Production of sulfur

By combining ultraviolet light and microwave sources, and utilizing standing waves to enhance the bond dissociation of hydrogen sulfide, the problems of equipment corrosion and insufficient efficiency in existing technologies have been solved, enabling the efficient production of elemental sulfur.

CN116873874BActive Publication Date: 2026-04-14NOUVEL TECHNOLOGY CO LTD
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2018-04-17
Publication Date
2026-04-14

AI Technical Summary

Technical Problem

In existing technologies, desulfurization methods require large and complex equipment, and the chemical reactions are highly corrosive to the equipment, resulting in insufficient efficiency and an inability to efficiently produce elemental sulfur.

Method used

The system, which combines ultraviolet light and microwave sources, uses microwave energy to thermally excite hydrogen sulfide and then exposes it to ultraviolet light to form a standing wave, thereby enhancing the bond dissociation of hydrogen sulfide and decomposing it into hydrogen gas and elemental sulfur.

Benefits of technology

It improves the decomposition efficiency of hydrogen sulfide, reduces equipment corrosion, lowers energy consumption, and increases the production volume and rate of sulfur.

✦ Generated by Eureka AI based on patent content.

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Abstract

A system includes a first chamber, a second chamber, an ultraviolet light source, and a microwave source. The first chamber has an inlet. The second chamber is adjacent to the first chamber, the second chamber having an outlet and a waveguide. The ultraviolet light source is located within the waveguide of the second chamber. Related apparatuses, systems, techniques, and articles of manufacture are also described.
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Description

[0001] This application is a divisional application of Chinese application filed on April 17, 2018, with application number 201880026133.2 and entitled "Production of Sulfur". Technical Field

[0002] The subject matter described in this article relates to the production of sulfur and / or hydrogen from sulfur compounds. Background Technology

[0003] Crude oil or petroleum is typically processed and refined in industrial refineries, and refined petroleum products such as asphalt-based oils, fuel oils, diesel oils, gasoline, kerosene, and liquefied petroleum gas can be separated based on the different boiling points of the refined petroleum products. Petroleum products mainly include various hydrocarbons with different numbers or structures of carbon atoms, and also include oxygen compounds (such as phenols, ketones, and carboxylic acids), nitrogen compounds (such as indole, acridine, hydroxyquinoline, and aniline), sulfur compounds (thiols, sulfides, disulfides, tetrahydrothiophene, thiophene, alkylthiophene, benzothiophene, dibenzothiophene, alkyldibenzothiophene), transition metal compounds containing nickel, vanadium, molybdenum, etc., as well as inorganic salts.

[0004] Sulfur compounds contained in petroleum can be released as hydrogen sulfide gas (H2S), which is also present in most natural gas. This hydrogen sulfide gas can be processed into elemental sulfur and hydrogen, a process known as "desulfurization." In a specific example of the relevant technology, the Claus process produces elemental sulfur from hydrogen sulfide gas released during the refining process through combustion and catalytic chemical reactions.

[0005] However, conventional desulfurization methods require large and complex equipment, and the chemical reactions during desulfurization are corrosive to that equipment. Furthermore, the efficiency of the desulfurization process and operation is insufficient to generate production efficiency. In addition, other raw materials can be used for current conventional desulfurization methods. Summary of the Invention

[0006] On one hand, a system includes: a first chamber, a second chamber, an ultraviolet light source, and a microwave source. The first chamber includes an inlet. The second chamber is adjacent to the first chamber and includes an outlet and a waveguide. The ultraviolet light source is located within the waveguide of the second chamber.

[0007] One or more of the following features may be included in any feasible combination. For example, the microwave source is configured to radiate microwave energy into waveguides of a first chamber and a second chamber, such that the microwave energy contacts an ultraviolet light source. The ultraviolet light source includes an internal gas that generates ultraviolet light upon contact with the microwave energy. The waveguide includes ends configured such that the microwave energy forms a standing wave within the waveguide. The second chamber may further include a first electrode configured to have a negative charge and a second electrode configured to have a positive charge, the first and second electrodes being external to the ultraviolet light source and internal to the waveguide.

[0008] The system may include a tube assembly within a waveguide, the tube assembly housing an ultraviolet light source, and the walls of the tube assembly being transparent to both ultraviolet light and microwave energy. The first chamber may be located between the microwave source and the second chamber, such that the microwave energy is generated by the microwave source and passes through the first chamber to reach the second chamber.

[0009] The system may include a plurality of tube assemblies adjacent to the first chamber, each of the plurality of tube assemblies including a tube assembly outlet, and each tube assembly including a wall that is transparent to ultraviolet and microwave energy. The system may include a plurality of ultraviolet light sources, each located within a respective tube assembly. The microwave sources may be configured to radiate microwave energy into the first chamber and the plurality of tube assemblies such that the microwave energy contacts the plurality of ultraviolet light sources. The plurality of ultraviolet light sources may include an internal gas that generates ultraviolet light upon contact with the microwave energy.

[0010] The system may include a hydrogen sulfide source connected to the inlet. The system may include a gas-solid separator connected to the outlet, the gas-solid separator being configured to separate hydrogen and sulfur.

[0011] The ultraviolet light source can radiate ultraviolet light with a wavelength range of approximately 280 nm to 300 nm. The second chamber can be elongated and extend along a main axis, and the ultraviolet light source can be elongated along the main axis and located within the second chamber along the main axis. The second chamber may include a first electrode configured with a negative charge and a second electrode configured with a positive charge, the first electrode and the second electrode being external to the ultraviolet light source and internal to the waveguide. The first electrode can be elongated along the main axis and positioned above the ultraviolet light source, and the second electrode can be elongated along the main axis and positioned below the ultraviolet light source.

[0012] The second chamber can form a hydrocyclone. The light source can be located on a vortex overflow pipe located within the hydrocyclone.

[0013] On the other hand, hydrogen sulfide is supplied to a first chamber adjacent to a second chamber, and a microwave source radiates microwave energy into the first chamber. The hydrogen sulfide is brought into contact with the microwave energy generated by the microwave source. Hydrogen sulfide is then supplied to the second chamber. The second chamber includes an outlet and a waveguide. An ultraviolet light source is located within the waveguide of the second chamber. Hydrogen sulfide is brought into contact with ultraviolet light within the second chamber. The ultraviolet light is generated by the ultraviolet light source. The microwave source is configured to radiate microwave energy into the waveguides of both the first and second chambers, such that the hydrogen sulfide is brought into contact with the ultraviolet light. The ultraviolet light source includes an internal gas that generates ultraviolet light upon contact with the microwave energy. The hydrogen sulfide is brought into contact with the ultraviolet light to produce hydrogen and sulfur.

[0014] One or more of the following features may be included in any feasible combination. For example, the waveguide may include ends configured such that the microwave energy forms a standing wave within the waveguide. The second chamber may include a first chamber configured to have a negative charge and a second chamber configured to have a positive charge, the first electrode and the second electrode being external to the ultraviolet light source and internal to the waveguide. The hydrogen sulfide may be supplied to a plurality of tube assemblies adjacent to the first chamber, each of the plurality of tube assemblies including a tube assembly outlet, and each of the plurality of ultraviolet light sources being located within a respective tube assembly. The microwave source is configured to radiate the microwave energy into the first chamber and the plurality of tube assemblies such that the microwave energy contacts the plurality of ultraviolet light sources. The plurality of ultraviolet light sources may include an internal gas that generates ultraviolet light upon contact with the microwave energy.

[0015] Hydrogen and sulfur can be separated using a gas-solid separator. The ultraviolet light source can radiate ultraviolet light in the wavelength range of approximately 280 nm to 300 nm. The second chamber can be elongated and can extend along a main axis. The ultraviolet light source can be elongated along the main axis and can be located within the second chamber along the main axis. The second chamber can include a first electrode configured with a negative charge and a second electrode configured with a positive charge, the first electrode and the second electrode being external to the ultraviolet light source and internal to the waveguide. The first electrode can be elongated along the main axis and can be arranged above the ultraviolet light source, and the second electrode can be elongated along the main axis and can be arranged below the ultraviolet light source.

[0016] The temperature used to decompose the hydrogen sulfide can be achieved within a temperature range of approximately 0 to 125 degrees Celsius. The hydrogen sulfide can be supplied to the first chamber at a pressure of 0.1 to 10 atm. The ultraviolet light and microwave energy can be applied to the hydrogen sulfide for approximately 0.01 seconds to 15 minutes. The hydrogen sulfide can be collected from natural gas or produced by processing petroleum.

