Multi-degree-of-freedom linkage sterilization device based on electron beam for the preparation of chili products
Through the multi-degree-of-freedom linkage sterilization device of electron beam, the problems of unevenness and high energy consumption in traditional high-temperature sterilization treatment are solved, and the efficient, uniform sterilization and nutrient retention of pepper products are achieved, energy consumption is reduced, and production efficiency and product quality are improved.
Patent Information
- Application Number
- CN202310840593.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-07-10
- Publication Date
- 2025-07-22
- Estimated Expiration
- 2043-07-10
AI Technical Summary
The high-temperature sterilization treatment of traditional chili products has problems such as unevenness, nutrient loss and high energy consumption, which affects the hygiene and safety of the product and production costs.
Using a multi-degree-of-freedom linkage sterilization device based on electron beams, the combination of the adjustment mechanism and the electron beam generation assembly can achieve uniform sterilization of the chili product container, and the high energy and precise control of the electron beam can be used to reduce the loss of nutrients by heat treatment and reduce energy consumption.
It achieves efficient and even sterilization of pepper products, retains the nutritional value of the product, reduces energy consumption, and improves production efficiency and product quality stability.
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Figure CN117063971B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of chili product preparation, and particularly to an electron beam-based multi-degree-of-freedom linkage sterilization device for chili product preparation. Background Art
[0002] Chili products are a type of food product derived from chili plants, characterized by their spicy taste and unique aroma. Chili products are widely used in various dishes and seasonings, giving food a strong impact of spiciness. However, chili products are often contaminated by bacteria and microorganisms during the processing and manufacturing process. These microorganisms can include pathogenic bacteria, molds, and yeasts, etc. They exist in raw materials and can also be transmitted through environmental air and human contact. These microorganisms not only affect the quality and taste of chili products, but more importantly, they can pose a potential threat to the health of consumers.
[0003] To ensure the safety and hygiene of chili products, sterilization treatment is an essential step. Sterilization is a process of killing or removing microorganisms. By applying physical or chemical means, the product can be stored for a long time under the condition of no harmful bacteria. Sterilization treatment can effectively kill bacteria and microorganisms in chili products, including pathogenic bacteria such as Salmonella and Escherichia coli. This can reduce the risk of food poisoning and infectious diseases and ensure the health and safety of consumers. After the sterilization treatment of chili products, the number of microorganisms is greatly reduced, and the shelf life can be extended. Bacteria and molds are one of the main causes of food spoilage and corruption. Through sterilization treatment, the growth and reproduction of these microorganisms can be effectively prevented, and the shelf life of the product can be extended. During the sterilization treatment of chili products, appropriate treatment methods and conditions will be selected to maximize the preservation of their original taste and quality. Sterilization treatment can kill microorganisms while reducing the damage to the nutritional components and flavor of the product, ensuring that the taste and quality of the product are not significantly affected.
[0004] The traditional sterilization treatment method for chili products is mostly heat treatment, which usually involves placing chili products in a high-temperature environment, such as using steam or hot air. The effect of high temperature can quickly kill microorganisms and ensure the aseptic state of the product. The heat treatment method can be applied to various chili products, including chili sauce, chili seasoning, etc.
[0005] However, through long-term work and research, the inventor found that this treatment method has the following drawbacks that need to be solved urgently:
[0006] (1) Uneven heat treatment: When the traditional technology performs high-temperature sterilization, the heat treatment of chili products is not uniform enough. This can lead to some areas where microorganisms are not completely killed, thus affecting the sterilization effect and the hygienic safety of the product.
[0007] (2) Nutrient loss: Traditional high-temperature sterilization technology can cause nutrient loss in chili products. During the high-temperature treatment process, chili products may lose some of their nutritional value, affecting the nutritional quality of the products.
[0008] (3) High energy consumption: Traditional high-temperature treatment technology usually requires a long treatment time and a high-temperature environment, which consumes a large amount of energy, increases production costs, and impacts the environment.
[0009] Therefore, a multi-degree-of-freedom linkage sterilization device based on electron beam for chili product preparation is proposed. Summary of the Invention
[0010] In view of this, embodiments of the present invention hope to provide a multi-degree-of-freedom linkage sterilization device based on electron beam for chili product preparation to solve or alleviate the technical problems existing in the prior art, namely uneven heat treatment, nutrient loss, and high energy consumption, and at least provide a beneficial option;
[0011] The technical solution of the embodiments of the present invention is implemented as follows: A multi-degree-of-freedom linkage sterilization device based on electron beam for chili product preparation includes an adjustment mechanism provided on a workbench; the adjustment mechanism includes a linear degree of freedom and several adjustment units arranged in a circular array and surrounding to form a topological cylinder, and the linear degree of freedom adjusts the diameter of the topological cylinder according to the magnitude of its stroke; an electron beam generating assembly for sterilization is provided on the adjustment unit; an electric claw for clamping the item to be disinfected is provided at the central axis of the topological cylinder, and the electric claw is installed on the workbench.
[0012] In the above embodiment, the multi-degree-of-freedom linkage sterilization device based on electron beam includes an adjustment mechanism provided on a workbench. The adjustment mechanism consists of a linear degree of freedom and multiple adjustment units arranged in a circular array. These adjustment units are arranged together to form a topological cylinder. An electron beam generating assembly for sterilization is installed on each adjustment unit. At the central axis of the topological cylinder, an electric claw for clamping the item to be disinfected is installed, and the electric claw is installed on the workbench.
[0013] In one of the embodiments: The electron beam generating assembly includes a control and regulation component and an electron linear accelerator for outputting an electron beam; the control and regulation component is used to adjust the irradiation pitch angle of the electron linear accelerator.
[0014] In the above embodiment, the electron beam generating assembly consists of a control and regulation component and an electron linear accelerator. The control and regulation component is used to adjust the irradiation pitch angle of the electron linear accelerator. Such a design makes the device have high flexibility and adaptability, and can meet the sterilization requirements of chili product containers of different sizes and shapes.
[0015] In one embodiment: the radiation intensity of the electron linear accelerator is 2, 3 or 6 kGy dose. In this embodiment, setting the radiation intensity of the electron linear accelerator to 2, 3 or 6 kGy dose is to provide appropriate radiation energy during the sterilization process.
