High-hardness anti-dazzle glass combining light interference principle and micro-nano structure design and ARAGAF coating process of high-hardness anti-dazzle glass

Abstract

The invention relates to the technical field of glass cover plate coating, in particular to high-hardness anti-dazzle glass combining the light interference principle and micro-nano structure design and an ARAFAG coating technology of the high-hardness anti-dazzle glass. The surface of a glass substrate is sequentially covered with a double-layer TiO2 film layer, an etching layer and an MgF2 film layer from inside to outside. Compared with the prior art, according to the high-hardness anti-glare glass combining the light interference principle and the micro-nano structure design and the ARAFAG coating process of the high-hardness anti-glare glass, the hardness of the glass cover plate after the AR process is remarkably improved, the glass cover plate is combined with the AF process and the AG process, and the anti-glare effect of the glass cover plate is improved. The glass which is excellent in hardness and wear resistance, oleophobic, hydrophobic, oil-stain-resistant, fingerprint-resistant and anti-glare is prepared. Meanwhile, a 3A process is combined to realize coexistence of a plurality of properties. The method can be used for conventional and high-requirement products, and is wider in application range and more suitable for industrial production.

Description

Technical Field

[0001] The present application relates to the technical field of glass cover coating, and in particular to a high-hardness anti-glare glass and its ARAGAF coating process which utilizes the interference principle of light and a combination of micro-nano structure design. Background Art

[0002] AR (Anti-Reflection) glass is anti-reflective glass. By applying an optical coating on one or both sides of the glass, its reflectivity can be reduced and its transmittance increased. The maximum transmittance can be increased to more than 99% and the reflectivity to less than 1%. By increasing the transmittance of the glass, the content of the display screen is clearer. The AR process can be realized by magnetron sputtering or thermal evaporation technology, usually using two materials with high and low refractive indices to cross-stack. AF (Anti-Fingerprint) glass is anti-fouling and anti-fingerprint glass. AF anti-fouling and anti-fingerprint glass is based on the lotus leaf principle. A layer of nanochemical material is coated on the outer surface of the glass to reduce the surface tension of the glass to the minimum, and the contact area between dust and the glass surface is reduced by 90%, making it have strong hydrophobic, anti-oil and anti-fingerprint capabilities; so that the video glass panel can maintain a smooth and bright effect for a long time. The process is realized by vacuum evaporating a layer of AF material on the glass or by PVD process to improve its wear resistance. The disadvantage of the traditional AR process is that the hardness is not improved enough, and the anti-oil and anti-fingerprint capabilities are not strong. However, the products manufactured by the traditional AF process do not have enough reflectivity. Summary of the invention

[0003] The technical problem solved by the present invention is to provide a high-hardness anti-glare glass and its ARAGAF coating process which utilizes the interference principle of light and micro-nano structure design to solve the problems mentioned in the above-mentioned background technology.

[0004] The manufacturing method of glass coating provided by the present invention comprises the following steps: growing a layer of TiO2 film on the bottom surface of the glass by thermal evaporation, growing another layer of TiO2 film after polishing by HF etching, performing AG etching by spraying frosting liquid on the glass, and vapor-depositing a layer of MgF2 material on the surface of the micro-nano structure by magnetron sputtering.

[0005] Furthermore, in the above-mentioned method for manufacturing high-performance glass, the glass is cut, edged and cleaned before thermal evaporation.

[0006] Furthermore, in the above-mentioned method for manufacturing high-performance glass, before thermal evaporation, vacuum is first performed for about an hour to reduce the pressure to the pressure required for the experiment.

[0007] Furthermore, the manufacturing method of the high-performance glass mentioned above manufactures the first layer of the high-performance glass by using TiO2 pellets for evaporation. The thermal evaporation rate is stabilized at about 0.2A / s by adjusting the power, and the pre-evaporation is performed for 15 minutes.

[0008] Furthermore, in the method for manufacturing the high-performance glass, after the pre-evaporation is completed, the evaporation rate is maintained at the same rate as the pre-evaporation, and a 25-30 nm TiO2 film layer is evaporated on the glass using TiO2 pills.

[0009] Furthermore, in the manufacturing method of the high-performance glass, after the evaporation is completed, the surface just coated is immersed in 24% HF, and the etching time is about 1.5 minutes.

[0010] Furthermore, in the method for manufacturing the high-performance glass, the etched glass is placed in cold water.

[0011] Furthermore, the manufacturing method of the high-performance glass mentioned above repeats the above work, re-evacuates the glass and then evaporates a 25-30nm TiO2 film layer on the glass just etched at the same power and for the same time.

[0012] Furthermore, in the manufacturing method of the high-performance glass, 5.5g CaF2, 9.5g Na2SiF6, 145g NH4HF2, 9g CaSO4, 9.5g NH4HSO4 and 5g suspending agent are used to prepare the frosting liquid required for anti-glare, and the aging time of the frosting liquid is 6h.

