Glass shell, preparation method thereof and electronic equipment

Abstract

The invention provides a glass shell, a preparation method thereof and electronic equipment. The glass shell is provided with a plurality of glass concave parts, the glass concave parts are located on the same surface of the glass shell, each glass concave part is provided with a light reflecting face, the glass shell is further provided with a preset surface deviating from the glass concave parts, and the preset surface faces the light reflecting faces in the preset direction. The angles between the reflective surfaces of the plurality of glass concave parts and the preset surface are gradually changed, and the preset direction is parallel to the preset surface. According to the embodiment of the invention, the angle of the reflective surface of the glass concave part of the glass shell is gradually changed, so that a flashing point can be seen at different angles.

Description

Technical Field

[0001] The present application relates to the field of electronics, and in particular to a glass housing, a preparation method thereof, and an electronic device. Background Art

[0002] As people's consumption level improves, people's requirements for the appearance of electronic devices such as mobile phones and tablet computers are becoming more and more diverse. However, the appearance of the shells of existing electronic devices is relatively simple and tends to be homogenized, which easily leads to aesthetic fatigue of consumers and poor user experience. Summary of the invention

[0003] The embodiment of the present application provides a glass shell, wherein the angle of the reflective surface of the glass recessed portion thereof changes gradually, so that the flashing point can be seen at different angles.

[0004] A first aspect of the present application provides a glass shell, wherein the glass shell has a plurality of glass recessed portions, wherein the plurality of glass recessed portions are located on the same surface of the glass shell, each of the glass recessed portions has a reflective surface, and the glass shell further has a preset surface facing away from the plurality of glass recessed portions, wherein along a preset direction, an angle between the reflective surface of the plurality of glass recessed portions and the preset surface changes gradually, wherein the preset direction is a direction parallel to the preset surface.

[0005] A second aspect of the present application provides a method for preparing a glass casing, which includes:

[0006] Providing a glass substrate having a surface to be etched;

[0007] The surface to be etched of the glass substrate is wet-etched so that the side etching rate of the glass substrate changes gradually along a preset direction, thereby obtaining a glass shell having a plurality of glass recessed portions, wherein the plurality of glass recessed portions are located on the same surface of the glass shell, each of the glass recessed portions has a reflective surface, and the glass shell further has a preset surface away from the plurality of glass recessed portions, and along the preset direction, the angle between the reflective surface of the plurality of glass recessed portions and the preset surface changes gradually, wherein the preset direction is a direction parallel to the preset surface.

[0008] A third aspect of the present application provides an electronic device, comprising:

[0009] Display screen;

[0010] The glass housing according to the first aspect of the present application is arranged opposite to the display screen; and

[0011] A processor is located between the glass shell and the display screen, and the processor is electrically connected to the display screen to control the display screen to display.

[0012] The glass shell of the embodiment of the present application includes a plurality of glass recessed portions, each of which has a reflective surface, and the angles between the reflective surfaces of the plurality of glass recessed portions and a preset surface are gradually changed, so that the flashing points of the glass shell can be viewed from different angles. In addition, the plurality of glass recessed portions of the glass shell have a stronger three-dimensional sense, thereby improving the appearance expression of the glass shell. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0014] Figure 1 Schematic diagram of the structure of a glass shell according to an embodiment of the present application.

[0015] Figure 2 The glass shell of one embodiment of the present application is Figure 1 Schematic diagram of the cross-sectional structure in the AA direction.

[0016] Figure 3 It is a structural schematic diagram of a glass shell according to another embodiment of the present application.

[0017] Figure 4 The glass shell of one embodiment of the present application is Figure 3 Schematic diagram of the cross-sectional structure in the BB direction.

[0018] Figure 5 The glass shell of an embodiment of the present application is Figure 3 Schematic diagram of the cross-sectional structure in the CC direction.

[0019] Figure 6 The glass shell of another embodiment of the present application is Figure 3 Schematic diagram of the cross-sectional structure in the BB direction.

[0020] Figure 7 The glass shell of another embodiment of the present application is Figure 3 Schematic diagram of the cross-sectional structure in the CC direction.

[0021] Figure 8 yes Figure 2 Enlarged view of the dashed box I in the middle.

[0022] Fig. 9It is a schematic diagram of the process of a method for preparing a glass shell according to an embodiment of the present application.

[0023] Fig.10 It is a structural schematic diagram of a preparation process of a glass shell according to an embodiment of the present application.

[0024] Fig.11 It is a schematic diagram of the process of wet etching according to an embodiment of the present application.

[0025] Fig.12 It is a structural schematic diagram of wet etching according to an embodiment of the present application.

[0026] Fig.13 It is a schematic diagram of the process of a method for preparing a mask layer according to an embodiment of the present application.

[0027] Fig.14 It is a structural schematic diagram of a baking device according to an embodiment of the present application.

[0028] Fig.15 It is a schematic diagram of the structure of an electronic device according to an embodiment of the present application.

[0029] Fig.16 It is a schematic diagram of a partial exploded structure of an electronic device according to an embodiment of the present application.

[0030] Fig.17 It is a circuit block diagram of an electronic device according to an embodiment of the present application.

[0031] Description of reference numerals:

[0032] 100-glass shell, 110-glass recessed portion, 111-reflective surface, 130-preset surface, 100'-glass substrate, 110'-surface to be etched, 130'-mask layer, 131'-hollow portion, 132'-first end, 133'-second end, 200'-baking device, 210'-tunnel furnace, 220'-heating tube, 230'-conveyor belt, 240'-sensor, 250'-transmission, 300-electronic device, 310-display screen, 320-middle frame, 330-processor, 350-memory, 370-camera module, 101-light-transmitting portion. DETAILED DESCRIPTION

[0033] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiments of the present application will be clearly and completely described below in conjunction with the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of this application.

[0034] The terms "first", "second", etc. in the specification and claims of this application and the above-mentioned drawings are used to distinguish different objects, rather than to describe a specific order. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions. For example, a process, method, system, product or device that includes a series of steps or units is not limited to the listed steps or units, but optionally includes steps or units that are not listed, or optionally includes other steps or units inherent to these processes, methods, products or devices.

[0035] The technical solutions in the embodiments of the present application will be described below in conjunction with the accompanying drawings.

[0036] It should be noted that, for the convenience of explanation, in the embodiments of the present application, the same figure marks represent the same components, and for the sake of brevity, detailed descriptions of the same components are omitted in different embodiments.

[0037] The etching of three-dimensional texture on the glass surface usually adopts yellow light etching process, first forming a photoresist layer with hollow micro-patterns, and then chemical etching to reduce the thickness of the glass evenly, and by controlling the rate of side etching, a large number of cone-like three-dimensional microstructures (i.e., 3D microstructures) are formed on the glass surface to form diffuse reflection, thereby forming a frosted effect. However, the slope of the micro-texture formed by the existing three-dimensional etching technology on the same glass surface is basically the same (i.e., the angle of the inclined surface is basically the same), which results in the texture surface reflecting the most light only at a certain angle. The macroscopic performance is that at one angle, more flashes can be seen on the glass surface, while at other angles, the glass surface is dark. In addition, under the same process conditions on the same glass surface, the depth of the texture is roughly the same as the angle, the three-dimensional sense of the pattern is weak, and there is no strong visual effect.

[0038] In addition, the texture of the shell can be achieved by transferring the texture layer on the substrate using a nano-imprinting or transfer process. However, the texture formed by the transfer is prone to bubbles or whitening, and the texture layer and the substrate are prone to debonding after a period of use. Moreover, the transfer can only be performed on a flat shell (i.e., a 2D shell) and is difficult to perform on a three-dimensional shell (3D shell), which affects the appearance of the shell.

[0039] The embodiment of the present application provides a glass shell. The glass shell of the present application can be applied to portable electronic devices such as mobile phones, tablet computers, laptops, desktop computers, smart bracelets, smart watches, e-readers, game consoles, etc. The glass shell of the embodiment of the present application can be a 2D structure, a 2.5D structure, a 3D structure, etc. The glass shell of the present application can be a middle frame, a back cover (battery cover), a decorative piece, etc. of an electronic device. In the following embodiments of the present application, the glass shell is described in detail using the back cover of a mobile phone as an example, which should not be understood as a limitation on the glass shell of the embodiment of the present application.

