Cleaning fluid dispensing system for substrate containers and method of performing same

Abstract

The invention relates to a cleaning fluid dispensing system for a substrate container and a method of performing the same. A substrate container includes a housing defining an interior space and a purge fluid dispensing system. The shell comprises a front opening, a bottom wall and a rear wall. The purge fluid distribution system receives a flow of purge gas and includes an inlet and a network of separate gas distribution devices configured to distribute the flow of purge gas into the interior space. Also included is a supply line connected to the inlet and configured to divide a supply of purge gas to the network of separate gas distribution devices. A method of cleaning an open substrate container includes supplying a flow of cleaning gas to an inlet of a cleaning fluid distribution system and dividing the cleaning gas to supply a network of separate gas distribution devices to distribute the flow of cleaning gas into the interior space.

Description

[0001] Divisional Application Information

[0002] This application is a divisional application of the invention patent application with the application date of October 25, 2022, application number 202280077619.5, and invention name “Cleaning fluid dispensing system for substrate container and its execution method”.

[0003] priority

[0004] This disclosure claims priority to U.S. Provisional Patent Application No. 63 / 272,282, filed on October 27, 2021. The priority document is incorporated herein by reference. Technical Field

[0005] The present disclosure generally relates to a substrate container with a front opening for processing semiconductor devices. More specifically, the present disclosure relates to a cleaning gas distribution system for distributing cleaning gas into the interior of the substrate container and a method for performing the same. Background Art

[0006] A substrate in the form of a wafer may be processed to form a semiconductor device. A wafer substrate (or simply a substrate) undergoes a series of process steps. Exemplary process steps may include, but are not limited to, deposition of a material layer, doping, etching, or chemical or physical reaction of the material of the substrate. A substrate container is used to store and transport the wafers in process between process steps within a manufacturing facility. During some process steps, the substrate is processed by processing equipment in a clean environment (e.g., a clean room). During processing, such as during a cleaning process, gases must be introduced into and removed from a substrate container, such as a front-opening wafer transport box (FOUP), thus requiring the FOUP to have one or more locations where gases can enter or leave the FOUP. The substrate may be transferred from the substrate container to the processing tool via an equipment front end module (EFEM). The EFEM typically includes a load port for receiving a substrate container, a transfer unit, a frame or "mini-environment," and a fan filter unit for generating airflow within the EFEM.

[0007] In use, a substrate container is docked on the load port and the door of the EFEM is opened. Next, the door is disengaged from the substrate container, which allows a transfer unit housed within the EFEM to access substrates contained within the substrate container for processing. The airflow introduced by the fan filter unit flows through the EFEM in a direction from the top of the EFEM to the bottom of the EFEM. When the front opening of the substrate container interfaces with the load port opening of the EFEM, some of the gas flowing through the EFEM and through the load port opening may be inadvertently introduced into the interior of the container, thereby potentially interfering with the cleaning capabilities of the substrate container by temporarily causing an increase in relative humidity and / or oxygen levels within the microenvironment of the substrate container, which may be undesirable. Summary of the invention

[0008] The present disclosure relates to a system for distributing cleaning gas to a wafer or reticle carrying container, such as a FOUP or a box (e.g., a reticle box) used in, for example, semiconductor manufacturing. More specifically, the present disclosure relates to a cleaning fluid distribution system within a FOUP or a reticle box for distributing a cleaning gas flow into an interior space of a substrate container by dividing the cleaning gas flow from a common input port to a plurality of discrete input cleaning ports for supplying a network of separate gas distribution devices.

[0009] In at least one example embodiment, a substrate container includes a shell defining an interior space, wherein the shell includes a front opening, a first side wall, a second side wall, a rear wall, and a bottom wall, the bottom wall including a front edge extending between the first side wall and the second side wall along the front opening of the shell. The substrate container also includes a cleaning fluid distribution system configured to receive a cleaning gas flow, wherein the cleaning fluid distribution system includes an inlet configured to receive the cleaning gas flow and a network of separate gas distribution devices configured to distribute the cleaning gas flow to the interior space. The cleaning fluid distribution system further includes a supply line connected to the inlet, the supply line being configured to divide the cleaning gas flow to the network of separate gas distribution devices. According to at least one example embodiment, the supply line includes a first flow path leading to one of the networks of separate gas distribution devices and a second flow path leading to another of the networks of separate gas distribution devices. In an embodiment, one of the networks of gas distribution devices is a first gas distribution device provided closer to the rear wall and the other of the network of gas distribution devices is a second gas distribution device, wherein the second gas distribution device may be provided closer to the front opening, and wherein the first flow path is configured to supply a portion of the cleaning gas flow to the first gas distribution device and the second flow path is configured to supply another portion of the cleaning gas flow to the second gas distribution device. It should be understood that the second gas distribution device may also be provided at other locations within the interior of the substrate container, for example, behind or near another gas distribution device, and is not limited to the above embodiments. According to at least one other example embodiment, the cleaning fluid distribution system further includes a manifold base provided on the bottom wall, the manifold base receiving the cleaning gas flow from the inlet to divide the cleaning gas flow to the network of gas distribution devices, wherein the manifold base may be configured to divide the second flow path into at least a left second flow path and a right second flow path to supply the portion of the cleaning gas flow to the second gas distribution device.

[0010] In at least one example embodiment, a method for cleaning a substrate container when a front opening is open includes: supplying a cleaning gas flow to an inlet of a cleaning fluid distribution system at least partially disposed within the substrate container via an inlet port disposed in a wall of the substrate container; and dividing the cleaning gas via a supply line of the cleaning fluid distribution system to supply a network of separate gas distribution devices for distributing the cleaning gas flow to an interior space of the substrate container, wherein the supply line includes at least a first flow path to one of the networks of gas distribution devices and at least a second flow path to another of the networks of separate gas distribution devices. In an embodiment, the method further includes disposing a first portion of the cleaning gas flow via the first flow path to a first gas distribution device and disposing a second portion of the cleaning gas flow via the second flow path to a second gas distribution device. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] Both the described and other features, aspects and advantages of the substrate container and method of cleaning the substrate container may be better understood using the following drawings:

[0012] Figure 1 is a front perspective view of a substrate container according to at least one example embodiment.

