Mask mold, platinum electrode forming method in tube, and conductivity sensor

Abstract

The embodiments of the present application provide a mask mold, a method for forming an in-tube platinum electrode, and a conductivity sensor, which are used to form a platinum electrode on the inner wall of a target circular tube, wherein the target circular tube is provided with multiple annular grooves and multiple through holes; the mask mold includes a rigid shaft body and multiple annular sleeves, and multiple cylindrical flange portions are sequentially arranged on the rigid shaft body along its axial direction. The multiple annular sleeves and the multiple cylindrical flange portions are equal in number and are arranged one-to-one, and the annular sleeves are sleeved on the cylindrical surfaces of the corresponding cylindrical flange portions; when the mask mold is embedded in the target circular tube, the multiple annular sleeves and the multiple annular grooves are alternately distributed along the axial direction of the target circular tube; the multiple annular sleeves are gap-fitted with the inner wall of the target circular tube at a first temperature, and are thermally expanded at a preset deposition temperature to form an interference connection with the inner wall of the target circular tube to shield the area on the inner wall of the target circular tube where no annular grooves are provided, and the first temperature is lower than the preset deposition temperature.

Description

Technical Field

[0001] The present application relates to the technical field of conductivity sensor manufacturing, and in particular to a mask mold, a method for forming an in-tube platinum electrode, and a conductivity sensor. Background Art

[0002] Seawater conductivity is a crucial parameter in oceanographic research. Rapid and accurate conductivity measurement is crucial for oceanographic research and the development of marine resources. Conductivity sensors are a commonly used measuring device for seawater conductivity measurement. Common types include three-electrode, four-electrode, and seven-electrode conductivity sensors. For example, a seven-electrode conductivity sensor uses seven platinum ring electrodes mounted on the inner wall of a conductivity cell tube. The sensor measures the change in seawater resistance between two voltage electrodes on the cell tube to determine seawater conductivity. However, conventional techniques for forming the platinum ring electrodes within the cell tube are difficult and suffer from poor uniformity and stability after forming. Summary of the Invention

[0003] The embodiments of the present application provide a mask mold, a method for forming a platinum electrode in a tube, and a conductivity sensor, which can reduce the difficulty of forming the platinum electrode and ensure the uniformity and stability of the platinum electrode after forming.

[0004] In the first aspect, an embodiment of the present application provides a mask mold for forming a platinum electrode on the inner wall of a target circular tube, wherein the target circular tube is provided with a plurality of annular grooves and a plurality of through holes, wherein the plurality of annular grooves are sequentially spaced along the axial direction of the target circular tube on the inner wall of the target circular tube, and the plurality of through holes and the plurality of annular grooves are equal in number and are connected one-to-one; the mask mold comprises a rigid shaft and a plurality of annular sleeves, wherein the rigid shaft is sequentially spaced along the axial direction thereof on a plurality of cylindrical flange portions, wherein the plurality of annular sleeves and the plurality of cylindrical flange portions are sequentially spaced. The number of flange parts is equal and they are arranged in one-to-one correspondence, and the annular sleeves are arranged on the cylindrical surface of the corresponding cylindrical flange part; when the mask mold is embedded in the target circular tube, the multiple annular sleeves and the multiple annular grooves are alternately distributed in sequence along the axial direction of the target circular tube; the multiple annular sleeves are clearance-fitted with the inner wall of the target circular tube at a first temperature, and are thermally expanded at a preset deposition temperature to form an interference connection with the inner wall of the target circular tube to shield the area on the inner wall of the target circular tube where no annular grooves are provided, and the first temperature is lower than the preset deposition temperature.

[0005] In some embodiments, at the preset deposition temperature, the two end edges of the annular groove along its axial direction are flush with the edges of the two adjacent annular sleeves, or the two end edges of the annular groove along its axial direction are blocked by the edges of the two adjacent annular sleeves.

[0006] In some embodiments, two annular ribs are provided on one side surface of the annular sleeve away from the cylindrical flange portion, and the two annular ribs are arranged at the opposite end portions of the annular sleeve along its axial direction; at the preset deposition temperature, the two annular ribs are elastically deformed and interference-connected with the target circular tube.

