An industrial atomic layer deposition chamber structure

By designing an industrial atomic layer deposition chamber structure with a supporting displacement device and a gas supply system, the problems of inconvenient loading and unloading and uneven gas distribution in existing equipment have been solved. This has enabled convenient material handling and uniform gas blowing, improved the uniformity and quality of thin film deposition, and met the high-efficiency production requirements of the semiconductor manufacturing industry.

CN117328041BActive Publication Date: 2026-07-14JIAXING KEMIN ELECTRONICS EQUIP TECH
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
JIAXING KEMIN ELECTRONICS EQUIP TECH
Filing Date
2023-11-15
Publication Date
2026-07-14

AI Technical Summary

Technical Problem

Existing industrial atomic layer deposition equipment is not convenient enough for loading and unloading, and the gas blowing is not sufficient and uniform enough, making it difficult to meet the requirements of semiconductor manufacturing for thin film thickness uniformity and quality, especially the need for improved conversion efficiency in the photovoltaic industry.

Method used

An industrial atomic layer deposition chamber structure was designed, including a support displacement device and an air supply system. The support structure is driven to rotate by an electric telescopic rod and a transmission gear to facilitate the loading and unloading of materials. Air is blown onto the material surface through multiple sets of air outlets to ensure uniform gas distribution.

Benefits of technology

It enables convenient loading and unloading of materials, and more thorough and uniform gas blowing, thereby improving the uniformity and quality of thin film deposition and meeting the high-efficiency production needs of the semiconductor manufacturing industry.

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Abstract

The application relates to an industrial atomic layer deposition chamber structure, which comprises a deposition chamber shell, a support is fixedly connected to the lower cavity of the deposition chamber shell, and the upper end of the support is provided with a support structure; a blowing shell is arranged in the middle part of the support, a gas supply pipeline mechanism is connected to the lower part of the blowing shell, and gas is supplied to the inside of the blowing shell. The equipment provided by the application is used for loading or taking materials, a gas-tight door is opened, the left material is firstly loaded or taken, then an electric telescopic rod is started, a support plate is driven to move upward through a transmission rod, so that the roller supports the support structure upward, then a motor is started to drive a transmission gear to rotate, so that a gear ring is driven to rotate, the support structure is rotated by 180 degrees, the right side of the support structure is transferred to the left side, and the left side is loaded or taken, so that the loading and taking of the whole structure are more convenient.
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Description

Technical Field

[0001] This application relates to the field of atomic layer deposition technology, and more particularly to an industrial atomic layer deposition chamber structure. Background Technology

[0002] Atomic layer deposition (ALD) involves complex surface chemistry processes and low deposition rates, and the technology did not achieve substantial breakthroughs until the mid-to-late 1980s. However, by the mid-1990s, interest in this technology was increasing, mainly due to the development of microelectronics and deep submicron chip technology, which required continuously reducing the size of devices and materials while increasing the aspect ratio of devices. This resulted in a reduction in the thickness of the materials used by several nanometers, making atomic layer deposition technology extremely important.

[0003] As semiconductor process technology becomes increasingly sophisticated, the continuous reduction in chip size and linewidth, along with the enhancement of functionality, has become crucial for semiconductor manufacturers. This has led to increasingly stringent requirements for the uniformity and quality of thin-film deposition (TFT) thickness. The industrialization of atomic layer deposition (ALD) equipment is also urgently needed. Current technologies can only perform ALD on single or multiple wafers, which falls far short of practical needs. A major challenge facing the photovoltaic industry today is increasing conversion efficiency without compromising the economics and technical feasibility of industrial production. ALD has a significant passivation effect on polycrystalline silicon solar cells and has been proven to be a method for improving conversion efficiency. Passivation of the silicon wafer surface increases the effective lifetime of charge carriers, thereby improving overall conversion efficiency. As semiconductor process technology matures, the demand for mass production of ALD is becoming increasingly stringent. Furthermore, conventional industrial ALD equipment is inconvenient for material handling and unloading. Therefore, we propose an industrial ALD chamber structure. Summary of the Invention

[0004] This application provides an industrial atomic layer deposition chamber structure to solve the problems mentioned in the background art.

