Display panel, preparation method and display device

Abstract

The embodiment of the invention discloses a display panel, a preparation method and a display device, and the display panel comprises a substrate which comprises a bending region and a non-bending region; the non-bending area comprises a display area with a plurality of sub-pixels; the first refractive index film layer is arranged on the substrate, and the display area is provided with the first refractive index film layer; the second refractive index film layer is arranged on the side, away from the substrate, of the first refractive index film layer, and the second refractive index film layer covers the first refractive index film layer and fills the multiple openings; the refractive index of the second refractive index film layer is greater than that of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the substrate is not overlapped with the bending area, the orthographic projection of the second refractive index film layer on the substrate is provided with a first film layer boundary close to the bending area, the bending area is provided with a first bending boundary close to the second refractive index film layer, and the first distance between the first film layer boundary and the first bending boundary is larger than 0.

Description

Technical Field

[0001] The present disclosure relates to the field of display technology, and in particular to a display panel, a preparation method and a display device. Background Art

[0002] With the development of display technology, consumers' demands for display panels are becoming more diversified and personalized. Display panels are favored by consumers because of their advantages such as bendability and portability. However, when the display panel is bent, the signal line in the bending area may be pulled and broken, causing abnormal display of the display panel. Summary of the invention

[0003] The present disclosure provides a display panel, including:

[0004] A substrate, comprising: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels;

[0005] A first refractive index film layer is disposed on the base substrate, the first refractive index film layer is disposed in the display area, and the first refractive index film layer has a plurality of openings, and the plurality of openings are disposed correspondingly to the plurality of sub-pixels;

[0006] A second refractive index film layer is disposed on a side of the first refractive index film layer away from the base substrate, the second refractive index film layer covers the first refractive index film layer and fills at least a portion of the plurality of openings;

[0007] Among them, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0.

[0008] In some possible implementations, the non-bending area includes a first non-bending area and a second non-bending area, the first non-bending area and the second non-bending area are arranged on both sides of the bending area, and the first non-bending area includes the display area;

[0009] The second refractive index film layer is disposed in the first non-bending area, and the orthographic projection of the second refractive index film layer on the base substrate covers the display area.

[0010] In some possible implementations, the first non-bending region is provided with the first refractive index film layer, the orthographic projection of the first refractive index film layer in the first non-bending region on the base substrate has a second film layer boundary close to the bending region, and a second distance between the second film layer boundary and the first bending boundary is not less than 0; and / or,

[0011] The second non-bending area is provided with the first refractive index film layer, and the first refractive index film layer in the second non-bending area has a third film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and a third distance between the third film layer boundary and the second bending boundary is not less than 0.

[0012] In some possible implementations, the display panel further includes: a first optical film layer, the first optical film layer being disposed between the first refractive index film layer and the base substrate; and the first optical film layer covering the display area in an orthographic projection of the base substrate.

[0013] In some possible implementations, the orthographic projection of the first optical film layer on the base substrate does not overlap with the bending area;

[0014] The first non-bending area is provided with the first optical film layer, the orthographic projection of the first optical film layer in the first non-bending area on the base substrate has a fourth film layer boundary close to the bending area, and a fourth distance between the fourth film layer boundary and the first bending boundary is not less than 0; and / or,

[0015] The second non-bending area is provided with the first optical film layer, the first optical film layer in the second non-bending area has a fifth film layer boundary close to the bending area on the orthographic projection of the base substrate, the bending area has a second bending boundary away from the second refractive index film layer, and the fifth distance between the fifth film layer boundary and the second bending boundary is not less than 0.

[0016] In some possible implementations, the fourth film layer boundary is disposed between the first film layer boundary and the first bending boundary.

[0017] In some possible implementations, the second film layer boundary is disposed between the fourth film layer boundary and the first bending boundary; or,

[0018] The second film layer boundary is arranged between the fourth film layer boundary and the first film layer boundary; or,

[0019] The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the fourth film layer boundary is disposed between the second film layer boundary and the first film layer boundary; or,

[0020] The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the second film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary.

[0021] In some possible implementations, the display panel further includes: a second optical film layer, wherein the second optical film layer is disposed between the first optical film layer and the base substrate; and the orthographic projection of the second optical film layer on the base substrate covers the display area.

[0022] In some possible implementations, the orthographic projection of the second optical film layer on the base substrate does not overlap with the bending area;

[0023] The first non-bending area is provided with the second optical film layer, the orthographic projection of the second optical film layer in the first non-bending area on the base substrate has a sixth film layer boundary close to the bending area, and a sixth distance between the sixth film layer boundary and the first bending boundary is not less than 0; and / or,

[0024] The second non-bending area is provided with the second optical film layer, and the second optical film layer in the second non-bending area has a seventh film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and the seventh distance between the seventh film layer boundary and the second bending boundary is not less than 0.

[0025] In some possible implementations, the sixth film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary; or,

[0026] The sixth film layer boundary is disposed between the fourth film layer boundary and the second film layer boundary; or,

[0027] The sixth film layer boundary is disposed between the fourth film layer boundary and the first bending boundary.

[0028] In some possible implementations, the display panel further includes: a touch insulating layer, wherein the touch insulating layer is disposed between the second optical adhesive and the base substrate; and the touch insulating layer covers the display area in an orthographic projection of the base substrate.

[0029] In some possible implementations, the orthographic projection of the touch insulating layer on the base substrate does not overlap with the bending area;

[0030] The first non-bending area is provided with the touch insulating layer, the orthographic projection of the touch insulating layer in the first non-bending area on the base substrate has an eighth film layer boundary close to the bending area, and an eighth distance between the eighth film layer boundary and the first bending boundary is greater than 0; and / or,

[0031] The touch insulating layer is provided in the second non-bending area, and the touch insulating layer in the second non-bending area has a ninth film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and a ninth distance between the ninth film layer boundary and the second bending boundary is not less than 0.

[0032] In some possible implementations, the eighth film layer boundary is disposed between the first film layer boundary and the sixth film layer boundary; or,

[0033] The eighth film layer boundary is arranged between the second film layer boundary and the sixth film layer boundary; or,

[0034] The eighth film layer boundary is disposed between the fourth film layer boundary and the sixth film layer boundary.

[0035] In some possible implementations, the display panel further includes: a thin film encapsulation layer, wherein the thin film encapsulation layer is disposed between the base substrate and the touch insulating layer; and the thin film encapsulation layer covers the display area in an orthographic projection of the base substrate.

[0036] In some possible implementations, the display panel further includes:

[0037] A thin film transistor array layer is disposed on the base substrate;

[0038] A first planarization layer disposed on a side of the thin film transistor array layer away from the base substrate;

[0039] A pixel defining layer disposed on a side of the first planarization layer away from the base substrate;

[0040] A light emitting device disposed in the opening of the pixel defining layer;

[0041] The thin film encapsulation layer is arranged on a side of the light emitting device away from the base substrate;

[0042] A first touch electrode film layer disposed on a side of the thin film encapsulation layer away from the base substrate;

[0043] Disposing the touch insulating layer on the side of the first touch electrode film layer away from the base substrate;

[0044] A second touch electrode film layer is disposed on a side of the touch insulating layer away from the base substrate;

[0045] A second optical film layer disposed on a side of the second touch electrode film layer away from the base substrate;

[0046] A black matrix and / or a color resist layer disposed on a side of the second optical film layer away from the base substrate;

[0047] A first optical film layer disposed on a side of the black matrix and / or the color resist layer away from the base substrate;

[0048] A first refractive index film layer disposed on a side of the first optical film layer away from the base substrate;

[0049] A second refractive index film layer is disposed on a side of the first refractive index film layer away from the base substrate.

[0050] In some possible embodiments, the display panel further includes: a protective layer, wherein the protective layer is disposed on the side of the first refractive index film layer away from the base substrate, the orthographic projection of the protective layer on the base substrate covers the bending area, and the orthographic projection of the protective layer on the base substrate does not overlap with the orthographic projection of the second refractive index film layer on the base substrate.

[0051] In some possible implementations, the display panel further includes:

[0052] A first optical film layer, wherein the first optical film layer is disposed between the first refractive index film layer and the base substrate;

[0053] A second optical film layer, wherein the second optical film layer is disposed between the first optical film layer and the base substrate;

[0054] A touch insulating layer, the touch insulating layer is disposed between the second optical adhesive and the base substrate;

[0055] A thin film encapsulation layer, wherein the thin film encapsulation layer is disposed between the base substrate and the touch insulating layer;

[0056] A first inorganic layer, wherein the first inorganic layer is disposed between the thin film encapsulation layer and the base substrate;

[0057] A second inorganic layer, wherein the second inorganic layer is disposed between the thin film encapsulation layer and the base substrate;

[0058] Wherein, the orthographic projection of the first refractive index film layer on the base substrate also covers the bending area and the second non-bending area;

[0059] The orthographic projection of the first optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area;

[0060] The orthographic projection of the second optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area;

[0061] The orthographic projection of the touch insulating layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area;

[0062] The orthographic projection of the thin film encapsulation layer on the base substrate covers the display area;

[0063] The orthographic projection of the first inorganic layer on the base substrate does not overlap with the bending region, and the orthographic projection of the first inorganic layer on the base substrate is aligned with the bending region near the boundary of the bending region;

[0064] The orthographic projection of the second inorganic layer on the base substrate does not overlap with the bending region.

[0065] In some possible implementations, the display panel further includes: a plurality of signal lines; the plurality of signal lines include: a plurality of data lines, a low voltage signal line, an initialization signal line, a plurality of clock signal lines and a high voltage signal line;

[0066] In the bending area, the orthographic projection of the area where the low voltage signal line is located on the substrate is arranged between the orthographic projection of the area where the multiple data lines are located on the substrate, the orthographic projection of the area where the initialization signal line is located on the substrate, the orthographic projection of the area where the multiple clock signal lines are located on the substrate, and the orthographic projection of the area where the high voltage signal line is located on the substrate.

