Screen mask cleaning device

Abstract

According to one aspect of this disclosure, a screen mask cleaning apparatus for performing a cleaning operation on a screen mask using a wiper includes: a first winding section on which a wiper is wound before the cleaning operation; a second winding section on which the wiper is wound after the cleaning operation; a container containing a solvent, wherein the wiper, unwound from the first winding section, is immersed in the solvent; an immersion drive unit configured to immerse the wiper in the solvent in the container; and a wiper support unit configured to support the wiper immersed in and wetted by the solvent.

Description

Technical Field

[0001] This disclosure relates to an apparatus for cleaning wire mesh masks. Background Technology

[0002] Component mounting processes can include a printing process of printing solder paste onto a printed circuit board (PCB), a process of mounting electronic components onto the PCB after the printing process, and a process of drying the PCB after the mounting process is complete. In these processes, screen printing equipment can be used in the printing process.

[0003] Screen printing equipment uses a screen mask to print solder paste, and during printing, some solder paste remains on the screen mask. This residual solder paste should be removed. In particular, the bottom surface of the screen mask that comes into direct contact with the printed circuit board should be cleaned periodically.

[0004] Several cleaning methods exist. Among these methods, the method of wiping the bottom of the screen mask with a cleaning paper or cloth sprayed with solvent has been widely used.

[0005] Japanese Patent No. 5919480 discloses an apparatus for removing paste adhering to the bottom surface of a screen mask by wiping it with a cleaning paper. Summary of the Invention

[0006] Technical issues

[0007] The main objective is to provide a screen mask cleaning device with improved cleaning performance.

[0008] Technical solution

[0009] According to one aspect of this disclosure, a screen mask cleaning apparatus is provided for performing a cleaning operation on a screen mask using a wiper, the screen mask cleaning apparatus comprising: a first winding portion on which a wiper is wound before the cleaning operation; a second winding portion on which a wiper is wound after the cleaning operation; a container containing a solvent, wherein the wiper, unwound from the first winding portion, is immersed in the solvent; an immersion drive unit configured to immerse the wiper in the solvent in the container; and a wiper support unit configured to support the wiper immersed in and wetted by the solvent.

[0010] Beneficial effects

[0011] According to a screen mask cleaning apparatus based on one aspect of this disclosure, the wiper is fully and uniformly wetted by the solvent because it is immersed in the solvent by immersion drive, thereby improving the performance of cleaning the screen mask. Attached Figure Description

[0012] Figure 1This is a schematic perspective view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the closed state of the cover unit.

[0013] Figure 2 This is a schematic perspective view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the open state of the cover unit.

[0014] Figure 3 This is a cross-sectional view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the container in a lowered state.

[0015] Figure 4 This is a cross-sectional view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the container in a raised state.

[0016] Figure 5 This is a schematic diagram showing the container and container drive unit of the screen mask cleaning apparatus according to a first embodiment of the present disclosure.

[0017] Figure 6 This is a cross-sectional view showing a screen mask cleaning apparatus according to a second embodiment of the present disclosure, particularly showing the state in which the wiping press unit is raised.

[0018] Figure 7 This is a cross-sectional view showing a screen mask cleaning apparatus according to a second embodiment of the present disclosure, particularly showing the state of the wiping press unit being lowered.

[0019] Figure 8 This is a schematic diagram showing the wiping press unit and the press unit drive device of the screen mask cleaning apparatus according to a second embodiment of the present disclosure.

[0020] Figure 9 It is shown Figure 8 An enlarged schematic diagram of part A.

[0021] Optimal Implementation

[0022] According to one aspect of this disclosure, a screen mask cleaning apparatus for performing a cleaning operation on a screen mask using a wiper includes: a first winding section on which a wiper is wound before the cleaning operation; a second winding section on which the wiper is wound after the cleaning operation; a container containing a solvent, wherein the wiper, unwound from the first winding section, is immersed in the solvent; an immersion drive unit configured to immerse the wiper in the solvent in the container; and a wiper support unit configured to support the wiper immersed in and wetted by the solvent.

