High-purity hexafluoroethane production equipment

By using spoiler and catalytic gas reaction in hexafluoroethane production equipment, the problem of difficulty in mixing dichlorotetrafluoroethane and hydrogen fluoride is solved, and the production of high-purity hexafluoroethane is achieved.

CN119318918AInactive Publication Date: 2025-01-17ANHUI APK ELECTRONIC MATERIAL CO LTD
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Patent Information

Application Number
CN202411426741.6
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-10-14
Publication Date
2025-01-17
Estimated Expiration
Not applicable · inactive patent

AI Technical Summary

Technical Problem

In the existing hexafluoroethane production technology, the difference in the mixing evaporation rate of dichlorotetrafluoroethane and hydrogen fluoride makes it difficult to control the purity of the product, affecting the high purity production of hexafluoroethane.

Method used

A high-purity hexafluoroethane production equipment is designed, using multiple reaction units that are connected in sequence, using spoiler and catalytic gas reactions to increase dichlorotetrafluoroethane and catalytic reactions through the spoiler and catalytic reactions of the gas flow. The mixing efficiency of hydrogen fluoride forms a low pressure zone to promote mixing, and the fluorination reaction is carried out under the heating plate.

Benefits of technology

The mixing ratio of dichlorotetrafluoroethane and hydrogen fluoride is effectively controlled, the purity of hexafluoroethane is improved, and efficient fluorination reaction production is ensured.

✦ Generated by Eureka AI based on patent content.

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Abstract

The invention relates to the technical field of hexafluoroethane production, in particular to high-purity hexafluoroethane production equipment which comprises a plurality of reaction units connected in sequence, and a pair of connecting channels communicated with the previous reaction unit is arranged in each reaction unit. According to the high-purity hexafluoroethane production equipment provided by the invention, a part of airflow is blocked by the curved surface part on the spoiler and is diverted to be in contact with peripheral airflow, so that the peripheral airflow moves in an accelerated manner and forms a low-air-pressure area behind the curved surface, and a part of airflow moves along the plane on the spoiler and forms a low-air-pressure area behind the curved surface; the rapidly moving airflow drives the hydrogen fluoride gas in the first gas outlet to flow, so that the hydrogen fluoride gas is mixed with dichlorotetrafluoroethane, and when the part of mixed gas moves to the bottom end of the spoiler, the mixed gas gets close to a low-pressure area, turns over from the rear side of the spoiler and the front side of the spoiler, and then is mixed with the airflow on the front side of the spoiler; the dichlorotetrafluoroethane is mixed with the hydrogen fluoride gas.
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Description

Technical Field

[0001] The invention relates to the technical field of hexafluoroethane production, and in particular to high-purity hexafluoroethane production equipment. Background Art

[0002] Hexafluoroethane is an organic compound, which is the product of all six hydrogen atoms in ethane being replaced by fluorine atoms. Hexafluoroethane can be used for etching materials such as silicon, silicon nitride, and phosphorus silicon, and can be used to clean the surface of electronic devices. Therefore, it is used in integrated circuits, microelectronic devices, optical fiber cables, solar cells and other fields.

[0003] According to the publication (announcement) number CN105753635B, the publication (announcement) date is 2019.01.25, a method for industrially producing hexafluoroethane using dichlorotetrafluoroethane as a raw material is disclosed. The method is a two-stage circulation process, comprising the following steps: (1) dichlorotetrafluoroethane and hydrogen fluoride are mixed and evaporated, and then enter the catalyst bed of the first reactor to obtain a mixture containing monochloropentafluoroethane and hydrogen fluoride, and the catalyst is a chromium-based catalyst; (2) the mixture obtained in step (1) is separated, and the monochloropentafluoroethane and hydrogen fluoride enter the catalyst bed of the second reactor to obtain hexafluoroethane after reaction, and the catalyst is a chromium-based catalyst or a magnesium-based catalyst; (3) the reaction product obtained in step (2) is separated, and hexafluoroethane is obtained at the top of the tower.

