Process chamber and process equipment

Abstract

The present disclosure provides a process chamber and process equipment, and relates to the field of semiconductor processing technology. The process chamber includes: a chamber base, the chamber base has a first end and a second end opposite to each other; a top seat, the top seat is connected to the first end, and the top seat and the chamber base form a receiving space; the top seat has an inner side surface facing the central axis of the process chamber, and the inner side surface of the top seat includes a first inclined surface, and along the direction away from the chamber base, the first inclined surface gradually approaches the central axis of the process chamber; a bearing member, the bearing member is located in the receiving space and is used to carry a workpiece; a radiation heater, the radiation heater is connected to the first inclined surface, and the radiation heater is evenly distributed along the circumference of the top seat, so that the radiation range of each radiation heater can cover the upper surface of the workpiece facing the first end. The present disclosure is conducive to ensuring the temperature uniformity of the workpiece.

Description

Technical Field

[0001] The present disclosure relates to the field of semiconductor processing technology, and in particular to a process chamber and process equipment. Background Art

[0002] The process chamber is usually used to process the wafer. In the related art, the process chamber is equipped with an infrared lamp tube, which is used to heat the wafer in the process chamber. How to reasonably design the structure and arrangement of the lamp tube to ensure the temperature uniformity of the wafer is one of the current research topics. Summary of the invention

[0003] The present disclosure provides a process chamber and process equipment.

[0004] According to one aspect of the present disclosure, a process chamber is provided, comprising: a chamber base, the chamber base having a first end and a second end opposite to each other; a top seat, the top seat being connected to the first end, the top seat and the chamber base forming a receiving space; the top seat having an inner side surface facing the central axis of the process chamber, the inner side surface of the top seat comprising a first inclined surface, and the first inclined surface gradually approaches the central axis of the process chamber in a direction away from the chamber base; a carrier, the carrier being located in the receiving space and used for carrying a workpiece; a radiation heater, the radiation heater being connected to the first inclined surface, and the radiation heater being evenly distributed along the circumference of the top seat, so that the radiation range of the radiation heater can cover the upper surface of the workpiece facing the first end.

[0005] In some embodiments, the process chamber further includes: a separation cylinder, the separation cylinder is located in the receiving space, and the separation cylinder is connected to the top seat, so that the separation cylinder and the top seat form an installation space; the radiation heater is located in the installation space.

[0006] In some embodiments, the separation tube includes: a cylindrical base, a first mounting portion and a second mounting portion, the first mounting portion is connected to an end of the cylindrical base facing away from the chamber base, and the second mounting portion is connected to an end of the cylindrical base facing the chamber base; the first mounting portion is connected to the top seat; and the second mounting portion is connected to at least one of the top seat and the chamber base.

[0007] In some embodiments, the top seat includes a conical base and a top plate, wherein the top plate is connected to an end of the conical base facing away from the chamber base; the first inclined surface is disposed on the inner side surface of the conical base.

[0008] In some embodiments, the top plate is provided with a first matching portion, and the first matching portion matches with the first mounting portion.

[0009] In some embodiments, a portion of the conical base that extends inwardly from one end of the chamber base toward the chamber base forms a second mating portion, and the second mating portion is mated with the second mounting portion.

[0010] In some embodiments, the top seat or the separation cylinder is provided with an air inlet, which is connected to the installation space, and the air inlet is used to supply cooling fluid to enter the installation space; the top seat or the separation cylinder is provided with an air outlet, which is connected to the installation space, and the air outlet is used to discharge the cooling fluid in the installation space.

[0011] In some embodiments, an angle between the first inclined surface and the central axis of the process chamber is greater than or equal to 30°.

[0012] In some embodiments, an angle between the first inclined surface and the central axis of the process chamber is less than or equal to 60°.

[0013] In some embodiments, the first inclined surface is conical.

[0014] In some embodiments, the radiant heater includes: a heating lamp.

[0015] In some embodiments, the radiation heater has a radiation zone, the length of which corresponds to the radius of the workpiece in the containing space; the radiation zone has a first edge facing away from the chamber base and a second edge facing the chamber base; the normal corresponding to the first edge of the radiation zone passes through the portion of the workpiece located in the central area; the normal corresponding to the second edge of the radiation zone passes through the portion of the workpiece located in the edge area.

[0016] In some embodiments, the top seat is provided with a mounting hole, in which a columnar shower head is installed, and the shower head is used to diffuse the process gas into the receiving space; the side surface of the shower head includes a second inclined surface, and the second inclined surface is close to one end of the shower head facing the chamber base; along the direction toward the chamber base, the second inclined surface gradually approaches the central axis of the process chamber.

