Cleaning base station

Abstract

The invention relates to a cleaning base station which comprises a base station body and a water supply assembly, the base station body comprises a containing cavity used for being in butt joint with a cleaning robot, the bottom of the containing cavity is provided with a cleaning tank and a wetting part located in the cleaning tank, and the wetting part is constructed to be used for making contact with a cleaning piece of the cleaning robot; the water supply assembly is configured to supply a cleaning solution to a water supply position on the edge of the wetting part; the wetting part comprises a first wetting area extending from the water supply position to the central area of the cleaning tank and second wetting areas located on the two opposite sides of the first wetting area. A buffer part is arranged in the first wetting area, and the buffer part is configured to be used for slowing down the flow speed of the cleaning solution in the first wetting area and is configured to distribute part of the cleaning solution in the first wetting area to the second wetting areas on the two opposite sides of the first wetting area. According to the cleaning base station, the cleaning solution can be fully distributed on the whole wetting part.

Description

Technical Field

[0001] The present disclosure relates to the field of cleaning machinery, and more precisely, particularly to a cleaning base station. Background Art

[0002] Environmental sanitation is an important factor affecting the quality of life. Therefore, as people's requirements for quality of life continue to increase, the corresponding requirements for environmental sanitation are also getting higher and higher. In order to save manpower, many robots with cleaning functions have appeared on the market, commonly used ones include sweeping robots, mopping robots or sweeping and mopping robots, etc.

[0003] In order to fully automate the cleaning process, existing cleaning robots with mopping functions are often used in conjunction with cleaning base stations, which can provide clean water to the cleaning robot, recycle sewage generated during the cleaning process, and clean the cleaning parts on the cleaning robot.

[0004] When cleaning the cleaning parts on a mopping robot or a sweeping and mopping robot, existing cleaning base stations are prone to incomplete wetting of the cleaning parts, which makes it difficult to clean the cleaning parts and easily leaves stains. In subsequent use, stains are also likely to remain on the work surface, affecting the user experience. Summary of the invention

[0005] In order to solve the problems existing in the prior art, the present disclosure provides a cleaning base station.

[0006] According to a first aspect of the present disclosure, there is provided a cleaning base station, comprising:

[0007] A base station body, the base station body comprising a receiving cavity for docking the cleaning robot, a cleaning groove and a wetting portion located in the cleaning groove are provided at the bottom of the receiving cavity, and the wetting portion is configured to contact with a cleaning member of the cleaning robot;

[0008] a water supply assembly configured to supply a cleaning solution to a water supply position at an edge of the wetting portion;

[0009] The wetting section includes a first wetting area extending from a water supply position to a central area of ​​the cleaning tank, and a second wetting area located on opposite sides of the first wetting area; a buffer section is arranged in the first wetting area, and the buffer section is configured to slow down the flow rate of the cleaning solution in the first wetting area, and is configured to divert part of the cleaning solution in the first wetting area to the second wetting areas on opposite sides thereof.

[0010] In one embodiment of the present disclosure, the buffer portion includes a plurality of first diverter ribs and a plurality of second diverter ribs respectively distributed along the extension direction of the first wetting area; the first diverter ribs and the second diverter ribs are arranged at an angle, and the openings surrounded by the first diverter ribs and the second diverter ribs face the edge of the wetting portion.

[0011] In one embodiment of the present disclosure, two adjacent first diverter ribs form a first flow channel; two adjacent second diverter ribs form a second flow channel; in the extension direction of the first wetting area, the first flow channel and the second flow channel are staggered.

[0012] In one embodiment of the present disclosure, the orthographic projections of the first diverter rib and the second diverter rib in the extension direction of the first wetting area do not overlap, or partially overlap.

[0013] In one embodiment of the present disclosure, the first diverter rib and the second diverter rib are configured to be in an arc shape.

[0014] In one embodiment of the present disclosure, a plurality of upwardly extending flanges are distributed on the surface of the second wetting area, and the cleaning solution diverted from the first wetting area is configured to flow between the flanges; the flanges are constructed to contact and cooperate with the cleaning member.

[0015] In one embodiment of the present disclosure, when the cleaning robot is located in the accommodating chamber, the contact area between the wetting portion and the cleaning member is at least greater than one quarter of the total area of ​​the cleaning member.

[0016] In one embodiment of the present disclosure, the end surface of the wetting portion is higher than the bottom of the cleaning tank; the cleaning tank is also provided with a drainage hole, and the dirt in the cleaning tank is configured to be discharged through the drainage hole.

[0017] In one embodiment of the present disclosure, in a direction extending from a water supply position to a central area of ​​the cleaning tank, an end surface of the wetting portion is configured to be gradually inclined downward.

[0018] In one embodiment of the present disclosure, a wiper portion extending upward is provided in the cleaning tank, and the wiper portion is configured to contact and cooperate with the cleaning member to scrape off dirt on the cleaning member.

[0019] In one embodiment of the present disclosure, the wiper portion is configured to extend from the edge of the cleaning tank to the central area of ​​the cleaning tank; at least two wiper portions are provided, and the at least two wiper portions are constructed to be spaced apart and distributed in the rotation direction of the cleaning member.

[0020] In one embodiment of the present disclosure, the wiping portion includes wiping ribs extending upward from the bottom of the cleaning groove, and the wiping ribs are constructed to form a wiping groove in the cleaning groove; the wiping ribs on opposite sides of the wiping groove are constructed to scrape off the dirt on the cleaning member in sequence during the rotation of the cleaning member.

[0021] In one embodiment of the present disclosure, a cleaning portion is provided between two adjacent wiper portions, and the cleaning portion is configured to extend from the edge of the cleaning tank to the central area of ​​the cleaning tank; a plurality of cleaning columns for contacting and cooperating with the cleaning member are distributed on the cleaning portion.

[0022] In one embodiment of the present disclosure, a top end surface of the washing column is lower than a top end surface of the wiper portion.

