A nuclide synthesis hot cell and a method of cleaning the same

CN117790029BActive Publication Date: 2026-09-08XUZHOU HUAYI PHARM CO LTD
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Patent Information

Application Number
CN202311833212.3
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2023-12-28
Publication Date
2026-09-08
Estimated Expiration
2043-12-28

AI Technical Summary

Technical Problem

[0003]但是现有技术中对于合成热室的清洗大都采用高压水泵直接对合成热室内部进行冲击,通过水流的冲击去除残留在合成热室内部的残留污物,但是此种方法由于高压水泵的冲击力过大极易引起设备的损毁

Benefits of technology

[0022] (1) The present invention provides a radionuclide synthesis hot chamber that is easy to clean and a cleaning method thereof. By using the synthesis chamber, the exhaust mechanism and the cleaning mechanism in cooperation, the residual gas in the synthesis chamber is completely removed by the exhaust mechanism using nitrogen, and the synthesis chamber is cleaned by the ultrasonic mechanism. This allows the toxic gas to be completely removed while the synthesis chamber is cleaned. Compared with the prior art, the combination of nitrogen and ultrasonic waves improves the cleaning degree of the synthesis chamber and reduces the residue of toxic gases.

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Abstract

The application discloses a nuclide synthesis hot chamber convenient to clean and a cleaning method thereof, which comprises a synthesis chamber, an exhaust mechanism arranged on the top of the synthesis chamber, and a cleaning mechanism arranged on the inner side of the synthesis chamber. The synthesis chamber comprises a synthesis cavity, a partition plate arranged in the synthesis cavity, and an ultrasonic cleaner arranged at the bottom of the partition plate. The ultrasonic cleaner is arranged in a plurality of pieces and is fixedly connected to the bottom of the partition plate uniformly. A laser three-dimensional scanner is fixedly connected to the top of the synthesis cavity. The exhaust mechanism comprises a gas storage cavity, a main pipeline arranged on one side of the gas storage cavity, and a gas conveying assembly arranged in the gas storage cavity. The main pipeline is used for conveying the gas in the gas storage cavity to the synthesis chamber and exhausting the residual gas in the synthesis chamber. The cleaning mechanism is mainly used for conveying cleaning liquid to the synthesis chamber to clean the synthesis chamber. The combination of nitrogen and ultrasonic waves improves the cleaning degree of the synthesis chamber and reduces the residual toxic gas.
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Description

Technical Field

[0001] This invention relates to the field of radionuclide synthesis hot chambers, and more particularly to a radionuclide synthesis hot chamber that is easy to clean and a cleaning method thereof. Background Technology

[0002] A radionuclide synthesis hot chamber is a device used to synthesize radionuclides. It typically includes a reaction chamber to contain raw materials and reactants, and a control system to control reaction conditions and product collection. Radionuclides are usually synthesized in the hot chamber using nuclear reactions such as nuclear fission or nuclear fusion. These radionuclides have significant applications in medical diagnosis, treatment, and scientific research. Strict safety measures and operating procedures are required for radionuclide synthesis hot chambers to ensure the safety of personnel and the environment.

[0003] However, in existing technologies, the cleaning of the synthesis heat chamber mostly involves using a high-pressure water pump to directly impact the inside of the synthesis heat chamber. The impact of the water flow removes the residual dirt inside the synthesis heat chamber. However, this method is prone to damage to the equipment due to the excessive impact force of the high-pressure water pump. Summary of the Invention

[0004] This invention overcomes the shortcomings of the prior art and provides a radionuclide synthesis hot chamber that is easy to clean and a cleaning method thereof.

[0005] To achieve the above objectives, the technical solution adopted by the present invention is as follows: a nuclide synthesis hot chamber that is easy to clean, comprising: a synthesis chamber, an exhaust mechanism disposed at the top of the synthesis chamber, and a cleaning mechanism disposed inside the synthesis chamber.