[0017] In some embodiments, the second inclined surface is disposed perpendicular to the first inclined surface.

[0018] In some embodiments, the second inclined surface is disposed close to a normal line corresponding to a first edge of a radiation zone of the radiation heater.

[0019] In some embodiments, the shower head is provided with shower holes, an opening of at least one shower hole is located on the end surface of the shower head facing the chamber base, and an opening of at least one shower hole is located on the second inclined surface.

[0020] In some embodiments, the process chamber further includes: a bottom plate, the bottom plate is connected to the second end, and the bottom plate is connected to the carrier.

[0021] According to another aspect of the present disclosure, a process device is provided, comprising: a process chamber as described in any one of the above.

[0022] In the process chamber provided in this embodiment, the radiation heater can radiate heat to the workpiece in a 360° circumferential direction, which helps to ensure the temperature uniformity of the workpiece.

[0023] It should be understood that the content described in this section is not intended to identify the key or important features of the embodiments of the present disclosure, nor is it intended to limit the scope of the present disclosure. Other features of the present disclosure will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] The accompanying drawings are used to better understand the present solution and do not constitute a limitation of the present disclosure.

[0025] Figure 1 is a schematic structural diagram of a process chamber according to an embodiment of the present disclosure;

[0026] Figure 2 is a schematic structural diagram of a process chamber according to an embodiment of the present disclosure;

[0027] Figure 3 yes Figure 1 A magnified schematic diagram of part A;

[0028] Figure 4 yes Figure 1 A magnified schematic diagram of part B;

[0029] Figure 5 yes Figure 1 Enlarged schematic diagram of part C.

[0030] Explanation of the reference numerals: 100-chamber base; 100a-containing space; 200-top seat; 200a-installation space; 210-conical base; 211-first inclined surface; 220-top plate; 221-installation hole; 300-carrier; 310-tray; 320-installation column; 330-support column; 400-radiation heater; 410-radiation zone; 500-bottom plate; 510-recovery channel; 520-recovery air hole; 600-workpiece; 700-partitioning tube; 710-cylindrical base; 720-first installation part; 730-second installation part; 800-spray head; 810-spray hole; 820-second inclined surface; 830-air inlet channel. DETAILED DESCRIPTION

[0031] The following is a description of exemplary embodiments of the present disclosure in conjunction with the accompanying drawings, including various details of the embodiments of the present disclosure to facilitate understanding, which should be considered as merely exemplary. Therefore, it should be recognized by those of ordinary skill in the art that various changes and modifications may be made to the embodiments described herein without departing from the scope and spirit of the present disclosure. Similarly, for the sake of clarity and conciseness, descriptions of well-known functions and structures are omitted in the following description.

[0032] Figure 1 is a schematic structural diagram of a process chamber according to an embodiment of the present disclosure; Figure 2 is a schematic diagram of the structure of a process chamber according to an embodiment of the present disclosure. Figure 1 and Figure 2 is a schematic diagram of a section cut with a plane passing through the central axis of the process chamber as a section plane; Figure 1 and Figure 2 The dot-dash line in FIG. 1 is used to indicate the central axis of the process chamber.

[0033] Please refer to Figure 1 and Figure 2 The present embodiment provides a process chamber, comprising: a chamber base 100, a top seat 200, a carrier 300 and a radiation heater 400. For ease of description, the present embodiment will be described by taking the direction toward the central axis of the process chamber as the inner side and the direction from the chamber base 100 toward the top seat 200 as the upper side.

[0034] The chamber base 100 is columnar, such as cylindrical or prismatic. For ease of description, this embodiment will take the chamber base 100 as an example. The chamber base 100 is a hollow cylinder, or in other words, the chamber base 100 is a ring structure with a preset height. The chamber base 100 has a first end and a second end relative to each other. The first end (i.e., the upper end or top end) of the chamber base 100 is an open end, which is used to be sealed and connected to the top seat 200. The second end (i.e., the lower end or bottom end) of the chamber base 100 can be an open end, in which case the bottom end of the chamber base 100 is sealed and connected to the bottom plate 500; in other examples, the chamber base 100 can also be integrally arranged with the bottom plate 500.

[0035] The top end of the chamber base 100 is detachably connected and sealed to the top seat 200. Exemplarily, the upper end of the chamber base 100 is snap-fitted or fastened to the lower end of the top seat 200; a sealing ring is provided between the upper end surface of the chamber base 100 and the lower end surface of the top seat 200 to improve the sealing effect of the receiving space 100a surrounded by the top seat 200 and the chamber base 100. In other examples, the upper end of the chamber base 100 and the lower end of the top seat 200 are fixed by bonding or welding.

