Wheel-type shear flow rheo-polishing apparatus and polishing method

Abstract

This invention discloses a wheel-type shear rheological polishing device and method. The polishing device includes a frame, a moving module, a workpiece clamping drive module, and a polishing module mounted on the frame. The moving module controls the movement of the workpiece in the X, Y, and Z directions. The workpiece clamping drive module clamps the workpiece to be processed and drives it to rotate. The polishing module includes a polishing tank and a polishing wheel located in the lower part of the polishing tank. A set of grooves are spaced circumferentially on the outer circumferential surface of the polishing wheel. During polishing, the rotation of the polishing wheel carries the polishing liquid to contact the workpiece above. Simultaneously, the relative movement between the workpiece and the polishing liquid performs shear thickening polishing on the workpiece. Furthermore, the polishing position of the workpiece can be adjusted by the moving module and the workpiece clamping drive module, thereby achieving polishing at different positions of the workpiece and achieving deterministic polishing with high polishing precision and good surface quality.

Description

Technical Field

[0001] This invention relates to the field of ultra-precision polishing technology, specifically to a wheel-type shear rheological polishing device and polishing method. Background Technology

[0002] In aerospace, optics, automotive, and medical device fields, complex curved surface workpieces are frequently used. Due to their complex shapes and materials, these workpieces cannot be surface-treated using conventional methods. Furthermore, with the rapid development of modern technology, the requirements for surface shape accuracy, surface roughness, and subsurface damage levels are becoming increasingly stringent. This necessitates precise control of the machining process and key parameters to achieve deterministic machining of the workpiece.

[0003] Deterministic polishing technology achieves quantitative and targeted removal of material from the workpiece surface by controlling factors such as polishing rate, tilt angle, and magnetic field strength. It enables deterministic material removal and has been widely used in the ultra-precision machining of large, complex curved surfaces. Currently, common deterministic polishing methods include airbag polishing, magnetorheological polishing, ion beam polishing, jet polishing, and shear rheological polishing, but these methods still have some limitations. ① In airbag polishing, maintaining the relative positional accuracy between the airbag and the workpiece is difficult. ② Magnetorheological polishing requires expensive equipment to apply the magnetic field. ③ Ion beam polishing has extremely stringent requirements for the vacuum environment. ④ Jet polishing suffers from abrasive agglomeration. ⑤ Shear rheological polishing is a technique that utilizes the unique shear thickening properties of the polishing fluid to polish complex curved surfaces; during shear rheological polishing, when the shear strain rate applied to the polishing fluid exceeds a critical value, the rheological properties of the polishing fluid change, and the viscosity increases sharply, transforming it into a flexible abrasive suitable for polishing various curved surfaces. Therefore, by adjusting the nonlinear rheological properties of the non-Newtonian fluid polishing slurry under shear stress and the flow field parameters of the polishing slurry, the shear stress between the polishing slurry and the polished surface can be controlled, forming a rheological layer that flexibly holds the abrasive grains on the polished surface to achieve material removal. However, the existing technology has a problem: in the shear rheological polishing process of complex curved workpieces, the shear thickening polishing region formed between the workpiece and the polishing slurry is often only a part of the polishing tank, requiring the rotation of the polishing tank to achieve the flow of the polishing slurry. However, in the processing of non-rotational curved workpieces with complex shapes, it is difficult to use this method of polishing tank rotation for polishing, making it impossible to simultaneously guarantee polishing accuracy and surface quality. Summary of the Invention

[0004] To overcome the aforementioned problems in the prior art, this invention provides a wheel-type shear rheological polishing device. This device, by setting a polishing wheel with a specific structure within the polishing tank, allows the polishing fluid to be carried up by the rotation of the polishing wheel during polishing, bringing it into contact with the workpiece above. Simultaneously, the relative motion between the workpiece and the polishing fluid applies shear force to the fluid, creating a shear thickening effect and forming a flexible "fixed abrasive" to remove material from the workpiece surface. This device can polish non-rotating workpieces with complex shapes, offering good versatility and high polishing efficiency. Furthermore, the polishing device includes a moving module and a workpiece clamping drive module, allowing continuous adjustment of the workpiece's polishing position during the polishing process, ensuring effective polishing of the entire workpiece surface with high precision and good surface quality. Correspondingly, this application also provides a wheel-type shear rheological polishing method.