[0023] In one embodiment of the present disclosure, the base station body is constructed to form a mounting groove at the bottom of the accommodating cavity; the cleaning base station also includes a cleaning body and a accommodating body, the accommodating body is formed with a accommodating groove, and is constructed to be detachably arranged in the mounting groove, the cleaning body is formed with the cleaning groove, and is constructed to be detachably arranged in the accommodating groove, and the accommodating groove is connected to the cleaning groove through the drainage hole.

[0024] In one embodiment of the present disclosure, a filter element is provided in the receiving tank, and the filter element is constructed to divide the receiving tank into a sewage discharge area and a sewage receiving area. The receiving tank is provided with a sewage discharge port connected to the sewage discharge area, and the drainage hole is provided at a position of the cleaning tank corresponding to the sewage receiving area.

[0025] During the operation of the cleaning base station disclosed in the present invention, the water supply component can supply the cleaning solution to the water supply position at the edge of the wetting section; when the cleaning solution flows along the first wetting area, the buffer section can slow down the flow rate of the cleaning solution in the first wetting area, and the cleaning solution with the slowed flow rate surges upward, thereby wetting the cleaning member. In addition, part of the cleaning liquid surging between the buffer sections will be diverted to the second wetting areas on both sides of the opposite sides, so that the cleaning solution can cover the entire wetting section. In this way, when the cleaning member contacts the wetting area, the wetting area of ​​the cleaning member can be increased, and at the same time, the liquid covers the entire wetting section, which can improve the wetting effect on the cleaning member, thereby improving the self-cleaning effect of the cleaning robot on the cleaning member, so that the cleaning member can be cleaned, and stains are avoided from remaining on the cleaning member. In the subsequent work process of the cleaning robot, no stains will remain on the working surface, which effectively improves the user experience.

[0026] Other features and advantages of the present disclosure will become apparent from the following detailed description of exemplary embodiments of the present disclosure with reference to the accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The accompanying drawings, which are incorporated in and constitute a part of the specification, illustrate embodiments of the present disclosure and, together with the description, serve to explain the principles of the present disclosure.

[0028] Figure 1 is a front schematic diagram of a cleaning base station provided by an embodiment of the present disclosure;

[0029] Figure 2 is a partial three-dimensional schematic diagram of a cleaning base station provided by an embodiment of the present disclosure;

[0030] Figure 3 is a front schematic diagram of a cleaning body provided by an embodiment of the present disclosure;

[0031] Figure 4 is a partially exploded schematic diagram of a cleaning base station provided by an embodiment of the present disclosure;

[0032] Figure 5 is a partially exploded schematic diagram of a cleaning base station provided by an embodiment of the present disclosure;

[0033] Figure 6 is a partial cross-sectional schematic diagram of a cleaning base station provided by an embodiment of the present disclosure;

[0034] Figure 7 It is a schematic diagram of the back side of the cleaning body provided by the embodiment of the present disclosure.

[0035] Figures 1 to 7 The corresponding relationship between the component names and reference numerals is as follows:

[0036] 1. Base station body; 11. Base station base; 12. Probe shrapnel; 13. Mounting slot; 2. Accommodating chamber; 3. Cleaning slot; 31. Wetting part; 311. First wetting area; 312. Second wetting area; 32. Buffer part; 321. First diverter rib; 322. Second diverter rib; 323. First water flow channel; 324. Second water flow channel; 33. Water supply position; 34. Flange; 35. Drain hole; 36. Wiping part; 361. Wiping rib; 362. Wiping slot; 37. Cleaning part; 371. Cleaning column; 4. Cleaning body; 41. Magnetic part; 5. Accommodating slot; 51. Drain port; 52. Filter element; 53. Drain area; 54. Drain holding area; 55. Drain pipe; 6. Accommodating body; 61. Water full detection element; 611. Detection probe; 7. Climbing part. DETAILED DESCRIPTION

[0037] Various exemplary embodiments of the present disclosure will now be described in detail with reference to the accompanying drawings. It should be noted that the relative arrangement of components and steps, numerical expressions and numerical values ​​set forth in these embodiments do not limit the scope of the present disclosure unless otherwise specifically stated.

[0038] The following description of at least one exemplary embodiment is merely illustrative in nature and is in no way intended to limit the present disclosure, its application, or uses.

[0039] Technologies, methods, and equipment known to ordinary technicians in the relevant art may not be discussed in detail, but where appropriate, the technologies, methods, and equipment should be considered as part of the specification.

[0040] It should be noted that like reference numerals and letters refer to similar items in the following figures, and therefore, once an item is defined in one figure, it need not be further discussed in subsequent figures.

[0041] The specific embodiments of the present disclosure are described below in conjunction with the accompanying drawings.

[0042] In this document, “upper”, “lower”, “front”, “back”, “left”, “right”, etc. are only used to indicate the relative position relationship between related parts, rather than to limit the absolute positions of these related parts.

[0043] In this article, "first", "second", etc. are only used to distinguish each other, and do not indicate the importance and order, or the premise of each other's existence.

[0044] In this document, “equal”, “same”, etc. are not strictly limited in a mathematical and / or geometric sense, but also include errors that can be understood by those skilled in the art and are allowed in manufacturing or use.

[0045] Unless otherwise stated, the numerical ranges herein include not only the entire range within its two endpoints but also include several sub-ranges contained therein.

[0046] The present disclosure provides a cleaning base station, which is used to dock with cleaning robots such as mopping robots and sweeping and mopping robots, so as to clean the self-moving equipment. Specifically, the cleaning base station of the present disclosure can be used to clean the cleaning parts of the cleaning robot, and can also provide the cleaning robot with clean water required for cleaning working surfaces such as the ground, and discharge dirt in the cleaning robot.

[0047] The cleaning base station disclosed in the present invention comprises a base station body and a water supply assembly, wherein the base station body comprises a receiving cavity for docking a cleaning robot, the bottom of the receiving cavity is provided with a cleaning groove and a wetting part located in the cleaning groove, and the wetting part is configured to contact with a cleaning member of the cleaning robot.

