Solution supply device and semiconductor apparatus

Abstract

The application discloses a solution supply device and a semiconductor device. The solution supply device is used for providing a mixed solution for a processing device, and comprises a first solution input end, a second solution input end, a first conveying pipeline, a second conveying pipeline, a mixing tank arranged at a joint of the first and second conveying pipelines, a main conveying pipeline connected with the mixing tank, a main discharge pipeline connected between the mixing tank and the main conveying pipeline of the processing device, and a control component in communication connection with the main discharge pipeline and the main conveying pipeline. The control component is used for discharging a solution with unstable flow through the main discharge pipeline before the main conveying pipeline provides the mixed solution for the processing device. The application realizes the effect of improving the volume proportion accuracy of each chemical component in the mixed solution.

Description

Technical Field

[0001] This invention relates to the field of semiconductor equipment, and more particularly to a solution supply device and a semiconductor device. Background Technology

[0002] In semiconductor wet cleaning and etching equipment, different solutions need to be mixed in specific proportions. To ensure that the etched film thickness remains stable within a certain range, the stability of the mixed solution concentration is crucial. Common mixed solutions include, for example: DHF solution (a mixture of water and 49% hydrofluoric acid), SC1 solution (a mixture of ammonia, hydrogen peroxide, and water in a volume ratio of 1:2:50), and HF / HNO3 solution (a mixture of hydrofluoric acid and nitric acid). Existing equipment controls the volume ratio of each component chemical solution by adjusting the injection flow rate of the chemical solution in different input lines, thereby achieving the desired concentration of solution.

[0003] However, due to limitations such as pipeline design and the time required for valve response control, the concentration of the solution fluctuates greatly during the mixing process. Moreover, with the increase in the number of online real-time replenishment, the concentration drift will have a cumulative effect, which will cause the etching amount of the solution on the product film to be unstable, and may even lead to product scrap.

[0004] For example, in invention patent application number 200510075183.4, a chemical mixing and supply device and method are disclosed, such as... Figure 1 As shown, the chemical mixing and supply device includes: a first chemical source section 112, a second chemical source section 122, a first delivery line 114, a second delivery line 124, a main delivery line 140, a mixer 142 located on the main delivery line 140, first and fourth flow meters 116 and 126, a discharge line 150, and a control unit 130 for comparing a chemical mixing ratio calculated based on flow rate data provided by the first and fourth flow meters 116 and 126 with a preset chemical mixing ratio to control the flow rate of the chemicals. The discharge line 150 is connected to the first and second delivery lines 114 and 124, respectively, and can be connected to the chemical source sections 112 and 122, respectively. Because the initial flow rate of the delivered chemicals is very unstable, the initially delivered chemicals are discharged by the discharge line 150 for 3-5 seconds, after which a stable flow rate is maintained, i.e., chemicals are discharged during the flow rate adjustment process.

[0005] Although the aforementioned discharge line 150 can be used to discharge unstable-flowing chemicals from the first and second delivery lines 114 and 124, preventing chemicals with unstable flow rates from flowing to the main delivery line 140 and the mixer 142, when the delivery of chemicals to the discharge line 150 is stopped and delivery to the main delivery line 140 begins, the chemicals delivered by the first delivery lines 114 and 124 will mix in the main delivery line 140. Due to changes in pipe resistance and pressure before and after the valve, the flow rates of chemicals in the first and second delivery lines 114 and 124 change drastically. This results in unstable flow rates of chemicals mixed and input into the main delivery line 140 from the first and second delivery lines 114 and 124, leading to deviations in the chemical mixing ratio input into the mixer 142 from the main delivery line 140, and deviations in the concentration of the chemical solution supplied to the processing unit 10 by the mixer 142.

[0006] Therefore, this patent aims to improve the accuracy of the volume ratio of each chemical component in the mixture. Summary of the Invention

[0007] To address the aforementioned technical problems, the present invention aims to improve the accuracy of the volume ratio of each chemical component in a mixed solution. To achieve this objective, the present invention provides a solution supply device and a semiconductor device.

[0008] In some embodiments, the present invention provides a solution supply device for supplying a mixed solution to a processing device, comprising:

[0009] A first solution input terminal is used to receive an injected first solution; a second solution input terminal is used to receive an injected second solution; a first delivery pipeline is connected to the first solution input terminal; a second delivery pipeline is connected to the second solution input terminal; a mixing tank is connected to the end of the first delivery pipeline away from the first solution input terminal and the end of the second delivery pipeline away from the second solution input terminal, for mixing the first solution and the second solution to form a mixed solution; a main delivery pipeline is connected between the mixing tank and the processing device, for providing the mixed solution to the processing device; a main discharge pipeline is connected to the main delivery pipeline; a control unit is communicatively connected to the main discharge pipeline and the main delivery pipeline, for discharging a mixed solution with an unstable flow rate through the main discharge pipeline before the main delivery pipeline provides the mixed solution to the processing device.

