Cleaning device

By designing annular sidewalls and bends in the chassis of the cleaning equipment, increasing the radius of the maximum rotating circle to reduce the distance between the front and rear vertices, the existing cleaning equipment's difficulties in obstacles and tight spaces are solved. , improves cleaning efficiency and flexibility.

CN119184570APending Publication Date: 2024-12-27ECOVACS ROBOTICS CO LTD
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Patent Information

Application Number
CN202310718387.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2023-06-16
Publication Date
2024-12-27

AI Technical Summary

Technical Problem

Existing cleaning equipment, especially D-shaped sweeping robots, are not easy to get out of trouble when encountering obstacles, and the cleaning corners of the walls are large in the home environment, which affects work efficiency.

Method used

A cleaning device is designed, and its chassis has an annular side wall, including a first straight side wall and a second straight side wall, both forming a bend, the radius of the maximum rotating circle is greater than the radius of the maximum circumferential circle, which is reduced Clean the distance between the front and rear vertices of the device, reducing the avoidance space during rotation, thereby improving the ability to escape.

Benefits of technology

The design improves the rotation flexibility of cleaning equipment in tight spaces and corner areas, reduces the risk of collision with obstacles, and enhances cleaning capabilities in tight spaces.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention discloses cleaning equipment which at least comprises a machine box, the machine box is provided with an annular side wall, the annular side wall comprises a first straight side wall and a second straight side wall, the first straight side wall extends in the first direction, the second straight side wall is connected with one end, in the first direction, of the first straight side wall, and the second straight side wall is connected with the other end, in the first direction, of the second straight side wall. The second straight side wall is bent relative to the first straight side wall, so that a bent part is formed between the first straight side wall and the second straight side wall; the second straight side wall extends in the second direction, and the second direction intersects with the first direction. A front vertex of the cleaning equipment is formed at the bent position, the maximum circumcircle of the cleaning equipment and the maximum rotating circle of the cleaning equipment both pass through the front vertex, and the radius of the maximum rotating circle is larger than that of the maximum circumcircle. According to the technical scheme provided by the invention, the escape capability of the cleaning equipment can be improved.
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Description

Technical Field

[0001] The embodiments of the present application relate to the technical field of cleaning equipment, and in particular to a cleaning equipment. Background Art

[0002] Cleaning equipment is mechanical equipment designed for cleaning. It reduces the labor cost of cleaning while also improving work efficiency and cleanliness, playing an indispensable role in modern society.

[0003] In the related art, in order to reduce the area of ​​the blind spot of the cleaning device, the shape of the cleaning device is D-shaped. The cleaning device has a square end and an arc end that are arranged opposite to each other, and the square end is located in front of the arc end, that is, the square end is located on the side of the arc end in the forward direction of the cleaning device. The side brush of the cleaning device is located at the square end. However, the cleaning device of the above structure is not easy to get out of trouble when encountering obstacles. Summary of the invention

[0004] The purpose of the present application is to provide a cleaning device that can improve the ability of the cleaning device to escape from trouble.

[0005] To achieve the above-mentioned purpose, the present application provides a cleaning device on the one hand, which includes at least a chassis, and the chassis has an annular side wall, wherein the annular side wall includes a first straight side wall and a second straight side wall, the first straight side wall extends along a first direction, the second straight side wall is connected to the first straight side wall at one end in the first direction, and the second straight side wall is bent relative to the first straight side wall so that a bending part is formed between the first straight side wall and the second straight side wall; the second straight side wall extends along a second direction, and the second direction intersects with the first direction; the front vertex of the cleaning device is formed at the bending part, the maximum circumscribed circle of the cleaning device and the maximum rotation circle of the cleaning device both pass through the front vertex, and the radius of the maximum rotation circle is greater than the radius of the maximum circumscribed circle.

[0006] It can be seen that the cleaning device provided in the embodiment of the present application is provided with a first straight side wall and a second straight side wall, the first straight side wall is connected to the second straight side wall and forms a bend, the side brush is provided at the bend, and a front vertex of the cleaning device is formed at the bend, the maximum circumscribed circle of the cleaning device and the maximum rotation circle of the cleaning device both pass through the front vertex of the bend, and by setting the radius of the maximum rotation circle to be larger than the radius of the maximum circumscribed circle, the distance between the front vertex and the rear vertex of the cleaning device can be shortened, thereby reducing the avoidance space required for the cleaning device when rotating, and ultimately improving the escape ability of the cleaning device. BRIEF DESCRIPTION OF THE DRAWINGS

[0007] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the drawings required for use in the description of the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0008] Figure 1 It is a cleaning process diagram of a cleaning device of the related art;

[0009] Figure 2 is a schematic diagram of a cleaning device provided in an embodiment of the present application;

[0010] Figure 3 yes Figure 2 A schematic diagram of the cleaning device after rotating 90 degrees counterclockwise around the rotation axis Q;

[0011] Figure 4 is another schematic diagram of a cleaning device provided in an embodiment of the present application;

[0012] Figure 5 yes Figure 4 A schematic diagram of the cleaning device after rotating 90 degrees counterclockwise around the rotation axis Q;

[0013] Figure 6 This is a process diagram of the cleaning device provided in an embodiment of the present application bypassing an obstacle. DETAILED DESCRIPTION

[0014] To make the purpose, technical solutions and advantages of the present application clearer, the embodiments of the present application will be further described in detail below in conjunction with the accompanying drawings. Terms such as "upper", "above", "lower", "below", "first end", "second end", "one end", "the other end" used in the present application to represent spatial relative positions are used to describe the relationship between a unit or feature as shown in the accompanying drawings relative to another unit or feature for the purpose of convenience of explanation. Terms of spatial relative position may be intended to include different orientations of the device in use or work other than the orientation shown in the figure. For example, if the device in the figure is turned over, the unit described as being "below" or "below" other units or features will be located "above" other units or features. Therefore, the exemplary term "below" can encompass both the above and below orientations. The device can be oriented in other ways (rotated 90 degrees or other orientations), and the spatially related descriptors used herein are interpreted accordingly.

[0015] In addition, the terms "installed", "set", "provided with", "connected", "slidingly connected", "fixed", and "sleeved" should be understood in a broad sense. For example, "connection" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be a direct connection, or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, elements, or components. For those of ordinary skill in the art, the specific meanings of the above terms in this application can be understood according to specific circumstances.

[0016] Most of the sweeping robots on the market are circular or quasi-circular. The escape logic of sweeping robots with this structure is simple and easy to escape. However, when dealing with walls and corners in a home environment, circular sweeping robots have large blind spots. In addition, due to space layout issues, the roller brush of a circular sweeping robot can generally only be set between the two driving wheels, so the length of the roller brush is basically only half of the length of the body, which will affect the working efficiency of the sweeping robot.