[0040] See also Figure 1 and Figure 2 The present application embodiment provides a glass housing 100, wherein the glass housing 100 has a plurality of glass recessed portions 110, wherein the plurality of glass recessed portions 110 are located on the same surface of the glass housing 100, wherein each of the glass recessed portions 110 has a reflective surface 111, and the glass housing 100 further has a preset surface 130 away from the glass recessed portion 110, and along a preset direction (such as Figure 2 As shown by arrow O, the angle α between the reflective surface 111 of the plurality of glass recessed portions 110 and the preset surface 130 changes gradually, wherein the preset direction is a direction parallel to the preset surface 130.

[0041] The term "plurality" means greater than or equal to two.

[0042] It can be understood that the reflective surface 111 can reflect (diffusely reflect) light (such as visible light), so that the glass recessed portion 110 presents a flashing effect.

[0043] Optionally, the number of the reflective surfaces 111 of each glass recessed portion 110 is at least two, and at least two reflective surfaces 111 are connected to enclose the glass recessed portion 110. In other words, the reflective surface 111 is the side wall of the glass recessed portion 110. It can be understood that the concavity and convexity of the surface microstructure of the glass housing 100 are related to the selected reference plane. In the embodiment of the present application, the plane formed by the end surfaces of multiple glass recessed portions 110 is taken as the reference plane, so it is called a glass recessed portion 110, and a convex portion is formed between adjacent glass recessed portions 110.

[0044] It should be noted that the angle between the reflective surface 111 of the multiple glass recessed portions 110 and the preset surface 130 changes gradually, which can be understood as the slope of the reflective surface 111 of the multiple glass recessed portions 110 changes gradually.

[0045] Along the preset direction, the angle between the reflective surface 111 of the multiple glass recessed portions 110 and the preset surface 130 changes gradually; it can be understood that the angle between the reflective surface 111 of at least some of the glass recessed portions 110 in the multiple glass recessed portions 110 and the preset surface 130 is different; it can also be understood that the slope of the reflective surface 111 of at least some of the glass recessed portions 110 in the multiple glass recessed portions 110 is different.

[0046] Optionally, the multiple glass recessed parts 110 are dot-shaped textures and the multiple glass recessed parts 110 are arranged at intervals; or the multiple glass recessed parts 110 are connected to form a linear texture; or a part of the multiple glass recessed parts 110 are connected to form a linear texture, and another part of the multiple glass recessed parts 110 are dot-shaped textures arranged at intervals. It can be understood that when multiple glass recessed parts 110 are connected to form a linear texture, the number of the linear textures can be one or more, and the multiple linear textures can be connected or arranged separately.

[0047] Optionally, the linear texture may extend according to a preset rule, such as Fresnel texture, CD texture, parallel linear texture, mesh texture, etc. The dot texture may be arranged in an array, randomly arranged, or arranged according to a preset rule, etc. The dot texture may be a snowflake texture, a hexagonal pyramid texture, a flash sand texture, etc.

[0048] Optionally, the extension direction of the linear texture may be the same as or different from the preset direction, for example, the extension direction of the linear texture intersects the preset direction. It can be understood that the extension direction of the linear texture may include at least one of a straight line direction and a curved line direction. In other words, the linear texture may be at least one of a straight line texture and a curved line texture.

[0049] Optionally, the gradual change includes at least one of gradually decreasing, gradually increasing, first gradually decreasing and then gradually increasing, and first gradually increasing and then gradually decreasing.

[0050] The glass shell 100 of the embodiment of the present application includes a plurality of glass recessed portions 110, each of the glass recessed portions 110 has a reflective surface 111, and the angles between the reflective surfaces 111 of the plurality of glass recessed portions 110 and the preset surface 130 are gradually changed, so that the glass shell 100 can be viewed from different angles. In addition, the plurality of glass recessed portions 110 of the glass shell 100 have a stronger three-dimensional sense, thereby improving the appearance expression of the glass shell 100.

[0051] In addition, compared with the texture formed by nano-imprinting or transfer, the glass recessed portion 110 of the glass shell 100 of the embodiment of the present application is directly formed on the surface of the glass substrate, and there will be no problems such as whitening, bubbling or debonding, and it has better light transmittance and better wear resistance, so that the glass shell 100 has a better appearance and service life; further, compared with the embossed or transferred texture, the glass recessed portion 110 has a better flashing effect; further, the glass recessed portion 110 of the present application can be directly formed on a three-dimensional structure, so that when the glass shell 100 is a 3D structure with a bent portion, the bent portion of the glass shell 100 also has a glass recessed portion 110, so that the glass shell 100 has a better appearance.

[0052] Optionally, the thickness of the glass shell 100 is 0.3mm to 1mm; specifically, the thickness of the glass shell 100 can be, but is not limited to, 0.3mm, 0.4mm, 0.5mm, 0.6mm, 0.7mm, 0.8mm, 0.9mm, 1mm, etc. When the glass shell 100 is too thin, it cannot play a good supporting and protective role, and the mechanical strength cannot meet the requirements of the electronic device shell. When the glass shell 100 is too thick, the weight of the electronic device is increased, the feel of the electronic device is affected, and the user experience is not good. In the embodiment of the present application, when it comes to the numerical range a to b, if not specifically specified, it means that the numerical value can be any numerical value between a and b, including the endpoint numerical value a and the endpoint numerical value b.

[0053] Optionally, see again Figure 2 , along the preset direction, the gradual change range of the angle α between the reflective surface 111 of the multiple glass recessed parts 110 and the preset surface 130 is: 20°≤α≤80°. It can be understood that the angle α between the reflective surface 111 of the multiple glass recessed parts 110 and the preset surface 130 can be changed in any interval between 20° and 80°. Specifically, the angle α between the reflective surface 111 of the multiple glass recessed parts 110 and the preset surface 130 can be gradually changed between any two values ​​between, but not limited to, 20°, 25°, 30°, 35°, 40°, 45°, 50°, 55°, 60°, 65°, 70°, 75°, 80°, etc.

[0054] For example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 20° and 40°. For another example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 20° and 50°. For another example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 20° and 60°. For another example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 20° and 70°. For another example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 20° and 80°. For another example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 30° and 50°. For another example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 30° and 60°. For another example, along the preset direction, the angle α between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually between 30° and 70°.

[0055] It can be understood that on the same glass shell 100, the wider the gradual change range of the angle α between the reflective surface 111 of the multiple glass recessed parts 110 and the preset surface 130, the bright spots of the glass shell 100 can be seen at a wider range of angles; conversely, on the same glass shell 100, the narrower the gradual change range of the angle α between the reflective surface 111 of the multiple glass recessed parts 110 and the preset surface 130, the bright spots of the glass shell 100 can be seen at a narrower range of angles.

[0056] In the present embodiment, when the angle between the reflective surface 111 and the preset surface 130 is too small, the slope of the reflective surface 111 is small, which will reduce the flash of the glass recessed portion 110. During preparation, it is necessary to control the etching liquid to have a higher side etching rate on the glass substrate (i.e., the etching rate along the extending plane of the glass shell 100 or the etching rate or the lateral etching rate perpendicular to the thickness direction), which increases the difficulty of the process preparation and further reduces the three-dimensional sense of the glass recessed portion 110. When the angle α between the reflective surface 111 and the preset surface 130 is too large (i.e., the slope of the reflective surface 111 is too large), it is close to vertical etching, which will also reduce the flash of the glass recessed portion 110, and at this time, the slope of the reflective surface 111 is steeper, which increases the scratching feel of the glass recessed portion 110. When the angle between the reflective surface 111 of the multiple glass recessed parts 110 and the preset surface 130 gradually changes between any values ​​between 20° and 80°, the multiple glass recessed parts 110 can have a higher sparkle. In addition, the multiple glass recessed parts 110 can also have a stronger three-dimensional sense and the glass shell 100 can have a better feel.

[0057] See also Figures 3 to 5 Optionally, the preset direction includes a first sub-direction (such as Figure 4 Arrow M) and the second sub-direction (as shown Figure 5 In the embodiment of the present invention, the angle α1 between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually along the first sub-direction; and the angle α2 between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually along the second sub-direction; wherein the first sub-direction intersects with the second sub-direction. In other words, the angle between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 changes gradually along the first sub-direction and the second sub-direction. In the present embodiment, the slope of the reflective surface 111 of the plurality of glass recesses 110 of the glass shell 100 changes gradually in two different directions, so that the plurality of glass recesses 110 of the glass shell 100 can be viewed as flash points at different angles in two directions, so that the glass shell 100 has a stronger three-dimensional sense, and the appearance expression of the glass shell 100 is improved.

[0058] In one embodiment, the first sub-direction is perpendicular to the second sub-direction.

