Chip layout splicing method and device, equipment and storage medium

By calculating a single pixel dot size and the memory size of the image processor, combined with the preset redundant pixel range, accurately calculate the mask optimization size and redundant size of the sub -landscape, solve the accurate splicing range in the existing technology The problem of poor sexuality achieves high accuracy sub -layout stitching.

CN119376174AActive Publication Date: 2025-01-28SHENZHEN JINGYUAN INFORMATION TECH CO LTD

Patent Information

Application Number
CN202411384567.3
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-09-29
Publication Date
2025-01-28
Estimated Expiration
2044-09-29

AI Technical Summary

Technical Problem

The prior art cannot quantify the splicing range of the sub-layer map, resulting in poor accuracy of the splicing range.

Method used

By obtaining a single pixel dot size of the chip layout, and accurately calculating the mask optimization size and redundant size of the sub -landscape according to the memory size of the image processor and the preset redundant pixel range, thereby determining the splicing range.

Benefits of technology

The quantitative calculation of the splicing range of the sub -territory is implemented, and the accuracy of the splicing range is improved.

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Patent Text Reader

Abstract

The invention discloses a splicing method, device and equipment of a chip layout and a storage medium, and relates to the technical field of photoetching simulation, and the splicing method of the chip layout comprises the following steps: obtaining the size of a single pixel point of the chip layout; according to the size of a single pixel point and the memory size of an image processor, the mask optimization size of each sub-layout is determined, and the sub-layouts are a plurality of local layouts obtained by cutting the chip layout; determining the redundancy size of each sub-layout according to the size of a single pixel point and a preset redundancy pixel point range of the sub-layouts; and determining a splicing range when the sub-layouts are spliced into the chip layout according to the mask optimization size and the redundancy size. According to the splicing method of the chip layout provided by the embodiment of the invention, the accuracy of the splicing range of the sub-layouts can be improved.
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Description

Technical Field

[0001] The present application belongs to the field of photolithography simulation technology, and in particular, relates to a chip layout splicing method, device, equipment and storage medium. Background Art

[0002] In order to overcome the distortion of mask imaging caused by the optical proximity effect, it is necessary to use mask optimization technology to optimize the mask pattern. In the mask optimization process, the original layout needs to be cut, and then the cut sub-layouts are processed in parallel, and then spliced ​​together to obtain the optimized mask pattern.

[0003] In the existing method, different attempts are mainly made on the splicing range of the sub-layouts to obtain the most accurate splicing range of the sub-layouts.

[0004] However, this method cannot quantitatively calculate the stitching range of the sub-layout, resulting in poor accuracy of the stitching range. Summary of the invention

[0005] The embodiments of the present application provide a chip layout splicing method, device, equipment and storage medium, which can improve the accuracy of the sub-layout splicing range.

[0006] In one aspect of an embodiment of the present application, a chip layout splicing method is provided, comprising:

[0007] Get the size of a single pixel of the chip layout;

[0008] Determine the optimal mask size of each sub-layout based on the size of a single pixel and the memory size of the image processor. Each sub-layout is a plurality of local layouts obtained by cutting the chip layout.

[0009] Determine the redundant size of each sub-layout according to the size of a single pixel and the preset redundant pixel range of the sub-layout;

[0010] According to the optimized mask size and redundant size, the splicing range of each sub-layout when splicing into the chip layout is determined.

[0011] In one aspect of an embodiment of the present application, a chip layout splicing device is provided, comprising:

[0012] A size acquisition module is used to obtain the size of a single pixel of the chip layout;

[0013] A size calculation module is used to determine the optimal mask size of each sub-layout according to the size of a single pixel and the memory size of the image processor. Each sub-layout is a plurality of local layouts obtained by cutting the chip layout.

[0014] The size calculation module is further used to determine the redundant size of each sub-layout according to the size of a single pixel and the redundant pixel range preset in the sub-layout;

[0015] The range determination module is used to determine the splicing range of each sub-layout when splicing into a chip layout according to the mask optimization size and redundant size.

[0016] According to one aspect of an embodiment of the present application, an electronic device is provided, which includes: a memory and a program or instruction stored in the memory and executable on a processor, wherein when the program or instruction is executed by the processor, a chip layout splicing method as provided in any aspect of the above-mentioned embodiment of the present application is implemented.