[0013] Figure 2 is an exploded view of a substrate container according to at least one example embodiment.

[0014] Figures 3A to 3C is a schematic diagram of a substrate container having a cleaning fluid distribution system configured to divide the supply of cleaning gas according to various embodiments.

[0015] Figure 4A is a rear perspective view of a substrate container having a cleaning fluid distribution system configured to distribute a supply of cleaning gas according to at least one example embodiment.

[0016] Figure 4B According to at least one example embodiment Figure 4A A top side cross-sectional view of a substrate container.

[0017] Figure 5A is a rear perspective view of a substrate container having a cleaning fluid distribution system configured to divide the supply of cleaning gas using a manifold substrate according to at least one example embodiment.

[0018] Figure 5B is configured to divide the supply of cleaning gas according to various embodiments Figure 5A Schematic diagram of the manifold substrate.

[0019] Figure 5C According to at least one example embodiment Figure 5A A bottom side view of a substrate container.

[0020] Figure 6 is a flow chart of a method of cleaning a substrate container according to at least one example embodiment, the method including dividing a supply of cleaning gas to a network of separate gas distribution devices.

[0021] Although the present disclosure is susceptible to various modifications and alternative forms, details thereof have been shown by way of example in the accompanying drawings and will be described in detail. However, it should be understood that the purpose is to limit the aspects of the present disclosure to the specific illustrative embodiments described. On the contrary, the purpose is to cover all modifications, equivalents and alternatives that fall within the spirit and scope of the present disclosure. DETAILED DESCRIPTION

[0022] As used herein, the term "network of gas distribution devices" means a network comprising a plurality of separate and different gas distribution devices, which are connected together by at least one supply line. The term "gas distribution device" means a device comprising at least one gas distribution surface, and is a combination of any plurality of gas distribution surfaces provided at certain specific positions in the substrate container, for example, the front gas distribution device includes all gas distribution surfaces provided at the front of the substrate container. The term "gas distribution surface" means a structural portion of a gas distribution device that distributes a portion of the cleaning gas from the gas distribution device to the internal space, wherein the gas distribution device may include a plurality of gas distribution surfaces. The term "supply line" means a pipe, a pipe, a pipe fitting connected to an inlet port for receiving cleaning gas and used to divide and supply cleaning gas to the input cleaning port of the gas distribution device and / or the gas distribution surface. That is, the supply line can be used to supply cleaning gas to a single input cleaning port of the gas distribution device / gas distribution surface or to supply cleaning gas along multiple input cleaning ports of the gas distribution device / gas distribution surface. The term "conduit" or "piping" means a structure for distributing cleaning gas flow through a network of gas distribution devices and includes conduits, pipes, tubing, passages, connectors, valves, controllers and similar structures that can be used to set / regulate the flow of gas through the network of gas distribution devices.

[0023] Also as used herein, although the terms "front" and "rear" and "right" and "left" are used to describe various elements, the elements are not limited by these terms. Instead, the terms are only used to distinguish one element from another. Instead, the terms are broadly interpreted to include any positional relationship between elements, including front, rear, side, top, bottom, or any combination thereof, without departing from the scope of the present disclosure.

[0024] As used in this specification and the appended claims, the singular forms "a," "an," and "the" include plural referents unless the content clearly dictates otherwise. As used in this specification and the appended claims, the term "or" is generally used in its sense including "and / or" unless the content clearly dictates otherwise.

[0025] The following detailed description should be read with reference to the accompanying drawings, in which similar elements in different drawings are numbered the same. The detailed description and drawings, which are not necessarily drawn to scale, depict illustrative embodiments and are not intended to limit the scope of the invention. The illustrative embodiments depicted are intended to be exemplary only. Selected features of any illustrative embodiment may be incorporated into additional embodiments unless expressly stated otherwise.

[0026] The present disclosure generally relates to a cleaning fluid distribution system for a substrate container having a front opening for accessing an interior space of the substrate container. More specifically, the present disclosure relates to a cleaning fluid distribution system configured to distribute a cleaning gas flow into the interior space of the substrate container by dividing the cleaning gas flow from a common source to a plurality of discrete input cleaning ports to supply a network of separate gas distribution devices. In some embodiments, the cleaning fluid distribution system can be configured to prevent gas from entering the front opening of the substrate container when open or to act as an outlet to facilitate the discharge of cleaning gas from the substrate container when the substrate container is closed.

[0027] A substrate in the form of a wafer may be processed to form a semiconductor device. A substrate container is a container for holding a substrate during processing. The substrate may be stored in the substrate container before and during different processing steps. The substrate container is accessed through a front opening of the substrate container. The substrate container may be, for example, a front opening pod (FOUP). In an embodiment, the substrate container may be a container for a reticle, such as a reticle box. In this embodiment, a container body may be included as at least part of an outer box configured to accommodate an inner box, wherein the cleaning fluid distribution system includes a fluid distribution system base configured to provide a cleaning gas to an interior space of the outer box.

[0028] Figures 1 to 2 A substrate container 1 according to an embodiment of the present disclosure is shown. Figure 1 is a front perspective view of the substrate container 1, and Figure 2 A substrate container is shown with its door removed (e.g., open). Figure 1 , the substrate container 1 includes a front door 4 and a shell 6. The front door 4 is received in the front opening 12 of the shell 6, blocking the front opening 12.

[0029] Figure 2 The substrate container 1 is shown with the front door 4 removed (eg, opened). Figure 2, the housing 6 defines an interior space 8 of the substrate container, wherein the substrate is stored in the interior space 8 of the substrate container 1. The substrate container 1 can be accessed by moving (eg, opening, removing) the door 4. For example, Figure 1 The door 4 in the housing 6 is received in the housing 6 by inserting the door 4 into the housing 6. In an embodiment, one or more of the door 4 and the housing 6 may include a locking mechanism (not shown) to prevent accidental removal of the door 4.