[0067] The embodiment of the present disclosure also provides a display device, including the above-mentioned display panel.

[0068] The present disclosure also provides a method for preparing a display panel, including:

[0069] A first refractive index film layer is formed on a base substrate; wherein the base substrate comprises: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels; the display area is provided with the first refractive index film layer, and the first refractive index film layer has a plurality of openings, and the plurality of openings are provided correspondingly to the plurality of sub-pixels;

[0070] Forming a second refractive index film layer on a side of the first refractive index film layer away from the base substrate; wherein the second refractive index film layer covers the first refractive index film layer and fills at least a portion of the plurality of openings;

[0071] Among them, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0. BRIEF DESCRIPTION OF THE DRAWINGS

[0072] Figure 1 Some structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0073] Figure 2 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0074] Figure 3a Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0075] Figure 3b Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0076] Figure 4 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0077] Figure 5 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0078] Figure 6 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0079] Figure 7 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0080] Figure 8 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0081] Fig. 9 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0082] Fig.10 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0083] Fig.11 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0084] Fig.12 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0085] Fig.13a Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0086] Fig.13b Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0087] Fig.14a Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0088] Fig.14b Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0089] Fig.15 Some further structural schematic diagrams of display panels in the embodiments of the present disclosure;

[0090] Fig.16 Some further structural schematic diagrams of the display panel in the embodiments of the present disclosure. DETAILED DESCRIPTION

[0091] In order to make the purpose, technical solution and advantages of the embodiments of the present disclosure clearer, the technical solution of the embodiments of the present disclosure will be clearly and completely described below in conjunction with the drawings of the embodiments of the present disclosure. Obviously, the described embodiments are part of the embodiments of the present disclosure, not all of the embodiments. And in the absence of conflict, the embodiments in the present disclosure and the features in the embodiments can be combined with each other. Based on the described embodiments of the present disclosure, all other embodiments obtained by ordinary technicians in the field without creative work are within the scope of protection of the present disclosure.

[0092] Unless otherwise defined, the technical terms or scientific terms used in the present disclosure should be understood by people with ordinary skills in the field to which the present disclosure belongs. "First", "second" and similar words used in the present disclosure do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect.

[0093] It should be noted that the sizes and shapes of the figures in the accompanying drawings do not reflect the actual proportions, and are only intended to illustrate the present disclosure. The same or similar reference numerals throughout represent the same or similar elements or elements having the same or similar functions.

[0094] In an embodiment of the present disclosure, a display device includes a display panel. The display panel includes a display area. The display area has a plurality of pixel units, and each pixel unit includes a plurality of sub-pixels. Each sub-pixel may include a light-emitting device and a pixel driving circuit for driving the light-emitting device to emit light. Among them, the light-emitting device includes an anode, a light-emitting functional layer, and a cathode that are stacked. Further, the light-emitting device may include: at least one of an organic light-emitting diode (OLED), a quantum dot light-emitting diode (QLED), a Micro LED, and a MiniLED. In addition, a general pixel driving circuit may include a plurality of transistors such as a driving transistor, a switching transistor, and a storage capacitor, and its specific structure and working principle may be the same as those in the prior art, and will not be repeated here.

[0095] The display device in the embodiment of the present disclosure may be a flexible display device. Optionally, the display panel may be a flexible display panel. Of course, the display device in the embodiment of the present disclosure may also be a display device in other forms, and the display panel may also be a display panel in other forms, which are not limited here.

[0096] Exemplarily, each pixel unit includes a red sub-pixel, a green sub-pixel and a blue sub-pixel, wherein the red sub-pixel includes a light-emitting device that displays red, the green sub-pixel includes a light-emitting device that displays green, and the blue sub-pixel includes a light-emitting device that displays blue.

[0097] For example, Figure 1As shown, the display panel may include: a substrate 100, a thin film transistor array layer 110 disposed on the substrate 100, a first planarization layer 150 disposed on a side of the thin film transistor array layer 110 facing away from the substrate 100, a pixel defining layer 120 disposed on a side of the first planarization layer 150 facing away from the substrate 100, a light emitting device 130 disposed in an opening of the pixel defining layer 120, a thin film encapsulation layer 140 disposed on a side of the light emitting device 130 facing away from the substrate 100, a first touch electrode film layer 161 disposed on a side of the thin film encapsulation layer 140 facing away from the substrate 100, a touch insulating layer 170 disposed on a side of the first touch electrode film layer 161 facing away from the substrate 100, and a touch insulating layer 170 disposed on a side of the touch insulating layer 170 facing away from the substrate. A second touch electrode film layer 162 on one side of the base substrate 100, a second optical film layer 171 arranged on the side of the second touch electrode film layer 162 away from the base substrate 100, a black matrix 174 arranged on the side of the second optical film layer 171 away from the base substrate 100, a color resistance layer 175 arranged on the side of the black matrix 174 away from the base substrate 100, a first optical film layer 172 arranged on the side of the color resistance layer 175 away from the base substrate 100, a first refractive index film layer 180 arranged on the side of the first optical film layer 172 away from the base substrate 100, a second refractive index film layer 190 arranged on the side of the first refractive index film layer 180 away from the base substrate 100, and a cover plate 200 arranged on the side of the second refractive index film layer 190 away from the base substrate 100.

[0098] Exemplarily, the first touch electrode film layer 161 and the second touch electrode film layer 162 are respectively provided with touch electrodes, so that the capacitive touch function can be realized through mutual capacitance technology. In addition, the orthographic projection of the touch electrode on the base substrate does not overlap with the orthographic projection of the opening area of ​​the sub-pixel on the base substrate to avoid affecting the display effect. In addition, part of the touch electrode in one of the first touch electrode film layer 161 and the second touch electrode film layer 162 can be connected through a via hole penetrating the touch insulating layer 170.

[0099] Exemplarily, a plurality of signal lines are also provided on the substrate 100, and the plurality of signal lines include a plurality of gate lines, a plurality of data lines, an initialization signal line, and a power signal line. For example, a pixel driving circuit in a row of sub-pixels is connected to a gate line, a pixel driving circuit in a column of sub-pixels is connected to a data line, a pixel driving circuit in a column of sub-pixels is connected to an initialization signal line, and a pixel driving circuit in a column of sub-pixels is connected to a power signal line. In this way, corresponding signals can be input to the pixel driving circuit through these signal lines to control the pixel driving circuit to drive the light-emitting device to emit light.

[0100] Exemplarily, a gate drive circuit connected to a plurality of gate lines is also provided on the substrate, and a gate scan signal is input to the gate line through the gate drive circuit to control the transistor in the pixel drive circuit to be turned on and off. Optionally, the gate drive circuit includes a transistor or a capacitor, and its specific structure and working principle can be the same as those in the prior art, which will not be described in detail here.

[0101] For example, Figure 1 As shown, the light emitting device 130 includes an anode 131 , a light emitting functional layer 132 , and a cathode 133 which are stacked.

[0102] Exemplarily, a pixel driving circuit, a gate driving circuit and a signal line are formed in the thin film transistor array layer. Exemplarily, the thin film transistor array layer may include: a semiconductor layer, a gate conductive layer, a capacitor electrode layer, a first conductive layer, and a second conductive layer. In addition, a buffer layer is provided between the semiconductor layer and the substrate, a gate insulating layer is provided between the semiconductor layer and the gate conductive layer, an interlayer dielectric layer is provided between the gate conductive layer and the capacitor electrode layer, an interlayer insulating layer is provided between the capacitor electrode layer and the first conductive layer, a second planarizing layer is provided between the first conductive layer and the second conductive layer, and a first planarizing layer is provided between the second conductive layer and the anode. In addition, the two film layers that need to be coupled are coupled to each other through vias that penetrate the insulating layer.

[0103] Exemplarily, the semiconductor layer includes the active layer of the above-mentioned transistor. The semiconductor layer can be formed by patterning a semiconductor material. The semiconductor layer can be used to make the active layer of the above-mentioned transistor. Exemplarily, the semiconductor layer can be made of amorphous silicon, polycrystalline silicon, oxide semiconductor materials, etc. It should be noted that the above-mentioned source region and drain region can be conductive regions formed by doping with n-type impurities or p-type impurities.

[0104] Exemplarily, the gate conductive layer includes the gate and gate line of the above-mentioned transistor, wherein the gate of some transistors is reused as a plate of the capacitor.

[0105] Exemplarily, the capacitor electrode layer includes another electrode plate in the above-mentioned capacitor. Two electrodes with facing areas form a capacitor.

[0106] Exemplarily, the first conductive layer includes the above-mentioned data line.

[0107] Illustratively, the second conductive layer includes the above-mentioned initialization signal line and power signal line.

[0108] For example, the thin film encapsulation layer 140 may include a first inorganic encapsulation layer (eg, a SiON layer), an organic encapsulation layer (eg, an acrylic layer), and a second inorganic encapsulation layer (eg, a SiN layer) stacked together.

[0109] For example, in combination Figure 1 As shown, the black matrix 174 has a plurality of black matrix openings, and the plurality of black matrix openings are arranged corresponding to the light emitting areas of the plurality of sub-pixels, and the color resist layer 175 covers each black matrix opening, and the color of the color resist layer corresponding to the sub-pixels of different colors is different. For example, the color of the color resist layer corresponding to the red sub-pixel is red, the color of the color resist layer corresponding to the green sub-pixel is green, and the color of the color resist layer corresponding to the blue sub-pixel is blue. With this arrangement, the display panel provided in the embodiment of the present disclosure can realize the non-polarizer technology, that is, the COE (Color filter On Encapsulation) structure.

[0110] For example, in combination Figure 1 As shown, the display panel may further include a black matrix and / or a color resist layer. For example, the display panel includes only one of the black matrix and the color resist layer.

