A medicament feeding device for a chemical polishing wastewater purification system

Abstract

The present application relates to chemical polishing wastewater treatment technical field, specifically disclose a kind of reagent feeding device for chemical polishing wastewater purification system, including the fixed plate located above chemical polishing pool, motor is fixedly installed on fixed plate, the output end of motor bottom is fixedly connected with the rotating shaft, the outer side of rotating shaft middle part is fixedly connected with fixed block, the collecting box is fixedly connected in rotating shaft bottom, two side frames are connected in fixed block two sides, a plurality of through slots are formed in side frame, and installation box is detachably installed in through slot, a plurality of baffle plates and filter plates are installed on installation box, and scraper is installed at the end of side frame away from rotating shaft. Turnplate opens outward, water flows through installation box inside, so that solid reagent in installation box is scattered, sliding block continuously moves, all turnplates are gradually opened from close to the center of chemical polishing pool to close to the edge of chemical polishing pool, so that all reagents are fully contacted with chemical polishing wastewater, compared with directly sprinkling reagent in chemical polishing pool, reaction time can be shortened, and efficiency is increased.

Description

Technical Field

[0001] This invention relates to the field of chemical wastewater treatment technology, and more particularly to a reagent dosing device for use in a chemical wastewater purification system. Background Technology

[0002] Chemical polishing is a method that uses the selective dissolution effect of chemical reagents on uneven areas of a sample surface to eliminate scratches and smooth the surface. Chemical polishing equipment is simple, capable of handling thin tubes, parts with deep holes, and parts with complex shapes, and offers high production efficiency. Chemical polishing can be used as a pretreatment step for electroplating, or it can be used directly after polishing with necessary protective measures.

[0003] Chemical polishing generates a significant amount of wastewater. The common method for treating this wastewater is to add chemical agents. Since this wastewater contains various metals and other impurities, different chemical agents are typically added multiple times to treat different impurities. These agents are usually in solid or liquid form. Liquid agents are poured directly into the chemical polishing tank. Existing equipment also typically involves directly sprinkling solid agents into the tank, resulting in a large amount of solid agent only contacting a small portion of the wastewater, making it difficult to mix evenly and leading to a slow reaction rate. Furthermore, impurities or crystals generated during the reaction require additional cleaning equipment, further reducing the efficiency of the chemical polishing tank. Summary of the Invention

[0004] The purpose of this invention is to address the shortcomings of existing technologies by proposing a reagent dosing device for a chemical wastewater purification system.

[0005] To achieve the above objectives, the present invention adopts the following technical solution:

[0006] A reagent dosing device for a chemical wastewater purification system includes a fixed plate located above the chemical wastewater tank. A motor is fixedly installed on the fixed plate. A rotating shaft is fixedly connected to the output end of the motor. A fixed block is fixedly connected to the outer side of the middle part of the rotating shaft. A collection box is fixedly connected to the bottom of the rotating shaft. Two side frames are connected to both sides of the fixed block. Multiple through slots are opened on the side frames. An installation box is detachably installed in the through slots. Multiple partitions and filter plates are installed on the installation box. A scraper is installed at the end of the side frame away from the rotating shaft.

[0007] Preferably, a support plate is also fixedly installed on the outside of the rotating shaft. The support plate is located above the fixed block. A first push rod is provided above the fixed block. The top of the first push rod is fixedly connected to the support plate, and the bottom is fixedly connected to the fixed block.

[0008] Preferably, mounting plates are fixedly connected to both sides of the fixing block. A second push rod is provided on the side of the mounting plate closest to the fixing block. One end of the second push rod is fixedly connected to the fixing block, and the other end is fixedly connected to the mounting plate. The side of the mounting plate away from the fixing block is fixedly connected to the frame.

