Sanitary washing device and toilet device

Abstract

Provided are a sanitary washing device and a toilet device capable of making the amount of discharged washing water sufficient. A sanitary washing device is provided with: a washing head configured so as to be capable of advancing and retreating between a storage position and a forward-out position; a device cleaning unit (6, 53) that discharges water to a part of the sanitary cleaning device and performs cleaning; a cleaning head water circuit for circulating the cleaning water discharged from the cleaning head to the cleaning head; and device cleaning unit water circuits (L2-L4) that are configured by water circuits different from the cleaning head water circuits, and that circulate the cleaning water discharged from the device cleaning unit to the device cleaning unit.

Description

Technical Field

[0001] The present disclosure relates to a sanitary cleaning device and a toilet device. Background Art

[0002] In a toilet apparatus, a nozzle cleaning section and a baffle cleaning section for cleaning a cleaning nozzle and a cleaning nozzle for cleaning a local part are known to release cleaning water using the same water circuit (for example, see Patent Document 1).

[0003] Prior art literature

[0004] Patent Literature

[0005] Patent Document 1: (Japanese) Patent Publication No. 2019-196642 Summary of the invention

[0006] Technical problem to be solved by the invention

[0007] In a conventional structure in which flushing water is released using the same water circuit, the amount of flushing water is limited. The present disclosure aims to provide a sanitary flushing device and a toilet device that can release a sufficient amount of flushing water.

[0008] Technical solutions for solving technical problems

[0009] The present invention discloses a sanitary cleaning device with a human body cleaning function which is arranged at a functional part of a toilet bowl, and comprises: a cleaning nozzle which is configured to be able to move forward and backward between a storage position and a forward position; a device cleaning part which discharges water to a part of the sanitary cleaning device for cleaning; a water circuit for the cleaning nozzle which allows the cleaning water discharged from the cleaning nozzle to flow to the cleaning nozzle; and a water circuit for the device cleaning part which is configured by a water circuit different from the water circuit for the cleaning nozzle and allows the cleaning water discharged from the device cleaning part to flow to the device cleaning part. BRIEF DESCRIPTION OF THE DRAWINGS

[0010] Figure 1 This is a perspective view of a toilet device according to an embodiment.

[0011] Figure 2 This is a diagram showing the functional part with the outer casing removed, as viewed from the front side.

[0012] Figure 3 This is a diagram showing the functional portion with the case member and the baffle portion removed, as viewed from the front side.

[0013] Figure 4 This is a three-dimensional view of the baffle cleaning unit as viewed from obliquely above.

[0014] Figure 5 This is a perspective view of the front portion of the functional portion as viewed from obliquely below.

[0015] Figure 6 This is a perspective view of the front portion of the functional portion with the baffle portion removed, as viewed from obliquely below.

[0016] Figure 7 This is a cross-sectional view of the unitized cleaning nozzle and support frame viewed from the side.

[0017] Figure 8 This is a three-dimensional view of the cleaning section below the nozzle as seen from obliquely above.

[0018] Fig. 9 This is a plan view of the functional part with the casing member removed, as seen from above.

[0019] Fig.10 It is a diagram showing a cleaning water circuit.

[0020] Fig.11 It is a diagram showing the timing of the cleaning operation of the cleaning head, the head cleaning unit, and the shutter cleaning unit performed by the cleaning control unit.

[0021] Fig.12 It is a diagram showing the timing of the cleaning operation of the cleaning head, the head cleaning unit, and the shutter cleaning unit performed by the cleaning control unit according to another embodiment. DETAILED DESCRIPTION

[0022] An embodiment of the toilet device 1 is described with reference to the accompanying drawings. In the following description, the front-to-back direction when viewed from a user sitting on a toilet seat (not shown) is referred to as the front-to-back direction. The left-right direction when viewed from a user sitting on the toilet seat is referred to as the left-right direction X. The up-and-down direction along the vertical direction relative to the floor on which the toilet 2 is installed is referred to as the up-and-down direction Z.

[0023] like Figure 1 As shown, the toilet device 1 of this embodiment includes a toilet 2, a toilet seat (not shown), a toilet cover 3, and a functional part 4. The toilet 2 is formed to open upward. The toilet 2 is made of, for example, pottery or resin. The toilet seat (not shown) and the toilet cover 3 are rotatably mounted relative to the toilet 2 at the top of the toilet 2.

[0024] like Figure 1 and Figure 2 As shown, the toilet 2 includes a toilet bowl 21, an upper surface 22, a toilet recess 23, and an outer peripheral wall 24. The toilet bowl 21 is disposed on the front side of the toilet 2. The toilet bowl 21 has an opening 211 at the upper portion. The outer peripheral wall 24 surrounds the outer surface of the toilet bowl 21 and the outside of the piping and the like.

