A focusing device

Abstract

The present invention provides a focusing device, comprising: a magnetic field uniformization component, which is used to uniformize the magnetic field of the component to be focused; a first focusing component, which is used to generate a focusing magnetic field, and the first focusing component includes a first permanent magnet structure and a second permanent magnet structure, and the first permanent magnet structure is arranged outside the second permanent magnet structure; a second focusing component, which includes a third permanent magnet structure and a fourth permanent magnet structure, and the third permanent magnet structure is arranged outside the fourth permanent magnet structure; the third permanent magnet structure and the first permanent magnet structure have opposite magnetization directions, and the fourth permanent magnet structure and the second permanent magnet structure have opposite magnetization directions; a magnetic conductive component, which is arranged at both ends of the first focusing component and is used to connect the first focusing component and the second focusing component. The focusing device of the present invention solves the technical problem of the huge weight and volume of the beam focusing system in the related art.

Description

Technical Field

[0001] The present invention relates to the field of beam focusing technology, and in particular to a focusing device. Background Art

[0002] Due to its important application prospects in many fields, high-power microwave technology has attracted widespread attention from researchers at home and abroad and has developed rapidly. Among them, the development of high-power microwave sources is particularly rapid, and remarkable results have been achieved in the fields of relativistic klystron amplifiers (RKA), relativistic backward wave oscillators (RBWO), relativistic magnetically insulated wire oscillators (RMILO), and relativistic magnetrons.

[0003] Among them, the coaxial relativistic klystron amplifier is based on a coaxial structure as a high-frequency structure. The disadvantage of this type of device is that the beam focusing system is heavy and large in size, and requires a large amount of space and power consumption to provide it with a focusing magnetic field.

[0004] Therefore, the prior art needs to be further developed. Summary of the Invention

[0005] The purpose of the present invention is to overcome the above technical deficiencies and provide a focusing device to solve the technical problems of huge weight and volume of beam focusing systems in related technologies.

[0006] In order to achieve the above technical objectives, the present invention adopts the following technical solutions: a focusing device is provided, comprising: a magnetic field uniform component, the magnetic field uniform component is used to uniformize the magnetic field of the component to be focused, the magnetic field uniform component has a uniform channel, the uniform channel is used for the component to be focused to pass through; a first focusing component, the first focusing component is connected to the magnetic field uniform component, the first focusing component is used to generate a focusing magnetic field, the first focusing component includes a first permanent magnet structure and a second permanent magnet structure, the first permanent magnet structure is sleeved on the outside of the second permanent magnet structure, a first installation channel is provided between the first permanent magnet structure and the second permanent magnet structure, the first installation channel is connected to the uniform channel, the first installation channel is used for the component to be focused to pass through; a second focusing component, the second focusing component is connected to the first focusing component The focusing components are arranged at intervals, and the second focusing component includes a third permanent magnet structure and a fourth permanent magnet structure. The third permanent magnet structure is sleeved on the outside of the fourth permanent magnet structure. There is a second installation channel between the third permanent magnet structure and the fourth permanent magnet structure, and the second installation channel is connected to the first installation channel. The second installation channel is used for the component to be focused to pass through; the magnetization direction of the third permanent magnet structure is opposite to that of the first permanent magnet structure, and the magnetization direction of the fourth permanent magnet structure is opposite to that of the second permanent magnet structure; the magnetic conductive component is arranged at both ends of the first focusing component, and the magnetic conductive component is used to connect the first focusing component and the second focusing component. A third installation channel is provided on the magnetic conductive component, and the third installation channel is connected to the first installation channel. The third installation channel is used for the component to be focused to pass through.

[0007] Furthermore, there are multiple first focusing assemblies and multiple second focusing assemblies, and the multiple first focusing assemblies and the multiple second focusing assemblies are alternately arranged.