[0004] In the prior art including the above patents, when dichlorotetrafluoroethane and hydrogen fluoride are used to produce hexafluoroethane, dichlorotetrafluoroethane and hydrogen fluoride are generally mixed and evaporated so that the gaseous dichlorotetrafluoroethane and the gaseous hydrogen fluoride are fully mixed. However, since the boiling points of dichlorotetrafluoroethane and hydrogen fluoride are quite different, the evaporation rates of dichlorotetrafluoroethane and hydrogen fluoride in the mixed evaporation at the same temperature are different, which makes it difficult to control the ratio of dichlorotetrafluoroethane and hydrogen fluoride in the mixed gas, which easily affects the purity of the target product hexafluoroethane. If dichlorotetrafluoroethane and hydrogen fluoride are evaporated separately, the gaseous dichlorotetrafluoroethane and the gaseous hydrogen fluoride need to be fully mixed to facilitate the fluorination reaction. Summary of the invention

[0005] The object of the present invention is to provide a high-purity hexafluoroethane production device to solve the above problems.

[0006] In order to achieve the above object, the present invention provides a high-purity hexafluoroethane production device, comprising a plurality of sequentially connected reaction units, wherein the reaction units are provided with:

[0007] a pair of connecting channels connected to the previous reaction unit;

[0008] A first chamber, wherein a connecting block is disposed inside the first chamber, wherein the connecting block is symmetrically and obliquely provided with spoilers corresponding to the connecting channel one by one and whose top faces the connecting channel, wherein the side surfaces on opposite sides of the spoiler are respectively a plane and an arc surface, and the arc surface extends to the top surface, and the spoiler is provided with a plurality of first gas outlets extending to the plane for the outflow of hydrogen fluoride gas, wherein:

[0009] The gas flowing through the plane of the spoiler entrains the hydrogen fluoride flowing out of the first gas outlet to move, and is dragged by the airflow flowing through the curved surface of the spoiler to change its flow direction.

[0010] Preferably, the thickness and width of the spoiler decrease gradually from one end close to the connecting block to the other end.

[0011] Preferably, the airflow moves along the spoiler and forms a spiral downward airflow at an end of the spoiler away from the connecting block, and the first chamber is provided with a third air outlet facing a section of the spiral downward airflow.

[0012] Preferably, a movable block for catalyzing gas reaction is disposed inside the first chamber, and a guide plate parallel to the tail end of the spiral downward airflow is disposed on the movable block.

[0013] Preferably, the movable block is provided with Y-shaped flow channels distributed in a linear array and connected to each other, and a heating plate is provided on the inner wall of the flow channel.

[0014] Preferably, a third chamber is provided at the top of the flow channel to buffer the gas expanded due to heat and prevent the gas from flowing back.

[0015] Preferably, a plurality of spoiler blocks facing the plurality of flow channels respectively are arranged inside the movable block, and a catalyst for catalyzing the reaction of the mixed gas is arranged on the spoiler blocks.

[0016] Preferably, the cross section of the spoiler block is an isosceles trapezoid whose upper base is longer than the lower base, and the airflow hits the top surface of the spoiler block and forms a vortex obliquely below the spoiler block.

[0017] Preferably, vortices formed when the airflow impinges on two adjacent spoiler blocks intersect.

[0018] Preferably, the two inclined surfaces of the spoiler block are provided with second gas outlets distributed in a linear array for the hydrogen fluoride gas to flow out.