[0007] In some embodiments, at the preset deposition temperature, the edge of the annular rib is flush with the edge of one end of the annular groove, or the edge of the annular rib covers the edge of one end of the annular groove.

[0008] In some embodiments, the mask mold is provided with an embedding depth marking portion, and when the multiple annular sleeves and the multiple annular grooves are alternately distributed in sequence along the axial direction of the target circular tube, the embedding depth marking portion is flush with the end surface of the target circular tube.

[0009] In some embodiments, the annular sleeve is an elastic sleeve made of elastic material.

[0010] In a second aspect, an embodiment of the present application provides a method for forming an in-tube platinum electrode, comprising: providing a target circular tube and a mask mold as described in any of the above embodiments; embedding the mask mold in the target circular tube at a first temperature, and making the multiple annular sleeves and the multiple annular grooves alternately distributed in sequence along the axial direction of the target circular tube; raising the ambient temperature to a preset deposition temperature, and pulse-alternatingly introducing a gaseous precursor into the multiple annular grooves through the multiple through holes, so as to deposit platinum atomic films layer by layer in the multiple annular grooves, thereby forming an in-tube platinum electrode.

[0011] In some embodiments, the predetermined deposition temperature is 180-220°C.

[0012] In some embodiments, the target tube is a sapphire tube.

[0013] In a third aspect, an embodiment of the present application provides a conductivity sensor, comprising a conductivity cell tube, wherein a plurality of platinum electrodes are provided on the inner wall of the conductivity cell tube, and the plurality of platinum electrodes are manufactured using the method for forming platinum electrodes in a tube as described in any of the above embodiments.

[0014] The embodiment of the present application sets up a mask mold with a rigid shaft and multiple circular ring sleeves. The circular ring sleeves can thermally expand at a preset deposition temperature and form an interference connection with the area on the inner wall of the target circular tube where no circular grooves are provided, thereby masking the area on the inner wall of the target circular tube where no circular grooves are provided, so that the atomic layer deposition process only occurs in each circular ring groove, and it is easy to form platinum ring electrodes in multiple circular grooves in the target circular tube, and the formed platinum ring electrodes have better uniformity and stability. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present application. For those skilled in the art, other drawings can be obtained based on these drawings without creative work.

[0016] Figure 1 is a projection structure diagram of a mask mold provided in some embodiments of the present application;

[0017] Figure 2 is a cross-sectional structural diagram of a mask mold provided by some embodiments of the present application during use;

[0018] Figure 3 This is a flowchart of the steps of the method for forming a platinum electrode in a tube provided in some embodiments of the present application.

[0019] Description of main component symbols:

[0020] 1-mask mold, 11-rigid shaft, 111-cylindrical flange, 12-annular sleeve, 121-annular convex rib, 2-target circular tube, 21-annular groove, 22-through hole. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of this application to clearly and completely describe the technical solutions in the embodiments of this application. Obviously, the embodiments described are only part of the embodiments of this application, not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts are within the scope of protection of this application.

[0022] In the description of the present application, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present application. In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the said features. In the description of the present application, "multiple" means two or more, unless otherwise clearly and specifically defined.

[0023] “A and / or B” includes the following three combinations: A only, B only, and a combination of A and B.

[0024] The use of "suitable for" or "configured to" in this application is intended to be open and inclusive language, and does not exclude devices that are adapted or configured to perform additional tasks or steps. In addition, the use of "based on" is intended to be open and inclusive, as a process, step, calculation, or other action that is "based on" one or more stated conditions or values ​​may, in practice, be based on additional conditions or values ​​beyond those stated.

[0025] In this application, the word "exemplary" is used to mean "serving as an example, illustration, or illustration." Any embodiment described in this application as "exemplary" is not necessarily to be construed as preferred or advantageous over other embodiments. The following description is given to enable any person skilled in the art to implement and use the present application. In the following description, details are listed for the purpose of explanation. It should be understood that one of ordinary skill in the art can recognize that the present application can be implemented without using these specific details. In other instances, well-known structures and processes are not elaborated in detail to avoid obscuring the description of the present application with unnecessary details. Therefore, the present application is not intended to be limited to the embodiments shown, but is consistent with the widest scope consistent with the principles and features disclosed in this application.

