A plasma device for functionally gradient modification of an insulating surface based on airflow control

Abstract

The present invention discloses a plasma device for functionally gradient modification of an insulating surface based on airflow control. The key points of the technical solution are as follows: It includes a streamlined gas collection and equalization gas path and a medium leakage concentration gradient module connected to the streamlined gas collection and equalization gas path. The medium leakage concentration gradient module is connected to an exhaust gas collection module, and the exhaust gas collection module is connected to an exhaust gas treatment device. One end of the medium leakage concentration gradient module is connected to a plasma reaction module. The technical effects are as follows: It enables the modification of the surface of a pot-type insulator under atmospheric pressure, deposits a film with a decreasing gradient, improves the surface electric field intensity distribution of the pot-type insulator, and improves the electric field distortion at its "three-junction point". At the same time, it is equipped with a gas storage device to collect the discharged working gas and prevent environmental pollution.

Description

Technical Field

[0001] The present invention relates to the technical field of material surface modification, and particularly relates to a plasma device for insulating surface functional gradient modification based on air flow control. Background Art

[0002] The plasma state is the fourth state of matter and can be generated under normal temperature and pressure. Plasma contains a large number of high-energy and highly chemically active electrons, ions, excited state particles, etc. These active particles can directly act on the material surface, and complex physical and chemical effects such as physical etching and chemical modification occur at the nano-to-micron scale. While changing the physical morphology and chemical composition of the material surface without affecting the basic structure of the material, it can effectively improve the surface properties such as the hydrophobicity and physicochemical properties of the material, so that the material meets the needs of daily use. Compared with traditional material modification methods, plasma material surface modification has the advantages of energy conservation, environmental protection, convenient operation, low reaction temperature, and easy implementation of multi-scenario applications, and has broad application prospects in the field of material surface treatment.

[0003] In practical applications, the sizes of many materials to be processed are large. For example, the pot-type insulator has a large volume and needs to be processed on both the inner and outer sides. Therefore, requirements are put forward for the plasma material modification device. To realize the application of plasma material modification to pot-type insulators, indirect dielectric barrier discharge is particularly important. Indirect dielectric barrier discharge is not restricted by the volume of the processed material and the reaction space. By blowing out high-energy plasma and reaction media, it can play the greatest role in the limited space of the material to be processed. For example, it can reach into the inner side of the pot-type insulator for processing, which cannot be achieved by surface dielectric barrier discharge. And to realize indirect dielectric barrier discharge, only factors such as the device structure, the thickness of the discharge blocking medium, the concentration of the reaction gas and their mixing timing, and the temperature and humidity of the environment need to be considered. To sum up, the traditional plasma discharge method cannot realize the surface treatment of large-scale pot-type insulators, while indirect dielectric barrier discharge can effectively overcome some problems existing in other plasma discharges.

[0004] A gis pot-type insulator surface fluorination device with the Chinese patent publication number CN117198665A treats the surface of the pot-type insulator through fluorination technology, deposits a certain thickness of film while cleaning the surface dust, and improves the electric field strength distribution on the surface of the pot-type insulator. However, the fluorination treatment requires a low-pressure environment, the conditions are harsh, and the use of fluorine-containing gases will cause harm to operators; in addition, the uniform-thickness fluorination film on the insulator surface has an unsatisfactory improvement effect on the electric field strength of the insulator surface.

[0005] An SDBD modification device for generating large-area uniform plasma, with the Chinese patent publication number CN114423138B, introduces an electric field gradient and a reaction gas concentration gradient in the reaction zone through surface dielectric barrier discharge, thereby forming a gradient film on the surface of the object to be processed. However, this method is only applicable to relatively thin objects to be processed because its reaction space is relatively narrow and it cannot process large-scale devices such as pot-type insulators.

[0006] An atmospheric pressure large-scale DBD material modification device based on gas path modularization, with the Chinese patent publication number CN114286488B, deposits a film with an almost uniform thickness on the surface of the object to be processed through indirect dielectric barrier discharge of plasma, and multiple samples can be processed simultaneously due to its large size. However, the film with a uniform thickness improves the surface field strength of the pot-type insulator far less than the gradient film, and it is not easy to process the pot-type insulator due to the large size of the device.

[0007] A preparation method of a pot-type insulator with a low strain gradient structure, with the Chinese patent publication number CN117382059A, controls the filler contents of three different gradients within the set volume fractions, and the produced pot-type insulator can better ensure its service performance. However, compared with the surface material modification of the pot-type insulator, the modification of the bulk insulator has complex steps and high manufacturing costs, and is not suitable for large-area application and promotion. The surface modification of the pot-type insulator is green and environmentally friendly, has simple steps, and low costs.