[0008] Furthermore, the first permanent magnet structure is cylindrical; the second permanent magnet structure is cylindrical, and the axis of the second permanent magnet structure coincides with the axis of the first permanent magnet structure; the third permanent magnet structure is cylindrical, and the axis of the third permanent magnet structure coincides with the axis of the first permanent magnet structure; the fourth permanent magnet structure is cylindrical, and the axis of the fourth permanent magnet structure coincides with the axis of the first permanent magnet structure.

[0009] Furthermore, the first permanent magnet structure includes a plurality of first permanent magnets, which are arranged around the second permanent magnet structure, and the shortest distance between two adjacent first permanent magnets gradually decreases along the axial direction close to the second permanent magnet structure; the third permanent magnet structure includes a plurality of third permanent magnets, which are arranged in a one-to-one correspondence with the plurality of first permanent magnets, and the plurality of third permanent magnets are arranged around the fourth permanent magnet structure, and the shortest distance between two adjacent third permanent magnets gradually decreases along the axial direction close to the second permanent magnet structure.

[0010] Furthermore, the plurality of first permanent magnets are all columnar, and both ends of the first permanent magnets are connected to the magnetic conductive assembly; and / or the plurality of third permanent magnets are all columnar, and both ends of the third permanent magnets are connected to the magnetic conductive assembly.

[0011] Furthermore, there are multiple first installation channels, and the multiple first installation channels are arranged in a one-to-one correspondence with the multiple first permanent magnets.

[0012] Furthermore, the first focusing assembly is detachably connected to the magnetic conductive assembly; and the second focusing assembly is detachably connected to the magnetic conductive assembly.

[0013] Furthermore, the magnetic field uniformity component includes: a second permanent magnet, which is cylindrical and magnetized along the direction close to the axis; a soft magnet, which is connected to the side of the second permanent magnet close to the axis, the soft magnet is cylindrical, and the uniformity channel is located on the side of the soft magnet close to the axis.

[0014] Furthermore, the focusing device also includes a potential energy component, which is arranged between the magnetic field uniformity component and the first focusing component. The potential energy component is sleeved on the outside of the soft magnet. The potential energy component is magnetized in the direction close to the magnetic field uniformity component. The potential energy component is used to provide magnetic potential energy.

[0015] Furthermore, the potential energy component includes a plurality of fourth permanent magnets, which are arranged around the axis of the second permanent magnet structure, and the planes where the plurality of fourth permanent magnets are located all intersect with the axis of the second permanent magnet structure.

[0016] Furthermore, the first focusing assembly is magnetized in a direction away from the magnetic field uniformity assembly; and the second focusing assembly is magnetized in a direction close to the magnetic field uniformity assembly.

[0017] Beneficial effects:

[0018] The focusing device of the present invention improves the uniform magnetic field required for beam focusing in traditional high-power microwave systems into a periodically inverted focusing magnetic field, thereby stabilizing beam transmission while significantly reducing the weight and volume of the focusing system. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 is a schematic structural diagram of a focusing device used in an embodiment of the present invention;

[0020] Figure 2 is a side view of a focusing device used in an embodiment of the present invention;

[0021] Figure 3 yes Figure 2 Cross-section along AA direction;

[0022] Figure 4 yes Figure 3 Cross-section along BB direction;

[0023] Figure 5 yes Figure 3 Cross-section along CC direction;

[0024] Figure 6 Schematic diagram of the magnetic field generated by the focusing device used in Example 1 of the present invention.

[0025] The above drawings include the following reference numerals:

[0026] 1. Magnetic field uniformity component; 10. Uniform channel; 11. Second permanent magnet; 12. Soft magnet; 2. First focusing component; 21. First permanent magnet structure; 210. First mounting channel; 211. First permanent magnet; 22. Second permanent magnet structure; 3. Second focusing component; 31. Third permanent magnet structure; 311. Third permanent magnet; 32. Fourth permanent magnet structure; 4. Magnetic conductive component; 41. Third mounting channel; 5. Potential energy component; 51. Fourth permanent magnet. DETAILED DESCRIPTION

[0027] In order to enable those skilled in the art to better understand the present invention, the following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of this application.

