High-precision measurement device and adjustment calibration method for optical axis deviation in multi-aperture imaging systems

Abstract

This invention relates to a high-precision measurement device and adjustment calibration method for optical axis deviation in multi-aperture imaging systems, belonging to the field of multi-aperture imaging technology. Addressing the problems of current measurement devices being bulky, heavy, and expensive, this invention includes a mounting substrate and an optical axis deviation adjustment component. The multi-aperture imaging system is located on one side of the reflected light path of the optical axis deviation adjustment component. The optical axis deviation adjustment component includes a collimating light source, multiple beam splitting elements, a large-aperture plane mirror, and a light spot acquisition and analysis device. The large-aperture plane mirror completely encloses the optical axis of the multi-aperture imaging system. By adjusting the large-aperture plane mirror, the light beam reflected by N1 returns and is transmitted through N1, then focused at the focal point of the focusing lens, making the centroid of the light spot close to the center coordinates of the area array photodetector. Similarly, other beams reflected by N1 are focused at the focal point of the focusing lens. i The centroids of the reflected light spots are all located at the same position as the centroid of the N1 light spot, thus enabling the calibration of the optical axis deviation of the multi-aperture imaging system.

Description

Technical Field

[0001] This invention relates to the field of multi-aperture imaging technology, and in particular to a high-precision measuring device and adjustment and calibration method for optical axis deviation in multi-aperture imaging systems. Background Technology

[0002] Multi-aperture imaging detection is an emerging imaging detection technology that arranges multiple single-aperture imaging systems in a certain geometric layout. It can improve imaging resolution by using coherent detection between multiple apertures, increase the imaging field of view by stitching together the fields of view between different apertures, and achieve imaging over a wider spectral range by using different detection bands for different apertures.

[0003] During the setup and adjustment phase of a multi-aperture imaging system, to achieve high-precision setup and adjustment of the multi-aperture axes, a large-diameter collimator capable of enveloping all multi-aperture imaging entrance pupils is typically used as a reference light source. Each imaging axis is precisely adjusted to maintain microradian-level accuracy between them. However, after exposure to mechanical and temperature environments during use, it becomes difficult for the imaging axes to maintain a high-precision relative axis relationship, affecting coherent imaging or field-of-view stitching capabilities. Therefore, frequent high-precision measurements and calibrations of the axes are necessary.

[0004] However, large-diameter collimators are bulky, heavy, and expensive, making them difficult to calibrate conveniently at the site of use for multi-aperture imaging systems. Therefore, this paper proposes a lightweight, portable, and self-calibrating high-precision multi-aperture line-of-sight deviation measurement device. Summary of the Invention

[0005] To address the shortcomings of existing technologies, this invention aims to provide a high-precision measurement device and calibration method for optical axis deviation in multi-aperture imaging systems. By combining multiple discrete optical elements with a large-aperture plane mirror, it overcomes the drawbacks of the large size and high cost of existing measurement devices, facilitating the calibration measurement of optical axis deviation at the site where the multi-aperture imaging system is used. This achieves the goal of accurate measurement of optical axis deviation in multi-aperture imaging systems and high-precision calibration of the optical axis of multi-aperture imaging systems.

[0006] To achieve the above-mentioned technical objectives, the present invention adopts the following technical solution:

[0007] The first aspect of the technical solution disclosed in this invention is: a high-precision measuring device for optical axis deviation of a multi-aperture imaging system, comprising an optical axis deviation adjustment component and a multi-aperture imaging system disposed on the same plane, wherein the multi-aperture imaging system is located on one side of the reflected light path of the optical axis deviation adjustment component, and the optical axis deviation of the multi-aperture imaging system is measured and calibrated by the optical axis deviation adjustment component.

[0008] As a further preferred embodiment of the above scheme: the optical axis deviation adjustment component includes a collimating light source, multiple beam-splitting elements, a large-aperture plane mirror, and a light spot acquisition and analysis device, wherein:

[0009] Multiple beam splitting elements including N1, N2…N i Multiple beam-splitting elements are parallel to each other and are on the same axis as the collimating light source in the transverse direction, and on the same axis as the multi-aperture imaging system in the longitudinal direction;

[0010] A portion of the emitted beam from the collimated light source is transmitted sequentially through N1 to N2, ... N i The other part of its emitted beam passes through N1, N2...N i Reflected onto the multi-aperture imaging system;

[0011] The light spot acquisition and analysis device is coaxially set with the optical axis of aperture one in the multi-aperture imaging system, and the optical axis deviation between the two is less than 10 microradians.