[0017] In another aspect, a system includes: a first heat exchanger, a second heat exchanger, a first separator, a third heat exchanger, a fourth heat exchanger, and a second separator. The first heat exchanger includes a first input terminal, a second input terminal, a first output terminal, and a second output terminal. The second heat exchanger includes a third input terminal, a fourth input terminal, a third output terminal, and a fourth output terminal. The first output terminal is operatively connected to the third input terminal. The first separator is operatively connected between the third output terminal and the second input terminal. The third heat exchanger includes a fifth input terminal, a sixth input terminal, a fifth output terminal, and a sixth output terminal. The fifth input terminal is operatively connected to the first separator. The fourth heat exchanger includes a seventh input terminal, an eighth input terminal, a seventh output terminal, and an eighth output terminal. The seventh input terminal is operatively connected to the fifth output terminal. The second separator is operatively connected between the seventh output terminal and the sixth input terminal, and between the seventh output terminal and the fourth input terminal.

[0018] One or more of the following features may be included in any feasible combination. For example, the first heat exchanger may be configured to transfer heat between a flow supplied to the first input and a flow supplied to the second input. The flow supplied to the first input may exit from the first output, and the flow supplied to the second input may exit from the second output. The second heat exchanger may be configured to transfer heat between a flow supplied to the third input and a flow supplied to the fourth input. The flow supplied to the third input may exit from the third output, and the flow supplied to the fourth input may exit from the fourth output. The third heat exchanger may be configured to transfer heat between a flow supplied to the fifth input and a flow supplied to the sixth input. The flow supplied to the fifth input may exit from the fifth output, and the flow supplied to the sixth input may exit from the sixth output. The fourth heat exchanger may be configured to transfer heat between a flow supplied to the seventh input and a flow supplied to the eighth input. The flow supplied to the seventh input may exit from the seventh output, and the flow supplied to the eighth input may exit from the eighth output.

[0019] The first separator can be configured to separate liquids and gases, and the second separator can be configured to separate liquids and gases.

[0020] The system may include a cooling unit operably connected to the eighth input and the eighth output. The system may include a gas source connected to the first input, the gas source supplying the first input with a gas comprising hydrogen sulfide, carbon dioxide, and methane. The system may include a methane holding unit operably connected to the sixth output. The system may include a carbon dioxide holding unit operably connected to the fourth output. The system may include a hydrogen sulfide holding unit operably connected to the second output.

[0021] The second heat exchanger and the first separator include a first condenser. The fourth heat exchanger and the second separator include a second condenser. The system may include a photoreactor as described above, wherein the second output is operatively connected to the inlet of the first chamber.

[0022] Details of one or more variations of the subject matter described herein are set forth in the accompanying drawings and the description below. Other features and advantages of the subject matter described herein will be apparent from the specification, the drawings, and the claims. Attached Figure Description

[0023] Figure 1 A schematic diagram is shown of the rate constants used to dissociate hydrogen sulfide (H2S) into hydrogen and sulfur.

[0024] Figure 2 An exemplary method for producing sulfur from natural gas according to an exemplary embodiment of this subject is shown;

[0025] Figure 3 An exemplary method for producing sulfur from diesel or diesel vapor according to exemplary embodiments of this subject matter is shown;

[0026] Figure 4A An exemplary reactor according to an exemplary embodiment of this subject is shown;

[0027] Figure 4B An exemplary reactor according to an exemplary embodiment of this subject is shown;

[0028] Figure 5 This is a block diagram illustrating an example;

[0029] Figure 6 and Figure 7 Example photos are shown;

[0030] Figure 8 This is a longitudinal cross-sectional view of an exemplary photoreactor used to decompose hydrogen sulfide into hydrogen and sulfur.

[0031] Figure 9 This is a cross-sectional view of the pipe assembly;

[0032] Figure 10 It shows a standing wave Figure 8 Photoreactor;

[0033] Figure 11 This is a cross-sectional view of another exemplary photoreactor having multiple tube assemblies;

[0034] Figures 12 to 17 This is a view of an exemplary photoreactor according to some embodiments of the present topic;

[0035] Figure 18 An exemplary system for decomposing hydrogen sulfide is shown;

[0036] Figures 19 to 25 It shows Figure 18 Various views of an exemplary system;

[0037] Figures 26 to 29 A view of an exemplary microwave source is shown;

[0038] Figure 30 This is a system block diagram illustrating an exemplary desulfurization process;

[0039] Figure 31 This is a system block diagram, which illustrates an exemplary processing procedure of a biogas distillation plant for processing feedstock gases.

[0040] Figure 32 It is used for implementation Figure 31 An exemplary system for the exemplary processing procedure shown in the figure;

[0041] Figures 33 to 35 This is a view showing an exemplary gas-solid separator;

[0042] Figures 36 to 41 Various views of an exemplary array of photoreactors are shown;

[0043] Figures 42 to 48 Various views of an exemplary reactor according to exemplary embodiments of this subject are shown.

[0044] In the various figures, the same reference numerals denote the same elements. Detailed Implementation

[0045] As used herein, the term "reactor" refers to a chamber or container in which a reaction can occur. A reactor may be provided with a certain volume to sustain the reaction and may also be provided with the function of controlling the temperature and / or pressure of the reaction.

[0046] As used herein, the terms “sulfur” and “sulfur products” refer to compounds containing elemental sulfur. In some embodiments, elemental sulfur can be present in a solid state (such as S6, S7, S8, S9, or S6) under normal conditions.12 S 18 (Polyatomic molecules) exist.

[0047] The term "dissociation" refers to the breaking of bonds between at least two atoms.

[0048] The term "bond dissociation energy" refers to the energy required to break the bond between at least two atoms.

[0049] The term "radiation" refers to the emission of energy toward an object in the form of light or heat.

[0050] The terminology used herein is for the purpose of describing particular embodiments only and is not intended to limit the invention. As used herein, the singular forms are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will also be understood that when the terms “comprising” and / or “including” are used in this specification, it indicates the presence of the said features, regions, integrals, steps, operations, elements, and / or components, but does not exclude the presence or addition of one or more other features, regions, integrals, steps, operations, elements, components, and / or groups thereof.

[0051] Unless otherwise specified or apparent from the context, the term “about” as used herein shall be understood to mean within the normal tolerances of the field, such as within two standard deviations of the mean. “About” can be understood as within 10%, 9%, 8%, 7%, 6%, 5%, 4%, 3%, 2%, 1%, 0.5%, 0.1%, 0.05%, or 0.01% of the specified value. Unless the context clearly indicates otherwise, all numerical values ​​provided herein are modified by the term “about”.

[0052] This topic can include the production of sulfur or the production of sulfur products comprising substantially homogeneous elemental sulfur. Elemental sulfur can be obtained through desulfurization methods, for example, by removing sulfur-containing compounds from natural gas, coal, crude oil, or petroleum and converting the removed sulfur-containing compounds into elemental sulfur. The current topic is not limited to fuel processing but can be extended to other applications, such as desulfurization within molasses processing facilities that may contain large amounts of hydrogen sulfide and biogas from waste treatment facilities.

[0053] In some embodiments, desulfurization can be performed by irradiating hydrogen sulfide with microwaves and ultraviolet light to decompose hydrogen sulfide into hydrogen and elemental sulfur. Microwaves can be used to thermally excite hydrogen sulfide, thereby facilitating bond vibration and increasing bond length, while ultraviolet light can induce bond dissociation. Therefore, this system and method do not involve ionization, but rather the breaking of hydrogen sulfide bonds. Thermal excitation of hydrogen sulfide advantageously increases its ability to absorb ultraviolet light, leading to greater bond dissociation and thus the production of elemental sulfur. Furthermore, thermal excitation of hydrogen sulfide provides the ability to achieve bond dissociation using higher ultraviolet wavelengths, which have greater bond penetration and thus enable more efficient breaking of hydrogen bonds that would otherwise not occur at lower ultraviolet wavelengths.

[0054] Furthermore, in some embodiments, microwaves can form a standing wave compared to when no standing wave is used. Due to the polarity of hydrogen sulfide, this standing wave can adjust the molecular position of hydrogen sulfide, thereby increasing the effective ultraviolet absorption area and thus improving the production of elemental sulfur. An electrodeless ultraviolet lamp can be used as an ultraviolet light source, and this electrodeless ultraviolet lamp can be driven by a microwave source that also radiates hydrogen sulfide.

