pulses along the main scanning direction onto one pixel, the timing of applying drive signals SSC and SSd is controlled to precede the value calculated by Fp / n·Fss by at least a certain number of pixels. Therefore, when Fp = 400MHz, Fss = 50MHz, and n = 2, it is sufficient to apply either drive signal (high-frequency signal) SSe or SSf at a pixel position that precedes the main scanning direction by at least 4 pixels.

[0173] In this modified example, two acousto-optic modulation elements, AM5 and AM6, are used to switch between point light SPb and point light SPc. Therefore, in Figure 4 The control device 100 shown includes a drive circuit (such as a high-frequency signal application amplifier) ​​for applying drive signals SSe and SSf to the acousto-optic modulation elements AM5 and AM6, respectively. In the drawing data storage unit 100B, information (bitmap information) regarding the on / off state of these drive signals SSe and SSf is stored in association with the pixel map information of the pattern to be drawn. Furthermore, the beam switching mechanism in this modified example, composed of the acousto-optic modulation elements AM5 and AM6, lenses GK7 to GK11, and incident mirrors IM5 and IM6, functions as a beam splitting section that splits the beam LBe from a single light source device LSe into two beams LB1b and LB1c that travel along different optical paths. Moreover, the reflectors M3B and M3C, and the wedge-shaped prisms 12B and 12C in this modified example function as a beam combining section that combines the two beams LB1b and LB1c, whose cross-sectional shape has been deformed from a circle by the beam shape deformation sections 10B and 10C.

[0174] According to this variation, such as Figure 20 As shown, the polarization directions of the two beams LB1b (for spot light SPb) and LB1c (for spot light SPc) generated by the beam LBe from a single light source device LSe can be aligned with the polarization direction of the beam LB1a (for spot light SPa) generated by a single light source device LS1A. Therefore, the acousto-optic modulation elements AM1 to AM4 can sequentially supply beams from each light source device to multiple drawing units MU1 to MU4 in a time-division manner. Furthermore, in this modified example, it is also consistent with the previous... Figure 17 Similarly, by means of drive mechanisms 20B and 20C, the directionality (major axis direction) of point lights SPb and SPc, which are transformed from circular shapes into anisotropic shapes (grooves, elongated ellipses), can be changed, so that the point shape can be easily set to the angle of the oblique edge of the pattern to be depicted.

[0175] Furthermore, in this modified example, for pixels with pattern edges extending linearly in the main scanning direction (Yt direction) and the sub-scanning direction (Xt direction), or pixels with pattern edges tilted relative to the Yt and Xt directions, it is possible to appropriately select either a groove-shaped (elongated elliptical) point light SPb or SPc and a circular point light SPa, or only either a deformed point light SPb or SPc, or only a circular point light SPa for projection.

[0176] In the first embodiment, second embodiment, and various modifications described above, the point lights SPb and SPc are modified from the circular point light SPa into groove-shaped or elongated elliptical shapes, but they can also be modified into other shapes. For example, the point light SPb (or SPc) can also be set as a rectangular, square, or rhomboid quadrilateral. However, in this case, according to the... Figure 2 The minimum point size is determined by the relationship between the numerical aperture (NA) of the beam B1b projected onto the sheet substrate P by the fθ lens system FT and the second cylindrical lens CYb and the wavelength λ of the beam B1b (from the light source device). Therefore, when the point light SPb is quadrilateral, it is preferable to set it to a size that is sufficiently large (e.g., more than three times the minimum point size) based on the effects of diffraction and aberration. Even when the point lights SPb and SPc are both quadrilateral, if the directions of their diagonals are different, they are treated as point lights deformed into different shapes.

