A pot and a PVD or CVD processing technology thereof

Abstract

The present application relates to the field of non-stick pot, especially to a pot and a PVD or CVD processing technology thereof, comprising the following steps: step 1, constructing a base material with a stainless steel inner layer, and performing precision knurling and hardening treatment on the stainless steel inner surface of the base material to obtain a micron-level concave-convex texture; step 2, cutting the base material into unit sheets according to the shape of the pot; step 3, performing pretreatment on the surface of the unit sheet and then cleaning; step 4, forming a PVD film layer or a CVD film layer with anti-sticking effect on the micron-level concave-convex texture of the unit sheet by using a PVD process or a CVD process, so that the hardness of the PVD film layer or the CVD film layer on the micron-level concave-convex texture reaches more than Vickers hardness HV600; and step 5, manufacturing the pot by using a stretching or stamping method. The PVD or CVD processing technology greatly improves the production efficiency of the pot, the thickness of the PVD film layer or the CVD film layer of the inner layer of the pot is more uniform, and the product quality is reliable.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of non-stick pots, in particular to a pot and a PVD or CVD processing technology thereof. BACKGROUND

[0002] Currently, conventional non-stick pots need to be sprayed with a chemical non-stick coating on the inner surface of the pot. Such a chemical non-stick coating is prone to decomposition and failure at high temperatures, and the coating will be quickly damaged under the use of a metal spatula. In order to make the non-stick pot have the characteristics of not easy to stick, easy to clean, fast and even heating, there are various solutions on the market. For example, CN201020591079.7 represents a solution of arranging multiple grooves on the top surface of the bottom of the pot to form a texture, and arranging a Teflon material non-stick layer in the grooves. CN201310455227.0 further designs the arrangement of the groove texture, and clearly defines the length, width and height of the groove stripes and the size and height of the convex points. Then, a non-stick coating is sprayed, and the surface of the pot body is further polished to become the final product.

[0003] Although the above solutions achieve the effect of non-stick to some extent, they all use chemical non-stick coatings. As we all know, the chemical non-stick coating of the non-stick pot is prone to failure or easy to fall off at high temperatures when cooking, thereby causing the food to stick to the pot and the problem of eating the chemical coating.

[0004] For the above problems, non-coated non-stick pots, also known as physical non-stick pots, have appeared on the market.

[0005] For example, the announcement text of Chinese invention patent No. CN108315696B records a surface treatment process of a pot, a pot and a cooking appliance. The surface treatment process of the pot comprises: preparing a pot body; pretreating the pot body and a target material; and depositing a layer of PVD coating on the outer surface of the pot body by using the target material according to preset deposition parameters. Through the technical scheme of the present application, the appearance of the outer surface of the pot can be effectively improved, and the pot has good hardness, wear resistance and corrosion resistance, thereby prolonging the service life of the product.

[0006] For example, the announcement text of Chinese invention patent No. CN115741485A records a non-coated cooking food container, which is a metal pot and a metal food container in a kitchen appliance. The inner surface material is austenitic stainless steel, ferritic stainless steel or ordinary carbon steel. The inner surface of the container body has a micron-nanometer scale concave-convex structure, and the nano-scale concave-convex structure and surface hardening are enriched by a physical vapor deposition (PVD) surface treatment method. The rough surface can provide certain physical non-stick performance, and has good surface hardness and wear resistance.

[0007] However, the above-mentioned prior art is to stretch the substrate into a pot body first, and then further process the pot body, including the surface treatment of physical vapor deposition (PVD), which is after the pot body is formed. Because the pot body is in a concave shape, on the one hand, due to its three-dimensional shape, it occupies a large space, and the number of pot bodies that can be processed at a time is greatly limited, and the yield is not high. On the other hand, the three-dimensional shape of the concave pot body makes the PVD film layer in the inner surface deposit unevenly, resulting in uneven thickness of the PVD film layer in each region. SUMMARY

[0008] In order to solve the above-mentioned problems, the first purpose of the present application is to provide a PVD or CVD processing process, which comprises the following steps:

[0009] In order to achieve the above-mentioned purposes, the present application adopts the following technical solutions:

[0010] A PVD or CVD processing process, characterized in that it comprises the following steps:

[0011] Step 1, constructing a substrate with a stainless steel inner layer, and precisely knurling and hardening the stainless steel inner surface of the substrate to obtain a micron-level concave-convex texture with a Vickers hardness of HV300-400;

[0012] Step 2, cutting the substrate into unit sheets according to the pot shape;

[0013] Step 3, pretreating and then cleaning the surface of the unit sheet;

[0014] Step 4, forming a PVD film layer or a CVD film layer with anti-sticking effect (cooking food non-stick property) on the micron-level concave-convex texture of the unit sheet by PVD process or CVD process, so that the hardness of the PVD film layer or the CVD film layer on the micron-level concave-convex texture reaches Vickers hardness HV600 or more;

[0015] Step 5, making the plated unit sheet into a pot by stretching or stamping.

[0016] The present application adopts the above-mentioned technical solution, which provides a PVD or CVD processing process. In this processing process, the inner surface of the substrate is precisely knurled and hardened first, so that the micron-level concave-convex texture has a Vickers hardness of HV300-400. This can ensure that the PVD coating can be stably attached to the inner surface of the substrate in the subsequent process steps, and also ensure that the micron-level concave-convex texture to which the PVD coating is attached has a certain strength, and the hardness of the PVD film layer or the CVD film layer has a gradient, which is not easy to cause damage to the plated film layer.

[0017] The base material can be in different forms according to different types of the pot body, and generally refers to a single-layer base material when the pot body is a single-layer pot, and a multi-layer composite base material when the pot body is a composite pot.

[0018] Further, the base material is cut into unit sheets in priority, and the unit sheets are cut according to the shape of the pot body to be manufactured, such as a wok, the unit sheets are constructed as circular sheets, and such as a baking tray, the unit sheets are constructed as square sheets. After the unit sheets are cleaned, the unit sheets are put into a furnace for PVD process or CVD process treatment. The PVD process refers to a surface treatment method of physical vapor deposition, and the CVD process refers to a surface treatment method of chemical vapor deposition. The base material is cut into unit sheets, and the unit sheets are treated by PVD process or CVD process to form a PVD film layer or a CVD film layer with anti-sticking effect on the micron-level concave-convex texture of the unit sheets, and finally the unit sheets are manufactured into a pot body.

[0019] The unit sheets occupy a small space due to the thin sheet shape, and the unit sheets are sent into a furnace for PVD process or CVD process treatment, which has two advantages:

[0020] 1. As described above, the unit sheets occupy a small space, and more unit sheets can be placed in the furnace for PVD process or CVD process treatment, which can improve the process efficiency and increase the yield.

[0021] 2. The flat sheet of the unit sheet has uniform thickness of the PVD film layer or the CVD film layer with anti-sticking effect formed on the micron-level concave-convex texture by using the deposition method.

[0022] In a further preferred embodiment, the step 1 comprises the following steps:

[0023] Step 1.1, selecting a stainless steel sheet as an inner layer base material;

[0024] Step 1.2, performing precise knurling treatment on the inner surface of the stainless steel sheet to obtain a micron-level concave-convex texture, so that the Vickers hardness of the inner surface of the sheet is HV300-400;

[0025] Step 1.3, selecting an outer layer base material, a middle layer base material and the inner layer base material to form a composite base material;

[0026] The outer layer base material is a magnetic conductive stainless steel base material, the middle layer base material is a uniform heat conductive base material, and the inner layer base material is a food-grade contact stainless steel.

[0027] The proposed solution involves first performing precision knurling and hardening on the inner substrate, and then combining it with the outer and middle substrates to form a composite substrate. The outer substrate is typically made of magnetically conductive stainless steel, while the middle substrate is typically made of aluminum.

[0028] Furthermore, step 3 includes the following steps:

[0029] Step 3.1, Fine cleaning: After fine sandblasting or other methods to remove oxide scale from the unit sheet, perform fine cleaning.

[0030] Step 3.2, Plasma cleaning: Plasma cleaning is performed on the unit sheet before it is fed into the furnace for PVD or CVD processes.

[0031] In order to ensure that the PVD or CVD film has good adhesion on the unit sheet, so as to make the PVD or CVD film more stable.

[0032] In the specific solution, step 4 includes the following steps:

[0033] Step 4.1: Deposit an underlayer or deposit an underlayer and a thickening layer sequentially on the micron-level texture of the unit sheet.