[0036] A carrier 300 is provided in the receiving space 100a, and the carrier 300 is used to carry a workpiece 600. The workpiece 600 includes a wafer and other semiconductor devices. The material of the carrier 300 may include a quartz material. The carrier 300 may include: a tray 310, a mounting column 320 and a support column 330. The tray 310 may be in the shape of a circular plate, and the diameter of the tray 310 is smaller than the inner diameter of the chamber base 100 to avoid contact friction between the tray 310 and the chamber base 100.

[0037] The lower surface of the tray 310 is connected to the mounting post 320, and the mounting post 320 can be integrally provided with the tray 310, and the mounting post 320 is used to connect the carrier 300 with the bottom plate 500. The mounting post 320 can be cylindrical or prismatic. The bottom plate 500 can be provided with a socket, and the mounting post 320 is inserted into the socket; wherein, the upper surface of the bottom plate 500 is connected with an extension ring, and the center hole of the extension ring forms the socket; or, the socket can be formed by extending downward from the upper surface of the bottom plate 500. Alternatively, the mounting post 320 is provided with a socket, and the orifice of the socket is located at the lower end surface of the mounting post 320, and the bottom plate 500 is provided with a plug-in post, and the plug-in post is inserted into the socket.

[0038] There are multiple support columns 330, and the multiple support columns 330 are respectively arranged near the outer edge of the tray 310, and the multiple support columns 330 are evenly distributed along the circumference of the tray 310. Among them, the upper end surface of the support column 330 can be a smooth arc surface to help reduce the adverse effects of the support column 330 on the workpiece 600. In some examples, the support column 330 can be a lifting pin. In other examples, the support column 330 can be a cylinder integrally arranged with the tray 310.

[0039] The top seat 200 may be conical, and the inner diameter of the top seat 200 gradually decreases in the direction away from the chamber base 100 (i.e., from bottom to top). The top seat 200 has an inner side facing the central axis of the process chamber, and the inner side of the top seat 200 includes a first inclined surface 211, and the first inclined surface 211 is used to install the radiation heater 400. In the direction away from the chamber base 100 (in the direction from bottom to top), the first inclined surface 211 gradually approaches the central axis of the process chamber; that is, in the direction from bottom to top, the distance between the first inclined surface 211 and the central axis of the process chamber gradually decreases.

[0040] The first inclined surface 211 may be a conical surface. The outer contour and inner contour of the portion of the top seat 200 corresponding to the first inclined surface 211 may be conical. Alternatively, the outer contour of the portion of the top seat 200 corresponding to the first inclined surface 211 may be cylindrical and the inner contour may be conical. In other examples, the portion of the top seat 200 corresponding to the first inclined surface 211 may be conical and its cross section may be polygonal.

[0041] Exemplarily, the top seat 200 includes a conical base 210 and a top plate 220, wherein the top plate 220 is connected to the upper end of the conical base 210; the inner side surface of the conical base 210 is provided with a first inclined surface 211. The entire inner side surface of the conical base 210 forms the first inclined surface 211. In other examples, the inner side surface of the conical base 210, the portion close to the bottom or top end of the conical base 210 is a vertical surface, and the remaining portion forms the first inclined surface 211.

[0042] The radiation heater 400 is located in the receiving space 100a and is connected to the first inclined surface 211, so that the radiation heater 400 is inclined. In this way, the heat of the radiation heater 400 can be radiated to the surface of the workpiece 600, and the radiation heater 400 will not interfere with the layout of other components such as the shower head 800, thereby helping to improve the structural compactness of the process chamber.

[0043] The radiation heater 400 is evenly distributed along the circumference of the top seat 200, so that the radiation range of the radiation heater 400 can cover the upper surface of the workpiece 600. Exemplarily, the radiation heater 400 includes: a heating lamp tube, and there can be multiple heating lamp tubes, and the multiple heating lamp tubes are evenly laid along the circumference of the top seat 200. Alternatively, the heating lamp tube is arranged in a cone shape. In this way, the heating radiator can radiate heat to the workpiece 600 from a 360° circumferential direction, which is conducive to ensuring the temperature uniformity of the workpiece 600.

[0044] The heating lamp tube may be an infrared lamp tube, and the heating lamp tube may be fixed on the first inclined surface 211 by bonding or fastening.

[0045] In other examples, the radiation heater 400 may also include a heating wire or other components capable of radiating heat; taking the heating wire as an example, the heating wire is spirally wound along the first inclined surface 211 so as to be able to radiate heat to the workpiece 600 from a 360° circumferential direction.

