A silicon wafer cleaning device for photovoltaic single crystal silicon wafer production

Abstract

The present invention discloses a silicon wafer cleaning device for photovoltaic power generation monocrystalline silicon wafer production, which belongs to the technical field of silicon wafer cleaning equipment. The device includes a cleaning tank, a cleaning basket and a driving device, the driving device includes a first guide rail, a first moving unit and a first telescopic rod, the cleaning basket is connected to the first telescopic rod, the cleaning tank is arranged below the cleaning basket, the cleaning tank is provided with more than two cleaning pools, a liquid receiving device is arranged above the cleaning tank, the liquid receiving device includes a second guide rail, a second moving unit, a second suspension rod and a liquid receiving plate, when the cleaning basket moves from one of the two or more cleaning pools to the next cleaning pool, the residual liquid on the cleaning basket drips onto the liquid receiving plate. The present invention can reduce the contamination of the cleaning solvent in the cleaning pool by arranging the liquid receiving plate; it will not affect the original cleaning steps of the cleaning basket, and ensure the cleaning efficiency of the silicon wafer; and it can understand the working condition of the cleaning basket and whether the cleaning work is normal from the side.

Description

Technical Field

[0001] The invention belongs to the technical field of silicon wafer cleaning equipment, and in particular relates to a silicon wafer cleaning device for producing photovoltaic power generation single crystal silicon wafers. Background Art

[0002] During silicon wafer processing, the cut silicon wafers need to be ground, polished, cleaned and other processes in sequence. Existing silicon wafer cleaning devices usually have multiple parallel cleaning pools, and multiple silicon wafers are placed in a cleaning basket, which is then lowered by a lifting device to immerse the cleaning basket in the first cleaning pool. After soaking for a period of time, the cleaning basket is lifted upward, and then the cleaning basket is driven forward by a transmission device to reach the top of the next cleaning pool, and then the cleaning basket is lowered and immersed again. In this way, it is immersed in different cleaning pools in turn and cleaned by different cleaning solvents. This cleaning device still has some problems. After the immersion process, residual liquid will drip on the cleaning basket and silicon wafers, and the residual liquid will drip into the next cleaning pool as the cleaning basket moves forward, thereby causing the cleaning agent in the next cleaning pool to be contaminated by the residual liquid. If the cleaning basket is lifted and then stays for a long time before moving forward, although it will reduce the residual liquid dripping into the next cleaning pool, the long residence time will affect the working efficiency of the entire cleaning device. Summary of the invention

[0003] Technical problem: In view of the above problems existing in the prior art, the technical problem to be solved by the present invention is to provide a cleaning device that reduces the residual liquid from dripping into the adjacent cleaning tank without reducing the working efficiency of the cleaning device.

[0004] Technical solution: In order to solve the above technical problems, the technical solution adopted by the present invention is as follows:

[0005] A cleaning device comprises a cleaning trough, a cleaning basket for carrying objects, and a driving device for driving the cleaning basket forward, the driving device comprising a first guide rail, a first movable unit movably connected to the first guide rail, and a first telescopic rod connected to the first movable unit, the cleaning trough is arranged below the cleaning basket, the cleaning trough is provided with more than two cleaning pools along the forward direction of the cleaning basket, the cleaning basket is sequentially immersed in the more than two cleaning pools driven by the driving device, a liquid receiving device is provided above the cleaning trough, the liquid receiving device comprises a second guide rail, a second movable unit movably connected to the second guide rail, a second suspension rod connected to the second movable unit, and a liquid receiving plate connected to the second suspension rod, when the cleaning basket moves from one of the more than two cleaning pools to the next cleaning pool, residual liquid on the cleaning basket drips onto the liquid receiving plate.

[0006] Furthermore, the liquid receiving plate includes a vertical plate connected to the second suspension rod, a bottom plate connected to the vertical plate, and side plates arranged on both sides of the bottom plate. The bottom plate is tilted so that the liquid on the bottom plate slides into the upper cleaning pool among the more than two cleaning pools.

[0007] Furthermore, the bottom plate or the side plate is rotatably connected to the vertical plate, and a limit block is provided on the side plate, and the limit block abuts against the back of the vertical plate to fix the bottom plate in an inclined position.

