Two-stage lifting and rotating device for wafer carrying

Abstract

The invention provides a two-stage lifting and rotating device for wafer carrying, and the device comprises a pedestal which is internally provided with a Z1-axis driving unit, a Z1-axis transmission unit, and a Z1-axis guiding unit; the Z1 lifting seat is arranged in the base in a sleeved mode, and a Z2-axis driving unit, a Z2-axis transmission unit and a Z2-axis guiding unit are arranged in the Z1 lifting seat. The rotary motion seat is of a cylindrical hollow structure and is arranged in the Z1 lifting seat in a sleeved mode. According to the device, the Z1 lifting base is arranged in the base in a sleeved mode, the rotary movement base is arranged in the Z1 lifting base in a sleeved mode, a two-stage lifting mode is achieved, large-stroke lifting can be achieved in a limited height space, and rotary movement is achieved by arranging the rotary movement base; through the optimized arrangement of the Z1-axis linear guide rail and the Z2-axis linear guide rail and the mode that the Z1-axis driving unit, the Z1-axis transmission unit, the Z1-axis guiding unit, the Z2-axis driving unit, the Z2-axis transmission unit, the Z2-axis guiding unit and other component parts are integrated, the rigidity and stability of the whole structure of the two-stage lifting device are improved.

Description

Technical Field

[0001] The invention relates to the technical field of semiconductor processing equipment, and in particular to a two-stage lifting and rotating device for wafer transportation. Background Art

[0002] With the development of society and the advancement of science and technology, robots have been widely used in production, and they replace or assist humans in completing various tasks in production activities. In the semiconductor processing technology industry, robots are widely used in the transportation of wafers. Since semiconductor processing equipment often has a small internal space, the smaller the size of the robot in the industry, the better, while ensuring its functionality.

[0003] At present, traditional wafer handling robot equipment is usually in the form of a one-stage lift. In addition to the height space occupied by the rotating axis and telescopic axis required for wafer handling, the robot's lifting height is difficult to exceed the height of the robot body. If you want to increase the robot's lifting stroke, you often need to increase the body height by the same or even greater than the lifting stroke, which is unacceptable for semiconductor equipment that requires to be as compact as possible. At the same time, the existing two-stage lifting form has poor structural rigidity, which limits the load capacity of the wafer handling robot equipment, resulting in the performance of other motion axes assembled on it being limited.

[0004] In addition, the single-stage lift has a small operating space and low flexibility, which limits the robot's ability to cope with different working conditions. If the single-stage lift wants to increase the stroke, it can only be achieved by continuously increasing the corresponding components. On the one hand, it will definitely increase the cost of the equipment. On the other hand, this will often introduce many unexpected problems, which will make it difficult to ensure the reliability of the product.

[0005] Even though the existing wafer handling robot equipment adopts a two-stage lifting form, the various components are installed and set separately, and the guide rail layout of the wafer handling equipment has not been optimized and upgraded, so that the structural rigidity of the existing wafer handling robot equipment is poor and the stability is also affected to a certain extent.

[0006] Moreover, the existing wafer handling robot equipment has a poor ability to withstand loads in non-moving directions. In addition, when performing rotational motion, the cables have a greater impact on the rotational motion. In some high-speed situations, the cables are easily damaged due to rapid torsion and friction. Summary of the invention

[0007] The purpose of the present invention is to propose a two-stage lifting and rotating device for wafer transportation that can achieve large-stroke lifting in a limited height space, and by optimizing the guide rail layout, improve the rigidity and stability of the overall structure, and adopt an independent drive source to improve the applicability of the equipment under different working conditions.

[0008] To achieve the above object, the present invention proposes a two-stage lifting and rotating device for wafer transport, the device comprising:

[0009] A base, wherein the base includes a Z1-axis driving unit, a Z1-axis transmission unit and a Z1-axis guiding unit;

[0010] A Z1 lifting seat, which is sleeved in the base and performs linear lifting motion on the base. A Z2 axis driving unit, a Z2 axis transmission unit and a Z2 axis guide unit are arranged in the Z1 lifting seat;

[0011] The rotating motion seat is a cylindrical hollow structure, which is sleeved in the Z1 lifting seat and performs lifting and rotating motion on the Z1 lifting seat.

[0012] In this specific embodiment, the height of the Z1 lifting seat is greater than or equal to the base, and the height of the rotating seat is greater than or equal to the Z1 lifting seat. The Z1 lifting seat and the rotating seat can be lifted separately or simultaneously.

[0013] In this specific embodiment, the Z1-axis driving unit is a servo motor, which provides power as a power source to drive the Z1-axis transmission unit to move; the Z2-axis driving unit is a servo motor, which provides power as a power source to drive the Z2-axis transmission unit to move.

[0014] In this specific embodiment, the base includes a first base, which is provided with a plurality of first grooves for clamping the Z1-axis drive unit, the Z1-axis transmission unit and the Z1-axis guide unit. A base top plate is provided on the top of the base, and a first entrance and exit hole is provided on the upper surface of the base top plate for the Z1 lifting base to perform a linear lifting motion in the base. A base baffle is provided around the base.