[0048] Specifically, the accommodating chamber can completely accommodate the cleaning robot, or only accommodate part of the structure of the cleaning robot; the cleaning groove at the bottom of the accommodating chamber can allow the cleaning robot to self-clean the cleaning parts such as the rag plate, and the wetting part is used to contact the cleaning parts to wet the cleaning parts.

[0049] The water supply assembly is configured to supply a cleaning solution to a water supply position at the edge of the wetting portion, wherein the cleaning solution may be tap water or a cleaning solution containing a cleaning substance.

[0050] The wetting portion includes a first wetting area extending from a water supply position to a central area of ​​a cleaning tank, and a second wetting area located on opposite sides of the first wetting area; a buffer portion is arranged in the first wetting area, and the buffer portion is configured to slow down the flow rate of the cleaning solution in the first wetting area, and is configured to divert part of the cleaning solution in the first wetting area to the second wetting areas on opposite sides thereof.

[0051] In this way, during the operation of the cleaning base station disclosed in the present invention, the water supply component can supply the cleaning solution to the water supply position at the edge of the wetting section; when the cleaning solution flows along the first wetting area, the buffer section can slow down the flow rate of the cleaning solution in the first wetting area, and the cleaning solution with the slowed flow rate surges upward, thereby wetting the cleaning member. In addition, part of the cleaning liquid surging between the buffer sections will be diverted to the second wetting areas on both sides of the opposite sides, so that the cleaning solution can cover the entire wetting section. In this way, when the cleaning member contacts the wetting area, the wetting area of ​​the cleaning member can be increased, and at the same time, the liquid covers the entire wetting section, which can improve the wetting effect on the cleaning member, thereby improving the self-cleaning effect of the cleaning robot on the cleaning member, so that the cleaning member can be cleaned, and stains are avoided from remaining on the cleaning member. In the subsequent work process of the cleaning robot, no stains will remain on the working surface, which effectively improves the user experience.

[0052] During self-cleaning, the cleaning element of the cleaning robot will rotate in a predetermined direction, so that each area on the cleaning element will pass through the second wetting area, the first wetting area, and another second wetting area in sequence. When the cleaning element passes through the second wetting area, it can be initially wetted by the second wetting area. When entering the first wetting area, the cleaning element can be wetted again, and because the cleaning liquid surges upward under the action of the buffer part, the wetting effect on the cleaning element can be improved; when the cleaning element passes through another second wetting area, not only can the cleaning element be wetted again, but the cleaning liquid can also be evenly distributed on the cleaning element through rotational friction, ensuring the wetting effect on the cleaning element.

[0053] For ease of understanding, refer to Figures 1 to 7 , the specific structure and working principle of the cleaning base station disclosed in the present invention are explained in detail in combination with an embodiment.

[0054] like Figure 1As shown, the present disclosure provides a cleaning base station, which is used to dock with cleaning robots such as mopping robots and sweeping and mopping robots, so as to clean the self-moving equipment. Specifically, the cleaning base station of the present disclosure can be used to clean the cleaning parts of the cleaning robot, and can also provide the cleaning robot with clean water required for cleaning working surfaces such as the floor, and discharge dirt in the cleaning robot.

[0055] The cleaning base station disclosed in the present invention comprises a base station body 1 and a water supply assembly. The base station body 1 comprises a receiving cavity 2 for docking a cleaning robot. Figure 1 and Figure 2 As shown, the bottom of the accommodating chamber 2 is provided with a cleaning tank 3 and a wetting portion 31 located in the cleaning tank 3, and the wetting portion 31 is configured to contact with the cleaning parts of the cleaning robot. Specifically, the accommodating chamber 2 can completely accommodate the cleaning robot, or only accommodate part of the structure of the cleaning robot; the cleaning tank 3 at the bottom of the accommodating chamber 2 can be used by the cleaning robot to self-clean cleaning parts such as rags and trays, and the wetting portion 31 is used to contact with the cleaning parts to wet the cleaning parts. The base station body 1 can be composed of the base station base 11 and other structures located on the base station base 11 to form the accommodating chamber 2.

[0056] Among them, Figure 2 As shown, a climbing member 7 can be provided on one side of the accommodating chamber 2 of the cleaning base station, and the climbing member 7 has a certain slope, so that the cleaning robot can enter the accommodating chamber 2 along the climbing member 7. In one embodiment of the present disclosure, the climbing member 7 can be installed on the base station base 11 through a snap-on structure, and in another embodiment of the present disclosure, the climbing member 7 can also be an integrated structure with the base station base 11.

[0057] The water supply assembly is configured to supply a cleaning solution to a water supply position 33 at the edge of the wetting portion 31 , wherein the cleaning solution may be tap water or a cleaning solution containing a cleaning substance.

[0058] Among them, Figure 3 As shown, the wetting portion 31 includes a first wetting area 311 extending from the water supply position 33 to the central area of ​​the cleaning tank 3, and a second wetting area 312 located on two opposite sides of the first wetting area 311; a buffer portion 32 is arranged in the first wetting area 311, and the buffer portion 32 is constructed to slow down the flow rate of the cleaning solution in the first wetting area 311, and is constructed to divert part of the cleaning solution in the first wetting area 311 to the second wetting areas 312 on two opposite sides thereof.

[0059] It is understandable that the cleaning robot may be provided with more than one cleaning member, and correspondingly, more than one wetting area may be provided in the cleaning tank 3, and each wetting area corresponds to a cleaning member to wet the corresponding cleaning tank 3 respectively. Figure 3As shown, in one embodiment of the present disclosure, two cleaning members are arranged side by side on the front side of the cleaning robot, and correspondingly, the cleaning tank 3 is also divided into two parts, each of which is provided with a wetting portion 31, and each wetting portion 31 is provided with a corresponding water supply position 33 to wet the corresponding cleaning member. The first wetting area 311 extends from the water supply position 33 to the central area of ​​the cleaning tank 3, which means that the first wetting area 311 extends from the water supply position 33 in the wetting portion 31 to the central area of ​​the cleaning tank 3 where the wetting portion 31 is located.