[0017] For this reason, some sweeping robots adopt a D-shaped structure. However, as described in the background art, the D-shaped cleaning device has the problem of being difficult to get out of trouble. The inventor of the present application found the following reasons through research:

[0018] refer to Figure 1 , the target surface may have intersecting a side and b side, and a side and b side form an inner corner area. The D-shaped cleaning device may have state ①, state ② and state ③. When the D-shaped cleaning device is in state ①, the square end of the D-shaped cleaning device faces the b side. During the movement of the D-shaped cleaning device toward the b side, the side brush 910 of the D-shaped cleaning device can clean the a side along its forward direction. After the a side is cleaned, the D-shaped cleaning device can rotate 90 degrees counterclockwise around the rotation axis O to state ③, so that the square end of the D-shaped cleaning device is away from the a side. During the movement of the D-shaped cleaning device away from the a side, the side brush 910 of the D-shaped cleaning device can clean the b side along its forward direction. Among them, the rotation axis O is the axis where the center of the D-shaped cleaning device is located, and the distance from the center to the two intersecting sides of the D-shaped cleaning device is equal.

[0019] In the process of the D-shaped cleaning device rotating 90 degrees around the rotation axis O from state ① to state ③, it has to go through state ②. In state ②, the corner of the square end of the D-shaped cleaning device is located at the top of the cleaning device, and there is the shortest distance between the corner and the b side. In order to avoid interference between the corner and the b side in state ②, in state ①, there needs to be a certain distance D1 between the corner of the D-shaped cleaning device and the b side.

[0020] Similarly, in state ③, the arc end of the D-shaped cleaning device is located at the rightmost end of the cleaning device, and there is the shortest distance between the arc end and edge a. In order to avoid interference between the arc end and edge a in state ③, a certain distance D2 must exist between the D-shaped cleaning device and edge a in state ①.

[0021] In summary, there needs to be a large avoidance space between the D-shaped cleaning device of the related art and the edge of the target surface (such as side a and side b) for the D-shaped cleaning device to rotate, which makes it difficult for the cleaning device to escape.

[0022] In order to improve this problem, the inventors of this application conducted the following research:

[0023] When the D-shaped cleaning device rotates from state ① to state ②, the corner of the D-shaped cleaning device is lifted by a certain height H1. If H1 can be reduced, the spacing D1 can be reduced, thereby reducing the avoidance space required for the D-shaped cleaning device when rotating. Similarly, when the D-shaped cleaning device rotates from state ① to state ③, the arc-shaped end of the D-shaped cleaning device is moved to the right by H2. If H2 can be reduced, the spacing D2 can be reduced, thereby reducing the avoidance space required for the D-shaped cleaning device when rotating.

[0024] The inventor of the present application found that the farther the corner of the D-shaped cleaning device is from the rotation axis, the smaller H1 is; the closer the arc end of the D-shaped cleaning device is to the rotation axis, the smaller H2 is. In view of this, the present application provides a cleaning device, the radius of the maximum rotation circle of the cleaning device is greater than the radius of the maximum circumscribed circle, which reduces the avoidance space required between the front vertex and the rear vertex of the cleaning device when the cleaning device rotates, thereby facilitating the cleaning device to escape.

[0025] In order to make the purpose, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions in the embodiments of the present application will be clearly and completely described below in combination with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments.

[0026] Based on the embodiments in this application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application. In the absence of conflict, the following embodiments and features in the embodiments can be combined with each other.

[0027] The present application embodiment provides a cleaning device 1000, which can be a floor scrubber, a sweeping robot, a sweeping and mopping robot, etc. Figure 2, the cleaning device 1000 provided in the embodiment of the present application may include a chassis 100, which may be a hollow prism, and the chassis 100 may include a bottom wall, an annular side wall and a top wall. When the cleaning device 1000 cleans the target surface, the bottom wall of the chassis 100 may face the target surface. The top wall of the chassis 100 and the bottom wall of the chassis 100 may be arranged in parallel, and there may be a certain spacing between the two. The annular side wall may be connected between the bottom wall of the chassis 100 and the top wall of the chassis 100, and the annular side wall, the top wall of the chassis 100 and the top wall of the chassis 100 may be enclosed into the inner cavity of the chassis 100. It is understandable that when the cleaning device 1000 is moving and cleaning on the target surface, the side wall of the cleaning device 1000 will collide with the obstacles on the target surface. Therefore, the embodiment of the present application mainly studies the side wall structure of the chassis 100.

[0028] Continue to refer Figure 2 , the annular side wall may include a first straight side wall 110 and a second straight side wall 120. The first straight side wall 110 may extend along a first direction X. That is, the orthographic projection of the first straight side wall 110 (along a straight line direction perpendicular to the top wall of the chassis 100) on the surface of the top wall of the chassis 100 is a long strip, and the length direction of the orthographic projection is the first direction X. In other words, by cutting the first straight side wall 110 with a plane parallel to the top wall (or bottom wall) of the chassis 100, a cross section of the first straight side wall 110 in a long strip shape can be obtained, and the length direction of the cross section of the first straight side wall 110 is the first direction X.

[0029] The cleaning device 1000 provided in the embodiment of the present application can move forward or backward along a first direction X, the positive direction of the first direction X (such as the direction indicated by the arrow X) can be the forward direction of the cleaning device 1000, and the reverse direction of the first direction X (such as the reverse direction of the direction indicated by the arrow X) is the backward direction of the cleaning device 1000. The cleaning device 1000 may have a front end and a rear end along the first direction X. Among them, the end of the cleaning device 1000 in the positive direction of the first direction X is the front end, and the end of the cleaning device 1000 in the reverse direction of the first direction X is the rear end.

[0030] Continue to refer Figure 2 , the second straight side wall 120 may extend along the second direction Y. That is, the orthographic projection of the second straight side wall 120 (along the straight line direction perpendicular to the top wall of the chassis 100) on the surface of the top wall of the chassis 100 is a long strip, and the length direction of the long strip is the second direction Y. In other words, by cutting the second straight side wall 120 with a plane parallel to the top wall (or bottom wall) of the chassis 100, a cross section of the second straight side wall 120 in a long strip shape may be obtained, and the length direction of the cross section of the second straight side wall 120 may be the second direction Y.

