A cleaning device for interlaced pattern facial mask substrate

Abstract

The present invention relates to a cleaning device for an interlaced pattern mask substrate, belonging to the technical field of mask cleaning. The cleaning device for an interlaced pattern mask substrate comprises a pressing box, a material port is provided on one side of the pressing box, an inner wall of the pressing box is fixedly provided with an open ring, the inner side of the open ring is provided with a plurality of grooves arranged at equal distances, the inner sides of the plurality of grooves are provided with a material pushing mechanism, an eccentric ring eccentrically arranged with the open ring is rotatably provided at the inner center of the pressing box, a rotating mechanism for driving the eccentric ring to eccentrically rotate around the open ring is provided on the inner side of the eccentric ring, a plurality of pressing mechanisms located inside the open ring are provided on the outer side of the eccentric ring, and buffer mechanisms connected with the inside of the eccentric ring are provided on the front and rear sides of the plurality of pressing mechanisms. According to the present invention, both sides and the inside of the textile mask can be cleaned by high-pressure water spraying at the same time, thereby improving the cleaning effect and efficiency.

Description

Technical Field

[0001] The invention belongs to the technical field of textile cleaning, and in particular relates to a cleaning device for an interlaced pattern mask substrate. Background Art

[0002] Textiles are made of processed and woven textile fibers. During the weaving process, the textile fibers will rub against each other, and static electricity will be generated during the friction. Static electricity will absorb tiny dust in the air, causing dust to exist on the surface and inside of the textiles. Especially for facial masks produced with textiles, higher requirements for cleaning are required. In order to clean the dust on the surface of textiles, textile cleaning devices are generally used.

[0003] For example, in the announcement number CN109023890B, the name is a textile cleaning device, including a workbench, a support frame a is vertically installed on the left side of the upper end of the workbench, a shaft is longitudinally installed on the front side of the upper end of the support frame a, a pulley a is installed on the outer wall of the shaft, a cylindrical steel pipe is installed on the outer wall of the front end of the pulley a, a bearing is installed on the outer wall of the cylindrical steel pipe, a driving motor is installed on the outer wall of the lower left end of the support frame a, a pulley b is installed on the rotating shaft of the driving motor, and the pulley b is connected to the pulley a through a belt, and the right side of the upper end of the workbench is vertically installed. A support frame b is directly installed. Although the above-mentioned prior art can be linked to the rotation of the pulley a through the operation of the driving motor, the rotation of the pulley a can drive the lifting rod and the pressure plate at its lower end to move up and down synchronously, so that the solid rubber block at the lower end of the pressure plate adheres to the debris and fluff on the surface of the textile. However, since the surface and interior of the textile fibers will rub against each other during the weaving process of the textile mask, dust will exist on the surface and interior of the textile mask. Therefore, the above-mentioned prior art can only clean the dust on the surface of the textile. Therefore, a cleaning device for the interlaced pattern mask substrate is needed. Summary of the invention

[0004] The purpose of the present invention is to provide a cleaning device for an interlaced pattern mask substrate with a simple structure and reasonable design in order to solve the above problems.

[0005] The present invention achieves the above-mentioned purpose through the following technical solutions:

[0006] A cleaning device for an interlaced pattern mask substrate comprises a pressing box, a material opening is provided on one side of the pressing box, an open ring is fixedly provided on the inner wall of the pressing box, a plurality of grooves arranged at equal intervals are provided on the inner side of the open ring, a plurality of inner sides of the grooves are provided with a material pushing mechanism, a cleaning mechanism is provided on the outer side of the open ring and the inner side of the grooves, an eccentric ring eccentrically arranged with the open ring is provided for rotation at the inner center of the pressing box, a rotating mechanism for driving the eccentric ring to rotate eccentrically around the open ring is provided on the inner side of the eccentric ring, a plurality of pressing mechanisms located inside the open ring are provided on the outer side of the eccentric ring, and a plurality of buffer mechanisms connected to the inside of the eccentric ring are provided on the front and rear sides of the pressing mechanisms.

[0007] As a further optimization scheme of the present invention, the rotating mechanism includes a rotating shaft arranged on the inner side of the eccentric ring and concentrically arranged with the open circular ring, a fixing ring is fixedly arranged on the outer side of the rotating shaft by screws, a plurality of connecting rods fixedly connected to the inner side of the eccentric ring are fixedly arranged on the outer side of the fixing ring, and a first servo motor for driving the rotating shaft to rotate is fixedly arranged on the outer side of the pressing box.

[0008] As a further optimization scheme of the present invention, the ejecting mechanism includes a reset plate slidably arranged on one side of the groove opening, the reset plate is provided with a plurality of equidistant through holes, one side of the reset plate is fixedly provided with a plurality of reset springs fixedly connected to the bottom of the groove, the cleaning mechanism includes a plurality of branch pipes fixedly arranged on the outside of the open circular ring, one side of the branch pipe is fixedly connected with a plurality of hollow spike needles penetrating the open circular ring and extending to the inner side of the groove, a plurality of the hollow spike needles are staggered with a plurality of reset springs, a plurality of water spray holes are provided on the side wall of the hollow spike needle, the rear side wall of the pressing box is fixedly provided with an annular tube connected with one end of the plurality of branch pipes at the same time, and a plurality of second water inlet pipes are provided on the annular tube.