[0008] A DBD device for surface functional gradient modification of pot-type insulators, with the Chinese patent publication number CN117316558A, controls the deposition of the gradient film by introducing six gradually decreasing circular dielectric slots on the side of the device through the method of side-pass media. However, there are spacings between the six slots, and the gradient cannot be maintained continuously, and there will be gradient faults between each slot. Moreover, the method of adding media later will cause insufficient mixing of the media and the inert gas, resulting in an unsatisfactory discharge effect.

[0009] In recent years, numerous experimental studies have shown that the modification effect of depositing a film with a gradient change on the surface of a pot-type insulator is better than that of depositing a film with a uniform thickness. Because the electric field intensity distortion at the triple junction of the high-voltage electrode of the pot-type insulator is severe, and this phenomenon becomes less obvious towards the ground electrode. Therefore, a film with a thickness gradient decreasing from the high-voltage electrode to the ground electrode has a better modification effect on the surface of the pot-type insulator material. In order to deposit a functional gradient film, many scholars have proposed different methods. Some scholars have proposed depositing a film with a discrete gradient. Although the modification effect is improved, there will be electric field distortion between each gradient layer, which affects the modification effect. Therefore, depositing a film with a continuously decreasing gradient is particularly important for the surface modification of pot-type insulators. Summary of the Invention

[0010] The object of the present invention is to provide a plasma device for functionally gradient modification of an insulating surface based on air flow control, and its advantages are as follows: it can modify the surface of a pot-type insulator under atmospheric pressure, deposit a thin film with a decreasing gradient, improve the surface electric field intensity distribution of the pot-type insulator, and at the same time, cooperate with a gas storage device to collect the discharged working gas and prevent environmental pollution.

[0011] The above technical object of the present invention is achieved through the following technical solutions: a plasma device for functionally gradient modification of an insulating surface based on air flow control, including a streamlined gas collection and equalization gas path and a medium leakage concentration gradient module connected to the streamlined gas collection and equalization gas path. The medium leakage concentration gradient module is connected to an exhaust gas collection module, the exhaust gas collection module is connected to an exhaust gas treatment device, and one end of the medium leakage concentration gradient module is connected to a plasma reaction module;

[0012] The streamlined gas collection and equalization gas path includes a fish-shaped bionic gas-slowing arc. A gas storage tank is provided inside the fish-shaped bionic gas-slowing arc. The front end of the gas storage tank is connected to a five-hole air inlet, and the side of the gas storage tank away from the five-hole air inlet is connected to a gas transmission tank, and a number of cylindrical gas equalization valves are installed on the gas transmission tank.

[0013] The present invention is further provided that: the number of the cylindrical gas equalization valves is specifically 14, and the cylinder diameter is 2.8 - 3.2 mm, and the center distance is 5.2 - 5.6 mm.

[0014] The present invention is further provided that: the medium leakage concentration gradient module includes a side leakage groove connected to the side of the gas transmission tank away from the gas storage tank. A triangular gradient baffle is provided on one side of the side leakage groove. A gradient air transmission hole in a trapezoidal structure is provided inside the triangular gradient baffle, and the side leakage groove is connected to the gradient air transmission hole.

[0015] The present invention is further provided that: the length of the side leakage groove is 80 mm, the height is 2 mm, and it forms a 45° angle downward.

[0016] The present invention is further provided that: the exhaust gas collection module includes an exhaust gas collection tank connected to the side leakage groove. An exhaust gas transmission hole is connected to the opening at one end of the exhaust gas collection tank, and the exhaust gas transmission hole is connected to the exhaust gas treatment device.

[0017] The present invention is further provided that: the exhaust gas transmission hole is a hollow cylinder, with a diameter of 8 - 8.2 mm and an inner diameter of 5.8 - 6 mm.

[0018] The present invention is further configured such that: the plasma reaction module includes a high-voltage electrode baffle, a side extension groove communicating with the gradient air supply holes is formed on the surface of the high-voltage electrode baffle, a high-voltage electrode and a ground electrode are respectively installed on the top and bottom sides of the side extension groove, a discharge blocking medium is arranged between the high-voltage electrode and the ground electrode in the side extension groove, and a plasma gas outlet communicating with the side extension groove is formed on the back surface of the high-voltage electrode baffle.

[0019] The present invention is further configured such that: the length of the plasma gas outlet is 78 - 82 mm, and the width is 2 - 4 mm.