[0019] In the above technical scheme, a high-purity hexafluoroethane production equipment provided by the present invention has the following beneficial effects: when the hexafluoroethane production work is carried out, dichlorotetrafluoroethane is introduced into the reaction unit from the connecting channel, and the dichlorotetrafluoroethane enters the first chamber along the connecting channel and contacts the spoiler, and part of the airflow is blocked by the curved surface on the spoiler so that the part of the airflow is diverted and contacts the peripheral airflow, so that the peripheral airflow moves faster and forms a low pressure area behind the curved surface, and another part of the airflow moves along the plane on the spoiler, and the fast-moving airflow drives the hydrogen fluoride gas in the first gas outlet to flow, so that the hydrogen fluoride gas is mixed with the dichlorotetrafluoroethane, and when the part of the mixed gas moves to the bottom of the spoiler, the mixed gas will move closer to the low pressure area, flip from the rear side of the spoiler to the front side of the spoiler, and then mix with the airflow on the front side of the spoiler, so that the dichlorotetrafluoroethane is mixed with the hydrogen fluoride gas, so that the subsequent fluorination reaction produces hexafluoroethane. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings required for use in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can also be obtained based on these drawings.

[0021] Figure 1 A schematic diagram of the overall structure provided for an embodiment of the present invention;

[0022] Figure 2 A schematic diagram of the internal structure provided by an embodiment of the present invention;

[0023] Figure 3 for Figure 2 Enlarged view of point A in the middle;

[0024] Figure 4 for Figure 2 Method diagram at B in the middle;

[0025] Figure 5 A schematic diagram of the structure of an activity block provided by an embodiment of the present invention;

[0026] Figure 6 A schematic diagram of the internal structure of an active block provided in an embodiment of the present invention;

[0027] Figure 7 A front view of a spoiler provided by an embodiment of the present invention;

[0028] Figure 8 A top view of a spoiler provided in an embodiment of the present invention;

[0029] Fig. 9 A schematic diagram of the cross section and airflow direction of a spoiler provided in an embodiment of the present invention;

[0030] Fig.10 A schematic diagram of a spiral downward airflow provided in an embodiment of the present invention.

[0031] Description of reference numerals:

[0032] 1. reaction unit; 11. connecting block; 111. spoiler; 112. first pipeline; 113. first air outlet; 114. connecting rod; 121. first chamber; 122. second chamber; 123. connecting channel; 124. impeller; 125. mounting plate; 126. ejector rod; 127. stopper; 128. third pipeline; 129. third air outlet; 13. movable block; 131. guide plate; 132. flow channel; 133. heating plate; 134. spoiler; 135. third chamber; 136. movable rod; 137. second pipeline; 138. second air outlet; 139. guide groove. DETAILED DESCRIPTION

[0033] In order to enable those skilled in the art to better understand the technical solution of the present invention, the present invention will be further described in detail below with reference to the accompanying drawings.

[0034] like Figure 1-10 As shown, a high-purity hexafluoroethane production device includes a plurality of reaction units 1 connected in sequence, and the reaction unit 1 is provided with:

[0035] a pair of connecting channels 123 connected to the previous reaction unit 1;

[0036] The first chamber 121 has a connecting block 11 disposed therein, and the connecting block 11 is symmetrically and obliquely provided with a spoiler 111 corresponding to the connecting channel 123 one by one and with the top surface facing the connecting channel 123, and the side surfaces of the spoiler 111 on opposite sides are respectively a plane and an arc surface, and the arc surface extends to the top surface, and the spoiler 111 is provided with a plurality of first gas outlets 113 extending to the plane for the hydrogen fluoride gas to flow out, wherein:

[0037] The gas flowing through the plane of the spoiler 111 carries the hydrogen fluoride flowing out of the first gas outlet 113 to move, and is dragged by the airflow flowing through the curved surface of the spoiler 111 to change its flow direction.

[0038] Specifically, the connection block 11 is provided with a channel extending to the inside of the two spoilers 111 and connected to the plurality of first air outlets 113, and the reaction unit 1 is provided with a first pipe 112 connected to the internal channel of the connection block 11, and the width of the connection channel 123 increases from top to bottom.