[0009] As a further optimization scheme of the present invention, the buffer mechanism includes a fixed cylinder fixedly arranged on the inner side of the eccentric ring, a buffer spring fixedly arranged on the inner side of the fixed cylinder, and a slide plate fixedly arranged on one end of the buffer spring which slides through the eccentric ring and extends to the outside of the eccentric ring.

[0010] As a further optimization scheme of the present invention, the pressing mechanism includes a pressing roller rotatably arranged between the front and rear slides, and a plurality of raised strips are equidistantly arranged on the surface circumference of the pressing roller, and a plurality of blind holes cooperating with hollow spike needles are opened on one side of the plurality of raised strips.

[0011] As a further optimization scheme of the present invention, horizontal plates are fixedly provided on the upper and lower sides of the material port, guide rollers cooperating with the openings of the open circular rings are provided at one end of the two horizontal plates, side plates are fixedly provided on the rear sides of the two horizontal plates, a unwinding disk and a winding disk are provided on the front sides of the side plates, mask substrates are wound on the unwinding disk and the winding disk, a driving mechanism for driving the unwinding disk and the winding disk to rotate simultaneously is provided on the rear sides of the side plates, a lower guide assembly and an upper guide assembly are provided on the front sides of the side plates, and a water spraying mechanism and a drying mechanism are provided on the front sides of the side plates.

[0012] As a further optimization scheme of the present invention, the driving mechanism includes an unwinding shaft which is rotatably arranged at the lower front part of the side plate and coaxially cooperates with the unwinding disk, a winding shaft which is coaxially cooperates with the winding disk is arranged at the upper front part of the side plate, an active synchronous wheel is fixedly arranged at one end of the unwinding shaft, a driven synchronous wheel is fixedly arranged at one end of the winding shaft, a synchronous belt is meshed between the active synchronous wheel and the driven synchronous wheel, and a second servo motor which drives the unwinding shaft to rotate is fixedly arranged at the rear side of the side plate.

[0013] As a further optimization scheme of the present invention, the water spray mechanism includes a water spray pipe fixedly arranged at the lower front part of the side panel, the upper side of the water spray pipe is connected to a plurality of upwardly arranged atomizing nozzles, and the rear side of the side panel is provided with a first water inlet pipe fixedly connected to the water spray pipe.

[0014] As a further optimization scheme of the present invention, the drying mechanism includes two drying tubes fixedly arranged on the upper front side of the side panel, and a plurality of air outlet holes are provided on the sides of the two drying tubes close to each other. An air inlet pipe fixedly connected to the two drying tubes is provided on the rear side of the side panel.

[0015] As a further optimization scheme of the present invention, a drainage hole is opened at the inner bottom of the pressing box, a drainage pipe connected to the drainage hole is fixedly installed at the bottom of the pressing box, a sealing door is installed on the front side of the pressing box by screw sealing, and an observation window is arranged on the sealing door.

[0016] The beneficial effects of the present invention are:

[0017] 1. In the present invention, clean water is pumped into the inner side of the annular tube through the second water inlet pipe by a water pump, and then flows into the interiors of several branch pipes respectively through the annular tube, and then flows into the inner sides of the hollow spike needles through the branch pipes, and finally sprayed out through the water spray holes on the hollow spike needles, so that the dust on the surface of the textile mask is cleaned, and the textile mask is pressed into the inner side of the groove by the raised strips on the surface of the pressure roller, and then the textile mask is squeezed through the multiple hollow spike needles on the inner side of the groove, so that both sides and the interior of the textile mask can be cleaned by high-pressure water spraying at the same time, thereby improving the cleaning effect and efficiency.

[0018] 2. In the present invention, the eccentric ring is driven to rotate eccentrically on the inner side of the open circular ring by the rotating shaft, the fixed ring and the fixed rod, so that the mask substrate between the open circular ring and the eccentric ring can be continuously extruded, thereby increasing the time of pattern pressing and making the pattern clearer. Moreover, the pressure roller on the outer side of the eccentric ring rolls on the inner side of the open circular ring. On the one hand, the patterns on the surface of the pressure roller and the patterns on the inner side of the open circular ring press the patterns of the mask substrate. Through the pressing process, the mask substrate is squeezed when it is wet, so that water and dust inside the mask substrate are squeezed out, thereby improving the cleaning effect. Moreover, the pattern can increase the area of ​​essence adhesion and increase the amount of essence carried. On the other hand, the raised strips on the pressure roller are connected in a plurality of grooves. Continuous rolling can make the mask substrate with pressed patterns produce larger creases. During the pressing process of the creases, the mask substrate can also be squeezed to squeeze out water and dust inside the mask substrate, thereby improving the cleaning effect and making the mask substrate have a certain elasticity. On the one hand, the creases can also allow the mask substrate to carry more essence and improve the use effect of the mask. On the other hand, the mask can be used for faces of different sizes to improve the practicality of the mask. When the mask substrate is creased, the mask substrate can also be perforated, so that when people apply the mask, the essence on the mask substrate away from the face can penetrate into the face through the micropores, thereby preventing the waste of essence and maximizing the use effect of the mask.

