High shear mixing chamber with wide slot channel

Abstract

A high shear mixing chamber is provided with a single wide slot microchannel that enables higher throughput, less clogging, and longer lifetime (e.g., less wear). The mixing chamber provided may include an inlet and an outlet in fluid communication with a single wide slot microchannel (e.g., via an inlet plenum and an outlet plenum). In some aspects, the wide-slot microchannel may have a stepped interior such that the wide-slot microchannel has portions of different depths. The wide slot microchannel has a first surface opposite a second surface, and one or more steps may be formed by the first surface, the second surface, or both the first surface and the second surface.

Description

[0001] Priority claim

[0002] This application claims priority to U.S. patent application No. 63 / 324,366, filed on March 28, 2022, the entire contents of which are incorporated herein by reference. Background Art

[0003] High shear mixing chambers typically work by passing a fluid from one or more inlet cylinders through one or more microchannels and out of one or more outlet cylinders. Some high shear mixing chambers can be multi-slotted, allowing the fluid to flow through an inlet cylinder, an inlet plenum, multiple separate microchannels, an outlet plenum and out of an outlet cylinder. The transition of the fluid flow into the microchannels can lead to cavitation, a physical phenomenon in which vapor cavities (bubbles) are formed inside a liquid. Cavitation is the result of rapid changes in pressure. When the pressure drops below the vaporization pressure, the liquid boils and forms vapor bubbles.

[0004] There are several disadvantages associated with cavitation in microchannels. First, as the downstream fluid pressure recovers, the cavity will implode and generate a strong shock wave. This can cause severe damage to the internal surfaces of the high shear mixing chamber and downstream piping (for example, component wear significantly reduces mixing chamber performance and life). Cavitation can also introduce local high temperature points, which can damage certain heat-sensitive materials. Second, because the formed cavity stays in the microchannel and occupies a certain volume, the flow through the microchannel will be blocked, and clogging problems will occur when processing certain solid dispersions or high aspect ratio materials. Third, the most serious cavitation is typically at the microchannel inlet, because the available cross-sectional area near the typical microchannel inlet is reduced, limiting the flow through the microchannel, which in turn leads to a lower average flow rate at the microchannel outlet. This reduces the energy of the fluid at the microchannel outlet and leads to reduced processing efficiency in some applications.

[0005] In addition to the disadvantages associated with cavitation, a typical multi-trough high shear mixing chamber design limitation is that based on the physical size of the machine with the multi-trough high shear mixing chamber, the typical multi-trough high shear mixing chamber can only include a limited number of individual microchannels. In addition, the space required between each individual microchannel further limits the number of individual microchannels that a typical multi-trough high shear mixing chamber can include. These physical constraints limit the throughput of a typical multi-trough high shear mixing chamber.

[0006] Therefore, there is a need for a high shear mixing chamber that improves the above-mentioned disadvantages. Summary of the invention

[0007] The present disclosure generally relates to a high shear mixing chamber for a fluid processor or fluid homogenizer. More specifically, a high shear mixing chamber having a single wide slot microchannel is provided, which has a higher processing capacity, less clogging, and a longer service life (e.g., less wear) than a typical multi-slot high shear mixing chamber. The cross-sectional area at the inlet of the wide slot microchannel is larger than the cross-sectional area at the inlet of each individual microchannel in a typical multi-slot high shear mixing chamber, which helps to reduce the occurrence of clogging problems and helps to extend the maintenance life of the provided high shear mixing chamber. For example, the larger cross-sectional area at the inlet of the wide slot microchannel can help to reduce the severity of cavitation at the inlet of the wide slot microchannel. The wide slot microchannel also eliminates the gaps between the individual microchannels in a typical multi-slot high shear mixing chamber. Therefore, the provided high shear mixing chamber can have a higher processing capacity than some typical multi-slot high shear mixing chambers.

[0008] In some embodiments, the wide-groove microchannel may have a stepped interior, so that the wide-groove microchannel has sections of different depths. When a fluid flows through the wide-groove microchannel, the corners formed by the stepped interior may help increase the generation of shear force.

[0009] In one example, a high shear mixing chamber for a fluid processor includes: an inlet chamber including an inlet hole and a bottom end; an inlet plenum in fluid communication with the bottom end of the inlet chamber; an outlet chamber including an outlet hole and a top end; an outlet plenum in fluid communication with the top end of the outlet chamber; and a microchannel connecting the inlet plenum to the outlet plenum. A first portion of the microchannel has a first uniform depth, a second portion of the microchannel has a second uniform depth, and a third portion of the microchannel has a third uniform depth. The first depth is different from the second depth. The first portion, the second portion, and the third portion extend in parallel along the length of the microchannel from the inlet plenum to the outlet plenum.

[0010] In another example, a high shear mixing chamber for a fluid processor includes: a vertically disposed inlet chamber including an inlet hole and a bottom end; an inlet plenum in fluid communication with the bottom end of the inlet chamber; a vertically disposed outlet chamber including an outlet hole and a top end; an outlet plenum in fluid communication with the top end of the outlet chamber; and a microchannel connecting the inlet plenum to the outlet plenum. The microchannel extends a certain length from the inlet plenum to the outlet plenum. The width of the microchannel is greater than the width of the inlet chamber and the width of the outlet chamber. BRIEF DESCRIPTION OF THE DRAWINGS

[0011] 1 and 2 illustrate a typical multi-channel high shear mixing chamber according to one aspect of the present disclosure.

[0012] Figure 3Velocity profiles of the high shear mixing chamber of FIGS. 1 and 2 are shown according to one aspect of the present disclosure.

[0013] Figure 4 A high shear mixing chamber with wide slot microchannels according to one aspect of the present disclosure is shown.

[0014] Figure 5 According to one embodiment of the present disclosure, Figure 4 Cross section of the high shear mixing chamber in FIG.

