Method for synchronously removing antibiotic drug-resistant bacteria and drug-resistant genes through combination of interface heat and Fenton-like oxidation driven by sunlight

Abstract

The invention relates to a method for synchronously removing antibiotic drug-resistant bacteria and drug-resistant genes by combining sunlight-driven interface heat and Fenton-like oxidation, which comprises the following steps of: putting a photothermal film loaded with a carbon black composite photothermal material into a photothermal disinfection reactor, introducing antibiotic drug-resistant bacteria wastewater, adding H2O2, turning on a xenon lamp light source, preheating the photothermal film, and carrying out photothermal disinfection on the photothermal film to remove the antibiotic drug-resistant bacteria and the drug-resistant genes. The photothermal disinfection reactor is sealed, the wastewater is treated through the photothermal film under the action of gravity, the photothermal conversion material absorbs optical radiation and converts the optical radiation into thermal radiation, and antibiotic-resistant bacteria are treated through the high-temperature interface heat effect generated on the photothermal film. The high-temperature interface heat can cause local temperature rise of a bacterial cell membrane structure, so that fatty acid chains in a bacterial membrane lipid bilayer are broken to a certain extent, the permeability of the cell membrane is increased, the structure of a bacterial outer membrane is damaged due to caused physical damage, the permeability of the bacterial membrane is increased, and the integrity of the membrane is damaged.

Description

Technical Field

[0001] The invention relates to a method for synchronously removing antibiotic-resistant bacteria and resistant genes by combining interfacial heat-Fenton-like oxidation driven by sunlight, and belongs to the chemical and environmental technology field of antibiotic wastewater treatment. Background Art

[0002] With the widespread use of antibiotics in the fields of medicine, animal husbandry and aquaculture, the threat of antibiotic residues and the antibiotic-resistant bacteria (ARB) and antibiotic resistance genes (ARGs) produced by them to the ecological environment has become a global problem. Antibiotic wastewater mainly comes from pharmaceutical factories, hospital discharges and domestic sewage. If these wastewaters are discharged into the environment without effective treatment, they will not only pollute the water body, but also lead to the spread of antibiotic-resistant bacteria and the horizontal transfer of antibiotic resistance genes, thereby exacerbating antibiotic resistance and the generation of "super bacteria". At present, the traditional technical processes for treating antibiotic wastewater mainly include physical methods, chemical methods, biological methods, etc. Physical methods can effectively remove a certain amount of antibiotics in water through physical processes such as adsorption and membrane separation, but the removal effect of antibiotic-resistant bacteria and antibiotic resistance genes is very limited. Although physical methods can remove some resistant bacteria, they are not effective in removing resistance genes in biofilms or cells. Although chemical methods such as advanced oxidation processes (AOPs) and ozonation can destroy the molecular structure of antibiotics, and the removal efficiency of oxidants in bacterial extracellular resistance genes is relatively high, it is still difficult to effectively contact the internal resistance genes. Therefore, the treatment of resistant bacteria and resistance genes requires high-dose chemical reagents to achieve a good inactivation and degradation effect. Biological methods such as activated sludge method and biofilter method use microbial physiological processes to degrade antibiotics with stable efficiency, but there are problems such as long treatment cycle, complex preliminary preparation, and possible generation of new resistance. Therefore, the development of a method that can efficiently remove antibiotic-resistant bacteria and antibiotic resistance genes in antibiotic wastewater is of great significance to solving the current problems in antibiotic wastewater treatment.

[0003] Photothermal sterilization technology is a technology that uses the photothermal effect to kill microorganisms. By exposing the target object to a light source, the photothermal conversion performance of the material is used to convert light energy into heat energy to achieve the effect of killing microorganisms. It has the characteristics of rapid killing of target microorganisms, no secondary pollution and low cost, but has limited destructive effect on drug-resistant genes. Fenton advanced oxidation technology is a commonly used treatment process in sewage treatment plants. Based on the extremely strong oxidizing free radicals in the Fenton reaction, it can non-selectively attack and mineralize most organic pollutants, achieve efficient removal effects in a shorter time, and studies have shown that it has a good degradation and destruction effect on gene molecules. However, its treatment effect on antibiotic-resistant bacteria is not ideal, because the existence of the biofilm structure of antibiotic-resistant bacteria can resist external attacks. Low doses of Fenton reagents have limited destructive effects on membrane structures, and it may take a certain reaction time to inactivate drug-resistant bacteria. The antibiotic resistance genes inside bacteria can be transmitted between different bacteria through horizontal gene transfer as genetic information. Even if the resistant bacteria are inactivated, low-dose Fenton reagents are not effective in reducing the resistance genes, and they may still remain in the environment and continue to spread resistance. However, the blind use of high-dose Fenton reagents will increase the cost of process treatment and produce more iron sludge.