[0059] Optionally, along the first sub-direction, the gradual change range of the angle α1 between the reflective surface 111 of the plurality of glass recessed portions 110 and the preset surface 130 is: 20°≤α1≤80°. Along the second sub-direction, the gradual change range of the angle α2 between the reflective surface 111 of the plurality of glass recessed portions 110 and the preset surface 130 is: 20°≤α2≤80°.

[0060] In other embodiments, the preset directions may be more than three directions, for example, three, four, five, six or other different directions, and the angle between the reflective surface 111 and the preset surface 130 along each direction changes gradually, thereby extending more effects.

[0061] See also Figure 6 and Figure 7 In some embodiments, along the first sub-direction, the angle α1 between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 first increases gradually and then decreases gradually; along the second sub-direction, the angle α2 between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 first increases gradually and then decreases gradually. In other words, in the first sub-direction, the slope of the reflective surface 111 of the plurality of glass recesses 110 first increases gradually and then decreases gradually; along the second sub-direction, the slope of the reflective surface 111 of the plurality of glass recesses 110 also first increases gradually and then decreases gradually. In this embodiment, the slope of the reflective surface 111 of the plurality of glass recesses 110 of the glass housing 100 has a gradual change in two different directions, so that the plurality of glass recesses 110 of the glass housing 100 can be viewed as flash points at different angles in two directions, so that the glass housing 100 has a stronger three-dimensional sense and a more varied flash effect, thereby improving the appearance expression of the glass housing 100.

[0062] In other embodiments, along the first sub-direction, the angle α1 between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 first gradually decreases and then gradually increases; along the second sub-direction, the angle α2 between the reflective surface 111 of the plurality of glass recesses 110 and the preset surface 130 first gradually decreases and then gradually increases. In other words, in the first sub-direction, the slope of the reflective surface 111 of the plurality of glass recesses 110 first gradually decreases and then gradually increases; along the second sub-direction, the slope of the reflective surface 111 of the plurality of glass recesses 110 also first gradually decreases and then gradually increases. In this embodiment, the slope of the reflective surface 111 of the plurality of glass recesses 110 of the glass housing 100 has a gradual change in two different directions, so that the plurality of glass recesses 110 of the glass housing 100 can be viewed as flash points at different angles in two directions, so that the glass housing 100 has a stronger three-dimensional sense and a more varied flash effect, thereby improving the appearance expression of the glass housing 100.

[0063] In another embodiment, along the preset direction, the angle α between the reflective surface 111 of the multiple glass recesses 110 and the preset surface 130 first gradually decreases, then gradually increases, then gradually decreases, then gradually increases, then gradually decreases, and then gradually increases. In other words, along the preset direction, the slope of the reflective surface 111 of the multiple glass recesses 110 includes six sections of gradual changes. In this embodiment, the reflective surface 111 of the multiple glass recesses 110 alternates between multiple gradual decreases and multiple gradual increases, so that flash points at multiple positions can be viewed from different angles. By controlling the number of gradual decreases and increases in the slope, more diverse flash effects can be prepared to enrich the appearance of the glass shell 100.

[0064] Optionally, the haze Ha of the glass shell 100 is in the range of 60%≤Ha≤80%. Specifically, along the preset direction, the haze Ha of the glass shell 100 may be, but is not limited to, 60%, 63%, 65%, 68%, 70%, 73%, 75%, 78%, 80%, etc. If the haze of the glass shell 100 is too low, when the glass shell 100 of a 3D structure needs to be prepared by hot bending, the shielding power of the mold produced by the hot bending is reduced, and the proportion of scratches produced by subsequent processes such as hot bending, CNC, and polishing is also reduced; if the haze of the glass shell 100 is too high, the overall appearance of the glass shell 100 is too hazy, and the visual effect is poor.

[0065] It can be understood that the haze of the glass housing 100 of the present application refers to the average haze of the etched area after the glass recess 110 is formed by etching.

[0066] It can be understood that although the haze Ha of the glass housing 100 can be any value between 60% and 80%, in this embodiment, when preparing the glass housing 100, the glass substrate is placed in the same system of etching solution, and the vertical etching rate of the etching solution on different parts of the glass substrate is equivalent, so the haze at different positions on the same glass housing 100 is basically the same.

[0067] Optionally, the light transmittance T of the glass shell 100 is in the range of 30%≤T≤50%. Specifically, the light transmittance T of the glass shell 100 may be, but is not limited to, 30%, 32%, 35%, 38%, 40%, 42%, 45%, 48%, 50%, etc. If the light transmittance of the glass shell 100 is too low, it means that the haze of the glass shell 100 is too large, making the overall appearance of the glass shell 100 too hazy and having a poor visual effect; if the light transmittance of the glass shell 100 is too high, the shielding power of the glass shell 100 against mold marks and scratches generated in subsequent processes and use is reduced.

[0068] It can be understood that the light transmittance of the glass housing 100 of the present application refers to the average light transmittance of the etched area after the glass recess 110 is formed by etching.

[0069] It can be understood that although the light transmittance of the glass housing 100 can be any value between 30% and 50%, when the glass housing 100 is prepared, the glass substrate is placed in the same system of etching solution, and the vertical etching rate of the etching solution on different parts of the glass substrate is equivalent, so the light transmittance of different positions on the same glass housing 100 is basically the same.

[0070] Optionally, the range of the roughness Ra of the glass shell 100 away from the preset surface 130 is: 1μm≤Ra≤6μm. Further, the range of the roughness Ra of the glass shell 100 away from the preset surface 130 is: 1μm≤Ra≤3μm. Specifically, the roughness Ra of the glass shell 100 away from the preset surface 130 may be, but is not limited to, 1μm, 1.5μm, 2μm, 2.5μm, 3μm, 3.5μm, 4μm, 4.5μm, 5μm, 5.5μm, 6μm, etc. The greater the roughness of the glass shell 100 away from the preset surface 130, the better the sparkle effect of the glass shell 100. However, when the roughness of the preset surface 130 is too large, the scratching feeling of the preset surface 130 increases. In addition, the depth of the glass recess 110 is too deep, which increases the requirements for the photoresist's resistance to etching liquid and may not be achieved. Moreover, when the roughness of the preset surface 130 is too large and the depth of the glass recess 110 is too large, the mechanical strength of the glass housing 100 is reduced. When the roughness of the preset surface 130 is too small, the texture effect is not obvious, and the sparkle of the glass housing 100 is reduced, or even no sparkle effect is produced.

[0071] It can be understood that the roughness of the glass housing 100 of the present application refers to the average roughness of the etched area after the glass recess 110 is formed by etching.

[0072] It can be understood that although the roughness of the glass shell 100 can be any value between 1 μm and 6 μm, when preparing the glass shell 100, the glass substrate is placed in the same system of etching solution, and the vertical etching rate of the etching solution on different parts of the glass substrate is similar, so the roughness of different positions on the same glass shell 100 is basically the same.

[0073] See also Figure 8Optionally, the minimum width w of the orthographic projection of each of the glass recessed portions 110 on the preset surface 130 is in the range of 5μm≤w≤10μm. Specifically, the minimum width w of the orthographic projection of the glass recessed portion 110 on the preset surface 130 may be, but is not limited to, 5μm, 5.5μm, 6μm, 6.5μm, 7μm, 7.5μm, 8μm, 8.5μm, 9μm, 9.5μm, 10μm, etc. When the minimum width of the orthographic projection of the glass recessed portion 110 on the preset surface 130 is too small, the area of ​​the reflective surface 111 surrounding the glass recessed portion 110 is too small, which reduces the overall flash effect of the glass shell 100. In addition, the difficulty of the exposure process is increased, and it may be difficult to achieve a lower exposure accuracy; when the minimum width of the orthographic projection of the glass recessed portion 110 on the preset surface 130 is too large, the width of the groove is too wide, even visible to the naked eye, and the texture fineness is poor, which affects the appearance effect of the surface texture of the glass shell 100.

[0074] Optionally, the minimum spacing s between any two adjacent glass recesses 110 is in the range of 40 μm ≤ s ≤ 60 μm. Specifically, the minimum spacing s between any two adjacent glass recesses 110 may be, but is not limited to, 40 μm, 42 μm, 44 μm, 46 μm, 48 μm, 50 μm, 52 μm, 54 μm, 56 μm, 58 μm, 60 μm, etc. When the minimum spacing s between two adjacent glass recesses 110 is too large, the arrangement of the multiple glass recesses 110 is too dispersed, affecting the gradient effect of the multiple glass recesses 110 presenting the gradient flash texture, and reducing the density of the reflective surface 111 on the glass shell 100, thereby reducing the fineness of the texture and affecting the appearance of the glass shell 100; when the minimum spacing s between two adjacent glass recesses 110 is too small, although the density of the reflective surface 111 is large, the area of ​​each reflective surface 111 is too small, which also affects the flash effect of the glass shell 100.