[0034] Step 4.2: Deposit a functional layer on the underlayer or thickening layer of the unit sheet. The functional layer refers to a PVD film or a CVD film.

[0035] The above scheme involves depositing an underlayer, a thickening layer, and a functional layer sequentially on the unit sheet, or depositing an underlayer and a functional layer sequentially, wherein the functional layer refers to a PVD film or a CVD film.

[0036] In a further embodiment, the preset deposition parameters for the PVD or CVD process in step 4 include: deposition gas pressure, deposition gas flow rate, deposition power, deposition bias, and deposition time; wherein the deposition gas pressure ranges from 8 × 10⁻⁶. -2 Pa ~ 8×10 -1 The deposition gas flow rate ranges from 100 sccm to 1500 sccm; the deposition power ranges from 5 kW to 30 kW; the deposition bias ranges from -200 V to -20 V; and the deposition time ranges from 10 minutes to 120 minutes.

[0037] Preferably, the stretching or stamping method in step 5 is a non-stretching stretching or stamping method. Using a non-stretching stretching or stamping method here ensures that the unit sheet and its attached PVD or CVD film layer will not stretch and be damaged.

[0038] The application also provides another PVD or CVD processing process, comprising the following steps:

[0039] Step 1, constructing the inner layer of the base material as stainless steel, and performing precision knurling and hardening treatment on the inner surface of the base material to obtain micron-level concave-convex textures with Vickers hardness of HV300-400;

[0040] Step 2, performing descaling on the inner surface of the base material and then cleaning;

[0041] Step 3, forming a PVD film layer or a CVD film layer with anti-sticking effect on the micron-level concave-convex textures of the base material by using a PVD process or a CVD process, so that the hardness of the PVD film layer or the CVD film layer on the micron-level concave-convex textures reaches Vickers hardness of HV600 or above;

[0042] Step 4, cutting the base material into unit sheets according to the pot shape;

[0043] Step 5, manufacturing the pot by using the unit sheets in a stretching or stamping manner.

[0044] The application adopts the above technical scheme, which provides another PVD or CVD processing process. The difference between the PVD or CVD processing process and the process described above is that the inner surface of the base material is first treated by a PVD process or a CVD process, so that a PVD film layer or a CVD film layer is formed on the micron-level concave-convex textures of the inner surface of the base material, and then the base material is cut into unit sheets, and finally the pot is manufactured.

[0045] In general, the difference lies in whether the film is plated first or the unit sheet is cut first, but the same point is that the film plating process of the PVD film layer or the CVD film layer is required to be before the pot forming process, so as to improve the efficiency of the film plating process and ensure that the PVD film layer or the CVD film layer with anti-sticking effect formed on the micron-level concave-convex textures has uniform thickness.

[0046] As a preferred, the step 1 comprises the following steps:

[0047] Step 1.1, selecting a stainless steel plate as the inner layer base material;

[0048] Step 1.2, performing precision knurling treatment on the inner surface of the stainless steel plate to obtain micron-level concave-convex textures, so that the Vickers hardness of the inner surface of the plate is HV300-400;

[0049] Step 1.3, selecting an outer layer base material, a middle layer base material and an inner layer base material to form a composite base material;

[0050] The outer layer base material is a magnetically conductive stainless steel base material, the middle layer base material is a uniform heat-conducting base material, and the inner layer base material is a food-grade contact stainless steel.

[0051] Preferably, step 2 includes the following steps:

[0052] Step 2.1, Fine cleaning: After removing the oxide scale from the unit sheet using methods such as fine sandblasting, a fine cleaning is performed;

[0053] Step 2.2, Plasma cleaning: Plasma cleaning is performed on the substrate before the PVD or CVD process.

[0054] Preferably, step 3 includes the following steps:

[0055] Step 3.1: Deposit an underlayer or deposit an underlayer and a thickening layer sequentially on the micron-level texture of the substrate.

[0056] Step 3.2: Deposit a functional layer on the underlayer or thickening layer of the substrate. The functional layer refers to a PVD film or a CVD film.

