A high-efficiency preparation system and method of a spiral micro-nano robot

Abstract

The present application relates to the technical field of micro-nano manufacturing, and more particularly to a high-efficiency preparation system and method of a spiral micro-nano robot. The high-efficiency preparation system of the spiral micro-nano robot comprises a light field generating device, a processing platform and a control device. In the present application, a rotating phase pattern is loaded on a light beam modulator to control femtosecond laser to generate a rotating linear light field, and the rotating linear light field is incident on a sample to be processed coated with photoresist. The rotating linear light field is controlled to be high-frequency exposed, and the sample to be processed is controlled to move at a constant speed along the incident direction of the rotating linear light field, so that the spiral micro-nano robot can be quickly processed. The present application replaces the original single-point scanning processing into area exposure processing, which greatly improves the processing efficiency. The present application solves the problem of low processing efficiency of the existing laser direct writing method.

Description

Technical Field

[0001] This invention relates to the field of micro-nano manufacturing technology, and more specifically, to a highly efficient fabrication system for a spiral micro-nano robot, and a method for using the system. Background Technology

[0002] Movable micro-nano robots, due to their small size and mobility, have great application prospects in various fields. The helical magnetically controlled micro-nano robot is one such example.

[0003] The invention of helical magnetically controlled micro / nanorobots was inspired by the movement of E. coli. In a rotating magnetic field, these helical robots can convert their rotational motion into translational motion, propelling them through liquids. They can achieve three-dimensional movement driven by low-intensity rotating magnetic fields (<10 mT). Combining the advantages of magnetic field actuation and helical propulsion, helical magnetically controlled micro / nanorobots are considered one of the most promising tools for biomedical applications, especially in vivo applications.

[0004] Currently, the fabrication methods for helical magnetically controlled micro-nano robots are divided into four categories: curling method, oblique angle incident deposition method, template-assisted method, and laser direct writing method.

[0005] The curling method is based on traditional thin film deposition and single crystal thin film growth techniques. By controlling deposition parameters, such as film thickness, width of the band structure, or orientation between the band structure and the crystalline structure, the curling degree of the band structure can be precisely adjusted.

[0006] The principle of angled incident deposition is as follows: First, spherical particles are densely arranged on a substrate. Using angled incident deposition, nanopillar structures can be grown on the particles. By continuously rotating the substrate, the columnar structure transforms into a helical shape. Finally, magnetic material is deposited onto one side of the nanohelical structure.

[0007] The principle of the template-assisted method is as follows: First, the vascular bundles are extracted from the plant. Then, a falcon / iron bilayer nanofilm is deposited on the surface of the structure. Finally, the deposited micron-sized structure is cut into short helical micro-nano robots.

[0008] The above three methods require complex processes and equipment, and have poor flexibility.

[0009] Laser direct writing is a type of 3D laser printing technology that can be used to fabricate 3D microstructures of arbitrary shapes. First, photosensitive resin is laid flat on a glass substrate, which is then moved in 3D under the control of a piezoelectric ceramic stage. As the focus of the laser beam moves along a spiral path, a spiral structure is formed within the photosensitive resin. Unpolymerized photosensitive resin is then washed away, and the spiral microstructure is formed. Finally, an electron beam evaporation method is used to deposit a layer of magnetic material on the entire surface of the spiral structure to complete the fabrication.

[0010] While laser direct writing offers good flexibility, this method relies on point-by-point processing through the laser focus to fabricate helical micro-nano robots, resulting in low processing efficiency and failing to meet the needs of large-scale processing. Summary of the Invention

[0011] Therefore, it is necessary to provide an efficient fabrication system and method for spiral micro / nano robots to address the problem of low processing efficiency in existing laser direct writing methods.

[0012] This invention is achieved using the following technical solution:

[0013] In a first aspect, the present invention discloses an efficient fabrication system for helical micro-nano robots, comprising: a light field generating device, a processing platform, and a control device.

