A remote plasma source cavity structure

Abstract

The present application belongs to the technical field of plasma generation equipment and discloses a remote plasma source cavity structure. A spiral separator having a channel and a first spiral blade and an auxiliary drive coil are provided at the gas outlet of the annular cavity. The magnetic field generated by the auxiliary drive coil is used to constrain the movement range of the plasma so that the plasma passes through the channel. The pollutant particles in the output airflow are not affected by the magnetic field and are thus decelerated by friction with the first spiral blade and the inner wall of the gas outlet during the spiral flow and are eventually adsorbed, thereby effectively reducing the content of pollutant particles contained in the plasma output from the gas outlet.

Description

Technical Field

[0001] The present application relates to the technical field of plasma generation equipment, and in particular to a remote plasma source cavity structure. Background Art

[0002] Nitrogen trifluoride is often used as an excellent plasma etching gas in the microelectronics industry. During ion etching, it decomposes into active fluoride ions. These fluoride ions etch objects such as silicon and tungsten compounds. During etching, it does not leave any residue on the surface of the etched object and is a very good cleaning agent.

[0003] refer to Figure 4 The existing remote plasma source chamber structure generally includes an annular cavity 61 and a high-frequency electric drive coil 62 wound around the annular cavity 61. The annular cavity 61 has an air inlet 61A and an air outlet 61B. During operation, working gases such as argon and nitrogen trifluoride are introduced into the annular cavity 61 through the air inlet 61A. The magnetic field of the high-frequency electric drive coil 62 generates plasma, which is eventually discharged through the air outlet 61B. Typically, the annular cavity 61 is made of aluminum alloy, and its inner and outer surfaces are oxidized to form a protective layer of aluminum oxide. When the high-energy fluorine-containing plasma strikes the inner wall of the annular cavity 61, it reacts with the aluminum oxide to form particulate matter, which contaminates the plasma and affects process quality.

[0004] How to reduce the content of pollutant particles contained in the plasma output from the gas outlet 61B is an urgent problem to be solved. Summary of the Invention

[0005] The purpose of the present application is to provide a remote plasma source cavity structure that can effectively reduce the content of pollutant particles contained in the plasma output from the gas outlet.

[0006] The present application provides a remote plasma source cavity structure, comprising an annular cavity and a main drive coil wound on the annular cavity, the annular cavity being provided with an air inlet and an air outlet; an auxiliary drive coil being wound around the air outlet, a spiral separator being provided inside the air outlet, the spiral separator comprising a channel coaxially arranged with the auxiliary drive coil and a first spiral blade arranged around the channel; the auxiliary drive coil being used to generate a magnetic field to confine plasma, so that the plasma passes through the channel and is output; the first spiral blade being used to adhere to polluted particles flowing through the surface of the first spiral blade.

[0007] A spiral separator having a channel and a first spiral blade and an auxiliary drive coil are provided at the gas outlet of the annular cavity. The magnetic field generated by the auxiliary drive coil is used to constrain the movement range of the plasma, so that the plasma passes through the channel. The pollutant particles in the output airflow are not affected by the magnetic field and are decelerated by friction with the first spiral blade and the inner wall of the gas outlet during the spiral flow and are eventually adsorbed, thereby effectively reducing the content of pollutant particles contained in the plasma output from the gas outlet.

[0008] Preferably, the spiral separator further comprises a central cylinder coaxially arranged with the gas outlet, the channel is an axial through hole opened on the central cylinder, and the first spiral blade is connected to the outer peripheral surface of the central cylinder.

[0009] Preferably, the first spiral blade is in contact with the inner wall of the air outlet.

[0010] Preferably, the spiral separator is made of ceramic.

[0011] Preferably, the surface of the spiral separator is roughened.

[0012] Preferably, the spiral separator is connected to the air outlet in a detachable manner.

[0013] Preferably, a spiral mixer is coaxially arranged in the air inlet; the spiral mixer is used to make the input gases flow in a spiral manner so as to mix with each other.

[0014] Preferably, the spiral mixer includes a core rod coaxially arranged with the air inlet and a second spiral blade arranged around the core rod.

[0015] Preferably, the surface of the second spiral blade is distributed with groove structures and / or convex point structures.

[0016] Preferably, an air-distributing flange is provided between the air inlet and the inner cavity of the annular cavity.