[0057] In a further embodiment, the preset deposition parameters for the PVD or CVD process in step 3 include: deposition gas pressure, deposition gas flow rate, deposition power, deposition bias, and deposition time; wherein the deposition gas pressure ranges from 8 × 10⁻⁶. -2 Pa ~ 8×10 -1 The deposition gas flow rate ranges from 100 sccm to 1500 sccm; the deposition power ranges from 5 kW to 30 kW; the deposition bias ranges from -200 V to -20 V; and the deposition time ranges from 10 minutes to 120 minutes.

[0058] Preferably, the stretching or stamping method in step 5 is a non-stretching stretching or stamping method.

[0059] The second objective of this invention is to provide a cookware manufactured using the PVD or CVD processing technology described above. Detailed Implementation

[0060] The embodiments of the present invention are described in detail below, and are intended to explain the present invention, but should not be construed as limiting the present invention.

[0061] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Thus, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more, unless explicitly defined otherwise.

[0062] In the present application, unless specifically defined and limited otherwise, the terms "mounting", "connecting", "connecting", "fixing" and the like should be understood broadly, for example, can be fixedly connected, can be detachably connected, or integrally connected; can be mechanically connected, or electrically connected; can be directly connected, or indirectly connected through an intermediate medium, or can be internal communication of two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0063] In the present application, unless specifically defined and limited otherwise, the first feature "on" or "under" the second feature can include that the first and second features are in direct contact, or that the first and second features are not in direct contact but are in contact through another feature between them. Moreover, the first feature "on", "above" and "above" the second feature includes that the first feature is directly above and obliquely above the second feature, or only indicates that the first feature is higher in horizontal height than the second feature. The first feature "under", "below" and "below" the second feature includes that the first feature is directly below and obliquely below the second feature, or only indicates that the first feature is lower in horizontal height than the second feature.

[0064] Embodiment 1:

[0065] The present embodiment provides a PVD or CVD processing process, comprising the following steps:

[0066] Step 1, constructing a base material with a stainless steel inner layer, and performing precision knurling and hardening treatment on the stainless steel inner surface of the base material to obtain a micron-level concave-convex texture with a Vickers hardness of HV300-400;

[0067] Step 2, cutting the base material into unit sheets according to the pot shape;

[0068] Step 3, pretreating and then cleaning the surface of the unit sheet;

[0069] Step 4, forming a PVD film layer or a CVD film layer with anti-sticking effect on the micron-level concave-convex texture of the unit sheet using a PVD process or a CVD process, so that the hardness of the PVD film layer or the CVD film layer on the micron-level concave-convex texture reaches Vickers hardness HV600 or more;

[0070] Step 5, making the unit sheet into a pot by stretching or stamping.

[0071] The present application adopts the technical scheme, and provides a PVD or CVD processing technology. The inner surface of the base material is first subjected to precision knurling and hardening treatment, so that the microscale concave-convex texture has a Vickers hardness of HV300-400. In this way, the PVD coating can be stably attached to the inner surface of the base material in the subsequent process step, and the microscale concave-convex texture of the PVD coating has a certain strength and is not easily damaged.

[0072] The base material described above can have different forms according to different types of pots. Generally, when the pot is a single-layer pot, the base material is a single-layer base material; when the pot is a composite pot, the base material is a multi-layer composite base material.

[0073] Further, the base material is first cut into unit sheets. The unit sheets are cut according to the shape of the pot to be made. For example, if the pot is a frying pan, the unit sheets are constructed as circular sheets; if the pot is a baking tray, the unit sheets are constructed as square sheets. After the unit sheets are cleaned, the unit sheets are placed in a furnace for PVD or CVD process treatment. The PVD process refers to a physical vapor deposition surface treatment method, and the CVD process refers to a chemical vapor deposition surface treatment method. In this embodiment, the base material is cut into unit sheets, and the unit sheets are subjected to PVD or CVD process to form a PVD or CVD film layer with anti-sticking effect on the microscale concave-convex texture of the unit sheets. Finally, the unit sheets are made into pots.

[0074] The unit sheets are thin and occupy less space. The unit sheets are sent into the furnace for PVD or CVD process treatment, which has two advantages:

[0075] 1. As described above, the unit sheets occupy less space, and more unit sheets can be placed in the furnace for PVD or CVD process treatment, which can improve the process efficiency and increase the yield.

[0076] 2. The flat unit sheets have uniform thickness of the PVD or CVD film layer with anti-sticking effect formed on the microscale concave-convex texture by deposition.