[0006] The synthesis chamber includes: a synthesis cavity, a partition inside the synthesis cavity, and an ultrasonic cleaner at the bottom of the partition; several ultrasonic cleaners are provided and are evenly and fixedly connected to the bottom of the partition, and a laser 3D scanner is fixedly connected to the top of the synthesis cavity.

[0007] The exhaust mechanism includes: a gas storage chamber, a main pipe disposed on one side of the gas storage chamber, and a gas delivery assembly disposed inside the gas storage chamber; the main pipe is used to deliver the gas in the gas storage chamber to the synthesis chamber and exhaust the residual gas in the synthesis chamber.

[0008] The cleaning unit is mainly used to deliver cleaning fluid to the synthesis chamber for cleaning.

[0009] In a preferred embodiment of the present invention, a partition is fixedly connected to the synthesis chamber, and the partition divides the synthesis chamber into a synthesis room and a cleaning room, with the cleaning mechanism disposed in the cleaning room.

[0010] In a preferred embodiment of the present invention, the gas storage cavity includes: a main cavity and a separation plate disposed in the main cavity; the main cavity is L-shaped, and the separation plate is fixedly connected to the L-shaped corner of the main cavity to separate the main cavity into a gas storage cavity and a gas delivery cavity.

[0011] In a preferred embodiment of the present invention, the separation plate and the top of the gas delivery chamber are both provided with fixing holes, and the bottom of the gas storage chamber is fixedly connected with a pin. The pin and the two fixing holes are located on the same axis. The gas storage chamber also includes a nitrogen tank, which is threadedly connected to the fixing holes.

[0012] In a preferred embodiment of the present invention, the main pipeline includes a main pipeline, two inlet pipes and an outlet pipe respectively disposed on both sides of the main pipeline; a one-way valve for controlling gas flow is fixedly connected inside both the inlet pipes and the outlet pipes.

[0013] In a preferred embodiment of the present invention, the upper and lower ends of the main pipe are fixedly connected to the gas delivery chamber and the synthesis chamber, respectively. One end of each of the two air inlet pipes is fixedly connected to the bottom of the gas storage chamber, and the other end is fixedly connected to the upper and lower ends of the main pipe, respectively. One end of each of the two air outlet pipes is fixedly connected to the upper and lower ends of the main pipe, and the other end is fixedly connected to the top of the synthesis chamber.

[0014] In a preferred embodiment of the present invention, the gas delivery assembly is disposed in the gas delivery chamber. The gas delivery assembly includes: a movable plate, a sliding shaft fixedly connected to the movable plate, and a gas delivery motor; one end of the gas delivery motor is rotatably connected to a rotating shaft, one end of the rotating shaft is rotatably connected to one end of the sliding shaft, and the sliding shaft is slidably connected to the gas delivery chamber.

[0015] In a preferred embodiment of the present invention, the cleaning mechanism includes: a cleaning liquid tank and a water pump threadedly connected to the cleaning liquid tank; the water pump is connected to the synthesis chamber via a short pipe.

[0016] A cleaning method for a nuclide synthesis hot chamber that is easy to clean, based on a cleaning method for synthesis hot chambers, includes the following steps:

[0017] S1: Nitrogen stored inside the gas storage chamber is continuously fed into the synthesis chamber through the gas delivery assembly to purge the gas inside the synthesis chamber.

[0018] S2: Scan the inside of the synthesis chamber, create a 3D model, and obtain information on the residual contaminants inside the synthesis chamber;

[0019] S3: The ultrasonic cleaner uses the residual dirt obtained in S2 to emit ultrasonic waves of different frequencies to clean the synthetic cavity.

[0020] In a preferred embodiment of the present invention, in S2, the scanning is specifically performed by a laser 3D scanner, and the unevenness of the interior of the synthesis cavity is obtained through 3D modeling, thereby determining the residual dirt in the synthesis cavity.