[0019] 3. In the present invention, the eccentric ring is driven by the rotating shaft to rotate eccentrically around the open circular ring. During the eccentric rotation, a number of pressure rollers on the outer side of the eccentric ring press the inner side of the open circular ring to move eccentrically, and the buffer spring is compressed. On the one hand, the pressure rollers are always pressed against the inner side of the open circular ring, thereby improving the effect of pressing the texture of the mask substrate, and can extrude the wet mask substrate to improve the dust extrusion effect, thereby improving the cleaning effect of the mask substrate. On the other hand, the pressing time can be increased, thereby improving the quality of the mask substrate texture pressing. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 is a schematic diagram of a first internal overall structure of the present invention;

[0021] Figure 2 is a second internal overall structure schematic diagram of the present invention;

[0022] Figure 3 It is a schematic diagram of the first internal overall structure of the pressing box of the present invention;

[0023] Figure 4 It is a second internal overall structural schematic diagram of the pressing box of the present invention;

[0024] Figure 5 It is a front overall structural schematic diagram of the present invention;

[0025] Figure 6 is a rear view first overall structural schematic diagram of the present invention;

[0026] Figure 7 is a rear view second overall structural schematic diagram of the present invention;

[0027] Figure 8 The present invention Figure 3 Enlarged view of point A in the middle;

[0028] Fig. 9 The present invention Figure 4 Enlarged view of point B in the middle;

[0029] Fig.10 The present invention Figure 4 Enlarged view of point C in the middle;

[0030] Fig.11 The present invention Figure 2 Enlarged view of point D in the middle;

[0031] Fig.12 The present invention Figure 5 Enlarged view of point E in the middle;

[0032] Fig.13 The present invention Figure 6 Enlarged view of point F in the middle.

[0033] In the figure: 1, pressing box; 2, material opening; 3, open ring; 4, groove; 5, eccentric ring; 6, buffer mechanism; 601, fixed cylinder; 602, buffer spring; 603, slide plate; 7, pressing mechanism; 701, pressing roller; 702, raised strip; 703, blind hole; 8, rotating shaft; 9, fixed ring; 10, connecting rod; 11, material lifting mechanism; 1101, reset spring; 1102, reset plate; 1103, through hole; 12, horizontal plate; 13, side plate; 14, unwinding reel; 15, winding reel; 16, lower guide assembly; 17, upper guide assembly; 18, water spraying mechanism; 1801, water spraying pipe; 1802, atomizing nozzle; 180 3. First water inlet pipe; 19. Drying mechanism; 1901. Drying pipe; 1902. Air outlet; 1903. Air inlet pipe; 20. Guide roller; 21. Drain hole; 22. Drain pipe; 23. Mask substrate; 24. Sealing door; 25. Observation window; 26. First servo motor; 27. Driving mechanism; 2701. Second servo motor; 2702. Active synchronous wheel; 2703. Synchronous belt; 2704. Driven synchronous wheel; 2705. Reeling shaft; 2706. Unreeling shaft; 28. Cleaning mechanism; 2801. Ring tube; 2802. Second water inlet pipe; 2803. Branch pipe; 2804. Hollow spike needle; 2805. Water spray hole. DETAILED DESCRIPTION

[0034] The present application is further described in detail below in conjunction with the accompanying drawings. It is necessary to point out here that the following specific implementation methods are only used to further illustrate the present application and cannot be understood as limiting the scope of protection of the present application. Technical personnel in this field can make some non-essential improvements and adjustments to the present application based on the above application content.