[0025] The toilet recess 23 is arranged along the peripheral edge of the rear side of the opening 211 of the toilet bowl 21, and is formed by being recessed from the upper surface of the upper surface 22. Figure 2As shown, the toilet recess 23 has a bottom surface 231, a pair of side walls 232, and a rear wall 233 (see Figure 8 , Fig. 9 , Fig.11 In the present embodiment, the upper surface of the upper surface portion 22 of the toilet 2 and the bottom surface 231 of the toilet recess 23 of the toilet 2 are both the upper surfaces of the toilet 2 .

[0026] like Figure 1 As shown, the functional part 4 is arranged at the rear of the toilet 2. In the toilet 2, the functional part 4 is arranged at the rear of the upper surface 22 of the toilet 2, and a part of the front is arranged above the upper part of the toilet recess 23 and the rear side of the toilet bowl 21. The functional part 4 has a functional part protrusion 42. The functional part protrusion 42 is formed to protrude downward from the front side of the functional part 4. When the functional part 4 is provided on the upper surface 22 other than the toilet recess 23 in the toilet 2, the functional part protrusion 42 is arranged in the toilet recess 23 of the toilet 2.

[0027] The functional part 4 is composed of at least a sanitary cleaning device 5 for cleaning the user's local area. Figure 1 and Figure 2 As shown, the functional part 4 includes a functional component including the sanitary washing device 5, a base plate 41 (base component), and a housing component 411 covering the outer shape of the functional part. On the base plate 41, at least a part of the functional component of the functional part 4 is arranged.

[0028] The functional components are arranged on the base plate 41 or other locations in consideration of various functions and positional relationships with other components. For example, the functional components include a heat preservation device for a toilet seat (not shown), a toilet cleaning device with a cleaning box, and a sanitary cleaning device 5 for cleaning the user's private parts (see Figure 3 ), hoses, power supply components, control circuit substrates, electric opening and closing components of the electric opening and closing toilet seat and toilet cover 3, valve components, various pipes, etc.

[0029] like Figure 3 As shown in FIG. 1 , the sanitary cleaning device 5 has a human body cleaning function, and has a pair of cleaning nozzles 51 that can move forward and backward, and a baffle portion 52 for opening and closing the front side opening of the cleaning nozzle 51 (see FIG. 1 ). Figure 2 )、Nose cleaning unit 53 (refer to Figure 7 )、Baffle cleaning unit 6 (refer to Figure 2 etc.), warm air drying device 54, cleaning control unit 55 (refer to Fig.10 ).exist Figure 3 The baffle portion 52 is omitted in the figure.

[0030] A pair of cleaning nozzles 51 are arranged separately in the left-right direction X at the center of the left-right direction X of the front side of the functional part 4. The pair of cleaning nozzles 51 are used for anal cleaning and bidet cleaning for cleaning the parts of the human body. The cleaning nozzle 51 is provided with a nozzle outlet 51a (refer to Figure 7 ) releases cleaning water to the human body.

[0031] A pair of cleaning nozzles 51 can be respectively Figure 3 , Figure 7 The cleaning nozzle 51 moves forward and backward between the storage position and the forward position shown in the figure, and the forward position is a position that protrudes further than the baffle portion 52 in the front of the front-rear direction Y from the storage position. The storage position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is stored inside the baffle portion 52. The forward position of the cleaning nozzle 51 is a position where the cleaning nozzle 51 is forwarded to the front side for cleaning the user's local area. A rack of a nozzle driving mechanism (not shown) is provided on the back side of the cleaning nozzle 51.

[0032] The nozzle drive mechanism (not shown) includes a long rack, a pinion, and a motor. The pinion meshes with the rack and is driven by the motor to rotate. The cleaning nozzle 51 is moved forward obliquely downward relative to the support frame 501 of the cleaning nozzle unit assembled with the cleaning nozzle 51 by the nozzle drive mechanism (not shown), so that its front end is Figure 2 The inner side of the baffle portion 52 pushes the back side (inner surface) of the baffle portion 52 toward the outside.

[0033] like Figure 7 As shown, at the lower side of the cleaning nozzle 51, the nozzle lower cleaning part 536 as the nozzle lower cleaning part is assembled with the cleaning nozzle 51. Figure 8 As shown, the lower cleaning portion 536 of the nozzle is provided with a pair of cylindrical shapes having a space inside for the cleaning water to flow. An enlarged water outlet 5361 is formed on the end surface of the front end portion of the lower cleaning portion 536 of the nozzle, and the enlarged water outlet 5361 constitutes a water outlet hole that expands from the base side of the lower cleaning portion 536 of the nozzle toward the end surface to the left and right. As a result, the cleaning water is discharged in a manner of diffusing to the left and right directions from the enlarged water outlet 5361, and the corresponding width of the cleaning nozzle 51 can be cleaned relative to the back side (lower side) of the cleaning nozzle 51. As a result, the lower cleaning portion 536 of the nozzle can be made into a smaller shape, and a larger water sprinkling effect relative to the back side of the cleaning nozzle 51 can be obtained.