[0031] The second direction Y and the first direction X may intersect, so that the first straight side wall 110 and the second straight side wall 120 may form a certain angle. Figure 2 In the figure, the second direction Y is perpendicular to the first direction X. In addition, the second straight side wall 120 can be connected to the first straight side wall 110 at one end in the positive direction of the first direction (in the direction indicated by the arrow X), and the second straight side wall 120 can be bent relative to the first straight side wall 110, so that a bending portion 150 is formed between the first straight side wall 110 and the second straight side wall 120.

[0032] The bend 150 may be a tip, or the bend 150 may be Figure 2 The rounded corners are shown. Figure 2 When the rounded corner is shown, the distance between the rounded corner and the rotation axis Q of the cleaning device 1000 is small, so that the space occupied by the rounded corner during rotation is small. In addition, the rounded corner has a large force-bearing surface, which has the advantage of not being easily deformed after hitting the obstacle 2000.

[0033] In addition, the cleaning device 1000 provided in the embodiment of the present application may include a side brush assembly 400, which is rotatably disposed at the bottom end of the chassis 100 and is used to sweep up garbage on the target surface. The rotation axis of the side brush assembly 400 is parallel to the rotation axis Q of the cleaning device 1000. And the orthographic projection of the rotation axis of the side brush assembly 400 (along the straight line direction perpendicular to the bottom surface of the annular side wall) on the bottom surface of the annular side wall is located in the inner ring of the annular side wall. In other words, the rotation axis portion of the side brush assembly 400 is located inside the chassis 100, so as to hide at least part of the side brush assembly 400 and reduce the space occupied by the entire cleaning device 1000.

[0034] In order to reduce the blind spot of the side brush assembly 400, the rotation axis of the side brush assembly 400 is close to the bend 150. That is, the rotation axis of the side brush assembly 400 is closer to the bend 150 than the roller brush assembly 700, the drive assembly 500, the navigation assembly 800, etc. mentioned below, and the side brush assembly 400 is the assembly closest to the bend 150. Figure 2 When the corner area formed by the middle side a and the side b is formed, the side brush assembly 400 can clean the corner area. Compared with the circular cleaning device 1000 of the related art, the side brush assembly 400 of the cleaning device 1000 provided in the embodiment of the present application has a smaller dead angle area and a better cleaning effect.

[0035] In addition, the side brush assembly 400 may include a rotating shaft and at least one brush strip connected to the circumference of the rotating shaft. A driver such as a motor may drive the rotating shaft to rotate, thereby causing the brush strip to rotate. The edge of the brush strip away from one end of the rotating shaft may form a circular trajectory when rotating, and at least part of the circular trajectory may be located outside the first straight side wall 110, so as to facilitate cleaning of the area outside the first straight side wall 110. It is worth noting that in order to ensure that the front vertex e mentioned below is formed at the bend 150, the circular trajectory formed by the brush strip (orthographic projection on the projection plane) does not exceed the bend 150 (orthographic projection on the projection plane).

[0036] 1000 pairs of cleaning equipment Figure 2 When cleaning the a side of the cleaning device 1000, the first straight side wall 110 can be rotated to be parallel to the a side, so that the first direction X is set along the a side, and the moving direction of the cleaning device 1000 is along the a side. In addition, a space can be left between the first straight side wall 110 and the a side for the brush bar of the side brush assembly 400 to extend and clean. When the cleaning device 1000 moves along the a side, the brush bar of the side brush assembly 400 can clean the a side.

[0037] Similarly, in the cleaning equipment 1000 pairs Figure 3 When cleaning the side b, the first straight side wall 110 can be rotated to be parallel to the side b, so that the first direction X is set along the side b, and the moving direction of the cleaning device 1000 is along the side b. In addition, a space can be left between the first straight side wall 110 and the side b for the brush bar of part of the side brush assembly 400 to extend and clean. When the cleaning device 1000 moves along the side b, the brush bar of the side brush assembly 400 can clean the side b.

[0038] In the cleaning equipment 1000 by Figure 2 In the middle, sweep a side and convert to Figure 3 During the cleaning process of side b, the cleaning device 1000 can rotate around its rotation axis Q in the space formed by side a and side b. Figure 2 , the cleaning device 1000 may have a maximum circumscribed circle C1. The circumscribed circle is defined as a circle that intersects all vertices of the polygon.

[0039] The cleaning device 1000 (along the straight line direction perpendicular to the projection plane) may have an orthographic projection on the projection plane, wherein the projection plane is an imaginary plane parallel to the top wall of the chassis 100, and the circumscribed circle of the outer contour of the cleaning device 1000 (orthographic projection on the projection plane) is the maximum circumscribed circle C1 of the cleaning device 1000. It should be noted that since the chassis 100, the side brush assembly 400 and / or the rag assembly 600 of the cleaning device 1000 are not in the same plane, the projection plane mentioned above is introduced to help the explanation.

[0040] The bend 150 is located at the front end of the cleaning device 1000, and the front vertex e of the bend 15 (orthographic projection on the projection plane) can be the front vertex e of the cleaning device 1000 (orthographic projection on the projection plane). When the bend 150 is a pointed end, the front vertex e is a pointed vertex; when the bend 150 is Figure 2 When the rounded corner is shown, the orthographic projection of the bend 150 on the projection plane can be tangent to the maximum circumscribed circle C1, and the tangent point is the front vertex e.

[0041] In addition, the cleaning device 1000 provided in the embodiment of the present application may also include a rag assembly 600, which is rotatably disposed at the bottom end of the chassis 100. At least part of the rag assembly 600 can extend out of the rear end of the chassis 100 so as to wipe the wall and other locations of the target surface. In this case, the rear vertex f of the rag assembly 600 (orthographic projection on the projection plane) can be the rear vertex f of the cleaning device 1000 (orthographic projection on the projection plane). Figure 2 When the rag assembly 600 is in an arc shape, the orthographic projection of the rear end of the rag assembly 600 on the projection plane may be tangent to the maximum circumscribed circle C1, and the tangent point is the rear vertex f. It is worth noting that the rag assembly 600 generally includes two rag plates 610, and the rotation axes of the two rag plates 610 are parallel to the rotation axis of the cleaning device 1000. The two rag plates 610 may each be formed with a rear vertex f. In this way, the maximum circumscribed circle C1 of the cleaning device 1000 may be a circle formed by the front vertex and the two rear vertices.