[0016] In one embodiment: the control component includes a first frame, a second frame hinged to one end of the first frame, and a second servo cylinder; the cylinder body and the piston rod of the second linear actuator servo cylinder are respectively hinged to the middle parts of the first frame and the second frame, and the electron linear accelerator is installed on the second frame.
[0017] In the above embodiment, the control component is composed of a first frame, a second frame hinged to one end of the first frame and a second servo cylinder. The cylinder body and the piston rod of the second linear actuator servo cylinder are respectively hinged to the middle parts of the first frame and the second frame. The electron linear accelerator is installed on the second frame. By controlling the movement of the control component, it can adapt to containers of different shapes and sizes and achieve flexible and precise sterilization operations.
[0018] In one embodiment: the adjustment mechanism includes a frame fixed to the workbench, a sliding cylinder vertically slidably fitted on the frame, and the sliding cylinder is lifted and adjusted relative to the frame by a first linear actuator servo cylinder for outputting the linear degree of freedom on the frame; at least ten adjustment units are arranged in a circular array on the sliding cylinder.
[0019] In the above embodiment, the adjustment mechanism includes a frame fixed to the workbench. A vertically sliding sliding cylinder is installed on the frame, and the sliding cylinder is lifted up and down by the first linear actuator servo cylinder on the frame to adjust the position of the frame. At least ten adjustment units are arranged in a circular array on the sliding cylinder. Through the flexible control of the adjustment mechanism, the height adaptability requirements of different containers and chili products can be met, ensuring the accuracy of the electron beam irradiation and the optimization of the sterilization effect.
[0020] In one embodiment: each adjustment unit includes a first plate body, the bottom and top of the first plate body are respectively hinged to the top of the sliding cylinder and the bottom of a second plate body by hinges; the outside of the second plate body is hinged to one end of a hinge frame, the other end of the hinge frame is hinged to a connecting frame, and the bottom of the connecting frame is fixedly connected to the sliding cylinder; a first frame of the electron beam generating component is installed on the second plate body.
[0021] In the above-described embodiments, each adjustment unit includes a first plate body. The bottom and top of the first plate body are respectively connected to the top of the sliding cylinder and the bottom of the second plate body by hinges. One end of the external part of the second plate body is hinged by a hinge frame, and the other end of the hinge frame is hinged to the connecting frame. The bottom of the connecting frame is fixedly connected to the sliding cylinder. A first frame body of the electron beam generating assembly is installed on the second plate body. Through the coordinated movement of the adjustment unit, efficient and precise sterilization treatment can be achieved for chili product containers of different shapes and sizes.
[0022] In one of the embodiments: Among every two adjacent adjustment units, the respective second plate bodies are slidably matched with each other through a sliding assembly. The sliding assembly is composed of a slide rail and a pin shaft that slidably cooperates with it, and the above-mentioned pin shaft is installed between each pair of second plate bodies. This arrangement is to achieve mutual support between each adjustment unit.
[0023] In the above-described embodiments, between every two adjacent adjustment units, the respective second plate bodies are slidably matched with each other through a sliding assembly. The sliding assembly is composed of a slide rail and a pin shaft that slidably cooperates with it, and the above-mentioned pin shaft is installed between each pair of second plate bodies. This arrangement aims to achieve mutual support between each adjustment unit. Such a design ensures uniform irradiation of the electron beam and the consistency of the sterilization effect, meeting the processing requirements of chili product containers of different shapes and sizes.
[0024] Compared with the prior art, the beneficial effects of the present invention are as follows:
[0025] First, high-efficiency sterilization: This technology uses electron beams to sterilize chili products. Electron beams have high energy and strong ability to kill microorganisms, and can quickly and effectively kill bacteria, yeasts and other microorganisms, improving the hygienic safety of products.
[0026] Second, precise control: The technology based on electron beams can achieve precise control of energy and time, and can finely adjust the sterilization process according to specific requirements to ensure the consistency of the sterilization effect and the quality stability of products.
[0027] Third, uniform irradiation: This technology adopts a multi-degree-of-freedom linkage adjustment, which can achieve uniform irradiation of the electron beam on the surface of chili product containers, avoiding the uneven heating problem that may occur in traditional high-temperature treatment, and improving the uniformity of the sterilization effect.
[0028] Fourth, retain nutritional value: Compared with traditional high-temperature treatment technology, the sterilization technology based on electron beams causes less loss of nutrients in chili products. Electron beams can sterilize at a lower temperature, reducing the damage to nutrients in products caused by heat conduction, and better retaining the nutritional value of chili products.
[0029] V. Flexible adaptability: This technology can be flexibly adjusted according to the shape and size of the containers for chili products to meet different production requirements. Through a multi-degree-of-freedom linkage adjustment mechanism, it can adapt to various container shapes, achieving personalization and customization in the sterilization process.
[0030] VI. Energy consumption savings: Compared with traditional high-temperature treatment technologies, the electron beam-based sterilization technology can perform sterilization at lower temperatures, reducing energy consumption. The irradiation time is shorter, saving processing time and reducing energy costs and environmental impact. BRIEF DESCRIPTION OF THE DRAWINGS
[0031] To more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings required for use in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only some embodiments of the present application. For those of ordinary skill in the art, without creative efforts, other drawings can be obtained based on these drawings.