[0012] A large-aperture plane mirror is mounted on a mounting substrate and positioned between multiple beam-splitting elements and a multi-aperture imaging system.

[0013] A further preferred embodiment is that each beam splitter is mounted on the mounting substrate via a two-dimensional adjustment lens frame, and the wavefront variation between the reflected and transmitted light of the beam splitter is less than λ / 10.

[0014] As a further preferred embodiment of the above technical solution: the light spot acquisition and analysis device includes an analysis component and a collector. The analysis component is located on the side of the multiple beam splitting elements away from the multi-aperture imaging system, and the optical axis of the analysis component is nearly coaxial with the optical axis of the aperture. The collector is a host computer, which communicates with the analysis component.

[0015] Furthermore, the analysis component includes an area array photodetector and a focusing lens, with the focusing lens located between multiple beam-splitting elements and the area array photodetector, and the area array photodetector communicating with the data acquisition unit.

[0016] As a further preferred embodiment of the above technical solution: the deviation of the optical axis of aperture i from that of aperture one is:

[0017] Δα 1i =Δα1-Δα i

[0018] Δβ 1i =Δβ1-Δβ i

[0019] In the formula: Δα 1i Δβ 1iLet Δα and Δβ1 represent the pitch and azimuth angle deviations of the optical axis of aperture i relative to the optical axis of aperture 1, respectively; Δα1 and Δβ1 represent the pitch and azimuth angle deviations of the optical axis of aperture 1 relative to the optical axis of the analysis component, respectively. i Δβ i These represent the pitch and azimuth angle deviations of the aperture i optical axis relative to the optical axis of the analysis component, respectively.

[0020] The second aspect of the technical solution disclosed in this invention is: a high-precision adjustment and calibration method for optical axis deviation in a multi-aperture imaging system, comprising the following steps:

[0021] S1: Adjust the pitch and angular positions of N1 so that the collimated light source is reflected by the N1 element and incident on aperture one, and the image is formed at the center of the focal plane of aperture one.

[0022] S2: Install a large-aperture plane mirror on the mounting base and adjust it so that the light beam reflected by the large-aperture plane mirror returns to N1 along the original path. After being transmitted through N1, it is focused to its focal point by the focusing lens.

[0023] S3: Adjust the area array photodetector to the focal plane of the focusing lens and record the centroid position of the N1 spot (Δ). x1 ,Δ y1 );

[0024] S4: Block the beam reflected by N1 to the large-aperture plane mirror. By adjusting the pitch and angular positions of N2, ensure that the centroid of the beam returning to the analysis unit after being reflected by N2 to the large-aperture plane mirror, then reflected by the large-aperture plane mirror, N2, and N1, is also located within (Δ). x1 ,Δ y1 ), sequentially blocking through N2…N i-1 The beam reflected to the large-aperture plane mirror, adjust N i The pitch and angular positions make N i After reflection, it is reflected by a large-aperture plane mirror and then sequentially passes through N... i-1 The light is reflected back to the centroid of the light spot on the analysis component (Δ). x1 ,Δ y1 );

[0025] S5: Remove the large-diameter plane mirror, so that the light passing through N... i The reflected light beams are incident on aperture i and the centroid of the light spot (Δc) is obtained on the corresponding imaging focal plane. x1 ,Δc y1 The optical axis of the imaging system with aperture i was measured to be:

[0026] Δα i =Δ cxi / f i

[0027] Δβ i =Δ cyi / f i

[0028] In the formula: Δα i Δβ i These represent the pitch and azimuth angle deviations of the aperture i optical axis relative to the optical axis of the analysis component, respectively; f i The focal length represents the aperture i;

[0029] S6: Based on the optical axis of the imaging system with aperture i, obtain the deviation (Δα) of the optical axis of the other aperture imaging systems relative to the optical axis of aperture one. 1i Δβ 1i ).

[0030] Compared with the prior art, the technical solution of the present invention has the following beneficial effects:

[0031] 1. The measuring device of this invention employs a combination of multiple beam-splitting elements and a large-aperture plane mirror to perform high-precision measurement and adjustment calibration of the optical axis deviation of a multi-aperture imaging system. It is lightweight, easily portable, and has a self-calibration function (i.e., it can obtain N1, N2…N… i The emitted beam is parallel, avoiding the drawbacks of existing measuring equipment such as large size and bulkiness, making it convenient to carry out line-of-sight deviation calibration measurements at the site where multi-aperture imaging systems are used.

