A rapid implantation device and system for radioactive seeds

Abstract

The application discloses a kind of radioactive particle fast implantation device and system, device includes: positioning needle;Guide needle, it is located in positioning needle and can be stretched from the distal end of positioning needle, guide needle as particle transport channel;Propelling needle, it is located in guide needle and can be stretched from the distal end of guide needle, propelling needle is used to push particle from guide needle;The end where the distal end of guide needle is located is working section, working section is made of memory material, it is curved when not under external force, the tangent of the axis of working section and the axis of working section distal end is first tangent, the angle α of first tangent and the axis of positioning needle is larger with the length of working section stretching the distal end of positioning needle increases.Implantation device can realize radioactive particle annular three-dimensional distribution, that is, it can be distributed along the circumferential direction of positioning needle and can be distributed along the axial direction parallel to positioning needle, and the arrangement position precision is high.

Description

TECHNICAL FIELD

[0001] The present application belongs to the field of medical devices, and particularly relates to a device and system for rapid implantation of radioactive particles. BACKGROUND

[0002] Radioactive particle implantation is one of the effective means for treating cancer, which is to implant radioactive particles into a tumor lesion site to kill cancer cells by the continuous radiation of the radioactive particles. This technique has the characteristics of strong targeting and no side effects, and has been widely used. Currently, one type of particle implantation surgery is completed manually by a doctor, and another type is completed with the assistance of a robot. Both types need multiple insertion needles to pass through the body surface, and the surgery is difficult, the accuracy is difficult to guarantee, the particle implantation efficiency is low, and the wound of the patient is relatively large.

[0003] For example, the patent with publication number CN214074691U discloses a percutaneous puncture radioactive particle implantation system, which realizes ring distribution of particles by bending or straightening the inner sheath tube through a steel wire. The form of controlling the deformation movement of the inner sheath tube by the steel wire is complex and is easily disturbed by external force, thereby affecting the accuracy of particle implantation. Moreover, the sheath tube is easily displaced due to the pulling of external force, and cannot be accurately positioned. In addition, since the inner sheath tube adopts a form similar to a spine, it is difficult to manufacture, and the bending angles of the inner sheath tube are only 8°, 16°, 24° and 32°, which leads to a low distribution range. When complex distribution of particles at multiple angles and dimensions is required, the system cannot achieve the distribution or needs multiple insertion needles to achieve the distribution.

[0004] For example, the patent with publication number CN217593014U discloses a puncture assembly composed of a bent sleeve and a needle tube and an elongated element. The needle tube includes a curved section 11e and a puncture tip 11c. The puncture of the needle tube is configured to be able to guide the elongated element into the needle cavity. The elongated element is used to guide the needle tube, so that the puncture tip of the needle tube can accurately puncture the puncture position, and the probability of position deviation in the puncture process is reduced. Since the sleeve is bent, multiple punctures are required to achieve the distribution of the particles. SUMMARY

[0005] The purpose of the present application is to provide a device for rapid implantation of radioactive particles, which can achieve ring-shaped three-dimensional distribution of particles with a single insertion needle, improve the particle layout accuracy, and has simple control, simple structure and low surgery difficulty.

[0006] To solve the above technical problems, the present application adopts the following technical scheme: a device for rapid implantation of radioactive particles, comprising:

[0007] A positioning needle for puncturing a target to be implanted with particles;

[0008] a guide needle arranged in the positioning needle and capable of extending out of the distal end of the positioning needle, the guide needle serving as a transport channel for the particles;

[0009] a pushing needle arranged in the guide needle and capable of extending out of the distal end of the guide needle, the pushing needle being used to push the particles out of the guide needle;

[0010] the distal end of the guide needle is an end portion of a working section, the rest of the guide needle is a supporting section, the working section is made of a memory material, in the absence of external force, the working section is curved, in the curved state of the working section, a tangent line tangent to the axis of the working section and passing through the distal end of the axis of the working section is a first tangent line, the included angle α between the first tangent line and the axis of the positioning needle increases with the increase of the length of the working section extending out of the distal end of the positioning needle.

[0011] In another embodiment, the axis of the positioning needle is a straight line, after the first implantation, the guide needle and the pushing needle are withdrawn into the positioning needle, then the positioning needle, the guide needle and the pushing needle are synchronously rotated, and the implantation is performed again, so that the one-time puncture and multiple implantations can be realized.

[0012] In another embodiment, the end face of the distal end of the positioning needle is arranged obliquely to the central axis of the distal end of the positioning needle, so that the distal end of the positioning needle is pointed, and the positioning needle is facilitated to penetrate into the body surface and the target of the source of the source.

[0013] In another embodiment, the vertex of the pointed distal end of the positioning needle is a first vertex, the end face of the distal end of the guide needle is arranged obliquely to the central axis of the distal end of the guide needle, so that the distal end of the guide needle is pointed, the vertex of the pointed distal end of the guide needle is a second vertex, the first vertex and the second vertex are located on both sides of the central axis of the distal end of the positioning needle, the first vertex is arranged as the lowest point of the distal end of the positioning needle, and the distal end of the guide needle can extend out of the distal end of the positioning needle earlier, i.e., the particles can be placed at a higher point of the target of the source of the source.

[0014] In another embodiment, the first vertex, the second vertex and the central axis of the distal end of the guide needle are coplanar, because the first vertex and the second vertex can extend out of the opening of the distal end of the positioning needle at the highest point, i.e., the height of the particles in the target of the source of the source can be maximized.

[0015] In another embodiment, the proximal ends of the positioning needle, the guide needle and the pushing needle are relatively fixed in the circumferential direction, the positioning needle, the guide needle and the pushing needle can be synchronously rotated, and the axis of rotation is the axis of the positioning needle, so that the synchronous rotation of the positioning needle, the guide needle and the pushing needle can be ensured.

