A coating device and coating method for real-time monitoring of refractive index

Abstract

This invention provides an optical device and a coating method, relating to the field of optical device technology. The optical device includes a housing, within which is a workpiece disk for placing a coating substrate. The workpiece disk uniformly holds the coating substrate and a co-coating sheet. It also includes a laser emitter, a filter, a polarizer, a reflective light assembly, a bombardment assembly, an analyzer, a light detection device, a data analysis and processing device, and a correction plate. The refractive index of the coating substrate can be obtained based on the real-time refractive index of the co-coating sheet. Furthermore, the data analysis and processing device adjusts the deposition rate of the coating based on the obtained refractive index of the coating substrate during the coating process and adjusts the position of the correction plate during the coating process. Even if the coating of multilayer films requires frequent target changes during lens deposition, the ability to monitor the refractive index of the coating material in real time during the coating process avoids the problem of difficulty in controlling film thickness uniformity.

Description

Technical Field

[0001] This invention relates to the field of optical equipment technology, and in particular to a coating device and coating method for real-time monitoring of refractive index. Background Technology

[0002] Measuring the optical properties of materials using the principle of light wave interference allows for the measurement of thickness, distance, and other parameters, as well as more precise parameters such as internal optical homogeneity, refractive index, and surface flatness. Current measuring equipment, when measuring parameters like optical homogeneity, refractive index, and surface flatness of lenses, measures the coated lens separately after it has been coated.

[0003] However, in the process of coating lenses, especially negative filters, the coating of multilayer films requires frequent replacement of the target material. Since the refractive index of the coating material cannot be monitored in real time during the coating process, it is easy to cause the film thickness uniformity to be difficult to control.

[0004] Therefore, the aforementioned technical issues still need to be addressed. Summary of the Invention

[0005] The purpose of this invention is to provide a coating device and coating method for real-time monitoring of refractive index, so that even if the coating of multilayer films requires frequent replacement of the target material during the lens coating process, the refractive index of the coating material can be monitored in real time during the coating process, thereby avoiding the situation where the film thickness uniformity is not easy to control during the coating process.

[0006] To address the aforementioned technical problems, the embodiments of the present invention provide the following technical solutions:

[0007] The first aspect of the present invention provides a coating apparatus for real-time monitoring of refractive index, comprising a housing, a workpiece tray for placing coating substrates within the housing, the coating substrates being uniformly placed on the workpiece tray, and any one of the coating substrates being used as a co-coating substrate for monitoring, and further comprising:

[0008] A laser emitter is mounted on the exterior of the housing;

[0009] A filter, connected to the optical signal of the laser emitter, is disposed on the outside of the housing and located close to the housing side;

[0010] A polarizer is connected to the optical signal of the filter. The polarizer is disposed outside the housing and on the side of the filter away from the laser emitter.

[0011] A reflective light assembly is disposed inside the housing and is connected to the polarizer and the co-plating sheet for optical signals, respectively.

[0012] The bombardment assembly is housed within the casing.

[0013] An analyzer is disposed outside the housing and is connected to the optical signal of the reflected light assembly;

[0014] An optical detection device is connected to the optical signal of the analyzer. The optical detection device is disposed outside the housing and located on the side of the analyzer away from the housing.

[0015] A data analysis and processing device is disposed outside the housing and is simultaneously communicatively connected to the optical detection device and the bombardment assembly;

[0016] The correction plate passes through the housing and is connected to the housing.

[0017] Furthermore, the reflective light component includes:

[0018] The first reflecting mirror is connected to the polarizer and the co-coated plate for optical signals, respectively.

[0019] The second reflector is connected to the co-coated sheet and the optical signal of the analyzer, respectively.

[0020] The optical axis of the first reflector is perpendicular to the optical axis of the second reflector.

[0021] Furthermore, the laser emitter, the filter, the polarizer, and the first reflector are arranged in a straight line, and a first penetration path is formed between the laser emitter, the filter, the polarizer, and the first reflector.