[0055] Hydrogen sulfide (H2S) gas can be generated in large quantities during oil refining processes or collected as a component of natural gas. Therefore, hydrogen sulfide can provide a useful resource for sulfur production. Compared to conventional systems and methods, the system and method of this invention can decompose hydrogen sulfide into hydrogen and elemental sulfur, thereby achieving higher yields. This is because, compared to conventional systems and methods, the system and method of this invention can dissociate the SH bond at a faster rate, thus reducing the sustaining time, and also uses less energy to dissociate the SH bond. Therefore, the formation of other substances during bond dissociation can be reduced or minimized.

[0056] Hydrogen sulfide consists of two SH bonds, which can be dissociated upon energy input. The hydrogen sulfide bonds in H₂S can be broken or dissociated sequentially. For example, the first bond can be broken when a sufficient energy greater than the energy required for the first bond to dissociate (e.g., 381 kJ / mol at 298 K) is applied, while the second bond can be broken when an energy greater than the energy required for the second bond to dissociate (e.g., 344 kJ / mol at 298 K) is applied over time.

[0057] H2S(g)→S(s)+H2(g) (1)

[0058] H2S→H+SH 381KJ / mol (2) First bond breaks (at 298K)

[0059] HS→H+S 344KJ / mol (3) Second bond breaks (at 298K)

[0060] exist Figure 1 The theoretical rate constants for reaction (1) are shown in the figure for various temperature ranges. For example, the rate constant can be determined by the activation energy for the decomposition reaction of hydrogen sulfide under certain temperature conditions.

[0061] However, without being bound by theory, the first and second dissociations of the hydrogen sulfide bonds can be initiated and carried out by providing sufficient energy to the reacting hydrogen sulfide molecules. The energy required to dissociate the SH bonds of hydrogen sulfide can be provided by radiated light. For example, light radiation can be used in the ultraviolet range. Table 1 below lists the energies of ultraviolet light at various wavelengths.

[0062]

[0063] Ultraviolet light with sufficient energy to break the first and second SH bonds of hydrogen sulfide can be applied for an appropriate period of time until the desired amount or yield of sulfur is obtained. For example, ultraviolet radiation can be applied for approximately 0.01 seconds to 15 minutes, approximately 1 second to 30 seconds, or even just approximately 0.01 seconds to 15 seconds. It is also expected that ultraviolet radiation can be applied for a period of time that does not fall outside the ranges listed above.

[0064] Furthermore, each dissociation of the SH bond can be initiated and carried out within a variety of temperature ranges. Preferably, the temperature can be in the range of about 27°C to 35°C, about 20°C to 40°C, or about 0°C to 125°C. For example, the bond dissociation energy of hydrogen sulfide, or the activation energy used to initiate the reaction, can vary within different temperature ranges, and the energy required for reactions (1) to (3) can be appropriately determined based on the reaction temperature. It is also anticipated that the temperature will not fall outside any of these listed ranges.

[0065] Hydrogen sulfide used to generate sulfur can have a substantially homogeneous homogeneity greater than about 80 vol%, about 85 vol%, about 90 vol%, about 95 vol%, or about 99 vol%. In some embodiments, hydrogen sulfide can be compressed to a pressure of about 1 bar to 200 bar. In some embodiments, hydrogen sulfide is compressed to a pressure of about 0.1 atm to 10 atm, about 0.1 atm to 1 atm, or about 0.1 atm to 0.5 atm. It is also contemplated that this pressure will not fall outside any of these listed ranges.

[0066] In some embodiments, hydrogen sulfide may be heated or supplied as hot gas (generated by microwave) at least in part based on the feed temperature of the hydrogen sulfide entering the system. In some embodiments, hydrogen sulfide is heated or supplied as hot gas at temperatures of about 25°C to 200°C, about 80°C to 120°C, and about 100°C. It is also contemplated that the temperature will not fall outside any of these listed ranges. Further contemplated is that the temperature may be between any two of the listed values.

[0067] In other embodiments, hydrogen may be heated or supplied in the form of vapor.

[0068] The decomposition of hydrogen sulfide produces hydrogen gas and elemental sulfur. After the reaction is complete, it can be produced in the form of molecules with molecular formulas such as S6, S7, S8, S9, or S... 12 S 18 The sulfur product is obtained in solid form. The sulfur product can be substantially homogeneous and have a homogeneity greater than about 80 atomic percent (A%), about 85 atomic percent (A%), about 90 atomic percent (A%), about 95 atomic percent (A%), or about 99 atomic percent (A%). Preferably, the sulfur product can be in particulate form with an average diameter less than about 5 mm, less than about 1 mm, less than about 900 μm, less than about 800 μm, less than about 700 μm, less than about 600 μm, or less than about 500 μm, or can be in particulate form with an average diameter of about 100 μm to 500 μm. Additionally, hydrogen can be separated from the sulfur product and collected, and can have a homogeneity greater than about 80 volume percent (V%), about 85 volume percent (V%), about 90 volume percent (V%), about 95 volume percent (V%), or about 99 volume percent (V%). In some embodiments, the sulfur can be amorphous.

[0069] This topic may include methods for producing sulfur or elemental sulfur through desulfurization processes. These methods may include supplying hydrogen sulfide into a reactor and decomposing the hydrogen sulfide.

[0070] Hydrogen sulfide can be supplied continuously. In some embodiments, hydrogen sulfide gas can be supplied or provided to maintain its partial pressure in the reactor at about 0.1 atm to 10 atm, about 0.1 atm to 1 atm, or about 0.1 atm to 0.5 atm. It is also contemplated that this pressure will not fall outside any of these listed ranges.

[0071] Furthermore, the initial pressure of hydrogen sulfide in the reactor can be approximately 0.1 atm to 10 atm, approximately 0.1 atm to 1 atm, or approximately 0.1 atm to 0.5 atm. It is also expected that the initial pressure will not fall outside any of these listed ranges. Further, it is expected that the initial pressure can be between any two of these listed values.

[0072] The reactor can have a temperature range of about 27°C to 35°C, from 20°C to 40°C, or from about 0°C to about 125°C. Alternatively, the decomposition of hydrogen sulfide can be performed within a temperature range of 27°C to 35°C, from 20°C to 40°C, or from about 0°C to about 125°C. For example, the reactor can be heated using a flame, an electric furnace, a gas flow, etc. In one embodiment, the decomposition of hydrogen sulfide can be performed at approximately ambient temperature. It is also contemplated that the temperature will not fall outside any of these listed ranges. In other embodiments, the temperature can be between any two of these listed values.

[0073] Energy can be provided to decompose hydrogen sulfide in the reactor. The energy source for decomposing or dissociating hydrogen sulfide can be ultraviolet light. UV light can have wavelengths ranging from about 100 nm to about 300 nm, from about 200 nm to about 300 nm, from about 280 nm to about 300 nm, or from about 290 nm to about 300 nm. UV light can be irradiated for about 0.01 seconds to 15 minutes, about 1 second to 30 seconds, or about 0.01 seconds to 15 seconds. It is also anticipated that UV light can be irradiated for a period of time not falling outside any of these listed time ranges. Further anticipated is that UV light can be irradiated for a period of time between any two of these listed values.

[0074] In an exemplary embodiment of this subject matter, a method for producing sulfur from natural gas is provided. For example... Figure 2 As shown, natural gas (e.g., a methane mixture) containing large amounts of hydrogen sulfide (H2S) or other sulfur compounds can be desulfurized. Desulfurization methods are not particularly limited, and any method commonly used in refineries can be used without restriction.

[0075] Natural gas can be processed (e.g., dried) to remove water or water vapor (H2O), and then further processed to separate hydrogen sulfide and carbon dioxide (CO2). While not essential, this method of separating hydrogen sulfide from water vapor and carbon dioxide is found beneficial because it minimizes the presence of oxygen in current desulfurization processes. It is undesirable to be limited by a single theory, as the presence of oxygen is thought to negatively impact the efficiency of this desulfurization process. The separated hydrogen sulfide can be transferred to a reaction chamber where a decomposition reaction can occur. The hydrogen sulfide can exist as hot vapor or in the gas phase under controlled temperature and partial or internal pressure. Decomposition can be performed by irradiating with ultraviolet light until the desired product yield is obtained.