[0017] In one aspect of an embodiment of the present application, a readable storage medium is provided, on which a program or instruction is stored. When the program or instruction is executed by a processor, a chip layout splicing method provided in any aspect of the above-mentioned embodiment of the present application is implemented.

[0018] In one aspect of an embodiment of the present application, a computer program product is provided. When instructions in the computer program product are executed by a processor of an electronic device, the electronic device executes a chip layout splicing method as provided in any aspect of the above-mentioned embodiment of the present application.

[0019] In the chip layout splicing method provided in the embodiment of the present application, the mask optimization size of the sub-layout can be accurately calculated according to the single pixel size of the chip layout and the memory size of the image processor; at the same time, according to the single pixel size of the chip layout and the preset redundant pixel range, the redundant size of the sub-layout can be accurately calculated. Finally, according to the mask optimization size and the redundant size, the splicing range when the sub-layout is spliced ​​into the chip layout can be determined. In this way, the embodiment of the present application realizes the quantification of the mask optimization size and the redundant size of the sub-layout based on the single pixel size and the corresponding pixel range, so that the splicing range of the sub-layout can be accurately determined according to the mask optimization size and the redundant size, which can improve the accuracy of the splicing range of the sub-layout. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] In order to more clearly illustrate the technical solution of the embodiments of the present application, the following is a brief introduction to the drawings required for use in the embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without any creative work.

[0021] Figure 1 It is a schematic flow chart of a chip layout splicing method provided by an embodiment of the present application;

[0022] Figure 2 It is a schematic diagram of a process of performing mask optimization on a chip layout provided by an embodiment of the present application;

[0023] Figure 3 It is a schematic diagram of the splicing range of the sub-layout provided by an embodiment of the present application;

[0024] Figure 4 It is a structural schematic diagram of a chip layout splicing device provided by an embodiment of the present application;

[0025] Figure 5 It is a structural schematic diagram of a chip layout splicing device provided in one embodiment of the present application. DETAILED DESCRIPTION

[0026] The features and exemplary embodiments of various aspects of the present application will be described in detail below. In order to make the purpose, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described herein are only intended to explain the present application, rather than to limit the present application. For those skilled in the art, the present application can be implemented without the need for some of these specific details. The following description of the embodiments is only to provide a better understanding of the present application by illustrating the examples of the present application.

[0027] It should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the terms "include", "comprise" or any other variants thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the statement "include..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0028] It should be noted that the acquisition, storage, use, and processing of data in the technical solution of this application are in compliance with the relevant provisions of national laws and regulations.

[0029] It should be noted that in the embodiments of the present application, certain software, components, models and other existing solutions in the industry may be mentioned, and they should be regarded as exemplary. Their purpose is only to illustrate the feasibility of implementing the technical solution of the present application, but it does not mean that the applicant has or will necessarily use the solution.

[0030] In the existing method, different attempts are made on the splicing range of the sub-layout to obtain the most accurate splicing range of the sub-layout. However, this method cannot quantitatively calculate the splicing range of the sub-layout, resulting in poor accuracy of the splicing range.

[0031] The purpose of the present application is to provide a chip layout splicing method, device, equipment and storage medium. In the chip layout splicing method provided in the embodiment of the present application, the mask optimization size of the sub-layout can be accurately calculated according to the single pixel size of the chip layout and the memory size of the image processor; at the same time, according to the single pixel size of the chip layout and the preset redundant pixel range, the redundant size of the sub-layout can be accurately calculated. Finally, according to the mask optimization size and the redundant size, the splicing range when the sub-layout is spliced ​​into the chip layout can be determined. In this way, the embodiment of the present application realizes the quantification of the mask optimization size and the redundant size of the sub-layout based on the single pixel size and the corresponding pixel range, so that the splicing range of the sub-layout can be accurately determined according to the mask optimization size and the redundant size, which can improve the accuracy of the splicing range of the sub-layout.

[0032] The following describes the specific embodiments of the chip layout splicing method, device, equipment and storage medium provided by the embodiments of the present application. The following first introduces the chip layout splicing method.

[0033] Figure 1 A schematic flow chart of a chip layout splicing method is provided. The chip layout splicing method can be applied to a server. The chip layout splicing method can include the following S101 to S104.

[0034] S101, obtaining the size of a single pixel of the chip layout.

[0035] In this embodiment, the size of a single pixel point of the chip layout may be preset or calculated.