[0022] Furthermore, a first reflection path is formed between the first reflector, the co-plated sheet, and the second reflector.

[0023] Furthermore, the second reflector, the analyzer, and the light detection device are aligned in a straight line, and a second penetration path is formed between the second reflector, the analyzer, and the light detection device.

[0024] Furthermore, the bombardment component includes:

[0025] An ion source is disposed inside the housing and is communicatively connected to the data acquisition and analysis equipment;

[0026] The target holder is housed within the casing.

[0027] The target material is mounted on the target material holder and connected to the ion source via an ion beam.

[0028] Furthermore, the correction plate is displaced in the target direction according to the target position, and the end of the correction plate located inside the housing is located between the target material and the workpiece disk.

[0029] Furthermore, the correction plate is communicatively connected to the data acquisition and analysis device, and the data acquisition and analysis device is equipped with a control module for controlling the displacement of the correction plate.

[0030] A second aspect of the present invention provides a coating method for real-time monitoring of refractive index, comprising:

[0031] In the bombardment step, a vacuum environment is set up inside the machine housing, and the ion source bombards the target material. During the rotation of the workpiece disk, the target atoms generated during the target bombardment are deposited on the coating substrate and the co-coating sheet located on the workpiece disk.

[0032] In the transmission step, the laser source emitter emits a laser and directs the laser light into the filter. The target light information filtered by the filter is then directed to the polarizer to select the optical axis direction. After passing through the transparent window on the housing, the light is directed to the first reflecting mirror.

[0033] In the reflected light step, the light information on the first reflector is incident on the coating substrate and the co-coating sheet to generate interference light, and the interference light is incident on the second reflector and then on the analyzer.

[0034] In the data acquisition step, the analyzer passes the target light information in the interference light and then incident it on the photodetector. The photodetector converts the light signal into an electrical signal and then transmits the electrical signal to the data analysis and processing equipment for analysis. Based on the obtained refractive index of the substrate film, the refractive index of the coating film is obtained.

[0035] The adjustment steps involve adjusting the position of the correction plate during the coating process based on the analysis results to regulate the number of target atoms deposited on the workpiece disk, and adjusting the deposition rate of the coating by adjusting the rate of the ion source.

[0036] Furthermore, the coating materials on the target are SiO2 for depositing the SiO2 layer and Ta2O5 for depositing the Ta2O5 layer, respectively.

[0037] The SiO2 layer deposition process is as follows: An radio frequency ion source bombards the SiO2 target material, causing SiO2 atoms to deposit onto the substrate and co-deposited sheets on the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁴. 6 Tor, argon and oxygen pressure set to 28 Pa, SiO2 deposition rate is 2.7 nm / s, deposition temperature is set to 280℃, and deposition time is the ratio between film thickness and deposition rate;

[0038] The Ta2O5 layer deposition process is as follows: A radio frequency ion source is used to bombard the Ta2O5 target material, causing Ta2O5 target particles to deposit on the substrate and the co-deposited wafers on the workpiece disk. The vacuum pressure inside the housing is less than or equal to 2*10⁻⁴. 6 Tor, after introducing argon and oxygen, the pressure was set to 30 Pa, the deposition rate of Ta2O5 was 3.5 nm / s, and the deposition time was the ratio between the film thickness and the deposition rate.

