A batch detection device for photovoltaic silicon wafer detection
By designing a photovoltaic silicon wafer detection device that includes detection components, limiting components and cleaning components, the existing devices' low efficiency and silicon wafer damage during extrusion detection are solved, and a more efficient, safe and flexible detection process is achieved. And improves the cleaning effect of the silicon wafer surface.
Patent Information
- Application Number
- CN202410567953.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-09
- Publication Date
- 2025-02-18
- Estimated Expiration
- 2044-05-09
AI Technical Summary
During extrusion detection, existing photovoltaic silicon wafer detection devices are prone to damage to the electric cylinder, excessive extension distance leads to damage to the silicon wafer, and the detection head squeezes hard debris onto the silicon wafer, resulting in low detection efficiency and damage to the silicon wafer.
A batch detection device including a detection component, a limiting component and a cleaning component is designed. The detection assembly realizes detection by extension of the first and second electric cylinders, and extends the distance between the detection head and the silicon wafer by adjusting the first threaded rod. The limiting assembly avoids the detection head extension distance from the limiting seat and the second threaded rod. The cleaning assembly cleans the silicon wafer surface with the height adjustment of the sponge-material cleaning block and threaded rod.
It improves detection efficiency, avoids damage to electric cylinders and damage to silicon wafers, enhances the safety and flexibility of detection, and improves the cleaning effect of debris on the surface of silicon wafers.
Smart Images

Figure CN118398513B_ABST
Abstract
Description
Technical Field
[0001] The present invention relates to the technical field of detection devices, and in particular to a batch detection device for detecting photovoltaic silicon wafers. Background Art
[0002] Photovoltaic silicon wafers, usually made of high-purity silicon materials, are a type of semiconductor material that uses the photoelectric effect to convert solar energy into electrical energy. The quality and performance of silicon wafers directly affect the efficiency and life of solar panels. Currently, photovoltaic silicon wafers need to be tested after production, and testing equipment is needed to test photovoltaic silicon wafers.
[0003] Although the existing device can realize the strength test of photovoltaic silicon wafers through extrusion, when the driving part (electric cylinder) used for extrusion is damaged during the extrusion test, the electric cylinder needs to be replaced, which delays the detection efficiency; when the existing device performs extrusion testing, when the extension distance of the electric cylinder is too long, it is easy to cause damage to the photovoltaic silicon wafer; when the existing device performs extrusion testing, when there are hard debris on the silicon wafer, the detection head squeezes the hard debris onto the photovoltaic silicon wafer, which is easy to cause damage to the photovoltaic silicon wafer.
[0004] Therefore, in view of this, the existing structure and defects are studied and improved, and a batch detection device for photovoltaic silicon wafer detection is provided, in order to achieve a more practical purpose. Summary of the invention
[0005] In order to solve the above technical problems, the present invention provides a batch detection device for photovoltaic silicon wafer detection, so as to solve the problems that although the existing device can realize the strength detection of photovoltaic silicon wafers by extrusion, when the driving part (electric cylinder) used for extrusion is damaged during the extrusion detection, the electric cylinder needs to be replaced, which delays the detection efficiency; when the existing device performs extrusion detection, when the extension distance of the electric cylinder is too long, it is easy to cause damage to the photovoltaic silicon wafer; when the existing device performs extrusion detection, when there are hard debris on the silicon wafer, the detection head squeezes the hard debris onto the photovoltaic silicon wafer, which is easy to cause damage to the photovoltaic silicon wafer.
[0006] The present invention provides a batch detection device for photovoltaic silicon wafer detection, which specifically includes: an equipment frame; two conveying rollers are rotatably connected to the equipment frame, a conveyor belt is sleeved on the two conveying rollers, and photovoltaic silicon wafers are conveyed on the conveyor belt; a motor for driving a conveying roller on the right side is fixed to the front end surface of the equipment frame through a screw; and a detection component is fixed to the equipment frame.
[0007] Furthermore, the detection assembly is composed of a first frame, a first electric cylinder, a second electric cylinder, a first fixed block, a first spring rod, a second fixed block, a threaded tube, a first threaded rod and a detection head. The first frame is fixed to the top surface of the equipment frame. The first frame is a concave structure. A first electric cylinder is fixed to the bottom end surface of the inner wall of the first frame by a screw, and a second electric cylinder is fixed to the protruding end of the first electric cylinder.