[0034] like Figure 7As shown, on the upper side of the cleaning nozzle 51, the upper cleaning part 535 of the nozzle, which is the cleaning part on the top of the nozzle, is assembled with the cleaning nozzle 51. A discharge port 5351 is formed on the upper cleaning part 535 of the nozzle as a through hole constituting a water outlet. The discharge port 5351 is not enlarged like the enlarged water outlet 5361, so one discharge port 5351 discharges cleaning water to the top of the cleaning nozzle 51 in a narrower range than the enlarged water outlet 5361. Such discharge ports 5351 are formed in multiples. Thus, the corresponding width of the cleaning nozzle 51 can be cleaned relative to the surface side (upper side) of the cleaning nozzle 51. Therefore, the upper cleaning part 535 of the nozzle discharges cleaning water at a faster flow rate and more flow rate (flow rate per unit time, i.e., instantaneous flow rate) than the lower cleaning part 536 of the nozzle. Thus, the upper cleaning part 535 of the nozzle can be made into a smaller shape, and the flow rate effect of making the cleaning water discharge faster can be obtained on the top of the cleaning nozzle 51.

[0035] On the upper side of the cleaning nozzle 51 and on the side close to the base relative to the front end of the cleaning nozzle 51, a silver ion supply unit 537 constituting a sterilizing water supply unit is provided as a component with the cleaning nozzle 51. The silver ion supply unit 537 supplies silver ions to the cleaning water to make the cleaning water sterilizing water, and can discharge water from the discharge port 5351 of the cleaning unit 535 on the upper side of the nozzle relative to the cleaning nozzle 51. In this way, the cleaning nozzle 51 can be sterilized.

[0036] The baffle portion 52 is arranged in the center of the left-right direction X on the front side of the functional portion protrusion 42. The baffle portion 52 is formed in a plate shape extending in the left-right direction X (lateral direction) of the toilet 2. When the baffle portion 52 is in the closed position, it is formed in a downwardly inclined plane shape descending from the front side to the rear side (see Figure 7 wait).

[0037] The baffle portion 52 pushes the cleaning nozzle 51 from the back side as the cleaning nozzle 51 advances and retreats, thereby opening and closing the opening 432 of the functional portion front frame 43 formed in front of the cleaning nozzle 51. The functional portion front frame 43 is fixed to the base plate 41. An opening 432 (front opening) constituting the front opening of the cleaning nozzle 51 is formed in the functional portion front frame 43. The opening 432 is an open portion formed on the front side of the functional portion 4. When the baffle portion 52 is in the closed position, it is arranged at the opening 432 of the functional portion front frame 43.

[0038] like Figure 2 , Figure 3As shown, the warm air drying device 54 is arranged on the outside of one side in the left-right direction X behind the baffle portion 52 in the closed position. The warm air drying device 54 has a warm air outlet 541. The warm air outlet 541 is formed to open upwardly behind the opening portion 432 of the functional portion front frame 43. The warm air drying device 54 can, for example, blow warm air from the warm air outlet 541 to the human body at a predetermined time after the cleaning operation of the sanitary cleaning device 5 when the baffle portion 52 is opened, or blow warm air to the back of the baffle portion 52 after cleaning to blow away water droplets when the baffle portion 52 is closed.

[0039] like Fig.10 As shown, the sanitary cleaning device 5 has a cleaning water circuit 56, in which cleaning water for cleaning the front side and the back side of the cleaning nozzle 51 and the baffle part 52 flows. The cleaning water circuit 56 supplies cleaning water to the nozzle cleaning part 53 and the baffle cleaning part 6 as the device cleaning part. In this embodiment, cleaning includes cleaning using sterilized water (silver ion water, hypochlorous acid), high temperature water, foam cleaning, etc.

[0040] like Fig.10 As shown, the washing water circuit 56 has a washing water supply flow path L1 for supplying washing water to the sanitary washing device 5, a baffle washing left flow path L2, a baffle washing right flow path L3, and a nozzle washing flow path L4. The nozzle washing flow path L4 is divided into a nozzle upper side flow path L41 and a nozzle lower side flow path L42 in the middle. The flow rate of washing water in the washing water supply flow path L1 is greater than the flow rate of washing water in the washing nozzle water circuit formed by the hose that allows the washing water discharged from the nozzle water outlet 51a of the washing nozzle 51 to the human body to flow to the washing nozzle 51. As a result, the washing nozzle 51 and the baffle part 52 can be washed with a sufficient flow of washing water. Moreover, the flow rate of washing water discharged from the nozzle washing part 53 and the baffle washing part 6 is greater than the flow rate of washing water discharged from the washing nozzle 51. As a result, the washing nozzle 51 can be washed with a sufficient water outlet flow rate. The above-mentioned "flow rate" refers to the instantaneous flow rate (flow rate per unit time).