[0039] Compared to existing technologies, the first aspect of this invention provides a coating device for real-time monitoring of refractive index. During the bombardment process within the housing, a laser emitted from an external laser emitter passes through a filter, enters a polarizer, passes through a transparent window on the housing, and then enters a reflective light component located inside the housing. The light information is reflected by the reflective light component and incident on the coating substrate and the co-coating sheet, generating interference light. This interference light is then incident on an analyzer located outside the housing. The target light information in the interference light is incident on a photodetector located outside the housing. The target light information is transmitted to a data analysis and processing device for analysis, which obtains the refractive index of the co-coating sheet. Based on the real-time obtained refractive index of the co-coating sheet, the refractive index of the coating substrate is obtained in real time. Furthermore, during the coating process, the data analysis and processing device adjusts the deposition rate of the coating in a timely manner based on the obtained refractive index of the coating substrate, and also adjusts the position of the correction plate during the coating process. Therefore, even if the coating of multilayer films requires frequent replacement of the target material during the lens coating process, the refractive index of the coating material can be monitored in real time during the coating process, thus avoiding the phenomenon that the film thickness uniformity is not easy to control during the coating process.

[0040] The second aspect of this invention provides a coating method for real-time monitoring of refractive index, which has the same or similar technical effects as a coating device for real-time monitoring of refractive index. Attached Figure Description

[0041] The above and other objects, features, and advantages of exemplary embodiments of the present invention will become readily apparent upon reading the following detailed description with reference to the accompanying drawings. In the drawings, several embodiments of the invention are illustrated by way of example and not limitation, with the same or corresponding reference numerals denoteing the same or corresponding parts, wherein:

[0042] Figure 1 A schematic cross-sectional view of a coating apparatus for real-time monitoring of refractive index is shown.

[0043] Figure 2 A flowchart illustrating a coating method for real-time monitoring of refractive index is shown schematically.

[0044] Figure 3 The diagram schematically illustrates the design and test curves of a negative filter with a center wavelength of 615 nm.

[0045] Explanation of icon numbers:

[0046] 1. Housing;

[0047] 2. Workpiece tray;

[0048] 3. Laser emitter;

[0049] 4. Filters;

[0050] 5. Polarizer;

[0051] 6. Polarizer;

[0052] 7. Photodetector;

[0053] 8. Data analysis and processing equipment;

[0054] 9. First reflecting mirror;

[0055] 10. Second reflecting mirror;

[0056] 11. Coated substrate;

[0057] 12. Accompanying plating sheet;

[0058] 13. Bombardment assembly; 131. Ion source; 132. Target holder; 133. Target;

[0059] 14. Correction plate. Detailed Implementation

[0060] Exemplary embodiments of the present disclosure will now be described in more detail with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it should be understood that the present disclosure may be implemented in various forms and should not be limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the disclosure to those skilled in the art. Unless otherwise specified, the techniques used in the embodiments are conventional means well known to those skilled in the art.

[0061] It should be noted that, unless otherwise stated, the technical or scientific terms used in this invention should be understood in their ordinary sense by those skilled in the art. In this document, relational terms such as “first” and “second” are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. The terms “connected,” “linked,” etc., should be interpreted broadly, for example, referring to a fixed connection, a detachable connection, or an integral connection; a mechanical connection or an electrical connection; a direct connection or an indirect connection via an intermediate medium. The terms “comprising,” “including,” or any other variations thereof are intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase “comprising…” does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0062] This invention provides a coating device for real-time monitoring of refractive index, such as... Figure 1 As shown, the coating device for real-time monitoring of refractive index includes a housing 1, inside which is a workpiece disk 2 for placing coating substrates 11. Coating substrates 11 and a co-coating sheet 12, with any one of the coating substrates 11 used as a monitoring component, are evenly placed on the workpiece disk 2. It also includes a laser emitter 3, a filter 4, a polarizer 5, a reflected light assembly, a bombardment assembly 13, an analyzer 6, a photodetector 7, a data analysis and processing device 8, and a correction plate 14. The laser emitter 3 is located outside the housing 1. The filter 4 is optically connected to the laser emitter 3 and is located outside the housing 1, closer to the housing 1. The polarizer 5 is optically connected to the filter 4 and is located outside the housing 1, away from the side of the filter 4 away from the laser emitter 3. The reflected light assembly is located inside the housing 1 and is optically connected to both the polarizer 5 and the co-coating sheet 12. The bombardment assembly 13 is located inside the housing 1. A polarizer 6 is disposed outside the housing 1 and is connected to the optical signal of the reflected light assembly. A light detection device 7 is connected to the optical signal of the polarizer 6, and is disposed outside the housing 1 on the side of the polarizer 6 furthest from the housing 1. A data analysis and processing device 8 is disposed outside the housing 1 and is communicatively connected to both the light detection device 7 and the bombardment assembly 13. A correction plate 14 passes through the housing 1 and is connected to the housing 1.

