Medium-temperature-erosion-resistant protective coating and preparation method thereof

Abstract

The invention provides a medium-temperature-erosion-resistant protective coating and a preparation method of the medium-temperature-erosion-resistant protective coating, and belongs to the technical field of surface treatment. Comprising a substrate, and an argon ion etching injection layer, a combination coordination metal Ti layer, a combination strengthening TiN layer, a first vertical columnar structure MeAlSiN layer, a zigzag columnar structure MeAlSiN layer and a second vertical columnar structure MeAlSiN layer which are sequentially arranged on the substrate, and Me is Ti or Cr. The Z-shaped structure coatings with different interface orientations are designed, on one hand, deformation can be coordinated, the crack propagation direction can be changed, on the other hand, the interlayer binding force can be improved through continuous growth, and meanwhile the internal stress of the coatings is reduced.

Description

Technical Field

[0001] The invention belongs to the technical field of surface treatment, and in particular relates to a medium-temperature erosion resistant protective coating and a preparation method thereof. Background Art

[0002] When an aircraft is taking off and landing, flying at low altitude, or serving in harsh environments such as deserts, solid particles in the air such as sand and dust will have high-speed impact and friction on the blade surface under the action of high-speed airflow, causing blade erosion damage and loss, affecting engine performance, reducing life, and even causing aircraft crashes. For example, a research report released by the US military pointed out that the initial design life of the compressor blades of the turboshaft engine of the CH-6E helicopter equipped in the "Desert Storm" operation was 3000 hours, and the service life was reduced to 100 hours in the desert environment. Therefore, slowing down and avoiding erosion and wear of engine blades has become an urgent need to ensure the normal operation of the engine and safe flight.

[0003] Erosion wear is the wear caused by the impact of a fluid or solid particle fluid beam on the material surface at a certain speed and angle. Therefore, the material surface is the key to controlling the erosion dynamics. Surface coating technology can effectively reduce the damage to the blades caused by erosion wear without damaging the mechanical properties of the base material, thereby improving the stability and reliability of the engine and extending its service life. Erosion damage modes include wear, impact, fatigue and their combined effects. The main factors affecting the erosion performance of the coating depend on the hardness and toughness of the coating. Temperature also exists in actual working conditions, so improving the medium-temperature erosion resistance of the coating is the key. Summary of the invention

[0004] In order to solve the above-mentioned technical problems, the present invention provides a medium-temperature erosion-resistant protective coating and a preparation method thereof to overcome the shortcomings of the prior art. The present invention designs a zigzag structure coating with different interface orientations, which can coordinate deformation and change the direction of crack propagation on the one hand, and on the other hand, continuous growth can improve the interlayer bonding strength and reduce the internal stress of the coating.

[0005] The invention provides a medium-temperature erosion resistant protective coating, comprising a substrate and an argon ion etching injection layer, a bonding coordination metal Ti layer, a bonding strengthening TiN layer, a first vertical columnar structure MeAlSiN layer, a zigzag columnar structure MeAlSiN layer and a second vertical columnar structure MeAlSiN layer which are sequentially arranged on the substrate, wherein Me is Ti or Cr.

[0006] Erosion damage modes include wear, impact, fatigue and their combined effects. The main factors affecting the erosion performance of the coating depend on the hardness and toughness of the coating. Studies have shown that at low impact angles (<30°), hardness is an important factor affecting the erosion resistance of the coating; at high impact angles (>60°), the higher the hardness of the coating, the more likely it is to suffer erosion loss. Therefore, the key to improving the erosion resistance of the coating at all angles lies in the matching design of high hardness and toughness. The present invention designs a zigzag structure coating with different interface orientations. On the one hand, it can coordinate deformation and change the direction of crack propagation. On the other hand, continuous growth can improve the interlayer bonding force and reduce the internal stress of the coating.

[0007] In some embodiments, in the first vertical columnar structure MeAlSiN layer, the zigzag columnar structure MeAlSiN layer and the second vertical columnar structure MeAlSiN layer, based on 100%, the atomic percentages are as follows: N: 40-50%, Al: 20-25%, Me: 30-50%, Si: 6-10%.

[0008] In some embodiments, the first vertical columnar structure MeAlSiN layer, the zigzag columnar structure MeAlSiN layer, and the second vertical columnar structure MeAlSiN layer all have a face-centered cubic fcc structure, a (200) preferred orientation, and an average grain size of 30-74 μm.

