Manufacturing method of OLED display screen and OLED display screen

Abstract

The invention discloses a manufacturing method of an OLED display screen and the OLED display screen, and relates to the technical field of manufacturing methods of OLED display screens. The manufacturing method of the OLED display screen comprises a display screen body, a shell is arranged outside the display screen body, a vertical rod is arranged at the bottom of the shell, and a supporting frame is arranged at the bottom of the vertical rod; the upper end and the lower end of the vertical rod are connected with the shell and the supporting frame in an inserted mode respectively, a substrate is arranged at the bottom of the display screen, an anode plate is arranged above the substrate, a hole injection layer is arranged above the anode plate, a hole transport layer is arranged above the hole injection layer, an organic light-emitting layer is arranged above the hole transport layer, and the organic light-emitting layer is arranged above the organic light-emitting layer. An electron transport layer is arranged above the organic light-emitting layer, an electron injection layer is arranged above the transport layer, and the problem that the manufacturing quality of the OLED display screen is affected due to the fact that non-uniformity is prone to occurring during film coating operation in a manufacturing method of the OLED display screen in the prior art is solved.

Description

Technical Field

[0001] The present invention relates to the technical field of methods for manufacturing OLED display screens, and in particular to a method for manufacturing an OLED display screen and an OLED display screen. Background Art

[0002] OLED display technology is different from traditional LCD display. It does not require a backlight, but uses a very thin organic material coating and a glass substrate. When current passes through, these organic materials will emit light. In addition, OLED display screens can be made lighter and thinner, with a wider viewing angle, and can significantly save power consumption. For example, the Chinese authorized patent with announcement number CN103500755A (OLED display screen, method for manufacturing OLED display screen and display device): includes a first substrate and a second substrate opposite to each other; a first dam glue connected between the first substrate and the second substrate, the first dam glue having at least one opening; a second dam glue connected between the first substrate and the second substrate and located outside the first dam glue, the second dam glue forming a sealed box with the first substrate and the second substrate; an OLED device located inside the first dam glue and on the first substrate, and a protective layer covering the OLED device and sealed to the first substrate; a filling glue filled inside the first dam glue, the filling amount of the filling glue having a larger process error range, which reduces the difficulty of debugging the production process and is conducive to improving production efficiency and product quality.

[0003] However, the manufacturing method of the OLED display screen in the above-mentioned prior art is prone to unevenness during the coating operation, thereby affecting its manufacturing quality; therefore, it does not meet the existing needs. In this regard, we propose a manufacturing method of an OLED display screen and an OLED display screen. Summary of the invention

[0004] The object of the present invention is to provide a method for manufacturing an OLED display screen and an OLED display screen, so as to solve the problem that the method for manufacturing an OLED display screen in the prior art proposed in the above background technology is prone to uneven coating during the coating operation, thereby affecting its manufacturing quality.

[0005] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a method for manufacturing an OLED display screen and an OLED display screen, comprising a display screen, a shell is arranged on the outside of the display screen, a vertical pole is arranged on the bottom of the shell, a support frame is arranged on the bottom of the vertical pole, the upper and lower ends of the vertical pole are plugged and connected to the shell and the support frame respectively, a substrate is arranged on the bottom of the display screen, an anode plate is arranged above the substrate, a hole injection layer is arranged above the anode plate, a hole transport layer is arranged above the hole injection layer, an organic light-emitting layer is arranged above the hole transport layer, an electron transport layer is arranged above the organic light-emitting layer, an electron injection layer is arranged above the electron transport layer, and a cathode plate is arranged above the electron injection layer.