[0023] The screen mask cleaning device may further include: a cover unit having an opening through which a wiper supported on the wiper support unit is exposed.

[0024] At least one air knife may be mounted on the cover unit.

[0025] The cover unit may include a wiper support configured to restrict upward movement of the wiper.

[0026] The container may have a groove shape with a length greater than the width of the wiper.

[0027] The screen mask cleaning device may also include a tank connected to the container and storing a solvent.

[0028] The screen mask cleaning device may also include a filter configured to filter out foreign matter from the solvent.

[0029] The immersion drive unit may include a container drive unit configured to move the container upward during immersion drive to immerse the wiper in the solvent within the container.

[0030] The immersion drive unit may include a wiper pressing unit configured to press the wiper during immersion drive to immerse the wiper in the solvent in the container. Detailed Implementation

[0031] Hereinafter, the present disclosure according to preferred embodiments will be described with reference to the accompanying drawings. In the drawings, elements having the same configuration are indicated by the same reference numerals, and repeated descriptions thereof will be omitted.

[0032] This disclosure will become clear from the following detailed description of embodiments taken in conjunction with the accompanying drawings. However, this disclosure may be implemented in many different forms and should not be construed as limited to the embodiments set forth herein; rather, these embodiments are provided so that this disclosure will be thorough and complete and will fully convey the scope of this disclosure to those skilled in the art, and the scope of this disclosure is defined only by the appended claims.

[0033] The terminology used herein is for illustrative purposes only and is not intended to limit this disclosure. As used herein, the singular forms “a,” “an,” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “comprising” and / or “including” as used herein specify the presence of an element, step, operation, and / or means, but do not exclude the presence or addition of one or more other elements, steps, operations, and / or means. It should be understood that although the terms “first,” “second,” etc., may be used herein to describe various elements, these elements should not be limited by these terms. These terms are used only to distinguish one element from another.

[0034] Figure 1 This is a schematic perspective view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the closed state of the cover unit. Figure 2 This is a schematic perspective view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the open state of the cover unit. Figure 3 This is a cross-sectional view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the container in a lowered state. Figure 4 This is a cross-sectional view showing a screen mask cleaning apparatus according to a first embodiment of the present disclosure, particularly showing the container in a raised state. Figure 5 This is a schematic diagram showing the container and container drive unit of the screen mask cleaning apparatus according to a first embodiment of the present disclosure.

[0035] like Figures 1 to 5 As shown, the screen mask cleaning device 100 according to the first embodiment includes a first winding section 110, a second winding section 120, a container 130, an immersion drive unit 140, a wiper support unit 150, a cover unit 160, a tank 170, a filter 180, and a controller 190.

[0036] The screen mask cleaning device 100 according to the first embodiment is a device for cleaning the bottom surface of a screen mask. That is, the wiper W of the screen mask cleaning device 100 wipes and cleans the bottom surface of the screen mask.

[0037] The wiper W disclosed herein wipes the bottom surface of a screen mask. Any of a variety of materials, such as natural or synthetic materials, can be used as the material for the wiper W. For example, paper, cloth, or nonwoven fabric can be used as the material for the wiper W. Although the wiper W is in Figure 1 and Figure 2 The process has not yet been fully implemented, but the wiper W is in... Figure 3 and Figure 4 It unfolds from the first winding section 110 and connects to the second winding section 120.

[0038] Before the cleaning operation, the wiper W is wound onto the first winding portion 110. Because the first winding portion 110 has a coil shape, the wiper W is wound around the circumference of the first winding portion 110.

[0039] After the cleaning operation, the wiper W is wound onto the second winding portion 120. Because the second winding portion 120 has a coil shape, the wiper W is wound around the circumference of the second winding portion 120.

[0040] When the second winding section 120 rotates via the winding section drive device 121, the wiper W unfolds and winds an appropriate amount to perform the cleaning operation, and the tension of the wiper W is maintained by the tension holding device 111.

