A quick adjustment device and method for double-reflective optical system

Abstract

The present invention discloses a device and method for rapid adjustment of a double-reflective optical system, and relates to the field of optoelectronic integrated testing technology. A device for rapid adjustment of a double-reflective optical system comprises a wavefront measuring device, a double-reflective optical system to be measured, an adjustment fitting and a standard reflector. The wavefront measuring device is used to emit a light beam to the double-reflective optical system to be measured, and is used to receive a light beam emitted from the double-reflective optical system to be measured, and is also used to measure the shape of the optical wavefront. The wavefront measuring device, the double-reflective optical system to be measured and the standard reflector are sequentially arranged and constitute a first self-collimation measurement optical path; the double-reflective optical system to be measured has a main focus; the adjustment fitting is connected to the double-reflective optical system to be measured, and is used to find an imaging light spot; the standard reflector is used to reflect the light beam incident from the double-reflective optical system to the double-reflective optical system to be measured. The present invention solves the problems of poor accuracy and repeatability, slow speed of identifying imaging light spots, and low efficiency of integrated debugging.

Description

Technical Field

[0001] The invention relates to the technical field of optoelectronic integrated testing, and in particular to a rapid assembly and adjustment device and method for a double-reflective optical system. Background Art

[0002] The double-reflector optical system is a typical optical system with the characteristics of small system aberration, simple structure, and no chromatic aberration. It is widely used in astronomical observation, precision instruments, angle measurement, etc. With the development of optical surface processing technology, especially aspheric processing technology, the application of double-reflector optical system has been greatly improved, such as the RC optical system (Ritchey-Chrétien system) of astronomical telescopes, and the off-axis double-reflector system in multi-spectral parallel light sources.

[0003] The optical system adjustment work is to adjust the relative position relationship of optical components and reduce the processing error so that the optical system meets the required imaging quality requirements. At present, the double-reflection optical system adjustment mainly adopts direct measurement method and autocollimation measurement method. In the direct measurement method, a parallel light source is used to simulate the measurement target, but the difficulty of developing a large-aperture parallel light source limits the application of this method in large-aperture optical systems. The autocollimation method uses a large-aperture standard reflector or a spliced ​​standard reflector to realize the beam path, which effectively solves the problem of development difficulty and has broad application prospects.

[0004] The development of computer adjustment technology has improved the adjustment efficiency of optical systems, but it has also increased the complexity of the system. Under the limited conditions of application scenarios, specifications and costs, manual adjustment is still an important process link. However, as the aperture of the optical system increases, the iterative debugging process of the dual-reflector system becomes complicated. During the entire integrated adjustment process, the imaging spot is often searched for in a large range based on the subjective judgment of the operator, resulting in poor accuracy and repeatability. This is related to factors such as the operator's experience differences and fatigue status. Therefore, how to quickly identify the imaging spot, reduce human operation factors, and improve the efficiency of integrated debugging has become an urgent problem to be solved. Summary of the invention

[0005] The technical problem to be solved by the present invention is that most of the existing double-reflective optical systems are manually adjusted, resulting in poor accuracy and repeatability, slow imaging spot recognition speed, and low integrated debugging efficiency. The purpose is to provide a double-reflective optical system rapid adjustment device and method, which solves the problems of poor accuracy and repeatability, slow imaging spot recognition speed, and low integrated debugging efficiency.

[0006] The present invention is achieved through the following technical solutions:

[0007] A fast adjustment device for a double-reflection optical system comprises a wavefront measuring device, a double-reflection optical system to be measured, an adjustment fitting and a standard reflector.

[0008] The wavefront measuring device is used to emit a light beam to the double-reflection optical system to be measured, and to receive a light beam emitted from the double-reflection optical system to be measured, and is also used to measure the shape of the optical wavefront. The wavefront measuring device, the double-reflection optical system to be measured and the standard reflector are arranged in sequence and constitute a first self-collimation measurement optical path;

[0009] The double-reflective optical system under test has a prime focus;

[0010] Install the adjustment accessories and connect them to the double-reflection optical system to be tested, so as to find the imaging light spot;

[0011] The standard reflector is used to reflect the light beam incident from the double-reflective optical system to the double-reflective optical system to be measured.

[0012] As a possible design, the above-mentioned double-mirror optical system under test includes a primary mirror assembly, a secondary mirror frame and a secondary mirror assembly.

[0013] The primary mirror assembly is arranged opposite to the wavefront measuring device, and the light beam is incident on the primary mirror assembly through the wavefront measuring device and then reflected by the standard reflector, so as to adjust and assemble the primary mirror assembly, and the primary mirror assembly has a main focus;

[0014] The auxiliary mirror frame can be detachably mounted on the mounting and adjusting fittings, and is used for mounting the auxiliary mirror assembly;

[0015] The secondary mirror assembly can be detachably mounted on the secondary mirror frame and is used for performing secondary reflection autocollimation measurement of the light beam. The secondary mirror assembly and the primary mirror assembly have a system focus after being combined. The wavefront measurement device, the double-reflection optical system to be measured, and the standard reflector form a second autocollimation measurement optical path through the system focus.