[0032] Figure 1 Schematic three-dimensional structure diagram of the present invention;
[0033] Figure 2 Schematic structure diagram of the present invention from a top-down perspective;
[0034] Figure 3 Schematic three-dimensional structure diagram of the adjustment mechanism (after removing the external protective housing) of the present invention;
[0035] Figure 4 Schematic three-dimensional structure diagram of a single set of adjustment units of the present invention;
[0036] Figure 5 Schematic three-dimensional structure diagram of the electron beam generating assembly of the present invention;
[0037] Figure 6 Schematic diagram of the C++ control program of the present invention;
[0038] Reference numerals: 1, workbench; 2, adjustment mechanism; 201, frame; 202, first linear actuator; 203, sliding cylinder; 204, adjustment unit; 2041, connecting frame; 2042, first plate body; 2043, second plate body; 2044, hinge frame; 3, electric claw; 4, electron beam generating assembly; 401, first frame body; 402, second frame body; 403, second linear actuator; 404, electron linear accelerator. DETAILED DESCRIPTION OF THE EMBODIMENTS
[0039] To make the above objects, features, and advantages of the present invention more obvious and understandable, the following will describe the specific embodiments of the present invention in detail with reference to the accompanying drawings. Many specific details are set forth in the following description to facilitate a full understanding of the present invention. However, the present invention can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without departing from the spirit of the present invention. Therefore, the present invention is not limited by the specific embodiments disclosed below;
[0040] It should be noted that terms such as "first", "second", "symmetric", "array", etc. are only used for the purpose of distinguishing descriptions and position descriptions, and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, features defined with "first", "symmetric", etc. may explicitly or implicitly include one or more of such features; similarly, when certain features are not limited in quantity by words such as "two", "three", etc., it should be noted that such features also belong to explicitly or implicitly including one or more feature quantities;
[0041] In the present invention, unless otherwise clearly specified and defined, the first feature being "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are indirectly in contact through an intermediate medium. Moreover, the first feature being "above", "over", and "on top of" the second feature may be that the first feature is directly above or obliquely above the second feature, or merely indicates that the first feature has a higher horizontal height than the second feature. The first feature being "under", "beneath", and "underneath" the second feature may be that the first feature is directly below or obliquely below the second feature, or merely indicates that the first feature has a lower horizontal height than the second feature; at the same time, all axial descriptions such as the X-axis, Y-axis, Z-axis, one end of the X-axis, the other end of the Y-axis, or the other end of the Z-axis, etc. are all based on the Cartesian coordinate system.
[0042] In the present invention, unless otherwise clearly specified and defined, terms such as "mounted", "connected", "fixed", etc. shall be understood in a broad sense; for example, it may be a fixed connection, a detachable connection, or an integral molding; it may be a mechanical connection, a direct connection, a welding connection, or an indirect connection through an intermediate medium, and may be the internal communication of two components or the interaction relationship between two components. For those of ordinary skill in the art, the specific meanings of the above terms in the present invention can be understood in combination with the specific circumstances of the specification drawings.
[0043] In the prior art, during high-temperature sterilization, the heat treatment of chili products is not uniform enough. This can lead to some areas where microorganisms are not completely killed, thus affecting the sterilization effect and the hygienic safety of the product; for this reason, please refer to Figures 1-5 , the present invention provides a technical solution to solve the above technical problems:
[0044] An electron beam-based multi-degree-of-freedom linkage sterilization device for preparing chili products, comprising an adjustment mechanism 2 provided on a workbench 1; the adjustment mechanism 2 includes a linear degree of freedom and a plurality of adjustment units 204 arranged in a circular array and surrounding to form a topological cylinder, and the linear degree of freedom adjusts the diameter of the topological cylinder according to the magnitude of its stroke; an electron beam generating assembly 4 for sterilization is provided on the adjustment unit 204; an electric claw 3 for clamping the part to be disinfected is provided at the central axis of the topological cylinder, and the electric claw 3 is installed on the workbench 1. When in use, the container containing chili products is clamped by the electric claw 3. Since the electron beam generating assemblies 4 on the adjustment units 204 are arranged in a circular array to form a "topological cylinder", all the electron beam generating assemblies 4 uniformly irradiate the container on the electric claw 3 for sterilization; and during this process, when the linear degree of freedom cyclically outputs the stroke, the diameter of the topological cylinder is cyclically adjusted in diameter, so as to realize that each electron beam generating assembly 4 continuously adjusts the distance between it and the container, further improving the sterilization accuracy.
[0045] In this solution, the electron beam-based multi-degree-of-freedom linkage sterilization device includes an adjustment mechanism 2 provided on a workbench 1. The adjustment mechanism 2 is composed of a linear degree of freedom and a plurality of adjustment units 204 arranged in a circular array. These adjustment units 204 are arranged together to form a topological cylinder. An electron beam generating assembly 4 for sterilization is installed on each adjustment unit 204. At the central axis of the topological cylinder, an electric claw 3 for clamping the part to be disinfected is installed, and the electric claw 3 is installed on the workbench 1.
[0046] Specifically: when in use, the container containing chili products is clamped by the electric claw 3. Since the electron beam generating assemblies 4 on the adjustment units 204 are arranged in a circular array to form a topological cylinder. Therefore, all the electron beam generating assemblies 4 uniformly irradiate the container on the electric claw 3 for sterilization. During this process, when the linear degree of freedom cyclically outputs the stroke, the diameter of the topological cylinder is cyclically adjusted, realizing that each electron beam generating assembly 4 continuously adjusts the distance between it and the container. Such a design can further improve the sterilization accuracy.
[0047] In this solution, all the electrical components of the whole device are powered by the mains; specifically, the electrical components of the whole device are conventionally electrically connected to the mains output port through devices such as relays, transformers and button panels to meet the power supply requirements of all the electrical components of this device.
[0048] Specifically, an external controller is also provided for this device. This controller is used to connect and control all the electrical components of the entire device to drive according to a preset program as preset values and drive modes. It should be noted that the above drive modes correspond to the start-stop time intervals, rotation speeds, powers, and other output parameters corresponding to the relevant electrical components in the following text, that is, they meet the requirements for the relevant electrical components to drive the relevant mechanical devices to operate according to the described functions in the following text.
[0049] It can be understood that in this specific embodiment, the device realizes the sterilization treatment of chili products through the electron beam-based sterilization technology. By adjusting the linear degree of freedom of the adjustment mechanism 2 and the electron beam generating components 4 arranged in a circular array, the microorganisms in the chili products, including bacteria and yeasts, etc., are effectively killed. The use of the electric chuck 3 can fix the container to ensure the stability of the chili products during the sterilization process. Through the design of the topological cylinder, the distance between each electron beam generating component 4 and the container can be adjusted, improving the sterilization accuracy and uniformity. This linkage sterilization device can be applied to the production line of chili products to improve production efficiency and the quality and safety of products.
