Bionic film for regulating aerodynamic drag of aircraft, preparation method and application thereof

Abstract

The present invention provides a biomimetic film for regulating aerodynamic drag of an aircraft, and its preparation method and application, relating to the technical field of aerodynamic drag reduction film preparation. The method comprises ultrasonically cleaning a stainless steel sheet with anhydrous ethanol, then ultrasonically cleaning it in deionized water for 5 minutes, and drying it with nitrogen; pouring ZrO2 crystals into a copper crucible, adjusting the angle and the spin speed of the substrate, and setting the thickness and deposition rate of the deposited film; pre-melting the ZrO2 crystals, and setting the currents of the X-axis alternating current and the Y-axis direct current to preset currents in a control program; automatically stopping the electron beam instrument when the film thickness reaches the preset film thickness; removing the sample, and obtaining a three-dimensional ZrO2 nanofilm with a biomimetic microstructure. The present invention has the advantages of simple operation, rapid preparation, high repeatability, low cost, and the ability to effectively prepare nanostructures with excellent fluid dynamics properties, effectively changing surface flow characteristics, improving aircraft speed and efficiency, and regulating aerodynamic performance.

Description

Technical Field

[0001] The present invention relates to the technical field of preparation of aerodynamic drag reduction films, and in particular to a bionic film for regulating the aerodynamic drag of an aircraft, and a preparation method and application thereof. Background Art

[0002] High-speed aircraft are subject to air resistance during flight, with frictional resistance accounting for approximately 40% to 50% of the total drag. Reducing air resistance is crucial for increasing aircraft speed and range, as well as conserving energy. In the 1970s, the National Aeronautics and Space Administration (NASA) Langley Research Center discovered that surface microstructures can alter the turbulent flow structure between an aircraft's surface and the air interface, effectively reducing air resistance and overturning the conventional wisdom of drag reduction based on smooth surfaces. In biomimetics, surface microstructures are the product of millions of years of evolutionary adaptation to the environment. These structures not only enhance adaptability, but also enable sharks to swim at speeds exceeding 56 km / h. This rapidity is due not only to their perfectly streamlined bodies that minimize pressure differential drag, but also to the three-dimensional denticles on their surface. However, the complex structure of shark skin denticles makes them difficult to produce. Common methods for preparing shark skin-like films include 3D printing, bioreplication, and laser etching, but these methods are complex and expensive. Zirconia has high hardness, high strength, good wear resistance, and excellent high-temperature resistance, as well as excellent chemical stability and good biocompatibility. These properties have led to its widespread application in biomimetic microstructured flow control modules. Physical vapor deposition methods (magnetron sputtering, evaporation, and pulsed laser deposition) have the advantages of low cost, ease of scalability, and good reproducibility. However, due to the characteristics of physical vapor deposition, the dense films produced do not have biomimetic nanostructures and are insufficient to regulate the turbulent structure and flow field distribution on the aircraft surface. Summary of the Invention

[0003] The present invention aims to provide a biomimetic film for controlling aerodynamic drag of aircraft, as well as a preparation method and application thereof. The preparation method adopts electron beam evaporation and is mainly divided into five steps: substrate cleaning, substrate and material installation, vacuuming, and electron beam evaporation deposition of the film and sintering. ZrO2 is used as the material and a 20mm×20mm stainless steel sheet is used as the substrate. The copper crucible and the substrate are placed in a sealed environment. The rotation speed of the substrate and the angle between the substrate plane direction and the steam direction (grazing angle) are adjusted. The sealed environment is then vacuumed and the air pressure in the sealed environment is reduced to 9×10 -4 When the deposition film thickness, deposition rate, size and position of the electron beam spot are set in the automatic control program, and then the electron beam is evaporated and deposited, and after sampling, a bionic thin film nanomaterial with a complex nanostructure is obtained.

[0004] In order to achieve the above object, the technical solution adopted by the present invention is as follows:

[0005] In a first aspect, the present application provides a method for preparing a biomimetic film for regulating the aerodynamic drag of an aircraft, comprising the following steps:

[0006] Step S100: ultrasonically clean the stainless steel sheet with anhydrous ethanol for 10 minutes, then ultrasonically clean it in deionized water for 5 minutes, and blow dry it with nitrogen to complete the pretreatment of the substrate and obtain a clean stainless steel sheet;

[0007] Step S200: Open the chamber door of the electron beam instrument, pour the ZrO2 crystal into a copper crucible, take the stainless steel substrate cleaned in step S100 and fix it on a rotatable substrate table, adjust the angle between the vertical direction of the substrate and the direction of the steam and the rotation speed of the substrate, set the deposited film thickness and deposition rate, control the current of the X-axis AC and Y-axis DC, close the chamber door of the electron beam instrument to form a closed space, and vacuum the closed space;

[0008] Step S300: When the vacuum in the enclosed space drops to 9×10 -4 When the ZrO2 crystal begins to melt, the high voltage switch is turned on and the filament is preheated. The ZrO2 crystal is pre-melted. When the surface of the ZrO2 crystal begins to melt, the currents of the X-axis AC and Y-axis DC are set to preset currents in the control program, and the control program is set to run automatically.