[0046] The process chamber provided in this embodiment includes a chamber base 100, a top seat 200, a carrier 300 and a radiation heater 400. The top seat 200 is arranged at the first end of the chamber base 100, a first inclined surface 211 is arranged on the inner side surface of the top seat 200, and the first inclined surface 211 is arranged to be gradually inclined toward the central axis of the process chamber in a direction away from the chamber base 100. The radiation heater 400 is installed on the first inclined surface 211, and the radiation heater 400 is evenly distributed along the circumference of the top seat 200, so that the radiation range of the radiation heater 400 can cover the upper surface of the workpiece 600 facing the first end. In this way, the radiation heater 400 can radiate heat to the workpiece 600 from a 360° circumferential direction, which is conducive to ensuring the temperature uniformity of the workpiece 600.

[0047] Moreover, by tilting the radiation heater 400, the radiation heater 400 will not occupy the area directly above the workpiece 600 and close to the center of the workpiece 600, which makes it easier to install the shower head 800 in this area. This not only reduces the difficulty of installing the shower head 800, helps improve the structural compactness of the process chamber, but also helps ensure uniform distribution of the process gas.

[0048] Please refer to Figures 1 to 3 In some embodiments, the top plate 220 of the top seat 200 is provided with a mounting hole 221, and a columnar spray head 800 is mounted in the mounting hole 221. The spray head 800 is cylindrical or prism-shaped. The spray head 800 can be fixed in the mounting hole 221 by bonding, snapping, screwing, plugging, or other connection methods.

[0049] The shower head 800 is provided with an air inlet channel 830 and a spray hole 810, and the air inlet channel 830 is connected with the spray hole 810; the bottom plate 500 is provided with a recovery air hole 520 connected with the receiving space 100a, and a recovery channel 510 connected with the recovery air hole 520. After the process gas enters the air inlet channel, it diffuses to the receiving space 100a through the spray hole 810, and the process gas contacts the workpiece 600 in the receiving space 100a and is discharged from the recovery air hole 520 and the recovery channel 510. A plurality of recovery air holes 520 are provided on the upper surface of the bottom plate 500, and the plurality of recovery air holes 520 are respectively connected with the recovery channel 510, and the recovery air holes 520 are distributed at intervals along the circumference of the bottom plate 500; the diameter of the circle corresponding to at least some of the recovery air holes 520 is larger than the diameter of the workpiece 600, so that the process gas that contacts the workpiece 600 can enter the recovery air hole 520.

[0050] In order to improve the uniformity of the contact between the process gas diffused from the shower head 800 and the workpiece 600, the central axis of the shower head 800 can coincide with the central axis of the carrier 300, so that the shower head 800 is located directly above the workpiece 600. In order to allow more process gas to contact the workpiece 600, the distance between the orifice of the spray hole 810 and the workpiece 600 can be set to be smaller. In order to prevent the shower head 800 from blocking the heat radiated vertically by the radiation heater 400, the portion near the lower end of the shower head 800 can be set to be conical.

[0051] Exemplarily, the side surface (or cylindrical surface) of the shower head 800 includes a second inclined surface 820. The second inclined surface 820 is arranged near the lower end of the shower head 800, for example, the lower end of the second inclined surface 820 is connected to the lower end surface of the shower head 800. Moreover, along the direction toward the chamber base 100 (from top to bottom), the second inclined surface 820 gradually approaches the central axis of the process chamber. In this way, the lower end surface of the shower head 800 can be closer to the workpiece 600, and the portion of the shower head 800 close to the lower end can avoid the heat radiated vertically by the radiation heater 400.

[0052] The radiation heater 400 has a radiation area 410, and the radiation area 410 is used to radiate the heat of the radiation heater 400 to the outside of the radiation heater 400. The vertically radiated heat refers to the heat radiated in a direction perpendicular to the radiation area 410.

[0053] In some examples, the second inclined surface 820 is disposed perpendicularly to the first inclined surface 211, so that the portion of the shower head 800 near the lower end can prevent the heat radiated vertically by the radiant heater 400. In other examples, the second inclined surface 820 and the first inclined surface 211 may have a smaller angle, such as 5°, 10°, or 15°, as long as the heat radiated vertically by the radiant heater 400 is not blocked.

