Superlens generation method and device for homogenization, superlens and homogenization system

Abstract

This application provides a method, apparatus, superlens, and beautification system for generating a superlens for beam homogenization. The superlens to be generated is used to shape a Gaussian beam into a first flat-top beam, the first flat-top beam satisfying a first divergence angle. The method includes: obtaining a second beautification phase for shaping the Gaussian beam into a second flat-top beam, the second flat-top beam satisfying a second divergence angle; based on the first and second divergence angles, obtaining the required number of copies of the second flat-top beam and the required diffraction angle of the copied second flat-top beam; constructing a target image based on the number of copies, diffraction angle, wavelength, and the positional distribution of micro / nano structures; performing phase recovery on the target image to obtain a copied and stitched phase; and generating a superlens based on the second beautification phase and the copied and stitched phase. The superlens generated according to the method provided in this application can shape a Gaussian beam into a flat-top beam that simultaneously achieves high uniformity and a large divergence angle.

Description

Technical Field

[0001] This application relates to the field of lenses, specifically to a method, apparatus, superlens, and light homogenizing system for generating superlenses for light homogenization. Background Technology

[0002] A flat-top beam refers to a beam whose intensity is uniformly distributed in the central region and drops sharply at the edges. It is widely used in laser medicine, laser etching, and other fields. The higher the uniformity of the flat-top beam, the flatter its central intensity region appears. In related technologies, the light emitted by the light source is mostly a Gaussian beam. Therefore, the solutions provided in related technologies first design a corresponding uniform phase for the Gaussian beam, then generate an optical element capable of applying the designed uniform phase, and finally use the generated optical element to shape the Gaussian beam into a flat-top beam. Although the solutions provided in related technologies can shape a Gaussian beam into a flat-top beam, it is difficult to simultaneously achieve high uniformity and a large divergence angle. Summary of the Invention

[0003] One objective of this application is to provide a method, apparatus, superlens, and beautification system for generating superlenses for beam homogenization. The superlens generated according to the method provided in this application can shape a Gaussian beam into a flat-top beam that simultaneously achieves high uniformity and a large divergence angle.

[0004] According to one aspect of the embodiments of this application, a method for generating a superlens for homogenizing light is disclosed. The superlens to be generated is used to shape a Gaussian beam into a first flat-top beam, wherein the first flat-top beam is intended to satisfy a first divergence angle and a desired uniformity. The method includes:

[0005] A second uniform phase is obtained for shaping the Gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle and a desired uniformity, and the second divergence angle is smaller than the first divergence angle.

[0006] Based on the first divergence angle and the second divergence angle, obtain the number of copies required to replicate and splice the first flat-top beam and the second flat-top beam, as well as the diffraction angle required for the replicated second flat-top beam;

[0007] Based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the positional distribution of the micro-nano structures to be arranged on the superlens, a target image is constructed to describe how the second flat-top beam is copied and stitched together by the micro-nano structures with the positional distribution to form the first flat-top beam.

[0008] Phase recovery is performed on the target image to obtain the replication and splicing phase required by the micro / nano structure with the positional distribution;

[0009] Based on the second homogenizing phase and the replicated splicing phase, a superlens is generated to shape the Gaussian beam into the first flat-top beam.

[0010] In an exemplary embodiment of this application, based on the first divergence angle and the second divergence angle, the number of copies required to replicate and splice the first flat-top beam and the second flat-top beam, as well as the diffraction angle required for the replicated second flat-top beam, are obtained, including:

[0011] The number of copies is calculated based on the ratio between the first divergence angle and the second divergence angle;

[0012] The diffraction angle is calculated based on the number of copies and the second divergence angle, wherein the diffraction angle is positively correlated with the number of copies and positively correlated with the second divergence angle.

[0013] In an exemplary embodiment of this application, the two-dimensional coordinate system constituting the beam observation surface includes a first direction axis and a second direction axis that are perpendicular to each other; the number of copies includes the number of copies required on the first direction axis and the number of copies required on the second direction axis, and the diffraction angle includes the diffraction angle required on the first direction axis and the diffraction angle required on the second direction axis.

[0014] In an exemplary embodiment of this application, based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the positional distribution of the micro / nano structures to be arranged on the superlens, a target image is constructed to describe how the copied second flat-top beams are stitched together into the first flat-top beam by the micro / nano structures at the distribution positions, including:

[0015] Based on the diameter of the spot projected by the Gaussian beam onto the superlens and the sampling period of the micro / nano structures to be arranged, the number of samples of the micro / nano structures to be arranged is calculated; the sampling period and the number of samples together constitute the position distribution.

[0016] Based on the number of copies, the diffraction angle, the wavelength, the sampling period, and the number of samples, the arrangement period of the dot matrix to be arranged in the target image is calculated;

[0017] The target size of the target image is determined according to the sampling period and the sampling quantity, and the dot matrix is ​​arranged in the image of the target size according to the copy quantity and the arrangement period to obtain the target image, wherein the dot matrix is ​​composed of the copy quantity of points, and the distance between adjacent points in the dot matrix conforms to the arrangement period.

[0018] In an exemplary embodiment of this application, the number of samples of the micro-nano structures to be arranged is calculated based on the diameter of the spot projected by the Gaussian beam onto the superlens and the sampling period of the micro-nano structures to be arranged, including:

[0019] Based on the spot diameter, the required size of the superlens target is calculated, wherein the size is positively correlated with the spot diameter;

[0020] The number of samples is calculated based on the ratio between the sampling period and the size.

[0021] In an exemplary embodiment of this application, the size is greater than or equal to 1.3 times the diameter of the light spot and less than or equal to 1.7 times the diameter of the light spot.

[0022] In an exemplary embodiment of this application, the arrangement period of the dot matrix to be arranged in the target image is calculated based on the number of copies, the diffraction angle, the wavelength, the sampling period, and the number of samples, including:

[0023] Based on the wavelength and the sampling period, the maximum diffraction angle that the replicated second flat-top beam can achieve under the conditions of the wavelength and the sampling period is calculated, wherein the maximum diffraction angle is positively correlated with the wavelength and negatively correlated with the sampling period;

[0024] The arrangement period is calculated based on the maximum diffraction angle, the number of copies, the diffraction angle, and the number of samples. The arrangement period is inversely correlated with the maximum diffraction angle and the number of copies, and is positively correlated with the diffraction angle and the number of samples.

[0025] According to one aspect of the embodiments of this application, a superlens generating apparatus for homogenizing light is disclosed. The superlens to be generated is used to shape a Gaussian beam into a first flat-top beam, wherein the first flat-top beam is intended to satisfy a first divergence angle and a desired uniformity. The apparatus includes:

[0026] The second uniform beam phase acquisition module is configured to acquire a second uniform beam phase for shaping the Gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle and the expected uniformity, and the second divergence angle is smaller than the first divergence angle.