[0028] According to an embodiment of the present invention, a focusing device is provided. Figures 1 to 6 , including: a magnetic field uniform component 1, the magnetic field uniform component 1 is used to uniformize the magnetic field of the component to be focused, the magnetic field uniform component 1 has a uniform channel 10, the uniform channel 10 is used for the component to be focused to pass through; a first focusing component 2, the first focusing component 2 is connected to the magnetic field uniform component 1, the first focusing component 2 is used to generate a focusing magnetic field, the first focusing component 2 includes a first permanent magnet structure 21 and a second permanent magnet structure 22, the first permanent magnet structure 21 is arranged outside the second permanent magnet structure 22, a first installation channel 210 is provided between the first permanent magnet structure 21 and the second permanent magnet structure 22, the first installation channel 210 is connected to the uniform channel 10, and the first installation channel 210 is used for the component to be focused to pass through; a second focusing component 3, the second focusing component 3 is arranged spaced apart from the first focusing component 2, and the second focusing component 3 includes a third permanent magnet structure 31 and a fourth permanent magnet structure 32. The third permanent magnet structure 31 is sleeved on the outside of the fourth permanent magnet structure 32. A second installation channel is provided between the third permanent magnet structure 31 and the fourth permanent magnet structure 32. The second installation channel is connected to the first installation channel 210 and is used to allow the component to be focused to pass through. The third permanent magnet structure 31 and the first permanent magnet structure 21 have opposite magnetization directions, and the fourth permanent magnet structure 32 and the second permanent magnet structure 22 have opposite magnetization directions. A magnetic conductive component 4 is provided at both ends of the first focusing component 2 and is used to connect the first focusing component 2 and the second focusing component 3. The magnetic conductive component 4 is provided with a third installation channel 41. The third installation channel 41 is connected to the first installation channel 210 and is used to allow the component to be focused to pass through.

[0029] With the above arrangement, the magnetic field uniformity component 1 achieves a uniform magnetic field in the diode portion, directing the beam into the drift tube. The first focusing component 2 comprises a longitudinal magnetization reversal focusing magnetic field cycle, and the second focusing component 3 comprises a negative axial longitudinal magnetization reversal focusing magnetic field cycle. The first mounting channel 210 and the second mounting channel serve as beam drift conduits reserved for the high-frequency structure, used to transmit the beam. The magnetic conductive component 4 includes holes reserved for the high-frequency structure, which are used to modulate the beam, guide the magnetic field, and provide an azimuthally uniform magnetic field. This results in a compact focusing device that is compatible with the RKA high-frequency device and can be mounted on it, resolving the technical issues of the heavy weight and bulk of beam focusing systems in related technologies.

[0030] Preferably, the radial magnetic field intensity in the beam transmission region is lower than 3% of the peak magnetic field intensity in the transmission region to achieve stable transmission of the coaxial pencil beam.

[0031] Preferably, a hole for waveguide passage or screw fixation can be opened at a position away from the middle hole portion of the magnetic conductive component 4, which usually does not affect the field average operation and peak magnetic field intensity of the magnetic field.

[0032] Preferably, the longitudinal thickness of each magnetic conductive component 4 is adjustable, generally not greater than 10 mm. If the longitudinal thickness is too large, the magnetic field direction reversal region will be too long. The thinner the thickness, the better for transmission. 5 mm is generally selected based on engineering considerations.

[0033] In practice, the focusing device of this embodiment is used to focus explosive emission electron beams, but can also be used to focus other electron guns, such as hot cathode emission electron beams, and can be used to focus non-relativistic coaxial multi-beam structure klystron devices.

[0034] In the focusing device of this embodiment, see Figure 3 There are multiple first focusing components 2 and multiple second focusing components 3, and the multiple first focusing components 2 and the multiple second focusing components 3 are alternately arranged.