[0016] In another embodiment, the support section is made of a memory material, which is curved in its natural state and the bending direction is opposite to the working section, which can increase the posture of the working section after the positioning needle.

[0017] In another embodiment, the axis of the support section in its natural state is a straight line, and the axis of the support section in its natural state coincides with the axis of the positioning needle, which can reduce the friction when the guide tube moves in the positioning needle, and make the movement of the guide tube more smooth.

[0018] In another embodiment, the positioning needle and the guide needle are both provided with a placement opening on the circumferential surface of the proximal end for placing particles into the guide needle, which makes it more convenient to operate.

[0019] In another embodiment, the circumferential surface of the positioning needle between the placement opening and the distal end is a full sealing surface, which prevents substances from entering between the positioning needle and the guide needle.

[0020] In another embodiment, the circumferential surface of the guide needle between the placement opening and the distal end is a full sealing surface, which prevents substances from entering between the guide needle and the push needle.

[0021] In another embodiment, the end of the push needle is blunt, which can make the push needle end more smoothly push the particles.

[0022] In another embodiment, the bending strength of the push needle is not greater than the bending strength of the guide needle, and when the distal end of the guide needle extends out of the distal end of the positioning needle, the distal end of the guide needle will not be deformed due to the movement of the push needle inside it.

[0023] In another embodiment, the bending strength of the guide needle is not greater than the bending strength of the positioning needle, which can ensure that the positioning needle remains straight when the guide needle is received in the positioning needle.

[0024] In another embodiment, 0° < α < 180°, which can maximize the implantation angle of the particles.

[0025] In another embodiment, 30° ≤ α ≤ 150°, which can make the implantation angle of the particles meet most of the needs while reducing the difficulty of operation of the moving curved working section.

[0026] In another embodiment, the distal end of the positioning needle is provided with a first opening, and the working section extends out of the first opening, and when the working section has 1 / 3 extending out of the first opening, 30° ≤ α ≤ 50°, which facilitates the arrangement of particles in a downward inclined manner.

[0027] In another embodiment, when the working section has 1 / 2 extending out of the first opening, 60° ≤ α ≤ 100°, which facilitates the arrangement of particles in a plane substantially perpendicular to the axis of the positioning needle.

[0028] In another embodiment, when the working section is 2 / 3 out of the first opening, 110°≤α≤140°, the particles are arranged in an upwardly inclined manner.

[0029] In another embodiment, the outer periphery of the push needle is in sealing contact with the inner periphery of the guide needle, so as to prevent any material from entering between the push needle and the guide needle.

[0030] In another embodiment, the outer periphery of the guide needle is in sealing contact with the inner periphery of the positioning needle, so as to prevent any material from entering between the guide needle and the positioning needle.

[0031] The present application also provides a fast implantation system of radioactive particles, which comprises a fast implantation device, a driving device for driving the implantation device to operate, and a replenishment device for replenishing radioactive particles into the fast implantation device.

[0032] The present application also provides an implantation method of a fast implantation device of radioactive particles, which comprises the following steps:

[0033] a. The guide needle is completely accommodated in the positioning needle, the push needle 33 is completely accommodated in the guide needle, and the positioning needle, the guide needle and the push needle 33 are synchronously moved to be inserted into the body surface until the center position P of the volumetric source target 0 is reached;

[0034] b. The positioning needle is fixed, and the guide needle and the push needle 33 continue to advance synchronously to the particle M implantation position;

[0035] c. The guide needle is fixed, and the push needle 33 is retracted;

[0036] d. The particle M is pushed into the guide needle through the particle M cavity, and the push needle 33 pushes the particle M;

[0037] e. After the particle M is pushed out of the guide needle and reaches the predetermined position, the guide needle and the push needle 33 are retracted;

[0038] f. When the guide needle is completely accommodated in the positioning needle, and the push needle 33 is completely accommodated in the guide needle, the positioning needle, the guide needle and the push needle 33 are synchronously rotated by a certain angle;

[0039] g. Steps b-f are repeated to complete the arrangement of the particles M in the circumferential direction of the positioning needle.

[0040] In another embodiment, the length of the guide needle extending out of the positioning needle in each step b can be the same or different. If the extension length of the guide needle extending out of the positioning needle is consistent, the particles M are distributed in substantially the same plane. When it is required to send the particles M to different positions in different postures, the extension length of the guide needle extending out of the positioning needle can be adjusted.

[0041] In another embodiment, the angle of rotation of the positioning needle, the guide needle and the pushing needle 33 in each step f can be the same or different. If the angle of rotation of the positioning needle, the guide needle and the pushing needle 33 is the same, the particles M are distributed approximately uniformly around the surface of the positioning needle. If the density of the particles M to be arranged at different positions is different, the particles M can be distributed sparsely or densely by rotating different angles.

[0042] The present application also provides an implantation method of the radioactive particle rapid implantation device, which comprises the following steps:

[0043] A. The guide needle is fully accommodated in the positioning needle, the pushing needle 33 is fully accommodated in the guide needle, and the positioning needle, the guide needle and the pushing needle 33 are synchronously moved to insert into the body surface until the volumetric source target is inserted;

[0044] B. The positioning needle is fixed, and the guide needle and the pushing needle 33 are synchronously continued to advance to the particle M implantation position;

[0045] C. The guide needle is fixed, and the pushing needle 33 is retracted;

[0046] D. The particles M are punched into the guide needle through the particle M cavity, and the pushing needle 33 pushes the particles M;

[0047] E. After the particles M are pushed out of the guide needle and reach the predetermined position, the guide needle and the pushing needle 33 are retracted;

[0048] F. When the guide needle is fully accommodated in the positioning needle, and the pushing needle 33 is fully accommodated in the guide needle, the positioning needle, the guide needle and the pushing needle 33 are synchronously pushed;

[0049] G. Steps B-F are repeated to arrange the particles M in the direction parallel to the axis of the positioning needle.