[0041] According to the first embodiment, although the second winding portion 120 is rotated by the winding portion drive device 121 to perform the cleaning operation, this disclosure is not limited thereto. That is, according to this disclosure, the first winding portion 110 can also be rotated by a separate drive device. In addition, according to this disclosure, a loosening prevention device can be added to prevent the wiper W from becoming excessively loose.

[0042] Container 130 is an element that contains solvent S, and solvent S is located in container 130. The wiper W, which is unwound from the first winding portion 110, is immersed in solvent S located in container 130. When wiper W is "immersed", it means that wiper W is placed in and wetted by solvent S located in container 130.

[0043] Any material capable of dissolving solder paste adhering to the bottom surface of the screen mask can be used without restriction as solvent S. For example, isopropanol, stencil cleaner, acetone, solvents, or diluents can be used as solvent S.

[0044] Solvent S is stored in tank 170 and supplied from tank 170 to container 130 when necessary. A sensor unit (not shown) for detecting the amount of solvent S may be disposed in container 130. When the sensor unit is disposed in container 130, the sensor unit is connected to controller 190 via wired or wireless connection to transmit the measurement results.

[0045] Because the container 130 has a groove shape with a length L greater than the width D of the wiper W, the wiper W can be completely immersed in the solvent S located in the container 130.

[0046] like Figure 3 and Figure 4 As shown, the container 130 is configured to move vertically along the container guide 131. That is, the container 130 can be moved vertically along the container guide 131 by the immersion drive unit 140.

[0047] The immersion drive unit 140 immerses the wiper W in the solvent S located in the container 130.

[0048] That is, the immersion drive unit 140 according to the first embodiment can move the container 130 in the vertical direction. During immersion driving, the immersion drive unit 140 moves the container 130 upward to immerse the wiper W in the solvent S in the container 130.

[0049] In detail, the immersion drive unit 140 according to the first embodiment includes a container drive unit 141 configured to move the container 130 upward during immersion drive to immerse the wiper W in the solvent S in the container 130.

[0050] The container driving unit 141 includes a driving device 141a and a moving mechanism 141b.

[0051] The drive unit 141a is driven and generates power by receiving control signals from the controller 190. The power generated by the drive unit 141a is transmitted to the moving mechanism 141b. The drive unit 141a can be any of a variety of power sources, such as an electric motor (e.g., a servo motor, DC motor, or AC motor), a cylinder driven by pneumatic or hydraulic pressure, or a micro internal combustion engine.

[0052] The moving mechanism 141b is connected to the container 130 and receives power from the drive device 141a to raise or lower the container 130. For this purpose, the moving mechanism 141b may include, but is not limited to, any of a variety of devices capable of receiving power and moving the container 130, such as a transmission screw, rack and pinion mechanism, or cam mechanism. That is, the power generated by the drive device 141a is transmitted to the moving mechanism 141b to move the container 130 in the vertical direction.

[0053] In the container drive unit 141 of the first embodiment, although the drive device 141a and the moving mechanism 141b are separate and distinct from each other, this disclosure is not limited thereto. That is, the drive device 141a and the moving mechanism 141b according to this disclosure can be configured as a single unit. For example, the drive device 141a can be a cylinder driven by hydraulic pressure or a power supply, and the moving mechanism 141b can be a cylinder rod disposed in the cylinder.

[0054] According to the first embodiment, although the immersion drive unit 140 is configured to move the container 130 upward to immerse the wiper W in the solvent S in the container 130, the present disclosure is not limited thereto. That is, according to the present disclosure, the immersion drive unit may be configured to lower the wiper W while keeping the container 130 stationary when the wiper W is immersed in the solvent S in the container 130, as will be described in detail below.

[0055] The wiper support unit 150 supports the wiper W, which is immersed in and wetted by the solvent S.

[0056] The wiper support unit 150 is a device for supporting the wiper W.

[0057] The wiper support unit 150 includes a negative pressure fixing part 151 for fixing the wiper W with negative pressure. The negative pressure fixing part 151 fixes the wiper W by using negative pressure to suction the wiper W during cleaning operations.