[0027] The copy splicing parameter acquisition module is configured to acquire, based on the first divergence angle and the second divergence angle, the number of copies required to copy and splice the first flat-top beam and the second flat-top beam, as well as the diffraction angle required for the copied second flat-top beam;

[0028] The target image construction module is configured to construct a target image describing how the second flat-top beam is copied and stitched together by the micro-nano structures to be arranged on the superlens, based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the positional distribution of the micro-nano structures to be arranged on the superlens.

[0029] The copy-stitching phase recovery module is configured to perform phase recovery on the target image to obtain the copy-stitching phase required by the micro / nano structure with the positional distribution.

[0030] The superlens generation module is configured to generate a superlens for shaping the Gaussian beam into the first flat-top beam based on the second uniform phase and the replicated splicing phase.

[0031] According to one aspect of the embodiments of this application, a superlens for homogenizing light is disclosed, wherein the superlens is generated using the method provided in any of the above method embodiments.

[0032] According to one aspect of the embodiments of this application, a light homogenizing system is disclosed, the light homogenizing system comprising: a light source for emitting a Gaussian beam, and a superlens for homogenizing the Gaussian beam; the superlens is generated using the method provided in any of the above method embodiments.

[0033] According to one aspect of the embodiments of this application, an electronic device is disclosed, comprising: one or more processing units; and a storage unit for storing one or more programs, wherein when the one or more programs are executed by the one or more processing units, the electronic device implements any of the above method embodiments.

[0034] According to one aspect of the embodiments of this application, a computer-readable storage medium is disclosed, on which computer-readable instructions are stored, which, when executed by a processing unit of a computer, cause the computer to perform any of the above method embodiments.

[0035] The superlens generated by the method provided in this application shapes the first flat-top beam, which is equivalent to first shaping the Gaussian beam into a second flat-top beam, and then replicating and splicing the second flat-top beam to obtain the first flat-top beam. Since replication and splicing have virtually no significant impact on the beam uniformity, the uniformity of the first flat-top beam is very similar to that of the second flat-top beam, and can be considered to be essentially the same. Furthermore, regardless of the difference between the second divergence angle of the second flat-top beam and the first divergence angle of the first flat-top beam, the second flat-top beam can be successfully replicated and spliced ​​into the first flat-top beam by adaptively adjusting the number of replicas required for the second flat-top beam and the diffraction angle required for the replicated second flat-top beam. Therefore, as long as the obtained second homogenizing phase can shape the Gaussian beam into a highly uniform second flat-top beam, even if the divergence angle of the second flat-top beam is small, the superlens generated by the method provided in this application can successfully shape the Gaussian beam into a highly uniform first flat-top beam with a large divergence angle; and the second homogenizing phase used only to ensure high uniformity is easily obtained. Therefore, the superlens generated according to the method provided in this application can shape a Gaussian beam into a flat-top beam that simultaneously achieves high uniformity and a large divergence angle.

[0036] Other features and advantages of this application will become apparent from the following detailed description, or may be learned in part from practice of this application.

[0037] It should be understood that the above general description and the following detailed description are merely exemplary and do not limit this application. Attached Figure Description

[0038] The above and other objectives, features and advantages of this application will become more apparent from a detailed description of exemplary embodiments thereof with reference to the accompanying drawings.

[0039] Figure 1 A flowchart of a method for generating a superlens for homogenizing light according to an embodiment of this application is shown.

[0040] Figure 2 A schematic diagram of shaping a Gaussian beam into a second flat-top beam is shown in one embodiment of this application.

[0041] Figure 3 An embodiment of this application is shown. Figure 2 The diagram shows a copy of the second flat-top beam spliced ​​together to form the first flat-top beam.

[0042] Figure 4 This illustration shows a schematic diagram of how a second flat-top beam is copied and spliced ​​together to form a first flat-top beam, which is then reflected on the beam observation surface in one embodiment of this application.

[0043] Figure 5This diagram illustrates the two-dimensional normalized light intensity distribution of the first flat-top beam obtained by shaping in one embodiment of this application on the beam observation plane.

[0044] Figure 6 This diagram illustrates the distribution of one-dimensional normalized light intensity in the horizontal direction of the first flat-top beam obtained by shaping according to an embodiment of this application.

[0045] Figure 7 A block diagram of a superlens generating apparatus for homogenizing light according to an embodiment of this application is shown.

[0046] Figure 8 A layout diagram of a light-uniforming system according to an embodiment of this application is shown. Attached image description:

[0048] 1-Light source; 2-Superlens. Detailed Implementation

[0049] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the examples set forth herein; rather, they are provided to make the description of this application more comprehensive and complete, and to fully convey the concept of the exemplary embodiments to those skilled in the art. The drawings are merely illustrative of this application and are not necessarily drawn to scale. The same reference numerals in the drawings denote the same or similar parts, and therefore repeated descriptions of them will be omitted.

[0050] Furthermore, the described features, structures, or characteristics can be combined in any suitable manner in one or more exemplary embodiments. Numerous specific details are provided in the following description to give a full understanding of exemplary embodiments of this application. However, those skilled in the art will recognize that the technical solutions of this application can be practiced with one or more of the specific details omitted, or other methods, components, steps, etc., can be employed. In other instances, well-known structures, methods, implementations, or operations are not shown or described in detail to avoid obscuring various aspects of this application.

[0051] Some of the block diagrams shown in the accompanying drawings are functional entities and do not necessarily correspond to physically or logically independent entities. These functional entities can be implemented in software, in one or more hardware modules or integrated circuits, or in different network and / or processing unit devices and / or microcontroller devices.

[0052] Generally, high homogeneity should be prioritized for flat-top beams. However, the flat-top beams shaped using the methods provided by related technologies, while maintaining high homogeneity, typically only achieve a divergence angle of around 15° (half-angle). Even with slight optimization, this can only be further increased to around 20° (half-angle), still resulting in a relatively small divergence angle. Therefore, while the methods provided by related technologies can shape Gaussian beams into flat-top beams, they struggle to simultaneously achieve both high homogeneity and a large divergence angle.

[0053] To overcome the aforementioned deficiencies in related technologies, this application provides a method for generating a superlens for homogenizing light. The superlens generated by the method provided in this application can shape a Gaussian beam into a flat-top beam that simultaneously achieves high homogeneity and a large divergence angle.

[0054] Figure 1 A flowchart of the superlens generation method for homogenizing light provided in this application is shown. See also... Figure 1 The methods provided in this application include:

[0055] Step S110: Obtain the second uniform phase for shaping the Gaussian beam into the second flat-top beam, wherein the second flat-top beam satisfies the second divergence angle and the expected uniformity, and the second divergence angle is smaller than the first divergence angle.