[0004] In summary, in view of the shortcomings of the existing photothermal sterilization technology and Fenton treatment process, it is urgent to develop new technologies to overcome these deficiencies, so as to improve the treatment efficiency of ARB and ARGs and save treatment costs. Summary of the invention

[0005] In view of the deficiencies in the prior art, the present invention provides a method for synchronously removing antibiotic-resistant bacteria and resistant genes by combining interfacial thermal-Fenton-like oxidation driven by sunlight.

[0006] The present invention is achieved through the following technical solutions

[0007] A method for synchronously removing antibiotic-resistant bacteria and drug-resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight, comprising the following steps:

[0008] (1) placing a photothermal film loaded with a carbon black composite photothermal material in a photothermal disinfection reactor, introducing antibiotic-resistant bacteria wastewater into the photothermal disinfection reactor through a water inlet, adding H2O2 solution to control the concentration of the reaction system to 10 to 100 mmol / L, and fully stirring;

[0009] (2) A xenon lamp light source is arranged above the photothermal film loaded with carbon black composite photothermal material, and the xenon lamp light source is turned on to preheat the photothermal film. The photothermal disinfection reactor is sealed, and wastewater passes through the photothermal film under the action of gravity. During the film passing process, photothermal-Fenton-like oxidation disinfection treatment is continuously performed to simultaneously remove antibiotic-resistant bacteria and resistant genes. The treated wastewater is collected in a liquid collection column and discharged through the liquid outlet.

[0010] According to the preferred embodiment of the present invention, in step (1), the photothermal film loaded with carbon black composite photothermal material is prepared by the following method:

[0011] The carbon black composite photothermal material powder and sodium dodecylbenzene sulfonate were dissolved in ultrapure water at a mass ratio of 1:10 and ultrasonicated for 2 hours to obtain a mixed solution a, polyvinyl alcohol solution was added to the mixed solution so that the mass ratio of the carbon black composite photothermal material powder to PVA was 2:1, and then ultrasonicated for 1 hour to mix evenly, and the ultrasonicated mixed solution b was deposited on a 0.45 μm PTFE microfiltration membrane using an ultrafiltration device, dried in a vacuum drying oven at 60°C for 40 minutes, naturally dried for 12 hours, and the film was rinsed with ultrapure water to remove chemical residues on the membrane to obtain a photothermal film loaded with a carbon black composite photothermal material.

[0012] Preferably according to the present invention, the volume concentration of the polyvinyl alcohol solution is 2%.

[0013] Preferably according to the present invention, the carbon black composite photothermal material is a Fe / Mn / carbon black composite photothermal material.

[0014] According to the preferred embodiment of the present invention, the Fe / Mn / carbon black composite photothermal material is prepared by the following method:

[0015] 1-5 g of FeCl3·6H2O, 1-5 g of MnCl2·4H2O, and 3-6 g of carbon black powder were added to 50 mL of ethylene glycol solution, and the mixture was stirred for 60 min. The obtained mixture was transferred to a stainless steel autoclave lined with polytetrafluoroethylene and heated in an oven at 200 ° C for 15 h. After heating, the precipitate was collected by centrifugation and washed twice with ethanol and deionized water respectively, then vacuum dried at 70 ° C for 20 h, and finally calcined at 500 ° C for 2 h in a N2 atmosphere to obtain Fe / Mn / carbon black composite photothermal material powder.

[0016] Preferably according to the present invention, the photothermal disinfection reactor comprises a reactor body with an opening at the top, a support frame is arranged at the bottom of the reactor body, a photothermal film loaded with a carbon black composite photothermal material is arranged on the support frame, a xenon lamp light source is arranged on the upper part of the photothermal film, a liquid collecting column is arranged under the support frame, the liquid collecting column is connected with the liquid outlet on the side wall of the reactor body through a channel, a liquid inlet is arranged on the side wall of the reactor body above the photothermal film, and a quartz glass cover is arranged at the opening of the reactor body.