[0015] Figure 6 A high shear mixing chamber having a stepped wide slot microchannel according to one embodiment of the present disclosure is shown.

[0016] Figure 7 According to one embodiment of the present disclosure, Figure 6 Cross-sectional view of the stepped wide-groove microchannel in .

[0017] Figure 8 According to one embodiment of the present disclosure, Figure 6 Cross-sectional view of the high shear mixing chamber in FIG.

[0018] 9A to 9E A cross-sectional view of a stepped wide-groove microchannel according to an embodiment of the present disclosure is shown.

[0019] Fig.10 A high shear mixing chamber having multiple microchannels with a stepped interior according to one aspect of the present disclosure is shown.

[0020] Fig.11 A cross-section of a high shear mixing chamber according to one aspect of the present disclosure is shown, the high shear mixing chamber having a wide slot microchannel and an inlet chamber and an outlet chamber extending out of the microchannel.

[0021] Fig.12 A schematic diagram of an exemplary system for processing a liquid / reactant stream according to one aspect of the present disclosure is shown.

[0022] Fig.13 A schematic diagram of another exemplary system for processing a liquid / reactant stream according to an aspect of the present disclosure is shown. DETAILED DESCRIPTION

[0023] The present disclosure provides a new innovative high shear mixing chamber having a single wide slot microchannel, which can achieve higher throughput, less clogging, and longer service life (e.g., less wear) than a typical multi-slot high shear mixing chamber. The provided high shear mixing chamber may include an inlet in fluid communication with an inlet plenum, an outlet in fluid communication with an outlet plenum, and a single wide slot microchannel connecting the inlet plenum with the outlet plenum.

[0024] Unlike the multiple individual microchannels in a typical multi-slot high shear mixing chamber, in some examples, the provided high shear mixing chamber includes a single wide slot microchannel. For example, each microchannel in a typical multi-slot high shear mixing chamber can have an aspect ratio (width: depth) of about 1:1, 2:1, or 4:1. In contrast, the single wide slot microchannel of the provided high shear mixing chamber can have an aspect ratio (width: depth) greater than or equal to 10:1, such as 20:1, 50:1, or 100:1. Therefore, the cross-sectional area at the entrance of the wide slot microchannel is larger than the cross-sectional area at the entrance of each individual microchannel in a typical multi-slot high shear mixing chamber, which helps reduce the occurrence of clogging problems and helps extend the maintenance life of the provided high shear mixing chamber. For example, the larger cross-sectional area at the entrance of the wide slot microchannel can help reduce the severity of cavitation at the entrance of the wide slot microchannel. Reduction in the severity of cavitation can help reduce the amount of damage or wear to the high shear mixing chamber and help reduce cavity formation, which hinders flow during operation.

[0025] In addition, the wide slot microchannels eliminate the spaces between individual microchannels in a typical multi-slot high shear mixing chamber. Thus, the provided high shear mixing chamber can have a higher throughput than at least some typical multi-slot high shear mixing chambers. For example, because the wide slot microchannels eliminate the spaces between individual microchannels, more fluid can flow through the wide slot microchannels than individual microchannels occupying the same amount of space.

[0026] The microchannels of a typical multi-slot high shear mixing chamber do not have as large an aspect ratio (width:depth) as the wide slot microchannels of the provided high shear mixing chamber for two main reasons. First, a higher aspect ratio means a larger cross-sectional area and therefore a higher flow / throughput, which may exceed the capacity of the machine if the flow is too high and result in the mixing chamber being unable to reach a sufficiently high pressure (e.g., 30 kpsi). Second, the increase in cross-sectional area and decrease in pressure can result in lower shear rates than expected. However, the inventors have discovered that wide slot microchannels can reduce the occurrence of clogging problems and provide the throughput advantages described above, while still generating an appropriate amount of shear force compared to a typical multi-slot high shear mixing chamber.

[0027] In some schemes, the wide groove microchannel of the high shear mixing chamber provided can have a stepped interior so that the wide groove microchannel has parts of different depths. In these schemes, the wide groove microchannel can have one, two, three or any number of steps. The wide groove microchannel has a first surface (such as a top surface) relative to the second surface (such as a bottom surface), and the step can be formed only by the first surface, or only by the second surface, or by both the first surface and the second surface. The step can extend the entire length of the microchannel between the inlet plenum and the outlet plenum. The step formed by the first surface can extend toward or away from the second surface, and vice versa. The corner formed by the stepped interior can contribute to the shear force generation when increasing the fluid flowing through the wide groove microchannel.

[0028] It should be understood that instead of a single wide slot microchannel, the provided high shear mixing chamber may include a small number of wide slot microchannels, such as 2, 3, 4, 5, etc., each of which is wider than the microchannels of a typical high shear mixing chamber. For example, in one embodiment, the provided high shear mixing chamber includes two wide slot microchannels, each of which has an aspect ratio (width: depth) of 20:1, which still eliminates the gaps between the individual microchannels in at least some typical multi-slot high shear mixing chambers (i.e., there is only one gap or gap between the two wide slot microchannels). In addition, the cross-sectional area of ​​the two wide slot microchannels at their respective entrances is still greater than the cross-sectional area at the entrance of each individual microchannel in a typical multi-slot high shear mixing chamber. In these embodiments where the provided high shear mixing chamber has a small number of wide slot microchannels, each wide slot microchannel may have a stepped interior.