[0030] like Figure 2 As further shown in , the shell 6 includes a first side wall 14, a second side wall 16, a rear wall 18, and a top wall 20 and a bottom wall 22. The first side wall 14 is opposite to the second side wall 16, and the top wall 20 is opposite to the bottom wall 22. The first side wall 14 can be referred to as the left side, and the second side wall 16 can be referred to as the right side. The top wall 20 and the bottom wall 22 each extend between the first side wall 14 and the second side wall 16. The shell 6 includes a front edge extending between the opposing walls. The bottom wall 22 includes a front edge 24A extending along the front opening 12. The front edge 24A also extends between the first side wall 14 and the second side wall 16 of the shell 6. The first side wall 14 includes a front edge 24B extending along the front opening 12. The front edge 24B of the first side wall 14 also extends between the top wall 20 and the bottom wall 22 of the shell 6. As shown in FIG. Figure 2 , in an embodiment shown, the front edges 24A, 24B are each directly adjacent to the front opening 12 .

[0031] The substrate container 1 may include an equipment hook 26 located on the top wall 20 of the housing 6. In an embodiment, the equipment hook 26 allows a standard robotic attachment (not shown) (such as (but not limited to) a robotic arm) for moving the substrate container 1 to be connected to the substrate container 1. For example, a robotic arm can be used to move the substrate container 1 between different processing equipment. In an embodiment, the substrate container 1 may include one or more handles (not shown) to allow a user (e.g., a technician, etc.) to manually move the substrate container 1.

[0032] The substrate container 1 may include a plurality of shelves 28 for holding substrates (not shown) in the interior space 8. The portion of the shelf 28 on the second side wall 16 is Figure 2 1 and 2. The shelves 28 are shielded in the interior space 8 and have a similar configuration (e.g., slots in substrate containers) as portions on the shelves 28 on the first sidewall 14. The shelves 28 are sized to each hold a substrate (not shown) within the interior space 8. For example, in an embodiment, the shelves 28 are sized to hold substrates of a particular size (e.g., 150 mm wafers, 200 mm wafers, etc.).

[0033] The substrate container 1 may include a plurality of inlet cleaning ports and / or outlet cleaning ports (eg, Figure 230A, 30B, 30C, etc. of the housing 6). A plurality of inlet cleaning ports (and outlet cleaning ports) may be connected to a cleaning fluid distribution system, as discussed further below. At least one outlet port may be provided for exhausting gas in the interior space 8 to the outside of the substrate container 1 and may be disposed in the bottom wall between the inlet and the second side wall. It should be appreciated that the inlet cleaning port and / or the outlet cleaning port may also be provided in different locations along the housing 6, such as in the rear wall 18, in which embodiment the inlet cleaning port and / or the outlet cleaning port correspond to the inlet and outlet of the substrate container.

[0034] The substrate container 1 also includes at least one inlet, such as an inlet port, for receiving a flow of cleaning gas from a cleaning gas supply system. The cleaning gas supply system delivers a cleaning gas, which may typically be an inert gas. The cleaning gas may include, for example but not limited to, one or more of nitrogen, clean dry air (CDA), and ultra clean dry air (xCDA).

[0035] In an embodiment, the inlet port is connected to a cleaning fluid distribution system for supplying cleaning gas to the inlet cleaning port to distribute the cleaning gas into the interior space 8. When the substrate container 1 is open, the cleaning fluid distribution system can be used to distribute the cleaning gas into the interior space 8 to reduce the external environment (e.g., gas, particles, moisture, etc.) from entering the substrate container 1 through the front opening 12. For example, the supplied cleaning gas is configured to flow out of the interior space 8 through the front opening 12, which helps to minimize any inward flow entering the interior space 8 through the front opening 12.

[0036] In contrast, when the door 4 is received in the front opening 12 and the substrate container 1 is closed, the cleaning gas can continue to be supplied to the interior space 8 of the substrate container 1. The cleaning gas can also be exhausted to the exterior of the substrate container 1 through a cleaning fluid distribution system, such as described herein according to various embodiments, which can be used as an inlet and an outlet or only as an outlet, depending on the configuration and desired application. The positive pressure of the cleaning gas within the interior space 8 creates a diffusion gradient that promotes the flow of the cleaning gas from the interior space through one or more outlets and out of the substrate container.

[0037] Figure 3AAn embodiment of a cleaning fluid distribution system 340 is schematically shown. The cleaning fluid distribution system 340 is connected to the inlet port 305 to receive cleaning gas from the cleaning supply system. The cleaning fluid distribution system 340 further includes a network of separate gas distribution devices 350 for distributing the cleaning gas flow to the interior space 8. The supply line 360 ​​connected to the inlet is used to divide the cleaning gas flow to the network of separate gas distribution devices 350. For example, in an embodiment, the supply line includes at least a first flow path 360A connected to the first gas distribution device 350A and at least a second flow path 360B connected to the second gas distribution device 350B. However, it should be understood that for the cleaning operation of the substrate container, as needed, the supply line 360 ​​can be divided into any number of different flow paths, for example, additional third, fourth, etc. flow paths to supply cleaning gas to separate and / or the same gas distribution devices in the substrate container 1. That is, the supply line 360 ​​is configured to receive a supply of purge gas from a common input port (eg, a purge gas source) and divide the supply of purge gas to a plurality of discrete input purge ports for supplying a plurality of gas distribution devices 350 .

[0038] The network of separate gas distribution devices comprises a plurality of separate and distinct gas distribution devices 350 connected together by at least one supply line 360. Thus, the network of separate gas distribution devices comprises separate gas distribution devices 350 and associated conduits connecting the separate distribution devices for distributing the cleaning gas fluid to the interior of the substrate container 1.

[0039] The gas distribution device 350 is a device that is separate and different from other gas distribution devices of the network, wherein each gas distribution device includes at least one gas distribution surface, and is a combination of any of a plurality of gas distribution surfaces 351A, 351B, 351C provided at certain specific locations in the substrate container, for example, the front gas distribution device includes any and all of the gas distribution surfaces 351A, 351B provided in front of the substrate container. That is, the gas distribution device is a combination of any or all of a plurality of gas distribution surfaces provided at specific locations of the substrate container, wherein the gas distribution surface is a structural part of the gas distribution device that distributes a portion of the cleaning gas from the gas distribution device into the interior space. It should be understood that the gas distribution surface 351A, 351B, 351C is connected to at least one input cleaning port and includes a structure for distributing the cleaning gas into the interior space, such as a diffuser, a manifold, a membrane, a portion having a slit or a nozzle, or a portion made of a porous material, or a similar structure and a combination thereof that is capable of guiding the cleaning gas into the interior of the substrate container.