[0021] This invention addresses the shortcomings of the prior art and has the following beneficial effects:

[0022] (1) The present invention provides a radionuclide synthesis hot chamber that is easy to clean and a cleaning method thereof. By using the synthesis chamber, the exhaust mechanism and the cleaning mechanism in cooperation, the residual gas in the synthesis chamber is completely removed by the exhaust mechanism using nitrogen, and the synthesis chamber is cleaned by the ultrasonic mechanism. This allows the toxic gas to be completely removed while the synthesis chamber is cleaned. Compared with the prior art, the combination of nitrogen and ultrasonic waves improves the cleaning degree of the synthesis chamber and reduces the residue of toxic gases.

[0023] (2) This invention provides a radionuclide synthesis hot chamber that is easy to clean and its cleaning method. Through the practical cooperation between an ultrasonic cleaner, a gas storage chamber, and a gas delivery assembly, nitrogen gas from the gas storage chamber is introduced into the synthesis chamber via the gas delivery assembly. The ultrasonic cleaner then performs the cleaning. Under the action of nitrogen gas, the formation and collapse of bubbles in the ultrasonic waves are more rapid and intense. Furthermore, the introduction of nitrogen gas enhances the oxidizing and reducing properties of the cleaning solution. This is because nitrogen gas can react with water to generate active substances such as hydrogen ions and nitrate ions. These active substances can accelerate the dissolution and removal of dirt and impurities, thus enabling the nitrogen gas to effectively clean the synthesis chamber while simultaneously expelling residual gas. Attached Figure Description

[0024] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0025] Figure 1 This is a perspective structural diagram of a preferred embodiment of the present invention;

[0026] Figure 2 This is a schematic cross-sectional view of the exhaust mechanism according to a preferred embodiment of the present invention;

[0027] Figure 3 This is a schematic cross-sectional view of the cleaning mechanism according to a preferred embodiment of the present invention;

[0028] In the picture:

[0029] 1. Synthesis chamber; 10. Synthesis cavity; 11. Partition; 12. Ultrasonic cleaner; 14. Synthesis room; 15. Cleaning room;

[0030] 2. Exhaust mechanism; 20. Gas storage chamber; 201. Main chamber; 202. Separation plate; 203. Gas storage chamber; 204. Gas delivery chamber; 21. Main pipeline; 211. Main pipeline; 212. Inlet pipe; 213. Outlet pipe; 22. Gas delivery assembly; 221. Moving plate; 222. Sliding shaft; 223. Gas delivery motor; 224. Rotating shaft; 23. Nitrogen tank;

[0031] 3. Cleaning mechanism; 30. Water pump; 31. Cleaning fluid tank; 32. Short pipe. Detailed Implementation

[0032] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0033] Many specific details are set forth in the following description in order to provide a full understanding of the invention. However, the invention may also be practiced in other ways different from those described herein. Therefore, the scope of protection of the invention is not limited to the specific embodiments disclosed below.

[0034] In the description of this application, it should be understood that the terms "center," "longitudinal," "lateral," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," and "outer," etc., indicating orientation or positional relationships based on the orientation or positional relationships shown in the accompanying drawings, are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting the scope of protection of this application. Furthermore, the terms "first," "second," etc., are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of indicated technical features. Therefore, features defined with "first," "second," etc., may explicitly or implicitly include one or more of that feature. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.

[0035] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to mechanical connections or electrical connections; they can refer to direct connections or indirect connections through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art will understand the specific meaning of the above terms in this application based on the specific circumstances.

[0036] like Figure 1 and Figure 2 As shown, a heat chamber for easy cleaning of radionuclide synthesis includes: a synthesis chamber 1, an exhaust mechanism 2 disposed on the top of the synthesis chamber 1, and a cleaning mechanism 3 disposed inside the synthesis chamber 1.

[0037] It should be noted that the exhaust mechanism 2 is located at the top of the synthesis chamber 1 and is connected to the synthesis chamber 1. The exhaust mechanism 2 delivers the nitrogen stored inside to the synthesis chamber 1 to exhaust all the residual gas inside the synthesis chamber 1. Finally, the cleaning mechanism 3 cleans the inside of the synthesis chamber 1.