[0058] A support unit lifting device 152 for raising or lowering the wiper support unit 150 is disposed below the wiper support unit 150. During cleaning operations, the support unit lifting device 152 operates to raise the wiper support unit 150, such that the wiper W, supported on the top surface of the wiper support unit 150, contacts the bottom surface of the screen mask.

[0059] According to the first embodiment, although the negative pressure fixing part 151 and the support unit lifting device 152 are provided in the wiper support unit 150, this disclosure is not limited thereto. That is, according to this disclosure, the negative pressure fixing part 151 and the support unit lifting device 152 may not be provided. When the support unit lifting device 152 is not provided, it is preferable to design the top surface of the wiper support unit 150 to be at a sufficiently high position, such that the wiper W supported on the top surface of the wiper support unit 150 contacts the bottom surface of the screen mask during cleaning operations.

[0060] The cover unit 160 is disposed on the top surface of the screen mask cleaning device 100 and can be opened and closed. When the screen mask cleaning device 100 is activated, the user closes the cover unit 160, and when replacing the wiper W of the first winding section 110 or the second winding section 120 or performing maintenance and repair on the internal device, the user opens the cover unit 160.

[0061] Openings 161 and 162 are formed in the cover unit 160, and the wiper W, supported on the wiper support unit 150, is exposed through opening 161. The wiper W exposed through opening 161 contacts the bottom surface of the screen mask during cleaning operations to perform cleaning.

[0062] At least one air knife 163 is disposed on the cover unit 160. The air knife 163 is used to dry the screen mask after cleaning.

[0063] According to the first embodiment, although the air knife 163 is provided in the cover unit 160, this disclosure is not limited thereto. That is, the air knife may not be provided in the cover unit according to this disclosure.

[0064] The cover unit 160 includes a wiper support 164 that supports the wiper W and restricts the upward movement of the wiper W.

[0065] Although the wiper support 164 according to this embodiment is located on the cover unit 160 and does not move, the present disclosure is not limited thereto. That is, the wiper support 164 according to the present disclosure can be formed in the shape of a roller and can be rotatably disposed on the cover unit 160. In this case, the contact resistance with the wiper W can be reduced, thereby facilitating the movement of the wiper W.

[0066] Tank 170 is connected to container 130 and stores solvent S. A valve device controlled by controller 190 is installed in tank 170. Therefore, when a sensor unit (not shown) installed in container 130 detects that the amount of solvent S in container 130 is less than a reference amount, solvent S is automatically supplied to container 130.

[0067] Filter 180 is connected to container 130 to filter out foreign matter from solvent S. Any type of filter capable of filtering out foreign matter from solvent S can be used without restriction.

[0068] Although the filter 180 according to the first embodiment is connected to the container 130 to filter out foreign matter from the solvent S, this disclosure is not limited thereto. That is, the filter 180 according to this disclosure can be connected to the tank 170 to filter out foreign matter from the solvent S.

[0069] The controller 190 controls the operation of the screen mask cleaning device 100. Specifically, the controller 190 controls the supply of the wiper W by controlling the first winding section 110 and the second winding section 120, controls the immersion drive by controlling the immersion drive unit 140, and controls the operation of cleaning the bottom surface of the screen mask with the wiper W by controlling the wiper support unit 150. For this purpose, the controller 190 may include hardware (such as circuit boards and integrated circuit chips), software, firmware, etc., capable of processing various data, and is driven under the control of a user or control algorithm.

[0070] Reference Figures 1 to 5 The operation of the screen mask cleaning apparatus 100 according to the first embodiment will be described.

[0071] When the cover unit 160 is closed to activate the screen mask cleaning device 100, as Figure 3 As shown, the wiper W is connected from the first winding portion 110 to the second winding portion 120 through the space above the container 130 and through the top surface of the wiper support unit 150.

[0072] In this case, solvent S is located in container 130, and controller 190 prepares for immersion drive by supplying solvent S from tank 170 to container 130.