[0005] Regarding the polishing device, the technical solution of this application is as follows:

[0006] A wheel-type shear rheological polishing device includes a frame; the frame is equipped with a moving module, a workpiece clamping drive module, and a polishing module; the moving module includes an X-axis drive mechanism, a Y-axis drive mechanism, and a Z-axis drive mechanism, which are used to control the movement of the workpiece in the X, Y, and Z directions, respectively, thereby adjusting the polishing position of the workpiece; the workpiece clamping drive module is located on the moving module and includes a rotating platform; the rotating platform is equipped with a clamp for clamping the workpiece to be processed; the rotating platform is connected to motor A and can rotate under the drive of motor A; the clamp is connected to motor B and can rotate under the drive of motor B; the polishing module includes a polishing wheel located below the clamp; the lower part of the polishing wheel is located in a polishing tank; the polishing tank is used to hold polishing liquid; the polishing wheel includes a wheel body and a wheel axle; a set of grooves are spaced circumferentially on the outer circumferential surface of the wheel body to form a space for polishing liquid to adhere; the wheel axle is drivenly connected to motor C.

[0007] Compared with existing technologies, the wheel-type shear rheological polishing device of this application includes a moving module, a workpiece clamping and driving module, and a polishing module. The polishing module includes a polishing tank and a polishing wheel located within the tank. A set of grooves is formed on the outer circumference of the polishing wheel, allowing the polishing fluid to adhere to its surface and form a polishing fluid layer as the wheel rotates. During polishing, the lower part of the polishing wheel is immersed in the polishing fluid. The rotation of the wheel lifts the polishing fluid, bringing it into contact with the workpiece above. Simultaneously, the workpiece clamping and driving module drives the workpiece to rotate, creating relative motion with the polishing fluid and applying shear force. This results in a shear thickening effect, forming a flexible "fixed abrasive" that removes material from the workpiece surface. This method offers high polishing efficiency and can polish complex, non-rotating workpieces, demonstrating good versatility. Furthermore, the moving module and workpiece clamping and driving module allow for continuous adjustment of the workpiece's polishing position during the polishing process, ensuring effective polishing of the entire workpiece surface with high precision and good surface quality.

[0008] As an optimization, in the aforementioned wheel-type shear rheological polishing device, the groove is a trapezoidal groove that is larger at the top and smaller at the bottom. In this case, the top opening of the groove is larger, making it easier for the polishing wheel to carry the polishing liquid in the polishing groove when it rotates.

[0009] As an optimization, in the aforementioned wheel-type shear rheological polishing device, a front support and a rear support are respectively provided on the front and rear sides of the polishing wheel on the frame; one end of the wheel axle of the polishing wheel is rotatably connected to the front support, and the other end is drivenly connected to the output shaft of the C motor; the C motor is installed in the rear support. By providing front and rear support to support the polishing wheel and the C motor, shaking during the rotation of the polishing wheel can be avoided, thereby improving the stability of the polishing device during operation.

[0010] Furthermore, the axle has a stepped axle structure and is connected to the wheel body via a key; after assembly, the front side of the wheel body abuts against the shoulder of the axle. At this point, the wheel body can be limited by the key and the shoulder, resulting in a high degree of connection between the wheel body and the axle.

[0011] Furthermore, bearings are respectively installed in the front and rear support seats, and the two ends of the wheel axle are inserted into the corresponding bearings; the wheel axle is connected to the output shaft of the C motor via a coupling. The bearings can reduce the coefficient of friction during the rotation of the wheel axle and ensure its normal working position, and are convenient to use and maintain, and easy to replace; the coupling allows the wheel axle and the output shaft of the C motor to rotate smoothly on their own, ensuring transmission performance, high rotational accuracy, and easy disassembly and assembly.