[0009] Step S400: Click Deposit, and the control program deposits a thin film of ZrO2 crystals according to the real-time deposition rate. When the film thickness reaches the preset film thickness, the electron beam instrument automatically stops running, and the deposition ends.

[0010] Step S500: Open the electron beam instrument chamber door, take out the sample, obtain a ZrO2 three-dimensional nanofilm with a bionic microstructure, and draw vacuum again to complete the preparation.

[0011] Preferably, in step S100, the substrate includes ZrO2 as a material and a 20 mm×20 mm stainless steel sheet as a substrate.

[0012] Preferably, in step S200, ZrO2 material is poured into 2 / 3 of the volume of the copper crucible.

[0013] Preferably, in step S200, the angle between the direction perpendicular to the substrate and the steam direction is adjusted to 85°.

[0014] Preferably, in step S200, the substrate spin speed is 0-1 r / min, and the deposition film thickness is set to 500 nm and the deposition rate is set to 2 A / s in the automatic control program.

[0015] Preferably, in step S300, the spot size and position of the electron beam are controlled by the current magnitudes of the X-axis alternating current and the Y-axis direct current.

[0016] Preferably, in step S300, the current switch of the electron gun at the position where the copper crucible containing the ZrO2 crystal is located is turned on to preheat the filament for 5 minutes, and the spot size and position of the electron beam are controlled by adjusting the current of the X-axis alternating current and the Y-axis direct current to pre-melt the ZrO2 crystal in the copper crucible. When the surface of the ZrO2 crystal begins to melt, the electron cavity is evaporated and cleared.

[0017] Preferably, in step S400, the output of the copper crucible evaporation containing ZrO2 crystals in the control program is adjusted to X DC, X AC, Y DC and Y AC, where the current sizes are 99, 45, 152 and 45 respectively.

[0018] In a second aspect, the present application also provides a bionic film prepared according to the preparation method for regulating the aerodynamic drag of an aircraft.

[0019] In a third aspect, the present application also provides applications of a bionic film for regulating the aerodynamic drag of an aircraft, wherein the application is in a bionic device and an aircraft equipment.

[0020] The beneficial effects of the present invention are:

[0021] Compared with the existing technology, the present invention provides a method based on physical vapor deposition combined with grazing angle deposition technology with a simple preparation process. It can prepare a ZrO2 three-dimensional bionic nano-thin film material with a complex nano-structure on a stainless steel sheet. The material is resistant to high temperatures, can effectively delay the generation of turbulent transition points and change the flow field distribution on the surface of the aircraft, reduce air resistance, and improve the lift-to-drag ratio of the aircraft. It can achieve large-scale preparation and has important application value.

[0022] The present invention adopts the method of preparing nanostructures by electron beam evaporation, and prepares ZrO2 composite nanomaterials with biomimetic dimensional structures at a large grazing angle. It is simple to operate, fast to prepare, highly repeatable, and low in cost. It can effectively prepare nanostructures with good fluid mechanics properties, effectively change surface flow characteristics, improve aircraft speed and efficiency, and adjust aerodynamic performance.

[0023] The present invention prepares three-dimensional nanomaterials with bionic microstructures, which can effectively improve the aerodynamic performance of stainless steel surfaces, can produce composite materials with different morphologies, can withstand high-temperature environments, and can be widely used in the field of aircraft interface drag reduction. The sample morphologies prepared under different preparation conditions are quite different, but all have three-dimensional nanostructures. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] In order to more clearly illustrate the technical solutions of the embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and therefore should not be regarded as limiting the scope. For ordinary technicians in this field, other relevant drawings can be obtained based on these drawings without paying any creative work.