[0016] As a possible design, the secondary mirror assembly includes a convex reflector and a concave reflector.

[0017] As a possible design, a small hole is provided on the above-mentioned mounting and adjusting fitting, and the small hole is arranged concentrically with the main focus; the diameter of the small hole is ≤0.5mm.

[0018] As a possible design, the above-mentioned mounting and adjusting fitting is provided with concentric circle markings of small holes, and the diameter of the concentric circle markings is ≥5mm.

[0019] As a possible design, the wavefront measurement device includes a laser interferometer and a Shack-Hartmann wavefront sensor; the standard reflector includes a concave spherical reflector, a convex spherical reflector and a plane reflector.

[0020] The present invention also provides a method for quickly adjusting a double-reflecting optical system, which is adjusted in conjunction with a device for quickly adjusting a double-reflecting optical system, and includes the following steps:

[0021] The double-reflection optical system to be measured is used as an installation reference, and a wavefront measurement device, a primary mirror assembly of the double-reflection optical system to be measured and a standard reflector are sequentially arranged to form a first autocollimation measurement optical path;

[0022] According to the wavefront shape of the main focus measured by the wavefront measuring device, the low-order aberration is decomposed, and the position of the wavefront measuring device is adjusted to reduce the order aberration to the design value or the determined value, and the relative position relationship between the standard reflector and the main mirror assembly is determined;

[0023] Connect the secondary mirror frame and the mounting and adjusting fittings, and adjust the mounting and adjusting fittings;

[0024] Connect the secondary mirror assembly and the secondary mirror frame, and adjust the wavefront measuring device so that the wavefront measuring device, the double-reflection optical system to be measured, and the standard reflector form a second autocollimation measuring optical path through the system focus;

[0025] The secondary mirror assembly is adjusted, and low-order aberrations are decomposed according to the wavefront shape of the system focus measured by the wavefront measuring device. The position of the secondary mirror assembly is adjusted to reduce the low-order aberrations to the design value or the determined value, and the relative position of the secondary mirror assembly and the primary mirror assembly is determined;

[0026] If the relative position error between the primary mirror assembly and the secondary mirror assembly exceeds the adjustment margin of the secondary mirror assembly, the secondary mirror assembly is finely adjusted. During this process, the adjustment adapter and the main focus are kept in a concentric and coaxial state to facilitate rapid restoration of the adjustment position.

[0027] The finely adjusted secondary mirror assembly is mounted on the secondary mirror frame, and the low-order aberration results are decomposed according to the system focal wavefront shape measured by the wavefront measurement device. If the difference between the low-order aberration and the design value or the determined value exceeds the tolerance range, the position of the secondary mirror assembly is adjusted or the secondary mirror assembly is finely adjusted until the difference between the low-order aberration and the design value or the determined value is within the tolerance range, thereby completing the optical adjustment of the measured double-reflector optical system.

[0028] As a possible design, the above-mentioned installation and adjustment of the installation and adjustment fittings includes the following steps:

[0029] Adjust the position of the adapter so that the main focus passes through the small hole of the adapter and the main focus is concentric with the small hole of the adapter;

[0030] Adjust the position and angle of the adapter and the position of the secondary mirror frame forward and backward to make the front and rear light spots of the main focus concentric with the small hole of the adapter, complete the coaxiality of the main focus and the small hole of the adapter, and determine the initial position of the secondary mirror assembly.

[0031] As a possible design, the adjustment of the moving part of the telescopic mobile adaptor includes:

[0032] The telescopic stroke of the movable part of the mounting and adjusting fitting is adjusted to be larger than the product of the F-ratio of the measured double-reflective optical system and the concentric circle line diameter of the mounting and adjusting fitting, so as to ensure that the diameter of the diffuse spot before and after the main focus is larger than the concentric circle line of the pinhole.

[0033] As a possible design, the above-mentioned fine adjustment of the secondary mirror assembly includes:

[0034] Remove the secondary mirror assembly, fill or grind the secondary mirror assembly and install the secondary mirror assembly.

[0035] Compared with the prior art, the present invention has the following advantages and beneficial effects:

[0036] The present invention utilizes the installation and adjustment adapter to quickly find the imaging light spot, solves the problem of the installation and adjustment efficiency of the double-mirror optical system, overcomes the defects of the previous installation and adjustment such as large number of iterations, poor repetition, and large subjective error, improves the installation and adjustment efficiency and repeated positioning capability, and provides a reference method for the rapid installation and adjustment of the double-mirror optical system. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] In order to more clearly illustrate the technical solutions of the exemplary embodiments of the present invention, the following briefly introduces the drawings required for use in the embodiments. It should be understood that the following drawings only illustrate certain embodiments of the present invention and should not be regarded as limiting the scope. For those of ordinary skill in the art, other relevant drawings can be obtained based on these drawings without creative work. In the drawings:

[0038] Figure 1 A schematic diagram of determining a reference field of view and debugging a primary mirror assembly according to the present invention;

[0039] Figure 2 It is a schematic diagram of the debugging of the installation and adjustment fittings and the auxiliary mirror frame of the present invention;

[0040] Figure 3 It is a structural schematic diagram of an installation adaption accessory in an embodiment of the present invention;

[0041] Figure 4 Schematic diagram of the position relationship between the imaging light spot and the small hole of the mounting and adjusting accessory in the embodiment of the present invention;

[0042] Figure 5 It is a schematic diagram of the installation of the secondary mirror assembly and the fine adjustment of the system of the present invention.