[0050] In some specific embodiments of the present application, please refer to Figures 2-5 : The electron beam generating component 4 includes a regulation component and an electron linear accelerator 404 for outputting electron beams; the regulation component is used to adjust the irradiation pitch angle of the electron linear accelerator 404.
[0051] In this solution, the electron beam generating component 4 is composed of a regulation component and an electron linear accelerator 404. The regulation component is used to adjust the irradiation pitch angle of the electron linear accelerator 404.
[0052] Specifically: The electron linear accelerator 404 is a key component for generating electron beams. It accelerates the electron beams to high speeds and focuses them into fine beams through electron acceleration and focusing technologies. The regulation component is responsible for adjusting the irradiation pitch angle of the electron linear accelerator 404. By adjusting the irradiation pitch angle, the incident angle and irradiation range of the electron beams can be controlled to meet the sterilization requirements for different container shapes and sizes.
[0053] It can be understood that in this specific embodiment, the electron beam generating assembly 4 combines the functions of an electron linear accelerator 404 and a regulating assembly. The electron linear accelerator 404 is responsible for generating a high-speed electron beam and focusing it into a fine beam. The regulating assembly adjusts the irradiation pitch angle so that the electron beam can accurately irradiate the chili products in the sterilized container. By adjusting the irradiation pitch angle, it is possible to adapt to the shapes and sizes of different containers, ensuring that the entire surface of the container is uniformly and sufficiently irradiated by the electron beam, thereby achieving an efficient sterilization effect. Such a design makes the device highly flexible and adaptable, capable of meeting the sterilization requirements for chili product containers of different sizes and shapes.
[0054] In some specific embodiments of the present application, please refer to Figures 2-5 : The radiation intensity of the electron linear accelerator 404 is 2, 3, or 6 kGy dose. In this embodiment, setting the radiation intensity of the electron linear accelerator 404 to 2, 3, or 6 kGy dose is to provide appropriate radiation energy during the sterilization process to ensure the thorough sterilization of the chili product container. Such a design can be flexibly adjusted according to the sterilization requirements and product characteristics to achieve efficient and safe sterilization treatment.
[0055] In this solution, the theory of the above radiation intensity of 2, 3, or 6 kGy dose is supported by the following existing technical documents:
[0056] "Influence of Electron Beam Irradiation on the Hot Air Drying Characteristics and Quality of Chili" (1. Shanghai Academy of Agricultural Sciences, Shanghai 201106; 2. Shanghai Shuneng Irradiation Technology Co., Ltd., Shanghai 201401), Chinese Library Classification Number: TS255.52; Document Mark: A; Number: 1673 - 1689(2015)09 - 0914 - 06;
[0057] This research shows that when chili is pre - irradiated with 2, 3, 6 kGy, the drying rate is significantly increased, and the irradiation dose is positively correlated with the drying rate; irradiating fresh chili before drying can more effectively kill microorganisms in the product, and the required irradiation dose is low (3 - 6 kCv); capsaicin and capsanthin in chili have relatively strong radiation resistance, but compared with fresh raw materials with high moisture content, their radiation resistance is relatively weak, and a significant impact on their quality will occur at a dose of 6 kGv (P < 0.05). The research results show that the pre - irradiation dose of chili should be controlled to achieve low - dose irradiation sterilization of chili and improve the efficiency of hot air drying.
[0058] Specifically, the electron linear accelerator 404 accelerates electrons and generates high-speed electron beams. These high-speed electron beams have a certain amount of energy and can kill microorganisms through radiation. The radiation intensity represents the amount of energy transferred by the electron beam per unit area. In this embodiment, the radiation intensity of the electron linear accelerator 404 is set to a dose of 2, 3, or 6 kGy, which represents the energy transferred by the electron beam to the sterilized container per unit area.
[0059] Preferably, the model of the electron linear accelerator 404 is preferably the same ESS-010-03 type electron linear accelerator 404 used in this document; only the output end element of the ESS-010-03 type electron linear accelerator 404 needs to be used.
[0060] It can be understood that in this specific embodiment, setting the radiation intensity of the electron linear accelerator 404 to a dose of 2, 3, or 6 kGy aims to achieve the sterilization of the chili product container by controlling the amount of energy transfer. The choice of radiation intensity depends on different sterilization requirements and product specifications. A lower radiation intensity can be applied to some chili product containers with higher sensitivity, while a higher radiation intensity can be applied to some containers with higher sterilization requirements. By setting an appropriate radiation intensity, it can be ensured that the electron beam transfers sufficient energy to effectively kill the microorganisms on the surface of the container, thereby ensuring the hygienic safety of the chili products.
[0061] Furthermore, all electrical components in this technology need to use a metal-sealed housing as a Faraday cage to avoid being interfered by the electron beam. At the same time, in the surrounding working environment, the staff needs to wear protective clothing for operation.
[0062] In some specific embodiments of this application, please refer to Figures 2-5 : The regulation component includes a first frame 401, a second frame 402 hinged to one end of the first frame 401, and a second servo cylinder 403; the cylinder body and the piston rod of the second linear actuator 403 are respectively hinged to the middle parts of the first frame 401 and the second frame 402, and an electron linear accelerator 404 is installed on the second frame 402.
[0063] In this solution, the regulation component consists of a first frame 401, a second frame 402 hinged to one end of the first frame 401, and a second servo cylinder 403. The cylinder body and the piston rod of the second linear actuator 403 (preferably a second servo cylinder) are respectively hinged to the middle parts of the first frame 401 and the second frame 402. An electron linear accelerator 404 is installed on the second frame 402. By controlling the movement of the regulation component, it can adapt to containers of different shapes and sizes and achieve flexible and precise sterilization operations.
[0064] Specifically, the first frame body 401 and the second frame body 402 are hinged to each other, enabling relative movement between the two frame bodies. The second servo cylinder 403 drives the second frame body 402 to move along the linear direction of the first frame body 401 by controlling the telescopic movement of the piston rod. The electron linear accelerator 404 is installed on the second frame body 402, and with the movement of the second frame body 402, the adjustment of the irradiation direction of the electron beam can be achieved.