[0015] In this specific embodiment, the Z1-axis transmission unit includes a Z1-axis synchronous pulley assembly and a Z1-axis ball screw, the Z1-axis synchronous pulley assembly includes a Z1-axis synchronous output wheel, a Z1-axis synchronous input wheel and a Z1-axis synchronous belt, the Z1-axis synchronous output wheel and the Z1-axis ball screw are located at the same end, the Z1-axis synchronous output wheel and the Z1-axis synchronous belt are located in the first groove at the same end, and the Z1-axis synchronous input wheel and the Z1-axis drive unit are located at the same end.

[0016] In this specific embodiment, a Z1-axis ball screw is provided at the center of the Z1-axis synchronous output wheel, a support seat is provided between the Z1-axis ball screw and the Z1-axis synchronous output wheel, the Z1-axis synchronous output wheel is fixedly connected to the Z1-axis ball screw, and can drive the Z1-axis ball screw to rotate relative to the support seat, the screw nut of the Z1-axis ball screw is fixedly connected to the Z1 lifting seat through a first connecting piece, and the Z1 lifting seat is driven to perform lifting motion through the rotation of the Z1-axis ball screw.

[0017] In this specific embodiment, the Z1-axis guiding unit includes at least 4 Z1-axis linear guides, the bottom end of the Z1-axis linear guide is fixed in the first groove of the first base, and the side of the Z1-axis linear guide is also fixed on the Z1-axis guide mounting support, and there are at least 2 Z1-axis guide mounting supports, which are simultaneously located on the inner side of the base baffle, and the Z1-axis linear guides are distributed at any two adjacent sides of the first base, and at least 2 Z1-axis linear guides are provided on each adjacent side, and at least one Z1-axis guide slider is provided on the Z1-axis linear guide, and the Z1-axis guide slider is fixed on the Z1 lifting seat to guide the lifting movement of the Z1 lifting seat.

[0018] In this specific embodiment, the Z1 lifting seat includes a second base, and a plurality of second grooves are provided on the second base for clamping the Z2-axis drive unit, the Z2-axis transmission unit and the Z2-axis guide unit. A Z1 seat top plate is provided on the top of the Z1 lifting seat, and a second access hole is provided on the upper surface of the Z1 seat top plate for the rotating motion seat to perform lifting and rotating motion in the Z1 lifting seat. A Z2-axis guide rail mounting support is also provided on the lower surface of the Z1 seat top plate, and a Z1 seat baffle is provided around the Z1 lifting seat.

[0019] In this specific embodiment, the Z2-axis transmission unit includes a Z2-axis synchronous pulley assembly and a Z2-axis ball screw, the Z2-axis synchronous pulley assembly includes a Z2-axis synchronous output wheel, a Z2-axis synchronous input wheel and a Z2-axis synchronous belt, the Z2-axis synchronous output wheel and the Z2-axis ball screw are located at the same end, the Z2-axis synchronous output wheel and the Z2-axis synchronous belt are simultaneously located in the second groove, the Z2-axis synchronous input wheel and the Z2-axis drive unit are located at the same end, the Z2-axis ball screw is simultaneously fixed to the lower surface of the Z1 seat top plate, and the rotation of the Z2-axis ball screw drives the rotating motion seat to perform lifting and lowering movements.

[0020] In this specific embodiment, the Z2-axis guiding unit includes at least two Z2-axis linear guides, the bottom end of the Z2-axis linear guide is fixed in the second groove of the second base, and the side of the Z2-axis linear guide is also fixed on the Z2-axis guide mounting support. There is at least one Z2-axis guide mounting support, and the Z2-axis guide mounting support is located on the inner side of the Z1 seat baffle at the same time. The Z2-axis linear guides are distributed at any two adjacent edges of the second base, and at least one Z2-axis linear guide is provided on each adjacent edge. At least one Z2-axis guide slider is provided on the Z2-axis linear guide, and the Z2-axis guide slider is fixed on the rotating motion seat to guide the lifting and lowering movement of the rotating motion seat.

[0021] In this specific embodiment, the rotary motion seat includes a rotary shaft driving component, a rotary shaft transmission component, a rotary shaft deceleration component and a rotary shaft output component.

[0022] In this specific embodiment, the rotating shaft driving component is a servo motor, which provides power as a power source to drive the rotating shaft transmission component to move, thereby driving the rotating shaft deceleration component to move. The rotating shaft deceleration component is a hollow harmonic reducer, which outputs rotational motion through the rotating shaft output component, and the rotating shaft driving component is offset at the rotating motion seat.

[0023] The two-stage lifting and rotating device for wafer transport of the present invention has at least the following beneficial effects:

[0024] 1. The device realizes a two-stage lifting mode by installing the Z1 lifting seat sleeve in the base and the rotating seat sleeve in the Z1 lifting seat. It can realize large-stroke lifting in a limited height space. The rotating seat is set to realize the rotating motion, which ensures the compact structure and saves the production cost;

[0025] 2. Through the optimized arrangement of the Z1 axis linear guide and the Z2 axis linear guide, and the setting of the first base and the second base, some parts of the assembly are integrated, and the Z2 axis guide rail mounting support is added, the rigidity and stability of the overall structure of the two-stage lifting device are further improved;

[0026] 3. By setting up the Z1 axis drive unit, the Z2 axis drive unit and the rotating axis drive component, the Z1 lifting seat and the rotating motion seat each use an independent drive source, which improves the flexibility and extensiveness of the design. The motion axis and motion speed can be adjusted according to specific needs, thereby improving the applicability of the device under different working conditions. The Z1 lifting seat and the rotating motion seat can also be raised and lowered separately or raised and lowered together;

[0027] 4. By offsetting the rotating shaft drive component and adopting a hollow harmonic reducer, the cables in the rotating motion seat can pass through the inside of the rotating motion seat, reducing the risk of damage to the cables due to rapid torsion and friction. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on the structures shown in these drawings without paying creative work.