[0012] As an optimization, in the aforementioned wheel-type shear rheological polishing device, an arc-shaped baffle is provided on each side of the polishing tank. The arc-shaped baffle can be used to block the polishing liquid, prevent the polishing liquid from splashing and causing environmental pollution, and enable the recycling of the polishing liquid.

[0013] As an optimization, in the aforementioned wheel-type shear rheological polishing device, the X-axis drive mechanism includes two A-type lead screw modules located on the left and right sides of the polishing wheel; the Y-axis drive mechanism includes a gantry frame slidably connected to the two A-type lead screw modules, and a B-type lead screw module located on top of the gantry frame; the Z-axis drive mechanism includes a C-type lead screw module slidably connected to the B-type lead screw module; and the workpiece clamping drive module is slidably connected to the C-type lead screw module. In this application, the position of the workpiece in the X, Y, and Z directions is changed through the lead screw modules, resulting in high adjustment accuracy and maximizing space savings for the entire polishing device, thus reducing manufacturing costs.

[0014] Furthermore, the A, B, and C lead screw modules each include a base, a lead screw mounted on the base, and a D motor connected to the lead screw drive. A sliding plate is mounted on the lead screw, and two sliders are respectively provided on both sides of the bottom of the sliding plate. Correspondingly, a slide rail is provided on each side of the top of the base. The sliders slide on the slide rails. The lead screw module adopts the above structural design, resulting in high linear transmission accuracy, good stability, strong structural reliability, and convenient installation.

[0015] Regarding the polishing method, the technical solution of this application is as follows:

[0016] A wheel-type shear rheological polishing method, implemented using the aforementioned wheel-type shear rheological polishing device of this application, specifically includes the following steps: S1, mounting the workpiece to be processed on a fixture, and pouring a non-Newtonian fluid polishing liquid into the polishing tank, immersing the lower part of the polishing wheel in the polishing liquid; S2, starting motor C to drive the polishing wheel to rotate, and simultaneously starting motor B to drive the fixture to rotate, causing the workpiece to rotate. The rotation speed of the polishing wheel is 70-80 rpm; the rotation speed of the workpiece is 10-30 rpm. During the rotation of the polishing wheel, the polishing liquid adheres to the surface of the polishing wheel to form a polishing liquid layer, which rotates synchronously with the polishing wheel. When the polishing liquid rotates to the top of the polishing wheel and contacts the workpiece, a shear thickening phenomenon occurs, forming a flexible, fixed abrasive tool to remove material from the surface of the workpiece; S3, controlling the movement of the workpiece in the X, Y, and Z directions through the X-axis drive mechanism, Y-axis drive mechanism, and Z-axis drive mechanism, while simultaneously driving the rotating platform to rotate through motor A, changing the polishing angle of the workpiece, thereby continuously adjusting the polishing position of the workpiece to achieve polishing of the entire surface of the workpiece.

[0017] Compared with existing technologies, when polishing a workpiece using the wheel-type shear rheological polishing method of this application, the polishing wheel is first driven to rotate, which brings up the polishing liquid in the polishing tank and brings it into contact with the workpiece above. At the same time, the workpiece is driven to rotate, which makes relative movement with the polishing liquid layer attached to the polishing wheel, thereby applying shear force to the polishing liquid. Under the action of shear force, the polishing liquid produces a shear thickening effect, forming a flexible "fixed abrasive" to remove material from the workpiece surface. Then, the polishing position of the workpiece is adjusted by the moving module and the rotating platform, so that the entire workpiece surface can be effectively polished, achieving efficient, high-precision, and high-quality polishing of the workpiece surface. Attached Figure Description

[0018] Figure 1 This is a schematic diagram of the wheel-type shear rheological polishing device of this application;

[0019] Figure 2 This is a schematic diagram of the workpiece driving and clamping module in the embodiments of this application;

[0020] Figure 3 This is a schematic diagram of the structure of the mobile module in the embodiments of this application;

[0021] Figure 4 This is a schematic diagram of the bottom structure of the skateboard in an embodiment of this application;

[0022] Figure 5 This is a schematic diagram of the polishing module in an embodiment of this application;

[0023] Figure 6 This is a schematic diagram of the assembly of the polishing wheel and the C motor in an embodiment of this application;

[0024] Figure 7 This is a schematic diagram illustrating the polishing principle of the wheel-type shear rheological polishing method of this application.

