A wavelength calibration and measurement method based on a measuring device
CN117889759BActive Publication Date: 2026-08-28WUHAN EOPTICS TECH CO LTD
Patent Information
- Application Number
- CN202311716165.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-13
- Publication Date
- 2026-08-28
- Estimated Expiration
- 2043-12-13
AI Technical Summary
Benefits of technology
[0019]本发明提供的一种基于测量设备的波长校准与测量方法,通过迭代拟合的方式得到全局样件厚度和全局入射角等不随波长改变的参数,再对其它的参数进行校准,相比现有的根据经验确定全局样件厚度和全局入射角,更为准确,那么根据全局样件厚度和全局入射角计算出的光谱穆勒矩阵更加准确。
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Abstract
The application provides a wavelength calibration and measurement method based on a measuring device, comprising: obtaining full-waveband light intensity information of a sample to be measured, and processing to obtain a measured Fourier coefficient corresponding to each wavelength; fitting and iteratively obtaining a first system parameter corresponding to each wavelength, a sample thickness and an incident angle according to the measured Fourier coefficient and a theoretical Fourier coefficient of each wavelength; fitting and iteratively obtaining a global sample thickness and a global incident angle through a specific function; fixing the global sample thickness and the global incident angle, and fitting and iteratively obtaining a second system parameter corresponding to each wavelength again; and calculating a full-waveband spectral Mueller matrix of the sample to be measured according to the measured Fourier coefficient corresponding to each wavelength and the second system parameter. The application obtains parameters such as the global sample thickness and the global incident angle which do not change with the wavelength through an iterative fitting mode, and then calibrates other parameters, which is more accurate compared with the prior art of determining the global sample thickness and the global incident angle according to experience.
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Citation Information
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