Photosensitive colored resin composition, pigment dispersion liquid, cured product, partition wall, organic electroluminescent element, color filter, and image display device

Abstract

Provided is a photosensitive colored resin composition having a high residual film rate. The photosensitive colored resin composition according to the present invention is characterized by containing (A) a colorant, (B) a dispersant, (C) an alkali-soluble resin, and (D) a photopolymerization initiator, the colorant (A) containing an organic pigment (A-1), and the alkali-soluble resin (C) containing a resin (C1) having a structural unit represented by general formula (1). # imgabs0 #

Description

Technical Field

[0001] The present invention relates to a photosensitive colored resin composition, a pigment dispersion, a cured product, a partition wall, an organic electroluminescent element, a color filter, and an image display device.

[0002] This application claims priority based on Japanese Patent Application No. 2022-127367 filed in Japan on August 9, 2022, and the contents are incorporated herein by reference. Background Art

[0003] Liquid crystal displays (LCDs) utilize the property that the arrangement of liquid crystal molecules switches according to the voltage applied to the liquid crystal. On the other hand, the components constituting the cells of an LCD are often formed by methods using photosensitive compositions, such as photolithography.

[0004] The photosensitive composition can be easily formed into a fine structure and can be easily processed into a substrate for a large screen. For these reasons, the scope of application of the photosensitive composition is further expanding.

[0005] Image display devices including organic electroluminescent elements (also called organic electroluminescence, organic EL) are attracting attention as the next generation of flat panel displays (FPD) due to their excellent visual recognition such as contrast and viewing angle, responsiveness, low power consumption, thinness and lightness, and flexibility of the display body.

[0006] An organic electroluminescent element has a structure in which an organic layer including a light-emitting layer or various functional layers is sandwiched between a pair of electrodes, at least one of which is light-transmissive. An image display device displays images by driving a panel in which an organic electroluminescent element is arranged for each pixel.

[0007] Conventionally, such an organic electroluminescent element is manufactured by forming a bank on a substrate and then laminating a light-emitting layer or various functional layers in a region surrounded by the bank.

[0008] When forming a light-emitting layer or the like in a region surrounded by the partition wall, a vapor deposition method is mainly used in which a material is sublimated in a vacuum state and adhered to a substrate to form a film.

[0009] In recent years, wet processes such as cast film, spin coating, and inkjet printing have attracted attention. Inkjet printing, in particular, can reduce uneven film thickness when forming a large area, and can achieve high-definition displays, reduce material usage, and improve yields by applying the coating separately, so it is suitable as a film-forming method for organic layers in large panels.

[0010] As a method for easily forming a partition wall, a method of forming the partition wall by photolithography using a photosensitive composition is known. In addition, as a method for imparting light-shielding properties to the partition wall and suppressing light leakage between pixels, a method of adding a colorant to a photosensitive composition is known.

[0011] Patent Document 1 describes a photosensitive colored resin composition having high light-shielding properties and a low dielectric constant by using a specific organic black pigment and a dispersant.

[0012] Patent Document 2 describes a photosensitive colored resin composition for use in partition walls of an organic electroluminescent element, which is effective in suppressing the generation of outgassing by using a specific organic black pigment and an alkali-soluble resin.

[0013] Prior art literature

[0014] Patent Literature

[0015] Patent Document 1: International Publication No. 2015 / 46178

[0016] Patent Document 2: International Publication No. 2018 / 101314 Summary of the invention

[0017] Problem that the invention aims to solve

[0018] As a method for preparing a photosensitive colored resin composition used for light-shielding partition walls, there is a known method of mixing a pigment dispersion prepared by adding a pigment as a colorant and dispersing it using a dispersant with other components. However, in the above-mentioned pigment dispersion, sufficient dispersibility and storage stability may not be ensured depending on the type of pigment, dispersant, and dispersing resin.

[0019] In addition, in the developing step and the baking step during the production of the partition, when the residual film rate of the photosensitive color resin composition is low, the developer resistance and the heat resistance during baking are poor, so that decomposition products, by-products, uncured materials, etc. in the composition may remain on the anode or re-adhere.

[0020] As a result of the present inventors' studies, it was found that when the partition wall is used in an organic electroluminescent element, sufficient brightness may not be obtained when the element current density relative to the applied voltage is low due to residues and re-attached materials on the anode. In addition, in the photosensitive color resin compositions described in Patent Documents 1 and 2, the residual film rate and the element current density are not sufficient.

[0021] Therefore, the first subject of the present invention is made in view of the above situation, and its purpose is to provide a photosensitive coloring resin composition with a high residual film rate. In addition, its purpose is to provide a photosensitive coloring resin composition with a high residual film rate and a high device current density when used for a partition wall for an organic electroluminescent element. Furthermore, its purpose is to provide an organic electroluminescent element and an image display device with high brightness.

[0022] In addition, a second object of the present invention is to provide a pigment dispersion having excellent dispersibility. A further object is to provide a photosensitive coloring resin composition, an organic electroluminescent element, and an image display device.

[0023] Solutions for solving problems

[0024] The present inventors have conducted intensive studies and have found that the above-mentioned problems can be solved by using a specific alkali-soluble resin and an organic pigment, thereby completing the present invention.

[0025] That is, the gist of the present invention is as follows.

[0026] [1] A photosensitive colored resin composition comprising (A) a colorant, (B) a dispersant, (C) an alkali-soluble resin, and (D) a photopolymerization initiator,

[0027] The aforementioned (A) colorant comprises an organic pigment (A-1),

[0028] The alkali-soluble resin (C) includes a resin (C1) having a structural unit represented by the following general formula (1).

[0029]

[0030] (In formula (1), R 1 represents a hydrogen atom or a methyl group.

[0031] R 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0032] L represents an alkylene group having 2 to 6 carbon atoms and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent.

[0033] *Each represents a connection key. )

[0034] [2] The photosensitive colored resin composition according to [1], wherein the resin (C1) has a structural unit represented by the following general formula (2).

[0035]

[0036] (In formula (2), A represents a hydrogen atom or a polyacid residue.

[0037] R 1 represents a hydrogen atom or a methyl group.

[0038] R 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0039] *Each represents a connection key. )

[0040] [3] The photosensitive colored resin composition according to [1] or [2], wherein the organic pigment (A-1) contains an organic black pigment.

[0041] [4] The photosensitive colored resin composition according to [3], wherein the organic black pigment comprises a benzodifuranone-based organic black pigment.

[0042] [5] The photosensitive colored resin composition according to [4], wherein the organic black pigment comprises an organic black pigment which is a compound represented by the following general formula (A-1-1), a geometric isomer thereof, a salt thereof, or a salt of a geometric isomer thereof.

[0043]

[0044] (In formula (A-1-1), R 611 and R 616 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom or a chlorine atom;

[0045] R 612 , R 613 , R 614 , R 615 , R 617 , R 618 , R 619 and R 620 Each independently represents a hydrogen atom, a halogen atom, R 621 、COOH、COOR 621 、COO - ,CONH2,CONHR 611 ,CONR 621 R 622 、CN、OH、OR 621 、COCR 621 、OOCNH2、OOCNHR 621 、OOCNR 621 R 622 、NO2、NH2、NHR 621 NR 621 R 622 、NHCOR 622 NR 621 COR 622、N=CH2、N=CHR 621 、N=CR 621 R 622 , SH, SR 621 , SOR 621 、SO2R 621 、SO3R 621 、SO3H、SO3 - 、SO2NH2、SO2NHR 621 or SO2NR 621 R 622 ;

[0046] Choose from R 612 With R 613 , R 613 With R 614 , R 614 With R 615 , R 617 With R 618 , R 618 With R 619 , and R 619 With R 620 At least one of the groups consisting of is optionally directly bonded to each other, or optionally bonded via an oxygen atom, a sulfur atom, NH or NR 621 Bridges bond to each other;

[0047] R 621 and R 622 Each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

[0048] [6] The photosensitive colored resin composition according to [1] or [2], wherein the (B) dispersant contains an acrylic dispersant having a tertiary amino group and / or a quaternary ammonium group.

[0049] [7] The photosensitive colored resin composition according to [1] or [2], wherein the (C) alkali-soluble resin contains (C2) an epoxy (meth)acrylate resin.

[0050] [8] The photosensitive colored resin composition according to [1] or [2], wherein the (C) alkali-soluble resin contains (C3) an isocyanuric acid skeleton-containing resin.

[0051] [9] The photosensitive colored resin composition according to [1] or [2], wherein the content of the resin (C1) in the (C) alkali-soluble resin is in the range of 4 to 80% by mass.

[0052]

[10] A pigment dispersion comprising (A) a colorant, (B) a dispersant and (C) an alkali-soluble resin,

[0053] The aforementioned (A) colorant comprises an organic pigment (A-1),

[0054] The alkali-soluble resin (C) includes a resin (C1) having a structural unit represented by the following general formula (1).

[0055]

[0056] (In formula (1), R 1 represents a hydrogen atom or a methyl group.

[0057] R 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0058] L represents an alkylene group having 2 to 6 carbon atoms and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent.

[0059] *Each represents a connection key. )

[0060]

[11] The pigment dispersion according to

[10] , wherein the resin (C1) has a structural unit represented by the following general formula (2).

[0061]

[0062] (In formula (2), A represents a hydrogen atom or a polyacid residue.

[0063] R 1 represents a hydrogen atom or a methyl group.

[0064] R 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0065] *Each represents a connection key. )

[0066]

[12] The pigment dispersion according to

[10] or

[11] , wherein the organic pigment (A-1) includes an organic black pigment.

[0067]

[13] The pigment dispersion according to

[12] , wherein the organic black pigment comprises a benzodifuranone-based organic black pigment.

[0068]

[14] The pigment dispersion according to

[13] , wherein the organic black pigment comprises an organic black pigment which is a compound represented by the following general formula (A-1-1), a geometric isomer thereof, a salt thereof, or a salt of a geometric isomer thereof.

[0069]

[0070] (In formula (A-1-1), R 611 and R 616 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom or a chlorine atom;

[0071] R 612 , R 613 , R 614 , R 615 , R 617 , R 618 , R 619 and R 620 Each independently represents a hydrogen atom, a halogen atom, R 621 、COOH、COOR 621 、COO - ,CONH2,CONHR 621 ,CONR 621 R 622 、CN、OH、OR 621 、COCR 621 、OOCNH2、OOCNHR 621 、OOCNR 621 R 622 、NO2、NH2、NHR 621 NR 621 R 622 、NHCOR 622 NR 621 COR 622 、N=CH2、N=CHR 621 、N=CR 621 R 622 , SH, SR 621 , SOR 621 、SO2R 621 、SO3R 621 、SO3H、SO3 - 、SO2NH2、SO2NHR 621 or SO2NR 621 R 622 ;

[0072] Choose from R 612 With R 613 , R 613 With R 614 , R 614 With R 615 , R 617 With R 618 , R 618 With R 619 , and R 619 With R 620At least one of the groups consisting of is optionally directly bonded to each other, or optionally bonded via an oxygen atom, a sulfur atom, NH or NR 621 Bridges bond to each other;

[0073] R 621 and R 622 Each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

[0074]

[15] The pigment dispersion according to

[10] or

[11] , wherein the (B) dispersant comprises an acrylic dispersant having a tertiary amino group and / or a quaternary ammonium group.

[0075]

[16] A photosensitive colored resin composition comprising the pigment dispersion according to

[10] or

[11] and (D) a photopolymerization initiator.

[0076]

[17] A cured product obtained by curing the photosensitive color resin composition according to any one of [1] to [9] and

[16] .

[0077]

[18] A partition wall formed from the cured product described in

[17] .

[0078]

[19] An organic electroluminescent element comprising the partition wall described in

[18] .

[0079]

[20] A color filter comprising the partition wall described in

[19] and light-emitting nanocrystal particles.

[0080]

[21] An image display device comprising the partition wall described in

[19] .

[0081]

[22] A compound having a structural unit represented by the following general formula (1).

[0082]

[0083] (In formula (1), R 1 represents a hydrogen atom or a methyl group.

[0084] R 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0085] L represents an alkylene group having 2 to 6 carbon atoms and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent.

[0086] *Each represents a connection key. )

[0087] Effects of the Invention

[0088] According to the present invention, a photosensitive colored resin composition having a high residual film rate can be provided. In addition, a pigment dispersion having excellent dispersibility can be provided. Furthermore, an organic electroluminescent element and an image display device can be improved. BRIEF DESCRIPTION OF THE DRAWINGS

[0089] Figure 1 It is a schematic cross-sectional view of an example of a color filter including the partition wall of the present invention. DETAILED DESCRIPTION

[0090] Hereinafter, although embodiment of the present invention is described concretely, the present invention is not limited to the following embodiment, and various modifications can be implemented within the scope of the gist thereof.

[0091] In the present invention, "(meth)acrylic acid" means "acrylic acid and / or methacrylic acid", and the same applies to "(meth)acrylate" and "(meth)acryloyl".

[0092] The "acrylic resin" refers to a (co)polymer containing (meth)acrylic acid or a (co)polymer containing a (meth)acrylate having a carboxyl group.

[0093] The “total solid content” refers to all components other than the solvent contained in the photosensitive color resin composition or the pigment dispersion. Even if a component other than the solvent is liquid at room temperature, the component is not included in the solvent but is included in the total solid content.

[0094] The term "(co)polymer" means both homopolymers and copolymers, and the terms "acid (anhydride)" and "(anhydrous) acid" mean both acids and their anhydrides.

[0095] The term "monomer" is a term in contrast to a so-called high molecular substance (polymer), and means to include not only monomers in a narrow sense but also dimers, trimers, and oligomers.

[0096] The “weight average molecular weight” refers to a polystyrene-equivalent weight average molecular weight (Mw) based on GPC (gel permeation chromatography).

[0097] Unless otherwise specified, the “amine value” refers to the amine value converted to the effective solid content, and is a value represented by the mass of KOH equivalent to the amount of alkali per 1 g of the solid content of the dispersant. The measurement method will be described later.

[0098] Unless otherwise specified, the “acid value” means the acid value converted into effective solid content, and is calculated by neutralization titration.

[0099] Regarding pigments, "CI" means Color Index.

[0100] In this specification, percentages and parts expressed by "mass" have the same meaning as percentages and parts expressed by "weight".

[0101] The photosensitive colored resin composition of the first embodiment of the present invention contains (A) a colorant, (B) a dispersant, (C) an alkali-soluble resin, and (D) a photopolymerization initiator, wherein the (A) colorant contains an organic pigment (A-1), and the (C) alkali-soluble resin contains a resin (C1) represented by formula (1).

[0102] The pigment dispersion of the second embodiment of the present invention contains (A) a colorant, (B) a dispersant, and (C) an alkali-soluble resin. The (A) colorant contains an organic pigment (A-1), and the (C) alkali-soluble resin contains a resin (C1) represented by formula (1).

[0103] Hereinafter, unless otherwise specified, (A) colorant, (B) dispersant, (C) alkali-soluble resin, and (D) photopolymerization initiator refer to technical features of both the photosensitive color resin composition of the first embodiment and the pigment dispersion of the second embodiment.

[0104] [Photosensitive coloring resin composition]

[0105] The photosensitive colored resin composition of the present invention contains:

[0106] (A) Colorants

[0107] (B) Dispersant

[0108] (C) Alkali-soluble resin

[0109] (D) Photopolymerization initiator.

[0110] <(A) Colorant>

[0111] The photosensitive colored resin composition of the present invention contains (A) a colorant. By containing the (A) colorant, appropriate light absorption can be obtained, and in particular, appropriate light shielding properties can be obtained when used for forming a light shielding member such as a partition.

[0112] The colorant (A) of the present invention contains an organic pigment (A-1). By containing the organic pigment (A-1), the insulating properties tend to be improved.

[0113] The pigment contained in the (A) colorant may be a single type or two or more types. From the viewpoint of achieving both uniform light shielding in the visible region and OD per unit film thickness, two or more types are preferred.

[0114] The organic pigment that can be used as (A) colorant is not particularly limited, and examples thereof include organic coloring pigments and organic black pigments. Here, the organic coloring pigment refers to an organic pigment that exhibits a color other than black, and examples thereof include red pigments, orange pigments, blue pigments, purple pigments, green pigments, and yellow pigments.

[0115] Among organic pigments, organic coloring pigments are preferably used from the viewpoint of suppressing the absorption of ultraviolet rays and having high curability and being easy to control the shape of the cured product. On the other hand, organic black pigments are preferably used from the viewpoint of having high light-shielding properties and being able to reduce the pigment concentration relative to the solid component.

[0116] Examples of the organic black pigment include perylene-based black pigments, aniline-based black pigments, and benzodifuranone-based black pigments.

[0117] Examples of the perylene-based black pigment include Lumogen Black (registered trademark) FK4281 and K0087, and Paliogen Black (registered trademark) EH0788 (all manufactured by BASF).

[0118] Examples of the aniline black pigment include Paliotol Black (registered trademark) L0080, D0080, and K0080 (all manufactured by BASF).

[0119] As the organic black pigment, from the viewpoints of light-shielding property, dispersibility, developability, and light-emitting property, benzodifuranone-based black pigments are preferred.

[0120] Among the benzodifuranone-based black pigments, from the viewpoints of light-shielding properties, dispersibility, developability, and luminescent properties, it is preferred to use an organic black pigment comprising at least one selected from the group consisting of a compound represented by the following general formula (A-1-1) (hereinafter sometimes referred to as “compound (A-1-1)”), a geometric isomer of the compound (A-1-1), a salt of the compound (A-1-1), and a salt of a geometric isomer of the compound (A-1-1) (hereinafter sometimes referred to as “organic black pigment represented by general formula (A-1-1)”).

[0121]

[0122] In formula (A-1-1), R 611 and R 616 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom or a chlorine atom;

[0123] R 612 , R 613 , R 614 , R 615 , R617 , R 618 , R 619 and R 620 Each independently represents a hydrogen atom, a halogen atom, R 621 、COOH、COOR 621 、COO - ,CONH2,CONHR 621 ,CONR 621 R 622 、CN、OH、OR 621 、COCR 621 、OOCNH2、OOCNHR 621 、OOCNR 621 R 622 、NO2、NH2、NHR 621 NR 621 R 622 、NHCOR 622 NR 621 COR 622 、N=CH2、N=CHR 621 、N=CR 621 R 622 , SH, SR 621 , SOR 621 、SO2R 621 、SO3R 621 、SO3H、SO3 - 、SO2NH2、SO2NHR 621 or SO2NR 621 R 622 ;

[0124] Choose from R 612 With R 613 , R 613 With R 614 , R 614 With R 615 , R 617 With R 618 , R 618 With R 619 , and R 619 With R 620 At least one of the groups consisting of is optionally directly bonded to each other, or optionally bonded via an oxygen atom, a sulfur atom, NH or NR 621 Bridges bond to each other;

[0125] R 621 and R 622 Each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

[0126] Compound (A-1-1) and the geometric isomers of compound (A-1-1) have the following core structure (wherein the substituents in the structural formula are omitted), and the trans-trans isomer is likely to be the most stable.

[0127]

[0128] When compound (A-1-1) is anionic, it is preferably a salt formed by compensating its charge with any known suitable cation, such as a metal, organic, inorganic or metal organic cation, specifically an alkali metal, alkaline earth metal, transition metal, primary ammonium, secondary ammonium, tertiary ammonium such as trialkylammonium, quaternary ammonium such as tetraalkylammonium or an organic metal complex. In addition, when the geometric isomers of compound (A-1-1) are anionic, they are preferably the same salts.

[0129] Among the substituents of formula (A-1-1) and their definitions, the following substituents are preferred because they tend to increase the shielding rate. This is because the following substituents are considered to have no absorption and do not affect the hue of the pigment.

[0130] R 612 , R 614 , R 615 , R 617 , R 619 and R 620 Each independently is preferably a hydrogen atom, a fluorine atom or a chlorine atom, and more preferably a hydrogen atom.

[0131] R 613 and R 618 Each is independently preferably a hydrogen atom, NO2, OCH3, OC2H5, a bromine atom, a chlorine atom, CH3, C2H5, N(CH3)2, N(CH3)(C2H5), N(C2H5)2, α-naphthyl, β-naphthyl, SO3H or SO3 - , further preferably a hydrogen atom or SO3H, particularly preferably a hydrogen atom.

[0132] R 611 and R 616 Each independently is preferably a hydrogen atom, CH3 or CF3, and more preferably a hydrogen atom.

[0133] Preferably selected from R 611 With R 616 , R 612 With R 617 , R 613 With R 618 , R 614 With R 619 , and R 615 With R 620At least one of the combinations in the group is the same, preferably R 611 With R 616 Same, R 612 With R 617 Same, R 613 With R 618 Same, R 614 With R 619 Same, and R 615 With R 620 same.

[0134] The alkyl group having 1 to 12 carbon atoms is, for example, methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, 2-methylbutyl, n-pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, n-hexyl, n-heptyl, n-octyl, 1,1,3,3-tetramethylbutyl, 2-ethylhexyl, nonyl, decyl, undecyl or dodecyl.

[0135] Examples of the cycloalkyl group having 3 to 12 carbon atoms include cyclopropyl, cyclopropylmethyl, cyclobutyl, cyclopentyl, cyclohexyl, cyclohexylmethyl, trimethylcyclohexyl, thujayl, norbornyl, bornyl, norcaryl, caryl, menthyl, norpinyl, pinyl, adamantane-1-yl, and adamantane-2-yl.

[0136] The alkenyl group having 2 to 12 carbon atoms is, for example, vinyl, allyl, 2-propen-2-yl, 2-buten-1-yl, 3-buten-1-yl, 1,3-butadien-2-yl, 2-penten-1-yl, 3-penten-2-yl, 2-methyl-1-buten-3-yl, 2-methyl-3-buten-2-yl, 3-methyl-2-buten-1-yl, 1,4-pentadien-3-yl, hexenyl, octenyl, nonenyl, decenyl or dodecenyl.

[0137] Examples of the cycloalkenyl group having 3 to 12 carbon atoms include 2-cyclobuten-1-yl, 2-cyclopenten-1-yl, 2-cyclohexen-1-yl, 3-cyclohexen-1-yl, 2,4-cyclohexadien-1-yl, 1-p-menthene-8-yl, 4(10)-thuja-10-yl, 2-norbornene-1-yl, 2,5-norbornadien-1-yl, 7,7-dimethyl-2,4-norcarbadien-3-yl, and camphenyl.

[0138] The alkynyl group having 2 to 12 carbon atoms is, for example, 1-propyn-3-yl, 1-butyn-4-yl, 1-pentyn-5-yl, 2-methyl-3-butyn-2-yl, 1,4-pentadiyn-3-yl, 1,3-pentadiyn-5-yl, 1-hexyn-6-yl, cis-3-methyl-2-penten-4-yn-1-yl, trans-3-methyl-2-penten-4-yn-1-yl, 1,3-hexadiyn-5-yl, 1-octyn-8-yl, 1-nonyn-9-yl, 1-decyn-10-yl or 1-dodecyn-12-yl.

[0139] The halogen atom is, for example, a fluorine atom, a chlorine atom, a bromine atom or an iodine atom.

[0140] The organic black pigment represented by formula (A-1-1) is preferably an organic black pigment comprising at least one selected from the group consisting of a compound represented by the following general formula (A-1-2) (hereinafter also referred to as "compound (A-1-2)") and geometric isomers of compound (A-1-2).

[0141]

[0142] As compound (A-1-2), trade name Irgaphor (registered trademark) Black S 0100CF (manufactured by BASF) is mentioned, for example.

[0143] The organic black pigment is preferably dispersed and used using a dispersant, solvent, or method described below. In addition, if a sulfonic acid derivative of compound (A-1-1), particularly a sulfonic acid derivative of compound (A-1-2), is present during dispersion, dispersibility and storage properties may be improved. Therefore, the organic black pigment preferably contains these sulfonic acid derivatives.