[0036] S102, determining the optimal mask size of each sub-layout according to the size of a single pixel and the memory size of the image processor, where each sub-layout is a local layout obtained by cutting the chip layout.

[0037] In this embodiment, the maximum sub-layout size that can be processed simultaneously can be determined according to the memory size of the image processor. For example, if the image processor has limited memory, it may be necessary to cut the chip layout into smaller sub-layouts for processing.

[0038] The mask optimization size is used to characterize the size of a single sub-layout for mask optimization. For example, Figure 2As shown, a schematic flow chart of mask optimization of a chip layout is provided. Due to the limitation of hardware resources, the entire chip layout cannot be directly subjected to mask optimization. Therefore, before optimization, the original chip layout 210 needs to be cut to obtain multiple sub-layouts 220. Then, the mask optimization processing is performed in parallel on each of the cut sub-layouts 220 to obtain a mask processing sub-layout 230. Finally, each mask processing sub-layout 230 is spliced ​​together to obtain the final optimized mask processing layout 240.

[0039] As an example, the server matches the resolution of the sub-layout in the chip layout according to the memory size of the image processor, and then multiplies the resolution of the sub-layout by the size of a single pixel to calculate the optimized mask size of the sub-layout.

[0040] S103, determining the redundant size of each sub-layout according to the size of a single pixel and a preset redundant pixel range of the sub-layout.

[0041] In this embodiment, in order to ensure Figure 2 The accuracy of the splicing of the sub-layouts that are finally spliced ​​into the entire chip layout requires that there be enough overlapping areas for accurate alignment and correction during splicing. Therefore, it is usually necessary to set a redundant range at the boundary of the sub-layout processed by the mask optimization, and the size of the redundant range is determined by the redundant size of the sub-layout.

[0042] The redundant pixel range is used to characterize the number of pixels in the redundant range corresponding to each side of the sub-layout.

[0043] As an example, the server presets a redundant pixel range based on the expected stitching accuracy of the sub-layout. Then, the redundant size of the sub-layout is calculated based on the redundant pixel range and the size of a single pixel. For example, assuming that the redundant pixel range is 50 pixels per side and the size of a single pixel is 0.009754 mm, the redundant size is 50*0.009754 mm=0.4877 mm.

[0044] S104, determining a splicing range when each sub-layout is spliced ​​into a chip layout according to the optimized mask size and the redundant size.

[0045] In this embodiment, the server determines the redundant range setting of the sub-layout according to the overall layout of the chip layout and the placement of the sub-layout in the chip layout. Then, with the help of the redundant range setting of the sub-layout, according to the mask optimization size and the redundant size, the splicing range when the sub-layout is spliced ​​into the chip layout is determined.

[0046] For example, when the sub-layout is the edge of the upper left corner of the chip layout, the sub-layout can set a redundant range only on the right and bottom borders, that is, the redundant range only needs to be set on one side in both the horizontal and vertical directions. Then, the size of the redundant range can be calculated based on the redundant size, and the size of the mask optimization range of the sub-layout can be calculated based on the mask optimization size. Finally, the size of the mask optimization range is subtracted from the size of the redundant range to obtain the splicing range when the sub-layout is spliced ​​into the chip layout.

[0047] In the chip layout splicing method provided in this embodiment, the mask optimization size of the sub-layout can be accurately calculated according to the single pixel size of the chip layout and the memory size of the image processor; at the same time, according to the single pixel size of the chip layout and the preset redundant pixel range, the redundant size of the sub-layout can be accurately calculated. Finally, according to the mask optimization size and the redundant size, the splicing range when the sub-layout is spliced ​​into the chip layout can be determined. In this way, the embodiment of the present application realizes the quantification of the mask optimization size and the redundant size of the sub-layout based on the single pixel size and the corresponding pixel range, so that the splicing range of the sub-layout can be accurately determined according to the mask optimization size and the redundant size, which can improve the accuracy of the splicing range of the sub-layout.

[0048] As an optional embodiment, S101 may specifically include:

[0049] Obtain the wavelength of the lithography machine light source and the numerical aperture of the lithography machine projection lens corresponding to the chip layout;

[0050] Calculate the size of a single pixel on the chip layout based on the wavelength and numerical aperture.

[0051] In this embodiment, the wavelength of the lithography machine light source generally depends on the type of light source used, and different types of lithography machines use light sources of different wavelengths. For example, the light source types mainly include ultraviolet light source (UV), deep ultraviolet light source (DUV) and extreme ultraviolet light source (EUV).