[0063] In this embodiment, during the bombardment process of the bombardment component 13 within the housing 1, the laser emitted by the laser emitter 3 outside the housing 1 passes through the filter 4, enters the polarizer 5, passes through the transparent window on the housing 1, and enters the reflective light component located inside the housing 1. The light information is incident on the coating substrate 11 and the co-coating sheet 12 via the reflective light component, generating interference light. The interference light is then incident on the analyzer 6 located outside the housing 1. The target light information in the interference light is incident on the photodetector 7 located outside the housing 1. The target light information is transmitted to the data analysis and processing device 8 for analysis, and the refractive index of the film layer of the co-coating sheet 12 is obtained. Based on the real-time obtained refractive index of the film layer of the co-coating sheet 12, the refractive index of the film layer of the coating substrate 11 is obtained in real time. Furthermore, during the coating process, the data analysis and processing device 8 adjusts the deposition rate of the coating in a timely manner based on the obtained refractive index of the film layer of the coating substrate 11, and adjusts the position of the correction plate 14 during the coating process. Therefore, even if the coating of multilayer films requires frequent replacement of the target material 133 during the lens coating process, the refractive index of the coating material can be monitored in real time during the coating process, thus avoiding the phenomenon that the film thickness uniformity is not easy to control during the coating process.

[0064] In a specific embodiment, such as Figure 1 As shown, the reflected light assembly includes a first reflector 9 and a second reflector 10. The first reflector 9 is connected to the polarizer 5 and the co-coating plate 12 for optical signals, respectively. The second reflector 10 is connected to the co-coating plate 12 and the analyzer 6 for optical signals, respectively. The optical axis of the first reflector 9 is perpendicular to the optical axis of the second reflector 10.

[0065] In this embodiment, after passing through the polarizer 5 and the transparent window on the housing 1, the laser light is incident on the first reflecting mirror 9 located inside the housing 1. The light information is incident on the coating substrate 11 and the co-coating sheet 12 via the first reflecting mirror 9, generating interference light. The interference light is reflected by the first reflecting mirror 9 to the analyzer 6 located outside the housing 1. Thus, the light information is reflected by the first reflecting mirror 9 inside the housing 1 onto the coating of the coating substrate 11 and the co-coating sheet 12, generating interference light, and the interference light is reflected by the second reflecting mirror 10 to the analyzer 6 outside the housing 1.

[0066] The optical axis of the first reflecting mirror 9 is perpendicular to the optical axis of the second reflecting mirror 10, which is beneficial for the first reflecting mirror 9 to reflect light information onto the coating substrate 11 and the co-coating film 12, and also beneficial for the interference light to be reflected onto the second reflecting mirror 10.

[0067] In a specific embodiment, such as Figure 1 As shown, the laser emitter 3, filter 4, polarizer 5, and first reflector 9 are arranged in a straight line, and a first penetration path is formed between the laser emitter 3, filter 4, polarizer 5, and first reflector 9.

[0068] In this embodiment, the laser emitted by the laser emitter 3 passes through the filter 4 and polarizer 5 sequentially along the first penetration path. The filter 4 filters out the desired target light information, and the polarizer 5 selects the target direction of the light information. After passing through the transparent window on the housing 1, the light is reflected by the first reflector 9. This allows for optical signal connection to the first reflector 9 located inside the housing 1 by setting the laser emitter 3, filter 4, and polarizer 5 outside the housing 1, thereby generating interference light on the coating of the coating substrate 11 and the co-coating sheet 12 located on the workpiece disk 2.