[0010] In some embodiments, the present invention provides a semiconductor device, including a semiconductor processing apparatus and the above-described solution supply apparatus.

[0011] Compared with the prior art, the present invention has the following beneficial effects:

[0012] This invention improves the accuracy of the volume ratio of each component in the mixed solution by adding a main discharge pipeline after the drug solution is mixed. This discharges the solution with abnormal concentration caused by unstable flow rate in the initial stage of mixing, allowing it to be transported into the processing device only after the flow rate has stabilized. Furthermore, this invention improves the accuracy of the volume ratio of each component in the mixed solution by installing a pressure regulator in the pipeline to stabilize the hydraulic pressure, thereby ensuring a stable flow rate of liquid before it enters the processing device. Attached Figure Description

[0013] The preferred embodiments will now be described in a clear and easy-to-understand manner, in conjunction with the accompanying drawings, to further explain the above-mentioned characteristics, technical features, advantages, and implementation methods of the present invention.

[0014] Figure 1 This is a structural diagram of a chemical mixing and supply device according to the background technology of this invention;

[0015] Figure 2 This is a schematic diagram of one embodiment of the solution supply device of the present invention;

[0016] Figure 3 This is a schematic diagram of another embodiment of the solution supply device of the present invention;

[0017] Figure 4 This is a schematic diagram of another embodiment of the solution supply device of the present invention;

[0018] Figure 5 This is a schematic diagram of another embodiment of the solution supply device of the present invention. Detailed Implementation

[0019] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the specific implementation methods of the present invention will be described below with reference to the accompanying drawings. Obviously, the drawings described below are merely some embodiments of the present invention. For those skilled in the art, other drawings and other implementation methods can be obtained based on these drawings without any creative effort.

[0020] To keep the drawings concise, each figure only schematically shows the parts relevant to the invention, and these do not represent the actual structure of the product. Furthermore, to facilitate understanding, in some figures, only one of components with the same structure or function is schematically depicted, or only one is labeled. In this document, "one" not only means "only one," but can also mean "more than one."

[0021] In this document, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to mechanical connections or electrical connections; they can refer to direct connections or indirect connections through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0022] Furthermore, in the description of this application, the terms "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0023] Example 1

[0024] like Figure 2 As shown, this embodiment discloses a solution supply device 200, which includes a first solution input terminal 211, a second solution input terminal 221, a first conveying pipeline 210, a second conveying pipeline 220, a main conveying pipeline 230, a main discharge pipeline 240, a mixing tank 250, and a control component 270.

[0025] The system includes a first solution input terminal 211 for receiving an injected first solution and a second solution input terminal 221 for receiving an injected second solution, wherein the first solution is different from the second solution. A first delivery line 210 is connected to the first solution input terminal 211, and a second delivery line 220 is connected to the second solution input terminal 221. A mixing tank 250 is connected to the end of the first delivery line 210 away from the first solution input terminal 211 and the end of the second delivery line 220 away from the second solution input terminal 221. In other words, the mixing tank 250 is located at the confluence of the first and second delivery lines 210, or the first and second delivery lines 220 are respectively connected to the mixing tank 250 for mixing the solutions delivered by the first and second delivery lines 210 and 220, respectively. A main delivery line 230 is connected between the mixing tank 250 and the processing device 300 for providing a mixed solution to the processing device 300.

[0026] Furthermore, the main discharge line 240 is connected to the main delivery line 230, essentially acting as a branch of the main delivery line 230. The control unit 270 maintains communicative connections with both the main delivery line 230 and the main discharge line 240, and is used to control the flow of the mixed solution via the main discharge line 240 before the main delivery line 230 supplies the processing unit 300. Figure 2The solution with an unstable flow rate is discharged in the DR direction as shown. This embodiment enables the mixed solution in the mixing tank 250 to be stably delivered to the processing device 300, thereby improving the accuracy of the volume ratio of each component in the mixed solution and ensuring that the mixed solution supplied to the processing device 300 has a precise concentration each time.

