An active fluid jet polishing pin

Abstract

The application provides an active jet polishing pin, which comprises a polishing assembly, the polishing assembly comprises a polishing part, one end of the polishing part is provided with a polishing surface, and the polishing surface is used for sticking polishing material; the polishing assembly further comprises a pressure dispersion part, the pressure dispersion part comprises a plurality of pressure dispersion members which are distributed in an array on the outer wall of the polishing part in a circumferential direction; and the polishing assembly further comprises a driving assembly, the driving assembly is arranged on the side of the polishing part which is away from the polishing surface and is used for driving the polishing assembly to rotate; in the scheme, the pressure dispersion members are distributed in an array on the outer wall of the polishing part, so that the pressure is uniformly distributed, and the problem of uneven polishing caused by uneven pressure is avoided.

Description

TECHNICAL FIELD

[0001] The application relates to the technical field of optical processing, and in particular to an active jet polishing pin. BACKGROUND

[0002] In order to meet the requirements of miniaturization and light weight of optical systems, some optical systems are designed in a structure-function integrated manner, and an optical surface is located on a structure side wall. Due to the limitation of spatial position and other factors, turning or milling tool marks will inevitably appear on the optical surface, which seriously affects the performance of the optical system. In order to remove the turning or milling tool marks on the optical surface of the workpiece, the workpiece needs to be polished.

[0003] The prior art discloses an improved method of a polishing pin, with the application number CN202110654276.1, which can perform conformal polishing on the side wall of a workpiece, but the polishing pin is prone to uneven stress when processing the workpiece due to gravity or other stress, which leads to uneven removal of the material on the surface of the workpiece. SUMMARY

[0004] In view of the above defects or deficiencies in the prior art, the application aims to provide an active jet polishing pin, which comprises:

[0005] A polishing assembly, the polishing assembly comprising:

[0006] A polishing portion, one end of the polishing portion having a polishing surface, the polishing surface being used for pasting polishing material;

[0007] A pressure dispersion portion, the pressure dispersion portion comprising a plurality of pressure dispersion members distributed in an array circumferentially on the outer wall of the polishing portion;

[0008] A driving assembly, the driving assembly being arranged on the side of the polishing portion away from the polishing surface, and being used for driving the polishing assembly to rotate.

[0009] According to the technical scheme provided by the embodiment of the application, the clamping assembly is used for clamping the polishing assembly, and the driving assembly is arranged on the side of the clamping assembly away from the polishing surface, and is used for driving the clamping assembly to rotate the polishing portion.

[0010] According to the technical scheme provided by the embodiment of the application, the polishing portion comprises a polishing head and an eccentric shaft distributed and arranged along a first direction, and the pressure dispersion members are distributed in an array circumferentially on the outer wall of the eccentric shaft; and the polishing surface is arranged on the side of the polishing head away from the eccentric shaft.

[0011] According to the technical scheme provided in the embodiment of the application, the clamping assembly comprises a first part and a second part arranged along a first direction, the first part has a first channel and a plurality of second channels communicated with the first channel, the first channel and the second channels extend along the first direction, the eccentric shaft is embedded in the first channel, and each pressure dispersion member is embedded in the second channel; and the polishing head is exposed outside the clamping assembly.

[0012] According to the technical scheme provided in the embodiment of the application, the second part has a third channel arranged therein, the third channel is communicated with the first channel and the second channel, and the third channel is used for containing polishing liquid.

[0013] According to the technical scheme provided in the embodiment of the application, the first channel and the third channel are arranged eccentrically.

[0014] According to the technical scheme provided in the embodiment of the application, the pressure dispersion member has a first gap with the inner wall of the second channel, the eccentric shaft has a second gap with the inner wall of the first channel, and the polishing liquid in the second channel can flow out through the first gap and the second gap.

[0015] According to the technical scheme provided in the embodiment of the application, the inner diameter of the third channel is greater than the inner diameter of the first channel.