[0069] Filter 4 is a monochromatic light filter that can filter out other unwanted light wavelengths and allow only the desired target light to pass through.

[0070] In a specific embodiment, such as Figure 1 As shown, a first reflection path is formed between the first reflector 9, the coating plate 12, and the second reflector 10.

[0071] In this embodiment, the light information on the first reflector 9 is reflected through the first reflection path onto the substrate 12 and the coating substrate 11, and then reflected onto the second reflector 10. This causes the second reflector 10 to receive interference light generated on the coatings of the coating substrate 11 and the substrate 12, and reflect it to the analyzer 6 outside the housing 1.

[0072] In a specific embodiment, such as Figure 1 As shown, the second reflector 10, the analyzer 6, and the photodetector 7 are aligned in a straight line, and a second penetration path is formed between the second reflector 10, the analyzer 6, and the photodetector 7.

[0073] In this embodiment, when the optical properties of the material deposited on the substrate 12 change during the plating process, the vibration direction and amplitude of the interference light also change. The second reflecting mirror 10 reflects the interference light along the second penetration path to the analyzer 6, and then it enters the photodetector 7. Thus, the photodetector 7 converts the optical signal into an electrical signal outside the housing 1 and transmits it to the data analysis and processing device 8. The data analysis and processing device analyzes the vibration direction and amplitude of the light, thereby enabling the analysis of parameters such as the refractive index and optical uniformity inside the material.

[0074] By adjusting the analyzer 6, the angle at which the light passes is changed to receive the interference light from the corresponding target direction and allow only that light to pass through.

[0075] In a specific embodiment, such as Figure 1As shown, the bombardment assembly 13 includes an ion source 131, a target 133 holder 132, and a target 133. The ion source 131 is housed within the casing 1 and is communicatively connected to data acquisition and analysis equipment. The target 133 holder 132 is housed within the casing 1. The target 133 is mounted on the target 133 holder 132 and is connected to the ion source 131 via an ion beam.

[0076] In this embodiment, the ion source 131 bombards the target 133 located on the target 133 holder 132 by emitting an ion beam, so that the target 133 atoms of the target 133 are deposited onto the coating substrate 11 and the co-coating sheet 12 on the workpiece disk 2.

[0077] Furthermore, based on the parameters of the refractive index of the film layer of the co-plating sheet 12 and the refractive index of the film layer of the coating substrate 11 obtained by the data acquisition and analysis equipment, the deposition rate of the coating is adjusted by adjusting the rate of the ion source 131 during the coating process. This allows for timely adjustments during the coating process, making it easier to control the uniformity of the film thickness during the coating process.

[0078] In a specific embodiment, such as Figure 1 As shown, the correction plate 14 is displaced in the target direction according to the target position. The end of the correction plate 14 located inside the housing 1 is located between the target material 133 and the workpiece disk 2.

[0079] In this embodiment, based on the parameters of the refractive index of the lens film obtained by the data acquisition and analysis equipment, the deposition rate of the film can be adjusted by simultaneously adjusting the target position of the correction plate 14 and the rate of the ion source 131 during the coating process. This allows for timely adjustments during the coating process, making it easy to control the uniformity of the film thickness.

[0080] By adjusting the target position of the correction plate 14, the number of target material 133 atoms deposited on the coating substrate 11 and the co-coating sheet 12 located on the workpiece disk 2 can be increased.

[0081] In a specific embodiment, the correction plate 14 is communicatively connected to the data acquisition and analysis device, and the data acquisition and analysis device is equipped with a control module that controls the displacement of the correction plate 14.

[0082] In this embodiment, during the coating process, the control module located in the data acquisition and analysis equipment adjusts the target position of the correction plate 14 through the control system, thereby enabling timely adjustments during the coating process and facilitating easy control of the film thickness uniformity.