[0043] Marks and corresponding parts names in the attached drawings:

[0044] 1- wavefront measurement device; 2- double-reflective optical system to be measured; 3- adapter accessories; 4- standard reflector; 5- primary mirror assembly; 6- secondary mirror frame; 7- secondary mirror assembly; 8- primary focus; 9- system focus; 10- fixed part; 11- moving part; 12- set screw; 13- small hole in the moving part; 14- beam dispersion spot. DETAILED DESCRIPTION

[0045] In order to make the purpose, technical scheme and advantages of the present invention clearer, the present invention is further described in detail below in conjunction with examples and drawings. The illustrative embodiments of the present invention and their description are only used to explain the present invention and are not intended to limit the present invention. If specific conditions are not specified in the examples, they are carried out according to conventional conditions or conditions recommended by the manufacturer. If the manufacturer is not specified for the reagents or instruments used, they are all conventional products that can be purchased commercially.

[0046] In a first aspect, the present invention provides a quick adjustment device for a double-reflective optical system, referring to Figure 1, comprising a wavefront measuring device 1, a double-reflective optical system 2 to be measured, an adjustment fitting 3 and a standard reflector 4. The wavefront measuring device 1 is a high-precision optical measuring device, which is used to measure and analyze the wavefront shape of light waves in an optical system, and can accurately determine the difference between the actual wavefront received and the ideal wavefront, thereby helping to adjust the position and three-dimensional rotational freedom of the optical system, ensuring the correct alignment of the primary mirror and the secondary mirror, achieving the best imaging quality, and ensuring accurate light beam focusing. Specifically, the wavefront measuring device 1 is arranged opposite to the double-reflective optical system 2 to be measured, and is used to emit a light beam to the double-reflective optical system 2 to be measured, and is used to receive a light beam reflected from the double-reflective optical system 2 to be measured. The double-reflective optical system 2 to be measured, the wavefront measuring device 1 and the standard reflector 4 form a first self-collimation measuring optical path, and the double-reflective optical system 2 to be measured is located between the wavefront measuring device 1 and the standard reflector 4. Specifically, the light emitted by the wavefront measuring device 1 is reflected by the double-reflective optical system 2 to be measured, then reflected by the standard reflector 4, and then reflected back to the wavefront measuring device 1 through the double-reflective optical system 2 to be measured, forming a closed-loop optical path. The design of this optical path enables the system to self-calibrate, that is, to determine the precise position and alignment state of the optical element by detecting a small offset of the light beam. The double-reflective optical system 2 to be measured has a main focus 8, which is the point where the light beam converges after being reflected from the double-reflective optical system 2 to be measured. The main focus 8 is a key reference point in the design and adjustment process, ensuring that the light is correctly focused, and facilitating adjustment of the optical system performance. The mounting and adjustment adapter 3 is connected to the double-reflective optical system 2 to be measured and is used to find the imaging light spot. The small hole on it can help to initially position the main focus 8 and the small hole, and can facilitate observation of the position of the main focus 8 and the small hole during subsequent calibration. It can be used as a reference to help reduce errors caused by manual operation and ensure that the relative position relationship of the double-reflective optical system 2 to be measured is correct. In addition, it can also simplify the complex optical component alignment process, speed up the overall mounting and adjustment speed, and improve the efficiency and accuracy of the mounting and adjustment; the standard reflector 4 can provide a stable reflection surface for constructing a self-collimating measurement light path, so that the light beam emitted from the wavefront measurement device 1 is reflected back. This self-collimation feature enables the system to self-calibrate and accurately measure slight changes in the light path. When adjusting the standard reflector 4, the positioning of the double-reflective optical system 2 to be measured can be indirectly adjusted and optimized to ensure the correct alignment of the light path. In addition, the fixed reflection characteristics of the standard reflector are utilized to simplify the debugging process and reduce the difficulty of direct adjustment of the double-reflective optical system 2 to be measured, making the entire mounting and adjustment process more systematic and efficient.