[0050] In another embodiment, the length of the guide needle protruding out of the positioning needle in each step B can be the same or different. If the length of the guide needle protruding out of the positioning needle is consistent, the particles M are approximately distributed in the same plane. If the particles M need to be sent to different positions in different postures, the length of the guide needle protruding out of the positioning needle can be adjusted to achieve the sparse or dense distribution of the particles M.

[0051] In another embodiment, the distance of the positioning needle, the guide needle and the pushing needle 33 synchronously pushed in each step F can be the same or different. If the distance of the positioning needle, the guide needle and the pushing needle 33 is the same, the particles M are approximately uniformly distributed in the direction parallel to the axis of the positioning needle. If the density of the particles M to be arranged at different positions is different, the particles M can be distributed sparsely or densely by pushing different distances.

[0052] The present application also provides an implantation method of the radioactive particle rapid implantation device, which comprises the following steps:

[0053] A1. The guide needle is completely housed in the positioning needle, the push needle 33 is completely housed in the guide needle, the positioning needle, the guide needle and the push needle 33 are synchronously moved to insert into the body surface, until inserted into the volumetric cloth source target;

[0054] A2. The particles M are arranged in the circumferential direction of the positioning needle

[0055] A3. The guide needle is completely housed in the positioning needle, the push needle 33 is completely housed in the guide needle, the positioning needle, the guide needle and the push needle 33 are synchronously moved to insert into the body surface, until inserted into the center of the volumetric cloth source target;

[0056] A4. The positioning needle is fixed, the guide needle and the push needle 33 are synchronously continued to advance a certain distance to the particle M implantation position;

[0057] A5. The guide needle is fixed, the push needle 33 is retracted;

[0058] A6. The particles M are punched into the guide needle by the particle M cavity, the push needle 33 pushes the particles M;

[0059] A7. After the particles M are pushed out of the guide needle and reach the predetermined position, the guide needle and the push needle 33 are retracted;

[0060] A8. When the guide needle is completely housed in the positioning needle, the push needle 33 is completely housed in the guide needle, the positioning needle, the guide needle and the push needle 33 are synchronously rotated by a certain angle;

[0061] A9. Repeat steps A4-A8 to complete the arrangement of particles M in the circumferential direction of the positioning needle;

[0062] A10. After completing the circumferential arrangement of particles M at a certain axial position of the positioning needle, the guide needle and the push needle 33 are retracted, and when the guide needle is completely housed in the positioning needle, the push needle 33 is completely housed in the guide needle, the positioning needle, the guide needle and the push needle 33 are synchronously advanced by a certain distance;

[0063] A11. Repeat steps A4-A10 to complete the overall arrangement in the direction parallel to the axial direction of the positioning needle and the circumferential direction of the positioning needle.

[0064] In another embodiment, the length of the guide needle protruding out of the positioning needle in each step A4 can be the same or different. If the protruding length of the guide needle protruding out of the positioning needle is consistent, the particles M are approximately distributed in the same plane. When it is necessary to deliver the particles M to different positions in different postures, the length of the guide needle protruding out of the positioning needle can be adjusted to achieve this.

[0065] In another implementation, in each step A8, the positioning pin, guide pin, and push pin 33 can rotate at the same or different angles. If the positioning pin, guide pin, and push pin 33 rotate at the same angle, the particles M will be distributed approximately evenly around the periphery of the positioning pin. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by rotating at different angles.

[0066] In another implementation, in each step A10, the positioning needle, guide needle and push needle 33 can advance the same distance or different distances. If the positioning needle, guide needle and push needle 33 advance the same distance, the particles M are distributed approximately evenly along the direction parallel to the axis of the positioning needle. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by advancing different distances.

[0067] The present invention also provides a method for implanting a rapid implantation device for radioactive particles, which includes the following steps:

[0068] B 1. The guide pin is completely retracted into the positioning pin, and the push pin 33 is completely retracted into the guide pin. The positioning pin, guide pin and push pin 33 move synchronously to insert into the body surface until they are inserted into the volumetric fabric source target.

[0069] B2. Arrange particles M in a direction parallel to the axial direction of the positioning pin;

[0070] B3. The guide needle is completely retracted into the positioning needle, and the push needle 33 is completely retracted into the guide needle. The positioning needle, guide needle and push needle 33 move synchronously to insert into the body surface until they are inserted into the center of the volumetric fabric source target.

[0071] B4. The positioning pin is fixed, and the guide pin and the advancing pin 33 continue to advance synchronously for a certain distance to the implantation position of particle M;

[0072] B5. The guide pin is fixed, and the push pin 33 is retracted;

[0073] B6. Particle M is injected into the guide needle through particle M cavity, and the pusher needle 33 pushes particle M forward;

[0074] B7. After particle M is pushed out of the guide needle and reaches the predetermined position, the guide needle and the pusher needle 33 retract.

[0075] B8. When the guide pin is completely retracted into the positioning pin and the push pin 33 is completely retracted into the guide pin, the positioning pin, guide pin and push pin 33 are simultaneously pushed forward a certain distance;

[0076] B9. Repeat steps B4-B8 to complete the placement of particles M in a direction parallel to the axial direction of the positioning pin;

[0077] B 10. The guide pin and the push pin 33 retract. When the guide pin is completely retracted into the positioning pin and the push pin 33 is completely retracted into the guide pin, the positioning pin, the guide pin and the push pin 33 are rotated at a certain angle simultaneously.