[0060] In this way, during the operation of the cleaning base station disclosed in the present invention, the water supply component can supply the cleaning solution to the water supply position 33 at the edge of the wetting section 31; when the cleaning solution flows along the first wetting area 311, the buffer section 32 can slow down the flow rate of the cleaning solution in the first wetting area 311, and the cleaning solution with the slowed flow rate surges upward, thereby wetting the cleaning member. In addition, part of the cleaning liquid surging between the buffer sections 32 will be diverted to the second wetting areas 312 on both sides thereof at the same time, so that the cleaning solution can cover the entire wetting section 31. In this way, when the cleaning member contacts the wetting area, the wetting area of ​​the cleaning member can be increased, and at the same time, the liquid covers the entire wetting section 31, which can improve the wetting effect on the cleaning member, thereby improving the self-cleaning effect of the cleaning robot on the cleaning member, so that the cleaning member can be cleaned, and stains are avoided from remaining on the cleaning member. In the subsequent work process of the cleaning robot, no stains will remain on the working surface, which effectively improves the user experience.

[0061] During self-cleaning, the cleaning element of the cleaning robot will rotate in a predetermined direction, so that each area on the cleaning element will sequentially pass through the second wetting area 312, the first wetting area 311, and another second wetting area 312. When the cleaning element passes through the second wetting area 312, it can be preliminarily wetted by the second wetting area 312, and when it enters the first wetting area 311, it can be wetted again, and because the cleaning liquid surges upward under the action of the buffer part 32, the wetting effect on the cleaning element can be improved; when the cleaning element passes through another second wetting area 312, it can not only be wetted again, but also the cleaning liquid can be evenly distributed on the cleaning element through rotational friction, thereby ensuring the wetting effect on the cleaning element.

[0062] In one embodiment of the present disclosure, the buffer portion 32 includes a plurality of first diverter ribs 321 and a plurality of second diverter ribs 322 that are spaced apart along the extension direction of the first wetting area 311; the first diverter ribs 321 and the second diverter ribs 322 are arranged at an angle, and the opening surrounded by the first diverter ribs 321 and the second diverter ribs 322 faces the edge of the wetting portion 31.

[0063] Among them, the first diverter rib 321 and the second diverter rib 322 can both block the movement of the cleaning solution. Through the multiple first diverter ribs 321 and multiple second diverter ribs 322 spaced apart in the extension direction of the first wetting area 311, the cleaning solution will collide with each first diverter rib 321 and second diverter rib 322 in turn during the movement along the extension direction of the first wetting area 311, thereby reducing the flow rate of the cleaning solution. Moreover, the opening surrounded by the first diverter rib and the second diverter rib 322 faces the edge of the wetting portion 31, so that the cleaning solution can move toward the edge of the wetting portion 31 after colliding with each first diverter rib 321 and second diverter rib 322, thereby flowing to the second wetting area 312 located on the opposite sides of the first wetting area 311, so that the cleaning solution can cover the entire wetting portion 31 as much as possible.

[0064] Further, such as Figure 3 As shown, in one embodiment of the present disclosure, two adjacent first diverter ribs 321 form a first water flow channel 323; two adjacent second diverter ribs 322 form a second water flow channel 324; in the extension direction of the first wetting area 311, the first water flow channel 323 and the second water flow channel 324 are staggered. That is, in the extension direction of the first wetting area 311, multiple first flow grooves 323 and second flow grooves 324 are staggered with each other, so that when the cleaning solution collides with the first diverter rib 321 during the movement along the extension direction of the first wetting area 311, a small amount of water will flow out from the first flow groove 323 on one side of the first diverter rib 321, and most of it will flow to the next second diverter rib 322; after the cleaning solution collides with the second diverter rib 322, a small amount of water will flow out from the second flow groove 324 on one side of the second diverter rib 322, and most of it will flow to the next first diverter rib 321. In this way, after the cleaning solution collides with each of the first diverter ribs 321 and the second diverter rib 322 in turn, part of the cleaning solution will flow from the first flow groove 323 and the second flow groove 324 to the second wetting areas 312 on both sides in turn, so that the cleaning solution can gradually cover the entire wetting part 31.

[0065] Among them, Figure 3 As shown, in one embodiment of the present disclosure, the orthographic projections of the first diverter rib 321 and the second diverter rib 322 in the extending direction of the first wetting area 311 do not overlap. Since the orthographic projections of the first diverter rib 321 and the second diverter rib 322 in the extending direction of the first wetting area 311 do not overlap, it can be ensured that when the cleaning solution collides with any diverter rib, a larger portion of the cleaning solution can flow to the next diverter rib, thereby ensuring that the cleaning solution can flow to the central area of ​​the cleaning tank 3 to wet the central area of ​​the cleaning member.

[0066] In another embodiment of the present disclosure, the orthographic projections of the first diverter rib 321 and the second diverter rib 322 in the extension direction of the first wetting area 311 partially overlap. Since the orthographic projections of the first diverter rib 321 and the second diverter rib 322 in the extension direction of the first wetting area 311 partially overlap. It can be ensured that when the cleaning solution collides with any diverter rib, more cleaning solution can flow out from the side water trough, thereby ensuring that the cleaning solution can cover the entire wetting portion 31. Specifically, the distribution shape of the first diverter rib 321 and the second diverter rib 322 can be determined according to the flow rate and flow conditions of the cleaning solution, and is not limited here.

[0067] Furthermore, in one embodiment of the present disclosure, the first diverter rib 321 and the second diverter rib 322 are configured to be arc-shaped. Since the first diverter rib 321 and the second diverter rib 322 are arc-shaped, compared with other shapes, the effect of slowing down the flow rate of the cleaning solution in the first wetting area 311 is better.

[0068] In order to perform self-cleaning on the cleaning piece, in one embodiment of the present disclosure, a plurality of upwardly extending flanges 34 are distributed on the surface of the second wetting area 312, and the cleaning solution diverted from the first wetting area 311 is configured to flow between the flanges 34; the flanges 34 are constructed to be in contact with and cooperate with the cleaning piece.