[0144] The chemical structure of the organic coloring pigment is not particularly limited, and examples thereof include azo, phthalocyanine, quinacridone, benzimidazolone, isoindolinone, dioxazine, indanthrene, and perylene. Specific examples of usable pigments are shown below using pigment codes. "CI" in the "CI Pigment Red 2" listed below refers to a color index (Color Index).

[0145] Examples of the red pigment include CI Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48:1, 48:2, 48:3, 48:4, 49, 49:1, 49:2, 50:1, 52:1, 52:2, 53, 53:1, 53:2, 53: 3, 57, 57:1, 57:2, 58:4, 60, 63, 63:1, 63:2, 64, 64:1, 68, 69, 81, 81:1, 81:2, 81:3, 81:4, 83, 88, 90:1, 101, 101:1, 104, 108, 108:1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 1 49, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 179, 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232 2, 233, 235, 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276. From the viewpoint of light blocking property and dispersibility, preferably, CI Pigment Red 48:1, 122, 149, 168, 177, 179, 194, 202, 206, 207, 209, 224, 242, 254 is used, and more preferably, CI Pigment Red 177, 209, 224, 254 is used. In addition, from the viewpoint of dispersibility and light-shielding property, CI Pigment Red 177, 254, and 272 are preferably used. When the photosensitive colored resin composition is cured by ultraviolet rays, it is preferable to use a red pigment with a low ultraviolet absorption rate. From this viewpoint, CI Pigment Red 254 and 272 are more preferably used.

[0146] As orange pigments, for example, CI Pigment Orange 1, 2, 5, 13, 16, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46, 48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79 can be mentioned. From the viewpoint of dispersibility and light shielding property, CI Pigment Orange 13, 43, 64, and 72 are preferably used. When the photosensitive coloring resin composition is cured by ultraviolet rays, it is preferred to use a pigment with a low ultraviolet absorption rate as the orange pigment, and from this viewpoint, CI Pigment Orange 64 and 72 are more preferably used.

[0147] Examples of the blue pigment include CI Pigment Blue 1, 1:2, 9, 14, 15, 15:1, 15:2, 15:3, 15:4, 15:6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56:1, 60, 61, 61:1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, and 79. From the viewpoint of light-shielding properties, CI Pigment Blue 15, 15:1, 15:2, 15:3, 15:4, 15:6, and 60 are preferably used, and CI Pigment Blue 15:6 is more preferably used. In addition, from the viewpoint of dispersibility and light-shielding properties, CI Pigment Blue 15:6, 16, and 60 are preferably used. When the photosensitive resin coloring composition is cured by ultraviolet rays, it is preferable to use a pigment having a low ultraviolet absorption rate as the blue pigment. From this viewpoint, CI Pigment Blue 60 is more preferably used.

[0148] Examples of the violet pigment include CI Pigment Violet 1, 1:1, 2, 2:2, 3, 3:1, 3:3, 5, 5:1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, and 50. From the viewpoint of light-shielding properties, CI Pigment Violet 19, 23, and 29 are preferably used, and CI Pigment Violet 23 is more preferably used. In addition, from the viewpoint of dispersibility and light-shielding properties, CI Pigment Violet 23 and 29 are preferably used. When the photosensitive colored resin composition is cured by ultraviolet rays, it is preferred to use a pigment having a low ultraviolet absorption rate as the violet pigment, and from this viewpoint, CI Pigment Violet 29 is more preferably used.

[0149] Examples of the green pigment include CI Pigment Green 1, 2, 4, 7, 8, 10, 13, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55, 58, and 59. Preferably, CI Pigment Green 7 and 36 are used.

[0150] Examples of yellow pigments include CI Pigment Yellow 1, 1:1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 41, 42, 43, 48, 53, 55, 61, 62, 62:1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127:1, 128, 129, 133, 1 34, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, 208. Preferably, CI Pigment Yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, and 185 are used, and more preferably, CI Pigment Yellow 83, 138, 139, 150, and 180 are used.

[0151] From the viewpoint of light-shielding properties and shape control of the cured product, it is preferred to use at least one selected from the group consisting of a red pigment, an orange pigment, a blue pigment, and a violet pigment.

[0152] From the viewpoint of light-shielding properties and shape control of the cured product, it is preferred that at least one of the following pigments be contained.

[0153] Red pigment: CI Pigment Red 177, 254, 272

[0154] Orange pigment: CI Pigment Orange 43, 64, 72

[0155] Blue pigment: CI Pigment Blue 15:6, 60

[0156] Violet Pigment: CI Pigment Violet 23, 29

[0157] The combination of organic coloring pigments when two or more organic coloring pigments are used in combination is not particularly limited, but from the viewpoint of light-shielding properties, it is preferred to contain at least one selected from the group consisting of red pigments and orange pigments and at least one selected from the group consisting of blue pigments and violet pigments.

[0158] The combination of colors is not particularly limited, and examples thereof include a combination of a red pigment and a blue pigment, a combination of a blue pigment and an orange pigment, and a combination of a blue pigment, an orange pigment, and a violet pigment from the viewpoint of light-shielding properties.

[0159] As the colorant (A) that can be used in the photosensitive colored resin composition of the present invention, a colorant other than the organic pigment (A-1) can also be used in combination. The colorant that can be used in combination is not particularly limited, and a pigment or a dye can be used. The other colorants used in combination with the organic pigment can be used alone or in combination of two or more.

[0160] From the viewpoint of durability, it is preferred to use a pigment, and examples thereof include inorganic pigments.

[0161] As the inorganic pigment, an inorganic black pigment is preferably used from the viewpoint of higher light-shielding properties.

[0162] Examples of the inorganic black pigment include carbon black, acetylene black, lamp black, bone black, graphite, iron black, cyanine black, and titanium black.

[0163] From the viewpoint of light-shielding property and image characteristics, carbon black can be preferably used.

[0164] Examples of carbon black include the following.

[0165] Made by Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA77, MA100, MA100R, MA100S, MA220, MA230, MA600, MCF88, #5, #10, #20, #25, #30, #32, #33, #40, #44, #45, #47, #50, #52, #55, #650, #750, #850, #900, #950, #9 60, #970, #980, #990, #1000, #2200, #2300, #2350, #2400, #2600, #2650, #3030, #3050, #315 0, #3250, #3400, #3600, #3750, #3950, #4000, #4010, OIL7B, OIL9B, OIL11B, OIL30B, OIL31B.

[0166] Made by DEGUSSA: Printex (registered trademark, the same below) 3, Printex3OP, Printex30, Printex30OP, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, Printex A, Printex L, Printex G, Printex P, Printex U, PrintexV, PrintexG, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlack100, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW200, Color Black S160, ColorBlack S170.

[0167] Manufactured by Cabot Corporation: Monarch (registered trademark, the same below) 120, Monarch 280, Monarch 460, Monarch 800, Monarch 880, Monarch 900, Monarch 1000, Monarch 1100, Monarch 1300, Monarch 1400, Monarch 4630, REGAL (registered trademark, the same below) 99, REGAL 99R, REGAL 415, REGAL 415R, REGAL 250, REGAL 250R, REGAL 330, REGAL 400R, REGAL 550R, REGAL 660R, BLACK PEARLS 480, PEARLS 130, VULCAN (registered trademark, the same below) XC72R, ELFTEX (registered trademark) -8.

[0168] Birla Manufactured by Corporation: RAVEN (registered trademark, the same below) 11, RAVEN14, RAVEN15, RAVEN16, RAVEN22, RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN780, RAVEN850, RAVEN890H, RAVEN 1000, RAVEN1020, RAVEN1040, RAVEN1060U, RAVEN1080U, RAVEN1170, RAVEN1190U, RAVEN1250, RAVEN1500, RAVEN2000, RAVEN2500U, RAVEN3500, RAVEN5000, RAVEN5250, RAVEN5750, RAVEN7000.

[0169] Carbon black can be used that has been subjected to an acid treatment on the surface. For example, the carbon black described in Japanese Patent Gazette No. 3674086 can be used appropriately. In addition, carbon black coated with resin can also be used. If carbon black coated with resin is used, the adhesion to the glass substrate and the volume resistance value can be improved. As the carbon black coated with resin, for example, the carbon black described in Japanese Patent Gazette No. 09-71733 can be used appropriately. In terms of volume resistance and dielectric constant, it is preferred to use resin-coated carbon black.

[0170] These pigments are preferably dispersed and used so as to have an average particle size of preferably 1 μm or less, more preferably 0.5 μm or less, and further preferably 0.25 μm or less. Here, the basis of the average particle size is the number of pigment particles.

[0171] In the photosensitive color resin composition of the present invention, the average particle size of the pigment is a value obtained from the pigment particle size measured by dynamic light scattering (DLS). The particle size measurement is performed on a sufficiently diluted photosensitive color resin composition (usually, the pigment concentration is adjusted to about 0.005 to 0.2% by mass by dilution. However, if there is a recommended concentration for the measuring equipment, it is measured at that concentration) at 25°C.

[0172] In addition to the above-mentioned organic pigments and inorganic pigments, dyes can also be used. For dyes that can be used as colorants, for example, azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes can be listed.

[0173] Examples of the azo dye include CI Acid Yellow 11, CI Acid Orange 7, CI Acid Red 37, CI Acid Red 180, CI Acid Blue 29, CI Direct Red 28, CI Direct Red 83, CI Direct Yellow 12, CI Direct Orange 26, CI Direct Green 28, CI Direct Green 59, CI Reactive Yellow 2, CI Reactive Red 17, CI Reactive Red 120, CI Reactive Black 5, CI Disperse Orange 5, CI Disperse Red 58, CI Disperse Blue 165, CI Basic Blue 41, CI Basic Red 18, CI Mordant Red 7, CI Mordant Yellow 5, and CI Mordant Black 7.

[0174] Examples of the anthraquinone dye include CI Vat Blue 4, CI Acid Blue 40, CI Acid Green 25, CI Reactive Blue 19, CI Reactive Blue 49, CI Disperse Red 60, CI Disperse Blue 56, and CI Disperse Blue 60.

[0175] As a phthalocyanine dye, CI Vat Blue 5 is mentioned, for example.

[0176] Examples of the quinoneimine dye include CI Basic Blue 3 and CI Basic Blue 9.

[0177] As quinoline dyes, CI Solvent Yellow 33, CI Acid Yellow 3, and CI Disperse Yellow 64 are mentioned, for example.

[0178] Examples of the nitro dye include CI Acid Yellow 1, CI Acid Orange 3, and CI Disperse Yellow 42.

[0179] <(B) Dispersant>

[0180] The photosensitive color resin composition of the present invention contains (B) a dispersant in order to finely disperse the (A) colorant and stabilize its dispersion state for the purpose of ensuring quality stability.

[0181] As the dispersant (B), a polymer dispersant having a functional group is preferred, and further, from the viewpoint of dispersion stability, a polymer dispersant having functional groups such as a carboxyl group; a phosphoric acid group; a sulfonic acid group; or a salt thereof; a primary, secondary or tertiary amino group; a quaternary ammonium group; or a group derived from a nitrogen-containing heterocyclic ring such as pyridine, pyrimidine, or pyrazine is preferred. In particular, a polymer dispersant having a basic functional group such as a primary, secondary or tertiary amino group; a quaternary ammonium group; or a group derived from a nitrogen-containing heterocyclic ring such as pyridine, pyrimidine, or pyrazine is particularly preferred from the viewpoint that the pigment can be dispersed with a small amount of the dispersant.

[0182] Examples of the polymer dispersant include urethane dispersants, acrylic acid dispersants, polyethyleneimine dispersants, polyallylamine dispersants, dispersants containing monomers and macromonomers having an amino group, polyoxyethylene alkyl ether dispersants, polyoxyethylene diester dispersants, polyether phosphate dispersants, polyester phosphate dispersants, sorbitan aliphatic ester dispersants, and aliphatic modified polyester dispersants.

[0183] Examples of such dispersants include EFKA (registered trademark, manufactured by BASF), DISPERBYK (registered trademark, manufactured by BYK-Chemie), DISPARLON (registered trademark, manufactured by Kusumoto Chemicals Co., Ltd.), SOLSPERSE (registered trademark, manufactured by Lubrizol Corporation), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), POLYFLOW (manufactured by Kyoeisha Chemical Co., Ltd.), and AJISPER (registered trademark, manufactured by Ajinomoto Co., Ltd.).

[0184] The polymer dispersants may be used alone or in combination of two or more.

[0185] From the viewpoint of the dispersibility of the pigment, the dispersant (B) preferably contains either or both of a urethane polymer dispersant and an acrylic polymer dispersant having a functional group, and particularly preferably contains an acrylic polymer dispersant.

[0186] From the viewpoint of dispersibility and storage stability, a polymer dispersant having a basic functional group and having either or both of a polyester bond and a polyether bond is preferred.

[0187] Examples of urethane-based and acrylic-based polymer dispersants include DISPERBYK-160 to 167, 182 series (all urethane-based), DISPERBYK-2000, 2001, and BYK-LPN21116 (all acrylic-based) (all manufactured by BYK-Chemie).

[0188] The amine value of the polymer dispersant having a basic functional group is not particularly limited, but is preferably 1 mgKOH / g or more, more preferably 10 mgKOH / g or more, further preferably 20 mgKOH / g or more, further preferably 40 mgKOH / g or more, and particularly preferably 50 mgKOH / g or more. In addition, it is preferably 140 mgKOH / g or less, more preferably 120 mgKOH / g or less, further preferably 100 mgKOH / g or less, further preferably 90 mgKOH / g or less, and particularly preferably 80 mgKOH / g or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 140 mgKOH / g, more preferably 10 to 120 mgKOH / g, further preferably 20 to 100 mgKOH / g, further preferably 40 to 90 mgKOH / g, and particularly preferably 50 to 80 mgKOH / g. By setting it above the above lower limit, there is a tendency for the dispersibility to become better. By setting it to the said upper limit value or less, there exists a tendency for the compatibility with (C) alkali-soluble resin to become favorable.

[0189] From the viewpoint of dispersibility, the acrylic dispersant is preferably an AB or BAB block copolymer composed of an A block having the above-mentioned functional group and a B block not having the above-mentioned functional group. In this case, in addition to the partial structure derived from the unsaturated group-containing monomer containing the above-mentioned functional group, the A block may also contain a partial structure derived from the unsaturated group-containing monomer not containing the above-mentioned functional group, which may also be included in the A block in any manner of random copolymerization or block copolymerization. The content ratio of the partial structure not containing a functional group in the A block is preferably 80% by mass or less, more preferably 50% by mass or less, further preferably 30% by mass or less, further preferably 10% by mass or less, and particularly preferably 0% by mass.

[0190] From the viewpoint of dispersibility, the B block is preferably composed only of a partial structure derived from an unsaturated group-containing monomer that does not contain the above-mentioned functional group. One B block may also contain partial structures derived from two or more monomers, which may be included in the B block in any form of random copolymerization or block copolymerization.

[0191] The AB or BAB block copolymer can be prepared, for example, by the living polymerization method shown below.

[0192] Living polymerization methods include anionic living polymerization, cationic living polymerization, and radical living polymerization. Among them, in anionic living polymerization, the polymerization active species is an anion, which is represented by the following scheme, for example.

[0193] (Anionic Living Polymerization)

[0194]

[0195] In the above route map, Ar 1 is a monovalent organic group, Ar 2 For Ar 1 In different monovalent organic groups, M is a metal atom, and s and t are each an integer greater than 1.

[0196] The polymerization active species in the radical living polymerization method is a radical, which can be represented by the following scheme, for example.

[0197] (Free Radical Living Polymerization)

[0198] (Nitroxyl method)

[0199]

[0200] (ATRP method)

[0201]

[0202] In the above roadmap, Ar 1 is a monovalent organic group, Ar 2 For Ar 1 different monovalent organic groups, j and k are each an integer greater than 1, R a is a hydrogen atom or a monovalent organic group, R b For R a Different hydrogen atoms or monovalent organic groups.

[0203] When synthesizing the acrylic dispersant, the following methods can be used: Japanese Patent Application Laid-Open No. 9-62002, P. Lutz, P. Masson et al., Polym. Bull. 12, 79 (1984), BC Anderson, GD Andrews et al., Macromolecules, 14, 1601 (1981), K. Hatada, K. Ute, et al., Polym. J. 17, 977 (1985), K. Hatada, K. Ute, et al., Polym. J. 17, 977 (1985), K. Hatada, K. Ute, et al., Polym. al, Polym.J.18, 1037 (1986), Yuhei Koichi, Hata Koichi, Polymer Processing, 36, 366 (1987), Toshinobu Higashimura, Mitsuo Sawamoto, Collected Papers on Polymers, 46, 189 (1989), M. Kuroki, T. Aida, J. Am. Chem. Sic, 109, 4737 (1987), Takuzo Aida, Shohei Inoue, Synthetic Organic Chemistry, 43, 300 (1985), DY Sogoh, WR Hertler et al, Macromolecules, 20, 1473 (1987), etc.

[0204] The acrylic dispersant that can be used in the present invention may be an AB block copolymer or a BAB block copolymer, and the A block / B block ratio constituting the copolymer is not particularly limited, but is preferably 1 / 99 to 80 / 20 (mass ratio), and more preferably 5 / 95 to 60 / 40 (mass ratio). By setting it within this range, it tends to be easy to ensure a balance between dispersibility and storage stability.

[0205] The amount of quaternary ammonium groups in 1 g of the AB block copolymer or BAB block copolymer that can be used in the present invention is preferably 0.1 to 10 mmol. By setting the amount within this range, it tends to be easy to ensure good dispersibility.

[0206] Such acrylic dispersants may also contain amino groups. The amine value of the acrylic dispersant is preferably 1 mgKOH / g or more, more preferably 10 mgKOH / g or more, further preferably 20 mgKOH / g or more, further preferably 40 mgKOH / g or more, and particularly preferably 50 mgKOH / g or more. In addition, it is preferably 140 mgKOH / g or less, more preferably 120 mgKOH / g or less, further preferably 100 mgKOH / g or less, further preferably 90 mgKOH / g or less, and particularly preferably 80 mgKOH / g or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 140 mgKOH / g, more preferably 10 to 120 mgKOH / g, further preferably 20 to 100 mgKOH / g, further preferably 40 to 90 mgKOH / g, and particularly preferably 50 to 80 mgKOH / g. By setting it above the above lower limit, there is a tendency for the dispersibility to become better. By setting it to the said upper limit value or less, there exists a tendency for the compatibility with (C) alkali-soluble resin to become favorable.

[0207] Here, the amine value of the acrylic dispersant is represented by the mass of KOH equivalent to the amount of alkali per 1 g of solid content in the dispersant sample after removing the solvent, and is measured by the following method.

[0208] In a 100mL beaker, accurately weigh 0.5-1.5g of the dispersant sample and dissolve it in 50mL of acetic acid. Use an automatic titrator equipped with a pH electrode to neutralize and titrate the solution with 0.1mol / L HClO4 acetic acid solution. The inflection point of the titration pH curve is taken as the titration endpoint, and the amine value is calculated using the following formula.

[0209] Amine value [mgKOH / g] = (561×V) / (W×S)

[0210] [W: represents the amount of the dispersant sample weighed [g], V: represents the titration amount at the titration endpoint [mL], and S: represents the solid content concentration of the dispersant sample [mass %].]

[0211] The weight average molecular weight (Mw) of the acrylic dispersant is not particularly limited, but is preferably 1000 or more, more preferably 3000 or more, further preferably 4000 or more, and particularly preferably 5000 or more. In addition, it is preferably 50000 or less, more preferably 20000 or less, and further preferably 15000 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1000 to 50000, more preferably 3000 to 50000, further preferably 4000 to 20000, and particularly preferably 5000 to 15000. By setting it to above the aforementioned lower limit, there is a tendency for the dispersibility to become better, and by setting it to below the aforementioned upper limit, there is a tendency for the viscosity to be less likely to change.

[0212] The acrylic dispersant preferably has a tertiary amino group and / or a quaternary ammonium group.

[0213] When the acrylic dispersant has a quaternary ammonium group as a functional group, the chemical structure of the repeating unit containing the quaternary ammonium group is not particularly limited. From the viewpoint of dispersibility, the acrylic dispersant preferably has a repeating unit represented by the following general formula (V) (hereinafter sometimes referred to as "repeating unit (V)").

[0214]

[0215] In formula (V), R 31 ~R 33 are each independently a hydrogen atom, an alkyl group optionally having a substituent, an aryl group optionally having a substituent, or an aralkyl group optionally having a substituent, and R 31 ~R 33 Two or more of R may be bonded to each other to form a ring structure. 34 is a hydrogen atom or a methyl group. X is a divalent linking group, Y - as counter anion.

[0216] R of formula (V) 31 ~R 33 The alkyl group optionally having a substituent may be any of a straight chain or a branched chain. In addition, a cyclic structure such as a cyclohexyl group and a cyclohexylmethyl group may also be included. The number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more, and is preferably 10 or less, more preferably 6 or less, further preferably 4 or less, and particularly preferably 2 or less. For example, it is preferably 1 to 10, more preferably 1 to 6, further preferably 1 to 4, and particularly preferably 1 to 2.

[0217] Examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl and octyl groups, preferably methyl, ethyl, propyl, butyl, pentyl and hexyl groups, more preferably methyl, ethyl, propyl and butyl groups, and further preferably methyl and ethyl groups.

[0218] R of formula (V) 31 ~R 33 The carbon number of the aryl group which may have a substituent is not particularly limited, but is preferably 6 or more, and preferably 16 or less, and more preferably 12 or less. For example, it is preferably 6 to 16, and more preferably 6 to 12. Examples of the aryl group include phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethylphenyl, naphthyl, and anthracenyl, and are preferably phenyl, methylphenyl, ethylphenyl, dimethylphenyl, and diethylphenyl, and more preferably phenyl, methylphenyl, and ethylphenyl.

[0219] R of formula (V) 31 ~R 33 The carbon number of the aralkyl group which may have a substituent is not particularly limited, but is preferably 7 or more, preferably 16 or less, more preferably 12 or less, further preferably 10 or less, and particularly preferably 8 or less. For example, it is preferably 7 to 16, more preferably 7 to 12, further preferably 7 to 10, and particularly preferably 7 to 8. Examples of the aralkyl group include phenylmethyl, phenylethyl, phenylpropyl, phenylbutyl, and phenylisopropyl, preferably phenylmethyl, phenylethyl, phenylpropyl, and phenylbutyl, and more preferably phenylmethyl and phenylethyl.

[0220] From the perspective of dispersion, R 31 ~R 33 Each is independently preferably an alkyl group or an aralkyl group, R 31 ~R 33 Each independently is preferably methyl or phenylmethyl.

[0221] As Y in formula (V) - For example, Cl - Br - ,I - 、ClO4 - 、BF4 - 、CH3COO - PF - .

[0222] In addition, the aromatic dicarboxylic acid imide anions, aromatic sulfonic acid anions, aromatic phosphonic acid anions, and aromatic carboxylic acid anions described in International Publication No. 2018 / 079659; and the alkyl sulfate anions and alkyl sulfonic acid anions described in International Publication No. 2019 / 107020 can also be suitably used.

[0223] As Y - From the viewpoint of the development form, Cl - From the viewpoint of light emitting properties, an alkylsulfonic acid anion is preferred.

[0224] When the polymer dispersant has a tertiary amine as a functional group, it preferably has a repeating unit represented by the following general formula (VI) (hereinafter sometimes referred to as "repeating unit (VI)") from the viewpoint of dispersibility and light emitting properties.

[0225]

[0226] In formula (VI), R 35 and R 36 are each independently a hydrogen atom, an alkyl group optionally having a substituent, an aryl group optionally having a substituent, or an aralkyl group optionally having a substituent, and R 35 and R 36 Optionally, they are bonded to each other to form a ring structure. 37 is a hydrogen atom or a methyl group. Z is a divalent linking group.