[0006] Preferably, the method for manufacturing an OLED display screen comprises the following steps: Step 1: First, choose glass material as the substrate. The substrate needs to be cleaned to remove dirt and impurities on the surface to ensure the cleanliness of the substrate. The cleaning methods include ultrasonic cleaning, chemical cleaning and physical cleaning. The appropriate cleaning method is selected according to the substrate material and the degree of surface contamination. The cleaned substrate should reach a certain cleanliness index to ensure the smooth progress of subsequent processes and the quality of the product; Step 2: In OLED displays, thin film preparation is one of the key processes, involving the preparation and stacking of multiple functional films, followed by the synthesis and purification of organic light-emitting materials, which are key components of OLED displays. Then, the organic light-emitting materials, electron transport layers, electron injection layers, anodes, and cathode layers are deposited layer by layer on the substrate through thin film deposition technology to form the basic structure of the OLED display. At the same time, the thickness and composition of the thin film need to be controlled to meet the performance requirements of the OLED display; Step 3: OLED devices require a transparent conductive substrate, usually glass or plastic materials. When making the substrate, the material needs to be cleaned and its surface needs to be kept flat. The core of OLED devices is organic materials, which need to be made through precise synthesis methods. Organic materials include hole transport materials, luminescent materials and electron transport materials. Photolithography technology is used to connect the layers and circuit patterns in the OLED display screen, and metal materials are deposited at designated locations through sputtering process to form structures such as electrodes and wires. The cathode of the OLED device is metal, and the anode is a transparent conductive material. When preparing the cathode and anode, their thickness and uniformity need to be controlled; Step 4: Assemble the prepared OLED display screen with the driving circuit chip and packaging materials, using a metal film for packaging to form a complete display screen module. Then, conduct electrical and optical performance tests to ensure that its performance and quality meet the requirements.

[0007] Preferably, the cleaning and sputtering process described in the above steps includes a cleaning chamber and a coating chamber, a drying chamber is arranged between the cleaning chamber and the coating chamber, and support platforms are arranged at the bottom of the cleaning chamber, the coating chamber and the drying chamber.

[0008] Preferably, an ultrasonic cleaning tank is provided on one side of the bottom of the support platform, an electrode seat is provided on the other side of the bottom of the support platform, and the front ends of the cleaning chamber, coating chamber, drying chamber, ultrasonic cleaning tank and electrode seat are all provided with door bodies.

[0009] Preferably, a cylinder is provided on the top of the cleaning chamber, and a water pump is installed on the top of the coating chamber.

[0010] Preferably, a cleaning rack is provided inside the cleaning chamber, and the cleaning rack is hollow as a whole.

[0011] Preferably, a placement slot is provided inside the cleaning rack, and a telescopic rod is installed on the top of the cleaning rack.

[0012] Preferably, a positive electrode seat is provided at the bottom end of the coating chamber, an air inlet is provided on one side of the positive electrode seat, an exhaust is provided on the other side of the positive electrode seat, a power supply is provided at the top end of the coating chamber, circulating cooling water is provided on one side of the power supply, an emitting electrode is provided below the power supply, and a coating target material port is provided at the bottom of the emitting electrode.

[0013] Compared with the prior art, the present invention has the following beneficial effects: 1. The present invention sets a coating chamber and utilizes sputtering coating during coating. First, the chamber is placed in a vacuum state by utilizing an exhaust port, and the process is carried out in a vacuum. Inert argon gas is introduced and voltage is applied thereto to ionize the argon gas into argon ions. These argon ions gain kinetic energy under electric field acceleration and bombard a target material. When the energy of the bombarding particles exceeds four times the sublimation heat of the target material, the target material atoms are pushed out of the lattice position to form gas phase atoms. These atoms are deposited on the substrate to form a thin film. High-quality and uniform thin film coverage can be achieved by adjusting the sputtering technical parameters, thereby ensuring the uniformity of the coating. This solves the problem that the manufacturing method of the OLED display screen in the prior art is prone to unevenness during the coating operation, thereby affecting its manufacturing quality.

[0014] 2. An ultrasonic cleaning tank is set up with a cleaning chamber on top. The material is placed in the placement tank inside the cleaning rack. The cleaning rack is located inside the ultrasonic cleaning tank by using a cylinder to drive the telescopic rod. The detergent is placed inside. The sound energy of the high-power ultrasonic frequency source is converted into mechanical vibration through the internal transducer. The ultrasonic wave is radiated to the cleaning liquid in the tank through the cleaning tank. This vibration enables the microbubbles in the liquid in the tank to maintain vibration, thereby enhancing the cleaning effect.