[0035] Example 1: Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 5 , Figure 7 , Figure 8 , Fig. 9 , Fig.10As shown, a cleaning device for an interlaced pattern mask substrate comprises a pressing box 1, a sealing door 24 is sealedly installed on the front side of the pressing box 1, the sealing door 24 is fixed to the front side of the pressing box 1 by screws, an observation window 25 is arranged on the sealing door 24, through which the pressing effect and process of the mask substrate 23 inside the pressing box 1 can be observed, a material port 2 is opened on one side of the pressing box 1, an open circular ring 3 is fixedly arranged on the inner side wall of the pressing box 1, a patterned concave-convex groove is arranged on the inner surface of the open circular ring 3 (not shown in the figure), an opening is arranged on one side of the open circular ring 3, and the opening cooperates with the material port 2, that is, one side of the open circular ring 3 is opened toward the material port 2, a plurality of grooves 4 arranged at equal distances are arranged on the inner side of the open circular ring 3, and both ends of the grooves 4 pass through the open circular ring 3, so that When water flows out of the groove 4, one end of the groove 4 adopts a "horn" structure, that is, the part of the inner edge of the groove 4 close to the open ring 3 becomes larger to prevent the mask substrate 23 from being crushed, and a lifting mechanism 11 is arranged on the inner side of the plurality of grooves 4. The lifting mechanism 11 comprises a reset plate 1102 slidably arranged on one side of the opening of the groove 4, and a plurality of through holes 1103 equidistantly arranged are provided on the reset plate 1102. A plurality of reset springs 1101 fixedly connected to the bottom of the groove 4 are fixedly arranged on one side of the reset plate 1102. When the reset plate 1102 is subjected to pressure and slides inward at the edge of the groove 4, the reset spring 1101 will be squeezed and compressed. When the reset plate 1102 is not subjected to pressure, the reset spring 1101 will push the reset plate 1102 to reset. The reset plate 1102 returns to the initial position, and a cleaning mechanism 28 is provided on the outer side of the open ring 3 and the inner side of the groove 4. The cleaning mechanism 28 includes a plurality of branch pipes 2803 fixedly arranged on the outer side of the open ring 3, and one side of the branch pipe 2803 is fixedly connected with a plurality of hollow spike needles 2804 that penetrate the open ring 3 and extend to the inner side of the groove 4. The plurality of hollow spike needles 2804 and the plurality of reset springs 1101 are alternately arranged. The reset plate 1102 is reset by squeezing the reset plate 1102 by the reset spring 1101, so that the mask substrate 23 on one side of the reset plate 1102 can be detached from the hollow spike needles 2804, which is convenient for conveying the mask substrate 23 so that the next section can be cleaned. The plurality of hollow spike needles 2804 cooperate with the plurality of through holes 1103. The hollow spike needles A plurality of water spray holes 2805 are provided on the side wall of the pressing box 1, and a ring-shaped tube 2801 connected with one end of a plurality of branch pipes 2803 is fixedly provided on the rear side wall of the pressing box 1, and the ring-shaped tube 2801 is fixed to the rear wall of the pressing box 1 by a fastener, and a plurality of second water inlet pipes 2802 are provided on the ring-shaped tube 2801, and one end of the plurality of second water inlet pipes 2802 are connected to a water pump (not shown in the figure). When in use, clean water is pumped into the inner side of the ring-shaped tube 2801 through the second water inlet pipe 2802 by the water pump, and then the clean water can flow into the interior of the plurality of branch pipes 2803 through the ring-shaped tube 2801, and then flow into the inner side of the hollow spike needle 2804 through the branch pipe 2803, and finally sprayed out through the water spray hole 2805 on the hollow spike needle 2804.The surface dust on one side of the textile mask is cleaned, and when the pressing roller 701 rolls over the textile mask, the textile mask is pressed into the inner side of the groove 4 by the raised strip 702 on the surface of the pressing roller 701, so that the reset plate 1102 slides into the bottom of the groove 4, so that the hollow spike needles 2804 at the bottom of the groove 4 pass through the through hole 1103, and then the textile mask is squeezed through the multiple hollow spike needles 2804 inside the groove 4, so that both sides and the inside of the textile mask can be cleaned by high-pressure water spray at the same time, thereby improving the cleaning effect and efficiency.

[0036] like Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 6 As shown, an eccentric ring 5 eccentrically arranged with the open circular ring 3 is rotatably arranged at the inner center of the pressing box 1, and a rotating mechanism for driving the eccentric ring 5 to rotate eccentrically around the open circular ring 3 is arranged on the inner side of the eccentric ring 5. The rotating mechanism includes a rotating shaft 8 arranged on the inner side of the eccentric ring 5 and concentrically arranged with the open circular ring 3. A fixing ring 9 is fixedly arranged on the outer side of the rotating shaft 8 by screws, and a plurality of connecting rods 10 fixedly connected to the inner side of the eccentric ring 5 are fixedly arranged on the outer side of the fixing ring 9. A first servo motor 26 driving the rotating shaft 8 to rotate is fixedly arranged on the outer side of the pressing box 1. The first servo motor 26 is electrically connected to a controller (not shown in the figure) through a wire, and the rotation rate of the first servo motor 26 can be controlled by the controller. When in use, the first servo motor 26 drives the rotating shaft 8 to rotate, which can drive the fixed ring 9 on the outside of the rotating shaft 8 to rotate, so that the multiple connecting rods 10 on the outside of the fixed ring 9 rotate, and then drive the eccentric ring 5 to rotate. Since the eccentric ring 5 is eccentrically arranged with respect to the rotating shaft 8, and the rotating shaft 8 is concentrically arranged with the open circular ring 3, the eccentric ring 5 is eccentrically arranged with respect to the open circular ring 3. That is, when the eccentric ring 5 rotates, the distance between the outer surface of the eccentric ring 5 and the inner surface of the open circular ring 3 changes in stages, so that the pressure during the pressing of the mask substrate 23 changes in stages. On the one hand, the moisture inside the mask substrate 23 can be repeatedly squeezed out for cleaning, and at the same time, lines and creases are formed on the surface of the mask substrate 23.