[0029] Figures 1 and 2 show an example of a working section of a typical multi-slot high shear mixing chamber 100. The high shear mixing chamber 100 includes: an inlet chamber 102 with an inlet hole 104; an outlet chamber 106 with an outlet hole 108; an inlet plenum 110 and an outlet plenum 112; and a plurality of microchannels 114 (e.g., 2 to 20 microchannels) connecting the inlet plenum 110 with the outlet plenum 112. In at least some embodiments, the inlet chamber 102 and the outlet chamber 106 can be cylindrical. Each microchannel 114 includes: a microchannel inlet 116, which is at the intersection of the microchannel 114 and the inlet plenum 110; and a microchannel outlet 117, which is at the intersection of the microchannel 114 and the outlet plenum 112. In various examples, the width of each microchannel 114 can be in the range of 0.006 inches to 0.04 inches, and the depth can be in the range of 0.002 inches to 0.03 inches.

[0030] In use, an influent fluid enters the inlet orifice 104 at a very high pressure, passes through the inlet chamber 102 and the inlet plenum 110, and then enters the plurality of microchannels 114 at the microchannel inlet 116. The fluid then exits the plurality of microchannels 114 from the microchannel outlet 117, enters the outlet plenum 112, passes through the outlet chamber 106, and exits through the outlet orifice 108. As the fluid passes through the working section of a typical multi-channel high shear mixing chamber 100, the high influent fluid pressure exerts high shear on the fluid.

[0031] Cavitation typically occurs in two places within the high shear mixing chamber 100: (i) the area of ​​the microchannel inlet 116; and (ii) the outlet orifice 108. The transition of the fluid flow entering the microchannel 114 with a sharp turn at the microchannel inlet 116 typically results in cavitation. In addition, due to the reduction in available cross-sectional area near each microchannel inlet 116, the most severe cavitation may occur near the microchannel inlet 116. Cavitation can damage the internal surface of the microchannel 114, thereby causing wear of the microchannel 114, which can reduce the performance and life of the high shear mixing chamber 100.

[0032] In addition, the reduced cross-sectional area available near the microchannel inlet 116 restricts the flow through the microchannel 114, resulting in a lower average flow velocity at the microchannel outlet 117. This reduces the energy of the fluid at the microchannel outlet 117, resulting in reduced processing efficiency in some applications. Figure 3 2 shows the velocity profile of a high shear mixing chamber 100 simulated using computational fluid dynamics. Figure 3 As shown, the velocity profile of the high shear mixing chamber 100 is unevenly distributed between each microchannel. In other words, the velocity profiles at the same position of each microchannel are different. This uneven velocity distribution is caused in part by the inlet effect and small cavitation pockets, resulting in a higher flow velocity near the lower half of each microchannel. Another reason for the uneven velocity distribution is the flow distribution in the inlet plenum 110-the microchannel flow velocity towards the center of the inlet plenum 110 is higher because they are closer to the inlet chamber 102. The flow needs to travel a long distance to reach the microchannels at both ends of the inlet plenum 110. The consequence of the uneven velocity distribution may be the difference in processing materials between each microchannel 114 and the blockage of some materials.

[0033] Additionally, a design limitation of a typical high shear mixing chamber 100 is that only a limited number of microchannels 114 can be accommodated within a single machine based on the physical size of the machine. Thus, the throughput of a machine with a typical high shear mixing chamber 100 is related to the number of microchannels 114 in the high shear mixing chamber 100, which in turn is limited by the spacing required between individual microchannels 114. As used herein, throughput refers to the amount of fluid that can flow through the high shear mixing chamber 100 in a given time.

[0034] Figure 4 and Figure 5 An example of a working section of a high shear mixing chamber 400 of the present disclosure is shown. In some different embodiments, the high shear mixing chamber 400 may include: an inlet chamber 402 with an inlet hole 404; an outlet chamber 406 with an outlet hole 408; and a single wide slot microchannel 414 connecting the inlet chamber 402 with the outlet chamber 406. In some embodiments, the high shear mixing chamber 400 may include an inlet plenum 410 and / or an outlet plenum 412. In these embodiments, a single wide slot microchannel 414 may connect the inlet plenum 410 with the outlet plenum 412. The remaining description will be about the embodiment in which the high shear mixing chamber 400 includes an inlet plenum 410 and an outlet plenum 412. In at least some embodiments, the inlet chamber 402 and the outlet chamber 406 may be cylinders. The wide slot microchannel 414 includes a microchannel inlet 416 at the intersection of the wide slot microchannel 414 and the inlet plenum 410, and a microchannel outlet 417 at the intersection of the wide slot microchannel 414 and the outlet plenum 412. In use, an influent fluid enters the inlet aperture 404, passes through the inlet chamber 402 and the inlet plenum 410, and then enters the wide slot microchannel 414 at the microchannel inlet 416. The fluid then exits the wide slot microchannel 414 from the microchannel outlet 417 and enters the outlet plenum 412, passes through the outlet chamber 406, and exits through the outlet aperture 408.

[0035] Although Figure 5 The respective ends of the inlet plenum 410 and the outlet plenum 412 are shown flush with the wide slot microchannel 414, but in other examples, at least one of the respective ends of the inlet plenum 410 and the outlet plenum 412 may extend beyond the wide slot microchannel 414. For example, Fig.11The end 1100 of the inlet plenum 410 and the end 1102 of the outlet plenum 412 are shown to extend beyond the wide slot microchannel 414. As shown, the wide slot microchannel 414 is located at a distance D1 from the end 1100 of the inlet plenum 410 and a distance D2 from the end 1102 of the outlet plenum 412. D1 and D2 can be the same or different distances. In one example, D1 and D2 can be in the range of 0.001 to 1 inch. In another example, D1 and D2 can be in the range of 0.01 to 0.03 inch. It has been determined that increasing distances D1 and D2 between the end 1100 and / or 1102 of the microchannel (e.g., wide slot microchannel 414) and the high shear mixing chamber 400 can streamline the flow when it enters the wide slot microchannel 414, and reduce the cavitation degree at the microchannel inlet 416 and the microchannel outlet 417. That is, positioning the wide slot microchannel 414 above the end 1100 will form a fluid pool at the end 1102, thereby inhibiting cavitation. In the embodiment where the high shear mixing chamber 400 does not include an inlet plenum 410 and an outlet plenum 412, the wide slot microchannel 414 can be located at a distance D1 or D2 from the respective end of at least one of the inlet chamber 402 or the outlet chamber 406.