[0005] To solve, or at least partially solve, the above-mentioned technical problems, this application provides an industrial atomic layer deposition chamber structure, comprising:

[0006] A deposition chamber shell, wherein a support is fixedly connected to the lower part of the inner cavity of the deposition chamber shell, and a support structure is placed at the upper end of the support;

[0007] An air-blowing housing is disposed in the middle of the bracket, and the lower part of the air-blowing housing is connected to an air supply pipe mechanism to supply gas to the interior of the air-blowing housing;

[0008] A support displacement device is provided below the bracket. A transmission rod is fixedly connected to the middle of the upper end of the support displacement device, and an electric telescopic rod is fixedly connected to the upper end of the transmission rod.

[0009] The support displacement device includes a support plate and rollers. The rollers are fixedly connected to the four corners of the upper end of the support plate, and the rollers are movably inserted into the rectangular openings at the four corners of the bracket.

[0010] A gear ring is fixedly connected to the upper middle part of the support structure. The outer side of the gear ring is meshed with a transmission gear, and the middle part of the transmission gear is fixedly inserted into the rotating shaft of the motor.

[0011] Optionally, the upper and lower ends of the bracket structure are support plates, and support reinforcing plates are fixedly connected to the left and right sides between the support plates. Support plates are movably connected to the left and right sides between the support plates. Limiting blocks are fixedly connected to the four corners of the front and rear ends of the support plates. Fixing bolts are inserted into the middle of the limiting blocks at the lower left of the front end and the lower right of the rear end. The fixing bolts are inserted into the threaded holes. The threaded holes are opened at the front and rear ends of the lower support plate of the bracket structure. At the same time, an air blowing shell is fixedly connected to the middle of the bracket structure.

[0012] Optionally, multiple sets of slots are opened on the opposite sides of the support plate and the left and right sides of the air blowing housing, and a rectangular air outlet is opened in the middle between two of the slots of the air blowing housing.

[0013] Optionally, the gas supply pipeline mechanism includes an inlet pipe, an inlet branch pipe, an annular gas distribution chamber, and an outlet pipe. The inlet pipe is inserted into the side wall of the deposition chamber shell. Two inlet branch pipes are fixedly connected to the outlet end of the inlet pipe. The inlet branch pipe is connected to the annular gas distribution chamber. The upper end of the annular gas distribution chamber is connected to the outlet pipe. The outlet pipe is located inside the blowing shell.

[0014] Optionally, the annular air distribution chamber is located in the middle of the upper side plate of the bracket, the lower part of the air outlet pipe is sealed with a sealing circular plate, the sealing circular plate is rotatably disposed in the middle of the lower end of the air blowing housing, the upper end of the air blowing housing is sealed, and the air inlet pipe is movably inserted through and connected to the support plate.

[0015] Optionally, the upper and lower side seals of the transmission rod are respectively movably inserted into the middle of the upper side plate and the sealing circular plate of the air blowing housing.

[0016] Optionally, both the electric telescopic rod and the motor are fixedly connected to the upper end of the inner cavity of the deposition chamber shell, and a protective shell is provided on the outside of the electric telescopic rod and the motor.

[0017] Optionally, a heating tube is fixedly connected to the inner cavity sidewall of the deposition chamber shell.

[0018] Optionally, a vacuum tube is provided on the upper right side of the deposition chamber shell, and a material intake port is provided at the front end of the deposition chamber shell, with an airtight door provided at the material intake port.