[0039] Furthermore, when the hexafluoroethane is produced, hydrogen fluoride is sent to the first gas outlet 113 through the first pipeline 112 and the internal channel of the connecting block 11, and then dichlorotetrafluoroethane is introduced into the reaction unit 1 from the connecting channel 123. Dichlorotetrafluoroethane enters the first chamber 121 along the connecting channel 123 and contacts the spoiler 111. Part of the airflow is blocked by the curved surface on the spoiler 111 and the part of the airflow is diverted to contact the peripheral airflow, so that the peripheral airflow is accelerated and moves, and a low pressure area is formed behind the curved surface. Another part of the airflow moves along the plane on the spoiler 111, and the fast-moving airflow drives the hydrogen fluoride gas in the first air outlet 113 to flow, so that the hydrogen fluoride gas is mixed with dichlorotetrafluoroethane. When this part of the mixed gas moves to the bottom of the spoiler 111, the mixed gas will move closer to the low-pressure area, flip from the rear side of the spoiler 111 to the front side of the spoiler 111, and then mix with the airflow on the front side of the spoiler 111, so that the dichlorotetrafluoroethane is mixed with the hydrogen fluoride gas, so as to produce hexafluoroethane in the subsequent fluorination reaction.

[0040] In the above technical solution, when the hexafluoroethane production work is carried out, dichlorotetrafluoroethane is introduced into the reaction unit 1 from the connecting channel 123, and the dichlorotetrafluoroethane enters the first chamber 121 along the connecting channel 123 and contacts the spoiler 111. Part of the airflow is blocked by the curved surface on the spoiler 111, and the part of the airflow is diverted to contact the peripheral airflow, so that the peripheral airflow is accelerated to move and a low pressure area is formed behind the curved surface. Another part of the airflow moves along the plane on the spoiler 111. The fast-moving airflow drives the hydrogen fluoride gas in the first gas outlet 113 to flow, so that the hydrogen fluoride gas is mixed with the dichlorotetrafluoroethane. When the part of the mixed gas moves to the bottom end of the spoiler 111, the mixed gas will move closer to the low pressure area, flip from the rear side of the spoiler 111 to the front side of the spoiler 111, and then mix with the airflow in front of the spoiler 111, so that the dichlorotetrafluoroethane is mixed with the hydrogen fluoride gas, so that the subsequent fluorination reaction produces hexafluoroethane.

[0041] As an embodiment further provided by the present invention, the thickness and width of the spoiler 111 decrease gradually from one end close to the connecting block 11 to the other end, the airflow moves along the spoiler 111 and forms a spiral downward airflow at the end of the spoiler 111 away from the connecting block 11, and the first chamber 121 is provided with a third air outlet 129 facing a section of the spiral downward airflow.

[0042] Specifically, when the hexafluoroethane production is carried out, hydrogen fluoride is sent to the first gas outlet 113 through the first pipeline 112 and the internal channel of the connecting block 11, and then dichlorotetrafluoroethane is introduced into the reaction unit 1 from the connecting channel 123. Dichlorotetrafluoroethane enters the first chamber 121 along the connecting channel 123 and contacts the spoiler 111. Part of the airflow is blocked by the curved surface on the spoiler 111, and the part of the airflow is diverted to contact the peripheral airflow, so that the peripheral airflow is accelerated and forms a low pressure area behind the curved surface. Another part of the airflow moves along the plane on the spoiler 111. The fast-moving airflow drives the hydrogen fluoride gas in the first gas outlet 113 to flow, so that the hydrogen fluoride gas is mixed with the dichlorotetrafluoroethane. The mixed gas moves to the bottom of the spoiler 111. When the mixed gas moves toward the low pressure area, it will be turned over by the front side of the spoiler 111 from the rear side of the spoiler 111, and then mixed with the airflow in front of the spoiler 111, so that the dichlorotetrafluoroethane and the hydrogen fluoride gas are mixed. At the same time, since the thickness and width of the spoiler 111 decrease from one end close to the connecting block 11 to the other end, the airflow will move laterally along the spoiler 111 when it contacts the spoiler 111, and gradually accumulate at the rear end of the spoiler 111. The accumulated airflow moves obliquely downward and is pushed by the subsequent airflow to generate a spiral downward airflow. At the same time, the third air outlet 129 slowly sprays hydrogen fluoride gas, and the slowly flowing hydrogen fluoride gas is entrained by the high-speed spiral downward airflow, so that the hydrogen fluoride gas is further mixed with the airflow, so that the subsequent fluorination reaction can produce hexafluoroethane.