[0069] It is understandable that during the self-cleaning process of the cleaning member, the cleaning robot will continuously control the cleaning member to rotate in the cleaning tank. Since a plurality of flanges 34 extending upward are distributed on the surface of the second wetting area 312, the cleaning robot continuously controls the cleaning member to rotate in the cleaning tank. After the cleaning member is wetted in the wetting area, it will rub and collide with the flanges 34 on the surface of the second wetting area 312. In this way, the stains on the cleaning member will continuously detach from the cleaning member and enter the cleaning solution, thereby achieving the purpose of cleaning the cleaning member.

[0070] In order to prevent the cleaning member from throwing dirt out of the cleaning tank 3 during the rotation of the cleaning member, Figure 3 As shown, in one embodiment of the present disclosure, the cleaning tank 3 is configured to adapt to the contour of the cleaning member of the cleaning robot. Specifically, the distance 2 between the cleaning tank 3 and the cleaning member can be set to 5 to 30 mm, so that the normal rotation of the cleaning tank 3 is not affected, and the cleaning member can be prevented from throwing dirt out of the cleaning tank 3.

[0071] In order to improve the wetting effect of the wetting area, in one embodiment of the present disclosure, when the cleaning robot is located in the accommodating chamber 2, the contact area between the wetting portion 31 and the cleaning member is at least greater than one-fourth of the total area of ​​the cleaning member. Since the contact area between the wetting portion 31 and the cleaning member is at least greater than one-fourth of the total area of ​​the cleaning member, it can be ensured that the cleaning member can be completely wetted, thereby ensuring that the cleaning member can be completely cleaned, and avoiding residual stains on the cleaning member.

[0072] As the cleaning parts are continuously cleaned, sewage will be generated in the cleaning tank 3. In order to discharge the sewage in the cleaning tank 3 in time and avoid the sewage in the cleaning tank 3 from overflowing, in one embodiment of the present disclosure, the end surface of the wetting part 31 is higher than the bottom of the cleaning tank 3; the cleaning tank 3 is also provided with a drainage hole 35, and the dirt in the cleaning tank 3 is configured to be discharged through the drainage hole 35. In this way, during the cleaning of the cleaning parts, when the stains on the cleaning parts will continuously separate from the cleaning parts and enter the cleaning solution, under the action of gravity, the dirt on the cleaning parts will fall into the cleaning tank 3 and then be discharged through the drainage hole 35. Among them, since the end surface of the wetting part 31 is higher than the bottom of the cleaning tank 3, the wetting part 31 can be separated from the bottom of the cleaning tank 3, so as to avoid the dirt at the bottom of the cleaning tank 3 from contaminating the clean cleaning solution on the wetting part 31.

[0073] It is understandable that a sewage suction component may be provided on the base station body 1, and the sewage suction component is used to suck the dirt discharged from the drainage hole 35 into a sewage bucket on the base station body 1, or directly suck it out to the outside.

[0074] Specifically, in one embodiment of the present disclosure, the cleaning member is arranged on the cleaning robot through the mounting portion; when the cleaning robot is located in the accommodating chamber 2, the distance between the bottom surface of the wetting portion 31 and the mounting portion is less than the thickness of the cleaning member, and the distance between the bottom of the cleaning tank 3 and the mounting portion is greater than the thickness of the cleaning member. In this way, the cleaning member located above the wetting portion 31 can be in a compressed state, thereby ensuring that the cleaning member can be in close contact with the wetting portion 31 and be fully wetted; the cleaning member located above the bottom of the cleaning tank 3 can be in a relaxed state, thereby ensuring that the dirt and grime on the cleaning member can continuously fall into the cleaning tank 3 under the action of gravity, and then be discharged through the drainage hole 35.

[0075] Further, in one embodiment of the present disclosure, in the extension direction from the water supply position 33 to the central area of ​​the cleaning tank 3, the end surface of the wetting portion 31 is constructed to be gradually inclined downward. In the extension direction of the first wetting area 311, the end surface of the wetting portion 31 is constructed to be gradually inclined downward, so that under the action of gravity, the cleaning solution can flow along the first wetting area 311, thereby ensuring that the entire first wetting area 311 can be soaked, and under the action of the buffer portion 32, part of the cleaning solution in the first wetting area 311 will be diverted to the second wetting areas 312 on the opposite sides thereof, so that the cleaning solution can cover the entire wetting portion 31.

[0076] Furthermore, in order to remove the dirt on the cleaning member, in one embodiment of the present disclosure, an upwardly extending wiper 36 is provided in the cleaning tank 3, and the wiper 36 is configured to contact and cooperate with the cleaning member to scrape off the dirt on the cleaning member. In this way, in the process of cleaning the cleaning member, when the cleaning member and the wiper 36 are in friction contact with each other, the wiper 36 can scrape off the dirt on the cleaning member by squeezing the cleaning member, and the dirt falls into the cleaning tank 3 and is discharged through the drainage hole 35; and after the dirt on the cleaning member is scraped off, the amount of cleaning solution contained in this part of the cleaning member will be reduced; when this part of the cleaning member reaches the wetting portion 31, it will be wetted again by the cleaning solution on the wetting area, and rub and collide with the flange 34 on the second wetting area 312, and the stains on the cleaning member will be separated from the cleaning member and enter the cleaning solution to form dirt, and then under the action of the wiper 36, the dirt on the cleaning member will be scraped off and fall into the cleaning tank 3 and be discharged through the drainage hole 35. Like this, cycle back and forth, the stain on the cleaning piece can be removed continuously, and the cleaning piece can become cleaner and cleaner.

[0077] In one embodiment of the present disclosure, the wiper portion 36 is configured to extend from the edge of the cleaning tank 3 to the central area of ​​the cleaning tank 3; at least two wiper portions 36 are provided, and at least two wiper portions 36 are constructed to be spaced apart and distributed in the rotation direction of the cleaning member.