[0029] Figure 1 It is a schematic diagram of the overall appearance of the two-stage lifting and rotating device of the present invention;

[0030] Figure 2 It is a schematic diagram of the motion state of the two-stage lifting and rotating device of the present invention after it rises to its position;

[0031] Figure 3It is a schematic diagram of the overall structure of the two-stage lifting and rotating device of the present invention;

[0032] Figure 4 This is a schematic diagram of the explosion of the base structure of the present invention;

[0033] Figure 5 A partial perspective view of the Z1 lifting seat of the present invention;

[0034] Figure 6 It is a cross-sectional view of the two-stage lifting and rotating device of the present invention;

[0035] Figure 7 This is an exploded schematic diagram of the Z1 lifting seat structure of the present invention;

[0036] Figure 8 It is a schematic diagram of the overall structure of the second mounting seat of the present invention;

[0037] Fig. 9 This is a partial structural diagram of the Z1 lifting seat of the present invention;

[0038] Fig.10 This is a schematic diagram of the structure of the Z1 lifting seat part from another angle of the present invention;

[0039] Fig.11 It is a top view of the internal layout of the two-stage lifting and rotating device of the present invention;

[0040] Fig.12 It is a schematic diagram of the overall structure of the rotary motion seat of the present invention.

[0041] In the accompanying drawings: 100, base; 101, first base; 102, base top plate; 103, base baffle; 104, first groove; 110, Z1 axis driving component; 120, Z1 axis transmission component; 121, Z1 axis synchronous pulley assembly; 1211, Z1 axis synchronous output wheel; 1212, Z1 axis synchronous belt; 1213, support seat; 1214, first connecting member; 122, Z1 axis ball screw; 130, Z1 axis guide component; 131, Z1 axis linear guide; 1311, Z1 axis guide mounting support; 132, Z1 axis guide slider; 200, Z1 lifting seat; 201, second base; 202, Z1 seat top plate; 2021, Z2 axis guide rail mounting support; 203, Z1 seat baffle; 204, second groove; 210, Z2 axis driving component; 220, Z2 axis transmission component; 221, Z2 axis synchronous pulley assembly; 2211, Z2 axis synchronous output wheel; 2212, Z2 axis synchronous belt; 222, Z2 axis ball screw; 230, Z2 axis guide component; 231, Z2 axis linear guide; 232, Z2 axis guide rail slider; 300, rotary motion seat; 310, rotary axis driving component; 320, rotary axis transmission component; 330, rotary axis deceleration component; 340, rotary axis output component.

[0042] The realization of the purpose, functional features and advantages of the present invention will be further explained in conjunction with embodiments and with reference to the accompanying drawings. DETAILED DESCRIPTION

[0043] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0044] In the above description of this specification, unless otherwise clearly specified and limited, the terms "fixed", "installed", "connected" or "connected" should be understood in a broad sense. For example, with regard to the term "connection", it can be a fixed connection, a detachable connection, or an integral one; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be the internal connection of two elements or the interaction relationship between two elements. Therefore, unless otherwise clearly defined in this specification, those skilled in the art can understand the specific meanings of the above terms in the present invention according to the specific circumstances.

[0045] According to the above description of this specification, those skilled in the art may also understand that the terms used below, such as "up", "down", "front", "back", "left", "right", "length", "width", "thickness", "vertical", "horizontal", "top", "bottom", "inside", etc., which indicate the orientation or position relationship, are based on the orientation or position relationship shown in the drawings of this specification, and are only for the purpose of facilitating the explanation of the scheme of the present invention and simplifying the description, rather than explicitly or implicitly indicating that the device or element involved must have the specific orientation, be constructed and operate in a specific orientation. Therefore, the above-mentioned orientation or position relationship terms cannot be understood or interpreted as limitations on the scheme of the present invention.

[0046] In addition, if there are descriptions involving "first", "second", etc. in the embodiments of the present invention, the descriptions of "first", "second", etc. are only used for descriptive purposes and cannot be understood as indicating or suggesting their relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include at least one of the features. In addition, the technical solutions between the various embodiments can be combined with each other, but they must be based on the ability of ordinary technicians in the field to implement them. When the combination of technical solutions is contradictory or cannot be implemented, it should be deemed that such a combination of technical solutions does not exist and is not within the scope of protection required by the present invention.