[0014] The light field generator is used to generate a rotating linear light field. The light field generator includes: a femtosecond laser, an optical shutter, a pre-energy adjustment module, a pre-beam adjustment module, a beam modulator, a post-beam adjustment module, and a focuser. The femtosecond laser emits a femtosecond laser beam. The optical shutter controls the on / off state of the femtosecond laser to adjust the exposure frequency. The pre-energy adjustment module modulates the energy of the femtosecond laser to form a controlled laser. The pre-beam adjustment module controls the laser beam to increase its intensity, forming an incident beam. The beam modulator adjusts the beam according to the rotating phase... Figure 1 or phase Figure 2 Modulate the incident beam into a cylindrical wave beam; phase Figure 1 A hologram with the phase of a cylindrical lens loaded; phase Figure 2 This is a hologram superimposed with the phase of the cylindrical lens and the phase of the flash grating. The rear beam adjustment module is used to shrink the cylindrical wave beam and guide the shrunken cylindrical wave beam to the focuser. The focuser is used to focus the shrunken cylindrical wave beam, generating a rotating linear light field.

[0015] During processing, a light field generator produces a rotating linear light field, which is incident perpendicularly onto the sample coated with photoresist. The rotating linear light field is subjected to high-frequency exposure, and the sample moves at a constant speed along the incident direction of the rotating linear light field to photolithographically create the desired helical micro-nano robot.

[0016] The processing platform is used to carry the sample to be processed and can move the sample relative to the rotating linear light field.

[0017] The control device is used to control the operation of the light field generator and the processing platform.

[0018] This efficient fabrication system for spiral micro / nano robots realizes the methods or processes according to embodiments of this disclosure.

[0019] Secondly, this invention discloses an efficient fabrication method for helical micro / nano robots, applied to the efficient fabrication system for helical micro / nano robots disclosed in the first aspect, comprising the following steps:

[0020] Step 1: Generate a rotating linear light field using a light field generator, and control the energy and exposure frequency of the rotating linear light field to meet the required values;

[0021] Step 2: Mount the sample to be processed coated with photoresist onto the processing platform, and make the rotating linear light field perpendicularly incident on the sample coated with photoresist. The perpendicular incident position is set to O at this time.

[0022] Step 3: Control the lifting processing platform to move the sample to be processed at a constant speed along the incident direction of the rotating linear light field, and at the same time control the high-frequency exposure of the rotating linear light field to process the spiral micro-nano robot at point O.

[0023] The efficient fabrication method of this spiral micro / nano robot realizes the method or process according to the embodiments of this disclosure.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] 1. This invention utilizes a beam modulator to load a rotating phase map, controlling a femtosecond laser to generate a rotating linear light field. This rotating linear light field is then incident onto a sample coated with photoresist. By controlling the high-frequency exposure of the rotating linear light field and simultaneously moving the sample at a uniform speed along the incident direction of the rotating linear light field, spiral micro / nano robots can be fabricated rapidly. This invention replaces the processing that originally required single-point scanning with surface exposure processing, significantly improving processing efficiency.

[0026] 2. The present invention upgrades the processing method to dynamic holographic processing. In this way, when processing a single position, it is only necessary to control the sample to be processed to move along the single direction of the incident direction of the rotating linear light field, avoiding additional movement in other directions, thereby increasing the stability of the processing.

[0027] 3. Furthermore, the present invention can also adjust the processing specifications of the spiral micro-nano robot by controlling the processing platform and the light field generating device to adapt to different processing needs. Attached Figure Description

[0028] Figure 1 This is a structural diagram of the efficient fabrication system for the spiral micro / nano robot in Embodiment 1 of the present invention;

[0029] Figure 2 This is a linear light field diagram;

[0030] Figure 3 For input Figure 1 Phase of the mid-beam modulator Figure 2 ;

[0031] Figure 4 for Figure 3 phase Figure 2 A diagram showing the various angles during rotation;

[0032] Figure 5 For use in Embodiment 2 of the present invention Figure 1 Image of the finished spiral micro / nano robot fabricated by a highly efficient preparation system;

[0033] Figure 6 For use in Embodiment 2 of the present invention Figure 1 Spiral micro / nano robots of varying heights were fabricated using a highly efficient fabrication system.