[0009] In some embodiments, the thickness of the medium-temperature erosion resistance protective coating is 3-10 μm, wherein the thickness of the zigzag columnar structure MeAlSiN layer is 500-800 nm.

[0010] The second object of the present invention is to provide a method for preparing a medium-temperature erosion-resistant protective coating, the preparation method specifically comprising the following steps:

[0011] S1. Place the substrate in a vacuum chamber and evacuate until the background vacuum is less than 2.0×10 -5 Torr, chamber temperature is 150~450℃;

[0012] S2, etching the substrate using an ion beam to obtain an argon ion etching implantation layer;

[0013] S3, using magnetron sputtering technology, sequentially depositing a bonding coordination metal Ti layer and a bonding strengthening TiN layer on the surface of the argon ion etching implanted layer in step S2;

[0014] S4. Using magnetron sputtering technology, a first vertical columnar structure MeAlSiN layer, a zigzag columnar structure MeAlSiN layer and a second vertical columnar structure MeAlSiN layer are sequentially deposited on the surface of the bonding strengthening TiN layer in step S3.

[0015] In some embodiments, in step S1, the substrate is selected from one of stainless steel, high-speed steel, cemented carbide, and titanium alloy.

[0016] In some embodiments, in step S2, the parameters of the etching process are as follows: etching time is 20 min, argon gas flow rate is 35 sccm, ion beam current is 0.2 A, and ion beam power is 120 W.

[0017] In some embodiments, in step S3, the parameters for depositing the coordinated metal Ti layer are as follows: a high-purity Ti target is used, an Ar gas with a flow rate of 30 sccm is introduced into the chamber, a magnetron sputtering Ti target current is 3A, a substrate negative bias voltage is 300V, and a deposition time is 10min;

[0018] The parameters for deposition and strengthening of the TiN layer are as follows: a high-purity Ti target is used, an Ar gas with a flow rate of 30 sccm and a nitrogen gas with a flow rate of 20 sccm are introduced into the chamber, the magnetron sputtering Ti target current is 3A, the substrate negative bias voltage is 300V, and the deposition time is 10min.

[0019] In some embodiments, in step S4, the parameters for depositing the first vertical columnar structure MeAlSiN layer and the second vertical columnar structure MeAlSiN layer are as follows: a high-purity TiAlSi target is used, the argon flow rate and the nitrogen flow rate are both 30 sccm, the chamber pressure is 0.5-5 Pa, the DC magnetron sputtering target current is set to 2-6 A, the substrate bias is -200 to -500 V, the angle between the target and the substrate is 0°, and the deposition time is 30 min.

[0020] In some embodiments, in step S4, the parameters for depositing the zigzag columnar structure MeAlSiN layer are as follows: a high-purity TiAlSi target is used, the argon flow rate and the nitrogen flow rate are both 30 sccm, the chamber pressure is 0.5-5 Pa, the DC magnetron sputtering target current is set to 2-6A, and the substrate bias is -200 to -500V.

[0021] In some embodiments, the steps of depositing a zigzag columnar structure MeAlSiN layer are as follows: maintain the parameters, first rotate the target material and the substrate to an angle of 60-75°, and deposit for 30-90 minutes; then rotate the target material and the substrate to an angle of 150-165°, and deposit for 30-90 minutes; finally rotate the target material and the substrate to an angle of 60-75°, and deposit for 30-90 minutes.

[0022] Compared with the prior art, the present invention can change the columnar structure of the coating by regulating the deposition process parameters, such as current, substrate bias, chamber gas pressure, plasma angle, etc., thereby regulating the strength and toughness of the coating.

[0023] In summary, the medium-temperature erosion-resistant protective coating prepared by the technical solution of the present invention has good and tough medium-temperature erosion-resistant protective performance when oxidized at 650° in solid sodium chloride water vapor for 50 hours. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 This is a surface morphology of the medium-temperature erosion-resistant protective coating prepared in Example 1 of the present invention;

[0025] Figure 2 is a cross-sectional morphology diagram of the medium-temperature erosion-resistant protective coating prepared in Example 1 of the present invention;

[0026] Figure 3 1 is a composition diagram of the medium-temperature erosion protection coating prepared in Example 1 of the present invention and the coating prepared in Comparative Example 1;

[0027] Figure 4 It is a graph of the erosion rate of the medium-temperature erosion-resistant protective coating prepared in Example 1 of the present invention and the coating prepared in Comparative Example 1. DETAILED DESCRIPTION

[0028] In order to make the above-mentioned purposes, features and advantages of the present invention more obvious and easy to understand, the specific embodiments of the present invention are described in detail below. It should be noted that the following embodiments are only used to illustrate the implementation method and typical parameters of the present invention, and are not used to limit the parameter range described in the present invention. Reasonable changes derived therefrom are still within the scope of protection of the claims of the present invention.