[0052] The numerical aperture (NA) usually depends on the model of the lithography machine used. The numerical aperture is an important parameter that describes the light-collecting ability and spatial resolution of the lens. The larger the value, the higher the resolution.

[0053] As an example, the server determines the wavelength of the corresponding light source according to the type of light source used by the lithography machine, and then determines the numerical aperture of the corresponding projection lens according to the lithography machine model. Finally, the wavelength of the light source is divided by the numerical aperture of the projection lens, and then multiplied by the preset adjustment coefficient to obtain the size of a single pixel point of the chip layout.

[0054] For example, assuming that the wavelength of the light source is 134 nm, the numerical aperture of the projection lens is 0.9, and the preset adjustment coefficient is 0.3, the size of a single pixel point of the chip layout is 0.3*134 nm / 0.9=44.67 nm.

[0055] Through this embodiment, the single pixel size of the chip layout is accurately calculated according to the wavelength of the lithography machine light source and the numerical aperture of the lithography machine projection lens corresponding to the chip layout. This helps to calculate the mask optimization size and redundant size according to the single pixel size, realize the quantification of the mask optimization size and redundant size of the sub-layout, and improve the accuracy of the sub-layout splicing range.

[0056] As an optional embodiment, calculating the size of a single pixel point of the chip layout according to the wavelength and the numerical aperture may specifically include:

[0057] Divide the wavelength by the numerical aperture to get the initial size;

[0058] Multiply the initial size by the corresponding preset adjustment coefficient to obtain the size of a single pixel of the chip layout.

[0059] In this embodiment, the size of a single pixel of the chip layout can be specifically determined by the following formula 1:

[0060]

[0061] In the formula, size is used to characterize the size of a single pixel in the chip layout, wavelength is used to characterize the wavelength of the lithography machine light source, NA is used to characterize the numerical aperture of the lithography machine projection lens, and 0.2 is the preset adjustment coefficient.

[0062] The value of the preset adjustment coefficient depends on the difficulty of the photolithography process. The greater the difficulty of the photolithography process, the greater the corresponding preset adjustment coefficient; the smaller the difficulty of the photolithography process, the smaller the corresponding preset adjustment coefficient.

[0063] Among them, the larger the wavelength of the lithography machine's light source, the larger the size of a single pixel in the chip layout; the larger the numerical aperture of the lithography machine's projection objective, the smaller the size of a single pixel in the chip layout.

[0064] Through this embodiment, the single pixel size of the chip layout is accurately calculated according to the wavelength of the lithography machine light source, the numerical aperture of the lithography machine projection lens and the preset adjustment coefficient corresponding to the chip layout. This is helpful for the subsequent calculation of the mask optimization size and redundant size according to the single pixel size, and the quantification of the mask optimization size and redundant size of the sub-layout can be achieved, which can improve the accuracy of the sub-layout splicing range.

[0065] As an optional embodiment, S102 may specifically include:

[0066] According to the memory size of the image processor, determine the mask pixel point range of the chip layout that matches the memory size of the image processor;

[0067] The optimized mask size of each sub-layout is determined based on the size of a single pixel and the range of mask pixels.

[0068] In this embodiment, the mask pixel range is used to characterize the number of pixels in the mask optimization range corresponding to each side of the sub-layout. For example, the chip layout and the sub-layout can both be squares, and the mask optimization size of the sub-layout is the corresponding side length of the sub-layout mask when it is optimized.

[0069] If the memory of the image processor is 16G, the mask optimization range corresponding to the sub-layout is set to a size of 1024 pixels; if the memory of the image processor is 32G, the mask optimization range corresponding to the sub-layout is set to a size of 2048 pixels.

[0070] As an example, when the size of a single pixel is 0.009754mm and the memory of the image processor is 16G, the mask optimization range corresponding to the sub-layout is determined to be 1024 pixels according to the memory size of the image processor, so that the mask optimization size of the sub-layout can be calculated to be 0.009754mm*1024=9.988096mm.

[0071] Through this embodiment, the mask pixel range of the chip layout is determined according to the memory size of the image processor, so that the mask optimization size of the sub-layout can be calculated according to the mask pixel range of the chip layout and the size of a single pixel. In this way, the embodiment of the present application determines the appropriate mask optimization size of the sub-layout according to the memory size of the image processor, avoids the problem of poor sub-layout mask optimization effect caused by unreasonable mask optimization size, and can improve the effect of sub-layout mask optimization.