[0075] Optionally, along the direction perpendicular to the preset surface 130, the depth h of each of the glass recessed portions 110 is in the range of 5μm≤h≤15μm. Specifically, along the direction perpendicular to the preset surface 130, the depth h of the glass recessed portion 110 may be, but is not limited to, 5μm, 6μm, 7μm, 8μm, 9μm, 10μm, 11μm, 12μm, 13μm, 14μm, 15μm, etc. If the depth of the glass recessed portion 110 is too small, the area of ​​the reflective surface 111 is too small, which affects the flashing effect of the glass recessed portion 110; if the depth of the glass recessed portion 110 is too large, the tolerance requirements for the photoresist are greatly increased, which increases the difficulty of the etching process. In addition, the tolerance of the photoresist may not be able to meet such a large etching depth. The photoresist may be completely peeled off from the glass substrate before the corresponding etching depth is reached, and a greater etching depth cannot be achieved; furthermore, if the depth of the glass recessed portion 110 is too large, the mechanical strength of the glass housing 100 will be reduced, and the scratching feel of the glass housing 100 will be increased.

[0076] “The depth of the glass recessed portion 110 ” refers to the distance between the lowest point and the highest point of the glass recessed portion 110 along the thickness direction of the glass housing 100 .

[0077] Optionally, the ends of the multiple glass recessed portions 110 away from the preset surface 130 are flush, and the ends of the multiple glass recessed portions 110 close to the preset surface 130 are also flush. In other words, the ends of the multiple glass recessed portions 110 away from the preset surface 130 are located in the same plane, and the ends of the multiple glass recessed portions 110 close to the preset surface 130 are also located in the same plane.

[0078] It can be understood that the ends of the multiple glass recessed portions 110 facing away from the preset surface 130 are flush, which can be understood as the ends of the reflective surfaces 111 enclosing the multiple glass recessed portions 110 facing away from the preset surface 130 are located in the same plane or flush.

[0079] When the ends of the plurality of glass recesses 110 away from the preset surface 130 are not in the same plane, the surface of the glass housing 100 having the plurality of glass recesses 110 has a strong scratching feel. In this embodiment, the ends of the plurality of glass recesses 110 away from the preset surface 130 are flush, so that the surface of the glass housing 100 having the plurality of glass recesses 110 has a better feel and reduces the scratching feel caused by the glass recesses 110.

[0080] Optionally, the glass housing 100 is obtained by wet etching a glass substrate. The glass housing 100 is prepared by wet etching, which facilitates assembly line operation and improves the preparation efficiency of the glass housing 100.

[0081] Optionally, when wet etching is performed, the lateral etching rate of the glass shell 100 changes gradually along the preset direction. In this embodiment, when wet etching is performed, the lateral etching rate of the glass substrate changes gradually, so that the slope of the reflective surface 111 of the multiple glass recessed parts 110 of the manufactured glass shell 100 changes gradually along the preset direction, so that the manufactured glass shell 100 can be viewed from different angles. In addition, the multiple glass recessed parts 110 of the manufactured glass shell 100 have a stronger three-dimensional sense, which improves the appearance expression of the glass shell 100.

[0082] Optionally, the gradual range of the lateral erosion rate V1 of the glass substrate is: 0.35 μm / min≤V1≤5.5 μm / min. It can be understood that along the preset direction, the lateral erosion rate V1 of the glass substrate can be gradually changed in any range between 0.35 μm / min and 5.5 μm / min. Specifically, along the preset direction, the side erosion rate V1 of the glass substrate can be gradually changed in an interval between any two values ​​of but not limited to 0.35 μm / min, 0.5 μm / min, 0.8 μm / min, 1.0 μm / min, 1.2 μm / min, 1.5 μm / min, 1.8 μm / min, 2.0 μm / min, 2.2 μm / min, 2.5 μm / min, 2.8 μm / min, 3.0 μm / min, 3.2 μm / min, 3.5 μm / min, 3.8 μm / min, 4.0 μm / min, 4.2 μm / min, 4.5 μm / min, 4.8 μm / min, 5 μm / min, 5.2 μm / min, 5.5 μm / min, etc.

[0083] It should be noted that, the wider the gradual variation range of the side etch rate V1 of the glass substrate, the wider the gradual variation range of the angle α between the reflective surface 111 of the glass shell 100 and the preset surface 130, and the flash point of the glass shell 100 can be seen at a wider range of angles; conversely, the narrower the gradual variation range of the side etch rate V1 of the glass substrate, the narrower the gradual variation range of the angle α between the reflective surface 111 of the glass shell 100 and the preset surface 130, and the flash point of the glass shell 100 can be seen at a narrower range of angles.

[0084] In this embodiment, the smaller the lateral etching rate V1 of the glass substrate, the larger the slope of the reflective surface 111 of the multiple glass recesses 110 formed. The larger the lateral etching rate V1 of the glass substrate, the smaller the slope of the reflective surface 111 of the multiple glass recesses 110 formed, which reduces the flash effect of the multiple glass recesses 110. When the lateral etching rate of the glass substrate is too large, the etching liquid resistance requirement of the photoresist layer is higher during etching. During etching, the photoresist layer may fall off from the glass substrate before the designed etching depth is reached, which affects the preparation of the glass housing 100. When the lateral etching rate of the glass substrate is too small, the slope of the reflective surface 111 of the multiple glass recesses 110 formed is too large, close to vertical etching, and the flash of the multiple glass recesses 110 formed is too low or even has no flash effect.

[0085] The glass shell 100 of the embodiment of the present application can be prepared by the method described in the following embodiment of the present application, and can also be prepared by other methods. The preparation method of the embodiment of the present application is only one or more preparation methods of the glass shell 100 of the present application, and should not be understood as limiting the glass shell 100 provided by the embodiment of the present application.

[0086] See also Fig. 9 and Fig.10 The present application also provides a method for preparing a glass housing 100, which includes:

[0087] S201, providing a glass substrate 100', wherein the glass substrate 100' has a surface 110' to be etched;

[0088] Optionally, the glass substrate 100 ′ may be, but is not limited to, at least one of silicate glass, borate glass, phosphate glass, and the like.

[0089] S202, wet etching is performed on the surface 110' to be etched of the glass substrate 100', so that the side etching rate of the glass substrate 100' changes gradually along the preset direction, and a glass housing 100 having a plurality of glass recessed portions 110 is obtained, wherein the plurality of glass recessed portions 110 are located on the same surface of the glass housing 100, each of the glass recessed portions 110 has a reflective surface 111, and the glass housing 100 further has a preset surface 130 facing away from the glass recessed portions 110, and along the preset direction, the angle between the reflective surface 111 of the plurality of glass recessed portions 110 and the preset surface 130 changes gradually, wherein the preset direction is a direction parallel to the preset surface 130.

[0090] Optionally, the side etching rate refers to the etching rate of the glass substrate 100' in the lateral direction during etching; in other words, the side etching rate refers to the etching rate of the glass substrate 100' in a direction perpendicular to the thickness of the glass substrate 100' during etching; in other words, the side etching rate refers to the etching rate of the glass substrate 100' in an extending direction along the preset surface 130 during etching.

[0091] For detailed description of the same characteristic parts of this embodiment as those of the above embodiment, such as the glass housing 100 and the glass recessed portion 110 , please refer to the above embodiment, which will not be repeated here.

[0092] In the method for preparing the glass shell 100 of the embodiment of the present application, the side etching rate of the glass substrate 100' changes gradually along a preset direction during etching, so that the slope of the reflective surface 111 of the plurality of glass recessed portions 110 formed by etching changes gradually along the preset direction, so that the flash points of the manufactured glass shell 100 can be viewed from different angles. In addition, the plurality of glass recessed portions 110 of the manufactured glass shell 100 have a stronger three-dimensional sense, thereby improving the appearance expression of the glass shell 100.