[0076] In an exemplary embodiment of this subject matter, a method for producing sulfur from diesel (petroleum) is provided. For example... Figure 3 As shown, diesel fuel containing sulfur compounds can be desulfurized as described above. For example, diesel fuel can be vaporized, and hydrogen sulfide can be generated from the sulfur compounds in the diesel vapor by adding hydrogen gas, from which the hydrogen sulfide gas can then be separated. The separated hydrogen sulfide can be transferred to a reactor for producing sulfur products. Hydrogen sulfide can exist as hot vapor or in the gas phase under controlled temperature and partial or internal pressure. Decomposition can be performed by irradiating with ultraviolet light until the desired product yield is obtained.

[0077] The ultraviolet radiation used to decompose hydrogen sulfide gas can also be continuously controlled based on initial reaction conditions (e.g., the temperature and pressure of the initial reaction gas (hydrogen sulfide)) or by monitoring product yield. The ultraviolet radiation device can be continuously controlled by adjusting parameters such as time, intensity, or wavelength.

[0078] Methods for producing sulfur may include separating and collecting sulfur products from hydrogen after bond dissociation. Hydrogen may flow out, for example, through the reactor outlet, or it may be filtered using a gas permeation membrane. In some embodiments, hydrogen may be collected and recycled separately.

[0079] The method of producing sulfur may further include cooling the sulfur product. The cooled sulfur product can be stabilized and granulated. For example, the sulfur produced thereby can be formed into particles, such as microparticles, as described above, so that the processed sulfur product can be used as a raw material for various chemical reactions and processes.

[0080] Figure 8This is a longitudinal cross-section of an exemplary photoreactor 800 for decomposing hydrogen sulfide into hydrogen and sulfur. The photoreactor 800 can be connected to a hydrogen sulfide source (e.g., in a hydrocarbon processing apparatus) and / or to a gas-solid separator to separate sulfur from hydrogen. The photoreactor 800 may include a microwave source 805, a first chamber 810, a second chamber 815, and a third chamber 835. The photoreactor 800 may be formed in a generally cylindrical shape (e.g., tubular).

[0081] The first chamber 810 may include an inlet 812 for receiving an input stream containing hydrogen sulfide. The first chamber 810 may be adjacent to the second chamber 815, and the input stream may include hydrogen sulfide, and the input stream may flow from the first chamber 810 into the second chamber 815 through an opening 814. The first chamber 810 may be formed of a suitable material for petroleum processing (e.g., stainless steel).

[0082] The second chamber 815 may be elongated (or slender) and cylindrical in shape along the main axis. The second chamber 815 may include a waveguide 820, which, in the illustrated example, is formed by the walls of the second chamber 815. Therefore, the second chamber 815 is formed of a suitable conductive material (such as stainless steel). In some embodiments, the waveguide 820 may be formed of a different structure. The waveguide 820 includes a first waveguide end 822 and a second waveguide end 824, the first waveguide end 822 being located at the end of the second chamber 815 that is not adjacent to the first chamber 810, and the second waveguide end 824 being adjacent to the first chamber 810. (Refer to...) Figure 8 The first waveguide end 822 and the end of the second chamber 815 are integral. The second chamber 815 may include an outlet 826 that is not adjacent to the first chamber 810.

[0083] The tube assembly 830 can be located within the second chamber 815 and can extend along the main axis of the second chamber 815. The ultraviolet light source 825 can also be located within the tube assembly 830. Additionally, the ultraviolet light source 825, the negative electrode 827, and the positive electrode 829 can be located within the tube assembly 830. The negative electrode 827 and the positive electrode 829 can be outside the ultraviolet light source 825 and inside the waveguide 820. The negative electrode 827 and the positive electrode 829 can be plate-shaped. The negative electrode 827 can be located above or arranged above the ultraviolet light source 825, while the positive electrode 829 can be located below the ultraviolet light source 825. Figure 9 This is a cross-sectional view of pipe assembly 830. Figure 9 The cross-sectional view shown is perpendicular to Figure 8 A cross-sectional view.

[0084] In other embodiments, in addition to the ultraviolet light source 825, the proton exchange membrane may also be located within the tube assembly 830.

[0085] In some embodiments, the wall 832 of the tube assembly 830 is transparent to both ultraviolet light and microwave energy. The wall 832 may be formed of a suitable transparent material, such as quartz. In some embodiments, the wall 832 extends from the inner surface to the waveguide 820. Quartz or other suitable materials (e.g., glass) can provide structural support and be transparent to both ultraviolet light and microwave energy.

[0086] The ultraviolet light source 825 may include an electrodeless lamp, which may include a gas discharge lamp, wherein the power required for the gas discharge lamp to generate light is transferred from the outside of the lamp to the internal gas via an electric or magnetic field. This is the opposite of a gas discharge lamp that uses internal electrodes connected to a power source via conductors passing through the lamp. Electrodeless lamps have many advantages, including extended lamp life due to the possibility of electrode failure, and energy savings due to the use of more efficient internal gases (which react if they come into contact with electrodes).

[0087] Furthermore, those skilled in the art will understand that the use of electrodeless lamps, as opposed to plasma, can have advantages in the systems and methods proposed herein. For example, one advantage of using electrodeless lamps compared to plasma is cost savings, as plasma is highly dependent on and therefore consumes a significant amount of electrical energy. Another advantage may include the extended lifespan of electrodeless lamps relative to plasma. Unfortunately, the electrodes may fail or break down prematurely during use due to the high temperatures and reduced mobility generated by the plasma arc, thus reducing electrode lifespan. Moreover, using plasma as a radiation source may have its own disadvantages, such as flammability, sustainability, and enclosure.

[0088] The ultraviolet light source 825 can produce light in wavelength ranges such as 100 μm to 300 μm and 280 μm to 300 μm. The gas contained in the lamp may include argon, mercury, and iodine. In some embodiments, the lamp may include argon at 25 kPa and 20 mg of mercury. Other gases, amounts, and pressures are also possible.

[0089] The second chamber 815, the ultraviolet light source 825, the negative electrode 827, and the positive electrode 829 may be elongated (or slender) and extend along the main axis of the second chamber 815.

[0090] The third chamber 835 may be adjacent to the second chamber 815 and may include two outlets (a first outlet 837 and a second outlet 839). The third chamber 835 may serve as an initial separation space for extracting hydrogen through the first outlet 837 and sulfur and any other present materials through the second outlet 839. In some embodiments, the third chamber 835 may include a gas-solid separator (e.g., a cyclone separator) and need not be integrated with the second chamber 815.

[0091] A microwave source 805 may be adjacent to the first chamber 810 and may include a transmitter 807 for radiating microwave energy. The microwave source 805 may emit electromagnetic energy at a frequency between 200 MHz and 300 GHz (corresponding to wavelengths between 100 cm and 0.1 cm). In one embodiment, the microwave source 805 emits electromagnetic energy at a frequency between approximately 900 MHz and 2.45 GHz. In some embodiments, the microwave source 805 emits electromagnetic energy at a frequency of approximately 2.45 GHz. It is also contemplated that the microwave source may emit microwaves at a frequency between any two of these listed values.

[0092] Microwave source 805 can be arranged to radiate microwave energy to waveguides 820 of the first chamber 810 and the second chamber 815, and the microwave energy is in contact with ultraviolet light source 825. When the microwave energy contacts ultraviolet light source 825, ultraviolet light source 825 can generate ultraviolet light. In some embodiments, microwave source 805 can be arranged to radiate microwave energy such that the microwave energy passes through the first chamber 810 and reaches the second chamber 815. The microwave energy generated by microwave source 805 can thermally excite hydrogen sulfide present in the first chamber 810 and simultaneously drive / excite ultraviolet light source 825. Because the radiated energy can be used both to thermally excite hydrogen sulfide and to generate ultraviolet light, both of which contribute to bond dissociation (e.g., the production of hydrogen and elemental sulfur from hydrogen sulfide), the radiated energy loss is minimal, and therefore this arrangement can be effective. Furthermore, this arrangement allows the microwave source to be tuned so that only the amount of energy required for bond dissociation is input into the system, with very little energy wasted on unnecessary heating.