[0041] The cleaning water circuit 56 includes the nozzle cleaning unit 53 , the baffle cleaning unit 6 , the solenoid valve 571 , the pressure reducing valve 572 , the vacuum breaker 573 , and the disc valve 564 , and performs each cleaning operation of the sanitary cleaning device 5 .

[0042] The left side flow path L2 for baffle cleaning, the right side flow path L3 for baffle cleaning, the nozzle cleaning flow path L4, the nozzle top side flow path L41 and the nozzle bottom side flow path L42 are, for example, formed by a rubber hose, and they constitute a device washing part water circuit as a water circuit different from the washing nozzle water circuit constituted by the hose that allows the washing water discharged from the nozzle outlet 51a of the washing nozzle 51 to the human body to flow to the washing nozzle 51. Here, "different water circuits" do not mean opening and closing in a common water supply valve, but that each water circuit has a water supply valve that is opened and closed independently. That is, the washing water circuit 56 is configured to include the electromagnetic valve 571, but another water supply valve (water supply valve for washing nozzle) that can be opened and closed independently of the electromagnetic valve 571 is provided in the washing nozzle water circuit not shown. The right side flow path L3 for baffle cleaning constitutes a dedicated water circuit that allows only the washing water to flow to the baffle cleaning part 6. The nozzle cleaning flow path L4 (the flow path L41 on the upper side of the nozzle and the flow path L42 on the lower side of the nozzle) constitutes a dedicated water circuit that allows cleaning water to flow only to the nozzle cleaning part 53. As a result, the nozzle cleaning part 53 can be used to clean the nozzle 51 at the same time as the cleaning operation, and the flow rate of each can be kept constant. In addition, the nozzle cleaning can be performed first and then the baffle cleaning can be performed, thereby allowing the dirt generated during the nozzle cleaning to be washed to the outside of the main body of the functional part (the base plate 41, the housing component 411) through the baffle cleaning.

[0043] The electromagnetic valve 571, the pressure reducing valve 572, the vacuum breaker 573 and the disc valve 564 are sequentially arranged and connected in the cleaning water supply flow path L1. The switching operation of the electromagnetic valve 571 and the disc valve 564 is controlled by the cleaning control unit 55. The cleaning control unit 55 controls the switching operation of the electromagnetic valve 571 and the disc valve 564 to release the cleaning water from the nozzle cleaning unit 53 and the baffle cleaning unit 6.

[0044] The end of the upstream side of the left flow path L2 for baffle cleaning is connected to the disc valve 564, and the end of the downstream side of the left flow path L2 for baffle cleaning is connected to the inlet 615 at the left end of the baffle cleaning part 6. The end of the upstream side of the right flow path L3 for baffle cleaning is connected to the disc valve 564, and the end of the downstream side of the right flow path L3 for baffle cleaning is connected to the inlet 616 at the left end of the baffle cleaning part 6. The cleaning water flowing into the inlet 615 and 616 flows through the flow path inside the baffle cleaning part 6, and the water is discharged from the front water outlet 611 and the back water outlet 621 of the baffle cleaning part 6.

[0045] The upstream end of the nozzle cleaning flow path L4 is connected to the disc valve 564, the downstream end of the nozzle upper side flow path L41 after the nozzle cleaning flow path L4 is branched is connected to the nozzle upper cleaning part 535 of the nozzle cleaning part 53, and the downstream end of the nozzle lower side flow path L42 is connected to the nozzle lower cleaning part 536 of the nozzle cleaning part 53. The cleaning water flowing to the nozzle upper cleaning part 535 is discharged from the discharge port 5351 of the nozzle upper cleaning part 535 relative to the upper side of the cleaning nozzle 51. The cleaning water flowing to the nozzle lower side cleaning part 536 is discharged from the discharge port 5361 of the nozzle lower side cleaning part 536 relative to the lower side of the cleaning nozzle 51.

[0046] The shutter cleaning unit 6 cleans the front surface 52a and the back surface 52b (see Figure 7 The baffle cleaning unit 6 is arranged above the upper end of the baffle unit 52. When the baffle unit 52 is located at the closed position to close the opening 432, the baffle cleaning unit 6 releases the cleaning water downward relative to the baffle unit 5.