[0078] Since the wiper portion 36 extends from the edge of the cleaning tank 3 to the central area of ​​the cleaning tank 3, it can be ensured that the working range of the wiper portion 36 can cover the entire cleaning member, avoiding dirt remaining in a part of the cleaning member. Since at least two wiper portions 36 are provided, and at least two wiper portions 36 are spaced apart in the rotation direction of the cleaning member, each wiper portion 36 can scrape off dirt in different areas of the cleaning member at the same time, thereby improving the working efficiency of the wiper portion 36. Further, if Figure 3 As shown, in one embodiment of the present disclosure, the interval angles of the wiper portions 36 are the same, which can ensure that the friction force of the wiper portions 36 on the cleaning member is relatively uniform, thereby avoiding large vibrations when the cleaning member rotates.

[0079] Specifically, in one embodiment of the present disclosure, the wiper portion 36 includes a wiper rib 361 extending upward from the bottom of the cleaning tank 3, and the wiper rib 361 is constructed to enclose a wiper tank 362 in the cleaning tank 3; the wiper ribs 361 on opposite sides of the wiper tank 362 are constructed to sequentially scrape off dirt on the cleaning member during the rotation of the cleaning member. Since both wiper ribs 361 are provided in the wiper tank 362, the two wiper ribs 361 can scrape off dirt on the cleaning member at the same time, thereby effectively improving the working efficiency of the wiper portion 36. Moreover, if Figure 3 As shown, a drainage hole 35 is also provided in the wiper groove 362 , so that water that can fall into the wiper groove 362 can be discharged from the drainage hole 35 .

[0080] It is understandable that, in order to ensure the wiping effect, in one embodiment of the present disclosure, the top end surface of the cleaning column 371 is lower than the top end surface of the wiping portion 36. That is, the top end surface of the wiping portion 36 is higher than other structures in the cleaning tank 3, so that the cleaning member can be pressed by the wiping portion 36, effectively improving the friction between the cleaning member and the wiping portion 36, so that the dirt on the cleaning member can be removed more cleanly.

[0081] In order to further improve the cleaning effect, in one embodiment of the present disclosure, a cleaning portion 37 is provided between two adjacent wiper portions 36, and the cleaning portion 37 is configured to extend from the edge of the cleaning tank 3 to the central area of ​​the cleaning tank 3; a plurality of cleaning columns 371 for contacting and cooperating with the cleaning member are distributed on the cleaning portion 37.

[0082] Since the cleaning part 37 is provided with a plurality of cleaning columns 371 for contacting and cooperating with the cleaning member, during the self-cleaning process of the cleaning member, the cleaning member will also rub and collide with the cleaning part 37 on the cleaning part 37 during the process of rotating in the cleaning tank, and the stains on the cleaning member will continuously detach from the cleaning member and enter the cleaning solution, thereby achieving the purpose of cleaning the cleaning member. Since the cleaning part 37 extends from the edge of the cleaning tank 3 to the central area of ​​the cleaning tank 3, the cleaning part 37 can clean all radial locations of the cleaning member, avoiding missing areas on the cleaning station. Moreover, since the cleaning part 37 is arranged between adjacent wiper parts 36, it will not occupy the setting space of the wiper parts 36, so that the interval angles of each wiper part 36 are the same.

[0083] It is understandable that during the cleaning process, the stains on the cleaning parts will be continuously washed off, and the cleaning parts may also carry some solid waste, such as food residues, etc. These wastes may not be discharged to the outside through the cleaning base stations, and may remain in the cleaning base stations.

[0084] Therefore, in order to facilitate users to clean up the garbage that can remain in the cleaning base station, such as Figure 4 and Figure 5As shown, in one embodiment of the present disclosure, the base station body 1 is constructed to form a mounting groove 13 at the bottom of the accommodating cavity 2; the cleaning base station also includes a cleaning body 4 and a accommodating body 6, the accommodating body 6 is formed with an accommodating groove 5, and is constructed to be detachably arranged in the mounting groove 13, the cleaning body 4 is formed with a cleaning groove 3, and is constructed to be detachably arranged in the accommodating groove 5, and the accommodating groove 5 is connected to the cleaning groove 3 through a drainage hole 35.

[0085] It is understandable that a sewage outlet 51 may be provided in the receiving tank 5, and the sewage suction assembly is connected to the sewage outlet 51. In this way, after the dirt flows into the receiving tank 5 from the drainage hole 35, the sewage suction assembly can suck the dirt into the sewage outlet 51, thereby discharging the sewage in the receiving tank 5.

[0086] like Figure 6 As shown, in order to enable the sewage suction assembly to suck out all the sewage in the receiving tank 5, in one embodiment of the present disclosure, the sewage outlet 51 is constructed to be lower than the bottom of the receiving tank 5. Since the sewage outlet 51 is lower than the bottom of the receiving tank 5, all the sewage in the receiving tank 5 can flow into the outlet, avoiding residual sewage in the receiving tank 5.

[0087] Since the drain hole 35 and the sewage outlet 51 are both limited in size, solid waste of larger size will remain in the cleaning tank 3 and the receiving tank 5. In this way, when cleaning the waste in the cleaning tank 3 and the receiving tank 5, the user can directly take out the cleaning body 4 and the receiving body 6 from the installation tank 13, separate the cleaning body 4 and the receiving body 6, and clean the cleaning body 4 and the receiving body 6 respectively, so that the waste in the cleaning tank 3 and the receiving tank 5 can be cleaned up. The operation is simple and convenient, which effectively improves the user's experience.