[0047] Embodiment 1:

[0048] See also Figure 1-2 A two-stage lifting and rotating device for wafer transport includes a base 100 at the bottom, including a first base 101, a plurality of first grooves 104 are provided on the first base 101, a base top plate 102 is provided on the top of the base 100, and a first access hole (not shown) is provided on the upper surface of the base top plate 102 for the Z1 lifting base 200 to perform a linear lifting movement in the base 100. A base baffle 103 is provided around the base 100. The base baffle 103 has a certain sealing effect on the base 100, firstly, it can prevent the base 100 from entering powder dust, and secondly, it can prevent the base 100 from causing adverse effects on the components in the base 100 due to collision.

[0049] See also Figure 3 to Figure 5 Furthermore, a Z1-axis driving unit 110, a Z1-axis transmission unit 120 and a Z1-axis guiding unit 130 are provided in the base 100. The Z1-axis driving unit 110, the Z1-axis transmission unit 120 and the Z1-axis guiding unit 130 are clamped in the first groove 104 on the first base 101. The stability of the base 100 is improved by providing the first base 101, and the Z1-axis driving unit 110, the Z1-axis transmission unit 120 and the Z1-axis guiding unit 130 are prevented from moving in the base 100, causing shaking of the base 100, thereby affecting the overall operation of the device. By providing the first groove 104, the Z1-axis driving unit 110, the Z1-axis transmission unit 120 and the Z1-axis guiding unit 130 can be sunk, the height can be reduced, and the space of the device can be further saved, making its structure more compact. Specifically, the Z1-axis driving unit 110 is a servo motor, which provides power as a power source to drive the Z1-axis transmission unit 120 to move. The Z1-axis transmission unit 120 transmits the power generated by the Z1-axis driving unit 110 and converts it into a force of appropriate size and direction to drive the Z1 lifting seat 200 to perform a reciprocating linear lifting motion up and down.

[0050] Further, the Z1-axis transmission unit 120 includes a Z1-axis synchronous pulley assembly 121 and a Z1-axis ball screw 122. Specifically, the Z1-axis synchronous pulley assembly 121 includes a Z1-axis synchronous output wheel 1211, a Z1-axis synchronous input wheel and a Z1-axis synchronous belt 1212, the Z1-axis synchronous output wheel and the Z1-axis ball screw are located at the same end, the Z1-axis synchronous output wheel 1211 and the Z1-axis synchronous belt 1212 are simultaneously located in the first groove 104 on the first base 101, the Z1-axis synchronous input wheel and the Z1-axis drive unit 110 are located at the same end, and the Z1-axis synchronous input wheel is installed on the output shaft of the Z1-axis drive unit 110.

[0051] Furthermore, a Z1-axis ball screw 122 is provided at the center of the Z1-axis synchronous output wheel 1211, and a support seat 1213 is provided between the Z1-axis ball screw 122 and the Z1-axis synchronous output wheel 1211. The Z1-axis synchronous output wheel 1211 is fixedly connected to the Z1-axis ball screw 122, and can drive the Z1-axis ball screw 122 to rotate relative to the support seat 1213. The screw nut of the Z1-axis ball screw 122 is fixedly connected to the Z1 lifting seat 200 through the first connecting member 1214, and the Z1 lifting seat 200 is driven to perform lifting and lowering motions through the rotation of the Z1-axis ball screw 122. Specifically, by providing the support seat 1213 at the bottom end of the Z1-axis ball screw 122, the stability of the Z1-axis ball screw 122 can be enhanced, and the Z1-axis ball screw 122 can be prevented from shaking under the operation of various components. The screw nut of the Z1-axis ball screw 122 is fixedly connected to the Z1 lifting seat 200 through the first connecting member 1214, and the Z1 lifting seat 200 is driven to move up and down by the rotation of the Z1-axis ball screw 122. The first connecting member 1214 is also fixedly connected to the Z1 seat baffle 203 around the Z1 lifting seat 200. The first connecting member 1214 moves up and down on the Z1-axis ball screw 122, thereby driving the Z1 lifting seat 200 to move up and down in the base 100.

[0052] At the same time, in order to ensure the accuracy of the linear motion of the Z1 lifting seat 200 and the stability of the entire device, the Z1 axis guide unit 130 includes at least 4 Z1 axis linear guide rails 131. Of course, the number of Z1 axis linear guide rails 131 can also be increased or decreased according to the actual needs. Specifically, the bottom end of the Z1 axis linear guide rail 131 is fixed in the first groove 104 of the first base 101, and the side of the Z1 axis linear guide rail 131 is also fixed on the Z1 axis guide rail mounting support 1311. There are at least two Z1 axis guide rail mounting supports 1311, and the Z1 axis guide rail mounting supports 1311 are located on the inner side of the base baffle 103 at the same time. The Z1 axis linear guide rails 131 are distributed at any two adjacent sides of the first base 101, and at least two Z1 axis linear guide rails 131 are provided on each adjacent side. At least one Z1 axis guide slider 132 is provided on each Z1 axis linear guide 131, wherein the Z1 axis guide slider 132 is fixed on the second base 201, guiding the Z1 lifting seat 200 to perform linear lifting motion, and can also support the entire Z1 lifting seat 200, thereby ensuring the accuracy of linear motion and being able to withstand the load brought by the non-movement direction. By arranging two sets of Z1 axis linear guides 131, the rigidity of the structure of the device can be effectively improved, thereby improving the load capacity and balance stability of the device. Of course, multiple sets of Z1 axis linear guides 131 can be added according to the actual needs, including but not limited to two sets of Z1 axis linear guides 131.