[0047] In the present embodiment, "the state in which the baffle portion 52 closes the opening portion 432" and "the state in which the baffle portion 52 is located at the closed position to close the opening portion 432" mean that the baffle portion 52 may not completely close the opening portion 432. "The state in which the baffle portion 52 closes the opening portion 432" and "the state in which the baffle portion 52 is located at the closed position to close the opening portion 432" also include, for example, a state in which the baffle portion 52 substantially blocks the opening portion 432 when the baffle portion 52 is pushed by the cleaning nozzle 51 and slightly opened.

[0048] like Figure 5 , Figure 6 as well as Figure 7 As shown, the baffle cleaning section 6 includes a front cleaning water outlet section 61 (front cleaning section), a rear cleaning water outlet section 62 (back cleaning section), a support section 64 , and a cleaning section fixed section 66 .

[0049] like Figure 5 and Figure 6 As shown, the front washing water outlet 61 has a plurality of front water outlets 611. The plurality of front water outlets 611 discharge washing water toward the front 52a of the baffle portion 52. The back washing water outlet 62 has a plurality of back water outlets 621. The plurality of back water outlets 621 discharge washing water toward the back 52b of the baffle portion 52. A hydrophilic treatment or embossing process for diffusing washing water is applied to the front 52a and the back 52b of the baffle portion 52. Such a hydrophilic treatment may be applied only to at least one of the front 52a and the back 52b, and the hydrophilic treatment is not limited to the embossing process.

[0050] The front washing water outlet 61 and the back washing water outlet 62 discharge the washing water temporarily flowing through the washing water circulation section 63. Figure 2 , Figure 3 As shown, the washing water flow portion 63 is arranged inside the housing member 411 at the upper portion of the front portion of the functional portion 4. The washing water flow portion 63 is formed into a hollow shape extending in the left-right direction X. The lower surface 632 of the washing water flow portion 63 is formed into a flat surface having a width in the front-back direction Y and extending in the left-right direction X.

[0051] A plurality of front water outlets 611 of the front water outlet 61 and a plurality of rear water outlets 621 of the rear water outlet 62 are formed on the lower surface 632 of the water circulation portion 63. Figure 4 As shown, the two ends of the washing water circulation part 63 in the left-right direction X respectively have an inlet 615 and an inlet 616 connected to the end of the downstream side of the left flow path L2 of the baffle cleaning and the end of the downstream side of the right flow path L3 of the baffle cleaning. The inlet 615 and the inlet 616 are welded to the baffle cleaning part 6 as a whole. The washing water is introduced and circulated in the washing water circulation part 63 through the baffle cleaning left flow path L2 and the baffle cleaning right flow path L3. The washing water temporarily circulated in the washing water circulation part 63 is discharged to the baffle part 52 through the multiple front water outlets 611 of the front washing water outlet part 61 and the multiple back water outlets 621 of the back washing water outlet part 62.

[0052] like Figure 5 and Figure 6 As shown, the plurality of front water outlets 611 and the plurality of back water outlets 621 are arranged in two rows in front and back on the lower surface 632 of the washing water circulation portion 63. The plurality of front water outlets 611 are arranged on the front side of the lower surface 632 of the washing water circulation portion 63 in the front-to-back direction Y, and the plurality of back water outlets 621 are arranged on the rear side in the front-to-back direction Y. The plurality of front water outlets 611 and the plurality of back water outlets 621 are staggered from each other in the region in the left-right direction X where the baffle portion 52 is provided so that the positions in the left-right direction X do not overlap, and are arranged in a straight line in the left-right direction X.

[0053] like Figure 7 As shown, the plurality of front water outlets 611 are formed by through holes that penetrate the bottom 632 of the washing water circulation portion 63 obliquely in the up-down direction Z at the front side of the bottom 632 of the washing water circulation portion 63 in the front-back direction Y. Figure 5 As shown, the plurality of front water outlets 611 open downwardly so that the washing water flows along the front surface 52 a of the baffle portion 52 when the baffle portion 52 is located at the closed position.

[0054] The plurality of front water outlets 611 open downward in the direction of the upper end curved portion 521 of the baffle portion 52. Thus, the washing water discharged from the plurality of front water outlets 611 is discharged along the upper end curved portion 521 of the baffle portion 52 and flows along the front face 52a of the baffle portion 52, thereby washing the front face 52a of the baffle portion 52. Furthermore, since the water discharge direction from the water outlets 611 is parallel to the front face 52a of the baffle portion 52, it is less likely to be affected by the deviation of the baffle portion 52. In addition, even when washing water is discharged from the front water outlets 611 and the back water outlets 621 in a state where the baffle portion 52 is removed, it is possible to prevent the washing water from the plurality of front water outlets 611 and the back water outlets 621 from splashing on the human body.