[0037] like Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 8 , Fig.11As shown, the front and rear sides of the plurality of pressing mechanisms 7 are both provided with buffer mechanisms 6 connected to the inside of the eccentric ring 5. The buffer mechanisms 6 include a fixed cylinder 601 fixedly arranged on the inside of the eccentric ring 5. A buffer spring 602 is fixedly arranged on the inside of the fixed cylinder 601. A slide plate 603 that slides through the eccentric ring 5 and extends to the outside of the eccentric ring 5 is fixedly arranged on one end of the buffer spring 602. When in use, the pressing roller 701 is driven to rotate by the rotation of the eccentric ring 5, so that the pressing roller 701 is pressed tightly against the inner wall of the open circular ring 3. Since the eccentric ring 5 and the open circular ring 3 are eccentrically arranged, when the eccentric distal end of the eccentric ring 5 approaches the inner wall of the open circular ring 3, the pressure roller 701 approaches one side of the eccentric ring 5, and the pressure roller 701 can drive the slides 603 at both ends to compress the buffer spring 602 inside the fixed cylinder 601, so that the pressure changes slowly. On the one hand, it can squeeze out the moisture inside the mask substrate 23 to improve the cleaning effect. On the other hand, it can make the pressing effect of the surface lines and creases of the mask substrate 23 better.

[0038] like Figure 1 , Figure 2 , Figure 3 , Figure 4 , Figure 8 , Fig.11As shown, the outer side of the eccentric ring 5 is provided with a plurality of pressing mechanisms 7 located on the inner side of the open circular ring 3, and the pressing mechanism 7 includes a pressing roller 701 rotatably arranged between the front and rear slide plates 603, and a plurality of raised strips 702 are equidistantly arranged on the surface circumference of the pressing roller 701, and the surfaces of the plurality of pressing rollers 701 are provided with textured concave-convex grooves (not shown in the figure). When pressing, the textured concave-convex grooves on the surface of the pressing roller 701 cooperate with the textured concave-convex grooves on the inner side wall of the open circular ring 3, so that the texture of the mask substrate 23 on the inner side wall of the open circular ring 3 can be pressed, and in the process of pressing, the water inside the mask substrate 23 can be The facial mask substrate 23 is extruded separately to improve the cleaning effect of the facial mask substrate 23, and the pressed texture allows the facial mask substrate 23 to carry more essence, thereby improving the use effect of the facial mask. One side of the plurality of raised strips 702 is provided with a plurality of blind holes 703 that cooperate with the hollow spike needles 2804. When in use, the rotation of the eccentric ring 5 drives the pressure roller 701 to rotate together, so that the pressure roller 701 rolls on the inner wall of the eccentric ring 5. Since the eccentric ring 5 is eccentrically arranged, a long axis is formed between the rotating shaft 8 and the farthest end of the eccentric ring 5, and a short axis is formed between the rotating shaft 8 and the nearest end of the eccentric ring 5. When the pressure roller at the long axis end When 701 is pressed against the inner wall of the open circular ring 3, the raised strip 702 on the surface of the pressing roller 701 cooperates with the groove 4 on the inner wall of the open circular ring 3, so that a crease is generated at the matching position of the mask substrate 23. The mask substrate 23 can be squeezed through the crease pressing process, which makes it easier to squeeze out the dust inside the mask substrate 23 and improve the cleaning effect. In the process of cooperation, the raised strip 702 will press the reset plate 1102 to slide into the inner side of the groove 4, so that the through hole 1103 on the reset plate 1102 slides from the tip of the hollow spike needle 2804 into the inner side of the groove 4, so that in the process of pressing the crease, , so that the mask substrate 23 is micro-perforated. On the one hand, the dust inside the mask substrate 23 and the other side can be cleaned during the process. On the other hand, when using the mask, it is convenient for the essence on the mask substrate 23 away from the face to penetrate into the face through the micropores, thereby improving the effect of using the essence on the face. When the pressing roller 701 at the short axis end is pressed tightly against the inner wall of the open circular ring 3, since the distance between the pressing roller 701 and the inner wall of the open circular ring 3 is relatively long, the hollow spike needle 2804 will not slide out of the through hole 1103 on the reset plate 1102, and only the texture of the mask substrate 23 will be suppressed.