[0009] Preferably, rotating plates are rotatably mounted on both sides of the mounting box. The bottom of the rotating plates is rotatably connected to the mounting box via pins, and a first torsion spring is provided on the outside of the pins. A top block is vertically slidably connected to the top of the mounting box, and a first locking plate is fixedly connected to the bottom of the top block. A second locking plate is correspondingly mounted at the end of the rotating plate, and the second locking plate can be locked onto the first locking plate. An airbag is mounted on the rotating plate.

[0010] Preferably, a groove is horizontally provided at the top of the frame, a slider is slidably installed in the groove, a resistance plate is fixedly connected to the top of the slider, a magnetic block is fixedly installed at the bottom of the slider, a magnetic block is also fixedly installed at the top of the top block, and the magnetic block at the bottom of the slider and the magnetic block at the top of the top block repel each other.

[0011] Preferably, the rotating plate has a movable groove, and a movable block is slidably installed inside the movable groove. A second spring is provided on one side of the movable block, with one end of the second spring connected to the movable block and the other end connected to the inner wall of the movable groove.

[0012] Preferably, a horizontal groove is formed on the inner wall of both sides of the through groove, and a vertical groove is formed at the bottom of the horizontal groove. A stop block is fixedly installed on both sides of the mounting box. The stop block can be stuck in the vertical groove. An abutment plate is rotatably installed on the inner wall of the top of the horizontal groove. One end of the abutment plate is rotatably connected to the inner wall of the horizontal groove, and the other end is provided with a first spring. One end of the first spring is connected to the inner wall of the horizontal groove, and the other end is connected to the abutment plate. The end of the abutment plate connected to the spring abuts against the top of the stop block.

[0013] Preferably, a pressure plate is provided on one side of the frame, the pressure plate is located above the top block, and a third push rod is provided at both ends of the pressure plate. The top of the third push rod is fixedly connected to the pressure plate, and the bottom is fixedly connected to the frame through a connecting plate. The pressure plate can contact the top of the top block.

[0014] Preferably, a baffle is provided on one side of the collection box, the top of the baffle is rotatably connected to the collection box, and an inclined block is rotatably connected to one side of the bottom of the collection box via a connecting rod. Gears are fixedly connected to both ends of the connecting rod, and a rack is meshed with one side of the gear. The rack is vertically slidably connected to the outer wall of the collection box, and a vertical rod is connected to the bottom of the rack. A ball bearing is installed at the bottom of the vertical rod. Steps are provided on the inclined surface of the inclined block, and a filter screen is provided on the side of the collection box away from the baffle.

[0015] Preferably, an air pump is fixedly connected to the support plate, one end of the air pump is connected to an air pipe, and a ventilation block is fixedly connected to the bottom of the frame. The ventilation block has multiple air holes, and the air pipe is connected to the ventilation block.

[0016] Compared with the prior art, the beneficial effects of the present invention are:

[0017] 1. The rotating shaft drives the fixed block and frame to rotate, stirring the liquid in the chemical polishing tank. During rotation, the resistance plate is resisted by the chemical polishing wastewater and moves away from the rotating shaft. The resistance plate drives the slider to move along the slide groove. When the slider moves above the mounting box, the magnetic block at the bottom of the slider repels the magnetic block at the top of the top block, causing the top block to slide downwards. This causes the first locking plate to disengage from the second locking plate on the rotating plate, and the rotating plate opens outwards. At this time, water flows through the inside of the mounting box, thus dispersing the solid chemicals inside the mounting box. The slider continues to move, gradually opening all the rotating plates from near the center of the chemical polishing tank to near the edge of the tank, allowing all the chemicals to fully contact the chemical polishing wastewater. The chemicals are also placed separately in the mounting box. After the rotating plates open, the chemicals can quickly and fully contact the chemical polishing wastewater. Compared with directly sprinkling the chemicals into the chemical polishing tank, this can shorten the reaction time and increase efficiency.

[0018] 2. Place the medicine on each layer of partition or filter plate, then close the rotating plate. The air bladder on the rotating plate helps to seal the plate, preventing solid medicine from leaking out and also preventing the medicine's odor from escaping and causing adverse effects on the health of the staff.