[0093] Optionally, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' has a gradual range of: 0.35 μm / min≤V1≤5.5 μm / min. It can be understood that along the preset direction, the lateral erosion rate V1 of the glass substrate 100' can be gradually changed in any range between 0.35 μm / min and 5.5 μm / min. Specifically, along the preset direction, the side erosion rate V1 of the glass substrate 100' can be gradually changed in an interval between any two values ​​of but not limited to 0.35μm / min, 0.5μm / min, 0.8μm / min, 1.0μm / min, 1.2μm / min, 1.5μm / min, 1.8μm / min, 2.0μm / min, 2.2μm / min, 2.5μm / min, 2.8μm / min, 3.0μm / min, 3.2μm / min, 3.5μm / min, 3.8μm / min, 4.0μm / min, 4.2μm / min, 4.5μm / min, 4.8μm / min, 5μm / min, 5.2μm / min, 5.5μm / min, etc.

[0094] For example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 0.35 μm / min and 2 μm / min. For another example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 0.35 μm / min and 3 μm / min. For another example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 0.35 μm / min and 4 μm / min. For another example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 0.35 μm / min and 5 μm / min. For another example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 0.35 μm / min and 5.5 μm / min. For another example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 1 μm / min and 3 μm / min. For another example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 1.5 μm / min and 3.5 μm / min. For another example, along the preset direction, the lateral erosion rate V1 of the glass substrate 100' gradually changes between 1 μm / min and 4.5 μm / min.

[0095] It should be noted that, the wider the gradual change range of the side etch rate V1 of the glass substrate 100', the wider the gradual change range of the angle α between the reflective surface 111 of the glass shell 100 and the preset surface 130, and the flash point of the glass shell 100 can be seen at a wider range of angles; conversely, the narrower the gradual change range of the side etch rate V1 of the glass substrate 100', the narrower the gradual change range of the angle α between the reflective surface 111 of the glass shell 100 and the preset surface 130, and the flash point of the glass shell 100 can be seen at a narrower range of angles.

[0096] In this embodiment, the smaller the lateral etching rate V1 of the glass substrate 100' is, the larger the slope of the reflective surface 111 of the formed glass recess 110 is, and the larger the lateral etching rate V1 of the glass substrate 100' is, the smaller the slope of the reflective surface 111 of the formed glass recess 110 is, which reduces the flash effect of the glass recess 110. When the lateral etching rate of the glass substrate 100' is too large, the etching liquid resistance requirement of the photoresist layer is higher during etching, and the photoresist layer may fall off from the glass substrate 100' before the designed etching depth is reached during etching, which affects the preparation of the glass housing 100; when the lateral etching rate of the glass substrate 100' is too small, the slope of the reflective surface 111 of the formed glass recess 110 is too large, close to vertical etching, and the flash of the formed glass recess 110 is too low or even has no flash effect.

[0097] Optionally, the vertical etching rate V2 of the glass substrate 100' is in the range of 1 μm / min≤V2≤3 μm / min. It can be understood that on the same glass substrate 100', the vertical etching rates V2 of various positions of the glass substrate 100' are equivalent. The vertical etching rate V2 of the glass substrate 100' can be any value between 1 μm / min and 3 μm / min. Specifically, the vertical etching rate V2 of the glass substrate 100' can be, but is not limited to, 1 μm / min, 1.2 μm / min, 1.5 μm / min, 1.8 μm / min, 2 μm / min, 2.2 μm / min, 2.5 μm / min, 2.8 μm / min, 3 μm / min, etc.

[0098] It can be understood that the vertical etching rate of the glass substrate 100 ′ refers to the etching rate along the thickness direction of the glass substrate 100 ′; in other words, the etching rate of the glass substrate 100 ′ along the direction perpendicular to the predetermined surface 130 .

[0099] In this embodiment, the vertical etching rate is too low, so that the depths of the obtained multiple glass recessed parts 110 are too shallow, and it takes a longer time to reach the same etching depth. The tolerance requirement for the photoresist is too high. When the required depth is reached, the photoresist layer may have fallen off, affecting the morphology of the obtained multiple glass recessed parts 110, thereby affecting the fading texture and fading flash effect of the obtained glass shell 100; if the vertical etching rate is too high, the angle α between the reflective surface 111 of the obtained multiple glass recessed parts 110 and the preset surface 130 is too large, which will also reduce the flash of the multiple glass recessed parts 110. In addition, if the vertical etching rate is too high, the depth of the multiple glass recessed parts 110 is etched too deep, which reduces the mechanical strength of the glass shell 100 and improves the scratching feel of the glass shell 100.

[0100] Optionally, along the preset direction, the ratio V2 / V1 of the vertical etching rate V2 to the side etching rate V1 changes gradually, wherein 0.36≤V2 / V1≤5.7. It can be understood that along the preset direction, the ratio V2 / V1 of the vertical etching rate V2 to the side etching rate V1 changes gradually in any interval between 0.36 and 5.7. Specifically, the ratio of the vertical etching rate V2 to the side etching rate V1 can be, but is not limited to, a gradual change in an interval between any two values ​​between 0.36, 0.5, 0.7, 1.0, 1.3, 1.5, 1.8, 2.0, 2.5, 3, 3.5, 4, 4.3, 4.5, 5, 5.4, 5.7, etc. If the ratio V2 / V1 of the vertical etching rate V2 to the side etching rate V1 is too small, the ratio of side etching is too large compared to the ratio of vertical etching, so that the slope of the reflective surface 111 of the formed glass recess 110 is too small, reducing the flash effect of the glass recess 110; in addition, when the ratio of the side etching rate of the glass substrate 100' is too large, the etching liquid resistance requirement of the photoresist layer is higher during etching, and the photoresist layer may fall off from the glass substrate 100' before the designed etching depth is reached during etching, affecting the preparation of the glass housing 100. If the ratio V2 / V1 of the vertical etching rate V2 to the side etching rate V1 is too large, the ratio of side etching is too small compared to the ratio of vertical etching, the slope of the reflective surface 111 of the formed glass recess 110 is too large, close to vertical etching, and the flash of the formed glass recess 110 is too low or even has no flash effect. When the ratio V2 / V1 of the vertical etching rate V2 to the side etching rate V1 along the preset direction is in the range of 0.36≤V2 / V1≤5.7, different flashing effects can be seen at all angles of the glass recessed portion 110, and the requirements for the process can be reduced, thereby reducing the process cost.

[0101] In this embodiment, along the preset direction, the ratio V2 / V1 of the vertical etching rate V2 to the side etching rate V1 changes gradually. When etching, at a position where V2 / V1 is larger, the slope of the reflective surface 111 of the formed glass recessed portion 110 is steeper, and at a position where V2 / V1 is smaller, the slope of the reflective surface 111 of the formed glass recessed portion 110 is flatter, so that the angle α between the reflective surface 111 of the glass recessed portion 110 of the manufactured glass shell 100 and the preset surface 130 changes gradually along the preset direction. In other words, the slope of the reflective surface 111 changes gradually, so that different shining surfaces or shining points of the glass shell 100 can be viewed from different angles. In addition, the glass recessed portion 110 of the glass shell 100 has a stronger three-dimensional sense, which improves the appearance expression of the glass shell 100.

[0102] Optionally, see Fig.11and Fig.12 The wet etching of the to-be-etched surface 110' of the glass substrate 100' so that the side etching rate of the glass substrate 100' changes gradually along the preset direction includes:

[0103] S2021, forming a mask layer 130' on the surface to be etched 110' of the glass substrate 100', wherein the mask layer 130' has a hollow portion 131', so that the surface to be etched 110' is partially exposed by the mask layer 130', wherein the adhesion of the mask layer 130' to the glass substrate 100' changes gradually along the preset direction, and the mask layer 130' has a first end 132' and a second end 133' which are spaced apart, and the preset direction is the direction in which the first end 132' points to the second end 133'; and

[0104] Optionally, there are multiple hollow portions 131', and the multiple hollow portions 131' may be arranged at intervals or at least partially connected. The hollow portions 131' may be dot-shaped hollow portions 131' or line-shaped hollow portions 131'.

[0105] It should be noted that, since the glass substrate 100' is exposed only at the position corresponding to the hollow portion 131', only this portion will be gradually etched by the etching solution. Therefore, the lateral etching rate of the glass substrate 100' along the preset direction in the present application refers to the lateral etching rate of the position of the glass substrate 100' corresponding to the hollow portion 131' along the preset direction, and the vertical etching rate is similar.

[0106] It should be noted that the preset direction of the present application is different from the position of the mask layer 130' close to the hollow portion 131' to the position away from the hollow portion 131'. The adhesion of the mask layer 130' to the glass substrate 100' in this embodiment changes gradually along the preset direction, which means that the adhesion of the mask layer 130' to the glass substrate 100' changes gradually from one position to another position on the mask layer 130', and multiple hollow portions 131' may be spanned between these two positions on the mask layer 130'. When the hollow portion 131' is a linear hollow portion 131', it can be from one end of the hollow portion 131' to the other end of the hollow portion 131', and it can also be in a direction that is an acute angle with the extension direction of the hollow portion 131'.