[0056] Step S120: Based on the first divergence angle and the second divergence angle, obtain the number of copies required to obtain the first flat-top beam and the second flat-top beam, as well as the diffraction angle required for the copied second flat-top beam;

[0057] Step S130: Based on the number of copies, diffraction angle, wavelength of the second flat-top beam, and positional distribution of the micro-nano structures to be arranged on the superlens, construct a target image to describe how the micro-nano structures with the positional distribution copy and stitch together the second flat-top beam into the first flat-top beam.

[0058] Step S140: Perform phase recovery on the target image to obtain the required replication and splicing phase for the micro / nano structure at that location.

[0059] Step S150: Based on the second homogenizing phase and the replicated splicing phase, generate a superlens for shaping the Gaussian beam into a first flat-top beam.

[0060] In this embodiment, the first flat-top beam refers to the flat-top beam obtained by shaping the target of the superlens, and the first divergence angle refers to the divergence angle satisfied by the target of the first flat-top beam; the second flat-top beam refers to the flat-top beam that can be directly obtained by homogenizing the phase of the beam using related technologies, the second divergence angle refers to the actual divergence angle satisfied by the second flat-top beam, and the second homogenizing phase refers to the phase used to shape the second flat-top beam.

[0061] As can be seen from the above description of the related technologies, when the first divergence angle is large, the second divergence angle will be smaller than the first divergence angle. Therefore, in this case, directly using the homogenized phase designed by the related technologies to shape the Gaussian beam cannot obtain the first flat-top beam. To address this, the method provided in this application proposes to replicate the second flat-top beam with a small divergence angle using a superlens, and then stitch together the replicated second flat-top beams to obtain the first flat-top beam with a large divergence angle.

[0062] Specifically, in order for the superlens to replicate and splice the second flat-top beam into the first flat-top beam, the micro-nano structures to be arranged on the superlens need to provide a phase for realizing the replication and splicing function, i.e., the replication and splicing phase referred to in this application.

[0063] Therefore, to determine the replication and splicing phase, after determining the first divergence angle of the first flat-top beam and the second divergence angle of the second flat-top beam, the number of copies of the second flat-top beam needed to replicate and splice the first flat-top beam can be calculated based on these angles; that is, the required number of copies of the second flat-top beam. After calculating the number of copies, the required diffraction angle for the replicated second flat-top beam can be further calculated by combining the second divergence angle and applying the principles of diffraction optics.

[0064] After calculating the number of copies required for the second flat-top beam and the diffraction angle required for the copied second flat-top beam, a target image is constructed by combining the wavelength of the second flat-top beam and the positional distribution of the micro-nano structures to be arranged on the superlens to describe how the micro-nano structures with the positional distribution copy and stitch together the second flat-top beam into the first flat-top beam.

[0065] Since the target image describes not only the entity executing the replication and stitching process (i.e., the micro / nano structure at that location), but also the actions performed (i.e., replicating and stitching a beam), the object being processed (i.e., the second flat-top beam), and the result (i.e., the first flat-top beam), phase retrieval of the constructed target image can yield the phase representation of the replication and stitching process, thus obtaining the replication and stitching phase required by the micro / nano structure at that location. Phase retrieval of the target image can be performed based on the Gerchberg-Saxton algorithm or on the principle of gratings.

[0066] Since the second homogenizing phase can shape the Gaussian beam into a second flat-top beam, and the replication and splicing phase can replicate and splice the second flat-top beam into a first flat-top beam, combining the second homogenizing phase and the replication and splicing phase determines the target phase required for the micro / nano structures to be arranged on the superlens to shape the Gaussian beam into the first flat-top beam. After determining the target phase, by searching a pre-established micro / nano database, micro / nano structures that can provide the target phase can be selected. Then, the selected micro / nano structures are arranged to design the superlens layout. Finally, the superlens used to shape the Gaussian beam into the first flat-top beam is fabricated according to the designed layout.

[0067] In summary, the method provided in this application, which generates a superlens to shape the first flat-top beam, is essentially equivalent to first shaping a Gaussian beam into a second flat-top beam, and then replicating and splicing the second flat-top beam to obtain the first flat-top beam. Since replication and splicing have virtually no significant impact on the beam uniformity, the uniformity of the first flat-top beam is very similar to that of the second flat-top beam, and can be considered essentially identical. Furthermore, regardless of the difference between the second divergence angle of the second flat-top beam and the first divergence angle of the first flat-top beam, the second flat-top beam can be successfully replicated and spliced ​​into the first flat-top beam by adaptively adjusting the number of replicas required for the second flat-top beam and the diffraction angle required after replication. Therefore, as long as the obtained second homogenizing phase can shape the Gaussian beam into a highly uniform second flat-top beam, even if the divergence angle of the second flat-top beam is very small, the superlens generated according to the method provided in this application can successfully shape the Gaussian beam into a first flat-top beam with high homogenization and a large divergence angle; and the second homogenizing phase used only to ensure high homogenization is easily obtained. Thus, it can be seen that the superlens generated according to the method provided in this application can shape the Gaussian beam into a flat-top beam that simultaneously achieves high homogenization and a large divergence angle.

[0068] Figure 2 A schematic diagram of shaping a Gaussian beam into a second flat-top beam is shown in one embodiment of this application. Figure 3 An embodiment of this application is shown. Figure 2 The diagram shows a copy of the second flat-top beam spliced ​​together to form the first flat-top beam.

[0069] See Figure 2 and Figure 3 In one embodiment, the divergence angle of the Gaussian beam emitted by the light source 1 is θ0, and the target is shaped by the superlens 2 into a flat-top beam with high uniformity and a divergence angle of θ1. However, if the uniform phase provided in related technologies is directly used, under the premise of ensuring high uniformity, the divergence angle of the flat-top beam shaped by the superlens 2 can only reach θ2, which is less than θ1.

[0070] A flat-top beam with a divergence angle of θ1 is used as the first flat-top beam, and a flat-top beam with a divergence angle of θ2 is used as the second flat-top beam. The homogenizing phase provided in related technologies is used as the second homogenizing phase. After calculating the corresponding replication and splicing phase using the method provided in this application, and combining it with the second homogenizing phase, a superlens 2 can be generated to shape a Gaussian beam with a divergence angle of θ0 into a first flat-top beam with a divergence angle of θ1.

[0071] As shown in the figure, the process by which the superlens 2 shapes the Gaussian beam with a divergence angle of θ0 into the first flat-top beam with a divergence angle of θ1 can be regarded as first shaping the Gaussian beam with a divergence angle of θ0 into the second flat-top beam with a divergence angle of θ2, and then copying and splicing the second flat-top beam with a divergence angle of θ2 into the first flat-top beam with a divergence angle of θ1.