[0017] Preferably, according to the present invention, in step (2), the power of the xenon lamp is 250-350 W, the wavelength is 200-2000 nm, and an AM 1.5G filter is used to correct the solar spectrum.

[0018] Preferably according to the present invention, in step (2), the preheating time is 10-30 minutes.

[0019] Preferably according to the present invention, in step (2), the xenon lamp light source is 15-30 cm away from the photothermal film.

[0020] Compared with the existing technology, the technical features and advantages of the present invention are as follows:

[0021] 1. The present invention adopts a sunlight-driven photothermal-Fenton-like oxidation combined process to remove antibiotic-resistant bacteria and antibiotic-resistant genes in wastewater. The light radiation absorbed by the photothermal conversion material is converted into thermal radiation, and the antibiotic-resistant bacteria are treated by the high-temperature interfacial thermal effect generated on the photothermal film. High-temperature interfacial heat will cause local heating of the bacterial cell membrane structure, causing a certain degree of breakage of the fatty acid chains in the lipid bilayer of the bacterial membrane, increasing the permeability of the cell membrane, and causing the structural damage of the bacterial outer membrane to increase the permeability of the bacterial membrane, thereby destroying the integrity of the membrane. High temperature can also cause the proteins on the membrane to denature, causing the bacteria to lose their normal physiological and biochemical functions, thereby leading to the inactivation of the bacteria. Compared with simply increasing the dosage of chemical reagents to intensify the damage to the membrane structure, photothermal sterilization will not cause secondary pollution, and can effectively inactivate bacteria while reducing the impact on the environment.

[0022] 2. The method of the present invention utilizes the characteristic that when bacteria are subjected to heat stimulation, reactive oxygen species (ROS) will be induced to be produced inside the bacteria, and cooperates with the external thermal effect and Fenton-like oxidation to further attack and destroy the bacterial membrane, thereby accelerating the release of the difficult-to-remove internal drug-resistant genes into the external environment, and contacting them more quickly with the strong oxidizing free radicals produced by the external Fenton-like reaction, so that the drug-resistant gene fragments are destroyed and degraded more quickly, thereby improving the treatment efficiency of Fenton-like oxidation, thereby reducing the amount of Fenton reagent used and controlling the treatment cost.

[0023] 3. The method of the present invention utilizes gravity to enable wastewater to pass through the photothermal film, thereby reducing the external force cost required for traditional membrane passing. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 This is a schematic diagram of the photothermal disinfection reactor used in the present invention;

[0025] In the figure, 1. xenon lamp light source; 2. quartz glass cover; 3. liquid inlet; 4. wastewater; 5. photothermal film; 6. liquid collection column; 7. liquid outlet.

[0026] Figure 2 This is a comparison chart of the inactivation effects of amoxicillin-resistant bacteria under different experimental conditions described in Example 1 of the present invention and Comparative Examples 1, 2, 3, and 4, and the horizontal axis AE represents Comparative Example 1, Comparative Example 2, Comparative Example 3, Comparative Example 4, and Example 1, respectively.

[0027] Figure 3 This is a comparison chart of the reduction effect of amoxicillin antibiotic resistance genes under different experimental conditions described in Example 1 of the present invention and Comparative Examples 1, 2, 3, and 4, and the horizontal axis AE represents Comparative Example 1, Comparative Example 2, Comparative Example 3, Comparative Example 4, and Example 1, respectively.

[0028] Figure 4 This is a comparison chart of changes in malondialdehyde (MDA) content in amoxicillin-resistant bacteria treated under different experimental conditions described in Example 1, Comparative Examples 1, 2, 3, and 4 of the present invention, and the horizontal axis AE is Comparative Example 1, Comparative Example 2, Comparative Example 3, Comparative Example 4, and Example 1, respectively.

[0029] Figure 5 This is a comparison chart of the changes in ATP content in amoxicillin-resistant bacteria treated under different experimental conditions described in Example 1 and Comparative Examples 1, 2, 3, and 4 of the present invention, and the horizontal axis AE represents Comparative Example 1, Comparative Example 2, Comparative Example 3, Comparative Example 4, and Example 1, respectively. DETAILED DESCRIPTION

[0030] The technical solutions in the embodiments of the present invention will be described clearly and completely below. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0031] Example 1

[0032] Preparation of Fe / Mn / carbon black composite photothermal materials:

[0033] 2 g of FeCl3·6H2O, 3 g of MnCl2·4H2O, and 5 g of carbon black powder were added to 50 mL of ethylene glycol solution, and the mixture was stirred for 60 min. The obtained mixture was transferred to a stainless steel autoclave lined with polytetrafluoroethylene and heated in an oven at 200 °C for 15 h. After heating, the precipitate was collected by centrifugation and washed twice with ethanol and deionized water respectively, then vacuum dried at 70 °C for 20 h, and finally calcined at 500 °C for 2 h in a N2 atmosphere to obtain Fe / Mn / carbon black composite photothermal material powder.