[0015] 3. By setting a shell on the outside of the display screen, the outside of the display screen can be protected. At the same time, the upper and lower ends of the vertical pole are connected with the shell and the support frame to facilitate the support and placement of the display screen, and also facilitate disassembly and storage. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of the overall structure of the display screen of the present invention; Figure 2 It is an enlarged schematic diagram of the local internal structure of the display screen of the present invention; Figure 3 This is a schematic structural diagram of a cleaning and coating device for display screen processing according to the present invention; Figure 4 It is a schematic diagram of the local structure of the cleaning rack of the present invention; Figure 5 It is a schematic diagram of the sputtering coating principle of the present invention; In the figure: 1. display screen; 2. shell; 3. vertical pole; 4. support frame; 5. substrate; 6. anode plate; 7. hole injection layer; 8. hole transport layer; 9. organic light-emitting layer; 10. electron transport layer; 11. electron injection layer; 12. cathode plate; 13. support platform; 14. ultrasonic cleaning tank; 15. electrode seat; 16. cleaning chamber; 17. drying chamber; 18. coating chamber; 19. cylinder; 20. door; 21. cleaning rack; 22. telescopic rod; 23. placement slot; 24. air inlet; 25. exhaust port; 26. positive electrode seat; 27. circulating cooling water; 28. power supply; 29. ​​water pump; 30. emission electrode; 31. coating target. DETAILED DESCRIPTION

[0017] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all the embodiments.

[0018] See also Figure 1-5The present invention provides an embodiment: a method for manufacturing an OLED display screen and an OLED display screen, comprising a display screen 1, a shell 2 is arranged outside the display screen 1, a vertical rod 3 is arranged at the bottom of the shell 2, a support frame 4 is arranged at the bottom of the vertical rod 3, the upper and lower ends of the vertical rod 3 are plugged and connected to the shell 2 and the support frame 4 respectively, a substrate 5 is arranged at the bottom of the display screen 1, an anode plate 6 is arranged above the substrate 5, a hole injection layer 7 is arranged above the anode plate 6, a hole transport layer 8 is arranged above the hole injection layer 7, an organic light emitting diode 2 is arranged above the hole transport layer 8, and an organic light emitting diode 2 is arranged above the hole transport layer 8. The organic light-emitting layer 9 is provided with an electron transport layer 10 above the electron transport layer 10, an electron injection layer 11 is provided above the electron injection layer 11, and a cathode plate 12 is provided above the electron injection layer 11. The sputtering coating method is used during the coating. First, the vacuum port 25 is used to make the chamber in a vacuum state. The process is carried out in a vacuum. Inert gas argon is introduced and voltage is applied thereto to ionize the argon gas into argon ions. These argon ions gain kinetic energy under electric field acceleration and bombard the target material. When the energy of the bombarding particles exceeds four times the sublimation heat of the target material, the target material atoms are pushed out. The lattice position forms gas-phase atoms, which are deposited on the substrate to form a thin film. By adjusting the sputtering technical parameters, high-quality and uniform thin film coverage can be achieved, ensuring the uniformity of the coating, and solving the problem that the manufacturing method of the OLED display screen 1 in the prior art is prone to unevenness during the coating operation, thereby affecting its manufacturing quality. By setting an ultrasonic cleaning tank 14, a cleaning chamber 16 is set above it, and the material is placed in a placement tank 23 inside the cleaning rack 21. The cylinder 19 drives the telescopic rod 22 so that the cleaning rack 21 is located inside the ultrasonic cleaning tank 14. The cleaning agent is placed inside. The sound energy of the power ultrasonic frequency source is converted into mechanical vibration through the internal transducer. The ultrasonic wave is radiated to the cleaning liquid in the tank through the cleaning tank. This vibration enables the microbubbles in the liquid in the tank to maintain vibration, thereby enhancing the cleaning effect. By setting a shell 2 on the outside of the display screen 1, the outside of the display screen 1 can be protected. At the same time, the upper and lower ends of the vertical rod 3 are plugged and connected with the shell 2 and the support frame 4, which is convenient for supporting and placing the display screen 1, and also convenient for disassembly and storage.