[0019] 3. During the movement of the slider, the air pump also starts to work. The gas enters the ventilation block through the air pipe, and then enters the chemical polishing tank through the air holes on the ventilation block. When necessary, catalytic gas or hot air can be introduced into the chemical polishing tank to accelerate the reaction speed. After the gas escapes from the air holes on the ventilation block, it moves upward. As the air moves upward along the mounting box, the bubbles will impact the solid reagent, making the solid reagent disperse faster and further increasing the reaction speed.

[0020] 4. When a foreign object or workpiece falls into the chemical polishing tank, the third push rod retracts, causing the pressure plate to move downwards. The pressure plate pushes all the top blocks downwards, thereby opening all the rotating plates. The rotating plates can catch the foreign object or workpiece. The first push rod retracts, and the foreign object or workpiece can be lifted out of the liquid surface without further retrieval. The airbags on the rotating plates can protect the foreign object or workpiece and reduce the possibility of scratches. Attached Figure Description

[0021] Figure 1 This is a schematic diagram of the installation structure shown in this invention;

[0022] Figure 2 This is a schematic diagram of the overall structure of the present invention;

[0023] Figure 3 As shown in this invention Figure 2 Enlarged schematic diagram of part A;

[0024] Figure 4 This is a schematic diagram of the frame structure shown in the present invention;

[0025] Figure 5 As shown in this invention Figure 4 Enlarged schematic diagram of part B;

[0026] Figure 6 This is a schematic diagram of the mounting box shown in the present invention;

[0027] Figure 7 This is a cross-sectional view of the rotating plate shown in this invention;

[0028] Figure 8 This is a schematic diagram of the structure of the collection box shown in this invention;

[0029] Figure 9 As shown in this invention Figure 8 Enlarged schematic diagram of part C.

[0030] In the diagram: 1. Chemical treatment tank; 2. Fixing plate; 3. Motor; 4. Rotating shaft; 5. Fixing block; 6. First push rod; 7. Support plate; 8. Frame; 9. Through groove; 10. Air pump; 11. Air pipe; 12. Collection box; 13. Filter screen; 14. Horizontal groove; 15. Vertical groove; 16. Abutment plate; 17. First spring; 18. Baffle; 19. Inclined block; 20. Gear; 21. Ventilation block; 22. Scraper. 23. Mounting plate; 24. Second push rod; 25. Slide groove; 26. Pressure plate; 27. Resistance plate; 28. Slider; 29. ​​Third push rod; 30. Mounting box; 31. Partition plate; 32. Top block; 33. First clamping plate; 34. Stop block; 35. Turning plate; 36. Airbag; 37. Second clamping plate; 38. Moving block; 39. Moving groove; 40. Second spring; 41. Rack; 42. Vertical rod. Detailed Implementation

[0031] The technical solutions of the present invention will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments.

[0032] Reference Figure 1-9 A reagent dosing device for a chemical wastewater purification system includes a fixed plate 2 located above a chemical wastewater tank 1. A motor 3 is fixedly installed on the fixed plate 2. A rotating shaft 4 is fixedly connected to the output end of the motor 3 at its bottom. A fixed block 5 is slidably connected to the outer side of the middle part of the rotating shaft 4 in a vertical direction. A collection box 12 is fixedly connected to the bottom of the rotating shaft 4. Two side frames 8 are connected to both sides of the fixed block 5. Multiple through grooves 9 are opened on the side frames 8. An installation box 30 is detachably installed in the through grooves 9. Multiple partitions 31 and filter plates are installed on the installation box 30. A scraper 22 is installed at the end of the side frame 8 away from the rotating shaft 4.

[0033] As a technical optimization of the present invention, a support plate 7 is also fixedly installed on the outer side of the rotating shaft 4. The support plate 7 is located above the fixing block 5. A first push rod 6 is provided above the fixing block 5. The top of the first push rod 6 is fixedly connected to the support plate 7, and the bottom is fixedly connected to the fixing block 5. When the first push rod 6 extends, it can push the fixing block 5 and the frame 8 downward, so that the frame 8 can adapt to the chemical polishing pool 1 of different depths.