[0040] For example, in an embodiment, the first gas distribution device 350A is located at the rear section of the FOUP, for example, closer to the rear wall 18 and may include at least one gas distribution surface 351A, 351B, such as a first and / or second diffuser, which is connected to at least one input purge port. The second gas distribution device 350B may be located at the front section of the FOUP, for example, closer to the front opening 12 and may include at least one gas distribution surface 351C, which includes a plurality of openings arranged along the length of the gas distribution surface between the first sidewall and the second sidewall or extending vertically along one of the front edges of the first sidewall or the second sidewall, such as a top / bottom manifold and / or a right / left manifold connected to at least one other input purge port. The supply line 360 ​​is divided into a first flow path 360A to supply at least a portion of the purge gas flow to the input purge port of the first gas distribution device 350A and divided into a second flow path 360B to supply at least another portion of the purge gas flow to the input purge port of the second gas distribution device 350B. It should be understood that the first and second gas distribution devices are not necessarily located at the rear section and the front section, but are provided by way of example, and may be provided at different (or the same) locations in the interior space of the substrate container.

[0041] The amount of cleaning gas supplied to the first flow path 360A and the second flow path 360B to supply the separate gas distribution devices 350A, 350B can be set in a variety of ways. For example, in an embodiment, a valve may be provided in the supply line and, for example, the valve may be set to a predetermined opening size to divide the supply of cleaning gas to the first flow path 360A and the second flow path 360B to supply a predetermined amount of cleaning gas to the separate gas distribution devices 350A, 350B. The valve may include a needle valve, a ball valve, a butterfly valve, a check valve, or a valve of similar structure, which is used to set the cleaning gas flow to different and separate gas distribution devices. It should be understood that the amount of cleaning gas can also be set as needed using an orifice, a spring-loaded diverter, or having one of the first or second flow paths have a pipe / conduit with a smaller or larger cross-sectional area to divide the supply of cleaning gas into appropriate / predetermined amounts to supply the gas distribution device, for example, the division / supply of cleaning gas is based on the pressure difference of the network. It should also be understood that the cleaning gas amount can be set to each separate gas distribution surface 351A, 351B, 351C. In other words, the supply of cleaning gas from a single inlet port is divided and arranged so that a predetermined amount of cleaning gas is supplied to multiple discrete input cleaning ports for supplying gas distribution devices and / or gas distribution surfaces respectively.

[0042] Figure 3B Another embodiment of a cleaning fluid distribution system 340 is described, wherein the inlet comprises at least two inlet ports 305A and 305B. Figure 3BIn an embodiment of the present invention, the cleaning fluid distribution system 340 is connected to two inlet ports 305A, 305B to receive cleaning gas from a cleaning gas supply system. The cleaning fluid distribution system further includes a network of separate gas distribution devices 350 for distributing cleaning gas into the interior of the interior space 8. However, in this embodiment, the supply line 360 ​​is connected to the two inlet ports 305A and 305B, so that the supply of cleaning gas is combined and then divided to at least a first flow path 360A connected to the first gas distribution device 350A and a second flow path 360B connected to the second gas distribution device 350B. It should be understood that the supply of cleaning gas can be mixed / combined from the junction of pipes from the supply lines of the inlet ports 305A, 305B, or (for example) mixed using an in-line mixer, and then divided / separated into different flow paths 360A, 360B. As discussed above, the first gas distribution device 350A and the second gas distribution device 350B each include at least one gas distribution surface for distributing cleaning gas into the interior of the substrate container.

[0043] The amount of cleaning gas supplied to the first flow path 360A and the second flow path 360B to supply the separate gas distribution devices 350A, 350B can be arranged in a variety of ways. For example, in an embodiment, valves may be provided upstream and / or downstream of the mixing / combining of the supply of cleaning gas from the inlet ports 305A, 305B and arranged to divide the supply of cleaning gas into predetermined amounts of cleaning gas for the separate gas distribution devices 350A, 350B and / or the separate gas distribution surfaces 351A, 351B, 351C. In other words, the supply of cleaning gas from the two inlet ports 305A, 305B is divided and arranged so that predetermined amounts of cleaning gas are supplied to multiple discrete input cleaning ports for supplying the separate gas distribution devices and / or the separate gas distribution surfaces, respectively.

[0044] Figure 3CA further embodiment of a cleaning fluid distribution system 340 is described, wherein the inlet comprises at least two inlet ports 305A and 305B, wherein the inlet ports are individually used to supply different networks of separate gas distribution devices. That is, the cleaning fluid distribution system 340 comprises at least two networks of separate gas distribution devices 350 for distributing the cleaning gas flow into the interior space 8. In this embodiment, the cleaning fluid distribution system 340 comprises at least two separate supply lines 360, 370, each of which is separately connected to the inlet ports 305A and 305B. The first supply line 360 ​​connected to the inlet port 305A is used to divide the supply of cleaning gas from the inlet port 305A to at least a first flow path 360A connected to a first gas distribution device 350A having gas distribution surfaces 351A, 351B and a second flow path 360B connected to a second gas distribution device 350B having at least one gas distribution surface 351C. The second supply line 370 connected to the inlet port 305B is used to divide the supply of the cleaning gas from the inlet port 305B to at least a first flow path 370A connected to a third gas distribution device 350C having at least two gas distribution surfaces 351D, 351E and a second flow path 370B connected to a fourth gas distribution device 350D having at least one gas distribution surface 351F.

[0045] The first and second flow paths supplied to at least two networks of separate gas distribution devices to supply the separate gas distribution devices 350A, 350B, 350C, 350D with the amount of cleaning gas can be arranged in a variety of ways. For example, in an embodiment, valves can be provided in the supply lines 360, 370 and arranged to divide the supply of cleaning gas into predetermined amounts of cleaning gas for the separate gas distribution devices 350A, 350B, 350C, 350D and / or the separate gas distribution surfaces 351A, 351B, 351C, 351D, 351E, 351F. In other words, the supply of cleaning gas from the inlet ports 305A, 305B is each separately used to supply a respective supply line, wherein the respective respective supply line is used to divide and arrange the predetermined amounts of cleaning gas supplied to the plurality of discrete input cleaning ports for supplying the separate gas distribution devices.