Claims

1. A pattern exposure apparatus comprising a drawing unit that draws a pattern on a substrate by scanning a spot light formed by a light beam supplied from a light source device along a main scanning direction, wherein, The pattern exposure device has: The first light source device emits the first beam of light; A second light source device that emits a second beam of light; The beam combining unit combines the first beam from the first light source device and the second beam from the second light source device in such a way that they are respectively incident on the drawing unit; A beam shape deformation section that makes the cross-sectional shapes of the first beam and the second beam incident on the beam combining section different from each other, so that the shape of the first point light formed by the first beam projected onto the substrate is different from the shape of the second point light formed by the second beam. as well as A control device that controls the drawing of at least the edge portion of a pattern drawn on the substrate using either or both of the first point light and the second point light.

2. The pattern exposure apparatus according to claim 1, wherein, The beam combining unit combines the first beam and the second beam in such a way that they are incident on the drawing unit along the optical axis of the drawing unit.

3. The pattern exposure apparatus according to claim 1 or 2, wherein, The cross-sectional shape of both the first beam from the first light source device and the second beam from the second light source device is circular. The beam shape deformation part includes: The first beam shape deformation section deforms the cross-sectional shape of the first beam from a circle to a groove or an elongated ellipse; and The second beam shape deformation section deforms the cross-sectional shape of the second beam from a circle to a groove or an elongated ellipse.

4. The pattern exposure apparatus according to claim 3, wherein, The direction of the major axis of the cross-sectional shape of the first beam emitted from the first beam shape deformation section and the direction of the major axis of the cross-sectional shape of the second beam emitted from the second beam shape deformation section are set to be different from each other, so that the major axis of the first point light deformed into the groove shape or the long ellipse shape and the major axis of the second point light deformed into the groove shape or the long ellipse shape are oriented in different directions on the substrate.

5. The pattern exposure apparatus according to claim 3, wherein, The first beam shape deformation section and the second beam shape deformation section each include a beam compression system that compresses a beam with a circular cross-sectional shape in one direction.

6. The pattern exposure apparatus according to claim 5, wherein, The beam compression system includes two cylindrical lenses separately arranged along the optical axis, which cause a circular beam incident as a parallel beam to be emitted as a parallel beam with a cross-sectional shape deformed into the groove or elongated ellipse shape.

7. The pattern exposure apparatus according to claim 3, wherein, The major axis of the first point light, which is deformed into the groove or elongated ellipse shape, is set to be tilted within the range of +25 degrees to +65 degrees relative to the main scanning direction. The major axis of the second point light, which is deformed into the groove or elongated ellipse shape, is set to be tilted within the range of -25 degrees to -65 degrees relative to the main scanning direction.

8. The pattern exposure apparatus according to claim 3, wherein, When the edge of the pattern drawn on the substrate is an inclined edge that extends obliquely relative to the main scanning direction, the control device controls the emission of the first light beam from the first light source device and the emission of the second light beam from the second light source device to project the point light of the first point light and the second point light corresponding to the inclination of the inclined edge onto the substrate.

9. The pattern exposure apparatus according to claim 8, wherein, The pattern exposure apparatus also has a third light source device that emits a third beam with a circular cross-sectional shape. The beam combining section projects the circular third point light formed by the third beam onto the substrate in such a way that the third beam, together with the first beam and the second beam, which are deformed into the groove shape or elongated ellipse shape, are incident along the optical axis of the drawing unit.

10. The pattern exposure apparatus according to claim 9, wherein, The control device controls the emission of the first beam from the first light source device and the emission of the second beam from the second light source device for the inclined edge portion of the pattern drawn on the substrate, such that either the first point light or the second point light is projected onto the substrate. Furthermore, for the pattern portion other than the inclined edge portion, the emission of the third beam from the third light source device is controlled in such a way that the third point light is projected onto the substrate.