[0072] Understandably, since each replicated second flat-top beam originates from superlens 2, there will be some overlap between them immediately upon exiting superlens 2. Figure 3 In the process, the first flat-top beam obtained by splicing the replicated second flat-top beams that have just exited from the superlens 2 will exhibit uneven intensity distribution. However, after propagating a certain distance, the overlap between the replicated second flat-top beams will decrease to a negligible level, and will no longer adversely affect the uniformity of the spliced ​​first flat-top beam.

[0073] In one embodiment, based on a first divergence angle and a second divergence angle, the number of copies required to replicate and stitch together the first and second flat-top beams, and the diffraction angle required for the replicated second flat-top beam, are obtained, including:

[0074] The number of copies is calculated based on the ratio between the first divergence angle and the second divergence angle.

[0075] The diffraction angle is calculated based on the number of copies and the second divergence angle. The diffraction angle is positively correlated with the number of copies and with the second divergence angle.

[0076] In this embodiment, after determining the first divergence angle satisfied by the first flat-top beam target and the second divergence angle satisfied by the second flat-top beam, the first divergence angle can be divided by the second divergence angle, and then the resulting ratio can be rounded up to calculate the number of copies required for the second flat-top beam.

[0077] Applying the principles of diffraction optics, the inventors of this application discovered that the diffraction angle required for the second flat-top beam after replication is positively correlated with the number of replications and also positively correlated with the second divergence angle. That is, as the number of replications increases, the diffraction angle required for the second flat-top beam after replication increases; similarly, as the second divergence angle increases, the diffraction angle required for the second flat-top beam after replication also increases. Therefore, based on the principles of diffraction optics and further combined with experimental data, a semi-empirical formula can be established to describe the mathematical relationship between the diffraction angle required for the second flat-top beam after replication, the number of replications, and the second divergence angle. Thus, after calculating the number of replications, and combining this semi-empirical formula with the second divergence angle, the diffraction angle required for the second flat-top beam after replication can be calculated.

[0078] In one embodiment, after calculating the ratio of the first divergence angle to the second divergence angle, if the ratio is not an integer, the second divergence angle of the second flat-top beam is adjusted so that the ratio is an integer.

[0079] In detail, if the ratio of the first divergence angle to the second divergence angle is not an integer, the number of replicas of the second flat-top beam will slightly exceed the mathematically required practicality, resulting in the actual divergence angle of the first flat-top beam satisfying high uniformity being greater than the first divergence angle. In this case, the first flat-top beam can simultaneously achieve high uniformity and a large divergence angle, but the portion exceeding the first divergence angle is essentially wasted, leading to lower optical efficiency in the first divergence angle region.

[0080] Therefore, in this embodiment, by adjusting the second divergence angle of the second flat-top beam, the ratio of the first divergence angle to the second divergence angle is made to be an integer. This makes the actual divergence angle of the first flat-top beam that satisfies high uniformity equal to the first divergence angle, thereby concentrating the light energy as much as possible in the first divergence angle region. This ensures that the first flat-top beam can not only simultaneously achieve high uniformity and a large divergence angle, but also maintain high optical efficiency.

[0081] In one embodiment, the two-dimensional coordinate system constituting the beam observation surface includes a first direction axis and a second direction axis that are perpendicular to each other; the number of copies includes the number of copies required on the first direction axis and the number of copies required on the second direction axis; and the diffraction angle includes the diffraction angle required on the first direction axis and the diffraction angle required on the second direction axis.

[0082] Understandably, the beam observation surface used to observe the beam imaging results is a two-dimensional plane. Therefore, the two-dimensional coordinate system constituting the beam observation surface includes a first direction axis and a second direction axis that are perpendicular to each other. In this embodiment, the first flat-top beam obtained by target shaping must satisfy the characteristics of a flat-top beam on both the first and second direction axes; that is, the light intensity of the first flat-top beam on the first direction axis and the light intensity on the second direction axis must both exhibit the characteristics of being uniformly distributed in the middle region and decreasing sharply in the edge region.

[0083] Therefore, in this embodiment, the second flat-top beam obtained by the second uniform phase shaping satisfies the characteristics of a flat-top beam on both the first and second directional axes.

[0084] Determine the divergence angle θ that the target satisfies on the first directional axis for the first flat-top beam. x And the divergence angle α satisfied by the second flat-top beam on the first directional axis. Then use the divergence angle θ x Dividing by the divergence angle α and then rounding the resulting ratio up yields the required number of copies M of the second flat-top beam along the first directional axis. Then, combining the number of copies M and the divergence angle α, a semi-empirical formula is used to calculate the required diffraction angle μ of the copied second flat-top beam along the first directional axis. x μ x = f(M,α).

[0085] Similarly, determine the divergence angle θ that the first flat-top beam satisfies on the second directional axis. y And the divergence angle β satisfied by the second flat-top beam on the second directional axis. Then use the divergence angle θ y Dividing by the divergence angle β and then rounding the resulting ratio up gives the required number of copies N of the second flat-top beam along the second directional axis. Then, combining the number of copies N and the divergence angle β, the required diffraction angle μ of the copied second flat-top beam along the second directional axis is calculated using the following formula. y μ y = f(N,β).

[0086] Then, based on the required number of copies M on the first direction axis and the required diffraction angle μ on the first direction axis... x The required number of copies N on the second direction axis; the required diffraction angle μ on the second direction axis. y By determining the wavelength of the second flat-top beam and the positional distribution of the micro / nano structures to be arranged, a target image suitable for two-dimensional shaping can be constructed. Then, phase recovery is performed on the target image to obtain a replicating and stitching phase suitable for two-dimensional shaping. Finally, by combining the second uniform beam phase and the replicating and stitching phase, a first flat-top beam can be generated to shape the Gaussian beam into a beam that meets the requirements of two-dimensional shaping.

[0087] In one embodiment, based on the number of copies, diffraction angle, wavelength of the second flat-top beam, and positional distribution of the micro / nanostructures to be arranged on the superlens, a target image is constructed to describe how the copied second flat-top beams are stitched together into a first flat-top beam by the micro / nanostructures at the distributed positions, including:

[0088] Based on the spot diameter of the Gaussian beam projected onto the superlens and the sampling period of the micro / nano structures to be arranged, the number of samples of the micro / nano structures to be arranged is calculated; the sampling period and the number of samples together constitute the position distribution.

[0089] Based on the number of copies, diffraction angle, wavelength, sampling period, and sampling number, the arrangement period of the dot matrix to be arranged in the target image is calculated.

[0090] The target size of the target image is determined according to the sampling period and the number of samples. The dot matrix is ​​then arranged in the image of the target size according to the number of copies and the arrangement period to obtain the target image. The dot matrix consists of a number of copies of points, and the distance between adjacent points in the dot matrix conforms to the arrangement period.

[0091] It should be noted that the positional distribution of the micro- and nanostructures to be arranged on the superlens consists of two main parts: the sampling period and the number of samples. The sampling period primarily describes the spacing between adjacent micro- and nanostructures; the number of samples primarily describes the quantity of micro- and nanostructures in the corresponding dimension. Understandably, once the sampling period and the number of samples are determined, the positional distribution of the micro- and nanostructures can be determined.