[0034] Preparation of photothermal film:

[0035] Fe / Mn / carbon black composite photothermal material powder and sodium dodecylbenzene sulfonate were dissolved in ultrapure water at a mass ratio of 1:10 and ultrasonicated for 2 hours to obtain a mixed solution a, polyvinyl alcohol solution was added to the mixed solution so that the mass ratio of carbon black composite photothermal material powder to PVA was 2:1, and then ultrasonicated for 1 hour to mix evenly, and the ultrasonicated mixed solution b was deposited on a 0.45 μm PTFE microfiltration membrane using an ultrafiltration device, dried in a vacuum drying oven at 60°C for 40 minutes, naturally dried for 12 hours, and the film was rinsed 3 times with ultrapure water to remove chemical residues on the membrane to obtain a photothermal film loaded with carbon black composite photothermal material.

[0036] A method for synchronously removing antibiotic-resistant bacteria and drug-resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight comprises the following steps:

[0037] (1) Place the prepared photothermal film loaded with carbon black composite photothermal material in a photothermal disinfection reactor, and introduce 20 ml of 10 7 For wastewater containing antibiotic-resistant bacteria at a concentration of CFU / mL, add H2O2 solution to control the concentration of the reaction system at 30mmol / L and stir well.

[0038] (2) Arranging a xenon lamp light source above the photothermal film loaded with carbon black composite photothermal material, adjusting the light source to a distance of 20 cm from the upper part of the photothermal film placed in the reactor in step (1), turning on the xenon lamp light source, preheating the photothermal film for 20 minutes, covering with a quartz glass cover plate to maintain a relatively sealed system state, allowing wastewater to pass through the photothermal film under the action of gravity, and continuously performing photothermal-Fenton-like oxidation disinfection treatment during the film passing process to simultaneously remove antibiotic-resistant bacteria and resistant genes, and collecting the treated wastewater in a liquid collection column and discharging through a liquid outlet.

[0039] The photothermal disinfection reactor includes a reactor body with an opening at the top, a support frame is arranged at the bottom of the reactor body, a photothermal film 5 loaded with carbon black composite photothermal material is arranged on the support frame, a xenon lamp light source 1 is arranged on the upper part of the photothermal film 5, a liquid collecting column 6 is arranged under the support frame, the liquid collecting column 6 is connected with the liquid outlet 7 on the side wall of the reactor body through a channel, a liquid inlet 3 is arranged on the side wall of the reactor body above the photothermal film, and a quartz glass cover 2 is arranged at the opening of the reactor body.

[0040] Comparative Example 1

[0041] The method for simultaneously removing antibiotic-resistant bacteria and drug-resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight as described in Example 1 is different in that:

[0042] No photothermal material is loaded on the photothermal film, a light source is used, and the rest is exactly the same as in Example 1.

[0043] Comparative Example 2

[0044] The method for simultaneously removing antibiotic-resistant bacteria and drug-resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight as described in Example 1 is different in that:

[0045] The photothermal film is not loaded with photothermal material, and no light source is used. Only a thermal environment with the same system temperature is provided. The rest is exactly the same as in Example 1.

[0046] Comparative Example 3

[0047] The method for simultaneously removing antibiotic-resistant bacteria and resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight as described in Example 1 is different in that: no photothermal material is loaded on the photothermal film, a thermal environment with the same temperature as the system is provided, and a light source is used. The rest is exactly the same as in Example 1.

[0048] Comparative Example 4

[0049] The method for synchronously removing antibiotic-resistant bacteria and resistant genes by combining interfacial heat-Fenton-like oxidation driven by sunlight is the same as that described in Example 1, except that no light source is used. The rest is exactly the same as Example 1.