[0016] According to the technical scheme provided in the embodiment of the application, the pressure dispersion member is a curved surface away from the eccentric shaft.

[0017] According to the technical scheme provided in the embodiment of the application, the polishing head is a semispherical shape.

[0018] In summary, the application provides an active jet polishing pin, which comprises a polishing part for adhering polishing material, a plurality of pressure dispersion members arranged in an array on the outer wall of the polishing part, and a driving assembly for driving the polishing part to rotate; during use, the polishing material is adhered to the polishing surface, the driving assembly drives the polishing assembly to rotate, the polishing part polishes the workpiece by using the polishing material, and the plurality of pressure dispersion members disperse the pressure applied by the polishing part to the surface of the workpiece; in the present scheme, the pressure dispersion members are arranged in an array on the outer wall of the polishing part, so that the pressure is uniformly distributed, and the problem of uneven polishing caused by uneven pressure is avoided. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 FIG. 1 is a structural schematic diagram of an active jet polishing pin according to an embodiment of the application;

[0020] Figure 2 FIG. 2 is a structural schematic diagram of a polishing assembly according to an embodiment of the application;

[0021] Figure 3A front view of the polishing assembly provided by the embodiment of the present application;

[0022] Figure 4 A structural schematic view of the clamping assembly provided by the embodiment of the present application;

[0023] Figure 5 A sectional schematic view of the clamping assembly provided by the embodiment of the present application.

[0024] The text annotations in the figure represent:

[0025] 1. Polishing assembly; 11. Polishing part; 111. Polishing head; 112. Eccentric shaft; 12. Pressure dispersion part; 121. Pressure dispersion member; 2. Clamping assembly; 21. First part; 22. Second part; 3. First channel; 4. Second channel; 5. Third channel. DETAILED DESCRIPTION

[0026] The present application will be further described in detail below with reference to the accompanying drawings and embodiments. It can be understood that the specific embodiments described herein are only used to explain the related application, and not to limit the application. In addition, it should be noted that only the parts related to the application are shown in the drawings for ease of description.

[0027] It should be noted that the embodiments in the present application and the features in the embodiments can be combined with each other without conflict. The present application will be described in detail below with reference to the accompanying drawings and embodiments.

[0028] As mentioned in the background, in order to solve the problems in the prior art, the present application provides an active jet polishing pin, which comprises:

[0029] The polishing assembly 1 comprises:

[0030] The polishing part 11 has a polishing surface at one end, and the polishing surface is used for pasting polishing material;

[0031] The pressure dispersion part 12 comprises a plurality of pressure dispersion members 121 which are distributed in an array around the outer wall of the polishing part 11;

[0032] The driving assembly is arranged on the side of the polishing part 11 away from the polishing surface, and is used for driving the polishing assembly 1 to rotate.

[0033] In some specific scenarios, please refer to Figure 1 、 Figure 2 and Figure 4The polishing assembly 1 is made of silica gel or rubber material, the number of the pressure dispersion members 121 can be three or more, and the pressure distribution is optimal when three pressure dispersion members 121 are used; wherein the polishing part 11 comprises polishing heads 111 distributed along a first direction and a rotating shaft connected with the driving assembly, the polishing surface is arranged at the polishing heads 111, and the pressure dispersion parts 12 are arranged in an array and distributed circumferentially on the outer wall of the rotating shaft; the rotating shaft, i.e., the polishing part 11, has a rotating axis, the extension direction of the rotating axis is the first direction, the driving assembly drives the polishing part 11 to rotate around the rotating axis, and the first direction is parallel to the extension direction of the rotating shaft.

[0034] In summary, the polishing material is bonded to the polishing part 11, the driving assembly drives the polishing assembly 1 to rotate, the polishing part 11 polishes the workpiece by using the polishing material, and the three pressure dispersion members 121 disperse the pressure applied by the polishing part 11 on the surface of the workpiece; in this scheme, the pressure dispersion members are arranged in an array on the outer wall of the polishing part, so that the pressure is uniformly distributed, and the problem of uneven polishing caused by uneven pressure is avoided.