[0042] The above description is about the determination of the rear vertex f when the cleaning device 1000 is provided with a rag assembly 600 and the rag assembly 600 extends out of the rear end of the chassis 100. When the cleaning device 1000 is not provided with a rag assembly 600, or when the cleaning device 1000 is provided with a rag assembly 600 but the rag assembly 600 does not extend out of the rear end of the chassis 100, the rear vertex of the chassis 100 (orthographic projection on the projection plane) may be the rear vertex of the cleaning device 1000 (orthographic projection on the projection plane). Figure 2 When the arc shape is shown, the orthographic projection of the rear end of the chassis 100 on the projection plane can be tangent to the maximum circumscribed circle C1, and the tangent point is the rear vertex.

[0043] Continue to refer Figure 2The cleaning device 1000 provided in the embodiment of the present application may include a driving assembly 500, which can enable the cleaning device 1000 to rotate around the rotation axis Q on the target surface, move forward along the first direction X, and move backward in the opposite direction of the first direction X. The driving assembly 500 and the side brush assembly 400 can be arranged at intervals along the first direction X, and the orthographic projection of the driving assembly 500 on the bottom surface of the annular side wall is located within the ring of the annular side wall, so as to hide the driving assembly 500 and reduce the space occupied by the entire cleaning device 1000.

[0044] In addition, the driving assembly 500 may include two driving wheels 510 spaced apart along the second direction Y, each driving wheel 510 may be rotatably disposed at the bottom end of the chassis 100, and the rolling axis of the driving wheel 510 is perpendicular to the rotation axis of the cleaning device 1000. The method of rotating and moving the cleaning device 1000 using the two driving wheels 510 may be any known method, and the embodiment of the present application does not specifically limit this method. The rotation axis Q of the cleaning device 1000 may be located between the two driving wheels 510, and the distance between each driving wheel 510 and the rotation axis Q is equal.

[0045] In a circular cleaning device (or D-shaped cleaning device) of the related art, the cleaning device rotates around an axis at which the center of its largest circumscribed circle is located. Figure 1 In the figure, the distance between the front vertex e of the cleaning device and the rotation axis O, and the distance between the front vertex f of the cleaning device and the rotation axis O are equal.

[0046] However, in the present application examples, reference Figure 2 , the center of the maximum circumscribed circle C1 is not on the rotation axis Q of the cleaning device 1000 provided in the embodiment of the present application, and the cleaning device 1000 may have a front rotating circle C2 and a rear rotating circle C3.

[0047] Front rotating circle C2: With the orthographic projection of the rotation axis Q on the projection plane as the center and the distance from the front vertex e to the center as the radius, that is, the front rotating circle C2 is the motion trajectory of the front vertex e when the cleaning device 1000 rotates around the rotation axis Q.

[0048] The rear rotation circle C3 has the positive projection of the rotation axis Q on the projection plane as the center and the distance from the rear vertex f to the center as the radius. In other words, the front rotation circle C2 is the motion trajectory of the rear vertex f when the cleaning device 1000 rotates around the rotation axis Q.

[0049] The rotation axis Q of the cleaning device 1000 provided in the embodiment of the present application is close to the rear vertex f and away from the front vertex e, so that the radius of the front rotating circle C2 is greater than the radius of the rear rotating circle C3, the radius of the front rotating circle C2 is greater than the radius of the maximum circumscribed circle C1, and the front rotating circle C2 is the maximum rotating circle of the cleaning device 1000.

[0050] In order to facilitate the rotation of the cleaning device 1000 and reduce the avoidance space required for the rotation of the cleaning device 1000, the center O of the maximum circumscribed circle C1 and the center Q of the front rotating circle C2 can be located on the same straight line arranged along the first direction X, and the distance between each driving wheel 510 and the straight line is equal, and the center Q of the front rotating circle C2 is farther away from the front vertex e than the center O of the maximum circumscribed circle C1.

[0051] In the positive direction of the first direction X (indicated by arrow X), the maximum circumscribed circle C1 has a first farthest point m1, and the front rotating circle C2 has a second farthest point m2. Figure 2 Turn 90 degrees counterclockwise to Figure 3 In the process, Figure 2 The front vertex e in will go through the second farthest point m2. As long as the second farthest point m2 is Figure 2 As shown, it is lower than side b, and the front vertex e will not interfere with side b during the rotation process.

[0052] Since the center O of the maximum circumscribed circle C1 is closer to the front vertex e, and the rotation axis Q is farther from the front vertex e, the second farthest point m2 can be made lower than the first farthest point m1. The cleaning device 1000 provided in the embodiment of the present application has a low height when the front vertex e is rotated, and the required avoidance space between the side b is small when rotating, which facilitates the cleaning device 1000 to rotate in a small space, thereby facilitating the cleaning device 1000 to escape from trouble.

[0053] In addition, in the positive direction of the second direction Y (as indicated by arrow Y), the maximum circumscribed circle C1 has a third farthest point m3, and the front rotating circle C2 has a fourth farthest point m4. Figure 2 Rotate 90 degrees counterclockwise around the rotation axis Q to Figure 3 back, Figure 2 The last vertex f in will move to the fourth farthest point m4. Figure 2 As shown, it is located on the left side of edge a, and the rear vertex f will not interfere with edge a during the rotation process.

[0054] Since the center O of the maximum circumscribed circle C1 is far from the rear vertex f, and the rotation axis Q is close to the rear vertex f, the fourth farthest point m4 can be further to the left than the third farthest point m3. The cleaning device 1000 provided in the embodiment of the present application has a small rightward displacement length of the rear vertex f when rotating, and a small avoidance space between the cleaning device 1000 and the side a when rotating, which facilitates the cleaning device 1000 to rotate in a small space, thereby facilitating the cleaning device 1000 to escape from trouble.

[0055] The cleaning device 1000 rotates around the axis Q. Figure 4 Turn 90 degrees counterclockwise to Figure 5 During the process, Figure 4 The front vertex e in will go through the second farthest point m2. As long as the second farthest point m2 is Figure 4 As shown, the front vertex e is located on the right side of the c side, and will not interfere with the c side during the rotation process. Compared with the cleaning device of the related art that rotates counterclockwise around the axis where the center O of the largest circumscribed circle C1 is located, the leftward displacement length of the front vertex e of the cleaning device 1000 provided in the embodiment of the present application is small during rotation, and the avoidance space required between the front vertex e and the c side during rotation is small, which facilitates the cleaning device 1000 to rotate in a small space, thereby facilitating the cleaning device 1000 to escape from trouble.