[0073] Next, the controller 190 executes the immersion drive. When the immersion drive begins, the controller 190 drives the drive device 141a and the moving mechanism 141b of the immersion drive unit 140 to move the container 130 upward. When the container 130 has moved fully upward, as... Figure 4 As shown, the wiper W, whose movement is restricted by the wiper support 164 of the cover unit 160, is immersed in the solvent S in the container 130 and is wetted by the solvent S.

[0074] With the wiper W immersed in the solvent S, the controller 190 drives the winding drive device 121 to rotate the first winding part 110 and the second winding part 120, thus moving the wiper W wetted by the solvent S. In this case, the wiper W wetted by the solvent S is located on the top surface of the wiper support unit 150.

[0075] Next, the controller 190 drives the negative pressure fixing part 151 to fix the wiper W with negative pressure, and operates the support unit lifting device 152 to raise the wiper support unit 150. Therefore, the controller 190 performs the cleaning operation of removing solder paste by bringing the wiper W, which is supported on the top surface of the wiper support unit 150 and wetted by the solvent S, into contact with the bottom surface of the screen mask.

[0076] Next, the wiper W, after the cleaning operation is completed, moves to the second winding section 120 and is retrieved.

[0077] According to the first embodiment, although the wiper W is configured to be movable even during the process of immersing the wiper W in the solvent S of the container 130, this disclosure is not limited thereto. That is, according to this disclosure, the wiper W can be configured not to move during the process of immersing the wiper W. In this case, the immersion and movement of the wiper W alternate little by little as the controller 190 drives the immersion drive unit 140 to move the container 130 downward and then moves the wiper W.

[0078] As described above, the screen mask cleaning apparatus 100 according to the first embodiment immerses the wiper W in the solvent S in the container 130 by moving the container 130 upward during immersion driving. Therefore, since cleaning can be performed by uniformly wetting the wiper W with a sufficient amount of solvent S through immersion, the screen mask can be cleaned effectively.

[0079] Furthermore, in the screen mask cleaning device 100 according to the first embodiment, since the cover unit 160, which can be opened and closed, is provided on the top surface of the screen mask cleaning device 100, the user can be protected during operation by the cover unit 160, and the convenience of operation can be improved when replacing the wiper W of the first winding part 110 or the second winding part 120 or when performing maintenance and repair on the internal device.

[0080] Although in the first embodiment, the wiper W is immersed in the solvent S in the container 130 by moving the container 130 upward during immersion driving, this disclosure is not limited thereto. See also Figures 6 to 9 A second embodiment is described, in which the wiper W is immersed in the solvent S in container 230 by pressing the wiper W during immersion driving.

[0081] Figure 6 This is a cross-sectional view showing a screen mask cleaning apparatus according to a second embodiment of the present disclosure, particularly showing the state in which the wiping press unit is raised. Figure 7 This is a cross-sectional view showing a screen mask cleaning apparatus according to a second embodiment of the present disclosure, particularly showing the state of the wiping press unit being lowered. Figure 8 This is a schematic diagram showing the wiping press unit and the press unit drive device of the screen mask cleaning apparatus according to a second embodiment of the present disclosure. Figure 9 It is shown Figure 8 An enlarged schematic diagram of part A.

[0082] like Figures 6 to 9 As shown, the screen mask cleaning device 200 according to the second embodiment includes a first winding section 210, a second winding section 220, a container 230, an immersion drive unit 240, a wiper support unit 250, a cover unit 260, a tank 270, a filter 280, and a controller (not shown).

[0083] Because the construction and operation of the first winding portion 210, the second winding portion 220, the wiper support unit 250, the cover unit 260, the can 270, the filter 280, and the controller (not shown) of the screen mask cleaning device 200 according to the second embodiment are almost identical to those of the first winding portion 110, the second winding portion 120, the wiper support unit 150, the cover unit 160, the can 170, the filter 180, and the controller 190 of the screen mask cleaning device 100 according to the first embodiment, a detailed description of the first winding portion 210, the second winding portion 220, the wiper support unit 250, the cover unit 260, the can 270, the filter 280, and the controller (not shown) of the screen mask cleaning device 200 according to the second embodiment is omitted.

