Display panel and display device

Abstract

The embodiment of the invention provides a display panel and a display device, and the display panel comprises a substrate; the pixel defining layer is arranged on one side of the substrate and comprises a pixel limiting part and a pixel opening; the first isolation structure is arranged on one side of the substrate; the light-emitting functional layer comprises light-emitting units at least partially located in the pixel openings, and each light-emitting unit comprises at least one organic layer; the second isolation structure is arranged on the side, away from the substrate, of the pixel definition layer, the orthographic projection of the second isolation structure on the substrate at least partially surrounds the orthographic projection of the pixel opening on the substrate, and the second isolation structure separates at least one organic layer; the first electrode layer is partially arranged on the side, away from the substrate, of the light-emitting functional layer. Therefore, transverse electric leakage caused by lap joint of the organic layer and the first isolation structure is avoided, the display image quality is not affected, the display effect of the display panel is improved, and the use performance of the display panel is improved.

Description

Technical Field

[0001] The present application relates to the field of display technology, and in particular to a display panel and a display device. Background Art

[0002] Organic Light Emitting Diode (OLED) and flat panel display devices based on technologies such as Light Emitting Diode (LED) have been widely used in various consumer electronic products such as mobile phones, televisions, laptops, desktop computers, etc. due to their advantages such as high image quality, power saving, thin body and wide application range, becoming the mainstream in display devices.

[0003] However, the performance of current OLED display products needs to be improved. Summary of the invention

[0004] Embodiments of the present application provide a display panel and a display device, aiming to improve the performance of the display panel.

[0005] An embodiment of one aspect of the present application provides a display panel, comprising: a substrate; a pixel definition layer, arranged on one side of the substrate, comprising a pixel defining portion and a pixel opening; a first isolation structure, arranged on one side of the substrate and enclosing a plurality of isolation openings, wherein the orthographic projection of the pixel opening on the substrate and the orthographic projection of the isolation opening on the substrate at least partially overlap; a light-emitting functional layer, comprising a light-emitting unit at least partially located at each of the pixel openings, wherein the light-emitting unit comprises at least one organic layer; a second isolation structure, arranged on a side of the pixel definition layer away from the substrate and located in the isolation opening, wherein the orthographic projection of the second isolation structure on the substrate at least partially surrounds the orthographic projection of the pixel opening on the substrate, and the second isolation structure separates at least one organic layer; a first electrode layer, partially arranged on a side of the light-emitting functional layer away from the substrate.

[0006] According to any embodiment described in one aspect of the present application, along a first direction, the second isolation structure is provided on at least two opposite sides of the light-emitting unit, and the first direction is parallel to the direction of the plane where the substrate is located; preferably, along a second direction, the second isolation structure is provided on at least one side of the light-emitting unit, the second direction is parallel to the direction of the plane where the substrate is located, and the second direction intersects with the first direction; preferably, the first direction and the second direction are perpendicular; preferably, the second isolation structure is provided around the light-emitting unit.

[0007] According to any embodiment described in one aspect of the present application, at least part of the first electrode layer is electrically connected to the first isolation structure; preferably, at least part of the first electrode layer is overlapped with the first isolation structure; preferably, at least part of the first electrode layer extends continuously from the pixel opening to the first isolation structure and overlaps with the first isolation structure.

[0008] According to any embodiment described in one aspect of the present application, the second isolation structure is arranged to protrude relative to the pixel definition layer in a direction away from the substrate; along the direction perpendicular to the plane where the substrate is located, the distance between the side surface of the first isolation structure away from the substrate and the side surface of the pixel definition layer away from the substrate is a first distance, and the distance between the side surface of the second isolation structure away from the substrate and the side surface of the pixel definition layer away from the substrate is a second distance, and the first distance is greater than the second distance.

[0009] According to any embodiment described in one aspect of the present application, the second isolation structure includes a first sublayer and a second sublayer stacked in a direction away from the substrate, and the orthographic projection of the first sublayer on the substrate is located within the orthographic projection of the second sublayer on the substrate; preferably, the first sublayer and the second sublayer both include inorganic materials; preferably, the first sublayer and the second sublayer respectively include inorganic materials with different etching rates; preferably, the first sublayer includes silicon nitride material, and the second sublayer includes silicon oxide material; preferably, the thickness of the first sublayer is greater than or equal to 10nm and less than or equal to 800nm, and the thickness of the second sublayer is greater than or equal to 10nm and less than or equal to 200nm; preferably, the pixel defining portion includes an inorganic material.

[0010] According to any embodiment described in one aspect of the present application, along the direction away from the substrate, the light-emitting functional layer includes a hole transport layer, a light-emitting layer, and an electron transport layer which are stacked; the hole transport layer is separated by the second isolation structure; preferably, the light-emitting functional layer also includes a hole injection layer located on the side of the hole transport layer facing the substrate, an auxiliary light-emitting layer located between the hole transport layer and the light-emitting layer, a hole blocking layer located between the light-emitting layer and the electron transport layer, and at least one of the electron injection layer located on the side of the electron transport layer away from the substrate; preferably, at least the hole injection layer is separated by the second isolation structure; preferably, the light-emitting layer is separated by the second isolation structure; preferably, the hole blocking layer and the electron transport layer are both separated by the second isolation structure.

[0011] According to any embodiment described in one aspect of the present application, the first isolation structure includes a third sublayer and a fourth sublayer stacked in a direction away from the substrate, and the orthographic projection of the third sublayer on the substrate is located within the orthographic projection of the fourth sublayer on the substrate; preferably, the third sublayer and the fourth sublayer both include conductive materials; preferably, the first electrode layer and the third sublayer are electrically connected.

[0012] According to any embodiment described in one aspect of the present application, the second isolation structure includes a partition groove provided on a surface of the pixel definition layer away from the substrate; at least part of the organic layer extends into the partition groove and is isolated by the partition groove.

[0013] According to any embodiment described in one aspect of the present application, the cross-sectional area of ​​at least one cross section of the partition groove is larger than the cross-sectional area of ​​the surface of the partition groove away from the substrate; preferably, the cross-sectional area of ​​the partition groove gradually decreases in the direction away from the substrate; preferably, along the direction perpendicular to the plane where the substrate is located, the cross-sectional shape of the partition groove is trapezoidal.

[0014] According to any one of the embodiments described in one aspect of the present application, the partition groove is arranged around the orthographic projection of the pixel opening on the substrate.

[0015] According to any embodiment described in one aspect of the present application, it further includes a first encapsulation layer, which is located on the side of the light-emitting functional layer away from the substrate, and the material of the first encapsulation layer includes an inorganic material; preferably, it further includes a second encapsulation layer, which is located on the side of the first encapsulation layer away from the substrate; preferably, the material of the second encapsulation layer includes an organic material; preferably, it further includes a third encapsulation layer, which is located on the side of the second encapsulation layer away from the substrate; preferably, the material of the third encapsulation layer includes an inorganic material; preferably, the materials of the first encapsulation layer and the third encapsulation layer are the same.

[0016] Another aspect of the present application provides a display panel, comprising: a substrate; a pixel definition layer, disposed on one side of the substrate, comprising a pixel defining portion and a pixel opening; a first isolation structure, disposed on one side of the substrate and enclosing a plurality of isolation openings, wherein the orthographic projection of the pixel opening on the substrate and the orthographic projection of the isolation opening on the substrate at least partially overlap; a light-emitting functional layer, comprising a light-emitting unit at least partially located in each of the pixel openings, wherein the light-emitting unit comprises at least one organic layer; a second isolation structure, disposed on a side of the pixel definition layer away from the substrate and located in the isolation opening, wherein the second isolation structure encloses a plurality of partition areas, wherein at least one organic layer comprises a first part and a second part intermittently arranged, wherein the first part is located in the partition area, and the second part is located between the first isolation structure and the second isolation structure; a first electrode layer, partially disposed on a side of the light-emitting functional layer away from the substrate.