[0092] In this embodiment, the sampling period for the micro / nano structure to be arranged is predetermined; therefore, to determine its positional distribution, the number of samples also needs to be determined. Thus, in this embodiment, the diameter of the spot on the superlens projected by the Gaussian beam is determined to determine the range of light to be modulated by the superlens. Specifically, for the spot on the superlens projected by the Gaussian beam, the maximum light intensity of the spot can be measured first, and then the light intensity within the spot equal to the maximum light intensity can be measured. The position is twice the maximum light intensity; the light intensity is equal to the position of the maximum light intensity. The position of the point is taken as the boundary of the light spot. The diameter of the light spot can be determined by combining the boundary position of the light spot with the center position of the light spot.

[0093] Since the spot diameter can be used to describe the range of light to be modulated by the superlens, the required size of the superlens target can be further determined based on the spot diameter. Combined with the sampling period, the number of samples for the micro / nano structures to be arranged can then be determined. The micro / nano structures can be arranged on the surface of the superlens facing the light source, or on the surface of the superlens facing the beam observation plane.

[0094] Furthermore, in this embodiment, by arranging a dot matrix in the target image, the target image describes the replication and splicing of the second flat-top beam into the first flat-top beam by a micro-nano structure with the sampling period and the number of samples.

[0095] Specifically, the target size of the target image is determined according to the sampling period and the number of samples, thereby enabling the target image to describe the execution subject of the copying and stitching process (i.e., the micro-nano structure with the sampling period and the number of samples). Then, according to the number of copies, a dot matrix composed of the number of copies is arranged in the image of the target size, thereby enabling the target image to describe the execution action of the copying and stitching process, but not yet to describe the processing object and processing result of the copying and stitching process (i.e., when only the number of points in the dot matrix is ​​determined, the target image only has the ability to describe "copying and stitching a certain beam", but not yet to describe "which beam is copied and stitched", nor "which beam is obtained after copying and stitching").

[0096] Therefore, in order to further enable the target image to describe the processing objects and results of the copying and splicing process, this embodiment applies the principle of diffraction optics. Based on the number of copies required for the second flat-top beam, the diffraction angle required for the copied second flat-top beam, the wavelength of the second flat-top beam, the sampling period of the micro / nano structure to be arranged, and the number of samples, the arrangement period of the dot matrix in the target image is calculated. This arrangement period is mainly used to describe the distance between adjacent points in the dot matrix to be arranged; wherein, the distance between adjacent points is mainly described by the number of unit distances between adjacent points (for example: the target image is a 100*100 pixel matrix, and the unit distance of this matrix is ​​the size of a single pixel; at the same time, the dot matrix to be arranged consists of 3*3 points, and the arrangement period of this dot matrix to be arranged is 4. Therefore, a 3*3 dot matrix is ​​arranged in the 100*100 pixel matrix, and the spacing between adjacent points is controlled to be 4 pixels).

[0097] Therefore, according to the number of copies, a dot matrix composed of the number of copies is arranged in the image of the target size, and the distance between adjacent points in the dot matrix is ​​controlled according to the arrangement period. This results in a target image that describes the execution subject of the copying and stitching process (i.e., the micro-nano structure with the sampling period and the number of samples), the execution action of the copying and stitching process (i.e., copying and stitching a certain beam), the processing object of the copying and stitching process (i.e., the second flat-top beam), and the processing result of the copying and stitching process (i.e., the first flat-top beam).

[0098] In one embodiment, the number of samples of the micro / nano structures to be arranged is calculated based on the diameter of the spot of the Gaussian beam projected onto the superlens and the sampling period of the micro / nano structures to be arranged, including:

[0099] Based on the spot diameter, the required size of the superlens target is calculated, where the size is positively correlated with the spot diameter;

[0100] The number of samples is calculated based on the ratio between the sampling period and the size.

[0101] In this embodiment, the required size of the superlens target is positively correlated with the diameter of the spot of the Gaussian beam incident on the surface. The larger the spot diameter, the larger the required size of the superlens target. After calculating the required size of the superlens target, this size is divided by the sampling period of the micro / nanostructure to be arranged and rounded up to obtain the number of samples of the micro / nanostructure to be arranged.

[0102] In one embodiment, considering the intensity distribution characteristics of the Gaussian beam, in order to enable the superlens to receive most of the energy of the Gaussian beam to achieve high optical efficiency, while ensuring that the size and cost of the superlens are not too large, the required size of the superlens is set to be greater than or equal to 1.3 times the diameter of the spot of the Gaussian beam projected onto the superlens, and less than or equal to 1.7 times the diameter of the spot.

[0103] When the required size of the target of the superlens is less than 1.3 times the diameter of the light spot, the optical efficiency of the superlens will be too low; while when the required size of the target of the superlens is greater than 1.7 times the diameter of the light spot, although the superlens can achieve a very high optical efficiency, its size and cost will also be too high.

[0104] Preferably, in one embodiment, the required size of the superlens target is greater than or equal to 1.4 times the diameter of the spot of the Gaussian beam projected onto the superlens, and less than or equal to 1.6 times the diameter of the spot.

[0105] In one embodiment, the arrangement period of the dot matrix to be arranged in the target image is calculated based on the number of copies, diffraction angle, wavelength, sampling period, and number of samples, including:

[0106] Based on the wavelength and sampling period, the maximum diffraction angle that the replicated second flat-top beam can achieve under the conditions of wavelength and sampling period is calculated. The maximum diffraction angle is positively correlated with the wavelength and negatively correlated with the sampling period.

[0107] Based on the maximum diffraction angle, the number of copies, the diffraction angle, and the number of samples, the arrangement period is calculated. The arrangement period is inversely correlated with the maximum diffraction angle and the number of copies, and positively correlated with the diffraction angle and the number of samples.

[0108] Based on the principles of diffraction optics, the inventors of this application have made the following findings: 1. In this application, the arrangement period of the dot matrix to be arranged in the target image is mainly constrained by the following four factors: the maximum diffraction angle achievable by the second flat-top beam after replication, the number of replications required for the second flat-top beam, the required diffraction angle for the second flat-top beam after replication, and the sampling number of the micro / nano structures to be arranged. Specifically, the arrangement period of the dot matrix to be arranged is inversely correlated with the maximum diffraction angle achievable by the second flat-top beam after replication, inversely correlated with the number of replications required for the second flat-top beam, positively correlated with the required diffraction angle for the second flat-top beam after replication, and positively correlated with the sampling number of the micro / nano structures to be arranged. 2. The maximum diffraction angle achievable by the second flat-top beam after replication is mainly constrained by the following two factors: the wavelength of the second flat-top beam and the sampling period of the micro / nano structures to be arranged. Specifically, the maximum diffraction angle achievable by the second flat-top beam after replication is positively correlated with the wavelength of the second flat-top beam and inversely correlated with the sampling period of the micro / nano structures to be arranged.