[0046] It should be understood that although Figures 3A to 3CThe supply line 360 ​​(or 370) is shown divided before supplying the separate gas distribution devices, but the supply line may be divided into any number of different flow paths that can be used to separately supply cleaning gas to any of the gas distribution devices and / or gas distribution surfaces, as long as a predetermined amount of cleaning gas fluid can be configured to be divided and / or distributed to the respective gas distribution devices, for example, to have an equal amount of cleaning gas fluid to all gas distribution devices in the network or more cleaning gas fluid to one of the gas distribution devices, as needed. It should also be understood that the inlet port can be provided at different locations along the substrate container. For example, the bottom wall of the substrate container may include a rear inlet port for introducing a second cleaning gas flow, wherein the rear inlet port is disposed closer to the rear wall than the front opening or the bottom wall may include a second inlet port for introducing a second cleaning gas flow, wherein the second inlet port is disposed closer to the front opening than the rear wall, or other locations along the substrate container. In other embodiments, the inlet port (and / or outlet port) may be provided on the bottom wall of the substrate container, wherein if multiple inlet ports are provided, the cleaning gases can be combined before the cleaning gases are supplied to the cleaning fluid distribution system.

[0047] Although described above with respect to a FOUP, it should be appreciated that any of the embodiments discussed herein may also be used to distribute a purge gas within an interior space within a reticle pod, such as within an outer pod of a reticle pod.

[0048] For example, Figure 4A and 4B A further embodiment is described, in which a supply line may be provided for dividing the supply of cleaning gas to separate gas distribution devices and / or separate gas distribution surfaces. In an embodiment, a second flow path of the supply line is provided after the first flow path.

[0049] Figure 4A The rear side of the substrate container 400 is shown. The housing 406 defines an interior space 408 of the substrate container, wherein substrates (not shown) are stored in the interior space 408 of the substrate container 400. The housing 406 includes a first side wall 414, a second side wall 416, a rear wall 418, and a top wall 420 and a bottom wall 422. The first side wall 414 is opposite the second side wall 416, and the top wall 420 is opposite the bottom wall 422. The first side wall 414 may be referred to as the left side, and the second side wall 416 may be referred to as the right side. The top wall 420 and the bottom wall 422 each extend between the first side wall 414 and the second side wall 416. The substrate container 400 may also include a carrier plate 423, which may provide a base to which the housing 406 may be attached.

[0050] The cleaning fluid distribution system may be included in or connected to the housing 406 of the substrate container 400, for example, located between the housing 406 and the carrier 423 or at least partially disposed between the housing 406 and the carrier 423. The cleaning fluid distribution system is connected to at least one inlet port, which is connected to a cleaning gas supply system for supplying cleaning gas to a network of separate gas distribution devices. The cleaning fluid distribution system includes at least one supply line connected to at least one inlet cleaning port 430A, 430B on the bottom wall 422. The supply line includes a first flow path 460A connected to the inlet cleaning port 430A, 430B for supplying cleaning gas to a rear gas distribution device 450A, 450B, wherein the rear gas distribution device may include at least two diffusers. The at least two diffusers 450A, 450B include a plurality of openings for distributing cleaning gas at the rear of the substrate container 400. At least one of the at least two diffusers 450A, 450B of the rear gas distribution device also includes an opening at its top end, which is closer to the top wall 420 of the substrate container 400, forming an input cleaning port connected to the second flow path 460B for supplying cleaning gas to another gas distribution device, such as the second gas distribution device. In this embodiment, the second flow path 460B is connected to the front gas distribution device, which includes at least one gas distribution surface, such as a top manifold 450C provided near the top wall 420 of the substrate container 400.

[0051] like Figure 4BAs seen in FIG. 4 , the second flow path 460B includes a conduit, channel or path provided along a top portion of the top wall 420 closer to the substrate container 400 for supplying at least a portion of the cleaning gas supplied to the first flow path 460A distributed to the front gas distribution device. For example, the amount of cleaning gas to the front gas distribution device can be set by sizing the cross-sectional area of ​​the second flow path 460B to have a predetermined amount of cleaning gas flow, for example, where the flow rate is proportional to the cross-sectional area, and / or by sizing the plurality of openings of the at least two diffusers 450A, 450B, such as diameters, so that a predetermined amount of cleaning gas is supplied through the second flow path 460B depending on the supply pressure (e.g., pressure differential). That is, the first gas distribution device is supplied with cleaning gas to distribute the predetermined amount of cleaning gas through the openings of the diffusers 450A, 450B, and the remaining amount of cleaning gas is supplied to the second gas distribution device via the second flow path 460B for distributing the cleaning gas through the gas distribution surface of the second (front) gas distribution device. It should be understood that although the description herein relates to a top manifold and a diffuser, any of the gas distribution surfaces may be any of the structures for distributing the cleaning gas into the interior of the substrate container 400, including but not limited to a top / bottom / side manifold, a top / bottom / side diffuser, a top / bottom / side membrane, a top / bottom / side having slits or nozzles or made of a porous material. It should also be understood that the supply line may also include a valve or other structure for setting the amount of cleaning gas supplied to the first gas distribution device and / or the second gas distribution device.

[0052] Figure 5A Another embodiment is described and the back side of the substrate container 500 is shown. The housing 506 defines an interior space of the substrate container, wherein substrates (not shown) are stored in the interior space of the substrate container 500. The housing 506 includes a first side wall 514, a second side wall 516, a back wall 518, and a top wall 520 and a bottom wall 522. The first side wall 514 is opposite to the second side wall 516, and the top wall 520 is opposite to the bottom wall 522. The first side wall 514 may be referred to as the left side, and the second side wall 516 may be referred to as the right side. The top wall 520 and the bottom wall 522 each extend between the first side wall 514 and the second side wall 516. The substrate container 500 may also include a carrier plate 523, which may provide a base to which the housing 506 may be attached.