[0035] In a preferred embodiment, the clamping assembly 2 is used to clamp the polishing assembly 1, and the driving assembly is arranged on the side of the clamping assembly 2 away from the polishing surface, for driving the clamping assembly 2 to rotate the polishing part 11;

[0036] In some specific scenarios, please refer to the clamping assembly 2 as shown in Figure 1 and Figure 4 The clamping assembly 2 is made of metal material, and the polishing material is reasonably selected according to the material of the workpiece to be polished.

[0037] In a preferred embodiment, the polishing part 11 comprises polishing heads 111 and eccentric shafts 112 arranged along a first direction, and the pressure dispersion members 121 are arranged in an array and distributed circumferentially on the outer wall of the eccentric shafts 112; the polishing surface is arranged on the side of the polishing heads 111 away from the eccentric shafts 112;

[0038] In some specific scenarios, please refer to the polishing part 11 as shown in Figure 3 The eccentric shaft 112 is a cylindrical structure; wherein the first direction is the vertical direction.

[0039] In a preferred embodiment, the clamping assembly 2 comprises a first part 21 and a second part 22 arranged along a first direction, the first part 21 has a first channel 3 and a plurality of second channels 4 communicated with the first channel 3, the first channel 3 and the second channels 4 extend along the first direction, the eccentric shaft 112 is embedded in the first channel 3, and each pressure dispersing member 121 is embedded in the second channel 4; the polishing head 111 is exposed outside the clamping assembly 2.

[0040] In some specific scenarios, please refer to the clamping assembly 2 shown in Figure 4 and Figure 5 The number of the second channels 4 is three corresponding to the number of the pressure dispersing members 121.

[0041] In a preferred embodiment, the second part 22 is provided with a third channel 5 communicated with the first channel 3 and the second channels 4, and the third channel 5 is used for containing polishing liquid.

[0042] In a preferred embodiment, the first channel 3 and the third channel 5 are arranged eccentrically.

[0043] In some specific scenarios, the second part 22 has a first axis, the eccentric shaft 112 has a second axis, the first axis is different from the second axis, the clamping assembly 2 rotates along the first axis under the action of the driving assembly, and the eccentric shaft 112 rotates along the second axis. The first axis and the second axis extend along the vertical direction; during the working process of the polishing pin, the driving assembly drives the clamping assembly 2 to rotate, and the polishing assembly 1 rotates synchronously under the driving of the clamping assembly 2, at this time, the second part 22 rotates along the first axis, and the polishing assembly 1 rotates along the first axis due to the eccentric arrangement, and the rotation track is offset, at this time, the rotation radius of the polishing assembly 1 on the surface of the workpiece is increased, and the polishing range is increased. Since the rotation radius is increased, according to the linear velocity formula, the rotation linear velocity of the polishing assembly 1 is also increased, and the polishing efficiency of the polishing assembly 1 is improved.

[0044] In a preferred embodiment, the pressure dispersing member 121 has a first gap with the inner wall of the second channel 4, and the eccentric shaft 112 has a second gap with the inner wall of the first channel 3, and the polishing liquid in the second channel 4 can flow out through the first gap and the second gap.

[0045] In some specific scenarios, the polishing liquid flows out of the first gap and the second gap, acts on the workpiece surface, provides reaction conditions for the polishing head 111 to polish the workpiece, and promotes the removal of the workpiece surface material; the first gap and the second gap are 0.1mm-0.2mm in size; please refer to the clamping assembly 2 as shown in Figure 5 The polishing liquid is placed in the third channel 5, and due to the small size of the first gap and the second gap, the flow rate of the polishing liquid is not too fast, so the polishing liquid remains in the third channel 5. The gravity of the remaining polishing liquid acts as a pressure applied to the polishing part 11, enhancing the polishing effect.