[0035] Specifically, from left to right, the magnetic conductive component 4, the first focusing component 2 and the magnetic conductive component 4 form a focusing cycle. The focusing device has N cycles, and the number of cycles depends on the length of the RKA high-frequency device structure.

[0036] In the focusing device of this embodiment, see Figure 1 、 Figure 3 The first permanent magnet structure 21 is cylindrical; the second permanent magnet structure 22 is cylindrical, with the axis of the second permanent magnet structure 22 coinciding with the axis of the first permanent magnet structure 21; the third permanent magnet structure 31 is cylindrical, with the axis of the third permanent magnet structure 31 coinciding with the axis of the first permanent magnet structure 21; and the fourth permanent magnet structure 32 is cylindrical, with the axis of the fourth permanent magnet structure 32 coinciding with the axis of the first permanent magnet structure 21. Thus, the first focusing assembly 2 and the second focusing assembly 3 form a coaxial inverted focusing magnetic field.

[0037] Specifically, the second permanent magnetic structure 22 is a cylindrical longitudinally magnetized permanent magnet, and the fourth permanent magnetic structure 32 is a negative axial longitudinally magnetized permanent magnet. Both the second permanent magnetic structure 22 and the fourth permanent magnetic structure 32 are used to provide magnetic potential energy.

[0038] In the focusing device of this embodiment, see Figure 1 、 Figure 3 The first permanent magnet structure 21 includes a plurality of first permanent magnets 211, which are arranged around the second permanent magnet structure 22, and the shortest distance between two adjacent first permanent magnets 211 gradually decreases along the axial direction close to the second permanent magnet structure 22; the third permanent magnet structure 31 includes a plurality of third permanent magnets 311, which are arranged in a one-to-one correspondence with the plurality of first permanent magnets 211, and the plurality of third permanent magnets 311 are arranged around the fourth permanent magnet structure 32, and the shortest distance between two adjacent third permanent magnets 311 gradually decreases along the axial direction close to the second permanent magnet structure 22.

[0039] Preferably, the radial radius of each second permanent magnet structure 22 is not greater than the radial radius of the first permanent magnet 211 in the same period.

[0040] Specifically, each first focusing assembly 2 is composed of a group of built-in cylindrical longitudinally magnetized permanent magnets and external centripetally arranged rectangular parallelepiped magnetic blocks.

[0041] Specifically, the multiple first focusing components 2 only have the same magnetizing direction or the same material, which does not mean that the first permanent magnet 211 contained in each first focusing component 2 has the same size. Generally speaking, the sizes of the first permanent magnet 211 contained in the first focusing components 2 of different periods are basically different.

[0042] Specifically, the number of third permanent magnets 311 is the same as the number of drift tubes of the RKA device, the number of reserved holes on the magnetic conductive component 4 is the same as the number of drift tubes of the RKA device, the geometric center of each third permanent magnet 311 is the same as the angular position of the corresponding drift tube, the length of each third permanent magnet 311 is greater than the length of the CMB-RKA device cavity placed in the period, and the length of the coaxial modular period inversion focusing system composed of N periods is greater than the beam transmission length of the CMB-RKA device.

[0043] In the focusing device of this embodiment, see Figure 3 , multiple first permanent magnets 211 are all columnar, and both ends of the first permanent magnets 211 are connected to the magnetic conductive component 4; and / or, multiple third permanent magnets 311 are all columnar, and both ends of the third permanent magnets 311 are connected to the magnetic conductive component 4.

[0044] Preferably, the first permanent magnet 211 and the third permanent magnet 311 may be a rectangular parallelepiped or a fan-shaped structure.

[0045] Specifically, the first permanent magnet 211 and the third permanent magnet 311 are columnar structures with arbitrary cross-sections, and two ends of the columnar structures are respectively in contact with the two magnetic conductive components 4 .

[0046] In the focusing device of this embodiment, see Figure 4 There are multiple first installation channels 210 , and the multiple first installation channels 210 are arranged in a one-to-one correspondence with the multiple first permanent magnets 211 .