[0032] 2. The adjustment and calibration method of this invention utilizes a large-aperture plane mirror to completely enclose the optical axis of the multi-aperture imaging system. By adjusting the tilt angle of the large-aperture plane mirror, the light beam reflected by N1 returns to N1 via the original path and is transmitted through N1. The beam is then focused to the focal point by the focusing lens. The area array photodetector is adjusted to be on the focal plane of the focusing lens, so that the centroid of the light spot is close to the center coordinates of the area array photodetector, thus achieving preliminary optical path adjustment. Then, N1, N2...N are blocked sequentially. i By adjusting the pitch and angular positions of each beam splitter, the centroid positions of the beams of the remaining beam splitters are all located at the same position as the centroid of the beam of N1. This ensures that the optical axis deviation of each beam splitter is within the measurement error range, and the optical axis deviation of the multi-aperture imaging system is reasonably calibrated. Attached Figure Description

[0033] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly described below.

[0034] Figure 1 This is a schematic diagram of the overall layout of a high-precision measurement device for optical axis deviation in a multi-aperture imaging system according to the present invention.

[0035] Figure 2This is a schematic diagram of the overall layout of the measuring device (excluding calibration) and the multi-aperture imaging system of the present invention;

[0036] Figure 3 This is a top view schematic diagram showing the optical path relationship between the measuring device and the multi-aperture imaging system of the present invention;

[0037] In the figure: 1. Optical axis deviation adjustment component; 11. Collimating light source; 12. Beam splitting element; 13. Large aperture planar emission mirror; 14. Light spot acquisition and analysis device; 141. Area array photodetector; 142. Focusing lens; 2. Multi-aperture imaging system; 21. Aperture 1; 3. Mounting substrate. Detailed Implementation

[0038] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are some embodiments of the present invention, but not all embodiments.

[0039] Example 1:

[0040] Reference Figure 1-3 This invention provides a high-precision measuring device for optical axis deviation of a multi-aperture imaging system, comprising an optical axis deviation adjustment component 1 and a multi-aperture imaging system 2 disposed on the same plane. Both the optical axis deviation adjustment component 1 and the multi-aperture imaging system 2 are disposed on a mounting substrate 3. The mounting substrate 1 is made of high-rigidity metal / non-metal material and is manufactured through a lightweight structural design. The lightweight design method is a method well known in the art, such as partial material removal or the use of a frame structure, with a weight reduction rate of more than 60% to facilitate movement and handling. The multi-aperture imaging system 2 is located on one side of the reflected light path of the optical axis deviation adjustment component 1. The optical axis deviation of the multi-aperture imaging system 2 is measured and calibrated by the optical axis deviation adjustment component 1.

[0041] Specifically, the optical axis deviation adjustment component 1 includes a collimating light source 11, multiple beam-splitting elements 12, a large-aperture plane mirror 13, and a light spot acquisition and analysis device 14.

[0042] In this embodiment, the collimating light source 11 uses a laser with a wavelength of λ, and the output wavefront PV value is better than λ / 2. The output power of the collimating light source 11 is adjustable to adapt to imaging systems with different gain coefficients.

[0043] Multiple beam splitting elements 12 include N1, N2…N i Multiple beam splitting elements 12 are parallel to each other and are located on the same axis as collimating light source 11 in the lateral direction, and on the same axis as multi-aperture imaging system 2 in the longitudinal direction. Each beam splitting element 12 is mounted on mounting base plate 3 through two-dimensional adjustment lens frame, and each beam splitting element 12 is parallel to each other.

[0044] In this embodiment, the beam splitter 12 adopts a beam splitter prism or beam splitter as in the prior art. The beam splitter 12 is used to reflect part of the laser light and transmit part of the laser light in the direct light source 11. Its reflectivity is R and transmittance is T. It is required that the wavefront change between the reflected light and the transmitted light is less than λ / 10 and the angle between the front and rear surfaces of the beam splitter 12 is less than 1 microradian. The two-dimensional adjustment frame is used to clamp and fix the beam splitter 12 and adjust the pitch and azimuth of the reflected and transmitted light of the beam splitter 12.

[0045] A portion of the emitted beam from the collimated light source 11 is transmitted sequentially through N1 to N2, ... N i The other part of its emitted beam passes through N1, N2...N i The image is reflected to a multi-aperture imaging system 2, which includes i imaging apertures, labeled C1, C2…C… i express;

[0046] In this embodiment, the mounting base plate 3 is machined with mounting holes of different types for mounting the collimating light source 11, multiple two-dimensional adjustable lens frames and large-diameter plane lens mount 13.