[0034] As a technical optimization of the present invention, mounting plates 23 are fixedly connected to both sides of the fixing block 5. A second push rod 24 is provided on the side of the mounting plate 23 closest to the fixing block 5. One end of the second push rod 24 is fixedly connected to the fixing block 5, and the other end is fixedly connected to the mounting plate 23. The side of the mounting plate 23 away from the fixing block 5 is fixedly connected to the frame 8. When the frame 8 is placed in the water, the second push rod 24 can extend, driving the mounting plate 23 and the frame 8 to move away from the center of the chemical polishing tank 1, so that the frame 8 and the scraper 22 can adapt to chemical polishing tanks 1 of different diameters.

[0035] As a technical optimization of the present invention, rotating plates 35 are rotatably mounted on both sides of the mounting box 30. The bottom of the rotating plates 35 is rotatably connected to the mounting box 30 via pins, and a first torsion spring is provided on the outside of the pins. A top block 32 is vertically slidably connected to the top of the mounting box 30, and a first locking plate 33 is fixedly connected to the bottom of the top block 32. A second locking plate 37 is correspondingly mounted on the end of the rotating plates 35, and the second locking plate 37 can be locked onto the first locking plate 33. An airbag 36 is installed on the rotating plates 35. When the rotating plates 35 are closed, the first locking plate 33 locks the second locking plate 37, and the airbag 36 on the rotating plates 35 helps to seal, preventing solid medicine from leaking out and preventing the medicine's odor from escaping and causing adverse effects on the health of the staff.

[0036] As a technical optimization of the present invention, a groove 25 is horizontally opened at the top of the frame 8, and a slider 28 is slidably installed in the groove 25. A resistance plate 27 is fixedly connected to the top of the slider 28, and a magnetic block is fixedly installed at the bottom of the slider 28. A magnetic block is also fixedly installed at the top of the top block 32. The magnetic block at the bottom of the slider 28 and the magnetic block at the top of the top block 32 repel each other. When the slider 28 moves above the mounting box 30, the magnetic block at the bottom of the slider 28 and the magnetic block at the top of the top block 32 repel each other, causing the top block 32 to slide downward, thereby causing the first locking plate 33 to disengage from the second locking plate 37 on the rotating plate 35. Under the action of the first torsion spring, the rotating plate 35 opens outward. At this time, water flows through the interior of the mounting box 30, thereby dispersing the solid agent inside the mounting box 30. The slider 28 continues to move, gradually opening all the rotating plates 35 from near the center of the chemical polishing tank 1 to near the edge of the chemical polishing tank 1, so that all the agents can fully contact the chemical polishing wastewater.

[0037] As a technical optimization of the present invention, a movable groove 39 is provided on the rotating plate 35, and a movable block 38 is slidably installed inside the movable groove 39. A second spring 40 is provided on one side of the movable block 38, with one end of the second spring 40 connected to the movable block 38 and the other end connected to the inner wall of the movable groove 39. When the rotating plate 35 is closed, when the second locking plate 37 contacts the first locking plate 33, the movable block 38 slides along the movable groove 39. After the second locking plate 37 locks the first locking plate 33, under the action of the second spring 40, the first locking plate 33 and the second locking plate 37 are locked together and will not fall off.

[0038] As a technical optimization of the present invention, horizontal grooves 14 are formed on the inner walls of both sides of the through groove 9, and vertical grooves 15 are formed at the bottom of the horizontal grooves 14. Stoppers 34 are fixedly installed on both sides of the mounting box 30. The stoppers 34 can be locked into the vertical grooves 15. An abutment plate 16 is rotatably installed on the inner wall of the top of the horizontal groove 14. One end of the abutment plate 16 is rotatably connected to the inner wall of the horizontal groove 14, and the other end is provided with a first spring 17. One end of the first spring 17 is connected to the inner wall of the horizontal groove 14, and the other end is connected to the abutment plate 16. The end of the abutment plate 16 connected to the spring abuts against the top of the stopper 34. When the stopper 34 slides into the vertical groove 15, under the action of the first spring 17, the abutment plate 16 pushes the stopper 34 downward, causing the stopper 34 to slide to the bottom of the vertical groove 15. The abutment plate 16 presses the stopper 34 downward from the top, preventing the stopper 34 from moving upward, thereby preventing the mounting box 30 from falling out of the through groove 9.