[0065] It can be understood that in this specific embodiment, the design of the regulation component can achieve the adjustment and control of the irradiation angle of the electron beam. The hinged connection between the first frame body 401 and the second frame body 402 enables the second frame body 402 to rotate around the first frame body 401. The telescopic movement of the second servo cylinder 403 controls the movement of the second frame body 402 in the linear direction, thereby adjusting the irradiation angle of the electron beam. Through such a design, the incident angle of the electron beam can be adjusted and controlled according to actual needs to adapt to containers of different shapes and sizes. The regulation component in this embodiment realizes the adjustment of the irradiation angle of the electron beam through the combination of the first frame body 401, the second frame body 402, and the second servo cylinder. Such a design can ensure that the electron beam can accurately irradiate the surface of the chili product container, thereby achieving effective sterilization treatment.
[0066] In some specific embodiments of the present application, please refer to Figures 2-5 : The adjustment mechanism 2 includes a frame 201 fixed to the workbench 1. A sliding cylinder 203 is vertically slidably fitted on the frame 201, and the sliding cylinder 203 is lifted and adjusted by a servo cylinder 202 on the frame 201 for outputting linear degrees of freedom to adjust the pre-frame 201; at least ten adjustment units 204 are arranged in a circular array on the sliding cylinder 203.
[0067] In this solution, the adjustment mechanism 2 includes a frame 201 fixed to the workbench 1. A vertically sliding sliding cylinder 203 is installed on the frame 201, and the sliding cylinder 203 is lifted up and down by a first servo cylinder 202 on the frame 201 to adjust the position of the frame 201. At least ten adjustment units 204 are arranged in a circular array on the sliding cylinder 203. Through the flexible control of the adjustment mechanism 2, the height adaptability requirements of different containers and chili products can be met, ensuring the accuracy of the electron beam irradiation and the optimization of the sterilization effect.
[0068] Specifically: The frame 201 serves as the basic structure of the adjustment mechanism 2 and is fixed to the workbench 1. The sliding cylinder 203 is vertically slidably fitted to the frame 201, and the position of the frame 201 is adjusted by the lifting movement of the first servo cylinder 202. The first servo cylinder 202 controls the up and down movement of the sliding cylinder 203, thereby realizing the height adjustment of the frame 201. At least ten adjustment units 204 are arranged in a circular array on the sliding cylinder 203, providing the basic structure and position support for subsequent sterilization operations.
[0069] It can be understood that in this specific embodiment, the adjustment mechanism 2 realizes the adjustment of the linear degree of freedom through the combination of the frame 201, the sliding cylinder 203 and the first linear actuator 202 (servo electric cylinder). The first linear actuator 202 (servo electric cylinder) controls the lifting movement of the sliding cylinder 203, thereby adjusting the height of the frame 201. The adjustment units 204 arranged in an annular array on the sliding cylinder 203 provide a stable position and support for the subsequent electron beam generating assembly 4. Through such a design, the irradiation position of the electron beam can be adjusted in the vertical direction as needed to adapt to containers and chili products of different heights. The adjustment mechanism 2 realizes the adjustment of the linear degree of freedom through the fixed frame 201, the sliding sliding cylinder 203 and the controlled first linear actuator 202 (servo electric cylinder). Such a design provides a stable infrastructure and a reliable height adjustment mechanism, facilitating the installation and adjustment of the subsequent electron beam generating assembly 4.
[0070] In some specific embodiments of the present application, please refer to Figures 2-5 : Each adjustment unit 204 includes a first plate body 2042. The bottom and top of the first plate body 2042 are respectively hinged to the top of the sliding cylinder 203 and the bottom of the second plate body 2043 by hinges; the outside of the second plate body 2043 is hinged to one end of the hinge frame 2044, and the other end of the hinge frame 2044 is hinged to the connecting frame 2041. The bottom of the connecting frame 2041 is fixedly connected to the sliding cylinder 203; a first frame body 401 of the electron beam generating assembly 4 is installed on the second plate body 2043. During use, when the sliding cylinder 203 moves up and down, it drives the connecting frame 2041 fixedly engaged with it to move up and down synchronously. Based on the double-end hinge fit of the hinge frame 2044, then the first plate body 2042 and the second plate body 2043 synchronously adjust the pitching angle depending on the hinge relationship between them; therefore, when the sliding cylinder 203 moves up and down, each adjustment unit 204 forms a topological cylinder and thus realizes the variable diameter adjustment.
[0071] In this solution, each adjustment unit 204 includes a first plate body 2042. The bottom and top of the first plate body 2042 are respectively connected to the top of the sliding cylinder 203 and the bottom of the second plate body 2043 by hinges. The outside of the second plate body 2043 is hinged to one end of the hinge frame 2044, and the other end of the hinge frame 2044 is hinged to the connecting frame 2041. The bottom of the connecting frame 2041 is fixedly connected to the sliding cylinder 203. A first frame body 401 of the electron beam generating assembly 4 is installed on the second plate body 2043. Through the coordinated movement of the adjustment units 204, efficient and precise sterilization treatment can be carried out on chili product containers of different shapes and sizes.
[0072] Specifically: Each adjustment unit 204 is designed with a hinged connection structure. The first plate body 2042 is hinged to the sliding cylinder 203 and the second plate body 2043 through a hinge to achieve the adjustment of the pitching angle. The hinge frame 2044 is used as a connecting element, one end of which is hinged to the second plate body 2043, and the other end is hinged to the connecting frame 2041. The connecting frame 2041 is fixedly connected to the sliding cylinder 203. When the sliding cylinder 203 moves up and down, the connecting frame 2041 fixedly matched with it will move up and down synchronously. The hinged structure of the hinge frame 2044 enables the first plate body 2042 and the second plate body 2043 to adjust the pitching angle synchronously. Such a design realizes the variable-diameter adjustment of the adjustment unit 204 around the formed topological cylinder.