[0093] Because microwave energy radiated into the second chamber 815 is reflected, the first waveguide end 822 and the second waveguide end 824 can be configured such that the second chamber 815 and / or waveguide 820 function as resonators. Due to interference between waves reflected back and forth within the second chamber 815 and / or waveguide 820, this arrangement can result in the formation of a stationary wave within the second chamber. A stationary wave (also called a standing wave) can comprise a wave in which each point on the wave axis has an associated constant amplitude. For example, Figure 10 The diagram shows a fixed wave 1005 as shown. Figure 8The photoreactor 800. The position with the smallest amplitude is called a node, and the position with the largest amplitude is called an antinode. The photoreactor 800 can be designed / controlled so that the positive amplitude value of the fixed wave is located on the positive electrode 829, and the negative amplitude value of the fixed wave is located on the negative electrode 827.

[0094] In operation, a hydrogen sulfide gas stream is introduced into inlet 812 under pressure and temperature. The hydrogen sulfide gas comes into contact with microwave energy in the form of microwaves radiated by microwave source 805. When the hydrogen sulfide gas comes into contact with microwave energy, it is thermally excited. The thermally excited hydrogen sulfide flows into a second chamber 815 contained within tube assembly 830. The thermally excited hydrogen sulfide comes into contact with a fixed wave. Because the molecules have a non-uniform electron distribution, hydrogen sulfide is polar, thus the molecules have a positively charged side and a negatively charged side. In the presence of a fixed wave, hydrogen sulfide aligns itself with the fixed wave (e.g., orients itself). This increases the effective cross-sectional area of ​​the molecule for absorbing ultraviolet light. Therefore, hydrogen sulfide exposed to both a fixed wave and ultraviolet light will absorb more energy from ultraviolet light compared to hydrogen sulfide without a fixed wave.

[0095] Thermally excited hydrogen sulfide exposed to ultraviolet light can lead to bond dissociation and the release of hydrogen ions (H+). + ) and sulfide ions (S 2- The generation of hydrogen and sulfur occurs. Hydrogen can be attracted to the negative electrode 827, while sulfur can be attracted to the positive electrode 829. This can lead to the physical separation of hydrogen and sulfur, thereby reducing the amount and likelihood of these free radicals reacting to form hydrogen sulfide. This can serve as a form of quenching (e.g., stopping or reducing the reverse reaction). Because hydrogen is lighter than sulfur (and thus sulfur will be pulled downwards due to gravity), the negative electrode 827 can be positioned above the positive electrode 829. Alternatively, a proton exchange membrane can be used instead of the positive and negative electrodes 827, which can also serve as a form of quenching.

[0096] The residence time of hydrogen sulfide in the second chamber 815 can be controlled by adjusting the length of the second chamber 815 and the flow rate of hydrogen sulfide entering the photoreactor 800. Furthermore, the energy supplied to the hydrogen sulfide by the microwave source 805 and the ultraviolet light source 825 affects the required residence time of the hydrogen sulfide.

[0097] Hydrogen and sulfur can exit the second chamber 815 through the second chamber outlet 823, while the lighter hydrogen can exit through the first outlet 837, and the heavier sulfur can exit through the second outlet 839. In some embodiments, a gas-solid separator, such as a cyclone separator, can be used.

[0098] Although the exemplary operation described above, which provides pure hydrogen sulfide as input to photoreactor 800, has been described, contaminants may also be included. Common contaminants may include carbon dioxide, methane, and other hydrocarbons. These contaminants may exit photoreactor 800 along with sulfur through a second outlet 839. Because more energy is consumed when contaminants are exposed to microwave energy and ultraviolet light, reducing the amount of contaminants in the hydrogen sulfide can improve the system's energy efficiency.

[0099] Additionally, the frequency / wavelength of the ultraviolet light generated by the ultraviolet light source 825 can be changed by controlling and / or modifying the microwave source 805. By changing the frequency / wavelength of the microwave energy, the frequency of the light generated by the ultraviolet light source 825 can be altered. Changing the frequency / wavelength of the ultraviolet light allows the operator to tune the photoreactor 800 based on the expected contaminants in the input stream to improve efficiency. The ultraviolet frequency / wavelength can be tuned to a frequency / wavelength that gives hydrogen sulfide a higher absorption coefficient and the contaminants a lower absorption coefficient. Therefore, it is not necessary to redesign some implementations of the photoreactor 800 for each application.

[0100] Some implementations may include multiple pipe assemblies 830 arranged in parallel (or in parallel). For example, Figure 11 This is a cross-sectional view of another exemplary second chamber 815 having multiple tube assemblies 830. Figure 11 The cross-sectional view shown is perpendicular to Figure 8 A cross-sectional view. Tube assemblies 830 are arranged within the second chamber 815, and each tube assembly 830 may have its own ultraviolet light source 825, negative electrode 827, and positive electrode 829. The region 1105 between the tube assemblies may be formed of a material (e.g., quartz) that is transparent to ultraviolet light and microwave energy. Figure 11 The arrangement allows light emitted by one ultraviolet light source 825 to illuminate not only the hydrogen sulfide within its corresponding tube assembly 830, but also the hydrogen sulfide within other tube assemblies 830. Multiple ultraviolet light sources 825 can be excited / driven by a common microwave source 805 and reside within a common waveguide. In some embodiments, each tube assembly 830 includes its own waveguide 820.

[0101] Figures 12 to 17 This is a view of an exemplary photoreactor 800 according to some embodiments of the present topic.

[0102] Figure 18 An exemplary system 1800 for decomposing hydrogen sulfide is shown. System 1800 includes a photoreactor 800, a hydrogen sulfide source 1805, and a gas-solid separator 1810. Figures 19 to 25 Various views of the exemplary system 1800 are shown.

[0103] Figures 26 to 29A view of an exemplary microwave source 805 is shown. In the example shown, the microwave source 805 is a magnetron.

[0104] Figure 30 This is a system block diagram illustrating an exemplary desulfurization process 3000. At 3010, hydrogen sulfide is provided. At 320, hydrogen sulfide is present in a processing tube (e.g., first chamber 810). At 3030, hydrogen sulfide is decomposed using photolysis (e.g., in a second chamber 815). At 3040, a separator (e.g., a cyclone separator) 3040 separates the decomposed hydrogen sulfide into hydrogen 3050 and sulfur 3060.

[0105] Figure 31 This is a system block diagram illustrating an exemplary system 3100 for a waste distillation plant used to process feedstock gases. The feedstock gases may include hydrogen sulfide, carbon dioxide, and methane. The feedstock gases may be generated from, for example, animal manure. System 3100 removes hydrogen sulfide, carbon dioxide, and methane from the feedstock gases and may also decompose hydrogen sulfide into hydrogen and sulfur. System 3100 may include one or more energy recycling loops that feed cold flow from further downstream processing back to the cooling input stream for further processing. This approach can recover energy and reduce the load on the cooling unit.

[0106] The system 3100 includes a raw gas receiving unit 3105, a raw gas precooler 3110, a hydrogen sulfide condenser 3115, a carbon dioxide subcooler 3120, a carbon dioxide condenser 3125, and an aftercooler tank 3130.

[0107] The feed gas receiving unit 3105 receives a feed gas comprising hydrogen sulfide, carbon dioxide, and hydrocarbons such as methane. The feed gas is pre-cooled in a feed gas precooler 3110, which lowers its temperature. The feed gas precooler 3110 may include a heat exchanger that exchanges heat with the hydrogen sulfide output stream 3112 (e.g., heat exchange occurs between the input streams, thereby raising the temperature of the hydrogen sulfide output stream 3112 while lowering the temperature of the feed gas stream). The cooled feed gas can be condensed in a hydrogen sulfide condenser 3115. The hydrogen sulfide condenser 3115 can separate hydrogen sulfide from the feed gas, resulting in a hydrogen sulfide output stream 3112 and a desulfurized feed gas stream 3117. The hydrogen sulfide output stream 3112 may be liquid and can be recycled using the feed gas precooler 3110 as described above.