[0227] As R of formula (VI) 35 and R 36 The alkyl group optionally having a substituent in the formula (V) may preferably be 31 ~R 33 The groups exemplified.

[0228] As R of formula (VI) 35 and R 36 The aryl group optionally having a substituent may preferably be R 31 ~R 33 The groups exemplified.

[0229] As R of formula (VI) 35 and R 36 The aralkyl group optionally having a substituent may preferably be R 31 ~R 33 The groups exemplified.

[0230] From the perspective of dispersibility and luminescence properties, R 35 and R 36 Preferably, each independently is an alkyl group which may have a substituent, and more preferably a methyl group or an ethyl group.

[0231] As R of formula (V) 31 ~R 33 and R of formula (VI) 35 and R 36 Examples of the substituent that the alkyl group, aralkyl group or aryl group in the group may have include a halogen atom, an alkoxy group, a benzoyl group and a hydroxyl group.

[0232] Examples of X in formula (V) and Z in formula (VI) include an alkylene group having 1 to 10 carbon atoms, an arylene group having 6 to 12 carbon atoms, and -CONH-R43 -base, -COOR 44 -base (where R 43 and R 44 is a single bond, an alkylene group having 1 to 10 carbon atoms, or an ether group (alkoxyalkyl group) having 2 to 10 carbon atoms, preferably -COO-R 44 - group, more preferably -COO-C2H4- group.

[0233] From the viewpoint of dispersibility, it is preferred to have a repeating unit (V), and further from the viewpoint of light-emitting properties, it is preferred to have a repeating unit (V) and a repeating unit (VI).

[0234] The content ratio of the repeating unit (V) in the total repeating units of the dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 1 mol% or more, more preferably 3 mol% or more, further preferably 5 mol% or more, and particularly preferably 8 mol% or more. In addition, it is preferably 50 mol% or less, more preferably 30 mol% or less, further preferably 20 mol% or less, and particularly preferably 15 mol% or less.

[0235] The content ratio of the repeating unit (VI) in the total repeating units of the dispersant is not particularly limited, but from the viewpoint of dispersibility, it is preferably 5 mol% or more, more preferably 10 mol% or more, further preferably 15 mol% or more, and particularly preferably 20 mol% or more. In addition, it is preferably 60 mol% or less, more preferably 40 mol% or less, further preferably 30 mol% or less, and particularly preferably 25 mol% or less.

[0236] From the viewpoint of improving compatibility with alkali-soluble resin components such as solvents and improving dispersion stability, the acrylic dispersant preferably has a repeating unit represented by the following general formula (VII) (hereinafter sometimes referred to as "repeating unit (VII)").

[0237]

[0238] In formula (VII), R 40 is ethylene or propylene, R 41 is an alkyl group optionally having a substituent, R 42 is a hydrogen atom or a methyl group. n is an integer of 1 to 20.

[0239] R of formula (VII) 41The alkyl group optionally having a substituent may be any of a straight chain or a branched chain. In addition, a cyclic structure such as a cyclohexyl group and a cyclohexylmethyl group may be included. The carbon number of the alkyl group is not particularly limited, but is preferably 1 or more, and more preferably 2 or more. In addition, it is preferably 10 or less, more preferably 6 or less, and further preferably 4 or less. Examples of the alkyl group include methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl, and octyl groups, preferably methyl, ethyl, propyl, butyl, pentyl, and hexyl groups, and more preferably methyl, ethyl, propyl, and butyl groups.

[0240] From the viewpoint of compatibility and dispersibility with alkali-soluble resin components such as solvents, n in formula (VII) is preferably 1 or more, more preferably 2 or more. In addition, it is preferably 10 or less, more preferably 5 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 2 to 5.

[0241] The content ratio of the repeating unit (VII) in all the repeating units of the dispersant is not particularly limited, but is preferably 1 mol% or more, more preferably 2 mol% or more, and further preferably 4 mol% or more. In addition, it is preferably 30 mol% or less, more preferably 20 mol% or less, and further preferably 10 mol% or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 1 to 30 mol%, more preferably 2 to 20 mol%, and further preferably 4 to 10 mol%. When within the above range, there is a tendency to easily take into account the compatibility and dispersion stability of alkali-soluble resin components such as solvents.

[0242] From the viewpoint of improving the compatibility of the dispersant with the alkali-soluble resin component such as the solvent and improving dispersion stability, the acrylic dispersant preferably has a repeating unit represented by the following general formula (VIII) (hereinafter sometimes referred to as "repeating unit (VIII)").

[0243]

[0244] In formula (VIII), R 38 R is an alkyl group which may have a substituent, an aryl group which may have a substituent, or an aralkyl group which may have a substituent. 39 A hydrogen atom or a methyl group.

[0245] R of formula (VIII) 38The alkyl group optionally having a substituent may be any of a straight chain or a branched chain. In addition, a cyclic structure such as a cyclohexyl group and a cyclohexylmethyl group may be included. The number of carbon atoms in the alkyl group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and further preferably 4 or more. In addition, it is preferably 10 or less, and more preferably 8 or less. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, a heptyl group, an octyl group, and a 2-ethylhexyl group, preferably a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, a hexyl group, and a 2-ethylhexyl group, and more preferably a methyl group, an ethyl group, a propyl group, a butyl group, and a 2-ethylhexyl group.

[0246] R of formula (VIII) 38 The carbon number of the aryl group which may have a substituent is not particularly limited, but is preferably 6 or more. In addition, it is preferably 16 or less, more preferably 12 or less, and further preferably 8 or less. For example, it is preferably 6 to 16, more preferably 6 to 12, and further preferably 6 to 8. Examples of the aryl group include phenyl, methylphenyl, ethylphenyl, dimethylphenyl, diethylphenyl, naphthyl, and anthracenyl, preferably phenyl, methylphenyl, ethylphenyl, dimethylphenyl, and diethylphenyl, and more preferably phenyl, methylphenyl, and ethylphenyl.

[0247] R of formula (VIII) 38 The carbon number of the aralkyl group which may have a substituent is not particularly limited, but is preferably 7 or more, and preferably 16 or less, more preferably 12 or less, and further preferably 10 or less. For example, it is preferably 7 to 16, more preferably 7 to 12, and further preferably 7 to 10. Examples of the aralkyl group include phenylmethyl, phenylethyl, phenylpropyl, phenylbutyl, and phenylisopropyl, preferably phenylmethyl, phenylethyl, phenylpropyl, or phenylbutyl, and more preferably phenylmethyl or phenylethyl.

[0248] From the viewpoint of solvent compatibility and dispersion stability, R 38 It is an alkyl group or an aralkyl group, and more preferably a methyl group, an ethyl group, a butyl group, a 2-ethylhexyl group or a phenylmethyl group.

[0249] As R 38 Examples of the substituents that the alkyl group in R may have include a halogen atom and an alkoxy group. Examples of the substituents that the aryl group or the aralkyl group may have include a chain alkyl group, a halogen atom, and an alkoxy group. 38 The chain alkyl group shown includes both linear and branched ones.

[0250] From the viewpoint of dispersibility, the content ratio of the repeating unit (VIII) in all the repeating units of the dispersant is preferably 30 mol% or more, more preferably 40 mol% or more, and further preferably 50 mol% or more. In addition, it is preferably 80 mol% or less, and more preferably 70 mol% or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 30 to 80 mol%, more preferably 40 to 80 mol%, and further preferably 50 to 70 mol%.

[0251] The acrylic dispersant may have repeating units other than the repeating unit (V), the repeating unit (VI), the repeating unit (VII) and the repeating unit (VIII). Examples of such repeating units include: repeating units derived from styrene monomers such as styrene and α-methylstyrene; (meth)acrylate monomers such as (meth)acryloyl chloride; (meth)acrylamide monomers such as (meth)acrylamide and N-methylolacrylamide; and monomers such as vinyl acetate, acrylonitrile, allyl glycidyl ether, crotonic acid glycidyl ether and N-methacryloylmorpholine.

[0252] From the viewpoint of further improving dispersibility, the acrylic dispersant is preferably a block copolymer comprising an A block having repeating units (V) and repeating units (VI) and a B block not having repeating units (V) and repeating units (VI). The block copolymer is preferably an AB block copolymer or a BAB block copolymer. By introducing not only a quaternary ammonium group but also a tertiary amino group into the A block, unexpectedly, the dispersing ability of the dispersant tends to be significantly improved. In addition, the B block preferably has a repeating unit (VII), and more preferably also has a repeating unit (VIII).

[0253] In the A block, the repeating unit (V) and the repeating unit (VI) may be contained in any form of random copolymerization or block copolymerization. In addition, the repeating unit (V) and the repeating unit (VI) may each contain two or more types in one A block, in which case, each repeating unit may be contained in the A block in any form of random copolymerization or block copolymerization.

[0254] The A block may contain repeating units other than the repeating units (V) and (VI), and examples of such repeating units include repeating units derived from the aforementioned (meth)acrylate monomers. The content of repeating units other than the repeating units (V) and (VI) in the A block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, and it is particularly preferred that the A block does not contain such repeating units.

[0255] The B block may also contain repeating units other than the repeating units (VII) and (VIII). Examples of such repeating units include: repeating units derived from styrene monomers such as styrene and α-methylstyrene; (meth)acrylate monomers such as (meth)acryloyl chloride; (meth)acrylamide monomers such as N-methylolacrylamide; and monomers such as vinyl acetate, acrylonitrile, allyl glycidyl ether, crotonic acid glycidyl ether, and N-methylacryloylmorpholine. The content of repeating units other than the repeating units (VII) and (VIII) in the B block is preferably 0 to 50 mol%, more preferably 0 to 20 mol%, and it is particularly preferred that the B block does not contain such repeating units.

[0256] These acrylic dispersants can be used alone or in combination of two or more.

[0257] <(C) Alkali-soluble resin>

[0258] The photosensitive colored resin composition of the present invention contains (C) an alkali-soluble resin. The (C) alkali-soluble resin contains a resin (C1) having a structural unit represented by the following general formula (1).

[0259]

[0260] In formula (1), R 1 represents a hydrogen atom or a methyl group.

[0261] R 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0262] L represents an alkylene group having 2 to 6 carbon atoms and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent.

[0263] * Each represents a connecting key.

[0264] The resin (C1) has high affinity for the pigment and contains a methylene group in the main chain, which makes it flexible enough to follow the pigment, and thus tends to show high pigment dispersibility. In addition, the resin (C1) contains a large number of aromatic rings in the main chain, so in the photosensitive color resin composition, the developer resistance during development is high, and the heat resistance during baking is high, so there is a tendency for the residual film rate to become high. When the residual film rate is high, there is a tendency to prevent the decomposition products, by-products, uncured materials, etc. in the composition from remaining or re-attaching to the electrode (anode).

[0265] Furthermore, when an organic electroluminescent element is formed using a partition obtained by curing a photosensitive colored resin composition, the residue and re-adherence on the anode are reduced, thereby reducing the accumulation in the pixel portion. In the organic electroluminescent element, there is a tendency that the current density when a voltage is applied becomes higher and the brightness of the light-emitting element is improved.

[0266] (R 2 )

[0267] R in formula (1) 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0268] From the viewpoint of solvent solubility, R 2 The carbon number of the alkyl group in is preferably 1 or more, and is preferably 3 or less, and more preferably 2 or less.

[0269] The alkyl group may be straight chain or branched. Examples thereof include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, and tert-butyl. From the viewpoint of dispersibility, a methyl group is preferred.

[0270] (L)

[0271] L represents an alkylene group having 2 to 6 carbon atoms and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent.

[0272] L preferably has 3 or more carbon atoms, and more preferably has 4 carbon atoms. It is also preferably 5 or less. For example, it may be 3 to 6, 3 to 5, 4 to 6, or 4 to 5.

[0273] L has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent, and may be further substituted with a methoxy group or an ethoxy group.

[0274] Here, the polybasic acid refers to the polybasic acid listed in the polybasic acid residue described later. In addition, the ester group of a hydroxyl group and a polybasic acid refers to a group in which the hydroxyl group bonded to L and the polybasic acid form an ester.

[0275] Among the structural units of the formula (1), the structural units having the following general formula (2) are preferred.

[0276]

[0277] (In formula (2), A represents a hydrogen atom or a polyacid residue.

[0278] R 1 represents a hydrogen atom or a methyl group.

[0279] R 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0280] *Each represents a connection key. )

[0281] (A)

[0282] A in formula (1) represents a hydrogen atom or a polyacid residue.

[0283] The polyacid residue refers to a monovalent or divalent group obtained by removing one or two OH groups from a polyacid. Examples of the polyacid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.

[0284] Among these, maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid are preferred from the viewpoint of dispersion stability, and phthalic acid, succinic acid, trimellitic acid, and pyromellitic acid are more preferred.

[0285] Particularly when the acid value is the same, trimellitic acid is preferred because the number of hydroxyl groups having high solvent affinity is relatively increased compared to the polybasic acid residue.

[0286] (R 1 )

[0287] R in formula (1) 1 represents a hydrogen atom or a methyl group. From the viewpoint of curability, a hydrogen atom is preferred.

[0288] (R 2 )

[0289] R in formula (1) 2 Each independently represents an alkyl group having 1 to 4 carbon atoms.

[0290] From the viewpoint of solvent solubility, R 2 The carbon number of the alkyl group in is preferably 1 or more, and is preferably 3 or less, and more preferably 2 or less.

[0291] The alkyl group may be straight chain or branched. Examples thereof include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, sec-butyl, and tert-butyl. From the viewpoint of dispersibility, a methyl group is preferred.

[0292] The partial structure represented by formula (1) contained in the resin (C1) may be one kind or two or more kinds. For example, a structure in which A is a hydrogen atom and a structure in which A is a polyacid residue may be present in mixture.

[0293] Examples of the resin (C1) include structures represented by the following general formulae (C1-1) to (C1-8).

[0294]

[0295]

[0296]

[0297] As the resin (C1), from the viewpoint of dispersion stability, structures represented by formula (C1-1), formula (C1-3), formula (C1-7), and formula (C1-8) are preferred.

[0298] The acid value of resin (C1) is not particularly limited, but is preferably 10 mgKOH / g or more, more preferably 30 mgKOH / g or more, further preferably 40 mgKOH / g or more, and further preferably 50 mgKOH / g or more. In addition, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, further preferably 100 mgKOH / g or less, and particularly preferably 80 mgKOH / g or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 10 to 200 mgKOH / g, more preferably 30 to 150 mgKOH / g, further preferably 40 to 100 mgKOH / g, and further preferably 50 to 80 mgKOH / g. By setting it above the aforementioned lower limit, there is a tendency that the developing solubility is improved and the resolution becomes good. By setting it below the aforementioned upper limit, there is a tendency that the residual film rate becomes good.

[0299] The method for producing the resin (C1) is not particularly limited, and the resin (C1) can be obtained by, for example, adding (meth)acrylic acid to an epoxy resin represented by the following general formula (1-2), and further reacting the epoxy resin with a polybasic acid and / or anhydride thereof.

[0300]

[0301] R in formula (1-2) 2 and * have the same meanings as in formula (1).

[0302] Examples of the epoxy resin represented by formula (1-2) include the following epoxy resins.

[0303]

[0304] In the above formula, m represents an integer of 2-8.

[0305] As a method for adding (meth)acrylic acid to the epoxy resin represented by formula (1-2), a known method can be used. For example, the epoxy resin and (meth)acrylic acid can be reacted at a temperature of 50 to 150° C. in the presence of an esterification catalyst. As the esterification catalyst used here, for example, tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine, and benzyldiethylamine; and quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride, and dodecyltrimethylammonium chloride can be used.

[0306] Examples of the polybasic acid and / or its anhydride include the above-mentioned polybasic acids and / or its anhydride. The addition reaction of the polybasic acid and / or its anhydride can be performed using a known method.

[0307] The photosensitive colored resin composition used in the present invention may contain (C) an alkali-soluble resin other than the resin (C1). There is no particular limitation as long as the resin is alkali-soluble, and examples thereof include resins containing carboxyl groups or hydroxyl groups, and more specifically, examples thereof include epoxy (meth) acrylate resins, acrylic resins, carboxyl-containing epoxy resins, carboxyl-containing urethane resins, novolac resins, polyvinylphenol resins, and isocyanuric acid skeleton-containing resins. As (C) alkali-soluble resins other than the resin (C1), the following resins can be preferably used from the viewpoint of excellent platemaking properties.

[0308] (C2) Epoxy (meth)acrylate resin

[0309] (C3) Resin containing isocyanuric acid skeleton

[0310] (C4) Acrylic copolymer resin

[0311] These can be used alone or in combination of two or more.

[0312] <(C2) Epoxy (meth)acrylate resin>

[0313] The (C2) epoxy (meth) acrylate resin in the present invention is an alkali-soluble resin (C) other than the resin (C1), and is a resin obtained by further reacting a hydroxyl group generated by a reaction of an epoxy compound (epoxy resin) with an α,β-unsaturated monocarboxylic acid and / or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group in the ester portion with a compound having two or more substituents that can react with the hydroxyl group, such as a polybasic acid and / or an anhydride thereof. However, the (C3) isocyanuric acid skeleton-containing resin described later is not included.

[0314] The (C2) epoxy (meth)acrylate resin includes a resin obtained by reacting a compound having two or more substituents reactive with a hydroxyl group before reacting the polybasic acid and / or its anhydride with the hydroxyl group and then reacting the polybasic acid and / or its anhydride.

[0315] From the viewpoint of the residual film ratio, degassing, and platemaking properties, it is preferred that the alkali-soluble resin further contains (C2) an epoxy (meth)acrylate resin in addition to the resin (C1).

[0316] A resin obtained by reacting the carboxyl group of the resin obtained by the above reaction with a compound having a further reactive functional group is also included in the (C2) epoxy (meth)acrylate resin.

[0317] Epoxy (meth)acrylate resins do not substantially have epoxy groups in their chemical structures and are not limited to "(meth)acrylates". However, since epoxy compounds (epoxy resins) are raw materials and "(meth)acrylates" are representative examples, they are conventionally named as such.

[0318] As the (C2) epoxy (meth)acrylate resin used in the present invention, from the viewpoint of developability and reliability, the following epoxy (meth)acrylate resin (C2-1) and / or epoxy (meth)acrylate resin (C2-2) (hereinafter sometimes referred to as "carboxyl group-containing epoxy (meth)acrylate resin") are preferably used.

[0319] As the epoxy (meth)acrylate resin (C2), a resin having an aromatic ring in the main chain can be more preferably used from the viewpoint of outgassing.

[0320] <Epoxy (meth)acrylate resin (C2-1)>

[0321] An alkali-soluble resin obtained by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin and further reacting the epoxy resin with a polybasic acid and / or an anhydride thereof.

[0322] <Epoxy (meth)acrylate resin (C2-2)>

[0323] An alkali-soluble resin obtained by adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin and further reacting the epoxy resin with a polyol and a polybasic acid and / or an anhydride thereof.

[0324] Here, epoxy resin refers to also comprising the raw material compound before forming the resin by thermosetting, and as this epoxy resin, can be suitably selected from known epoxy resin to use.In addition, epoxy resin can use the compound obtained by making phenolic compound and epihalohydrin react.As phenolic compound, preferably have the compound of binary or more than binary phenolic hydroxyl group, can be monomer also can be polymer.

[0325] As the type of epoxy resin that becomes the raw material, for example, cresol novolac type epoxy resin, phenol novolac type epoxy resin, bisphenol A type epoxy resin, bisphenol F type epoxy resin, trisphenol methane type epoxy resin, biphenyl novolac type epoxy resin, naphthol novolac type epoxy resin, epoxy resin that is a reaction product of a polyaddition reaction product of dicyclopentadiene and phenol or cresol and an epihalohydrin, epoxy resin containing an adamantyl group, and fluorene type epoxy resin can be suitably used, and epoxy resins having an aromatic ring in the main chain can be more suitably used.

[0326] As the epoxy resin, for example, bisphenol A type epoxy resin (for example, "jER (registered trademark, hereinafter the same) 828", "jER1001", "jER1002", "jER1004", etc. manufactured by Mitsubishi Chemical Corporation), epoxy resin obtained by reaction of alcoholic hydroxyl group of bisphenol A type epoxy resin with epichlorohydrin (for example, "NER-1302" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent 323, softening point 76° C.)), bisphenol F type resin (for example, "jER 807", "EP-4001", "EP-4002", "EP-4004", etc.), epoxy resins obtained by the reaction of alcoholic hydroxyl groups of bisphenol F type epoxy resins with epichlorohydrin (e.g., "NER-7406" manufactured by Nippon Kayaku Co., Ltd. (epoxy equivalent 350, softening point 66°C)), bisphenol S type epoxy resins, biphenyl glycidyl ether (e.g., "YX-4000" manufactured by Mitsubishi Chemical Corporation), phenol novolac type epoxy resins (e.g., "EPPN-201" manufactured by Nippon Kayaku Co., Ltd., "EP-152", "EP-154" manufactured by Mitsubishi Chemical Corporation, Dow Chemical Company ), (o-, m-, p-) cresol novolac type epoxy resins (e.g., "EOCN (registered trademark, hereinafter the same) -102S", "EOCN-1020", "EOCN-104S" manufactured by Nippon Kayaku Co., Ltd.), trisphenol methane type epoxy resins (e.g., "EPPN (registered trademark, hereinafter the same) -501", "EPPN-502", "EPPN-503" manufactured by Nippon Kayaku Co., Ltd.), alicyclic epoxy resins ("CELLOXIDE (registered trademark, hereinafter the same) 2021P", "CELLOXIDE EHPE" manufactured by Daicel Corporation), epoxy resins obtained by glycidylating a phenolic resin obtained by reacting dicyclopentadiene with phenol (e.g., "EXA-7200" manufactured by DIC Corporation, "NC-7300" manufactured by Nippon Kayaku Co., Ltd.), and epoxy resins represented by the following general formulas (C2α) to (C2δ). Specifically, for example, as the epoxy resin represented by the following general formula (C2α), "XD-1000" manufactured by Nippon Kayaku Co., Ltd. can be listed, as the epoxy resin represented by the following general formula (C2β), "NC-3000" and "NC-3500" manufactured by Nippon Kayaku Co., Ltd. can be listed, as the epoxy resin represented by the following general formula (C2γ), "E-201" manufactured by Osaka Organic Chemical Industry Co., Ltd. can be listed, and as the epoxy resin represented by the following general formula (C2δ), "ESF-300" manufactured by Nippon Steel & Sumigin Chemical Corporation can be listed.

[0327]

[0328] In formula (C2α), a is an average value, representing a number from 0 to 10, and R 111Each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group or a biphenyl group. 111 Each are optionally the same as or different from each other.

[0329]

[0330] In the formula (C2β), b1 and b2 are average values, each independently representing a number from 0 to 10, and R 121 Each independently represents a hydrogen atom, a halogen atom, an alkyl group having 1 to 8 carbon atoms, a cycloalkyl group having 3 to 10 carbon atoms, a phenyl group, a naphthyl group or a biphenyl group. 121 Each are optionally the same as or different from each other.

[0331]

[0332] In the formula (C2γ), X represents a linking group represented by the following general formula (C2γ-1) or (C2γ-2).

[0333] The molecular structure contains one or more adamantane structures. c represents 2 or 3.

[0334]

[0335] In formula (C2γ-1) and (C2γ-2), R 131 ~R 134 and R 135 ~R 137 Each independently represents an adamantyl group which may have a substituent, a hydrogen atom, an alkyl group having 1 to 12 carbon atoms which may have a substituent, or a phenyl group which may have a substituent, and * represents a bond.

[0336]

[0337] In the formula (C2δ), p and q each independently represent an integer of 0 to 4, and R 141 and R 142 Each independently represents an alkyl group having 1 to 4 carbon atoms or a halogen atom, and R 143 and R 144 Each independently represents an alkylene group having 1 to 4 carbon atoms, and x and y each independently represent an integer greater than or equal to 0.