[0025] The labels in the attached diagram are as follows: 1-Frame, 11-Front support, 12-Rear support; 2-Moving module, 21-X-axis drive mechanism, 22-Y-axis drive mechanism, 221-Gantry, 23-Z-axis drive mechanism, 24-Base, 25-Lead screw, 26-D motor, 27-Slide plate, 28-Slider, 29-Slide rail; 3-Workpiece clamping drive mechanism, 31-Rotating platform, 32-Clamp, 33-A motor, 34-B motor; 4-Polishing module, 41-Polishing wheel, 411-Wheel body, 412-Wheel axle, 413-Groove, 42-Polishing groove, 43-C motor, 44-Bearing, 45-Coupling, 46-Arc-shaped baffle; 5-Workpiece; 6-Polishing fluid, 601-Abrasive grains, 602-Particle clusters. Detailed Implementation

[0026] The invention will now be further described with reference to the accompanying drawings.

[0027] To overcome the problem that conventional shear rheological polishing devices in the prior art cannot simultaneously guarantee polishing accuracy and surface quality when processing non-rotational workpieces with complex shapes, making it difficult to achieve deterministic polishing, this invention provides a wheel-type shear rheological polishing device, including a frame 1; the frame 1 is equipped with a moving module 2, a workpiece clamping drive module 3, and a polishing module 4. The polishing module 4, through the design of the position and structure of the polishing wheel 41 and the polishing groove 42, allows the polishing fluid to adhere to the surface of the polishing wheel 41 during rotation, forming a polishing fluid layer. As the polishing wheel 41 rotates, the layer rises to contact the workpiece 5. Thus, by simply rotating the polishing wheel 41 and the workpiece 5, shear thickening polishing can be performed on non-rotational workpieces with complex shapes. Simultaneously, the polishing position of the workpiece 5 can be adjusted by the moving module 2 and the workpiece clamping drive module 3, thereby achieving polishing at different positions of the workpiece 5 and achieving deterministic polishing. Details are as follows.

[0028] Example (see) Figures 1-6 )

[0029] See Figure 3 and Figure 4 In this embodiment, the moving module 2 includes an X-axis drive mechanism 21, a Y-axis drive mechanism 22, and a Z-axis drive mechanism 23, which are respectively used to control the linear movement of the workpiece 5 in the front-back, left-right, and up-down directions (i.e., the X, Y, and Z directions); the X-axis drive mechanism 21 includes two A-axis lead screw modules disposed on the left and right sides of the polishing wheel 41; the Y-axis drive mechanism 22 includes a gantry frame 221 slidably connected to the two A-axis lead screw modules, and a B-axis lead screw module disposed on the top of the gantry frame 221; The Z-axis drive mechanism 23 includes a C-type lead screw module slidably connected to the B-type lead screw module. Each of the A, B, and C lead screw modules includes a base 24, a lead screw 25 mounted on the base 24, and a D-type motor 26 driven by the lead screw 25. A slide plate 27 is mounted on the lead screw 25, and two sliders 28 are respectively provided on both sides of the bottom of the slide plate 27. Correspondingly, a slide rail 29 is provided on both sides of the top of the base 24. The sliders 28 are slidably mounted on the slide rails 29. The lead screw modules allow for precise adjustment of the workpiece 5 in the X, Y, and Z directions, while also maximizing space savings in the polishing device and reducing manufacturing costs.