[0084] The container 230 of the screen mask cleaning apparatus 200 according to the second embodiment is positioned in a fixed position. That is, although the container 130 according to the first embodiment is configured to rise or fall by the immersion drive unit 140, the position of the container 230 according to the second embodiment is fixed.

[0085] Solvent S is located in container 230, and the wiper W, unwound from the first winding section 210, is immersed in solvent S. Any material capable of dissolving solder paste adhering to the bottom surface of the screen mask can be used in solvent S without limitation. For example, isopropanol, stencil cleaner, acetone, solvent, or diluent can be used as solvent S.

[0086] Because container 230 has a groove shape with a length greater than the width of wiper W, wiper W can be completely immersed in solvent S located in container 230.

[0087] The immersion drive unit 240 immerses the wiper W in the solvent S located in the container 230.

[0088] In detail, the immersion drive unit 240 according to the second embodiment includes a wiper pressing unit 241, which is configured to press the wiper W during immersion drive to immerse the wiper W in the solvent S in the container 130.

[0089] The wiping unit 241 includes a pressing unit driver 241a and a pressing part 241b.

[0090] The pressing unit driver 241a is driven by receiving a control signal from the controller 290 and transmits power to the pressing part 241b.

[0091] The pressing unit driver 241a may include, but is not limited to, any of a variety of power sources such as an electric motor (such as a servo motor, DC motor or AC motor), a cylinder driven by pneumatic or hydraulic pressure, or a micro internal combustion engine, and any of a variety of devices such as a piston, a transmission screw, a rack and pinion mechanism or a cam mechanism for receiving power from the power source and transmitting power to the pressing part 241b.

[0092] The pressing part 241b receives power from the pressing unit driver 241a and directly presses the wiper W.

[0093] The actuating end 241b_1 of the pressing part 241b has a roller shape and is rotatably disposed at one end of the pressing part 241b. That is, because the actuating end 241b_1 is configured to be rotatable by the rotating shaft C, the movement of the wiper W is promoted by reducing the contact resistance with the wiper W while pressing the wiper W.

[0094] According to the second embodiment, although the actuating end 241b_1 of the pressing part 241b is rotatably provided, this disclosure is not limited thereto. That is, according to this disclosure, the actuating end 241b_1 of the pressing part 241b can be provided as non-rotatable.

[0095] Reference Figures 6 to 9The operation of the screen mask cleaning apparatus 200 according to the second embodiment will be described.

[0096] When the cover unit 260 is closed to activate the screen mask cleaning device 200, as Figure 6 As shown, the wiper W is connected from the first winding portion 210 to the second winding portion 220 through the space above the container 230 and through the top surface of the wiper support unit 250.

[0097] In this case, solvent S is located in container 230, and controller 290 prepares for immersion drive by supplying solvent S from tank 270 to container 230.

[0098] Next, the controller 290 executes the immersion drive. When the immersion drive begins, the controller 290 drives the pressing unit driver 241a and pressing part 241b of the immersion drive unit 240 to press the wiper W downward. When the actuating end 241b_1 of the pressing part 241b moves fully downward, as... Figure 7 As shown, the wiper W is pressed by the actuating end 241b_1 to be immersed in the solvent S in the container 230 and wetted by the solvent S.

[0099] With the wiper W immersed in the solvent S, the controller (not shown) drives the winding drive device (not shown) to rotate the first winding part 210 and the second winding part 220, causing the wiper W, which is wetted by the solvent S, to move. In this case, the wiper W, wetted by the solvent S, is located on the top surface of the wiper support unit 250.

[0100] Next, the controller 290 drives the negative pressure fixing part 251 to fix the wiper W using negative pressure, and operates the support unit lifting device 252 to raise the wiper support unit 250. Therefore, the controller 290 performs a cleaning operation to remove solder paste adhering to the bottom surface of the screen mask by bringing the wiper W, which is supported on the top surface of the wiper support unit 250 and wetted by the solvent S, into contact with the bottom surface of the screen mask.