[0043] As another embodiment further provided by the present invention, a movable block 13 for catalyzing gas reaction is disposed inside the first chamber 121 , and a guide plate 131 parallel to the tail end of the spiral downward airflow is disposed on the movable block 13 .

[0044] Specifically, the spiral downward airflow gradually approaches the movable block 13, and the tail end of the airflow moves with the inclined guide plate 131 and enters the movable block 13 along the guide plate 131. The dichlorotetrafluoroethane reacts with the hydrogen fluoride gas inside the movable block 13 to produce monochloropentafluoroethane.

[0045] As another embodiment further provided by the present invention, the movable block 13 is provided with Y-shaped flow channels 132 distributed in a linear array and connected to each other inside, and a heating plate 133 is provided on the inner wall of the flow channel 132 .

[0046] Specifically, after entering the movable block 13, the mixed gas is pushed by the follow-up gas into the narrow Y-shaped flow channel 132, and the heating plate 133 on the inner wall of the flow channel 132 heats the mixed gas so that the mixed gas undergoes a fluorination reaction at a suitable temperature to produce monochloropentafluoroethane.

[0047] As another embodiment further provided by the present invention, a third chamber 135 is provided at the top of the flow channel 132 to buffer the gas expanded due to heat and prevent the gas from flowing back.

[0048] Specifically, after the gas enters the Y-shaped flow channel 132 and is heated by the heating plate 133, it will expand, and part of the expanded gas will flow upward and enter the third chamber 135, preventing this part of the gas flow from flowing back from the gap between the guide plate 131 and the movable block 13 to the second chamber 122 of the reaction unit 1, thereby ensuring that the air pressure in the second chamber 122 is low, so as to form a spiral downward airflow.

[0049] Furthermore, as another embodiment further provided by the present invention, a plurality of spoiler blocks 134 facing the plurality of flow channels 132 are disposed inside the movable block 13 , and a catalyst for catalyzing the reaction of the mixed gas is disposed on the spoiler blocks 134 .

[0050] Specifically, the catalyst in the above embodiment is a chromium-based catalyst that can catalyze the reaction of dichlorotetrafluoroethane and hydrogen fluoride as well as the reaction of monochloropentafluoroethane and hydrogen fluoride. A heating unit is also provided in the spoiler block 134 so that the catalyst at a suitable temperature can catalyze the reaction of the mixed gas.

[0051] Furthermore, after being fully heated in the flow channel 132 , the mixed gas is quickly ejected downward and impacts the spoiler block 134 . The catalyst on the spoiler block 134 catalyzes the reaction of the mixed gas at a suitable temperature.

[0052] As another embodiment further provided by the present invention, the cross section of the spoiler block 134 is specifically an isosceles trapezoid with an upper base longer than a lower base, and the airflow hits the top surface of the spoiler block 134 and forms a vortex obliquely below the spoiler block 134 .

[0053] Specifically, after flowing out of the flow channel 132, the mixed gas will hit the top plane of the spoiler block 134 and form a vortex obliquely downward on both sides of the spoiler block 134. The vortex can further mix the dichlorotetrafluoroethane, making it easier for it to enter the next reaction unit 1 to continue the reaction.

[0054] As another embodiment further provided by the present invention, vortices formed when the airflow impinges on two adjacent spoiler blocks 134 intersect.

[0055] Specifically, two air flows are ejected from two adjacent flow channels 132 and collide with two adjacent spoiler blocks 134 , and vortices with opposite directions are formed between the two spoiler blocks 134 . The two vortices gradually approach and offset each other, so that the gas mixing degree is further improved.