[0047] In some embodiments of the present invention, reference Figure 2 , Figure 3 and Figure 5The above-mentioned double-mirror optical system 2 to be measured includes a main mirror assembly 5, a sub-mirror frame 6 and a sub-mirror assembly 7. The main mirror assembly 5 is installed in the main mirror chamber, and is used to receive the incident light beam and perform the initial reflection, focus the light to the main focus 8, and improve the image clarity. It can also receive the light beam incident from the standard reflector 4 or the sub-mirror assembly 7, and reflect the light beam to the wavefront measurement device 1. The sub-mirror frame 6 is detachably connected to the mounting adapter 3, and the mounting method can be any existing mounting method, such as: snap-on, magnetic attraction or other methods, which can support and fix the sub-mirror assembly 7 to ensure the precise position of the sub-mirror assembly 7 in the entire device, and can realize axial movement and tilt rotation relative to the mounting adapter 3 to achieve the best optical path alignment; the sub-mirror assembly 7 is detachably mounted on the sub-mirror frame 6, and the wavefront measurement device 1, the measured double-reflection optical system 2, and the standard reflector 4 form a second self-collimation measurement optical path through the system focus 9, which are respectively arranged opposite to the main mirror assembly 5 and the standard reflector 4, and are used to reflect the light of the standard reflector 4 to the front of the measured double-reflection optical system 2, and then focus again through the measured double-reflection optical system 2. This design helps to correct aberrations and improve imaging quality. There is an adjustable angle between it and the sub-mirror frame 6, so that its position and angle can be fine-tuned, which is convenient for adjusting the optical path.

[0048] In some embodiments of the present invention, reference Figures 1 to 5 , the secondary mirror assembly 7 can be a convex reflector and a concave reflector.

[0049] In some embodiments of the present invention, reference Figure 1 A small hole is provided on the mounting and adjusting fitting 3, and the small hole is arranged concentrically with the main focus 8; the diameter of the small hole is ≤0.5mm, and the diameter of the small hole can be 0.2mm, 0.3mm or any size less than 0.5mm.

[0050] In some embodiments of the present invention, the mounting and adjusting fitting 3 is provided with concentric circle lines of a small hole, and the diameter of the concentric circle lines is ≥5 mm. The diameter of the concentric circle lines can be 6 mm, 8 mm, 13 mm or any other size, and the concentric circle lines are used to judge the eccentricity of the light beam dispersion spot and the small hole.

[0051] In some embodiments of the present invention, the wavefront measuring device 1 includes but is not limited to a laser interferometer and a Shack-Hartmann wavefront sensor; the standard reflector 4 includes but is not limited to a concave spherical reflector, a convex spherical reflector and a plane reflector.

[0052] Preferably, refer to Figure 3The above-mentioned mounting and adjusting fitting 3 comprises a fixed part 10 and a movable part 11, both of which are made of metal, preferably 7075 aluminum alloy. The fixed part 10 is detachably connected to the auxiliary mirror frame 6, and can be connected by threaded connection, clamping or other connection methods. Preferably, the fixed part 10 and the auxiliary mirror frame 6 are connected by a slot, and the axis turning angle is designed according to the optical system parameters and can be any angle. The inner diameter of the interface between the fixed part 10 and the auxiliary mirror frame 6 is 30-40 mm, preferably 36 mm. The fixed part 10 and the movable part 11 are matched by sleeve clearance, the outer diameter of the inner sleeve is 20-25 mm, and the outer diameter of the inner sleeve is more preferably Φ22 mm. The axis turning angle is preferably 15-25°, and more preferably 20.1°. The moving part 11 and the fixed part 10 are matched with a sleeve clearance, and a set screw 12 is set to fix the position, so as to facilitate observation of the light spot during installation and adjustment. A moving part small hole 13 of Φ0.5mm is set at the bottom of the moving part 11. The moving part 11 of the adjustment adapter is provided with concentric circle engraved lines of the small hole. The diameters of the concentric circles are Φ5mm and Φ10mm respectively, which are used to judge the eccentricity of the light beam dispersion spot 14 and the moving part small hole 13. The chamfer realizes sharp-edge light guiding. The sleeve length is 20mm, which is used to determine the main focus position and optical axis direction of the system.

[0053] In a second aspect, the present invention also provides a method for quickly assembling a double-reflective optical system, referring to Figure 1 , Figure 2 , Figure 5 , including the following steps:

[0054] S1. Confirm the reference field of view and installation reference;

[0055] Usually, the central field of view of the double-reflective optical system 2 to be measured is selected as the reference field of view, the double-reflective optical system 2 to be measured is used as the installation reference, the wavefront measurement device 1 and the standard reflector 4 are selected as the measuring equipment and debugging tooling, and the wavefront measurement device 1, the main mirror assembly 5 of the double-reflective optical system 2 to be measured and the standard reflector 4 are arranged in sequence to form a first self-collimation measurement optical path.

[0056] S2, determining the position of the wavefront measurement device 1;

[0057] The position and angle of the wavefront measuring device 1 are adjusted, and low-order aberrations such as tilt, defocus, astigmatism, and coma are decomposed according to the wavefront shape of the main focus 8 measured by the wavefront measuring device 1. By adjusting the position of the wavefront measuring device 1, these low-order aberrations are reduced to the design value or a certain value, and then the relative position relationship between the standard reflector 4 and the main mirror assembly 5 is determined.

[0058] S3, using the adjustment accessory 3 to mark the position of the main focus 8;

[0059] The auxiliary lens frame 6 is connected to the mounting and adjusting fitting 3, and the mounting and adjusting fitting 3 is adjusted so that the main focus 8 passes through the small hole of the mounting and adjusting fitting 3, so that the main focus 8 is concentric and coaxial with the small hole of the mounting and adjusting fitting 3.

