Camphorsulfonate-based flavone photoacid generator and preparation method thereof
By applying camphorsulfonate-based flavonoid photoacid generators in photoresists, the problems of fast diffusion and insufficient thermal stability of photoacid generators in the prior art are solved, better resolution and line edge roughness are achieved, and thermal stability is improved.
CN118955450BActive Publication Date: 2025-10-21ANQING BEIHUA UNIV SCI & TECH PARK CO LTD +1
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Patent Information
- Application Number
- CN202310553521.9
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2023-05-15
- Publication Date
- 2025-10-21
- Estimated Expiration
- 2043-05-15
AI Technical Summary
Technical Problem
Existing photoacid generators diffuse quickly in the resin matrix, resulting in poor line edge roughness and insufficient thermal stability.
Method used
The camphorsulfonate flavonoid photoacid generator is used to absorb light through the flavonoid mother nucleus and generate camphorsulfonic acid with a large van der Waals volume, thereby inhibiting the diffusion of the acid in the resin matrix and connecting the camphorsulfonate group with the flavonoid structure to improve thermal stability.
Benefits of technology
The resolution and line edge roughness of the photoresist are improved, and the photoresist has good thermal stability.
✦ Generated by Eureka AI based on patent content.
Abstract
The application discloses a camphorsulfonate-based flavone photoacid generator and a preparation method thereof. 16 fatty alkyl, C1-C 16 fatty alkoxy, dimethylamino or phenyl. The camphorsulfonate-based flavone photoacid generator prepared by the application realizes long-wave absorption based on a flavone nucleus, has strong absorption to 248nm and 365nm UV LED light sources, and has high photosensitivity. The camphorsulfonate-based flavone photoacid generator contains a camphorsulfonate group which is directly connected with a flavone aromatic ring. The structure has photosensitive cleavage characteristics, and strong acid camphorsulfonic acid is generated by photolysis. Because the van der Waals volume of camphorsulfonic acid is large, the diffusion of camphorsulfonic acid is slow, and therefore the diffusion in a resin matrix is poor, so that better resolution and line edge roughness can be obtained.
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