11. A pattern exposure apparatus comprising a drawing unit that draws a pattern on a substrate by scanning a spot light formed by a light beam supplied from a light source device along a main scanning direction, wherein, The pattern exposure device has the following features: A light splitting section that splits a circular cross-sectional light beam emitted from the light source device into a first beam and a second beam; The first beam shape deformation part is provided in the optical path of the first beam to deform the cross-sectional shape of the first beam from a circle, so that the shape of the first point light generated on the substrate by the projection of the first beam becomes the first shape. The second beam shape deformation part is provided in the optical path of the second beam to deform the cross-sectional shape of the second beam from a circle, so that the shape of the second point light generated on the substrate by the projection of the second beam becomes a second shape that is different from the first shape. A beam combining unit combines the first beam from the first beam shape deformation unit and the second beam from the second beam shape deformation unit in such a way that they are incident on the drawing unit; as well as A control device that controls the drawing of a pattern on the substrate using either the first point light or the second point light.

12. The pattern exposure apparatus according to claim 11, wherein, The beam combining unit combines the first beam and the second beam in such a way that they are incident on the drawing unit along the optical axis of the drawing unit.

13. The pattern exposure apparatus according to claim 11 or 12, wherein, The first beam shape deformation section deforms the cross-sectional shape of the first beam so that the first shape of the first point beam is deformed into a groove or elongated ellipse with a major axis inclined relative to the main scanning direction. The second beam shape deformation section deforms the cross-sectional shape of the second beam so that the second shape of the second point light is deformed into a groove or elongated ellipse having a major axis that is inclined opposite to the first shape relative to the main scanning direction.

14. The pattern exposure apparatus according to claim 13, wherein, The first beam shape deformation section and the second beam shape deformation section respectively include a beam compression system that compresses a beam with a circular cross-section in one direction to make the cross-section shape into a groove or an elongated ellipse.

15. The pattern exposure apparatus according to claim 14, wherein, The beam compression system includes two cylindrical lenses separately arranged along the optical axis, which cause a circular beam incident as a parallel beam to be emitted as a parallel beam with a cross-sectional shape deformed into the groove or elongated ellipse shape.

16. The pattern exposure apparatus according to claim 13, wherein, The major axis of the first point light, which is deformed into the groove or elongated ellipse shape, is set to be tilted within the range of +25 degrees to +65 degrees relative to the main scanning direction. The major axis of the second point light, which is deformed into the groove or elongated ellipse shape, is set to be tilted within the range of -25 degrees to -65 degrees relative to the main scanning direction.

17. The pattern exposure apparatus according to claim 13, wherein, The beam combining section is composed of a polarizing beam splitter that has transmissivity or reflectivity depending on the direction of the linearly polarized light. The pattern exposure apparatus also includes an electro-optic element that complementaryly switches the direction of linearly polarized light from the first beam from the first beam shape deformer and the second beam from the second beam shape deformer.

18. The pattern exposure apparatus according to claim 17, wherein, When the edge of the pattern drawn on the substrate is an inclined edge that extends obliquely relative to the main scanning direction, the control device controls the electro-optic element so that the point light of the first point light and the second point light corresponding to the inclination of the inclined edge is projected onto the substrate.

19. The pattern exposure apparatus according to claim 18, wherein, The pattern exposure apparatus also has a second light source device that emits a third beam with a circular cross-sectional shape. The beam combining section projects the circular third point light formed by the third beam onto the substrate in such a way that the third beam, together with the first beam or the second beam which is deformed into the groove or elongated ellipse shape, is incident along the optical axis of the drawing unit.

20. The pattern exposure apparatus according to claim 19, wherein, The control device controls the emission of the light beam from the light source device and the driving of the electro-optic element for the inclined edge of the pattern drawn on the substrate, such that either the first point light or the second point light is projected onto the substrate. Furthermore, the emission of the third beam from the second light source device is controlled for the pattern portion other than the inclined edge portion, in such a way that the third point light is projected onto the substrate.

21. A pattern exposure method, the pattern exposure method using a drawing unit, the drawing unit scanning a point light formed by a light beam supplied from a light source device along a main scanning direction according to pixel information of each pixel specified in drawing data to draw a pattern on a substrate, wherein, When the column of pixels scanned along the main scanning direction includes edge pixels that form the edge portion of a pattern that extends obliquely to the main scanning direction, the shape of the point light projected onto the edge pixels is at least set to a groove or elongated ellipse with the major axis inclined in the direction of the oblique extension of the pattern.