[0108] The desulfurization feed gas 3117 comprises gaseous carbon dioxide and methane, which is subsequently cooled in a carbon dioxide subcooler 3120. The carbon dioxide subcooler 3120 may include a heat exchanger that uses the desulfurization feed gas 3117 as a hot input stream and further uses a cooled methane stream 3132 as a cold input stream. The carbon dioxide subcooler 3120 raises the temperature of the cooled methane stream 3132 while lowering the temperature of the desulfurization feed gas 3117. A carbon dioxide condenser 3125 can condense the carbon dioxide from the desulfurization feed gas 3117. The carbon dioxide condenser 3125 can separate carbon dioxide and methane, thereby producing a carbon dioxide output stream 3122 and a methane stream 3127. The carbon dioxide output stream 3122 can be recycled back to the heat exchanger as a cold input stream via a hydrogen sulfide condenser 3115. Similarly, methane stream 3127 can be stored in aftercooler tank 3130, the output of which can be methane stream 3132, which can be used as a cold input stream to the heat exchanger of carbon dioxide subcooler 3120. Cooled methane stream 3137 can be stored in storage tank 3140.

[0109] The carbon dioxide condenser 3125 can be driven by a carbon dioxide thermoelectric cooling element 3145, which includes a circuit for cooling a liquid that the carbon dioxide condenser 3125 uses to condense / separate carbon dioxide and methane. The carbon dioxide condenser 3125 may include a heat exchanger for exchanging heat between the cooling stream from the thermoelectric cooling element 3145 and the relatively warm carbon dioxide and methane gas received from the carbon dioxide subcooler 3120. While this example shows a thermoelectric cooling element, other cooling elements are also possible.

[0110] Because system 3100 recycles output streams 3112, 3122 and 3132 for cooling in earlier steps of the process, the cooling load required on the carbon dioxide thermoelectric cooling element is reduced.

[0111] Once the carbon dioxide output stream 3122 (which can be liquid when entering the hydrogen sulfide condenser 3115) is warmed, it can be used as output gas 3147. Similarly, once the hydrogen sulfide output stream 3112 (which can be liquid when entering the feed gas precooler 3110) is warmed, it can be used as output gas 3150.

[0112] In some implementations, the above-described information can be used. Figure 8 The photoreactor 800 and the gas-solid separator 1810 decompose the output hydrogen sulfide gas 3150 into sulfur 3155 and hydrogen 3160.

[0113] At 3120, the feed gas is cooled to separate hydrogen sulfide from hydrocarbons (e.g., methane) and other contaminants (e.g., carbon dioxide). At 3130, for example, a mixture of gases can be used. Figure 30 The process described herein is used to process the separated hydrogen sulfide to produce sulfur and hydrogen gas. At 3140, hydrocarbons and other contaminants that do not contain hydrogen sulfide can be processed.

[0114] Figure 32 yes Figure 31 A system block diagram of a variant of the exemplary system 3100 is shown.

[0115] Figures 33 to 35 This is a view showing an exemplary gas-solid separator 1810 in the form of a cyclone separator.

[0116] In some implementations, photoreactor arrays can be used in parallel to scale up any process flow. For example, Figures 36-41 Various views of an exemplary photoreactor array are shown. Each photoreactor includes a chamber through which hydrogen sulfide can pass. Within each chamber is at least one ultraviolet light source for irradiating the hydrogen sulfide and decomposing it into hydrogen and sulfides. Figure 36 In this design, the reactor array comprises nine reactors (a 3×3 array) that can split the input stream into nine independent streams, each of which can be processed independently and in parallel. These nine output streams can be recombined for further processing or maintained as separate streams. Other implementations are also possible, for example... Figure 41 Five ultraviolet light chambers are shown. Figure 48 Another exemplary photoreactor array is shown, wherein the photoreactor array 2000 includes four photoreactors, namely photoreactor 2000a, photoreactor 2000b, photoreactor 2000c and photoreactor 2000d.

[0117] Another exemplary system or apparatus according to the present subject matter may include an electronic module, a lamp module, a microwave module, a reactor module, a sensor module, an extraction module, a mounting structure, pipes / fittings, a control module, a blower module, a separator / recovery module, and a safety module. The electronic module may include a microcontroller and a power controller. The lamp module may include an electrodeless lamp and a lamp mount. The microwave module may include a magnetron, a power unit, and a waveguide. The reactor module may include a continuously stirred reactor (CSTR), a mounting structure, sensor ports (heat, pressure, flow, ultraviolet, H2 sensor, H2S sensor, multi-gas sensor, etc.), and wiring harnesses / conduits. The sensor module may include temperature, pressure, ultraviolet, flow, valve / actuator position, and gas sensors (H2, CH4, CO2, etc.). The extraction module may include a cyclone separator, a cooling coil, a thermoelectric cooler, electrodes (e.g., electrode plates) for recovering free radicals, and a gate / valve actuator. The mounting structure may include pipes, a cyclone separator, a microwave module, a sensor module, an electronic module, and a frame (angle steel, channel steel, profile steel), etc. Piping and fittings may include pipes, elbows, reducers, tees, stopcocks, and valves. Command and control modules may include computers and data acquisition cards. Safety modules may include safety (pressure) release systems, hydrogen control systems, environmental monitoring systems, and accidental UV leak protection systems. Blower modules may include: type: centrifugal, spiral, etc.; capacity (size): flow rate (cubic feet per minute, CFM); discharge pressure gauges and controls. Separator and recovery modules may include CO2 liquefaction systems, hydrogen processing systems, CO2 processing systems, and sulfur treatment systems for recovering CO2 and other gases from the feed.

[0118] In some embodiments, the system may include at least two coupled and fluidly connected chambers. A first chamber may be configured to receive and thermally excite an input feed comprising at least a portion of hydrogen sulfide. A second chamber may be configured to receive the thermally excited feed to decompose the hydrogen sulfide in the feed, thereby producing hydrogen and elemental sulfur, and separating the hydrogen and elemental sulfur, as well as any other components that may be present in the input feed.

[0119] As discussed in more detail below, the first chamber may include a microwave source configured to expose the feed flowing through and through the first chamber to microwave energy. This exposure can enhance the ability of hydrogen sulfide to absorb energy (e.g., ultraviolet light), thereby enhancing the efficiency of photodesulfurization. Furthermore, in some embodiments, the first chamber may be configured to facilitate the formation of a fixed wave, which, as described above, allows hydrogen sulfide to align with the fixed wave itself, thereby increasing the effective cross-sectional area of ​​the hydrogen sulfide for absorbing ultraviolet light.

[0120] Furthermore, as discussed in more detail below, the second chamber may include a light source (e.g., an ultraviolet light source) configured to expose the thermally excited feed to an effective amount of electromagnetic energy that can cause the cleavage of hydrogen-sulfur bonds, thereby forming hydrogen and elemental sulfur. While the second chamber may be coupled to a separator to separate elemental sulfur, in some embodiments, the second chamber may be configured to separate elemental sulfur from the remaining feed components present within the second chamber. The second chamber may also be configured to separate the cleaved hydrogen from the remaining feed components.

[0121] Figure 4B An exemplary embodiment of a desulfurization system 400 is shown. As shown, the system 400 includes two chambers 402 and 404 coupled together and in fluid communication. The first chamber 402 includes an inlet 406 for receiving an input feed (not shown). The input feed may be a raw feed or a processed feed having a composition containing at least hydrogen sulfide. In some embodiments, the input feed may be in the form of gas vapor.

[0122] Inlet 406 can supply input feed at a constant flow rate, which can be varied depending on the implementation of the system. Inlet 406 may include a meter or valve to control the flow rate of the input feed. Alternatively, the flow rate of the input feed can be continuously varied, for example, to reduce, increase, or maintain the yield of the product (e.g., elemental sulfur).

[0123] The first chamber 402 may also include a microwave source 408, which is positioned near the inlet 406 (e.g., at the distal end 402d of the first chamber 402). The microwave source 408 emits microwave energy to thermally excite hydrogen sulfide present in the input feed as it flows into and through the first chamber 402. As shown, the first chamber 402 may be elongated (or slender) and cylindrical along its main axis (e.g., tubular construction). It is also contemplated that the first chamber 402 may have other configurations. Furthermore, it is contemplated that the first chamber 402 may be [unclear - possibly related to a specific configuration or structure]. Figure 8 The photoreactor shown in the image is similar to the photoreactor 800, or may be a photoreactor similar to... Figure 48 The array shown is similar to a photoreactor array of 2000.

[0124] The first chamber 402 may include a waveguide configured to guide microwave energy through the first chamber (e.g., from the distal end 402d of the first chamber 402 to the proximal end 402p of the first chamber 402, where the proximal end is 404p). In some embodiments, the waveguide may be formed by the walls of the first chamber 402. In this case, the first chamber 402 may be formed of a suitable reflective material (such as stainless steel). Furthermore, at least a portion of the inner surface of the wall may be coated with a reflective composition in the desired area. Alternatively or additionally, the first chamber 402 may include a separate waveguide (e.g., a waveguide not formed by the walls of the first chamber).