[0077] In a further preferred embodiment, the step 1 includes the following steps:

[0078] Step 1.1: Selecting a stainless steel sheet as the inner layer base material;

[0079] Step 1.2: Subjecting the inner surface of the stainless steel sheet to precision knurling treatment to obtain a microscale concave-convex texture, and making the surface hardness of the inner surface have a Vickers hardness of HV300-400;

[0080] Step 1.3: Select an outer substrate, a middle substrate, and an inner substrate to construct a composite substrate.

[0081] The proposed solution involves first performing precision knurling and hardening on the inner substrate, and then combining it with the outer and middle substrates to form a composite substrate. The outer substrate is typically made of magnetically conductive stainless steel, while the middle substrate is typically made of aluminum.

[0082] Furthermore, step 3 includes the following steps:

[0083] Step 3.1, Fine cleaning: After fine sandblasting or other methods to remove oxide scale from the unit sheet, fine cleaning is performed;

[0084] Step 3.2, Plasma cleaning: Plasma cleaning is performed on the unit sheet before it is fed into the furnace for PVD or CVD processes.

[0085] In order to ensure that the PVD or CVD film has good adhesion on the unit sheet, so as to make the PVD or CVD film more stable.

[0086] In the specific solution, step 4 includes the following steps:

[0087] Step 4.1: Deposit an underlayer or deposit an underlayer and a thickening layer sequentially on the micron-level texture of the unit sheet.

[0088] Step 4.2: Deposit a functional layer on the underlayer or thickening layer of the unit sheet. The functional layer refers to a PVD film or a CVD film.

[0089] The above scheme involves depositing an underlayer, a thickening layer, and a functional layer sequentially on the unit sheet, or depositing an underlayer and a functional layer sequentially, wherein the functional layer refers to a PVD film or a CVD film.

[0090] The underlayer here is generally made of pure metal, and its main function is to enhance the adhesion between the film and the substrate; the thickening layer mainly refers to a hard film layer with a faster plating speed, which can save the thickness of the functional film layer while improving the impact resistance of the film layer.

[0091] In a further embodiment, the preset deposition parameters for the PVD or CVD process in step 4 include: deposition gas pressure, deposition gas flow rate, deposition power, deposition bias, and deposition time; wherein the deposition gas pressure ranges from 8 × 10⁻⁶. -2 Pa ~ 8×10 -1 The deposition gas flow rate ranges from 100 sccm to 1500 sccm; the deposition power ranges from 5 kW to 30 kW; the deposition bias ranges from -200 V to -20 V; and the deposition time ranges from 10 minutes to 120 minutes.

[0092] As preferred, the stretching or punching mode in step 5 adopts a non-ductile stretching or punching mode. Here, the non-ductile stretching or punching mode is adopted so that the unit sheet and the PVD film layer or CVD film layer attached thereon will not be damaged by ductility.

[0093] By using the above PVD or CVD processing technology, the production efficiency of the pot is greatly improved. Since the sheet film coating can adopt a continuous film coating line with plane conveying, the production capacity is improved from the original 500 daily output of single cavity film coating machine to 10,000 daily output, greatly reducing the operating cost, improving the production capacity and production efficiency, and greatly replacing and reducing the huge investment in single cavity furnace.

[0094] Moreover, the PVD film layer or CVD film layer of the inner layer of the pot is more uniform in thickness, and the product quality is reliable. The thickness of the PVD film layer or CVD film layer is in the range of 0.5 μm to 4 μm.

[0095] Example 2:

[0096] This embodiment provides another PVD or CVD processing technology. The technical effects of the same scheme in the following processing technology can be referred to the effects described in Example 1. The PVD or CVD processing technology comprises the following steps:

[0097] Step 1, constructing a base material with stainless steel inner layer, and performing precision knurling and hardening treatment on the stainless steel inner surface of the base material to obtain micron-level concave-convex texture with Vickers hardness of HV300-400;

[0098] Step 2, cleaning the inner surface of the base material;

[0099] Step 3, forming a PVD film layer or CVD film layer with anti-sticking effect on the micron-level concave-convex texture of the base material by using PVD process or CVD process, so that the hardness of the PVD film layer or CVD film layer on the micron-level concave-convex texture reaches Vickers hardness HV600 or more;

[0100] Step 4, cutting the base material into unit sheets according to the pot shape;

[0101] Step 5, making the unit sheet into a pot by using stretching or punching mode.