[0038] A cleaning method for a nuclide synthesis hot chamber that is easy to clean, based on a cleaning method for synthesis hot chambers, includes the following steps:

[0039] S1: The nitrogen stored inside the gas storage chamber 203 20 is continuously fed into the synthesis chamber 10 through the gas conveying assembly 22 to purge the gas inside the synthesis chamber 10.

[0040] S2: Scan the inside of the synthesis chamber 10, create a 3D model, and obtain information on the residual contaminants inside the synthesis chamber 10;

[0041] S3: The ultrasonic cleaner 12 uses ultrasonic waves of different frequencies to clean the synthetic cavity 10 based on the amount of dirt residue obtained in S2.

[0042] In a preferred embodiment of the present invention, in S2, the scanning is specifically performed by scanning with a laser 3D scanner, and the unevenness inside the synthesis cavity 10 is obtained through 3D modeling, thereby determining the residual dirt inside the synthesis cavity 10.

[0043] Synthesis chamber 1 includes: synthesis cavity 10, partition 11 disposed inside synthesis cavity 10, and ultrasonic cleaner 12 disposed at the bottom of partition 11; a plurality of ultrasonic cleaners 12 are disposed and uniformly fixedly connected to the bottom of partition 11, and a laser three-dimensional scanner is fixedly connected to the top of synthesis cavity 10.

[0044] In a preferred embodiment of the present invention, the partition 11 is fixedly connected to the synthesis chamber 10, and the partition 11 divides the synthesis chamber 10 into a synthesis room 14 and a cleaning room 15, and the cleaning mechanism 3 is disposed in the cleaning room 15.

[0045] It should be noted that the partition 11 is fixedly connected to the inside of the synthesis chamber 10, thereby dividing the synthesis chamber 10 into upper and lower parts. The upper part is the synthesis room 14, and the lower part is the cleaning room. The laser 3D scanner is fixedly connected to the top of the synthesis room 14, and the laser 3D scanner is equipped with laser beam emission modules facing all four directions to ensure that the entire synthesis room 14 can be completely scanned. By emitting lasers into the synthesis room 14 and measuring the reflection time, the 3D coordinate data of the synthesis room 14 is obtained, thereby modeling the entire synthesis room 14 and comparing it with the original unused synthesis room 14 to check the contamination situation inside the synthesis room 14. The synthesis room 14 is a single-tank synthesis heat chamber, and its interior is equipped with... A drug synthesis module is provided, that is, a drug synthesis module is set above the partition 11 for drug synthesis. Several ultrasonic cleaners 12 are uniformly fixedly connected to the bottom of the partition 11. The partition 11 is made of isotropic and homogeneous glass material. Isotropic and homogeneous glass material means that the properties of its material are the same in all directions. That is, the physical, chemical and mechanical properties of the material are consistent in different directions. The performance of such glass material is uniform and consistent in all directions and will not show significant differences due to changes in direction. Isotropic and homogeneous glass material usually has good acoustic coupling, electromagnetic shielding and optical properties, so that the partition 11 will not block the ultrasonic waves emitted by the ultrasonic cleaners 12.

[0046] During operation, a laser 3D scanner scans the synthesis chamber 14, uses the scanned data to create a model, and compares the model with data from a model of an unused synthesis chamber 14 to determine the level of contamination. An ultrasonic cleaner 12 then uses ultrasonic waves to clean the synthesis chamber 14 based on the level of contamination. Ultrasonic cleaning is a technique that uses microbubbles generated by high-frequency vibrations to clean the surface of objects. By applying ultrasonic cleaning at different intensities at different locations, different types of dirt and impurities can be effectively cleaned. Furthermore, appropriate cleaning fluids and ultrasonic equipment can be selected based on the specific conditions of the synthesis chamber and the nature of the contamination to achieve the best cleaning results. In areas with more contamination, the power of the ultrasonic cleaner 12 is increased; in areas with less contamination, the power is decreased.

[0047] The exhaust mechanism 2 includes: a gas storage chamber 203 body 20, a main pipe 21 disposed on one side of the gas storage chamber 203 body 20, and a gas delivery assembly 22 disposed inside the gas storage chamber 203 body 20; the main pipe 21 is used to deliver the gas in the gas storage chamber 203 body 20 to the synthesis chamber 1 and exhaust the residual gas in the synthesis chamber 1.