[0047] A large-aperture plane mirror 13 is mounted on a mounting substrate 1 and located between multiple beam-splitting elements 12 and a multi-aperture imaging system 2;

[0048] In this embodiment, the aperture of the large-aperture plane mirror 13 is larger than the optical axis envelope of the multi-aperture imaging system 2, its surface shape error is better than λ / 10, it is highly reflective of the laser of the direct light source 11, and its reflectivity is greater than 99%. The tilt angle of the large-aperture plane mirror 13 is adjustable.

[0049] The light spot acquisition and analysis device 14 includes an analysis component and a collector. The analysis component is located on the side of the multiple beam splitting elements 12 away from the multi-aperture imaging system 2, and the optical axis of the analysis component is nearly coaxial with the optical axis of the aperture 21. The collector is a host computer, and there is a communication connection between the collector and the analysis component.

[0050] Furthermore, the analysis components include an area array photodetector 141 and a focusing lens 142. The area array photodetector 141 uses an existing CCD or CMOS sensor and can respond to the laser wavelength of the collimated light source 11. The focusing lens 142 is located between multiple beam splitting elements 12 and the area array photodetector 141 and is used to focus the collimated light source 11. The focal length of the focusing lens 142 is f. The area array photodetector 141 is connected to the host computer via a common USB cable or network cable. The host computer is a computer or other embedded system used to display the light spot image detected by the area array photodetector 141.

[0051] The area array photodetector 141 is disposed on the side of the multiple beam splitting elements 12 away from the multi-aperture imaging system 2, and the optical axis of the area array photodetector 141 is coaxial with the optical axis of C1.

[0052] The position of the light spot centroid relative to the center of the area array photodetector 141 (Δ) x Δ y By combining the focal length, the deviation angle of the incident optical axis can be calculated:

[0053] Δα=Δx / f

[0054] Δβ=Δy / f

[0055] In the formula: Δα and Δβ represent the deviations of the incident beam relative to the optical axis of the spot detection device in the elevation and azimuth angles, respectively, and f represents the focal length of the imaging aperture.

[0056] The adjustment accuracy (Δx, Δy) of the spot centroid position depends on the pixel size Δ of the area array photodetector 141 and the extraction accuracy N of the spot centroid. If the extraction accuracy N of the spot centroid can reach Δ / 8, then the position measurement accuracy of the spot centroid (Δx1, Δy1) is Δ / 8, and the corresponding measurement accuracy of the beam angle incident on the focusing lens 142 is Δ / (8f). If the pixel size of the area array photodetector 141 is 4μm and the focal length of the focusing lens 142 is 1m, then the detection accuracy of the optical axis can reach 0.5urad.

[0057] For ease of understanding, combined with Figure 2-3 The mounting relationship of the multi-aperture imaging system and measuring device of the present invention is further described as shown.

[0058] Reference Figure 3 Using the XOY plane as the reference plane, the multi-aperture imaging system 2 and the measuring device are installed respectively. The center coordinates of the optical lens of the i-th aperture of the multi-aperture imaging system 2 are C. i (x i ,y i ,z i Furthermore, its optical lens imaging axis is parallel to the Y-axis.

[0059] In this embodiment, for simplicity, the center height of each optical lens is adjusted to be consistent, and they are at the same position in the y-axis direction, i.e., z. i =z0,y i =y0+L, so the center coordinates of aperture 1, 21 are defined as C1(x1,y0+L,z0). Similarly, the center coordinates of aperture 2 are C2(x2,y0+L,z0), and the center coordinates of aperture i are C... i (x i ,y0+L,z0);

[0060] Mounting substrate 3 is located on the XOY plane. Collimated light source 11, each beam splitter 12, and light spot acquisition and analysis device 14 are respectively mounted on mounting substrate 3, so that the laser beam emitted by collimated light source 11 is parallel to the X-axis and its center height is z0. A surface array photodetector 141 is mounted, and its center height is also z0. The optical axis of the surface array photodetector 141 coincides with the optical axis of aperture 21.

[0061] Mount N1 and the two-dimensional adjustment frame onto the mounting base 3, so that the center position of N1 is P1(x1,y0,z0), that is, P1 is aligned with the center of C1. Similarly, mount N2…N i The corresponding two-dimensional adjustable lens frame is sequentially installed on the mounting base 3, such that the center position of N2 is P2(x2,y0,z0), N i The center position is P i (x i ,y0,z0), that is, P2…P i With C2…C i The centers are aligned, and initial adjustments are made to ensure that N1, N2...N i The reflecting surface is at a 45-degree angle to the optical axis of aperture 121.

