Vertical oxidation jig and oxidation process for silicon injection pipe

Abstract

This invention discloses a vertical oxidation fixture for placing silicon injection tubes. It includes a top cover with a through-hole; a base with a support slot and a vent hole penetrating the base, through which water vapor enters. The inner diameter of the vent hole is less than or equal to the inner diameter of the silicon injection tube. The inner wall of the placement slot and the inner wall of the support slot are in contact with the outer wall of the silicon injection tube; a support column is fixed between the top cover and the base. The placement slot and the support slot are vertically aligned, and the silicon injection tube passes through the placement slot and is inserted into the support slot. This invention ensures that during the oxidation process, water vapor can fully enter from the inner wall of the silicon injection tube and evenly oxidize it, improving the oxidation effect and thus extending the service life of the silicon injection tube.

Description

Technical Field

[0001] This invention relates to a silicon jet tube oxidation fixture, specifically a vertical oxidation fixture and oxidation process for silicon jet tubes. Background Technology

[0002] Silicon jet tubes are primarily used to transport specific gases. Existing silicon jet tubes, depending on the CVD (Chemical Vapor Deposition) furnace, can be categorized into three types: fused type, integral type, and through-hole type. CVD furnaces, based on the gases used, can be divided into two processes: UPOLY (silane + nitrogen) and DPOLY (phosphine + nitrogen). Because the UPOLY process decomposes silane into silicon deposits in the heat treatment furnace, which adhere to the inner wall of the silicon jet tube orifice, uneven pressure distribution over time can lead to breakage.

[0003] To ensure the service life of silicon jet tubes, a uniform oxide coating needs to be applied to the inner wall of the tubes. Currently, the oxidation method involves placing the silicon jet tubes in a vertical oxidation furnace and then introducing steam into the furnace to oxidize them. However, due to the small size of the pores in the inner wall of the silicon jet tubes, steam cannot fully enter the pores to form a uniform oxide layer, resulting in poor oxidation of the inner wall and reduced service life. Summary of the Invention

[0004] In order to solve at least one of the technical problems mentioned in the background art, the present invention aims to provide a vertical oxidation fixture and oxidation process for silicon jet tubes, which can ensure that water vapor can fully enter from the inner wall of the silicon jet tube and uniformly oxidize the inner wall of the silicon jet tube during the oxidation process, thereby improving the oxidation effect of the inner wall of the silicon jet tube and thus improving the service life of the silicon jet tube.

[0005] To achieve the above objectives, the present invention provides the following technical solution:

[0006] A vertical oxidation fixture for holding a silicon injection tube, comprising:

[0007] The top cover has a through-type placement slot;

[0008] The base has a groove, and the bottom surface of the groove has a vent hole that penetrates the base. The inner diameter of the vent hole is less than or equal to the inner diameter of the silicon injection pipe.

[0009] Support column, fixed between top cover and base;

[0010] The placement groove and the tray are vertically aligned, and the silicon injection tube passes through the placement groove and is inserted into the tray.

[0011] Optionally, the base, top cover, and support column are all made of silicon.

[0012] Optionally, the placement slots and brackets can be of various sizes.

[0013] Optionally, both the opening of the placement groove and the opening of the bracket groove are chamfered.

[0014] Optionally, both sides of the placement slot have chamfers, and the chamfer of the placement slot located on the top surface of the top cover is larger than the chamfer of the placement slot located on the bottom surface of the top cover.

[0015] Optionally, the top surface of the base and the bottom surface of the top cover are provided with welding grooves, and the support column is installed in the welding grooves and fixedly connected to the base and the top cover by welding.

[0016] Optionally, it also includes a quartz base, wherein an air inlet is provided in the middle of the quartz base, and a vent pipe is installed at the bottom of the air inlet. The base is installed on the quartz base, and the air inlet and the vent are connected. External water vapor enters the air inlet through the vent pipe and then enters the vent through the air inlet.

[0017] Optionally, the bottom surface of the base is provided with an air-gathering groove, and all the vent holes are located in the air-gathering groove.

[0018] Optionally, it also includes a plug for sealing the vent hole, the plug comprising a sealing seat and a sealing post fixed to the sealing seat, the sealing seat having the same dimensions as the bracket, and the sealing post having the same dimensions as the vent hole.