[0048] In a preferred embodiment of the present invention, the gas storage chamber 203 body 20 includes: a main chamber 201 and a separation plate 202 disposed in the main chamber 201; the main chamber 201 is L-shaped, and the separation plate 202 is fixedly connected to the L-shaped corner inside the main chamber 201 to separate the main chamber 201 into a gas storage chamber 203 and a gas delivery chamber 204.

[0049] In a preferred embodiment of the present invention, the top of the separation plate 202 and the gas delivery chamber 204 are both provided with fixing holes, and the bottom of the gas storage chamber 203 is fixedly connected with a pin. The pin and the two fixing holes are located on the same axis. The body 20 of the gas storage chamber 203 also includes a nitrogen tank 23, which is threadedly connected to the fixing holes.

[0050] In a preferred embodiment of the present invention, the main pipe 21 includes a main pipe 211, two air inlet pipes 212 and an air outlet pipe 213 respectively disposed on both sides of the main pipe 211; a one-way valve for controlling gas flow is fixedly connected in both the air inlet pipe 212 and the air outlet pipe 213.

[0051] In a preferred embodiment of the present invention, the upper and lower ends of the main pipe 211 are fixedly connected to the gas delivery chamber 204 and the synthesis chamber 14, respectively. One end of each of the two air inlet pipes 212 is fixedly connected to the bottom of the gas storage chamber 203, and the other end is fixedly connected to the upper and lower ends of the main pipe 211, respectively. One end of each of the two air outlet pipes 213 is fixedly connected to the upper and lower ends of the main pipe 211, and the other end is fixedly connected to the top of the synthesis chamber 14.

[0052] It should be noted that the main cavity 201 is L-shaped, and the separation plate 202 is fixedly connected to it, thereby separating the L-shaped main cavity 201 into a horizontally arranged gas delivery cavity 204 and a vertically arranged gas storage cavity 203. A fixing hole is provided on the separation plate 202 for threaded connection and fixation of the nitrogen tank 23. The fixing hole on the separation plate 202 connects the gas delivery cavity 204 and the gas storage cavity 203. A similar fixing hole is also provided on the top of the gas delivery cavity 204, directly above the separation plate 202. The gas storage cavity 203... A pin is fixedly connected to the bottom of the device, and the center of the pin and the two fixing holes are on the same axis. The main pipe 211 is located at the bottom of the middle position of the gas supply chamber 204. The two ends of the main pipe 211 are fixedly connected to the gas supply chamber 204 and the synthesis chamber 14, respectively. The two ends of the two inlet pipes 212 connect the bottom of the gas storage chamber 203 to the upper and lower parts of the main pipe 211, respectively. The two ends of the two outlet pipes 213 connect the upper and lower parts of the main pipe 211 to the synthesis chamber 14, respectively. One-way valves are installed in the inlet pipes 212 and the outlet pipes 213.

[0053] During operation, nitrogen gas is loaded into nitrogen tank 23 under high pressure. The top of nitrogen tank 23 is equipped with an airtight core. When in use, the nitrogen cylinder is threaded into the fixing hole to fix nitrogen tank 23. After fixing, the ejector pin pushes the airtight core upward, causing the airtight core to open. Nitrogen gas inside nitrogen tank 23 flows into gas storage chamber 203. Gas delivery component 22 operates, and nitrogen gas is discharged into synthesis chamber 14 through inlet pipe 212, main pipe 211 and outlet pipe 213. Nitrogen gas is used to purge residual gas in synthesis chamber 14 to prevent toxic and harmful gases from harming human health.

[0054] In a preferred embodiment of the present invention, the gas delivery assembly 22 is disposed in the gas delivery chamber 204. The gas delivery assembly 22 includes: a movable plate 221, a sliding shaft 222 fixedly connected to the movable plate 221, and a gas delivery motor 223. One end of the gas delivery motor 223 is rotatably connected to a rotating shaft 224, one end of the rotating shaft 224 is rotatably connected to one end of the sliding shaft 222, and the sliding shaft 222 is slidably connected to the gas delivery chamber 204.