[0050] Experimental example

[0051] The scheme of Example 1 was used to carry out a photothermal-Fenton-like oxidation disinfection experiment on bacterial wastewater containing amoxicillin-resistant antibiotics. The initial volume of the solution was 20mL, and the H2O2 concentration of the system was 30mmol / L. The same parameters were applied to comparative examples 1-4 to disinfect bacterial wastewater resistant to amoxicillin antibiotics. During the photothermal-Fenton-like oxidation disinfection process, samples were taken at fixed times, i.e. 1mL was sampled at 0min, 5min, 15min, 30min, and 40min, and the inactivation of resistant bacteria was confirmed by the flat plate coating method. 1mL was sampled at 2h to detect the reduction of resistance genes. After the experiment, the inactivation of antibiotic-resistant bacteria, the reduction of resistance genes, and the membrane damage test were tested. Figure 2-Figure 5 .

[0052] 1. Pass Figure 2It can be seen that the inactivation effect of drug-resistant bacteria in Example 1 is more significant than that in Comparative Examples 1-4. During the disinfection process within 40 minutes, the inactivation effect of drug-resistant bacteria in Comparative Examples 1-4 is basically maintained at 3-4 orders of magnitude, while Example 1 can achieve a drug-resistant bacteria inactivation effect of 7 orders of magnitude. The photothermal-Fenton-like oxidation combined process in the reaction system of Example 1 is complete, while the mechanism of only light action (Comparative Example 1), only heat action (Comparative Example 2), only photothermal action (Comparative Example 3) and only Fenton-like oxidation action (Comparative Example 4) has limited effect in inactivating drug-resistant bacteria. In Example 1, on the one hand, the photothermal material efficiently and quickly absorbs light energy and converts it into heat energy, generates a high-temperature thermal effect on the surface of the photothermal film, and contacts with drug-resistant bacteria, causing a certain degree of damage to the lipid and protein components of the bacterial membrane structure, changing the permeability of the cell membrane and causing the destruction of the membrane structure, making it impossible for the bacterial life activities to proceed normally. On the other hand, the Fe / Mn metal components in the photothermal material react with H2O2 to form a Fenton-like system to promote the generation of strong oxidative free radicals, and also oxidatively attack the cell membrane structure components, synergizing the photothermal high temperature effect to accelerate the destruction of the membrane structure. Therefore, the photothermal-Fenton-like oxidation combined process used in the present invention has a more significant effect of inactivating drug-resistant bacteria.

[0053] 2. Pass Figure 3 It can be seen that the degree of resistance gene reduction in Example 1 is higher than that in Comparative Examples 1-4. This is because under the action of the combined photothermal-Fenton-like oxidation process, the degree of destruction of the membrane structure of resistant bacteria is higher, and the resistance gene genetic material that is difficult to remove inside the cell is released to the extracellular space faster and at a higher content than that in Comparative Examples 1-4 within the same time (2h), which is beneficial to the destruction of resistance gene fragments by Fenton-like oxidation.

[0054] 3. In order to verify that Example 1 is more significantly destructive to the bacterial membrane structure than Comparative Examples 1-4, the changes in malondialdehyde (MDA) content and ATP content were tested. Studies have shown that MDA is a product of oxidative decomposition of lipid structure. When membrane permeability is impaired and intracellular nucleotides flow out, the loss of inorganic phosphate through the membrane will lead to ATP hydrolysis and a decrease in content. Among them, compared with Comparative Examples 1-4, the MDA content in Example 1 increased significantly in each period, and the ATP content decreased to a certain extent, which shows that the photothermal-Fenton-like oxidation combined process in the present invention has a significant destructive effect on the bacterial membrane structure.

[0055] Therefore, the present invention uses the high-temperature interface thermal effect of the photothermal film to cooperate with Fenton-like oxidation to treat antibiotic-resistant bacterial wastewater in a 30mmol / L H2O2 system environment, and achieves good results in inactivating bacteria and reducing resistance genes during the disinfection process. Compared with simply increasing the concentration of chemical oxidants to enhance sterilization and reduce resistance genes, it can reduce the consumption of Fenton reagents and control costs.

[0056] Example 2

[0057] The method for simultaneously removing antibiotic-resistant bacteria and drug-resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight as described in Example 1 is different in that:

[0058] The concentration of H2O2 in the reaction system is 10mmol / L, and the concentration of antibiotic-resistant bacteria is ~10 6 CFU / mL.