[0008] Furthermore, a first fixed block with a rectangular block structure is fixed to the extended end of the second electric cylinder, two first spring rods are symmetrically welded to the bottom end surface of the first fixed block, and the extended ends of the two first spring rods are fixed to the second fixed block, which is a rectangular block structure.
[0009] Furthermore, a threaded tube is welded at the center of the bottom end surface of the second fixed block, a first threaded rod is connected to the inner thread of the threaded tube, a detection head is fixed at one end below the first threaded rod, the bottom of the detection head is an arc structure, and the detection head is located above the photovoltaic silicon wafer.
[0010] Furthermore, a limit assembly is installed on the first frame, and the limit assembly consists of a limit seat and a second threaded rod. The limit seat is a U-shaped structure, and the limit seat is slidably connected to the first frame. Two first spring rods are slidably connected to the limit seat. When the first electric cylinder or the second electric cylinder extends 10 cm, the bottom end surface of the first fixed block contacts the bottom end surface of the inner wall of the limit seat.
[0011] Furthermore, a second threaded rod is threadedly connected to the limit seat, and a lower end of the second threaded rod is rotatably connected to the top end surface of the first frame body, and the second threaded rod is an adjusting member of the limit seat.
[0012] Furthermore, a cleaning assembly is fixed on the equipment frame, and the cleaning assembly consists of a second frame, a guide rod, a third fixed block, a third threaded rod, a second spring rod, a fourth fixed block and a cleaning block. The second frame is fixed to the top surface of the equipment frame, and the second frame is a concave structure. Two guide rods of cylindrical rod-like structures are slidably connected to the second frame, and one end below the two guide rods is welded to a third fixed block of a rectangular block structure. A third threaded rod is threadedly connected to the second frame, and one end below the third threaded rod is rotatably connected to the top surface of the third fixed block.
[0013] Furthermore, two second spring rods are fixed to the bottom end surface of the third fixed block, and the lower ends of the two second spring rods are welded to the fourth fixed block with a rectangular plate structure. A cleaning block made of sponge material is adhered to the bottom end surface of the fourth fixed block by glue, and the bottom end surface of the cleaning block is in contact with the top surface of the photovoltaic silicon wafer.
[0014] Furthermore, the equipment frame is provided with four auxiliary grooves, all of which are rectangular groove-shaped structures, and the four auxiliary grooves together constitute an auxiliary when the equipment frame is transferred.
[0015] Compared with the prior art, the present invention has the following beneficial effects:
[0016] The present application is provided with a detection component. Through the setting of the detection component, firstly, the extrusion detection of the photovoltaic silicon wafer can be realized by extending the first electric cylinder, and when the first electric cylinder is damaged, the detection can be realized by extending the second electric cylinder; secondly, when the extension distance of the first electric cylinder and the second electric cylinder is not enough, the adjustment can be realized by rotating the first threaded rod, and the first threaded rod is rotated to move it downward to supplement the extension distance of the first electric cylinder and the second electric cylinder, and the detection can continue without immediately replacing the first electric cylinder and the second electric cylinder, and the structure is flexible.
[0017] The present application sets up a limit assembly. Through the setting of the limit assembly, on the one hand, the first fixed block can be limited by the limit seat, thereby achieving the limitation of the downward movement distance of the detection head, avoiding the damage of the photovoltaic silicon wafer caused by the downward movement distance of the detection head being too large, and having high safety; on the other hand, the limit seat can be adjusted through the second threaded rod, and the limit distance can be adjusted through adjustment, and it has high adjustability.
[0018] The present application is provided with a cleaning component. Through the setting of the cleaning component, on the one hand, by wiping the photovoltaic silicon wafer with a cleaning block, debris on the photovoltaic silicon wafer, such as small sand particles, can be cleaned, thereby preventing the detection head from squeezing small sand particles onto the photovoltaic silicon wafer, causing damage to the photovoltaic silicon wafer; on the other hand, when the third threaded rod is rotated, the height of the cleaning block can be adjusted, and by adjusting the height of the cleaning block, the cleaning effect of the cleaning block on the photovoltaic silicon wafer can be improved. BRIEF DESCRIPTION OF THE DRAWINGS
[0019] In order to more clearly illustrate the technical solution of the embodiment of the present invention, the drawings of the embodiment are briefly introduced below.