[0054] In some examples, the normal line at the upper edge of the radiation zone 410 (or the vertical radiation line located above) can be closer to the second inclined surface 820, so that the shower head 800 can block the heat of non-vertical radiation, thereby preventing the heat radiated to the central area of ​​the workpiece 600 from being too concentrated, and ensuring the temperature uniformity of the workpiece 600. Figure 1 As shown by the longer dashed line, Figure 1 The shorter dashed line is used to illustrate the normal line at the lower edge of the radiation zone 410 .

[0055] In which, taking the example that the second inclined surface 820 is perpendicular to the first inclined surface 211, the normal line of the upper edge of the radiation zone 410 may coincide with the second inclined surface 820, or there is a small distance between the normal line of the upper edge of the radiation zone 410 and the second inclined surface 820. Taking the example that there is a small angle between the second inclined surface 820 and the first inclined surface 211, the point of the second inclined surface 820 close to the radiation heater 400, that is, the point located at the upper edge of the second inclined surface 820, is located in the normal line of the upper edge of the radiation zone 410, or there is a small distance between the point and the normal line of the upper edge of the radiation zone 410.

[0056] In some examples, in order to take into account the shielding effect of the showerhead 800 on the non-vertical radiant heat of the radiant heater 400 and the uniform distribution of the process gas sprayed by the showerhead 800, the ratio of the vertical height of the first inclined surface 211 along the axial direction of the process chamber to the height of the showerhead 800 is greater than or equal to 0.26 and less than or equal to 0.40. Exemplarily, the ratio of the vertical height of the first inclined surface 211 to the height of the showerhead 800 is 0.26 or 0.28 or 0.30 or 0.33 or 0.34 or 0.36 or 0.38 or 0.40, or a ratio between any two of the above.

[0057] In some examples, the ratio of the diameter of the lower end surface of the showerhead 800 to the diameter of the upper end surface of the showerhead 110 is greater than or equal to 0.66 and less than or equal to 0.98. Exemplarily, the ratio of the diameter of the lower end surface of the showerhead 800 to the diameter of the upper end surface of the showerhead 110 is 0.66 or 0.70 or 0.74 or 0.78 or 0.82 or 0.86 or 0.90 or 0.94 or 0.98, or a ratio between any two of the above.

[0058] In some examples, the ratio of the diameter of the lower end surface of the showerhead 800 to the diameter of the chamber substrate 100 is greater than or equal to 0.33 and less than or equal to 0.49. Exemplarily, the ratio of the diameter of the lower end surface of the showerhead 800 to the diameter of the chamber substrate 100 is 0.33 or 0.37 or 0.41 or 0.45 or 0.49, or a ratio between any two of the above.

[0059] In some examples, the ratio of the distance between the lower end surface of the showerhead 800 and the upper surface of the workpiece 600 to the diameter of the chamber base 100 is greater than or equal to 0.18 and less than or equal to 0.26. Exemplarily, the ratio of the distance between the lower end surface of the showerhead 800 and the upper surface of the workpiece 600 to the diameter of the chamber base 100 is 0.18 or 0.20 or 0.22 or 0.24 or 0.26 or 0.28, or a ratio between any two of the above.

[0060] In some examples, a plurality of spray holes 810 are provided in the shower head 800. The opening of at least one spray hole 810 is located on the end surface of the shower head 800 facing the chamber substrate 100, and the opening of at least one spray hole 810 is located on the second inclined surface 820. In this way, the coverage of the shower head 800 can be increased, and it is helpful to ensure the uniformity of the process gas contacting the workpiece 600.

[0061] Among them, since the second inclined surface 820 is inclined, the process gas sprayed by the spray holes 810 on the second inclined surface 820 does not face the workpiece 600. Therefore, the distribution density of the spray holes 810 on the second inclined surface 820 can be greater than or equal to the distribution density of the spray holes 810 on the lower end surface of the spray head 800; that is, along the radial direction of the spray head 800, the spacing between two adjacent spray heads 800 on the lower end surface is greater than or equal to the spacing between two adjacent spray heads 800 on the second inclined surface 820, so as to ensure the uniformity of the process gas in contact with the workpiece 600.

[0062] In some examples, the distance between two adjacent spray holes 810 on the second inclined surface 820 may gradually decrease in a direction away from the central axis of the reaction chamber to further ensure the uniformity of the process gas contacting the workpiece 600 .

[0063] In other examples, the diameter of the spray hole 810 on the lower end surface of the shower head 800 may be smaller than the diameter of the spray hole 810 on the second inclined surface 820. The diameter of the spray hole 810 on the second inclined surface 820 may gradually increase in a direction away from the central axis of the reaction chamber.