[0053] See also Figure 6 and Figure 7 Furthermore, the Z1 lifting seat is sleeved in the base 100, and performs a linear lifting motion on the base 100 through the first access hole on the base 100. Specifically, the height of the Z1 lifting seat 200 can be extended and retracted at will, and can extend to a height greater than the base top plate 102 of the base 100, or can be retracted to a height equal to the base top plate 102.

[0054] Furthermore, the Z1 lifting seat 200 includes a second base 201, a plurality of second grooves 204 are provided on the second base 201, a Z1 seat top plate 202 is provided on the top of the Z1 lifting seat 200, a second access hole is provided on the upper surface of the Z1 seat top plate 202, and the rotating seat 300 is used to perform lifting and rotating movements in the Z1 lifting seat 200, a Z2 axis guide rail mounting support 2021 is also provided on the lower surface of the Z1 seat top plate 202, and a Z1 seat baffle 203 is provided around the Z1 lifting seat 200. The Z1 seat baffle 203 has a certain sealing effect on the Z1 lifting seat 200, firstly, it can prevent the Z1 lifting seat 200 from entering powder and dust, secondly, it can prevent the Z1 lifting seat 200 from causing adverse effects on the components in the Z1 lifting seat 200 due to collision, and thirdly, the Z1 axis guide rail slider 132 is fixed on the outer surface of the Z1 seat baffle 203, driving the Z1 lifting seat 200 to move up and down.

[0055] See also Figure 8 , further, the Z1 lifting seat 200 is provided with a Z2-axis driving unit 210, a Z2-axis transmission unit 220 and a Z2-axis guiding unit 230. Specifically, the Z2-axis driving unit 210, the Z2-axis transmission unit 220 and the Z2-axis guiding unit 230 are clamped in the second groove 204 on the second base 201. By setting the second base 201, the stability of the connection between the Z1 lifting seat 200 and the base 100 is improved, and the Z2-axis driving unit 210, the Z2-axis transmission unit 220 and the Z2-axis guiding unit 230 are prevented from moving in the Z1 lifting seat 200, thereby improving the overall load capacity and stability of the device. By setting the second groove 204, the Z2-axis driving unit 210, the Z2-axis transmission unit 220 and the Z2-axis guiding unit 230 can be sunk, the height can be reduced, the space of the device can be further saved, and the structure can be more compact. Specifically, the Z2-axis driving unit 210 is a servo motor, which provides power as a power source to drive the Z2-axis transmission unit 220 to move. The Z2-axis transmission unit 220 transmits the power generated by the Z2-axis driving unit 210 and converts it into a force with a suitable size and direction to drive the rotary motion base 300 to perform a reciprocating lifting motion up and down.

[0056] See also Figures 9 to 11Further, the Z2-axis transmission unit 220 includes a Z2-axis synchronous pulley assembly 221 and a Z2-axis ball screw 222, the Z2-axis synchronous pulley assembly 221 includes a Z2-axis synchronous output wheel 2211, a Z2-axis synchronous input wheel and a Z2-axis synchronous belt 2212, the Z2-axis synchronous output wheel 2211 and the Z2-axis ball screw 222 are located at the same end, the Z2-axis synchronous output wheel 2211 and the Z2-axis synchronous belt 2212 are simultaneously located in the second groove 204 of the second base 201, the Z2-axis synchronous input wheel and the Z2-axis drive unit 210 are located at the same end, which plays a certain limiting role on the Z2-axis synchronous output wheel 2211 and the Z2-axis synchronous belt 2212. The Z2-axis ball screw 222 is fixed to the lower surface of the Z1 seat top plate 202 at the same time. The Z2-axis ball screw 222 is fixedly connected to the rotating seat 300 via a second connecting piece (not shown), and the rotation of the Z2-axis ball screw 222 drives the rotating seat 300 to perform lifting and lowering movements.

[0057] See also Figure 8 Furthermore, in order to ensure the accuracy of the linear motion of the rotary motion seat 300 and the stability of the entire device, the Z2-axis guide unit 230 includes at least two Z2-axis linear guide rails 231. Of course, the number of Z2-axis linear guide rails 231 can also be increased or decreased according to the actual needs. Specifically, the bottom end of the Z2-axis linear guide rail 231 is fixed in the second groove 204 of the second base 201, and the Z2-axis linear guide rails 231 are distributed at any two adjacent sides of the second base 201, and each adjacent side is provided with at least one Z2-axis linear guide rail 231. The Z2-axis linear guide rail 131 is provided with at least one Z2-axis guide slider 232. The Z2-axis guide slider 232 is fixed on the rotary motion seat 300, guides the lifting and lowering motion of the rotary motion seat 300 and plays a certain supporting role on the rotary motion seat 300, ensuring the accuracy of the linear motion and being able to withstand the load brought by the non-movement direction. By arranging two sets of Z2 axis linear guide rails 231, the rigidity of the device structure can be effectively improved, thereby improving the load capacity and balance stability of the device. Of course, multiple sets of Z2 axis linear guide rails 231 can be added according to the actual needs, including but not limited to two sets of 21 axis linear guide rails 231.