[0073] Furthermore, each adjustment unit 204 forms a topological cylinder around it, realizing the uniform irradiation of the electron beam, thereby improving the uniformity of the sterilization effect. The principle that each adjustment unit 204 forms a topological cylinder around it is based on the multi-degree-of-freedom linkage adjustment mechanism 2 of the electron beam. When the sliding cylinder 203 moves up and down, through the linkage action of each component in the adjustment mechanism 2, the diameter of the topological cylinder can be adjusted as needed, so that the electron beam generating assembly 4 irradiates the surface of the object to be disinfected evenly. Such an adjustment mechanism 2 enables the electron beam to irradiate evenly on the surface of the chili product container, improving the uniformity of the sterilization effect. Its principle is:
[0074] (1) Uniform irradiation: Through the variable-diameter adjustment of the topological cylinder, the distance between each electron beam generating assembly 4 and the container surface can be accurately adjusted. Such adjustment enables the electron beam to irradiate each area of the container surface evenly, ensuring that each area can receive sufficient sterilization irradiation and improving the uniformity of the sterilization effect.
[0075] (2) Adaptability and flexibility: The variable-diameter adjustment of the topological cylinder enables this technology to adapt to chili product containers of different shapes and sizes. Through the variable-diameter adjustment of the adjustment mechanism 2, the spacing between the electron beam and the container surface can be optimized according to the size and shape of the specific container, ensuring that each container can be subjected to uniform and effective sterilization treatment.
[0076] (3) Precise control: The variable-diameter adjustment of the topological cylinder realizes the precise adjustment of the distance between the electron beam and the container. Through the accurate control of the adjustment mechanism 2, the irradiation distance of the electron beam can be precisely adjusted according to the sterilization requirements and container characteristics, ensuring the consistency and quality stability of the sterilization effect.
[0077] Through the variable-diameter adjustment feature of the topological cylinder, this technology realizes the uniform irradiation of the electron beam and improves the uniformity of the sterilization effect. Through the precise control of the adjustment mechanism 2, it can adapt to chili product containers of different shapes and sizes, realize precise sterilization treatment, and ensure the consistency and quality stability of the sterilization effect.
[0078] It can be understood that in this specific embodiment, the design of each adjustment unit 204 realizes the adjustment of the pitching angle by using the structure of hinge connection. Through the lifting movement of the sliding cylinder 203, the connecting frame 2041 rises and falls synchronously therewith, driving the double-end hinge of the hinge frame 2044, and then adjusting the pitching angle between the first plate body 2042 and the second plate body 2043. Such a design enables each adjustment unit 204 to form a topological cylinder, realizing variable-diameter adjustment. Through the flexible adjustment of the adjustment unit 204, the irradiation range and sterilization effect of the electron beam can be optimized according to the shape and size of the container. The structure of the adjustment unit 204 realizes the variable-diameter adjustment of the topological cylinder through hinge connection by hinges, hinge connection of the hinge frame 2044, and fixed connection of the connecting frame 2041. Such a design enables each adjustment unit 204 to freely adjust the distance between it and the container, ensuring uniform irradiation of the electron beam and optimization of the sterilization effect.
[0079] In some specific embodiments of the present application, please refer to Figures 2-5 : Among every two adjacent adjustment units 204, the second plate bodies 2043 of each are slidably matched with each other through a sliding assembly. The sliding assembly is composed of a slide rail and a pin shaft slidably matched therewith, and the above-mentioned pin shaft is installed between each second plate body 2043. This arrangement is to realize the mutual support of each adjustment unit 204.
[0080] In this solution, between every two adjacent adjustment units 204, the second plate bodies 2043 of each are slidably matched with each other through a sliding assembly. The sliding assembly is composed of a slide rail and a pin shaft slidably matched therewith, and the above-mentioned pin shaft is installed between each second plate body 2043. This arrangement aims to realize the mutual support between each adjustment unit 204. Such a design ensures uniform irradiation of the electron beam and consistency of the sterilization effect, adapting to the processing requirements of chili product containers of different shapes and sizes.
[0081] Specifically: The design of the sliding assembly is to realize the sliding fit and support between the adjustment units 204. The second plate body 2043 of each adjustment unit 204 is connected to each other through the slide rail and the pin shaft in the sliding assembly. The slide rail is installed between the adjustment units 204, and the pin shaft is fixed on the second plate body 2043 of each adjustment unit 204. Through the cooperation of the pin shaft and the slide rail, the relative sliding between the adjustment units 204 is realized. Such a design enables each adjustment unit 204 to support each other, maintaining the overall stability and balance.
[0082] It can be understood that in this specific embodiment, the design of the sliding component realizes the mutual sliding fit between the adjusting units 204. Through the combination of the slide rail and the pin shaft, the second plate bodies 2043 of each adjusting unit 204 can slide relative to each other, thereby realizing the support between the adjusting units 204. This arrangement can ensure the stability and balance of the entire device, keep the relative positions of each adjusting unit 204 unchanged during the sterilization process, and thus ensure the uniform irradiation of the electron beam and the consistency of the sterilization effect. Through the mutual support between the adjusting units 204, the reliability and stability of the device are improved, meeting the sterilization requirements of chili product containers with different shapes and sizes. The design of the sliding component in this embodiment realizes the sliding fit and support between the adjusting units 204. Through the combination of the slide rail and the pin shaft, the second plate bodies 2043 of each adjusting unit 204 can slide relative to each other, thereby maintaining the stability of the entire device.
[0083] Summarily, in view of the related defects in the prior art, the following technical features or means are adopted in this specific embodiment to solve the problems:
[0084] (1) Difficulty in temperature control: The high-temperature treatment in the traditional technology is often difficult to accurately control, while the sterilization technology based on electron beam can precisely control the energy and irradiation time of the electron beam, thereby realizing the precise control of the temperature during the sterilization process. The energy transfer amount of the electron beam can be adjusted as needed to avoid the problems of overheating or overcooling of chili products and ensure that the temperature is within a safe range.
[0085] (2) Uneven heat treatment: The heat treatment in the traditional technology often cannot ensure the uniform heating of the entire surface of chili products, resulting in uneven sterilization effects. While the sterilization technology based on electron beam can achieve uniform irradiation of the entire container surface by adjusting the irradiation angle and position of the electron beam. Each adjusting unit 204 forms a topological cylinder, realizing the uniform irradiation of the electron beam, thereby improving the uniformity of the sterilization effect.