[0025] Figure 1 This is a schematic diagram of a scanning electron microscope at 50,000 times the surface magnification described in Example 1 of the present invention;

[0026] Figure 2 This is a schematic diagram of a scanning electron microscope at 50,000 times the surface magnification described in Example 1 of the present invention;

[0027] Figure 3 This is a schematic diagram of a scanning electron microscope at 50,000 times the surface magnification described in Example 2 of the present invention;

[0028] Figure 4 This is a schematic diagram of a scanning electron microscope of a 50,000-fold cross-section described in Example 2 of the present invention;

[0029] Figure 5 This is a schematic diagram of a scanning electron microscope of a 50,000-fold cross-section described in Example 3 of the present invention;

[0030] Figure 6 This is a schematic diagram of a scanning electron microscope of a 50,000-fold cross-section described in Example 3 of the present invention;

[0031] Figure 7 This is a schematic diagram of the X-ray diffraction pattern described in Example 1 of the present invention;

[0032] Figure 8 Schematic diagram of the steam and crucible described in Example 1 of the present invention;

[0033] Figure 9 Schematic diagram of the substrate table described in Example 1 of the present invention. DETAILED DESCRIPTION

[0034] To make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments of the present invention are described clearly and completely below. Where specific conditions are not specified in the embodiments, conventional conditions or conditions recommended by the manufacturer are used. Where the manufacturer of the reagents or instruments is not specified, all are conventional products that can be purchased commercially.

[0035] It should be noted that, in the absence of conflict, the embodiments and features in the embodiments of the present application can be combined with each other. The present invention will be described in detail below with reference to specific embodiments.

[0036] The electron beam evaporation method used in the present invention is mainly divided into five steps: substrate cleaning, substrate and material installation, vacuuming and electron beam evaporation deposition of thin films and sintering into phases. ZrO2 is used as the material and a 20mm×20mm stainless steel sheet is used as the substrate. Figure 9 , the inner bottom of the electron beam vacuum chamber has two evaporation sources for placing material crucibles on the left and right sides at the same height. Each side of the two evaporation sources is equipped with an electron gun, and a rotatable substrate table is placed above the perpendicular bisector of the line connecting the two sources; the material copper crucible and the substrate are placed in a closed environment, such as Figure 8 and Figure 9 As shown, the rotation speed of the substrate and the angle between the substrate plane direction and the steam direction (grazing angle) are adjusted; then the closed environment is vacuumed and the air pressure in the closed environment is reduced to 9×10 -4 When the deposition film thickness and deposition rate are set in the automatic control program to control the size and position of the electron beam spot, the electron beam is evaporated and deposited, and after sampling, a bionic thin film nanomaterial with a complex nanostructure is obtained.

[0037] The preparation process of the present invention comprises the following steps: placing a stainless steel sheet in an anhydrous ethanol solution and deionized water in sequence for ultrasonic cleaning, and then drying the surface moisture thereof with nitrogen to obtain a cleaned stainless steel sheet; then pouring a ZrO2 crystal material into a copper crucible until the volume of the crucible reaches 2 / 3, installing the copper crucible containing the ZrO2 crystal material at the position of the No. 1 crucible of the No. 2 source of an electron beam evaporation instrument, fixing the cleaned stainless steel substrate on a rotatable substrate table, adjusting the angle between the substrate plane direction and the steam direction to 85 degrees and the substrate rotation speed, setting the deposition film thickness and deposition rate, controlling and adjusting the currents of the X-axis alternating current and the Y-axis direct current, closing the electron beam instrument chamber door, and evacuating the chamber; when the vacuum degree of the chamber drops to 9×10 -4 2 source electron gun to preheat the filament for 5 minutes, turn on the high-voltage switch, set the control program to manual operation, adjust the current of the X-axis AC and Y-axis DC again, and slightly melt the ZrO2 crystal material in the copper crucible, clear the electron cavity evaporation, and when the ZrO2 crystal surface begins to melt, set the current of the X-axis AC and Y-axis DC to the preset current in the control program, and set the control program to automatic operation; click Deposit, and the control program deposits a thin film of ZrO2 crystal according to the real-time deposition rate. When the film thickness reaches the preset film thickness, the electron beam instrument automatically stops running and the deposition ends; open the electron beam instrument cavity door, take out the sample, and obtain a three-dimensional ZrO2 nanofilm with a bionic microstructure. Draw the vacuum again and the preparation is completed.

[0038] Example 1:

[0039] A stainless steel sheet with a size of 20 mm × 20 mm and a thickness of 2 mm was ultrasonically cleaned in anhydrous ethanol solution for 10 minutes each, then ultrasonically cleaned in deionized water for 5 minutes, and dried with nitrogen gas to serve as the sample substrate.