[0029] It should be noted that the endpoints and any values ​​of the ranges disclosed in this article are not limited to the precise ranges or values, and these ranges or values ​​should be understood to include values ​​close to these ranges or values. For numerical ranges, the endpoint values ​​of each range, the endpoint values ​​of each range and the individual point values, and the individual point values ​​can be combined with each other to obtain one or more new numerical ranges, and these numerical ranges should be regarded as specifically disclosed in this article.

[0030] Unless otherwise defined, all terms, symbols and other scientific terms used herein are intended to have the same meaning as those commonly understood by those skilled in the art to which the present invention belongs. In some cases, terms with conventionally understood meanings are defined herein for the purpose of clarification or ease of reference, and such definitions herein should not be construed as indicating significant differences from conventional understandings in the art. The technical methods described or cited herein are generally well understood by those skilled in the art and are adopted by conventional methods. Unless otherwise stated, the use of commercially available kits, reagents and instruments is carried out in accordance with the protocols and parameters given by the manufacturer.

[0031] The technical effects of the present invention are described below in conjunction with specific embodiments.

[0032] Example 1

[0033] This embodiment provides a medium-temperature erosion resistant protective coating, which is prepared by the following steps:

[0034] (1) The titanium alloy substrate was ultrasonically cleaned with acetone and ethanol for 15 min respectively, dried and placed in a vacuum chamber, and pre-evacuated to 2.0×10 -5 Torr; 35 sccm of argon gas was introduced into the coating chamber, a DC pulse bias of -100 V was applied to the substrate, the ion beam current was set to 0.2 A, the ion beam power was set to 120 W, and the substrate surface was etched for 20 minutes;

[0035] (2) Using magnetron sputtering technology, a high-purity Ti target was used to deposit a metal Ti layer on the substrate surface. Ar gas of 30 sccm was introduced into the chamber, the magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0036] (3) A TiN layer was sputtered on the substrate surface using a high-purity Ti target. Ar gas of 30 sccm and nitrogen gas of 20 sccm were introduced into the chamber. The magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0037] (4) Introduce argon and nitrogen into the chamber at a flow rate of 30 sccm respectively, maintain the chamber pressure at 3.5 Pa, set the DC magnetron sputtering target current to 3.0 A, the substrate bias to -300 V, turn on the DC magnetron sputtering source to sputter the TiAlSi target, and deposit the coating on the target surface parallel to the substrate (0°) for 30 minutes; rotate the target material and the substrate to deposit at an angle of 60° for 30 minutes, rotate the target material and the substrate to deposit at an angle of 150° for 30 minutes, rotate the target material and the substrate to deposit at an angle of 60° for 30 minutes, and rotate the target material and the substrate to deposit at an angle of 0° for 30 minutes.

[0038] The performance of the medium-temperature erosion-resistant protective coating prepared in this embodiment was tested. Figure 1 This is a surface morphology of the medium-temperature erosion-resistant protective coating prepared in Example 1 of the present invention. Figure 2 This is a cross-sectional morphology of the medium-temperature erosion-resistant protective coating prepared in Example 1 of the present invention. Further testing shows that in the medium-temperature erosion-resistant protective coating prepared in this embodiment, the atomic percentage of Ti:Al:Si:N in the first vertical columnar structure MeAlSiN layer, the zigzag columnar structure MeAlSiN layer and the second vertical columnar structure MeAlSiN layer is 30:20:10:40, the preferred orientation is (200), the average grain size is 74nm, and the erosion rate is 0.0117±0.0083mg / g.