[0056] Similarly, when the cleaning device 1000 rotates around the rotation axis Q, Figure 4 Turn 90 degrees counterclockwise to Figure 5 During the process, Figure 4 The last vertex f in will move to the fourth farthest point m4, and as long as the fourth farthest point m4 is Figure 4 As shown, the rear vertex f is located at the lower side of the b side, and the rear vertex f will not interfere with the b side during the rotation process. Compared with the cleaning device of the related art that rotates counterclockwise around the axis where the center O of the maximum circumscribed circle C1 is located, the cleaning device 1000 provided in the embodiment of the present application has a small upward displacement length of the rear vertex f during rotation, and the avoidance space required between the rear vertex f and the b side during rotation is small, which facilitates the cleaning device 1000 to rotate in a small space, thereby facilitating the cleaning device 1000 to escape from trouble.

[0057] In summary, when the cleaning device 1000 provided in the embodiment of the present application cleans corner areas such as wall corners, the space on the corner side required for its rotation is small (i.e., the avoidance space is small), the rotation is flexible, and it is not easy to collide with the corner, which makes it easy to rotate in a small space, making it easy for the cleaning device 1000 to get out of trouble.

[0058] refer to Figure 6 When there is an obstacle 2000 in front of the cleaning device 1000, the cleaning device 1000 can bypass the obstacle 2000 through the following steps.

[0059] Step 1: The cleaning device 1000 rotates counterclockwise, and the moving direction of the cleaning device 1000 changes from upward to upward left, and the front vertex of the cleaning device 1000 moves from e1 to e2. Since the rotation axis Q of the embodiment of the present application is far away from the front end of the cleaning device 1000, the upward movement length of the front vertex of the cleaning device 1000 is small, avoiding collision with the obstacle 2000, and facilitating the rotation of the cleaning device 1000;

[0060] Step 2: The cleaning device 1000 is translated a certain distance in the upper left direction, so that the front vertex of the cleaning device 1000 moves from e2 to e3;

[0061] Step 3: The cleaning device 1000 rotates clockwise, and the direction of travel of the cleaning device 1000 changes from the upper left to the upper right, and the front vertex of the cleaning device 1000 moves from e3 to e4. Since the rotation axis Q of the embodiment of the present application is far away from the front end of the cleaning device 1000, the cleaning device 1000 rotates clockwise around the rotation axis Q at a small angle, which can move the front vertex of the cleaning device 1000 to the right by a longer distance, thereby making it easier for the cleaning device 1000 to return to the correct position, thereby improving the avoidance efficiency.

[0062] Step 4: The cleaning device 1000 is translated a certain distance in the upper right direction, so that the front vertex of the cleaning device 1000 moves from e4 to e5;

[0063] Step 5: The cleaning device 1000 rotates clockwise, and the direction of travel of the cleaning device 1000 is tilted more toward the right, and the front vertex of the cleaning device 1000 moves from e5 to e6. Since the rotation axis Q of the embodiment of the present application is far away from the front end of the cleaning device 1000, the cleaning device 1000 rotates clockwise around the rotation axis Q at a small angle, which can move the front vertex of the cleaning device 1000 to the right by a longer distance, thereby making it easier for the cleaning device 1000 to return to the center, thereby improving the avoidance efficiency.

[0064] Step 6: The cleaning device 1000 is translated for a distance in the upper right direction, so that the front vertex of the cleaning device 1000 moves from e6 to e7. The cleaning device 1000 in this state may be located in front of the obstacle 2000, or the rotation axis Q of the cleaning device 1000 in this state corresponds to the rotation axis Q of the cleaning device 1000 in the initial state;

[0065] Step 7: The cleaning device 1000 rotates counterclockwise, and the moving direction of the cleaning device 1000 changes from the upper right to the upper left, and the front vertex of the cleaning device 1000 moves from e7 to e8.

[0066] In summary, the cleaning device 1000 provided in the embodiment of the present application has the advantages of flexible rotation and easy return to the center when avoiding the obstacle 2000.

[0067] It is mentioned above that the radius of the front rotating circle C2 (maximum rotating circle) provided in the embodiment of the present application is greater than the radius of the maximum circumscribed circle C1. In order for the driving component 500 to drive the front end of the cleaning device 1000 to rotate around the rotation axis Q, the radius of the front rotating circle C2 cannot be too large, otherwise the machine will not be able to turn. In view of this, the radius of the front rotating circle C2 (maximum rotating circle) may be less than or equal to the sum of √2 / 2 times the width of the chassis 100 and the first preset value. Among them, the width of the chassis 100 is: the maximum length of the chassis 100 in the direction perpendicular to the first straight side wall 110. For example, Figure 2In the figure, in a direction perpendicular to the first straight side wall 110 , the fourth straight side wall 140 is farthest from the first straight side wall 110 , and the distance between the fourth straight side wall 140 and the first straight side wall 110 is equal to the width of the cleaning device 1000 .

[0068] Further, the first preset value may be greater than or equal to 10mm±5mm. For example, the first preset value may be 5mm, the radius of the front rotating circle C2 (maximum rotating circle) is less than or equal to the sum of √2 / 2 times the width of the chassis 100 and 5mm; the first preset value may be 10mm, the radius of the front rotating circle C2 is less than or equal to the sum of √2 / 2 times the width of the chassis 100 and 10mm; the first preset value may be 15mm, the radius of the front rotating circle C2 is less than or equal to the sum of √2 / 2 times the width of the chassis 100 and 15mm.

[0069] The cleaning device 1000 can enter the space formed by the table legs (or chair legs or sofa legs), etc., and can move or rotate in the space to clean the space. The cleaning device 1000 can enter the space in its entirety, or a portion of the cleaning device 1000 can enter the space, and another portion of the cleaning device 1000 can be located outside the space. For example, Figure 4 In the embodiment, the cleaning device 1000 can enter the space enclosed by the side a, the side b and the side c from the opening end, and can move or rotate in the space.

[0070] In order to enable the cleaning device 1000 to move in a narrow space, optionally, the radius of the maximum circumscribed circle C1 may be less than or equal to the difference between √2 / 2 times the width of the chassis 100 and the second preset value. Specifically, the maximum width of the cleaning device 1000 is the diameter of the maximum circumscribed circle C1. As long as the maximum circumscribed circle C1 is able to move in a narrow space, the cleaning device 1000 can move in a narrow space.

[0071] Further, the second preset value may be greater than or equal to 10mm±5mm. For example, the second preset value may be 5mm, and the radius of the maximum circumscribed circle C1 is less than or equal to the difference between √2 / 2 times the width of the chassis 100 and 5mm; the second preset value may be 10mm, and the radius of the maximum circumscribed circle C1 is less than or equal to the difference between √2 / 2 times the width of the chassis 100 and 10mm; the second preset value may be 15mm, and the radius of the maximum circumscribed circle C1 is less than or equal to the difference between √2 / 2 times the width of the chassis 100 and 15mm.