[0039] As a technical optimization of the present invention, a pressure plate 26 is provided on one side of the frame 8, and the pressure plate 26 is located above the top block 32. Third push rods 29 are provided at both ends of the pressure plate 26. The top of the third push rods 29 is fixedly connected to the pressure plate 26, and the bottom is fixedly connected to the frame 8 through a connecting plate. The pressure plate 26 can contact the top of the top block 32. When a foreign object or workpiece falls into the chemical polishing tank 1, the third push rod 29 retracts, causing the pressure plate 26 to move downwards. The pressure plate 26 pushes all the top blocks 32 downwards, thereby opening all the rotating plates 35. The rotating plates 35 can catch the foreign object or workpiece. The first push rod 6 retracts, thus lifting the foreign object or workpiece out of the liquid surface, reducing the need for retrieval. The airbags 36 on the rotating plates 35 can protect the foreign object or workpiece, reducing the possibility of scratches.

[0040] As a technical optimization of the present invention, a baffle 18 is provided on one side of the collection box 12. The top of the baffle 18 is rotatably connected to the collection box 12. An inclined block 19 is rotatably connected to one side of the bottom of the collection box 12 via a connecting rod. Gears 20 are fixedly connected to both ends of the connecting rod. A rack 41 is meshed with one side of the gear 20. The rack 41 is vertically slidably connected to the outer wall of the collection box 12. A vertical rod 42 is connected to the bottom of the rack 41. A ball bearing is installed at the bottom of the vertical rod 42. A step is provided on the inclined surface of the inclined block 19. A filter screen 13 is provided on the side of the collection box 12 away from the baffle 18. As the collection box 12 rotates along the shaft 4, the water flow pushes the baffle 18, causing the baffle 18 to open into the collection box 12. The water flows through the inside of the collection box 12, and the filter screen 13 inside the collection box 12 blocks crystals or impurities, causing crystals or impurities to accumulate inside the collection box 12. The inclined block 19 also scrapes away the crystals or impurities at the bottom of the chemical polishing tank 1, and the scraped impurities or crystals enter the inside of the collection box 12 under the push of the water flow. When the collection box 12 is no longer in contact with the bottom of the chemical polishing tank 1, during the process of the inclined block 19 resetting, the steps on the inclined block 19 can prevent impurities or crystals from falling.

[0041] As a technical optimization of the present invention, an air pump 10 is fixedly connected to the support plate 7, and an air pipe 11 is connected to one end of the air pump 10. A ventilation block 21 is fixedly connected to the bottom of the frame 8. The ventilation block 21 has multiple air holes, and the air pipe 11 is connected to the ventilation block 21. During the movement of the slider 28, the air pump 10 also starts to work. Gas enters the ventilation block 21 through the air pipe 11, and then enters the chemical polishing tank 1 through the air holes on the ventilation block 21. When needed, catalytic gas or hot air can be introduced into the chemical polishing tank 1 to accelerate the reaction speed. After the gas escapes from the air holes on the ventilation block 21, it moves upward. During the upward movement of the air along the mounting box 30, the air bubbles will impact the solid agent, making the solid agent disperse faster and further increasing the reaction speed.