[0034] Figure 7 For use in Embodiment 2 of the present invention Figure 1 The efficient fabrication system produces helical micro-nano robots with different pitches.

[0035] The attached diagram lists the components represented by each number as follows:

[0036] 1. Femtosecond laser, 2. Optical shutter, 3. Gradient filter, 4. Mirror 1, 5. Beam expander, 6. Spatial light modulator, 7. Lens 1, 8. Mirror 2, 9. Mirror 3, 10. Optical power meter, 11. Lens 2, 12. Mirror 4, 13. Focusing lens, 14. Sample to be processed, 15. Processing platform. Detailed Implementation

[0037] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0038] It should be noted that when a component is said to be "installed on" another component, it can be directly on the other component or it may be in a component that is centered on it. When a component is said to be "set on" another component, it can be directly set on the other component or it may also be in a component that is centered on it. When a component is said to be "fixed to" another component, it can be directly fixed to the other component or it may also be in a component that is centered on it.

[0039] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention pertains. The terminology used herein in the specification of this invention is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. The term "or / and" as used herein includes any and all combinations of one or more of the associated listed items.

[0040] Example 1

[0041] Please see Figure 1 , Figure 1 The efficient fabrication system for the spiral micro / nano robot provided in this embodiment 1 includes: a light field generating device, a processing platform 15, and a control device.

[0042] First, let's look at the light field generator: The light field generator is used to generate a rotating linear light field. A non-rotating linear light field, such as... Figure 2 As shown, this is a long-focal-length light field with a high aspect ratio. The rotating linear light field rotates about its length as the axis of rotation.

[0043] The light field generating device includes: femtosecond laser 1, optical shutter 2, pre-energy adjustment module, pre-beam adjustment module, beam modulator, post-beam adjustment module, and focuser.

[0044] Femtosecond laser 1 is used to emit femtosecond laser light. Femtosecond lasers have the characteristics of being fast and having high resolution, making them particularly suitable for processing micro and nanostructures.

[0045] Optical shutter 2 is used to control the on / off state of the femtosecond laser to adjust the exposure frequency. Optical shutter 2 is located at the emission port of femtosecond laser 1. When it is closed, the optical path formed by the femtosecond laser is disconnected; when it is open, the optical path formed by the femtosecond laser is connected.

[0046] The pre-energy conditioning module is used to regulate the energy of the femtosecond laser, forming a regulated laser. See also... Figure 1 In this embodiment 1, the energy adjustment module can use a gradient filter 3 to directly adjust the energy of the femtosecond laser. Alternatively, the energy adjustment module can use a combination of a half-glass slide and a Glan Taylor prism. The half-glass slide is used to polarize the femtosecond laser; the Glan Taylor prism is used to control the polarization of the femtosecond laser, thereby adjusting its energy.

[0047] The pre-beam adjustment module is used to control the laser beam for amplification, forming the incident beam. The beam adjustment module employs a beam expander 5, which is used to adjust and control the diameter of the laser beam and match it with the beam modulator.

[0048] In addition, considering the direction of the optical path, a reflector 4 can be set between the front energy adjustment module and the front beam adjustment module to adjust and control the direction of the laser so that it forms an incident beam on the beam modulator.

[0049] Beam modulators are used to adjust the phase of rotation. Figure 1 or phase Figure 2 The incident beam is modulated into a cylindrical wave beam.

[0050] Among them, phase Figure 1 A hologram with the phase of a cylindrical lens applied. Phase. Figure 2 To create a hologram that superimposes the phase of the cylindrical lens and the phase of the grating, such as Figure 3 As shown.

[0051] It should be noted that if the phase input to the beam modulator Figure 1 or phase Figure 2 Since it does not rotate, the resulting linear light field is like... Figure 2 As shown, it also does not rotate; but as Figure 4 As shown, due to the input phase Figure 1 or phase Figure 2 When rotating, the resulting linear light field also rotates. Furthermore, the exposure frequency needs to be kept high, typically set to 1 / 30s exposure time for each hologram frame.