[0072] To facilitate the rotation of the cleaning device 1000, optionally, the difference between the radius of the front rotating circle C2 (maximum rotating circle) and the radius of the maximum circumscribed circle C1 may be greater than or equal to a third preset value. Specifically, the smaller the radius of the maximum circumscribed circle C1, the smaller the space occupied by the cleaning device 1000 during the rotation process. By utilizing the small size difference of the maximum circumscribed circle C1, when the cleaning device 1000 encounters an obstacle 2000, it can retreat a distance and then rotate, so that the cleaning device 1000 can escape smoothly.

[0073] Furthermore, the third preset value may be greater than or equal to 10mm±5mm. For example, the third preset value may be 5mm, and the difference between the radius of the front rotating circle C2 (maximum rotating circle) and the radius of the maximum circumscribed circle C1 may be greater than or equal to 5mm. The third preset value may be 10mm, and the difference between the radius of the front rotating circle C2 and the radius of the maximum circumscribed circle C1 may be greater than or equal to 10mm; the third preset value may be 15mm, and the difference between the radius of the front rotating circle C2 and the radius of the maximum circumscribed circle C1 may be greater than or equal to 15mm. Among them, when the cleaning device 1000 encounters an obstacle 2000, it can retreat 10mm±5mm and then rotate.

[0074] In the cleaning equipment of the related art, the side wall surrounding the outside of the driving assembly is a curved wall with a large curvature, and the two driving wheels of the driving assembly are respectively arranged at the two ends of a certain radial direction of the curved wall. Since the driving wheel has a length perpendicular to the radial direction, the distance between the driving wheel and the radial edge of the cleaning equipment of the related art is large. To avoid the above problems, in the embodiment of the present application, the positive projection of the driving assembly 500 (along the straight line direction perpendicular to the first straight side wall 110) on the surface of the first straight side wall 110 is located within the surface of the first straight side wall 110. In this way, the distance between the driving assembly 500 and the first straight side wall 110 is close, and the distance between the two driving wheels 510 of the driving assembly 500 can be set farther, so that the driving assembly 500 drives the cleaning equipment 1000 to move.

[0075] refer to Figure 2, the two driving wheels 510 of the driving assembly 500 may be arranged at intervals along the second direction Y, and a storage space may be formed between the two driving wheels 510. In the cleaning device of the related art, the roller brush assembly is arranged between the two driving assemblies, resulting in the length of the roller brush assembly being affected by the distance between the two driving wheels. To solve the above problems, optionally, the cleaning device 1000 provided in the embodiment of the present application may also include a roller brush assembly 700, which is rollably arranged at the bottom end of the chassis 100, and the rotation axis of the roller brush assembly 700 is parallel to the rotation axis of the driving wheel 510. The bottom wall of the chassis 100 may be provided with an air inlet connected to the inner cavity of the chassis 100, and the roller brush assembly 700 may be rollably arranged at the air inlet, and the garbage on the target surface may be rolled up. The fan may guide the rolled up garbage together with the air around it into the inner cavity of the chassis 100 through the air inlet. In addition, the roller brush assembly 700 can be located between the side brush assembly 400 and the drive assembly 500, and at least one end of the roller brush assembly 700 in the second direction Y can extend out of the storage space. In this way, the roller brush assembly 700 is arranged in front of the drive assembly 500 in the embodiment of the present application, and the length of the roller brush assembly 700 will not be affected by the distance between the two drive wheels 510. The length of the roller brush assembly 700 can be set longer to increase the cleaning range of the roller brush assembly 700 and improve the cleaning effect. In addition, the storage space can be as follows: Figure 2 As shown, a dust box 200 for collecting and collecting garbage is placed.

[0076] refer to Figure 2 The embodiment of the present application may further include a rag assembly 600, which may include two rag plates 610 rotatably disposed at the bottom of the chassis 100, and the target surface may be wiped by the rotation of the two rag plates 610. The inner cavity of the chassis 100 may be provided with a water tank, and the water tank may be provided with a guide pipe, and the water in the water tank may flow to the rag assembly 600 through the guide pipe to soak the rag plates 610.

[0077] In the cleaning device of the related art, the side wall located above the rag assembly and surrounding the outer side of the rag assembly is a curved wall with a large curvature, resulting in a large distance between the rag assembly and the edge when the cleaning device of the related art cleans along the edge, making it difficult for the position near the edge to be wiped by the rag assembly. In the embodiment of the present application, in order to enable the rag assembly 600 to wipe along the edge, optionally, the rag assembly 600 and the side brush assembly 400 can be arranged at both ends of the first straight side wall 110 along the first direction X. And the orthographic projections of the two ends of the rag assembly 600 along the second direction Y (along the straight line direction perpendicular to the bottom surface of the annular side wall) on the bottom surface of the annular side wall are located within the ring of the annular side wall, that is, the rag assembly 600 does not extend out of the annular side wall at both ends in the second direction Y, so that the first straight side wall 110 is still the outermost structure of the cleaning device 1000 along the second direction Y.

[0078] When the cleaning device 1000 cleans an edge (such as edge a and edge b), the cleaning device 1000 is first moved to the vicinity of the edge, and the first straight side wall 110 of the cleaning device 1000 is directed toward the edge (that is, the extension direction of the cleaning device 1000 is along the extension direction of the edge, and the outer surface of the first straight side wall 110 is used as the surface of the cleaning device 1000 closest to the edge), and then moves along the extension direction of the edge to clean the edge. It can be seen from the above that when cleaning the edge, the outer surface of the first straight side wall 110 is the surface of the cleaning device 1000 closest to the edge. The distance between the rag assembly 600 and the edge is: the sum of the distance between the rag assembly 600 and the first straight side wall 110 and the distance between the first straight side wall 110 and the edge.

[0079] Compared with the cleaning equipment in the related art having a curved wall with a larger curvature, the first straight side wall 110 is a straight line extending along the first direction X, which can make the distance between the rag assembly 600 and the first straight side wall 110 smaller, the distance between the rag assembly 600 and the edge smaller, and the blind spot area of ​​the rag assembly 600 is small.

[0080] Optionally, the side brush assembly 400, the roller brush assembly 700, the drive assembly 500 and the rag assembly 600 may be sequentially arranged at intervals at the bottom of the chassis 100 along the first direction X to facilitate dry and wet separation and weight distribution with the drive assembly 500 (rotation axis Q) as the boundary.