[0086] (3) Loss of nutrients: The traditional high-temperature treatment technology may cause the loss of nutrients in chili products. While the sterilization technology based on electron beam can carry out sterilization at a lower temperature, reducing the heat treatment of chili products, thereby reducing the loss of nutrients. At the same time, the energy transfer mode of the electron beam is different from heat conduction, and it can act more locally on microorganisms, reducing the overall heat treatment of chili products and helping to retain the nutritional value of the product.
[0087] (4) High energy consumption: Compared with the traditional technology, the sterilization technology based on electron beam has lower energy consumption. The traditional high-temperature treatment technology requires high temperatures and long treatment times, consuming a large amount of energy. While the sterilization technology based on electron beam can carry out sterilization at a lower temperature and with a shorter irradiation time, thereby reducing the amount of energy used.
[0088] The technical features of the above-described specific embodiments can be combined arbitrarily. For the sake of brevity of description, not all possible combinations of the various technical features in the above specific embodiments are described. However, as long as there is no contradiction in the combination of these technical features, it should be considered to be within the scope described in this specification.
[0089] Example 1
[0090] To make the above specific embodiments of the present invention more obvious and understandable, the following provides a detailed and exemplary description of the specific embodiments of the present invention. The present invention can be implemented in many other ways different from those described herein. Those skilled in the art can make similar improvements without departing from the connotation of the present invention. Therefore, the present invention is not limited by the embodiments disclosed below.
[0091] This embodiment is based on the relevant principles described in the above specific embodiments. When used exemplarily:
[0092] When each adjustment unit 204 adjusts the diameter while forming a topological cylinder, it is realized based on the first servo cylinder; this embodiment adopts the form of a PID controller to achieve control. Specifically:
[0093] Let the set value be R (the diameter of the target topological cylinder), the feedback value be D (the current diameter of the topological cylinder), and the error be E (the deviation). The control algorithm can be expressed as:
[0094] (1) Proportional control (P control):
[0095] According to the error E, calculate the output:
[0096] P_out: P_out = Kp * E
[0097] Integral control (I control): Accumulate the error E to obtain the integral term I_error, and calculate the output I_out:
[0098] I_error = I_error + E I_out = Ki * I_error
[0099] Derivative control (D control): Calculate the change rate dE / dt of the error E, and calculate the output D_out:
[0100] dE / dt = (E - E_previous) / Δt D_out = Kd * (dE / dt)
[0101] (2) Comprehensive output: Sum P_out, I_out, and D_out to obtain the total output Output:
[0102] Output = P_out + I_out + D_out
[0103] (3) Control quantity limit: Limit the total output quantity Output to ensure that the output is within a controllable range.
[0104] (4) Output processing: Use Output as the control signal to control the first servo cylinder through a PID controller to adjust the diameter of the topological cylinder.
[0105] In the above control algorithm, Kp, Ki, and Kd represent the proportional, integral, and differential coefficients respectively, and their values are adjusted according to specific applications and system characteristics. Δt represents the time interval and is used to calculate the change rate of the error.
[0106] Exemplary:
[0107] Kp = 0.5 (proportional coefficient)
[0108] Ki = 0.2 (integral coefficient)
[0109] Kd = 0.1 (differential coefficient)
[0110] Δt = 0.1 (time interval)
[0111] Let the set value be R = 10 (target topological cylinder diameter), the feedback value be D (current topological cylinder diameter), and the error be E (deviation):
[0112] Proportional control (P control):
[0113] P_out = Kp * E
[0114] Integral control (I control):
[0115] I_error = I_error + E I_out = Ki * I_error
[0116] Differential control (D control):
[0117] dE / dt = (E - E_previous) / Δt D_out = Kd * (dE / dt)
[0118] Combined output quantity:
[0119] Output = P_out + I_out + D_out
[0120] First, set the initial state as:
[0121] E_previous = 0, I_error = 0
[0122] Let the feedback value D = 8, then the error:
[0123] E = R - D = 10 - 8 = 2
[0124] Proportional control (P control):
[0125] P_out = Kp * E = 0.5 * 2 = 1
[0126] Integral control (I control):
[0127] I_error = I_error + E = 0 + 2 = 2 I_out = Ki * I_error = 0.2 * 2 = 0.4 Derivative control (D control):
[0128] dE / dt = (E - E_previous) / Δt = (2 - 0) / 0.1 = 20 D_out = Kd
[0129] *(dE / dt) = 0.1 * 20 = 2
[0130] Combined output:
[0131] Output = P_out + I_out + D_out = 1 + 0.4 + 2 = 3.4
[0132] Therefore, the output Output is 3.4. This output will be used as a control signal to control the first servo cylinder through the PID controller to adjust the diameter of the topological cylinder.
[0133] The above-described embodiments only represent the implementation manners of the relevant actual applications of the present invention. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the invention patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the present invention patent should be subject to the appended claims.
[0134] Embodiment 2
[0135] To make the above specific implementation manners of the present invention more obvious and understandable, the following provides a detailed and exemplary description of the specific implementation manners of the present invention. The present invention can be implemented in many other ways different from those described herein. Those skilled in the art can make similar improvements without departing from the connotation of the present invention. Therefore, the present invention is not limited by the embodiments disclosed below.
[0136] This embodiment is based on the relevant principles described in the above specific implementation manners. Please refer to Figure 6 , the figure shows the control program for controlling and driving all mechanical elements provided in this embodiment to execute the above specific implementation manners, which is stored in the controller. The principle is:
[0137] (1) getFeedbackValue(): This function is used to obtain the actual feedback value measured by the sensor. In practical applications, various sensors may be used to measure relevant parameters, such as position sensors, force sensors, etc., to obtain feedback information related to the adjustment mechanism 2, the electric gripper 3, and the electron beam generating assembly 4.
[0138] (2) controlGripper(double controlOutput): This function is used to control the movement of the electric gripper 3. According to the output value (controlOutput) of the PID controller, this function realizes the control of the electric gripper 3, adjusts its opening and closing degree, and realizes the clamping operation of the item to be disinfected.