[0111] For example, in combination Figure 1 In the display area, a first refractive index film layer 180 and a second refractive index film layer 190 are arranged. The first refractive index film layer 180 has a plurality of openings, which are arranged correspondingly to the light emitting areas of a plurality of sub-pixels. The second refractive index film layer 190 covers the first refractive index film layer 180 and fills the openings of the first refractive index film layer 180. The refractive index of the second refractive index film layer 190 is greater than the refractive index of the first refractive index film layer 180, which can improve the light emitting angle of the light emitting device and increase the light emitting brightness. Figure 1 As shown, the refractive index of the first refractive index film layer 180 is, for example, 1.47, the refractive index of the second refractive index film layer 190 is, for example, 1.7, the refractive index of the cover plate 200 is, for example, 1.5, and the refractive index of the air is, for example, 1. Since the first refractive index film layer 180 is provided with openings corresponding to sub-pixels, the second refractive index film layer 190 covers the first refractive index film layer 180 and fills the openings of the first refractive index film layer 180, the light emitted from the side direction of the sub-pixel is fully emitted at the boundary between the first refractive index film layer 180 and the second refractive index film layer 190, so that the side-emitting light can be emitted in the forward direction, thereby improving the luminous efficiency and increasing the light brightness.

[0112] The present disclosure does not limit the materials of the first refractive index film layer and the second refractive index film layer. For example, the first refractive index film layer can be made of low refractive index optical glue, and the second refractive index film layer can be made of high refractive index optical glue. With this arrangement, the first refractive index film layer and the second refractive index film layer can form an enhanced lens structure, so that the display panel provided by the embodiment of the present disclosure can realize an EES (Efficiency Enhance Structure) structure to improve the display effect.

[0113] In a specific implementation, the display panel may adopt a single-sided drive gate line, that is, a gate drive circuit is provided only on one side of the gate line. Figure 2 As shown, the display panel can also drive the gate line in a bilateral manner, that is, gate drive circuits 210a and 210b are respectively arranged on both sides of the gate line GA. Usually, corresponding signals need to be input to the gate drive circuits 210a and 210b to control the gate drive circuits to input gate scanning signals to the gate lines. The plurality of signal lines also include: a plurality of clock signal lines, high voltage signal lines, and low voltage signal lines connected to the gate drive circuits. For example, Figure 2 As shown, clock signal lines CK1a and CK2a, high voltage signal line VGHa and low voltage signal line VGLa connected to the gate drive circuit 210a may be provided, and clock signal lines CK1b and CK2b, high voltage signal line VGHb and low voltage signal line VGLb connected to the gate drive circuit 210b may be provided. In this way, a clock signal is transmitted to the gate drive circuit through the clock signal line, a high voltage signal is input to the gate drive circuit through the high voltage signal line, and a low voltage signal is input to the gate drive circuit through the low voltage signal line, so as to control the gate drive circuit to input a gate scanning signal to the gate line.

[0114] In a specific implementation, the display panel includes a bending area and a non-bending area, and the display area is arranged in the non-bending area. Usually, multiple signal lines in the display area need to pass through the bending area and then be connected to the driver chip through bonding, so that the driver chip inputs corresponding signals to these signal lines to control the display panel to display images. However, due to the high elastic modulus of the material of the second refractive index film layer, when the display panel is bent, the second refractive index film layer in the bending area will peel off or cause the organic layer below it to peel, causing the signal line originally in the neutral layer to move up, resulting in the signal line in the bending area being pulled and broken during the bending process, thereby causing the display panel to display abnormally.

[0115] Based on this, Figures 3a to 4As shown, in the display panel provided by the embodiment of the present disclosure, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 does not overlap with the bending zone WB, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 has a first film layer boundary SM1 close to the bending zone WB, the bending zone WB has a first bending boundary SB1 close to the second refractive index film layer 190, and a first distance h1 is provided between the first film layer boundary SM1 and the first bending boundary SB1. By making the first distance h1 greater than 0, the first film layer boundary SM1 of the second refractive index film layer 190 is moved to a position with a first distance h1 from the first bending boundary SB1 to avoid the first film layer boundary SM1 falling into the bending zone WB, which is equivalent to not setting the second refractive index film layer 190 in the bending zone WB, so as to avoid the signal line in the bending zone WB being pulled and broken during the bending process due to the second refractive index film layer 190 when the bending zone WB is bent, thereby reducing the risk of signal line breakage and improving display abnormalities.

[0116] In some embodiments of the present disclosure, Figures 3a to 4 As shown, the non-bending area may include a first non-bending area NWB1 and a second non-bending area NWB2, and the first non-bending area NWB1 and the second non-bending area NWB2 are arranged on both sides of the bending area WB. The first non-bending area NWB1 includes the display area AA, and the second non-bending area NWB2 includes a bonding area, and the bonding area has a plurality of bonding terminals (PAD), then the plurality of signal lines in the first non-bending area NWB1 pass through the bending area WB and enter the second non-bending area NWB2, and the plurality of signal lines are connected to the plurality of bonding terminals (PAD) one by one. Then the plurality of bonding terminals (PAD) are connected to the driving chip in a bonding form, so that the driving chip inputs corresponding signals to these signal lines through the bonding terminals (PAD) to control the display panel to display the picture.

[0117] In some embodiments of the present disclosure, Figures 3a to 8 As shown, the second refractive index film layer 190 is disposed in the first non-bending area NWB1, and the second refractive index film layer 190 is not disposed in the second non-bending area NWB2. In addition, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 covers the display area AA, and the orthographic projection of the first refractive index film layer 180 on the base substrate 100 has an overlapping area with the display area AA, thereby improving the light output angle of the light emitting device and increasing the light output brightness.

[0118] In some embodiments of the present disclosure, Figures 3a to 8As shown, the first non-bending area NWB1 also includes: a non-display area BB arranged between the display area AA and the bending area WB. The orthographic projection of the second refractive index film layer 190 on the base substrate 100 not only covers the display area AA, but also covers part of the non-display area BB. Exemplarily, the present disclosure does not limit the first distance h1, for example, h1 ≥ 0.8 mm. Optionally, h1 can be 0.8 mm, 0.83 mm, 0.85 mm, 0.88 mm, 0.9 mm, 0.92 mm, 0.95 mm, etc.

[0119] It should be noted that, combined with Figure 4 The remaining borders of the display area AA (e.g., BJ1, BJ2, BJ3) are also provided with non-display areas BB, in which signal lines and gate drive circuits are provided. The orthographic projection of the second refractive index film layer 190 on the base substrate 100 also covers the non-display areas BB at the remaining borders of the display area AA (e.g., BJ1, BJ2, BJ3), and the orthographic projection of the first refractive index film layer 180 on the base substrate 100 also covers the non-display areas BB at the remaining borders of the display area AA (e.g., BJ1, BJ2, BJ3).

[0120] In order to prevent the first refractive index film layer 180 from affecting the bending process of the bending zone, in some embodiments of the present disclosure, for example Figure 3a , Figure 3b , Figures 5 to 7 As shown, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 may not overlap with the bending area WB. Optionally, the first refractive index film layer 180 may be provided in the first non-bending area NWB1, and the first refractive index film layer 180 may not be provided in the second non-bending area NWB2. Moreover, the orthographic projection of the first refractive index film layer 180 in the first non-bending area NWB1 on the base substrate 100 has a second film layer boundary SM2 close to the bending area WB, and there is a second distance h2 between the second film layer boundary SM2 and the first bending boundary SB1, and the second distance h2 may be not less than 0. Exemplarily, the second distance h2 may be greater than 0, and the second film layer boundary SM2 is provided between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the second film layer boundary SM2 may be aligned with the first film layer boundary SM1, and the second distance h2 is equal to the first distance h1. Alternatively, the second film layer boundary SM2 may be misaligned with the first film layer boundary SM1, and the second film layer boundary SM2 may be misaligned with the first bending boundary SB1, and the second distance h2 may be smaller than the first distance h1. Alternatively, the second distance h2 may be equal to 0, and the second film layer boundary SM2 may be aligned with the first bending boundary SB1.

[0121] For example, the second refractive index film layer may be disposed only in the first non-bending region. Alternatively, the second refractive index film layer may be disposed in both the first non-bending region and the second non-bending region. Figure 3b As shown, the orthographic projection of the first refractive index film layer 180 in the second non-bending area NWB2 on the base substrate 100 has a third film layer boundary SM3 close to the bending area WB, the bending area WB has a second bending boundary SB2 away from the second refractive index film layer 190, and a third distance h3 between the third film layer boundary SM3 and the second bending boundary SB2 is not less than 0. Optionally, the third distance h3 is the same as the second distance h2. Alternatively, the third distance h3 is greater than or less than the second distance h2.

[0122] In some embodiments of the present disclosure, Figures 3a to 8 As shown, the orthographic projection of the first optical film layer 172 on the base substrate 100 covers the display area AA. Optionally, the orthographic projection of the first optical film layer 172 on the base substrate 100 also covers the non-display area BB at the remaining boundaries (eg, BJ1, BJ2, BJ3) of the display area AA.

[0123] In order to prevent the first optical film layer 172 from affecting the bending process of the bending zone, in some embodiments of the present disclosure, for example Figure 3a , Figure 3b , Figures 5 to 7 As shown, the orthographic projection of the first optical film layer 172 on the base substrate 100 may not overlap with the bending area WB. For example, the first non-bending area NWB1 may be provided with the first optical film layer 172, and the orthographic projection of the first optical film layer 172 in the first non-bending area NWB1 on the base substrate 100 may have a fourth film layer boundary SM4 close to the bending area WB, and a fourth distance h4 may be provided between the fourth film layer boundary SM4 and the first bending boundary SB1, and the fourth distance h4 may be not less than 0. For example, the fourth distance h4 may be greater than 0, and the fourth film layer boundary SM4 is provided between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the fourth film layer boundary SM4 may be aligned with the first film layer boundary SM1, and the fourth distance h4 is equal to the first distance h1. Alternatively, the fourth film layer boundary SM4 may not be aligned with the first film layer boundary SM1, and the fourth film layer boundary SM4 may not be aligned with the first bending boundary SB1, and the fourth distance h4 may be less than the first distance h1. Alternatively, the fourth distance h4 may be set to 0, and then the fourth film layer boundary SM4 may be aligned with the first bending boundary SB1.

