Composite structure and method for evaluating the same, semiconductor and display manufacturing apparatus
By optimizing the microstructure of polycrystalline ceramic structures and controlling the hydrogen content, the problem of particle generation in ceramic coatings during semiconductor manufacturing was solved, achieving high particle resistance and adapting to the miniaturization and high-density plasma environment of semiconductor manufacturing equipment.
CN116895607BActive Publication Date: 2026-06-09TOTO LTD
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- TOTO LTD
- Filing Date
- 2019-03-07
- Publication Date
- 2026-06-09
Smart Images
Figure CN116895607B_ABST
Abstract
Provided is a ceramic coating having excellent particle resistance and a method for evaluating the particle resistance of a ceramic coating. Specifically, a composite structure including a base material and a structure having a surface provided on the base material, the structure including a polycrystalline ceramic, the composite structure satisfying a prescribed value for a brightness Sa calculated from TEM image analysis, can be appropriately used as an internal member of a semiconductor manufacturing device requiring particle resistance.
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