[0040] Pour 99.99% pure ZrO2 material into a copper crucible to fill 2 / 3 of the crucible volume, and install it in the No. 1 crucible position of the No. 2 source of the electron beam evaporation instrument. Then, fix a spare cleaned stainless steel substrate on a rotatable substrate table, adjust the angle between the vertical direction of the substrate and the direction of the vapor to 85°, and the substrate rotation speed to 1 r / min. Set the deposition film thickness to 500 nm and the deposition rate to 2 A / s in the automatic control program;

[0041] Close the electron beam instrument chamber door and evacuate the chamber. When the vacuum degree of the chamber drops to 9×10 -4 When the current switch of the No. 2 source electron gun is turned on to preheat the filament for 5 minutes, the high voltage switch is turned on, and the control program is set to manual operation. By adjusting the current of the X-axis AC and Y-axis DC, the electron beam spot size and position are controlled to pre-melt the material in the crucible. When the surface of the material is slightly melted and evaporated, the current of the X-axis AC and Y-axis DC of the No. 1 crucible of the No. 2 source is set to the preset current size in the control program, and the control program is set to automatic operation, such as Figure 7 and 8 ;

[0042] Click Deposit, and the control program will deposit the ZrO2 film according to the real-time deposition rate. When the film thickness reaches the set film thickness, the electron beam instrument will automatically stop running. After the deposition is completed, turn on the take-out switch, open the chamber door, and take out the sample to obtain a ZrO2 three-dimensional nanofilm with a bionic microstructure. Figure 1 and 2 In order to maintain the electron beam evaporation instrument, the vacuum needs to be drawn again.

[0043] Example 2:

[0044] A stainless steel sheet with a size of 20 mm × 20 mm and a thickness of 2 mm was ultrasonically cleaned in anhydrous ethanol solution for 10 minutes each, then ultrasonically cleaned in deionized water for 5 minutes, and dried with nitrogen gas to serve as the sample substrate.

[0045] Pour 99.99% pure ZrO2 material into a copper crucible to fill 2 / 3 of the crucible volume, and install it in the No. 1 crucible position of the No. 2 source of the electron beam evaporation instrument. Then, fix a spare cleaned stainless steel substrate on a rotatable substrate table, adjust the angle between the vertical direction of the substrate and the direction of the vapor to 85°, and the substrate rotation speed to 0 r / min. Set the deposition film thickness to 500 nm and the deposition rate to 2 A / s in the automatic control program;

[0046] Close the electron beam instrument chamber door and evacuate the chamber. When the vacuum degree of the chamber drops to 9×10 -4 When the current switch of the No. 2 source electron gun is turned on to preheat the filament for 5 minutes, the high-voltage switch is turned on, and the control program is set to manual operation. The electron beam spot size and position are controlled by adjusting the current of the X-axis AC and Y-axis DC to pre-melt the material in the crucible. After the surface of the material is slightly melted and evaporated, the current of the X-axis AC and Y-axis DC for the No. 1 crucible of the No. 2 source is set to the preset current size in the control program, and the control program is set to automatic operation;

[0047] Click Deposit, and the control program will deposit the ZrO2 film according to the real-time deposition rate. When the film thickness reaches the set film thickness, the electron beam instrument will automatically stop running. After the deposition is completed, turn on the take-out switch, open the chamber door, and take out the sample to obtain a ZrO2 three-dimensional nanofilm with a bionic microstructure. Figure 3 and 4 In order to maintain the electron beam evaporation instrument, the vacuum needs to be drawn again.

[0048] Example 3:

[0049] A stainless steel sheet with a size of 20 mm × 20 mm and a thickness of 2 mm was ultrasonically cleaned in anhydrous ethanol solution for 10 minutes each, then ultrasonically cleaned in deionized water for 5 minutes, and dried with nitrogen gas to serve as the sample substrate.