[0124] For example, Figure 3a and Figure 3bAs shown, the fourth film layer boundary SM4 can be set between the first film layer boundary SM1 and the second film layer boundary SM2, and the second film layer boundary SM2 can be set between the fourth film layer boundary SM4 and the first bending boundary SB1, so that h2 < h4 < h1. With this setting, the first refractive index film layer 180 can wrap the fourth film layer boundary SM4 of the first optical film layer 172, and the amount of edge wrapping for each is based on the mechanical influence range. Exemplarily, h2 ≥ 0.2 mm can be set. For example, h2 can be 0.2 mm, 0.22 mm, 0.25 mm, 0.28 mm, 0.3 mm, etc.

[0125] Exemplarily, as Figure 5 shown, the fourth film layer boundary SM4 can also be set between the first film layer boundary SM1 and the first bending boundary SB1, and the second film layer boundary SM2 can be set between the fourth film layer boundary SM4 and the first film layer boundary SM1, so that h4 < h2 < h1. With this setting, the film layer boundary of the first refractive index film layer 180 can be retracted inward to a flat position in the display area AA direction, preventing the risk of Peeling occurring during bending when the boundary of the first refractive index film layer 180 is close to the bending area WB when the thickness of the first refractive index film layer 180 is relatively thin.

[0126] Exemplarily, as Figure 6 shown, the first film layer boundary SM1 can also be set between the second film layer boundary SM2 and the first bending boundary SB1, and the fourth film layer boundary SM4 can be set between the second film layer boundary SM2 and the first film layer boundary SM1, so that h1 < h4 < h2. With this setting, the second refractive index film layer 190 can wrap the fourth film layer boundary SM4 of the first optical film layer 172 and the second film layer boundary SM2 of the first refractive index film layer 180, and the amount of edge wrapping for each is based on the mechanical influence range.

[0127] Exemplarily, as Figure 7 shown, the first film layer boundary SM1 can also be set between the second film layer boundary SM2 and the first bending boundary SB1, and the second film layer boundary SM2 can be set between the fourth film layer boundary SM4 and the first film layer boundary SM1, so that h1 < h2 < h4. With this setting, the second refractive index film layer 190 can wrap the second film layer boundary SM2 of the first refractive index film layer 180, and the first refractive index film layer 180 can wrap the fourth film layer boundary SM4 of the first optical film layer 172, and the amount of edge wrapping for each is based on the mechanical influence range.

[0128] Exemplarily, the first optical film layer 172 can be set only in the first non-bending area NWB1. Or, the first optical film layer 172 can also be set in both the first non-bending area NWB1 and the second non-bending area NWB2. For example, as Figure 3a , Figure 3b , Figures 5 to 7 As shown, the first non-bending area NWB1 and the second non-bending area NWB2 are both provided with a first optical film layer 172. Among them, the first optical film layer 172 in the second non-bending area NWB2 has a fifth film layer boundary SM5 close to the bending area WB in the orthographic projection of the base substrate 100, and the bending area WB has a second bending boundary SB2 away from the second refractive index film layer 190. There is a fifth distance h5 between the fifth film layer boundary SM5 and the second bending boundary SB2, and the fifth distance h5 can be made not less than 0. Optionally, the fifth distance h5 can be made the same as the fourth distance h4. Of course, the fifth distance h5 can also be made greater than or less than the fourth distance h4.

[0129] In some embodiments of the present disclosure, Figures 3a to 8 As shown, the orthographic projection of the second optical film layer 171 on the base substrate 100 can cover the display area AA. Optionally, the orthographic projection of the second optical film layer 171 on the base substrate 100 also covers the non-display area BB at the remaining boundaries (e.g., BJ1, BJ2, BJ3) of the display area AA.

[0130] In order to prevent the second optical film layer 171 from affecting the bending process of the bending zone, in some embodiments of the present disclosure, such as Figure 3a , Figure 3b , Figures 5 to 7 As shown, the orthographic projection of the second optical film layer 171 on the base substrate 100 may not overlap with the bending area WB. Optionally, the second optical film layer 171 may be disposed in the first non-bending area NWB1, and the orthographic projection of the second optical film layer 171 in the first non-bending area NWB1 on the base substrate 100 has a sixth film layer boundary SM6 close to the bending area WB, and there is a sixth distance h6 between the sixth film layer boundary SM6 and the first bending boundary SB1, and the sixth distance h6 may be not less than 0. Exemplarily, the sixth distance h6 may be greater than 0, and the sixth film layer boundary SM6 is disposed between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the sixth film layer boundary SM6 may be aligned with the first film layer boundary SM1, and the sixth distance h6 is equal to the first distance h1. Alternatively, the sixth film layer boundary SM6 may be misaligned with the first film layer boundary SM1, and the sixth film layer boundary SM6 may be misaligned with the first bending boundary SB1, and the sixth distance h6 is less than the first distance h1. Alternatively, the sixth distance h6 may be set to 0, and then the sixth film layer boundary SM6 may be aligned with the first bending boundary SB1.

[0131] For example, Figure 3a and Figure 3bAs shown, the boundary SM6 of the sixth film layer can be set between the boundary SM4 of the fourth film layer and the boundary SM1 of the first film layer, so that h4 < h6 < h1. With this setting, the first optical film layer 172 can wrap the boundary SM6 of the sixth film layer of the second optical film layer 171, and the amount of edge wrapping for each is based on the mechanical influence range.

[0132] Exemplarily, as Figure 5 shown, the boundary SM6 of the sixth film layer can also be set between the boundary SM4 of the fourth film layer and the boundary SM2 of the second film layer, so that h4 < h6 < h2. With this setting, the first optical film layer 172 can wrap the boundary SM6 of the sixth film layer of the second optical film layer 171, and the amount of edge wrapping for each is based on the mechanical influence range.

[0133] Exemplarily, as Figure 6 and Figure 7 shown, the boundary SM6 of the sixth film layer can also be set between the boundary SM4 of the fourth film layer and the first bending boundary SB1, so that h6 < h4.

[0134] Exemplarily, the second optical film layer 171 can be provided only in the first non-bending region NWB1. Alternatively, the second optical film layer 171 can also be provided in both the first non-bending region NWB1 and the second non-bending region NWB2. For example, as Figure 3a 、 Figure 3b 、 Figures 5 to 7 shown, the second optical film layer 171 in the second non-bending region NWB2 has a seventh film layer boundary SM7 in the orthographic projection on the substrate 100 close to the bending region WB, the bending region WB has a second bending boundary SB2 away from the second refractive index film layer 190, and there is a seventh distance h7 between the seventh film layer boundary SM7 and the second bending boundary SB2. The seventh distance h7 can be made not less than 0. Optionally, the seventh distance h7 can be made the same as the sixth distance h6. Of course, the seventh distance h7 can also be made greater than or less than the sixth distance h6.

[0135] In some embodiments of the present disclosure, as Figures 3a to 8 shown, the touch insulating layer 170 can be made to cover the display area AA in the orthographic projection on the substrate 100. Optionally, the touch insulating layer 170 in the orthographic projection on the substrate 100 also covers the non-display area BB at the remaining boundaries (e.g., BJ1, BJ2, BJ3) of the display area AA.

[0136] To avoid the touch insulating layer 170 affecting the bending process of the bending region, in some embodiments of the present disclosure, as Figure 3a 、 Figure 3b 、 Figures 5 to 7As shown, the orthographic projection of the touch insulating layer 170 on the base substrate 100 may not overlap with the bending area WB. Optionally, the touch insulating layer 170 may be disposed in the first non-bending area NWB1, and the orthographic projection of the touch insulating layer 170 in the first non-bending area NWB1 on the base substrate 100 may have an eighth film layer boundary SM8 close to the bending area WB, and an eighth distance h8 may be provided between the eighth film layer boundary SM8 and the first bending boundary SB1, and the eighth distance h8 may be greater than 0. Exemplarily, the eighth distance h8 may be greater than 0, and the eighth film layer boundary SM8 is disposed between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the eighth film layer boundary SM8 may be aligned with the first film layer boundary SM1, and the eighth distance h8 is equal to the first distance h1. Alternatively, the eighth film layer boundary SM8 may be misaligned with the first film layer boundary SM1, and the eighth film layer boundary SM8 may be misaligned with the first bending boundary SB1, and the eighth distance h8 is less than the first distance h1. Alternatively, the eighth distance h8 may be set to 0, and then the eighth film layer boundary SM8 may be aligned with the first bending boundary SB1.

[0137] For example, Figure 3a and Figure 3b As shown, the eighth film layer boundary SM8 can be set between the first film layer boundary SM1 and the sixth film layer boundary SM6, then h6 <h8

[0138] For example, Figures 5 to 7 As shown, the eighth film layer boundary can also be set between the second film layer boundary SM2 and the sixth film layer boundary SM6, then h6 <h8<h2。

[0139] For example, Figure 6 and Figure 7 As shown, the eighth film layer boundary can also be set between the fourth film layer boundary SM4 and the sixth film layer boundary SM6, then h6 <h8<h4。

[0140] For example, Figure 3a , Figure 3b , Figures 5 to 7 As shown, the second optical film layer 171 can wrap the eighth film layer boundary SM8 of the touch insulating layer 170 , and the amount of the wrapping is determined by the mechanical influence range.