[0107] S2022, immersing the glass substrate 100' having the mask layer 130' into an etching solution to etch the portion of the surface 110' to be etched that is exposed by the mask layer 130', so that the etching solution enters the hollow portion 131', and etches the position of the glass substrate 100' corresponding to the hollow portion 131' to obtain the multiple glass recessed portions 110.

[0108] It can be understood that after the glass substrate 100' with the mask layer 130' is immersed in the etching solution, the etching solution passes through the hollow portion 131' and etches the position of the glass substrate 100' corresponding to the hollow portion 131' to form the multiple glass recessed portions 110. Since the adhesion between the mask layer 130' and the glass substrate 100' changes gradually along the preset direction, the peeling speed of the mask layer 130' and the glass substrate 100' is faster in the portion where the adhesion between the mask layer 130' and the glass substrate 100' is weaker, so that the side etching rate of the portion of the glass substrate 100' is faster, and the peeling speed of the mask layer 130' and the glass substrate 100' is slower in the portion where the adhesion between the mask layer 130' and the glass substrate 100' is stronger, so that the side etching rate of the portion of the glass substrate 100' is slower. Therefore, when etching is performed, the side etching rate of the glass substrate 100 ′ changes gradually along the preset direction, and the angle between the reflective surface 111 of the etched glass recess 110 and the preset surface 130 changes gradually.

[0109] Optionally, before the glass substrate 100' is immersed in the etching solution, all surfaces of the glass substrate 100' except the surface to be etched 110' (i.e., surfaces other than the surface provided with the mask layer 130') are coated with a whole layer of etching liquid resistant layer without hollow portions 131' or through holes, such as an ink layer or a photoresist layer.

[0110] Optionally, the etching solution comprises, by mass fraction, 0.5% to 3% hydrofluoric acid (HF), 2% to 5% sulfuric acid (H2SO4) and 3% to 8% ammonium bifluoride (NH4F), with the remainder being water. In a specific embodiment, the etching solution comprises, by mass fraction, 1% hydrofluoric acid (HF), 3% sulfuric acid (H2SO4) and 5% ammonium bifluoride (NH4F), with the remainder being water.

[0111] In some embodiments, after S2022 , the method for preparing the glass housing 100 of the embodiment of the present application further includes: stripping the mask layer 130 ′ so that the mask layer 130 ′ completely falls off from the glass housing 100 .

[0112] Optionally, see Fig.13 , forming a mask layer 130' on the surface to be etched 110' of the glass substrate 100', wherein the mask layer 130' has a hollow portion 131', wherein along the preset direction, the adhesion of the mask layer 130' to the glass substrate 100' changes gradually, including:

[0113] S21, forming a photoresist layer on the surface 110' to be etched of the glass substrate 100';

[0114] Optionally, a layer of photoresist solution is sprayed or coated on the surface of the glass substrate 100 ′, and soft baking is performed to remove the solvent in the photoresist solution to form a photoresist layer.

[0115] Optionally, the photoresist solution may be a positive photoresist solution or a negative photoresist solution. The positive photoresist solution may be, but not limited to, o-azidequinone photoresist; the negative photoresist solution may be, but not limited to, cinnamate photoresist.

[0116] S22, partially exposing the photoresist layer;

[0117] Specifically, a photomask with a hollow pattern is disposed on the photoresist layer, and the photoresist layer is partially exposed by non-contact exposure.

[0118] S23, developing the exposed photoresist layer to remove part of the photoresist layer to form a patterned photoresist layer; and

[0119] Optionally, the photoresist layer is developed with a developer to develop away a portion of the photoresist in the photoresist layer to form a patterned photoresist layer.

[0120] S24, hard-baking the patterned photoresist layer, and making the hard-baking time of the patterned photoresist layer gradually change along the preset direction, so that the adhesion of the mask layer 130' to the glass substrate 100' changes gradually along the preset direction, forming the mask layer 130' having the hollow portion 131'.

[0121] It can be understood that hard baking is also called hard film. Along the preset direction, the hard baking time of the patterned photoresist layer changes gradually. The reaction time of the photoresist in the area with a longer hard baking time is longer, and the curing degree of the corresponding area of ​​the obtained mask layer 130' is higher, so that the area of ​​the mask layer 130' has a higher adhesion to the glass substrate 100'; conversely, the reaction time of the photoresist in the area with a shorter hard baking time is shorter, and the curing degree of the corresponding area of ​​the obtained mask layer 130' is lower, so that the area of ​​the mask layer 130' has a lower adhesion to the glass substrate 100'. Therefore, by gradually controlling the hard baking time, the gradual change of the adhesion of the mask layer 130' to the glass substrate 100' can be controlled.

[0122] It can be understood that along the preset direction, the curing degrees of the mask layer 130 ′ and the glass substrate 100 ′ vary gradually.

[0123] It should be noted that the vertical etching rate of the glass substrate 100' is related to the concentration and composition of the etching solution; while the side etching rate of the glass substrate 100' is related to the adhesion between the mask layer 130' and the glass substrate 100'. The higher the adhesion of the mask layer 130' to the surface of the glass substrate 100', the lower the side etching rate, and the greater the slope of the reflective surface 111 of the formed glass recess 110; the worse the adhesion of the mask layer 130' to the surface of the glass substrate 100', the higher the side etching rate, and the lower the slope of the reflective surface 111 of the formed glass recess 110. Therefore, by adjusting the adhesion between the mask layer 130' and the glass substrate 100' along the preset direction, the side etching rate of the glass substrate 100' can be changed, thereby adjusting the adhesion of the photoresist in different regions to form different side etching rates, thereby achieving the effect of multiple slopes of the reflective surface 111 of the glass recess 110.

[0124] In some embodiments, in S24, the hard baking of the patterned photoresist layer and making the hard baking time of the patterned photoresist layer gradually change along the preset direction include:

[0125] A glass substrate 100' with a patterned photoresist layer is placed on a conveyor belt, and the conveyor belt drives the glass substrate 100' with a patterned photoresist layer into a tunnel furnace for hard baking along a preset direction at a preset rate, wherein the preset rate changes gradually so that the hard baking time of the patterned photoresist layer changes gradually, wherein the preset rate V3 has a gradual change range of: 1mm / min≤V3≤10mm / min.

[0126] It can be understood that, along the preset direction, the preset rate V3 can be gradually changed in any interval between 1 mm / min and 10 mm / min. Specifically, along the preset direction, the preset rate V3 can be gradually changed in an interval between any two values ​​between, but not limited to, 1 mm / min, 2 mm / min, 3 mm / min, 4 mm / min, 5 mm / min, 6 mm / min, 7 mm / min, 8 mm / min, 9 mm / min, 10 mm / min, etc. The smaller the preset rate V3 is, the longer the hard baking time is, the higher the curing degree of the mask layer 130' is, the better the adhesion of the mask layer 130' to the surface of the glass substrate 100' is, the slower the side etching rate is during etching, and the steeper the slope of the reflective surface 111 of the formed glass recessed portion 110 is; the larger the preset rate V3 is, the shorter the hard baking time is, the lower the curing degree of the mask layer 130' is, the worse the adhesion of the mask layer 130' to the surface of the glass substrate 100' is, the faster the side etching rate is during etching, and the slope of the reflective surface 111 of the formed glass recessed portion 110 is gentler, so that the reflective surface 111 of the glass recessed portion 110 of the glass housing 100 can have multiple slopes. However, when the preset rate V3 is too slow, the overall hard-baking time of the patterned photoresist layer is too long, and the reaction of each position on the patterned photoresist layer is basically complete, making it difficult to form a gradient-changing curing degree, so that the adhesion between the mask layer 130' and the glass substrate 100' cannot be gradient-changed along the preset direction. When the preset rate V3 is too fast, the overall hard-baking time of the patterned photoresist layer is too short, and the reaction degree of each position on the patterned photoresist layer is low, so that the overall adhesion between the formed mask layer 130' and the glass substrate 100' is too poor, and the performance of resisting the etching solution is deteriorated, affecting the etching of the glass substrate 100'. In addition, the preset rate V3 is too fast, and the gradient change of the curing degree of the formed mask layer 130' along the preset direction is very small, so that the adhesion between the mask layer 130' and the glass substrate 100' cannot be significantly gradient-changed along the preset direction.