[0081] Continue to refer Figure 2 In order to prevent the rear end of the chassis 100 from colliding with the obstacle 2000 when the cleaning device 1000 rotates around the rotation axis Q, the annular side wall may optionally further include a third side wall 130, and the third side wall 130 and the second straight side wall 120 are respectively connected to the two ends of the first straight side wall 110 along the first direction X, and the third side wall 130 may extend along the second direction Y. That is, the third side wall 130 is connected to the end of the first straight side wall 110 away from the second straight side wall 120, and the length direction of the third side wall 130 is the second direction Y. In addition, the rag assembly 600 may extend out of the third side wall 130 at one end in the first direction X, and the orthographic projection of the portion of the rag assembly 600 extending out of the third side wall 130 on the projection plane may have a rear vertex. The orthographic projection of the third side wall 130 on the projection plane may be located within the rear rotation circle to prevent the third side wall 130 from colliding with the obstacle 2000 during the rotation of the cleaning device 1000 , thereby protecting the chassis 100 and extending the service life of the chassis 100 .

[0082] Further, the third side wall 130 is in an arc shape, and the third side wall 130 has an arc center facing the second straight side wall 120. Specifically, compared with setting the third side wall 130 in a straight line, setting the third side wall 130 in an arc shape has the advantage of forming a larger annular side wall, which is convenient for increasing the capacity of the chassis 100.

[0083] In the cleaning equipment of the related art, the navigation assembly is often set on the top wall of the chassis, and the navigation assembly protrudes from the top wall of the chassis. This will make the overall height of the cleaning equipment of the related art higher, which is not convenient for the equipment to enter the lower space for cleaning, and limit the cleaning range of the equipment. In order to solve this problem, optionally, the cleaning equipment 1000 provided in the embodiment of the present application may include a navigation assembly 800 located in the inner cavity of the chassis 100. Among them, the chassis 100 may have a first end and a second end arranged relatively in the first direction X. The navigation assembly 800 and the side brush assembly 400 may be arranged at intervals at the first end of the chassis 100 along the second direction Y. The side wall of the chassis 100 may have a light-transmitting portion, and the navigation assembly 800 obtains the distance between the cleaning equipment 1000 and the target by the light passing through the light-transmitting portion. Compared with the related art, the overall height of the cleaning equipment 1000 of the embodiment of the present application is low, which is convenient for the cleaning equipment 1000 to clean the lower space.

[0084] It is worth noting that the path planning mode of the cleaning device 1000 mainly achieves obstacle avoidance by measuring the distance of the obstacle 2000, and the distance measurement is used as the basis for obstacle avoidance, which can be achieved by various technologies such as wireless radio frequency, ultrasonic wave, infrared or laser / laser. The navigation component 800 can be LDS (laser distance sensor), infrared sensor, wireless radio frequency device, etc. Among them, LDS can scan the distance from itself to each boundary of the indoor room by emitting laser, thereby forming a digital map, and storing the indoor layout plan in the digital map. The cleaning device 1000 can plan a reasonable cleaning route according to the layout of the furniture, wall boundaries and other obstacles 2000 in the indoor room to complete the cleaning work. In addition, the cleaning device 1000 can also update the digital map in real time according to the changes in the position of the furniture in the house. In addition, the LDS emits a laser beam to irradiate a certain point on the object, and the distance between the cleaning device 1000 and the narrow space can be determined according to the received reflected light. When the cleaning device 1000 moves to the vicinity of the narrow space for cleaning work, the LDS can continuously feedback the distance information from the narrow space. When the cleaning device 1000 moves to a point where part of the chassis 100 enters a narrow space, the LDS at the front end of the cleaning device 1000 can be triggered in advance to change the direction of the sweeping robot to prevent more parts of the cleaning device 1000 from entering the narrow space. In addition, a universal wheel 300 can be provided between the navigation assembly 800 and the side brush assembly 400, and the universal wheel 300 can be used to change the direction of the cleaning device 1000.

[0085] Optionally, in order to make the appearance of the cleaning device a more regular shape and facilitate the rotation of the cleaning device 1000, the shape of the cleaning device 1000 provided in the embodiment of the present application can be a shape symmetrical about the central axis plane. The central axis plane can be located between the two driving wheels 510, and the axis where the center O of the maximum circumscribed circle C1 mentioned above is located and the rotation axis Q of the cleaning device 1000 are both on the central axis plane.

[0086] Further, the annular sidewall may further include a fourth straight sidewall 140. The fourth straight sidewall 140 may be connected to an end of the second straight sidewall 120 away from the first straight sidewall 110, and the fourth straight sidewall 140 and the first straight sidewall 110 are symmetrical about the central axis of the second straight sidewall 120. The fourth straight sidewall 140 may be bent relative to the second straight sidewall 120, and a bend 150 may be formed between the fourth straight sidewall 140 and the second straight sidewall 120. The orthographic projection of the bend 150 on the projection plane may have a front vertex e. Figure 2 In the embodiment, the first straight side wall 110 , the second straight side wall 120 , the fourth straight side wall 140 and the third side wall 130 are connected end to end to form an annular side wall of the cleaning device 1000 .

[0087] Optionally, at least part of the light-transmitting portion may be located on the second straight side wall 120 , and at least part of the light-transmitting portion may be located on the fourth straight side wall 140 , so as to increase the visual range of the navigation assembly 800 .

[0088] The following is a detailed description of the working principle of a cleaning device, a sweeping robot, in combination with a specific application scenario.

[0089] A wants to invite friends to his home for a small gathering during the holiday. In order to leave a clean and tidy impression on his friends, A starts the sweeping robot, opens his phone, clicks on the APP that matches the sweeping robot, and selects the deep cleaning mode. After the sweeping robot starts working, A goes to do other things. Based on the deep cleaning instruction, the sweeping robot first opens the navigation component, which can generate a dot cloud based on A's home environment. The sweeping robot can then build a model of A's home based on the dot cloud map, and then the sweeping robot uses the path planning algorithm to calculate the best cleaning path.

[0090] When the sweeping robot is cleaning a corner, the sweeping robot is first moved to the end of one of the sides of the corner to be cleaned, and then the first straight side wall of the sweeping robot is arranged along the side, and a cleaning space is left between the first straight side wall of the sweeping robot and the side for the side brush assembly of the sweeping robot to extend. When the sweeping robot moves along the side, the side brush assembly cleans the side closely. When the sweeping robot moves to the end of the side, the sweeping robot rotates, so that the first straight side wall of the sweeping robot is arranged along the other side, and a cleaning space is left between the first straight side wall of the sweeping robot and the other side for the side brush assembly of the sweeping robot to extend. When the sweeping robot moves along the other side, the side brush assembly cleans the other side closely.