[0060] In some embodiments of the present invention, adjusting the adjustment fitting 3 comprises the following steps:

[0061] S31, the main focus 8 is concentrically adjusted with the mounting and adjusting fitting 3;

[0062] Adjust the position of the adapter 3 so that the main focus 8 passes through the small hole of the adapter 3, and the main focus 8 is concentric with the small hole of the adapter 3;

[0063] S32, main focus 8 and mounting adapter 3 are coaxially adjusted;

[0064] The movable part of the adjusting fitting 3 and the position of the secondary mirror frame 6 are telescopically moved to make the front and rear light spots of the main focus 8 concentric with the small hole of the adjusting fitting 3, so that the main focus 8 is coaxial with the small hole of the adjusting fitting 3, and the initial position of the secondary mirror assembly 7 is determined.

[0065] In the above step S31, the movable part 11 of the telescopic adjustment fitting 3 is larger than the product of the optical F number of the measured double-reflective optical system 2 and the concentric circle line diameter of the adjustment fitting 3, ensuring that the diameter of the diffuse spot before and after the main focus 8 is larger than the concentric circle line of the pinhole.

[0066] S4, quickly determine the position of the secondary mirror assembly 7 according to the position of the main focus 8;

[0067] The secondary mirror assembly 7 and the secondary mirror frame 6 are connected, and the wavefront measuring device 1 is adjusted so that the wavefront measuring device 1, the measured double-reflection optical system 2, and the standard reflector 4 form a second self-collimation measuring optical path through the system focus 9.

[0068] S5, determining the relative position relationship between the mirror surfaces of the primary mirror assembly 5 and the secondary mirror assembly 7;

[0069] The secondary mirror assembly 7 is adjusted, and low-order aberrations such as tilt, defocus, astigmatism, and coma are decomposed according to the wavefront shape of the system focus 9 measured by the wavefront measuring device 1. By adjusting the position of the secondary mirror assembly 7, these low-order aberrations are reduced to the design value or a certain value, and then the relative position of the secondary mirror assembly 7 and the main mirror assembly 5 is determined.

[0070] S6, determining the relative position relationship between the mirror surfaces of the primary mirror assembly 5 and the secondary mirror assembly 7 under special circumstances;

[0071] The finely adjusted sub-mirror assembly 7 is mounted on the sub-mirror frame 6, and based on the wavefront shape of the system focus 9 measured by the wavefront measuring device 1, low-order aberration results such as tilt, defocus, astigmatism, and coma are decomposed. If the difference between these low-order aberrations and the design value or a certain value exceeds the tolerance range, the position of the sub-mirror assembly 7 is adjusted or the sub-mirror assembly 7 is finely adjusted until the difference between these low-order aberrations and the design value or a certain value is within the tolerance range, thereby completing the optical adjustment of the measured double-reflector optical system 2.

[0072] In some embodiments of the present invention, fine adjustment of the secondary mirror assembly 7 in S5 includes:

[0073] The secondary mirror assembly 7 is removed, the secondary mirror assembly 7 is filled or ground, and the secondary mirror assembly 7 is installed.

[0074] Filling the secondary mirror assembly 7 means that the relative position error between the mirror surfaces of the primary mirror assembly 5 and the secondary mirror assembly 7 is greater than the adjustment margin of the secondary mirror assembly 7, and a filler such as a metal foil is used to meet the design value;

[0075] Grinding the secondary mirror assembly 7 means that the relative position error between the mirror surfaces of the main mirror assembly 5 and the secondary mirror assembly 7 is smaller than the adjustment margin of the mirror assembly 7, and the design value is met by processes such as grinding the end surface of the secondary mirror assembly 7.

[0076] The method is described below in conjunction with specific embodiments. In the following embodiments, the optical system 2 to be measured is an off-axis double-reflection optical system, the wavefront measuring device 1 is a plane wave laser interferometer, and the standard reflector 4 is a standard concave spherical reflector. The primary mirror assembly 5 is an off-axis aspheric concave reflector with an aperture of Φ120 mm, an aspheric coefficient of -1.0, and a vertex radius of 885 mm. The secondary mirror assembly 7 is an off-axis aspheric convex reflector with an aperture of Φ30 mm, an aspheric coefficient of -1.48, a vertex radius of 76 mm, and a primary and secondary mirror spacing of 420 mm. The mounting and adjusting fitting 3 comprises a fixed part 10 and a movable part 11, both of which are made of 7075 aluminum alloy; the fixed part 10 and the secondary mirror frame 6 are connected by a card slot, the inner diameter of the interface between the fixed part 10 and the secondary mirror frame 6 is 36 mm, the fixed part 10 and the movable part 11 are matched with a sleeve clearance, the outer diameter of the inner sleeve is Φ22 mm, and the axis rotation angle is 20.1°; the movable part 11 and the fixed part 10 are matched with a sleeve clearance, and a set screw 12 is provided to fix the position, so as to facilitate observation of the light spot during the mounting and adjusting process, a movable part small hole 13 of Φ0.5 mm is provided at the bottom of the movable part 11, and concentric circle engraved lines of the small hole are provided on the movable part 11 of the mounting and adjusting fitting, and the concentric circle diameters are Φ5 mm and Φ10 mm respectively, which are used to judge the eccentricity of the light beam dispersion spot 14 and the movable part small hole 13, and the chamfer realizes sharp edge light guiding. The sleeve length is 20 mm, which is used to determine the main focus position and optical axis direction of the system.