[0064] The process chamber provided in this embodiment arranges the radiation heater 400 at an angle so that the radiation heater 400 is evenly distributed along the circumference of the top seat 200, and installs the shower head 800 in the mounting hole 221 of the top seat 200 so that the shower head 800 can be located directly above the workpiece 600. This can radiate heat to the workpiece 600 from a 360° circumferential direction, which is beneficial to ensure the temperature uniformity of the workpiece 600, and can allow more process gas to contact the workpiece 600, which is beneficial to ensure the uniformity of the process gas in contact with the workpiece 600, and also help improve the structural compactness of the process chamber and help miniaturize the process chamber.

[0065] Please refer to Figure 4 and Figure 5 , and continue to refer to Figures 1 to 3 In some embodiments, the process chamber further includes: a separation cylinder 700, the separation cylinder 700 is located in the receiving space 100a, and the separation cylinder 700 is connected to the top seat 200, so that the separation cylinder 700 and the top seat 200 enclose an installation space 200a. The radiation heater 400 is located in the installation space 200a. In this way, the separation cylinder 700 can isolate the space where the radiation heater 400 and the workpiece 600 are located, which can increase safety and facilitate cooling of the radiation heating area. When the process chamber is a vacuum chamber, this embodiment can also reduce the difficulty of installing the radiation heater 400.

[0066] The material of the separation tube 700 includes quartz or other materials that are resistant to high temperatures and can conduct heat. The separation tube 700 includes: a cylindrical base 710, a first mounting portion 720 and a second mounting portion 730. The first mounting portion 720 is connected to the upper end of the cylindrical base 710, and the second mounting portion 730 is connected to the lower end of the cylindrical base 710. The first mounting portion 720 is connected to the top seat 200; the second mounting portion 730 is connected to at least one of the top seat 200 and the chamber base 100.

[0067] For example, the tubular base 710, the first mounting portion 720 and the second mounting portion 730 may be integrally provided. Alternatively, the tubular base 710 and the first mounting portion 720 are fixedly connected by bonding or screwing; the tubular base 710 and the second mounting portion 730 are fixedly connected by bonding or screwing.

[0068] The cylindrical base 710 is conical. In the direction away from the chamber base 100 (i.e., from bottom to top), the inner wall of the cylindrical base 710 gradually approaches the central axis of the reaction chamber; in other words, in the direction from bottom to top, the inner diameter of the cylindrical base 710 gradually decreases. The length of the cylindrical base 710 can be equal to the length of the radiation zone 410, and the normal line of the upper end of the cylindrical base 710 can coincide with the normal line at the upper edge of the radiation zone 410. In other examples, the length of the cylindrical base 710 can be greater than the length of the radiation zone 410, and the heat radiated vertically by the radiant heater 400 can all pass through the cylindrical base 710.

[0069] The first mounting portion 720 is folded relative to the upper end of the cylindrical base 710, so that the first mounting portion 720 is sealed and connected to the top seat 200. The top plate 220 is provided with a first matching portion, and the first matching portion matches the first mounting portion 720. For example, the first mounting portion 720 is an annular structure parallel to the axial direction of the cylindrical base 710; the first matching portion includes a matching hole, or the first matching portion is a portion where the lower surface of the top plate 220 of the top seat 200 is connected to the first mounting portion 720. In other examples, the first mounting portion 720 can also be connected to the cylindrical base 710.

[0070] In some examples, a positioning groove may be provided on the side of the shower head 800, and the first mounting portion 720 may cooperate with the positioning groove to limit the axial displacement of the shower head relative to the top seat 200. In addition, a sealing ring may be provided between the shower head 800 and the hole wall of the mounting hole 221, or a sealing ring may be provided between the shower head 800 and the first mounting portion 720.

[0071] The second mounting portion 730 is folded relative to the lower end of the cylindrical base 710, so that the second mounting portion 730 is connected to the conical base 210 or the chamber base 100. Exemplarily, the portion of the conical base 210 that faces one end of the chamber base 100 and extends inward from the first end of the chamber base 100 forms a second matching portion, and the second matching portion is sealed and matched with the second mounting portion 730. For example, the second mounting portion 730 includes a plate extending radially and outwardly along the cylindrical base 710, and the second mounting portion 730 is connected to the lower surface of the second matching portion, or the second mounting portion 730 is connected to the inner side surface of the second matching portion; wherein the second matching portion may extend along the entire circumference of the cylindrical base 710, or the second matching portion includes a plurality of convex structures distributed at intervals along the circumference of the cylindrical base 710. In other examples, the second mounting portion 730 may also be sealed and connected to the upper end surface of the chamber base 100, or to the inner side surface of the chamber base 100.