[0059] Example 3

[0060] The method for simultaneously removing antibiotic-resistant bacteria and drug-resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight as described in Example 1 is different in that:

[0061] The concentration of H2O2 in the reaction system is 50mmol / L, and the concentration of antibiotic-resistant bacteria is ~10 8 CFU / mL.

[0062] Example 4

[0063] The method for simultaneously removing antibiotic-resistant bacteria and drug-resistant genes by combining interfacial heat and Fenton-like oxidation driven by sunlight as described in Example 1 is different in that:

[0064] The concentration of H2O2 in the reaction system is 70mmol / L, and the concentration of antibiotic-resistant bacteria is ~10 9 CFU / mL.

Claims

1. A method for synchronously removing antibiotic-resistant bacteria and resistance genes by combining interfacial heat-Fenton-like oxidation driven by sunlight, comprising the following steps: (1) placing a photothermal film loaded with a carbon black composite photothermal material in a photothermal disinfection reactor, introducing antibiotic-resistant bacteria wastewater into the photothermal disinfection reactor through a water inlet, adding H2O2 solution to control the concentration of the reaction system to 10 to 100 mmol / L, and fully stirring; (2) A xenon lamp light source is arranged above the photothermal film loaded with carbon black composite photothermal material, and the xenon lamp light source is turned on to preheat the photothermal film. The photothermal disinfection reactor is sealed, and wastewater passes through the photothermal film under the action of gravity. During the film passing process, photothermal-Fenton-like oxidation disinfection treatment is continuously performed to simultaneously remove antibiotic-resistant bacteria and resistant genes. The treated wastewater is collected in a liquid collection column and discharged through the liquid outlet.

2. The method according to claim 1, characterized in that In step (1), the photothermal film loaded with carbon black composite photothermal material is prepared by the following method: The carbon black composite photothermal material powder and sodium dodecylbenzene sulfonate were dissolved in ultrapure water at a mass ratio of 1:10 and ultrasonicated for 2 hours to obtain a mixed solution a, polyvinyl alcohol solution was added to the mixed solution so that the mass ratio of the carbon black composite photothermal material powder to PVA was 2:1, and then ultrasonicated for 1 hour to mix evenly, and the ultrasonicated mixed solution b was deposited on a 0.45 μm PTFE microfiltration membrane using an ultrafiltration device, dried in a vacuum drying oven at 60°C for 40 minutes, naturally dried for 12 hours, and the film was rinsed with ultrapure water to remove chemical residues on the membrane to obtain a photothermal film loaded with a carbon black composite photothermal material.

3. The method according to claim 2, characterized in that The volume concentration of the polyvinyl alcohol solution was 2%.

4. The method according to claim 2, characterized in that: The carbon black composite photothermal material is a Fe / Mn / carbon black composite photothermal material.

5. The method according to claim 4, characterized in that The Fe / Mn / carbon black composite photothermal material is prepared as follows: 1-5 g of FeCl3·6H2O, 1-5 g of MnCl2·4H2O, and 3-6 g of carbon black powder were added to 50 mL of ethylene glycol solution, and the mixture was stirred for 60 min. The obtained mixture was transferred to a stainless steel autoclave lined with polytetrafluoroethylene and heated in an oven at 200 ° C for 15 h. After heating, the precipitate was collected by centrifugation and washed twice with ethanol and deionized water respectively, then vacuum dried at 70 ° C for 20 h, and finally calcined at 500 ° C for 2 h in a N2 atmosphere to obtain Fe / Mn / carbon black composite photothermal material powder.

6. The method according to claim 1, characterized in that The photothermal disinfection reactor includes a reactor body with an opening at the top, a support frame is arranged at the bottom of the reactor body, a photothermal film loaded with carbon black composite photothermal material is arranged on the support frame, a xenon lamp light source is arranged on the upper part of the photothermal film, a liquid collecting column is arranged below the support frame, the liquid collecting column is connected with the liquid outlet on the side wall of the reactor body through a channel, a liquid inlet is arranged on the side wall of the reactor body above the photothermal film, and a quartz glass cover is arranged at the opening of the reactor body.

7. The method according to claim 1, characterized in that In step (2), the power of the xenon lamp is 250-350W, the wavelength is 200-2000nm, and an AM 1.5G filter is used to correct the solar spectrum.

8. The method according to claim 1, characterized in that In step (2), the preheating time is 10-30 minutes.

9. The method according to claim 1, characterized in that: In step (2), the xenon lamp light source is 15-30 cm away from the photothermal film.

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