[0109] Therefore, in this embodiment, the maximum diffraction angle that the replicated second flat-top beam can achieve is first calculated based on the wavelength of the second flat-top beam and the sampling period of the micro / nano structure to be arranged. Then, based on the maximum diffraction angle that the replicated second flat-top beam can achieve, the number of replicates required for the second flat-top beam, the diffraction angle required for the replicated second flat-top beam, and the sampling number of the micro / nano structure to be arranged, the arrangement period of the dot matrix to be arranged in the target image is calculated.

[0110] In one embodiment, the divergence angle (half-angle) of the Gaussian beam emitted by the light source is 13°, the wavelength of the Gaussian beam is 850 nm, and the distance between the light source and the phase modulation surface of the superlens is 1.4 mm. The superlens is square, the sampling period of the micro / nano structures to be arranged on the superlens is 0.4 μm, and the distance between the superlens and the beam observation surface is 50 cm.

[0111] In this embodiment, the flat-top beam obtained by target shaping needs to meet the characteristics of a flat-top beam in both the horizontal and vertical directions of the beam observation surface. Specifically, while ensuring high uniformity, the superlens needs to be able to shape the Gaussian beam into a first flat-top beam with a divergence angle (half-angle) of 60° in both the horizontal and vertical directions. However, if the obtained second uniform phase is used directly, the superlens can only shape the Gaussian beam into a second flat-top beam with a divergence angle (half-angle) of 20° in both the horizontal and vertical directions.

[0112] Let λ be the wavelength of the second flat-top beam; ω be the diameter of the spot projected onto the superlens by the Gaussian beam; P be the sampling period of the micro / nano structure to be arranged; and NP be the number of samples in the horizontal direction. x The number of samples in the vertical direction is NPy The divergence angle of the first flat-top beam in the horizontal direction is θ. x The divergence angle in the vertical direction is θ. y The second flat-top beam has a horizontal divergence angle of α and a vertical divergence angle of β; the required number of copies of the second flat-top beam in the horizontal direction is M, and the required number of copies in the vertical direction is N; the required diffraction angle of the second flat-top beam after horizontal copying is μ. x The required diffraction angle for the second flat-top beam after vertical replication is μ. y The arrangement period of the dots to be arranged in the target image in the horizontal direction is np. x The arrangement period in the vertical direction is np y .

[0113] The second flat-top beam has the same wavelength λ as the Gaussian beam, which is 850 nm; the spot diameter ω is 646 μm; the sampling period P is 0.4 μm; and the divergence angle θ of the first flat-top beam in the horizontal direction is... x The divergence angle θ in the vertical direction is 60°. y The first beam has a horizontal divergence angle of 60°; the second flat-top beam has a horizontal divergence angle α of 20° and a vertical divergence angle β of 20°. Therefore, M, N, and μ can be calculated using the following formula. x μ y NP x NP y :

[0114]

[0115]

[0116] μ x =f(M,α)=f(3,20°)=40°

[0117] μ y =f(N,β)=f(3,20°)=40°

[0118]

[0119]

[0120] Then, based on the wavelength λ of the second flat-top beam and the sampling period P of the micro / nano structure to be arranged, the maximum diffraction angle achievable by the second flat-top beam after replication in the horizontal direction can be calculated; further, based on the maximum diffraction angle achievable by the second flat-top beam after replication in the horizontal direction, the required number of replications M in the horizontal direction, and the actual required diffraction angle μ in the horizontal direction... xThe number of samples NP of the micro / nano structures to be arranged in the horizontal direction x The arrangement period np of the lattice to be arranged can then be calculated in the horizontal direction. x The calculated np x It is 957.

[0121] Similarly, based on the wavelength λ of the second flat-top beam and the sampling period P of the micro / nano structure to be arranged, the maximum diffraction angle achievable by the replicated second flat-top beam in the vertical direction can be calculated; further, based on the maximum diffraction angle achievable by the replicated second flat-top beam in the vertical direction, the required number of replicates N in the vertical direction, and the actual required diffraction angle μ in the vertical direction... y The number of samples NP of the micro / nano structures to be arranged in the horizontal direction y The arrangement period np of the lattice to be arranged can then be calculated in the horizontal direction. y The calculated np y It is 957.

[0122] Therefore, the target image is set to NP. x *NP y The matrix is ​​of size 2423*2423. Then, an M*N 3*3 dot matrix is ​​placed within this matrix. Each point in this dot matrix is ​​set to a value of 1, while all other points in the matrix are set to 0. The points in this dot matrix have a horizontal period of np. x The arrangement period in the vertical direction is np y That is, the points in this matrix have a horizontal arrangement period of 957 and a vertical arrangement period of 957. The numerical value of a point in the matrix corresponding to the target image represents the normalized light intensity of the corresponding pixel; if the value of a point in the target image is set to 1, it means that the normalized light intensity of the corresponding pixel is set to the highest value of 1; conversely, if the value of a point in the target image is set to 0, it means that the normalized light intensity of the corresponding pixel is set to the lowest value of 0.

[0123] After constructing the target image, the GS algorithm is applied to perform phase recovery to obtain the replicated and stitched phase. Then, combining the second homogenized phase and the replicated and stitched phase, the target phase required by the micro / nano structures to be arranged on the superlens is obtained. After determining the target phase, micro / nano structures that can provide the target phase can be selected by searching a pre-established micro / nano database. The selected micro / nano structures are then arranged to design the superlens layout. Based on the designed layout, a superlens for shaping a Gaussian beam into a first flat-top beam with a divergence angle (half-angle) of 60° in both the horizontal and vertical directions can be generated.

[0124] Figure 4 This diagram illustrates how, in this embodiment, the second flat-top beam is replicated and stitched together to form the first flat-top beam, which is then reflected on the beam observation surface. See also... Figure 4 In this embodiment, the generated superlens is equivalent to copying the second flat-top beam three times in both the horizontal and vertical directions, and then splicing them together to obtain the first flat-top beam.

[0125] Figure 5 This diagram illustrates the two-dimensional normalized light intensity distribution of the first flat-top beam obtained by shaping in this embodiment on the beam observation plane. Figure 6 This diagram illustrates the distribution of one-dimensional normalized light intensity of the first flat-top beam obtained by shaping in this embodiment in the horizontal direction. Figure 6 The horizontal axis represents the horizontal coordinate axis of the beam observation surface. The origin of this horizontal coordinate axis is the intersection of the optical axis and the beam observation surface. The unit of this horizontal coordinate axis is μm. Figure 6 The vertical axis represents the normalized intensity of the light beam.