[0042] In use, first, according to the amount of medicine to be added, remove the corresponding number of installation boxes 30, open the rotating plate 35 on one side, and place the medicine on the partition plate 31 or filter plate of each layer. Then close the rotating plate 35. The air bag 36 on the rotating plate 35 can help seal and prevent solid medicine from leaking out, while also preventing the medicine odor from escaping and causing adverse effects on the health of the staff. Then put the installation box 30 filled with medicine back into the through groove 9. The stop block 34 slides along the horizontal groove 14. When the stop block 34 slides into the vertical groove 15, under the action of the first spring 17, the abutment plate 16 pushes the stop block 34 downward, so that the stop block 34 slides to the bottom of the vertical groove 15. The abutment plate 16 presses the stop block 34 downward from the top of the stop block 34 to prevent the stop block 34 from moving upward, thereby preventing the installation box 30 from falling out of the through groove 9.

[0043] The device is placed in the chemical polishing tank 1 to be treated. The motor 3 is started, and the motor 3 drives the rotating shaft 4 to rotate. The rotating shaft 4 drives the fixed block 5 and the frame 8 to rotate, stirring the liquid in the chemical polishing tank 1. There is a certain angle difference between the resistance plate 27 and the frame 8. As the frame 8 rotates along the rotating shaft 4, the resistance plate 27 is resisted by the chemical polishing wastewater and moves away from the rotating shaft 4. The resistance plate 27 drives the slider 28 to move along the slide groove 25. When the slider 28 moves above the mounting box 30, the magnetic block at the bottom of the slider 28 and the magnetic block at the top of the top block 32 repel each other, causing the top block 32 to slide downward, thereby causing the first card to... Plate 33 disengages from the second locking plate 37 on the rotating plate 35. Under the action of the first torsion spring, the rotating plate 35 opens outward. At this time, water flows through the interior of the mounting box 30, thereby dispersing the solid agent inside the mounting box 30. The slider 28 continues to move, gradually opening all the rotating plates 35 from near the center of the chemical polishing tank 1 to near the edge of the chemical polishing tank 1, so that all the agents can fully contact the chemical polishing wastewater. The agents are also placed separately in the mounting box 30. After the rotating plate 35 is opened, the agents can quickly and fully contact the chemical polishing wastewater. Compared with directly sprinkling the agents into the chemical polishing tank 1, the reaction time can be shortened and the efficiency increased.

[0044] When the rotating plate 35 is closed, when the second plate 37 contacts the first plate 33, the moving block 38 slides along the moving groove 39. After the second plate 37 locks the first plate 33, under the action of the second spring 40, the first plate 33 and the second plate 37 are locked together and will not fall off.

[0045] As the slider 28 moves, the air pump 10 also starts to work. Gas enters the ventilation block 21 through the air pipe 11, and then enters the chemical polishing tank 1 through the air holes on the ventilation block 21. When needed, catalytic gas or hot air can be introduced into the chemical polishing tank 1 to accelerate the reaction speed. After the gas escapes from the air holes on the ventilation block 21, it moves upward. As the air moves upward along the mounting box 30, the bubbles will impact the solid reagent, making the solid reagent disperse faster and further increasing the reaction speed.

[0046] When the frame 8 rotates, the scraper 22 at the end of the frame 8 away from the fixed block 5 comes into contact with the inner wall of the chemical polishing tank 1. The scraper 22 can scrape off the impurities or crystals generated on the inner wall of the chemical polishing tank 1, and the scraped crystals or impurities fall to the bottom of the chemical polishing tank 1.