[0127] In this embodiment, the preset rate is controlled to change gradually between 1 mm / min and 10 mm / min, so that the adhesion between the obtained mask layer 130' and the glass substrate 100' has an obvious gradient in the preset direction, and has good resistance to etching liquid. When the glass substrate 100' is etched by the etching liquid, the peeling rate of the mask layer 130' and the glass substrate 100' can be gradually changed along the preset direction, so that the side etching rate of the etching liquid on the glass substrate 100' changes gradually along the preset direction, and then the angle α between the reflective surface 111 of the glass recessed part 110 of the prepared glass shell 100 and the preset surface 130 changes gradually along the preset direction, and the obtained glass shell 100 can see the flash point in a wider angle range, reducing the angle range of the dark glass surface. In addition, because the preset rate gradually changes, the slope of the glass recessed part 110 of the glass shell 100 changes gradually.

[0128] Optionally, the hard baking temperature ranges from 120°C to 180°C. Specifically, the hard baking temperature may be, but is not limited to, 120°C, 130°C, 140°C, 150°C, 160°C, 170°C, 180°C, etc. If the hard baking temperature is too high, the curing reaction speed of the patterned photoresist layer is too fast, so that after curing, the curing degree of each position of the mask layer 130' is relatively high, and it is difficult to form a gradient curing degree, so that the gradual change of the adhesion between the mask layer 130' and the glass substrate 100' is not obvious, and the gradual change of the angle between the reflective surface 111 of the prepared glass shell 100 and the preset surface 130 is not obvious. If the hard baking temperature is too low, the overall curing degree of the mask layer 130' is low, the adhesion between the mask layer 130' and the glass substrate 100' is low, and the performance of resisting etching liquid is reduced. When etching is performed, the mask layer 130' may not reach the etching depth, and it will fall off completely.

[0129] Optionally, hard baking can be done with Fig.14The baking device 200' is used for hard baking, and the baking device 200' includes a tunnel oven 210', a heating tube 220', a conveyor belt 230', a sensor 240' and a transmission 250'. The heating tube 220' is arranged in the tunnel furnace 210' for heating; the conveyor belt 230' passes through the tunnel furnace 210' from the entrance of the tunnel furnace 210' and passes out from the exit of the tunnel furnace 210', and is used to convey the glass substrate 100' with the patterned photoresist layer from one end of the tunnel furnace 210' to the other end of the tunnel furnace 210' to hard bake the patterned photoresist layer; the sensor 240' is arranged at the entrance of the tunnel furnace 210', and is used to detect the glass substrate 100' with the patterned photoresist layer. When the sensor 240' detects the glass substrate 100' with the patterned photoresist layer, the baking device 200' is started to bake; the transmission 250' is used to drive the transmission belt to move, and control the acceleration of the conveyor belt 230' to adjust the running speed of the conveyor belt 230', thereby adjusting the hard baking time of the patterned photoresist layer.

[0130] In some embodiments, an acceleration section, a deceleration section, or both an acceleration section and a deceleration section may be provided on the same glass substrate 100', so that the adhesion of the obtained mask layer 130' along a preset direction gradually decreases, gradually increases, or includes a gradually decreasing area and a gradually increasing area, so that the slope of the reflective surface 111 of the glass recessed portion 110 of the obtained glass substrate 100' may gradually decrease, gradually increase, or include a gradually decreasing area and a gradually increasing area, etc.

[0131] In a specific embodiment, the acceleration can be adjusted in six stages (acceleration stage and deceleration stage in total, for example, including acceleration stage->deceleration stage->acceleration stage->deceleration stage->acceleration stage->deceleration stage) so that the slope of the reflective surface 111 of the multiple glass recessed parts 110 of the manufactured glass shell 100 presents a multi-stage gradual effect, that is, the slope of the reflective surface 111 of the multiple glass recessed parts 110 first gradually decreases, then gradually increases, then gradually decreases, then gradually increases, then gradually decreases, and then gradually increases, which greatly enriches the appearance effect of the glass shell 100. By designing different baking times and acceleration and deceleration stage times, a variety of effects can be brought about; because the preset rate gradually accelerates or decelerates, the baking time transitions naturally, and the slope of the formed glass recessed part 110 also presents a smooth gradual transition.

[0132] In some other embodiments, the preset direction includes a first sub-direction (such as Figure 4 Arrow M) and the second sub-direction (as shown Figure 5The first sub-direction intersects with the second sub-direction, and the preset rate includes a first rate and a second rate; the hard baking of the patterned photoresist layer and making the hard baking time of the patterned photoresist layer gradually change along the preset direction include:

[0133] The glass substrate 100' having the patterned photoresist layer is allowed to enter the tunnel furnace 210' along a first sub-direction at a first rate for hard baking to form a mask layer 130', wherein the first rate is gradually changed so that the adhesion of the mask layer 130' on the surface of the glass substrate 100' is gradually changed along the first sub-direction, wherein the gradual change range of the first rate V31 is: 1mm / min≤V31≤10mm / min; and

[0134] The glass substrate 100' with the patterned photoresist layer is made to enter the tunnel furnace 210' along the second sub-direction at a second rate for hard baking to form a mask layer 130', and the second rate is gradually changed so that the adhesion of the mask layer 130' on the surface of the glass substrate 100' changes gradually along the second sub-direction, wherein the gradual range of the second rate V32 is: 1mm / min≤V32≤10mm / min.

[0135] Optionally, the first rate and the second rate may be the same or different, which may be determined according to the design scheme, and this application does not make specific limitations. For a detailed description of the first rate and the second rate, please refer to the above description of the preset rate, which will not be repeated here.

[0136] In a specific embodiment, the first rate may include a first deceleration section and a first acceleration section; and the second rate may include a second deceleration section and a second acceleration section. In this way, the adhesion between the mask layer 130' and the glass substrate 100' gradually increases along the first sub-direction and then gradually decreases, and the adhesion between the mask layer 130' and the glass substrate 100' also gradually increases along the second sub-direction and then gradually decreases, so that the slope of the reflective surface 111 of the glass recessed portion 110 of the manufactured glass housing 100 gradually increases along the first sub-direction and then gradually decreases; the slope of the reflective surface 111 of the glass recessed portion 110 of the glass housing 100 also gradually increases along the second sub-direction and then gradually decreases.

[0137] In this embodiment, gradual baking is performed in two directions respectively, so that the slope of the reflective surface 111 of the glass recessed portion 110 of the glass shell 100 changes gradually in two directions, so that the glass recessed portion 110 of the glass shell 100 can be seen as a flash point at different angles in two directions, so that the glass shell 100 has a stronger three-dimensional sense, and the appearance expression of the glass shell 100 is improved.

[0138] See also Figures 15 to 17 The embodiment of the present application further provides an electronic device 300, which includes a display screen 310, a glass housing 100 described in the embodiment of the present application, and a processor 330. The glass housing 100 and the display screen 310 are arranged opposite to each other; the processor 330 is located between the glass housing 100 and the display screen 310, and the processor 330 is electrically connected to the display screen 310 for controlling the display screen 310 to display.

[0139] The electronic device 300 of the embodiment of the present application may be, but is not limited to, a portable electronic device 300 such as a mobile phone, a tablet computer, a laptop computer, a desktop computer, a smart bracelet, a smart watch, an e-reader, a game console, etc.

[0140] For a detailed description of the glass housing 100 , please refer to the description of the corresponding part of the above embodiment, which will not be repeated here.

[0141] Optionally, the display screen 310 may be, but is not limited to, one or more of a liquid crystal display screen, a light emitting diode display screen (LED display screen), a micro light emitting diode display screen (Micro LED display screen), a sub-millimeter light emitting diode display screen (Mini LED display screen), an organic light emitting diode display screen (OLED display screen), etc.

[0142] Optionally, the processor 330 includes one or more general-purpose processors, wherein the general-purpose processor can be any type of device capable of processing electronic instructions, including a central processing unit (CPU), a microprocessor, a microcontroller, a main processor, a controller, and an ASIC, etc. The processor 330 is used to execute various types of digital storage instructions, such as software or firmware programs stored in a memory, which enables the computing device to provide a wide variety of services.

[0143] Optionally, the electronic device 300 of the present application further includes a memory 350. The memory 350 is electrically connected to the processor 330 and is used to store program codes required for the processor 330 to run, program codes required for controlling the display screen 310, display content of the display screen 310, and the like.