[0072] In some examples, the separation cylinder 700 is provided with an air inlet (not shown in the figure), and the separation cylinder 700 is provided with an air outlet (not shown in the figure); or, the top seat 200 is provided with an air inlet, and the top seat 200 is provided with an air outlet; or, the top seat 200 is provided with an air inlet, and the separation cylinder 700 is provided with an air outlet, or, the separation cylinder 700 is provided with an air inlet, and the top seat 200 is provided with an air outlet. The air inlet and the air outlet are respectively connected to the installation space 200a. In this way, the cooling fluid, such as cooling gas or cooling liquid, enters the installation space 200a from the air inlet and performs heat exchange with the radiation heater 400, and the cooling fluid after the heat exchange is discharged from the air outlet, thereby realizing the cooling of the radiation heater 400.

[0073] In some embodiments, the angle between the first inclined surface 211 and the central axis of the process chamber is greater than or equal to 30°. The angle between the first inclined surface 211 and the central axis of the process chamber is less than or equal to 60°. Exemplarily, the angle between the first inclined surface 211 and the central axis of the process chamber can be 30°, 35°, 40°, 45°, 50°, 55°, or 60°, or an angle between any two of the above. Through the above arrangement, it is possible to avoid the incident angle of the light irradiated by the heating lamp being too small to cause total reflection, thereby ensuring the irradiation effect of the heating lamp on the workpiece 600; it is also possible to avoid the incident angle of the light being too large to cause a small space for installing the shower head 800, thereby facilitating the increase of the range covered by the shower head 800, and there is no need to set the reaction chamber larger.

[0074] Along the inclined direction of the first inclined surface 211, the radiation zone 410 of the heating lamp has a preset length; the preset length corresponds to the radius of the workpiece 600 in the receiving space 100a, so that the normal line at the first edge (i.e., the upper edge) of the radiation zone 410 can pass through the portion of the workpiece 600 close to the center (i.e., the vertical radiation line close to the chamber base 100 can irradiate the portion of the workpiece 600 close to the outer edge), and the normal line at the second edge (i.e., the lower edge) of the radiation zone 410 can pass through the portion of the workpiece 600 close to the outer edge (i.e., the vertical radiation line away from the chamber base 100 can irradiate the portion of the workpiece 600 close to the outer edge). In this way, the vertical radiation range of the two opposite radiation heaters 400 can just cover the diameter of the workpiece 600, so that the heat radiated by each radiation heater 400 can cover the entire upper surface of the workpiece 600, and can avoid the temperature of the portion of the workpiece 600 located in the central area from being too high, which is conducive to ensuring the temperature uniformity of the workpiece 600.

[0075] Using the process chamber provided in this embodiment, during the heat treatment process, the carrier 300 drives the workpiece 600 to rotate at a constant speed, the radiation heater 400 starts to work, and the heat radiated vertically by the radiation heater 400 is radiated to the workpiece 600 through the separation tube 700 to heat the workpiece 600; the process gas enters the space where the workpiece 600 is located from the spray head 800 and fully contacts the workpiece 600, and then is discharged from the recovery channel in the base plate 500.

[0076] In practical applications, the process chamber may further include other functional components based on actual needs, and this embodiment does not limit this.

[0077] This embodiment also provides a process equipment, including: a process chamber as in any of the above embodiments. In addition, the process equipment may also include a recovery pipeline connected to the bottom plate of the process chamber, and the recovery pipeline is used to collect process gas exhausted from the process chamber. The process equipment may also include an air inlet pipeline connected to the air inlet, and an exhaust pipeline connected to the air outlet. The process equipment may also include a rotating device capable of driving the workpiece to rotate, etc.

[0078] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present disclosure. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner.

[0079] In the description of the present disclosure, it is necessary to understand that the terms "upper", "lower", "horizontal", "top", "bottom", "inside", "outside", "axial", "radial", "circumferential", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present disclosure.

[0080] In addition, the terms "first", "second", etc. used in the embodiments of the present disclosure are only used for descriptive purposes and should not be understood as indicating or implying relative importance, or implicitly indicating the number of technical features indicated in the embodiments. Therefore, the features defined by the terms "first", "second", etc. in the embodiments of the present disclosure may explicitly or implicitly indicate that at least one of the features is included in the embodiment. In the description of the present disclosure, the word "multiple" means at least two or two or more, such as two, three, four, etc., unless otherwise clearly and specifically defined in the embodiments.