[0008] Furthermore, a retention plate is provided on the bottom plate, and the retention plate divides the bottom plate into a sliding area and a liquid accumulation area, the liquid on the sliding area directly slides down, and the liquid on the liquid accumulation area is retained by the retention plate, and an image acquisition device for taking pictures of the liquid accumulation area is provided on the second suspension rod; the second suspension rod is a telescopic suspension rod, and a top rod for supporting the liquid receiving plate is provided on the cleaning tank;

[0009] A receiving groove is provided on the back side of the vertical plate, a second through hole is provided at the bottom of the receiving groove, a sealing device for blocking the second through hole is provided in the receiving groove, the sealing device includes a sealing plate for blocking the second through hole, a sealing spring connected to the sealing plate and a substrate connected to the sealing spring, the substrate is connected to the inner wall of the receiving groove; a guiding mechanism for guiding the liquid in the receiving groove is provided on the cleaning groove, the guiding mechanism includes a guiding groove and a guiding rod arranged in the guiding groove, the guiding rod is used to push into the second through hole, when the guiding rod is pushed into the second through hole, there is a gap between the outer wall of the guiding rod and the inner wall of the second through hole.

[0010] Furthermore, a liquid receiving plate is provided between two adjacent cleaning pools among the more than two cleaning pools.

[0011] Furthermore, the first guide rail is an annular guide rail, and the second guide rail is a linear guide rail.

[0012] Furthermore, the cleaning pool is provided with a liquid inlet and a liquid outlet, and the cleaning tank is provided with an ultrasonic vibration plate.

[0013] Beneficial effects: Compared with the prior art, the present invention has the following advantages:

[0014] 1. By setting a liquid receiving plate, the residual liquid dripping from the cleaning basket can be guided back to the previous cleaning tank, reducing the contamination of the cleaning solvent in the cleaning tank by the solvent in the previous cleaning tank;

[0015] 2. The liquid receiving plate moves back and forth driven by the second guide rail, which will not affect the original cleaning steps of the cleaning basket and ensure the cleaning efficiency of the silicon wafer;

[0016] 3. A retention plate is set on the bottom plate of the liquid receiving plate to divide the bottom plate into a sliding area and a liquid accumulation area. An image acquisition device is set on the second suspension rod to take pictures of the liquid accumulation area, so as to judge whether the liquid volume in the liquid accumulation area is normal and understand the working condition of the cleaning basket and whether the cleaning work is normal from the side;

[0017] 4. The bottom plate of the liquid receiving plate is rotatably connected to the vertical plate. Through the retractable second suspension rod and the top rod arranged on the side wall of the cleaning tank, the top rod can push the bottom plate upward to facilitate the pouring of the residual liquid in the liquid accumulation area back to the original cleaning tank;

[0018] 5. A receiving groove is set on the liquid receiving plate, and a guide mechanism is set on the cleaning tank to facilitate judging whether the liquid receiving plate is working abnormally according to the amount of liquid received. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a schematic diagram of the structure of an embodiment of the present invention;

[0020] Figure 2 is a schematic diagram of the structure of the first telescopic rod and the cleaning basket;

[0021] Figure 3 It is a schematic diagram of the structure of the liquid receiving plate;

[0022] Figure 4 yes Figure 3 Enlarged view of point A in the middle;

[0023] Figure 5 It is a structural schematic diagram of the working state of the liquid receiving plate;

[0024] Figure 6 It is a schematic diagram of the structure when the liquid receiving plate dumps the liquid in the liquid accumulation area;

[0025] Figure 7 yes Figure 6 Enlarged view of point B in the middle;

[0026] Figure 8 It is a schematic diagram of the working state structure when the cleaning basket arrives at the second cleaning tank;

[0027] Fig. 9 yes Figure 8 Enlarged view of point C in the middle;

[0028] Fig.10 It is a schematic diagram of the cross-sectional structure of the guide rod when it is working. DETAILED DESCRIPTION

[0029] The present invention is further illustrated below in conjunction with specific examples. The examples are implemented based on the technical solutions of the present invention. It should be understood that these examples are only used to illustrate the present invention and are not used to limit the scope of the present invention.

[0030] like Figure 1 and2 As shown, a cleaning device includes a driving device, a cleaning basket 3, a cleaning tank 4 and a liquid receiving device. The cleaning tank 4 is a rectangular long tank, which is divided into three cleaning pools 41 of equal size by two partition plates 45. The three cleaning pools 41 contain different cleaning solvents. The cleaning pool 41 adopts the existing cleaning pool structure and is provided with a liquid inlet and a liquid outlet (omitted in the figure) for replacing the internal cleaning solvent. An ultrasonic vibration plate (omitted in the figure) is provided inside the cleaning tank 4. The ultrasonic vibration plate can adopt an existing ultrasonic vibration plate, such as the ADS-1036X vibration plate series produced by Foshan Andyson Ultrasonic Cleaning Equipment Co., Ltd., which adopts an immersion side vibration working mode to increase cleaning efficiency and cleaning effect.