[0077] Example 1

[0078] A quick adjustment method for a double-reflective optical system, referring to Figure 1 to Figure 5 , including the following steps:

[0079] S1. Confirm the reference field of view and the adjustment reference. Select the central field of view of the double-reflection optical system 2 to be measured as the reference field of view, install the main mirror assembly 5 in the main mirror chamber of the double-reflection optical system 2 to be measured, use the main mirror assembly 5 as the installation reference, select the wavefront measurement device 1 and the standard reflector 4 as the measurement equipment and debugging tooling, adjust the position and three-dimensional rotational freedom of the wavefront measurement device 1, use the standard reflector 4 to achieve light beam reflection, so that the wavefront measurement device 1, the main mirror assembly 5, and the standard reflector 4 form a self-collimation measurement optical path through the main focus 8, adjust the position and three-dimensional rotational freedom of the wavefront measurement device 1, determine the relative position relationship between the wavefront measurement device 1 and the main mirror assembly 5 according to the imaging quality of the main focus 8, and sequentially arrange the wavefront measurement device 1, the double-reflection optical system 2 to be measured, and the standard reflector 4 to form a first self-collimation measurement optical path;

[0080] S2. Determine the position of the wavefront measuring device 1. Adjust the position and angle of the wavefront measuring device 1, and decompose low-order aberrations such as tilt, defocus, astigmatism, and coma according to the wavefront shape of the main focus 8 measured by the wavefront measuring device 1. By adjusting the position of the wavefront measuring device 1, these low-order aberrations are reduced to the design value or a certain value, and then the relative position relationship between the standard reflector 4 and the main mirror assembly 5 is determined; in the implementation process, the central field of view of the optical system is selected as the reference field of view, and the main mirror is an off-axis parabolic mirror, which makes it easier to find the imaging spot of the main mirror and the position of the main focus 8, and then determine the position of the main mirror assembly 5, which is used as the position reference for the rapid adjustment of the entire double-reflection optical system to be measured, and complete the integrated adjustment of the main mirror assembly 5 of the double-reflection optical system to be measured;

[0081] like Figure 1 As shown, before installing the secondary mirror assembly 7, the secondary mirror frame 6 and the mounting and adjusting fitting 3 are connected and installed in the above-mentioned debugging optical path, and the position of the mounting and adjusting fitting 3 is adjusted so that the main focus 8 passes through the small hole of the mounting and adjusting fitting 3, so that the main focus 8 is concentric with the small hole of the mounting and adjusting fitting 3;

[0082] S3, using the adjustment fitting 3 to mark the position of the main focus 8. Figure 1 As shown, before installing the secondary mirror assembly 7, the secondary mirror frame 6 and the mounting and adjusting fitting 3 are connected and installed in the above-mentioned debugging optical path, and the position of the mounting and adjusting fitting 3 is adjusted so that the main focus 8 passes through the small hole of the mounting and adjusting fitting 3, so that the main focus 8 is concentric with the small hole of the mounting and adjusting fitting 3.

[0083] Reference Figure 3-4In the debugging optical path, according to the position of the main focus 8, the sub-lens frame 6 and the mounting adapter 3 are installed, and the position and three-dimensional rotational freedom of the sub-lens frame 6 are adjusted so that the Φ0.5mm small hole of the mounting adapter 3 coincides with the position of the main focus 8, and the complete imaging spot can be seen at the rear end of the mounting adapter, as shown in FIG. Figure 3 As shown on the left, this state satisfies the initial adjustment of the translation position of the sub-mirror frame 6; then, loosen the set screw 12, slide the movable part 11 of the adjustment fitting, observe the relative position of the light spot behind the main focus 8 and the Φ0.5mm movable part small hole 13 of the adjustment fitting 3, for easy observation, on the bottom plane of the movable part 11, engrave circular lines of different diameters with the small hole as the center, according to the relative position of the imaging light spot 14 and the circular engraved line, with the main focus 8 as the rotation center, adjust the rotation angle of the sub-mirror frame 6 until the relative position of the imaging light spot 14 and the circular engraved line is concentric, as shown in FIG. Figure 4 As shown on the right side, at the front and rear positions of the main focus 8, the moving part 11 of the mounting and adjusting fitting is telescopically moved, and the concentric position deviation between the light spot before and after the main focus 8 and the small hole of the mounting and adjusting fitting 3 is observed. By moving the sub-mirror frame 6, the light spot before and after the main focus 8 is concentric with the small hole of the mounting and adjusting fitting 3, and the main focus 8 and the small hole of the mounting and adjusting fitting 3 are coaxial. The initial position of the sub-mirror assembly 7 of the double-reflecting optical system under test is quickly determined, and the Φ0.5mm small hole is still at the main focus. The set screw is locked to facilitate subsequent resetting;