[0017] According to any embodiment described in another aspect of the present application, along a first direction, the second isolation structure is provided on at least two opposite sides of the light-emitting unit, and the first direction is parallel to the direction of the plane where the substrate is located; preferably, along a second direction, the second isolation structure is provided on at least one side of the light-emitting unit, the second direction is parallel to the direction of the plane where the substrate is located, and the second direction intersects with the first direction; preferably, the first direction and the second direction are perpendicular; preferably, the second isolation structure is provided around the light-emitting unit.

[0018] According to any embodiment described in another aspect of the present application, at least part of the first electrode layer is electrically connected to the first isolation structure; preferably, at least part of the first electrode layer is overlapped with the first isolation structure; preferably, at least part of the first electrode layer extends continuously from the pixel opening to the first isolation structure and overlaps with the first isolation structure.

[0019] According to any embodiment described in another aspect of the present application, the second isolation structure is arranged to protrude relative to the pixel definition layer in a direction away from the substrate; along the direction perpendicular to the plane where the substrate is located, the distance between the side surface of the first isolation structure facing away from the substrate and the side surface of the pixel definition layer facing away from the substrate is a first distance, and the distance between the side surface of the second isolation structure facing away from the substrate and the side surface of the pixel definition layer facing away from the substrate is a second distance, and the first distance is greater than the second distance.

[0020] According to any embodiment described in another aspect of the present application, the second isolation structure includes a first sublayer and a second sublayer stacked in a direction away from the substrate, and the orthographic projection of the first sublayer on the substrate is located within the orthographic projection of the second sublayer on the substrate; preferably, the first sublayer and the second sublayer both include inorganic materials; preferably, the first sublayer and the second sublayer respectively include inorganic materials with different etching rates; preferably, the first sublayer includes silicon nitride material, and the second sublayer includes silicon oxide material; preferably, the thickness of the first sublayer is greater than or equal to 10nm and less than or equal to 800nm, and the thickness of the second sublayer is greater than or equal to 10nm and less than or equal to 200nm; preferably, the pixel defining portion includes an inorganic material.

[0021] According to any embodiment described in another aspect of the present application, along the direction away from the substrate, the light-emitting functional layer includes a hole transport layer, a light-emitting layer, and an electron transport layer which are stacked; the hole transport layer is located in the isolation area; preferably, the light-emitting functional layer also includes a hole injection layer located on the side of the hole transport layer facing the substrate, an auxiliary light-emitting layer located between the hole transport layer and the light-emitting layer, a hole blocking layer located between the light-emitting layer and the electron transport layer, and at least one of the electron injection layer located on the side of the electron transport layer away from the substrate; preferably, at least the hole injection layer is isolated by the second isolation structure; preferably, the light-emitting layer is isolated by the second isolation structure; preferably, the hole blocking layer and the electron transport layer are both isolated by the second isolation structure.

[0022] According to any embodiment described in another aspect of the present application, the first isolation structure includes a third sublayer and a fourth sublayer stacked in a direction away from the substrate, and the orthographic projection of the third sublayer on the substrate is located within the orthographic projection of the fourth sublayer on the substrate; preferably, the third sublayer and the fourth sublayer both include conductive materials; preferably, the first electrode layer and the third sublayer are electrically connected.

[0023] According to any embodiment described in another aspect of the present application, the second isolation structure includes a partition groove provided on a surface of the pixel definition layer on a side away from the substrate; at least a portion of the organic layer extends into the partition groove.

[0024] According to yet another aspect of the present application, a display device is provided, comprising the display panel in any of the above embodiments. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Other features, objects and advantages of the present application will become more apparent by reading the following detailed description of non-limiting embodiments with reference to the accompanying drawings, in which the same or similar reference numerals represent the same or similar features.

[0026] Figure 1 is a structural schematic diagram of a display panel provided in an embodiment of the present application;

[0027] Figure 2 In one example Figure 1 A partial enlarged view of the middle A;

[0028] Figure 3 In one example Figure 2 Sectional view at the middle BB;

[0029] Figure 4 In another example Figure 1 A partial enlarged view of the middle A;

[0030] Figure 5 In one example Figure 4 Sectional view at CC;

[0031] Figure 6 In another example Figure 4 Sectional view at CC;

[0032] Figure 7 In another example Figure 1 A partial enlarged view of the middle A;

[0033] Figure 8 yes Figure 3 A schematic diagram of a local enlarged structure;

[0034] Fig. 9 yes Figure 3 A schematic diagram of a local enlarged structure;

[0035] Fig.10 In another example Figure 2 Cross-sectional view at the middle BB.

[0036] Fig.11 yes Fig.10 Schematic diagram of the local enlarged structure.

[0037] Description of reference numerals:

[0038] 100. Substrate;

[0039] 200, pixel definition layer; 210, pixel definition portion; 220, pixel opening;

[0040] 300, first isolation structure; 310, third sublayer; 320, fourth sublayer;

[0041] 400, a first electrode layer;

[0042] 500, second isolation structure; 510, first sublayer; 520, second sublayer;

[0043] 600, light-emitting functional layer; 610, first part; 620, second part; 601, hole transport layer; 602, light-emitting layer; 603, electron transport layer; 604, hole injection layer; 605, auxiliary light-emitting layer; 606, hole blocking layer; 607, electron injection layer;

[0044] 700, second electrode layer;

[0045] C, partition groove; F, light-emitting unit; K, isolation opening; GA-partition area; X, first direction; Y, second direction. DETAILED DESCRIPTION

[0046] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In the detailed description below, many specific details are proposed to provide a comprehensive understanding of the present application. However, it is obvious to those skilled in the art that the present application can be implemented without the need for some of these specific details. The following description of the embodiments is only to provide a better understanding of the present application by illustrating examples of the present application. In the accompanying drawings and the following description, at least some of the known structures and technologies are not shown to avoid unnecessary ambiguity in the present application; and, for clarity, the size of some structures may be exaggerated. In addition, the features, structures or characteristics described below may be combined in one or more embodiments in any suitable manner.

[0047] In the description of the present application, it should be noted that, unless otherwise specified, "multiple" means more than two; the terms "upper", "lower", "left", "right", "inner", "outer", etc., indicating directions or positional relationships, are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore cannot be understood as limiting the present application. In addition, the terms "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or implying relative importance.

[0048] The directional words appearing in the following description are all directions shown in the figures, and do not limit the specific structure of the embodiments of the present application. In the description of the present application, it should also be noted that, unless otherwise clearly specified and limited, the terms "installation" and "connection" should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be directly connected or indirectly connected. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0049] In order to better understand this application, Figures 1 to 11 The display panel and the display device according to the embodiments of the present application are described in detail.

[0050] Please also read Figures 1 to 3 , Figure 1 is a structural schematic diagram of a display panel provided in an embodiment of the present application; Figure 2 In one example Figure 1 A partial enlarged view of the middle A; Figure 3 In one example Figure 2 Cross-sectional view at the middle BB.