[0019] See also Figure 1-Figure 5 , a method for manufacturing an OLED display screen, comprising the following steps: Step 1: First, glass material is selected as the substrate 5. The substrate 5 needs to be cleaned to remove dirt and impurities on the surface to ensure the cleanliness of the substrate 5. The cleaning method adopts ultrasonic cleaning and chemical cleaning. The appropriate cleaning method is selected according to the material of the substrate 5 and the degree of surface contamination. The cleaned substrate 5 should reach a certain cleanliness index to ensure the smooth progress of the subsequent process and the quality of the product; Step 2: In the OLED display 1, the preparation of thin films is one of the key processes, which involves the preparation and stacking of multiple functional thin films. Then, the organic light-emitting material is synthesized and purified, which is a key component of the OLED display 1. Then, the organic light-emitting material, anode, and cathode layers are deposited layer by layer on the substrate 5 through thin film deposition technology to form the basic structure of the OLED display 1. At the same time, the thickness and composition of the thin film need to be controlled to meet the performance requirements of the OLED display 1; Step 3: OLED devices require a transparent conductive substrate, usually glass or plastic materials. When making the substrate, the material needs to be cleaned and its surface needs to be kept flat. The core of OLED devices is organic materials, which need to be made through precise synthesis methods. Organic materials include hole transport materials, luminescent materials and electron transport materials. Photolithography technology is used to connect and pattern the circuits between the layers in the OLED display 1, and metal materials are deposited at designated locations through a sputtering process to form structures such as electrodes and wires. The cathode of the OLED device is metal, and the anode is a transparent conductive material. When preparing the cathode and anode, their thickness and uniformity need to be controlled. Sputtering is used for coating. First, the vacuum port 25 is used to make the chamber in a vacuum state. The process is carried out in a vacuum. By introducing an inert gas argon and applying a voltage to it, the argon gas is ionized into argon ions. These argon ions are accelerated by an electric field to obtain dynamic motion. The target material is bombarded with energy. When the energy of the bombarding particles exceeds four times the sublimation heat of the target material, the target material atoms are pushed out of the lattice position to form gas-phase atoms. These atoms are deposited on the substrate to form a thin film. By adjusting the sputtering technical parameters, high-quality and uniform thin film coverage can be achieved, ensuring the uniformity of the coating, and solving the problem that the manufacturing method of the OLED display screen 1 in the prior art is prone to unevenness during the coating operation, thereby affecting its manufacturing quality. An ultrasonic cleaning tank 14 is set, and a cleaning chamber 16 is set above it. The material is placed in a placement tank 23 inside the cleaning rack 21. The cylinder 19 drives the telescopic rod 22 so that the cleaning rack 21 is located inside the ultrasonic cleaning tank 14. A cleaning agent is placed inside. The sound energy of the power ultrasonic frequency source is converted into mechanical vibration through an internal transducer. The ultrasonic wave is radiated to the cleaning liquid in the tank through the cleaning tank. This vibration enables the microbubbles in the liquid in the tank to maintain vibration, thereby enhancing the cleaning effect. Step 4: Assemble the prepared OLED display screen 1 with the driving circuit chip and packaging materials, use a metal film for packaging, and form a complete display screen 1 module, and then conduct electrical and optical performance tests to ensure that its performance and quality meet the requirements.

[0020] See also Figure 1-Figure 5The cleaning and sputtering process in the above step 3 includes a cleaning chamber 16 and a coating chamber 18, a drying chamber 17 is arranged between the cleaning chamber 16 and the coating chamber 18, and a supporting platform 13 is arranged at the bottom of the cleaning chamber 16, the coating chamber 18 and the drying chamber 17.

[0021] See also Figure 1-Figure 5 An ultrasonic cleaning tank 14 is arranged on one side of the bottom of the support platform 13, an electrode holder 15 is arranged on the other side of the bottom of the support platform 13, and a door body 20 is arranged on the front end surfaces of the cleaning chamber 16, the coating chamber 18, the drying chamber 17, the ultrasonic cleaning tank 14 and the electrode holder 15.