[0020] The present invention is further configured such that: the discharge blocking medium is made of 8200 resin material, and the thickness is 1.2 - 1.7 mm.

[0021] The present invention is further configured such that: the sizes of the high-voltage electrode and the ground electrode are both 100 mm * 10 mm * 1 mm.

[0022] In summary, it is ensured that a part of the gradient-increasing gas leaks out before the working gas enters the reaction cavity, so that the outlet of the dielectric barrier discharge device can discharge the reaction medium with a decreasing concentration, generating plasma with a decreasing concentration gradient, enabling the surface modification of the pot insulator under atmospheric pressure, depositing a film with a decreasing gradient, improving the surface electric field intensity distribution of the pot insulator, and at the same time, cooperating with the gas storage device to collect the discharged working gas and prevent environmental pollution. Description of the Drawings

[0023] Figure 1 is the overall structural schematic diagram of this embodiment;

[0024] Figure 2 is the front view of this embodiment;

[0025] Figure 3 is the top view of this embodiment;

[0026] Figure 4 is the overall structural schematic diagram of the streamline-shaped gas collection and equalizing gas path used in this embodiment;

[0027] Figure 5 is the overall structural schematic diagram of the medium leakage concentration gradient module used in this example;

[0028] Figure 6 is the top view of the medium leakage concentration gradient module used in this example;

[0029] Figure 7 is the right view of the medium leakage concentration gradient module used in this example;

[0030] Figure 8This is a schematic diagram showing the overall structure of the exhaust gas collection module in this example;

[0031] Figure 9 This is a schematic diagram showing the overall structure of the plasma reaction module in this example;

[0032] Figure 10 This is a right view showing the plasma reaction module in this example;

[0033] Figure 11 This is a flowchart showing the discharge working platform in this example.

[0034] Reference numerals: 1, streamline gas collection and equalizing gas path; 2, exhaust gas collection module; 3, plasma reaction module; 4, medium leakage concentration gradient module; 5, five-hole air inlet; 6, fish-shaped bionic gas-slowing arc; 7, gas storage tank; 8, cylindrical gas equalizing valve; 9, gas transmission tank; 10, side leakage groove; 11, gradient gas transmission hole; 12, triangular gradient baffle; 13, exhaust gas transmission hole; 14, exhaust gas collection tank; 15, side extension groove; 16, high-ground electrode baffle; 17, high-voltage electrode; 18, ground electrode; 19, discharge blocking medium; 20, plasma gas outlet. Detailed implementation manners

[0035] The present invention will be further described in detail below with reference to the accompanying drawings.

[0036] Embodiment: Referring to Figures 1-11 As shown, a plasma device for functionally gradient modification of an insulating surface based on air flow control includes a streamline gas collection and equalizing gas path 1 and a medium leakage concentration gradient module 4 connected to the streamline gas collection and equalizing gas path 1. The medium leakage concentration gradient module 4 is connected to an exhaust gas collection module 2, and the exhaust gas collection module 2 is connected to an exhaust gas treatment device. One end of the medium leakage concentration gradient module 4 is connected to a plasma reaction module 3. The streamline gas collection and equalizing gas path 1 includes a fish-shaped bionic gas-slowing arc 6. A gas storage tank 7 is provided inside the fish-shaped bionic gas-slowing arc 6. The front end of the gas storage tank 7 is connected to a five-hole air inlet 5. One side of the gas storage tank 7 away from the five-hole air inlet 5 is connected to a gas transmission tank 9, and a plurality of cylindrical gas equalizing valves 8 are installed on the gas transmission tank 9. The outer diameter of the five-hole air inlet 5 in the streamline gas collection and equalizing gas path 1 is 10 mm, the inner diameter is 6 mm, the wall thickness is 2 mm, and it is externally connected to a PVE plastic gas pipe. The working gas enters through the five-hole air inlet 5 and converges in the gas storage tank 7 to ensure sufficient air pressure in the gas transmission tank 9. The fish-shaped bionic gas-slowing arc 6 ensures that the gas slowly enters the gas transmission tank 9. The size of the gas transmission tank 9 is 96 mm * 80 mm * 4 mm, and the actual gas transmission channel height is 2 mm. There are 14 cylindrical gas equalizing valves 8 in total, with a cylindrical diameter of 3 mm and a center distance of 5.4 mm;