[0051] The present application provides a display panel, comprising: a substrate 100; a pixel definition layer 200, which is arranged on one side of the substrate 100 and includes a pixel defining portion 210 and a pixel opening 220; a first isolation structure 300, which is arranged on one side of the substrate 100 and encloses a plurality of isolation openings K, wherein the orthographic projection of the pixel opening 220 on the substrate 100 and the orthographic projection of the isolation opening K on the substrate 100 at least partially overlap; a light-emitting functional layer 600, comprising a light-emitting unit F at least partially located in each pixel opening 220, wherein the light-emitting unit F includes at least one organic layer; a second isolation structure 500, which is arranged on the side of the pixel definition layer 200 away from the substrate 100 and is located in the isolation opening K, wherein the orthographic projection of the second isolation structure 500 on the substrate 100 at least partially surrounds the orthographic projection of the pixel opening 220 on the substrate 100, and the second isolation structure 500 separates at least one organic layer; a first electrode layer 400, which is partially arranged on the side of the light-emitting functional layer 600 away from the substrate 100.

[0052] The display panel provided by the embodiment of the present invention includes a substrate 100, a first isolation structure 300, a second isolation structure 500, a light-emitting functional layer 600, a pixel definition layer 200 and a first electrode layer 400. The first isolation structure 300 encloses an isolation opening K, so that the light-emitting unit F of the light-emitting functional layer 600 is located in the isolation opening K, thereby improving the problem of light interference between light-emitting units F of different colors. The pixel definition layer 200 includes a pixel defining portion 210 and a pixel opening 220 enclosed by the pixel definition portion. The light-emitting functional layer 600 is disposed on a side of the pixel definition layer 200 away from the substrate 100 and includes a plurality of light-emitting units F. At least part of the light-emitting units F can be located in the pixel opening 220. The pixel definition layer 200 can be used to divide the sub-pixels of the display panel.

[0053] The light-emitting unit F includes at least one organic layer. In order to avoid overlapping of the organic layer and the first isolation structure 300, the present embodiment sets a second isolation structure 500 between the first isolation structure 300 and the light-emitting unit F, so as to utilize the second isolation structure 500 to isolate the organic layer, so as to prevent the organic layer from continuously extending to the first isolation structure 300, thereby avoiding lateral leakage caused by overlapping of the organic layer and the first isolation structure 300, affecting the display quality, making it less likely for the display panel to have the problem of light crosstalk, thereby improving the display effect of the display panel and improving the performance of the display panel.

[0054] See also Figures 2 to 3 Optionally, along a first direction X, the second isolation structure 500 is disposed at least on two opposite sides of the light emitting unit F, and the first direction X is parallel to the direction of the plane where the substrate 100 is located.

[0055] In this embodiment, along the first direction X, the second isolation structure 500 may be only disposed on two opposite sides of the light emitting unit F, that is, the second isolation structure 500 includes two oppositely disposed parts to isolate the organic layers corresponding to the two sides of the light emitting unit F.

[0056] Alternatively, the setting range of the second isolation structure 500 may be further increased, see Figures 4 to 6 For example, along the second direction Y, the second isolation structure 500 is provided on at least one side of the light emitting unit F, the second direction Y is parallel to the direction of the plane where the substrate 100 is located, and the second direction Y intersects with the first direction X. It can be understood that the first direction X and the second direction Y can be vertically arranged, and can be specifically arranged according to the shape of the light emitting unit. In this embodiment, the second isolation structure 500 provided on one side of the light emitting unit F along the second direction Y can be connected to the second isolation structure 500 located on one side of the light emitting unit F along the first direction X to form a half-enclosed overall structure, or can be unconnected and each can be independently arranged for easy preparation.

[0057] See also Figure 7 Optionally, the second isolation structure 500 is arranged around the light-emitting unit F, that is, the second isolation structure 500 is a closed ring structure, which is completely arranged around the light-emitting unit F to isolate the organic layer from all directions and avoid lateral leakage caused by overlapping of the organic layer and the first isolation structure 300.

[0058] Optionally, the first electrode layer 400 extends from the pixel opening 220 toward the direction of the first isolation structure 300 to cross the second isolation structure 500 and is electrically connected to the first isolation structure 300 so that the first electrode layer 400 can receive a voltage signal through the first isolation structure 300, that is, the first isolation structure 300 includes a conductive material.

[0059] Optionally, at least a portion of the first electrode layer 400 extends continuously from the pixel opening 220 to the first isolation structure 300 and overlaps the first isolation structure 300 .

[0060] It should be noted that the first electrode layer 400 extends continuously, which means that the first electrode layer 400 will not be interrupted by the second isolation structure 500, and can cross the second isolation structure 500 to be electrically connected to the first isolation structure 300. The first electrode layer 400 can normally receive voltage signals to ensure the display effect of the display panel.

[0061] Patent applications CN118251982A, 202410864269.8, PCT / CN2024 / 098407, PCT / CN2024 / 102783, PCT / CN2024 / 098217, PCT / CN2024 / 099419, and PCT / CN2024 / 099072 record relevant technical solutions for the first isolation structure, and their contents are incorporated into this application by reference for reference.

[0062] In this embodiment, the second isolation structure 500 isolates at least one organic layer, which means that the second isolation structure 500 can interrupt the continuous organic layer, so that the organic layer between the second isolation structure 500 and the first isolation structure 300 is discontinuous and cannot be connected and conductive. Alternatively, the organic layer can only extend to the second isolation structure 500, and the second isolation structure 500 can block the organic layer from continuing to extend to the first isolation structure 300, thereby preventing the organic layer and the first isolation structure 300 from overlapping.

[0063] The second isolation structure 500 may refer to a protruding structure protruding relative to the pixel definition layer 200 in a direction away from the substrate 100, or may be a partition groove C opened on the side of the pixel definition layer 200 away from the substrate 100. As long as the structure can isolate the organic layer, there is no special limitation.

[0064] Optionally, there are multiple ways to set the substrate 100. The substrate 100 may include a substrate and a first conductive layer, a second conductive layer, and a third conductive layer that are arranged on one side of the substrate and are stacked. An insulating layer is provided between adjacent conductive layers. Exemplarily, the substrate 100 includes a pixel driving circuit. The pixel driving circuit includes a transistor and a storage capacitor. The transistor includes a channel region, a gate, a source and a drain. The storage capacitor includes a first plate and a second plate. As an example, the gate and the first plate may be located in the first conductive layer, the second plate may be located in the second conductive layer, and the source and the drain may be located in the third conductive layer. Optionally, the substrate 100 may also include a fourth conductive layer, the fourth conductive layer is located on the side of the third conductive layer facing away from the substrate, and the fourth conductive layer may be provided with a connecting signal line.

[0065] Optionally, the display panel further includes a second electrode layer 700, the second electrode layer 700 includes a plurality of second electrodes arranged at intervals, each second electrode being located on a side of each light-emitting unit F facing the substrate 100. The second electrode layer 700 and the first electrode layer 400 work together to drive the light-emitting unit F to emit light. One of the first electrode layer 400 and the second electrode layer 700 is an anode, and the other is a cathode. The embodiment of the present application is described by taking the first electrode layer 400 as a cathode and the second electrode layer 700 as an anode as an example.

[0066] The material of the first electrode layer 400 may include one of metal materials such as silver (Ag), aluminum (Al), lithium (Li), magnesium (Mg), ytterbium (Yb), calcium (Ca) or indium (In), and may also be an alloy of the aforementioned metal materials, such as magnesium-silver alloy (Mg / Ag) and lithium-aluminum alloy (Li / Al), but this embodiment does not impose any limitation on this.

[0067] The material of the second electrode layer 700 is generally a material with a high work function to improve the hole injection efficiency, and may include gold (Au), platinum (Pt), titanium (Ti), silver (Ag), indium tin oxide (ITO), zinc tin oxide (IZO) or a transparent conductive polymer (such as polyaniline), etc. For example, the second electrode layer 700 can be made of an ITO-Ag-ITO composite material, without special limitation.