[0053] The cleaning fluid distribution system may be included in or connected to the housing 506 of the substrate container 500, for example, located between the housing 506 and the carrier plate 523 or at least partially located between the housing 506 and the carrier plate 523. The cleaning fluid distribution system 540 is connected to at least one inlet port 505, which is connected to a cleaning gas supply system for supplying cleaning gas to a network of separate gas distribution devices. The cleaning fluid distribution system 540 includes at least one supply line connected to at least one cleaning port on the bottom wall 522. In this embodiment, the cleaning fluid distribution system 540 includes a manifold base 560 provided on the bottom wall 522, the manifold base 560 being configured to divide the cleaning gas flow to the network of gas distribution devices.

[0054] like Figure 5B , the manifold substrate 560 is connected to a network of separate gas distribution devices 550. The manifold substrate 560 includes a first flow path 560A connected to an inlet purge port for supplying purge gas to a first gas distribution device and a second flow path 560B connected to an inlet purge port for supplying purge gas to a second gas distribution device. The first gas distribution device may be a rear gas distribution device 550A, which may include rear left and right diffusers 550A and 550B and the second gas distribution device may be a front gas distribution device, which may include a front manifold 550C and left and right manifolds 550D and 550E for distributing purge gas to the interior of the substrate container at the front side of the substrate container. The purge fluid distribution system 540 is configured in this manner so that the supply line can be adjusted to set the amount of purge gas flowing to at least one of the front gas distribution device and the rear gas distribution device, and / or can also be configured to adjust the amount of purge gas to separate gas distribution surfaces of the front gas distribution device and / or the rear gas distribution device. It should be understood that the first and second gas distribution devices are not necessarily located at the rear section and the front section, but are provided by way of example, and may be provided at different (or the same) locations in the interior space of the substrate container.

[0055] For example, in this embodiment, the inlet supply line valve 580 may be adjusted to set the amount of cleaning gas supplied to the front gas distribution device and the rear gas distribution device. That is, by adjusting the supply line valve 580, a pressure difference may be generated to divide the supply of cleaning gas to the first flow path 560A and the second flow path 560B to set the amount of cleaning gas supplied to the front gas distribution device and the rear gas distribution device, which is necessary for cleaning the substrate container.

[0056] In addition to controlling the amount of cleaning gas to the front gas distribution device by providing a supply line valve 580, the amount of cleaning gas to the separate gas distribution surfaces 550C, 550D, 550E of the front gas distribution device can be adjusted using a plurality of adjustable valves 585A, 585B, 585C, 585D. For example, adjustable valve 585A can be provided to control the amount of cleaning gas to the front right (e.g., right side) manifold 550E, adjustable valves 585B and 585C can be provided to control the amount of cleaning gas to the front manifold 550C, and adjustable valve 585D can be provided to control the amount of cleaning gas to the front left (e.g., left side) manifold 550D. Thus, the manifold substrate 560 can be used to divide the cleaning gas from the supply line to the network of separate gas distribution devices and / or separate gas distribution surfaces by providing adjustable valves 580, 585A, 585B, 585C, 585D. In other words, the supply of the cleaning gas from a single inlet port is divided and arranged so that a predetermined amount of cleaning gas is supplied to a plurality of discrete input cleaning ports for supplying separate gas distribution devices 550 , respectively.

[0057] like Figure 5C As seen in FIG. 5 , the inlet port connected to the cleaning fluid distribution system 540 can be provided in a variety of locations. For example, although Figure 5A Inlet port 505 is generally shown provided below manifold base 560 for supplying cleaning gas from a cleaning gas distribution system, but it should be understood that cleaning gas can be supplied to a number of inlet ports (or outlet ports) 505A, 505B, 505C, 505D provided through carrier plate 523, depending on the nature of the application / docking configuration of the substrate container. It should be understood that the cleaning gases from inlet ports 505A, 505B, 505C, 505D can be combined before being supplied to manifold base 560 or provided / combined as needed to supply different cleaning gas fluid distribution systems in the substrate container.

[0058] It should be appreciated that the amount of cleaning gas may also be controlled or set using any combination of different structures that allow for setting a pressure drop or flow rate based on energy conservation. For example, an orifice may be placed in any of the first flow path and / or the second flow path to create a pressure differential to set the amount of cleaning gas supplied to any of the front gas distribution device and / or the rear gas distribution device and / or the separated gas distribution surfaces. Alternatively, or in addition to this structure, the cross-sectional area of ​​the various conduits of the first flow path and / or the second flow path may be sized to set the amount of cleaning gas divided between the front gas distribution device and the rear gas distribution device and / or the gas distribution surfaces of the front and rear gas distribution devices. Thus, the cleaning fluid distribution system 540 is configured such that by adjusting and / or setting the different components of the cleaning fluid distribution system 540 in an appropriate manner, the cleaning gas may be divided and supplied to the different gas distribution devices and / or gas distribution surfaces.

[0059] Figure 6 An operational flow 600 for supplying a cleaning fluid to a substrate container is shown in accordance with at least one example embodiment.

[0060] Operational flow 600 may include one or more operations, actions, or functions depicted by one or more blocks 610, 620, 630, and 640. Although illustrated as discrete blocks, various blocks may be divided into additional blocks, combined into fewer blocks, or eliminated, depending on the desired implementation. As a non-limiting example, according to one or more example embodiments described herein, corresponding to Figure 6 The description of method 600 described therein and performed by one or more of the apparatus or components described in the above embodiments involves supplying a cleaning fluid in a substrate container. Process flow 600 may begin at block 610.

[0061] Block 610 may refer to supplying a cleaning gas flow into the interior of a container, which may be a wafer or reticle container (e.g., a FOUP or reticle box), via an inlet cleaning port connected to a cleaning fluid distribution system at least partially disposed in a substrate container. The cleaning gas flow may include one or more of nitrogen, clean dry air (CDA), ultra clean dry air (xCDA), a gas for conditioning the container environment, or any other suitable gas flow. Block 610 may be followed by block 620.

[0062] Block 620 may refer to dividing the cleaning gas to supply a network of separate gas distribution devices to distribute the cleaning gas flow into the interior space of the substrate container via the supply line of the cleaning fluid distribution system. In an embodiment of block 630, the division of the cleaning gas includes dividing the supply line into a first flow path for supplying the cleaning gas to at least one of the networks of gas distribution devices and a second flow path for supplying the cleaning gas to another of the networks of gas distribution devices. The amount of cleaning gas supplied to the first flow path and the second flow path may be based on a number of predetermined operating conditions. For example, in one embodiment, one or more sensors may be used to detect at least one environmental condition in the interior of the substrate container during a predetermined time period. The at least one environmental condition may include one or more of relative humidity (%RH), pressure (e.g., absolute pressure), oxygen level, temperature, measured presence of airborne molecular contaminants, measured presence of one or more volatile organic compounds, etc. Block 620 / 630 may be followed by block 640.