[0019] An oxidation process for a silicon-based injection nozzle, comprising the following steps:

[0020] S1. Open the furnace cover of the vertical oxidation furnace and place any of the above-mentioned vertical oxidation fixtures with silicon injection pipes into the vertical oxidation furnace;

[0021] S2. An external air duct is installed to connect to the ventilation hole of the vertical oxidation fixture;

[0022] S3. Insert the silicon injection tube into the placement slot on the top cover, and then vertically insert it into the bracket on the base;

[0023] S4. Close the furnace cover and heat the vertical oxidation furnace to the specified temperature;

[0024] S5. Introduce steam to oxidize the silicon jet tube at a constant temperature for two hours. After two hours of oxidation, stop introducing steam and remove the oxidized silicon jet tube once it has cooled to room temperature.

[0025] Compared with the prior art, the beneficial effects of the present invention are:

[0026] Insert the silicon spray tube into the placement slot of the top cover, and then directly into the support slot of the base. Since the inner wall of the placement slot is in contact with the outer wall of the silicon spray tube, and the placement slot and support slot are vertically aligned, the silicon spray tube can be constrained by the support slot and placement slot, ensuring that the silicon spray tube can be placed vertically and stably. Because the inner diameter of the vent hole is less than or equal to the inner diameter of the silicon spray tube, and the inner wall of the support slot is in contact with the outer wall of the silicon spray tube, when the silicon spray tube is inserted into the bottom wall of the support slot, the vent hole is exactly aligned with the inner wall of the silicon spray tube. When water vapor is introduced, the water vapor can enter the inner wall of the spray tube from bottom to top and flow upward along the inner wall of the spray tube. This ensures that there is sufficient water vapor on the inner wall of the spray tube during the oxidation process, thereby ensuring that a uniform oxide layer can be formed on the inner wall of the silicon spray tube, improving the oxidation effect of the inner wall of the silicon spray tube, and thus improving the service life of the silicon spray tube. Attached Figure Description

[0027] Figure 1 This is an exploded view of the overall structure of the present invention;

[0028] Figure 2 for Figure 1 Enlarged schematic diagram of the structure at point A in the middle;

[0029] Figure 3 This is a cross-sectional structural diagram of the top cover of the present invention;

[0030] Figure 4 This is a cross-sectional structural diagram of the base of the present invention;

[0031] Figure 5 This is a schematic diagram of the assembly of a vertical oxidation fixture and a quartz base.

[0032] Figure 6 This is a cross-sectional schematic diagram of the overall assembly of the vertical oxidation fixture, the quartz base, and the oxidation furnace.

[0033] In the diagram: 1. Silicon injection pipe; 2. Top cover; 21. Placement slot; 3. Base; 31. Support slot; 32. Vent hole; 4. Support column; 5. Chamfer; 6. Welding groove; 7. Gas gathering groove; 8. Plug; 81. Sealing seat; 82. Sealing column; 9. Quartz seat; 10. Vertical oxidation furnace; 11. Gas guide pipe. Detailed Implementation

[0034] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0035] Please see Figures 1-6 This embodiment provides a vertical oxidation fixture for silicon injection pipes, mainly used to place silicon injection pipes 1. The vertical oxidation fixture is installed in a vertical oxidation furnace 10 and includes a top cover 2. A through-type placement groove 21 is opened on the top cover 2. A support column 4 is fixed to the bottom surface of the top cover 2. A base 3 is fixed to the end of the support column 4 away from the top cover 2. A support groove 31 is opened on the base 3. A vent hole 32 is opened through the base 3 on the bottom surface of the support groove 31. Water vapor enters from the bottom of the vent hole 32. The inner diameter of the vent hole 32 is less than or equal to the inner diameter of the silicon injection pipe 1. The inner wall of the placement groove 21 is in contact with the outer wall of the silicon injection pipe 1. The placement groove 21 and the support groove 31 are in contact with the outer wall of the silicon injection pipe 1. The placement groove 21 and the support groove 31 are positioned correspondingly. When placing, the silicon injection pipe 1 is inserted into the support groove 31 after passing through the placement groove 21.