[0125] It should be noted that, in some embodiments, the first chamber may include an array of sub-chambers, which are structurally similar to, for example, Figure 4B The first chamber 402 is shown in the figure. These sub-chambers can be arranged in series or in parallel.

[0126] like Figure 4B As shown, the proximal end 402p of the first chamber 402 is connected to the second chamber 404. The second chamber 404 includes a light source 410. Thus, the second chamber 404 can serve as a photoreactor. While the light source 410 can be configured to emit various types of light, in some embodiments, the light source 410 emits ultraviolet light. In one embodiment, the light source 410 radiates ultraviolet light having a wavelength range from about 100 nm to about 300 nm, from about 200 nm to about 300 nm, from about 280 nm to about 300 nm, or from about 290 nm to about 300 nm. As shown, the light source 410 can be attached to at least a portion of the inner surface of the second chamber 404. In one embodiment, the light source 410 can be coupled to the entire inner surface. It is contemplated that the light source 410 can be located in other areas or connected to components of the second chamber 404, for example, coupled to those described in more detail below. Figure 42 The vortex overflow pipe is located at position 1022.

[0127] The radiation time and / or intensity of the light emitted within the second chamber 404 can be appropriately adjusted by modifying the parameters of the light source 410. The light source 410 can be appropriately selected from radiation devices capable of enhancing a specific wavelength range. Exemplary light sources may include LEDs, lasers, etc.

[0128] In use, when the feed flows from the first chamber 402 into the second chamber 404, the ultraviolet light emitted by the light source 410 is at least partially absorbed by the hydrogen sulfide. This causes bond dissociation, resulting in the production of hydrogen gas and elemental sulfur. Although the second chamber 404 can have various shapes, such as... Figure 4BThe second chamber 404 shown is in the form of a cyclone, so the generated hydrogen gas exits the second chamber 404 through a first outlet 412 located at the top of the second chamber 404. Additionally, the generated elemental sulfur exits the second chamber 404 through a second outlet 414 located at the bottom of the second chamber 404. Furthermore, any remaining components of the feed present in the second chamber 404 can be exited through the first outlet 412 along with the hydrogen gas, or through the second outlet 414 along with the elemental sulfur. Alternatively or additionally, the remaining components can exit the second chamber 404 through a third outlet 416. Any outlet of the second chamber 404 may include a meter or valve to control the outflow rate of each component.

[0129] Furthermore, such as Figure 4B As shown, the second chamber 404 may include a gas permeation membrane 418 (e.g., a proton exchange membrane) configured to separate hydrogen from the remaining components of the feed and / or elemental sulfur. As illustrated, the gas permeation membrane 418 substantially separates hydrogen, allowing it to exit through a first outlet 412, while the remaining feed components exit through a third outlet 416. Furthermore, in some embodiments, if reactant gases are present within the second chamber 404, the gas permeation membrane 418 may also be configured to separate hydrogen from the reactant gases. In some embodiments, the gas permeation membrane 418 may include a catalyst.

[0130] like Figure 4B As shown, the second chamber 404 may include a cooling element 420. This cooling element 420 may be configured to control or alter the temperature of elemental sulfur, for example, by lowering the temperature to granulate the elemental sulfur. As shown, the cooling element 420 may be coupled to the inner surface of the second chamber 404. In other embodiments, the cooling element 420 may be incorporated into the wall of the second chamber 404 or coupled to the outer surface of the wall of the second chamber to form a jacketed second chamber. In another embodiment, the second chamber may be connected to a cooling device (e.g., a heat exchanger). Non-limiting examples of suitable cooling elements include air, water, etc., at a suitable temperature.

[0131] Furthermore, the second chamber 404 may include or be connected to a heating device. The heating device may be configured to control the reaction temperature at the start of the decomposition reaction or during the decomposition reaction. Non-limiting examples of suitable heating devices include flames, electric furnaces, heating plates, and airflows. Alternatively or additionally, a heating element may be integrated into the wall of the second chamber 404 or coupled to the outer surface of the wall of the second chamber 404. Non-limiting examples of suitable heating elements include air, water, etc., at suitable temperatures.

[0132] In some embodiments, system 400 may include a controller, or may be wired or wirelessly connected to the controller. The controller refers to a hardware device that may include a memory and a processor. The memory is configured to store modules, and the processor is specifically configured to execute the modules to perform one or more processes. The control logic of this subject matter may be embodied in a non-transitory computer-readable medium containing executable program instructions that are executed by a processor, controller / control unit, etc. Examples of computer-readable media include, but are not limited to, ROM, RAM, optical disc (CD)-ROMs, magnetic tape, floppy disks, flash drives, smart cards, and optical data storage devices. Computer-readable recording media may also be distributed across a network-connected computer system such that the computer-readable media is stored and executed in a distributed manner, for example, via a telematics server or a controller area network (CAN). The controller may be suitably connected to at least one component of the system, such as an inlet, outlet, first chamber, second chamber, microwave source, and light source, so that the controller controls the reaction (decomposition conditions). The controller may have a control algorithm capable of suitably adjusting system conditions.

[0133] Figures 42 to 47 Another exemplary embodiment of the desulfurization system 1000 is shown. Apart from the differences described in detail below, system 1000 can be similar to... Figure 4B The system 400 shown is not described in detail here. Furthermore, for simplicity, Figures 42 to 47 Some components of System 1000 are not shown in the diagram.

[0134] like Figure 42 , Figure 44 and Figure 45 As shown, system 1000 includes a first chamber 1002 and a second chamber 1004 connected to each other. The first chamber 1002 may be a photoreactor, like... Figure 8 The photoreactor 800 shown in the image is similar to, or could be, a photoreactor array, like... Figure 48 The array 2000 shown is the same. In some embodiments, such as Figure 42 , Figure 44 and Figure 45 As shown, the first chamber 1002 is directly connected to the second chamber. In other embodiments, an additional chamber or other component may be placed between the first chamber 1002 and the second chamber 1004.

[0135] like Figure 42 As shown, the second chamber may include a light source 1010 disposed at a vortex overflow pipe 1022 within the second chamber 1004. While the light source 1010 may have various structures, such as... Figure 42 as well as Figures 44 to 47As shown, the light source 1010 has a spiral structure wound around the outer surface of the eddy overflow pipe 1022. In use, a microwave source (not shown) can radiate microwave energy into the second chamber 1004, so that the microwave energy comes into contact with the light source 1010. In some embodiments, the light source 1010 may include an internal gas that generates ultraviolet light when in contact with the microwave energy.

[0136] Furthermore, such as Figure 42 and Figures 45 to 47 As shown, the second chamber 1004 includes two gas-permeable membranes 1018 (like...). Figure 4B (Similar to the gas permeation membrane 418 shown) and the second gas permeation membrane 1024. The second gas permeation membrane is located at the distal end 1022d of the vortex overflow pipe 1022. The second gas permeation membrane 1024 (e.g., a proton exchange membrane) can be constructed similarly to the gas permeation membrane 418, and therefore will not be discussed in detail here.

[0137] This subject matter may include refining systems, which include the desulfurization systems described herein. Specifically, the desulfurization system may include a recovery unit for introducing hydrogen produced by the reactor into another stage of a fuel processing system that utilizes hydrogen as input.

[0138] The first experiment was conducted to confirm the presence of sulfur, and sulfur was extracted from hydrogen sulfide.

[0139] Figure 5 This is a block diagram showing the test apparatus 500. Figure 6 and 7 A photograph of the test setup is shown. The test apparatus includes a hydrogen sulfide source arranged to introduce hydrogen sulfide into the inlet of a reaction chamber containing a UV-C lamp. The UV-C lamp (mercury-based) irradiates the gas inside the reaction chamber. The outlet of the UV-C lamp (reaction chamber) is connected to a collection container filled with water. The reaction chamber is approximately 115 cm long. The UV-C lamp is driven with a voltage of 234 volts and a current of 0.002 amperes.