[0047] Specifically, the number of third permanent magnets 311 is the same as the number of drift tubes of the RKA device, the number of reserved holes on the magnetic conductive component 4 is the same as the number of drift tubes of the RKA device, and the number of first installation channels 210 is the same as the number of drift tubes of the RKA device.

[0048] In the focusing device of this embodiment, see Figure 1 , the first focusing assembly 2 is detachably connected to the magnetic conductive assembly 4; the second focusing assembly 3 is detachably connected to the magnetic conductive assembly 4.

[0049] Specifically, the distance between the multiple first permanent magnets 211 and the first installation channel 210 can be adjusted by disassembling and replacing the first permanent magnets 211, and the distance between the second permanent magnet structure 22 and the first installation channel 210 can be adjusted by disassembling and replacing the second permanent magnet structure 22.

[0050] Preferably, the sum of the distance between the first installation channel 210 and the first permanent magnet 211 and the distance between the first installation channel 210 and the second permanent magnet structure 22 is greater than the CMB-RKA device structure.

[0051] In practice, for different CMB-RKA devices, the number of focusing cycles N is variable, as is the length L of each cycle, and the peak magnetic field Bp within each cycle. For a fixed CMB-RKA, a larger number of cycles N generally facilitates transmission, but the length L of each cycle must be greater than the internal device length, so there is a maximum value for the number of cycles N.

[0052] Specifically, the peak magnetic field Bp of each cycle is adjustable, and the magnitude of the peak magnetic field Bp depends on the weight of the first permanent magnet 211 and the second permanent magnet structure 22 on both radial sides of the beam axis (drift tube) and their distance from the drift tube.

[0053] Preferably, the magnetic flux passing through the second permanent magnet structure 22 and the first installation channel 210 is approximately equal to the magnetic flux passing through the first permanent magnet 211 and the first installation channel 210, which is a balance condition. The sizes of the second permanent magnet structure 22 and the first permanent magnet 211 are determined by this condition.

[0054] Preferably, the period length L can be changed by disassembling and replacing the second permanent magnet structure 22 and the third permanent magnet 311 .

[0055] Specifically, the radial thickness, longitudinal length, and angular width of the first permanent magnet 211 are variable, and the radius and longitudinal length of the first permanent magnet 211 within the same period are variable. After adjusting the size, the peak value of the reversal magnetic field provided by the first permanent magnet 211 is generally approximately equal to the peak magnetic field strength of the diode part, and at the same time, the magnetic flux passing through the second permanent magnet structure 22 and the first mounting channel 210 is approximately equal to the magnetic flux passing through the first permanent magnet 211 and the first mounting channel 210.

[0056] In the focusing device of this embodiment, see Figure 1 The magnetic field uniformity component 1 includes: a second permanent magnet 11, which is cylindrical and magnetized in a direction close to the axis; a soft magnet 12, which is connected to the side of the second permanent magnet 11 close to the axis, and the soft magnet 12 is cylindrical, and the uniformity channel 10 is located on the side of the soft magnet 12 close to the axis.

[0057] Specifically, the second permanent magnet 11 and the soft magnet 12 work together to realize a uniform magnetic field in the diode portion, thereby introducing the beam into the drift tube.

[0058] Preferably, the second permanent magnet 11 comprises a plurality of coaxially arranged longitudinally magnetized rectangular permanent magnets. The radial thickness, longitudinal length, and angular width of the plurality of coaxially arranged longitudinally magnetized rectangular permanent magnets are variable, and the longitudinal length of the plurality of coaxially arranged longitudinally magnetized rectangular permanent magnets is generally twice the distance between the cathode and anode electrodes. The radial thickness and longitudinal length of the soft magnet 12 are variable, and are generally designed in conjunction with the second permanent magnet 11 to form a uniform magnetic field at the magnetic field uniformity component 1. The soft magnet 12 is used to improve the azimuthal uniformity of the magnetic field of the second permanent magnet 11 and is generally no larger than 5 mm.