[0036] The following analysis, based on specific application scenarios, further explains that when oxidizing the silicon spray tube 1, the top cover 2, base 3, and support column 4 need to be connected first, and the assembled fixture needs to be installed into the vertical oxidation furnace 10. It should be noted that the bottom of the vertical oxidation furnace 10 needs to be equipped with a gas guide pipe 11 that is directly connected to the bottom of the vent 32, so that water vapor can be guided to the vent 32 through the gas guide pipe 11. After the fixture is installed in the vertical oxidation furnace 10, the silicon injection pipe 1 is inserted into the placement groove 21 of the top cover 2. After passing through the placement groove 21, the silicon injection pipe 1 is inserted directly into the support groove 31 of the base 3. Since the inner wall of the placement groove 21 is in contact with the outer wall of the silicon injection pipe 1, and the inner wall of the support groove 31 is in contact with the outer wall of the silicon injection pipe 1, and the placement groove 21 and the support groove 31 are vertically aligned, the support groove 31 and the placement groove 21 can be used to constrain the silicon injection pipe 1, ensuring that the silicon injection pipe 1 can be placed vertically and stably. Furthermore, since the inner diameter of the vent hole 32 is less than or equal to the inner diameter of the silicon injection pipe 1, the silicon injection pipe 1 can be placed vertically and stably. The inner wall of the tray 31 is in contact with the outer wall of the silicon spray tube 1. When the silicon spray tube 1 is inserted into the bottom wall of the tray 31, the vent 32 corresponds to the inner wall of the silicon spray tube 1. When water vapor is introduced, the water vapor can enter the inner wall of the spray tube directly from bottom to top and flow upward along the inner wall of the spray tube. This ensures that there is sufficient water vapor on the inner wall of the spray tube during the oxidation process, thereby ensuring that a uniform oxide layer can be formed on the inner wall of the silicon spray tube 1, improving the oxidation effect of the inner wall of the silicon spray tube 1, and thus improving the service life of the silicon spray tube 1.

[0037] As one specific embodiment of this application, the base 3, top cover 2, and support column 4 are all made of silicon.

[0038] When oxidizing the inner wall of a silicon-based spray tube, the vertical oxidation furnace 10 needs to reach a temperature of 1000℃, which exceeds the melting point of common metals. Furthermore, metals undergo high-temperature corrosion when the operating temperature reaches 30%–40% of their melting point, making metal unsuitable for fixture construction. Using silicon, however, avoids high-temperature corrosion during oxidation in the spray tube, ensuring a longer service life for the fixture.

[0039] Reference Figures 1-4 As one specific embodiment of this application, the placement groove 21 and the bracket 31 have various sizes.

[0040] Depending on the specific application scenario, since the size and type of silicon spray tube 1 are different, the placement groove 21 and the support groove 31 can be designed according to different sizes and types, so that the inner wall of silicon spray tube 1 of different sizes and types can be oxidized in one oxidation operation, thereby improving the versatility of the fixture.

[0041] Reference Figure 3 and Figure 4 As a specific embodiment of this application, chamfers 5 are provided in both the slot opening of the placement slot 21 and the slot opening of the support slot 31.

[0042] In specific application scenarios, since silicon material is brittle and its edges are prone to breakage under stress, and burrs are easily generated at the edges after processing, chamfering 5 is made at the openings of the placement groove 21 and the support groove 31. This not only removes the burrs at the openings of the placement groove 21 and the support groove 31, but also guides the placement of the silicon injection tube 1, making the placement of the silicon injection tube 1 more convenient. In addition, chamfering 5 also reduces the risk of collision between the openings of the placement groove 21 and the support groove 31 and the silicon injection tube 1 during the handling of the silicon injection tube 1, thereby preventing the base 3 and the top cover 2 from cracking and scratching due to collisions.

[0043] Reference Figure 3 As a specific embodiment of this application, both sides of the placement groove 21 have chamfers 5, and the chamfer 5 of the placement groove 21 located on the top surface of the top cover 2 is greater than the chamfer 5 of the placement groove 21 located on the bottom surface of the top cover 2.