[0084] S4, quickly determine the position of the secondary mirror assembly 7 according to the position of the main focus 8. Figure 5 As shown, the sub-mirror assembly 7 is installed, and the position of the sub-mirror assembly 7 is fine-tuned to meet the imaging quality requirements of the optical system; the sub-mirror assembly 7 and the sub-mirror frame 6 are connected, and the standard reflector 4 is adjusted so that the wavefront measurement device 1, the optical system to be measured 2, and the standard reflector 4 form a self-collimation measurement optical path through the system focus. In this embodiment, according to the initial position of the sub-mirror assembly 7, after completing the self-collimation measurement optical path, the initial system wave aberration RMS of the optical systems of both parties to be measured is less than λ / 2, and the wavelength λ is 632.8nm. Within the measurement range of the interferometer, it can quickly enter the fine adjustment state.

[0085] S5, determine the relative position relationship between the mirror surfaces of the primary mirror assembly 5 and the secondary mirror assembly 7. By fine-tuning the translation and rotational degrees of freedom of the secondary mirror assembly 7, the standard reflector 4 is adjusted accordingly to ensure the autocollimation measurement conditions, and after rapid iterative convergence, the imaging quality of the off-axis double-reflection optical system to be measured meets the design requirements;

[0086] S6, determine the relative position relationship between the mirror surfaces of the main mirror assembly 5 and the auxiliary mirror assembly 7 under special circumstances. According to the relative position between the auxiliary mirror assembly 7 and the auxiliary mirror frame 6, and according to the wavefront shape of the system focus 9 measured by the wavefront measurement device 1, the low-order aberration results such as tilt, defocus, astigmatism, and coma are decomposed. If the difference between these low-order aberrations and the design value or a certain value exceeds the tolerance range, select a suitable material to fill or grind the auxiliary mirror assembly. After the material filling or grinding of the auxiliary mirror assembly is completed, whether the position of the auxiliary mirror assembly 66 changes, reduce the influence of human operation errors, and improve the adjustment and reset capabilities. Filling the auxiliary mirror assembly 7 means that the relative position error between the mirror surface of the main mirror assembly 5 and the auxiliary mirror assembly 7 is greater than the adjustment margin of the auxiliary mirror assembly 7, and the design value is met by using fillers such as metal foil; grinding the auxiliary mirror assembly 7 means that the relative position error between the mirror surface of the main mirror assembly 5 and the auxiliary mirror assembly 7 is less than the adjustment margin of the mirror assembly 7, and the design value is met by grinding the end face of the auxiliary mirror assembly 7 and other processes.

[0087] Confirm that the small hole of the adjustment adapter 3 is concentric and coaxial with the main focus 8, install the processed sub-mirror assembly 7, and determine the relative position relationship between the sub-mirror assembly 7 and the main mirror assembly 5 according to the imaging quality of the system focus 9, until the imaging quality of the tested double-mirror optical system meets the design requirements, thereby completing the optical adjustment of the tested double-mirror optical system 2.

[0088] The specific implementation methods described above further illustrate the objectives, technical solutions and beneficial effects of the present invention in detail. It should be understood that the above description is only a specific implementation method of the present invention and is not intended to limit the scope of protection of the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A quick adjustment device for a double-reflective optical system, characterized in that: The invention comprises a wavefront measuring device (1), a double-reflecting optical system to be measured (2), an adjustment fitting (3) and a standard reflector (4), The wavefront measurement device (1) is used to emit a light beam to the double-reflection optical system (2) to be measured, and to receive a light beam emitted from the double-reflection optical system (2) to be measured, and is also used to measure the shape of the optical wavefront. The wavefront measurement device (1), the double-reflection optical system (2) to be measured, and the standard reflector (4) are arranged in sequence and form a first self-collimation measurement optical path; The double-reflective optical system (2) under test has a main focus (8); The adjustment fitting (3) is connected to the double-reflective optical system (2) to be tested, and is used to find the imaging light spot; The standard reflector (4) is used to reflect the light beam incident on the double-reflection optical system (2) to be tested. The double-mirror optical system (2) to be tested comprises a primary mirror assembly (5), a secondary mirror frame (6) and a secondary mirror assembly (7). The primary mirror assembly (5) is arranged opposite to the wavefront measuring device (1); the light beam passes through the wavefront measuring device (1) and enters the primary mirror assembly (5), and then is reflected by the standard reflector (4), so as to be used for adjusting the primary mirror assembly (5); the primary mirror assembly (5) has a primary focus (8); The auxiliary mirror frame (6) is detachably mounted on the mounting and adjusting fitting (3) and is used for mounting the auxiliary mirror assembly (7); The secondary mirror assembly (7) is detachably mounted on the secondary mirror frame (6) and is used for performing secondary reflection autocollimation measurement of a light beam. The secondary mirror assembly (7) and the primary mirror assembly (5) have a system focus (9) when combined. The wavefront measurement device (1), the double-reflection optical system to be measured (2), and the standard reflector (4) form a second autocollimation measurement optical path through the system focus (9).