[0072] As an optional embodiment, the mask pixel range includes the number of first mask pixel points of the chip layout in a first direction and the number of second mask pixel points of the chip layout in a second direction, and the first direction is perpendicular to the second direction;

[0073] The number of pixels of the first mask and the number of pixels of the second mask are both equal to 2 to the power of N.

[0074] In this embodiment, the first direction is perpendicular to the second direction. When the first direction is a horizontal direction, the second direction is a vertical direction; when the first direction is a vertical direction, the second direction is a horizontal direction.

[0075] The mask pixel range includes the first mask pixel number of the chip layout in the first direction and the second mask pixel number of the chip layout in the second direction, that is, the mask pixel range includes the mask pixel number corresponding to the length of the rectangle and the mask pixel number corresponding to the width of the rectangle.

[0076] When the chip layout and the sub-layout are both squares, the length of the rectangle is equal to the width of the rectangle, that is, the number of pixels in the first mask is equal to the number of pixels in the second mask.

[0077] The number of pixels of the first mask and the number of pixels of the second mask are both equal to 2 to the power of N. That is, the number of pixels of the first mask and the number of pixels of the second mask can be 1024, 2048, 3072, etc., which matches the processing size of the image.

[0078] Through this embodiment, according to the number of mask pixels in the first direction and the second direction of the chip layout, the optimized mask size of each side of the sub-layout can be accurately determined. At the same time, the number of first mask pixels and the number of second mask pixels are both set to the Nth power of 2 to match the processing size of the image, thereby facilitating image processing and calculation and improving the efficiency of resource utilization.

[0079] As an optional embodiment, S104 may specifically include:

[0080] Determine the splicing size of the sub-layout according to the optimized mask size and redundant size;

[0081] According to the stitching size, determine the stitching range of each sub-layout when it is stitched into the chip layout.

[0082] In this embodiment, the server determines the redundant range setting of the sub-layout according to the overall layout of the chip layout and the placement of the sub-layout in the chip layout. Then, with the help of the redundant range setting of the sub-layout, according to the mask optimization size and the redundant size, the splicing size when the sub-layout is spliced ​​into the chip layout is determined. Finally, according to the splicing size of the sub-layout, the splicing range when the sub-layout is spliced ​​into the chip layout can be determined.

[0083] For example, when the sub-layout is the upper left edge of the chip layout, the sub-layout can set a redundant range only on the right and bottom boundaries, that is, the redundant range only needs to be set on one side in both the horizontal and vertical directions.

[0084] Then, in the horizontal direction, a redundant size is subtracted from the mask optimization size to obtain the horizontal splicing size; in the vertical direction, a redundant size is subtracted from the mask optimization size to obtain the vertical splicing size.

[0085] Finally, multiply the horizontal stitching size by the vertical stitching size to get the stitching range when the sub-layouts are stitched into the chip layout.

[0086] Through this embodiment, the splicing size of the sub-layout is determined according to the optimized mask size and the redundant size; finally, according to the splicing size of the sub-layout, the splicing range when the sub-layout is spliced ​​into the chip layout can be calculated. In this way, the embodiment of the present application quantifies the splicing size of the sub-layout according to the optimized mask size and the redundant size, thereby improving the accuracy of the splicing range of the sub-layout.

[0087] As an optional embodiment, determining the splicing size of the sub-layout according to the mask optimization size and the redundant size specifically includes:

[0088] Subtract twice the corresponding redundant size from the mask optimization size to obtain the splicing size of the chip layout.

[0089] In this embodiment, in order to ensure the accuracy of the splicing of the sub-layouts and avoid the loss of the sub-layouts, a redundant range can be set at each boundary of the sub-layouts processed by the mask optimization process. That is, no matter where the sub-layout is located in the chip layout, a redundant range is set around it.

[0090] like Figure 3 As shown in the figure, a schematic diagram of the splicing range of a sub-layout is provided. It can be seen that in the sub-layout with mask optimization processing Figure 4 The redundancy range is set for each week. The sub-layout is in the shape of a square, D1 represents the splicing size, D2 represents the mask optimization size, and D3 represents the redundancy size. Therefore, when the server calculates the splicing size D1 of the chip layout, it needs to use the mask optimization size D2 minus twice the corresponding redundancy size D3.