[0056] As another embodiment further provided by the present invention, the two inclined surfaces of the spoiler block 134 are provided with second gas outlets 138 distributed in a linear array for the hydrogen fluoride gas to flow out.

[0057] Specifically, the reaction unit 1 is provided with a second pipe 137 , which extends to the interior of the spoiler 134 and is in communication with the plurality of second air outlets 138 .

[0058] Furthermore, while the gas hits the top of the spoiler 134 to form a vortex, the second pipe 137 inputs hydrogen fluoride to the second gas outlet 138. The hydrogen fluoride gas flows slowly, while the gas in the vortex flows faster, forming a low-pressure area at the center of the vortex, and adsorbing the hydrogen fluoride gas flowing out of the second gas outlet 138, so that the hydrogen fluoride gas is further mixed into the mixed gas for subsequent reactions.

[0059] As another embodiment further provided by the present invention, the movable block 13 is slidably installed inside the second chamber 122, and the reaction unit 1 is internally rotatably provided with an impeller 124 extending to the inside of the connecting channel 123 and used to drive the movable block 13 to move, and a mounting disk 125 is provided on the impeller 124, and a push rod 126 distributed in a circular array is slidably provided on the mounting disk 125, and a spring is provided between the push rod 126 and the mounting disk 125, and a movable rod 136 is provided on the movable block 13, and a guide groove 139 for the flow of hydrogen fluoride gas is provided on the side wall of the movable rod 136, and a third pipeline 128 connected to the guide groove 139 is provided on the reaction unit 1, and a third gas outlet 129 is provided on the movable rod 136 and connected to the guide groove 139, and a spring is provided between the movable block 13 and the reaction unit 1.

[0060] Specifically, the reaction unit 1 is provided with a wide third chamber 135 located below the movable block 13 and connected to the connection channel 123 of the downwardly movable reaction unit 1 , and a triangular prism-shaped stopper 127 is symmetrically provided on the top of the third chamber 135 .

[0061] Furthermore, when the hexafluoroethane production work is carried out, hydrogen fluoride is sent to the first gas outlet 113 through the first pipeline 112 and the internal channel of the connecting block 11, and then dichlorotetrafluoroethane is introduced into the reaction unit 1 from the connecting channel 123. Dichlorotetrafluoroethane enters the first chamber 121 along the connecting channel 123 and contacts the spoiler 111. Part of the airflow is blocked by the curved surface on the spoiler 111, and the part of the airflow is diverted to contact the peripheral airflow, so that the peripheral airflow is accelerated to move and a low pressure area is formed behind the curved surface. Another part of the airflow moves along the plane on the spoiler 111. The fast-moving airflow drives the hydrogen fluoride gas in the first gas outlet 113 to flow, so that the hydrogen fluoride gas is mixed with dichlorotetrafluoroethane. When the part of the mixed gas moves to the bottom of the spoiler 111, the mixed gas will move to the low pressure area. The air pressure zones are brought closer, and the rear side of the spoiler 111 and the front side of the spoiler 111 are flipped, and then mixed with the airflow on the front side of the spoiler 111, so that the dichlorotetrafluoroethane is mixed with the hydrogen fluoride gas. At the same time, since the thickness and width of the spoiler 111 decrease from one end close to the connecting block 11 to the other end, the airflow moves laterally along the spoiler 111 when contacting the spoiler 111, and gradually accumulates at the rear end of the spoiler 111. The accumulated airflow moves obliquely downward and is pushed by the subsequent airflow, generating a spiral downward airflow. At the same time, the third pipe 128 injects hydrogen fluoride gas into the guide groove 139 on the movable rod 136, and this part of the hydrogen fluoride gas is slowly ejected from the third air outlet 129, and the slowly flowing hydrogen fluoride gas is entrained by the high-speed spiral downward airflow, so that the hydrogen fluoride gas is further mixed with the airflow.