[0055] like Figure 7 As shown, the plurality of rear water outlets 621 are formed by through holes that penetrate the lower surface 632 of the washing water circulation portion 63 obliquely in the vertical direction Z at the rear side of the plurality of front water outlets 611 of the lower surface 632 of the washing water circulation portion 63 in the front-rear direction Y. Figure 5 As shown, the plurality of back water outlets 621 are in a state where the baffle portion 52 is in the closed position so that the washing water flows along the back side 52b of the baffle portion 52 (see Figure 7 ) flows in a manner that opens downward.

[0056] The plurality of back water outlets 621 open in a direction along the back side 52b of the baffle portion 52, that is, downward. Thus, the cleaning water released from the plurality of back water outlets 621 is released in a manner along the back side 52b of the baffle portion 52, and by flowing along the back side 52b of the baffle portion 52, the back side 52b of the baffle portion 52 can be cleaned. In addition, the direction of the opening is the direction in which the baffle cleaning portion 6 releases the cleaning water in a direction in which the electronic components not shown and housed inside the functional portion 4 are not configured. Here, the "direction in which the electronic components are not configured" includes not only a direction in which the electronic components are not configured on the extension line of the water outlet direction of the cleaning water released from the baffle cleaning portion 6, but also a direction in which the cleaning water released from the baffle cleaning portion 6 does not splash on the electronic components. Therefore, it is possible to avoid water splashing on the electronic components.

[0057] In addition, a plurality of front water outlets 611 and rear water outlets 621 are formed at the lower part 632. Since the number of the nozzle water outlets 51a of the cleaning nozzle 51 is small and the total opening area is small, the flow rate of the cleaning water released from the nozzle cleaning part 53 is faster than the flow rate of the cleaning water released from the baffle cleaning part 6. Thus, a strong cleaning effect can be obtained with respect to the cleaning nozzle 51. In addition, the flow rate of the cleaning water released from the baffle cleaning part 6 is greater than the flow rate of the cleaning water released from the nozzle cleaning part 53. Thus, the surface and the back of the baffle part 52 having a larger surface area than the cleaning nozzle 51 can be fully cleaned.

[0058] like Figure 4 As shown, a pair of support parts 64 are provided at a predetermined interval in the central portion of the baffle cleaning part 6 in the longitudinal direction of the baffle cleaning part 6. The support part 64 is formed by a plate-shaped member fixed integrally with the baffle cleaning part 6 and having a positional relationship orthogonal to the longitudinal direction of the baffle cleaning part 6.

[0059] A rotation axis engaging portion 643 is formed at the upper front portion of the support portion 64. The rotation axis 583 of the baffle portion 52 is detachably engaged with the rotation axis engaging portion 643. The baffle portion 52 is rotatably supported by the baffle cleaning portion 6 by engaging the rotation axis 583 of the baffle portion 52 with the rotation axis engaging portion 643. Thus, the baffle portion 52 and the baffle cleaning portion 6 can be made into an integral component, and the deviation of the baffle portion 52, which is the object to be discharged, can be minimized.

[0060] The rear end portion 642 of the support portion 64 abuts against the support frame 501 that supports the cleaning nozzle 51. Thus, the baffle cleaning portion 6 is supported on the base plate 41 at a position separated from the inlet 615 and the inlet 616 welded to the baffle cleaning portion 6. Therefore, when the baffle portion 52 is mounted on the baffle arm 58 that is engaged by pressing the rotating shaft 583 into the rotating shaft engaging portion 643, it is possible to prevent the support portion 64 abutting against the support frame 501 from overcoming the pressing force and causing the baffle cleaning portion 6 to bend.

[0061] like Figure 7 As shown, the rear end portion 642 of the support portion 64 abuts against the support frame 501 assembled with the cleaning nozzle 51. Thus, the shutter cleaning portion 6 is positioned relative to the cleaning nozzle 51. Thus, the positional deviation of the shutter cleaning portion 6 relative to the cleaning nozzle 51 can be suppressed.

[0062] The cleaning section fixing portion 66 is provided integrally with the baffle cleaning section 6 at a central position in the length direction of the baffle cleaning section 6 closer to the inlet 615 and the inlet 616 of the baffle cleaning section 6. The cleaning section fixing portion 66 is fixed to the base plate 41 by screws, thereby fixing the baffle cleaning section 6 to the base plate 41.

[0063] A baffle arm 58 supporting the baffle portion 52 is fixed to the back surface 52b of the baffle portion 52. The baffle arm 58 includes a supported portion 581 extending in the longitudinal direction of the baffle portion 52 and a pair of plate-shaped baffle fixing portions 582 extending downward from both ends of the supported portion 581. The baffle portion 52 is fixed to the lower portion of the baffle fixing portion 582, thereby supporting the baffle portion 52 by the baffle arm 58. A rotating shaft 583 penetrates the supported portion 581. The rotating shaft 583 is engaged with the rotating shaft engaging portion 643. Thus, the baffle portion 52 and the baffle arm 58 are supported rotatably relative to the supporting portion 64.