[0013] Furthermore, in the manufacturing method of the high-performance glass, the prepared frosting liquid is sprayed on the side of the glass without coating, the frosting time of the panel is 8 minutes, and the etching is 10-15nm.

[0014] Furthermore, in the manufacturing method of the high-performance glass, the radio frequency magnetron sputtering technology is used on the frosted side, the gas introduced is pure argon gas, and before magnetron sputtering, the gas is evacuated to the pressure required for the experiment.

[0015] Furthermore, the above-mentioned method for manufacturing high-performance glass uses a MgF2 target material with a target power of 50W and pre-sputtering for 15 minutes.

[0016] Furthermore, in the method for manufacturing the high-performance glass, the sputtering power is maintained the same as that of the pre-sputtering, the sputtering is performed for 15 minutes, the pure argon gas is maintained, and the MgF2 film layer is sputtered to a thickness of 12 to 18 nm.

[0017] Beneficial effects: Compared with the prior art, the present invention provides a high-hardness anti-glare glass and its ARAFAG coating process that utilizes the interference principle of light and the design of micro-nano structures, which significantly improves the hardness of the glass cover after the AR process, and is combined with the AF and AG processes to prepare glass with excellent hardness and wear resistance, and is oleophobic, hydrophobic, anti-greasy, anti-fingerprint and anti-glare. The overall hardness of the glass is improved, and at the same time, multiple properties are achieved by combining the 3A process. It can be used for conventional and high-demand products, has a wider range of applications, and is more suitable for industrial production. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] Figure 1 The structural diagram of the glass cover plate of the present invention is In the figure, 1 is the MgF2 film layer, 2 is the etching layer, 3 is the glass layer, 4 is the TiO2 film layer after etching, and 5 is the TiO2 film layer.

Claims

1. A high-hardness anti-glare glass cover plate and its ARAFAG coating process using the interference principle of light and micro-nano structure design, characterized in that: It comprises a glass substrate and a functional layer covering the surface of the glass substrate, wherein the functional layer comprises a TiO2 film layer, an etching layer and a MgF2 film layer, and the double-layer TiO2 film layer, the etching layer and the MgF2 film layer are alternately covered on the surface of the glass substrate from the inside to the outside.

2. The high-hardness anti-glare glass cover plate according to claim 1, which is characterized by: The TiO2 film has two layers, while the other films have only one layer.

3. The high-hardness anti-glare glass cover plate according to claim 1, which is characterized by: The thickness of the TiO2 film layer is 25-30 nm.

4. The high-hardness anti-glare glass cover plate according to claim 1, which is characterized by: The etching layer has a thickness of 10-15 nm.

5. The high-hardness anti-glare glass cover plate according to claim 1, which is characterized by: The thickness of the MgF2 film layer is 12-18 nm.

6. An AR coating process for producing the double-layer TiO2 film of claim 3, characterized in that: The following steps are involved: Selecting a glass substrate, and cutting the glass substrate into a specified size; Put the glass substrate into the cleaning chamber and clean the glass substrate with deionized water; The cleaned glass substrate is sent into a vacuum drying oven for drying; Place the glass substrate into the chamber of the thermal evaporation equipment and perform vacuum treatment with a vacuum degree of 5.0E. -4 pa, the TiO2 pellets were placed in the pellet evaporation boat, the thermal evaporation rate was stabilized at about 0.2A / S, and the pre-evaporation was performed for 15 minutes. After the pre-evaporation was completed, the same evaporation rate as the pre-evaporation was maintained to evaporate a 25-30nm TiO2 film on the glass substrate; After the evaporation is completed, the coated side is immersed in 24% HF, and the etching time is about 1.5 minutes; After etching is completed, place the etched glass in cold water; Repeat the thermal evaporation process, re-evacuate the glass and evaporate a 25~30nm TiO2 film at the same power and time on the etched glass.

7. An AG coating process for producing the etching layer of claim 4, characterized in that: The following steps are involved: The frosting liquid required for anti-glare is prepared with 5.5g CaF2, 9.5g Na2SiF6, 145g NH4HF2, 9g CaSO4, 9.5g NH4HSO4 and 5g suspending agent. The aging time of the frosting liquid is 6h. Spray the prepared frosting liquid on the uncoated side of the glass, and the frosting time of the panel is 8 minutes; An etching layer formed by an etching solution is formed on the TiO2 film layer, and the thickness of the etching layer is 10-15 nm.

8. An AF coating process for producing the MgF2 film of claim 5, characterized in that: The following steps are involved: Place it in the chamber of the magnetron sputtering equipment, perform magnetron sputtering on the frosted glass cover, and perform vacuum treatment with a vacuum degree of 8.0E -4 pa, with MgF2 target as the target material, the Ar flow rate is 220sccm, the sputtering power is 50W, pre-sputtering for 15 minutes, while maintaining the same sputtering power as the pre-sputtering, sputtering for 15 minutes, the thickness is 12~18nm, and a MgF2 film layer is plated on the etched film layer.

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