[0058] See also Fig.12 Furthermore, the device further includes a rotary motion seat 300, which is a cylindrical hollow structure, and is sleeved in the Z1 lifting seat 200, and performs lifting and rotating motion on the Z1 lifting seat 200. Specifically, the rotary motion seat 300 performs a linear lifting motion on the Z1 lifting seat 200 through the second access hole on the Z1 lifting seat 200. Specifically, the height of the rotary motion seat 300 can be freely extended and retracted, and can be extended to a height greater than the Z1 lifting seat 200, or can be retracted to a height equal to the Z1 lifting seat 200.

[0059] Furthermore, the rotary motion seat 300 includes a rotary shaft driving component 310, a rotary shaft transmission component 320, a rotary shaft reduction component 330, and a rotary shaft output component 340. Specifically, the rotary shaft driving component 310 is a servo motor, which provides power as a power source to drive the rotary shaft transmission component 320 to move, thereby driving the rotary shaft reduction component 330 to move, and the rotary shaft reduction component 330 is a hollow harmonic reducer, which outputs rotary motion through the rotary shaft output component 340.

[0060] Furthermore, the rotating shaft driving component 310 is offset from the rotating motion seat 300, so that the cables in the rotating motion seat can pass through the inside of the rotating motion seat, reducing the risk of damage to the cables due to rapid torsion and friction.

[0061] Please refer to Figure 2 Specifically, since the Z1 lifting seat 200 is sleeved in the base 100, it can move up and down relative to the base 100, and the rotating seat 300 is sleeved in the Z1 lifting seat 200, it can move up and down relative to the Z1 lifting seat 200, thereby realizing a two-stage lifting mode, and the lifting to the highest point is as follows. Figure 2 As shown; at the same time, the rotary motion seat 300 is mainly a rotary motion related component, which can assist the device to achieve rotary motion.

[0062] Embodiment 2:

[0063] On the basis of Example 1, in this embodiment, a Z1-axis driving unit 110 and a Z1-axis guiding unit 130 are provided in the base 100. The Z1-axis driving unit 110 and the Z1-axis guiding unit 130 are clamped in the first groove 104 on the first base 101, which improves the stability of the base 100 and prevents the Z1-axis driving unit 110 and the Z1-axis guiding unit 130 from moving in the base 100, causing shaking of the base 100, thereby affecting the overall operation of the device. Specifically, the Z1-axis driving unit 110 is a linear motor, which is used as a power source to provide power, so that some transmission components can be omitted, thereby reducing the overall structure volume, and converting it into a force of appropriate size and direction to drive the Z1 lifting seat 200 to perform a reciprocating linear lifting movement up and down. At the same time, the Z1-axis guiding component 130 adopts a linear bearing plus a guide rod, which is suitable for bearing axial loads and torques, and can improve the axial bearing capacity of the device, thereby ensuring stable movement and transmitting precise torque. Of course, in actual production, the Z1-axis driving unit 110 includes but is not limited to a linear motor.

[0064] At the same time, in order to ensure the accuracy of the linear motion of the Z1 lifting seat 200 and the stability of the entire device, the Z1 axis guide unit 130 includes at least 4 Z1 axis linear guide rails 131. Of course, the number of Z1 axis linear guide rails 131 can also be increased or decreased according to the actual needs. Specifically, the bottom end of the Z1 axis linear guide rail 131 is fixed in the first groove 104 of the first base 101, and the Z1 axis linear guide rails 131 are distributed at any two adjacent sides of the first base 101, and at least two Z1 axis linear guide rails 131 are provided on each adjacent side. At least one Z1 axis guide rail slider 132 is provided on each Z1 axis linear guide rail 131, wherein the Z1 axis guide rail slider 132 is fixed on the second base 201, guiding the Z1 lifting seat 200 to perform linear lifting motion, and can also support the entire Z1 lifting seat 200, ensuring the accuracy of linear motion, and being able to withstand the load brought by the non-movement direction. By arranging two sets of Z1 axis linear guide rails 131, the rigidity of the device structure can be effectively improved, thereby improving the load capacity and balance stability of the device. Of course, multiple sets of Z1 axis linear guide rails 131 can be added according to actual needs, including but not limited to two sets of Z1 axis linear guide rails 131.

[0065] The Z1 lifting seat 200 is provided with a Z2 axis driving unit 210 and a Z2 axis guiding unit 230. Specifically, the Z2 axis driving unit 210 and the Z2 axis guiding unit 230 are clamped in the second groove 204 on the second base 201, which improves the stability of the connection between the Z1 lifting seat 200 and the base 100, and prevents the Z2 axis driving unit 210 and the Z2 axis guiding unit 230 from moving in the Z1 lifting seat 200, thereby improving the overall load capacity and stability of the device. Specifically, the Z2 axis driving unit 210 is a linear motor, which is used as a power source to provide power, so that some transmission components can be omitted, thereby reducing the overall structure volume, and converting it into a force of appropriate size and direction to drive the rotary motion seat 300 to perform a linear lifting motion reciprocating up and down. At the same time, the Z2 axis guiding component 230 adopts a linear bearing plus a guide rod, which is suitable for bearing axial loads and torques, and can improve the axial load-bearing capacity of the device, thereby ensuring stable movement and transmitting precise torque. Of course, in actual production, the Z2-axis driving unit 210 includes but is not limited to a linear motor, and the Z2-axis guiding component 230 is not limited to a linear bearing plus a guide rod.