[0078] B 11. Repeat steps B4-B 10 to complete the full arrangement of particles M in the axial and circumferential directions of the positioning pin.

[0079] In another implementation, the length of the guide pin extending beyond the positioning pin in each step B4 can be the same or different. If the extension length of the guide pin beyond the positioning pin is the same, then the particles M are roughly distributed on the same plane. When it is necessary to send the particles M to different positions in different postures, this can be achieved by adjusting the length of the guide pin extending beyond the positioning pin.

[0080] In another implementation, in each step B8, the positioning needle, guide needle and push needle 33 can advance the same distance or different distances. If the positioning needle, guide needle and push needle 33 advance the same distance, the particles M are distributed approximately evenly along the direction parallel to the axis of the positioning needle. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by advancing different distances.

[0081] In another implementation, in each step B10, the positioning pin, guide pin, and push pin 33 can rotate at the same or different angles. If the positioning pin, guide pin, and push pin 33 rotate at the same angle, the particles M will be distributed approximately evenly around the periphery of the positioning pin. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by rotating at different angles.

[0082] The beneficial effects of this invention are as follows: 1. It achieves a three-dimensional circular distribution of radioactive particles, which can be distributed both circumferentially along the positioning needle and axially parallel to the positioning needle, with high positioning accuracy. When used for cancer treatment, it can accurately and effectively kill cancer cells; 2. With a single needle insertion, the wound area suffered by the patient is extremely small; 3. The structure is simple, the control is simple, and the surgical difficulty is low. Attached Figure Description

[0083] Figure 1 A schematic diagram of the rapid implantation system;

[0084] Figure 2 A cross-sectional view of the rapid implantation device with the guide needle fully retracted inside the positioning needle and the advance needle fully retracted inside the guide needle;

[0085] Figure 3 A cross-sectional view of the rapid implantation device with the guide pin extending out of the positioning pin and the advance pin fully retracted inside the guide pin;

[0086] Figure 4This is a schematic diagram of the process of arranging particles at the same height along the axis of the positioning pin in Example 1.

[0087] Figure 5 This is a schematic diagram of Example 2, in which part of the support segment also extends from the first opening. Detailed Implementation

[0088] The present invention will now be described in detail with reference to the embodiments shown in the accompanying drawings:

[0089] Example 1

[0090] like Figure 1 As shown, a rapid implantation system for radioactive particles includes a rapid implantation device O, a drive device P for driving the implantation device, and a supply device Q for replenishing the rapid implantation device with radioactive particles. Figures 2-3 As shown, the rapid implantation device O for radioactive particles includes a positioning needle 1, a guide needle 2, and an advance needle 3. The proximal ends of the positioning needle 1, guide needle 2, and advance needle 3 are relatively fixed in the circumferential direction. The positioning needle 1, guide needle 2, and advance needle 3 can rotate synchronously, with the axis of rotation being the axis of the positioning needle 1, which ensures that the positioning needle 1, guide needle 2, and advance needle 3 rotate synchronously.

[0091] Specifically:

[0092] The positioning needle 1 is used to puncture the target into which the implanted particles are inserted. The axis of the positioning needle 1 is a straight line. After one insertion, the guide needle 2 and the advance needle 3 are retracted into the positioning needle 1, allowing the positioning needle 1, guide needle 2, and advance needle 3 to rotate synchronously for another insertion. This allows for multiple insertions with a single puncture. The end face of the distal end 11 of the positioning needle 1 is inclined to the central axis of the distal end 11, making the distal end 11 of the positioning needle 1 pointed, which facilitates the insertion of the positioning needle 1 into the body surface and the target.

[0093] The guide pin 2 is located inside the positioning pin 1 and extends from the distal end 11 of the positioning pin 1, serving as a particle transport channel. The distal end of the guide pin 2 is the working section 21, and the rest of the guide pin 2 is the support section 22. The working section 21 is made of memory material and is curved when not subjected to external force. In the curved state of the working section 21, the tangent line y that is tangent to the axis x of the working section 21 and passes through the distal end of its axis is the first tangent line y. The angle α between the first tangent line y and the axis z of the positioning pin 1 increases with the length of the working section 21 extending beyond the distal end 11 of the positioning pin 1. The support section 22 is also made of memory material and is curved in its natural state, with its bending direction opposite to that of the working section 21, which can improve the posture of the working section 21 after it extends beyond the positioning pin 1. The bending strength of the guide pin 2 is no greater than that of the positioning pin 1, ensuring that the positioning pin 1 remains straight when the guide pin 2 is retracted into the positioning pin 1. 0° < α < 180° maximizes the particle implantation angle; optimally, 30° ≤ α ≤ 150° satisfies most needs for particle implantation angle while reducing the operational difficulty of moving the curved working section 21. The distal end 11 of the positioning pin 1 has a first opening, from which the working section 21 extends. More preferably, when 1 / 3 of the working section 21 extends beyond the first opening, 30° ≤ α ≤ 50°, facilitating downward tilting of particles; when 1 / 2 of the working section 21 extends beyond the first opening, 60° ≤ α ≤ 100°, facilitating particle placement on a surface approximately perpendicular to the axis of the positioning pin 1; when 2 / 3 of the working section 21 extends beyond the first opening, 110° ≤ α ≤ 140°, facilitating upward tilting of particles.