[0031] like Figure 1 and 2 As shown, the driving device includes a first guide rail 1 and a first telescopic rod 2. The first guide rail 1 is an annular guide rail. The first guide rail 1 has two straight sections, one of which is located directly above the cleaning tank 4. A plurality of first moving units 11 are slidably connected to the first guide rail 1. The lower end of the first moving unit 11 is connected to the top of the first telescopic rod 2. The first telescopic rod 2 adopts an electric telescopic rod including a first fixed section 21 and a plurality of first telescopic sections 22. The lower end of the lowest first telescopic section 22 is connected to a hanger 23. The hanger 23 is provided with four hooks 231. The hooks 231 are used to hook the cleaning basket 3, so that the cleaning basket 3 is connected to the lower end of the telescopic rod 22. The cleaning basket 3 can rise or fall under the drive of the first telescopic rod 2. The first guide rail 1 is provided with a power mechanism that can drive The first moving unit 11 moves forward in a circular motion (the power mechanism adopts an existing motor and annular transmission structure, such as common structures such as synchronous belt transmission and chain transmission, which are omitted in the figure). The first moving unit 11 drives the cleaning basket 3 to move forward and pass through three cleaning pools 41 in sequence. When reaching each cleaning pool 41, the first telescopic rod 2 extends to drive the cleaning basket 3 downward to immerse in the cleaning solvent of this cleaning pool 41. After immersing for a period of time, the first telescopic rod 2 retracts to drive the cleaning basket 3 upward. The first guide rail 1 drives the first telescopic rod 2 to drive the cleaning basket 3 to move to the top of the next cleaning pool 41, and then the first telescopic rod 2 extends to drive the cleaning basket 3 downward to immerse in the cleaning solvent of this cleaning pool 41. The cleaning basket 3 passes through the three cleaning pools 41 in sequence. A plurality of card slots 31 are provided on the cleaning basket 3. The card slots 31 are used to place silicon wafers, so that multiple silicon wafers can be driven to be cleaned together.

[0032] like Figure 1 , Figure 3 , Figure 4 and Figure 7As shown, the liquid receiving device is arranged just above the cleaning tank 4, and the liquid receiving device includes a second guide rail 5, a second suspension rod 6 and a liquid receiving plate 7. The second guide rail 5 is a linear guide rail arranged along the extension direction of the cleaning tank 4, and two are arranged in parallel. Three second moving units 51 are arranged on each second guide rail 5. The second moving units 51 slide in the upper area between two adjacent cleaning tanks 41. The second moving units 51 on the two second guide rails 5 are located in a corresponding position. The second moving units 51 slide back and forth on the second guide rail 5 driven by the power mechanism. The second moving units 5 The mobile trolley in the prior art is adopted, which can move along the track. The lower end of the second mobile unit 51 is connected to the second suspension rod 6. The second suspension rod 6 adopts an electric telescopic suspension rod, including a second fixed section 61 and a second telescopic section 62. The lower end of the second telescopic section 62 is connected to a liquid receiving plate 7, so that the liquid receiving plate 7 is respectively connected to the two second guide rails 5 through the two second suspension rods 6, and slides forward and backward under the synchronous drive of the two second mobile units 51, so as to facilitate movement above two adjacent cleaning pools 41. The synchronous extension and retraction of the two second suspension rods 6 drives the liquid receiving plate 7 to rise or fall. When the handle 71 is in the closed position, the two ends of the two side plates 73 are connected to the two second suspension rods 6, and the two side plates 73 are arranged on both sides of the bottom plate 72. The corresponding ends of the two side plates 73 are rotatably connected to the vertical plates 71 through the rotating shafts, so that the bottom plate 72 can rotate relative to the vertical plates 71. The end of the side plate 73 close to the vertical plate 71 is provided with a stopper 74, and the stopper 74 extends in the direction of the vertical plates 71. When the side plates 73 are rotated downward to a certain angle relative to the vertical plates 71, the stopper 74 of the two side plates 73 respectively abuts against the back of the vertical plates 71 to limit the side plates 73 from continuing to rotate downward, so that the bottom plate 72 is fixed at this angle and the bottom plate 72 is tilted at this time. The cleaning basket 3 is driven by the first telescopic rod 2 to move downwardly into the second cleaning tank 41 for immersion cleaning. The cleaning basket 3 is driven by the first telescopic rod 2 to move downwardly into the second cleaning tank 41 for immersion cleaning. The cleaning basket 3 is driven by the first telescopic rod 2 to move downwardly into the second cleaning tank 41 for immersion cleaning. The immersion cleaning work is continued. The working process of the second cleaning tank 41 and the liquid receiving plate 7 above the adjacent part of the third cleaning tank 41 are the same.