[0066] Furthermore, in order to ensure the accuracy of the linear motion of the rotating motion seat 300 and the stability of the entire device, the Z2-axis guide unit 230 includes at least 2 Z2-axis linear guide rails 231. Of course, the number of Z2-axis linear guide rails 231 can be increased or decreased according to actual needs. Specifically, the bottom end of the Z2-axis linear guide 231 is fixed in the second groove 204 of the second base 201, and the side of the Z2-axis linear guide 231 is also fixed on the Z2-axis guide mounting support 2021. The Z2-axis guide mounting support 2021 is provided with at least one. The Z2-axis guide mounting support 2021 is also located on the inner side of the Z1 seat baffle 203, and the Z2-axis linear guide 231 is distributed at any two adjacent edges of the second base 201. Each adjacent edge is provided with at least one Z2-axis linear guide 231. The Z2-axis linear guide 131 is provided with at least one Z2-axis guide slider 232. The Z2-axis guide slider 232 is fixed on the rotating motion seat 300 to guide the lifting and lowering movement of the rotating motion seat 300 and provide a certain supporting effect on the rotating motion seat 300, thereby ensuring the accuracy of the linear motion and being able to withstand the load brought by the non-movement direction. By arranging two sets of Z2 axis linear guide rails 231, the rigidity of the device structure can be effectively improved, thereby improving the load capacity and balance stability of the device. Of course, multiple sets of Z2 axis linear guide rails 231 can be added according to the actual needs, including but not limited to two sets of 21 axis linear guide rails 231.

[0067] Of course, the embodiment 1 can also be combined with the embodiment 2 according to the actual needs, such as: the Z1 axis driving unit 110 and the Z2 axis driving unit 210 still use the servo motor in the embodiment 1 as a power source to provide power, and the Z1 axis guiding unit 130 and the Z2 axis guiding unit 230 use a linear bearing plus a guide rod. Alternatively, the Z1 axis driving unit 110 and the Z2 axis driving unit 210 can use the linear motor in the embodiment 2 as a power source to provide power, and the Z1 axis guiding unit 130 and the Z2 axis guiding unit 230 still use a linear guide.

[0068] The above description is only a preferred embodiment of the present invention, and does not limit the patent scope of the present invention. All equivalent structural changes made by using the contents of the present invention specification and drawings under the inventive concept of the present invention, or directly / indirectly applied in other related technical fields are included in the patent protection scope of the present invention.

Claims

1. A two-stage lifting and rotating device for wafer transport, characterized in that: The device comprises: A base (100), wherein the base includes a Z1-axis driving unit (110), a Z1-axis transmission unit (120) and a Z1-axis guiding unit (130); A Z1 lifting seat (200), the Z1 lifting seat (200) being sleeved in the base (100) and performing a linear lifting motion on the base (100), wherein a Z2 axis driving unit (210), a Z2 axis transmission unit (220) and a Z2 axis guiding unit (230) are arranged in the Z1 lifting seat (200); The rotary motion seat (300) is a cylindrical hollow structure, which is sleeved in the Z1 lifting seat (200) and performs lifting and rotating motion on the Z1 lifting seat (200).

2. The two-stage lifting and rotating device for wafer transport according to claim 1 is characterized in that: The height of the Z1 lifting seat (200) is greater than or equal to the base (100), and the height of the rotating seat (300) is greater than or equal to the Z1 lifting seat (200). The Z1 lifting seat (200) and the rotating seat (300) can be lifted or lowered separately or simultaneously.

3. The two-stage lifting and rotating device for wafer transport according to claim 1 is characterized in that: The Z1-axis driving unit (110) is a servo motor, which serves as a power source to provide power and drive the Z1-axis transmission unit (120) to move; the Z2-axis driving unit (210) is a servo motor, which serves as a power source to provide power and drive the Z2-axis transmission unit (220) to move.

4. The two-stage lifting and rotating device for wafer transport according to claim 1, characterized in that: The base (100) comprises a first base (101), the first base (101) is provided with a plurality of first grooves (104) for clamping the Z1-axis driving unit (110), the Z1-axis transmission unit (120) and the Z1-axis guiding unit (130), the top of the base (100) is provided with a base top plate (102), the upper surface of the base top plate (102) is provided with a first access hole for the Z1 lifting base (200) to perform a linear lifting motion in the base (100), and base baffles (103) are provided around the base (100).

5. The two-stage lifting and rotating device for wafer transport according to claim 4 is characterized in that: The Z1-axis transmission unit (120) comprises a Z1-axis synchronous pulley assembly (121) and a Z1-axis ball screw (122); the Z1-axis synchronous pulley assembly (121) comprises a Z1-axis synchronous output wheel (1211), a Z1-axis synchronous input wheel (not shown) and a Z1-axis synchronous belt (1212); the Z1-axis synchronous output wheel (1211) and the Z1-axis ball screw (122) are located at the same end; the Z1-axis synchronous output wheel (1211) and the Z1-axis synchronous belt (1212) are simultaneously located in the first groove (104); and the Z1-axis synchronous input wheel and the Z1-axis driving unit (110) are located at the same end.