[0036] The wide slot microchannel 414 extends from the inlet plenum 410 by a length L (e.g. Figure 8 ) to the outlet plenum 412 and having a width W perpendicular to its length L (as shown Figure 7 and Figure 8 406). The interior of the wide slot microchannel 414 has a depth extending from a first surface (e.g., the top surface closest to the inlet chamber 402) to a second surface (e.g., the bottom surface closest to the outlet chamber 406). The depth of the wide slot microchannel 414 is perpendicular to both the length L and the width W of the wide slot microchannel 414. In various examples, the width W of the wide slot microchannel 414 can be between 0.01 inches and 1 inches. In some examples, the width W of the wide slot microchannel 414 can be between 0.1 inches and 1 inches. In various examples, the length L of the wide slot microchannel 414 can be between 0.01 inches and 1 inches. In some examples, the length L of the wide slot microchannel 414 can be between 0.1 inches and 1 inches.

[0037] In at least some embodiments, the width W of the wide slot microchannel 414 is greater than the width or diameter of the inlet chamber 402 and / or the width or diameter of the outlet chamber 406. In various embodiments, the width W of the wide slot microchannel 414 is greater than or equal to 1 / 2, 3 / 5, 2 / 3, 7 / 10, 3 / 4, 4 / 5, 9 / 10 or other appropriate ratios of the width of the inlet plenum 410 and / or the outlet plenum 412. In one example, the width W of the wide slot microchannel 414 may be substantially equal to or slightly less than the width of the inlet plenum 410 and / or the outlet plenum 412. In some embodiments, the width W of the wide slot microchannel 414 may be greater than the length L of the wide slot microchannel 414. In one embodiment, the depth of the wide slot microchannel 414 may be uniform along the length L and width W of the wide slot microchannel 414. In various examples, the depth of the wide slot microchannel 414 may be in the range of 0.002 inches to 0.1 inches. In some examples, the depth of the wide slot microchannel 414 may be in the range of 0.002 inches to 0.03 inches.

[0038] In various aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be greater than or equal to 10:1, for example, 20:1, 50:1, 100:1, or 200:1. In some aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be less than or equal to 200:1, 300:1, 400:1, or 500:1. In some aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be in the range of 10:1 to 500:1. In some aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be in the range of 10:1 to 350:1. In some aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be in the range of 10:1 to 200:1. In some aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be in the range of 20: 1 to 500: 1. In some aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be in the range of 50: 1 to 500: 1. In some aspects, the aspect ratio (width: depth) of the wide slot microchannel 414 can be in the range of 100: 1 to 500: 1. Any of the various ranges disclosed herein for various features of the high shear mixing chamber 400 include the endpoints of the range.

[0039] In some embodiments of the present disclosure, the wide slot microchannel 414 may have a stepped interior. For example, Figure 6 A high shear mixing chamber 400 is shown including an exemplary wide slot microchannel 414 having a step 600 . Figure 7 The exemplary wide slot microchannel 414 is shown in FIG. Figure 6 A cross-sectional view at plane AA is shown. Figure 7In the example of , wide slot microchannel 414 includes a first surface 714, which is opposite to a second surface including surfaces 704, 706 and 708. Surface 706 is connected to first surface 714 through wall 710, and surface 708 is connected to first surface 714 through wall 712. First surface 714 can be a top surface. Second surface can be a bottom surface. Surface 704 is offset from surfaces 706 and 708 by walls 700 and 702, thereby forming step 600.

[0040] In this example, the step 600 extends away from the first surface 714, thereby increasing the depth of the central portion of the wide slot microchannel 414. For example, the wide slot microchannel 414 may have a depth D in a first portion between the first surface 714 and the surface 708, a depth greater than D in a second portion between the first surface 714 and the surface 704, and a depth D in a third portion between the first surface 714 and the surface 706. In other examples, the third portion between the first surface 714 and the surface 706 may have a depth different from that of the first portion and the second portion. In various embodiments, the depth of the second portion may be within a range greater than the depth D and less than or equal to the depth 3D. In other words, in these embodiments, the ratio of the depth of the second portion to the depth of the first portion and / or the third portion is less than or equal to 3:1. In some examples, the ratio of the depth of the second portion to the depth of the first portion and / or the third portion may be less than or equal to 2:1.

[0041] In some aspects, the depth of walls 710 and 712 (depth D in this example) can be equal to the depth of walls 700 and 702. In other aspects, the depth of walls 710 and 712 can be greater or less than the depth of walls 700 and 702. Figure 7 As shown in FIG. 4 , the depths of the first portion, the second portion, and the third portion of the wide slot microchannel 414 can be uniform. In other embodiments, the depths of one or more of the first portion, the second portion, and the third portion can be non-uniform. For example, in these other embodiments, the surface 704 and / or the first surface 714 can be inclined so that the surface 704 and the first surface 714 are not parallel to each other, rather than being parallel to each other. Figure 7 The surface 704 is shown to be parallel to the first surface 714 .

[0042] In at least some cases, the corners formed in the stepped interior help to increase shear force generation when the fluid flows through the wide groove microchannel 414. In other words, the shear force can be highest at the edge or corner of the wide groove microchannel 414, and compared to the wide groove microchannel 414 with a constant depth interior, the stepped interior produces additional corners. For example, additional corners are produced at the junction of (1) surface 706 and wall 700, (2) wall 700 and surface 704, (3) surface 704 and wall 702, and (4) wall 702 and surface 708. In this example, these additional corners are all right angles. In other examples, such as the above-mentioned uneven depth scheme, at least some of the corners formed in the stepped interior can be non-right angles (e.g., 70°, 80°, 85°, etc.).