[0033] like Figure 3 , Figure 6 and Figure 7As shown, a retaining plate 75 is provided on the bottom plate 72, and the retaining plate 75 has a certain height. The retaining plate 75 divides the upper area of ​​the bottom plate 72 into a sliding area 721 and a liquid accumulation area 722. The sliding area 721 is at a lower position and has an area larger than the liquid accumulation area 722. When liquid drops on the sliding area 721, the liquid slides down directly. When the liquid drops on the liquid accumulation area 722, the liquid slides down and is blocked by the retaining plate 75. Since the retaining plate 75 has a certain height, the liquid accumulates in the liquid accumulation area 722. The second suspension rod 6 is provided with an image acquisition device 8, and the image acquisition device 8 uses a camera to capture the liquid accumulation. Area 722 is photographed and images are collected to determine whether the amount of liquid in the liquid accumulation area 722 is normal. Since the liquid accumulation area 722 is small and located at the front end, the collected droplets should be small under normal circumstances. If a large number of droplets are collected in a short time, it means that there are some problems with the cleaning basket 3. For example, a silicon wafer is damaged in the previous cleaning tank and shattered in the cleaning basket 3, causing the cleaning basket 3 to bring out more cleaning solvent, so more liquid drips in the liquid accumulation area 722. Therefore, the liquid accumulation in the liquid accumulation area 722 can be used to assist in determining whether the cleaning basket 3 is working normally. When there is too much liquid in the liquid accumulation area 722, it is necessary to dump the liquid in the liquid accumulation area 722 back into the previous cleaning pool 41. At this time, the second mobile unit 51 drives the liquid receiving plate 7 to slide backward into the area above the first cleaning pool 41. Each cleaning pool 41 is provided with a top rod 42 on the side wall. The top rod 42 is used to support the liquid receiving plate 7. The two side plates 73 are respectively provided with side wings 78. There are two top rods 42. When the liquid receiving plate 7 reaches the dumping area above the cleaning pool 41, the second lifting rod 6 The second telescopic joint 62 extends, driving the liquid receiving plate 7 to move downward. During the downward movement, the side wings 78 press downward against the top of the top rod 42, so that the top rod 42 pushes the liquid receiving plate 7 upward. Since the bottom plate 72 and the side plates 73 are rotatably connected with the vertical plate 71 through the rotating shaft, the bottom plate 72 rotates upward under the upward supporting action of the top rod 42. Since the gap at the contact point between the bottom plate 72 and the vertical plate 71 increases after the bottom plate 72 rotates upward, the liquid in the liquid accumulation area 722 slides from the gap back to the original cleaning pool 41 below (such as Figure 7 As shown), a through hole may also be provided on the vertical plate 71 to facilitate the backflow of liquid.

[0034] like Figure 3 , Figure 4 , Figure 7 , Fig. 9 and Fig.10As shown, a receiving groove 76 is provided on the back of the vertical plate 71, and a second through hole 761 is provided at the bottom of the receiving groove 76. A blocking device 77 is provided in the receiving groove 76. The blocking device 77 includes a blocking plate 771, a blocking spring 772 and a substrate 773. The substrate 773 is arranged inside the receiving groove 76 and above the second through hole 761. The blocking spring 772 is arranged on the substrate 773. The lower end of the blocking spring 772 is connected to the blocking plate 771. The blocking plate 771 is made of rubber material and is blocked on the second through hole 761 under the elastic force of the blocking spring 772. A guide mechanism 9 corresponding to the receiving groove 76 is provided on the side wall of the cleaning tank 4. The guide mechanism includes a guide groove 91 and a guide rod 92 arranged in the guide groove 91. The guide rod 92 is a cylindrical rod with a diameter smaller than the second through hole 761. The diameter of hole 761, when too much liquid is collected in the receiving groove 76, the liquid receiving plate 7 is moved to a predetermined position. At this time, the second through hole 761 is located directly above the guide rod 92, and the second telescopic joint 62 of the second suspension rod 6 is extended to drive the liquid receiving plate 7 to move downward, so that the upper end of the guide rod 92 is pushed into the second through hole 761, and the blocking plate 771 is pushed upward to overcome the elastic force of the blocking spring 772, so that the liquid in the receiving groove 76 slides along the guide rod 92 into the guide groove 91, and is collected under the guidance of the guide groove 91. A liquid level sensor is set in the guide groove 91 to judge the amount of liquid, thereby judging whether the operation of the liquid receiving plate is normal. Under normal circumstances, due to the small collection area of ​​the receiving groove 76, the amount of liquid that can be collected is very small. If there is a large amount of liquid, it means that the operation of the liquid receiving plate is abnormal.