[0338] As the epoxy resin, an epoxy resin represented by any of the formulas (C2α) to (C2δ) is preferably used.

[0339] Examples of the α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group include: (meth)acrylic acid, crotonic acid, o-vinylbenzoic acid, m-vinylbenzoic acid or p-vinylbenzoic acid, monocarboxylic acids such as (meth)acrylic acid substituted with halogenated alkyl, alkoxy, halogen, nitro or cyano groups at the α-position; 2-(meth)acryloyloxyethylsuccinic acid, 2-(meth)acryloyloxyethyladipic acid, 2-(meth)acryloyloxyethylphthalic acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, 2-(meth)acryloyloxyethylmaleic acid, 2-(meth)acryloyloxypropylsuccinic acid, 2-(meth)acryloyloxypropyladipic acid, 2-(meth)acryloyloxypropyltetrahydrophthalic acid Acid, 2-(meth)acryloxypropylphthalic acid, 2-(meth)acryloxypropylmaleic acid, 2-(meth)acryloxybutylsuccinic acid, 2-(meth)acryloxybutyladipic acid, 2-(meth)acryloxybutylhydrophthalic acid, 2-(meth)acryloxybutylphthalic acid, 2-(meth)acryloxybutylmaleic acid; a monomer of a product obtained by adding lactones such as ε-caprolactone, β-propiolactone, γ-butyrolactone, and δ-valerolactone to (meth)acrylic acid; or a monomer obtained by adding succinic acid (anhydride), phthalic acid (anhydride), maleic acid (anhydride), and the like to hydroxyalkyl (meth)acrylates and pentaerythritol tri(meth)acrylates; (meth)acrylic acid dimer. From the viewpoint of sensitivity, (meth)acrylic acid is preferred.

[0340] As a method for adding α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group to epoxy resin, a known method can be used. For example, α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group can be reacted with epoxy resin at a temperature of 50 to 150°C in the presence of an esterification catalyst. As the esterification catalyst used here, for example, tertiary amines such as triethylamine, trimethylamine, benzyldimethylamine, benzyldiethylamine, etc.; quaternary ammonium salts such as tetramethylammonium chloride, tetraethylammonium chloride, dodecyltrimethylammonium chloride, etc. can be used.

[0341] Each component of the epoxy resin, the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group, and the esterification catalyst may be used alone or in combination of two or more.

[0342] The amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group is preferably 0.5 to 1.2 equivalents, and more preferably 0.7 to 1.1 equivalents relative to 1 equivalent of epoxy group of the epoxy resin. By setting the amount of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group to be above the aforementioned lower limit, it is possible to suppress the insufficient amount of unsaturated group introduction, and there is a tendency to facilitate the subsequent reaction with polyacids and / or their anhydrides to be sufficient. By setting it below the aforementioned upper limit, it is possible to suppress the unreacted product of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group from remaining, and it is confirmed that it is easy to make the curing characteristics good.

[0343] Examples of the polybasic acid and / or its anhydride include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid, and anhydrides thereof.

[0344] Preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, and anhydrides thereof. Particularly preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, and anhydrides thereof.

[0345] The addition reaction of the polyacid and / or its anhydride can be carried out using a known method, and the target product can be obtained by continuing the reaction under the same conditions as the addition reaction of α,β-unsaturated monocarboxylic acid or α,β-unsaturated monocarboxylic acid ester having a carboxyl group to epoxy resin. The addition amount of the polyacid and / or its anhydride component is preferably an addition amount that reaches an acid value of 10 to 150 mgKOH / g for the generated carboxyl-containing epoxy (meth) acrylate resin, and more preferably an addition amount that reaches 20 to 140 mgKOH / g. By setting it to above the aforementioned lower limit, there is a tendency for alkali developability to become good. By setting it to below the aforementioned upper limit, there is a tendency for curing performance to become good.

[0346] In the addition reaction of the polyacid and / or its anhydride, a polyfunctional alcohol (polyol) such as trimethylolpropane, ditrimethylolpropane, pentaerythritol, dipentaerythritol, trimethylolethane, 1,2,3-propanetriol, etc. can be added to introduce a multi-branched structure. In this case, there is no particular restriction on the mixing order of the polyacid and / or its anhydride and the polyfunctional alcohol. By heating, the polyacid and / or its anhydride react with any hydroxyl group present in the mixture of the reactant of the epoxy resin and the α,β-unsaturated monocarboxylic acid or the α,β-unsaturated monocarboxylic acid ester having a carboxyl group and the polyfunctional alcohol.

[0347] By using a polyol, there is a tendency to increase the molecular weight of the epoxy (meth)acrylate resin (C2), introduce branches into the molecule, and achieve a balance between the molecular weight and the viscosity. There is also a tendency to increase the introduction rate of acid groups into the molecule, making it easier to achieve a balance between sensitivity and adhesion.

[0348] Examples of the carboxyl group-containing epoxy (meth)acrylate resin include, in addition to the above-described ones, those described in Korean Patent Publication No. 10-2013-0022955.

[0349] The weight average molecular weight (Mw) of the carboxyl-containing epoxy (meth) acrylate resin measured by gel permeation chromatography (GPC) in terms of polystyrene is preferably 1000 or more, more preferably 1500 or more, further preferably 2000 or more, further preferably 3000 or more, further preferably 4000 or more, and particularly preferably 5000 or more. In addition, it is preferably 30000 or less, more preferably 20000 or less, and further preferably 15000 or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 1000 to 30000, more preferably 1500 to 20000, further preferably 1500 to 15000, and further preferably 2000 to 15000. By setting it to above the aforementioned lower limit, there is a tendency to suppress the solubility in the developer from becoming too high. By setting it to below the aforementioned upper limit, there is a tendency to easily make the solubility in the developer good.

[0350] The acid value of the carboxyl-containing epoxy (meth) acrylate resin is not particularly limited, but is preferably 20 mgKOH / g or more, more preferably 40 mgKOH / g or more, further preferably 60 mgKOH / g or more, further preferably 80 mgKOH / g or more, and particularly preferably 100 mgKOH / g or more. In addition, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, further preferably 130 mgKOH / g or less, and particularly preferably 120 mgKOH / g or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 20 to 200 mgKOH / g, more preferably 60 to 150 mgKOH / g, further preferably 80 to 130 mgKOH / g, and further preferably 100 to 130 mgKOH / g. By setting it to the above lower limit value or more, there is a tendency that the developing solubility is improved and the resolution becomes good. By setting it to the above upper limit value or less, there is a tendency that the residual film rate of the photosensitive coloring resin composition becomes good.

[0351] The chemical structure of the (C2) epoxy (meth)acrylate resin is not particularly limited. From the viewpoint of developability and reliability, it is preferably an epoxy (meth)acrylate resin having a partial structure represented by the following general formula (C2-I) (hereinafter, sometimes referred to as "(C2-I) epoxy (meth)acrylate resin") and / or an epoxy (meth)acrylate resin having a partial structure represented by the following general formula (C2-II) (hereinafter, sometimes referred to as "(C2-II) epoxy (meth)acrylate resin").

[0352]

[0353] In formula (C2-I), R 11 represents a hydrogen atom or a methyl group, R 12 represents a divalent hydrocarbon group which may have a substituent, k represents 1 or 2, and * represents a connecting bond.

[0354] The benzene ring in formula (C2-I) may be further substituted by any substituent.

[0355]

[0356] In formula (C2-II), R 13 Each independently represents a hydrogen atom or a methyl group, R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, R 15 and R 16 Each independently represents a divalent aliphatic group which may have a substituent, m and n each independently represent an integer of 0 to 2, and * represents a connecting bond.

[0357] <(C2-I) Epoxy (meth)acrylate resin>

[0358]

[0359] In formula (C2-I), R 11 represents a hydrogen atom or a methyl group, R 12 represents a divalent hydrocarbon group which may have a substituent, k represents 1 or 2, and * represents a connecting bond.

[0360] The benzene ring in formula (C2-I) may be further substituted by any substituent.

[0361] (R 12 )

[0362] In formula (C2-I), R 12 It represents a divalent hydrocarbon group which may have a substituent.

[0363] Examples of the divalent hydrocarbon group include a divalent aliphatic group, a divalent aromatic ring group, and a group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked.

[0364] Examples of the divalent aliphatic group include linear, branched, and cyclic aliphatic groups. From the viewpoint of development solubility, linear aliphatic groups are preferred. On the other hand, from the viewpoint of reducing the penetration of the developer into the exposed portion, cyclic aliphatic groups are preferred. The number of carbon atoms is preferably 1 or more, more preferably 3 or more, and further preferably 6 or more. In addition, it is preferably 20 or less, more preferably 15 or less, and further preferably 10 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 20, more preferably 1 to 15, and further preferably 1 to 10. By setting it above the aforementioned lower limit, it is easy to obtain a firm film, and there is a tendency that the surface roughness generated during development is not easily generated, and the adhesion to the substrate becomes good. By setting it below the aforementioned upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0365] Examples of the divalent straight-chain aliphatic group include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, an n-pentylene group, an n-hexylene group, and an n-heptylene group. From the viewpoint of rigidity of the skeleton, a methylene group is preferred.

[0366] Examples of the divalent branched aliphatic group include a structure in which the divalent linear aliphatic group has, for example, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, or a tert-butyl group as a side chain.

[0367] The number of rings of the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, and more preferably 2 or more. In addition, it is preferably 12 or less, and more preferably 10 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 12, more preferably 1 to 10, and further preferably 2 to 10. By setting it to be above the above lower limit, a strong film is formed, and there is a tendency that the substrate adhesion becomes good. By setting it to be below the above upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0368] Examples of the divalent cyclic aliphatic group include groups obtained by removing two hydrogen atoms from a ring such as a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, a dicyclopentadiene ring, a dicyclopentane ring, etc. From the viewpoint of rigidity of the skeleton, groups obtained by removing two hydrogen atoms from a dicyclopentadiene ring, a dicyclopentane ring, or an adamantane ring are preferred.

[0369] Examples of the substituent that the divalent aliphatic group may have include alkoxy groups having 1 to 5 carbon atoms, such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

[0370] As the divalent aromatic ring group, a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group can be listed. The carbon number is not particularly limited, but is preferably 4 or more, more preferably 5 or more, and further preferably 6 or more. In addition, it is preferably 20 or less, more preferably 15 or less, and further preferably 10 or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 4 to 20, more preferably 5 to 15, and further preferably 6 to 10. By setting it to above the aforementioned lower limit, it is easy to obtain a firm film, and there is a tendency that the surface roughness generated during development is not easy to occur, and the adhesion to the substrate becomes good. By setting it to below the aforementioned upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0371] The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a monocyclic ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzopyrene ring, Ring, triphenylene ring, acenaphthene ring, fluoranthene ring, fluorene ring.

[0372] The aromatic heterocyclic ring in the divalent aromatic heterocyclic group may be a monocyclic ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, an indole ring, a carbazole ring, a pyrroloimidazole ring, a pyrrolopyrazole ring, a pyrrolopyrrole ring, a thienopyrrole ring, a thienothiophene ring, a furopyrrole ring, a furofuran ring, a thienofuran ring, a benzisoxazole ring, a benzisothiazole ring, a benzimidazole ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cinnoline ring, a quinoxaline ring, a phenanthridine ring, a phenanthridine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring.

[0373] From the viewpoint of patterning characteristics, a benzene ring or a naphthalene ring having two free valences is preferred, and a benzene ring having two free valences is more preferred.

[0374] Examples of the substituent that the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. From the viewpoint of development solubility, it is preferably unsubstituted.

[0375] Examples of the group in which one or more divalent aliphatic groups are linked to one or more divalent aromatic ring groups include groups in which one or more of the aforementioned divalent aliphatic groups are linked to one or more of the aforementioned divalent aromatic ring groups.

[0376] The number of divalent aliphatic groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and preferably 10 or less, more preferably 5 or less, and further preferably 3 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 to 3. By setting it to be above the above lower limit, a strong film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated, and the adhesion to the substrate becomes good. By setting it to be below the above upper limit, the deterioration of sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0377] The number of the divalent aromatic ring groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and preferably 10 or less, more preferably 5 or less, and further preferably 3 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 to 3. By setting it to be above the above lower limit, it is easy to obtain a strong film, and there is a tendency that the surface roughness generated during development is not easily generated, and the adhesion to the substrate becomes good. By setting it to be below the above upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0378] As a group obtained by connecting one or more divalent aliphatic groups to one or more divalent aromatic ring groups, for example, groups represented by the following formulas (C2-IA) to (C2-IF) can be cited. In the following formulas (C2-IA) to (C2-IF), * represents a connecting bond. From the viewpoint of rigidity of the skeleton and hydrophobization of the membrane, a group represented by the following formula (C2-IA) is preferred.

[0379]

[0380] In formula (C2-I), k represents 1 or 2. From the viewpoint of adhesion and platemaking properties, k is preferably 1. From the viewpoint of sensitivity, k is preferably 2. In addition, (C2-I) epoxy (meth)acrylate may contain both a partial structure in which k is 1 and a partial structure in which k is 2.

[0381] The benzene ring in formula (C2-I) may be further substituted by any substituent.

[0382] Examples of the substituent include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. The number of the substituents is not particularly limited, and may be one or two or more.

[0383] From the viewpoint of platemaking properties, unsubstituted is preferred.

[0384] From the viewpoint of ease of synthesis, the partial structure represented by formula (C2-I) is preferably a partial structure represented by the following general formula (C2-I-1).

[0385]

[0386] In formula (C2-I-1), R 11 , R 12 and k have the same meanings as in formula (C2-I), R X represents a hydrogen atom or a polyacid residue, and * represents a connecting bond.

[0387] The benzene ring in the formula (C2-I-1) may be further substituted by any substituent.

[0388] The polyacid residue refers to a monovalent or divalent group obtained by removing one or two OH groups from a polyacid. Examples of the polyacid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.

[0389] From the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid, and more preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid.

[0390] The benzene ring in the formula (C2-I-1) may be further substituted by any substituent. As the substituent, the groups listed for the benzene ring in the formula (C2-I) can be preferably used.

[0391] The partial structure represented by the formula (C2-I-1) contained in one molecule of the epoxy (meth)acrylate resin (C2-I) may be one or more, for example, R X is the structure of hydrogen atom and R X The structures of polyacid residues are mixed.

[0392] The number of partial structures represented by formula (C2-I) contained in one molecule of the epoxy (meth)acrylate resin (C2-I) is not particularly limited, but is preferably 1 or more, and more preferably 3 or more. In addition, it is preferably 20 or less, and further preferably 15 or less. The above upper and lower limits may be combined arbitrarily. It is preferably 1 to 20, more preferably 1 to 15, and further preferably 3 to 15. By setting it to be above the aforementioned lower limit, a firm film is easily obtained, and there is a tendency that surface roughness generated during development is not easily generated. By setting it to be below the aforementioned upper limit, the deterioration of sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0393] The weight average molecular weight (Mw) of the epoxy (meth) acrylate resin (C2-I) measured by gel permeation chromatography (GPC) in terms of polystyrene is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more, further preferably 2000 or more, further preferably 3000 or more, particularly preferably 4000 or more, most preferably 5000 or more, preferably 30000 or less, more preferably 20000 or less, and further preferably 15000 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1000 to 30000, more preferably 1500 to 2000, further preferably 1500 to 15000, and further preferably 2000 to 1500. By setting it to the above lower limit value or more, there is a tendency that the residual film rate of the photosensitive coloring resin composition becomes good. By setting it to the above upper limit value or less, there is a tendency that the solubility in the developer becomes good.

[0394] The acid value of the epoxy (meth) acrylate resin (C2-I) is not particularly limited, but is preferably 20 mgKOH / g or more, more preferably 40 mgKOH / g or more, further preferably 60 mgKOH / g or more, further preferably 80 mgKOH / g or more, and particularly preferably 100 mgKOH / g or more. In addition, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, further preferably 130 mgKOH / g or less, and particularly preferably 120 mgKOH / g or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 20 to 200 mgKOH / g, more preferably 60 to 150 mgKOH / g, further preferably 80 to 130 mgKOH / g, and further preferably 100 to 130 mgKOH / g. By setting it to the above lower limit value or more, there is a tendency that the developing solubility is improved and the resolution becomes good. By setting it to the above upper limit value or less, there is a tendency that the residual film rate of the photosensitive coloring resin composition becomes good.

[0395] Specific examples of (C2-I) epoxy (meth)acrylate resins are listed below. In addition, * in the examples represents a connecting bond.

[0396]

[0397]

[0398] <(C2-II) Epoxy (meth)acrylate resin>

[0399]

[0400] In formula (C2-II), R 13 Each independently represents a hydrogen atom or a methyl group, R 14 represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain, R 15 and R 16 Each independently represents a divalent aliphatic group which may have a substituent, m and n each independently represent an integer of 0 to 2, and * represents a connecting bond.

[0401] Having a structure of formula (C2-II) is preferred from the viewpoint of light-emitting properties.

[0402] (R 14 )

[0403] In formula (C2-II), R 14 It represents a divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain.

[0404] Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.

[0405] The number of rings of the aliphatic cyclic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. In addition, it is preferably 10 or less, more preferably 5 or less, and further preferably 3 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 to 3. By setting it to be above the above lower limit, a strong film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated. By setting it to be below the above upper limit, the deterioration of sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0406] The carbon number of the aliphatic ring group is not particularly limited, but is preferably 4 or more, more preferably 6 or more, and further preferably 8 or more. In addition, it is preferably 40 or less, more preferably 30 or less, further preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 4 to 40, more preferably 4 to 30, further preferably 6 to 20, and particularly preferably 8 to 15. By setting it to be above the aforementioned lower limit, it is easy to obtain a strong film, and there is a tendency that the surface roughness generated during development is not easy to occur. By setting it to be below the aforementioned upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0407] Examples of the aliphatic ring in the aliphatic cyclic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, and an adamantane ring. From the viewpoint of the residual film rate and resolution of the photosensitive color resin composition, an adamantane ring is preferred.

[0408] The number of rings possessed by the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and further preferably 3 or more. In addition, it is preferably 10 or less, more preferably 5 or less, and further preferably 4 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 4, further preferably 2 to 4, and particularly preferably 3 to 4. By setting it to be above the aforementioned lower limit, a strong film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated. By setting it to be below the aforementioned upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0409] As the aromatic ring group, an aromatic hydrocarbon ring group and an aromatic heterocyclic group can be cited. The number of carbon atoms in the aromatic ring group is not particularly limited, but is preferably 4 or more, more preferably 6 or more, further preferably 8 or more, further preferably 10 or more, and particularly preferably 12 or more. In addition, it is preferably 40 or less, more preferably 30 or less, further preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 4 to 40, more preferably 6 to 40, further preferably 8 to 30, further preferably 10 to 20, and particularly preferably 12 to 15. By setting it to above the aforementioned lower limit, it is easy to obtain a firm film, and there is a tendency that the surface roughness generated during development is not easy to occur. By setting it to below the aforementioned upper limit, there is a tendency that the patterning characteristics become good.

[0410] Examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzopyrene ring, A fluorene ring is preferably a fluorene ring.

[0411] The divalent hydrocarbon group in the divalent hydrocarbon group having a cyclic hydrocarbon group as a side chain is not particularly limited, and examples thereof include a divalent aliphatic group, a divalent aromatic ring group, and a group in which one or more divalent aliphatic groups and one or more divalent aromatic ring groups are linked.

[0412] The divalent aliphatic group may be a linear, branched, or cyclic aliphatic group. From the viewpoint of development solubility, a linear aliphatic group is preferred. On the other hand, from the viewpoint of reducing the penetration of the developer into the exposed portion, a cyclic aliphatic group is preferred. The number of carbon atoms is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and further preferably 6 or more. In addition, it is preferably 25 or less, more preferably 20 or less, and further preferably 15 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 25, more preferably 3 to 20, and further preferably 6 to 15. By setting it to above the aforementioned lower limit, a firm film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated, and the adhesion to the substrate becomes good. By setting it to below the aforementioned upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0413] Examples of the divalent straight-chain aliphatic group include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, an n-pentylene group, an n-hexylene group, and an n-heptylene group. From the viewpoint of rigidity of the skeleton, a methylene group is preferred.

[0414] Examples of the divalent branched aliphatic group include a structure in which the divalent straight-chain aliphatic group has a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group or a tert-butyl group as a side chain.

[0415] The number of rings of the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. In addition, it is preferably 10 or less, more preferably 5 or less, and further preferably 3 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 to 3. By setting it to be above the above lower limit, a strong film is formed, and there is a tendency that the substrate adhesion becomes good. In addition, by setting it to be below the above upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0416] Examples of the divalent cyclic aliphatic group include groups obtained by removing two hydrogen atoms from a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, and an adamantane ring. From the viewpoint of rigidity of the skeleton, a group obtained by removing two hydrogen atoms from an adamantane ring is preferred.

[0417] Examples of the substituent that the divalent aliphatic group may have include alkoxy groups having 1 to 5 carbon atoms, such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

[0418] As the divalent aromatic ring group, a divalent aromatic hydrocarbon ring group and a divalent aromatic heterocyclic group can be listed. The carbon number is not particularly limited, but is preferably 4 or more, more preferably 5 or more, and further preferably 6 or more. In addition, it is preferably 30 or less, more preferably 20 or less, and further preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 4 to 30, more preferably 5 to 20, and further preferably 6 to 15. By setting it to above the aforementioned lower limit, it is easy to obtain a firm film, and there is a tendency that the surface roughness generated during development is not easy to occur, and the adhesion to the substrate becomes good. By setting it to below the aforementioned upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0419] The aromatic hydrocarbon ring in the divalent aromatic hydrocarbon ring group may be a monocyclic ring or a condensed ring. Examples of the divalent aromatic hydrocarbon ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, a perylene ring, a tetracene ring, a pyrene ring, a benzopyrene ring, Ring, triphenylene ring, acenaphthene ring, fluoranthene ring, fluorene ring.

[0420] The aromatic heterocyclic ring in the divalent aromatic heterocyclic group may be a monocyclic ring or a condensed ring. Examples of the divalent aromatic heterocyclic group include a furan ring, a benzofuran ring, a thiophene ring, a benzothiophene ring, a pyrrole ring, a pyrazole ring, an imidazole ring, an oxadiazole ring, an indole ring, a carbazole ring, a pyrroloimidazole ring, a pyrrolopyrazole ring, a pyrrolopyrrole ring, a thienopyrrole ring, a thienothiophene ring, a furopyrrole ring, a furofuran ring, a thienofuran ring, a benzisoxazole ring, a benzisothiazole ring, a benzimidazole ring, a pyridine ring, a pyrazine ring, a pyridazine ring, a pyrimidine ring, a triazine ring, a quinoline ring, an isoquinoline ring, a cinnoline ring, a quinoxaline ring, a phenanthridine ring, a phenanthridine ring, a quinazoline ring, a quinazolinone ring, and an azulene ring. Among these, from the viewpoint of patterning characteristics, a benzene ring and a naphthalene ring having two free valences are preferred, and a benzene ring having two free valences is more preferred.

[0421] Examples of the substituent that the divalent aromatic ring group may have include a hydroxyl group, a methyl group, a methoxy group, an ethyl group, an ethoxy group, a propyl group, and a propoxy group. From the viewpoint of development solubility, it is preferably unsubstituted.

[0422] Examples of the group in which one or more divalent aliphatic groups are linked to one or more divalent aromatic ring groups include groups in which one or more of the aforementioned divalent aliphatic groups are linked to one or more of the aforementioned divalent aromatic ring groups.