[0068] See also Figure 8 or Fig. 9 Optionally, along the direction away from the substrate 100 , the light-emitting functional layer 600 includes a stacked hole transport layer 601 , a light-emitting layer 602 , and an electron transport layer 603 ; the hole transport layer 601 is separated by the second isolation structure 500 .

[0069] In this embodiment, the hole transport layer 601 located at the bottom layer of the light-emitting functional layer 600 is isolated by the second isolation structure 500 and is disconnected at the second isolation structure 500 to avoid overlapping with the first isolation structure 300. Of course, in order to improve the light extraction efficiency of the light-emitting functional layer 600 and improve the light extraction effect, the light-emitting functional layer 600 may also include other functional layers.

[0070] See also Fig. 9 For example, the light-emitting functional layer 600 also includes a hole injection layer 604 located on the side of the hole transport layer 601 facing the substrate 100, an auxiliary light-emitting layer 605 located between the hole transport layer 601 and the light-emitting layer 602, a hole blocking layer 606 located between the light-emitting layer 602 and the electron transport layer 603, and an electron injection layer 607 located on the side of the electron transport layer 603 away from the substrate 100. The specific selection can be made according to actual needs.

[0071] Optionally, at least the hole injection layer 604 is isolated by the second isolation structure 500 .

[0072] Optionally, the light-emitting layer 602 is isolated by a second isolation structure 500. When only a hole transport layer 601, a light-emitting layer 602 and an electron transport layer 603 are provided, the hole transport layer 601 and the light-emitting layer 602 are both isolated by the second isolation structure 500. When a hole injection layer 604, an auxiliary light-emitting layer 605, a hole blocking layer 606 and an electron injection layer 607 are provided, the hole injection layer 604, the auxiliary light-emitting layer 605, the hole transport layer 601 and the light-emitting layer 602 are all isolated by the second isolation structure 500.

[0073] Optionally, the hole blocking layer 606 and the electron transport layer 603 are both separated by the second isolation structure 500. Considering that the hole blocking layer 606 and the electron transport layer 603 are separated by the second isolation structure 500, the film layer below the hole blocking layer 606 will also be separated together, that is, the hole injection layer 604, the auxiliary light-emitting layer 605, the hole transport layer 601, the light-emitting layer 602, the hole blocking layer 606, and the electron transport layer 603 are all separated by the second isolation structure 500.

[0074] See also Figure 3 In some optional embodiments, the first isolation structure 300 includes a third sublayer 310 and a fourth sublayer 320 stacked in a direction away from the substrate 100, and the orthographic projection of the third sublayer 310 on the substrate 100 is located within the orthographic projection of the fourth sublayer 320 on the substrate 100.

[0075] In these optional embodiments, the size of the third sublayer 310 is smaller than that of the fourth sublayer 320, so that a recess can be formed under the fourth sublayer 320. When the light-emitting material layer falls on the first isolation structure 300, the light-emitting material layer can be broken at the peripheral side of the first isolation structure 300, thereby forming light-emitting units F located in each isolation opening K and independent of each other, which can simplify the preparation process of the light-emitting unit F.

[0076] Optionally, the material of the first isolation structure 300 includes a conductive material, a first electrode layer 400 is provided on the side of the light-emitting unit F facing away from the substrate 100, and the first electrode layer 400 and the first isolation structure 300 are electrically connected, so that the first electrode can be interconnected through the first isolation structure 300 to form a whole-surface electrode.

[0077] See also Figure 3 In some optional embodiments, the second isolation structure 500 is disposed to protrude relative to the pixel definition layer 200 in a direction away from the substrate 100 .

[0078] In this embodiment, the height difference between the second isolation structure 500 and the pixel definition layer 200 can be used to isolate the organic layer in the light-emitting functional layer 600. Optionally, along a direction perpendicular to the plane where the substrate 100 is located, the distance between the side surface of the first isolation structure 300 away from the substrate 100 and the side surface of the pixel definition layer 200 away from the substrate 100 is a first distance d1, and the distance between the side surface of the second isolation structure 500 away from the substrate 100 and the side surface of the pixel definition layer 200 away from the substrate 100 is a second distance d2, and the first distance d1 is greater than the second distance d2.

[0079] It can be understood that in this embodiment, the height of the first isolation structure 300 is greater than that of the second isolation structure 500 to ensure that the second isolation structure 500 can isolate the organic layer in the light-emitting functional layer 600 without affecting the first electrode layer 400 crossing the second isolation structure 500 and overlapping with the first isolation structure 300.

[0080] See also Figure 3 In some optional embodiments, the second isolation structure 500 includes a first sublayer 510 and a second sublayer 520 stacked in a direction away from the substrate 100, and the orthographic projection of the first sublayer 510 on the substrate 100 is located within the orthographic projection of the second sublayer 520 on the substrate 100.

[0081] In these optional embodiments, the size of the first sublayer 510 may be smaller than the size of the second sublayer 520, so that a concave can be formed under the second sublayer 520. When the light-emitting material layer falls on the first isolation structure 300, the light-emitting material layer may be broken on the peripheral side of the second isolation structure 500, thereby isolating the organic layer in the light-emitting functional layer 600 and preventing the organic layer in the light-emitting functional layer 600 from overlapping with the first isolation structure 300.

[0082] Optionally, both the first sublayer 510 and the second sublayer 520 include inorganic materials, that is, the first sublayer 510 and the second sublayer 520 are insulated to avoid affecting signal transmission of the light-emitting functional layer 600 .

[0083] Optionally, the first sublayer 510 and the second sublayer 520 respectively include inorganic materials with different etching rates. Specifically, the etching rate of the material used for the first sublayer 510 is greater than the etching rate of the material used for the second sublayer 520, so that in the same etching environment, the amount of etching of the first sublayer 510 material is greater than the amount of etching of the second sublayer 520 material, thereby achieving the size of the first sublayer 510 being smaller than the size of the second sublayer 520, that is, the orthographic projection of the first sublayer 510 on the substrate 100 is within the orthographic projection of the second sublayer 520 on the substrate 100.

[0084] Optionally, the first sub-layer 510 includes a silicon nitride material, and the second sub-layer 520 includes a silicon oxide material.

[0085] Optionally, the thickness of the first sublayer 510 is greater than or equal to 10 nm and less than or equal to 800 nm, and the thickness of the second sublayer 520 is greater than or equal to 10 nm and less than or equal to 200 nm. For example, the thickness of the first sublayer 510 may be equal to any one of 10 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, and 800 nm. The thickness of the second sublayer 520 may be equal to any one of 10 nm, 50 nm, 100 nm, 150 nm, and 200 nm.

[0086] Optionally, the pixel defining portion 210 includes an inorganic material, and the inorganic material may include at least one of silicon nitride, silicon oxide, and silicon oxynitride.

[0087] In addition to the above-mentioned protruding structure, the second isolation structure 500 may also adopt other structural forms to achieve isolation of the organic layer of the light-emitting functional layer 600 .

[0088] See also Figure 6 as well as Figure 10 to Figure 11 In these optional embodiments, the second isolation structure 500 includes a partition groove C disposed on a surface of the pixel definition layer 200 away from the substrate 100; at least part of the organic layer extends into the partition groove C and is isolated by the partition groove C.

[0089] In this embodiment, a partition groove C can be formed on the surface of the side of the pixel definition layer 200 away from the substrate 100 by etching or other processes, so that the organic layer to be isolated extends into the partition groove C, and the depth of the partition groove C itself is used to limit the organic layer from being cut off or interrupted at the partition groove C, thereby avoiding electrical connection between the organic layer of the light-emitting functional layer 600 and the first isolation structure 300.