[0141] For example, the touch insulating layer 170 may be disposed only in the first non-bending region NWB1. Alternatively, the touch insulating layer 170 may be disposed in both the first non-bending region NWB1 and the second non-bending region NWB2. Figure 3a , Figure 3b , Figures 5 to 7 ​As shown, the orthographic projection of the touch insulating layer 170 in the second non-bending area NWB2 on the base substrate 100 has a ninth film layer boundary SM9 close to the bending area WB, and the bending area WB has a second bending boundary SB2 away from the second refractive index film layer 190. There is a ninth distance h9 between the ninth film layer boundary SM9 and the second bending boundary SB2, and the ninth distance h9 can be made not less than 0. Optionally, the ninth distance h9 can be made the same as the eighth distance h8. Of course, the ninth distance h9 can also be made greater than or less than the eighth distance h8.

[0142] In some embodiments of the present disclosure, Figures 3a to 8 As shown, the orthographic projection of the thin film encapsulation layer 140 on the base substrate 100 can cover the display area AA. Optionally, the orthographic projection of the thin film encapsulation layer 140 on the base substrate 100 also covers the non-display area BB at the remaining boundaries (eg, BJ1, BJ2, BJ3) of the display area AA.

[0143] In some embodiments of the present disclosure, Figure 3a , Figure 3b , Figures 5 to 7 As shown, the thin film encapsulation layer 140 is disposed in the first non-bending area NWB1. For example, the thin film encapsulation layer 140 can be disposed only in the first non-bending area NWB1. Moreover, the thin film encapsulation layer 140 has a tenth film layer boundary SM10 close to the bending area WB in the orthographic projection of the base substrate 100, and there is a tenth distance h10 between the tenth film layer boundary SM10 and the first bending boundary SB1, and the tenth distance h10 can be made not less than 0. Exemplarily, the tenth distance h10 can be made greater than 0, and the tenth film layer boundary SM10 is disposed between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the tenth film layer boundary SM10 can be aligned with the first film layer boundary SM1, and the tenth distance h10 is equal to the first distance h1. Alternatively, the tenth film layer boundary SM10 can be misaligned with the first film layer boundary SM1, and the tenth film layer boundary SM10 can be misaligned with the first bending boundary SB1, and the tenth distance h10 is less than the first distance h1. Alternatively, the tenth distance h10 may be set to 0, and the tenth film layer boundary SM10 may be aligned with the first bending boundary SB1.

[0144] For example, Figure 3a and Figure 3b As shown, the tenth film layer boundary SM10 can be set between the eighth film layer boundary SM8 and the first film layer boundary SM1, then h8 <h10

[0145] For example, Figure 5 As shown, the tenth film layer boundary SM10 can also be set between the second film layer boundary SM2 and the first film layer boundary SM1, then h2 <h10

[0146] ​​For example, Figure 6 and Figure 7 As shown, the tenth film layer boundary SM10 can also be set between the eighth film layer boundary SM8 and the fourth film layer boundary SM4, then h8 <h10<h4。

[0147] For example, Figure 3a , Figure 3b , Figures 5 to 7 As shown, the touch insulating layer 170 can wrap the tenth film layer boundary SM10 of the thin film encapsulation layer 140, and the amount of wrapping is based on the mechanical influence range. In addition, the touch insulating layer 170 can wrap more of the thin film encapsulation layer 140. If the touch insulating layer 170 wraps less of the thin film encapsulation layer 140, there is a risk that the touch insulating layer 170 over-etches the thin film encapsulation layer 140.

[0148] Exemplarily, the materials of the first optical film layer 172 , the second optical film layer 171 , the first refractive index film layer 180 , and the second refractive index film layer 190 include, but are not limited to, organic materials.

[0149] It should be noted that if Figure 3a and Figure 3b As shown, the first refractive index film layer 180, the first optical film layer 172, and the second optical film layer 171 adopt an upper-wrapped lower structure, and the amount of each wrapping is based on the mechanical influence range. In addition, after all the wrapping is completed, h2 is at least 0.2mm to ensure that no other film layer in the bending area affects the position of the signal line neutral layer.

[0150] It should be noted that if Figure 6 As shown, the boundaries of the encapsulation film layer 140, the touch insulating layer 170, and the second optical film layer 171 near the bending zone remain unchanged, that is, the organic film layer second optical film layer 171 covers the touch insulating layer 170, and the other organic film layers first optical film layer 172, first refractive index film layer 180, and second refractive index film layer 190 are all retracted to the flat area within the boundary of the encapsulation film layer 140, and at the same time, the second refractive index film layer 190 is designed to cover the first refractive index film layer 180 and the first optical film layer 172, ensuring that the second optical film layer 171, the first optical film layer 172, the first refractive index film layer 180, and the second refractive index film layer 190 in the bending zone are all dug out. In addition, under the premise of ensuring that the touch insulating layer 170 is effectively protected, all other upper organic film layers are retracted, and the principle of the upper film layer covering the lower film layer is maintained.

[0151] It should be noted that if Figure 7 As shown, the first refractive index film layer 180 may also be designed to cover the first optical film layer 172 .

[0152] It should be noted that if Figure 3a , Figure 3b, Figures 5 to 7 As shown, the touch insulating layer 170 can wrap more of the thin film encapsulation layer 140 . If the touch insulating layer 170 wraps less of the thin film encapsulation layer 140 , there may be a risk that the touch insulating layer 170 over-etches the thin film encapsulation layer 140 .

[0153] In some embodiments of the present disclosure, Figures 3a to 8 As shown, the display panel also includes: a first inorganic layer 114, and the first inorganic layer 114 is arranged between the thin film encapsulation layer 140 and the base substrate 100. Optionally, the first inorganic layer 114 may include: a buffer layer, a gate insulating layer, an interlayer dielectric layer, and one or more of an interlayer insulating layer. In order to avoid the first inorganic layer 114 from affecting the bending process of the bending zone, the orthographic projection of the first inorganic layer 114 on the base substrate 100 may not overlap with the bending zone WB, and the orthographic projection of the first inorganic layer 114 on the base substrate 100 is aligned with the bending zone WB close to the boundary of the bending zone WB. Exemplarily, the orthographic projection of the first inorganic layer 114 on the base substrate 100 covers the display area AA. Optionally, the orthographic projection of the first inorganic layer 114 on the base substrate 100 also covers the non-display area BB at the remaining boundaries (e.g., BJ1, BJ2, BJ3) of the display area AA.

[0154] In some embodiments of the present disclosure, Figures 3a to 8 As shown, the display panel further includes: a second inorganic layer 113, and the second inorganic layer 113 is disposed between the thin film encapsulation layer 140 and the base substrate 100. Optionally, the second inorganic layer 113 may include: a buffer layer, a gate insulating layer, an interlayer dielectric layer, and one or more of the interlayer insulating layers except the first inorganic layer 114. In order to prevent the second inorganic layer 113 from affecting the bending process of the bending zone, the orthographic projection of the second inorganic layer 113 on the base substrate 100 may not overlap with the bending zone WB.

[0155] For example, Figures 3a to 8As shown, the first non-bending area NWB1 is provided with a second inorganic layer 113, and the second inorganic layer 113 in the first non-bending area NWB1 has an eleventh film layer boundary SM11 close to the bending area WB in the orthographic projection of the base substrate 100, and there is an eleventh distance h11 between the eleventh film layer boundary SM11 and the first bending boundary SB1, and the eleventh distance h11 can be made not less than 0. Exemplarily, the eleventh distance h11 can be made greater than 0, and the eleventh film layer boundary SM11 is provided between the first film layer boundary SM1 and the first bending boundary SB1. Optionally, the eleventh film layer boundary SM11 can be aligned with the first film layer boundary SM1, and the eleventh distance h11 is equal to the first distance h1. Alternatively, the eleventh film layer boundary SM11 can be misaligned with the first film layer boundary SM1, and the eleventh film layer boundary SM11 is misaligned with the first bending boundary SB1, and the eleventh distance h11 is less than the first distance h1. Alternatively, the eleventh distance h11 may be set to 0, and the eleventh film layer boundary SM11 may be aligned with the first bending boundary SB1.

[0156] For example, Figure 3a , Figure 3b , Figures 5 to 7 As shown, the eleventh film layer boundary SM11 can be set between the first film layer boundary SM1 and the first bending boundary SB1, then h11

[0157] For example, Figure 3a and Figure 3b As shown, the eleventh film layer boundary SM11 can be set between the second film layer boundary SM2 and the fourth film layer boundary SM4, then h2 <h11<h4。

[0158] For example, Figure 5 As shown, the eleventh film layer boundary SM11 may also be aligned with the fourth film layer boundary SM4, then h11=h4.

[0159] For example, Figure 6 As shown, the eleventh film layer boundary SM11 can also be set between the sixth film layer boundary SM6 and the first bending boundary SB1, then h11 <h4<h2。

[0160] For example, Figure 7 As shown, the eleventh film layer boundary SM11 can also be set between the sixth film layer boundary SM6 and the first bending boundary SB1, then h11 <h2<h4。

[0161] For example, the second inorganic layer 113 may be disposed only in the first non-bending region NWB1. Alternatively, the second inorganic layer 113 may be disposed in both the first non-bending region NWB1 and the second non-bending region NWB2. Figure 3a ,​ Figure 3b , Figures 5 to 7 As shown, the second non-bending area NWB2 is provided with a second inorganic layer 113, and the second inorganic layer 113 in the second non-bending area NWB2 has a twelfth film layer boundary SM12 close to the bending area WB in the orthographic projection of the base substrate 100, and a twelfth distance h12 between the twelfth film layer boundary SM12 and the second bending boundary SB2, so that the twelfth distance h12 can be not less than 0.

[0162] Optionally, the twelfth distance h12 may be the same as the eleventh distance h11. Of course, the twelfth distance h12 may also be greater than or less than the eleventh distance h11.