[0039] Embodiment 2: Based on embodiment 1, further improvement is made in that Figure 1 , Figure 2 , Figure 5 , Figure 6 , Fig.12 , Fig.13As shown, the upper and lower sides of the material port 2 are fixedly provided with transverse plates 12, one end of the two transverse plates 12 is provided with a guide roller 20 that matches the opening of the open ring 3, the rear sides of the two transverse plates 12 are fixedly provided with side plates 13, the front sides of the side plates 13 are provided with an unwinding disk 14 and a winding disk 15, and the unwinding disk 14 and the winding disk 15 are both wound with a mask substrate 23, the mask substrate 23 on the unwinding disk 14 is unwound from the bottom of the unwinding disk 14, and the mask substrate 23 on the winding disk 15 is unwound from the bottom of the unwinding disk 14, and the mask substrate 23 on the winding disk 15 is unwound from the bottom of the unwinding disk 14. The top of the winding reel 15 is wound, and a driving mechanism 27 for driving the unwinding reel 14 and the winding reel 15 to rotate simultaneously is arranged on the rear side of the side plate 13. The driving mechanism 27 includes an unwinding shaft 2706 rotatably arranged at the lower front part of the side plate 13 and coaxially matched with the unwinding reel 14, and a winding shaft 2705 coaxially matched with the winding reel 15 is rotatably arranged at the upper front part of the side plate 13. An active synchronous wheel 2702 is fixedly arranged at one end of the unwinding shaft 2706, and one end of the winding shaft 2705 is fixedly arranged at one end of the winding shaft 2705. A driven synchronous wheel 2704 is fixedly provided, and a synchronous belt 2703 is meshed between the active synchronous wheel 2702 and the driven synchronous wheel 2704. A second servo motor 2701 that drives the unwinding shaft 2706 to rotate is fixedly provided on the rear side of the side plate 13. When in use, the unwinding shaft 2706 is driven to rotate by the second servo motor 2701, so that the unwinding disk 14 on the unwinding shaft 2706 can be rotated, so that the mask substrate 23 on the unwinding disk 14 is unwound, and at the same time, the active synchronous wheel 2702 on the unwinding shaft 2706 drives the synchronous belt 2703 to rotate, thereby rotating the winding shaft 2705 at the other end of the synchronous belt 2703, and then the winding disk 15 on the winding shaft 2705 rotates synchronously, so that the mask substrate 23 is wound, so that the entire unwinding, pressing and winding are completely automatic, so that the mask substrate 23 completes the entire cleaning, and the automation of pressing the mask lines and creases is improved, thereby improving the mask cleaning efficiency.

[0040] like Figure 2 , Figure 5 , Figure 6 , Fig.12As shown, a lower guide assembly 16 and an upper guide assembly 17 are provided on the front side of the side plate 13, and both the lower guide assembly 16 and the upper guide assembly 17 include two vertically arranged rollers, through which the surface of the mask substrate 23 can be leveled and guided for transportation, thereby improving the smoothness of mask processing; a water spraying mechanism 18 is provided on the lower front side of the side plate 13, and the water spraying mechanism 18 includes a water spraying pipe 1801 fixedly arranged on the lower front side of the side plate 13, and a plurality of upwardly arranged atomizing nozzles 1802 are connected on the upper side of the water spraying pipe 1801, and the atomizing nozzles 1802 spray water toward the lower surface of the mask substrate 23, so that the lower surface of the mask substrate 23 can be better fitted to the inner wall of the open circular ring 3, so that the mask The substrate 23 is pre-moistened to soften the dust, which facilitates the subsequent cleaning of the mask substrate 23 by spraying water, and the moistened mask substrate 23 can keep the texture for a longer time, thereby improving the effect of pressing the mask texture and creases. A first water inlet pipe 1803 fixedly connected to the water spray pipe 1801 is provided on the rear side of the side panel 13, and one end of the first water inlet pipe 1803 is connected to a water pump (not shown in the figure). Water can enter the interior of the water spray pipe 1801 through the first water inlet pipe 1803 through the water pump. A drainage hole 21 is provided at the inner bottom of the pressing box 1, and a drainage pipe 22 connected to the drainage hole 21 is fixedly provided at the bottom of the pressing box 1. Water at the bottom of the pressing box 1 can be discharged through the drainage pipe 22 and the drainage hole 21.

[0041] like Figure 2 , Figure 5 , Figure 6 , Fig.12 As shown, a drying mechanism 19 is provided on the upper front side of the side panel 13, and the drying mechanism 19 includes two drying tubes 1901 fixedly provided on the upper front side of the side panel 13, and a plurality of air outlet holes 1902 are provided on the sides of the two drying tubes 1901 close to each other, and an air inlet pipe 1903 fixedly connected to the two drying tubes 1901 is provided on the rear side of the side panel 13, and one end of the air inlet pipe 1903 is connected to a hot air blower (not shown in the figure). After cleaning and pressing are completed, hot water can be blown into the interior of the two drying tubes 1901 by the hot air blower, and finally blown out through the air outlet holes 1902 between the two drying tubes 1901, so that the pressed mask substrate 23 is dried for subsequent use and storage.