[0039] Example 2

[0040] This embodiment provides a medium-temperature erosion resistant protective coating, which is prepared by the following steps:

[0041] (1) The stainless steel substrate was ultrasonically cleaned with acetone and ethanol for 15 min respectively, dried and placed in a vacuum chamber, and pre-evacuated to 2.0×10 -5 Torr; 35 sccm of argon gas was introduced into the coating chamber, a DC pulse bias of -100 V was applied to the substrate, the ion beam current was set to 0.2 A, the ion beam power was set to 120 W, and the substrate surface was etched for 20 minutes;

[0042] (2) Using magnetron sputtering technology, a high-purity Ti target was used to deposit a metal Ti layer on the substrate surface. Ar gas of 30 sccm was introduced into the chamber, the magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0043] (3) A TiN layer was sputtered on the substrate surface using a high-purity Ti target. Ar gas of 30 sccm and nitrogen gas of 20 sccm were introduced into the chamber. The magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0044] (4) Argon and nitrogen were introduced into the chamber at flow rates of 50 sccm and 50 sccm respectively, the chamber pressure was maintained at 5 Pa, the DC magnetron sputtering target current was set to 2.0 A, the substrate bias was set to -200 V, the DC magnetron sputtering source was turned on to sputter the TiAlSi target, and the coating was deposited on the target surface parallel to the substrate (0°) for 60 minutes; the target was rotated at an angle of 75° to the substrate for deposition for 60 minutes, the target was rotated at an angle of 165° to the substrate for deposition for 60 minutes, the target was rotated at an angle of 75° to the substrate for deposition for 60 minutes, and the target was rotated at an angle of 0° to the substrate for deposition for 60 minutes.

[0045] Example 3

[0046] This embodiment provides a medium-temperature erosion resistant protective coating, which is prepared by the following steps:

[0047] (1) The titanium alloy substrate was ultrasonically cleaned with acetone and ethanol for 15 min respectively, dried and placed in a vacuum chamber, and pre-evacuated to 2.0×10 -5 Torr; 35 sccm of argon gas was introduced into the coating chamber, a DC pulse bias of -100 V was applied to the substrate, the ion beam current was set to 0.2 A, the ion beam power was set to 120 W, and the substrate surface was etched for 20 minutes;

[0048] (2) Using magnetron sputtering technology, a high-purity Ti target was used to deposit a metal Ti layer on the substrate surface. Ar gas of 30 sccm was introduced into the chamber, the magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0049] (3) A TiN layer was sputtered on the substrate surface using a high-purity Ti target. Ar gas of 30 sccm and nitrogen gas of 20 sccm were introduced into the chamber. The magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0050] (4) Argon and nitrogen are introduced into the chamber at flow rates of 20 sccm and 10 sccm respectively, the chamber pressure is maintained at 0.5 Pa, the DC magnetron sputtering target current is set to 6.0 A, the substrate bias is -500 V, the DC magnetron sputtering source is turned on to sputter the TiAlSi target, and the coating is deposited on the target surface parallel to the substrate (0°) for 90 minutes; the target is rotated at an angle of 65° to the substrate for deposition for 90 minutes, the target is rotated at an angle of 155° to the substrate for deposition for 90 minutes, the target is rotated at an angle of 65° to the substrate for deposition for 90 minutes, and the target is rotated at an angle of 0° to the substrate for deposition for 90 minutes.

[0051] Comparative Example 1

[0052] This comparative example provides a coating, which is prepared by the following steps:

[0053] (1) The titanium alloy substrate was ultrasonically cleaned with acetone and ethanol for 15 min respectively, dried and placed in a vacuum chamber, and pre-evacuated to 2.0×10 -5 Torr; 35 sccm of argon gas was introduced into the coating chamber, a DC pulse bias of -100 V was applied to the substrate, the ion beam current was set to 0.2 A, the ion beam power was set to 120 W, and the substrate surface was etched for 20 minutes;

[0054] (2) Using magnetron sputtering technology, a high-purity Ti target was used to deposit a metal Ti layer on the substrate surface. Ar gas of 30 sccm was introduced into the chamber, the magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0055] (3) A TiN layer was sputtered on the substrate surface using a high-purity Ti target. Ar gas of 30 sccm and nitrogen gas of 20 sccm were introduced into the chamber. The magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0056] (4) Introduce argon and nitrogen into the chamber at a flow rate of 30 sccm respectively, maintain the chamber pressure at 3.5 Pa, set the DC magnetron sputtering target current to 3.0 A, the substrate bias to -300 V, turn on the DC magnetron sputtering source to sputter the TiAl target, and deposit the coating on the target surface parallel to the substrate (0°) for 30 minutes; rotate the target material and the substrate at an angle of 60° for deposition for 30 minutes, rotate the target material and the substrate at an angle of 150° for deposition for 30 minutes, rotate the target material and the substrate at an angle of 60° for deposition for 30 minutes, and rotate the target material and the substrate at an angle of 0° for deposition for 30 minutes.