[0019] The technical solutions provided in this application have the following advantages compared with the prior art:

[0020] The device provided in this application embodiment opens the airtight door when loading or unloading materials. First, the material on the left side is loaded or unloaded. Then, the electric telescopic rod is activated, which drives the support plate to move upward through the transmission rod. This causes the rollers to support the bracket structure upward. Then, the motor is activated to drive the transmission gear to rotate, which in turn drives the gear ring to rotate, causing the bracket structure to rotate. This allows the material to be transferred from the right side of the bracket structure to the left side for loading or unloading, making the loading and unloading of the overall structure more convenient and greatly reducing the area of ​​the airtight door.

[0021] When gas blowing is required for atomic layer deposition, an external gas source is activated. Gas enters the interior of the blowing shell through the inlet pipe, inlet manifold, annular gas distribution chamber, and outlet pipe. Then, gas is blown onto the surface of each layer of material through each rectangular air outlet, making the gas blowing more thorough and uniform. Attached Figure Description

[0022] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0023] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, for those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0024] Figure 1 This is an overall structural diagram of an industrial atomic layer deposition chamber.

[0025] Figure 2 This is a cross-sectional view of an industrial atomic layer deposition chamber structure;

[0026] Figure 3 An industrial atomic layer deposition chamber structure Figure 2 Enlarged view of point A in the middle;

[0027] Figure 4 This is a structural diagram of the support structure for an industrial atomic layer deposition chamber.

[0028] In the diagram: 1. Deposition chamber shell; 2. Feed inlet; 3. Airtight door; 4. Vacuum tube; 5. Air inlet pipe; 6. Heating tube; 7. Support; 8. Support structure; 9. Support plate; 10. Air blowing shell; 11. Slot; 12. Support plate; 13. Roller; 14. Air inlet branch pipe; 15. Circular air distribution chamber; 16. Air outlet pipe; 17. Transmission rod; 18. Protective shell; 19. Electric telescopic rod; 20. Motor; 21. Transmission gear; 22. Gear ring; 23. Rectangular air outlet; 24. Support reinforcement plate; 25. Limiting block; 26. Fixing bolt; 27. Threaded hole. Detailed Implementation

[0029] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0030] Various embodiments of this application may exist in the form of a range. It should be understood that the description in the form of a range is merely for convenience and brevity and should not be construed as a rigid limitation on the scope of this application. Therefore, it should be considered that the range description has specifically disclosed all possible sub-ranges and single numerical values ​​within that range. For example, it should be considered that the range description from 1 to 6 has specifically disclosed sub-ranges, such as from 1 to 3, from 1 to 4, from 1 to 5, from 2 to 4, from 2 to 6, from 3 to 6, etc., and single numbers within the range, such as 1, 2, 3, 4, 5, and 6, regardless of the range. In addition, whenever a numerical range is indicated in this application, it means including any referenced number (fraction or integer) within the indicated range. Unless otherwise specified, all raw materials, reagents, instruments, and equipment used in this application can be purchased commercially or prepared by existing methods.

[0031] In this application, unless otherwise stated, directional terms such as "upper" and "lower" specifically refer to the drawing directions in the accompanying drawings. Furthermore, in this application, the terms "comprising," "including," etc., mean "including but not limited to." In this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. In this application, "and / or" describes the relationship between related objects, indicating that three relationships may exist. For example, A and / or B can represent: A alone, A and B simultaneously, or B alone. A and B can be singular or plural. In this application, "at least one" means one or more, and "more than one" means two or more. "At least one," "at least one of the following," or similar expressions refer to any combination of these items, including any combination of a single item or a plural item. For example, "at least one of a, b, or c" or "at least one of a, b, and c" can both mean: a, b, c, ab (i.e., a and b), ac, bc, or abc, where a, b, and c can be a single or multiple.

[0032] like Figures 1-4 As shown, this application provides an industrial atomic layer deposition chamber structure, including:

[0033] A deposition chamber shell 1, wherein a support 7 is fixedly connected to the lower part of the inner cavity of the deposition chamber shell 1, and a support structure 8 is placed at the upper end of the support 7;

[0034] An air-blowing housing 10 is disposed in the middle of the support 7, and the lower part of the air-blowing housing 10 is connected to an air supply pipe mechanism to supply gas to the interior of the air-blowing housing 10.