[0017] Beneficial effects: The remote plasma source cavity structure provided in the present application is provided with a spiral separator having a channel and a first spiral blade and an auxiliary drive coil at the gas outlet of the annular cavity. The magnetic field generated by the auxiliary drive coil is used to constrain the movement range of the plasma, so that the plasma passes through the channel. The pollutant particles in the output airflow are not affected by the magnetic field, and thus are decelerated by friction with the first spiral blade and the inner wall of the gas outlet during the spiral flow and are eventually adsorbed, thereby effectively reducing the content of pollutant particles contained in the plasma output from the gas outlet. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 This is a schematic structural diagram of the remote plasma source cavity structure provided in an embodiment of the present application.

[0019] Figure 2 Schematic diagram of the spiral separator.

[0020] Figure 3 Schematic diagram of the spiral mixer.

[0021] Figure 4 This is a schematic diagram of the structure of an existing remote plasma source cavity.

[0022] Explanation of reference numerals: 1. Annular cavity; 101. Air inlet; 102. Air outlet; 103. Inner cavity; 104. Guide portion; 2. Main drive coil; 3. Auxiliary drive coil; 4. Spiral separator; 401. Channel; 402. First spiral blade; 403. Central cylinder; 5. Spiral mixer; 501. Core rod; 502. Second spiral blade; 6. Air uniformity flange. DETAILED DESCRIPTION

[0023] The technical solutions in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all of the embodiments. The components of the embodiments of the present application generally described and shown in the drawings here can be arranged and designed in various different configurations. Therefore, the following detailed description of the embodiments of the present application provided in the drawings is not intended to limit the scope of the application for protection, but merely represents the selected embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without making creative work fall within the scope of protection of the present application.

[0024] It should be noted that similar reference numerals and letters represent similar items in the following drawings. Therefore, once an item is defined in one drawing, it does not need to be further defined or explained in subsequent drawings. At the same time, in the description of this application, the terms "first", "second", etc. are only used to distinguish the description and should not be understood as indicating or implying relative importance.

[0025] With the rapid development of the microelectronics industry, plasma etching technology is playing an increasingly important role in semiconductor manufacturing. Nitrogen trifluoride, as an excellent plasma etching gas, is widely used for etching materials such as silicon and tungsten compounds due to its residue-free etching process. However, in practical applications, existing remote plasma source chamber structures present several challenges that need to be addressed.

[0026] The traditional remote plasma source chamber structure typically consists of an annular cavity and a high-frequency electric drive coil wrapped around it. The annular cavity has an air inlet and an air outlet. Working gases such as argon and nitrogen trifluoride are introduced through the air inlet. The magnetic field generated by the high-frequency electric drive coil forms a plasma, which is eventually discharged through the air outlet. While this structure can generate plasma, it has a significant drawback: when the high-energy fluorine-containing plasma contacts the inner wall of the annular cavity, it reacts with the aluminum oxide protective layer on the inner wall, generating contaminant particles. These contaminants can be mixed into the output plasma, seriously affecting the quality and efficiency of subsequent processes.

[0027] To address this issue, this application proposes an innovative remote plasma source chamber structure. This novel structure not only retains the advantages of traditional designs, but also cleverly solves the problem of contaminating particles, significantly improving plasma purity and process quality.

[0028] Please refer to Figure 1-Figure 3 In some embodiments of the present application, a remote plasma source cavity structure includes an annular cavity 1 and a main driving coil 2 wound on the annular cavity 1, the annular cavity 1 is provided with an air inlet 101 and an air outlet 102; an auxiliary driving coil 3 is wound around the air outlet 102, and a spiral separator 4 is provided inside the air outlet 102, the spiral separator 4 includes a channel 401 coaxially arranged with the auxiliary driving coil 3 and a first spiral blade 402 arranged around the channel 401; the auxiliary driving coil 3 is used to generate a magnetic field to confine plasma, so that the plasma passes through the channel 401 and is output; the first spiral blade 402 is used to adhere to the polluted particles flowing through the surface of the first spiral blade 402.

[0029] By arranging a spiral separator 4 having a channel 401 and a first spiral blade 402 and an auxiliary drive coil 3 at the gas outlet 102 of the annular cavity 1, the magnetic field generated by the auxiliary drive coil 3 is used to constrain the movement range of the plasma, so that the plasma passes through the channel 401. The pollutant particles in the output airflow are not affected by the magnetic field and are thus decelerated by friction with the first spiral blade 402 and the inner wall of the gas outlet 102 during the spiral flow and are eventually adsorbed, thereby effectively reducing the content of pollutant particles contained in the plasma output from the gas outlet 102.