[0055] It should be noted that the movable plate 221 is slidably connected to the inside of the main pipe 211, thereby dividing the main pipe 211 into upper and lower parts. The top of the movable plate 221 is fixedly connected to the sliding shaft 222. The two ends of the rotating shaft 224 are respectively rotatably connected to the gas transmission motor 223 and the sliding shaft 222. The sliding shaft 222 is set through the gas transmission chamber 204.

[0056] During operation, the gas delivery motor 223 rotates, thereby driving the rotating shaft 224 to move. The rotating shaft 224 is eccentrically connected to the gas delivery motor 223, so that the rotating shaft 224 moves up and down in the vertical direction. This, in turn, drives the moving plate 221 to move up and down through the sliding shaft 222. The connection between the sliding shaft 222 and the gas delivery chamber 204 is sealed. When the moving plate 221 moves upward, the one-way valve of the lower inlet pipe 212 is opened, allowing nitrogen from the bottom of the gas storage chamber 203 to enter the lower part of the main pipe 211. At the same time, the one-way valve in the upper outlet pipe 213 is opened, pushing the nitrogen in the upper part of the main pipe 211 into the synthesis chamber 14. When the moving plate 221 moves downward, the one-way valves in the upper inlet pipe 212 and the lower outlet pipe 213 are opened, thereby introducing the nitrogen in the gas storage chamber 203 into the synthesis chamber 14 and purging the gas in the synthesis chamber 14.

[0057] The cleaning mechanism 3 is mainly used to deliver cleaning fluid to the synthesis chamber 1 to clean the synthesis chamber 1.

[0058] In a preferred embodiment of the present invention, the cleaning mechanism 3 includes: a cleaning liquid tank 31, and a water pump 30 threadedly connected to the cleaning liquid tank 31; the water pump 30 is connected to the synthesis chamber 14 through a short pipe 32.

[0059] During operation, the water pump 30 is positioned within the cleaning chamber. An opening on one side of the cleaning unit is used to secure the cleaning fluid tank 31. A short pipe 32 connects to both ends of the water pump 30 and the synthesis chamber 14. This allows the water pump 30 to pump the cleaning fluid from the tank 31 into the synthesis chamber 14 after nitrogen is used to expel residual gas from the chamber. The cleaning fluid then covers the chamber. The ultrasonic cleaner 12 then uses ultrasonic waves, generated based on a model created by a laser 3D scanner, to clean the synthesis chamber 14. The nitrogen gas alters the physical and chemical properties of the cleaning fluid, making the formation and collapse of bubbles in the ultrasonic waves more rapid and intense. The introduction of nitrogen increases the gas content in the cleaning fluid, reducing its density and increasing its fluidity. This accelerates the propagation of ultrasonic waves within the cleaning fluid, enhancing its energy and range. Furthermore, the tiny bubbles generated by nitrogen in the cleaning fluid expand and collapse more easily under the influence of ultrasonic waves. This is because nitrogen is less dense than air, making the formed tiny bubbles more easily compressed and stretched under the influence of ultrasonic waves. Meanwhile, nitrogen is chemically stable and does not readily react with other substances, thus it will not adversely affect the propagation of ultrasound or the cleaning effect. The introduction of nitrogen also enhances the oxidizing and reducing properties of the cleaning solution. This is because nitrogen can react with water to generate active substances such as hydrogen ions and nitrate ions, which can accelerate the dissolution and removal of dirt and impurities.

[0060] Based on the preferred embodiments of the present invention described above, those skilled in the art can make various changes and modifications without departing from the inventive concept. The technical scope of this invention is not limited to the contents of the specification, but must be determined according to the scope of the claims.

