Method for cleaning a storage container for semiconductors and cleaning chamber

Abstract

The application provides a semiconductor storage container cleaning method and a cleaning cavity. The method comprises the following steps: the box body is fixed to a driving mechanism in an inverted manner, a first nozzle is located in a space formed between the box body and the driving mechanism, a spraying surface of the first nozzle is perpendicular to a plane where an inner wall of the box body is located and a plane where a lower surface of the box body is located, and the box body is driven to rotate by the driving mechanism; the first nozzle sprays cleaning liquid to the inner wall of the box body to remove contaminants on the inner wall of the box body; wherein the driving mechanism drives the box body to rotate in a non-uniform speed, so that the time for spraying the cleaning liquid to a first preset area is greater than the time for spraying the cleaning liquid to other areas, and the first preset area covers each groove structure. In one rotation period of the box body, the proportion of time for cleaning the first preset area is increased, and the proportion of time for cleaning other areas is reduced, so that the cleaning quality and the cleaning efficiency are improved.

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