[0126] The radius of the observation area within the beam observation plane used to determine the intensity uniformity of the first flat-top beam in the horizontal direction is denoted as R. Since the divergence angle of the first flat-top beam in the horizontal direction is 60°, the distance between the superlens and the beam observation plane is 50 cm, and the size of the superlens is negligible compared to this distance, the trigonometric theorem can be applied to determine R = 50 cm * tan(60°), that is, R is approximately 8.66 × 10⁻⁶. 5 μm. That is, it should be ±8.66 × 10 in the horizontal direction. 5 Within an observation area of ​​μm, the intensity uniformity F of the first flat-top beam with a horizontal divergence angle of 60° is determined. The formula for calculating the intensity uniformity F is as follows:

[0127]

[0128] Among them, I max I represents the maximum normalized light intensity in the observation area. min The minimum normalized light intensity within the observation area.

[0129] according to Figure 6 The calculated light intensity uniformity F is 98.74%. That is, the first flat-top beam shaped in this embodiment has a light intensity uniformity of 98.74% within a divergence angle of 60°. Therefore, it can be seen that the first flat-top beam shaped in this embodiment simultaneously achieves high uniformity and a large divergence angle. Furthermore, according to... Figure 6 The optical efficiency of the optical system corresponding to the superlens was calculated to be 83.22%. It can be seen that the first flat-top beam obtained by shaping in this embodiment not only has high uniformity and large divergence angle, but also has excellent optical efficiency.

[0130] Figure 7 A block diagram of the superlens generation apparatus for beam homogenization provided in this application is shown. The superlens to be generated is used to shape a Gaussian beam into a first flat-top beam, the first flat-top beam aiming to satisfy a first divergence angle and a desired uniformity; see [link to relevant documentation]. Figure 7 The device includes:

[0131] The second uniform beam phase acquisition module 210 is configured to acquire a second uniform beam phase for shaping a Gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle and the expected uniformity, and the second divergence angle is smaller than the first divergence angle.

[0132] The copy splicing parameter acquisition module 220 is configured to acquire, based on the first divergence angle and the second divergence angle, the number of copies required to obtain the first flat-top beam and the second flat-top beam, as well as the diffraction angle required for the copied second flat-top beam after copying and splicing.

[0133] The target image construction module 230 is configured to construct a target image describing how the second flat-top beam is copied and stitched together into a first flat-top beam by the micro-nano structures to be arranged on the superlens, based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the positional distribution of the micro-nano structures to be arranged on the superlens.

[0134] The copy-stitching phase recovery module 240 is configured to perform phase recovery on the target image to obtain the copy-stitching phase required for the positional distribution of the micro / nano structure;

[0135] The superlens generation module 250 is configured to generate a superlens for shaping a Gaussian beam into a first flat-top beam based on a second homogenizing phase and a replicated splicing phase.

[0136] In an exemplary embodiment of this application, the copy splicing parameter acquisition module 220 is configured as follows:

[0137] The number of copies is calculated based on the ratio between the first divergence angle and the second divergence angle.

[0138] The diffraction angle is calculated based on the number of copies and the second divergence angle, where the diffraction angle is positively correlated with the number of copies and also positively correlated with the second divergence angle.

[0139] In an exemplary embodiment of this application, the two-dimensional coordinate system constituting the beam observation surface includes a first direction axis and a second direction axis that are perpendicular to each other; the number of copies includes the number of copies required on the first direction axis and the number of copies required on the second direction axis; and the diffraction angle includes the diffraction angle required on the first direction axis and the diffraction angle required on the second direction axis.

[0140] In an exemplary embodiment of this application, the target image construction module 230 is configured as follows:

[0141] Based on the spot diameter of the Gaussian beam projected onto the superlens and the sampling period of the micro / nano structures to be arranged, the number of samples of the micro / nano structures to be arranged is calculated; the sampling period and the number of samples together constitute the position distribution.

[0142] Based on the number of copies, diffraction angle, wavelength, sampling period, and sampling number, the arrangement period of the dot matrix to be arranged in the target image is calculated.

[0143] The target size of the target image is determined according to the sampling period and the number of samples. The dot matrix is ​​then arranged in the image of the target size according to the number of copies and the arrangement period to obtain the target image. The dot matrix consists of a number of copies of points, and the distance between adjacent points in the dot matrix conforms to the arrangement period.

[0144] In an exemplary embodiment of this application, the target image construction module 230 is configured as follows:

[0145] Based on the spot diameter, the required size of the superlens target is calculated, where the size is positively correlated with the spot diameter;

[0146] The number of samples is calculated based on the ratio between the sampling period and the size.

[0147] In an exemplary embodiment of this application, the required size of the superlens target is greater than or equal to 1.3 times the spot diameter and less than or equal to 1.7 times the spot diameter.

[0148] In an exemplary embodiment of this application, the target image construction module 230 is configured as follows:

[0149] Based on the wavelength and sampling period, the maximum diffraction angle that the replicated second flat-top beam can achieve under the conditions of wavelength and sampling period is calculated. The maximum diffraction angle is positively correlated with the wavelength and negatively correlated with the sampling period.

[0150] Based on the maximum diffraction angle, the number of copies, the diffraction angle, and the number of samples, the arrangement period is calculated. The arrangement period is inversely correlated with the maximum diffraction angle and the number of copies, and positively correlated with the diffraction angle and the number of samples.

[0151] This application also provides a superlens for homogenizing light, which is generated using the method provided in any of the above-described method embodiments. Referring to the methods provided in any of the above-described method embodiments, the specific generation process of the superlens will not be repeated here.

[0152] This application also provides a light homogenizing system. Figure 8A layout diagram of a light-uniforming system according to an embodiment of this application is shown. See also... Figure 8 The homogenizing system provided in this application includes: a light source 1 for emitting a diverging Gaussian beam, and a superlens 2 for homogenizing the Gaussian beam. Using the superlens 2, the Gaussian beam emitted by the light source 1 with a divergence angle of θ0 can be shaped into a first flat-top beam with a divergence angle of θ1; the first flat-top beam simultaneously satisfies high homogenization and a large divergence angle. The superlens 2 is generated using the method provided in any of the above-described method embodiments. Referring to the method provided in any of the above-described method embodiments, the specific generation process of the superlens 2 will not be repeated here.

[0153] This application also provides an electronic device. This electronic device is manifested in the form of a general-purpose computing device. The components of the electronic device may include, but are not limited to: at least one processing unit, at least one storage unit, and a bus connecting different system components (including the storage unit and the processing unit).

[0154] The storage unit stores program code, which can be executed by the processing unit to perform the steps of the exemplary embodiments described in the various exemplary embodiments above. For example, the processing unit can perform actions such as... Figure 1 The steps shown are as follows.