[0030] See Figure 2In this embodiment, the workpiece clamping drive module 3 includes a rotating platform 31; the rotating platform 31 is provided with a clamp 32 for clamping the workpiece 5 to be processed; the clamp 32 includes a connecting block and a rotating shaft, the connecting block is fixed on the rotating platform 31, the upper end of the rotating shaft is rotatably connected to the connecting block, and the lower end is provided with a mounting plate; during polishing, the workpiece is fixed on the mounting plate; the B motor 34 is fixed on the top of the connecting block, and its output shaft is connected to the rotating shaft for driving the rotating shaft to rotate, thereby causing the workpiece 5 to rotate; the rotating platform 31 is connected to the A motor 33 and can rotate under the drive of the A motor 33, thereby causing the workpiece 5 to rotate in the YZ plane; the A motor 33 is fixed on the slide plate of the C lead screw module.

[0031] See Figure 5 and Figure 6 In this embodiment, the polishing module 4 includes a polishing wheel 41 (made of stainless steel) located below the fixture 32; the lower part of the polishing wheel 41 is located in the polishing groove 42 (there is a polishing gap between the bottom of the polishing wheel 41 and the polishing groove 42); the polishing groove 42 is used to hold polishing liquid; the polishing wheel 41 includes a wheel body 411 and a wheel axle 412; a set of grooves 413 are evenly spaced along the circumferential direction on the outer circumferential surface of the wheel body 411 to form a space for the polishing liquid to adhere; the wheel axle 412 is connected to the C motor 43 and can rotate under the drive of the C motor 43; the groove 413 is a trapezoidal groove that is larger at the top and smaller at the bottom, and the front and rear sides of the trapezoidal groove have arc-shaped sidewalls.

[0032] Furthermore, on the frame 1, a front support base 11 and a rear support base 12 are respectively provided on the front and rear sides of the polishing wheel 41; one end of the wheel axle 412 is rotatably connected to the front support base 11, and the other end is drively connected to the output shaft of the C motor 43; the C motor 43 is installed inside the rear support base 12. By providing the front support base 11 and the rear support base 12 to support the polishing wheel 41 and the C motor 43, shaking during the rotation of the polishing wheel 41 can be avoided, thereby improving the stability of the polishing device during operation. The rear support base 12 is also provided with a rear cover to facilitate the installation of the C motor 43.

[0033] Furthermore, the axle 412 has a stepped axle structure, and the wheel body 411 has a central hole, which is connected to the axle 412 via a key. After assembly, the front side of the wheel body 411 abuts against the shoulder of the axle 412. At this time, the wheel body 411 can be limited by the key and the shoulder, resulting in a high degree of firmness in the connection between the wheel body 411 and the axle 412.

[0034] Furthermore, bearings 44 are respectively provided in the front support 11 and the rear support 12; both ends of the axle 412 are inserted into the corresponding bearings 44; the axle 412 is connected to the output shaft of the C motor 43 through a coupling 45. The bearings 44 can reduce the coefficient of friction during the rotation of the axle 412 and ensure its normal working position, and are convenient to use and maintain, and easy to replace; the coupling 45 allows the axle 412 and the output shaft of the C motor 43 to rotate smoothly on their own, ensuring transmission performance, high rotational accuracy, and easy disassembly and assembly.

[0035] Furthermore, an arc-shaped baffle 46 is provided on each of the left and right sides of the polishing tank 42. The arc-shaped baffle 46 is used to block the polishing liquid, prevent the polishing liquid from splashing and causing environmental pollution, and enable the recycling of the polishing liquid.

[0036] The wheel-type shear rheological polishing method, which employs the aforementioned wheel-type shear rheological polishing device, specifically includes the following steps:

[0037] S1, the workpiece 5 to be processed is mounted on the fixture 32, there is a certain polishing gap between the workpiece 5 and the polishing wheel 41 (the gap is 1mm in this embodiment), and non-Newtonian fluid polishing liquid is poured into the polishing tank 42 so that the lower part of the polishing wheel 41 is immersed in the polishing liquid;

[0038] S2, start motor C 43 to drive polishing wheel 41 to rotate, and simultaneously start motor B 34 to drive fixture 32 to rotate, causing workpiece 5 to rotate. The rotation speed of polishing wheel 41 is 70-80 rpm; the rotation speed of workpiece 5 is 10-30 rpm. During the rotation of polishing wheel 41, polishing liquid will adhere to the surface of polishing wheel 41 to form a polishing liquid layer (the thickness of the polishing liquid layer is about 3 mm), and rotate synchronously with polishing wheel 41. When the polishing liquid rotates to the top of polishing wheel 41 and contacts workpiece 5, shear thickening phenomenon will occur, forming a flexible fixed abrasive, which removes the material from the surface of workpiece 5.