[0091] When the sweeping robot encounters an obstacle in front of it, the sweeping robot can first retreat for a distance, and then turn counterclockwise (or clockwise) so that the front end of the sweeping robot faces the left front (or right front) of the obstacle; after the sweeping robot travels a distance along the left front (or right front), the sweeping robot turns clockwise (or counterclockwise) again so that the front end of the sweeping robot faces the right front (or left front) of the obstacle; after the sweeping robot travels a distance along the right front (or left front), the sweeping robot turns clockwise (or counterclockwise) again so that the front end of the sweeping robot faces the right front (or left front) of the obstacle. The angle increases; wait for the sweeping robot to move a distance along the right front (or left front), observe whether the sweeping robot is in front of the obstacle, if the sweeping robot is in front of the obstacle, the sweeping robot rotates counterclockwise (or clockwise) to make the front end of the cleaning robot return to the center; if the sweeping robot is not in front of the obstacle, continue to move the sweeping robot forward, or rotate clockwise (or counterclockwise) again to increase the angle of the front end of the sweeping robot toward the right front (or left front) of the obstacle again, and then move a distance in the new direction until the sweeping robot is in front of the obstacle.

[0092] It can be seen that the technical solution provided by the present application, by setting a first straight side wall and a second straight side wall, the first straight side wall is connected to the second straight side wall and forms a bend, the side brush is set at the bend, and the bend forms a front vertex of the cleaning device, the maximum circumscribed circle of the cleaning device and the maximum rotation circle of the cleaning device both pass through the front vertex of the bend, and by setting the radius of the maximum rotation circle to be larger than the radius of the maximum circumscribed circle, the distance between the front vertex and the rear vertex of the cleaning device can be shortened, thereby reducing the avoidance space required for the cleaning device when rotating, and ultimately improving the escape ability of the cleaning device.

[0093] The above description is only a preferred embodiment of the present application and is not intended to limit the present application. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present application should be included in the protection scope of the present application.

Claims

1. A cleaning device, characterized in that: The cleaning device comprises at least a chassis having an annular side wall, wherein: The annular side wall includes a first straight side wall and a second straight side wall, the first straight side wall extends along a first direction, the second straight side wall is connected to one end of the first straight side wall in the first direction, and the second straight side wall is bent relative to the first straight side wall so that a bending portion is formed between the first straight side wall and the second straight side wall; The second straight side wall extends along a second direction, and the second direction intersects the first direction; The bending portion forms a front vertex of the cleaning device, the maximum circumscribed circle of the cleaning device and the maximum rotating circle of the cleaning device both pass through the front vertex, and the radius of the maximum rotating circle is greater than the radius of the maximum circumscribed circle.

2. The cleaning device according to claim 1, characterized in that The radius of the maximum rotating circle is less than or equal to the sum of √2 / 2 times the width of the chassis and a first preset value.

3. The cleaning device according to claim 1, characterized in that: The radius of the maximum circumscribed circle is less than or equal to √2 / 2 times the difference between the width of the chassis and a second preset value.

4. The cleaning device according to claim 2 or 3, characterized in that: A difference between the radius of the maximum rotating circle and the radius of the maximum circumscribed circle is greater than or equal to a third preset value.

5. The cleaning device according to claim 4, characterized in that The cleaning device also includes a side brush assembly, wherein: The side brush assembly is rotatably disposed at the bottom end of the chassis; The rotation axis of the side brush assembly is close to the bending part, and the orthographic projection of the rotation axis of the side brush assembly on the bottom surface of the annular side wall is located in the inner ring range of the annular side wall.

6. The cleaning device according to claim 5, characterized in that The track formed by the edge of the side brush assembly when rotating is at least partially located outside the first straight side wall.

7. The cleaning device according to claim 6, characterized in that The cleaning device also includes a drive assembly, wherein: The driving assembly is rollably disposed at the bottom end of the chassis, and the driving assembly and the side brush assembly are spaced apart along the first direction.

8. The cleaning device according to claim 7, characterized in that The orthographic projection of the driving component on the bottom surface of the annular sidewall is located within the inner ring range of the annular sidewall, and the orthographic projection of the driving component on the surface of the first straight sidewall is located within the surface range of the first straight sidewall.

9. The cleaning device according to claim 8, characterized in that The cleaning device also includes a roller brush assembly, wherein: The roller brush assembly is rollably disposed at the bottom end of the chassis, and the roller brush assembly is located between the side brush assembly and the driving assembly; The driving assembly comprises two driving wheels which are rollingly arranged at the bottom end of the chassis, the two driving wheels are spaced apart along the second direction, and a storage space is formed between the two driving wheels; In the second direction, at least one end of the roller brush assembly extends out of the storage space.

10. The cleaning device according to claim 5, characterized in that The cleaning device also includes a rag assembly, wherein: The rag assembly is rotatably disposed at the bottom end of the chassis, and the rag assembly and the side brush assembly are arranged at two ends of the first straight side wall along the first direction.

11. The cleaning device according to claim 10, characterized in that The orthographic projections of the two ends of the rag assembly along the second direction on the bottom surface of the annular side wall are located within the inner ring range of the annular side wall.

12. The cleaning device according to claim 11, characterized in that The annular side wall further includes a third side wall. The third side wall and the second straight side wall are respectively connected to two ends of the first straight side wall along the first direction, and the third side wall extends along the second direction.

13. The cleaning device according to claim 12, characterized in that In the first direction, one end of the rag assembly extends out of the third side wall and forms a rear vertex; The rear vertex is located on the maximum circumscribed circle, and the rear vertex rotates around the rotation axis of the cleaning device to form a rear rotation circle, and the third side wall is located in the rear rotation circle.

14. The cleaning device according to claim 13, characterized in that The third side wall is in an arc shape, and the arc center of the third side wall faces the second straight side wall.

15. The cleaning device according to claim 5, characterized in that The cleaning device further comprises a navigation assembly located in the inner cavity of the chassis, wherein: The chassis has a first end and a second end that are oppositely arranged in the first direction, and the navigation assembly and the side brush assembly are spaced apart and arranged at the first end of the chassis along the second direction; The side wall of the chassis has a light-transmitting portion, and the navigation component obtains the distance between the cleaning device and the target through the light passing through the light-transmitting portion.

16. The cleaning device according to claim 15, characterized in that The chassis further comprises a fourth straight side wall, wherein: The fourth straight side wall is connected to an end of the second straight side wall away from the first straight side wall, and the fourth straight side wall is symmetrical with the first straight side wall about the central axis of the second straight side wall; The light-transmitting portion is at least partially located on the second straight side wall, and the light-transmitting portion is at least partially located on the fourth straight side wall.

Citation Information

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