[0139] (3) controlBeamComponents(double controlOutput): This function is used to control the second servo cylinder and the electron linear accelerator 404 of the electron beam generating assembly 4. According to the output value (controlOutput) of the PID controller, this function realizes the control of the second servo cylinder and the electron linear accelerator 404, adjusts their positions and radiation intensities, and realizes the uniform irradiation of the electron beam in the chili product container and the adjustment of the sterilization effect.
[0140] (4) pidController.calculate(error): This function is the core algorithm of the PID controller. According to the given error value (error), the PID controller calculates based on the proportional, integral, and differential coefficients to generate a control quantity for adjusting the positions and intensities of the servo cylinder and the accelerator. The calculation process of the PID controller will comprehensively consider the proportional, integral, and differential terms according to the magnitude and change rate of the error to achieve precise control of the system.
[0141] The above-described embodiments only represent the implementation modes of the relevant practical applications of the present invention. Their descriptions are relatively specific and detailed, but they should not be construed as limiting the scope of the invention patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several modifications and improvements can still be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the present invention patent shall be subject to the appended claims.
[0142] Embodiment III
[0143] To make the above specific embodiments of the present invention more obvious and understandable, the following provides a detailed and exemplary description of the specific embodiments of the present invention. The present invention can be implemented in many other ways different from those described herein. Those skilled in the art can make similar improvements without departing from the connotation of the present invention. Therefore, the present invention is not limited by the embodiments disclosed below.
[0144] This embodiment is based on the relevant principles described in the above specific embodiments. During exemplary application:
[0145] Prepare the chili product container: Load the chili product to be processed into a specific container, ensuring the cleanliness and hygiene of the container.
[0146] Set the adjustment mechanism 2: Set the adjustment mechanism 2 on the workbench 1 to ensure its normal operation and stability.
[0147] Start the sterilization process:
[0148] Install the container: Place the container containing the chili product on the workbench 1 to ensure the stable position of the container.
[0149] Fix the electric claw 3: Start the electric claw 3 and use the electric claw 3 to clamp the container of the item to be disinfected to ensure its firm fixation.
[0150] Sterilization process:
[0151] Start the adjustment mechanism 2: Start the adjustment mechanism 2 and start adjusting the position of the electron beam generating assembly 4 and the diameter of the topological cylinder.
[0152] Adjust the electron beam generating assembly 4: Adjust the irradiation pitch angle of the electron linear accelerator 404 through the control component to ensure the correct irradiation direction of the electron beam.
[0153] Adjust the topological cylinder: Through the control of the first servo cylinder, adjust the diameter of the topological cylinder to achieve uniform spacing adjustment between each electron beam generating assembly 4 and the container.
[0154] Continue the sterilization process: During the adjustment process, the electron beam generating assembly 4 uniformly irradiates the container on the electric claw 3 for sterilization until the set radiation dose is reached.
[0155] End the sterilization process:
[0156] Stop the adjustment mechanism 2: After reaching the set radiation dose, stop the operation of the adjustment mechanism 2.
[0157] Release the electric claw 3: Stop the operation of the electric claw 3 and release the container of the item to be disinfected.
[0158] Completion of sterilization treatment: After the chili product container is uniformly irradiated and sterilized by an electron beam, the sterilization process is completed.
[0159] The above-described embodiments only represent the implementation modes of the relevant practical applications of the present invention. The description is relatively specific and detailed, but it should not be construed as a limitation on the scope of the invention patent. It should be noted that for those of ordinary skill in the art, without departing from the concept of the present invention, several deformations and improvements can still be made, and these all belong to the protection scope of the present invention. Therefore, the protection scope of the present invention patent shall be subject to the appended claims.
Claims
1. An electron beam-based multi-degree-of-freedom linkage sterilization device for chili product preparation, characterized in that, Comprising an adjusting mechanism (2); The adjusting mechanism (2) includes a linear degree of freedom and a number of adjusting units (204) arranged in an annular array and surrounding to form a topological cylinder, and the linear degree of freedom adjusts the diameter of the topological cylinder according to the magnitude of its stroke; An electron beam generating assembly (4) for sterilization is provided on the adjusting unit (204); An electric chuck (3) for clamping the member to be disinfected is provided at the central axis of the topological cylinder; The electron beam generating assembly (4) includes a control assembly and an electron linear accelerator (404) for outputting an electron beam; The control assembly is used to adjust the irradiation pitch angle of the electron linear accelerator (404); The control assembly includes a first frame body (401), a second frame body (402) hinged to one end of the first frame body (401), and a second servo cylinder (403); The cylinder body and the piston rod of the second servo cylinder (403) are respectively hinged to the middle parts of the first frame body (401) and the second frame body (402), and the electron linear accelerator (404) is installed on the second frame body (402); The adjusting mechanism (2) includes a frame (201), a sliding cylinder (203) is vertically slidably engaged on the frame (201), and the sliding cylinder (203) is lifted and adjusted relative to the frame (201) by a first linear actuator (202) for outputting the linear degree of freedom on the frame (201); At least ten of the adjusting units (204) are arranged in an annular array on the sliding cylinder (203); Each adjusting unit (204) includes a first plate body (2042), and the bottom and top of the first plate body (2042) are respectively hinged to the top of the sliding cylinder (203) and the bottom of a second plate body (2043) by hinges; The outside of the second plate body (2043) is hinged to one end of a hinge frame (2044), the other end of the hinge frame (2044) is hinged to a connecting frame (2041), and the bottom of the connecting frame (2041) is fixedly connected to the sliding cylinder (203); The electron beam generating assembly (4) is installed on the second plate body (2043); In each pair of adjacent adjusting units (204), the respective second plate bodies (2043) are slidably engaged with each other through a sliding assembly; the sliding assembly is composed of a slide rail and a pin shaft slidably engaged therewith; the above-mentioned pin shafts are installed between each pair of second plate bodies (2043).
2. The sterilization device according to claim 1, characterized in that: The radiation intensity of the electron linear accelerator (404) is 2, 3 or 6 kGy dose.
3. The sterilization device according to claim 2, wherein: The first linear actuator (202) is a first servo cylinder.
Citation Information
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