[0059] In the focusing device of this embodiment, see Figure 1 The focusing device also includes a potential energy component 5, which is arranged between the magnetic field uniform component 1 and the first focusing component 2. The potential energy component 5 is sleeved on the outside of the soft magnet 12. The potential energy component 5 is magnetized in the direction close to the magnetic field uniform component 1. The potential energy component 5 is used to provide magnetic potential energy.

[0060] Specifically, the potential energy component 5 is cylindrical, and has a focusing channel inside the potential energy component 5 for the component to be focused to pass through.

[0061] In the focusing device of this embodiment, see Figure 1 The potential energy component 5 includes a plurality of fourth permanent magnets 51 , which are arranged around the axis of the second permanent magnet structure 22 , and planes where the plurality of fourth permanent magnets 51 are located intersect with the axis of the second permanent magnet structure 22 .

[0062] Preferably, the potential energy component 5 is composed of a plurality of fourth permanent magnets 51 arranged centripetally.

[0063] Specifically, the plurality of fourth permanent magnets 51 are all columnar structures with a cross-section that can be in any shape.

[0064] In the focusing device of this embodiment, see Figure 1 The first focusing component 2 is magnetized in a direction away from the magnetic field uniform component 1 ; the second focusing component 3 is magnetized in a direction close to the magnetic field uniform component 1 .

[0065] In this way, in response to the shortcomings of the existing technology, the focusing device of this embodiment has the characteristics of high peak magnetic field, low radial magnetic field, low weight, variable period, variable period peak magnetic field, and relatively independent magnetic field intensity within a period (with little impact on adjacent periods). It can not only replace the conventional electromagnetic focusing system and uniform permanent magnet focusing system in high-power microwave sources, but also provide a matching modular period reversal focusing system for coaxial multi-injection klystrons of various structures.

[0066] Example 1:

[0067] A multi-beam klystron amplifier (with 28 electron beams) was selected as the focusing object of the modular periodic inversion permanent magnet focusing system. At 300kV4000A, a 95% diode beam introduction rate was achieved, and the beam pass rate after passing through the 150mm drift tube reached 90%.

[0068] The inner diameter of the drift tube is 8mm, the transmission axis is located at the radial R=42mm, the corresponding soft iron reserved hole has an inner diameter of 8mm, the transmission axis is located at the radial R=42mm, the inner and outer radii of the second permanent magnet 11 are 78.5mm and 200mm respectively, and the thickness is 55mm, the inner and outer radii of the soft magnet 12 are 73.5mm and 78.5mm respectively, and the thickness is 55mm, the fourth permanent magnet 51 has a size of 124mm×85mm×7mm, the magnetic conductive component 4 located on the left side of the first focusing component 2 has an outer radius of 200mm, a thickness of 5mm, an inner diameter of the reserved hole is 8mm, and there are 28 of them, and the sizes of the first permanent magnet 211 from left to right are: 140mm×40mm×12mm, 110mm×40mm×11.5mm , 90mm×40mm×10mm, the dimensions of the second permanent magnet structure 22 from left to right are: outer radius 34mm, length 40mm; outer radius 34mm, length 40mm; outer radius 30mm, length 40mm, the outer radii of the magnetic conductive component 4 located between the first focusing component 2 and the second focusing component 3 are 170mm, 170mm, 150mm, 150mm, 150mm, respectively, the thickness is 5mm, the inner diameter of the hole is 8mm, and the number is 28, the dimensions of the third permanent magnet 311 from left to right are: 190mm×40mm×9.5mm, 250mm×40mm×8mm, the dimensions of the fourth permanent magnet structure 32 from left to right are: outer radius 7mm, length 40mm; outer radius 7mm, length 40mm.

[0069] Generate a magnetic field such as Figure 6 As shown, in 4 cycles, the length of the uniform area is 30mm+150mm, where -30mm-0 point is the diode focusing magnetic field, and 0-150mm is the drift segment focusing area.