[0064] Next, the timing at which the cleaning control unit 55 causes the cleaning head 51 , the head cleaning unit 53 , and the shutter cleaning unit 6 to perform the cleaning operation will be described.

[0065] like Fig.11 As shown, the cleaning control unit 55 controls each cleaning operation of the sanitary cleaning device 5. The cleaning control unit 55 controls the cleaning water circuit 56 to perform control related to the cleaning of the sanitary cleaning device 5.

[0066] First, the cleaning control unit 55 is in the storage position ( Fig.11 When the cleaning nozzle 51 is in the "storage" state, the cleaning nozzle 51 and the nozzle cleaning part 53 are controlled to perform pre-cleaning by releasing cleaning water. Next, the cleaning control part 55 controls the cleaning nozzle 51 to a position protruding from the baffle part 52, that is, the forward position ( Fig.11 The user moves forward to the "cleaning position" in the figure, and wash water is released from the cleaning nozzle 51 to clean the user's local area ( Fig.11 control of the "buttocks washing" in the

[0067] Next, the cleaning control unit 55 moves the cleaning nozzle 51 backward and moves the cleaning nozzle 51 back to the storage position ( Fig.11 At the same time, the cleaning control unit 55 discharges cleaning water from the nozzle upper cleaning unit 535 and the nozzle lower cleaning unit 536 of the nozzle cleaning unit 53, and controls the cleaning of the cleaning nozzle 51 in the middle of returning to the storage position and the cleaning of the cleaning nozzle 51 in the state of returning to the storage position. Then, the cleaning control unit 55 stops the discharge of cleaning water from the nozzle upper cleaning unit 535 and the nozzle lower cleaning unit 536 of the nozzle cleaning unit 53.

[0068] Next, the cleaning control unit 55 starts to control the discharge of cleaning water from the front water outlet 611 and the back water outlet 621 of the baffle cleaning unit 6 to the closed baffle unit 52. Thus, the cleaning water can flow along the front 52a and the back 52b of the baffle unit 52, and the cleaning water can be prevented from strongly contacting the baffle unit 52 and scattering.

[0069] Then, after a predetermined time has passed, the cleaning control unit 55 performs control to stop the discharge of the cleaning water from the front water outlet 611 and the back water outlet 621 of the baffle cleaning unit 6. That is, after the cleaning of the cleaning nozzle 51 by the nozzle cleaning unit 53 starts, the cleaning of the baffle unit 52 by the baffle cleaning unit 6 starts, and after the cleaning of the cleaning nozzle 51 by the nozzle cleaning unit 53 ends, the cleaning of the baffle unit 52 by the baffle cleaning unit 6 ends. Thus, in the case where dirt scattered by the cleaning of the cleaning nozzle 51 adheres to the baffle unit 52, the dirt can be removed by cleaning the baffle unit 52.

[0070] After that, the user leaves the toilet seat and the cleaning control unit 55 moves the cleaning nozzle 51 to the forward position ( Fig.11 Next, the cleaning control unit 55 controls the cleaning nozzle 51 to move back and moves the cleaning nozzle 51 back to the storage position ( Fig.11 At the same time, the cleaning control unit 55 performs post-cleaning control by releasing cleaning from the nozzle cleaning unit 53.

[0071] In the post-cleaning, the amount, flow rate (instantaneous flow rate), and flow rate of the washing water discharged from the nozzle cleaning unit 53 are greater than those in the pre-cleaning. Thus, more washing water can be used for the pre-cleaning on the washing nozzle 51 that is almost free of dirt than for the post-cleaning on the washing nozzle 51 that is covered with dirt.

[0072] Next, the cleaning control unit 55 controls the silver ion supply unit 537 to supply silver ions to the cleaning water after the post-cleaning, so that the cleaning water becomes sterile water and is discharged from the discharge port 5351 of the upper cleaning unit 535 of the nozzle to the cleaning nozzle 51. That is, the silver ion supply unit 537 and the upper cleaning unit 535 of the nozzle as the sterile water supply unit discharge the sterile water to the cleaning nozzle 51 after the user leaves the toilet seat, that is, after the post-cleaning. Thus, the cleaning nozzle 51 can be sterilized by the sterile water in a state where dirt is reliably removed by the post-cleaning and when the user is not sitting. Therefore, although the sterilization requires a specified time, the specified time can be ensured after the sterile water is discharged.

[0073] Although preferred embodiments of the present disclosure have been described, the present disclosure is not limited to the above-described embodiments and can be appropriately modified.