[0037] Further, the medium leakage concentration gradient module 4 includes a side leakage groove 10 connected to the side of the gas transmission tank 9 away from the gas storage tank 7. A triangular gradient baffle 12 is provided on one side of the side leakage groove 10. A gradient air transmission hole 11 in a trapezoidal structure is formed in the triangular gradient baffle 12. The side leakage groove 10 is communicated with the gradient air transmission hole 11. The size of the side leakage groove 10 in the medium leakage concentration gradient module 4 is 80mm * 2mm, with a downward inclination angle of 45°. In the cross-section, the bottom of the triangular gradient baffle 12 is 1mm and the height is 78mm. Thus, the gradient air transmission hole 11 is trapezoidal, with the upper base of 1mm, the lower base of 2mm, and the height of 78mm. After the working gas is equalized by the cylindrical gas equalizing valve 8, part of it leaks from the side leakage groove 10, and part of it is distributed in a gradient in the gradient air transmission hole 11 after passing through the triangular gradient baffle 12.

[0038] Further, the exhaust gas collection module 2 includes an exhaust gas collection tank 14 communicated with the side leakage groove 10. An exhaust gas transmission hole 13 is communicated at one open end of the exhaust gas collection tank 14. The exhaust gas transmission hole 13 is communicated with the exhaust gas treatment device. The exhaust gas collection module 2 is composed of the exhaust gas collection tank 14 and the exhaust gas transmission hole 13. The size of the exhaust gas collection tank 14 is 80mm * 12mm * 12mm. Part of the working gas leaks into the exhaust gas collection tank 14 through the side leakage groove 10, and then enters the exhaust gas treatment device through the exhaust gas transmission hole 13 connecting to a PVE plastic air pipe. The exhaust gas transmission hole 13 is a hollow cylinder, with an outer diameter of 8mm and an inner diameter of 6mm.

[0039] Further, the plasma reaction module 3 includes a high - low electrode 18 baffle 16. A side extension groove 15 communicated with the gradient air transmission hole 11 is formed on the surface of the high - low electrode 18 baffle 16. A high - voltage electrode 17 and a ground electrode 18 are respectively installed on the top, bottom, and side of the side extension groove 15. A discharge resistance medium 19 is arranged between the high - voltage electrode and the ground electrode 18 in the side extension groove 15. And a plasma outlet 20 communicated with the side extension groove 15 is formed on the back of the high - low electrode 18 baffle 16. For the plasma reaction module 3, the size of the high - low electrode 18 baffle 16 is 120mm * 30mm. The baffles at the high - voltage electrode 17 and the ground electrode 18 are symmetrically distributed. The two - side extension size of the side extension groove 15 is 20mm each, and the groove height is 30mm. Metal electrodes, aluminum electrodes, are pasted in the groove. The size of the high - voltage electrode 17 is 100mm * 10mm * 1mm, the size of the ground electrode 18 is 100mm * 10mm * 1mm, the discharge resistance medium 19 is 8200 resin, with a thickness of 1.5mm, and the size of the plasma outlet 20 is 80mm * 2mm.

[0040] Further, it is a functional gradient modification system for the insulating surface of a plasma basin insulator. After argon passes through the pressure reducing valve, a part of it is transported to Flowmeter 1 through a PVE plastic gas pipe with an outer diameter of 6 mm, and another part passes through the medium bottle. The medium is brought into the gas pipe by the bubbling method and transported to Flowmeter 2. After regulation and mixing, the final gas enters the functional gradient modification device for the insulating surface of the plasma basin insulator. A part of the leaked gas enters the waste collection system, and another part of the gas becomes plasma under the high-frequency high voltage of the parameter-adjustable excitation power supply and bombards the surface of the basin insulator along with the medium, forming a continuously gradient-changing thin film.

[0041] Operating steps: The gas enters from the five-hole air inlet 5 of the streamlined gas collection and equalization gas path 1, is collected in the gas storage tank 7 through the fish-shaped bionic gas-slowing arc 6 and then enters the gas transmission tank 9. The working gas is evenly distributed in the gas transmission tank 9 through the cylindrical gas equalization valve 8; the working gas enters the medium leakage concentration gradient module 4 from the gas transmission tank 9. A part of the gas is discharged into the waste gas collection module 2 through the side leakage groove 10. The waste gas collection tank 14 in the waste gas collection module 2 passes the waste gas into the waste gas treatment device through the waste gas transmission hole 13. Another part of the working gas, due to the action of the triangular gradient baffle 12 in the medium leakage concentration gradient module 4, passes through the gradient transmission hole 11 in a gradient manner and finally enters the plasma reaction module 3. Dielectric barrier discharge is carried out through the high-voltage electrode 17, the ground electrode 18, and the discharge blocking medium 19. Finally, the high-energy plasma in the excited state and the medium in the reaction are discharged from the plasma gas outlet 20 and bombard the surface of the material to be treated, forming a white thin film with a gradient distribution.