[0035] A support displacement device is provided below the bracket 7. A transmission rod 17 is fixedly connected to the middle of the upper end of the support displacement device, and an electric telescopic rod 19 is fixedly connected to the upper end of the transmission rod 17.

[0036] The support displacement device includes a support plate 12 and rollers 13. The rollers 13 are fixedly connected to the four corners of the upper end of the support plate 12, and the rollers 13 are movably inserted into the rectangular openings at the four corners of the bracket 7.

[0037] Specifically: the support plate 12 supports the bracket structure 8 through the rollers 13, so that the bracket structure 8 can rotate, thereby facilitating the loading and unloading of materials.

[0038] A gear ring 22 is fixedly connected to the upper middle part of the bracket structure 8. The outer side of the gear ring 22 is meshed with a transmission gear 21, and the middle part of the transmission gear 21 is fixedly inserted into the rotating shaft of the motor 20.

[0039] Specifically: the overall frame of the support structure 8 is cubic, allowing the support structure 8 to rotate inside the deposition chamber shell 1.

[0040] like Figure 2 and Figure 4 As shown: The upper and lower ends of the bracket structure 8 are support plates. Support reinforcing plates 24 are fixedly connected to the left and right sides between the support plates. Support plates 9 are movably connected to the left and right sides between the support plates. Limiting blocks 25 are fixedly connected to the four corners of the front and rear ends of the support plates 9. Fixing bolts 26 are inserted into the middle of the limiting blocks 25 at the lower left of the front end and the lower right of the rear end. The fixing bolts 26 are inserted into the threaded holes 27. The threaded holes 27 are opened at the front and rear ends of the lower support plate of the bracket structure 8. At the same time, the air blowing shell 10 is fixedly connected to the middle of the bracket structure 8.

[0041] Specifically: The position of the support plate 9 can be adjusted. After the position is adjusted, the position of the limiting block 25 is fixed by the fixing bolt 26, thereby positioning the support plate 9. By adjusting the position of the support plate 9, the equipment can meet the atomic layer deposition of raw materials of different sizes.

[0042] like Figure 2 As shown: The opposite side of the support plate 9 and the left and right sides of the air blowing housing 10 are provided with multiple sets of slots 11. The air blowing housing 10 has a rectangular air outlet 23 in the middle between two slots 11.

[0043] Specifically: The space between the slots 11 is for inserting and placing materials.

[0044] like Figure 1 As shown: The gas supply pipeline mechanism includes an air inlet pipe 5, an air inlet branch pipe 14, an annular air distribution chamber 15, and an air outlet pipe 16. The air inlet pipe 5 is inserted into the side wall of the sedimentation chamber shell 1. Two air inlet branch pipes 14 are fixedly connected to the air outlet end of the air inlet pipe 5. The air inlet branch pipe 14 is connected to the annular air distribution chamber 15. The upper end of the annular air distribution chamber 15 is connected to the air outlet pipe 16. The air outlet pipe 16 is located inside the blowing shell 10.

[0045] Specifically: the inner cavity of the air blowing shell 10 is rectangular, which can blow gas onto the surface of various materials. The air inlet pipe 5, the air inlet branch pipe 14 and the air outlet pipe 16 are all made of stainless steel pipes. The sealing circular plate inserted into the air outlet pipe 16 can not only seal the lower end of the air blowing shell 10, but also position the support structure 8 at the upper end of the support 7 through the sealing circular plate, so that the rotation of the support structure 8 is stable.

[0046] like Figure 2 As shown: the annular air distribution chamber 15 is opened in the middle of the upper side plate of the bracket 7, the lower part of the air outlet pipe 16 is sealed with a sealing circular plate, the sealing circular plate is rotatably disposed in the middle of the lower end of the air blowing housing 10, the upper end of the air blowing housing 10 is sealed, and the air inlet pipe 14 is movably inserted through the support plate 12.