[0091] Through this embodiment, a redundant range is set at each boundary of the sub-layout processed by mask optimization, which can ensure the accuracy of the splicing of the sub-layout. Then, the splicing size of the chip layout can be accurately determined by subtracting twice the corresponding redundant size from the mask optimization size. In this way, the embodiment of the present application quantifies the splicing size of the sub-layout according to the mask optimization size and the redundant size, thereby improving the accuracy of the splicing range of the sub-layout.

[0092] Chip layout-based splicing method. Accordingly, the present application also provides a specific embodiment of a chip layout splicing device.

[0093] like Figure 4 As shown, the chip layout splicing device 400 provided in the embodiment of the present application includes a size acquisition module 410 , a size calculation module 420 and a range determination module 430 .

[0094] The size acquisition module 410 is used to acquire the size of a single pixel of the chip layout;

[0095] The size calculation module 420 is used to determine the optimal mask size of each sub-layout according to the size of a single pixel and the memory size of the image processor, where each sub-layout is a plurality of local layouts obtained by cutting the chip layout;

[0096] The size calculation module 420 is further used to determine the redundant size of each sub-layout according to the size of a single pixel and the redundant pixel range preset in the sub-layout;

[0097] The range determination module 430 is used to determine the splicing range of each sub-layout when splicing into a chip layout according to the mask optimization size and the redundant size.

[0098] In the chip layout splicing device provided in the embodiment of the present application, the mask optimization size of the sub-layout can be accurately calculated according to the single pixel size of the chip layout and the memory size of the image processor; at the same time, according to the single pixel size of the chip layout and the preset redundant pixel range, the redundant size of the sub-layout can be accurately calculated. Finally, according to the mask optimization size and the redundant size, the splicing range when the sub-layout is spliced ​​into the chip layout can be determined. In this way, the embodiment of the present application realizes the quantification of the mask optimization size and the redundant size of the sub-layout based on the single pixel size and the corresponding pixel range, so that the splicing range of the sub-layout can be accurately determined according to the mask optimization size and the redundant size, which can improve the accuracy of the splicing range of the sub-layout.

[0099] As an optional embodiment, the size acquisition module 410 specifically includes the following units:

[0100] A parameter acquisition unit, used to acquire the wavelength of the lithography machine light source and the numerical aperture of the lithography machine projection lens corresponding to the chip layout;

[0101] The pixel size calculation unit is used to calculate the size of a single pixel point of the chip layout according to the wavelength and numerical aperture.

[0102] As an optional embodiment, the size calculation unit is specifically used for:

[0103] Divide the wavelength by the numerical aperture to get the initial size;

[0104] Multiply the initial size by the corresponding preset adjustment coefficient to obtain the size of a single pixel of the chip layout.

[0105] As an optional embodiment, the size calculation module 420 specifically includes the following units:

[0106] A pixel range determination unit, used to determine, according to the memory size of the image processor, a mask pixel point range of the chip layout that matches the memory size of the image processor;

[0107] The mask size determination unit is used to determine the optimized mask size of each sub-layout according to the size of a single pixel and the range of mask pixels.

[0108] As an optional embodiment, the range determination module 430 specifically includes the following units:

[0109] A splicing size determination unit, used to determine the splicing size of the sub-layout according to the mask optimization size and the redundant size;

[0110] The splicing range determination unit is used to determine the splicing range when each sub-layout is spliced ​​into a chip layout according to the splicing size.

[0111] As an optional embodiment, the splicing size determination unit is specifically used for:

[0112] Subtract twice the corresponding redundant size from the mask optimization size to obtain the splicing size of the chip layout.

[0113] Chip layout-based splicing method. Accordingly, the present application also provides a specific embodiment of a chip layout splicing device.

[0114] Figure 5 A schematic diagram of the hardware structure of a chip layout splicing device provided in an embodiment of the present application is shown.

[0115] The chip layout stitching device may include a processor 501 and a memory 502 storing computer program instructions.

[0116] Specifically, the processor 501 may include a central processing unit (CPU), or an application specific integrated circuit (ASIC), or may be configured to implement one or more integrated circuits of the embodiments of the present application.