[0074] For example, Fig.12 As shown in another embodiment, after the cleaning water is released from the cleaning nozzle 51 and the local cleaning action of cleaning the user's local area is completed ( Fig.12After the cleaning of the cleaning nozzle 51 is started, the cleaning nozzle 51 is moved to the storage position ( Fig.12 Before the washing nozzle 51 is moved to the "storage" in the figure, the post-washing of the sterilizing water to the washing nozzle 51 is started. Then, after the washing of the washing nozzle 51 is completed by releasing the washing water from the nozzle upper washing section 535 and the nozzle lower washing section 536 of the nozzle washing section 53, the post-washing can be completed. In this case, the application of the sterilizing water to the washing nozzle 51 can be completed after the washing of the washing nozzle 51 is completed.

[0075] For example, the housing cleaning unit may have a structure that discharges cleaning water and cleans the housing member 411 as the housing of the main body, and has a dedicated water circuit that allows the cleaning water to flow only to the housing cleaning unit. In this case, the housing cleaning unit can clean the main body housing after cleaning the baffle plate by the baffle plate cleaning unit.

[0076] In addition, for example, the base cleaning unit may have a structure that releases cleaning water and cleans the base component, and has a dedicated water circuit that allows the cleaning water to flow only to the base cleaning unit. In this case, the base cleaning unit can clean the base component after cleaning the baffle plate unit through the baffle plate cleaning unit.

[0077] Description of Reference Numerals

[0078] 1 toilet device, 2 toilet, 4 functional part, 5 sanitary cleaning device, 6 baffle cleaning part (device cleaning part), 41 base plate (base component), 51 cleaning nozzle, 52 baffle part, 53 nozzle cleaning part (device cleaning part), 61 front cleaning water outlet part (front side cleaning part), 62 back cleaning water outlet part (back side cleaning part), 64 supporting part, 535 nozzle upper cleaning part (sterilizing water supply part), 536 nozzle lower cleaning part, 537 silver ion supply part (sterilizing water supply part), L2 baffle cleaning left side flow path (device cleaning part water circuit), L3 baffle cleaning right side flow path (device cleaning part water circuit), L4 nozzle cleaning flow path (device cleaning part water circuit).

Claims

1. A sanitary cleaning device, which is arranged in a functional part of a toilet and has a human body cleaning function, It is characterized in that have: A cleaning nozzle, which is configured to be able to move forward and backward between a storage position and a forward position; a device cleaning section that discharges water relative to a portion of the sanitary cleaning device and performs cleaning; a water circuit for cleaning the nozzle, which allows the cleaning water released from the cleaning nozzle to flow to the cleaning nozzle; The device cleaning part water circuit is formed by a water circuit different from the head cleaning water circuit, and allows the cleaning water discharged from the device cleaning part to flow to the device cleaning part.

2. The sanitary cleaning device according to claim 1, It is characterized in that The flow rate of the washing water in the water circuit for washing the device is greater than the flow rate of the washing water in the water circuit for washing the nozzle.

3. The sanitary cleaning device according to claim 1 or 2, It is characterized in that The water circuit for cleaning the nozzle is provided with a water supply valve for cleaning the nozzle. The device cleaning part water circuit includes a device cleaning part water supply valve different from the device cleaning head water supply valve.

4. The sanitary cleaning device according to any one of claims 1 to 3, It is characterized in that A baffle portion is provided for opening and closing an open portion formed on the front side of the functional portion relative to the cleaning nozzle, The device cleaning unit includes a baffle cleaning unit that releases cleaning water to clean the baffle unit. The device cleaning part water circuit includes a dedicated water circuit for flowing cleaning water to the baffle cleaning part.

5. The sanitary cleaning device according to any one of claims 1 to 4, It is characterized in that The device cleaning unit includes a nozzle cleaning unit that releases cleaning water and cleans the cleaning nozzle. The device cleaning part water circuit includes a dedicated water circuit for flowing cleaning water to the nozzle cleaning part.

6. The sanitary cleaning device according to any one of claims 1 to 5, It is characterized in that The functional part has a body shell, The device cleaning unit includes a shell cleaning unit that releases cleaning water and cleans the main body shell. The device washing part water circuit includes a dedicated water circuit for flowing washing water to the housing washing part.

7. The sanitary cleaning device according to any one of claims 1 to 6, It is characterized in that The functional part has a base member, The device cleaning unit includes a base cleaning unit that releases cleaning water and cleans the base member. The device cleaning part water circuit includes a dedicated water circuit for flowing cleaning water to the base cleaning part.

8. A toilet device, It is characterized in that have: toilet; A functional part arranged at the rear of the toilet; The sanitary cleaning device according to any one of claims 1 to 7.

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