[0052] Since the cylindrical wave beam is used to generate a linear light field, its energy value needs to meet the requirements. Therefore, an optical power meter 10 can be set after the beam modulator to monitor the beam energy, and in turn, the laser can be adjusted and controlled to a suitable value through the energy adjustment module, so that the energy value of the cylindrical wave beam meets the requirements.

[0053] The rear beam adjustment module is used to reduce the cylindrical wave beam and guide the reduced cylindrical wave beam to the focuser. The rear beam adjustment module includes a lens pair and a mirror group. The lens pair is used to reduce the cylindrical wave beam. The mirror group is used to guide the reduced cylindrical wave beam to the focuser.

[0054] For details, please refer to Figure 1 The reflector group consists of three reflectors: reflector 2 (8), reflector 3 (9), and reflector 4 (12). Reflectors 2 (8), 3 (9), and 4 (12) work together to adjust the direction of the light path to be perpendicular to the processing platform 15.

[0055] The lens pair includes lens 7 and lens 11. Lens 7 is located near the beam modulator, and lens 11 is located near the focuser. Lens 7 and lens 11 are confocal. The beam modulator is located at the focal point of lens 7, and the focuser is located at the focal point of lens 11. In this way, the lens pair constitutes a 4F optical system, realizing the relay of cylindrical wave beams. The advantage of this is that the focuser can directly focus the cylindrical wave beam to produce a linear light field.

[0056] In addition, lens 7 and lens 11 are distributed between the reflector groups to reduce the beam when it passes through.

[0057] The focuser is used to focus the contracted cylindrical wave beam and control f=d to generate a rotating linear light field. In this embodiment 1, the focuser includes a focusing lens 13. The focusing lens 13 is used to focus the contracted cylindrical wave beam and generate a rotating linear light field in the focal region of the focusing lens 13. The focusing lens 13 can be a focusing lens or a focusing objective lens. Among them, the focusing lens has a weak focusing ability and produces a large focused spot, which is suitable for long-stroke detection; the focusing objective lens has a strong focusing ability and therefore produces a small focused spot, which is suitable for short-stroke, high-precision detection. After subsequent actual testing, the focusing lens 13 uses a 60x oil immersion lens, and the effect meets the requirements.

[0058] It should be noted that phase Figure 1 Phase Figure 2 The specific phase to be selected depends on the beam modulator and focuser used in subsequent steps.

[0059] (1) If the beam modulator is any one of a cylindrical lens optical element, a binary diffraction plate, or a liquid crystal phase plate, according to the phase... Figure 1 Modulation is performed. This is because this type of beam modulator does not produce a grating effect, therefore there is no need to introduce a flash grating phase, and it can be modulated based on the phase. Figure 1 Modulation is performed.

[0060] Specifically, when based on phase Figure 1 Modulation is performed; the beam modulator is of the transmission type. If the focusing direction of the cylindrical lens is parallel to the Y-axis, the phase of the cylindrical lens is... If the focusing direction of the cylindrical lens is parallel to the X-axis, the phase of the cylindrical lens is...

[0061] When based on phase Figure 1 Modulation is performed using a reflective beam modulator; if the focusing direction of the cylindrical lens is parallel to the Y-axis, the phase of the cylindrical lens is... If the focusing direction of the cylindrical lens is parallel to the X-axis, the phase of the cylindrical lens is...

[0062] Where j represents the imaginary part; k represents the wave number, k = 2π / λ; and λ represents the wavelength.

[0063] (2) If the beam modulator is a digital reflective micromirror or a spatial light modulator 6, based on the phase... Figure 2 Modulation is performed. This is because these types of beam modulators are subject to the grating effect, resulting in strong diffraction of the zeroth-order beam. Therefore, an additional flash grating phase is required, based on the phase... Figure 2 Modulation is performed.