[0046] In a preferred embodiment, the inner diameter of the third channel 5 is larger than the inner diameter of the first channel 3;

[0047] In some specific scenarios, please refer to the third channel 5 as shown in Figure 5 The third channel 5 has an inner diameter larger than that of the first channel 3, which not only increases the capacity of the polishing liquid and avoids repeated addition, but also increases the maximum value of the force that can be applied to the polishing assembly 1.

[0048] In a preferred embodiment, the pressure dispersion member 121 is curved away from the eccentric shaft 112;

[0049] In some specific scenarios, please refer to the pressure dispersion member 121 as shown in Figure 2 The pressure dispersion member 121 is integrally formed with the polishing part 11, and the curved surface structure is convenient for operators to process.

[0050] In a preferred embodiment, the polishing head 111 is semispherical;

[0051] In some specific scenarios, the polishing head 111 is a hemisphere, and the hemisphere cross-section covers the top surface of the cylinder. The polishing material is adhered to the semispherical arc surface to polish the workpiece surface.

[0052] Specific examples are used in this paper to describe the principles and implementation methods of the application. The above examples are only used to help understand the method and its core idea. The above description is only a preferred embodiment of the application. It should be noted that due to the limited nature of the language, there are infinitely many specific structures. For ordinary technical personnel in this technical field, without departing from the principles of the application, some improvements, refinements or changes can be made, or the above technical features can be combined in an appropriate manner; these improvements, refinements, changes or combinations, or the application of the inventive concept and technical solution to other occasions without improvement, shall be regarded as the protection scope of the application.

Claims

1. An active fluid jet polishing pin, characterized by, The polishing assembly (1) comprises: a polishing part (11) having a polishing surface at one end for sticking polishing material; a pressure dispersion part (12) comprising a plurality of pressure dispersion members (121) distributed in an array on the outer wall of the polishing part (11); a driving assembly arranged on the side of the polishing part (11) away from the polishing surface for driving the polishing assembly (1) to rotate; a clamping assembly (2) for clamping the polishing assembly (1); the polishing part (11) comprises a polishing head (111) and an eccentric shaft (112) arranged in a first direction, and the pressure dispersion members (121) are distributed in an array on the outer wall of the eccentric shaft (112); the polishing surface is arranged on the side of the polishing head (111) away from the eccentric shaft (112); the clamping assembly (2) comprises a first part (21) and a second part (22) arranged in the first direction, the first part (21) has a first channel (3) and a plurality of second channels (4) communicating with the first channel (3) in the middle, the extension directions of the first channel (3) and the second channel (4) are the first direction, the eccentric shaft (112) is embedded in the first channel (3), and each pressure dispersion member (121) is embedded in the second channel (4); the polishing head (111) is exposed outside the clamping assembly (2).

2. The active fluid jet polishing pin of claim 1, wherein: the second part (22) has a third channel (5) in the middle, the third channel (5) communicates with the first channel (3) and the second channel (4), and the third channel (5) is used for containing polishing liquid.

3. The active fluid jet polishing pin of claim 2, wherein: the first channel (3) and the third channel (5) are arranged eccentrically.

4. The active fluid jet polishing pin of claim 2, wherein: the pressure dispersion member (121) has a first gap with the inner wall of the second channel (4), the eccentric shaft (112) has a second gap with the inner wall of the first channel (3), and the polishing liquid in the second channel (4) can flow out through the first gap and the second gap.

5. The active fluid jet polishing pin of claim 2, wherein: the inner diameter of the third channel (5) is greater than that of the first channel (3).

6. The active fluid jet polishing pin of claim 1, wherein: the side of the pressure dispersion member (121) away from the eccentric shaft (112) is curved.

7. The active fluid jet polishing pin of claim 1, wherein: the polishing head (111) is semispherical.

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