[0155] The storage unit may include readable media in the form of volatile storage units, such as random access memory (RAM) and / or cache storage units, and may further include read-only memory (ROM).

[0156] The storage unit may also include a program / utility having a set (at least one) of program modules, including but not limited to: an operating system, one or more application programs, other program modules, and program data, each or some combination of these examples may include an implementation of a network environment.

[0157] A bus can represent one or more of several types of bus structures, including a memory cell bus or memory cell controller, a peripheral bus, a graphics acceleration port, a processing unit, or a local bus that uses any of the various bus structures.

[0158] This application also provides a computer-readable storage medium storing computer-readable instructions thereon, which, when executed by a computer's processing unit, cause the computer to perform the method provided in any of the above embodiments.

[0159] Other embodiments of this application will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of this application that follow the general principles of this application and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this application are indicated by the appended claims.

Claims

1. A method for generating a superlens for homogenizing light, characterized in that, The superlens to be generated is used to shape the Gaussian beam into a first flat-top beam, the first flat-top beam satisfying a first divergence angle and a desired uniformity; the method includes: A second uniform phase is obtained for shaping the Gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle and a desired uniformity, and the second divergence angle is smaller than the first divergence angle. Based on the first divergence angle and the second divergence angle, in order to replicate and splice the first flat-top beam, the required number of copies of the second flat-top beam and the required diffraction angle of the replicated second flat-top beam are obtained. Based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the positional distribution of the micro-nano structures to be arranged on the superlens, a target image is constructed to describe how the second flat-top beam is copied and stitched together by the micro-nano structures with the positional distribution to form the first flat-top beam. Phase recovery is performed on the target image to obtain the replication and splicing phase required by the micro / nano structure with the positional distribution; Based on the second homogenizing phase and the replicated splicing phase, a superlens is generated to shape the Gaussian beam into the first flat-top beam.

2. The method according to claim 1, characterized in that, Based on the first divergence angle and the second divergence angle, the number of copies required to replicate and stitch together the first flat-top beam and the second flat-top beam, as well as the diffraction angle required for the replicated second flat-top beam, are obtained, including: The number of copies is calculated based on the ratio between the first divergence angle and the second divergence angle; The diffraction angle is calculated based on the number of copies and the second divergence angle, wherein the diffraction angle is positively correlated with the number of copies and positively correlated with the second divergence angle.

3. The method according to claim 1, characterized in that, The two-dimensional coordinate system constituting the beam observation surface includes a first direction axis and a second direction axis that are perpendicular to each other; the number of copies includes the number of copies required on the first direction axis and the number of copies required on the second direction axis, and the diffraction angle includes the diffraction angle required on the first direction axis and the diffraction angle required on the second direction axis.

4. The method according to claim 1, characterized in that, Based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the positional distribution of the micro / nano structures to be arranged on the superlens, a target image is constructed to describe how the copied second flat-top beams are stitched together to form the first flat-top beam by the micro / nano structures at the specified positions. This includes: Based on the diameter of the spot projected by the Gaussian beam onto the superlens and the sampling period of the micro / nano structures to be arranged, the number of samples of the micro / nano structures to be arranged is calculated; the sampling period and the number of samples together constitute the position distribution. Based on the number of copies, the diffraction angle, the wavelength, the sampling period, and the number of samples, the arrangement period of the dot matrix to be arranged in the target image is calculated; The target size of the target image is determined according to the sampling period and the sampling quantity, and the dot matrix is ​​arranged in the image of the target size according to the copy quantity and the arrangement period to obtain the target image, wherein the dot matrix is ​​composed of the copy quantity of points, and the distance between adjacent points in the dot matrix conforms to the arrangement period.

5. The method according to claim 4, characterized in that, Based on the diameter of the spot projected by the Gaussian beam onto the superlens and the sampling period of the micro / nanostructure to be arranged, the number of samples of the micro / nanostructure to be arranged is calculated, including: Based on the spot diameter, the required size of the superlens target is calculated, wherein the size is positively correlated with the spot diameter; The number of samples is calculated based on the ratio between the sampling period and the size.

6. The method according to claim 5, characterized in that, The size is greater than or equal to 1.3 times the diameter of the light spot and less than or equal to 1.7 times the diameter of the light spot.

7. The method according to claim 4, characterized in that, Based on the number of copies, the diffraction angle, the wavelength, the sampling period, and the number of samples, the arrangement period of the dot matrix to be arranged in the target image is calculated, including: Based on the wavelength and the sampling period, the maximum diffraction angle that the replicated second flat-top beam can achieve under the conditions of the wavelength and the sampling period is calculated, wherein the maximum diffraction angle is positively correlated with the wavelength and negatively correlated with the sampling period; The arrangement period is calculated based on the maximum diffraction angle, the number of copies, the diffraction angle, and the number of samples. The arrangement period is inversely correlated with the maximum diffraction angle and the number of copies, and is positively correlated with the diffraction angle and the number of samples.

8. A superlens generating apparatus for homogenizing light, characterized in that, The superlens to be generated is used to shape the Gaussian beam into a first flat-top beam, the first flat-top beam satisfying a first divergence angle and a desired uniformity; the apparatus includes: The second uniform beam phase acquisition module is configured to acquire a second uniform beam phase for shaping the Gaussian beam into a second flat-top beam, wherein the second flat-top beam satisfies a second divergence angle and the expected uniformity, and the second divergence angle is smaller than the first divergence angle. The copy splicing parameter acquisition module is configured to, based on the first divergence angle and the second divergence angle, acquire the number of copies required for the second flat-top beam and the diffraction angle required for the copied second flat-top beam in order to copy and splice the first flat-top beam. The target image construction module is configured to construct a target image describing how the second flat-top beam is copied and stitched together by the micro-nano structures to be arranged on the superlens, based on the number of copies, the diffraction angle, the wavelength of the second flat-top beam, and the positional distribution of the micro-nano structures to be arranged on the superlens. The copy-stitching phase recovery module is configured to perform phase recovery on the target image to obtain the copy-stitching phase required by the micro / nano structure with the positional distribution. The superlens generation module is configured to generate a superlens for shaping the Gaussian beam into the first flat-top beam based on the second uniform phase and the replicated splicing phase.

9. A superlens for homogenizing light, characterized in that, The superlens is generated using the method described in any one of claims 1-7.

10. A light homogenizing system, characterized in that, The homogenizing system includes: a light source for emitting a Gaussian beam, and a superlens for homogenizing the Gaussian beam; the superlens is generated by the method described in any one of claims 1-7.

11. An electronic device, characterized in that, include: One or more processing units; A storage unit for storing one or more programs, which, when executed by the one or more processing units, cause the electronic device to perform the method as described in any one of claims 1 to 7.

12. A computer-readable storage medium, characterized in that, It stores computer-readable instructions that, when executed by a computer's processing unit, cause the computer to perform the method described in any one of claims 1 to 7.

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