[0042] It should be noted that, when using the interlaced pattern facial mask substrate cleaning device, first the unwinding disk 14 and the winding disk 15 are fixed to the unwinding shaft 2706 and the winding shaft 2705 respectively by screws, and then the facial mask substrate 23 on the unwinding disk 14 is pulled out from the bottom of the unwinding disk 14, and passes through the lower guide assembly 16 and the top of the water spray mechanism 18 in turn, and then passes through the upper surface of the lower guide roller 20 to penetrate into the inner lower part of the open circular ring 3, and then passes out from the inner upper part of the open circular ring 3, and then passes through the lower surface of the upper guide roller 20 to penetrate between the two drying tubes 1901, and then passes through the upper guide assembly 17, and finally is wound up from the upper side of the winding disk 15. During use, the unwinding shaft 2706 is driven to rotate by the second servo motor 2701, so that the facial mask substrate 23 can be cleaned. The unwinding disk 14 on the unwinding shaft 2706 rotates, so that the mask substrate 23 on the unwinding disk 14 is unwound, and at the same time, the active synchronous wheel 2702 on the unwinding shaft 2706 drives the synchronous belt 2703 to rotate, so that the reel 2705 at the other end of the synchronous belt 2703 rotates, so that the reel 15 on the reel 2705 rotates synchronously, and at the same time, the mask substrate 23 on the unwinding disk 14 is unwound from the bottom of the unwinding disk 14, and at the same time, the reel 15 rewinds the mask substrate 23 from the top of the reel 15. In the process of unwinding and rewinding, the mask substrate 23 slides from the inner wall of the open circular ring 3. When the mask substrate 23 is laid on the inner wall of the open circular ring 3, the unwinding and rewinding are stopped. At this time, the first servo motor 2 6 drives the rotating shaft 8 to rotate, which can drive the fixed ring 9 on the outside of the rotating shaft 8 to rotate, so that the multiple connecting rods 10 on the outside of the fixed ring 9 rotate, and then drive the eccentric ring 5 to rotate eccentrically on the inside of the open circular ring 3. During the eccentric rotation, the multiple pressure rollers 701 on the outside of the eccentric ring 5 roll on the inner wall of the open circular ring 3, and the textured concave-convex grooves on the surfaces of the pressure rollers 701 cooperate with the textured concave-convex grooves on the inner wall of the open circular ring 3, so that the mask substrate 23 on the inner wall of the open circular ring 3 is pressed, and the mask substrate 23 is continuously squeezed, so that the water and dust inside the mask substrate 23 are squeezed out, thereby improving the cleaning effect. Since the eccentric ring 5 is eccentrically arranged, a long axis is formed between the rotating shaft 8 and the farthest end of the eccentric ring 5. 5 A short axis is formed between the nearest ends. When the pressure roller 701 at the long axis end is pressed against the inner wall of the open circular ring 3, the raised strip 702 on the surface of the pressure roller 701 cooperates with the groove 4 on the inner wall of the open circular ring 3, so that the reset plate 1102 slides into the bottom of the groove 4, so that the hollow spike needle 2804 at the bottom of the groove 4 passes through the through hole 1103, and then squeezes the textile mask through the multiple hollow spike needles 2804 inside the groove 4, so that both sides and the inside of the textile mask can be cleaned by high-pressure water spray at the same time, and when the raised strip 702 cooperates with the groove 4, the mask substrate 23 will be creased and squeezed at the matching position, so that the water and dust inside the mask substrate 23 are squeezed out, and in the process of the raised strip 702 cooperating with the groove 4,The raised strip 702 will press the reset plate 1102 to slide into the inner side of the groove 4, so that the through hole 1103 on the reset plate 1102 slides from the tip of the hollow spike needle 2804 into the inner side of the groove 4, so that the mask substrate 23 can be micro-perforated during the process of pressing the crease. When the eccentric ring 5 rotates one or several circles, the pressure roller 701 at the long axis end of the eccentric ring 5 slides to the position of the material port 2, and then the winding disk 15 and the unwinding disk 14 rotate synchronously, so that the pressed mask substrate 23 is rolled up, and the new mask substrate 23 is unwound onto the inner side wall of the open circular ring 3, and the next pattern pressing and perforation is performed, and so on, the whole roll of the mask substrate 23 is processed.

[0043] The above-mentioned embodiments only express several implementation methods of the present invention, and the description thereof is relatively specific and detailed, but it cannot be understood as limiting the scope of the present invention. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the present invention, which all belong to the protection scope of the present invention.