[0163] In some embodiments of the present disclosure, Figures 3a to 8 As shown, the display panel may further include: a protective layer 173, the protective layer 173 is disposed on the side of the first refractive index film layer 180 away from the base substrate 100, and the protective layer 173 is disposed between the first refractive index film layer 180 and the cover plate. The orthographic projection of the protective layer 173 on the base substrate 100 covers the bending area WB, so that the bending area can be protected, and the orthographic projection of the protective layer 173 on the base substrate 100 does not overlap with the orthographic projection of the second refractive index film layer 190 on the base substrate 100. It should be noted that the elastic modulus of the protective layer 173 is low, and the influence on the position of the signal line in the neutral layer can be ignored, which is equivalent to not causing the signal line to be pulled and broken due to the provision of the protective layer 173.

[0164] For example, Figure 3a and Figure 3b As shown, the orthographic projection of the protective layer 173 on the base substrate 100 can also cover the portion of the first refractive index film layer 180 close to the bending region WB in the orthographic projection of the base substrate 100 .

[0165] For example, Figure 3a and Figure 3b As shown, the protective layer 173 can be arranged in contact with the first film layer boundary SM1 of the second refractive index film layer 190. Alternatively, as shown in FIG. Figures 5 to 7 As shown, a certain distance L1 can be provided between the protective layer 173 and the first film layer boundary SM1 of the second refractive index film layer 190, and L1 is smaller than h1. In some embodiments, the upper surface of the protective layer 173 can be slightly higher than the upper surface of the second refractive index film layer 190, so that the second refractive index film layer 190 is not affected during the assembly process. Of course, the upper surface of the protective layer 173 can also be slightly lower than the upper surface of the second refractive index film layer 190.

[0166] For example, Figures 3a to 8 As shown, the second refractive index film layer 190 at least covers the thin film encapsulation layer 140 and / or the touch insulating layer 170 in the first non-bending region NWB1.

[0167] For example, Figures 5 to 7 As shown, the orthographic projection of the protective layer 173 on the base substrate 100 and the orthographic projection of the first refractive index film layer 180 on the base substrate 100 may also not overlap.

[0168] Alternatively, if Figure 8 As shown, the orthographic projection of the first refractive index film layer 180 on the base substrate 100 can also cover the bending area WB and the second non-bending area NWB2. Since the elastic modulus of the first refractive index film layer 180 is relatively low, the peeling problem can be ignored, so that the signal line originally in the neutral layer position moves downward, and is in a compressed state during the bending process, and the signal line is not easy to break under the compressed state.

[0169] Alternatively, if Figure 8 As shown, the orthographic projection of the first optical film layer 172 on the base substrate 100 can also cover the first non-bending area NWB1, the bending area WB and the second non-bending area NWB2. In this way, the signal line originally in the neutral layer position can be further moved downward, and is in a compressed state during the bending process, and the signal line is not easy to break in the compressed state.

[0170] Alternatively, if Figure 8 As shown, the orthographic projection of the second optical film layer 171 on the base substrate 100 can also cover the first non-bending area NWB1, the bending area WB and the second non-bending area NWB2. In this way, the signal line originally in the neutral layer position can be further moved downward, and is in a compressed state during the bending process, and the signal line is not easy to break in the compressed state.

[0171] Alternatively, if Figure 8 As shown, the orthographic projection of the touch insulating layer 170 on the base substrate 100 can also cover the first non-bending area NWB1, the bending area WB and the second non-bending area NWB2. In this way, the signal line originally in the neutral layer position can be further moved downward, and is in a compressed state during the bending process, and the signal line is not easy to break in the compressed state.

[0172] It should be noted that if Figure 1 , 3a , Figure 3b , Figures 5 to 8 As shown, 112 represents a second planarization layer, and 111 represents a second conductive layer.

[0173] In some embodiments, the second inorganic layer 113, the second inorganic layer 113, 112, the second planarization layer 112, and the second conductive layer 111 may be partial structures of the thin film transistor array layer 110, that is, during the formation of the thin film transistor array layer 110, the second inorganic layer 113, the second inorganic layer 113, 112, the second planarization layer 112, and the second conductive layer 111 are simultaneously formed. Of course, the thin film transistor array layer 110 may also include other metal film layers or insulating layer structures required to form the driving light emitting element 130, which will not be described in detail here.

[0174] In order to block the flow of the organic encapsulation layer in the thin film encapsulation layer 140 and improve the encapsulation effect, a retaining wall is arranged around the display area AA. Fig. 9 As shown, the first non-bending area NWB1 further includes: at least two retaining walls (such as 176, 177) surrounding the display area AA, and the retaining walls (such as 176, 177) are arranged in the non-display area BB. The number of retaining walls can be two, three, four or more, which is not limited here. Fig. 9 Taking two retaining walls as an example, two retaining walls are provided: a first retaining wall 176 and a second retaining wall 177 . The first retaining wall 176 is provided to surround the display area AA, and the second retaining wall 177 is provided in a ring shape on the periphery of the first retaining wall 176 .

[0175] In some examples, the first retaining wall 176 and the second retaining wall 177 can be prepared simultaneously when preparing the first planarization layer 150 and the pixel defining layer 120, so that the first retaining wall 176 and the second retaining wall 177 are formed using the stacked structure of the pixel defining layer 120 and the first planarization layer 150, and the process flow is reduced.

[0176] In some other examples, the first retaining wall and the second retaining wall may be prepared simultaneously when the pixel defining layer is prepared, so that the first retaining wall, the second retaining wall and the pixel defining layer are an integrated structure, and the process flow is reduced. Alternatively, the first retaining wall and the second retaining wall may be prepared simultaneously when the first planarization layer is prepared, so that the first retaining wall, the second retaining wall and the first planarization layer are an integrated structure, and the process flow is reduced.

[0177] In some embodiments of the present disclosure, Fig. 9 As shown, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 can cover the orthographic projection of all the retaining walls on the base substrate 100, so that the second refractive index film layer 190 can completely cover the display area AA. Also, the orthographic projection of the first refractive index film layer 180 on the base substrate 100 can cover the orthographic projection of all the retaining walls on the base substrate 100, so that the first refractive index film layer 180 can completely cover the display area AA. For example, Fig. 9As shown, the orthographic projections of the second refractive index film layer 190 and the first refractive index film layer 180 on the base substrate 100 cover the orthographic projections of the first retaining wall and the second retaining wall on the base substrate 100 .

[0178] In some embodiments of the present disclosure, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 may not overlap with the side edge of the retaining wall portion near the bending region WB in at least one retaining wall, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 also covers the orthographic projections of the remaining side edges of all retaining walls on the base substrate 100. For example, Fig.10 As shown, the orthographic projection of the second refractive index film layer 190 on the base substrate 100 does not overlap with the orthographic projection of the side edge of the second retaining wall 177 near the bending area WB on the base substrate 100, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 also covers the orthographic projections of the remaining side edges of the first retaining wall 176 and the second retaining wall 177 on the base substrate 100.

[0179] In some embodiments of the present disclosure, near the bending area WB, the first film layer boundary SM1 of the second refractive index film layer 190 can also be located between the retaining walls 177 and 176, and the orthographic projection of the second refractive index film layer 190 on the base substrate 100 also covers the orthographic projections of the remaining side edges of all the retaining walls on the base substrate 100.

[0180] In some embodiments of the present disclosure, Fig.10 As shown, near the bending area WB, the distance between the first film layer boundary SM1 of the second refractive index film layer 190 and the second retaining wall 177 can also be made smaller than the distance h1 from the first film layer boundary SM1 of the second refractive index film layer 190 to the bending area WB. Such a design allows the second refractive index film layer 190 to have sufficient buffer space to avoid splitting.

[0181] In some embodiments of the present disclosure, Fig.10 As shown, the width of the bending zone WB is greater than the distance from the first film layer boundary SM1 of the second refractive index film layer 190 to the bending zone WB (ie, the first distance h1). This design allows the bending of the bending zone to avoid the second refractive index film layer 190 (high elastic modulus) to avoid splitting.

[0182] For example, Figure 4As shown, in the bending region WB and the non-bending region, all of the multiple data lines are disposed in the middle region of the substrate 100. On both sides of the data line DA, clock signal lines (such as CK1a, CK2a, CK1b, CK2b), initialization signal lines (such as VINITa, VINITb), high voltage signal lines (such as VGHa, VGHb), and low voltage signal lines (such as VGLa, VGLb) are sequentially arranged, so that the signal lines are also arranged in a symmetric structure. That is to say, the orthographic projection of the region where all of the multiple data lines DA are located on the substrate 100 is disposed in the middle region of the substrate 100. On both sides of the orthographic projection of the region where the data line DA is located on the substrate 100, the orthographic projection of the region where the clock signal lines (such as CK1a, CK2a and CK1b, CK2b) are located on the substrate 100, the orthographic projection of the region where the initialization signal lines (such as VINITa, VINITb) are located on the substrate 100, the orthographic projection of the region where the high voltage signal lines (such as VGHa, VGHb) are located on the substrate 100, and the orthographic projection of the region where the low voltage signal lines (such as VGLa, VGLb) are located on the substrate 100 can be sequentially arranged respectively. Since the low voltage signal is usually on the outermost side in the bending region WB, close to the edge of the substrate. Cracks may occur after bending in the bending region, resulting in water vapor entering through the cracks. However, the voltage (negative value) transmitted on the low voltage signal line is usually relatively low, resulting in a large pressure difference between the low voltage signal line and the adjacent signal lines. Under the operation of reliability double 85 (such as reliability test at 85% humidity and 85% temperature), the low voltage signal line is corroded and disconnected, resulting in a black screen.

[0183] In order to further reduce the corrosion and disconnection of the above-mentioned low voltage signal lines, as Fig.10 shown, in the bending region WB, the orthographic projection of the region where the low voltage signal lines (such as VGLa, VGLb) are located on the substrate 100 can be disposed between the orthographic projection of the region where the multiple data lines DA are located on the substrate 100 and the edge of the substrate 100. In this way, the region where the low voltage signal lines (such as VGLa, VGLb) are located is moved inwards, while moving away from the edge of the substrate 100, and water and oxygen are blocked by other signal lines.