[0070] Example 2:

[0071] A focusing device includes a magnetic field uniformity component 1, a potential energy component 5, a magnetic conductive component 4, a first focusing component 2, a magnetic conductive component 4, a second focusing component 3 and a magnetic conductive component 4 connected in sequence; a hole is provided on the magnetic conductive component 4 as a drift tube entrance, and the input cavity drift tube and the like are fixed to the magnetic conductive component 4 by screws, and the beam drift tube is aligned with the reserved hole of the magnetic conductive component 4. The first focusing component 2 wraps the first part of the RKA device structure, and at the same time, the middle part of the first permanent magnet 211 with different peripheries is inserted into the fan-shaped waveguide to inject modulated microwaves, the drift tube at the end of the first part of the device is connected to the second magnetic conductive component 4, the second part of the RKA device structure is placed in the middle of the second focusing component 3, and then N-1 groups of magnetic conductive components 4 are added to the alternating first focusing component 2 and the second focusing component 3.

[0072] It should be noted that the terms "first", "second", etc. in the specification and claims of the present application and the above-mentioned drawings are used to distinguish similar objects and are not necessarily used to describe a specific order or sequential order. It should be understood that the data used in this way can be interchangeable where appropriate, so that the embodiments of the present application described herein can be implemented in a sequence other than those illustrated or described herein. In addition, the terms "including" and "having" and any of their variations are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device comprising a series of steps or units is not necessarily limited to those steps or units clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0073] Optionally, the specific examples in this embodiment may refer to the examples described in the above embodiments, and this embodiment will not be described in detail here.

[0074] The serial numbers of the above-mentioned embodiments of the present application are for description only and do not represent the advantages or disadvantages of the embodiments.

[0075] In the above embodiments of the present application, the description of each embodiment has its own focus. For parts that are not described in detail in a certain embodiment, please refer to the relevant description of other embodiments.

[0076] The above is only a preferred embodiment of the present application. It should be pointed out that for ordinary technicians in this technical field, several improvements and modifications can be made without departing from the principles of the present application. These improvements and modifications should also be regarded as the scope of protection of the present application.

Claims

1. A focusing device, characterized in that: include: A magnetic field uniformity component (1), the magnetic field uniformity component (1) being used to uniformize the magnetic field of the component to be focused, the magnetic field uniformity component (1) having a uniformity channel (10) therein, the uniformity channel (10) being used for the component to be focused to pass through; a first focusing component (2), the first focusing component (2) being connected to the magnetic field uniform component (1), the first focusing component (2) being used to generate a focusing magnetic field, the first focusing component (2) comprising a first permanent magnetic structure (21) and a second permanent magnetic structure (22), the first permanent magnetic structure (21) being sleeved on the outside of the second permanent magnetic structure (22), a first mounting channel (210) being provided between the first permanent magnetic structure (21) and the second permanent magnetic structure (22), the first mounting channel (210) being in communication with the uniform channel (10), and the first mounting channel (210) being used for the component to be focused to pass through; a second focusing component (3), the second focusing component (3) being spaced apart from the first focusing component (2), the second focusing component (3) comprising a third permanent magnet structure (31) and a fourth permanent magnet structure (32), the third permanent magnet structure (31) being sleeved on the outside of the fourth permanent magnet structure (32), a second mounting channel being provided between the third permanent magnet structure and the fourth permanent magnet structure (32), the second mounting channel being connected to the first mounting channel (210), and the second mounting channel being used for allowing the component to be focused to pass through; the magnetization direction of the third permanent magnet structure (31) is opposite to that of the first permanent magnet structure (21), and the magnetization direction of the fourth permanent magnet structure (32) is opposite to that of the second permanent magnet structure (22); A magnetic conductive component (4), the magnetic conductive component (4) being arranged at both ends of the first focusing component (2), the magnetic conductive component (4) being used to connect the first focusing component (2) and the second focusing component (3), the magnetic conductive component (4) being provided with a third mounting channel (41), the third mounting channel (41) being in communication with the first mounting channel (210), and the third mounting channel (41) being used for the component to be focused to pass through.