6. The two-stage lifting and rotating device for wafer transport according to claim 5, characterized in that: The Z1-axis ball screw (122) is arranged at the center of the Z1-axis synchronous output wheel (1211), and a support seat (1213) is arranged between the Z1-axis ball screw (122) and the Z1-axis synchronous output wheel (1211). The Z1-axis synchronous output wheel (1211) is fixedly connected to the Z1-axis ball screw (122) and can drive the Z1-axis ball screw (122) to perform rotational movement relative to the support seat (1213). The screw nut of the Z1-axis ball screw (122) is fixedly connected to the Z1 lifting seat (200) via a first connecting member (1214), and the Z1 lifting seat (200) is driven to perform lifting movement by the rotation of the Z1-axis ball screw (122).

7. The two-stage lifting and rotating device for wafer transport according to claim 4, characterized in that: The Z1-axis guide unit (130) comprises at least four Z1-axis linear guide rails (131), the bottom ends of the Z1-axis linear guide rails (131) are fixed in the first groove (104) of the first base (101), and the side surfaces of the Z1-axis linear guide rails (131) are simultaneously fixed on the Z1-axis guide rail mounting support (1311), and the Z1-axis guide rail mounting support (1311) is provided with at least two Z1-axis guide rail mounting supports (1311). On the inner side of the base baffle (103), the Z1-axis linear guide rail (131) is distributed at any two adjacent sides of the first base (101), at least two Z1-axis linear guide rails (131) are provided on each adjacent side, at least one Z1-axis guide rail slider (132) is provided on the Z1-axis linear guide rail (131), and the Z1-axis guide rail slider (132) is fixed on the Z1 lifting seat (200) to guide the lifting movement of the Z1 lifting seat (200).

8. The two-stage lifting and rotating device for wafer transport according to claim 1, characterized in that: The Z1 lifting seat (200) comprises a second base (201), the second base (201) is provided with a plurality of second grooves (204) for clamping the Z2 axis driving unit (210), the Z2 axis transmission unit (220) and the Z2 axis guide unit (230), the top of the Z1 lifting seat (200) is provided with a Z1 seat top plate (202), the upper surface of the Z1 seat top plate (202) is provided with a second entrance and exit hole for the rotating motion seat (300) to perform lifting and rotating motion in the Z1 lifting seat (200), the lower surface of the Z1 seat top plate (202) is also provided with a Z2 axis guide rail mounting support (2021), and the Z1 lifting seat (200) is provided with a Z1 seat baffle (203) around it.

9. The two-stage lifting and rotating device for wafer transport according to claim 8, characterized in that: The Z2-axis transmission unit (220) comprises a Z2-axis synchronous pulley assembly (221) and a Z2-axis ball screw (222); the Z2-axis synchronous pulley assembly (221) comprises a Z2-axis synchronous output wheel (2211), a Z2-axis synchronous input wheel (not shown) and a Z2-axis synchronous belt (2212); the Z2-axis synchronous output wheel (2211) and the Z2-axis ball screw (222) are located at the same end; the Z2-axis synchronous output wheel (2211) and the Z2-axis synchronous belt (2212) are simultaneously located in the second groove (204); the Z2-axis synchronous input wheel and the Z2-axis driving unit (210) are simultaneously located at the same end; the Z2-axis ball screw (222) is simultaneously fixed to the lower surface of the Z1 seat top plate (202); and the rotation of the Z2-axis ball screw (222) drives the rotary motion seat (300) to perform lifting motion.

10. The two-stage lifting and rotating device for wafer transport according to claim 8, characterized in that: The Z2-axis guide unit (230) comprises at least two Z2-axis linear guide rails (231), the bottom ends of the Z2-axis linear guide rails (231) are fixed in the second groove (204) of the second base (201), and the side surfaces of the Z2-axis linear guide rails (231) are simultaneously fixed on the Z2-axis guide rail mounting support (2021), and the Z2-axis guide rail mounting support (2021) is provided with at least one Z2-axis guide rail mounting support (2021). On the inner side of the Z1 seat baffle (203), the Z2 axis linear guide rail (231) is distributed at any two adjacent sides of the second base (201), and at least one Z2 axis linear guide rail (231) is provided on each adjacent side. The Z2 axis linear guide rail (131) is provided with at least one Z2 axis guide rail slider (232), and the Z2 axis guide rail slider (232) is fixed on the rotating motion seat (300) to guide the lifting and lowering movement of the rotating motion seat (300).

11. The two-stage lifting and rotating device for wafer transport according to claim 1, characterized in that: The rotary motion seat (300) comprises a rotary shaft driving component (310), a rotary shaft transmission component (320), a rotary shaft deceleration component (330) and a rotary shaft output component (340).

12. The two-stage lifting and rotating device for wafer transport according to claim 11, characterized in that: The rotating shaft driving component (310) is a servo motor, which provides power as a power source to drive the rotating shaft transmission component (320) to move, thereby driving the rotating shaft deceleration component (330) to move. The rotating shaft deceleration component (330) is a hollow harmonic reducer, which outputs the rotating motion through the rotating shaft output component (340). The rotating shaft driving component (310) is offset from the rotating motion seat (300).

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