[0064] Specifically, when based on phase Figure 2 Modulation is performed, the beam modulator is a transmissive type, and the focuser is located in the X direction of the beam modulator. If the focusing direction of the cylindrical lens is parallel to the Y-axis, the phase of the cylindrical lens is... The phase of the flash grating is If the focusing direction of the cylindrical lens is parallel to the X-axis, the phase of the cylindrical lens is... The phase of the flash grating is

[0065] When based on phase Figure 2 Modulation is performed using a transmissive beam modulator, with the focuser located in the Y-direction of the beam modulator; if the focusing direction of the cylindrical lens is parallel to the Y-axis, the phase of the cylindrical lens is... The phase of the flash grating is If the focusing direction of the cylindrical lens is parallel to the X-axis, the phase of the cylindrical lens is... The phase of the flash grating is

[0066] When based on phase Figure 2 Modulation is performed using a transmissive beam modulator, with the focuser located in the Y-direction of the beam modulator; if the focusing direction of the cylindrical lens is parallel to the Y-axis, the phase of the cylindrical lens is... The phase of the flash grating is If the focusing direction of the cylindrical lens is parallel to the X-axis, the phase of the cylindrical lens is... The phase of the flash grating is

[0067] When based on phase Figure 2 Modulation is performed using a reflective beam modulator, with the focuser located in the Y-direction of the beam modulator. If the focusing direction of the cylindrical lens is parallel to the Y-axis, the phase of the cylindrical lens is... The phase of the flash grating is If the focusing direction of the cylindrical lens is parallel to the X-axis, the phase of the cylindrical lens is... The phase of the flash grating is

[0068] Where j represents the imaginary part; k represents the wave number, k = 2π / λ; λ represents the wavelength; x represents the X-axis coordinate; y represents the Y-axis coordinate; and T represents the blaze period of the grating.

[0069] Since the cylindrical wave beam is used to generate a linear light field, its energy value needs to meet the requirements. Therefore, an optical power meter 10 can be set between the pre-energy adjustment module and the focuser to monitor the beam energy. In turn, the laser can be adjusted and controlled to a suitable value through the pre-energy adjustment module, so that the energy value of the cylindrical wave beam meets the requirements. Figure 1 This demonstrates the situation where the optical power meter 10 is placed inside the rear beam adjustment module.

[0070] Next, let's look at the processing platform 15: The processing platform 15 is used to carry the sample 14 to be processed and can move the sample 14 relative to the rotating linear light field.

[0071] It should be noted that the sample 14 to be processed is coated with a certain thickness of photoresist to achieve photolithography.

[0072] During processing, the light field generator generates a rotating linear light field, which is incident perpendicularly onto the sample 14 coated with photoresist. The rotating linear light field performs high-frequency exposure, and the sample 14 moves at a constant speed along the incident direction of the rotating linear light field to photolithographically etch the required spiral micro-nano robot.

[0073] Generally, the processing platform 15 adopts a three-dimensional motion platform, which can realize the adjustment in the X, Y, and Z directions in three-dimensional space. In this way, the sample 14 to be processed is fixed on the processing platform 15, and the position of the sample 14 to be processed can be adjusted as needed through the processing platform 15.

[0074] Continuing with the control unit: The control unit is used to control the operation of the light field generator and the processing platform 15. Specifically, the control unit is connected to the optical shutter 2 and is used to control the opening and closing of the optical shutter 2. The control unit is also connected to the beam modulator and is used to control the phase of the input rotation. Figure 1 or phase Figure 2 The control device is connected to the machining platform 15 and is used to control the movement of the machining platform 15.

[0075] Generally, control devices can be terminal control equipment such as industrial control computers, which are convenient for operators to operate.

[0076] Furthermore, considering the visualization of the processing, a monitoring device can be set up to monitor the processing status of the sample 14 in real time. The simplest way is to set up a CCD camera on the processing platform 15 to take real-time pictures of the sample 14. Of course, the CCD camera can also be connected to a control device for convenient real-time viewing on the control device side.