[0050] Pour 99.99% pure ZrO2 material into a copper crucible to fill 2 / 3 of the crucible volume, and install it in the No. 1 crucible position of the No. 2 source of the electron beam evaporation instrument. Then, fix a spare cleaned stainless steel substrate on a rotatable substrate table, adjust the angle between the vertical direction of the substrate and the direction of the vapor to 85°, and the substrate rotation speed to 0 r / min. Set the deposition film thickness to 500 nm and the deposition rate to 2 A / s in the automatic control program;

[0051] Close the electron beam instrument chamber door and evacuate the chamber. When the vacuum degree of the chamber drops to 9×10 -4 When the current switch of the No. 2 source electron gun is turned on to preheat the filament for 5 minutes, the high-voltage switch is turned on, and the control program is set to manual operation. The electron beam spot size and position are controlled by adjusting the current of the X-axis AC and Y-axis DC to pre-melt the material in the crucible. After the surface of the material is slightly melted and evaporated, the current of the X-axis AC and Y-axis DC for the No. 1 crucible of the No. 2 source is set to the preset current size in the control program, and the control program is set to automatic operation;

[0052] Click Deposition, and the control program deposits the ZrO2 film according to the real-time deposition rate. When the film thickness reaches the set film thickness of 250nm, the deposition is paused, the manual mode is switched, the No. 2 source shutter is closed, the substrate spin speed is set to 1r / min and rotates for 30s, then the substrate spin speed is set to 0r / min, the automatic mode is switched back to start deposition, and the machine automatically stops when the film thickness reaches the set film thickness of 500nm; after the deposition is completed, the take-out switch is turned on, the chamber door is opened, and the sample is taken out to obtain a ZrO2 three-dimensional nanofilm with a bionic microstructure, such as Figure 5 and 6 In order to maintain the electron beam evaporation instrument, the vacuum needs to be drawn again.

[0053] Scanning electron microscope test: It is a microscopic morphology observation method between transmission electron microscope and optical microscope, which can directly use the material properties of the sample surface material for microscopic imaging.

[0054] Electron beam evaporation: A type of vacuum evaporation coating method that uses an electron beam to directly heat the evaporation material under vacuum conditions, vaporizing the evaporation material and transporting it to the substrate, where it condenses to form a thin film. In the electron beam heating device, the heated material is placed in a water-cooled copper crucible to prevent the evaporation material from reacting with the copper crucible wall and affecting the quality of the film.

[0055] Physical vapor deposition technology: refers to the technology of using physical methods under vacuum conditions to vaporize the surface of materials, solids or liquids into gas atoms, molecules or partially ionize them into ions, and depositing a thin film with special functions on the surface of the substrate through a low-pressure gas (or plasma) process.

[0056] Glancing Angle Deposition (GLAD), also known as tilted angle deposition, is a patented thin film deposition process. Its primary principle is the shadowing effect of adsorbed atom diffusion and random nucleation on the substrate. This allows the production of thin films with controllable morphology.

[0057] X-ray diffraction spectrum: The spectrum recorded when a crystal diffracts X-rays at different angles (due to different incident angles).

[0058] The test results of the sample indicators obtained in the above embodiment are as follows:

[0059]

[0060] It can be seen from the data in the above table that when the angle between the vertical direction of the substrate and the steam direction is adjusted, the deposited film thickness and the deposition rate are the same, and different substrate rotation speeds are used, when the angle between the vertical direction of the substrate and the steam direction is 85°, when the substrate rotation speed is 0r / min, an inclined nanocolumn film similar to the shark skin microstructure can be obtained. When the substrate rotation speed is adjusted or the rotation speed is intermittently adjusted during the deposition process, the vertical nanocolumn film and the folded nanocolumn film obtained are quite different from the actual shark skin microstructure, which may be unfavorable for controlling the aerodynamic drag of the aircraft.

[0061]

[0062] The data in the table above show that, when the angle between the substrate vertical direction and the vapor direction is 85°, ZrO2 microstructured films with different morphologies can be obtained by adjusting the substrate spin. These different morphologies of ZrO2 microstructured films affect the film's ability to control the aerodynamic drag of an aircraft.

[0063] When the angle between the vertical direction of the substrate table and the steam direction is 85° and the substrate rotation speed is 1r / min, Figure 1 and Figure 2 As shown in Figure 2, a vertical nanocolumn microstructure film can be obtained. When the angle between the vertical direction of the substrate and the steam direction is 85° and the substrate rotation speed is 0 r / min, as shown in Figure 2, Figure 3 and Figure 4 As shown, a tilted nanocolumn microstructure film can be obtained and X-ray diffraction test is performed. The results are as follows Figure 7 As shown in Figure 49-1642, a ZrO2 crystal film that conforms to the standard PDF card can be observed. When the angle between the substrate vertical direction and the vapor direction is 85° and the substrate rotation speed is 0 r / min, during the deposition process, when the growth film thickness reaches 250nm, half of the set film thickness of 500nm, the substrate is rotated 180°, as shown in Figure 49-1642. Figure 5 and Figure 6 As shown, a folded nanocolumn microstructure film can be obtained. ZrO2 material itself has high hardness, high strength, good wear resistance and excellent high temperature resistance, which can adapt to the harsh working environment when the aircraft is flying at high speed. At the same time, the angle between the vertical direction of the substrate and the direction of the steam is 85°.