[0063] Block 640 may refer to setting a first portion or amount of purge gas flow to a first distribution device via a first flow path and setting a second portion or amount of purge gas flow to a second gas distribution device via a second flow path during a predetermined time period based on at least one detected environmental condition.

[0064] In at least one example embodiment, the amount of purge gas to the front gas distribution device and / or the rear gas distribution device can be obtained or determined by, for example, achieving a desired (predetermined or optimal) environmental response (e.g., within the container). The desired environmental response can include adjusting one or more of the relative humidity (%RH), oxygen level, temperature, measured presence of airborne molecular contaminants, and / or measured presence of one or more volatile organic compounds inside the container to respective predetermined threshold levels. The desired environmental response can also include generating a desired pressure (e.g., absolute pressure) inside the container. The environmental response can be detected or measured by a sensor inside the container and the detected data can be communicated to the outside of the container, such as a controller.

[0065] The controller analyzes the environmental response and determines the amount of purge gas supplied to the front gas distribution device (and / or the front gas distribution surface) and the rear gas distribution device required to achieve the applicable operating scenario. In an embodiment, the controller analyzes the environmental response and determines the amount of purge gas to achieve the applicable operating scenario can be achieved through design of experiments (DOE), trained neural network, modeling, etc.

[0066] The amount of purge gas supplied to at least one of the front distribution devices and / or the rear distribution devices may be set by setting a valve in a supply line provided in the purge fluid distribution system. The valve may include a needle valve, a ball valve, a butterfly valve, a check valve or a valve of similar structure, which may be used to control the flow of gas to different and separate gas distribution devices. It should be understood that the purge gas flow may also be set using an orifice, a spring loaded flow divider, or by sizing the pipe / conduit of one of the first or second flow paths to have a cross-sectional area to supply a predetermined amount of purge gas, given a supply pressure to divide the supply of purge gas as required. In an embodiment, once the amount of purge gas supplied to the network of gas distribution devices is set, the amount of purge gas supplied (e.g., a valve) is not further adjusted until necessary, such as passive control.

[0067] aspect

[0068] Any of aspects 1-18 may be combined with any of aspects 19 and 20.

[0069] Aspect 1. A substrate container, comprising: a shell defining an interior space, the shell including a front opening, a first side wall, a second side wall, a rear wall and a bottom wall, the bottom wall including a front edge extending between the first side wall and the second side wall along the front opening of the shell; and a cleaning fluid distribution system configured to receive a cleaning gas flow, the cleaning fluid distribution system comprising: an inlet configured to receive the cleaning gas flow; and a network of separate gas distribution devices for distributing the cleaning gas flow into the interior space, wherein the cleaning fluid distribution system further comprises a supply line connected to the inlet, the supply line being configured to divide the cleaning gas flow to the network of separate gas distribution devices.

[0070] Aspect 2. The substrate container of aspect 1, wherein the supply line comprises a first flow path leading to one of the networks of separate gas distribution devices and a second flow path leading to another of the networks of separate gas distribution devices.

[0071] Aspect 3. A substrate container according to Aspect 2, wherein one of the network of gas distribution devices is a first gas distribution device provided closer to the rear wall and the other of the network of gas distribution devices is a second gas distribution device provided in the interior space of the substrate container, and wherein the first flow path is configured to supply a portion of the cleaning gas flow to the first gas distribution device and the second flow path is configured to supply another portion of the cleaning gas flow to the second gas distribution device.

[0072] Aspect 4. A substrate container according to Aspect 3, wherein the first flow path of the supply pipeline leading to the first gas distribution device has a smaller or larger cross-sectional area than the second flow path of the supply pipeline leading to the second gas distribution device, or includes an orifice, a spring-loaded diverter or a valve to direct fluid to the second flow path of the supply pipeline leading to the second gas distribution device.

[0073] Aspect 5. The substrate container according to aspect 3, wherein the second flow path is provided after the first flow path at an end of the first gas distribution device opposite to the inlet.

[0074] Aspect 6. The substrate container according to aspect 3, wherein the second flow path is provided at a top portion of the substrate container to supply the cleaning gas to the second gas distribution device.

[0075] Aspect 7. A substrate container according to Aspect 6, wherein the second gas distribution device includes a gas distribution surface, the gas distribution surface includes a plurality of openings arranged along the length of the gas distribution surface between the first side wall and the second side wall, or wherein the front gas distribution device includes a gas distribution surface extending vertically along one of the front edge of the first side wall or the front edge of the second side wall.

[0076] Aspect 8. A substrate container according to any one of aspects 1 to 3, wherein the cleaning fluid distribution system further includes a manifold base provided on the bottom wall, the manifold base receiving the cleaning gas flow from the inlet to divide the cleaning gas flow to the network of gas distribution devices.

[0077] Aspect 9. The substrate container according to aspect 8, wherein the manifold base is configured to divide the second flow path into at least a left second flow path and a right second flow path to supply the portion of the cleaning gas flow to the second gas distribution device.

[0078] Aspect 10. A substrate container according to Aspect 9, wherein the manifold base includes a plurality of adjustable valves to set at least one of the portions of the cleaning gas flow in the first flow path to the first gas distribution device and to set the portion of the cleaning gas flow in the second flow path to the second gas distribution device.

[0079] Aspect 11. The substrate container according to any one of aspects 1 to 9, wherein one of the network of gas distribution devices comprises a gas distribution surface comprising a porous material.

[0080] Aspect 12. The substrate container according to any one of aspects 1 to 11, wherein the cleaning fluid distribution system is attached to an inlet cleaning port in the bottom wall of the housing.

[0081] Aspect 13. A substrate container according to any one of aspects 1 to 12, wherein one of the networks of gas distribution devices includes a gas distribution surface comprising a plurality of openings arranged along the length of the gas distribution surface between the first sidewall and the second sidewall of the shell.