[0423] The number of divalent aliphatic groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and further preferably 3 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 to 3. By setting it to be above the above lower limit, a strong film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated, and the adhesion to the substrate becomes good. By setting it to be below the above upper limit, the deterioration of sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0424] The number of the divalent aromatic ring groups is not particularly limited, but is preferably 1 or more, more preferably 2 or more, preferably 10 or less, more preferably 5 or less, and further preferably 3 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 1 to 3, and particularly preferably 2 to 3. By setting it to be above the above lower limit, a strong film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated, and the adhesion to the substrate becomes good. By setting it to be below the above upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0425] As a group obtained by connecting one or more divalent aliphatic groups to one or more divalent aromatic ring groups, for example, groups represented by the above formulae (C2-IA) to (C2-IF) can be cited. From the viewpoint of rigidity of the skeleton and hydrophobization of the membrane, a group represented by formula (C2-IC) is preferred.

[0426] The bonding method of the cyclic hydrocarbon group as a side chain to these divalent hydrocarbon groups is not particularly limited, and examples thereof include a method in which one hydrogen atom of an aliphatic group or an aromatic ring group is substituted by the cyclic hydrocarbon group as a side chain, and a method in which the cyclic hydrocarbon group as a side chain is composed of one carbon atom of an aliphatic group.

[0427] (R 15 , R 16 )

[0428] In formula (C2-II), R 15 and R 16 Each independently represents a divalent aliphatic group which may have a substituent.

[0429] The divalent aliphatic group may be a linear, branched, or cyclic aliphatic group. From the viewpoint of development solubility, a linear aliphatic group is preferred. On the other hand, from the viewpoint of reducing the penetration of the developer into the exposed portion, a cyclic aliphatic group is preferred. The number of carbon atoms is not particularly limited, but is preferably 1 or more, more preferably 3 or more, and further preferably 6 or more. In addition, it is preferably 20 or less, more preferably 15 or less, and further preferably 10 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 20, more preferably 3 to 15, and further preferably 6 to 10. By setting it to above the aforementioned lower limit, a firm film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated, and the adhesion to the substrate becomes good. By setting it to below the aforementioned upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0430] Examples of the divalent straight-chain aliphatic group include a methylene group, an ethylene group, an n-propylene group, an n-butylene group, an n-pentylene group, an n-hexylene group, and an n-heptylene group. From the viewpoint of rigidity of the skeleton, a methylene group is preferred.

[0431] Examples of the divalent branched aliphatic group include a structure in which the divalent linear aliphatic group has, for example, a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, or a tert-butyl group as a side chain.

[0432] The number of rings of the divalent cyclic aliphatic group is not particularly limited, but is preferably 1 or more, and more preferably 2 or more. In addition, it is preferably 12 or less, and more preferably 10 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 12, and more preferably 2 to 10. By setting it to be above the above lower limit, a strong film is formed, and there is a tendency that the substrate adhesion becomes good. By setting it to be below the above upper limit, the deterioration of the sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0433] Examples of the divalent cyclic aliphatic group include groups obtained by removing two hydrogen atoms from a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, an adamantane ring, or a dicyclopentadiene ring. From the viewpoint of rigidity of the skeleton, groups obtained by removing two hydrogen atoms from a dicyclopentadiene ring or an adamantane ring are preferred.

[0434] Examples of the substituent that the divalent aliphatic group may have include alkoxy groups having 1 to 5 carbon atoms, such as methoxy and ethoxy groups; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

[0435] (m, n)

[0436] In formula (C2-II), m and n each independently represent an integer of 0 to 2. By setting it to be above the aforementioned lower limit, there is a tendency that patterning adaptability is good and surface roughness generated during development is not easily generated. In addition, by setting it to be below the aforementioned upper limit, there is a tendency that developability becomes good. From the viewpoint of developability, m and n are preferably 0. From the viewpoint of patterning adaptability and suppression of surface roughness generated during development, m and n are preferably 1 or more.

[0437] From the viewpoint of adhesion to the substrate, the partial structure represented by formula (C2-II) is preferably a partial structure represented by the following general formula (C2-II-1).

[0438]

[0439] In formula (C2-II-1), R 13 , R 15 , R 16 , m and n have the same meanings as in formula (C2-II), R α represents a monovalent cyclic hydrocarbon group which may have a substituent, p represents an integer greater than or equal to 1, and * represents a connecting bond. The benzene ring in formula (C2-II-1) may be further substituted by any substituent.

[0440] (R α )

[0441] In formula (C2-II-1), R α It represents a monovalent cyclic hydrocarbon group which may have a substituent.

[0442] Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.

[0443] The number of rings of the aliphatic cyclic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. In addition, it is preferably 6 or less, more preferably 4 or less, and further preferably 3 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 6, more preferably 1 to 4, further preferably 1 to 3, and particularly preferably 2 to 3. By setting it to be above the above lower limit, a strong film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated. By setting it to be below the above upper limit, there is a tendency that the patterning characteristics become good.

[0444] The number of carbon atoms in the aliphatic ring group is not particularly limited, but is preferably 4 or more, more preferably 6 or more, and further preferably 8 or more. In addition, it is preferably 40 or less, more preferably 30 or less, further preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 4 to 40, more preferably 4 to 30, further preferably 6 to 20, and particularly preferably 8 to 15. By setting it to be above the above lower limit, it is easy to obtain a strong film, and there is a tendency that the surface roughness generated during development is not easy to occur. By setting it to be below the above upper limit, there is a tendency that the patterning characteristics become good.

[0445] Examples of the aliphatic ring in the aliphatic cyclic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, and an adamantane ring. From the viewpoint of strong film properties, an adamantane ring is preferred.

[0446] The number of rings possessed by the aromatic ring group is not particularly limited, but is preferably 1 or more, preferably 2 or more, and more preferably 3 or more. In addition, it is preferably 10 or less, and more preferably 5 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 2 to 5, and particularly preferably 3 to 5. By setting it to be above the above lower limit, it is easy to obtain a strong film, and there is a tendency that the surface roughness generated during development is not easy to occur. By setting it to be below the above upper limit, there is a tendency that the patterning characteristics become good.

[0447] As the aromatic ring group, an aromatic hydrocarbon ring group and an aromatic heterocyclic group can be cited. In addition, the number of carbon atoms in the aromatic ring group is not particularly limited, but is preferably 4 or more, more preferably 5 or more, and further preferably 6 or more. In addition, it is preferably 30 or less, more preferably 20 or less, and further preferably 15 or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 4 to 30, more preferably 5 to 20, and further preferably 6 to 15. By setting it to above the aforementioned lower limit, it is easy to obtain a firm film, and there is a tendency that the surface roughness generated during development is not easy to occur. By setting it to below the aforementioned upper limit, there is a tendency that the patterning characteristics become good.

[0448] Examples of the aromatic ring in the aromatic ring group include a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring. From the viewpoint of development solubility, a fluorene ring is preferred.

[0449] Examples of the substituents that the cyclic hydrocarbon group may have include alkyl groups having 1 to 5 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, pentyl, and isopentyl; alkoxy groups having 1 to 5 carbon atoms, such as methoxy and ethoxy; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

[0450] p represents an integer greater than or equal to 1, and is preferably greater than or equal to 2. In addition, it is preferably less than or equal to 3. For example, it is preferably 1 to 3, and more preferably 2 to 3. By setting it to be greater than or equal to the above lower limit, there is a tendency that the film curing degree and the residual film rate become good. By setting it to be less than or equal to the above upper limit, there is a tendency that the developability becomes good.

[0451] From the perspective of firm film curing, R α It is preferably a monovalent aliphatic ring group, and more preferably an adamantyl group.

[0452] The benzene ring in formula (C2-II-1) may be further substituted by any substituent. As a substituent, for example, hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy can be listed. The number of substituents is not particularly limited, and can be 1 or more than 2.

[0453] From the viewpoint of patterning properties, unsubstituted is preferred.

[0454] Specific examples of the partial structure represented by formula (C2-II-1) are listed below.

[0455] In the following examples, * represents a connecting bond.

[0456]

[0457]

[0458] From the viewpoint of rigidity of the skeleton and hydrophobization of the membrane, the partial structure represented by formula (C2-II) is preferably a partial structure represented by the following general formula (C2-II-2).

[0459]

[0460] In formula (C2-II-2), R 13 , R 15 , R 16 , m and n have the same meanings as in formula (C2-II), R β represents a divalent cyclic hydrocarbon group which may have a substituent, and * represents a connecting bond.

[0461] The benzene ring in the formula (C2-II-2) may be further substituted by any substituent.

[0462] (R β )

[0463] In formula (C2-II-2), R β It represents a divalent cyclic hydrocarbon group which may have a substituent.

[0464] Examples of the cyclic hydrocarbon group include an aliphatic ring group and an aromatic ring group.

[0465] The number of rings of the aliphatic cyclic group is not particularly limited, but is preferably 1 or more, more preferably 2 or more. In addition, it is preferably 10 or less, more preferably 5 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 2 to 5. By setting it to be above the above lower limit, a strong film is easily obtained, and there is a tendency that the surface roughness generated during development is not easily generated. By setting it to be below the above upper limit, the deterioration of sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0466] The carbon number of the aliphatic cyclic group is preferably 4 or more, more preferably 6 or more, and further preferably 8 or more. In addition, it is preferably 40 or less, more preferably 35 or less, and further preferably 30 or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 4 to 40, more preferably 6 to 35, and further preferably 8 to 30. By setting it to be above the above lower limit, there is a tendency to suppress the roughness of the film surface during development. By setting it to be below the above upper limit, the deterioration of sensitivity can be suppressed, and there is a tendency that the residual film rate after development is high and the resolution is improved.

[0467] Examples of the aliphatic ring in the aliphatic cyclic group include a cyclohexane ring, a cycloheptane ring, a cyclodecane ring, a cyclododecane ring, a norbornane ring, an isobornane ring, and an adamantane ring. From the viewpoint of the residual film rate after development and the resolution, an adamantane ring is preferred.

[0468] The number of rings possessed by the aromatic ring group is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and further preferably 3 or more. In addition, it is preferably 10 or less, and more preferably 5 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 10, more preferably 1 to 5, further preferably 2 to 5, and particularly preferably 3 to 5. By setting it to be above the above lower limit, it is easy to obtain a strong film, and there is a tendency that the surface roughness generated during development is not easy to occur. By setting it to be below the above upper limit, it is easy to suppress the deterioration of sensitivity and the reduction of film, and there is a tendency to improve the resolution.

[0469] Examples of the aromatic ring group include an aromatic hydrocarbon ring group and an aromatic heterocyclic group.

[0470] The number of carbon atoms in the aromatic ring group is preferably 4 or more, more preferably 6 or more, further preferably 8 or more, and further preferably 10 or more. In addition, it is preferably 40 or less, more preferably 30 or less, further preferably 20 or less, and particularly preferably 15 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 4 to 40, more preferably 6 to 30, further preferably 8 to 20, and particularly preferably 10 to 15. By setting it to be above the above lower limit, it is easy to obtain a strong film, and there is a tendency that the surface roughness generated during development is not easy to occur. By setting it to be below the above upper limit, it is easy to suppress the deterioration of sensitivity and the reduction of film, and there is a tendency to improve the resolution.

[0471] As the aromatic ring in the aromatic ring group, for example, a benzene ring, a naphthalene ring, an anthracene ring, a phenanthrene ring, and a fluorene ring can be listed. From the viewpoint of the residual film rate, a fluorene ring is preferred. It is inferred that the plane forming the fluorene ring is orthogonal to the bond connected to the two benzene rings, so the volume becomes larger, thereby forming a more rigid skeleton, which is not easy to produce the penetration of the developer and the shrinkage during baking, and as a result, the residual film rate becomes higher.

[0472] Examples of the substituents that the cyclic hydrocarbon group may have include alkyl groups having 1 to 5 carbon atoms, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, tert-butyl, pentyl, and isopentyl; alkoxy groups having 1 to 5 carbon atoms, such as methoxy and ethoxy; hydroxyl groups; nitro groups; cyano groups; and carboxyl groups. From the viewpoint of ease of synthesis, unsubstituted groups are preferred.

[0473] From the viewpoint of suppressing film reduction and resolution, R β Preferably, it is a divalent aliphatic ring group, and more preferably, it is a divalent adamantane ring group. β It is preferably a divalent aromatic ring group, and more preferably a divalent fluorene ring group.

[0474] The phenyl ring in formula (C2-II-2) may be further substituted by any substituent. As a substituent, for example, hydroxyl, methyl, methoxy, ethyl, ethoxy, propyl, propoxy can be listed. The number of substituents is not particularly limited, and can be 1 or more than 2.

[0475] In addition, two benzene rings can also be connected by means of a substituent. As a substituent in this case, divalent groups such as -O-, -S-, -NH-, and -CH2- can be listed. From the viewpoint of patterning characteristics, it is preferably unsubstituted. In addition, from the viewpoint of not being easy to produce film reduction, it is preferably methyl substituted.

[0476] Specific examples of the partial structure represented by formula (C2-II-2) are listed below. In addition, * in the examples represents a connecting bond.

[0477]

[0478]

[0479] From the viewpoint of the coating film residual rate and patterning characteristics, the partial structure represented by formula (C2-II) is preferably a partial structure represented by the following general formula (C2-II-3).

[0480]

[0481] In formula (C2-II-3), R 13 , R 14 , R 15 , R 16 , m and n have the same meanings as in formula (C2-II), R Z represents a hydrogen atom or a polyacid residue.

[0482] The polyacid residue refers to a monovalent or divalent group obtained by removing one or two OH groups from a polyacid. It should be noted that another OH group may be further removed to form a monovalent or divalent group with R Z That is, multiple formulas (C2-II-3) can be shared by R Z And connect.

[0483] Examples of the polybasic acid include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, and biphenyltetracarboxylic acid.

[0484] From the viewpoint of patterning properties, preferred are maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, and biphenyltetracarboxylic acid, and more preferred are tetrahydrophthalic acid, biphenyltetracarboxylic acid, and biphenyltetracarboxylic acid.

[0485] The partial structure represented by the formula (C2-II-3) contained in one molecule of the epoxy (meth)acrylate resin (C2-II) may be one or more, for example, R Z is the structure of hydrogen atom and R Z The structures of polyacid residues are mixed.

[0486] The number of partial structures represented by formula (C2-II) contained in one molecule of the (C2-II) epoxy (meth) acrylate resin is not particularly limited, and is preferably 1 or more, and more preferably 3 or more. In addition, it is preferably 20 or less, more preferably 15 or less, and further preferably 10 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 20, more preferably 1 to 15, and further preferably 3 to 10. By setting it to be above the aforementioned lower limit, it is easy to obtain a firm film, and there is a tendency that surface roughness generated during development is not easily generated. By setting it to be below the aforementioned upper limit, it is easy to suppress the deterioration of sensitivity and the reduction of the film, and there is a tendency that the resolution is improved.

[0487] The weight average molecular weight (Mw) of the epoxy (meth) acrylate resin (C2-II) measured by gel permeation chromatography (GPC) in terms of polystyrene is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more, further preferably 2000 or more, further preferably 3000 or more, further preferably 4000 or more, and particularly preferably 5000 or more. In addition, it is preferably 10000 or less, more preferably 8000 or less, and further preferably 7000 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1000 to 10000, more preferably 1500 to 10000, further preferably 1500 to 8000, further preferably 2000 to 8000, and particularly preferably 2000 to 7000. By setting it to the above lower limit value or more, there is a tendency that the residual film rate of the photosensitive coloring resin composition becomes good. By setting it to the above upper limit value or less, there is a tendency that the developability becomes good.

[0488] The acid value of the epoxy (meth) acrylate resin (C2-II) is not particularly limited, but is preferably 20 mgKOH / g or more, more preferably 40 mgKOH / g or more, further preferably 60 mgKOH / g or more, further preferably 80 mgKOH / g or more, and particularly preferably 100 mgKOH / g or more. In addition, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less, further preferably 130 mgKOH / g or less, and particularly preferably 120 mgKOH / g or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 20 to 200 mgKOH / g, more preferably 60 to 150 mgKOH / g, further preferably 80 to 130 mgKOH / g, and further preferably 100 to 130 mgKOH / g. By setting it to the above lower limit value or more, there is a tendency that the developing solubility is improved and the resolution becomes good. By setting it to the above upper limit value or less, there is a tendency that the residual film rate of the photosensitive coloring resin composition becomes good.

[0489] (C2) The epoxy (meth)acrylate resin may be used alone or in combination of two or more.

[0490] <(C3) Resin containing isocyanuric acid skeleton>

[0491] In the photosensitive colored resin composition of the present invention, as the (C) alkali-soluble resin other than the resin (C1), an isocyanuric acid skeleton-containing resin having an ethylenic double bond and a carboxyl group can be used. (Hereinafter, it may be abbreviated as (C3) isocyanuric acid skeleton-containing resin.)

[0492] By having an isocyanuric acid skeleton, an ethylenic double bond and a carboxyl group, chemical resistance and heat resistance are improved, and the amount of decomposition products during development and baking is reduced. As a result, in the organic electroluminescent element, the current density when a voltage is applied tends to be higher.

[0493] The isocyanuric acid skeleton-containing resin (C3) is an alkali-soluble resin (C) other than the resin (C1) and is not particularly limited as long as it has an ethylenic double bond, a carboxyl group and an isocyanuric acid skeleton. Examples thereof include the following resins (C3-1) and (C3-2).

[0494] (C3-1) A resin obtained by reacting a reaction product of an epoxy group-containing compound having an isocyanuric acid skeleton with an α,β-unsaturated monocarboxylic acid and / or an ester compound with a polybasic acid and / or an anhydride thereof.

[0495] As an epoxy group-containing compound which has an isocyanuric acid skeleton, the compound represented by the following general formula (C3-1-1) is mentioned, for example.

[0496]

[0497] In formula (C3-1-1), R 4 ~R 6 Each independently represents an alkylene group, and the alkylene group may be interrupted by an etheric oxygen atom in the middle.

[0498] The alkylene group preferably has a carbon number of 1 or more. In addition, it is preferably a carbon number of 6 or less, more preferably 4 or less, and further preferably 2 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1 to 6, more preferably 1 to 4, and further preferably 1 to 2. The alkylene group may be linear or branched. By setting it below the above upper limit, there is a tendency that the developability becomes good and the gas barrier property is improved.

[0499] Examples of the alkylene group include methylene, ethylene, n-propylene, isopropylene, n-butylene, isobutylene, n-pentylene, and n-hexylene. In addition, examples of the alkylene group interrupted by an etheric oxygen atom include groups in which 1 to 10 carbon atoms of an optionally linear or branched alkylene chain having 4 to 30 carbon atoms are replaced by oxygen atoms, and examples thereof include groups in which 2 to 9 ethoxy groups are connected, and groups in which 2 to 7 propoxy groups are connected.

[0500] Among these, from the viewpoint of gas barrier properties, a methylene group, an ethylene group, and an n-propylene group are preferred, and a methylene group is more preferred.

[0501] Examples of the α,β-unsaturated monocarboxylic acid and / or ester compound include: (meth)acrylic acid, (meth)acrylic acid substituted with alkyl halide, alkoxy, halogen, nitro, cyano, etc. at the α-position; 2-(meth)acryloyloxyethylsuccinic acid, 2-(meth)acryloyloxyethyladipic acid, 2-(meth)acryloyloxyethylphthalic acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, 2-(meth)acryloyloxyethylmaleic acid, 2-(meth)acryloyloxypropylsuccinic acid, 2-(meth)acryloyloxypropyladipic acid, 2-(meth)acryloyloxyethylhexahydrophthalic acid, 2-(meth)acryloyloxyethylmaleic acid, 2-(meth)acryloyloxypropylsuccinic acid, 2-(meth)acryloyloxypropyladipic acid, 2-(meth)acryloyloxyethyl Acryloyloxypropyl tetrahydrophthalic acid, 2-(meth)acryloyloxypropyl phthalic acid, 2-(meth)acryloyloxypropyl maleic acid, 2-(meth)acryloyloxybutyl succinic acid, 2-(meth)acryloyloxybutyl adipic acid, 2-(meth)acryloyloxybutyl hydrophthalic acid, 2-(meth)acryloyloxybutyl phthalic acid, 2-(meth)acryloyloxybutyl maleic acid; or a monomer obtained by adding succinic acid (anhydride), phthalic acid (anhydride), maleic acid (anhydride) or the like to hydroxyalkyl (meth)acrylate or pentaerythritol tri(meth)acrylate. From the viewpoint of sensitivity, (meth)acrylic acid is preferred.

[0502] As a method for adding an α,β-unsaturated monocarboxylic acid or an α,β-unsaturated monocarboxylic acid ester having a carboxyl group to an epoxy resin, the same method as that for the (C2) epoxy (meth)acrylate resin can be used.

[0503] Examples of the polybasic acid and / or its anhydride include maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, benzophenonetetracarboxylic acid, methylhexahydrophthalic acid, endomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, biphenyltetracarboxylic acid, and anhydrides thereof.

[0504] Preferred are succinic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, pyromellitic acid, trimellitic acid, biphenyltetracarboxylic acid, and anhydrides thereof. Particularly preferred are pyromellitic acid and anhydrides thereof.

[0505] The addition reaction of the polybasic acid and / or its anhydride can be carried out by the same method as that for the (C2) epoxy (meth)acrylate resin.

[0506] Examples of the α,β-unsaturated monocarboxylic acid and / or ester compound include the same compounds as those described in the section of the (C2) epoxy (meth)acrylate resin.

[0507] Furthermore, examples of the polybasic acid and / or its anhydride include the same compounds as those described in the section of the resin (C1).

[0508] (C3-2) A resin obtained by reacting a compound obtained by reacting a polyisocyanate compound having an isocyanuric acid skeleton with an acid or an acid anhydride with an epoxy group-containing (meth)acrylate compound.

[0509] Examples of the resin (C3-2) include resins described in JP-A-2020-75994 and intermediates thereof.

[0510] (C3) The weight average molecular weight (Mw) of the resin containing an isocyanuric acid skeleton is not particularly limited, but is preferably 1000 or more, more preferably 1500 or more, further preferably 2000 or more, further preferably 3000 or more, further preferably 4000 or more, and particularly preferably 5000 or more. In addition, it is preferably 10000 or less, more preferably 8000 or less, and further preferably 7000 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 1000 to 10000, more preferably 1500 to 10000, further preferably 1500 to 8000, further preferably 2000 to 8000, and particularly preferably 2000 to 7000. By setting it to the above lower limit value or more, there is a tendency that the solubility in the developer can be suppressed from becoming too high. By setting it to the above upper limit value or less, there is a tendency that the solubility in the developer can be easily improved.

[0511] (C3) The acid value of the resin containing an isocyanuric acid skeleton is not particularly limited, but is preferably 20 mgKOH / g or more, more preferably 40 mgKOH / g or more, further preferably 60 mgKOH / g or more, further preferably 80 mgKOH / g or more, and particularly preferably 100 mgKOH / g or more. In addition, it is preferably 200 mgKOH / g or less, more preferably 150 mgKOH / g or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 20 to 200 mgKOH / g, more preferably 60 to 150 mgKOH / g. By setting it to above the aforementioned lower limit, there is a tendency that the developing solubility is improved and the resolution becomes good. By setting it to below the aforementioned upper limit, there is a tendency that the residual film rate of the photosensitive coloring resin composition becomes good.

[0512] <(C4) Acrylic Copolymer Resin>

[0513] As the alkali-soluble resin (C), in addition to the resin (C1), an acrylic copolymer resin (C4) may be used from the viewpoint of compatibility with a pigment, a dispersant, etc. As the acrylic copolymer resin (C4), for example, the resins described in Japanese Patent Application Laid-Open No. 2014-137466 may be preferably used.

[0514] Examples of the (C4) acrylic copolymer resin include copolymers of an ethylenically unsaturated monomer having one or more carboxyl groups (hereinafter referred to as “unsaturated monomer (C4-1)”) and other copolymerizable ethylenically unsaturated monomers (hereinafter referred to as “unsaturated monomer (C4-2)”).