[0022] See also Figure 1-Figure 5 A cylinder 19 is provided on the top of the cleaning chamber 16, and a water pump 29 is installed on the top of the coating chamber 18. The material is placed in the placement groove 23 inside the cleaning rack 21. The cylinder 19 drives the telescopic rod 22 so that the cleaning rack 21 is located inside the ultrasonic cleaning tank 14. The detergent is placed inside. The sound energy of the power ultrasonic frequency source is converted into mechanical vibration through the internal transducer. The ultrasonic wave is radiated to the cleaning liquid in the tank through the cleaning tank. This vibration enables the microbubbles in the liquid in the tank to maintain vibration, thereby enhancing the cleaning effect.

[0023] See also Figure 1-Figure 5 A cleaning rack 21 is disposed inside the cleaning chamber 16, and the cleaning rack 21 is hollow as a whole.

[0024] See also Figure 1-Figure 5 A placement slot 23 is provided inside the cleaning rack 21 , and a telescopic rod 22 is installed on the top of the cleaning rack 21 .

[0025] See also Figure 1-Figure 5 A positive electrode seat 26 is provided at the bottom of the coating chamber 18, an air inlet 24 is provided on one side of the positive electrode seat 26, and an exhaust port 25 is provided on the other side of the positive electrode seat 26. In the OLED display 1, the preparation of the thin film is one of the key processes, which involves the preparation and stacking of multiple functional films. Then, the organic light-emitting material is synthesized and purified, which is a key component of the OLED display 1. Then, the organic light-emitting material, the anode, and the cathode layer are deposited layer by layer on the substrate 5 through the thin film deposition technology to form the basic structure of the OLED display 1. At the same time, the thickness and composition of the thin film need to be controlled to meet the performance requirements of the OLED display 1.

[0026] See also Figure 1-Figure 5A power source 28 is provided at the top of the coating chamber 18, a circulating cooling water 27 is provided on one side of the power source 28, an emitting electrode 30 is provided below the power source 28, and a coating target 31 is provided at the bottom of the emitting electrode 30. The connection and circuit pattern between the layers in the OLED display screen 1 are formed by photolithography technology, and the metal material is deposited at a specified position by a sputtering process to form structures such as electrodes and wires. The cathode of the OLED device is metal, and the anode is a transparent conductive material. When preparing the cathode and the anode, their thickness and uniformity need to be controlled. When coating, the sputtering coating method is used. First, the exhaust port 25 is used to make the chamber in a The process is carried out in a vacuum state by introducing an inert gas, argon, and applying a voltage thereto to ionize the argon into argon ions. These argon ions gain kinetic energy under electric field acceleration and bombard the target. When the energy of the bombarding particles exceeds four times the sublimation heat of the target, the target atoms are pushed out of the lattice position to form gas phase atoms. These atoms are deposited on the substrate to form a thin film. High-quality and uniform thin film coverage can be achieved by adjusting the sputtering technical parameters, thereby ensuring the uniformity of the coating. This solves the problem that the manufacturing method of the OLED display screen 1 in the prior art is prone to unevenness during the coating operation, thereby affecting its manufacturing quality.

[0027] It will be apparent to those skilled in the art that the invention is not limited to the details of the exemplary embodiments described above and that the invention can be implemented in other specific forms without departing from the spirit or essential features of the invention. Therefore, the embodiments should be considered exemplary and non-limiting in all respects, and the scope of the invention is defined by the appended claims rather than the foregoing description, and it is intended that all variations falling within the meaning and scope of the equivalent elements of the claims be included in the invention. Any reference numeral in a claim should not be considered as limiting the claim to which it relates.

Claims

1. An OLED display screen, comprising a display screen (1), characterized in that: The display screen (1) is provided with a shell (2) on the outside, a vertical pole (3) is provided at the bottom of the shell (2), a support frame (4) is provided at the bottom of the vertical pole (3), the upper and lower ends of the vertical pole (3) are plugged and connected to the shell (2) and the support frame (4) respectively, and the display screen (1) is provided with a substrate (5) at the bottom, an anode plate (6) is provided above the substrate (5), a hole injection layer (7) is provided above the anode plate (6), a hole transport layer (8) is provided above the hole injection layer (7), an organic light-emitting layer (9) is provided above the hole transport layer (8), an electron transport layer (10) is provided above the organic light-emitting layer (9), an electron injection layer (11) is provided above the electron transport layer (10), and a cathode plate (12) is provided above the electron injection layer (11).