[0027] This application does not limit how the solution is discharged. In some embodiments, a second regulating valve 241 is provided on the main discharge line 240, and a first regulating valve 231 is provided on the main delivery line 230 between the main discharge line 240 and the processing device 300. The first regulating valve 231 is located between the main discharge line 240 and the processing device 300, and the first regulating valve 231 and the second regulating valve 241 are respectively communicatively connected to the control unit 270. Before the main delivery line 230 supplies the mixed solution to the processing device 300, the control unit 270 closes the first regulating valve 231 and opens the second regulating valve 241 to discharge the solution with an unstable flow rate through the main discharge line 240. When the main delivery line 230 supplies the mixed solution to the processing device 300, the control unit 270 first opens the first regulating valve 231. At this time, the solution in the main delivery line 230 is divided into two parts: one part continues to be discharged from the main discharge line 240, and the other part is supplied to the processing device 300. After the first regulating valve 231 and the second regulating valve 241 are both in the open state for a preset time, the solution flow rate in the main delivery pipeline 230 will tend to stabilize. At this time, the second regulating valve 241 is closed, and all the solution in the main delivery pipeline 230 is supplied to the processing device 300.

[0028] Preferably, a second flow meter 242 is provided on the main discharge pipeline 240, and a first flow meter 232 is provided on the main delivery pipeline 230 between the main discharge pipeline 240 and the treatment device 300. The first flow meter 232 and the second flow meter 242 are respectively communicatively connected to the control component 270. Specifically, before the main delivery pipeline 230 supplies the mixed solution to the treatment device 300, the second flow meter 242 detects a first detection value as the flow rate of the solution in the main discharge pipeline 240 when the flow rate is stable. When the main delivery pipeline 230 supplies the mixed solution to the treatment device 300, the flow rate of the solution in the main delivery pipeline 230 will change due to the opening of the first regulating valve 231. At this time, the real-time value of the flow rate of the solution delivered from the main delivery pipeline 230 to the treatment device 300 (i.e., the flow rate of the solution in the branch 233 of the main delivery pipeline 230) detected by the first flow meter 232 is defined as the second detection value, and the real-time value of the flow rate of the solution in the main discharge pipeline 240 detected by the second flow meter 242 is defined as the third detection value. The control unit 270 maintains a stable flow rate in the main delivery pipeline 230 by adjusting the opening rate of the first regulating valve 231 and the closing rate of the second regulating valve 241, ensuring that the sum of the second and third detection values ​​equals the first detection value. Ultimately, the first regulating valve 231 is fully open, and the second regulating valve 241 is fully closed, at which point the second detection value equals the first detection value, and the third detection value is zero.

[0029] Preferably, such as Figure 3 As shown, a feed trough 234 (daily use trough) can also be installed on the main delivery pipeline 230. The feed trough 234 is located between the main discharge pipeline 240 and the treatment device 300, and is used to buffer the mixed solution from the mixing tank 250 and supply it to the treatment device 300. In the accompanying drawings of this embodiment, the feed trough 234 is located after the first regulating valve 231 and the second flow meter 242 and before the treatment device 300, so as to improve the accuracy of the volume ratio of each component in the mixed solution entering the feed trough 234, thereby ensuring that the mixed solution supplied by the feed trough 234 to the treatment device 300 each time has a precise concentration.

[0030] In some embodiments, a third regulating valve 212 and a third flow meter 213 are provided on the first delivery pipeline 210. The third regulating valve 212 is located between the first solution input end 211 and the third flow meter 213. A fourth regulating valve 222 and a fourth flow meter 223 are provided on the second delivery pipeline 220. The fourth regulating valve 222 is located between the second solution input end 221 and the fourth flow meter 223. That is, along the solution flow direction in the first delivery pipeline 210 or the second delivery pipeline 220, the third flow meter 213 is downstream of the third regulating valve 212, and the fourth flow meter 223 is downstream of the fourth regulating valve 222, so as to detect the actual flow rate in the first delivery pipeline 210 or the second delivery pipeline 220 that may fluctuate due to the operation of the third regulating valve 212 or the fourth regulating valve 222. Furthermore, the aforementioned third regulating valve 212 and fourth regulating valve 222, and the third flow meter 213 and fourth flow meter 223 are communicatively connected to the control unit 270. The control unit 270 can receive flow information signals sent by the third flow meter 213 and the fourth flow meter 223, and control the opening degree of the third regulating valve 212 and the fourth regulating valve 222 to regulate the flow in each pipeline. It should be noted that the aforementioned first, second, third, and fourth regulating valves 231, 241, 212, and 222 are preferably flow control valves (FCVs), but can also be ordinary gate valves.