[0515] Examples of the unsaturated monomer (C4-1) include unsaturated monocarboxylic acids such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid, and cinnamic acid; unsaturated dicarboxylic acids or their anhydrides such as maleic acid, maleic anhydride, fumaric acid, citraconic acid, citraconic anhydride, and mesaconic acid; mono(meth)acryloyloxyalkyl) esters of polycarboxylic acids having a valence of 2 or more such as mono(2-(meth)acryloyloxyethyl) succinate and mono(2-(meth)acryloyloxyethyl) phthalate; mono(meth)acrylates of polymers having carboxyl groups and hydroxyl groups at both ends such as ω-carboxypolycaprolactone mono(meth)acrylate; and p-vinylbenzoic acid.

[0516] These unsaturated monomers (C4-1) can be used alone or in combination of two or more.

[0517] Examples of the unsaturated monomer (C4-2) include N-substituted maleimides such as N-phenylmaleimide and N-cyclohexylmaleimide;

[0518] Aromatic vinyl compounds such as styrene, α-methylstyrene, p-hydroxystyrene, p-hydroxy-α-methylstyrene, p-vinylbenzyl glycidyl ether, and acenaphthylene;

[0519] Methyl (meth)acrylate, n-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, 2-hydroxyethyl (meth)acrylate, allyl (meth)acrylate, benzyl (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polypropylene glycol (degree of polymerization 2-10) methyl ether (meth)acrylate, polyethylene glycol (degree of polymerization 2-10) mono(meth)acrylate, polypropylene glycol (degree of polymerization 2-10) mono(meth)acrylate, cyclohexyl (meth)acrylate, isobornyl (meth)acrylate, tricyclo[5.2.1.0](meth)acrylate 2,6 ] decane-8-acrylate, dicyclopentenyl (meth)acrylate, glycerol mono(meth)acrylate, 4-hydroxyphenyl (meth)acrylate, ethylene oxide-modified (meth)acrylate of p-cumylphenol, glycidyl (meth)acrylate, 3,4-epoxycyclohexylmethyl (meth)acrylate, 3-〔(meth)acryloyloxymethyl〕oxetane, 3-〔(meth)acryloyloxymethyl〕-3-ethyloxetane and the like (meth)acrylates;

[0520] Cyclohexyl vinyl ether, isobornyl vinyl ether, tricyclic [5.2.1.0 2,6 ] vinyl ethers such as decane-8-yl vinyl ether, pentacyclopentadecyl vinyl ether, 3-(vinyloxymethyl)-3-ethyloxetane;

[0521] A macromonomer having a mono(meth)acryloyl group at the end of a polymer molecular chain such as polystyrene, poly(methyl)acrylate, poly(n-butyl)(meth)acrylate, and polysiloxane.

[0522] These unsaturated monomers (C4-2) can be used alone or in combination of two or more.

[0523] In the copolymer of the unsaturated monomer (C4-1) and the unsaturated monomer (C4-2), the copolymerization ratio of the unsaturated monomer (C4-1) is preferably 5 to 50% by mass, and more preferably 10 to 40% by mass. By copolymerizing the unsaturated monomer (C4-1) in such a range, there is a tendency to obtain a photosensitive coloring resin composition having excellent alkali developability and storage stability.

[0524] Examples of the copolymer of the unsaturated monomer (C4-1) and the unsaturated monomer (C4-2) include copolymers disclosed in JP-A-7-140654, JP-A-8-259876, JP-A-10-31308, JP-A-10-300922, JP-A-11-174224, JP-A-11-258415, JP-A-2000-56118, and JP-A-2004-101728.

[0525] The copolymer of the unsaturated monomer (C4-1) and the unsaturated monomer (C4-2) can be produced by a known method, and its structure, Mw, and Mw / Mn (Mn is the number average molecular weight) can also be controlled by the method disclosed in, for example, Japanese Patent Publication No. 2003-222717, Japanese Patent Publication No. 2006-259680, and International Publication No. 2007 / 029871.

[0526] As the (C4) acrylic copolymer resin, resins described in International Publication No. 2016 / 194619 and International Publication No. 2017 / 154439 may be used in addition to the above.

[0527] <(D) Photopolymerization Initiator>

[0528] The photosensitive colored resin composition of the present invention contains (D) a photopolymerization initiator. (D) The photopolymerization initiator is a component that directly absorbs light and undergoes a decomposition reaction or a hydrogen abstraction reaction to generate polymerization-active free radicals. Additives such as a polymerization accelerator (chain transfer agent) and a sensitizing pigment may also be added and used as needed.

[0529] As the photopolymerization initiator, for example, there can be listed: metallocene compounds including titanocene compounds described in Japanese Patent Application Laid-Open No. 59-152396 and Japanese Patent Application Laid-Open No. 61-151197; hexaarylbiimidazole derivatives described in Japanese Patent Application Laid-Open No. 2000-56118; halomethylated oxadiazole derivatives and halomethyl-s-triazine derivatives described in Japanese Patent Application Laid-Open No. 10-39503; α-aminoalkylphenone derivatives; oxime ester compounds described in Japanese Patent Application Laid-Open No. 2000-80068 and Japanese Patent Application Laid-Open No. 2006-36750.

[0530] Examples of the metallocene compound include dicyclopentadienyltitanium dichloride, dicyclopentadienyltitanium bisphenyl, dicyclopentadienyltitanium bis(2,3,4,5,6-pentafluorobenzene-1-yl), dicyclopentadienyltitanium bis(2,3,5,6-tetrafluorobenzene-1-yl), dicyclopentadienyltitanium bis(2,4,6-trifluorobenzene-1-yl), dicyclopentadienyltitanium bis(2,6-difluorobenzene-1-yl), dicyclopentadienyltitanium bis(2,4-difluorobenzene-1-yl), di(methylcyclopentadienyl)titanium bis(2,3,4,5,6-pentafluorobenzene-1-yl), di(methylcyclopentadienyl)titanium bis(2,6-difluorobenzene-1-yl), and dicyclopentadienyltitanium [2,6-di-fluoro-3-(pyrrol-1-yl)-benzene-1-yl].

[0531] Examples of the hexaarylbiimidazole derivatives include 2-(2'-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-chlorophenyl)-4,5-bis(3'-methoxyphenyl)imidazole dimer, 2-(2'-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(2'-methoxyphenyl)-4,5-diphenylimidazole dimer, and (4'-methoxyphenyl)-4,5-diphenylimidazole dimer.

[0532] Examples of the halogenated methylated oxadiazole derivatives include 2-trichloromethyl-5-(2'-benzofuranyl)-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-benzofuranyl)vinyl]-1,3,4-oxadiazole, 2-trichloromethyl-5-[β-(2'-(6"-benzofuranyl)vinyl)]-1,3,4-oxadiazole, and 2-trichloromethyl-5-furanyl-1,3,4-oxadiazole.

[0533] Examples of the halomethyl-s-triazine derivatives include 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-ethoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, and 2-(4-ethoxycarbonylnaphthyl)-4,6-bis(trichloromethyl)-s-triazine.

[0534] Examples of α-aminoalkylphenone derivatives include 2-methyl-1〔4-(methylthio)phenyl〕-2-morpholinopropane-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)butan-1-one, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholinophenyl)butan-1-one, and 3,6-bis(2-methyl-2-morpholinopropionyl)-9-octylcarbazole.

[0535] As the (D) photopolymerization initiator, oxime ester compounds are effective from the viewpoint of sensitivity and platemaking properties. For example, when an alkali-soluble resin containing a phenolic hydroxyl group is used, such oxime ester compounds with excellent sensitivity are particularly useful. Since oxime ester compounds have a structure that absorbs ultraviolet rays, a structure that transmits light energy, and a structure that generates free radicals in their structure, they have high sensitivity even in a small amount, and are stable to thermal reactions, and a highly sensitive photosensitive colored resin composition can be obtained in a small amount.

[0536] Examples of the oxime ester compound include compounds represented by the following general formula (IV).

[0537]

[0538] In formula (IV), R 21a represents a hydrogen atom, an alkyl group which may have a substituent, or an aromatic ring group which may have a substituent.

[0539] R 21b represents an arbitrary substituent including an aromatic ring.

[0540] R 22a It represents an alkanoyl group which may have a substituent or an aroyl group which may have a substituent.

[0541] n represents an integer of 0 or 1.

[0542] R 21a The carbon number of the alkyl group in is not particularly limited, but is preferably 1 or more, more preferably 2 or more, and preferably 20 or less, more preferably 15 or less, and further preferably 10 or less from the viewpoint of solubility in a solvent and sensitivity. For example, examples of the alkyl group include a methyl group, an ethyl group, a propyl group, and a cyclopentylethyl group.

[0543] Examples of the substituent that the alkyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, 4-(2-methoxy-1-methyl)ethoxy-2-methylphenyl, and N-acetyl-N-acetoxyamino. From the viewpoint of ease of synthesis, the alkyl group is preferably unsubstituted.

[0544] As R 21a The aromatic ring group in the group may be an aromatic hydrocarbon ring group or an aromatic heterocyclic group. The number of carbon atoms in the aromatic ring group is not particularly limited, but is preferably 5 or more from the viewpoint of solubility in the photosensitive colored resin composition. In addition, from the viewpoint of developability, it is preferably 30 or less, more preferably 20 or less, and further preferably 12 or less. For example, it is preferably 5 to 30, more preferably 5 to 20, and further preferably 5 to 12.

[0545] Examples of the aromatic ring group include a phenyl group, a naphthyl group, a pyridyl group, and a furyl group. From the viewpoint of developability, a phenyl group or a naphthyl group is preferred, and a phenyl group is more preferred.

[0546] As the substituent that the aromatic ring group may have, for example, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, an alkyl group, an alkoxy group, and a group formed by connecting these substituents. From the viewpoint of developability, an alkyl group, an alkoxy group, and a group formed by connecting these are preferred, and a connected alkoxy group is more preferred.

[0547] From the perspective of developability, R 21a An aromatic ring group which may have a substituent is preferred, and an aromatic ring group having an alkoxy group connected as a substituent is more preferred.

[0548] As R 21b , an optionally substituted carbazolyl group, an optionally substituted thioxanthone group, an optionally substituted diphenyl sulfide group, an optionally substituted fluorenyl group or an optionally substituted indolyl group can be cited. From the viewpoint of sensitivity, an optionally substituted carbazolyl group is preferred. From the viewpoint of electrical reliability, an optionally substituted diphenyl sulfide group is preferred.

[0549] R 22a The carbon number of the alkanoyl group in is not particularly limited, but is preferably 2 or more from the viewpoint of solubility in a solvent and sensitivity, and is preferably 20 or less, more preferably 15 or less, further preferably 10 or less, and particularly preferably 5 or less. For example, examples of the alkanoyl group include acetyl, propionyl, and butyryl.

[0550] Examples of the substituent that the alkanoyl group may have include an aromatic ring group, a hydroxyl group, a carboxyl group, a halogen atom, an amino group, and an amide group. From the viewpoint of ease of synthesis, the alkanoyl group is preferably unsubstituted.

[0551] R 22a The carbon number of the aromatic acyl group in is not particularly limited, but is preferably 7 or more, more preferably 8 or more, and preferably 20 or less, more preferably 15 or less, and further preferably 10 or less from the viewpoint of solubility in a solvent and sensitivity. Examples of the aromatic acyl group include benzoyl and naphthoyl.

[0552] Examples of the substituent that the aroyl group may have include a hydroxyl group, a carboxyl group, a halogen atom, an amino group, an amide group, and an alkyl group. From the viewpoint of ease of synthesis, the aroyl group is preferably unsubstituted.

[0553] From the perspective of sensitivity, R 22a An alkanoyl group which may have a substituent is preferred, an unsubstituted alkanoyl group is more preferred, and an acetyl group is further preferred.

[0554] For example, the photopolymerization initiators described in Japanese Patent No. 4454067, International Publication No. 2002 / 100903, International Publication No. 2012 / 45736, International Publication No. 2015 / 36910, International Publication No. 2006 / 18973, International Publication No. 2008 / 78678, Japanese Patent No. 4818458, International Publication No. 2005 / 80338, International Publication No. 2008 / 75564, International Publication No. 2009 / 131189, International Publication No. 2009 / 131189, International Publication No. 2010 / 133077, International Publication No. 2010 / 102502, and International Publication No. 2012 / 68879 can be used.

[0555] From the viewpoint of reducing contamination caused by the colorant, the initiator described in JP-A-2016-133574 can also be preferably used.

[0556] The photopolymerization initiator may be used alone or in combination of two or more.

[0557] If necessary, a sensitizing dye or polymerization accelerator that matches the wavelength of the image exposure light source may be added to the photopolymerization initiator for the purpose of improving sensitivity. Examples of sensitizing dyes include xanthene dyes described in Japanese Patent Application Laid-Open Nos. 4-221958 and 4-219756; coumarin dyes having a heterocyclic ring described in Japanese Patent Application Laid-Open Nos. 3-239703 and 5-289335; 3-ketocoumarin compounds described in Japanese Patent Application Laid-Open Nos. 3-239703 and 5-289335; pyrromethene dyes described in Japanese Patent Application Laid-Open No. 6-19240; and pyrrolemethine dyes described in Japanese Patent Application Laid-Open Nos. 47-2528 and 54-155292. The pigment having a dialkylaminobenzene skeleton described in Japanese Patent Publication No. 45-37377, Japanese Patent Application Laid-Open No. 48-84183, Japanese Patent Application Laid-Open No. 52-112681, Japanese Patent Application Laid-Open No. 58-15503, Japanese Patent Application Laid-Open No. 60-88005, Japanese Patent Application Laid-Open No. 59-56403, Japanese Patent Application Laid-Open No. 2-69, Japanese Patent Application Laid-Open No. 57-168088, Japanese Patent Application Laid-Open No. 5-107761, Japanese Patent Application Laid-Open No. 5-210240, and Japanese Patent Application Laid-Open No. 4-288818.

[0558] As the sensitizing dye, an amino group-containing sensitizing dye is preferred, and a compound having an amino group and a phenyl group in the same molecule is more preferred. For example, benzophenone compounds such as 4,4'-dimethylaminobenzophenone, 4,4'-diethylaminobenzophenone, 2-aminobenzophenone, 4-aminobenzophenone, 4,4'-diaminobenzophenone, 3,3'-diaminobenzophenone, and 3,4-diaminobenzophenone are preferred; 2-(p-dimethylaminophenyl)benzoxazole, 2-(p-diethylaminophenyl)benzoxazole, 2-(p-dimethylaminophenyl)benzo[4,5]benzoxazole, 2-(p-dimethylaminophenyl)benzo[6,7]benzoxazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-oxazole are preferred. , 2-(p-dimethylaminophenyl)benzothiazole, 2-(p-diethylaminophenyl)benzothiazole, 2-(p-dimethylaminophenyl)benzimidazole, 2-(p-diethylaminophenyl)benzimidazole, 2,5-bis(p-diethylaminophenyl)-1,3,4-thiadiazole, (p-dimethylaminophenyl)pyridine, (p-diethylaminophenyl)pyridine, (p-dimethylaminophenyl)quinoline, (p-diethylaminophenyl)quinoline, (p-dimethylaminophenyl)pyrimidine, (p-diethylaminophenyl)pyrimidine and the like, and 4,4'-dialkylaminobenzophenone is particularly preferred.

[0559] The sensitizing dye may be used alone or in combination of two or more.

[0560] As the polymerization accelerator, for example, aromatic amines such as ethyl p-dimethylaminobenzoate and 2-dimethylaminoethyl benzoate, aliphatic amines such as n-butylamine and N-methyldiethanolamine, and mercapto compounds described below can be used. The polymerization accelerator can be used alone or in combination of two or more.

[0561] <(E) Ethylenically Unsaturated Compound>

[0562] The photosensitive colored resin composition of the present invention may contain (E) an ethylenically unsaturated compound. By containing (E) an ethylenically unsaturated compound, there is a tendency for the sensitivity to be improved.

[0563] The (E) ethylenically unsaturated compound used in the present invention is a compound having at least one ethylenically unsaturated group in the molecule, and specifically, examples thereof include (meth)acrylic acid, (meth)acrylic acid alkyl esters, acrylonitrile, styrene, carboxylic acids having one ethylenically unsaturated bond, and monoesters of polyols or monohydric alcohols.

[0564] In the present invention, it is particularly preferred to use a multifunctional ethylenic monomer having two or more ethylenic unsaturated groups in one molecule. The number of ethylenic unsaturated groups possessed by the multifunctional ethylenic monomer is not particularly limited, and is preferably more than 2, more preferably more than 4, and further preferably more than 5, and further preferably less than 8, and more preferably less than 7. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 2 to 8, more preferably 2 to 7, further preferably 4 to 7, and particularly preferably 5 to 7. By setting it to above the aforementioned lower limit, there is a tendency to become highly sensitive. In addition, by setting it to below the aforementioned upper limit, there is a tendency to improve solubility in a solvent.

[0565] Examples of the polyfunctional ethylenic monomer include esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; and esters obtained by esterification of polyhydroxy compounds such as aliphatic polyhydroxy compounds and aromatic polyhydroxy compounds with unsaturated carboxylic acids and polycarboxylic acids.

[0566] Examples of the esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids include acrylates of aliphatic polyhydroxy compounds such as ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, and glycerol acrylate; methacrylates obtained by replacing these acrylates with methacrylates; itaconates obtained by replacing these acrylates with itaconates; crotonates obtained by replacing these acrylates with crotonates; and maleates obtained by replacing these acrylates with maleates.

[0567] Examples of the esters of an aromatic polyhydroxy compound and an unsaturated carboxylic acid include acrylates and methacrylates of aromatic polyhydroxy compounds such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcinol dimethacrylate, and pyrogallol triacrylate.

[0568] The esters obtained by the esterification reaction of polycarboxylic acids and unsaturated carboxylic acids with polyhydroxy compounds are not necessarily single substances, and examples thereof include condensates of acrylic acid, phthalic acid and ethylene glycol; condensates of acrylic acid, maleic acid and diethylene glycol; condensates of methacrylic acid, terephthalic acid and pentaerythritol; and condensates of acrylic acid, adipic acid, butanediol and glycerol.

[0569] In addition, examples of the polyfunctional olefinic monomer used in the present invention include: urethane (meth)acrylates obtained by reacting a polyisocyanate compound with a hydroxyl group-containing (meth)acrylate or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylate; epoxy acrylates such as addition reaction products of a polyvalent epoxy compound with a hydroxyl (meth)acrylate or (meth)acrylic acid; acrylamides such as ethylenebisacrylamide; allyl esters such as diallyl phthalate; and vinyl-containing compounds such as divinyl phthalate.

[0570] Examples of the urethane (meth)acrylates include DPHA-40H, UX-5000, UX-5002D-P20, UX-5003D, and UX-5005 (manufactured by Nippon Kayaku Co., Ltd.), U-2PPA, U-6LPA, U-10PA, U-33H, UA-53H, UA-32P, and UA-1100H (manufactured by Shin-Nakamura Chemical Co., Ltd.), UA-306H, UA-510H, and UF-8001G (manufactured by Kyoeisha Chemical Co., Ltd.), and UV-1700B, UV-7600B, UV-7605B, UV-7630B, and UV7640B (manufactured by Mitsubishi Chemical Corporation).

[0571] From the viewpoint of curability, as the (E) ethylenically unsaturated compound, it is preferred to use an alkyl (meth)acrylate, a urethane (meth)acrylate obtained by reacting a polyisocyanate compound with a hydroxyl group-containing (meth)acrylate, or a polyisocyanate compound with a polyol and a hydroxyl group-containing (meth)acrylate, and it is more preferred to use a polyisocyanate compound and a hydroxyl group-containing (meth)acrylate.

[0572] These may be used alone or in combination of two or more.

[0573] <Other compounding components of the photosensitive coloring resin composition>

[0574] The photosensitive colored resin composition of the present invention may contain, in addition to the above components, additives such as adhesion improvers such as silane coupling agents, surfactants, pigment derivatives, photoacid generators, crosslinking agents, mercapto compounds, and polymerization inhibitors.

[0575] (1) Adhesion enhancer

[0576] The photosensitive colored resin composition of the present invention may contain an adhesion improver in order to improve adhesion to a substrate. As the adhesion improver, a silane coupling agent, a phosphoric acid group-containing compound, and the like are preferred.

[0577] As the silane coupling agent, for example, various silane coupling agents such as epoxy-based, (meth)acrylic-based, and amino-based silane coupling agents may be used alone or in combination of two or more.

[0578] Examples of the silane coupling agent include (meth)acryloxysilanes such as 3-methacryloxypropylmethyldimethoxysilane and 3-methacryloxypropyltrimethoxysilane; epoxysilanes such as 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, and 3-glycidoxypropyltriethoxysilane; ureidosilanes such as 3-ureidopropyltriethoxysilane; and isocyanatesilanes such as 3-isocyanatepropyltriethoxysilane. Epoxysilane-based silane coupling agents are particularly preferred.

[0579] The phosphoric acid group-containing compound is preferably a (meth)acryloyl group-containing phosphoric acid ester, and preferably a compound represented by the following general formula (g1), (g2) or (g3).

[0580]

[0581] In formula (g1), (g2) and (g3), R 51 represents a hydrogen atom or a methyl group, l and l' are integers of 1 to 10, and m is 1, 2 or 3.

[0582] These phosphoric acid group-containing compounds may be used alone or in combination of two or more.

[0583] (2) Surfactants

[0584] The photosensitive color resin composition of the present invention may contain a surfactant in order to improve coating properties.

[0585] As the surfactant, various surfactants such as anionic surfactants, cationic surfactants, nonionic surfactants, and amphoteric surfactants can be used. From the perspective of low possibility of adverse effects on various properties, nonionic surfactants are preferably used, and from the perspective of coating properties, fluorine-based and silicone-based surfactants are more preferred.

[0586] Examples of such surfactants include TSF4460 (manufactured by Momentive Performance Materials), DFX-18 (manufactured by NEOS), BYK-300, BYK-325, BYK-330 (manufactured by BYK-Chemie), KP340 (manufactured by Shin-Etsu Silicone Co., Ltd.), F-470, F-475, F-478, F-554, F-559 (manufactured by DIC Corporation), SH7PA (manufactured by Dow Corning Toray Co., Ltd.), DS-401 (manufactured by Daikin Co., Ltd.), L-77 (manufactured by Unicar Japan Co., Ltd.), and FC4430 (manufactured by 3M Co., Ltd.).

[0587] The surfactant may be used alone or in combination of two or more.

[0588] (3) Pigment derivatives

[0589] The photosensitive color resin composition of the present invention may further contain a pigment derivative as a dispersing aid in order to improve dispersibility and storage stability.

[0590] Examples of pigment derivatives include azo, phthalocyanine, quinacridone, benzimidazolone, quinophthalone, isoindolinone, dioxazine, anthraquinone, indanthrene, perylene, perinone, diketopyrrolopyrrole, and dioxazine derivatives, with phthalocyanine and quinophthalone derivatives being preferred.

[0591] Examples of substituents of the pigment derivative include sulfonic acid groups, sulfonamide groups and quaternary salts thereof, phthalimidomethyl groups, dialkylaminoalkyl groups, hydroxyl groups, carboxyl groups, and amide groups directly or via alkyl groups, aryl groups, and heterocyclic groups to the pigment skeleton, preferably sulfonic acid groups. Multiple substituents may be substituted on one pigment skeleton, or multiple substituents may be substituted.

[0592] Examples of the pigment derivatives include sulfonic acid derivatives of phthalocyanine, sulfonic acid derivatives of quinophthalone, sulfonic acid derivatives of anthraquinone, sulfonic acid derivatives of quinacridone, sulfonic acid derivatives of diketopyrrolopyrrole, and sulfonic acid derivatives of dioxazine. These may be used alone or in combination of two or more.