[0020] In the attached picture:
[0021] Figure 1 It shows an axial structural schematic diagram of a batch detection device for photovoltaic silicon wafer detection according to the present invention;
[0022] Figure 2 It shows a schematic diagram of the main structure of a batch detection device for photovoltaic silicon wafer detection according to the present invention;
[0023] Figure 3 A schematic diagram of the top view of the structure of a batch detection device for photovoltaic silicon wafer detection according to the present invention is shown;
[0024] Figure 4 The schematic diagram of the axial structure of the batch detection device for photovoltaic silicon wafer detection according to the present invention after a part is cut off is shown;
[0025] Figure 5 It shows a schematic diagram of the axial structure of the detection component and the limit component according to the present invention;
[0026] Figure 6 It shows a schematic diagram of the axial structure of the detection assembly according to the present invention;
[0027] Figure 7 It shows a schematic diagram of the axial structure of the limit assembly according to the present invention;
[0028] Figure 8 A schematic diagram of the axial structure of the cleaning component according to the present invention is shown.
[0029] Reference numerals list
[0030] 1. Equipment frame; 101. Conveyor roller; 102. Conveyor belt; 103. Auxiliary trough;
[0031] 2. Photovoltaic silicon wafer;
[0032] 3. Detection assembly; 301. First frame; 302. First electric cylinder; 303. Second electric cylinder; 304. First fixing block; 305. First spring rod; 306. Second fixing block; 307. Threaded tube; 308. First threaded rod; 309. Detection head;
[0033] 4. Limiting assembly; 401. Limiting seat; 402. Second threaded rod;
[0034] 5. Cleaning assembly; 501. Second frame; 502. Guide rod; 503. Third fixing block; 504. Third threaded rod; 505. Second spring rod; 506. Fourth fixing block; 507. Cleaning block. DETAILED DESCRIPTION
[0035] The following will be combined with the drawings in the embodiments of the present disclosure to clearly and completely describe the technical solutions in the embodiments of the present disclosure. Obviously, the described embodiments are only part of the embodiments of the present disclosure, not all of the embodiments. Based on the embodiments in the present disclosure, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present disclosure.
[0036] Unless otherwise defined, all terms (including technical and scientific terms) used in the embodiments of the present disclosure have the same meanings as commonly understood by those of ordinary skill in the art to which the present disclosure belongs. It should also be understood that terms such as those defined in common dictionaries should be interpreted as having meanings consistent with their meanings in the context of the relevant technology, and should not be interpreted in an idealized or extremely formal sense, unless explicitly defined in this manner in the embodiments of the present disclosure.
[0037] The "first", "second" and similar words used in the embodiments of the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "One", "one" or "the" and similar words do not indicate a quantity limitation, but indicate that there is at least one. Similarly, "including" or "comprising" and similar words mean that the element or object appearing in front of the word covers the elements or objects listed after the word and their equivalents, without excluding other elements or objects. In the following description, spatial and directional terms such as "upper", "lower", "front", "back", "top", "bottom", "vertical" and "horizontal" may be used to describe the embodiments of the present disclosure, but it should be understood that these terms are only for the convenience of describing the embodiments shown in the figures, and do not require the actual device to be constructed or operated in a specific orientation. In the following description, the use of terms such as "connect", "connect", "fix" and "attach" may refer to two elements or structures being directly connected without other elements or structures between them, or may refer to two elements or structures being indirectly connected through an intermediate element or structure, unless otherwise clearly stated in this article. Embodiment 1:
[0038] As attached Figure 1 To Attachment Figure 8 As shown:
[0039] The present invention provides a batch detection device for photovoltaic silicon wafer detection, comprising: an equipment frame 1; two conveying rollers 101 are rotatably connected to the equipment frame 1, a conveyor belt 102 is sleeved on the two conveying rollers 101, and photovoltaic silicon wafers 2 are conveyed on the conveyor belt 102; a motor for driving a right conveying roller 101 is fixed to the front end surface of the equipment frame 1 through a screw; a detection component 3 is fixed to the equipment frame 1.