[0030] Among them, the main driving coil 2 is a high-frequency electric energy driving coil, which can adopt existing technology and will not be described in detail here.

[0031] The annular cavity 1 has an annular inner cavity 103 therein, and the annular cavity 1 can adopt existing technology.

[0032] In some preferred embodiments, Figure 1As shown, the annular cavity 1 is a symmetrical structure having at least one symmetry axis. The air inlet 101 and the air outlet 102 are respectively arranged on opposite sides of the annular cavity 1 and are coaxial with one of the symmetry axes.

[0033] Furthermore, a guide portion 104 that gradually narrows in a direction approaching the gas outlet 102 may be provided between the inner cavity 103 of the annular cavity 1 and the gas outlet 102 , so as to allow the plasma to flow toward the gas outlet 102 more smoothly.

[0034] The first spiral blade 402 has an inner edge and an outer edge, the inner edge extending along a first spiral line, and the outer edge extending along a second spiral line. The first spiral line and the second spiral line are coaxially arranged, and the first spiral line is located inside the second spiral line. The channel 401 may refer to the space formed by the inner edge of the first spiral blade 402 (i.e., the spiral separator 4 has no other components inside the first spiral blade 402).

[0035] But more preferably, see Figure 2 The spiral separator 4 further includes a central cylinder 403 coaxially arranged with the gas outlet 102 , the channel 401 is an axial through hole opened on the central cylinder 403 , and the first spiral blade 402 is connected to the outer peripheral surface of the central cylinder 403 .

[0036] First, the presence of the central cylinder 403 provides a stable support structure for the first spiral blade 402, thereby enhancing the mechanical strength of the entire spiral separator 4. Secondly, the axial through hole, as the channel 401, provides a clear flow path for the plasma, helping to control the flow direction and speed of the plasma. It can also isolate the plasma in the channel 401 from the spiral channel between the central cylinder 403 and the inner wall of the gas outlet 102, more effectively preventing the polluting particles on the first spiral blade 402 from being carried by the airflow into the channel 401. Furthermore, by connecting the first spiral blade 402 to the outer peripheral surface of the central cylinder 403, the shape and angle of the first spiral blade 402 can be precisely controlled, thereby optimizing the capture effect of the polluting particles.

[0037] The design of the axial through-hole can be varied. The simplest form is a straight cylindrical through-hole, but it can also be designed with a flared or tapered shape to adjust the plasma flow rate and pressure. The inner wall of the through-hole can be polished to reduce friction between the plasma and the wall, thereby improving transmission efficiency.

[0038] There are also multiple options for connecting the first spiral blade 402 to the central cylinder 403. Welding, bolting, or integral molding can be used. Different connection methods will affect the stability and replacement convenience of the first spiral blade 402, and the choice can be made based on actual needs.

[0039] This improved design of the present application demonstrates significant advantages in practical applications. First, the presence of central cylinder 403 provides a stable core structure, effectively controlling the plasma flow path. As the plasma passes through the axial through-hole, it is better constrained and guided, minimizing contact with the cavity walls and thus reducing the generation of contaminating particles.

[0040] Secondly, the first spiral blades 402 are connected to the outer circumference of the central cylinder 403, forming a spiral channel. When the air flows through this channel, the centrifugal force will throw heavier pollutants outward, where they will come into contact with the surface of the first spiral blades 402 and the inner wall of the outlet 102 and be captured, preventing them from being discharged with the plasma.

[0041] Furthermore, this design improves the structural strength and stability of the entire spiral separator 4. Structural stability is crucial in high-temperature, high-velocity plasma environments. The central cylinder 403 acts as a support, significantly enhancing the mechanical strength of the spiral separator 4, extending its service life and reducing the frequency of maintenance and replacement.

[0042] At the same time, this design also improves the customizability and optimizability of the spiral separator 4. By adjusting parameters such as the size of the central cylinder 403, the shape of the axial through hole, and the angle and pitch of the first spiral blade 402, the device can be optimized for different plasma sources and process requirements, thereby improving the adaptability and efficiency of the device.

[0043] It should be noted that the aperture setting of the channel 401 is related to the magnetic field strength that the auxiliary drive coil 3 can provide and the output speed of the plasma. The aperture of the channel 401 can be selected and set according to the magnetic field strength of the auxiliary drive coil 3 and the output speed of the plasma to ensure the pass rate of the plasma through the channel 401, thereby balancing the output and purity of the plasma.