[0062] The spiral downward airflow gradually approaches the movable block 13, and the tail end of the airflow moves with the inclined guide plate 131 and enters the movable block 13 along the guide plate 131. After entering the movable block 13, the mixed gas will enter the narrow Y-shaped flow channel 132 under the push of the subsequent gas. The heating plate 133 on the inner wall of the flow channel 132 heats the mixed gas, and the expanded part of the gas will flow upward and enter the third chamber 135, avoiding the part of the airflow from flowing back from the gap between the guide plate 131 and the movable block 13 to the second chamber 122 of the reaction unit 1, ensuring that the air pressure in the second chamber 122 is low, so as to form a spiral downward airflow. After being fully heated in the flow channel 132, the mixed gas is quickly ejected downward and hits the spoiler block 134. The catalyst on the spoiler block 134 is at a suitable temperature. The mixed gas is catalyzed to react at a certain temperature, and the mixed gas impacts the top plane of the spoiler block 134 to form vortices obliquely downward on both sides of the spoiler block 134. The vortices can further mix the dichlorotetrafluoroethane. At the same time, the second pipe 137 inputs hydrogen fluoride to the second gas outlet 138. The hydrogen fluoride gas flows slowly, while the gas flows faster in the vortex, forming a low-pressure area at the center of the vortex, and adsorbing the hydrogen fluoride gas flowing out of the second gas outlet 138, so that the hydrogen fluoride gas is further mixed into the mixed gas. In addition, multiple air flows are ejected from multiple flow channels 132 and impact on multiple spoiler blocks 134, and vortices in opposite directions are formed between any two adjacent spoiler blocks 134. The two vortices gradually approach and offset each other, so that the gas mixing degree is further improved, which is convenient for it to enter the next reaction unit 1 to continue the reaction.

[0063] Then the mixed gas enters the wide third chamber 135 , and a certain amount of gas accumulates in the third chamber 135 to pressurize the gas flow injected into the next reaction unit 1 , and the block 127 at the top of the third chamber 135 can prevent the gas flow from moving upward to ensure the gas pressure inside the third chamber 135 .

[0064] When the gas flows at a faster speed, the gas flows through the spoiler 111 and forms a spiral downward airflow with a larger pitch at the tail end of the spoiler 111. At the same time, the gas pushes the impeller 124 to rotate at a faster speed. The impeller 124 drives the mounting plate 125 to rotate. The top rod 126 in the mounting plate 125 extends to the outside of the mounting plate 125 under the action of centrifugal force and pushes the connecting rod 114. The connecting rod 114 drives the movable rod 136 and the movable block 13 to move downward, so that the guide plate 131 on the movable block 13 remains roughly parallel to the tail end of the spiral downward airflow, so that the airflow enters the movable block 13. At the same time, the connecting rod 114 drives the third air outlet 129 to move downward, so that the third air outlet 129 on the connecting rod 114 can remain facing a part of the spiral downward airflow, so that the hydrogen fluoride gas flowing out of the third air outlet 129 can be carried away by the spiral downward airflow.

[0065] On the contrary, when the gas flows at a slower speed, the pitch of the spiral downward airflow formed by the gas flowing through the spoiler 111 at the tail end of the spoiler 111 decreases, and at the same time, the speed at which the gas drives the impeller 124 to rotate is also slower, the rotation speed of the mounting plate 125 decreases, the top rod 126 retracts into the mounting plate 125, and the spring pushes the movable rod 136 and the movable block 13 to move upward, so that the guide plate 131 on the movable block 13 remains roughly parallel to the tail end of the spiral downward airflow, so that the airflow enters the movable block 13, and at the same time, the connecting rod 114 drives the third air outlet 129 to move upward, so that the third air outlet 129 on the connecting rod 114 can remain facing a part of the spiral downward airflow, so that the hydrogen fluoride gas flowing out of the third air outlet 129 can be carried away by the spiral downward airflow.