2. A fast adjustment device for a double-reflective optical system according to claim 1, characterized in that: The secondary mirror assembly (7) comprises a convex reflecting mirror and a concave reflecting mirror.

3. A fast adjustment device for a double-reflective optical system according to claim 2, characterized in that: The mounting and adjusting fitting (3) is provided with a small hole, the small hole being arranged concentrically with the main focus (8); the diameter of the small hole is ≤0.5 mm.

4. A fast adjustment device for a double-reflective optical system according to claim 3, characterized in that: The mounting and adjusting fitting (3) is provided with concentric circle engraved lines of small holes, and the diameter of the concentric circle engraved lines is ≥5 mm.

5. The rapid adjustment device for a double-reflective optical system according to claim 2, characterized in that: The wavefront measurement device (1) comprises a laser interferometer and a Shack-Hartmann wavefront sensor; the standard reflector (4) comprises a concave spherical reflector, a convex spherical reflector and a plane reflector.

6. A method for rapid adjustment of a double-reflective optical system, characterized in that: The adjustment is performed in conjunction with a fast adjustment device for a double-reflective optical system as claimed in any one of claims 2 to 5, comprising the following steps: The double-reflection optical system (2) to be measured is used as an installation reference, and the wavefront measurement device (1), the main mirror assembly (5) of the double-reflection optical system (2) to be measured, and the standard reflector (4) are arranged in sequence to form a first self-collimation measurement optical path; Decomposing low-order aberrations based on the wavefront shape of the main focus (8) measured by the wavefront measuring device (1), reducing the order aberrations to a designed value or a determined value by adjusting the position of the wavefront measuring device (1), and determining the relative position relationship between the standard reflector (4) and the main mirror assembly (5); Connecting the auxiliary mirror frame (6) and the mounting and adjusting fitting (3), and adjusting the mounting and adjusting fitting (3); Connecting the secondary mirror assembly (7) and the secondary mirror frame (6), adjusting the wavefront measuring device (1), so that the wavefront measuring device (1), the double-reflective optical system to be measured (2), and the standard reflector (4) form a second self-collimation measuring optical path through the system focus (9); The secondary mirror assembly (7) is adjusted, and low-order aberrations are decomposed according to the wavefront shape of the system focus (9) measured by the wavefront measurement device (1), and the position of the secondary mirror assembly (7) is adjusted so that the low-order aberrations are reduced to a design value or a determined value, and the relative position of the secondary mirror assembly (7) and the primary mirror assembly (5) is determined; If the relative position error between the mirror surfaces of the primary mirror assembly (5) and the secondary mirror assembly (7) exceeds the adjustment margin of the secondary mirror assembly (7), the secondary mirror assembly (7) is finely adjusted, and during this process, the adjustment adapter (3) and the main focus (8) are placed in a concentric and coaxial state, so as to facilitate rapid restoration of the adjustment position; The finely adjusted secondary mirror assembly (7) is mounted on the secondary mirror frame (6), and the low-order aberration result is decomposed according to the wavefront shape of the system focus (9) measured by the wavefront measurement device (1). If the difference between the low-order aberration and the design value or the determined value exceeds the tolerance range, the position of the secondary mirror assembly (7) is adjusted or the secondary mirror assembly (7) is finely adjusted until the difference between the low-order aberration and the design value or the determined value is within the tolerance range, thereby completing the optical adjustment of the measured double-reflection optical system (2).

7. A method for rapid adjustment of a double-reflecting optical system according to claim 6, characterized in that: The step of adjusting the adjustment fitting (3) comprises the following steps: Adjusting the position of the mounting and adjusting fitting (3) so that the main focus (8) passes through the small hole of the mounting and adjusting fitting (3) and the main focus (8) is concentric with the small hole of the mounting and adjusting fitting (3); The movable part of the telescopic movable fitting (3) and the position of the secondary mirror frame (6) are adjusted so that the light spots before and after the main focus (8) are concentric with the small hole of the fitting (3), so that the main focus (8) and the small hole of the fitting (3) are coaxial, and the initial position of the secondary mirror assembly (7) is determined.

8. A method for rapid adjustment of a double-reflecting optical system according to claim 7, characterized in that: The adjustment of the moving part of the telescopic movable fitting (3) includes: The telescopic stroke of the movable part of the mounting and adjusting fitting (3) is adjusted to be greater than the product of the F number of the measured double-reflective optical system (2) and the diameter of the concentric circle lines of the mounting and adjusting fitting (3), so as to ensure that the diameter of the diffuse spot before and after the main focus (8) is greater than the concentric circle lines of the small hole.

9. A method for rapid adjustment of a double-reflecting optical system according to claim 6, characterized in that: The fine adjustment of the secondary mirror assembly (7) comprises: Remove the secondary mirror assembly (7), fill or grind the secondary mirror assembly (7), and install the secondary mirror assembly (7).

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