[0101] Next, the wiper W, after the cleaning operation is completed, moves to the second winding section 220 and is retrieved.

[0102] According to the second embodiment, although the wiper W is configured to be movable even during the process of immersing the wiper W in the solvent S of the container 230, this disclosure is not limited thereto. That is, according to this disclosure, the wiper W can be configured not to move during the process of immersing the wiper W. In this case, since the controller 290 drives the immersion drive unit 240 to move the pressing part 241b upward, and then moves the wiper W, the immersion and movement of the wiper W are alternated little by little.

[0103] As described above, the screen mask cleaning apparatus 200 according to the second embodiment immerses the wiper W in the solvent S in the container 130 by pressing the wiper W during immersion driving. Therefore, since cleaning can be performed by uniformly wetting the wiper W with a sufficient amount of solvent S through immersion, the screen mask can be cleaned effectively.

[0104] Furthermore, in the screen mask cleaning device 200 according to the second embodiment, since the cover unit 260, which can be opened and closed, is provided on the top surface of the screen mask cleaning device 200, the user can be protected during operation by means of the cover unit 260, and the convenience of operation can be improved when replacing the wiper W of the first winding part 210 or the second winding part 220 or when performing maintenance and repair on the internal device.

[0105] The screen mask cleaning apparatus 200 according to the second embodiment of this disclosure has the same or very similar structure, operation and effects as the screen mask cleaning apparatus 100 according to the first embodiment of this disclosure, except for the configuration, operation and effects described above, so its description is omitted.

[0106] While this disclosure has been specifically illustrated and described with reference to the embodiments shown in the accompanying drawings, it will be understood by those skilled in the art that various modifications and equivalent embodiments may be implemented therein. Therefore, the true technical scope of this disclosure should be defined by the appended claims.

[0107] Industrial availability

[0108] The screen mask cleaning apparatus according to this disclosure can be used in industries that manufacture, test, or operate screen mask cleaning apparatus.

Claims

1. A screen mask cleaning device for performing a cleaning operation on a screen mask using a wiper, the screen mask cleaning device comprising: The first winding section, the wiper is wound onto the first winding section before the cleaning operation; The second winding section is where the wiper is wound after the cleaning operation; A container holding solvent, with the wiper unwound from the first winding portion immersed in the solvent; An immersion drive unit is configured to immerse the wiper in a solvent within the container; The wiper support unit is configured to support the wiper that is immersed in and wetted by the solvent; as well as The cover unit includes an opening through which a wiper, supported on the wiper support unit, is exposed. The cover unit includes a wiper support, disposed at a position corresponding to the container when the cover unit is closed, and configured to restrict upward movement of the wiper. The immersion drive unit includes a container drive unit configured to raise or lower the container. When immersion drive begins, the immersion drive unit moves the container upward, and the movement of the wiper is restricted by the wiper support, thereby immersing it in the solvent in the container.

2. The screen mask cleaning device according to claim 1, wherein, At least one air knife is mounted on the cover unit.

3. The screen mask cleaning device according to claim 1, wherein, The container has a groove shape with a length greater than the width of the wiper.

4. The screen mask cleaning device according to claim 1 further includes: A can, connected to the container and storing solvent.

5. The screen mask cleaning device according to claim 1, further comprising: A filter is constructed to remove foreign matter from a solvent.

6. A screen mask cleaning device for performing a cleaning operation on a screen mask using a wiper, the screen mask cleaning device comprising: The first winding section, the wiper is wound onto the first winding section before the cleaning operation; The second winding section is where the wiper is wound after the cleaning operation; A container holding solvent, with the wiper unwound from the first winding portion immersed in the solvent; An immersion drive unit is configured to immerse the wiper in a solvent within the container; as well as The wiper support unit is configured to support the wiper, which is immersed in and wetted by the solvent. The immersion drive unit includes a wiper pressing unit configured to press the wiper during immersion drive to immerse the wiper in the solvent in the container.

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