2. The focusing device according to claim 1, characterized in that There are multiple first focusing components (2) and multiple second focusing components (3), and the multiple first focusing components (2) and the multiple second focusing components (3) are alternately arranged.

3. The focusing device according to claim 1, characterized in that The first permanent magnetic structure (21) is cylindrical; The second permanent magnetic structure (22) is cylindrical, and the axis of the second permanent magnetic structure (22) coincides with the axis of the first permanent magnetic structure (21); The third permanent magnetic structure (31) is cylindrical, and the axis of the third permanent magnetic structure (31) coincides with the axis of the first permanent magnetic structure (21); The fourth permanent magnetic structure (32) is cylindrical, and the axis of the fourth permanent magnetic structure (32) coincides with the axis of the first permanent magnetic structure (21).

4. The focusing device according to claim 3, characterized in that The first permanent magnet structure (21) comprises a plurality of first permanent magnets (211), the plurality of first permanent magnets (211) being arranged around the second permanent magnet structure (22), and the shortest distance between two adjacent first permanent magnets (211) gradually decreases along an axial direction close to the second permanent magnet structure (22); The third permanent magnet structure (31) includes a plurality of third permanent magnets (311), the plurality of third permanent magnets (311) are arranged in a one-to-one correspondence with the plurality of first permanent magnets (211), the plurality of third permanent magnets (311) are arranged around the fourth permanent magnet structure (32), and the shortest distance between two adjacent third permanent magnets (311) gradually decreases along the axial direction close to the second permanent magnet structure (22).

5. The focusing device according to claim 4, characterized in that The plurality of first permanent magnets (211) are all columnar, and both ends of the first permanent magnets (211) are connected to the magnetic conductive component (4); and / or, The plurality of third permanent magnets (311) are all columnar, and both ends of the third permanent magnets (311) are connected to the magnetic conductive component (4).

6. The focusing device according to claim 4, characterized in that There are a plurality of first installation channels (210), and the plurality of first installation channels (210) are arranged in a one-to-one correspondence with the plurality of first permanent magnets (211).

7. The focusing device according to claim 1, characterized in that The first focusing assembly (2) is detachably connected to the magnetic conductive assembly (4); The second focusing assembly (3) is detachably connected to the magnetic conductive assembly (4).

8. The focusing device according to claim 1, characterized in that The magnetic field uniformity component (1) comprises: A second permanent magnet (11), the second permanent magnet (11) is cylindrical, and the second permanent magnet (11) is magnetized in a direction close to the axis; A soft magnet (12), the soft magnet (12) is connected to a side of the second permanent magnet (11) close to the axis, the soft magnet (12) is cylindrical, and the uniform channel (10) is located on a side of the soft magnet (12) close to the axis.

9. The focusing device according to claim 8, characterized in that The focusing device further comprises a potential energy component (5), wherein the potential energy component (5) is arranged between the magnetic field uniform component (1) and the first focusing component (2), the potential energy component (5) is sleeved on the outside of the soft magnet (12), the potential energy component (5) is magnetized in a direction close to the magnetic field uniform component (1), and the potential energy component (5) is used to provide magnetic potential energy.

10. The focusing device according to claim 9, characterized in that The potential energy component (5) comprises a plurality of fourth permanent magnets (51), wherein the plurality of fourth permanent magnets (51) are arranged around the axis of the second permanent magnet structure (22), and the planes where the plurality of fourth permanent magnets (51) are located all intersect with the axis of the second permanent magnet structure (22).

11. The focusing device according to claim 1, wherein The first focusing component (2) is magnetized in a direction away from the magnetic field uniform component (1); The second focusing component (3) is magnetized in a direction close to the magnetic field uniform component (1).

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