[0031] When the third regulating valve 212 and the fourth regulating valve 222 are selected as flow control valves, the control component 270 can control the concentration ratio by controlling the solution flow ratio in the first delivery pipeline 210 and the second delivery pipeline 220 respectively through the flow control valves. That is, the control component 270 detects the flow data in the first delivery pipeline 210 and the second delivery pipeline 220 respectively through the third flow meter 213 and the fourth flow meter 223, calculates the flow ratio of different chemical solutions injected into the first solution input terminal 211 and the second solution input terminal 221, compares the calculated flow ratio with the preset solution volume mixing ratio, and outputs a control signal for controlling the opening rate of the third regulating valve 212 and the fourth regulating valve 222, thereby controlling the concentration of the mixed solution so that the first solution and the second solution are mixed to form a mixed solution with the above-mentioned preset solution volume mixing ratio, thereby achieving the preset concentration ratio.

[0032] In practical applications, taking the injection of HF (hydrogen fluoride) solution into the first solution input terminal 211 and DIW (deionized water) solution into the second solution input terminal 221 as an example:

[0033] First, only the second, third, and fourth regulating valves 241, 212, and 222 are opened, while the first regulating valve 231 is closed. The control unit 270 controls the flow rate ratio of HF or DIW solutions in the first delivery pipeline 210 and the second delivery pipeline 220 through the third regulating valve 212 and the fourth regulating valve 222, respectively, to adjust the concentration of the mixed solution in the mixing tank 250. The HF / DIW mixed solution, which experiences large flow fluctuations due to pressure or pipe resistance changes, is discharged through the main discharge pipeline 240. Second, after the second flow meter 242 detects that the solution flow rate in the main discharge pipeline 240 has stabilized, the control unit 270 opens the first regulating valve 231 to inject a stable flow rate of HF / DIW mixed solution into the feed tank 234. During this process, the control unit 270 adjusts the opening rate of the first regulating valve 231 and the closing rate of the second regulating valve 241 according to the control method described above to maintain a stable flow rate in the main delivery pipeline 230.

[0034]

Example 2

[0035] like Figure 4 As shown, this embodiment discloses a solution supply device 200, similar to Embodiment 1, including a first solution input terminal 211, a second solution input terminal 221, a first conveying pipeline 210, a second conveying pipeline 220, a main conveying pipeline 230, a main discharge pipeline 240, a mixing tank 250, a feed tank 234, and a control component 270. The connection methods of the above components and pipelines are the same as in Embodiment 1, and will not be repeated here. The difference between this embodiment and Embodiment 1 is that a buffer tank 214 and a circulation pipeline 215 are added to the first conveying pipeline 210, and a secondary discharge pipeline 224 is added to the second conveying pipeline 220.

[0036] The buffer tank 214 is located between the first solution input terminal 211 and the third regulating valve 212. One end of the circulation pipeline 215 is connected to the first delivery pipeline 210 between the buffer tank 214 and the first solution input terminal 211, and the other end is connected to the first delivery pipeline 210 between the buffer tank 214 and the third regulating valve 212. The circulation pipeline 215 is equipped with a fifth regulating valve 216 and a fifth flow meter 217. One end of the secondary discharge pipeline 224 is connected to the first delivery pipeline 210 between the second solution input terminal 221 and the fourth regulating valve 222. The secondary discharge pipeline 224 is equipped with a sixth regulating valve 225 and a sixth flow meter 226. The aforementioned fifth regulating valve 216, sixth regulating valve 225, fifth flow meter 217, and sixth flow meter 226 are also communicatively connected to the control unit 270.

[0037] In practical applications, taking the injection of HF (hydrogen fluoride) solution into the first solution input terminal 211 and DIW (deionized water) solution into the second solution input terminal 221 as an example:

[0038] First, only the fifth regulating valve 216 and the sixth regulating valve 225 are opened, while the first, second, third, and fourth regulating valves 231, 241, 212, and 222 are closed. The HF solution will circulate internally in the buffer tank 214 and the circulation pipeline 215 at the set flow rate, and the DIW will begin to stabilize its flow rate through the secondary discharge pipeline 224. Second, after the flow rates of both the HF solution and DIW have reached their set values ​​and stabilized for a period of time, the fifth regulating valve 216 and the sixth regulating valve 225 are closed, and the second, third, and fourth regulating valves 241, 212, and 222 are opened simultaneously, while the first regulating valve 231 remains closed. The HF solution stops entering the circulation pipeline 215, and the DIW stops being discharged from the secondary discharge pipeline 224. The HF solution and DIW will converge in the mixing tank 250, and the HF / DIW mixed solution after passing through the mixing tank 250 will flow to the main discharge pipeline 240, from which the HF / DIW mixed solution, which experiences large flow rate fluctuations due to changes in pressure or pipe resistance, will be discharged. Finally, after the second flow meter 242 detects that the flow rate is stable, the first regulating valve 231 is opened to inject a stable HF / DIW mixed solution into the feed tank 234.