[0593] (4) Thiol compounds

[0594] The photosensitive colored resin composition of the present invention may contain a mercapto compound as a polymerization accelerator in order to improve adhesion to a substrate.

[0595] Examples of the mercapto compound include 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 2-mercaptobenzimidazole, hexanedithiol, decanedithiol, 1,4-dimethylmercaptobenzene, butylene glycol dimercaptopropionate, butylene glycol dimercaptoacetate, ethylene glycol dimercaptoacetate, trimethylolpropane trimercaptoacetate, butylene glycol dimercaptopropionate, trimethylolpropane trimercaptopropionate, trimethylolpropane trimercaptoacetate, pentaerythritol tetramercaptopropionate, pentaerythritol tetramercaptoacetate, trihydroxyethyl trimercaptopropionate, ethylene glycol bis(3-mercaptobutyrate), butanediol bis(3-mercaptobutyrate), and the like. (3-mercaptobutyrate), 1,4-bis(3-mercaptobutyryloxy)butane, trimethylolpropane tris(3-mercaptobutyrate), pentaerythritol tetrakis(3-mercaptobutyrate), pentaerythritol tris(3-mercaptobutyrate), ethylene glycol bis(3-mercaptoisobutyrate), butanediol bis(3-mercaptoisobutyrate), trimethylolpropane tris(3-mercaptoisobutyrate), 1,3,5-tris(3-mercaptobutoxyethyl)-1,3,5-triazine-2,4,6(1H,3H,5H)-trione and other mercapto compounds having a heterocyclic ring, and aliphatic multifunctional mercapto compounds. These various substances may be used alone or in combination of two or more.

[0596] (5) Inhibitor

[0597] The photosensitive colored resin composition of the present invention may contain a polymerization inhibitor from the viewpoint of controlling the shape of the cured product. It is believed that the polymerization inhibitor inhibits radical polymerization of the lower layer of the coating film, thereby controlling the taper angle (the angle between the support and the cured product in the cross section of the cured product).

[0598] Examples of the polymerization inhibitor include hydroquinone, hydroquinone monomethyl ether, methyl hydroquinone, methoxyphenol, and 2,6-di-tert-butyl-4-methylphenol (BHT). From the viewpoint of shape control, 2,6-di-tert-butyl-4-methylphenol is preferred. From the viewpoint of particularly excellent safety to the human body, hydroquinone monomethyl ether and methyl hydroquinone are preferred.

[0599] The polymerization inhibitor may be used alone or in combination of two or more.

[0600] When producing (C) the alkali-soluble resin, the resin may contain a polymerization inhibitor, which can be used as the polymerization inhibitor of the present invention. In addition to the polymerization inhibitor in the resin, the same or different polymerization inhibitor may be added when producing the photosensitive coloring resin composition.

[0601] When the photosensitive color resin composition contains a polymerization inhibitor, the content ratio thereof is not particularly limited, and is preferably 0.0005% by mass or more, more preferably 0.001% by mass or more, and further preferably 0.01% by mass or more, relative to the total solid content of the photosensitive color resin composition. In addition, it is preferably 0.3% by mass or less, more preferably 0.2% by mass or less, and further preferably 0.1% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 0.0005% by mass to 0.3% by mass, more preferably 0.001% by mass to 0.2% by mass, and further preferably 0.01% by mass to 0.1% by mass. By setting it to above the aforementioned lower limit, there is a tendency to be able to control the shape of the cured product. By setting it to below the aforementioned upper limit, there is a tendency to be able to maintain the desired sensitivity.

[0602] (6) Solvent

[0603] The photosensitive colored resin composition of the present invention preferably contains a solvent. By containing a solvent, the colorant can be dispersed or dissolved in the solvent, and coating becomes easy.

[0604] The photosensitive colored resin composition of the present invention is used in a state where (A) a colorant, (B) a dispersant, (C) an alkali-soluble resin, (D) a photopolymerization initiator, and other various materials used as required are dissolved or dispersed in a solvent. From the viewpoint of dispersibility and coating properties, an organic solvent is preferred.

[0605] Among organic solvents, from the viewpoint of coating properties, it is preferred to select an organic solvent having a boiling point of 100 to 300° C., and more preferably an organic solvent having a boiling point of 120 to 280° C. It should be noted that the boiling point referred to here means the boiling point at a pressure of 1013.25 hPa, and the same shall apply to the boiling point hereinafter.

[0606] Examples of such organic solvents include glycol monoalkyl ethers such as ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether, propylene glycol monomethyl ether, propylene glycol monoethyl ether, propylene glycol mono-n-butyl ether, propylene glycol tert-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol mono-n-butyl ether, methoxymethylpentanol, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, 3-methoxybutanol, 3-methyl-3-methoxybutanol, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, and tripropylene glycol methyl ether;

[0607] Glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dipropyl ether, diethylene glycol dibutyl ether and dipropylene glycol dimethyl ether;

[0608] Glycol alkyl ether acetates such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, ethylene glycol mono-n-butyl ether acetate, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether acetate, propylene glycol monopropyl ether acetate, propylene glycol monobutyl ether acetate, methoxybutyl acetate, 3-methoxybutyl acetate, methoxypentyl acetate, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol mono-n-butyl ether acetate, dipropylene glycol monomethyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoethyl ether acetate, and 3-methyl-3-methoxybutyl acetate;

[0609] Glycol diacetates such as ethylene glycol diacetate, 1,3-butanediol diacetate, and 1,6-hexanediol diacetate;

[0610] Alkyl acetates such as cyclohexanol acetate;

[0611] Ethers such as amyl ether, diethyl ether, dipropyl ether, diisopropyl ether, dibutyl ether, diamyl ether, ethyl isobutyl ether, dihexyl ether;

[0612] Ketones such as acetone, methyl ethyl ketone, methyl amyl ketone, methyl isopropyl ketone, methyl isoamyl ketone, diisopropyl ketone, diisobutyl ketone, methyl isobutyl ketone, cyclohexanone, ethyl amyl ketone, methyl butyl ketone, methyl hexyl ketone, methyl nonyl ketone, and methoxymethyl amyl ketone;

[0613] Monohydric or polyhydric alcohols such as ethanol, propanol, butanol, hexanol, cyclohexanol, ethylene glycol, propylene glycol, butylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, methoxymethylpentanol, glycerol, and benzyl alcohol;

[0614] Aliphatic hydrocarbons such as n-pentane, n-octane, diisobutylene, n-hexane, hexene, isoprene, dipentene, and dodecane;

[0615] Alicyclic hydrocarbons such as cyclohexane, methylcyclohexane, methylcyclohexene, and bicyclohexane;

[0616] Aromatic hydrocarbons such as benzene, toluene, xylene, and cumene;

[0617] Chain or cyclic esters such as amyl formate, ethyl formate, ethyl acetate, butyl acetate, propyl acetate, amyl acetate, methyl isobutyrate, ethylene glycol acetate, ethyl propionate, propyl propionate, butyl butyrate, isobutyl butyrate, methyl isobutyrate, ethyl octanoate, butyl stearate, ethyl benzoate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, and γ-butyrolactone;

[0618] Alkoxycarboxylic acids such as 3-methoxypropionic acid and 3-ethoxypropionic acid;

[0619] Halogenated hydrocarbons such as chlorobutane and chloropentane;

[0620] Ether ketones such as methoxymethylpentyl ketone;

[0621] Nitriles such as acetonitrile and benzonitrile.

[0622] Examples of commercially available organic solvents include mineral spirit, Varsol #2, Apco #18 Solvent, Apco thinner, Sorcal solvent No. 1 and No. 2, Solvesso #150, Shell TS28 Solvent, carbitol, ethyl carbitol, butyl carbitol, methyl cellosolve (“Cellosolve” is a registered trademark. The same shall apply hereinafter), ethyl cellosolve, ethyl cellosolve acetate, methyl cellosolve acetate, and diethylene glycol dimethyl ether (diglyme) (all trade names).

[0623] These organic solvents may be used alone or in combination of two or more.

[0624] When forming the partition wall by photolithography, as the organic solvent, an organic solvent having a boiling point of preferably 100 to 240°C, more preferably 120 to 200°C, and still more preferably 120 to 170°C is selected.

[0625] Glycol alkyl ether acetates are preferred because they have a good balance between coating properties and surface tension and have high solubility of components in the composition.

[0626] The glycol alkyl ether acetates may be used alone or in combination of two or more.

[0627] Glycol alkyl ether acetates may be used alone or in combination with other organic solvents. As the organic solvent used in combination, glycol monoalkyl ethers are preferred. Propylene glycol monomethyl ether is preferred from the perspective of solubility of the components in the composition.

[0628] Glycol monoalkyl ethers have high polarity. If the amount added is too large, the pigment is likely to aggregate, and the viscosity of the photosensitive color resin composition obtained thereafter tends to decrease in storage stability, such as an increase in viscosity. Therefore, the proportion of the glycol monoalkyl ether in the solvent is preferably 5 to 30% by mass, more preferably 5 to 20% by mass.

[0629] By using an organic solvent having a boiling point of 150°C or more (hereinafter sometimes referred to as a "high boiling point solvent") in combination, the photosensitive colored resin composition becomes difficult to dry, but there is an effect of preventing the uniform dispersion state of the pigment in the composition from being destroyed by rapid drying, so a high boiling point solvent can be used in combination. For example, there is an effect of preventing the generation of foreign matter defects caused by the precipitation / solidification of the colorant at the front end of the slit nozzle. From the perspective of this high effect, when a high boiling point solvent is used in combination, diethylene glycol mono-n-butyl ether, diethylene glycol mono-n-butyl ether acetate, and diethylene glycol monoethyl ether acetate are preferably used in combination.

[0630] When a high boiling point solvent is used in combination, the content of the high boiling point solvent in the organic solvent is preferably 3 to 50% by mass, more preferably 5 to 40% by mass, and particularly preferably 5 to 30% by mass. By setting it above the aforementioned lower limit, there is a tendency to suppress, for example, the precipitation / solidification of the colorant at the front end of the slit nozzle to cause foreign matter defects. By setting it below the aforementioned upper limit, the drying time of the composition can be suppressed from becoming longer, thereby suppressing problems such as poor beats in the reduced pressure drying process and pin marks of pre-baking.

[0631] The high boiling point solvent may be glycol alkyl ether acetate or glycol alkyl ether. In this case, the high boiling point solvent may not be contained separately.

[0632] Preferred high boiling point solvents include, for example, diethylene glycol mono-n-butyl ether acetate, diethylene glycol monoethyl ether acetate, dipropylene glycol methyl ether acetate, 1,3-butanediol diacetate, 1,6-hexanol diacetate, and glycerol triacetate.

[0633] <Content Ratio of Each Component in the Photosensitive Coloring Resin Composition>

[0634] The content ratio of the colorant (A) in the photosensitive colored resin composition of the present invention is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, and further preferably 15% by mass or more, relative to the total solid content of the photosensitive colored resin composition. In addition, it is preferably 40% by mass or less, more preferably 30% by mass or less, further preferably 25% by mass or less, and particularly preferably 20% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 5 to 40% by mass, more preferably 10 to 30% by mass, further preferably 15 to 30% by mass, further preferably 15 to 25% by mass, and particularly preferably 15 to 20% by mass. By setting it to above the aforementioned lower limit, there is a tendency to ensure light-shielding properties. By setting it to below the aforementioned upper limit, there is a tendency to reduce the amount of dispersants and suppress surface roughness.

[0635] The content ratio of the organic pigment (A-1) in the photosensitive coloring resin composition of the present invention is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, and further preferably 15% by mass or more, relative to the total solid content of the photosensitive coloring resin composition. In addition, it is preferably 40% by mass or less, more preferably 30% by mass or less, further preferably 25% by mass or less, and particularly preferably 20% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 5 to 40% by mass, more preferably 10 to 30% by mass, further preferably 15 to 30% by mass, further preferably 15 to 25% by mass, and particularly preferably 15 to 20% by mass. By setting it to above the aforementioned lower limit, there is a tendency to ensure light-shielding properties. By setting it to below the aforementioned upper limit, there is a tendency for the residual film rate to become higher.

[0636] When the photosensitive coloring resin composition of the present invention contains an organic black pigment, the content ratio of the organic black pigment in the photosensitive coloring resin composition is not particularly limited, and is preferably 5% by mass or more, more preferably 10% by mass or more, and further preferably 15% by mass or more relative to the total solid content of the photosensitive coloring resin composition. In addition, it is preferably 40% by mass or less, more preferably 30% by mass or less, further preferably 25% by mass or less, and particularly preferably 20% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 5 to 40% by mass, more preferably 10 to 30% by mass, further preferably 15 to 30% by mass, further preferably 15 to 25% by mass, and particularly preferably 15 to 20% by mass. By setting it to above the aforementioned lower limit, there is a tendency to ensure light-shielding properties. By setting it to below the aforementioned upper limit, there is a tendency for the residual film rate to become higher.

[0637] When the photosensitive colored resin composition of the present invention contains a colorant other than the organic pigment (A-1), the content ratio is not particularly limited, and is preferably 1% by mass or more, more preferably 5% by mass or more, and further preferably 10% by mass or more in the total solid content of the photosensitive colored resin composition. In addition, it is preferably 30% by mass or less, and more preferably 20% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 1 to 30% by mass, more preferably 5 to 20% by mass, and further preferably 10 to 20% by mass. By setting it to above the aforementioned lower limit, there is a tendency to suppress the loss of ultraviolet light required for curing and to increase the light-shielding property. By setting it to below the aforementioned upper limit, there is a tendency for the residual film rate to increase.

[0638] (B) The content ratio of the dispersant is not particularly limited, but is preferably 1% by mass or more, more preferably 2% by mass or more, and further preferably 3% by mass or more, relative to the total solid content of the photosensitive coloring resin composition. In addition, it is preferably 20% by mass or less, more preferably 15% by mass or less, further preferably 10% by mass or less, and further preferably 7% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 1 to 20% by mass, more preferably 2 to 15% by mass, further preferably 3 to 10% by mass, and particularly preferably 3 to 7% by mass. By setting it to above the aforementioned lower limit, there is a tendency to easily obtain sufficient dispersibility. By setting it to below the aforementioned upper limit, there is a tendency to reduce outgassing.

[0639] The content ratio of (B) dispersant relative to 100 parts by mass of (A) colorant is not particularly limited, but is preferably 5 parts by mass or more, more preferably 10 parts by mass or more, and further preferably 15 parts by mass or more. In addition, it is preferably 50 parts by mass or less, and more preferably 30 parts by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 5 to 50 parts by mass, more preferably 10 to 50 parts by mass, and further preferably 15 to 30 parts by mass. By setting it to above the aforementioned lower limit, there is a tendency to easily obtain sufficient dispersibility. By setting it to below the aforementioned upper limit, there is a tendency for the residual film rate to become higher.

[0640] (C) The content ratio of the alkali-soluble resin is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 20% by mass or more, further preferably 30% by mass or more, and particularly preferably 40% by mass or more, relative to the total solid content of the photosensitive coloring resin composition. In addition, it is preferably 85% by mass or less, more preferably 80% by mass or less, further preferably 70% by mass or less, further preferably 60% by mass or less, and particularly preferably 55% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 5 to 80% by mass, more preferably 10 to 70% by mass, further preferably 20 to 60% by mass, further preferably 30 to 60% by mass, further preferably 30 to 55% by mass, and particularly preferably 40 to 55% by mass. By setting it to the above lower limit or more, there is a tendency to suppress the solubility of the unexposed part in the developer and suppress poor development. By setting it to the above upper limit or less, there is a tendency to maintain appropriate sensitivity, suppress the dissolution of the exposed part due to the developer, and suppress the reduction of the cone angle.

[0641] The content ratio of the resin (C1) is not particularly limited, but is preferably 1% by mass or more, more preferably 3% by mass or more, and further preferably 5% by mass or more, relative to the total solid content of the photosensitive coloring resin composition. In addition, it is preferably 20% by mass or less, more preferably 17% by mass or less, more preferably 15% by mass or less, and further preferably 10% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 1 to 20% by mass, more preferably 3 to 17% by mass, further preferably 3 to 15% by mass, and particularly preferably 5 to 10% by mass. By setting it to above the aforementioned lower limit, there is a tendency to improve the dispersion stability. By setting it to below the aforementioned upper limit, there is a tendency for the solubility in the developer to become good.

[0642] The content ratio of the resin (C1) is not particularly limited, and is preferably 1% by mass or more, more preferably 5% by mass or more, and further preferably 10% by mass or more in the alkali-soluble resin (C). In addition, it is preferably 100% by mass or less, more preferably 80% by mass or less, further preferably 60% by mass or less, further preferably 40% by mass or less, and particularly preferably 20% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 1 to 100% by mass, more preferably 5 to 80% by mass, further preferably 10 to 60% by mass, further preferably 10 to 40% by mass, and particularly preferably 10 to 20% by mass. By setting it to above the above lower limit, there is a tendency to suppress the solubility of the unexposed part in the developer and suppress poor development. By setting it to below the above upper limit, there is a tendency to maintain appropriate sensitivity, suppress the dissolution of the exposed part due to the developer, and suppress the clarity and adhesion of the pattern.

[0643] When the photosensitive color resin composition of the present invention contains (C2) epoxy (meth) acrylate resin, the content ratio of (C2) epoxy (meth) acrylate resin is not particularly limited, but is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, further preferably 20% by mass or more, further preferably 30% by mass or more, and particularly preferably 40% by mass or more, relative to the total solid content of the photosensitive color resin composition of the present invention. In addition, it is preferably 80% by mass or less, more preferably 70% by mass or less, further preferably 60% by mass or less, and particularly preferably 55% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 5 to 80% by mass, more preferably 10 to 70% by mass, further preferably 15 to 60% by mass, further preferably 20 to 60% by mass, further preferably 30 to 55% by mass, and particularly preferably 40 to 55% by mass. By setting it to the above lower limit or more, there is a tendency to ensure the solubility of the unexposed portion in the developer. By setting it to the said upper limit or less, there exists a tendency that appropriate sensitivity can be maintained, dissolution of the exposed part by a developer can be suppressed, and the clarity and adhesiveness of a pattern can be suppressed from falling.

[0644] When the (C) alkali-soluble resin includes the (C2) epoxy (meth) acrylate resin, the content ratio of the (C2) epoxy (meth) acrylate resin contained in the (C) alkali-soluble resin is not particularly limited, and is preferably 20% by mass or more, more preferably 30% by mass or more, and further preferably 40% by mass or more. In addition, it is preferably 100% by mass or less, more preferably 90% by mass or less, and further preferably 80% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 20 to 100% by mass, more preferably 30 to 90% by mass, and further preferably 40 to 80% by mass. By setting it to above the aforementioned lower limit, there is a tendency to ensure the solubility of the unexposed portion in the developer. By setting it to below the aforementioned upper limit, there is a tendency to maintain appropriate sensitivity, suppress the dissolution of the exposed portion due to the developer, and suppress the clarity and adhesion of the pattern from decreasing.

[0645] When (C) the alkali-soluble resin includes (C3) a resin containing an isocyanuric acid skeleton, the content ratio of the resin containing (C3) an isocyanuric acid skeleton contained in the (C) alkali-soluble resin is not particularly limited, and is preferably 20% by mass or more, more preferably 30% by mass or more, and further preferably 40% by mass or more. In addition, it is preferably 90% by mass or less, more preferably 80% by mass or less, and further preferably 70% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 20 to 90% by mass, more preferably 30 to 80% by mass, and further preferably 40 to 70% by mass. By setting it to above the aforementioned lower limit, there is a tendency for the luminescent properties to be improved. By setting it to below the aforementioned upper limit, there is a tendency for the developability to be improved.

[0646] (D) The content ratio of the photopolymerization initiator is not particularly limited, but is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, further preferably 1% by mass or more, further preferably 2% by mass or more, and particularly preferably 3% by mass or more, relative to the total solid content of the photosensitive colored resin composition of the present invention. In addition, it is preferably 15% by mass or less, more preferably 10% by mass or less, further preferably 8% by mass or less, and particularly preferably 6% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 0.1 to 15% by mass, more preferably 0.5 to 15% by mass, further preferably 1 to 10% by mass, further preferably 2 to 8% by mass, and particularly preferably 3 to 6% by mass. By setting it to above the aforementioned lower limit, there is a tendency to suppress the decrease in sensitivity. By setting it to below the aforementioned upper limit, there is a tendency to suppress the decrease in solubility of the unexposed portion in the developer and suppress poor development.

[0647] When a polymerization accelerator is used together with the photopolymerization initiator (D), the content ratio of the polymerization accelerator is not particularly limited, but is preferably 0.05% by mass or more, preferably 10% by mass or less, and more preferably 5% by mass or less, relative to the total solid content of the photosensitive colored resin composition of the present invention. For example, it is preferably 0.05 to 10% by mass, and more preferably 0.05 to 5% by mass. In addition, the polymerization accelerator is preferably used in a ratio of 0.1 to 50 parts by mass, and more preferably 0.1 to 20 parts by mass, relative to 100 parts by mass of the photopolymerization initiator (D). By setting the content ratio of the polymerization accelerator to be above the aforementioned lower limit, there is a tendency to suppress the decrease in sensitivity to exposure light. By setting it to below the aforementioned upper limit, there is a tendency to suppress the decrease in solubility of the unexposed portion in the developer and suppress poor development.

[0648] When a sensitizing dye is used together with the (D) photopolymerization initiator, the content ratio of the sensitizing dye is not particularly limited, but is preferably 20% by mass or less, more preferably 15% by mass or less, and further preferably 10% by mass or less, relative to the total solid content in the photosensitive color resin composition from the viewpoint of sensitivity.

[0649] When the photosensitive colored resin composition of the present invention contains (E) an ethylenically unsaturated compound, the content ratio of the (E) ethylenically unsaturated compound is not particularly limited, and is preferably 1% by mass or more, more preferably 5% by mass or more, more preferably 10% by mass or more, and particularly preferably 15% by mass or more, relative to the total solid content of the photosensitive colored resin composition of the present invention. In addition, it is preferably 30% by mass or less, more preferably 25% by mass or less, and further preferably 20% by mass or less. The above upper and lower limits can be combined arbitrarily. For example, it is preferably 1 to 30% by mass, more preferably 5 to 25% by mass, more preferably 10 to 25% by mass, and particularly preferably 15 to 20% by mass. By setting it to above the aforementioned lower limit, there is a tendency to maintain appropriate sensitivity, suppress dissolution of the exposed portion due to the developer, and suppress the clarity and adhesion of the pattern. By setting it to below the aforementioned upper limit, there is a tendency to suppress the permeability of the developer to the exposed portion and to easily obtain a good image.

[0650] When the photosensitive colored resin composition of the present invention contains (E) an ethylenically unsaturated compound, the content ratio of the (C) alkali-soluble resin relative to 100 parts by mass of the (E) ethylenically unsaturated compound is not particularly limited, and is preferably 100 parts by mass or more, more preferably 200 parts by mass or more, further preferably 250 parts by mass or more, further preferably 300 parts by mass or more, and particularly preferably 350 parts by mass or more. In addition, it is preferably 700 parts by mass or less, more preferably 500 parts by mass or less, further preferably 450 parts by mass or less, and particularly preferably 400 parts by mass or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 100 to 700 parts by mass, more preferably 200 to 700 parts by mass, further preferably 250 to 500 parts by mass, further preferably 300 to 450 parts by mass, and particularly preferably 350 to 400 parts by mass. By setting it to the above lower limit value or more, there is a tendency to become a suitable dissolution and development state without peeling, etc. By setting it to the above upper limit value or less, there is a tendency to obtain a suitable dissolution time relative to the developer.

[0651] When a close adhesion improving agent is used, its content ratio is not particularly limited, but is preferably 0.1 to 5% by mass, more preferably 0.2 to 3% by mass, and further preferably 0.4 to 2% by mass relative to the total solid content of the photosensitive coloring resin composition. By setting it to be above the above lower limit, there is a tendency that the close adhesion improving effect can be sufficiently obtained. By setting it to be below the above upper limit, there is a tendency that the sensitivity can be reduced or the residual residue after development can be suppressed to become a defect.