[0094] The pointed tip of the distal end 11 of the positioning needle 1 is designated as the first vertex 11a. The distal end face of the guide needle 2 is inclined to the central axis of the distal end of the guide needle 2, making the distal end of the guide needle 2 pointed. The pointed tip of the distal end of the guide needle 2 is designated as the second vertex 21a. The first vertex 11a and the second vertex 21a are located on opposite sides of the central axis of the distal end 11 of the positioning needle 1. Let the first vertex 11a be the lowest point of the distal end 11 of the positioning needle 1. The distal end of the guide needle 2 can extend beyond the distal end 11 of the positioning needle 1 earlier, meaning it can place the particle at a higher point on the placed fabric source target. The first vertex 11a, the second vertex 21a, and the central axis of the distal end of the guide needle 2 are coplanar. Since the first vertex 11a and the second vertex 21a can extend from the highest point of the opening of the distal end 11 of the positioning needle 1 at the distal end of the guide needle 2, the height of the particle within the placed fabric source target can be maximized.

[0095] The pusher needle 3 is located inside the guide needle 2 and can extend from the distal end of the guide needle 2. The pusher needle 3 is used to push particles out of the guide needle 2. The end of the pusher needle 3 is blunt, which allows for smoother particle propulsion. The bending strength of the pusher needle 3 is not greater than that of the guide needle 2. When the distal end of the guide needle 2 extends beyond the distal end 11 of the positioning needle 1, the distal end of the guide needle 2 will not deform due to the movement of the pusher needle 3 inside it.

[0096] Both the positioning pin 1 and the guide pin 2 have placement ports on their proximal circumferential surfaces for inserting particles into the guide pin 2, making particle insertion from the circumferential surface easier to operate. The circumferential surface of the positioning pin 1 between its placement port and its distal end is a fully sealed surface to prevent substances from entering between the positioning pin 1 and the guide pin 2. The circumferential surface of the guide pin 2 between its placement port and its distal end is also a fully sealed surface to prevent substances from entering between the propulsion pin 3 and the guide pin 2. The outer circumferential surface of the propulsion pin 3 is sealed against the inner circumferential surface of the guide pin 2 to prevent substances from entering between the propulsion pin 3 and the guide pin 2. The outer circumferential surface of the guide pin 2 is sealed against the inner circumferential surface of the positioning pin 1 to prevent substances from entering between the positioning pin 1 and the guide pin 2.

[0097] Example 2

[0098] like Figure 1 As shown, a rapid implantation system for radioactive particles includes a rapid implantation device O, a drive device P for driving the implantation device, and a supply device Q for replenishing the rapid implantation device with radioactive particles. Figure 5 As shown, the rapid implantation device O for radioactive particles includes a positioning needle 1, a guide needle 2, and an advance needle 3. The proximal ends of the positioning needle 1, guide needle 2, and advance needle 3 are relatively fixed in the circumferential direction. The positioning needle 1, guide needle 2, and advance needle 3 can rotate synchronously, with the axis of rotation being the axis of the positioning needle 1, which ensures that the positioning needle 1, guide needle 2, and advance needle 3 rotate synchronously.

[0099] Specifically:

[0100] The positioning needle 1 is used to puncture the target into which the implanted particles are inserted. The axis of the positioning needle 1 is a straight line. After one insertion, the guide needle 2 and the advance needle 3 are retracted into the positioning needle 1, allowing the positioning needle 1, guide needle 2, and advance needle 3 to rotate synchronously for another insertion. This allows for multiple insertions with a single puncture. The end face of the distal end 11 of the positioning needle 1 is inclined to the central axis of the distal end 11, making the distal end 11 of the positioning needle 1 pointed, which facilitates the insertion of the positioning needle 1 into the body surface and the target.

[0101] The guide pin 2 is located inside the positioning pin 1 and extends from the distal end 11 of the positioning pin 1. The guide pin 2 serves as a particle transport channel. The distal end of the guide pin 2 is the working section 21, and the rest of the guide pin 2 is the support section 22. The working section 21 is made of memory material and is curved when not subjected to external force. In the curved state of the working section 21, the tangent line that is tangent to the axis x of the working section 21 and passes through the distal end of its axis is the first tangent line y. The angle α between the first tangent line y and the axis z of the positioning pin 1 increases with the length of the working section 21 extending from the distal end 11 of the positioning pin 1. The axis of the support section 22 is straight in its natural state. The axis of the support section 22 in its natural state coincides with the axis z of the positioning pin 1, which can reduce the friction when the guide tube moves inside the positioning pin 1, making the movement of the guide tube smoother. The bending strength of the guide pin 2 is no greater than that of the positioning pin 1, ensuring that the positioning pin 1 remains straight when the guide pin 2 is housed within it. 0° < α < 180° maximizes the particle implantation angle; optimally, 30° ≤ α ≤ 150° satisfies most particle implantation angle requirements while reducing the operational difficulty of moving the bent working section 21. The distal end 11 of the positioning pin 1 has a first opening from which the working section 21 extends. More preferably, when 1 / 3 of the working section 21 extends beyond the first opening, 30° ≤ α ≤ 50°, facilitating downward-tilted particle placement; when 1 / 2 of the working section 21 extends beyond the first opening, 60° ≤ α ≤ 100°, facilitating particle placement on a surface approximately perpendicular to the axis of the positioning pin 1; when 2 / 3 of the working section 21 extends beyond the first opening, 110° ≤ α ≤ 140°, facilitating upward-tilted particle placement.

[0102] The pointed tip of the distal end 11 of the positioning needle 1 is designated as the first vertex 11a. The distal end face of the guide needle 2 is inclined to the central axis of the distal end of the guide needle 2, making the distal end of the guide needle 2 pointed. The pointed tip of the distal end of the guide needle 2 is designated as the second vertex 21a. The first vertex 11a and the second vertex 21a are located on opposite sides of the central axis of the distal end 11 of the positioning needle 1. Let the first vertex 11a be the lowest point of the distal end 11 of the positioning needle 1. The distal end of the guide needle 2 can extend beyond the distal end 11 of the positioning needle 1 earlier, meaning it can place the particle at a higher point on the placed fabric source target. The first vertex 11a, the second vertex 21a, and the central axis of the distal end of the guide needle 2 are coplanar. Since the first vertex 11a and the second vertex 21a can extend from the highest point of the opening of the distal end 11 of the positioning needle 1 at the distal end of the guide needle 2, the height of the particle within the placed fabric source target can be maximized.