[0040] Among them, the detection component 3 is composed of a first frame 301, a first electric cylinder 302, a second electric cylinder 303, a first fixed block 304, a first spring rod 305, a second fixed block 306, a threaded tube 307, a first threaded rod 308 and a detection head 309. The first frame 301 is fixed to the top surface of the equipment frame 1. The first frame 301 is a concave structure. A first electric cylinder 302 is fixed to the bottom end surface of the inner wall of the first frame 301 through a screw, and a second electric cylinder 303 is fixed to the protruding end of the first electric cylinder 302.
[0041] Among them, a first fixed block 304 with a rectangular block structure is fixed to the protruding end of the second electric cylinder 303, and two first spring rods 305 are symmetrically welded to the bottom end surface of the first fixed block 304. The protruding ends of the two first spring rods 305 are fixed to the second fixed block 306, and the second fixed block 306 is a rectangular block structure.
[0042] Among them, a threaded tube 307 is welded at the center of the bottom end surface of the second fixed block 306, and a first threaded rod 308 is connected to the inner thread of the threaded tube 307. A detection head 309 is fixed at one end below the first threaded rod 308. The bottom of the detection head 309 is an arc-shaped structure. The detection head 309 is located above the photovoltaic silicon wafer 2. When it is necessary to detect the strength of the photovoltaic silicon wafer 2, the first electric cylinder 302 is controlled to extend 10 cm. When the first electric cylinder 302 extends 10 cm, the bottom of the detection head 309 elastically contacts the top of the photovoltaic silicon wafer 2. At this time The strength detection of the photovoltaic silicon wafer 2 can be realized. When the first electric cylinder 302 is damaged and cannot be extended, the detection can be completed by controlling the extension of the second electric cylinder 303. When the second electric cylinder 303 is extended, it can drive the detection head 309 to squeeze the photovoltaic silicon wafer 2 for detection. When the first electric cylinder 302 and the second electric cylinder 303 can only extend 8cm, the detection head 309 cannot contact the photovoltaic silicon wafer 2. At this time, adjustment can be achieved by rotating the first threaded rod 308. Rotating the first threaded rod 308 to move it downward 2cm can then perform normal detection.
[0043] Among them, a limiting component 4 is installed on the first frame 301, and the limiting component 4 is composed of a limiting seat 401 and a second threaded rod 402. The limiting seat 401 is a U-shaped structure, and the limiting seat 401 is slidably connected to the first frame 301. Two first spring rods 305 are slidably connected to the limiting seat 401. When the first electric cylinder 302 or the second electric cylinder 303 is extended by 10 cm, the bottom end surface of the first fixed block 304 contacts the bottom end surface of the inner wall of the limiting seat 401. When the first electric cylinder 302 or the second electric cylinder 303 is extended to realize the strength detection of the photovoltaic silicon wafer 2, the limiting seat 401 can be used to limit the extension distance of the first electric cylinder 302 or the second electric cylinder 303, thereby avoiding damage to the photovoltaic silicon wafer 2 when the first electric cylinder 302 or the second electric cylinder 303 is extended for too long.
[0044] Among them, a second threaded rod 402 is threadedly connected to the limit seat 401, and the lower end of the second threaded rod 402 is rotatably connected to the top surface of the first frame 301. The second threaded rod 402 is an adjustment part of the limit seat 401. When the height of the limit seat 401 needs to be adjusted, the second threaded rod 402 can be directly rotated. Under the thread drive of the second threaded rod 402, the height adjustment of the limit seat 401 can be achieved.
[0045] Among them, a cleaning component 5 is fixed on the equipment frame 1, and the cleaning component 5 is composed of a second frame 501, a guide rod 502, a third fixed block 503, a third threaded rod 504, a second spring rod 505, a fourth fixed block 506 and a cleaning block 507. The second frame 501 is fixed to the top surface of the equipment frame 1. The second frame 501 is a concave structure. Two guide rods 502 with cylindrical rod-like structures are slidably connected to the second frame 501. The lower ends of the two guide rods 502 are welded to a third fixed block 503 with a rectangular block structure. A third threaded rod 504 is threadedly connected to the second frame 501, and the lower end of the third threaded rod 504 is rotatably connected to the top surface of the third fixed block 503.