[0140] The initial temperature of the reaction chamber is 27 degrees Celsius at 1 standard atmosphere (atm). Hydrogen sulfide is introduced into the lamp using sodium sulfide and hydrochloric acid. The output of the UV-C lamp is bubbled through pure water (H2O) in a collection container. Hydrogen sulfide is allowed to flow through the UV lamp for 15 minutes. Figure 7 As shown in the image, the H2O in the collection container on the left turns milky white, indicating the presence of sulfur in the output stream of the reaction chamber. After 15 minutes, the temperature of the reaction chamber is 35 degrees Celsius.

[0141] Although some variations have been described in detail above, other modifications or additions are possible. For example, ultraviolet light reactors can be used for sterilization to break the bonds of materials other than hydrogen sulfide (e.g., other binary and ternary molecules with appropriate bond dissociation energies).

[0142] One or more aspects or features of the subject matter described herein can be implemented in digital electronic circuits, integrated circuits, application-specific integrated circuits (ASICs), field-programmable gate arrays (FPGAs), computer hardware, firmware, software, and / or combinations thereof. These aspects or features can be implemented in one or more computer programs that can execute and / or interpret on a programmable system including at least one programmable processor, which may be dedicated or general-purpose, and which can be coupled to and receive data and instructions from a storage system, at least one input device, and at least one output device, and transmit data and instructions to the storage system, at least one input device, and at least one output device. The programmable system or computing system can include clients and servers. Clients and servers are typically geographically separated and typically interact via a communication network. The relationship between clients and servers is generated by computer programs running on their respective computers and having a client-server relationship with each other.

[0143] These computer programs (also referred to as programs, software, software applications, applications, components, or code) include machine instructions for a programmable processor and can be implemented in high-level procedural languages ​​(objects), object-oriented programming languages, functional programming languages, logic programming languages, and / or assembly / machine languages. As used herein, the term "machine-readable medium" refers to any computer program product, apparatus, and / or device (e.g., disk, optical disk, memory, and programmable logic device (PLD)) used to provide machine instructions and / or data to a programmable processor, which includes a machine-readable medium that receives machine instructions as machine-readable signals. The term "machine-readable signal" refers to any signal used to provide machine instructions and / or data to a programmable processor. Machine-readable media can store such machine instructions non-transitory, as would be done by non-transitory solid-state memory or magnetic hard disk drives or any equivalent storage medium. Machine-readable media can alternatively or additionally store such machine instructions temporarily, as would be done by processor cache or other random access memory associated with one or more physical processor cores.

[0144] To provide interaction with the user, one or more aspects or features of the subject matter described herein can be implemented on a computer having a display device (such as a cathode ray tube (CRT), liquid crystal display (LCD), or light-emitting diode (LED) monitor for displaying information to the user), a keyboard, and indicating devices (such as a mouse or trackball) through which the user can provide input to the computer. Other types of devices can also be used to provide interaction with the user. For example, feedback provided to the user can be any form of sensory feedback, such as visual, auditory, or tactile feedback, and input from the user can be received in any form, including sound, speech, or tactile input. Other possible input devices include touchscreens or other touch-sensitive devices (such as single-point or multi-point resistive or capacitive touchpads), voice recognition hardware and software, optical scanners, optical indicators, digital image capture devices, and related interpretation software, etc.

[0145] In the foregoing specification and claims, phrases such as “at least one” or “one or more” may appear, followed by a list of combinations of elements or features. The term “and / or” may also appear in a list of two or more elements or features. Unless implicitly or explicitly contradicting the context in which it is used, the phrase is intended to mean individually any of the listed elements or features, or any of the listed elements or features in combination with any other listed element or feature. For example, the phrases “at least one of A and B,” “one or more of A and B,” and “A and / or B” are intended to mean “A alone,” “B alone,” or “A and B together,” respectively. A similar interpretation applies to lists containing three or more terms. For example, the phrases “at least one of A, B, and C,” “one or more of A, B, and C,” and “A, B, and / or C” are intended to mean “A alone,” “B alone,” “C alone,” “A and B together,” “A and C together,” “B and C together,” or “A and B and C together,” respectively. Furthermore, the use of the term "based on" in the foregoing and in the claims is intended to mean "at least partially based on," thus allowing for the inclusion of features or elements not listed.

[0146] The subject matter described herein can be embodied in systems, apparatus, methods, and / or articles of manufacture according to desired configurations. The embodiments set forth in the foregoing description do not represent all embodiments consistent with the subject matter described herein. Rather, they are merely examples of aspects consistent with the described subject matter. Although some variations have been described in detail above, other modifications or additions are possible. In particular, other features and / or variations may be provided in addition to those features and / or variations set forth herein. For example, the embodiments described above can be adapted for various combinations and sub-combinations of the disclosed features and / or combinations and sub-combinations of several other features disclosed above. Furthermore, the logical flows depicted in the drawings and / or described herein do not necessarily require the specific order or sequence shown to achieve the desired results. Other embodiments are within the scope of the appended claims.

Claims

1. A system for producing sulfur using an input feed comprising hydrogen sulfide, the system comprising: A first chamber includes an inlet that allows input feed to enter the first chamber, the input feed including hydrogen sulfide; A microwave source is configured to radiate microwave energy into at least the first cavity; A second chamber, communicating with the first chamber, the second chamber including an outlet and a waveguide extending from a first end to a second end, wherein at least one of the first end or the second end is configured such that the microwave energy forms a standing wave within at least one of the waveguide or the second chamber; An ultraviolet light source is located within the waveguide of the second chamber; The microwave source is further configured to radiate the microwave energy into the waveguide of the second chamber, such that the microwave energy contacts the ultraviolet light source, the ultraviolet light source comprising an internal gas that generates ultraviolet light upon contact with the microwave energy.

2. The system according to claim 1, wherein, The second chamber further includes: The first electrode is configured to have a negative charge; and The second electrode is configured to have a positive charge, and the first electrode and the second electrode are outside the ultraviolet light source and inside the waveguide.

3. The system according to claim 1, further comprising: A tube assembly within the waveguide, the tube assembly containing the ultraviolet light source, the tube assembly including walls that are transparent to ultraviolet light and microwave energy.

4. The system according to claim 1, wherein, The first chamber is located between the microwave source and the second chamber, such that the microwave energy is generated by the microwave source and passes through the first chamber to reach the second chamber.

5. The system of claim 1, wherein the second chamber includes a plurality of tube assemblies extending through the second chamber, and the ultraviolet light source includes a plurality of ultraviolet light sources, each tube assembly comprising: Pipe assembly outlet; The wall is transparent to ultraviolet and microwave energy; as well as One of a plurality of ultraviolet light sources, the corresponding ultraviolet light source comprising an internal gas that generates ultraviolet light upon contact with the microwave energy; The microwave source is configured to radiate microwave energy into the first chamber and into the plurality of tube assemblies, such that the microwave energy contacts the plurality of ultraviolet light sources, causing the internal gas therein to generate ultraviolet light upon contact with the microwave energy.

6. The system according to claim 1, further comprising: A hydrogen sulfide source is connected to the inlet; A gas-solid separator, connected to the outlet, is configured to separate sulfur from hydrogen.

7. The system according to claim 1, wherein, The ultraviolet light source emits ultraviolet light with a wavelength range of 280nm to 300nm.

8. The system according to claim 1, wherein, The second chamber is elongated and extends along the main axis, and the ultraviolet light source is elongated along the main axis and located within the second chamber along the main axis, wherein the second chamber further includes: The first electrode is configured to have a negative charge; and The second electrode is configured to have a positive charge, and the first electrode and the second electrode are outside the ultraviolet light source and inside the waveguide; The first electrode is elongated along the main axis and is arranged above the ultraviolet light source, while the second electrode is elongated along the main axis and is arranged below the ultraviolet light source.

9. The system according to claim 1, wherein, The second chamber forms a hydrocyclone.

10. The system according to claim 9, wherein, The light source is located on the vortex overflow pipe inside the hydrocyclone.

11. The system according to claim 1, wherein, The further includes: a gas permeation membrane located within the second chamber, wherein the gas permeation membrane is configured to separate hydrogen gas generated from at least partial decomposition of the hydrogen sulfide when the hydrogen sulfide flows through the second chamber.

Citation Information

Patent Citations

  • Originality foul gas purifier still

    CN205730823U

  • Plasma generating equipment and ion source using it

    JP1990132798A

  • Radio-frequency plasma generator, surface treatment device constituted of the radio-frequency plasma generator, and surface treatment method

    JP2008311669A