[0044] In light of the specific application scenario, the relatively large chamfer 5 at the top of the placement slot 21 mainly serves to facilitate the insertion of the silicon injection tube 1, specifically guiding the placement of the silicon injection tube 1. The chamfer 5 at the bottom of the placement slot 21 does not need to be too large because a larger chamfer 5 results in a longer processing time and increases the risk of material breakage during processing. Designing the chamfer 5 at the bottom of the placement slot 21 to be smaller can reduce the processing difficulty, shorten the overall processing time of the top cover 2, and improve the manufacturing efficiency of the top cover 2, while ensuring that the corners at the bottom of the placement slot 21 are not prone to collision with the silicon injection tube 1.

[0045] Reference Figure 1 , Figure 3 and Figure 4 As a specific embodiment of this application, the top surface of the base 3 and the bottom surface of the top cover 2 are provided with welding grooves 6, and the support column 4 is installed in the welding grooves 6 and fixedly connected to the base 3 and the top cover 2 by welding method.

[0046] Depending on the specific application scenario, by opening the welding groove 6, the connection area between the support column 4, the base 3, and the top cover 2 can be increased, thereby improving the connection strength and stability between the base 3, the support column 4, and the top cover 2.

[0047] Reference Figure 5 and Figure 6 As a specific embodiment of this application, it also includes a quartz seat 9, which is installed at the bottom of the vertical oxidation furnace 10. An air inlet is provided in the middle of the quartz seat 9, and a gas guide pipe 11 is installed at the bottom of the air inlet. The base 3 is installed in the middle of the quartz seat 9. The air inlet and the ventilation hole are connected. External water vapor enters the air inlet through the gas guide pipe and then enters the ventilation hole through the air inlet.

[0048] Based on the specific application scenario, the quartz base 9 is used to ensure the stable installation of the fixture, facilitate the installation of the fixture, and allow for easy adjustment of the height of the quartz base 9 as needed, ensuring that the fixture is installed at the appropriate height in the vertical oxidation furnace 10.

[0049] Reference Figures 4-6 As a specific embodiment of this application, an air-gathering groove 7 is provided on the bottom surface of the base 3, and all the vent holes 32 are located in the air-gathering groove 7.

[0050] Considering the specific application scenario, if each vent 32 is equipped with a vent pipe 11 to introduce water vapor, it will increase the amount of material used and thus increase the cost. However, by opening a gas gathering groove 7 on the bottom surface of the base 3, and having all the vents 32 located in the gas gathering groove 7, only one vent pipe 11 needs to be installed. Specifically, water vapor is introduced into the gas gathering groove 7 through the vent pipe 11 to accumulate water vapor. After passing through the gas gathering groove 7, the water vapor flows into each vent 32. This can save the use of the vent pipe 11 and reduce material costs.

[0051] Furthermore, refer to Figure 1 , Figure 2 and Figure 5 As a specific embodiment of this application, it also includes a plug 8 for sealing the vent 32. The plug 8 includes a sealing seat 81 and a sealing post 82 fixed to the sealing seat 81. The size of the sealing seat 81 is the same as the size of the bracket 31, and the size of the sealing post 82 is the same as the size of the vent 32.

[0052] In specific usage scenarios, when the slot 31 on the base 3 is not fully used, if water vapor is introduced, water vapor may also enter the slot 31 that is not inserted into the silicon jet tube 1, which will cause oxygen loss. By using the plug 8 to seal the vent 32 that is not inserted into the silicon jet tube 1, water vapor can be prevented from escaping, thereby preventing oxygen loss and improving the utilization efficiency of water vapor.

[0053] refer to Figures 1-6 The oxidation process for a silicon-based injection nozzle provided by this invention comprises the following steps:

[0054] S1. Open the furnace cover of the vertical oxidation furnace 10 and place the silicon injection pipe 1 vertical oxidation fixture into the vertical oxidation furnace 10;

[0055] S2. An external air duct 11 is provided to connect to the ventilation hole 32 of the vertical oxidation fixture;

[0056] S3. Insert the silicon injection tube 1 into the placement slot 21 on the top cover 2, and then vertically insert it into the bracket 31 on the base 3;

[0057] S4. Close the furnace cover and heat the vertical oxidation furnace 10 to the specified temperature, specifically 1000℃;

[0058] S5. Water vapor is introduced. Water vapor enters the inner wall of the silicon spray tube 1 from bottom to top through the vent 32 on the base 3. At a high temperature of 1000℃, after water vapor is introduced, an oxide layer will be generated on the inner wall of the silicon spray tube 1. After constant temperature oxidation at 1000℃ for two hours, the water vapor is stopped. The silicon spray tube 1 is cooled to room temperature using a cooling device or natural cooling method, and then the oxidized silicon spray tube is removed.