[0103] The pusher needle 3 is located inside the guide needle 2 and can extend from the distal end of the guide needle 2. The pusher needle 3 is used to push particles out of the guide needle 2. The end of the pusher needle 3 is blunt, which allows for smoother particle propulsion. The bending strength of the pusher needle 3 is not greater than that of the guide needle 2. When the distal end of the guide needle 2 extends beyond the distal end 11 of the positioning needle 1, the distal end of the guide needle 2 will not deform due to the movement of the pusher needle 3 inside it.

[0104] Both the positioning pin 1 and the guide pin 2 have placement ports on their proximal circumferential surfaces for inserting particles into the guide pin 2, making particle insertion from the circumferential surface easier to operate. The circumferential surface of the positioning pin 1 between its placement port and its distal end is a fully sealed surface to prevent substances from entering between the positioning pin 1 and the guide pin 2. The circumferential surface of the guide pin 2 between its placement port and its distal end is also a fully sealed surface to prevent substances from entering between the propulsion pin 3 and the guide pin 2. The outer circumferential surface of the propulsion pin 3 is sealed against the inner circumferential surface of the guide pin 2 to prevent substances from entering between the propulsion pin 3 and the guide pin 2. The outer circumferential surface of the guide pin 2 is sealed against the inner circumferential surface of the positioning pin 1 to prevent substances from entering between the positioning pin 1 and the guide pin 2.

[0105] This implantable device has the following four methods of use, but is not limited to these four:

[0106] Method 1

[0107] like Figure 4 As shown, if it is only necessary to arrange particles M around the center of the source target (tumor), the implantation method of the rapid implantation device based on the above-mentioned radioactive particles includes the following steps:

[0108] a. Make the guide needle 2 completely retracted into the positioning needle 1, and the push needle 3 completely retracted into the guide needle 2. The positioning needle 1, guide needle 2 and push needle 3 move synchronously to insert into the body surface until they are inserted into the center position P of the volume-shaped fabric source target 0.

[0109] b. Positioning pin 1 is fixed, and guide pin 2 and advance pin 3 continue to advance synchronously for a certain distance to the implantation position of particle M;

[0110] c. Guide pin 2 is fixed, and push pin 3 is retracted;

[0111] d. Particle M is injected into the guide needle 2 through the particle M cavity, and the pusher needle 3 pushes the particle M forward;

[0112] e. After particle M is pushed out of guide needle 2 and reaches the predetermined position, guide needle 2 and push needle 3 retract;

[0113] f. When the guide pin 2 is completely retracted into the positioning pin 1 and the push pin 3 is completely retracted into the guide pin 2, the positioning pin 1, the guide pin 2 and the push pin 3 are rotated synchronously at a certain angle.

[0114] g. Repeat step bf to complete the arrangement of particles M in the circumference of the positioning pin.

[0115] In each step b, the length by which the guide pin 2 extends beyond the positioning pin 1 can be the same or different. If the extension lengths of the guide pin 2 and the positioning pin 1 are the same, then the particles M are roughly distributed on the same plane. When it is necessary to send the particles M to different positions with different postures, this can be achieved by adjusting the length of the guide pin 2 extending beyond the positioning pin 1. In each step f, the angles at which the positioning pin 1, guide pin 2, and propulsion pin 3 rotate synchronously can be the same or different. If the angles at which the positioning pin 1, guide pin 2, and propulsion pin 3 rotate synchronously are the same, then the particles M are roughly evenly distributed outside the circumference of the positioning pin 1. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by rotating at different angles.

[0116] Method 2

[0117] If the placement of particles M only needs to be completed along the axial direction parallel to the positioning needle 1, the implantation method based on the above-mentioned rapid implantation device for radioactive particles includes the following steps:

[0118] A. Make the guide needle 2 completely retracted into the positioning needle 1, and the push needle 3 completely retracted into the guide needle 2. The positioning needle 1, guide needle 2 and push needle 3 move synchronously to insert into the body surface until they are inserted into the volumetric fabric source target.

[0119] B. Positioning pin 1 is fixed, and guide pin 2 and advance pin 3 continue to advance synchronously for a certain distance to the implantation position of particle M;

[0120] C. Guide pin 2 is fixed, and push pin 3 is retracted;

[0121] D. Particle M is injected into guide needle 2 through particle M cavity, and push needle 3 pushes particle M forward;

[0122] E. After particle M is pushed out of guide needle 2 and reaches the predetermined position, guide needle 2 and push needle 3 retract;

[0123] F. When the guide pin 2 is completely retracted into the positioning pin 1 and the push pin 3 is completely retracted into the guide pin 2, the positioning pin 1, guide pin 2 and push pin 3 are pushed forward simultaneously.

[0124] G. Repeat step BF to complete the placement of particles M in a direction parallel to the axial direction of positioning pin 1.

[0125] In each step B, the length by which the guide pin 2 extends beyond the positioning pin 1 can be the same or different. If the extension lengths of the guide pin 2 and the positioning pin 1 are the same, then the particles M are roughly distributed on the same plane. When it is necessary to send the particles M to different positions with different postures, this can be achieved by adjusting the length of the guide pin 2 extending beyond the positioning pin 1. In each step F, the distances by which the positioning pin 1, guide pin 2, and propulsion pin 3 advance synchronously can be the same or different. If the distances by which the positioning pin 1, guide pin 2, and propulsion pin 3 advance are the same, then the particles M are roughly evenly distributed along a direction parallel to the axis of the positioning pin 1. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by advancing different distances.