22. The pattern exposure method according to claim 21, wherein, The shape of the point light projected onto pixels other than the edge pixels is set to a circle.

23. The pattern exposure method according to claim 22, wherein, The effective size of the circular point light projected onto the substrate is set to be within ±50% of the size of the pixel on the substrate.

24. The pattern exposure method according to claim 23, wherein, The effective size of the major axis of the slotted or elongated elliptical point light projected onto the substrate is set to be equal to the diagonal size of the pixel on the substrate.

25. The pattern exposure method according to any one of claims 22 to 24, wherein, The light source device has: A first light source device emits a first beam of light, which is a slotted or elongated elliptical first point light beam with its major axis tilted within a range of +25 degrees to +65 degrees relative to the main scanning direction; and The second light source device emits a second beam of light, which is a slotted or elongated elliptical second point light beam with its major axis tilted within the range of -25 degrees to -65 degrees relative to the main scanning direction. When depicting edge pixels corresponding to the edge portion, the control is configured to supply either the first light beam from the first light source device or the second light beam from the second light source device to the depicting unit.

26. The pattern exposure method according to any one of claims 22 to 24, wherein, The light source device has: A first light source device emits a beam for generating a first point light and a second point light, wherein the first point light is in a slotted or elongated elliptical shape with its major axis tilted relative to the main scanning direction within a range of +25 degrees to +65 degrees, and the second point light is in a slotted or elongated elliptical shape with its major axis tilted relative to the main scanning direction within a range of -25 degrees to -65 degrees; and The second light source device emits a beam of light to generate the third point light in the circle.

27. The pattern exposure method according to claim 26, wherein, The light beam from the first light source device is split into a first light beam for generating the first point light and a second light beam for generating the second point light. After deforming the cross-sectional shape of the split first beam and the second beam into the groove shape or the elongated ellipse shape, either the first beam or the second beam is supplied to the drawing unit along the optical axis within the drawing unit.

28. The pattern exposure method according to claim 27, wherein, The light beam from the first light source device is split into the first beam and the second beam using electro-optic elements and a polarizing beam splitter. The electro-optic element switches the polarization direction of the light beam from the first light source device via electrical control. The polarization beam splitter divides the light beam that has passed through the electro-optic element into a path of light that is transmitted according to the polarization state and a path of light that is reflected according to the polarization state.

29. The pattern exposure method according to claim 27, wherein, The device is equipped with a first acousto-optic modulation element and a second acousto-optic modulation element, which are configured to allow the light beam from the first light source to pass through in series. The first diffracted beam generated when only the first acousto-optic modulation element is in the ON state is used as the first beam. The first diffracted beam of the beam generated when only the second acousto-optic modulation element is in the on state is used as the second beam.

30. A pattern exposure apparatus comprising a drawing unit that draws a pattern on a substrate by scanning a spot light formed by a light beam supplied from a light source device along a main scanning direction, wherein, The pattern exposure device has the following features: The first light source device emits the first beam of light; A second light source device that emits a second beam of light; A first beam shape deformation section is provided, wherein the first beam is incident on the first beam shape deformation section and the first beam shape deformation section guides the first beam, after deforming the cross-sectional shape of the first beam, to the drawing unit; as well as A second beam shape deformation section is used to guide the second beam, after deforming its cross-sectional shape, to the drawing unit. The first beam shape deformation section deforms the cross-sectional shape of the first beam from a circle to a non-circular shape, and the shapes of the first point light projected onto the substrate corresponding to the deformed first beam and the second point light projected onto the substrate corresponding to the deformed second beam are different from each other.

31. The pattern exposure apparatus according to claim 30, wherein, The first beam shape deformation section deforms the cross-sectional shape of the first beam from a circle to a groove or an elongated ellipse.

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