[0117] The memory 502 may include a large capacity memory for data or instructions. By way of example and not limitation, the memory 502 may include a hard disk drive (HDD), a floppy disk drive, a flash memory, an optical disk, a magneto-optical disk, a magnetic tape, or a universal serial bus (USB) drive or a combination of two or more of these. In appropriate cases, the memory 502 may include a removable or non-removable (or fixed) medium. In appropriate cases, the memory 502 may be inside or outside the integrated gateway disaster recovery device. In a specific embodiment, the memory 502 is a non-volatile solid-state memory.

[0118] The processor 501 reads and executes the computer program instructions stored in the memory 502 to implement any chip layout splicing method in the above embodiments.

[0119] In one example, the chip layout splicing device may further include a communication interface 503 and a bus 510. Figure 5 As shown, the processor 501, the memory 502, and the communication interface 503 are connected via a bus 510 and communicate with each other.

[0120] The communication interface 503 is mainly used to implement communication between various modules, devices, units and / or equipment in the embodiments of the present application.

[0121] Bus 510 includes hardware, software or both, and the parts of the splicing equipment of chip layout are coupled to each other.For example, but not limitation, bus may include accelerated graphics port (AGP) or other graphics bus, enhanced industrial standard architecture (EISA) bus, front side bus (FSB), hypertransport (HT) interconnection, industrial standard architecture (ISA) bus, infinite bandwidth interconnection, low pin count (LPC) bus, memory bus, micro channel architecture (MCA) bus, peripheral component interconnection (PCI) bus, PCI-Express (PCI-X) bus, serial advanced technology attachment (SATA) bus, video electronics standard association local (VLB) bus or other suitable bus or two or more of these combinations. In appropriate cases, bus 510 may include one or more buses. Although the present application embodiment describes and shows a specific bus, the present application considers any suitable bus or interconnection.

[0122] In addition, in combination with the chip layout splicing method in the above embodiment, the embodiment of the present application can provide a computer storage medium for implementation. The computer storage medium stores computer program instructions; when the computer program instructions are executed by the processor, any chip layout splicing method in the above embodiment is implemented.

[0123] In addition, in combination with the chip layout splicing method in the above-mentioned embodiment, the embodiment of the present application may provide a computer program product to implement it. When the instructions in the computer program product are executed by the processor of an electronic device, the electronic device executes the chip layout splicing method provided by any aspect of the above-mentioned embodiment of the present application.

[0124] It should be clear that the present application is not limited to the specific configuration and processing described above and shown in the figures. For the sake of simplicity, a detailed description of the known method is omitted here. In the above embodiments, several specific steps are described and shown as examples. However, the method process of the present application is not limited to the specific steps described and shown, and those skilled in the art can make various changes, modifications and additions, or change the order between the steps after understanding the spirit of the present application.

[0125] The functional blocks shown in the above-described block diagram can be implemented as hardware, software, firmware or a combination thereof. When implemented in hardware, it can be, for example, an electronic circuit, an application specific integrated circuit (ASIC), appropriate firmware, a plug-in, a function card, etc. When implemented in software, the elements of the present application are programs or code segments that are used to perform the required tasks. The program or code segment can be stored in a machine-readable medium, or transmitted on a transmission medium or a communication link by a data signal carried in a carrier wave. "Machine-readable medium" can include any medium capable of storing or transmitting information. Examples of machine-readable media include electronic circuits, semiconductor memory devices, ROM, flash memory, erasable ROM (EROM), floppy disks, CD-ROMs, optical disks, hard disks, optical fiber media, radio frequency (RF) links, etc. The code segment can be downloaded via a computer network such as the Internet, an intranet, etc.

[0126] It should also be noted that the exemplary embodiments mentioned in this application describe some methods or systems based on a series of steps or devices. However, this application is not limited to the order of the above steps, that is, the steps can be performed in the order mentioned in the embodiment, or in a different order from the embodiment, or several steps can be performed simultaneously.

[0127] Aspects of the present disclosure are described above with reference to the flowchart and / or block diagram of the method, device (system) and computer program product according to the embodiment of the present disclosure. It should be understood that each box in the flowchart and / or block diagram and the combination of each box in the flowchart and / or block diagram can be implemented by computer program instructions. These computer program instructions can be provided to a processor of a general-purpose computer, a special-purpose computer, or other programmable data processing device to produce a machine so that these instructions executed by the processor of the computer or other programmable data processing device enable the implementation of the function / action specified in one or more boxes of the flowchart and / or block diagram. Such a processor can be, but is not limited to, a general-purpose processor, a special-purpose processor, a special application processor, or a field programmable logic circuit. It can also be understood that each box in the block diagram and / or flowchart and the combination of boxes in the block diagram and / or flowchart can also be implemented by dedicated hardware that performs a specified function or action, or can be implemented by a combination of dedicated hardware and computer instructions.