[0102] The present application adopts the above technical solution, and provides another PVD or CVD processing technology, which is only different from the above-mentioned process in that the present application is to first perform a PVD process or a CVD process on the inner surface of the base material, so as to form a PVD film layer or a CVD film layer on the micron-level concave-convex texture of the inner surface of the base material, then cut the base material into unit sheets, and finally manufacture the pot. In general, the difference lies in whether the film is plated first or the unit sheet is cut first, but the same point is that the film plating process of the PVD film layer or the CVD film layer is required to be before the pot forming process, so as to improve the efficiency of the film plating process and ensure that the PVD film layer or the CVD film layer with the anti-sticking effect formed on the micron-level concave-convex texture is uniform in thickness.

[0103] As preferred, the step 1 comprises the following steps:

[0104] Step 1.1, selecting a stainless steel plate as the inner layer base material;

[0105] Step 1.2, performing precision knurling treatment on the inner surface of the stainless steel plate to obtain a micron-level concave-convex texture, so that the surface hardness of the inner surface is 300-400 Vickers hardness HV;

[0106] Step 1.3, selecting an outer layer base material, a middle layer base material and the inner layer base material to form a composite base material.

[0107] As preferred, the step 2 comprises the following steps:

[0108] Step 2.1, fine cleaning: fine cleaning the base material;

[0109] Step 2.2, plasma cleaning: sending the base material into a furnace to perform plasma cleaning before the PVD process or the CVD process.

[0110] As preferred, the step 3 comprises the following steps:

[0111] Step 3.1, plating a primer layer or sequentially plating a primer layer and a thickening layer on the micron-level concave-convex texture of the base material;

[0112] Step 3.2, plating a functional layer, which is a PVD film layer or a CVD film layer, on the primer layer or the thickening layer of the base material.

[0113] In a further scheme, the preset deposition parameters of the PVD process or the CVD process in the step 3 include: deposition gas pressure, deposition gas flow rate, deposition power, deposition bias and deposition time; wherein, the deposition gas pressure is valued in the range of 8×10 -2 Pa-8×10 -1The deposition gas flow rate ranges from 100sccm to 1500sccm; the deposition power ranges from 5kw to 30kw; the deposition bias ranges from -200V to -20V; and the deposition time ranges from 10 minutes to 120 minutes.

[0114] As a preference, the stretching or punching in step 5 is in a non-ductile stretching or punching mode.

[0115] Embodiment 3:

[0116] A second object of the present application is to provide a pot made by the PVD or CVD processing technology as described in Embodiment 1 or Embodiment 2.

[0117] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily mean the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0118] Although the embodiments of the present application have been shown and described above, it should be understood that the above-described embodiments are exemplary, and should not be construed as limiting the present application, and those of ordinary skill in the art can make changes, modifications, replacements and variations to the above-described embodiments without departing from the principles and spirit of the present application within the scope of the present application.

Claims

1. A PVD or CVD processing process, characterized by: It comprises the following steps: Step 1, constructing the base material with stainless steel as the inner layer, and performing precision knurling and hardening treatment on the stainless steel inner surface of the base material to obtain micron-level concave-convex texture with Vickers hardness of HV300-400; Step 2, cutting the base material into unit sheets according to the shape of the pot; Step 3, performing pretreatment on the surface of the unit sheet and then cleaning it; Step 4, forming a PVD film layer or a CVD film layer with anti-sticking effect on the micron-level concave-convex texture of the unit sheet by using PVD process or CVD process, so that the hardness of the PVD film layer or the CVD film layer on the micron-level concave-convex texture reaches Vickers hardness HV600 or above; The step 4 comprises the following steps: Step 4.1, plating a primer layer on the micron-level concave-convex texture of the unit sheet, or plating a primer layer and a thickening layer in sequence; Step 4.2, plating a functional layer on the primer layer or the thickening layer of the unit sheet, the functional layer being a PVD film layer or a CVD film layer with non-sticking property; Step 5, manufacturing the unit sheet into a pot by using non-extensible stretching or stamping method, so that the PVD film layer or the CVD film layer remains intact during the forming process; The step 1 comprises the following steps: Step 1.1, selecting a stainless steel plate as the inner layer base material; Step 1.2, performing precision knurling treatment on the inner surface of the stainless steel plate to obtain micron-level concave-convex texture, so that the Vickers hardness of the inner surface of the plate is HV300-400; Step 1.3, selecting an outer layer base material, a middle layer base material and an inner layer base material to form a composite base material; The outer layer base material is a magnetically conductive stainless steel base material, the middle layer base material is a uniform heat-conducting base material, and the inner layer base material is a food-grade contact stainless steel.