[0090] Optionally, in the direction away from the substrate 100, the cross-sectional area of ​​the partition groove C gradually decreases, so that the opening of the partition groove C on the side away from the substrate 100 can have a smaller size, so that the organic layer of the partial light-emitting functional layer 600 falling into the partition groove C can be easily disconnected from the partial organic layer outside the partition groove C, so as to cut off the electrical connection between the organic layers of the light-emitting functional layer 600 falling into the partition groove C, so that it is not easy to achieve electrical connection between adjacent light-emitting units F through the first isolation structure 300, which can better reduce the lateral leakage of the display panel.

[0091] See also Figure 10 to Figure 11Optionally, along the direction perpendicular to the plane where the substrate 100 is located, the cross-sectional shape of the partition groove C is trapezoidal, so as to further facilitate the disconnection between the partial organic layer in the partition groove C and the partial organic layer outside the partition groove C. Of course, the cross-sectional shape of the partition groove C can also adopt other shapes, and is not limited to the above embodiment.

[0092] Optionally, the orthographic projection of the partition groove C on the substrate 100 is arranged around the orthographic projection of the pixel opening 220 on the substrate 100, that is, the orthographic projection of the partition groove C on the substrate 100 is arranged in a ring shape, and the specific shape can match the orthographic projection shape of the pixel opening 220 on the substrate 100. For example, when the orthographic projection of the pixel opening 220 on the substrate 100 is circular, the orthographic projection of the partition groove C on the substrate 100 is in a circular ring shape, so as to ensure that the organic layer of the light-emitting functional layer 600 can be separated by the partition groove C in all directions.

[0093] In some optional embodiments, the display panel further includes a first encapsulation layer (not shown in the figures), and the first encapsulation layer is located on a side of the light-emitting functional layer 600 facing away from the substrate 100 .

[0094] It can be understood that the first encapsulation layer is used to encapsulate and protect the light-emitting functional layer 600. The material of the first encapsulation layer includes inorganic materials. The inorganic materials can specifically be silicon nitride, silicon oxide, silicon oxynitride and other materials, and can specifically be formed by CVD (Chemical Vapor Deposition) process.

[0095] Optionally, the encapsulation layer further includes a second encapsulation layer (not shown) located on the side of the first encapsulation layer away from the substrate 100, and the material of the second encapsulation layer includes an organic material. The organic material can be made of resin or polymer organic material, and can be formed by IJP (Inkjet printing) process.

[0096] Optionally, the encapsulation layer also includes a third encapsulation layer (not shown in the figure) located on the side of the second encapsulation layer away from the substrate 100, and the material of the third encapsulation layer includes an inorganic material. Continuing to add an inorganic encapsulation layer outside the organic encapsulation layer can further improve the encapsulation effect of the encapsulation layer; in this embodiment, the material of the third encapsulation layer can be the same as or different from the material of the first encapsulation layer, and there is no special limitation.

[0097] Optionally, the material of the first encapsulation layer is the same as the material of the third encapsulation layer, so that the first encapsulation layer and the third encapsulation layer can be prepared using the same equipment, which can simplify the preparation process of the display panel.

[0098] See also Figures 1 to 3The embodiment of the present invention further provides a display panel, comprising: a substrate 100; a pixel definition layer 200, disposed on one side of the substrate 100, comprising a pixel defining portion 210 and a pixel opening 220; a first isolation structure 300, disposed on one side of the substrate 100, and enclosing a plurality of isolation openings K, wherein the orthographic projection of the pixel opening 220 on the substrate 100 and the orthographic projection of the isolation opening K on the substrate 100 at least partially overlap; a light-emitting functional layer 600, comprising a light-emitting unit F at least partially located in each pixel opening 220, the light-emitting unit F comprising At least one organic layer; a second isolation structure 500, which is arranged on the side of the pixel definition layer 200 away from the substrate 100 and is located in the isolation opening K, the second isolation structure 500 encloses a plurality of isolation areas GA, at least one organic layer includes a first portion 610 and a second portion 620 that are intermittently arranged, the first portion 610 is located in the isolation area GA, and the second portion 620 is located between the first isolation structure 300 and the second isolation structure 500; a first electrode layer 400, which is partially arranged on the side of the light-emitting functional layer 600 away from the substrate 100.

[0099] The display panel provided by the embodiment of the present invention includes a substrate 100, a first isolation structure 300, a second isolation structure 500, a light-emitting functional layer 600, a pixel definition layer 200 and a first electrode layer 400. The first isolation structure 300 encloses an isolation opening K, so that the light-emitting unit F of the light-emitting functional layer 600 is located in the isolation opening K, thereby improving the problem of light interference between light-emitting units F of different colors. The pixel definition layer 200 includes a pixel defining portion 210 and a pixel opening 220 enclosed by the pixel defining portion 210. The light-emitting functional layer 600 is disposed on a side of the pixel definition layer 200 away from the substrate 100 and includes a plurality of light-emitting units F. At least part of the light-emitting units F can be located in the pixel opening 220. The pixel definition layer 200 can be used to divide the sub-pixels of the display panel.

[0100] The light-emitting unit F includes at least one organic layer. In order to avoid overlapping of the organic layer and the first isolation structure 300, the present embodiment sets a second isolation structure 500 between the first isolation structure 300 and the light-emitting unit F. The second isolation structure 500 encloses a plurality of isolation areas GA. The at least one organic layer includes a first part 610 and a second part 620 which are intermittently set. The first part 610 is located in the isolation area GA, and the second part 620 is located between the first isolation structure 300 and the second isolation structure 500. The organic layer is isolated by the second isolation structure 500 to prevent the organic layer from continuously extending to the first isolation structure 300, thereby avoiding lateral leakage caused by overlapping of the organic layer and the first isolation structure 300, affecting the display quality, making it less likely for the display panel to have the problem of light crosstalk, improving the display effect of the display panel, and improving the performance of the display panel. In addition, the first electrode layer 400 can also cross the second isolation structure 500 and be electrically connected to the first isolation structure 300 without being affected by the second isolation structure 500. The first electrode layer 400 can normally receive voltage signals to ensure the display effect of the display panel.

[0101] Optionally, along a first direction X, the second isolation structure 500 is disposed at least on two opposite sides of the light emitting unit F, and the first direction X is parallel to the direction of the plane where the substrate 100 is located.

[0102] In this embodiment, along the first direction X, the second isolation structure 500 may be only disposed on two opposite sides of the light emitting unit F, that is, the second isolation structure 500 includes two oppositely disposed parts to isolate the organic layers corresponding to the two sides of the light emitting unit F.

[0103] Alternatively, the setting range of the second isolation structure 500 can be further increased. For example, along the second direction Y, the second isolation structure 500 is provided on at least one side of the light-emitting unit F, the second direction Y is parallel to the direction of the plane where the substrate 100 is located, and the second direction Y intersects with the first direction X. It can be understood that the first direction X and the second direction Y can be vertically arranged, and can be specifically arranged according to the shape of the light-emitting unit. In this embodiment, the second isolation structure 500 provided on one side of the light-emitting unit F along the second direction Y can be connected to the second isolation structure 500 located on one side of the light-emitting unit F along the first direction X to form a half-enclosed overall structure, or can be unconnected and each can be independently arranged for easy preparation.

[0104] Optionally, the second isolation structure 500 is arranged around the light-emitting unit F, that is, the second isolation structure 500 is a closed ring structure, which completely surrounds the light-emitting unit F to isolate the organic layer from all directions to avoid lateral leakage caused by overlapping of the organic layer and the first isolation structure 300.