[0043] like Figure 7 As shown, the wide slot microchannel 414 has a width W. In some embodiments, the cross section of the wide slot microchannel 414 can be symmetrical about the axis at the center of the width W of the wide slot microchannel 414. For example, in some examples, the first part, the second part, and the third part can have equal widths. In other examples, such as the illustrated examples, the first part and the third part can have equal widths, and the width of the second part can be greater than or less than the width of the first part and the third part. In other embodiments, the cross section of the wide slot microchannel 414 can be asymmetrical about the axis at the center of the width W of the wide slot microchannel 414. For example, in some examples, the first part and the third part can have unequal widths. In these examples, the width of the second part can be equal to the width of the first part or the third part. In other examples, the first part, the second part, and the third part can all have different widths.

[0044] Figure 8 An exemplary wide slot microchannel 414 is shown in Figure 6 A cross-sectional view at plane BB is shown. Figure 8 In the above reference Figure 7 The first portion of the wide slot microchannel 414 is the section between the wall 702 and the wall 712. The second portion of the wide slot microchannel 414 is the section between the wall 700 and the wall 702. The third portion of the wide slot microchannel 414 is the section between the wall 710 and the wall 700. Figure 8In the example of the wide slot microchannel 414, each of the first portion, the second portion, and the third portion extends the length L of the wide slot microchannel 414 from the inlet plenum 410 to the outlet plenum 412. In other words, the depth of the first portion is uniform from the inlet plenum 410 to the outlet plenum 412, as are the second portion and the third portion. In other examples, the depth of each of the first portion, the second portion, and the third portion may not be uniform from the inlet plenum 410 to the outlet plenum 412. For example, one section of the wide slot microchannel 414 may have a uniform depth along the width of the wide slot microchannel 414, while another section may be divided into the first portion, the second portion, and the third portion having different depths.

[0045] 9A to 9E Cross-sectional views of various examples of wide slot microchannels 414 are shown. Fig. 9A In the example of FIG. 4 , unlike step 600 extending away from first surface 714, wide slot microchannel 414 includes step 900 extending toward first surface 714. Second surface includes surfaces 706, 708, and 906, with surface 906 offset from surfaces 706 and 708 by walls 902 and 904, thereby forming step 900. Step 900 extends toward first surface 714, thereby reducing the depth of the central portion of wide slot microchannel 414. For example, wide slot microchannel 414 may have a depth D in a first portion between first surface 714 and surface 708, a depth less than D in a second portion between first surface 714 and surface 906, and a depth D in a third portion between first surface 714 and surface 706.

[0046] exist Fig. 9B In the example of, the wide groove microchannel 414 can have a second surface including the above-mentioned step 600. The second surface can be opposite to the first surface including surfaces 916, 918 and 920. Surface 916 is offset from surfaces 918 and 920 by walls 912 and 914, thereby forming step 910. As shown, step 910 extends away from the second surface. Step 600 extends away from the first surface, and step 910 extends away from the second surface, thereby increasing the depth of the central portion of the wide groove microchannel 414. For example, the wide groove microchannel 414 can have a depth D in a first portion between surface 920 and surface 708, a depth greater than D in a second portion between surface 916 and surface 704, and a depth D in a third portion between surface 918 and surface 706. In some schemes, step 600 and step 910 can have the same depth. In other words, the depth of walls 700 and 702 can be equal to the depth of walls 912 and 914. In other aspects, step 600 and step 910 may have different depths, such that the depth of step 600 is greater or less than the depth of step 910 .

[0047] exist Fig. 9C In the example of, the wide groove microchannel 414 can have a second surface including the above-mentioned step 900. The second surface can be opposite to the first surface including surfaces 936, 938 and 940. Surface 936 is offset from surfaces 938 and 940 by walls 932 and 934, thereby forming step 930. As shown, step 930 extends toward the second surface. Step 900 extends toward the first surface, and step 930 extends toward the second surface, thereby reducing the depth of the central portion of the wide groove microchannel 414. For example, the wide groove microchannel 414 can have a depth D in a first portion between surface 940 and surface 708, a depth less than D in a second portion between surface 906 and surface 936, and a depth D in a third portion between surface 938 and surface 706. In some embodiments, step 900 and step 930 can have the same depth. In other words, the depth of walls 902 and 904 can be equal to the depth of walls 932 and 934. In other aspects, step 900 and step 930 may have different depths, such that the depth of step 900 is greater or less than the depth of step 930 .

[0048] exist Fig.9D In the example of, the wide groove microchannel 414 can have a first surface including the above-mentioned step 930, and a second surface including the above-mentioned step 600. As shown, the step 930 extends toward the second surface, and the step 600 extends away from the first surface. In some schemes, the depth of the step 930 can be equal to the depth of the step 600. In other words, the depth of the walls 932 and 934 can be equal to the depth of the walls 700 and 702. In these schemes, the wide groove microchannel 414 can have an equal (although offset) depth along the width of the wide groove microchannel 414. For example, the wide groove microchannel can have a depth D in a first portion between the surface 940 and the surface 708, a depth D in a second portion between the surface 936 and the surface 704, and a depth D in a third portion between the surface 938 and the surface 706. In other schemes, the step 930 and the step 600 can have different depths. In these other aspects, the depth of the second portion between surface 936 and surface 704 may be greater than or less than depth D.

[0049] It should be understood that 9A to 9D In any of the examples shown, the first surface and the second surface can be interchanged. Fig.9D In an example of , the first surface may include a step (e.g., step 910) extending away from the second surface, and the second surface may include a step (e.g., step 900) extending toward the first surface. Figure 7 As stated, 9A to 9DThe depth and width of each of the first portion, the second portion, and the third portion in the illustrated example may have any suitable aspect ratio.