[0184] Exemplarily, as Fig.10 shown, in the bending region WB, in the row direction of the pixel unit, there is a spacing distance H1a between the orthographic projection of the region where the low voltage signal line VGLa is located on the substrate 100 and the edge of the substrate 100. The present disclosure does not limit the specific value of H1a. Exemplarily, 832um < H1a ≤ 2000um. For example, H1a can be selected from 850um, 900um, 1000um, 1100um, 1500um, 1800um, 2000um, etc.

[0185] Exemplarily, as Fig.10As shown, in the bending region WB, in the row direction of the pixel unit, there is a spacing distance H1b between the orthographic projection of the region where the low-voltage signal line VGLb is located on the substrate 100 and the edge of the substrate 100. The present disclosure does not limit the specific value of H1b. Exemplarily, 832um < H1b ≤ 2000um. For example, H1b can be selected from 850um, 900um, 1000um, 1100um, 1500um, 1800um, 2000um, etc.

[0186] Exemplarily, H1a can be made the same as H1b to achieve a symmetric setting.

[0187] In some examples, in the bending region, the orthographic projection of the region where the low-voltage signal line is located on the substrate can be arranged between the orthographic projection of the region where multiple data lines are located on the substrate and the orthographic projection of the region where the clock signal line is located on the substrate. For example, as Fig.10 shown, the orthographic projection of the region where the low-voltage signal line VGLa is located on the substrate 100 is arranged between the orthographic projection of the region where multiple data lines DA are located on the substrate 100 and the orthographic projection of the regions where the clock signal lines CK1a and CK2a are located on the substrate 100. The orthographic projection of the region where the low-voltage signal line VGLb is located on the substrate 100 is arranged between the orthographic projection of the region where multiple data lines DA are located on the substrate 100 and the orthographic projection of the regions where the clock signal lines CK1b and CK2b are located on the substrate 100.

[0188] In still other examples, in the bending region, the orthographic projection of the region where the low-voltage signal line is located on the substrate can be arranged between the orthographic projection of the region where the clock signal line is located on the substrate and the orthographic projection of the region where the initialization signal line is located on the substrate.

[0189] In still other examples, in the bending region, the orthographic projection of the region where the low-voltage signal line is located on the substrate can be arranged between the orthographic projection of the region where the initialization signal line is located on the substrate and the orthographic projection of the region where the high-voltage signal line is located on the substrate.

[0190] In some embodiments of the present disclosure, the display panel further includes: at least one virtual signal line disposed between multiple signal lines and the edge of the substrate. Based on this, by designing one or more virtual signal lines to block water and oxygen, reliability corrosion is prevented. It can be understood that the virtual signal line is a trace without any input signal and is in a floating state.

[0191] Exemplarily, as Fig.11As shown, in the bending area WB, the area where the low voltage signal line VGLa is located is provided with 6 virtual signal lines DUMa between the orthographic projection of the substrate 100 and the edge of the substrate 100, and the area where the low voltage signal line VGLb is located is provided with 6 virtual signal lines DUMb between the orthographic projection of the substrate 100 and the edge of the substrate 100. That is, the number of virtual signal lines on the left and right sides is the same, and a symmetrical arrangement is achieved. Of course, the number of virtual signal lines on the left and right sides may also be different, which is not limited here.

[0192] For example, Fig.12 As shown, in the bending area WB, the area where the high voltage signal line VGHa is located is provided with 6 virtual signal lines DUMa between the orthographic projection of the substrate 100 and the edge of the substrate 100, and the area where the high voltage signal line VGHb is located is provided with 6 virtual signal lines DUMb between the orthographic projection of the substrate 100 and the edge of the substrate 100. That is, the number of virtual signal lines on the left and right sides is the same, and a symmetrical arrangement is achieved.

[0193] Fig.11 and Fig.12 The example of setting 6 virtual signal lines on the left and right sides is used for illustration. In practical applications, the number of virtual signal lines can be set to 1, 2, 4, 8, 10, 15 or 20, and the present disclosure does not limit the number of virtual signal lines.

[0194] In some examples, such as Fig.13a and Fig.13b As shown, in the bending area WB, multiple data lines DA can be set in the first conductive layer, and low voltage signal lines VGLa, VGLb, initialization signal lines VINITa, VINITb, multiple clock signal lines CK1a, CK2a and CK1b, CK2b and high voltage signal lines VGHa, VGHb can be set in the second conductive layer.

[0195] In some other examples, such as Fig.14a and Fig.14b As shown, in the bending region WB, multiple data lines DA and low voltage signal lines VGLa, VGLb can be arranged in the first conductive layer, which can further reduce the corrosion and disconnection of the low voltage signal lines. In addition, the initialized signal lines VINITa, VINITb, multiple clock signal lines CK1a, CK2a and CK1b, CK2b and high voltage signal lines VGHa, VGHb are arranged in the second conductive layer.

[0196] In some other examples, in the bending area, the low voltage signal line includes a first low voltage signal line and a second low voltage signal line connected to each other. A plurality of data lines and the first low voltage signal line are arranged in the first conductive layer, and the second low voltage signal line, the initialization signal line, a plurality of clock signal lines and the high voltage signal line are arranged in the second conductive layer, which can further reduce the corrosion and disconnection of the low voltage signal line. For example, Fig.15 As shown, the low voltage signal line VGLa includes a first low voltage signal line VGL1a and a second low voltage signal line VGL2a connected to each other, and the low voltage signal line VGLb includes a first low voltage signal line VGL1b and a second low voltage signal line VGL2b connected to each other, the first low voltage signal lines VGL1a and VGL1b are arranged on the first conductive layer, and the second low voltage signal lines VGL2a and VGL2b are arranged on the second conductive layer. The first low voltage signal line VGL1a and the second low voltage signal line VGL2a are connected to each other through a via hole penetrating the insulating layer, and the first low voltage signal line VGL1b and the second low voltage signal line VGL2b are connected to each other through a via hole penetrating the insulating layer.

[0197] When a virtual signal line is provided, the virtual signal line and the low voltage signal line can be provided on the same layer. Fig.13a and Fig.13b As shown, the low voltage signal lines VGLa, VGLb and the virtual signal lines DUMa, DUMb are all disposed in the second conductive layer. Fig.14a and Fig.14b As shown, the low voltage signal lines VGLa, VGLb and the dummy signal lines DUMa, DUMb are all arranged in the first conductive layer.

[0198] It should be noted that, in the bending region, the first conductive layer may be disposed between the second planarization layer 112 and the second inorganic layer 113 .

[0199] For example, the thickness of the layer where the low voltage signal line is located can be increased by 10% to 30% on the original set thickness A, so that the thickness of the layer where the low voltage signal line is located is A*110% to A*130%, thereby reducing the impedance of the signal line. Moreover, this solution can be implemented through the process without changing the mask.

[0200] For example, the thickness of the layer where the low voltage signal line is located can be A*110%, A*115%, A*120%, A*125%, A*130%, which is not limited here. The thickness of the layer where the low voltage signal line is located is

[0201] In some other examples, such as Fig.16As shown, the portion of the low voltage signal line VGLb in the bending area WB includes: a plurality of low voltage sub-signal lines VGLZb arranged at intervals from each other. In addition, one end of the plurality of low voltage sub-signal lines is connected to the low voltage signal line VGLb in the first non-bending area NWB1, and the other end of the plurality of low voltage sub-signal lines is connected to the low voltage signal line VGLb in the second non-bending area NWB2. It should be noted that Fig.16 The low voltage signal line VGLb and 8 low voltage sub-signal lines VGLZb are used as an example for illustration, and the specific value of the low voltage sub-signal line VGLZb can be determined according to the actual application requirements. The low voltage signal line VGLa can be set similarly, which will not be described in detail here.

[0202] Based on the same disclosed concept, the disclosed embodiment also provides a method for preparing the above-mentioned display panel, comprising: forming a first refractive index film layer on a base substrate. Forming a second refractive index film layer on the side of the first refractive index film layer away from the base substrate. Wherein, the base substrate comprises: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels; a first refractive index film layer is arranged in the display area, and the first refractive index film layer has a plurality of openings, and the plurality of openings and the plurality of sub-pixels are arranged correspondingly. Moreover, the second refractive index film layer covers the first refractive index film layer and fills at least part of the plurality of openings. Moreover, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and the first distance between the first film layer boundary and the first bending boundary is greater than 0.

[0203] For example, in combination Figure 1 As shown, the following are sequentially formed on the substrate: a thin film transistor array layer 110, a first planarization layer 150, a pixel defining layer 120, a light emitting device 130, a thin film encapsulation layer 140, a first touch electrode film layer 161, a touch insulating layer 170, a second touch electrode film layer 162, a second optical film layer 171, a black matrix 174, a color resist layer 175, a first optical film layer 172, a first refractive index film layer 180, and a second refractive index film layer 190. The structure and relative position of each film layer can refer to the above description, and will not be repeated here.

[0204] Based on the same disclosed concept, the embodiment of the present disclosure also provides a display device, including the above-mentioned display panel provided by the embodiment of the present disclosure. The principle of solving the problem by the display device is similar to that of the above-mentioned display panel, so the implementation of the display device can refer to the implementation of the above-mentioned display panel, and the repeated parts will not be repeated here.

[0205] In specific implementation, in the embodiments of the present disclosure, the display device may be any product or component with a display function, such as a mobile phone, a tablet computer, a television, a monitor, a laptop computer, a digital photo frame, a navigator, etc. Other essential components of the display device are well understood by those skilled in the art, and are not described in detail here, nor should they be used as limitations to the present disclosure.

[0206] Although the preferred embodiments of the present disclosure have been described, those skilled in the art may make additional changes and modifications to these embodiments once they have learned the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications falling within the scope of the present disclosure.