[0042] This specific embodiment is only an explanation of the present invention and is not a limitation thereof. Those skilled in the art can make modifications to this embodiment without creative contributions according to needs after reading this specification, but as long as they are within the scope of the claims of the present invention, they are protected by the patent law.

Claims

1. A plasma device for functional gradient modification of insulating surfaces based on gas flow control, characterized in that: The invention comprises a streamlined gas collection and uniform gas path (1) and a medium leakage concentration gradient module (4) connected to the streamlined gas collection and uniform gas path (1), wherein the medium leakage concentration gradient module (4) is connected to a waste gas collection module (2), wherein the waste gas collection module (2) is connected to a waste gas treatment device, and one end of the medium leakage concentration gradient module (4) is connected to a plasma reaction module (3); the streamlined gas collection and uniform gas path (1) comprises a fish-shaped bionic slow-gas arc (6), wherein a gas storage tank (7) is provided in the fish-shaped bionic slow-gas arc (6), wherein the front end of the gas storage tank (7) is connected to a five-hole gas inlet (5), and the gas storage tank (7) is far away from the five-hole gas inlet ( 5), one side of which is connected to a gas delivery groove (9), and a plurality of cylindrical gas equalizing valves (8) are installed on the gas delivery groove (9), the number of the cylindrical gas equalizing valves (8) being specifically 14, and the cylindrical diameter is 2.8-3.2 mm, and the center spacing is 5.2-5.6 mm. The medium leakage concentration gradient module (4) comprises a lateral gas leakage groove (10) connected to the side of the gas delivery groove (9) away from the gas storage groove (7), a triangular gradient baffle (12) is arranged on one side of the lateral gas leakage groove (10), a gradient gas delivery hole (11) of a trapezoidal structure is opened in the triangular gradient baffle (12), the lateral gas leakage groove (10) is connected to the gradient gas delivery hole (11), and the The waste gas collection module (2) comprises a waste gas collecting groove (14) connected to the side leakage groove (10), and one end opening of the waste gas collecting groove (14) is connected to a waste gas delivery hole (13), and the waste gas delivery hole (13) is connected to the waste gas treatment device. The gas enters from the five-hole air inlet (5) of the streamlined gas collecting and equalizing gas path (1), is collected in the gas storage groove (7) through the fish-shaped bionic slow air arc (6), and then enters the gas delivery groove (9), and the working gas is evenly distributed in the gas delivery groove (9) through the cylindrical equalizing valve (8); the working gas is passed from the gas delivery groove (9) to the medium leakage concentration gradient module (4), and a part of the gas is discharged through the side leakage groove (10) The waste gas enters the waste gas collection module (2), and the waste gas collecting groove (14) in the waste gas collection module (2) passes the waste gas into the waste gas treatment device through the waste gas delivery hole (13). The other part of the working gas, due to the action of the triangular gradient baffle (12) in the medium leakage concentration gradient module (4), passes through the gradient gas delivery hole (11) in a gradient manner and finally enters the plasma reaction module (3), passes through the high-voltage electrode (17), the ground electrode (18), and the discharge blocking medium (19) to perform dielectric barrier discharge, and finally the excited high-energy plasma and the reacting medium are discharged from the plasma outlet (20), bombarding the surface of the material to be treated, forming a gradient distributed white film.

2. The plasma device for functional gradient modification of insulating surface based on gas flow control according to claim 1, characterized in that: The side air leakage groove (10) has a length of 80 mm and a height of 2 mm.

3. The plasma device for functional gradient modification of insulating surface based on gas flow control according to claim 1, characterized in that: The exhaust gas delivery hole (13) is a hollow cylinder with a diameter of 8-8.2 mm and an inner diameter of 5.8-6 mm.

4. The plasma device for functional gradient modification of insulating surface based on gas flow control according to claim 1, characterized in that: The plasma outlet (20) has a length of 78-82 mm and a width of 2-4 mm.

5. The plasma device for functional gradient modification of insulating surface based on gas flow control according to claim 1, characterized in that: The discharge blocking medium (19) is made of 8200 resin material and has a thickness of 1.2-1.7 mm.

6. The plasma device for functional gradient modification of insulating surface based on gas flow control according to claim 1, characterized in that: The dimensions of the high voltage electrode (17) and the ground electrode (18) are both 100 mm*10 mm*1 mm.

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