[0026] like Figure 1 As shown, in the first aspect, an embodiment of the present application provides a mask mold 1, which includes a rigid shaft 11 and multiple circular ring sleeves 12, and is used to form a platinum electrode on the inner wall of a target circular tube 2, which can reduce the difficulty of forming the platinum electrode and ensure the uniformity and stability of the platinum electrode after forming.

[0027] like Figure 2 As shown, as a carrier of the platinum electrode, the target circular tube 2 is a cylindrical tube with two open ends and a hollow concentric circular cross-section. The inner and outer wall surfaces of the target circular tube 2 are cylindrical surfaces. The target circular tube 2 is provided with a plurality of circular grooves 21 and a plurality of through holes 22. The plurality of circular grooves 21 are sequentially spaced along the axial direction of the target circular tube 2 on the inner wall of the target circular tube 2. There is a gap between two adjacent circular grooves 21 and they are independent of each other, so that a platinum ring electrode with a circular ring structure can be correspondingly arranged in each circular groove 21. The plurality of through holes 22 and the plurality of circular grooves 21 are equal in number and are connected one-to-one. For example, when there are seven circular grooves 21 on the target circular tube 2, the target circular tube 2 is correspondingly provided with seven through holes 22. The number of the annular grooves 21 can be determined according to actual needs, based on the number of required platinum ring electrodes, and is not limited in this embodiment of the present application. When the target circular tube 2 is used as the conductivity cell tube substrate of a seven-electrode conductivity sensor, seven annular grooves 21 can be provided on the target circular tube 2.

[0028] like Figure 1 and Figure 2 As shown, the rigid shaft body 11 is provided with a plurality of cylindrical flange portions 111. The plurality of cylindrical flange portions 111 are sequentially spaced apart along the axial direction of the rigid shaft body 11. The cylindrical flange portions 111 are formed as protrusions on the outer circumferential surface of the rigid shaft body 11, and any two cylindrical flange portions 111 are spaced apart and do not contact each other. The number of cylindrical flange portions 111 can be determined based on the number of annular grooves 21 of the target circular tube 2. In some embodiments, the number of cylindrical flange portions 111 can be the number of annular grooves 21 plus one. For example, when the target circular tube 2 is provided with seven annular grooves 21, the rigid shaft body 11 can be provided with eight cylindrical flange portions 111. Any two cylindrical flange portions 111 can have the same or different outer diameters, which is not limited in the present embodiment. In some embodiments, the plurality of cylindrical flange portions 111 can have the same outer diameter.

[0029] The number of the aforementioned multiple annular sleeves 12 and the multiple cylindrical flange portions 111 is equal and they are arranged in a one-to-one correspondence; for example, when eight cylindrical flange portions 111 are provided on the rigid shaft 11, the mask mold 1 may include eight annular sleeves 12. Here, each annular sleeve 12 is respectively sleeved on its corresponding cylindrical flange portion 111, specifically sleeved on the cylindrical surface of the cylindrical flange portion 111, so that the cylindrical surface of the cylindrical flange portion 111 is tightly wrapped by the annular sleeve 12. Here, the fixing method between the annular sleeve 12 and the cylindrical flange portion 111 can be determined according to actual needs, and can adopt fixing methods such as bonding, elastic deformation sleeve connection, etc., which are not limited in the embodiments of the present application.

[0030] When the mask mold 1 is embedded in the target circular tube 2, the central axis of the rigid shaft 11 is parallel to or coincides with the central axis of the target circular tube 2; the plurality of annular sleeves 12 and the plurality of annular grooves 21 are alternately distributed along the axial direction of the target circular tube 2, such that there is an annular sleeve 12 between any two adjacent annular grooves 21. Here, the plurality of annular sleeves 12 can be configured as follows: at a first temperature, such as room temperature, the annular sleeves 12 and the inner wall of the target circular tube 2, specifically the area on the inner wall without the annular grooves 21, are clearance-fitted, making it easy for the mask mold 1 to be engaged with or removed from the target circular tube 2 under the first temperature condition; and at a predetermined deposition temperature, the annular sleeves 12 thermally expand and form an interference fit with the inner wall of the target circular tube 2, specifically the area on the inner wall without the annular grooves 21, so that the annular sleeves 12 and the target circular tube 2 are engaged and fixed, thereby sealing and isolating each annular groove 21 and shielding the area on the inner wall of the target circular tube 2 without the annular grooves 21; here, the first temperature is lower than the predetermined deposition temperature. Thus, under the preset deposition temperature conditions, the area on the inner wall of the target circular tube 2 that is not provided with the annular groove 21 is shielded by the mask mold 1, leaving only the aforementioned multiple annular grooves 21 exposed, so that platinum layers can be deposited in each of the multiple annular grooves 21. Here, the preset deposition temperature can be determined based on the ambient temperature required for the actual deposition process, and this embodiment of the present application is not limited thereto.