[0083] For example, the target position of the correction plate 14 can be adjusted, or it can be manually adjusted based on the parameters of the lens coating refraction obtained by the data acquisition and analysis device.

[0084] The control module and control system are based on existing technologies.

[0085] In this invention, a door is provided on the housing 1, and a workpiece tray 2 is disposed on the door. During the coating process, the workpiece tray 2 rotates within the housing 1. The door can be opened to facilitate placing the coating substrate 11 and the co-coating sheet 12 on the workpiece tray 2 before coating, and to remove the coating substrate 11 and the co-coating sheet 12 from the workpiece tray 2 after coating. The rotation of the workpiece tray 2 within the housing 1 increases the uniformity of the deposition of target material 133 atoms onto the coating substrate 11 and the co-coating sheet 12 during the deposition process.

[0086] In this invention, under vacuum conditions, the coating substrate 11 is placed on the workpiece disk 2. During the coating process, the ion source 131 emits an ion beam to bombard the target material 133, and the atoms of the target material 133 are deposited on the coating substrate 11 to form an optical thin film. Based on the optical properties of the coating material, a coating curve and film thickness are designed; the longer the deposition time, the thicker the film. During the coating process, the deposition rate of the target material 133 atoms affects the refractive index of the film. By real-time monitoring of the refractive index and adjusting the rate of the ion source 131, the deposition rate of the coating and the target position of the correction plate 14 can be adjusted. This allows for precise real-time measurement of the refractive index changes, improving the uniformity of the target material 133 atoms deposited on the coating substrate 11 and the quality of the film.

[0087] For example, the present invention can also monitor the crystal structure of the coating material in real time based on the interference light information of the coating layer on the substrate during the coating process.

[0088] like Figure 2 As shown, the second aspect of the present invention provides a coating method for real-time monitoring of refractive index, including a bombardment step, a transmission step, a reflection step, a data acquisition step, and an adjustment step.

[0089] In the bombardment step, a vacuum environment is set up inside the machine housing, and the ion source bombards the target material. During the rotation of the workpiece disk, the target atoms generated during the target bombardment are deposited on the coating substrate and the co-coating sheet located on the workpiece disk.

[0090] In the transmission step, the laser source emitter emits a laser and directs the laser light into the filter. The target light information filtered by the filter is then directed to the polarizer 5 to select the optical axis direction. After passing through the transparent window on the housing, the light is directed to the first reflecting mirror.

[0091] In the reflected light step, the light information on the first reflector is incident on the coating substrate and the co-coating sheet to generate interference light, and the interference light is incident on the second reflector and then on the analyzer.

[0092] In the data acquisition step, the analyzer passes the target light information in the interference light and then incident it on the photodetector. The photodetector converts the light signal into an electrical signal and then transmits the electrical signal to the data analysis and processing equipment for analysis. Based on the obtained refractive index of the substrate film, the refractive index of the coating film is obtained.

[0093] The adjustment steps involve adjusting the position of the correction plate during the coating process based on the analysis results to regulate the number of target atoms deposited on the workpiece disk, and adjusting the deposition rate of the coating by adjusting the rate of the ion source.

[0094] In this embodiment, after passing through the bombardment and transmission steps, the interference light generated in the reflection step passes through the second reflecting mirror and enters the analyzer. The interference light information passing through the analyzer is received by the photodetector and converted into an electrical signal. In the data acquisition step, the data acquisition and analysis device analyzes the electrical signal to obtain the refractive index of the coating substrate based on the obtained refractive index of the substrate film. Furthermore, based on the refractive index parameter of the lens film obtained by the data acquisition and analysis device, the target position of the correction plate and the deposition rate of the bombardment component are adjusted during the coating process. This allows for timely adjustments during the coating process, making it easy to control the uniformity of the film thickness.

[0095] Furthermore, depending on the actual work requirements, the bombardment step, transmission step, reflection step, data acquisition step, and adjustment step can be repeated to avoid the phenomenon that the film thickness uniformity is not easy to control during the coating process.