[0057] The difference between this comparative example and Example 1 is that the deposition process is the same, but a TiAl target is used, so the composite layer in the coating includes a first vertical columnar structure TiAlN layer, a zigzag columnar structure TiAlN layer and a second vertical columnar structure TiAlN layer, and in the first vertical columnar structure TiAlN layer, the zigzag columnar structure TiAlN layer and the second vertical columnar structure TiAlN layer: the atomic percentage of Ti:Al:N is 30:30:40, the preferred orientation is (200), the average grain size is 87nm, and the erosion rate is 0.162±0.029mg / g.

[0058] The performance of the coating prepared in this comparative example was tested and compared with the performance of the medium-temperature erosion protection coating prepared in Example 1. Figure 3 1 is a composition diagram of the medium-temperature erosion protection coating prepared in Example 1 of the present invention and the coating prepared in Comparative Example 1; Figure 4 is a graph of the erosion rate of the medium-temperature erosion-resistant protective coating prepared in Example 1 of the present invention and the coating prepared in Comparative Example 1; Figure 3 and Figure 4 It can be seen that the composite coating with the atomic ratio of the present invention has a lower erosion rate. Therefore, the anti-medium-temperature erosion protective coating obtained by the present invention has good strong and tough anti-medium-temperature erosion protective performance.

[0059] Comparative Example 2

[0060] This comparative example provides a coating, which is prepared by the following steps:

[0061] (1) The titanium alloy substrate was ultrasonically cleaned with acetone and ethanol for 15 min respectively, dried and placed in a vacuum chamber, and pre-evacuated to 2.0×10 -5 Torr; 35 sccm of argon gas was introduced into the coating chamber, a DC pulse bias of -100 V was applied to the substrate, the ion beam current was set to 0.2 A, the ion beam power was set to 120 W, and the substrate surface was etched for 20 minutes;

[0062] (2) Using magnetron sputtering technology, a high-purity Ti target was used to deposit a metal Ti layer on the substrate surface. Ar gas of 30 sccm was introduced into the chamber, the magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0063] (3) A TiN layer was sputtered on the substrate surface using a high-purity Ti target. Ar gas of 30 sccm and nitrogen gas of 20 sccm were introduced into the chamber. The magnetron sputtering Ti target current was 3A, the substrate negative bias voltage was 300 V, and the deposition time was 10 min.

[0064] (4) Argon and nitrogen were introduced into the chamber at a flow rate of 30 sccm respectively, the chamber pressure was maintained at 3.5 Pa, the DC magnetron sputtering target current was set to 3.0 A, the substrate bias was set to -300 V, and the DC magnetron sputtering source was turned on to sputter the TiAlSi target, and the coating was deposited on the target surface parallel to the substrate (0°) for 90 minutes.

[0065] The difference between this comparative example and Example 1 is that the coating materials on the Ti layer and the TiN layer are both TiAlSiN, but do not have a zigzag structure. After testing, it can be found that the erosion rate of the coating prepared in this comparative example is 0.154±0.032 mg / g.

[0066] It can be seen from the above results that the zigzag structure coating with different interface orientations designed in the present invention can coordinate deformation and change the direction of crack propagation on the one hand, and on the other hand, the continuous growth can improve the interlayer bonding strength and reduce the internal stress of the coating.

[0067] Although the disclosure is disclosed as above, the protection scope of the disclosure is not limited thereto. Those skilled in the art can make various changes and modifications without departing from the spirit and scope of the disclosure, and these changes and modifications will fall within the protection scope of the present invention.

Claims

1. A medium-temperature erosion-resistant protective coating, characterized in that: The invention comprises a substrate and an argon ion etching implantation layer, a bonding coordination metal Ti layer, a bonding strengthening TiN layer, a first vertical columnar structure MeAlSiN layer, a zigzag columnar structure MeAlSiN layer and a second vertical columnar structure MeAlSiN layer which are sequentially arranged on the substrate, wherein Me is Ti or Cr.