[0126] Method 3

[0127] To complete the overall arrangement along the direction parallel to the axis of positioning pin 1 and around the circumference of positioning pin 1, the arrangement of particles M on the circumference of positioning pin 1 at the same axial position can be completed first, and then the arrangement of particles M at different axial positions can be completed. The implantation method of the above-mentioned rapid implantation device for radioactive particles includes the following steps:

[0128] A1. Make the guide needle 2 completely retracted into the positioning needle 1, and the push needle 3 completely retracted into the guide needle 2. The positioning needle 1, guide needle 2 and push needle 3 move synchronously to insert into the body surface until they are inserted into the volumetric fabric source target.

[0129] A2. Arrange particles M around the circumference of positioning pin 1.

[0130] A3. Make the guide needle 2 completely retracted into the positioning needle 1, and the push needle 3 completely retracted into the guide needle 2. The positioning needle 1, guide needle 2 and push needle 3 move synchronously to insert into the body surface until they are inserted into the center of the volumetric fabric source target.

[0131] A4. Positioning pin 1 is fixed, and guide pin 2 and advance pin 3 continue to advance synchronously for a certain distance to the implantation position of particle M;

[0132] A5. Guide pin 2 is fixed, and push pin 3 is retracted;

[0133] A6. Particle M is injected into guide needle 2 through particle M cavity, and push needle 3 pushes particle M;

[0134] A7. After particle M is pushed out of guide needle 2 and reaches the predetermined position, guide needle 2 and push needle 3 retract;

[0135] A8. When the guide pin 2 is completely retracted into the positioning pin 1 and the push pin 3 is completely retracted into the guide pin 2, the positioning pin 1, the guide pin 2 and the push pin 3 are rotated synchronously at a certain angle.

[0136] A9. Repeat steps A4-A8 to complete the arrangement of particles M in the circumference of the positioning pin;

[0137] A10. After the circumferential arrangement of particles M at a certain axial position of positioning pin 1 is completed, guide pin 2 and push pin 3 retract. When guide pin 2 is completely retracted into positioning pin 1 and push pin 3 is completely retracted into guide pin 2, positioning pin 1, guide pin 2 and push pin 3 are simultaneously pushed forward a certain distance.

[0138] A11. Repeat steps A4-A10 to complete the overall arrangement along the direction parallel to the axial direction of positioning pin 1 and around the circumference of positioning pin 1.

[0139] In each step A4, the length by which the guide pin 2 extends beyond the positioning pin 1 can be the same or different. If the extension lengths of the guide pin 2 beyond the positioning pin 1 are the same, then the particles M are roughly distributed on the same plane. When it is necessary to send the particles M to different positions with different postures, this can be achieved by adjusting the length of the guide pin 2 extending beyond the positioning pin 1. In each step A8, the angles at which the positioning pin 1, guide pin 2, and push pin 3 rotate synchronously can be the same or different. If the angles at which the positioning pin 1, guide pin 2, and push pin 3 rotate synchronously are the same, then the particles M are roughly evenly distributed outside the circumference of the positioning pin 1. When the density of particles M to be arranged at different positions is different, different rotation angles can be used to achieve a denser distribution of particles M. In each step A10, the distances by which the positioning pin 1, guide pin 2, and push pin 3 advance synchronously can be the same or different. If the distances by which the positioning pin 1, guide pin 2, and push pin 3 advance are the same, then the particles M are roughly evenly distributed along a direction parallel to the axis of the positioning pin 1. When the density of particles M to be arranged at different positions is different, different advancing distances can be used to achieve a denser distribution of particles M.

[0140] Method 4

[0141] To complete the overall arrangement of particles along the axial direction parallel to the positioning pin 1 and around the positioning pin 1, the arrangement of particles M parallel to the axial direction of the positioning pin 1 can be completed first, followed by the arrangement of particles M at different angles on different circumferential surfaces. Therefore, the implantation method based on the aforementioned rapid implantation device for radioactive particles includes the following steps:

[0142] B 1. Make the guide needle 2 completely retracted into the positioning needle 1, and the push needle 3 completely retracted into the guide needle 2. The positioning needle 1, guide needle 2 and push needle 3 move synchronously to insert into the body surface until they are inserted into the volumetric fabric source target.

[0143] B2. Arrange particles M in a direction parallel to the axis of positioning pin 1;

[0144] B3. Make the guide needle 2 completely retracted into the positioning needle 1, and the push needle 3 completely retracted into the guide needle 2. The positioning needle 1, guide needle 2 and push needle 3 move synchronously to insert into the body surface until they are inserted into the center of the volumetric fabric source target.

[0145] B4. Positioning pin 1 is fixed, and guide pin 2 and advance pin 3 continue to advance synchronously for a certain distance to the implantation position of particle M;

[0146] B5. Guide pin 2 is fixed, and push pin 3 is retracted;

[0147] B6. Particle M is injected into guide needle 2 through particle M cavity, and push needle 3 pushes particle M forward;

[0148] B7. After particle M is pushed out of guide pin 2 and reaches the predetermined position, guide pin 2 and push pin 3 retract.

[0149] B8. When the guide pin 2 is completely retracted into the positioning pin 1 and the push pin 3 is completely retracted into the guide pin 2, the positioning pin 1, guide pin 2 and push pin 3 are simultaneously pushed forward a certain distance;

[0150] B9. Repeat steps B4-B8 to complete the arrangement of particles M in a direction parallel to the axial direction of positioning pin 1;

[0151] B 10. Guide pin 2 and push pin 3 retract. When guide pin 2 is completely retracted into positioning pin 1 and push pin 3 is completely retracted into guide pin 2, positioning pin 1, guide pin 2 and push pin 3 are rotated at a certain angle simultaneously.