2. The method for manufacturing an OLED display screen according to claim 1, characterized in that: The following steps are involved: Step 1: First, a glass material is selected as the substrate (5). The substrate (5) needs to be cleaned to remove dirt and impurities on the surface to ensure the cleanliness of the substrate (5). The cleaning method adopts ultrasonic cleaning and chemical cleaning. The appropriate cleaning method is selected according to the material of the substrate (5) and the degree of surface contamination. After cleaning, the substrate (5) reaches a certain cleanliness index to ensure the smooth progress of subsequent processes and the quality of the product; Step 2: In the OLED display (1), the preparation of thin films is one of the key processes, which involves the preparation and stacking of multiple functional thin films. Next, the organic light-emitting material is synthesized and purified, which is a key component of the OLED display (1). Then, the organic light-emitting material, anode, and cathode layers are deposited layer by layer on the substrate (5) through thin film deposition technology to form the basic structure of the OLED display (1). At the same time, the thickness and composition of the thin film need to be controlled to meet the performance requirements of the OLED display (1); Step 3: OLED devices require a transparent conductive substrate, which is made of glass. When making the substrate, the material needs to be cleaned and its surface needs to be kept flat. The core of OLED devices is organic materials, which need to be made through precise synthesis methods. Organic materials include hole transport materials, luminescent materials and electron transport materials. Photolithography technology is used to connect and pattern the various layers in the OLED display (1). Metal materials are deposited at designated locations through a sputtering process to form structures such as electrodes and wires. The cathode of the OLED device is metal, while the anode is a transparent conductive material. When preparing the cathode and anode, their thickness and uniformity need to be controlled. Step 4: Assemble the prepared OLED display screen (1) with the driving circuit chip and packaging materials, using a metal film for packaging to form a complete display screen (1) module, and then conduct electrical and optical performance tests to ensure that its performance and quality meet the requirements.

3. The method for manufacturing an OLED display screen according to claim 2, characterized in that: The cleaning and sputtering process described in the above step 3 includes a cleaning chamber (16) and a coating chamber (18), a drying chamber (17) is arranged between the cleaning chamber (16) and the coating chamber (18), and a support platform (13) is arranged at the bottom of the cleaning chamber (16), the coating chamber (18) and the drying chamber (17).

4. The method for manufacturing an OLED display screen and the OLED display screen according to claim 3, characterized in that: An ultrasonic cleaning tank (14) is provided on one side of the bottom of the support platform (13), an electrode holder (15) is provided on the other side of the bottom of the support platform (13), and front ends of the cleaning chamber (16), the coating chamber (18), the drying chamber (17), the ultrasonic cleaning tank (14) and the electrode holder (15) are all provided with door bodies (20).

5. The method for manufacturing an OLED display screen and the OLED display screen according to claim 4, characterized in that: A cylinder (19) is provided on the top of the cleaning chamber (16), and a water pump (29) is installed on the top of the coating chamber (18).

6. The method for manufacturing an OLED display screen and the OLED display screen according to claim 5, characterized in that: A cleaning rack (21) is arranged inside the cleaning chamber (16), and the cleaning rack (21) is hollow as a whole.

7. The method for manufacturing an OLED display screen and the OLED display screen according to claim 6, characterized in that: A placement groove (23) is provided inside the cleaning rack (21), and a telescopic rod (22) is installed on the top of the cleaning rack (21).

8. The method for manufacturing an OLED display screen and the OLED display screen according to claim 7, characterized in that: A positive electrode seat (26) is provided at the bottom end of the coating chamber (18), an air inlet (24) is provided on one side of the positive electrode seat (26), and an air extraction port (25) is provided on the other side of the positive electrode seat (26).

9. The method for manufacturing an OLED display screen and the OLED display screen according to claim 8, characterized in that: A power source (28) is provided at the top end of the coating chamber (18), and circulating cooling water (27) is provided on one side of the power source (28).

10. The method for manufacturing an OLED display screen and the OLED display screen according to claim 9, characterized in that: An emitting electrode (30) is arranged below the power source (28), and a coating target material (31) is arranged at the bottom of the emitting electrode (30).

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