[0096] In a specific embodiment, the coating materials on the target are SiO2 for depositing the SiO2 layer and TiO2 for depositing the TiO2 layer.

[0097] The SiO2 layer deposition process is as follows: An radio frequency ion source bombards the SiO2 target material, causing SiO2 atoms to deposit onto the substrate and co-deposited sheets on the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁴. 6 Tor, with argon and oxygen pressure set to 26 Pa, SiO2 deposition rate of 7.8 nm / s, and deposition time the ratio between film thickness and deposition rate.

[0098] The TiO2 layer deposition process is as follows: A radio frequency ion source is used to bombard the TiO2 target material, causing TiO2 target particles to deposit on the substrate and the co-deposited wafers of the workpiece disk. The vacuum pressure inside the machine housing is less than or equal to 2*10⁻⁴. 6 Tor, after introducing argon and oxygen, the pressure was set to 28 Pa, the TiO2 deposition rate was 2.9 nm / s, and the deposition time was the ratio between the film thickness and the deposition rate.

[0099] In this embodiment, the deposition process of the SiO2 and TiO2 layers is applied to the deposition of an optical filter. The deposition conditions for this lens are as follows: the substrate for deposition is microcrystalline glass, the center wavelength is set to 615nm, and the thickness of the TiO2 and SiO2 layers is 1 / 4 of the optical thickness. The calculation formula is as follows:

[0100]

[0101] λ0 is the center wavelength, and nH / L is the refractive index of TiO2 and SiO2 at the center wavelength. Both materials are deposited simultaneously to prepare a negative filter that transitions from a high refractive index to a low refractive index. The refractive index n of SiO2 at 615nm is 1.46, and the refractive index n of TiO2 at 615nm is 2.59. The design and test curves for depositing a negative filter with a center wavelength of 615nm are shown below. Figure 3 As shown, the anti-reflection and peak transmittance are in good agreement with the design, demonstrating the high precision in controlling the fabrication of negative filters achieved through the embodiments of this invention. Specific parameters are shown in the table below:

[0102] Optical thin films 615nm transmittance measurement 615nm transmittance design value negative filter 94％ 97.2％

[0103] Adjusting the relative sputtering power of TiO2 and SiO2 targets can control the refractive index of the coating material and improve the precise control of the film thickness.

[0104] This invention can monitor parameters such as the refractive index of the coating material in real time during the coating process, and can also provide timely feedback and make corresponding adjustments during the coating process, thereby improving the precise control of the film thickness.

[0105] The above description is merely a specific embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in the present invention should be included within the scope of protection of the present invention. Therefore, the scope of protection of the present invention should be determined by the scope of the claims.

Claims

1. A coating device for real-time monitoring of refractive index, comprising a housing, wherein a workpiece tray for placing coating substrates is disposed within the housing, the coating substrates are uniformly placed on the workpiece tray, and any one of the coating substrates is used as a co-coating substrate for monitoring, characterized in that, Also comprising: a laser emitter arranged outside the casing; a filter connected in optical signal with the laser emitter, the filter being arranged outside the casing and located close to the side of the casing; a polarizer connected in optical signal with the filter, the polarizer being arranged outside the casing and located on the side of the filter away from the laser emitter; a reflected light assembly arranged inside the casing and connected in optical signal with the polarizer and the filter respectively; a bombardment assembly arranged inside the casing; an analyzer arranged outside the casing and connected in optical signal with the reflected light assembly; a light detection device connected in optical signal with the analyzer, the light detection device being arranged outside the casing and located on the side of the analyzer away from the casing; a data analysis processing device arranged outside the casing and connected in communication with the light detection device and the bombardment assembly; a correction plate passing through the casing and connected with the casing; the reflected light assembly comprising: a first mirror connected in optical signal with the polarizer and the filter respectively; a second mirror connected in optical signal with the filter and the analyzer respectively; wherein the optical axis of the first mirror is perpendicular to the optical axis of the second mirror; the laser emitter, the filter and the polarizer and the first mirror are in a straight line, and the laser emitter, the filter and the polarizer and the first mirror form a first penetration path; the second mirror, the analyzer and the light detection device are in a straight line, and the second mirror, the analyzer and the light detection device form a second penetration path; the bombardment assembly comprising: an ion source arranged inside the casing and connected in communication with the data analysis processing device; a target holder arranged inside the casing; a target arranged on the target holder and connected with the ion source through ion beam flow.