[0050] Combination 9A to 9D Each of the examples described has a first surface and / or a second surface with a single step. In other examples, the wide slot microchannel 414 can have a first surface and / or a second surface with more than one step. For example, Fig.9E A cross-sectional view of a wide slot microchannel 414 having a second surface with two steps is shown. In this example, the wide slot microchannel 414 can have a second surface including: surfaces 704A and 704B, which are offset from surfaces 706 and 708 by walls 700 and 702 to form step 600; and surface 956, which is offset from surfaces 704A and 704B by walls 952 and 954 to form step 950. Step 950 extends from step 600 and away from first surface 714.

[0051] Step 950 extends away from first surface 714, thereby increasing the depth of the central portion of wide slot microchannel 414 compared to other portions of wide slot microchannel 414. For example, wide slot microchannel 414 may have a depth D at a first portion between surface 714 and surface 708, a depth greater than D at a second portion between surface 714 and surface 704B, a depth greater than D at a third portion between surface 714 and surface 956, a depth greater than D at a fourth portion between surface 714 and surface 704A, and a depth D at a fifth portion between surface 714 and surface 706. In some embodiments, step 950 and step 600 may have the same depth. In other words, the depth of walls 952 and 954 may be equal to the depth of walls 700 and 702. In other embodiments, step 950 and step 600 may have different depths, such that the depth of step 950 is greater than or less than the depth of step 600.

[0052] and Figure 7 as well as 9A to 9D As in the example, Fig.9E In the example of the first part, the second part, the third part, the fourth part and the fifth part, the depth and width of each part can have any suitable aspect ratio. In a specific example, the depth of the third part can be 1.5D, or 1.5 times the depth of the first part; the depth of the second part can be 1.2D, or 1.2 times the depth of the first part. In another specific example, the width of the third part can be twice the width of the second part and twice the width of the first part. In this specific example, the width of the fourth part can be equal to the width of the second part, and the width of the fifth part can be equal to the width of the first part.

[0053] In various embodiments, the wide groove microchannel 414 with two or more steps can have any orientation described in conjunction with the wide groove microchannel 414 with a single step. For example, the first surface 714 (rather than the second surface) can include steps 600 and 950, or the first surface 714 and the second surface can each include two or more steps extending toward or away from the opposite surface. In some embodiments, the surface with two or more steps can include steps extending in opposite directions. For example, step 950 can extend toward the first surface 714, and step 600 extends away from surface 714. In some embodiments, the first surface and the second surface can have the same number of steps. In other embodiments, the first surface and the second surface can have different numbers of steps.

[0054] exist Fig.10 In another exemplary embodiment shown, the high shear mixing chamber 400 may include a plurality of microchannels 1002, 1004, 1006, and 1008, each of which has a stepped interior. For example, each of the microchannels 1002, 1004, 1006, and 1008 in such an example may have one of the stepped interiors described above. In some embodiments, each of the microchannels 1002, 1004, 1006, and 1008 may have the same type of stepped interior (e.g., each such as Fig. 9A In other embodiments, at least one microchannel 1002, 1004, 1006, or 1008 may have a stepped interior that is different from that of the other microchannels. For example, microchannels 1002 and 1006 may have Fig. 9A The stepped interior of the microchannels 1004 and 1008 may have Fig. 9B In examples where the high shear mixing chamber 400 includes a plurality of microchannels, the aspect ratio (width:depth) of each microchannel can be greater than or equal to 4:1, such as 10:1, 20:1, 50:1, 100:1, 150:1, or 200:1. In some embodiments, the aspect ratio (width:depth) of each microchannel can be greater than or equal to 10:1. In some embodiments, the aspect ratio (width:depth) of each microchannel can be less than or equal to 100:1, 150:1, 200:1, or 250:1. In addition, although Fig.10 A high shear mixing chamber 400 is shown including four microchannels having a stepped interior, but in other examples, the high shear mixing chamber 400 may have other suitable numbers of stepped interior microchannels (eg, two, three, five, etc.).

[0055] In some aspects, the high shear mixing chamber 400 can be at least partially composed of a suitable ceramic (e.g., alumina) and / or diamond (e.g., polycrystalline diamond). In one example, the high shear mixing chamber 400 can be made entirely of polycrystalline diamond. In some aspects, at least a portion of the interior of the high shear mixing chamber 400 can be coated with diamond (e.g., polycrystalline diamond). For example, the entire interior of the high shear mixing chamber 400 can be coated with diamond. In some cases, the high shear mixing chamber 400 can be coated by vapor deposition.

[0056] In various aspects, the high shear mixing chamber 400 can be configured to withstand operating pressures greater than or equal to 5,000 psi, 10,000 psi, 20,000 psi, or 35,000 psi without failure. For example, the high shear mixing chamber 400 can be constructed to withstand 5000 to 50,000 psi, 10,000 to 40,000 psi, 10,000 to 50,000 psi, 5,000 to 40,000 psi, 5,000 to 30,000 psi, 10,000 to 30,000 psi, 5,000 to 25,000 psi, 10,000 to 25,000 psi, 5,000 to 20,000 psi, 10,000 to 20,000 psi, 30,000 to 50,000 psi, 20,000 to 40,000 psi, 20,000 to 50,000 psi, 15,000 to 40,000 psi, 15,000 to 50,000 psi, and other suitable pressure ranges.