[0077] Based on the above-described efficient fabrication system for helical micro / nano robots, this embodiment 1 also discloses an efficient fabrication method for helical micro / nano robots, which is essentially a method of using the above-described fabrication system, including the following steps:

[0078] Step 1: Control the light field generator to generate a rotating linear light field, and control the energy and exposure frequency of the rotating linear light field to reach the required values;

[0079] Step 2: Mount the photoresist-coated sample 14 onto the processing platform 15, and make the rotating linear light field perpendicularly incident on the photoresist-coated sample 14. The perpendicular incident position is set to O at this time.

[0080] Step 3: Control the lifting processing platform 15 to move the sample 14 to be processed at a constant speed along the incident direction of the rotating linear light field, and at the same time control the high-frequency exposure of the rotating linear light field to process the spiral micro-nano robot at point O.

[0081] This completes the fabrication of a single helical micro-nano robot. If only a single helical micro-nano robot is needed, the fabrication system can be shut down at this point, the sample 14 to be processed can be removed, and any remaining photoresist can be cleaned off.

[0082] Of course, if you want to fabricate several spiral micro-nano robots, further operations are required:

[0083] Step 4: According to the processing requirements, move the sample 14 to be processed on a plane perpendicular to the linear light field, and adjust the rotating linear light field to be perpendicularly incident on the new position.

[0084] Step 5: Control the lifting processing platform 15 to move the sample 14 to be processed at a constant speed along the incident direction of the rotating linear light field, and at the same time control the high-frequency exposure of the rotating linear light field to process the spiral micro-nano robot at the new position.

[0085] Step six: Repeat steps four and five to fabricate several spiral micro-nano robots on the sample 14 to be processed.

[0086] In summary, this method is simple and does not involve complex processes. It can fabricate helical micro-nano robots on a large scale using only laser processing, making it a flexible, efficient, fast, and low-cost processing method.

[0087] Example 2

[0088] This embodiment 2 provides a specific example of the method in embodiment 1:

[0089] Before the experiment began, sample preparation was carried out: SU2080 photoresist was selected, and 10 μL was evenly dropped onto a glass slide. The slide was then placed in a heating oven and heated at 60°C for 3 hours to obtain sample 14 to be processed.

[0090] Next, the experiment began with photolithography:

[0091] The femtosecond laser 1 is turned on and forms an incident beam for the beam modulator. The phase is input to the beam modulator through the control device. Figure 2 A cylindrical wave beam is formed, which in turn generates a linear light field. The wavelength of the femtosecond laser is adjusted to 780nm, the energy value of the cylindrical wave beam is controlled to reach 60mW, and the exposure frequency is set to 1 / 30s for each frame of the hologram.

[0092] The sample 14 to be processed is fixed on the processing platform 15, and a rotating linear light field is incident perpendicularly onto the sample 14. The processing platform 15 is controlled to move along the direction of perpendicular incident of the rotating linear light field to process a single helical micro-nano robot.

[0093] Then, the control processing platform 15 carries the sample 14 to be processed to complete multiple position adjustments, change the incident position of the rotating linear light field, and process a new spiral micro-nano robot at the position after each adjustment.

[0094] Finally, the processed sample is removed from the processing platform 15 and immersed in n-propanol solution for 30 minutes to remove residual photoresist. After drying, the finished product is obtained.

[0095] The finished product of this embodiment 2 is as follows: Figure 5 As shown, Figure 5 (a) shows the morphology of a single helical micro-nano robot; Figure 5 (b) shows the morphology of the array-distributed helical micro-nano robots.

[0096] Furthermore, this embodiment 2 also verifies the fabrication of helical micro-nano robots of different specifications. That is, in the above-mentioned fabrication process, helical micro-nano robots of different specifications are fabricated by controlling system parameters:

[0097] See Figure 6 Eight different heights of spiral micro-nano robots were demonstrated. This is achieved by controlling the movement distance of the processing platform 15 along the vertical incident direction of the rotating linear light field: provided that the photoresist thickness is sufficient, the greater the movement distance of the processing platform 15 along the vertical incident direction of the rotating linear light field, the taller the spiral micro-nano robot will be.

[0098] See Figure 7 The exhibition showcases six helical micro-nano robots with different pitches, which can be achieved by controlling the movement speed of the processing platform 15 along the perpendicular incident direction of the rotating linear light field, or by controlling the rotation speed of the hologram.