[0059] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above, and that the invention can be implemented in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as exemplary and non-limiting, and the scope of the invention is defined by the appended claims rather than the foregoing description. Thus, it is intended that all variations falling within the meaning and scope of equivalents of the claims be included within the present invention.

Claims

1. A vertical oxidation jig for a silicon spouting pipe (1) for placing a silicon spouting pipe, characterized by, include: Top cover (2), the top cover (2) has a through-type placement groove (21); The base (3) has a groove (31) and a vent hole (32) through the base (3) on the bottom surface of the groove (31). The inner diameter of the vent hole (32) is less than or equal to the inner diameter of the silicon injection pipe (1). The support column (4) is fixed between the top cover (2) and the base (3); The placement groove (21) and the bracket (31) are vertically aligned, and the silicon injection pipe (1) passes through the placement groove (21) and is inserted into the bracket (31); The bottom surface of the base (3) is provided with an air-gathering groove (7), and the air vents (32) are all located in the air-gathering groove (7).

2. The vertical oxidation tool for silicon spouting pipe according to claim 1, wherein The base (3), top cover (2), and support column (4) are all made of monocrystalline silicon.

3. The vertical oxidation tool for silicon spouting tubes according to claim 1, wherein The placement slot (21) and the bracket (31) have various sizes.

4. The vertical oxidation tool for silicon spouting tubes according to claim 1, wherein Both the slot of the placement groove (21) and the slot of the bracket (31) are chamfered (5).

5. The vertical oxidation tool for silicon injection tubes of claim 3, wherein: Both sides of the placement groove (21) have chamfers (5), and the chamfer (5) of the placement groove (21) on the top surface of the top cover (2) is greater than the chamfer (5) of the placement groove (21) on the bottom surface of the top cover (2).

6. The vertical oxidation tool for silicon spouting tubes according to claim 1, wherein The top surface of the base (3) and the bottom surface of the top cover (2) are provided with welding grooves (6). The support column (4) is installed in the welding grooves (6) and is fixedly connected to the base (3) and the top cover (2) by welding.

7. A vertical oxidation fixture for a silicon-based injection pipe according to claim 1, characterized in that, It also includes a quartz base (9), which is installed at the bottom of the vertical oxidation furnace (10). An air inlet is provided in the middle of the quartz base (9), and a gas guide pipe (11) is installed at the bottom of the air inlet. The base (3) is installed in the middle of the quartz base (9). The air inlet and the ventilation hole are connected. External water vapor enters the air inlet through the gas guide pipe and then enters the ventilation hole through the air inlet.

8. A vertical oxidation fixture for a silicon-based injection pipe according to claim 1, characterized in that, It also includes a plug (8) for sealing the vent (32), the plug (8) including a sealing seat (81) and a sealing post (82) fixed to the sealing seat (81), the sealing seat (81) being the same size as the bracket (31) and the sealing post (82) being the same size as the vent (32).

9. An oxidation process for a silicon-based injection nozzle, comprising the following steps: S1. Open the furnace cover of the vertical oxidation furnace (10) and place any one of the silicon spray pipe vertical oxidation fixtures described in claims 1-8 into the vertical oxidation furnace (10); S2. An external air duct (11) is connected to the air vent (32) of the vertical oxidation fixture. S3. Insert the silicon injection tube (1) into the placement slot (21) on the top cover (2), and then vertically insert it into the bracket (31) on the base (3); S4. Close the furnace cover and heat the vertical oxidation furnace (10) to the specified temperature; S5. Introduce steam to oxidize the silicon jet tube at a constant temperature for two hours. After two hours of oxidation, stop introducing steam and wait for the silicon jet tube (1) to cool to room temperature before taking out the oxidized silicon jet tube.

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