[0047] The bottom of the collection box 12 can contact the bottom of the chemical polishing tank 1. When the bottom of the collection box 12 approaches the bottom, the rotating shaft 4 rotates, causing the collection box 12 to rotate. The bottom of the vertical rod 42 at the end of the collection box 12 contacts the bottom of the chemical polishing tank 1. The collection box 12 continues to move downward, and the vertical rod 42 pushes the rack 41 upward. The rack 41 drives the gear 20 to rotate. The gear 20 drives the inclined block 19 to rotate through the connecting rod, so that the inclined block 19 contacts the bottom of the chemical polishing tank 1. Impurities or crystals at the bottom of the chemical polishing tank 1 will enter the collection box 12 through the inclined block 19. When the collection box 12 rotates along the rotating shaft 4, the water flow will push the baffle 18, causing the baffle 18 to open into the collection box 12. The water flow passes through the inside of the collection box 12, and the filter screen 13 inside the collection box 12 will block the crystals or impurities, allowing the crystals or impurities to pass through. Impurities accumulate in the collection box 12. The inclined block 19 also scrapes away the crystals or impurities at the bottom of the chemical polishing tank 1. The scraped impurities or crystals are pushed into the collection box 12 by the water flow. When the collection box 12 is no longer in contact with the bottom of the chemical polishing tank 1, the inclined block 19 rotates and resets under the action of the second torsion spring. The inclined block 19 drives the gear 20 and rack 41 to reset through the connecting rod. The ball bearing installed at the bottom of the vertical rod 42 can reduce the friction between the bottom of the vertical rod 42 and the bottom of the chemical polishing tank 1. During the reset process of the inclined block 19, the steps on the inclined block 19 can prevent impurities or crystals from falling. After the water flow stops pushing the baffle 18, the baffle 18 resets and the bottom of the baffle 18 abuts against the inclined block 19, closing the collection box 12 and preventing crystals and impurities from leaking out of the collection box 12.

[0048] During the rotation of the frame 8, impurities or crystals in the chemical wastewater that do not settle to the bottom will be blocked by the filter plate on the mounting box 30. Then, the rotating plate 35 is closed, and the impurities can be stored in the mounting box 30. The mounting box 30 can be removed, and the impurities and crystals can be treated separately.

[0049] When the frame 8 is placed in the water, the second push rod 24 can extend, causing the mounting plate 23 and the frame 8 to move away from the center of the chemical polishing tank 1, so that the frame 8 and the scraper 22 can adapt to chemical polishing tanks 1 of different diameters; when the first push rod 6 extends, it can push the fixing block 5 and the frame 8 downward, so that the frame 8 can adapt to chemical polishing tanks 1 of different depths.

[0050] When a foreign object or workpiece falls into the chemical polishing tank 1, the third push rod 29 retracts, causing the pressure plate 26 to move downward. The pressure plate 26 pushes all the top blocks 32 downward, thereby opening all the rotating plates 35. The rotating plates 35 can catch the foreign object or workpiece. The first push rod 6 retracts, which can lift the foreign object or workpiece out of the liquid surface, reducing the possibility of needing to retrieve it. The airbags 36 on the rotating plates 35 can protect the foreign object or workpiece and reduce the possibility of scratches.

[0051] The first push rod 6, the second push rod 24, and the third push rod 29 are all electric push rods.

[0052] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A reagent feeding device for a chemical polishing wastewater purification system, comprising a fixed plate (2) located above a chemical polishing tank (1), characterized in that, The fixed plate (2) is fixedly installed with a motor (3), the output end of the bottom of the motor (3) is fixedly connected with a rotating shaft (4), the outer side of the middle of the rotating shaft (4) is fixedly connected with a fixed block (5), the bottom of the rotating shaft (4) is fixedly connected with a collecting box (12), two side frames (8) are connected on the both sides of the fixed block (5), a plurality of through grooves (9) are formed in the side frame (8), a mounting box (30) is detachably installed in the through groove (9), a plurality of partition plates (31) and filter plates are installed on the mounting box (30), a scraping piece (22) is installed on the end of the side frame (8) away from the rotating shaft (4), a rotating plate (35) is rotatably installed on the both sides of the mounting box (30), the bottom of the rotating plate (35) is rotatably connected with the mounting box (30) through a pin shaft, a first torsion spring is arranged outside the pin shaft, a top block (32) is vertically and slidably connected to the top of the mounting box (30), a sliding groove (25) is horizontally formed in the top of the side frame (8), a sliding block (28) is slidably installed in the sliding groove (25), a resistance plate (27) is fixedly connected to the top of the sliding block (28), a magnetic block is fixedly installed at the bottom of the sliding block (28), a magnetic block is also fixedly installed at the top of the top block (32), the magnetic block at the bottom of the sliding block (28) repels the magnetic block at the top of the top block (32), a pressing plate (26) is arranged on one side of the side frame (8), the pressing plate (26) is located above the top block (32), third push rods (29) are arranged at the both ends of the pressing plate (26), the third push rods (29) are fixedly connected with the pressing plate (26) at the top and with the side frame (8) at the bottom through a connecting plate, the pressing plate (26) can contact the top of the top block (32), a first clamping plate (33) is fixedly connected to the bottom of the top block (32), a second clamping plate (37) is correspondingly installed at the end of the rotating plate (35), the second clamping plate (37) can be clamped on the first clamping plate (33), an air bag (36) is installed on the rotating plate (35).