2. A PVD or CVD process according to claim 1, characterized in that: The step 3 comprises the following steps: Step 3.1, fine cleaning: performing fine cleaning on the unit sheet after surface descaling by fine sand blasting or the like; Step 3.2, plasma cleaning: sending the unit sheet into a furnace for plasma cleaning before PVD process or CVD process.

3. The PVD or CVD processing process according to claim 1, characterized in that it comprises the following steps: The preset deposition parameters of the PVD process or the CVD process in the step 4 include: deposition gas pressure, deposition gas flow rate, deposition power, deposition bias and deposition time; wherein, the deposition gas pressure ranges from 8*10 -2 Pa to 8*10 -1 Pa, the deposition gas flow rate ranges from 100sccm to 1500sccm, the deposition power ranges from 5kw to 30kw, the deposition bias ranges from -200V to -20V, and the deposition time ranges from 10 minutes to 120 minutes.

4. A PVD or CVD processing process characterized by: Step 1, constructing the base material with stainless steel as the inner layer, and performing precision knurling and hardening treatment on the stainless steel inner surface of the base material to obtain micron-level concave-convex texture with Vickers hardness of HV300-400; Step 2, cleaning the base material after removing the oxide skin on the inner surface; Step 3, forming a PVD film layer or a CVD film layer with anti-sticking effect on the micron-level concave-convex texture of the base material by using PVD process or CVD process, so that the hardness of the PVD film layer or the CVD film layer on the micron-level concave-convex texture reaches Vickers hardness HV600 or above; The step 3 comprises the following steps: Step 3.1, plating a primer layer on the micron-level concave-convex texture of the base material or plating a primer layer and a thickening layer in sequence; Step 3.2, plating a functional layer on the primer layer or the thickening layer of the base material, the functional layer being a PVD film layer or a CVD film layer; Step 4, cutting the base material into unit sheets according to the shape of the pot; Step 5, manufacturing the unit sheet into a pot by using non-extensible stretching or stamping method, so that the PVD film layer or the CVD film layer remains intact during the forming process; ​ Step 1 comprises the following steps: Step 1.1, selecting stainless steel plate as inner layer base material; Step 1.2, performing precision knurling treatment on the inner surface of the stainless steel plate to obtain micron-level concave-convex texture, so that the Vickers hardness of the inner surface of the plate is HV300~400; Step 1.3, selecting outer layer base material, middle layer base material and inner layer base material to form a composite base material; The outer layer base material is a magnetic conductive stainless steel base material, the middle layer base material is a uniform heat conductive base material, and the inner layer base material is a food-grade contact stainless steel.

5. A PVD or CVD process according to claim 4, wherein: The step 2 comprises the following steps: Step 2.1, fine cleaning: after the unit sheet is subjected to surface descaling methods such as fine sand blasting, fine cleaning is performed; Step 2.2, plasma cleaning: the base material is sent into the furnace for plasma cleaning before PVD process or CVD process.

6. The PVD or CVD processing process according to claim 4, characterized in that it is prepared by using the PVD or CVD processing process according to any one of claims 1~3 or any one of claims 4~6. The preset deposition parameters of the PVD process or the CVD process in the step 3 include: deposition gas pressure, deposition gas flow rate, deposition power, deposition bias and deposition time; wherein, the deposition gas pressure ranges from 8*10 -2 Pa to 8*10 -1 Pa, the deposition gas flow rate ranges from 100sccm to 1500sccm, the deposition power ranges from 5kw to 30kw, the deposition bias ranges from -200V to -20V, and the deposition time ranges from 10 minutes to 120 minutes.

7. A pan characterised in that:

6. The PVD or CVD processing process according to claim 4, characterized in that it is prepared by using the PVD or CVD processing process according to any one of claims 1~3 or any one of claims 4~6.