[0081] In the present disclosure, unless otherwise clearly specified or limited in the embodiments, the terms "installed", "connected", "connected" and "fixed" etc. appearing in the embodiments should be understood in a broad sense. For example, the connection can be a fixed connection, a detachable connection, or an integrated connection. It can be understood that it can also be a mechanical connection, an electrical connection, etc.; of course, it can also be a direct connection, or an indirect connection through an intermediate medium, or it can be the internal connection of two elements, or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present disclosure can be understood according to the specific implementation situation.

[0082] In the present disclosure, unless otherwise clearly specified and limited, a first feature being "above" or "below" a second feature may mean that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. Moreover, a first feature being "above", "above" or "above" a second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. A first feature being "below", "below" or "below" a second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0083] Although the embodiments of the present disclosure have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations of the present disclosure. A person skilled in the art may change, modify, replace and vary the above embodiments within the scope of the present disclosure.

Claims

1. A process chamber, comprising: a chamber base having opposing first and second ends; A top seat, the top seat is connected to the first end, the top seat and the chamber base form a receiving space; the top seat has an inner side surface facing the central axis of the process chamber, the inner side surface of the top seat includes a first inclined surface, and along the direction away from the chamber base, the first inclined surface gradually approaches the central axis of the process chamber; A bearing member, the bearing member is located in the receiving space and is used to bear a workpiece; A radiation heater, wherein the radiation heater is connected to the first inclined surface and is evenly distributed along the circumference of the top seat so that the radiation range of the radiation heater can cover the upper surface of the workpiece facing the first end; The top seat comprises a conical base and a top plate, wherein the top plate is connected to an end of the conical base facing away from the chamber base; The inner side surface of the conical base is provided with the first inclined surface; The top seat is provided with a mounting hole, in which a columnar spray head is installed, and the spray head is used to diffuse the process gas into the receiving space; The side surface of the shower head includes a second inclined surface, the second inclined surface is close to an end of the shower head facing the chamber base; along the direction toward the chamber base, the second inclined surface gradually approaches the central axis of the process chamber; The second inclined surface is arranged perpendicular to the first inclined surface; The second inclined surface is disposed close to a normal line corresponding to a first edge of a radiation zone of the radiation heater; The first inclined surface is conical.

2. The process chamber according to claim 1, further comprising: A separation cylinder, the separation cylinder is located in the receiving space, and the separation cylinder is connected to the top seat, so that the separation cylinder and the top seat enclose an installation space; The radiant heater is located in the installation space.

3. The process chamber according to claim 2, wherein: The separation tube comprises: a cylindrical base, a first mounting portion and a second mounting portion, wherein the first mounting portion is connected to an end of the cylindrical base away from the chamber base, and the second mounting portion is connected to an end of the cylindrical base facing the chamber base; The first mounting portion is connected to the top seat; The second mounting portion is connected to at least one of the top seat and the chamber base.

4. The process chamber according to claim 3, wherein: The top plate is provided with a first matching portion, and the first matching portion matches with the first mounting portion.

5. The process chamber according to claim 3, wherein: A portion of the conical base that faces one end of the chamber base and extends inwardly from the first end of the chamber base forms a second matching portion, and the second matching portion matches with the second mounting portion.

6. The process chamber according to claim 2, wherein: The top seat or the separation cylinder is provided with an air inlet, which is connected to the installation space and is used to supply cooling fluid into the installation space; the top seat or the separation cylinder is provided with an air outlet, which is connected to the installation space and is used to discharge the cooling fluid in the installation space.

7. The process chamber according to claim 1, wherein: The spray head is provided with spray holes, an orifice of at least one of the spray holes is located on the end surface of the spray head facing the chamber substrate, and an orifice of at least one of the spray holes is located on the second inclined surface.

8. The process chamber according to claim 1, wherein: The included angle between the first inclined surface and the central axis of the process chamber is greater than or equal to 30°; or, the included angle between the first inclined surface and the central axis of the process chamber is less than or equal to 60°.

9. The process chamber according to claim 1, wherein: The radiation heater has a radiation zone, and the length of the radiation zone corresponds to the radius of the workpiece in the receiving space; The radiation zone has a first edge facing away from the chamber base and a second edge facing the chamber base; a normal line corresponding to the first edge of the radiation zone passes through a portion of the workpiece located in a central area; a normal line corresponding to the second edge of the radiation zone passes through a portion of the workpiece located in an edge area.

10. The process chamber according to claim 1, wherein: The radiation heater comprises a heating lamp tube.

11. The process chamber according to claim 1, further comprising: A bottom plate is connected to the second end and is connected to the bearing member.

12. A process equipment comprising: A process chamber as claimed in any one of claims 1 to 11.

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