[0207] Obviously, those skilled in the art can make various changes and modifications to the embodiments of the present disclosure without departing from the spirit and scope of the embodiments of the present disclosure. Thus, if these modifications and variations of the embodiments of the present disclosure fall within the scope of the claims of the present disclosure and their equivalents, the present disclosure is also intended to include these modifications and variations.

Claims

1. A display panel, wherein: include: A substrate, comprising: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels; A first refractive index film layer is disposed on the base substrate, the first refractive index film layer is disposed in the display area, and the first refractive index film layer has a plurality of openings, and the plurality of openings are disposed correspondingly to the plurality of sub-pixels; A second refractive index film layer is disposed on a side of the first refractive index film layer away from the base substrate, the second refractive index film layer covers the first refractive index film layer and fills at least a portion of the plurality of openings; Among them, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0.

2. The display panel according to claim 1, wherein: The non-bending area includes a first non-bending area and a second non-bending area, the first non-bending area and the second non-bending area are arranged on both sides of the bending area, and the first non-bending area includes the display area; The second refractive index film layer is disposed in the first non-bending area, and the orthographic projection of the second refractive index film layer on the base substrate covers the display area.

3. The display panel according to claim 2, wherein: The first non-bending area is provided with the first refractive index film layer, the orthographic projection of the first refractive index film layer in the first non-bending area on the base substrate has a second film layer boundary close to the bending area, and a second distance between the second film layer boundary and the first bending boundary is not less than 0; and / or, The second non-bending area is provided with the first refractive index film layer, and the first refractive index film layer in the second non-bending area has a third film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and a third distance between the third film layer boundary and the second bending boundary is not less than 0.

4. The display panel according to any one of claims 1 to 3, wherein: The display panel further includes: a first optical film layer, which is disposed between the first refractive index film layer and the base substrate; and an orthographic projection of the first optical film layer on the base substrate covers the display area.

5. The display panel according to claim 4, wherein: The orthographic projection of the first optical film layer on the base substrate does not overlap with the bending area; The first non-bending area is provided with the first optical film layer, the orthographic projection of the first optical film layer in the first non-bending area on the base substrate has a fourth film layer boundary close to the bending area, and a fourth distance between the fourth film layer boundary and the first bending boundary is not less than 0; and / or, The second non-bending area is provided with the first optical film layer, the first optical film layer in the second non-bending area has a fifth film layer boundary close to the bending area on the orthographic projection of the base substrate, the bending area has a second bending boundary away from the second refractive index film layer, and the fifth distance between the fifth film layer boundary and the second bending boundary is not less than 0.

6. The display panel according to claim 5, wherein: The fourth film layer boundary is disposed between the first film layer boundary and the first bending boundary.

7. The display panel according to claim 6, wherein: The second film layer boundary is disposed between the fourth film layer boundary and the first bending boundary; or, The second film layer boundary is arranged between the fourth film layer boundary and the first film layer boundary; or, The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the fourth film layer boundary is disposed between the second film layer boundary and the first film layer boundary; or, The first film layer boundary is disposed between the second film layer boundary and the first bending boundary, and the second film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary.

8. The display panel according to any one of claims 4 to 7, wherein: The display panel further includes: a second optical film layer, which is disposed between the first optical film layer and the base substrate; and an orthographic projection of the second optical film layer on the base substrate covers the display area.

9. The display panel according to claim 8, wherein: The orthographic projection of the second optical film layer on the base substrate does not overlap with the bending area; The first non-bending area is provided with the second optical film layer, the orthographic projection of the second optical film layer in the first non-bending area on the base substrate has a sixth film layer boundary close to the bending area, and a sixth distance between the sixth film layer boundary and the first bending boundary is not less than 0; and / or, The second non-bending area is provided with the second optical film layer, and the second optical film layer in the second non-bending area has a seventh film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and the seventh distance between the seventh film layer boundary and the second bending boundary is not less than 0.

10. The display panel according to claim 9, wherein: The sixth film layer boundary is disposed between the fourth film layer boundary and the first film layer boundary; or, The sixth film layer boundary is disposed between the fourth film layer boundary and the second film layer boundary; or, The sixth film layer boundary is disposed between the fourth film layer boundary and the first bending boundary.

11. The display panel according to any one of claims 8 to 10, wherein: The display panel further includes: a touch insulating layer, which is disposed between the second optical adhesive and the base substrate; and the orthographic projection of the touch insulating layer on the base substrate covers the display area.

12. The display panel according to claim 11, wherein: The orthographic projection of the touch insulating layer on the base substrate does not overlap with the bending area; The touch insulating layer is disposed in the first non-bending area, the touch insulating layer in the first non-bending area has an eighth film layer boundary close to the bending area on the orthographic projection of the base substrate, and an eighth distance between the eighth film layer boundary and the first bending boundary is greater than 0; and / or, The touch insulating layer is provided in the second non-bending area, and the touch insulating layer in the second non-bending area has a ninth film layer boundary close to the bending area on the orthographic projection of the base substrate, and the bending area has a second bending boundary away from the second refractive index film layer, and a ninth distance between the ninth film layer boundary and the second bending boundary is not less than 0.

13. The display panel according to claim 12, wherein: The eighth film layer boundary is arranged between the first film layer boundary and the sixth film layer boundary; or, The eighth film layer boundary is arranged between the second film layer boundary and the sixth film layer boundary; or, The eighth film layer boundary is disposed between the fourth film layer boundary and the sixth film layer boundary.

14. The display panel according to any one of claims 11 to 13, wherein: The display panel further includes: a thin film encapsulation layer, which is disposed between the base substrate and the touch insulating layer; and the thin film encapsulation layer covers the display area on an orthographic projection of the base substrate.

15. The display panel according to claim 14, wherein: The display panel further includes: A thin film transistor array layer is disposed on the base substrate; A first planarization layer disposed on a side of the thin film transistor array layer away from the base substrate; A pixel defining layer disposed on a side of the first planarization layer away from the base substrate; A light emitting device disposed in the opening of the pixel defining layer; The thin film encapsulation layer is arranged on a side of the light emitting device away from the base substrate; A first touch electrode film layer disposed on a side of the thin film encapsulation layer away from the base substrate; Disposing the touch insulating layer on the side of the first touch electrode film layer away from the base substrate; A second touch electrode film layer is disposed on a side of the touch insulating layer away from the base substrate; A second optical film layer disposed on a side of the second touch electrode film layer away from the base substrate; A black matrix and / or a color resist layer disposed on a side of the second optical film layer away from the base substrate; A first optical film layer disposed on a side of the black matrix and / or the color resist layer away from the base substrate; A first refractive index film layer disposed on a side of the first optical film layer away from the base substrate; A second refractive index film layer is disposed on a side of the first refractive index film layer away from the base substrate.

16. The display panel according to any one of claims 1 to 15, wherein: The display panel also includes: a protective layer, which is arranged on the side of the first refractive index film layer away from the base substrate, the orthographic projection of the protective layer on the base substrate covers the bending area, and the orthographic projection of the protective layer on the base substrate does not overlap with the orthographic projection of the second refractive index film layer on the base substrate.

17. The display panel according to claim 2, wherein: The display panel further includes: A first optical film layer, wherein the first optical film layer is disposed between the first refractive index film layer and the base substrate; A second optical film layer, wherein the second optical film layer is disposed between the first optical film layer and the base substrate; A touch insulating layer, the touch insulating layer is disposed between the second optical adhesive and the base substrate; A thin film encapsulation layer, wherein the thin film encapsulation layer is disposed between the base substrate and the touch insulating layer; A first inorganic layer, wherein the first inorganic layer is disposed between the thin film encapsulation layer and the base substrate; A second inorganic layer, wherein the second inorganic layer is disposed between the thin film encapsulation layer and the base substrate; Wherein, the orthographic projection of the first refractive index film layer on the base substrate also covers the bending area and the second non-bending area; The orthographic projection of the first optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area; The orthographic projection of the second optical film layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area; The orthographic projection of the touch insulating layer on the base substrate covers the first non-bending area, the bending area and the second non-bending area; The orthographic projection of the thin film encapsulation layer on the base substrate covers the display area; The orthographic projection of the first inorganic layer on the base substrate does not overlap with the bending region, and the orthographic projection of the first inorganic layer on the base substrate is aligned with the bending region near the boundary of the bending region; The orthographic projection of the second inorganic layer on the base substrate does not overlap with the bending region.

18. The display panel according to any one of claims 1 to 17, wherein: The display panel further comprises: a plurality of signal lines; the plurality of signal lines comprises: a plurality of data lines, a low voltage signal line, an initialization signal line, a plurality of clock signal lines and a high voltage signal line; In the bending area, the orthographic projection of the area where the low voltage signal line is located on the substrate is arranged between the orthographic projection of the area where the multiple data lines are located on the substrate, the orthographic projection of the area where the initialization signal line is located on the substrate, the orthographic projection of the area where the multiple clock signal lines are located on the substrate, and the orthographic projection of the area where the high voltage signal line is located on the substrate.

19. A display device, wherein: Comprising a display panel as described in any one of claims 1-18.

20. A method for preparing a display panel, wherein: include: A first refractive index film layer is formed on a base substrate; wherein the base substrate comprises: a bending area and a non-bending area; the non-bending area comprises a display area having a plurality of sub-pixels; the display area is provided with the first refractive index film layer, and the first refractive index film layer has a plurality of openings, and the plurality of openings are provided correspondingly to the plurality of sub-pixels; Forming a second refractive index film layer on a side of the first refractive index film layer away from the base substrate; wherein the second refractive index film layer covers the first refractive index film layer and fills at least a portion of the plurality of openings; Among them, the refractive index of the second refractive index film layer is greater than the refractive index of the first refractive index film layer; the orthographic projection of the second refractive index film layer on the base substrate does not overlap with the bending area, and the orthographic projection of the second refractive index film layer on the base substrate has a first film layer boundary close to the bending area, the bending area has a first bending boundary close to the second refractive index film layer, and a first distance between the first film layer boundary and the first bending boundary is greater than 0.

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