[0046] Among them, two second spring rods 505 are fixed to the bottom end surface of the third fixed block 503, and the lower ends of the two second spring rods 505 are welded to the fourth fixed block 506 of a rectangular plate structure. A cleaning block 507 made of sponge material is adhered to the bottom end surface of the fourth fixed block 506 by glue, and the bottom end surface of the cleaning block 507 is in contact with the top end surface of the photovoltaic silicon wafer 2. When the conveyor belt 102 drives the photovoltaic silicon wafer 2 to move, the cleaning block 507 wipes the top of the photovoltaic silicon wafer 2, so that the top end surface of the photovoltaic silicon wafer 2 can be cleaned. Embodiment 2:
[0047] On the basis of the first embodiment, four auxiliary grooves 103 are provided on the equipment frame 1, and the four auxiliary grooves 103 are all rectangular groove structures. The four auxiliary grooves 103 together constitute an auxiliary structure for the equipment frame 1 when it is transferred. When transferring, the two forklift arms can be clamped in the four auxiliary grooves 103, which can prevent the equipment frame 1 from shaking during the transfer process.
[0048] The specific usage and function of this embodiment are as follows:
[0049] When in use, the photovoltaic silicon wafer 2 is placed on the conveyor belt 102, and the driving motor on the equipment frame 1 is controlled to rotate. When the driving motor rotates, the conveyor belt 102 can be driven to move; at the same time, the first electric cylinder 302 is controlled to continuously extend for detection. When the strength of the photovoltaic silicon wafer 2 needs to be detected, the first electric cylinder 302 is controlled to extend 10 cm. When the first electric cylinder 302 extends 10 cm, the bottom of the detection head 309 is elastically in contact with the top of the photovoltaic silicon wafer 2. At this time, the strength detection of the photovoltaic silicon wafer 2 can be achieved. When the first electric cylinder 302 is damaged and cannot be extended, the detection can be completed by controlling the second electric cylinder 303 to extend. When the second electric cylinder 303 extends, it can drive the detection head 309 to squeeze the photovoltaic silicon wafer 2 for detection; when the first electric cylinder 302 and the second electric cylinder When the first electric cylinder 302 or the second electric cylinder 303 can only be extended by 8 cm, the detection head 309 cannot contact the photovoltaic silicon wafer 2. At this time, the adjustment can be achieved by rotating the first threaded rod 308. The first threaded rod 308 is rotated to move it downward by 2 cm, and then normal detection can be performed; at the same time, when the first electric cylinder 302 or the second electric cylinder 303 is extended to realize the strength detection of the photovoltaic silicon wafer 2, the limit seat 401 can be used to limit the extension distance of the first electric cylinder 302 or the second electric cylinder 303, thereby avoiding damage to the photovoltaic silicon wafer 2 when the first electric cylinder 302 or the second electric cylinder 303 extends too long; when the height of the limit seat 401 needs to be adjusted, the second threaded rod 402 can be directly rotated, and the height of the limit seat 401 can be adjusted under the thread drive of the second threaded rod 402;
[0050] When the conveyor belt 102 drives the photovoltaic silicon wafer 2 to move, the top of the photovoltaic silicon wafer 2 can be cleaned by wiping the top of the photovoltaic silicon wafer 2 with the cleaning block 507. When the cleaning effect needs to be improved, the third threaded rod 504 can be directly rotated. Under the squeezing of the third threaded rod 504, the cleaning block 507 is in tighter contact with the photovoltaic silicon wafer 2, and the cleaning effect is better.
[0051] The above are only specific implementations of the present disclosure, but the protection scope of the present disclosure is not limited thereto, and the protection scope of the present disclosure shall be based on the protection scope of the claims.