[0031] When using the mask mold 1 provided in the embodiment of the present application to form a platinum electrode in the target circular tube 2, a gaseous precursor can be pulsed and alternately introduced into the multiple annular grooves 21 through the multiple through holes 22 on the target circular tube 2. The gaseous precursor reacts on the surface of the annular groove 21 to deposit a platinum atomic film layer by layer, and finally a platinum atomic deposition layer and a platinum ring electrode of the desired thickness are obtained. Compared with the related art, using the mask mold 1 provided in the embodiment of the present application, the area on the inner wall of the target circular tube 2 where the annular groove 21 is not provided can be masked at a preset deposition temperature, so that the atomic layer deposition process only occurs in each annular groove 21, making it easy to form platinum ring electrodes in the multiple annular grooves 21 in the target circular tube 2, and the formed platinum ring electrodes have better uniformity and stability.

[0032] In certain embodiments, at a preset deposition temperature, the two end edges along its axial direction on the annular groove 21 can be flush with the edge portions of adjacent two annular sleeves 12 respectively. Here, the axial direction of the annular groove 21 is consistent with the axial direction of the target circular pipe 2. Specifically, the one end edge along its axial direction on the annular groove 21 can be flush with one end edge portion of an annular sleeve 12, and the other end edge along its axial direction on the annular groove 21 can be flush with one end edge portion of another annular sleeve 12, and the two annular sleeves 12 are adjacently arranged. Because the annular sleeve 12 can undergo thermal expansion at a preset deposition temperature, the region that is not provided with the annular groove 21 on the inner wall of the target circular pipe 2 is interference-connected accordingly, in combination with the above-mentioned flush arrangement relationship, the region that is not provided with the annular groove 21 on the inner wall of the target circular pipe 2 is just covered by the mask mold 1, and the notch of the annular groove 21 can not be blocked, thereby ensuring a better deposition effect.

[0033] In other embodiments, the annular groove 21 can be blocked by the edge of two adjacent annular sleeves 12 along its axial direction. Specifically, the annular groove 21 can be blocked by an end edge of an annular sleeve 12 along its axial direction, and the annular groove 21 can be blocked by an end edge of another annular sleeve 12 along its axial direction. The two annular sleeves 12 are arranged adjacently. Because the annular sleeve 12 can undergo thermal expansion at a preset deposition temperature, the region where the annular groove 21 is not provided with on the inner wall of the target circular tube 2 is interference-connected accordingly, in combination with the above-mentioned blocking arrangement, the region where the annular groove 21 is not provided on the inner wall of the target circular tube 2 is completely covered by the mask mold 1, can not be locally exposed due to possible errors, and ensure better deposition effect and deposition accuracy. In some examples, at the first temperature, the axial end edges of the annular groove 21 can be flush with the edges of the two adjacent annular sleeves 12 , respectively; thus, the above-mentioned shielding setting relationship at the preset deposition temperature can be better ensured.

[0034] In some embodiments, two annular ribs 121 may be provided on a surface of the annular sleeve 12 on a side away from the cylindrical flange portion 111. The two annular ribs 121 may be disposed at opposite ends of the annular sleeve 12 along its axial direction. Here, the axial direction of the annular sleeve 12 coincides with the axial direction of the rigid shaft 11. Here, at a predetermined deposition temperature, the two annular ribs 121 may each be elastically deformed to form an interference fit with the target circular tube 2. In some examples, the area of ​​the annular sleeve 12 between the two annular ribs 121 may be clearance-fitted with the target circular tube 2. By setting as above, a certain deformation space can be provided for the two circular convex ribs 121, so that the circular convex ribs 121 can be elastically deformed more fully at the preset deposition temperature to form a reliable interference seal with the target circular tube 2, thereby avoiding accidental displacement of the mask mold 1 due to insufficient interference effect between the circular convex rib 121 and the target circular tube 2, thereby ensuring the fitting reliability and position stability of the mask mold 1 in the target circular tube 2, thereby ensuring the uniformity, stability and molding accuracy of the formed platinum ring electrode.