[0057] In various examples, the high shear mixing chamber 400 and / or one or more microchannels (e.g., wide slot microchannel 414 or microchannels 1002, 1004, 1006, 1008) disclosed herein can be a component of any suitable high pressure fluid system (such as a high pressure fluid mixer, a high pressure / high shear fluid processor, a high pressure impact jet reactor, and a high pressure homogenizer). These suitable high pressure fluid systems can include various systems from Microfluidics International Corporation (a division of IDEX Corporation, Westwood, Massachusetts), such as pilot scale machines and production scale machines. For example, pilot scale machines can include Microfluidics International's Pilot Scale M110EH and Pilot Scale M815 products. Production scale machines can include Microfluidics International's M700 and M710 series products (e.g., M7125 and M7250).

[0058] Exemplary apparatuses / systems according to the present disclosure are generally designed to accommodate the mixing of liquid streams (e.g., reactants). The liquid streams are generally pumped from a feed pump to an intensification pump. The disclosed apparatuses / systems are designed to allow the liquid streams to mix in controlled proportions, controlled locations, and controlled energy inputs. For example, Fig.12 An exemplary liquid stream ("reactant") is shown, which is schematically depicted as part of a processing device according to the present disclosure. According to the present disclosure, the liquid stream can take various forms and exhibit various properties, for example, it can be a multiphase fluid, a miscible fluid and / or an immiscible fluid. The liquid stream is described as being connected to a feed container / inlet reservoir. Of course, the treatment and / or storage method of the liquid stream before introduction into the disclosed processing equipment / system can be very different, and the disclosed inlet reservoir is merely an example of pre-processing treatment / storage of the reactant / fluid stream. The liquid stream is typically combined with an intensifier pump or other high-pressure pump to pressurize such liquid stream (e.g., to a pressure of up to 50,000 psi) for delivery into a mixing chamber (e.g., high shear mixing chamber 400).

[0059] The feed pump controls the flow rate of the liquid stream in combination with the intensifier pump / high pressure pump. The energy input to the liquid stream at different locations in the system is controlled by the geometry of the flow path. Therefore, energy dissipation can be controlled / minimized by a favorable piping design / layout, the design / geometry of the mixing chamber / microreactor, and the design / layout of the heat exchanger located downstream of the mixing chamber. Typically, energy dissipation is most affected by the design / geometry of the mixing chamber / microreactor, for example, by the turbulence and / or shear associated therewith.

[0060] In the mixing chamber / microreactor of fixed geometry, liquid stream is advantageously mixed at nano level. In the mixing chamber / microreactor downstream, liquid stream is typically sent to a heat exchanger, where it is cooled or heated (if necessary). In some cases, liquid stream can be collected in whole or in part at this processing stage. However, in exemplary embodiments / implementations of the present disclosure, liquid stream can be circulated in whole or in part to equipment / system, for example, by introducing a circulating feed in an intensifier pump / high pressure pump upstream.

[0061] Fig.13 A schematic diagram of an exemplary flow implementation according to the present disclosure is shown. A hydraulic pump is driven by a motor to deliver hydraulic oil to an intensifier pump. A liquid feed stream ("reactant stream") is introduced into the intensifier pump, and the liquid stream is pressurized to be fed into a mixing chamber (e.g., high shear mixing chamber 400). Upon exiting the mixing chamber, the liquid product stream may enter a heat exchanger for temperature control (i.e., cooling or heating).

[0062] Although Fig.12 and Fig.13A single reactant liquid stream is shown, but in some examples, two or more reactant liquid streams can be combined by an intensifier pump or other high-pressure pumps so that this combined liquid stream (e.g., pressurized to a pressure of up to 50,000 psi) is sent to a mixing chamber. In these examples, before the intensifier pump is introduced through a port, two or more reactant liquid streams can be combined in a manifold, a tee, etc., or an intensifier pump can be introduced through a separate port. Alternatively, an exemplary device / system may include a coaxial feed feature / design to feed two or more liquid streams into an intensifier pump. In a specific example, a feed line / pipeline for a first liquid stream may be located in a feed line / pipeline for a second liquid stream, so that the feed of these reactant liquid streams to the intensifier pump (or other high-pressure pump) is substantially coaxial. Therefore, a feed line / pipeline for a second liquid stream may be limited to a larger inner diameter / diameter than the outer diameter of the feed line / pipeline for the first liquid stream, thereby allowing the second liquid stream to flow in an annular flow channel defined outside the feed line / pipeline for the first liquid stream. In this way, mixing between the first liquid stream and the second liquid stream is avoided (or substantially minimized) until before the pressure builds up. Thus, in this example of a coaxial feed feature / design, premature interaction between the first liquid stream and the second liquid stream is advantageously avoided, and the interaction of these liquid streams occurs, for example, at the nanoscale in the mixing chamber / microreactor. Alternative flow patterns, such as side-by-side feed lines / pipes, may be used to minimize / avoid premature interaction and / or mixing without departing from the spirit or scope of the present disclosure.

[0063] As used herein, "about", "approximately" and "substantially" are understood to mean a number within a certain numerical range of the referenced number, for example, a range of -10% to +10% of the referenced number, preferably a range of -5% to +5% of the referenced number, more preferably a range of -1% to +1% of the referenced number, and most preferably a range of -0.1% to +0.1% of the referenced number.

[0064] In addition, all numerical ranges herein should be understood to include all integers, whole or fractions within the range. In addition, these numerical ranges should be interpreted as supporting requirements for any number or number subset within the range. For example, the disclosure from 1 to 10 should be interpreted as supporting ranges from 1 to 8, from 3 to 7, from 1 to 9, from 3.6 to 4.6, from 3.5 to 9.9, etc.

[0065] Without further elaboration, it is believed that those skilled in the art can utilize the foregoing description to the maximum extent possible the claimed invention. The examples and schemes disclosed herein should be understood to be illustrative only and not to limit the scope of the present disclosure in any way. Those skilled in the art will appreciate that the details of the above examples may be changed without departing from the underlying principles discussed. In other words, various modifications and improvements to the examples specifically disclosed in the above description are within the scope of the appended claims. For example, any suitable combination of the features of the various examples described may be envisioned.