[0064] Under the condition that the substrate rotation speed is 0r / min, the ZrO2 inclined nanocolumn film with shark skin-like microstructure can adjust the air flow distribution on the surface of the aircraft, reduce the pressure difference drag, and improve the lift-to-drag ratio of the aircraft, and may have better aerodynamic drag capability.

[0065] In summary, the present invention provides a method for preparing a ZrO2 three-dimensional bionic nano-thin film material with a complex nano-structure on a stainless steel sheet based on physical vapor deposition combined with grazing angle deposition technology, which can effectively delay the generation of turbulent turning points and change the flow field distribution on the aircraft surface, reduce air resistance, improve the lift-to-drag ratio of the aircraft, and can achieve large-scale preparation; the present invention adopts a method for preparing nanostructures by electron beam evaporation, and prepares a ZrO2 composite nano-material with a bionic dimensional structure at a large grazing angle, which can effectively change the surface flow characteristics, improve the speed and efficiency of the aircraft, and adjust the aerodynamic performance; it effectively improves the aerodynamic performance of the stainless steel surface, can produce composite materials with different morphologies, can withstand high temperature environments, and can be widely used in the field of aircraft interface drag reduction.

[0066] The above are merely preferred embodiments of the present invention and are not intended to limit the present invention. Those skilled in the art will readily appreciate that various modifications and variations of the present invention are possible. Any modifications, equivalent substitutions, or improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the present invention.

Claims

1. A method for preparing a bionic film for regulating the aerodynamic drag of an aircraft, characterized in that: The following steps are involved: Step S100: a stainless steel sheet with a shape specification of 20 mm × 20 mm and a thickness of 2 mm is ultrasonically cleaned in an absolute ethanol solution for 10 minutes each, and then ultrasonically cleaned in deionized water for 5 minutes, and the surface moisture is blown dry with nitrogen gas to serve as a sample substrate; Step S200: Pour 99.99% pure ZrO2 material into a copper crucible to fill 2 / 3 of the crucible volume, and install it in the No. 1 crucible position of the No. 2 source of the electron beam evaporation instrument. Then, fix a spare cleaned stainless steel substrate on a rotatable substrate table, adjust the angle between the vertical direction of the substrate and the direction of the vapor to 85°, and the substrate rotation speed to 0 r / min. Set the deposition film thickness to 500 nm and the deposition rate to 2 A / s in the automatic control program; Step S300: Close the electron beam instrument chamber door and evacuate the chamber. When the vacuum degree of the chamber drops to 9×10 -4 When the current switch of the No. 2 source electron gun is turned on to preheat the filament for 5 minutes, the high-voltage switch is turned on, and the control program is set to manual operation. The electron beam spot size and position are controlled by adjusting the current of the X-axis AC and Y-axis DC to pre-melt the material in the crucible. After the surface of the material is slightly melted and evaporated, the current of the X-axis AC and Y-axis DC for the No. 1 crucible of the No. 2 source is set to the preset current size in the control program, and the control program is set to automatic operation; Step S400, click Deposition, the control program deposits the ZrO2 thin film according to the real-time deposition rate. When the film thickness reaches the set film thickness of 250nm, the deposition is paused, the manual mode is switched, the source baffle No. 2 is closed, the substrate spin speed is set to 1r / min and rotates for 30s, then the substrate spin speed is set to 0r / min, the automatic mode is switched back to start deposition, and the machine automatically stops running when the film thickness reaches the set film thickness of 500nm; after the deposition is completed, the pickup switch is turned on, the chamber door is opened, and the sample is taken out to obtain a ZrO2 three-dimensional nanofilm with a bionic microstructure.

2. The method for preparing a bionic film for regulating aerodynamic drag of an aircraft according to claim 1, characterized in that: In step S400, the output of the copper crucible evaporation containing ZrO2 crystals in the control program is adjusted to X DC, X AC, Y DC and Y AC, where the current magnitudes are 99, 45, 152 and 45 respectively.

3. A bionic film for regulating the aerodynamic drag of an aircraft, prepared according to the preparation method according to any one of claims 1 to 2.

4. The use of the bionic film for regulating the aerodynamic drag of an aircraft according to claim 3, characterized in that: Used in bionic devices and aircraft equipment.

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