[0035] The above are only preferred embodiments of the present invention. It should be pointed out that, for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present invention. These improvements and modifications should also be regarded as the scope of protection of the present invention.

Claims

1. A silicon wafer cleaning device for photovoltaic single crystal silicon wafer production, comprising a cleaning tank (4), a cleaning basket (3) for carrying objects, and a driving device for driving the cleaning basket (3) forward, characterized in that: The driving device comprises a first guide rail (1), a first moving unit (11) movably connected to the first guide rail (1), and a first telescopic rod (2) connected to the first moving unit (11); the cleaning basket (3) is connected to the first telescopic rod (2); the cleaning tank (4) is arranged below the cleaning basket (3); the cleaning tank (4) is provided with more than two cleaning pools (41) along the forward direction of the cleaning basket (3); the cleaning basket (3) is driven by the driving device to be immersed in the more than two cleaning pools (41) in sequence; the cleaning A liquid receiving device is provided above the tank (4), the liquid receiving device comprising a second guide rail (5), a second moving unit (51) movably connected to the second guide rail (5), a second suspension rod (6) connected to the second moving unit (51), and a liquid receiving plate (7) connected to the second suspension rod (6); when the cleaning basket (3) moves from a previous cleaning pool (41) to a next cleaning pool (41) among the two or more cleaning pools (41), residual liquid on the cleaning basket (3) drips onto the liquid receiving plate (7), and the liquid receiving plate (7) comprises a second suspension rod (6) connected to the second moving unit (51). 6) connected to the vertical plate (71), a bottom plate (72) connected to the vertical plate (71), and side plates (73) arranged on both sides of the bottom plate (72), the bottom plate (72) being arranged at an angle so that liquid on the bottom plate (72) can slide into the upper cleaning pool (41) of the two or more cleaning pools (41), the bottom plate (72) or the side plate (73) being rotatably connected to the vertical plate (71), and a limit block (74) being arranged on the side plate (73), the limit block (74) being pressed against the back of the vertical plate (71) so that the bottom plate (72) is fixed in place. In the inclined position, a retaining plate (75) is provided on the bottom plate (72), the retaining plate (75) divides the bottom plate (72) into a sliding area (721) and a liquid accumulation area (722), the liquid on the sliding area (721) directly slides down, and the liquid on the liquid accumulation area (722) is retained by the retaining plate (75), and the second suspension rod (6) is provided with an image acquisition device (8) for taking a picture of the liquid accumulation area (722); the second suspension rod (6) is a telescopic suspension rod, and the cleaning tank (4) is provided with a push rod (42) for supporting the liquid receiving plate (7).

2. The silicon wafer cleaning device for photovoltaic single crystal silicon wafer production according to claim 1, characterized in that: A receiving groove (76) is provided on the back of the vertical plate (71), a second through hole (761) is provided on the bottom of the receiving groove (76), a blocking device (77) for blocking the second through hole (761) is provided in the receiving groove (76), the blocking device (77) comprising a blocking plate (771) for blocking the second through hole (761), a blocking spring (772) connected to the blocking plate (771), and a base plate (773) connected to the blocking spring (772), the base plate (773) being connected to the receiving groove (761) and the receiving groove (761). 6) inner wall connection; the cleaning tank (4) is provided with a guide mechanism (9) for guiding the liquid in the containing tank (76), the guide mechanism comprising a guide tank (91) and a guide rod (92) arranged in the guide tank (91), the guide rod (92) being used to push into the second through hole (761), when the guide rod (92) pushes into the second through hole (761), there is a gap between the outer wall of the guide rod (92) and the inner wall of the second through hole (761), and a liquid level sensor is provided in the guide tank (91).

3. The silicon wafer cleaning device for photovoltaic single crystal silicon wafer production according to claim 1, characterized in that: A liquid receiving plate (7) is provided between two adjacent cleaning tanks (41) of the more than two cleaning tanks (41).

4. The silicon wafer cleaning device for photovoltaic single crystal silicon wafer production according to claim 1, characterized in that: The first guide rail (1) is a circular guide rail, and the second guide rail (5) is a linear guide rail.

5. The silicon wafer cleaning device for photovoltaic single crystal silicon wafer production according to claim 1, characterized in that: The cleaning pool (41) is provided with a liquid inlet and a liquid outlet, and the cleaning tank (4) is provided with an ultrasonic vibration plate.

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