Claims

1. A high shear mixing chamber for a high pressure fluid processor, comprising: an inlet chamber including an inlet opening and a bottom end; an inlet plenum chamber in fluid communication with a bottom end of the inlet chamber; an outlet chamber, including an outlet hole and a top end; an outlet plenum chamber in fluid communication with a top end of the outlet chamber; as well as a microchannel connecting the inlet plenum chamber with the outlet plenum chamber, wherein a first portion of the microchannel has a first uniform depth, a second portion of the microchannel has a second uniform depth, and a third portion of the microchannel has a third uniform depth, wherein the first depth is different from the second depth, and wherein the first portion, the second portion, and the third portion extend in parallel along the length of the microchannel between the inlet chamber and the outlet chamber.

2. A high shear mixing chamber according to claim 1, wherein the inlet chamber and / or the outlet chamber are arranged vertically.

3. The high shear mixing chamber of claim 1, wherein the inlet chamber and / or the outlet chamber is cylindrical.

4. A high shear mixing chamber according to claim 1, wherein the microchannel extends a length between the inlet chamber and the outlet chamber, and wherein the width of the microchannel is greater than the width or diameter of the inlet chamber and the width or diameter of the outlet chamber, and the width is perpendicular to the length.

5. The high shear mixing chamber of claim 1, wherein the second portion is located between the first portion and the third portion, and wherein the first depth is equal to the third depth.

6. The high shear mixing chamber of claim 1, wherein the third depth is different than the first depth and the second depth.

7. The high shear mixing chamber of claim 1, wherein the first depth is consistent throughout the first portion, the second depth is consistent throughout the second portion, and the third depth is consistent throughout the third portion.

8. The high shear mixing chamber of claim 1, wherein the second portion is located between the first portion and the third portion, wherein the microchannel includes a first surface opposite a second surface, and wherein the first surface is stepped such that the second depth is greater than the first depth.

9. The high shear mixing chamber of claim 1, wherein the second portion is located between the first portion and the third portion, wherein the microchannel includes a first surface opposite a second surface, and wherein the first surface is stepped such that the second depth is less than the first depth.

10. The high shear mixing chamber of claim 1, wherein a central region of the interior of the microchannel comprises a plurality of corners, wherein each corner extends the length of the microchannel.

11. The high shear mixing chamber of claim 1 , wherein a central region of the interior of the microchannel comprises a plurality of right angle surfaces, wherein each right angle surface extends the length of the microchannel.

12. A high shear mixing chamber according to claim 1, wherein the microchannel includes a first stepped surface opposite to a second stepped surface, wherein each of the first stepped surface and the second stepped surface includes a plurality of right angles in a central portion of the first stepped surface and the second stepped surface, each right angle extending the length of the microchannel.

13. The high shear mixing chamber of claim 1, wherein the first portion of the microchannel is directly adjacent to the second portion of the microchannel.

14. The high shear mixing chamber of claim 1, wherein the high shear mixing chamber is at least partially constructed of one of ceramic or diamond.

15. The high shear mixing chamber of claim 1, wherein at least a portion of an interior of the high shear mixing chamber is coated with polycrystalline diamond.

16. The high shear mixing chamber of claim 1, configured to withstand operating pressures in the range of 5,000 psi to 50,000 psi without failure.

17. A method for producing an emulsion, comprising: Passing a fluid through the high shear mixing chamber of any of the preceding claims at at least one of the group consisting of 5 kpsi, 10 kpsi, 20 kpsi and 35 kpsi.

18. A method for producing reduced particle size, comprising: The particle stream is passed through a high shear mixing chamber according to any one of claims 1 to 16 at at least one pressure in the group consisting of 5 kpsi, 10 kpsi, 20 kpsi and 35 kpsi.

19. A high shear mixing chamber for a high pressure fluid processor, comprising: A vertically disposed inlet chamber including an inlet opening and a bottom end; an inlet plenum chamber in fluid communication with a bottom end of the inlet chamber; A vertically disposed outlet chamber including an outlet hole and a top end; an outlet plenum chamber in fluid communication with a top end of the outlet chamber; as well as A microchannel connects the inlet plenum with the outlet plenum, wherein the microchannel extends a length from the inlet plenum to the outlet plenum, and wherein a width of the microchannel is greater than a width of the inlet chamber and a width of the outlet chamber.

20. The high shear mixing chamber of claim 19, wherein the width of the inlet plenum is parallel to the width of the microchannel, and wherein the width of the microchannel is at least half the width of the inlet plenum.

21. The high shear mixing chamber of claim 19, a single microchannel connecting the inlet plenum with the outlet plenum.

22. The high shear mixing chamber of claim 19, wherein the microchannel comprises a first surface opposite a second surface, wherein the first surface comprises at least one first step extending the length of the microchannel, the at least one first step extending toward or away from the second surface.

23. The high shear mixing chamber of claim 22, wherein the second surface comprises at least one second step extending the length of the microchannel, the at least one second step extending toward or away from the first surface.

24. The high shear mixing chamber of claim 19, wherein the microchannels have an aspect ratio (width:depth) greater than or equal to 10:

1.

25. A method for producing an emulsion, comprising: The particle stream is passed through a high shear mixing chamber according to any one of claims 19 to 24 at at least one pressure in the group consisting of 5 kpsi, 10 kpsi, 20 kpsi and 35 kpsi.

26. A method for producing reduced particle size, comprising: The particle stream is passed through a high shear mixing chamber according to any one of claims 19 to 24 at at least one pressure in the group consisting of 5 kpsi, 10 kpsi, 20 kpsi and 35 kpsi.

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