2. The reagent feeding device for a chemical polishing wastewater purification system according to claim 1, wherein The rotating shaft (4) is also fixedly installed with a supporting plate (7), the supporting plate (7) is located above the fixed block (5), a first push rod (6) is arranged above the fixed block (5), the first push rod (6) is fixedly connected with the supporting plate (7) at the top and with the fixed block (5) at the bottom.

3. The reagent feeding device for a chemical polishing wastewater purification system according to claim 2, wherein The both sides of the fixed block (5) are respectively fixedly connected with mounting plates (23), one side of the mounting plate (23) close to the fixed block (5) is provided with a second push rod (24), one end of the second push rod (24) is fixedly connected with the fixed block (5), and the other end is fixedly connected with the mounting plate (23), and the side of the mounting plate (23) away from the fixed block (5) is fixedly connected with the side frame (8).

4. The reagent feeding device for a chemical polishing wastewater purification system according to claim 1, wherein The rotating plate (35) is provided with a moving groove (39), a moving block (38) is slidably installed in the moving groove (39), a second spring (40) is arranged on one side of the moving block (38), one end of the second spring (40) is connected with the moving block (38), and the other end is connected with the inner wall of the moving groove (39).

5. The reagent dispensing device for a chemical polishing wastewater purification system according to claim 1, wherein The inner wall of both sides of the through groove (9) is provided with a horizontal groove (14), the bottom of the horizontal groove (14) is provided with a vertical groove (15), the both sides of the mounting box (30) are fixedly provided with a stop block (34), the stop block (34) can be clamped in the vertical groove (15), the top inner wall of the horizontal groove (14) is rotatably provided with an abutting plate (16), one end of the abutting plate (16) is rotatably connected with the inner wall of the horizontal groove (14), the other end is provided with a first spring (17), one end of the first spring (17) is connected with the inner wall of the horizontal groove (14), the other end is connected with the abutting plate (16), and the end of the abutting plate (16) connected with the spring is in abutment with the top of the stop block (34).

6. The reagent dispensing device for a chemical polishing wastewater purification system according to claim 1, wherein The collecting box (12) is provided with a baffle (18) on one side, the top of the baffle (18) is rotatably connected with the collecting box (12), the bottom of the collecting box (12) is rotatably connected with an inclined block (19) through a connecting rod, the both ends of the connecting rod are fixedly connected with a gear (20), the gear (20) is meshingly connected with a rack (41) on one side, the rack (41) is vertically and slidably connected with the outer wall of the collecting box (12), the bottom of the rack (41) is connected with a vertical rod (42), the bottom of the vertical rod (42) is provided with a ball, the inclined surface of the inclined block (19) is provided with a step, and the side, away from the baffle (18), of the collecting box (12) is provided with a filter screen (13).

7. The reagent dispensing device for use in a chemical polishing wastewater purification system according to claim 2, wherein The supporting plate (7) is fixedly connected with an air pump (10), one end of the air pump (10) is connected with an air pipe (11), the bottom of the frame (8) is fixedly connected with a ventilation block (21), a plurality of air holes are formed in the ventilation block (21), and the air pipe (11) is communicated with the ventilation block (21).

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