[0105] Optionally, the first electrode layer 400 extends from the pixel opening 220 toward the direction of the first isolation structure 300 to cross the second isolation structure 500 and is electrically connected to the first isolation structure 300 so that the first electrode layer 400 can receive a voltage signal through the first isolation structure 300, that is, the first isolation structure 300 includes a conductive material.

[0106] Optionally, at least a portion of the first electrode layer 400 extends continuously from the pixel opening 220 to the first isolation structure 300 and overlaps the first isolation structure 300 .

[0107] It should be noted that the first electrode layer 400 extends continuously, which means that the first electrode layer 400 will not be interrupted by the second isolation structure 500, and can cross the second isolation structure 500 to be electrically connected to the first isolation structure 300. The first electrode layer 400 can normally receive voltage signals to ensure the display effect of the display panel.

[0108] Optionally, there are multiple ways to set the substrate 100. The substrate 100 may include a substrate and a first conductive layer, a second conductive layer, and a third conductive layer that are arranged on one side of the substrate and are stacked. An insulating layer is provided between adjacent conductive layers. Exemplarily, the substrate 100 includes a pixel driving circuit. The pixel driving circuit includes a transistor and a storage capacitor. The transistor includes a channel region, a gate, a source and a drain. The storage capacitor includes a first plate and a second plate. As an example, the gate and the first plate may be located in the first conductive layer, the second plate may be located in the second conductive layer, and the source and the drain may be located in the third conductive layer. Optionally, the substrate 100 may also include a fourth conductive layer, the fourth conductive layer is located on the side of the third conductive layer facing away from the substrate, and the fourth conductive layer may be provided with a connecting signal line.

[0109] Optionally, the display panel further includes a second electrode layer 700, the second electrode layer 700 includes a plurality of second electrodes arranged at intervals, each second electrode being located on a side of each light-emitting unit F facing the substrate 100. The second electrode layer 700 and the first electrode layer 400 work together to drive the light-emitting unit F to emit light. One of the first electrode layer 400 and the second electrode layer 700 is an anode, and the other is a cathode. The embodiment of the present application is described by taking the first electrode layer 400 as a cathode and the second electrode layer 700 as an anode as an example.

[0110] The material of the first electrode layer 400 may include one of metal materials such as silver (Ag), aluminum (Al), lithium (Li), magnesium (Mg), ytterbium (Yb), calcium (Ca) or indium (In), and may also be an alloy of the aforementioned metal materials, such as magnesium-silver alloy (Mg / Ag) and lithium-aluminum alloy (Li / Al), but this embodiment does not impose any limitation on this.

[0111] The material of the second electrode layer 700 is generally a material with a high work function to improve the hole injection efficiency, and may include gold (Au), platinum (Pt), titanium (Ti), silver (Ag), indium tin oxide (ITO), zinc tin oxide (IZO) or a transparent conductive polymer (such as polyaniline), etc. For example, the second electrode layer 700 can be made of an ITO-Ag-ITO composite material, without special limitation.

[0112] Please refer to 8 . Optionally, along the direction away from the substrate 100 , the light-emitting functional layer 600 includes a stacked hole transport layer 601 , a light-emitting layer 602 , and an electron transport layer 603 ; the hole transport layer 601 is located in the partition area GA.

[0113] In this embodiment, the hole transport layer 601 located at the bottom of the light-emitting functional layer 600 is located in the isolation area GA and can be disconnected at the second isolation structure 500 to avoid overlapping with the first isolation structure 300. Of course, in order to improve the light extraction efficiency of the light-emitting functional layer 600 and improve the light extraction effect, the light-emitting functional layer 600 may also include other functional layers.

[0114] See also Fig. 9 For example, the light-emitting functional layer 600 also includes a hole injection layer 604 located on the side of the hole transport layer 601 facing the substrate 100, an auxiliary light-emitting layer 605 located between the hole transport layer 601 and the light-emitting layer 602, a hole blocking layer 606 located between the light-emitting layer 602 and the electron transport layer 603, and an electron injection layer 607 located on the side of the electron transport layer 603 away from the substrate 100. The specific selection can be made according to actual needs.

[0115] Optionally, at least the hole injection layer 604 is isolated by the second isolation structure 500 .

[0116] Optionally, the light-emitting layer 602 is separated by the second isolation structure 500. When only the hole transport layer 601, the light-emitting layer 602 and the electron transport layer 603 are provided, the hole transport layer 601 and the light-emitting layer 602 are both separated by the second isolation structure 500 and are both located in the isolation area GA. Part of the hole transport layer 601 material and the light-emitting layer 602 material are located between the first isolation structure 300 and the second isolation structure 500, but they do not have the function of emitting light or hole transport.

[0117] When a hole injection layer 604, an auxiliary light-emitting layer 605, a hole blocking layer 606, and an electron injection layer 607 are provided, the hole injection layer 604, the auxiliary light-emitting layer 605, the hole transport layer 601, and the light-emitting layer 602 are all isolated by the second isolation structure 500, that is, the hole injection layer 604, the auxiliary light-emitting layer 605, the hole transport layer 601, and the light-emitting layer 602 are located in the isolation area GA.

[0118] Optionally, the hole blocking layer 606 and the electron transport layer 603 are both isolated by the second isolation structure 500. Considering that the hole blocking layer 606 and the electron transport layer 603 are isolated by the second isolation structure 500, the film layer below the hole blocking layer 606 will also be isolated together, the hole injection layer 604, the auxiliary light-emitting layer 605, the hole transport layer 601, the light-emitting layer 602, the hole blocking layer 606, and the electron transport layer 603 are all isolated by the second isolation structure 500, that is, the hole injection layer 604, the auxiliary light-emitting layer 605602, the hole transport layer 601, the light-emitting layer 602, the hole blocking layer 606, and the electron transport layer 603 are located in the isolation area GA.

[0119] In some optional embodiments, the first isolation structure 300 includes a third sublayer 310 and a fourth sublayer 320 stacked in a direction away from the substrate 100 , and the orthographic projection of the third sublayer 310 on the substrate 100 is located within the orthographic projection of the fourth sublayer 320 on the substrate 100 .

[0120] In these optional embodiments, the size of the third sublayer 310 is smaller than that of the fourth sublayer 320, so that a recess can be formed under the fourth sublayer 320. When the light-emitting material layer falls on the first isolation structure 300, the light-emitting material layer can be broken at the peripheral side of the first isolation structure 300, thereby forming light-emitting units F located in each isolation opening K and independent of each other, which can simplify the preparation process of the light-emitting unit F.

[0121] Optionally, the material of the first isolation structure 300 includes a conductive material, a first electrode layer 400 is provided on the side of the light-emitting unit F facing away from the substrate 100, and the first electrode layer 400 and the first isolation structure 300 are electrically connected, so that the first electrode can be interconnected through the first isolation structure 300 to form a whole-surface electrode.

[0122] See also Figure 3 In some optional embodiments, the second isolation structure 500 is disposed to protrude relative to the pixel definition layer 200 in a direction away from the substrate 100 .

[0123] In this embodiment, the height difference between the second isolation structure 500 and the pixel definition layer 200 can be used to isolate the organic layer in the light-emitting functional layer 600. Optionally, along a direction perpendicular to the plane where the substrate 100 is located, the distance between the side surface of the first isolation structure 300 away from the substrate 100 and the side surface of the pixel definition layer 200 away from the substrate 100 is a first distance d1, and the distance between the side surface of the second isolation structure 500 away from the substrate 100 and the side surface of the pixel definition layer 200 away from the substrate 100 is a second distance d2, and the first distance d1 is greater than the second distance d2.