[0039]

Example 3

[0040] like Figure 5 As shown, this embodiment discloses a solution supply device 200, similar to Embodiment 1, including a first solution input terminal 211, a second solution input terminal 221, a first conveying pipeline 210, a second conveying pipeline 220, a main conveying pipeline 230, a mixing tank 250, a feeding tank 234, and a control component 270. The connection methods of the above components and pipelines are the same as in Embodiment 1, and will not be repeated here. The difference between this embodiment and Embodiment 1 is that voltage regulators 260 are added to the first conveying pipeline 210 and the second conveying pipeline 220 respectively.

[0041] Furthermore, since the first delivery pipeline 210 and the second delivery pipeline 220 maintain constant pressure within their respective pipes through the pressure regulator 260, the pressure of the solution entering the main delivery pipeline 230 remains unchanged, thereby ensuring dynamic stability of the flow rate. In other words, the pressure regulator 260 achieves the same technical effect as the main discharge pipeline 240 in Embodiment 1. Therefore, in this embodiment, the main delivery pipeline 230 may not be connected to the main discharge pipeline 240. The pressure regulator 260 can be a hydraulic balance valve, or it can consist of a controller, a pressure sensor, and a flow regulating valve. The pressure sensor is connected to the inside of the pipe and transmits the pressure signal to the controller. The controller controls the opening of the flow regulating valve based on the received pressure signal, maintaining the pressure within the pipe at a constant level. The controller can be independent of the control component 270 or be part of the control component 270.

[0042] In practical applications, taking the injection of HF (hydrogen fluoride) solution into the first solution input terminal 211 and DIW (deionized water) solution into the second solution input terminal 221 as an example:

[0043] If the main delivery pipeline 230 is connected to the main discharge pipeline 240: First, open the second, third, and fourth regulating valves 241, 212, and 222, and close the first regulating valve 231. The HF solution and DIW will converge in the mixing tank 250 through their respective pipeline regulators 260, and the HF / DIW mixed solution will be discharged for a specified time through the main discharge pipeline 240. Then, when the feed tank 234 needs to be replenished, close the second regulating valve 241 and open the first regulating valve 231 to inject a stable flow rate of HF / DIW mixed solution into the feed tank 234.

[0044] If the main delivery pipeline 230 is not connected to the main discharge pipeline 240, the first, third, and fourth regulating valves 231, 212, and 222 are opened directly, allowing the HF solution and DIW to merge in the mixing tank 250 through the pressure regulators 260 of their respective pipelines. The HF / DIW mixed solution injected into the feed tank 234 uses the pressure regulators 260 on the first and second delivery pipelines 210 and 220 to maintain the dynamic balance of the hydraulic pressure in the main delivery pipeline 230, providing a stable flow rate to the feed tank 234 to ensure the accuracy of the HF / DIW mixed solution concentration.

[0045]

Example 4

[0046] This embodiment discloses a semiconductor device, which includes a processing unit 300 and a solution supply unit 200 as described in any of the above embodiments. The processing unit 300 includes, but is not limited to, a wafer cleaning tank or a wafer etching tank, and the solution supply unit 200 provides a mixed solution to one or more of the aforementioned wafer cleaning tanks and wafer etching tanks via a main delivery pipeline 230, thereby performing etching and cleaning processes on the wafer. By incorporating the solution supply unit 200 into the semiconductor device, this embodiment can improve the stability of the etched thin film amount during the etching process and improve the cleanliness of the substrate surface during the cleaning process.

[0047] It should be noted that the above embodiments can be freely combined as needed. The above are merely preferred embodiments of the present invention. For those skilled in the art, several improvements and modifications can be made without departing from the principle of the present invention, and these improvements and modifications should also be considered within the scope of protection of the present invention.