[0044] In some preferred embodiments, the first spiral blade 402 contacts the inner wall of the air outlet 102. Specifically, the outer edge of the first spiral blade 402 contacts the inner wall of the air outlet 102. On the one hand, this can prevent pollutants from directly flowing through the gap between the first spiral blade 402 and the inner wall of the air outlet 102, further improving the filtration efficiency of pollutants. On the other hand, the first spiral blade 402 can transfer heat to the annular cavity 1 to achieve a heat dissipation and cooling effect, making the first spiral blade 402 a cold wall, preventing the first spiral blade 402 from excessively reducing its ability to adhere to pollutants due to excessive temperature, thereby ensuring the filtration efficiency of pollutants.

[0045] The material of the spiral separator 4 can be selected based on actual needs. Preferably, the spiral separator 4 is made of ceramic. Ceramic materials have excellent high-temperature resistance, corrosion resistance, and wear resistance, making them well-suited for long-term, stable operation in harsh plasma environments. Using ceramic materials to manufacture the spiral separator 4 significantly improves its durability and stability, extending its service life and reducing maintenance and replacement frequency.

[0046] Specifically, the ceramic material can be high-performance engineering ceramics such as alumina, aluminum nitride, yttrium oxide, and silicon nitride. These materials not only have excellent high-temperature resistance, but also have good thermal conductivity and insulation. For example, alumina ceramics can remain stable in high-temperature environments above 1600°C, while having excellent corrosion resistance and wear resistance. Aluminum nitride ceramics have higher thermal conductivity, which helps to dissipate heat. Silicon nitride ceramics excel in mechanical strength and toughness and can withstand greater mechanical stress. Among them, yttrium oxide ceramics and silicon nitride ceramics are particularly preferred, which not only have good high-temperature resistance, corrosion resistance, thermal conductivity and insulation, but also have a higher adhesion coefficient to the polluted particles generated by nitrogen trifluoride and the aluminum oxide protective layer, and can more effectively adsorb polluted particles. In order to further improve the filtering effect on polluted particles, an yttrium oxide ceramic layer or a silicon nitride ceramic layer can also be provided on the inner wall of the air outlet 102.

[0047] Another advantage of ceramic materials is that their surfaces can be finely processed and treated. The present application can roughen the surface of the ceramic spiral separator 4 to further increase its surface area and adsorption capacity.

[0048] In some embodiments, the surface of the spiral separator 4 is roughened. This treatment not only increases the surface area of ​​the spiral separator 4, but also provides more adsorption sites, thereby significantly improving the capture efficiency of pollutant particles.

[0049] Roughening can be achieved through methods such as sandblasting, chemical etching, or laser processing, creating micron- or nanometer-scale surface structures and significantly improving the capture efficiency of pollutant particles. In practical applications, the most appropriate roughening method can be selected based on the material properties and specific needs of the spiral separator 4. For example, for spiral separators made of ceramic materials, chemical etching or plasma treatment techniques can be used to avoid material damage that may be caused by mechanical grinding.

[0050] At the same time, the roughening treatment also enhances the corrosion resistance of the spiral separator 4. The presence of the microstructure can disperse the attack of corrosive substances and slow down the corrosion process. This is of great significance for the spiral separator 4 that operates for a long time in a high-energy plasma environment.

[0051] Roughening can also have unexpected effects. For example, certain microstructures may generate tiny eddies, further promoting the separation of pollutant particles.

[0052] Preferably, the spiral separator 4 is connected to the gas outlet 102 in a detachable manner. For example, a threaded connection (for example, an internal thread that matches the outer edge of the first spiral blade 402 is provided on the inner wall of the gas outlet 102, and the threaded connection is achieved by screwing the outer edge of the first spiral blade 402 into the internal thread; this method can effectively achieve heat conduction and eliminate gaps between the first spiral blade 402 and the inner wall of the gas outlet 102), a snap connection or a flange connection can be used. These connection methods can ensure that the spiral separator 4 is tightly combined with the gas outlet 102 during operation, while being easily disassembled when needed. Regardless of which detachable connection method is used, the design of the present application can significantly improve the maintainability of the equipment. The operator can regularly remove the spiral separator 4 for cleaning and inspection, remove accumulated contaminants, and ensure that the equipment always maintains the best working condition. This not only extends the service life of the equipment, but also ensures the stability and purity of the plasma output.