Claims

1. A heat chamber for nuclide synthesis that is easy to clean, comprising: A synthesis chamber, an exhaust mechanism disposed at the top of the synthesis chamber, and a cleaning mechanism disposed inside the synthesis chamber, characterized in that, The synthesis chamber includes: a synthesis cavity, a partition disposed inside the synthesis cavity, and an ultrasonic cleaner disposed at the bottom of the partition; a plurality of ultrasonic cleaners are disposed and uniformly fixedly connected to the bottom of the partition, and a laser 3D scanner is fixedly connected to the top of the synthesis cavity; The exhaust mechanism includes: a gas storage chamber, a main pipe disposed on one side of the gas storage chamber, and a gas delivery assembly disposed inside the gas storage chamber; the main pipe is used to deliver the gas in the gas storage chamber to the synthesis chamber and exhaust the residual gas in the synthesis chamber. The cleaning mechanism is used to deliver cleaning fluid to the synthesis chamber for cleaning; The gas storage cavity includes: a main cavity and a separation plate disposed within the main cavity; the main cavity is L-shaped, and the separation plate is fixedly connected to the L-shaped corner within the main cavity, dividing the main cavity into a gas storage cavity and a gas delivery cavity; The separation plate and the top of the gas delivery chamber are both provided with fixing holes. The bottom of the gas storage chamber is fixedly connected with a pin. The pin and the two fixing holes are located on the same axis. The gas storage chamber also includes a nitrogen tank, which is threadedly connected to the fixing holes. The main pipeline includes a main pipeline, two air inlet pipes and an air outlet pipe respectively disposed on both sides of the main pipeline; a one-way valve for controlling gas flow is fixedly connected inside the air inlet pipe and the air outlet pipe.

2. The easily cleanable radionuclide synthesis hot chamber according to claim 1, characterized in that: The partition is fixedly connected to the synthesis chamber, and the partition divides the synthesis chamber into a synthesis room and a cleaning room. The cleaning mechanism is located in the cleaning room.

3. The easily cleanable radionuclide synthesis hot chamber according to claim 1, characterized in that: The main pipeline is fixedly connected to the gas delivery chamber and the synthesis chamber at its upper and lower ends, respectively. One end of each of the two air inlet pipes is fixedly connected to the bottom of the gas storage chamber, and the other end is fixedly connected to the upper and lower ends of the main pipeline, respectively. One end of each of the two air outlet pipes is fixedly connected to the upper and lower ends of the main pipeline, and the other end is fixedly connected to the top of the synthesis chamber.

4. The easily cleanable radionuclide synthesis hot chamber according to claim 1, characterized in that: The gas delivery assembly is disposed in the gas delivery chamber. The gas delivery assembly includes: a movable plate, a sliding shaft fixedly connected to the movable plate, and a gas delivery motor; one end of the gas delivery motor is rotatably connected to a rotating shaft, one end of the rotating shaft is rotatably connected to one end of the sliding shaft, and the sliding shaft is slidably connected to the gas delivery chamber.

5. The easily cleanable radionuclide synthesis hot chamber according to claim 1, characterized in that: The cleaning mechanism includes a cleaning liquid tank and a water pump threadedly connected to the cleaning liquid tank; the water pump is connected to the synthesis chamber via a short pipe.

6. A cleaning method for a nuclide synthesis hot chamber that is easy to clean, based on the cleaning method for a synthesis hot chamber according to any one of claims 1-5, characterized in that, Includes the following steps: S1: Nitrogen stored inside the gas storage chamber is continuously fed into the synthesis chamber through the gas delivery assembly to purge the gas inside the synthesis chamber. S2: Scan the inside of the synthesis chamber, create a 3D model, and obtain information on the residual contaminants inside the synthesis chamber; S3: The ultrasonic cleaner uses the residual dirt obtained in S2 to emit ultrasonic waves of different frequencies to clean the synthetic cavity.

7. A cleaning method for a easily cleanable nuclide synthesis hot chamber according to claim 6, characterized in that: In S2, the scanning is specifically performed by scanning with a laser 3D scanner, and the unevenness inside the synthesis cavity is obtained through 3D modeling, thereby determining the residual dirt inside the synthesis cavity.

Citation Information

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