[0124] It can be understood that in this embodiment, the height of the first isolation structure 300 is greater than that of the second isolation structure 500 to ensure that the second isolation structure 500 can isolate the organic layer in the light-emitting functional layer 600 without affecting the first electrode layer 400 crossing the second isolation structure 500 and overlapping with the first isolation structure 300.

[0125] In some optional embodiments, the second isolation structure 500 includes a first sublayer 510 and a second sublayer 520 stacked in a direction away from the substrate 100, and the orthographic projection of the first sublayer 510 on the substrate 100 is located within the orthographic projection of the second sublayer 520 on the substrate 100;

[0126] In these optional embodiments, the size of the first sublayer 510 may be smaller than the size of the second sublayer 520, so that a concave can be formed under the second sublayer 520. When the light-emitting material layer falls on the first isolation structure 300, the light-emitting material layer may be broken on the peripheral side of the second isolation structure 500, thereby isolating the organic layer in the light-emitting functional layer 600 and preventing the organic layer in the light-emitting functional layer 600 from overlapping with the first isolation structure 300.

[0127] Optionally, both the first sublayer 510 and the second sublayer 520 include inorganic materials, that is, the first sublayer 510 and the second sublayer 520 are insulated to avoid affecting signal transmission of the light-emitting functional layer 600 .

[0128] Optionally, the first sublayer 510 and the second sublayer 520 respectively include inorganic materials with different etching rates. Specifically, the etching rate of the material used for the first sublayer 510 is greater than the etching rate of the material used for the second sublayer 520, so that in the same etching environment, the amount of etching of the first sublayer 510 material is greater than the amount of etching of the second sublayer 520 material, thereby achieving the size of the first sublayer 510 being smaller than the size of the second sublayer 520, that is, the orthographic projection of the first sublayer 510 on the substrate 100 is within the orthographic projection of the second sublayer 520 on the substrate 100.

[0129] Optionally, the first sub-layer 510 includes a silicon nitride material, and the second sub-layer 520 includes a silicon oxide material.

[0130] Optionally, the thickness of the first sublayer 510 is greater than or equal to 10 nm and less than or equal to 800 nm, and the thickness of the second sublayer 520 is greater than or equal to 10 nm and less than or equal to 200 nm. For example, the thickness of the first sublayer 510 may be equal to any one of 10 nm, 100 nm, 200 nm, 300 nm, 400 nm, 500 nm, 600 nm, 700 nm, and 800 nm. The thickness of the second sublayer 520 may be equal to any one of 10 nm, 50 nm, 100 nm, 150 nm, and 200 nm.

[0131] Optionally, the pixel defining portion 210 includes an inorganic material, and the inorganic material may include at least one of silicon nitride, silicon oxide, and silicon oxynitride.

[0132] In addition to the above-mentioned protruding structure, the second isolation structure 500 may also adopt other structural forms to achieve isolation of the organic layer of the light-emitting functional layer 600 .

[0133] See also Figure 6 as well as Figure 10 to Figure 11 In these optional embodiments, the second isolation structure 500 includes a partition groove C disposed on a surface of the pixel definition layer 200 away from the substrate 100; at least part of the organic layer extends into the partition groove C and is isolated by the partition groove C.

[0134] In this embodiment, a partition groove C can be formed on the surface of the side of the pixel definition layer 200 away from the substrate 100 by etching or other processes, so that the organic layer to be isolated extends into the partition groove C, and the depth of the partition groove C itself is used to limit the organic layer from being cut off or interrupted at the partition groove C, thereby avoiding electrical connection between the organic layer of the light-emitting functional layer 600 and the first isolation structure 300.

[0135] Optionally, in the direction away from the substrate 100, the cross-sectional area of ​​the partition groove C gradually decreases, so that the opening of the partition groove C on the side away from the substrate 100 can have a smaller size, so that the organic layer of the partial light-emitting functional layer 600 falling into the partition groove C can be easily disconnected from the partial organic layer outside the partition groove C, so as to cut off the electrical connection between the organic layers of the light-emitting functional layer 600 falling into the partition groove C, so that it is not easy to achieve electrical connection between adjacent light-emitting units F through the first isolation structure 300, which can better reduce the lateral leakage of the display panel 10.

[0136] Optionally, the organic layer includes a first portion 610 located in the pixel opening 220 and a second portion 620 located in the partition groove C, and the first portion 610 and the second portion 620 are spaced apart from each other.

[0137] Among them, the first part 610 located in the pixel opening 220 can emit light and display under the action of the first electrode and the second electrode, and the second part 620 separated from the first part 610 cannot receive current from the first part 610, so that adjacent light-emitting units F cannot be electrically connected, which can better reduce lateral leakage of the display panel.

[0138] An embodiment of the present application further provides a display device, which includes the display panel of any of the above embodiments.

[0139] Although the present application has been described with reference to preferred embodiments, various modifications may be made thereto and parts thereof may be replaced with equivalents without departing from the scope of the present application. In particular, the various technical features mentioned in the various embodiments may be combined in any manner as long as there are no structural conflicts. The present application is not limited to the specific embodiments disclosed herein, but includes all technical solutions falling within the scope of the claims.

Claims

1. A display panel, characterized in that: include: substrate; A pixel definition layer, disposed on one side of the substrate, comprising a pixel defining portion and a pixel opening; A first isolation structure is provided on one side of the substrate and encloses a plurality of isolation openings, wherein the orthographic projection of the pixel opening on the substrate and the orthographic projection of the isolation opening on the substrate at least partially overlap; A light-emitting functional layer, comprising a light-emitting unit at least partially located at each of the pixel openings, wherein the light-emitting unit comprises at least one organic layer; A second isolation structure is provided on a side of the pixel definition layer away from the substrate and is located in the isolation opening, the orthographic projection of the second isolation structure on the substrate at least partially surrounds the orthographic projection of the pixel opening on the substrate, and the second isolation structure isolates at least one layer of the organic layer; The first electrode layer is partially arranged on a side of the light-emitting functional layer away from the substrate.

2. The display panel according to claim 1, characterized in that: The second isolation structure is at least arranged on two opposite sides of the light emitting unit along a first direction, and the first direction is parallel to the direction of the plane where the substrate is located; Preferably, along a second direction, the second isolation structure is provided on at least one side of the light emitting unit, the second direction is parallel to the direction of the plane where the substrate is located, and the second direction intersects with the first direction; Preferably, the first direction is perpendicular to the second direction; Preferably, the second isolation structure is arranged around the light emitting unit.

3. The display panel according to claim 1, characterized in that: At least a portion of the first electrode layer is electrically connected to the first isolation structure; Preferably, at least a portion of the first electrode layer and the first isolation structure overlap; Preferably, at least a portion of the first electrode layer continuously extends from the pixel opening to the first isolation structure and overlaps with the first isolation structure.

4. The display panel according to claim 1, characterized in that: The second isolation structure is disposed protruding relative to the pixel definition layer in a direction away from the substrate; Along a direction perpendicular to the plane where the substrate is located, the distance between a side surface of the first isolation structure facing away from the substrate and a side surface of the pixel definition layer facing away from the substrate is a first distance, and the distance between a side surface of the second isolation structure facing away from the substrate and a side surface of the pixel definition layer facing away from the substrate is a second distance, and the first distance is greater than the second distance.