[0062] Combination Figure 2 The light beam output from the collimated light source 11 passes through N1, and part of it is reflected to C1. The transmitted light continues to reach N2, and the light beam reflected by N2 is incident on C2. The light beam transmitted by N2 is then reflected by N3 and incident on C3. This constitutes the optical path relationship between each optical path structure and the multi-aperture imaging system.

[0063] Example 2:

[0064] Combination Figure 1-3 The high-precision adjustment and calibration method for optical axis deviation in multi-aperture imaging systems proposed in this invention comprises the following steps:

[0065] 1) Adjust the pitch and angular positions of N1 so that the collimated light source 11 is reflected by N1 and incident on the aperture 21, and imaged at the center of the focal plane of the aperture 21.

[0066] 2) such as Figure 3 A large-aperture plane mirror 13 is mounted on the mounting substrate 3, positioned between N1 and aperture 21, with the reflecting surface facing the incident light direction. The large-aperture plane mirror 13 is adjusted so that the light beam reflected by it returns to N1 along the original path, and after being transmitted through N1, it is focused to its focal point by the focusing lens 142.

[0067] 3) Adjust the area array photodetector 141 to the focal plane of the focusing lens 142, and adjust the lateral position of the area array photodetector 141 so that the centroid position of the light spot (Δ) is adjusted.x1 ,Δ y1 The center coordinates of the near-array photodetector 141 are recorded (Δ). x1 ,Δ y1 ) numerical value;

[0068] 4) Blocking the light beam reflected by N1 to the large-aperture plane mirror 13, the next imaging aperture adjustment begins. The collimated light source 11, after transmission through N1 and reflection through N2, is incident on the large-aperture plane mirror 13. After being reflected again by the large-aperture plane mirror 13, it is reflected by N2 and N1 respectively, and then returns to the area array photodetector 141 through the focusing lens 142. The area array photodetector 141 transmits the received light spot image to the host computer for display. By finely adjusting the pitch and angular positions of N2, the centroid of the light spot is also located within (Δ). x1 ,Δ y1 Thus, the optical axis deviation between the beam reaching the large-aperture plane mirror 13 via N2 and the beam reaching the large-aperture plane mirror 13 via N1 is less than Δ / (8f), approaching parallelism, and the deviation can be less than 1μrad; similarly, the beams reaching the large-aperture plane mirror 13 via N2…N are blocked sequentially. i-1 The beam reflected to the large-aperture plane mirror 13 is adjusted by N. i The pitch and angular positions make N i The light beam reaching the large-aperture plane mirror 13 is nearly parallel to the light beam reflected by N1 and reaching the large-aperture plane mirror 13. Through the above steps, the light beam reflected by N1 is made... i The reflected beams have nearly parallel optical axes, and the beam center is aligned with each aperture of the multi-aperture imaging system 2. The optical axis deviation of the multiple emitted beams formed after adjustment can be less than 1 μrad.

[0069] 5) Remove the large-diameter plane mirror 13, so that the light passing through N... i The reflected light beams are incident on aperture i, and the centroid (Δc) of the light spot is obtained on the imaging focal plane of aperture i. x1 ,Δc y1 The optical axis of the imaging system with aperture i was measured to be:

[0070] Δα i =Δ cxi / f i

[0071] Δβ i =Δ cyi / f i

[0072] In the formula: Δα i Δβ i They represent..., f i The focal length represents the aperture i;

[0073] 6) Based on the optical axis of the imaging system with aperture i, calculate the deviation of the optical axis of the other aperture imaging systems relative to the optical axis of aperture 21:

[0074] Δα 1i =Δα1-Δα i

[0075] Δβ 1i =Δβ1-Δβ i

[0076] In the invention, the measurement error is less than Δ / (8f), and different measurement accuracy requirements are met by selecting different Δ and f.

[0077] The detailed description of the above embodiments is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. Based on the embodiments of the present invention, they are only used to illustrate the technical solutions of the invention and not to limit it. Other modifications or equivalent substitutions made by those skilled in the art to the technical solutions of the present invention, as long as they do not depart from the spirit and scope of the technical solutions of the present invention, should be covered within the scope of the claims of the present invention.