[0035] In some examples, at a preset deposition temperature, an edge portion of the annular convex rib 121, specifically an edge portion of the annular convex rib 121 away from the other annular convex rib 121, can be flush with an edge portion of one end of the annular groove 21, and the two annular convex ribs 121 are located on the same annular sleeve 12. In other examples, at a preset deposition temperature, an edge portion of the annular convex rib 121, specifically an edge portion of the annular convex rib 121 away from the other annular convex rib 121, can block an edge portion of the annular groove 21, and the two annular convex ribs 121 are located on the same annular sleeve 12; illustratively, at a first temperature, an edge portion of the annular convex rib 121, specifically an edge portion of the annular convex rib 121 away from the other annular convex rib 121, can be flush with an edge portion of one end of the annular groove 21, and the two annular convex ribs 121 are located on the same annular sleeve 12.

[0036] In some embodiments, the mask mold 1 may be provided with an embedding depth indicator. When the plurality of annular sleeves 12 and the plurality of annular grooves 21 are alternately distributed along the axial direction of the target circular tube 2, the embedding depth indicator is flush with the end surface of the target circular tube 2. This arrangement allows the operator to easily control the fitting depth between the mask mold 1 and the target circular tube 2, thereby increasing the alignment accuracy of the mask mold 1 and the target circular tube 2.

[0037] The material of the annular sleeve 12 can be determined based on actual needs and is not limited in this embodiment of the present application. In some embodiments, the annular sleeve 12 is an elastic sleeve made of an elastic material with excellent elastic deformation ability. The type of elastic material can be determined based on actual needs, and can include, for example, elastic silicone, elastic rubber, etc., and is not limited in this embodiment of the present application. Here, at a preset temperature, the elastic sleeve can be thermally expanded to a preset size to achieve a reliable interference fit with the inner wall of the target circular tube 2.

[0038] like Figures 1 to 3 As shown, in a second aspect, an embodiment of the present application provides a method for forming a platinum electrode in a tube, and the method for forming a platinum electrode in a tube includes S10 to S30.

[0039] S10: Provide a target tube 2 and a mask mold 1 according to any of the above embodiments. The material of the target tube 2 can be determined based on actual needs and is not limited in this embodiment of the present application. In some embodiments, the target tube 2 is a sapphire tube made of sapphire. Sapphire has advantages such as good machinability and high pressure resistance, and its thermal expansion coefficient is roughly consistent with that of platinum metal, allowing platinum metal to be well deposited on the sapphire tube.

[0040] S20: The mask mold 1 is inserted into the target circular tube 2 at a first temperature, with the plurality of annular sleeves 12 and the plurality of annular grooves 21 alternately distributed along the axial direction of the target circular tube 2. At this point, the plurality of annular sleeves 12 maintain a clearance fit with the inner wall of the target circular tube 2. The first temperature can be determined based on actual needs, such as room temperature or another preset temperature, and is not limited in this embodiment.

[0041] S30: Raising the ambient temperature to a predetermined deposition temperature, and alternately introducing a gaseous precursor into the plurality of annular grooves 21 through the plurality of through-holes 22 in a pulsed manner, thereby depositing a platinum atomic film layer by layer within the plurality of annular grooves 21 to form the platinum electrodes within the tube. In some embodiments, the deposition process may be an atomic layer deposition process.

[0042] The preset deposition temperature can be determined based on the ambient temperature required for the actual deposition process, and is not limited in the present embodiment. In some embodiments, the preset deposition temperature can be 180-220°C, for example, 180°C, 190°C, 195°C, 200°C, 205°C, 210°C, or 220°C. Within this temperature range, platinum atoms can be well deposited layer by layer on the surface of the annular groove 21, and the platinum ring electrode has better uniformity and stability.