2. The coating device for monitoring the refractive index in real time according to claim 1, wherein, the first mirror, the filter and the second mirror form a first reflection path.

3. The coating device for monitoring the refractive index in real time according to claim 1, wherein, the correction plate is displaced according to the target position, and the end of the correction plate located inside the casing is located between the target and the workpiece disc.

4. The coating device for monitoring the refractive index in real time according to claim 3, wherein, the correction plate is connected in communication with the data analysis processing device, and the data analysis processing device is provided with a control module for controlling the displacement of the correction plate.

5. A coating method using the coating apparatus for monitoring the refractive index in real time according to claim 1, characterized by, comprising: a bombardment step, a vacuum environment is arranged inside the casing, an ion source bombards a target, a workpiece disc is rotated, and target atoms generated during target bombardment are deposited on a coated substrate and a filter plate located on the workpiece disc; a transmission step, a laser emitter emits laser and the laser is incident into a filter, target light information selected by the filter is incident into a polarizer to select the direction of the optical axis, and then the light is incident into a first mirror through a transparent window on the casing; a reflected light step, light information on the first mirror is incident into a coated substrate and a filter plate to generate interference light, the interference light is incident into a second mirror and then into an analyzer; a transmission step, a laser emitter emits laser and the laser is incident into a filter, target light information selected by the filter is incident into a polarizer to select the direction of the optical axis, and then the light is incident into a first mirror through a transparent window on the casing; a reflected light step, light information on the first mirror is incident into a coated substrate and a filter plate to generate interference light, the interference light is incident into a second mirror and then into an analyzer; The data acquisition step is to make the target light signal in the interference light incident to the light detection device through the polarizer, and then make the light detection device convert the light signal into an electric signal, and then make the electric signal communicated to the data analysis device for analysis, so as to obtain the film layer refractive index of the plated substrate according to the obtained film layer refractive index of the auxiliary plated piece; The adjusting step is to adjust the position of the correction plate in the plating process according to the analysis result, so as to adjust the number of target atoms deposited on the workpiece disc, and adjust the deposition rate of the plating through the adjusting rate of the ion source.

6. The coating method according to claim 5, wherein The plating materials on the target materials are SiO2 for plating the SiO2 layer and Ta2O5 for plating the Ta2O5 layer, respectively. The plating process of the SiO2 layer is as follows: the SiO2 target is bombarded by a radio frequency ion source, so that the SiO2 target atoms are deposited on the plating film base sheet and the accompanying plating sheet of the workpiece disc; the vacuum pressure in the machine shell is less than or equal to 2×10 -6 Tor, the argon and oxygen pressure is set to 28 Pa, the deposition rate of SiO2 is 2.7 nm / s, the deposition temperature is set to 280℃, and the plating time is the ratio between the film thickness and the deposition rate. The plating process of the Ta2O5 layer is as follows: the Ta2O5 target is bombarded by a radio frequency ion source, so that the Ta2O5 target particles are deposited on the plating film substrate of the workpiece disc and the accompanying plating sheet; the vacuum pressure in the machine shell is less than or equal to 2x10 -6 After argon and oxygen are introduced, the pressure is set to 30 Pa, the deposition rate of Ta2O5 is 3.5 nm / s, and the plating time is the ratio between the film thickness and the deposition rate.

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