[0039] S3 controls the movement of workpiece 5 in the X, Y, and Z directions through X-axis drive mechanism 21, Y-axis drive mechanism 22 and Z-axis drive mechanism 23. At the same time, motor A 33 drives the rotating platform 31 to rotate in the YZ plane to change the angle between workpiece 5 and Z-axis, thereby continuously adjusting the polishing position of workpiece 5 and achieving polishing of the entire surface of workpiece 5.

[0040] Non-Newtonian fluids are fluids that do not obey Newton's law of viscosity, meaning the relationship between their shear stress and shear strain rate is not linear. The principle behind non-Newtonian fluids is that their viscosity changes when subjected to shear or tensile forces, leading to different flow characteristics compared to Newtonian fluids. Specifically, at low shear rates, non-Newtonian fluids have higher viscosity and are more difficult to flow; conversely, as the shear rate increases, the viscosity decreases, making flow easier. This characteristic causes non-Newtonian fluids to exhibit different flow behaviors at different shear rates. See also... Figure 6 In this application, when the relative shear rate between the polishing fluid 6 and the workpiece 5 exceeds a certain threshold (the shear thickening rate ranges from 50 to 200 s), -1 The threshold is 50 seconds. -1 The polishing fluid 6 will undergo a shear thickening effect, and the polymers uniformly distributed in the polishing fluid 6 will aggregate with the abrasive particles 601 to form a particle cluster 602, giving the polishing fluid 6 a "solid"-like property, that is, a flexible "fixed abrasive", which can be used to polish the surface of the workpiece 5 and remove the surface material of the workpiece 5.

[0041] Implementation Case:

[0042] This case study demonstrates the polishing of a BK7 glass spherical lens using the aforementioned wheel-type shear rheological polishing method. Specific experimental conditions are shown in the table below:

[0043] workpiece BK7 Glass Spherical Lens φ30mm Abrasive particle size <![CDATA[SiO2 (average 80 nm)]]> Abrasive concentration 8wt% Polishing wheel speed 75rpm workpiece and polishing wheel spacing 1mm Polishing time 30min Workpiece rotation speed 20rpm

[0044] Experimental results show that the polishing fluid performance remains stable during the processing; after 30 minutes of shear rheological polishing, all surface scratches on the glass workpiece are removed, and the roughness Sa is reduced from the original 250.1 nm ± 14 nm to below 0.9 nm ± 0.1 nm.

[0045] In the description of this invention, it should be understood that the terms "X-axis", "Y-axis", "Z-axis", "YZ plane", "front and back", "left and right", "up and down", "above", etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0046] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, and not to limit them. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein; and these modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of the present invention.