[0053] In some embodiments, see Figure 1 A spiral mixer 5 is coaxially arranged in the air inlet 101; the spiral mixer 5 is used to make the input gases flow in a spiral manner so as to mix with each other.

[0054] In practical applications of remote plasma source chamber structures, uniform gas mixing is crucial for plasma generation and performance. However, in existing technologies, insufficient gas mixing often occurs, which can lead to uneven plasma distribution and affect the stability and consistency of subsequent processes. To address this issue, the present application introduces an innovative spiral mixer 5 design within the gas inlet 101.

[0055] The core concept of the spiral mixer 5 is to utilize the rotating flow generated by the spiral structure to promote sufficient contact and mixing between different gas molecules. This design not only improves the efficiency of gas mixing, but also enables a longer mixing path within a limited space, thereby ensuring that the gases are fully mixed before entering the inner cavity 103 of the annular cavity 1. This provides a uniform gas environment for subsequent plasma generation. This not only improves the efficiency of plasma generation, but also significantly improves the uniformity and stability of the plasma. Uniform plasma distribution is crucial for subsequent etching or deposition processes, ensuring process consistency and repeatability.

[0056] Further, see Figure 3 The spiral mixer 5 includes a core rod 501 coaxially arranged with the air inlet 101 and a second spiral blade 502 arranged around the core rod 501 .

[0057] The core rod 501 is coaxially arranged with the air inlet 101, providing a stable support structure for the second spiral blade 502. The second spiral blade 502 is arranged around the core rod 501, forming a spiral channel. When the gas flows through this spiral channel, it generates a rotational motion, which promotes sufficient contact and mixing between different gas molecules.

[0058] The core rod 501 can be designed in a variety of ways. For example, a cylindrical core rod can be used, with its diameter optimized based on the size of the gas inlet 101 and the gas flow rate. Another option is a tapered core rod, which gradually changes the cross-sectional area of ​​the flow path during gas flow, further enhancing mixing. Furthermore, a multi-segment core rod, each with a slightly different diameter or shape, can be considered to create a more complex flow path.

[0059] The design of the second helical blade 502 can also be varied. Equally spaced helical blades can be selected to ensure uniform force on the gas throughout the mixing process. Another option is to use variable-pitch helical blades, with a larger pitch at the inlet and gradually decreasing toward the outlet. This design can gradually increase mixing intensity during gas flow. Furthermore, a double-helical or multi-helical blade design can be considered to improve mixing efficiency by increasing the number of spiral channels.

[0060] The presence of core rod 501 further enhances the mixing effect. During gas flow, the gas is not only affected by the second spiral blades 502 but also rubs and collides with the surface of core rod 501. This complex flow pattern generates subtle turbulence, further promoting mixing between gas molecules. Especially when using a tapered or multi-segment core rod design, changes in the flow channel cross-sectional area cause changes in gas flow rate, generating additional turbulence and achieving more thorough mixing.

[0061] The design of the second spiral blades 502 also plays a key role in the mixing process. The uniform spacing ensures uniform force on the gases throughout the mixing process, making it suitable for handling gases with similar properties. The variable spacing design, on the other hand, allows for gradual adjustment of the mixing intensity based on the characteristics of the different gases, making it particularly suitable for handling difficult-to-mix gas combinations.

[0062] Through this design, the spiral mixer 5 of the present application is able to achieve thorough mixing of the gas before it enters the inner cavity 103 of the annular cavity 1. This not only improves the efficiency of subsequent plasma generation but also ensures plasma uniformity. The uniform gas mixture is more easily excited by the electromagnetic field generated by the main drive coil 2, forming a stable plasma. This stability is crucial for precise control of the etching process and can significantly improve the quality and consistency of precision processes such as semiconductor manufacturing.

[0063] In some preferred embodiments, groove structures and / or convex point structures are distributed on the surface of the second spiral blade 502 .

[0064] The core idea behind this design is to generate more micro-turbulence during gas flow by adding microstructures to the blade surface. The grooves and bumps modify the local flow field as the gas flows over the blade surface, creating more complex flow patterns. These microstructures lead to frequent changes in gas flow direction, increasing the chances of collisions and exchanges between different gas molecules, significantly improving mixing efficiency.

[0065] The grooves can be designed in various shapes, such as V, U, or wavy. These grooves generate small-scale vortices during gas flow, increasing the level of gas agitation. The bumps can be designed in hemispherical, conical, or prismatic shapes. These bumps create localized acceleration and deceleration effects during gas flow, further enhancing mixing.