[0043] In a third aspect, embodiments of the present application provide a conductivity sensor comprising a conductivity cell tube having a plurality of platinum electrodes disposed on the inner wall thereof. The plurality of platinum electrodes are manufactured using the platinum electrode-in-tube forming method described in any of the above embodiments. The conductivity cell tube is formed using the aforementioned target circular tube 2 as a substrate. The type of conductivity sensor can be determined based on practical needs and is not limited in the present application. In some embodiments, the conductivity sensor can be a seven-electrode conductivity sensor.

[0044] The above is a detailed introduction to the mask mold, the platinum electrode forming method in the tube, and the conductivity sensor provided in the embodiments of the present application. Specific examples are used herein to illustrate the principles and implementation methods of the present application. The description of the above embodiments is only used to help understand the method of the present application and its core idea. At the same time, for those skilled in the art, based on the ideas of the present application, there will be changes in the specific implementation methods and application scope. In summary, the content of this specification should not be understood as a limitation on the present application.

Claims

1. A mask mold, characterized in that: Used to form a platinum electrode on the inner wall of a target circular tube, the target circular tube is provided with a plurality of annular grooves and a plurality of through holes, the plurality of annular grooves are sequentially spaced along the axial direction of the target circular tube on the inner wall of the target circular tube, the plurality of through holes and the plurality of annular grooves are equal in number and are connected one-to-one; The mask mold comprises a rigid shaft and a plurality of annular sleeves, wherein a plurality of cylindrical flanges are sequentially arranged on the rigid shaft along its axial direction, the plurality of annular sleeves are equal in number to the plurality of cylindrical flanges and are arranged in a one-to-one correspondence, and the annular sleeves are sleeved on the cylindrical surfaces of the corresponding cylindrical flanges; When the mask mold is embedded in the target circular tube, the multiple annular sleeves and the multiple annular grooves are alternately distributed in sequence along the axial direction of the target circular tube; the multiple annular sleeves are clearance-fitted with the inner wall of the target circular tube at a first temperature, and are thermally expanded at a preset deposition temperature to form an interference fit with the inner wall of the target circular tube to shield the area on the inner wall of the target circular tube where the annular grooves are not provided, and the first temperature is lower than the preset deposition temperature.

2. The mask mold according to claim 1, wherein: At the preset deposition temperature, the two end edges of the annular groove along its axial direction are flush with the edges of the two adjacent annular sleeves, or the two end edges of the annular groove along its axial direction are blocked by the edges of the two adjacent annular sleeves.

3. The mask mold according to claim 1, wherein: Two annular convex ribs are provided on one side surface of the annular sleeve away from the cylindrical flange portion, and the two annular convex ribs are arranged at the opposite end portions of the annular sleeve along its axial direction; at the preset deposition temperature, the two annular convex ribs are elastically deformed and interference-connected with the target circular tube.

4. The mask mold according to claim 3, characterized in that At the preset deposition temperature, the edge of the annular convex rib is flush with the edge of one end of the annular groove, or the edge of the annular convex rib covers the edge of one end of the annular groove.

5. The mask mold according to claim 1, wherein: The mask mold is provided with an embedding depth marking portion. When the multiple annular sleeves and the multiple annular grooves are alternately distributed along the axial direction of the target circular tube, the embedding depth marking portion is flush with the end surface of the target circular tube.

6. The mask mold according to claim 1, wherein: The annular sleeve is an elastic sleeve made of elastic material.

7. A method for forming a platinum electrode in a tube, characterized in that: include: Providing a target round tube and a mask mold according to any one of claims 1 to 6; Embedding the mask mold into the target circular tube at a first temperature, and making the plurality of circular sleeves and the plurality of circular grooves alternately distributed along the axial direction of the target circular tube; The ambient temperature is raised to a preset deposition temperature, and a gaseous precursor is pulsed and alternately introduced into the multiple annular grooves through the multiple through holes to deposit platinum atomic films layer by layer in the multiple annular grooves to form platinum electrodes in the tube.

8. The method for forming a platinum electrode in a tube according to claim 7, characterized in that: The preset deposition temperature is 180-220°C.

9. The method for forming a platinum electrode in a tube according to claim 7, characterized in that: The target circular tube is a sapphire circular tube.

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