Claims

1. A cleaning device for a woven pattern facial mask substrate, comprising a pressing box (1), characterized in that: A material opening (2) is provided on one side of the pressing box (1); an open circular ring (3) is fixedly provided on the inner side wall of the pressing box (1); the inner side wall of the open circular ring (3) is provided with a patterned concave-convex groove; a plurality of grooves (4) are provided on the inner side of the open circular ring (3) at equal intervals; a material ejection mechanism (11) is provided on the inner side of each of the plurality of grooves (4); a cleaning mechanism (28) is provided on the outer side of the open circular ring (3) and the inner side of the grooves (4); an eccentric ring (5) eccentrically arranged with the open circular ring (3) is provided at the inner center of the pressing box (1); a rotating mechanism for driving the eccentric ring (5) to rotate eccentrically around the open circular ring (3) is provided on the inner side of the eccentric ring (5); a plurality of pressing mechanisms (7) located on the inner side of the open circular ring (3) are provided on the outer side of the eccentric ring (5); a plurality of buffer mechanisms (6) connected to the inside of the eccentric ring (5) are provided on the front and rear sides of each of the plurality of pressing mechanisms (7); The ejecting mechanism (11) comprises a reset plate (1102) slidably arranged on one side of the opening of the groove (4), the reset plate (1102 being provided with a plurality of through holes (1103) arranged at equal intervals, a plurality of reset springs (1101) fixedly arranged on one side of the reset plate (1102) and connected to the bottom of the groove (4), the cleaning mechanism (28) comprising a plurality of branch pipes (2803) fixedly arranged on the outside of the open circular ring (3), a plurality of springs (1101) penetrating the open circular ring (3) and extending to the groove (4) being fixedly connected on one side of the branch pipes (2803). A hollow spike needle (2804) is disposed inside the groove (4); a plurality of the hollow spike needles (2804) and a plurality of return springs (1101) are arranged alternately; a plurality of the hollow spike needles (2804) cooperate with a plurality of through holes (1103); a plurality of water spray holes (2805) are provided on the side wall of the hollow spike needle (2804); an annular tube (2801) connected to one end of the plurality of branch tubes (2803) is fixedly disposed on the rear side wall of the pressing box (1); and a plurality of second water inlet pipes (2802) are disposed on the annular tube (2801); The buffer mechanism (6) comprises a fixed cylinder (601) fixedly arranged on the inner side of the eccentric ring (5), a buffer spring (602) fixedly arranged on the inner side of the fixed cylinder (601), and a slide plate (603) fixedly arranged at one end of the buffer spring (602) which slides through the eccentric ring (5) and extends to the outer side of the eccentric ring (5); The pressing mechanism (7) comprises a pressing roller (701) rotatably arranged between two front and rear slide plates (603), the surface of the pressing roller (701) being provided with grooves with textures, a plurality of raised strips (702) being equidistantly arranged on the circumference of the surface of the pressing roller (701), and a plurality of blind holes (703) cooperating with the hollow spike needles (2804) being opened on one side of the plurality of raised strips (702).

2. The cleaning device for a woven pattern mask substrate according to claim 1, characterized in that: The rotating mechanism comprises a rotating shaft (8) arranged on the inner side of the eccentric ring (5) and arranged concentrically with the open circular ring (3); a fixing ring (9) is fixedly arranged on the outer side of the rotating shaft (8) by screws; a plurality of connecting rods (10) fixedly connected to the inner side of the eccentric ring (5) are fixedly arranged on the outer side of the fixing ring (9); and a first servo motor (26) for driving the rotating shaft (8) to rotate is fixedly arranged on the outer side of the pressing box (1).

3. The cleaning device for a woven pattern mask substrate according to claim 1, characterized in that: A transverse plate (12) is fixedly provided on the upper and lower sides of the material opening (2); a guide roller (20) cooperating with the opening of the open circular ring (3) is provided at one end of the two transverse plates (12); a side plate (13) is fixedly provided on the rear side of the two transverse plates (12); a reel (14) and a reel (15) are provided on the front side of the side plates (13); a facial mask substrate (23) is wound around the reel (14) and the reel (15); a driving mechanism (27) for driving the reel (14) and the reel (15) to rotate simultaneously is provided on the rear side of the side plates (13); a lower guide assembly (16) and an upper guide assembly (17) are provided on the front side of the side plates (13); and a water spraying mechanism (18) and a drying mechanism (19) are provided on the front side of the side plates (13).

4. The cleaning device for a woven pattern mask substrate according to claim 3, characterized in that: The driving mechanism (27) comprises an unwinding shaft (2706) rotatably arranged at the lower front part of the side plate (13) and coaxially matched with the unwinding disk (14); a reeling shaft (2705) rotatably arranged at the upper front part of the side plate (13) and coaxially matched with the reeling disk (15); an active synchronous wheel (2702) is fixedly arranged at one end of the unwinding shaft (2706); a driven synchronous wheel (2704) is fixedly arranged at one end of the reeling shaft (2705); a synchronous belt (2703) is meshed between the active synchronous wheel (2702) and the driven synchronous wheel (2704); and a second servo motor (2701) for driving the unwinding shaft (2706) to rotate is fixedly arranged at the rear side of the side plate (13).

5. The cleaning device for a woven pattern mask substrate according to claim 4, characterized in that: The water spray mechanism (18) comprises a water spray pipe (1801) fixedly arranged at the lower front part of the side plate (13); the upper side of the water spray pipe (1801) is connected to a plurality of upwardly arranged atomizing nozzles (1802); and the rear side of the side plate (13) is provided with a first water inlet pipe (1803) fixedly connected to the water spray pipe (1801).

6. The cleaning device for a woven pattern mask substrate according to claim 5, characterized in that: The drying mechanism (19) comprises two drying tubes (1901) fixedly arranged on the upper front part of the side plate (13), a plurality of air outlet holes (1902) being provided on the sides of the two drying tubes (1901) close to each other, and an air inlet pipe (1903) fixedly connected to the two drying tubes (1901) being provided on the rear side of the side plate (13).

7. A cleaning device for a woven pattern mask substrate according to any one of claims 1 to 6, characterized in that: A drainage hole (21) is provided at the inner bottom of the pressing box (1), a drainage pipe (22) connected to the drainage hole (21) is fixedly provided at the bottom of the pressing box (1), a sealing door (24) is installed on the front side of the pressing box (1) by means of screw sealing, and an observation window (25) is provided on the sealing door (24).

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