[0066] In practical applications, the size, shape, and distribution density of the grooves and bumps can be adjusted based on the specific gas type and flow requirements. For example, for high-flow applications, the size and density of the grooves and bumps can be increased to produce a stronger turbulent effect. For low-flow or reactive gases, smaller microstructures can be selected to avoid excessive disturbances that could lead to unwanted reactions.

[0067] By adding these microstructures to the surface of the second spiral blade 502, the remote plasma source chamber structure of the present application achieves significant improvements in gas mixing. First, this design greatly improves the uniformity of gas mixing. Due to the complex flow pattern generated by the microstructures, the contact opportunities between different gas molecules are greatly increased, ensuring that the gases are fully mixed before entering the plasma generation region.

[0068] Secondly, this design improves mixing efficiency and shortens the time and distance required for the gases to reach a uniform mixing state. This means that sufficient mixing can be achieved in a shorter intake channel, which facilitates the miniaturization of the entire device.

[0069] Furthermore, by adjusting microstructural parameters, the design of this application possesses high flexibility and adaptability. The design of the grooves and bumps can be optimized for different gas combinations and flow requirements to achieve optimal mixing. This flexibility enables the remote plasma source cavity structure of this application to adapt to a variety of different application scenarios.

[0070] Finally, this design also helps improve plasma stability and uniformity. Because the gases are fully mixed before entering the plasma generation area, plasma instability caused by localized gas concentration inhomogeneities is reduced, thereby improving the overall system efficiency and processing quality.

[0071] In some embodiments, see Figure 1 A gas leveling flange 6 is disposed between the gas inlet 101 and the inner cavity 103 of the annular chamber 1. This flange 6 typically includes a gas swirl mixing plate with swirl holes for further mixing the incoming gas and improving the ionization rate. This flange 6 is conventional and will not be described in detail here.

[0072] In this document, relational terms such as first and second, etc. are used merely to distinguish one entity or operation from another entity or operation, but do not necessarily require or imply any actual relationship or order between these entities or operations.

[0073] The above description is merely an embodiment of the present application and is not intended to limit the scope of protection of the present application. For those skilled in the art, various modifications and variations of the present application are possible. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application shall be included in the scope of protection of the present application.

Claims

1. A remote plasma source cavity structure, comprising an annular cavity (1) and a main drive coil (2) wound on the annular cavity (1), wherein the annular cavity (1) is provided with an air inlet (101) and an air outlet (102); characterized in that: The air outlet (102) is wound with a secondary drive coil (3), and a spiral separator (4) is provided inside the air outlet (102). The spiral separator (4) comprises a channel (401) coaxially arranged with the secondary drive coil (3) and a first spiral blade (402) arranged around the channel (401); the secondary drive coil (3) is used to generate a magnetic field to confine plasma, so that the plasma passes through the channel (401) and is output; the first spiral blade (402) is used to adhere to pollutant particles flowing through the surface of the first spiral blade (402); The spiral separator (4) further comprises a central cylinder (403) coaxially arranged with the gas outlet (102); the channel (401) is an axial through hole provided on the central cylinder (403); and the first spiral blade (402) is connected to the outer peripheral surface of the central cylinder (403); The first spiral blade (402) contacts the inner wall of the air outlet (102); The material of the spiral separator (4) is ceramic.

2. The remote plasma source chamber structure according to claim 1, characterized in that: The surface of the spiral separator (4) is roughened.

3. The remote plasma source chamber structure according to claim 1, characterized in that: The spiral separator (4) and the air outlet (102) are connected in a detachable manner.

4. The remote plasma source chamber structure according to claim 1, characterized in that: A spiral mixer (5) is coaxially arranged in the air inlet (101); the spiral mixer (5) is used to make the input gases flow in a spiral manner so as to mix with each other.

5. The remote plasma source chamber structure according to claim 4, characterized in that: The spiral mixer (5) comprises a core rod (501) coaxially arranged with the air inlet (101) and a second spiral blade (502) arranged around the core rod (501).

6. The remote plasma source chamber structure according to claim 5, characterized in that: The surface of the second spiral blade (502) is distributed with groove structures and / or convex point structures.

7. The remote plasma source chamber structure according to claim 1, characterized in that: An air-distributing flange (6) is provided between the air inlet (101) and the inner cavity (103) of the annular cavity (1).

Images