[0082] Aspect 14. The substrate container according to any one of aspects 1 to 13, further comprising: an outlet port for exhausting gas from the interior space, the outlet port being disposed in the bottom wall between the inlet and the second side wall.

[0083] Aspect 15. A substrate container according to any one of aspects 1 to 14, wherein the bottom wall includes a rear inlet port for introducing a second cleaning gas flow into the interior space through the cleaning fluid distribution system, the rear inlet port being disposed closer to the rear wall than the front opening.

[0084] Aspect 16. A substrate container according to any one of aspects 1 to 14, wherein the bottom wall includes a second inlet port for introducing a second cleaning gas flow into the interior space through the cleaning fluid distribution system, the second inlet port being disposed closer to the front opening than the rear wall.

[0085] Aspect 17. The substrate container according to any one of aspects 1 to 16, further comprising: a door configured to be received within the front opening defined by the shell to close the interior space.

[0086] Aspect 18. A substrate container according to any one of Aspects 1 to 17, wherein the inlet of the cleaning fluid distribution system includes a first inlet and a second inlet, wherein the supply pipeline is configured to combine the cleaning gas flows from the first inlet and the second inlet and then divide the cleaning gas flows to the network of separate gas distribution devices.

[0087] Aspect 19. A method for cleaning an open substrate container, comprising: supplying a cleaning gas flow to an inlet of a cleaning fluid distribution system at least partially disposed within the substrate container via an inlet port disposed in a wall of the substrate container; dividing the cleaning gas via a supply line of the cleaning fluid distribution system to supply a network of separate gas distribution devices for distributing the cleaning gas flow to an interior space of the substrate container, wherein the supply line comprises a first flow path to one of the networks of gas distribution devices and a second flow path to another of the networks of gas distribution devices.

[0088] Aspect 20. The method according to aspect 19, further comprising disposing a first portion of the purge gas flow via the first flow path to a first gas distribution device and disposing a second portion of the purge gas flow via the second flow path to a second gas distribution device.

[0089] Thus, having described several illustrative embodiments of the present disclosure, it will be readily apparent to those skilled in the art that other embodiments may be made and used within the scope of the appended claims. Many advantages of the present disclosure covered by this document have been set forth in the previous description. However, it should be understood that the present disclosure is in many respects merely illustrative. Changes may be made to the details, particularly in the shape, size and arrangement of parts, without exceeding the scope of the present disclosure. Of course, the scope of the present disclosure is defined in the language in which the appended claims are expressed.

Claims

1. A substrate container, comprising: a housing defining an interior space, the housing comprising a front opening, a first side wall, a second side wall, a rear wall, and a bottom wall, the bottom wall comprising a front edge extending between the first side wall and the second side wall along the front opening of the housing; a cleaning fluid distribution system positioned on the housing, the cleaning fluid distribution system configured to receive a flow of cleaning gas, wherein the cleaning fluid distribution system includes an inlet configured to receive the flow of cleaning gas; and At least one gas distribution device for distributing the purge gas flow into the interior space.

2. The substrate container according to claim 1, wherein the gas distribution device is a diffuser, a manifold, a membrane, a side of the housing having slits or nozzles, a porous material, or a combination of at least two of the foregoing.

3. The substrate container of claim 1, wherein the at least one gas distribution device further comprises a network of gas distribution devices.

4. A substrate container according to claim 3, wherein one of the networks of gas distribution devices is a first gas distribution device provided closer to the rear wall and another of the network of gas distribution devices is a second gas distribution device provided in the interior space of the substrate container, and wherein the first flow path is configured to supply a portion of the cleaning gas flow to the first gas distribution device and the second flow path is configured to supply another portion of the cleaning gas flow to the second gas distribution device.

5. A substrate container according to claim 4, wherein the first flow path leading to the first gas distribution device has a smaller or larger cross-sectional area than the second flow path leading to the second gas distribution device, or includes an orifice, a spring-loaded diverter or a valve to direct fluid to the second flow path leading to the second gas distribution device.

6. The substrate container of claim 1, wherein the at least one gas distribution device comprises a gas distribution surface including a plurality of openings arranged along a length of the gas distribution surface.

7. The substrate container of claim 1, wherein the cleaning fluid distribution system further comprises a manifold base provided on the bottom wall and positioned on an exterior of the housing, the manifold base receiving the cleaning gas flow.

8. The substrate container of claim 7, wherein the manifold base is configured to divide the cleaning gas flow into at least a left flow path and a right flow path to supply the portion of the cleaning gas flow to two or more gas distribution devices.

9. The substrate container of claim 1, wherein the at least one gas distribution device comprises a gas distribution surface comprising a porous material.

10. The substrate container of claim 1, wherein the cleaning fluid distribution system is attached to an inlet cleaning port in the bottom wall of the housing.

11. The substrate container of claim 1 , further comprising: An outlet port for exhausting gas from the interior space is disposed in the bottom wall between the inlet and the second side wall.

12. The substrate container of claim 1, wherein The bottom wall includes a rear inlet port for introducing a flow of purge gas from the purge fluid distribution system into the interior space, the rear inlet port being disposed closer to the rear wall than the front opening.

13. The substrate container of claim 12, wherein The bottom wall includes a second inlet port for introducing a second purge gas flow from the purge fluid distribution system into the interior space, the second inlet port being disposed closer to the front opening than the rear wall.

14. The substrate container of claim 1, further comprising: A door is configured to be received within the front opening defined by the housing to enclose the interior space.

15. A substrate container comprising: a housing defining an interior space, the housing comprising a front opening, a first side wall, a second side wall, a rear wall, and a bottom wall, the bottom wall comprising a front edge extending between the first side wall and the second side wall along the front opening of the housing; a manifold base positioned on the housing, the manifold base having an inlet configured to receive a flow of a cleaning gas, and At least one diffuser is in communication with the manifold base for distributing the purge gas flow into the interior space of the housing.

16. The substrate container of claim 15, wherein the manifold base is positioned between the housing and a carrier plate.

17. The substrate container of claim 15, wherein the at least one diffuser is positioned proximate the rear wall of the housing.

18. The substrate container of claim 15, wherein the diffuser comprises a gas distribution surface comprising a porous material.

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