[0099] Provided that the photoresist thickness is sufficient, the faster the processing platform 15 moves along the direction perpendicular to the incident direction of the rotating linear light field, the larger the pitch of the spiral micro-nano robot will be; or, the faster the hologram rotates, the smaller the pitch of the spiral micro-nano robot will be.

[0100] As can be seen from the above, the system of Example 1 can be used to process spiral micro-nano robots of different specifications, and has strong applicability.

[0101] The technical features of the above embodiments can be combined in any way. For the sake of brevity, not all possible combinations of the technical features in the above embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0102] The embodiments described above are merely illustrative of several implementations of the present invention, and while the descriptions are relatively specific and detailed, they should not be construed as limiting the scope of the invention patent. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the present invention, and these all fall within the protection scope of the present invention. Therefore, the protection scope of this invention patent should be determined by the appended claims.

Claims

1. A high-efficiency preparation system of a spiral micro-nanobot, characterized in that, The application relates to a method for processing a sample by using a rotating linear light field. The light field generating device comprises a femtosecond laser, a light shutter, a pre-energy adjusting module, a pre-beam adjusting module, a beam modulator, a post-beam adjusting module and a focuser; the femtosecond laser is used for emitting femtosecond laser; the light shutter is used for controlling the on-off of the femtosecond laser to adjust the exposure frequency; the pre-energy adjusting module is used for energy regulation of the femtosecond laser to form a regulated laser; the pre-beam adjusting module is used for beam multiplication of the regulated laser to form an incident light beam; the beam modulator is used for modulating the incident light beam into a cylindrical wave light beam according to a phase diagram one or a phase diagram two; the phase diagram one is a hologram loaded with a cylindrical lens phase; the phase diagram two is a hologram superimposed with a cylindrical lens phase and a flash grating phase; the post-beam adjusting module is used for beam shrinking of the cylindrical wave light beam and guiding the shrunk cylindrical wave light beam to the focuser; and the focuser is used for focusing the shrunk cylindrical wave light beam to generate a rotating linear light field. In the processing, the light field generating device generates a rotating linear light field and vertically irradiates the rotating linear light field to a sample coated with photoresist, the rotating linear light field performs high-frequency exposure, and the sample moves at a constant speed along the incident direction of the rotating linear light field, so that a required spiral micro-nano robot is photoetched. A processing platform is used for carrying the sample and moving the sample relative to the rotating linear light field. A control device is used for controlling the light field generating device and the processing platform. If the beam modulator is any one of a cylindrical lens optical element, a binary diffraction plate and a liquid crystal phase plate, the beam modulator is modulated according to the phase diagram one. Wherein, j represents an imaginary part; k represents a wave number, k=2pi / lambda; and lambda represents a wavelength.

2. The high-efficiency preparation system of the screw micro-nano robot according to claim 1, wherein, If the beam modulator is a digital reflection mirror or a spatial light modulator, the beam modulator is modulated according to the phase diagram two. When modulating according to the phase pattern one, the beam modulator is a transmissive type; if the focusing direction of the cylindrical lens is parallel to the Y axis, the phase of the cylindrical lens is If the focusing direction of the cylindrical lens is parallel to the X axis, the phase of the cylindrical lens is When modulating according to the phase pattern one, the beam modulator is reflective; if the focusing direction of the cylindrical lens is parallel to the Y axis, the phase of the cylindrical lens is If the focusing direction of the cylindrical lens is parallel to the X axis, the phase of the cylindrical lens is Wherein, j represents an imaginary part; k represents a wave number, k=2pi / lambda; lambda represents a wavelength; x represents an X-axis coordinate; y represents a Y-axis coordinate; and T represents a flashing period of the flash grating.