5. The display panel according to claim 1 or 4, characterized in that: The second isolation structure includes a first sublayer and a second sublayer stacked in a direction away from the substrate, wherein an orthographic projection of the first sublayer on the substrate is located within an orthographic projection of the second sublayer on the substrate; Preferably, the first sublayer and the second sublayer both comprise inorganic materials; Preferably, the first sub-layer and the second sub-layer respectively include inorganic materials with different etching rates; Preferably, the first sublayer comprises silicon nitride material, and the second sublayer comprises silicon oxide material; Preferably, the thickness of the first sublayer is greater than or equal to 10 nm and less than or equal to 800 nm, and the thickness of the second sublayer is greater than or equal to 10 nm and less than or equal to 200 nm; Preferably, the pixel defining portion comprises an inorganic material.

6. The display panel according to claim 1, characterized in that: Along the direction away from the substrate, the light-emitting functional layer includes a hole transport layer, a light-emitting layer, and an electron transport layer which are stacked; The hole transport layer is separated by the second isolation structure; Preferably, the light-emitting functional layer further comprises at least one of a hole injection layer located on the side of the hole transport layer facing the substrate, an auxiliary light-emitting layer located between the hole transport layer and the light-emitting layer, a hole blocking layer located between the light-emitting layer and the electron transport layer, and an electron injection layer located on the side of the electron transport layer facing away from the substrate; Preferably, at least the hole injection layer is separated by the second isolation structure; Preferably, the light-emitting layer is separated by the second isolation structure; Preferably, the hole blocking layer and the electron transport layer are both separated by the second isolation structure.

7. The display panel according to claim 1, characterized in that: The first isolation structure comprises a third sublayer and a fourth sublayer stacked in a direction away from the substrate, wherein an orthographic projection of the third sublayer on the substrate is located within an orthographic projection of the fourth sublayer on the substrate; Preferably, the third sublayer and the fourth sublayer both include conductive materials; Preferably, the first electrode layer and the third sublayer are electrically connected.

8. The display panel according to claim 1, characterized in that: The second isolation structure comprises a partition groove provided on a surface of the pixel definition layer away from the substrate; At least a portion of the organic layer extends into the partitioning groove and is partitioned by the partitioning groove.

9. The display panel according to claim 8, characterized in that: The cross-sectional area of ​​at least one cross section of the partition groove is larger than the cross-sectional area of ​​the surface of the partition groove away from the substrate; Preferably, in a direction away from the substrate, the cross-sectional area of ​​the partition groove gradually decreases; Preferably, along a direction perpendicular to the plane where the substrate is located, the cross-section of the partition groove is trapezoidal.

10. The display panel according to claim 8, characterized in that: The partition groove is arranged around the orthographic projection of the pixel opening on the substrate.

11. The display panel according to claim 1, characterized in that: It also includes a first encapsulation layer, which is located on a side of the light-emitting functional layer away from the substrate, and the material of the first encapsulation layer includes an inorganic material; Preferably, it further comprises a second encapsulation layer, wherein the second encapsulation layer is located on a side of the first encapsulation layer away from the substrate; Preferably, the material of the second encapsulation layer includes organic material; Preferably, it further comprises a third encapsulation layer, which is located on a side of the second encapsulation layer away from the substrate; Preferably, the material of the third encapsulation layer includes inorganic material; Preferably, the first encapsulation layer and the third encapsulation layer are made of the same material.

12. A display panel, characterized in that: include: substrate; A pixel definition layer, disposed on one side of the substrate, comprising a pixel defining portion and a pixel opening; A first isolation structure is provided on one side of the substrate and encloses a plurality of isolation openings, wherein the orthographic projection of the pixel opening on the substrate and the orthographic projection of the isolation opening on the substrate at least partially overlap; A light-emitting functional layer, comprising a light-emitting unit at least partially located at each of the pixel openings, wherein the light-emitting unit comprises at least one organic layer; A second isolation structure is provided on a side of the pixel definition layer away from the substrate and is located in the isolation opening, the second isolation structure encloses a plurality of isolation regions, at least one layer of the organic layer includes a first portion and a second portion that are intermittently arranged, the first portion is located in the isolation region, and the second portion is located between the first isolation structure and the second isolation structure; The first electrode layer is partially arranged on a side of the light-emitting functional layer away from the substrate.

13. The display panel according to claim 12, characterized in that: The second isolation structure is at least arranged on two opposite sides of the light emitting unit along a first direction, and the first direction is parallel to the direction of the plane where the substrate is located; Preferably, along a second direction, the second isolation structure is provided on at least one side of the light emitting unit, the second direction is parallel to the direction of the plane where the substrate is located, and the second direction intersects with the first direction; Preferably, the first direction is perpendicular to the second direction; Preferably, the second isolation structure is arranged around the light emitting unit.

14. The display panel according to claim 12, characterized in that: At least a portion of the first electrode layer is electrically connected to the first isolation structure; Preferably, at least a portion of the first electrode layer and the first isolation structure overlap; Preferably, at least a portion of the first electrode layer continuously extends from the pixel opening to the first isolation structure and overlaps with the first isolation structure.

15. The display panel according to claim 12, characterized in that: The second isolation structure is disposed protruding relative to the pixel definition layer in a direction away from the substrate; Along a direction perpendicular to the plane where the substrate is located, the distance between a side surface of the first isolation structure facing away from the substrate and a side surface of the pixel definition layer facing away from the substrate is a first distance, and the distance between a side surface of the second isolation structure facing away from the substrate and a side surface of the pixel definition layer facing away from the substrate is a second distance, and the first distance is greater than the second distance.

16. The display panel according to claim 12, characterized in that: The second isolation structure includes a first sublayer and a second sublayer stacked in a direction away from the substrate, wherein an orthographic projection of the first sublayer on the substrate is located within an orthographic projection of the second sublayer on the substrate; Preferably, the first sublayer and the second sublayer both comprise inorganic materials; Preferably, the first sub-layer and the second sub-layer respectively include inorganic materials with different etching rates; Preferably, the first sublayer comprises silicon nitride material, and the second sublayer comprises silicon oxide material; Preferably, the thickness of the first sublayer is greater than or equal to 10 nm and less than or equal to 800 nm, and the thickness of the second sublayer is greater than or equal to 10 nm and less than or equal to 200 nm; Preferably, the pixel defining portion comprises an inorganic material.

17. The display panel according to claim 12, characterized in that: Along the direction away from the substrate, the light-emitting functional layer includes a hole transport layer, a light-emitting layer, and an electron transport layer which are stacked; The hole transport layer is located in the partition area; Preferably, the light-emitting functional layer further comprises at least one of a hole injection layer located on the side of the hole transport layer facing the substrate, an auxiliary light-emitting layer located between the hole transport layer and the light-emitting layer, a hole blocking layer located between the light-emitting layer and the electron transport layer, and an electron injection layer located on the side of the electron transport layer facing away from the substrate; Preferably, at least the hole injection layer is separated by the second isolation structure; Preferably, the light-emitting layer is separated by the second isolation structure; Preferably, the hole blocking layer and the electron transport layer are separated by the second isolation structure.

18. The display panel according to claim 12, characterized in that: The first isolation structure comprises a third sublayer and a fourth sublayer stacked in a direction away from the substrate, wherein an orthographic projection of the third sublayer on the substrate is located within an orthographic projection of the fourth sublayer on the substrate; Preferably, the third sublayer and the fourth sublayer both include conductive materials; Preferably, the first electrode layer and the third sublayer are electrically connected.

19. The display panel according to claim 12, characterized in that: The second isolation structure comprises a partition groove provided on a surface of the pixel definition layer away from the substrate; At least a portion of the organic layer extends into the partition groove.

20. A display device, characterized in that: A display panel comprising any one of claims 1-19.

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