[0144] Optionally, the memory 350 may include a volatile memory (Volatile Memory), such as a random access memory (Random Access Memory, RAM); the memory 350 may also include a non-volatile memory (NVM), such as a read-only memory (Read-Only Memory, ROM), a flash memory (Flash Memory, FM), a hard disk drive (Hard Disk Drive, HDD) or a solid-state drive (SSD). The memory 350 may also include a combination of the above-mentioned types of memory.

[0145] In some embodiments, the electronic device 300 of the embodiment of the present application further includes a middle frame 320 and a camera module 370, wherein the middle frame 320 is disposed between the display screen 310 and the glass shell 100, and the side of the middle frame 320 is exposed to the glass shell 100 and the display screen 310. The middle frame 320 and the glass shell 100 enclose a housing space (not shown), and the housing space is used to accommodate the processor 330, the memory 350 and the camera module 370. The camera module 370 is electrically connected to the processor 330, and is used to shoot under the control of the processor 330.

[0146] Optionally, the glass housing 100 has a light-transmitting portion 101, and the camera module 370 can shoot through the light-transmitting portion 101 on the glass housing 100, that is, the camera module 370 in this embodiment is a rear camera module 370. It can be understood that in other embodiments, the light-transmitting portion 101 can be set on the display screen 310, that is, the camera module 370 is a front camera module 370. In the schematic diagram of this embodiment, the light-transmitting portion 101 is illustrated as an opening. In other embodiments, the light-transmitting portion 101 may not be an opening, but a light-transmitting material, such as plastic, glass, etc.

[0147] It can be understood that the electronic device 300 described in this embodiment is only one form of the electronic device 300 used by the glass shell 100, and should not be understood as a limitation on the electronic device 300 provided in this application, nor should it be understood as a limitation on the glass shell 100 provided in each embodiment of this application.

[0148] Mentioning "embodiment" and "implementation method" in this application means that the specific features, structures or characteristics described in conjunction with the embodiment may be included in at least one embodiment of the present application. The appearance of the phrases in various places in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described in this application can be combined with other embodiments. In addition, it should also be understood that the features, structures or characteristics described in the various embodiments of the present application can be arbitrarily combined to form another embodiment that does not deviate from the spirit and scope of the technical solution of the present application, if there is no contradiction between them.

[0149] Finally, it should be noted that the above implementation modes are only used to illustrate the technical solution of the present application and are not intended to limit it. Although the present application has been described in detail with reference to the above preferred implementation modes, a person of ordinary skill in the art should understand that the technical solution of the present application may be modified or replaced by equivalents without departing from the spirit and scope of the technical solution of the present application.

Claims

1. A glass housing, characterized in that: The glass shell has a plurality of glass recessed portions, the plurality of glass recessed portions are located on the same surface of the glass shell, each of the glass recessed portions has a reflective surface, and the glass shell further has a preset surface away from the plurality of glass recessed portions, and along a preset direction, an angle between the reflective surface of the plurality of glass recessed portions and the preset surface changes gradually, wherein the preset direction is a direction parallel to the preset surface.

2. The glass housing according to claim 1, characterized in that: Along the preset direction, the gradual change range of the angle α between the reflective surface of the plurality of glass recessed portions and the preset surface is: 20°≤α≤80°.

3. The glass housing according to claim 1, characterized in that: The preset direction includes a first sub-direction and a second sub-direction. Along the first sub-direction, the angle α1 between the reflective surface of the multiple glass recessed parts and the preset surface changes gradually; along the second sub-direction, the angle α2 between the reflective surface of the multiple glass recessed parts and the preset surface also changes gradually; wherein the first sub-direction intersects with the second sub-direction.

4. The glass housing according to claim 3, characterized in that: Along the first sub-direction, the angle α1 between the reflective surface of the plurality of glass recessed portions and the preset surface first gradually increases and then gradually decreases; along the second sub-direction, the angle α2 between the reflective surface of the plurality of glass recessed portions and the preset surface first gradually increases and then gradually decreases; or, Along the first sub-direction, the angle α1 between the reflective surface of the multiple glass recessed parts and the preset surface first gradually decreases and then gradually increases; along the second sub-direction, the angle α2 between the reflective surface of the multiple glass recessed parts and the preset surface first gradually decreases and then gradually increases.

5. The glass housing according to claim 1, wherein: Along the preset direction, the angle α between the reflective surfaces of the plurality of glass recessed portions and the preset surface first gradually decreases, then gradually increases, then gradually decreases, then gradually increases, then gradually decreases, and then gradually increases.

6. The glass housing according to claim 1, characterized in that: The haze Ha of the glass shell is in the range of 60%≤Ha≤80%.

7. The glass housing according to claim 1, characterized in that: The range of the roughness Ra of the glass shell away from the preset surface is: 1 μm≤Ra≤6 μm.

8. The glass housing according to claim 1, wherein: The minimum width w of the orthographic projection of each of the glass recessed portions on the preset surface is in the range of 5 μm≤w≤10 μm.

9. The glass housing according to claim 1, wherein: The plurality of glass recessed portions are arranged at intervals on a surface of the glass housing away from the preset surface, and a minimum spacing s between any two adjacent glass recessed portions is in the range of 40 μm≤s≤60 μm.

10. The glass housing according to claim 1, wherein: Along a direction perpendicular to the predetermined surface, a depth h of each of the glass recessed portions is in a range of 5 μm≤h≤15 μm.

11. The glass housing according to claim 7, characterized in that: Ends of the plurality of glass recessed portions facing away from the preset surface are flush.

12. The glass housing according to any one of claims 1 to 11, characterized in that: The glass shell is obtained by wet etching a glass substrate.

13. The glass housing according to claim 12, characterized in that: When wet etching is performed, the side etching rate of the glass shell changes gradually along the preset direction.

14. The glass housing according to claim 13, characterized in that: The gradual change range of the side erosion rate V1 of the glass substrate is: 0.35 μm / min≤V1≤5.5 μm / min.

15. A method for preparing a glass housing, characterized in that: include: Providing a glass substrate having a surface to be etched; The surface to be etched of the glass substrate is wet-etched so that the side etching rate of the glass substrate changes gradually along a preset direction, thereby obtaining a glass shell having a plurality of glass recessed portions, wherein the plurality of glass recessed portions are located on the same surface of the glass shell, each of the glass recessed portions has a reflective surface, and the glass shell further has a preset surface away from the plurality of glass recessed portions, and along the preset direction, the angle between the reflective surface of the plurality of glass recessed portions and the preset surface changes gradually, wherein the preset direction is a direction parallel to the preset surface.

16. The method for preparing a glass casing according to claim 15, characterized in that: Along the preset direction, the gradual change range of the side erosion rate V1 of the glass substrate is: 0.35 μm / min≤V1≤5.5 μm / min.

17. The method for preparing a glass casing according to claim 15, characterized in that: When the surface to be etched of the glass substrate is wet-etched, the vertical etching rate of the glass substrate is V2, and along the preset direction, the ratio V2 / V1 of the vertical etching rate V2 to the side etching rate V1 changes gradually, wherein 0.36≤V2 / V1≤5.

7.

18. The method for preparing a glass casing according to any one of claims 15 to 17, characterized in that: The wet etching of the surface to be etched of the glass substrate so that the side etching rate of the glass substrate changes gradually along the preset direction includes: forming a mask layer on the surface to be etched of the glass substrate, the mask layer having a hollow portion so that the surface to be etched is partially exposed to the mask layer, wherein the adhesion of the mask layer to the glass substrate changes gradually along the preset direction, the mask layer having a first end and a second end which are spaced apart, and the preset direction is a direction from the first end to the second end; and The glass substrate with the mask layer is immersed in an etching solution to etch the portion of the surface to be etched that is exposed to the mask layer.

19. The method for preparing a glass casing according to claim 18, characterized in that: The step of forming a mask layer on the surface to be etched of the glass substrate, wherein the mask layer has a hollow portion, wherein along the preset direction, the mask layer changes gradually on the glass substrate, comprising: forming a photoresist layer on the surface to be etched of the glass substrate; locally exposing the photoresist layer; Developing the exposed photoresist layer to remove part of the photoresist layer to form a patterned photoresist layer; and The patterned photoresist layer is hard-baked, and the hard-baking time of the patterned photoresist layer is gradually changed along the preset direction, so that the adhesion of the mask layer to the glass substrate is gradually changed along the preset direction, forming a mask layer with a hollow portion.

20. An electronic device, characterized in that: include: Display screen; The glass housing according to any one of claims 1 to 14, wherein the glass housing is disposed opposite to the display screen; as well as A processor is located between the glass shell and the display screen, and the processor is electrically connected to the display screen to control the display screen to display.

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