[0066] The temperature of the heating plates 133 in the multiple reaction units 1 connected in sequence increases from 330° C. to 450° C., so that dichlorotetrafluoroethane can gradually react with hydrogen fluoride in the multiple reaction units 1 to generate chloropentafluoroethane, and then chloropentafluoroethane reacts with hydrogen fluoride to generate hexafluoroethane.

[0067] The above description is only by way of illustration of certain exemplary embodiments of the present invention. It is undoubted that those skilled in the art can modify the described embodiments in various ways without departing from the spirit and scope of the present invention. Therefore, the above drawings and descriptions are illustrative in nature and should not be construed as limiting the scope of protection of the claims of the present invention.

Claims

1. A high-purity hexafluoroethane production equipment, characterized in that: The invention comprises a plurality of reaction units (1) connected in sequence, wherein the reaction units (1) are provided with: A pair of connecting channels (123) connected to the previous reaction unit (1); A first chamber (121), wherein a connecting block (11) is arranged inside the first chamber (121), wherein the connecting block (11) is symmetrically and obliquely provided with spoilers (111) corresponding one-to-one to the connecting channel (123) and having a top surface facing the connecting channel (123), wherein the side surfaces of the spoiler (111) on opposite sides are respectively a plane and an arc surface, and the arc surface extends to the top surface, and the spoiler (111) is provided with a plurality of first gas outlets (113) extending to the plane for the hydrogen fluoride gas to flow out, wherein: The gas flowing through the plane of the spoiler (111) moves with the hydrogen fluoride flowing out of the first gas outlet (113), and changes its flow direction due to the traction of the airflow flowing through the curved surface of the spoiler (111).

2. A high-purity hexafluoroethane production equipment according to claim 1, characterized in that: The thickness and width of the spoiler (111) decrease gradually from one end close to the connecting block (11) to the other end.

3. A high-purity hexafluoroethane production equipment according to claim 2, characterized in that: The airflow moves along the spoiler (111) and forms a spiral downward airflow at an end of the spoiler (111) away from the connecting block (11), and the first chamber (121) is provided with a third air outlet (129) facing a section of the spiral downward airflow.

4. A high-purity hexafluoroethane production equipment according to claim 3, characterized in that: A movable block (13) for catalyzing gas reaction is arranged inside the first chamber (121), and a guide plate (131) parallel to the tail end of the spiral downward airflow is arranged on the movable block (13).

5. A high-purity hexafluoroethane production equipment according to claim 4, characterized in that: The movable block (13) is provided with Y-shaped flow channels (132) distributed in a linear array and connected to each other inside, and a heating plate (133) is provided on the inner wall of the flow channel (132).

6. A high-purity hexafluoroethane production equipment according to claim 5, characterized in that: A third chamber (135) is provided at the top of the flow channel (132) to buffer the gas that expands due to heat and prevent the gas from flowing back.

7. A high-purity hexafluoroethane production equipment according to claim 5, characterized in that: A plurality of flow-turbulating blocks (134) facing the plurality of flow channels (132) are arranged inside the movable block (13), and a catalyst for catalyzing the reaction of the mixed gas is arranged on the flow-turbulating blocks (134).

8. A high-purity hexafluoroethane production equipment according to claim 7, characterized in that: The cross section of the spoiler block (134) is specifically an isosceles trapezoid with an upper base longer than a lower base, and the airflow hits the top surface of the spoiler block (134) and forms a vortex obliquely below the spoiler block (134).

9. A high-purity hexafluoroethane production equipment according to claim 8, characterized in that: The vortices formed when the airflow hits two adjacent spoiler blocks (134) intersect.

10. The high-purity hexafluoroethane production equipment according to claim 8, characterized in that: Second gas outlets (138) for the hydrogen fluoride gas to flow out are provided on the two inclined surfaces of the spoiler block (134) and are distributed in a linear array.

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