[0088] Furthermore, in order to prevent solid waste from entering the sewage suction component, Figure 7 As shown, in one embodiment of the present disclosure, a filter element 52 is provided in the receiving tank 5, and the filter element 52 is constructed to divide the receiving tank 5 into a sewage discharge area 53 and a sewage receiving area 54. A sewage outlet 51 connected to the sewage discharge area 53 is provided on the receiving tank 5, and a drainage hole 35 is provided at a position of the cleaning tank 3 corresponding to the sewage receiving area 54. By providing the filter element 52, larger garbage can be intercepted in the sewage receiving area 54, preventing solid garbage from entering the sewage outlet 51 of the sewage discharge area 53 and causing blockage in the pipeline of the sewage suction component, thereby ensuring that the sewage suction component can work normally. Among them, the sewage outlet 51 is connected to the sewage suction component through a sewage pipe 55. As shown in FIG. Figure 7 As shown, in one embodiment of the present disclosure, the filter element 52 can be disposed on the cleaning body 4, and in another embodiment of the present disclosure, the filter element 52 can also be disposed on the containing body 6. Figure 7As shown, in one embodiment of the present disclosure, the filter hole is a strip hole extending in the height direction. When the filter hole is a strip hole extending in the height direction, it can ensure that the area of ​​the filter hole is large, avoid the filter hole blocking the normal flow of sewage, and effectively intercept solid waste in the sewage holding area 54.

[0089] Among them, Figure 4 and Figure 5 As shown, in one embodiment of the present disclosure, a water full detection element 61 is provided in the receiving tank 5, and the water full detection element 61 is configured to be triggered when the water level in the receiving tank 5 is higher than the set water level. By providing the water full detection element 61, when the water level in the receiving tank 5 is high, the sewage suction component can be opened or the water supply component can be closed in time to prevent the dirt in the receiving tank 5 from flowing out of the receiving tank 5. Specifically, in one embodiment of the present disclosure, the water full detection element 61 may include two detection probes 611 respectively provided on both sides of the receiving tank 5, and the water full detection element 61 is configured to be triggered when the two detection probes 611 are connected by the water in the receiving tank 5. Figure 4 and Figure 5 As shown, one end of the water full detection element 61 is arranged on the inner side, and the other end is arranged on the outer side of the receiving groove 5, and is used to conduct with the probe spring 12 on the base station base 11, and the probe spring 12 is connected with the detection circuit on the base station body 1. In this way, when the two detection probes 611 are conducted by the water in the receiving groove 5, the detection circuit can be conducted.

[0090] like Figure 7 As shown, in one embodiment of the present disclosure, a magnetic member 41 is provided on the cleaning body 4, and a Hall sensor is provided on the base station body 1, and the Hall sensor is configured to be triggered when the cleaning body 4 is installed in place. By providing the magnetic member 41 and the Hall sensor, the cleaning base station of the present disclosure can control the water supply component to supply water only when the cleaning body 4 is installed in place, thereby preventing the water supply component from mistakenly supplying water when the cleaning body 4 is not installed, causing water to enter the base station body 1.

[0091] Application Scenario

[0092] The present disclosure provides a cleaning base station, which is used to dock with cleaning robots such as mopping robots and sweeping and mopping robots, so as to clean the self-moving equipment. Specifically, the cleaning base station of the present disclosure can be used to clean the cleaning parts of the cleaning robot, and can also provide the cleaning robot with clean water required for cleaning working surfaces such as the ground, and discharge dirt in the cleaning robot.

[0093] The cleaning base station disclosed in the present invention comprises a base station body 1 and a water supply assembly. The base station body 1 comprises a receiving cavity 2 for docking a cleaning robot, a cleaning tank 3 and a wetting portion 31 located in the cleaning tank 3 are arranged at the bottom of the receiving cavity 2, and the wetting portion 31 is configured to contact with a cleaning member of the cleaning robot.

[0094] Specifically, the accommodating chamber 2 can completely accommodate the cleaning robot, or only accommodate part of the structure of the cleaning robot; the cleaning tank 3 at the bottom of the accommodating chamber 2 can allow the cleaning robot to self-clean cleaning items such as rags and plates, and the wetting portion 31 is used to contact the cleaning items to wet the cleaning items.

[0095] The water supply assembly is configured to supply a cleaning solution to a water supply position 33 at the edge of the wetting portion 31 , wherein the cleaning solution may be tap water or a cleaning solution containing a cleaning substance.

[0096] Among them, the wetting portion 31 includes a first wetting area 311 extending from the water supply position 33 to the central area of ​​the cleaning tank 3, and a second wetting area 312 located on the opposite sides of the first wetting area 311; a buffer portion 32 is arranged in the first wetting area 311, and the buffer portion 32 is constructed to slow down the flow rate of the cleaning solution in the first wetting area 311, and is constructed to divert part of the cleaning solution in the first wetting area 311 to the second wetting areas 312 on its opposite sides.

[0097] In this way, during the operation of the cleaning base station disclosed in the present invention, the water supply component can supply the cleaning solution to the water supply position 33 at the edge of the wetting section 31; when the cleaning solution flows along the first wetting area 311, the buffer section 32 can slow down the flow rate of the cleaning solution in the first wetting area 311, and the cleaning solution with the slowed flow rate surges upward, thereby wetting the cleaning member. In addition, part of the cleaning liquid surging between the buffer sections 32 will be diverted to the second wetting areas 312 on both sides thereof at the same time, so that the cleaning solution can cover the entire wetting section 31. In this way, when the cleaning member contacts the wetting area, the wetting area of ​​the cleaning member can be increased, and at the same time, the liquid covers the entire wetting section 31, which can improve the wetting effect on the cleaning member, thereby improving the self-cleaning effect of the cleaning robot on the cleaning member, so that the cleaning member can be cleaned, and stains are avoided from remaining on the cleaning member. In the subsequent work process of the cleaning robot, no stains will remain on the working surface, which effectively improves the user experience.

[0098] During self-cleaning, the cleaning element of the cleaning robot will rotate in a predetermined direction, so that each area on the cleaning element will sequentially pass through the second wetting area 312, the first wetting area 311, and another second wetting area 312. When the cleaning element passes through the second wetting area 312, it can be preliminarily wetted by the second wetting area 312, and when it enters the first wetting area 311, it can be wetted again, and because the cleaning liquid surges upward under the action of the buffer part 32, the wetting effect on the cleaning element can be improved; when the cleaning element passes through another second wetting area 312, it can not only be wetted again, but also the cleaning liquid can be evenly distributed on the cleaning element through rotational friction, thereby ensuring the wetting effect on the cleaning element.