[0047] The transmission rod 17 is movably inserted into the middle of the upper side plate and the sealing circular plate of the air blowing housing 10, respectively.

[0048] Specifically: the sealing disc can rotate.

[0049] like Figure 2 As shown: The electric telescopic rod 19 and the motor 20 are both fixedly connected to the upper end of the inner cavity of the sedimentation chamber shell 1, and a protective shell 18 is provided on the outside of the electric telescopic rod 19 and the motor 20.

[0050] Specifically: The electric telescopic pole 19 and the motor 20 both use existing equipment and technology on the market. The protective housing 18 can protect the electric telescopic pole 19 and the motor 20 from corrosion. The electric telescopic pole 19 and the motor 20 are connected to external control equipment through wires.

[0051] like Figure 2 As shown: A heating tube 6 is fixedly connected to the inner cavity side wall of the deposition chamber shell 1.

[0052] Specifically, the operation of the heating tube 6 can regulate the temperature inside the deposition chamber shell 1.

[0053] like Figure 1 As shown: A vacuum tube 4 is provided on the upper right side of the deposition chamber shell 1, and a material intake port 2 is opened at the front end of the deposition chamber shell 1. The material intake port 2 is provided with an airtight door 3.

[0054] Specifically: the airtight door 3 adopts the existing airtight door on the market, and the airtight door 3 can seal the material inlet 2.

[0055] When the equipment is in use, the air inlet pipe 5 is connected to an external air source, and the vacuum pipe 4 is connected to an external vacuum device. First, open the airtight door 3, insert the processed plate into the two corresponding slots 11, and after the material on the left side is placed, the electric telescopic rod 19 can be started, which drives the support plate 12 to move upward through the transmission rod 17, so that the roller 13 supports the bracket structure 8 upward. Then, the motor 20 is started to drive the transmission gear 21 to rotate, which drives the gear ring 22 to rotate, so that the bracket structure 8 rotates 180 degrees, thereby transferring the right side of the bracket structure 8 to the left side for loading.

[0056] After the material is fed, the vacuum is drawn through the vacuum tube 4 and then atomic layer deposition can be carried out. When the atomic layer deposition requires blowing, the external gas source is started. The gas enters the inside of the blowing shell 10 through the air inlet pipe 5, the air inlet branch pipe 14, the annular air distribution chamber 15 and the air outlet pipe 16. Then, the gas is blown onto the surface of each layer of material through each rectangular air outlet 23. After the blowing is completed, the vacuum is drawn again and then the atomic layer deposition continues. The operation of the heating tube 6 can regulate the temperature inside the deposition chamber shell 1.

[0057] When picking up materials, open the airtight door 3, first pick up the material on the left side, then start the electric telescopic rod 19, which drives the support plate 12 to move upward through the transmission rod 17, so that the roller 13 supports the bracket structure 8 upward. Then start the motor 20 to drive the transmission gear 21 to rotate, which in turn drives the gear ring 22 to rotate, causing the bracket structure 8 to rotate 180 degrees, thereby transferring the material from the right side of the bracket structure 8 to the left side for unloading.

[0058] During atomic layer deposition, the support structure 8 is stably placed on top of the support 7.

[0059] The above description is merely a specific embodiment of this application, enabling those skilled in the art to understand or implement this application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Therefore, this application is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed in this application.