3. The high-efficiency preparation system of the screw micro-nano robot according to claim 1, wherein, The pre-energy adjusting module is a gradient filter used for directly adjusting the energy of the femtosecond laser. When modulating according to the phase pattern two, the beam modulator is transmissive, and the focuser is located in the X direction of the beam modulator, if the focusing direction of the cylindrical lens is parallel to the Y axis, the phase of the cylindrical lens is The phase of the flash grid is If the focusing direction of the cylindrical lens is parallel to the X axis, the phase of the cylindrical lens is The phase of the flash grid is When modulating according to the phase pattern two, the beam modulator is transmissive, the focuser is located in the Y direction of the beam modulator; if the focusing direction of the cylindrical lens is parallel to the Y axis, the phase of the cylindrical lens is The phase of the flash grid is If the focusing direction of the cylindrical lens is parallel to the X axis, the phase of the cylindrical lens is The phase of the flash grid is When modulating according to the phase pattern two, the beam modulator is reflective, and the focuser is located in the Y direction of the beam modulator, if the focusing direction of the cylindrical lens is parallel to the Y axis, the phase of the cylindrical lens is The phase of the flash grid is If the focusing direction of the cylindrical lens is parallel to the X axis, the phase of the cylindrical lens is The phase of the flash grid is Or, the pre-energy adjusting module comprises a half glass and a G-Lens; the half glass is used for polarizing the femtosecond laser; and the G-Lens is used for controlling the polarization of the femtosecond laser to adjust the energy of the femtosecond laser.

4. The high-efficiency preparation system of the screw micro-nano robot according to claim 1, wherein, The pre-beam adjusting module is an expander used for adjusting the diameter of the regulated laser and matching the beam modulator. The post-beam adjusting module comprises a lens pair and a mirror group. The lens pair is used for beam shrinking of the cylindrical wave light beam; the lens pair comprises a lens one and a lens two; the lens one is close to the beam modulator; the lens two is close to the focuser; the lens one and the lens two are confocal; the beam modulator is located on the focal point of the lens one; and the focuser is located on the focal point of the lens two.

5. The high-efficiency preparation system of the screw micro-nano robot according to claim 1, wherein The mirror group is used for guiding the shrunk cylindrical wave light beam to the focuser.

6. The high-efficiency preparation system of the screw micro-nano robot according to claim 1, wherein, The focuser comprises a focusing mirror. The focusing mirror is used for focusing the cylindrical wave light beam and generating the rotating linear light field in the focal point area of the focusing mirror. ​ 7. The high-efficiency preparation system of the screw micro-nano robot according to claim 1, wherein, ​ ​ 8.The high-efficiency preparation system of the screw micro-nano robot according to claim 1, wherein, The control device is connected with the light shutter and is used for controlling the opening and closing of the light shutter. The control device is connected with the light beam modulator and is used for controlling the phase pattern one or the phase pattern two of the input rotation; The control device is connected with the processing platform and is used for controlling the movement of the processing platform.

9. A method for efficiently preparing a spiral micro-nanorobot, characterized by, The high-efficiency preparation system of the helical micro-nano robot is applied to any one of claims 1-8. The high-efficiency preparation method of the helical micro-nano robot comprises the following steps: Step one, the light field generating device generates a rotating linear light field, and the energy and exposure frequency of the rotating linear light field are controlled to reach the required value; Step two, the sample to be processed coated with photoresist is installed on the processing platform, and the rotating linear light field is vertically incident on the sample to be processed coated with photoresist, and the vertical incident position is set as O; Step three, the lifting processing platform moves at a constant speed along the incident direction of the rotating linear light field with the sample to be processed, and at the same time, the rotating linear light field is controlled to be high-frequency exposed, and the helical micro-nano robot is processed at O.

10. The method according to claim 9, wherein the helical micro / nano robot is efficiently prepared by the method. The processing method further comprises: Step four, the sample to be processed is moved in the plane perpendicular to the rotating linear light field according to the processing requirement, and the vertical incident position of the rotating linear light field is adjusted to a new position; Step five, the lifting processing platform moves at a constant speed along the incident direction of the rotating linear light field with the sample to be processed, and at the same time, the rotating linear light field is controlled to be high-frequency exposed, and the helical micro-nano robot is processed at the new position; Step six, steps four and five are repeated to process several helical micro-nano robots on the sample to be processed.

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