Claims

1. A wheel-type shear rheological polishing method, characterized in that: The method is implemented using a wheel-type shear rheological polishing device; the wheel-type shear rheological polishing device includes a frame (1); the frame (1) is provided with a moving module (2), a workpiece clamping drive module (3) and a polishing module (4); The moving module (2) includes an X-axis drive mechanism (21), a Y-axis drive mechanism (22) and a Z-axis drive mechanism (23), which are used to control the movement of the workpiece (5) in the X, Y and Z directions, respectively, thereby adjusting the polishing position of the workpiece (5); The workpiece clamping drive module (3) is located on the moving module (2) and includes a rotating platform (31); the rotating platform (31) is provided with a clamp (32) for clamping the workpiece (5) to be processed; the rotating platform (31) is connected to motor A (33) and can rotate under the drive of motor A (33); the clamp (32) is connected to motor B (34) and can rotate under the drive of motor B (34); The polishing module (4) includes a polishing wheel (41) located below the fixture (32); the lower part of the polishing wheel (41) is located in the polishing tank (42); the polishing tank (42) is used to hold polishing liquid; the polishing wheel (41) includes a wheel body (411) and a wheel axle (412); a set of grooves (413) are spaced apart circumferentially on the outer circumferential surface of the wheel body (411) to form a space for the polishing liquid to adhere; the wheel axle (412) is connected to the C motor (43) for transmission. Specifically, the following steps are included: S1, install the workpiece (5) to be processed on the fixture (32), and pour non-Newtonian fluid polishing liquid into the polishing tank (42) so that the lower part of the polishing wheel (41) is immersed in the polishing liquid; S2, start motor C (43) to drive polishing wheel (41) to rotate, and start motor B (34) to drive fixture (32) to rotate, causing workpiece (5) to rotate; during the rotation of polishing wheel (41), polishing liquid will adhere to the surface of polishing wheel (41) to form a polishing liquid layer, and rotate synchronously with polishing wheel (41); when polishing liquid rotates to the top of polishing wheel (41) and contacts workpiece (5), shear thickening phenomenon will occur, forming a flexible fixed abrasive, which removes material from the surface of workpiece (5); S3 controls the workpiece (5) to move in the X, Y and Z directions through the X-axis drive mechanism (21), Y-axis drive mechanism (22) and Z-axis drive mechanism (23), and at the same time drives the rotating platform (31) to rotate through the A motor (33), changing the polishing angle of the workpiece (5), thereby continuously adjusting the polishing position of the workpiece (5) to achieve polishing of the entire surface of the workpiece (5).

2. The wheel-type shear rheological polishing method according to claim 1, characterized in that: The groove (413) is a trapezoidal groove that is larger at the top and smaller at the bottom.

3. The wheel-type shear rheological polishing method according to claim 1, characterized in that: On the frame (1), a front support seat (11) and a rear support seat (12) are respectively provided on the front and rear sides of the polishing wheel (41); one end of the wheel axle (412) of the polishing wheel (41) is rotatably connected to the front support seat (11), and the other end is drivenly connected to the output shaft of the C motor (43); the C motor (43) is installed in the rear support seat (12).

4. The wheel-type shear rheological polishing method according to claim 3, characterized in that: The axle (412) has a stepped axle structure and is connected to the wheel body (411) by a key.

5. The wheel-type shear rheological polishing method according to claim 3, characterized in that: The front support (11) and the rear support (12) are respectively provided with bearings (44), and the two ends of the wheel axle (412) are inserted into the corresponding bearings (44); the wheel axle (412) is connected to the output shaft of the C motor (43) through a coupling (45).

6. The wheel-type shear rheological polishing method according to claim 1, characterized in that: An arc-shaped baffle (46) is provided on each side of the polishing groove (42).

7. The wheel-type shear rheological polishing method according to claim 1, characterized in that: The X-axis drive mechanism (21) includes two A-type lead screw modules located on the left and right sides of the polishing wheel (41); the Y-axis drive mechanism (22) includes a gantry frame (221) slidably connected to the two A-type lead screw modules, and a B-type lead screw module located on the top of the gantry frame (221); the Z-axis drive mechanism (23) includes a C-type lead screw module slidably connected to the B-type lead screw module. The workpiece clamping drive module (3) is slidably mounted on the C-screw module.

8. The wheel-type shear rheological polishing method according to claim 7, characterized in that: The A, B, and C lead screw modules each include a base (24), a lead screw (25) mounted on the base (24), and a D motor (26) connected to the lead screw (25) for transmission. A slide plate (27) is mounted on the lead screw (25), and two sliders (28) are respectively provided on the bottom sides of the slide plate (27). Correspondingly, a slide rail (29) is provided on the top sides of the base (24). The sliders (28) are slidably mounted on the slide rails (29).

9. The wheel-type shear rheological polishing method according to claim 1, characterized in that: The polishing wheel (41) rotates at a speed of 70-80 rpm; the workpiece (5) rotates at a speed of 10-30 rpm.

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