Claims

1. An industrial atomic layer deposition chamber structure, characterized in that, include: A sedimentation chamber shell (1) is fixedly connected to a bracket (7) in the lower part of the inner cavity of the sedimentation chamber shell (1), and a bracket structure (8) is placed at the upper end of the bracket (7). An air-blowing housing (10) is disposed in the middle of the support (7), and the lower part of the air-blowing housing (10) is connected to an air supply pipe mechanism to supply gas to the interior of the air-blowing housing (10). A support displacement device is provided below the bracket (7). A transmission rod (17) is fixedly connected to the middle of the upper end of the support displacement device. An electric telescopic rod (19) is fixedly connected to the upper end of the transmission rod (17). The support displacement device includes a support plate (12) and rollers (13). The upper end of the support plate (12) is fixedly connected to the four corners of the rollers (13). The rollers (13) are movably inserted into the rectangular openings at the four corners of the bracket (7). A gear ring (22) is fixedly connected to the upper middle part of the bracket structure (8). The outer side of the gear ring (22) is meshed with a transmission gear (21). The middle part of the transmission gear (21) is fixedly connected to the shaft of the motor (20).

2. The industrial atomic layer deposition chamber structure according to claim 1, characterized in that: The upper and lower ends of the support structure (8) are support plates. Support reinforcing plates (24) are fixedly connected to the left and right sides between the support plates. Support plates (9) are movably connected to the left and right sides between the support plates. Limiting blocks (25) are fixedly connected to the four corners of the front and rear ends of the support plates (9). Fixing bolts (26) are inserted into the middle of the limiting blocks (25) at the lower left of the front end and the lower right of the rear end. The fixing bolts (26) are inserted into the threaded holes (27). The threaded holes (27) are opened at the front and rear ends of the lower support plate of the support structure (8). At the same time, the air blowing shell (10) is fixedly connected to the middle of the support structure (8).

3. The industrial atomic layer deposition chamber structure according to claim 2, characterized in that: The opposing surfaces of the support plate (9) and the left and right sides of the air blowing housing (10) are provided with multiple sets of slots (11) facing each other. The air blowing housing (10) has a rectangular air outlet (23) in the middle between two slots (11).

4. The industrial atomic layer deposition chamber structure according to claim 1, characterized in that: The gas supply pipeline mechanism includes an inlet pipe (5), an inlet branch pipe (14), an annular gas distribution chamber (15), and an outlet pipe (16). The inlet pipe (5) is inserted into the side wall of the sedimentation chamber shell (1). The outlet end of the inlet pipe (5) is fixedly connected to two inlet branch pipes (14). The inlet branch pipe (14) is connected to the annular gas distribution chamber (15). The upper end of the annular gas distribution chamber (15) is connected to the outlet pipe (16). The outlet pipe (16) is located inside the blowing shell (10).

5. The industrial atomic layer deposition chamber structure according to claim 4, characterized in that: The annular air distribution chamber (15) is located in the middle of the upper side plate of the bracket (7). The lower part of the air outlet pipe (16) is sealed with a sealing circular plate. The sealing circular plate is rotatably disposed in the middle of the lower end of the air blowing housing (10). The upper end of the air blowing housing (10) is sealed. The air inlet pipe (14) is movably inserted through and connected to the support plate (12).

6. The industrial atomic layer deposition chamber structure according to claim 1, characterized in that: The transmission rod (17) is movably inserted into the middle of the upper side plate and the sealing circular plate of the air blowing housing (10), respectively.

7. The industrial atomic layer deposition chamber structure according to claim 1, characterized in that: The electric telescopic rod (19) and the motor (20) are both fixedly connected to the upper end of the inner cavity of the sedimentation chamber shell (1), and a protective shell (18) is provided on the outside of the electric telescopic rod (19) and the motor (20).

8. The industrial atomic layer deposition chamber structure according to claim 1, characterized in that: A heating tube (6) is fixedly connected to the inner wall of the deposition chamber shell (1).

9. The industrial atomic layer deposition chamber structure according to claim 1, characterized in that: The upper right side of the deposition chamber shell (1) is provided with a vacuum tube (4), and the front end of the deposition chamber shell (1) is provided with a material inlet (2), and the material inlet (2) is provided with an airtight door (3).

Citation Information

Patent Citations

  • CN221854765U