Claims

1. A solution supply device for supplying a mixed solution to a processing device, characterized in that, include: The first solution input terminal is used to receive the injected first solution; The second solution input terminal is used to receive the injected second solution; The first delivery pipeline is connected to the first solution input end; The second delivery pipeline is connected to the second solution input terminal; A mixing tank is connected to the end of the first delivery pipeline away from the first solution input end and the end of the second delivery pipeline away from the second solution input end, for mixing the first solution and the second solution to form a mixed solution; The main delivery pipeline connects the mixing tank and the processing device to provide the processing device with a mixed solution. The main discharge pipeline is connected to the main delivery pipeline; A second flow meter is provided on the main discharge pipeline. The second flow meter is used to detect whether the solution flow rate in the main discharge pipeline is stable. And / or, a third flow meter is provided on the first delivery pipeline and a fourth flow meter is provided on the second delivery pipeline. The third flow meter is used to detect whether the solution flow rate in the first delivery pipeline is stable. The fourth flow meter is used to detect whether the solution flow rate in the second delivery pipeline is stable. A second regulating valve is provided on the main discharge pipeline, and a first regulating valve is provided on the main delivery pipeline. The first regulating valve is located between the main discharge pipeline and the treatment device. A control unit, communicatively connected to the main discharge pipeline and the main delivery pipeline, is used to discharge a mixed solution with an unstable flow rate via the main discharge pipeline before the main delivery pipeline supplies the mixed solution to the treatment device, wherein... The control unit is communicatively connected to the first regulating valve and the second regulating valve, respectively, and is configured to: before the main delivery pipeline supplies the mixed solution to the processing device, the control unit closes the first regulating valve and opens the second regulating valve to discharge the mixed solution with an unstable flow rate through the main discharge pipeline; and When the main delivery pipeline provides the mixed solution to the processing device, the control component controls the first regulating valve to open, and after a preset time when both the first regulating valve and the second regulating valve are in the open state, the second regulating valve is then closed.

2. The solution supply device according to claim 1, characterized in that: A first regulating valve and a first flow meter are sequentially installed on the main delivery pipeline, and the first regulating valve and the first flow meter are located between the main discharge pipeline and the treatment device. The main discharge pipeline is equipped with a second regulating valve and a second flow meter in sequence. The control component is communicatively connected to the first regulating valve, the first flow meter, the second regulating valve, and the second flow meter, respectively, and is configured as follows: Before the main delivery pipeline supplies the mixed solution to the treatment device, the control component closes the first regulating valve and opens the second regulating valve, and the second flow meter detects the first detection value as the flow rate when the solution flow rate in the main discharge pipeline is stable. When the main delivery pipeline provides a mixed solution to the treatment device, the first flow meter detects a real-time value of the solution flow rate delivered by the main delivery pipeline to the treatment device as a second detection value, and the second flow meter detects a real-time value of the solution flow rate in the main discharge pipeline as a third detection value. The control component adjusts the opening rate of the first regulating valve and the closing rate of the second regulating valve so that the sum of the second detection value and the third detection value is equal to the first detection value.

3. The solution supply device according to claim 1, characterized in that, The main conveying pipeline is equipped with a feed trough, which is located between the main discharge pipeline and the processing device. The feed trough is used to buffer the mixed solution from the mixing tank and supply it to the processing device.

4. The solution supply device according to claim 1, characterized in that, A third regulating valve is also provided on the first delivery pipeline; A fourth regulating valve is also provided on the second delivery pipeline; The control unit is further configured to: receive flow data detected by the third flow meter and the fourth flow meter, calculate the flow ratio of the first solution and the second solution, compare the flow ratio with a preset mixing ratio, and output a control signal for controlling the opening rate of the third regulating valve and the fourth regulating valve, so that the first solution and the second solution are mixed to form a mixed solution having the preset mixing ratio.

5. The solution supply device according to claim 1, characterized in that, The first and second delivery pipelines are each equipped with a pressure stabilizer to stabilize the hydraulic pressure within the first and second delivery pipelines.

6. The solution supply device according to claim 1, characterized in that, include: A buffer tank is provided in the first delivery pipeline; A circulation line, connected before and after the buffer tank of the first delivery line, is used to recover the first solution with an unstable flow rate via the circulation line before the first delivery line supplies the first solution to the mixing tank.

7. The solution supply device according to claim 1 or 6, characterized in that, include: A secondary discharge line, connected to the second delivery line, is used to discharge a second solution with an unstable flow rate via the secondary discharge line before the second delivery line supplies the second solution to the mixing tank.

8. A semiconductor device, characterized in that, It includes a processing apparatus for processing semiconductors and a solution supply apparatus as described in any one of claims 1-7.

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