[0128] The above is only a specific implementation of the present application. Those skilled in the art can clearly understand that for the convenience and simplicity of description, the specific working processes of the systems, modules and units described above can refer to the corresponding processes in the aforementioned method embodiments, and will not be repeated here. It should be understood that the protection scope of the present application is not limited to this. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed in this application, and these modifications or replacements should be included in the protection scope of this application.

Claims

1. A chip layout splicing method, characterized in that: The method is applied to an image processor, and the method comprises: Get the size of a single pixel of the chip layout; Determine the optimal mask size of each sub-layout according to the size of the single pixel and the memory size of the image processor, each of the sub-layouts is a plurality of local layouts obtained by cutting the chip layout; Determining the redundant size of each of the sub-layouts according to the single pixel size and the preset redundant pixel range of the sub-layouts; The splicing range when each of the sub-layouts is spliced ​​into the chip layout is determined according to the optimized mask size and the redundant size.

2. The method according to claim 1, characterized in that: The step of obtaining the size of a single pixel of the chip layout includes: Obtaining the wavelength of the lithography machine light source and the numerical aperture of the lithography machine projection lens corresponding to the chip layout; The size of a single pixel of the chip layout is calculated according to the wavelength and the numerical aperture.

3. The method according to claim 2, characterized in that Calculating the size of a single pixel of the chip layout according to the wavelength and the numerical aperture includes: Dividing the wavelength by the numerical aperture to obtain an initial size; The initial size is multiplied by the corresponding preset adjustment coefficient to obtain the size of a single pixel point of the chip layout.

4. The method according to claim 1, characterized in that: Determining the optimized mask size of each sub-layout according to the single pixel size and the memory size of the image processor includes: According to the memory size of the image processor, determining the mask pixel range of the chip layout that matches the memory size of the image processor; The optimized mask size of each of the sub-layouts is determined according to the single pixel size and the mask pixel range.

5. The method according to claim 4, characterized in that The mask pixel range includes the number of first mask pixel points of the chip layout in a first direction and the number of second mask pixel points of the chip layout in a second direction, and the first direction is perpendicular to the second direction; The number of pixels of the first mask and the number of pixels of the second mask are both equal to 2 to the power of N.

6. The method according to any one of claims 1 to 5, characterized in that: The step of determining a splicing range when the sub-layouts are spliced ​​into the chip layout according to the mask optimization size and the redundant size includes: Determining the splicing size of the sub-layout according to the optimized mask size and the redundant size; According to the splicing size, a splicing range when each of the sub-layouts is spliced ​​into the chip layout is determined.

7. The method according to claim 6, characterized in that The step of determining the splicing size of the sub-layout according to the mask optimization size and the redundant size includes: The mask optimization size is subtracted from twice the corresponding redundant size to obtain the splicing size of the chip layout.

8. A chip layout splicing device, characterized in that: The device is applied to an image processor, and comprises: A size acquisition module is used to obtain the size of a single pixel of the chip layout; A size calculation module, used to determine the optimized mask size of each sub-layout according to the size of the single pixel point and the memory size of the image processor, each of the sub-layouts is a plurality of local layouts obtained by cutting the chip layout; The size calculation module is further used to determine the redundant size of each of the sub-layouts according to the size of the single pixel and the redundant pixel range preset in the sub-layout; The range determination module is used to determine the splicing range when each of the sub-layouts is spliced ​​into the chip layout according to the mask optimization size and the redundant size.

9. An electronic device, characterized in that: The device comprises: a processor and a memory storing computer program instructions; When the processor executes the computer program instructions, the chip layout splicing method as described in any one of claims 1-7 is implemented.

10. A computer-readable storage medium, characterized in that: The computer-readable storage medium stores computer program instructions, and when the computer program instructions are executed by a processor, the chip layout splicing method according to any one of claims 1 to 7 is implemented.

Citation Information

Patent Citations

  • Edge redundancy graph generating method for simulating internal layout graphs

    CN107958112A

  • Hyper-parameter determination method and device for layout feature extraction and medium

    CN111539177A

  • Mask for exposure, manufacturing method thereof, and manufacturing method of semiconductor device

    JP2004304094A

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