[0099] The embodiments of the present disclosure have been described above, and the above description is exemplary, not exhaustive, and is not limited to the disclosed embodiments. Many modifications and changes will be apparent to those of ordinary skill in the art without departing from the scope and spirit of the described embodiments. The choice of terms used herein is intended to best explain the principles of the embodiments, practical applications, or technical improvements in the marketplace, or to enable other persons of ordinary skill in the art to understand the embodiments disclosed herein. The scope of the present disclosure is defined by the appended claims.

Claims

1. A cleaning base station, characterized in that: include: A base station body (1), the base station body (1) comprising a receiving cavity (2) for docking a cleaning robot, a cleaning groove (3) and a wetting portion (31) located in the cleaning groove (3) being arranged at the bottom of the receiving cavity (2), the wetting portion (31) being configured to contact a cleaning member of the cleaning robot; a water supply assembly, the water supply assembly being configured to supply a cleaning solution to a water supply position (33) at an edge of the wetting portion (31); The wetting portion (31) comprises a first wetting area (311) extending from a water supply position (33) to a central area of ​​the cleaning tank (3), and second wetting areas (312) located on two opposite sides of the first wetting area (311); a buffer portion (32) is provided in the first wetting area (311), and the buffer portion (32) is configured to slow down the flow rate of the cleaning solution in the first wetting area (311), and is configured to divert part of the cleaning solution in the first wetting area (311) to the second wetting areas (312) on two opposite sides thereof.

2. The cleaning base station according to claim 1, characterized in that: The buffer portion (32) comprises a plurality of first diverter ribs (321) and a plurality of second diverter ribs (322) which are spaced apart and distributed along the extension direction of the first wetting area (311); the first diverter ribs (321) and the second diverter ribs (322) are arranged at an angle, and an opening surrounded by the first diverter ribs (321) and the second diverter ribs (322) faces the edge of the wetting portion (31).

3. The cleaning base station according to claim 2, characterized in that: Two adjacent first diverter ribs (321) form a first water flow channel (323); two adjacent second diverter ribs (322) form a second water flow channel (324); in the extension direction of the first wetting area (311), the first water flow channel (323) and the second water flow channel (324) are staggered.

4. The cleaning base station according to claim 2, characterized in that: The orthographic projections of the first diverter rib (321) and the second diverter rib (322) in the extension direction of the first wetting area (311) do not overlap, or partially overlap.

5. The cleaning base station according to claim 2, characterized in that: The first diverter rib (321) and the second diverter rib (322) are constructed to be in an arc shape.

6. The cleaning base station according to claim 1, characterized in that: A plurality of upwardly extending flanges (34) are distributed on the surface of the second wetting area (312), and the cleaning solution diverted from the first wetting area (311) is configured to flow between the flanges (34); the flanges (34) are constructed to be in contact with the cleaning element.

7. The cleaning base station according to claim 1, characterized in that: When the cleaning robot is located in the accommodating chamber (2), the contact area between the wetting portion (31) and the cleaning element is at least greater than one quarter of the total area of ​​the cleaning element.

8. The cleaning base station according to claim 1, characterized in that: The end surface of the wetting portion (31) is higher than the bottom of the cleaning tank (3); the cleaning tank (3) is also provided with a drainage hole (35), and dirt in the cleaning tank (3) is configured to be discharged through the drainage hole (35).

9. The cleaning base station according to claim 8, characterized in that: In the extension direction from the water supply position (33) to the central area of ​​the cleaning tank (3), the end surface of the wetting portion (31) is configured to gradually slope downward.

10. The cleaning base station according to claim 8, characterized in that: A wiper portion (36) extending upward is provided in the cleaning tank (3), and the wiper portion (36) is configured to be in contact with and cooperate with a cleaning member to scrape off dirt on the cleaning member.

11. The cleaning base station according to claim 10, characterized in that: The wiper portion (36) is configured to extend from the edge of the cleaning tank (3) to the central area of ​​the cleaning tank (3); at least two wiper portions (36) are provided, and the at least two wiper portions (36) are configured to be spaced and distributed in the rotation direction of the cleaning element.

12. The cleaning base station according to claim 10, characterized in that: The wiper portion (36) comprises a wiper rib (361) extending upward from the bottom of the cleaning groove (3), and the wiper rib (361) is constructed to enclose a wiper groove (362) in the cleaning groove (3); the wiper ribs (361) on opposite sides of the wiper groove (362) are constructed to scrape off dirt on the cleaning member in sequence during the rotation of the cleaning member.

13. The cleaning base station according to claim 11, characterized in that: A cleaning portion (37) is provided between two adjacent wiper portions (36), and the cleaning portion (37) is configured to extend from the edge of the cleaning tank (3) toward the central area of ​​the cleaning tank (3); and a plurality of cleaning columns (371) for contacting and cooperating with the cleaning element are distributed on the cleaning portion (37).

14. The cleaning base station according to claim 13, characterized in that: The top end surface of the cleaning column (371) is lower than the top end surface of the wiper portion (36).

15. The cleaning base station according to claim 8, characterized in that: The base station body (1) is configured to form a mounting groove (13) at the bottom of the accommodating cavity (2); the cleaning base station further comprises a cleaning body (4) and an accommodating body (6); the accommodating body (6) is formed with an accommodating groove (5) and is configured to be detachably arranged in the mounting groove (13); the cleaning body (4) is formed with the cleaning groove (3) and is configured to be detachably arranged in the accommodating groove (5); the accommodating groove (5) is connected to the cleaning groove (3) through the drainage hole (35).

16. The cleaning base station according to claim 15, characterized in that: A filter element (52) is arranged in the receiving tank (5), and the filter element (52) is constructed to divide the receiving tank (5) into a sewage discharge area (53) and a sewage containing area (54). The receiving tank (5) is provided with a sewage discharge port (51) connected to the sewage discharge area (53), and the drainage hole (35) is arranged at a position of the cleaning tank (3) corresponding to the sewage containing area (54).

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