Claims
1. A batch detection device for photovoltaic silicon wafer detection, comprising: An equipment frame (1); the equipment frame (1) is rotatably connected to two conveying rollers (101), the two conveying rollers (101) are sleeved with a conveyor belt (102), the conveyor belt (102) conveys photovoltaic silicon wafers (2), and a motor for driving a right conveying roller (101) is fixed to the front end surface of the equipment frame (1) through a screw; a detection component (3) is fixed to the equipment frame (1); the detection component (3) is characterized in that the detection component (3) is composed of a first frame (301), a first electric cylinder (302), a second electric cylinder (303), a first fixed block (304), a first spring rod (305), a second fixed block (306), a threaded tube (307), a first threaded rod (308) and a detection head (309), and the first frame (301) is fixed to the equipment frame (1) The top surface, the first frame (301) is a concave structure, a first electric cylinder (302) is fixed to the bottom end surface of the inner wall of the first frame (301) by a screw, and a second electric cylinder (303) is fixed to the protruding end of the first electric cylinder (302); a limit assembly (4) is installed on the first frame (301), the limit assembly (4) is composed of a limit seat (401) and a second threaded rod (402), the limit seat (401) is a U-shaped structure, the limit seat (401) is slidably connected to the first frame (301), and two first spring rods (305) are slidably connected to the limit seat (401), and when the first electric cylinder (302) or the second electric cylinder (303) is extended by 10 cm, the bottom end surface of the first fixed block (304) contacts the bottom end surface of the inner wall of the limit seat (401); A second threaded rod (402) is threadedly connected to the limiting seat (401), and a lower end of the second threaded rod (402) is rotatably connected to the top surface of the first frame (301). The second threaded rod (402) is an adjustment member of the limiting seat (401).
2. A batch detection device for photovoltaic silicon wafer detection as claimed in claim 1, characterized in that: A first fixed block (304) with a rectangular block structure is fixed to the extended end of the second electric cylinder (303); two first spring rods (305) are symmetrically welded to the bottom end surface of the first fixed block (304); the extended ends of the two first spring rods (305) are fixed to the second fixed block (306); and the second fixed block (306) is a rectangular block structure.
3. A batch detection device for photovoltaic silicon wafer detection as claimed in claim 2, characterized in that: A threaded tube (307) is welded at the center of the bottom end surface of the second fixed block (306); a first threaded rod (308) is connected to the inner thread of the threaded tube (307); a detection head (309) is fixed to one end below the first threaded rod (308); the bottom of the detection head (309) is an arc-shaped structure; the detection head (309) is located above the photovoltaic silicon wafer (2).
4. A batch detection device for photovoltaic silicon wafer detection as claimed in claim 3, characterized in that: A cleaning assembly (5) is fixed on the equipment frame (1); the cleaning assembly (5) is composed of a second frame (501), a guide rod (502), a third fixing block (503), a third threaded rod (504), a second spring rod (505), a fourth fixing block (506) and a cleaning block (507); the second frame (501) is fixed on the top surface of the equipment frame (1); and the second frame (501) is a concave structure.
5. A batch detection device for photovoltaic silicon wafer detection as claimed in claim 4, characterized in that: The second frame (501) is slidably connected to two guide rods (502) of cylindrical rod-like structures, and the lower ends of the two guide rods (502) are welded to a third fixed block (503) of rectangular block structure. The second frame (501) is threadedly connected to a third threaded rod (504), and the lower end of the third threaded rod (504) is rotatably connected to the top surface of the third fixed block (503).
6. A batch detection device for photovoltaic silicon wafer detection as claimed in claim 5, characterized in that: Two second spring rods (505) are fixed to the bottom end surface of the third fixing block (503), and one end below the two second spring rods (505) is welded to a fourth fixing block (506) with a rectangular plate-like structure. A cleaning block (507) made of a sponge material is adhered to the bottom end surface of the fourth fixing block (506) by glue, and the bottom end surface of the cleaning block (507) is in contact with the top end surface of the photovoltaic silicon wafer (2).
7. A batch detection device for photovoltaic silicon wafer detection as claimed in claim 6, characterized in that: The equipment frame (1) is provided with four auxiliary grooves (103), each of which is a rectangular groove-shaped structure, and the four auxiliary grooves (103) together constitute an auxiliary structure when the equipment frame (1) is transferred.
Citation Information
Patent Citations
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