[0152] B 11. Repeat steps B4-B 10 to complete the full arrangement of particles M in the axial and circumferential directions of positioning pin 1.

[0153] In each step B4, the length by which the guide pin 2 extends beyond the positioning pin 1 can be the same or different. If the extension lengths of the guide pin 2 beyond the positioning pin 1 are the same, then the particles M are roughly distributed on the same plane. When it is necessary to send the particles M to different positions with different postures, this can be achieved by adjusting the length of the guide pin 2 extending beyond the positioning pin 1. In each step B8, the distance by which the positioning pin 1, guide pin 2, and push pin 3 advance synchronously can be the same or different. If the distances of the positioning pin 1, guide pin 2, and push pin 3 advance synchronously are the same, then the particles M are roughly evenly distributed along a direction parallel to the axis of the positioning pin 1. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by advancing different distances. In each step B10, the angles by which the positioning pin 1, guide pin 2, and push pin 3 rotate synchronously can be the same or different. If the angles by which the positioning pin 1, guide pin 2, and push pin 3 rotate synchronously are the same, then the particles M are roughly evenly distributed outside the circumference of the positioning pin 1. When the density of particles M to be arranged at different positions is different, the density distribution of particles M can be achieved by rotating different angles.

[0154] The above embodiments are only for illustrating the technical concept and features of the present invention, and are intended to enable those skilled in the art to understand the content of the present invention and implement it accordingly. They should not be construed as limiting the scope of protection of the present invention. All equivalent changes or modifications made in accordance with the spirit of the present invention should be covered within the scope of protection of the present invention.

Claims

1. A device for rapid implantation of radioactive particles, comprising: A positioning needle, used to puncture the target into which the implanted particle is placed; A guide needle is disposed inside the positioning needle and can extend from the distal end of the positioning needle, the guide needle serving as a particle transport channel; A pusher needle, which is disposed within the guide needle and can extend from the distal end of the guide needle, is used to push particles out of the guide needle; The feature is that: the distal end of the guide pin is the working section, the other part of the guide pin is the support section, the working section is made of memory material, and it is curved when not subjected to external force. In the curved state of the working section, the tangent line that is tangent to the axis of the working section and passes through the distal end of its axis is the first tangent line. The angle α between the first tangent line and the axis of the positioning pin increases with the length of the working section extending beyond the distal end of the positioning pin. The distal end face of the positioning pin is inclined to the central axis of the distal end of the positioning pin, making the distal end of the positioning pin pointed; the apex of the pointed distal end of the positioning pin is the first apex, the distal end face of the guide pin is inclined to the central axis of the distal end of the guide pin, making the distal end of the guide pin pointed, and the apex of the pointed distal end of the guide pin is the second apex, the first apex and the second apex are located on both sides of the central axis of the distal end of the positioning pin.

2. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The centerline of the positioning pin is a straight line.

3. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The central axes of the first vertex, the second vertex, and the distal end of the guide pin are coplanar.

4. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The proximal ends of the positioning pin, the guide pin, and the advance pin are fixed relative to each other in the circumferential direction. The positioning pin, the guide pin, and the advance pin can rotate synchronously, with the axis of rotation being the center line of the positioning pin.

5. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The support segment is made of shape memory material and is naturally curved in the opposite direction to the working segment.

6. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The centerline of the support section in its natural state is a straight line, and the working section is the part that extends out of the positioning needle when the particle is implanted.

7. The rapid implantation device for radioactive particles according to claim 1, characterized in that: Both the positioning pin and the guide pin have placement openings on their proximal ends for placing particles into the guide pin.

8. The rapid implantation device for radioactive particles according to claim 7, characterized in that: The circumferential surface of the positioning pin between its placement port and its distal end is a fully sealed surface.

9. The rapid implantation device for radioactive particles according to claim 7, characterized in that: The circumferential surface of the guide pin between its placement port and its distal end is a fully sealed surface.

10. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The tip of the propellant needle is blunt.

11. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The bending strength of the advance needle is not greater than that of the guide needle.

12. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The bending strength of the guide pin is not greater than the bending strength of the positioning pin.

13. The rapid implantation device for radioactive particles according to claim 1, characterized in that: 0°<α<180°。 14. The rapid implantation device for radioactive particles according to claim 13, characterized in that: 30°≤α≤150°。 15. The rapid implantation device for radioactive particles according to claim 14, characterized in that: The distal end of the positioning pin is provided with a first opening, and the working section extends out from the first opening. When 1 / 3 of the working section extends out of the first opening, 30°≤α≤50°.

16. The rapid implantation device for radioactive particles according to claim 14, characterized in that: When half of the working section extends outside the first opening, 60°≤α≤100°.

17. The rapid implantation device for radioactive particles according to claim 14, characterized in that: When 2 / 3 of the working section extends outside the first opening, 110°≤α≤140°.

18. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The outer peripheral surface of the pusher needle is sealed and fitted to the inner peripheral surface of the guide needle.

19. The rapid implantation device for radioactive particles according to claim 1, characterized in that: The outer peripheral surface of the guide pin is sealed and fitted to the inner peripheral surface of the positioning pin.

20. A rapid implantation system for radioactive particles, comprising a rapid implantation device, a driving device for driving the rapid implantation device, and a supply device for replenishing the rapid implantation device with radioactive particles, characterized in that: The rapid implantation device is any one of the rapid implantation devices described in claims 1-19.

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