2. The medium-temperature erosion-resistant protective coating according to claim 1, characterized in that: In the first vertical columnar structure MeAlSiN layer, the zigzag columnar structure MeAlSiN layer and the second vertical columnar structure MeAlSiN layer, based on 100%, the atomic percentage contents are as follows: N: 40-50%, Al: 20-25%, Me: 30-50%, Si: 6-10%.

3. The medium-temperature erosion-resistant protective coating according to claim 1, characterized in that: The first vertical columnar structure MeAlSiN layer, the zigzag columnar structure MeAlSiN layer and the second vertical columnar structure MeAlSiN layer all have a face-centered cubic fcc structure, a (200) preferred orientation, and an average grain size of 30-74 μm.

4. The medium-temperature erosion-resistant protective coating according to claim 1, characterized in that: The thickness of the medium-temperature erosion resistance protective coating is 3-10 μm, wherein the thickness of the zigzag columnar structure MeAlSiN layer is 500-800 nm.

5. A method for preparing the medium-temperature erosion-resistant protective coating according to any one of claims 1 to 4, characterized in that: The preparation method specifically comprises the following steps: S1. Place the substrate in a vacuum chamber and evacuate until the background vacuum is less than 2.0×10 -5 Torr, chamber temperature is 150~450℃; S2, etching the substrate using an ion beam to obtain an argon ion etching implantation layer; S3, using magnetron sputtering technology, sequentially depositing a bonding coordination metal Ti layer and a bonding strengthening TiN layer on the surface of the argon ion etching implanted layer in step S2; S4. Using magnetron sputtering technology, a first vertical columnar structure MeAlSiN layer, a zigzag columnar structure MeAlSiN layer and a second vertical columnar structure MeAlSiN layer are sequentially deposited on the surface of the bonding strengthening TiN layer in step S3.

6. The method for preparing the medium-temperature erosion-resistant protective coating according to claim 5, characterized in that: In the step S1, the substrate is selected from one of stainless steel, high speed steel, cemented carbide and titanium alloy.

7. The method for preparing the medium-temperature erosion-resistant protective coating according to claim 5, characterized in that: In step S2, the parameters of the etching process are as follows: etching time is 20 minutes, argon gas flow rate is 35 sccm, ion beam current is 0.2A, and ion beam power is 120W.

8. The method for preparing the medium-temperature erosion resistant protective coating according to claim 5, characterized in that: In step S3, the parameters for depositing the coordinated metal Ti layer are as follows: a high-purity Ti target is used, an Ar gas with a flow rate of 30 sccm is introduced into the cavity, a magnetron sputtering Ti target current is 3A, a substrate negative bias voltage is 300V, and a deposition time is 10min; The parameters for deposition and strengthening of the TiN layer are as follows: a high-purity Ti target is used, an Ar gas with a flow rate of 30 sccm and a nitrogen gas with a flow rate of 20 sccm are introduced into the chamber, the magnetron sputtering Ti target current is 3A, the substrate negative bias voltage is 300V, and the deposition time is 10min.

9. The method for preparing the medium-temperature erosion resistant protective coating according to claim 5, characterized in that: In the step S4, the parameters for depositing the first vertical columnar structure MeAlSiN layer and the second vertical columnar structure MeAlSiN layer are as follows: a high-purity TiAlSi target is used, the argon flow rate and the nitrogen flow rate are both 30 sccm, the chamber pressure is 0.5-5 Pa, the DC magnetron sputtering target current is set to 2-6 A, the substrate bias is -200 to -500 V, the angle between the target and the substrate is 0°, and the deposition time is 30 min.

10. The method for preparing the medium-temperature erosion-resistant protective coating according to claim 5, characterized in that: In the step S4, the parameters for depositing the zigzag columnar structure MeAlSiN layer are as follows: a high-purity TiAlSi target is used, the argon flow rate and the nitrogen flow rate are both 30 sccm, the chamber pressure is 0.5-5 Pa, the DC magnetron sputtering target current is set to 2-6 A, and the substrate bias voltage is -200 to -500 V; The steps of depositing the zigzag columnar structure MeAlSiN layer are as follows: maintain the parameters, first rotate the target material and the substrate to an angle of 60-75°, and deposit for 30-90 minutes; then rotate the target material and the substrate to an angle of 150-165°, and deposit for 30-90 minutes; finally rotate the target material and the substrate to an angle of 60-75°, and deposit for 30-90 minutes.

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