Claims

1. A high-precision measuring device for optical axis deviation in multi-aperture imaging systems, characterized in that, It includes an optical axis deviation adjustment component (1) and a multi-aperture imaging system (2) set on the same plane. The multi-aperture imaging system (2) is located on one side of the reflected light path of the optical axis deviation adjustment component (1). The optical axis deviation of the multi-aperture imaging system (2) is measured and calibrated by the optical axis deviation adjustment component (1). The optical axis deviation adjustment component (1) includes a collimating light source (11), multiple beam-splitting elements (12), a large-aperture plane mirror (13), and a light spot acquisition and analysis device (14), wherein: Multiple beam splitting elements (12) include N1, N2…N i Multiple beam-splitting elements (12) are parallel to each other and are on the same axis as the collimating light source (11) in the transverse direction, and on the same axis as the multi-aperture imaging system (2) in the longitudinal direction; A portion of the emitted beam from the collimated light source (11) is transmitted sequentially through N1 to N2, ... N i The other part of its emitted beam passes through N1, N2...N i Reflected onto the multi-aperture imaging system (2); The light spot acquisition and analysis device (14) and the optical axis of aperture one (21) in the multi-aperture imaging system (2) are set coaxially; A large-aperture plane mirror (13) is positioned between multiple beam-splitting elements (12) and a multi-aperture imaging system (2); The light spot acquisition and analysis device (14) includes an analysis component and a collector. The analysis component is located on the side away from the multi-aperture imaging system (2) of multiple beam splitting elements (12), and the optical axis of the analysis component is coaxial with the optical axis of aperture one. The collector and the analysis component are connected in communication. The analysis component includes an area array photodetector (141) and a focusing lens (142). The focusing lens (142) is located between multiple beam splitting elements (12) and the area array photodetector (141). The area array photodetector (141) is connected to the data collector. The deviation of the optical axis of aperture i of the multi-aperture imaging system (2) relative to aperture one (21) is: In the formula: These represent the pitch and azimuth deviations of aperture i relative to the optical axis of aperture one, respectively. These represent the pitch and azimuth angle deviations of the aperture-optical axis relative to the optical axis of the analysis component, respectively. These represent the pitch and azimuth angle deviations of the aperture i optical axis relative to the optical axis of the analysis component, respectively.

2. The high-precision measuring device for optical axis deviation in a multi-aperture imaging system according to claim 1, characterized in that, The tilt angle of the beam splitter (12) is adjusted by a two-dimensional adjustment frame, and the wavefront variation of the reflected light and transmitted light of the beam splitter (12) is less than λ / 10.

3. A high-precision adjustment and calibration method for optical axis deviation in multi-aperture imaging systems, characterized in that, This method is used to adjust and calibrate the measuring device according to any one of claims 1-2 and to test the optical axis deviation, and includes the following steps: S1: Adjust the pitch and angular positions of N1 so that the collimated light source (11) is reflected by the N1 element and incident on the aperture (21), and imaged at the center of the focal plane of the aperture (21). S2: Install and adjust the large-aperture plane mirror (13) so that the light beam reflected by the large-aperture plane mirror (13) returns to N1 along the original path, is transmitted through N1, and is focused to its focal point by the focusing lens (142); S3: Adjust the area array photodetector (141) to the focal plane of the focusing lens (142), and record the position of the centroid of the light spot N1 (Δ). x1 ,Δ y1 ); S4: Block the beam reflected by N1 to the large-aperture plane mirror (13). By adjusting the pitch and angular positions of N2, the beam reflected by N2 to the large-aperture plane mirror (13), then reflected by the large-aperture plane mirror (13), N2, and N1, returns to the analysis component at a position where the centroid of the beam is also located at (Δ). x1 ,Δ y1 ), sequentially blocking through N2…N i-1 The beam reflected to the large-aperture plane mirror (13) is adjusted by N. i The pitch and angular positions make N i After reflection, it is reflected by the large-aperture plane mirror (13), and then sequentially by N. i-1 The light is reflected back to the centroid of the light spot on the analysis component (Δ). x1 ,Δ y1 ); S5: Remove the large-aperture plane mirror (13), so that the light passes through N... i The reflected light beams are incident on aperture i and the centroid of the light spot (Δc) is obtained on the corresponding imaging focal plane. x1 ,Δc y1 The optical axis of the imaging system with aperture i was measured to be: In the formula: These represent the pitch and azimuth angle deviations of the aperture i optical axis relative to the optical axis of the analysis component, respectively. f i The focal length represents the aperture i; S6: Based on the imaging optical axis of aperture i, obtain the optical axis deviation of the imaging optical axes of the other apertures relative to the optical axis of aperture one (21). .

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