[0652] When a surfactant is used, the content ratio thereof is not particularly limited, but is preferably 0.001 to 10% by mass, more preferably 0.005 to 1% by mass, further preferably 0.01 to 0.5% by mass, and particularly preferably 0.03 to 0.3% by mass relative to the total solid content of the photosensitive coloring resin composition. By setting the content to be above the lower limit, the coating film tends to be smooth and uniform. By setting the content to be below the upper limit, the coating film tends to be smooth and uniform, and deterioration of other characteristics can also be suppressed.

[0653] The photosensitive colored resin composition of the present invention is adjusted to preferably 5% by mass or more, more preferably 10% by mass or more, and further preferably 15% by mass or more by using a solvent, and preferably 50% by mass or less, more preferably 30% by mass or less, and further preferably 25% by mass or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably adjusted to 5 to 50% by mass, more preferably 10 to 30% by mass, and further preferably 15 to 25% by mass.

[0654] <Physical Properties of Photosensitive Colored Resin Composition>

[0655] The optical density (OD) of the photosensitive colored resin composition of the present invention per 1 μm film thickness of the coating film is not particularly limited, but is preferably 0.2 or more, more preferably 0.5 or more, further preferably 0.7 or more, further preferably 0.9 or more, and preferably 4.0 or less, more preferably 3.0 or less, further preferably 2.0 or less, and particularly preferably 1.5 or less. The above upper and lower limits may be combined arbitrarily. For example, it is preferably 0.2 to 4.0, more preferably 0.5 to 4.0, further preferably 0.5 to 3.0, further preferably 0.5 to 2.0, further preferably 0.7 to 2.0, and particularly preferably 0.9 to 1.5. By setting it to the above lower limit value or more, there is a tendency to obtain sufficient light-shielding properties. By setting it to the above upper limit value or less, there is a tendency to suppress the surface roughness of the electrode and the increase of the residual film rate.

[0656] The optical density (OD) per 1 μm film thickness of the coating film may be measured using a coating film formed by curing the photosensitive color resin composition of the present invention, and can be measured using a coating film of about 0.5 to 1.5 μm formed by heat curing at 230° C. for 20 minutes.

[0657] Optical density refers to the transmitted optical density shown by ISO Visualdensity in the ISO 5-3 standard, which is the spectral sensitivity characteristic of the light receiving unit. Usually, the A light source specified by CIE (International Commission on Illumination) is used as the light source. As a measuring instrument that can be used for the measurement of the transmitted optical density, for example, X-Rite 361T (V) of SAKATA INX ENG.CO.,LTD. can be cited.

[0658] [Pigment dispersion]

[0659] The components and compositions constituting the pigment dispersion of the present invention will be described.

[0660] The pigment dispersion of the present invention contains (A) a colorant, (B) a dispersant, and (C) an alkali-soluble resin, and in particular, the colorant (A) contains an organic pigment (A-1), and the alkali-soluble resin (C) contains a resin (C1). In addition, it is preferred to contain a solvent.

[0661] As the constituent components in the pigment dispersion of the present invention, the components listed as the same items in the photosensitive color resin composition of the present invention can be preferably used.

[0662] The resin (C1) has a high affinity for the pigment and also contains a methylene group in the main chain and has flexibility to follow the pigment. Therefore, the pigment dispersion of the present invention tends to show high pigment dispersibility.

[0663] In addition, the photosensitive colored resin composition using the pigment dispersion of the present invention tends to have a high residual film rate. As described above, since the resin (C1) contains a large number of aromatic rings in the main chain, it tends to have high developer resistance during development and high heat resistance during baking.

[0664] Moreover, when an organic electroluminescent element is formed using a partition obtained from a photosensitive coloring resin composition, as described above, the current density when a voltage is applied tends to be high.

[0665] <Content Ratio of Each Component in Pigment Dispersion Liquid>

[0666] In the pigment dispersion of the present invention, the content ratio of the colorant (A) is preferably 10% by mass or more, more preferably 20% by mass or more, further preferably 30% by mass or more, further preferably 40% by mass or more, further preferably 50% by mass or more, and particularly preferably 55% by mass or more relative to the total solid content in the pigment dispersion. In addition, it is usually 100% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, and further preferably 65% ​​by mass or less. By setting it to the above lower limit or more, a photosensitive color resin composition can be produced at an appropriate solid content concentration. In addition, by setting it to the above upper limit or less, there is a tendency for the dispersibility to become good. As a combination of the upper and lower limits, it is preferably 10 to 80% by mass, more preferably 20 to 80% by mass, further preferably 30 to 70% by mass, further preferably 40 to 70% by mass, particularly preferably 50 to 65% by mass, and most preferably 55 to 65% by mass.

[0667] In the pigment dispersion of the present invention, the content ratio of the organic pigment (A-1) is preferably 10% by mass or more, more preferably 20% by mass or more, further preferably 30% by mass or more, further preferably 40% by mass or more, further preferably 50% by mass or more, and particularly preferably 55% by mass or more relative to the total solid content in the pigment dispersion. In addition, it is usually 100% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, and further preferably 65% ​​by mass or less. By setting it to the above lower limit or more, a photosensitive coloring resin composition can be produced at an appropriate solid content concentration, and by setting it to the above upper limit or less, there is a tendency for the dispersibility to become good. As a combination of the upper and lower limits, it is preferably 10 to 80% by mass, more preferably 20 to 80% by mass, further preferably 30 to 70% by mass, further preferably 40 to 70% by mass, particularly preferably 50 to 65% by mass, and most preferably 55 to 65% by mass.

[0668] In the pigment dispersion of the present invention, the content ratio of the organic black pigment is preferably 10% by mass or more, more preferably 20% by mass or more, further preferably 30% by mass or more, further preferably 40% by mass or more, further preferably 50% by mass or more, and particularly preferably 55% by mass or more relative to the total solid content in the pigment dispersion. In addition, it is usually 100% by mass or less, preferably 80% by mass or less, more preferably 70% by mass or less, and further preferably 65% ​​by mass or less. By setting it to the above lower limit or more, a photosensitive coloring resin composition can be produced at an appropriate solid content concentration. In addition, by setting it to the above upper limit or less, there is a tendency for the dispersibility to become good. As a combination of the upper and lower limits, it is preferably 10 to 80% by mass, more preferably 20 to 80% by mass, further preferably 30 to 70% by mass, further preferably 40 to 70% by mass, particularly preferably 50 to 65% by mass, and most preferably 55 to 65% by mass.

[0669] In the pigment dispersion of the present invention, the content ratio of the dispersant (B) is preferably 2% by mass or more, more preferably 5% by mass or more, and further preferably 8% by mass or more relative to the total solid content in the pigment dispersion. In addition, it is preferably 50% by mass or less, more preferably 40% by mass or less, further preferably 30% by mass or less, further preferably 20% by mass or less, and particularly preferably 15% by mass or less. By setting it to be above the aforementioned lower limit, there is a tendency for the dispersibility to become better, and by setting it to be below the aforementioned upper limit, the excess dispersant can be reduced, and there is a tendency for the developability of the obtained photosensitive coloring resin composition to become better. As a combination of the upper limit and the lower limit, preferably 2 to 50% by mass, more preferably 5 to 40% by mass, further preferably 5 to 30% by mass, further preferably 5 to 20% by mass, and particularly preferably 8 to 15% by mass can be cited.

[0670] When the pigment dispersion of the present invention contains an acrylic dispersant as the (B) dispersant, the content ratio of the acrylic dispersant is preferably 2% by mass or more, more preferably 5% by mass or more, and further preferably 8% by mass or more relative to the total solid content in the pigment dispersion. In addition, it is preferably 50% by mass or less, more preferably 40% by mass or less, further preferably 30% by mass or less, further preferably 20% by mass or less, and particularly preferably 15% by mass or less. By setting it to above the aforementioned lower limit, there is a tendency that the dispersibility becomes good, and the pattern adhesion becomes good during the development of the cured product, and by setting it to below the aforementioned upper limit, there is a tendency that the developability of the obtained photosensitive coloring resin composition becomes good. As a combination of the upper and lower limits, it is preferably 2 to 50% by mass, more preferably 5 to 40% by mass, further preferably 5 to 30% by mass, further preferably 5 to 20% by mass, and particularly preferably 10 to 15% by mass.

[0671] In the pigment dispersion of the present invention, the content ratio of (C) the alkali-soluble resin is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, further preferably 20% by mass or more, and particularly preferably 25% by mass or more relative to the total solid content in the pigment dispersion. In addition, it is preferably 50% by mass or less, more preferably 40% by mass or less, and further preferably 35% by mass or less. By setting it to be above the aforementioned lower limit, there is a tendency for the dispersibility to become good, and by setting it to be below the aforementioned upper limit, there is a tendency to make the colorant amount in the obtained photosensitive coloring resin composition appropriate and to ensure sufficient light-shielding properties. As a combination of the upper and lower limits, it is preferably 5 to 50% by mass, more preferably 10 to 40% by mass, further preferably 15 to 35% by mass, further preferably 20 to 35% by mass, and particularly preferably 25 to 35% by mass.

[0672] The content ratio of the resin (C1) in the pigment dispersion of the present invention is preferably 5% by mass or more, more preferably 10% by mass or more, further preferably 15% by mass or more, further preferably 20% by mass or more, and particularly preferably 25% by mass or more relative to the total solid content in the pigment dispersion. In addition, it is preferably 50% by mass or less, more preferably 40% by mass or less, and further preferably 35% by mass or less. By setting it to be above the aforementioned lower limit, there is a tendency for the dispersibility to become good, and by setting it to be below the aforementioned upper limit, there is a tendency that the colorant amount in the obtained photosensitive color resin composition can be made appropriate and sufficient light-shielding properties can be ensured. As a combination of the upper limit and the lower limit, it is preferably 5 to 50% by mass, more preferably 10 to 40% by mass, further preferably 15 to 35% by mass, further preferably 20 to 35% by mass, and particularly preferably 25 to 35% by mass.

[0673] The pigment dispersion of the present invention is adjusted to preferably have a solid content concentration of 5 to 50% by mass, more preferably 10 to 30% by mass, using the organic solvent.

[0674] <Physical Properties of Pigment Dispersion>

[0675] The viscosity of the pigment dispersion is preferably 1 MPa·s or more, more preferably 3 MPa·s or more, and further preferably 5 MPa·s or more. It is preferably 15 MPa·s or less, and further preferably 10 MPa·s or less. The viscosity can be measured, for example, using a rotational viscometer.

[0676] [Method for producing pigment dispersion]

[0677] The pigment dispersion of the present invention is produced according to a conventional method.

[0678] The colorant (A) is preferably dispersed in advance using a paint shaker, sand mill, ball mill, roll mill, stone mill, jet mill, homogenizer, etc. The dispersion treatment can finely divide the colorant (A), thereby improving the coating properties of the photosensitive color resin composition and reducing the surface roughness.

[0679] The dispersion treatment is preferably carried out in a system in which (A) a colorant, (B) a dispersant and a solvent, and (C) a part or all of an alkali-soluble resin are used in combination, or in a system in which (A) a colorant, (B) a dispersant and a solvent, and (C) a part or all of an alkali-soluble resin are used in combination. In particular, when a polymer dispersant is used as the dispersant (B), the thickening of the obtained pigment dispersion and the photosensitive color resin composition over time can be suppressed, that is, the dispersion stability is excellent, which is preferred.

[0680] As the (A) colorant, (B) dispersant, and solvent that can be used in the pigment dispersion, the examples described as those that can be used in the photosensitive color resin composition can be preferably adopted.

[0681] When a liquid containing all the components blended in the photosensitive color resin composition is dispersed, the highly reactive components may be modified due to heat generated during the dispersion treatment. Therefore, it is preferable to perform the dispersion treatment in a system containing a polymer dispersant.

[0682] When the colorant (A) is dispersed by a sand mill, glass beads or zirconium oxide beads having a particle size of about 0.1 to 8 mm are preferably used. Regarding the dispersion treatment conditions, the temperature is preferably 0°C to 100°C, and more preferably room temperature to 80°C. Regarding the dispersion time, since the appropriate time varies depending on the composition of the liquid and the size of the dispersion treatment device, it is appropriately adjusted. The standard of dispersion is: the gloss of the pigment dispersion is controlled so that the 20-degree specular gloss (JIS Z8741) of the photosensitive coloring resin composition is in the range of 50 to 300. When the gloss of the photosensitive coloring resin composition is low, the dispersion treatment is usually insufficient, and rough pigment (colorant) particles remain, which may make the developability, adhesion, resolution, surface roughness, etc. insufficient. If the dispersion treatment is performed until the gloss value exceeds the above range, the pigment is broken and a large number of ultrafine particles are generated, so there is a tendency for the dispersion stability to be impaired.

[0683] The dispersed particle size of the pigment dispersed in the pigment dispersion is preferably 0.03 to 0.3 μm, and can be measured by a dynamic light scattering method.

[0684] [Method for producing photosensitive colored resin composition]

[0685] Next, the pigment dispersion obtained by the above dispersion treatment is mixed with other components contained in the photosensitive color resin composition to prepare a uniform solution or dispersion. In the production process of the photosensitive color resin composition, fine dust may be mixed into the liquid, so it is desirable to filter the obtained photosensitive color resin composition using a filter or the like.

[0686] [cured material]

[0687] The cured product of the present invention can be obtained by curing the photosensitive color resin composition of the present invention. The cured product obtained by curing the photosensitive color resin composition of the present invention can be suitably used as a black matrix, an insulating film, or a partition, and can be more suitably used as a partition.

[0688] The film thickness of the cured product is preferably 0.5 μm or more, more preferably 0.7 μm or more, and further preferably 0.9 μm or more. In addition, it is preferably 15 μm or less, more preferably 10 μm or less, and further preferably 5 μm or less. For example, it is preferably 0.5 to 15 μm, more preferably 0.7 to 10 μm, and further preferably 0.9 to 5 μm.

[0689] From the viewpoint of light-shielding properties, the optical density (OD) per 1 μm of the cured product of the present invention is preferably 0.2 or more, more preferably 0.5 or more, further preferably 0.7 or more, and particularly preferably 0.9 or more. In addition, it is preferably 4.0 or less, more preferably 3.0 or less, further preferably 2.0 or less, and particularly preferably 1.5 or less. For example, it is preferably 0.2 to 4.0, more preferably 0.5 to 4.0, further preferably 0.5 to 3.0, further preferably 0.5 to 2.0, further preferably 0.7 to 2.0, and particularly preferably 0.9 to 1.5. Here, the optical density (OD) is a value measured by the method described later.

[0690] Next, a cured product using the photosensitive coloring resin composition of the present invention will be described in terms of its production method.

[0691] (1) Support

[0692] As a support for forming a solidified product, as long as it has appropriate strength, its material is not particularly limited. Mainly used is a substrate, and as a material, for example, polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, thermoplastic resin sheets such as polycarbonate, polymethyl methacrylate, and polysulfone, epoxy resins, unsaturated polyester resins, poly (methyl) acrylic resins and other thermosetting resin sheets, various glasses. From the viewpoint of heat resistance, glass and heat-resistant resins are preferred. In addition, sometimes a transparent electrode such as ITO and IZO or a metal electrode such as silver, gold, platinum, aluminum, and magnesium is formed on the surface of the substrate. In addition to the above-mentioned substrate, it can also be formed on a TFT array.

[0693] To improve surface properties such as adhesiveness, the support may be subjected to, if necessary, corona discharge treatment, ozone treatment, or treatment for forming a thin film of various resins such as a silane coupling agent or a urethane resin.

[0694] The thickness of the support is preferably in the range of 0.05 to 10 mm, more preferably 0.1 to 7 mm. When thin film formation of various resins is performed, the film thickness is preferably in the range of 0.01 to 10 μm, more preferably 0.05 to 5 μm.

[0695] On the support on which the cured product is to be provided, a photosensitive colored resin composition is applied in a film or pattern by a coating method or the like, and the solvent is dried. Then, patterning is performed by a method such as photolithography with exposure-development. After that, additional exposure and heat curing treatment are performed as needed to form a cured product on the substrate.

[0696] (2) Method of supplying to support

[0697] The photosensitive colored resin composition of the present invention is preferably supplied to the support in a state dissolved or dispersed in a solvent. As a supply method, it can be carried out by a conventionally known method, such as a spin coating method, a wire bar method, a flow coating method, a die coating method, a roller coating method, and a spray coating method. In addition, it can be supplied in a pattern by, for example, an inkjet method or a printing method. When using the die coating method, it is preferred from a comprehensive point of view that the amount of coating liquid used is greatly reduced, and there is no influence of mist attached when using the spin coating method, and the generation of foreign matter is suppressed.

[0698] The coating amount varies depending on the application, and is preferably 0.5 μm to 10 μm, more preferably 1 μm to 9 μm, and particularly preferably 1 μm to 7 μm in terms of dry film thickness. It is important that the dry film thickness or the height of the finally formed solidified product is uniform over the entire region of the support. By reducing the deviation, the light shielding property in the support becomes uniform, and in the case of being used as a partition wall, the light-emitting layer can be uniformly produced, and poor display during light emission can be suppressed.

[0699] When cured products having different heights are formed at once by photolithography using the photosensitive color resin composition of the present invention, the heights of the cured products finally formed will be different.

[0700] (3) Drying method

[0701] Drying after supplying the photosensitive color resin composition onto the support is preferably performed by a drying method using a hot plate, an IR oven, or a convection oven. It may also be combined with a reduced pressure drying method in which the composition is dried in a reduced pressure chamber without increasing the temperature.

[0702] The drying conditions can be appropriately selected according to the type of solvent component, the performance of the dryer used, etc. The drying time is preferably selected within the range of 40 to 130° C. and 15 seconds to 5 minutes, and more preferably within the range of 50 to 110° C. and 30 seconds to 3 minutes, depending on the type of solvent component, the performance of the dryer used, etc.

[0703] (4) Exposure method

[0704] Exposure is performed by superimposing a negative mask pattern on the coating film of the photosensitive color resin composition and irradiating a light source of ultraviolet rays or visible light through the mask pattern. When exposure is performed using an exposure mask, a method of bringing the exposure mask close to the coating film of the photosensitive color resin composition; a method of arranging the exposure mask at a position away from the coating film of the photosensitive color resin composition and projecting exposure light through the exposure mask can be adopted. A scanning exposure method using a laser without using a mask pattern can also be adopted. If necessary, in order to prevent the sensitivity of the photopolymerizable layer from decreasing due to oxygen, exposure can be performed in a deoxygenated atmosphere, or after an oxygen barrier layer such as a polyvinyl alcohol layer is formed on the photopolymerizable layer.

[0705] When forming cured products of different heights at the same time by photolithography, for example, an exposure mask having a light shielding portion (transmittance 0%) and a plurality of openings (medium-transmittance openings) whose average transmittance is lower than that of the opening with the highest average transmittance (completely-transmitted openings) is used. By this method, a difference in the residual film rate occurs due to the difference in average transmittance between the medium-transmittance openings and the completely-transmitted openings, i.e., the difference in exposure amount.

[0706] The medium transmission opening is made by, for example, a matrix-shaped light shielding pattern having tiny polygonal light shielding units. As the absorber, for example, a film of chromium, molybdenum, tungsten, or silicone material is used to control the light transmittance.

[0707] The light source used for exposure is not particularly limited. Examples of the light source include lamp light sources such as xenon lamps, halogen lamps, tungsten lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arcs, and fluorescent lamps; and laser light sources such as argon ion lasers, YAG lasers, excimer lasers, nitrogen lasers, helium-cadmium lasers, blue-violet semiconductor lasers, and near-infrared semiconductor lasers. When using light of a specific wavelength for irradiation, a filter may also be used.

[0708] The filter may be of a type that can control the transmittance at the exposure wavelength by a thin film, and the material in this case may include, for example, Cr compounds (Cr oxides, nitrides, oxynitrides, fluorides, etc.), MoSi, Si, W, and Al.

[0709] The exposure dose is not particularly limited, but is preferably 1 mJ / cm 2 More preferably, 5 mJ / cm 2 More preferably, 10 mJ / cm 2 More than, preferably 300mJ / cm 2 Less than, more preferably 200mJ / cm 2 Below, more preferably 150mJ / cm 2 the following.

[0710] (5) Development method

[0711] After the exposure, an image pattern can be formed on the support by development using an aqueous solution of a basic compound or an organic solvent. The aqueous solution of a basic compound may further contain, for example, a surfactant, an organic solvent, a buffer, a complexing agent, a dye or a pigment.

[0712] As the alkaline compound, for example, inorganic alkaline compounds such as sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide, monoethanolamine, diethanolamine or triethanolamine, monomethylamine, dimethylamine or trimethylamine, monoethylamine, diethylamine or triethylamine, monoisopropylamine or diisopropylamine, n-butylamine, monoisopropanolamine, diisopropanolamine or triisopropanolamine, ethyleneimine, ethylenediamine, tetramethylammonium hydroxide (TMAH), choline, etc. can be listed. These alkaline compounds can be used alone or in combination of two or more.

[0713] Examples of the surfactant include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, and monoglyceride alkyl esters; anionic surfactants such as alkylbenzene sulfonates, alkylnaphthalene sulfonates, alkyl sulfates, alkyl sulfonates, and sulfosuccinates; and amphoteric surfactants such as alkyl betaines and amino acids.

[0714] Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, and diacetone alcohol. Two or more of these organic solvents may be used in combination. In addition, the organic solvent may be used alone or in combination with water or an aqueous solution of an alkaline compound.

[0715] The conditions for the development treatment are not particularly limited, but the development temperature is preferably 10 to 50° C., more preferably 15 to 45° C., and further preferably 20 to 40° C. The development method may include, for example, immersion development, spray development, brush development, or ultrasonic development.

[0716] (6) Additional exposure and thermal curing treatment

[0717] The developed substrate may be subjected to additional exposure as required in the same manner as the above exposure method. After development or additional exposure, a thermal curing treatment (also referred to as baking) may also be performed. Regarding the thermal curing treatment conditions, the temperature is preferably 100 to 280° C., more preferably 150 to 250° C., and the time is 5 to 60 minutes.

[0718] [Partition wall]

[0719] The photosensitive colored resin composition of the present invention can be suitably used to form partition walls, in particular, partition walls for partitioning the organic layer of an organic electroluminescent element. As an organic layer for an organic electroluminescent element, for example, an organic layer for a hole injection layer, a hole transport layer, or a hole transport layer on a hole injection layer described in Japanese Patent Application Laid-Open No. 2016-165396 can be cited.

[0720] When the present invention is used as a partition, the size and shape can be appropriately adjusted according to the specifications of the organic electroluminescent element using it. The film thickness and optical density (OD) per 1 μm of the partition formed from the photosensitive colored resin composition of the present invention are the same as those of the cured film.

[0721] [Organic electroluminescent element]

[0722] The organic electroluminescent element of the present invention includes a cured product, such as a partition, formed from the photosensitive colored resin composition of the present invention.

[0723] For example, various organic electroluminescent elements can be manufactured using a substrate having a partition wall pattern manufactured using the above method. The method for forming the organic electroluminescent element is not particularly limited, and preferably, after forming a partition wall pattern on a substrate using the above method, an organic layer such as a pixel is formed by a wet process such as a vapor deposition method, a casting method, a spin coating method, or an inkjet printing method, thereby manufacturing the organic electroluminescent element, wherein the vapor deposition method sublimates the functional material in a vacuum state and adheres to the region surrounded by the partition wall on the substrate to form a film.

[0724] Examples of the types of organic electroluminescent elements include bottom emission type and top emission type.

[0725] In the bottom emission type, a partition wall is formed on a glass substrate laminated with a transparent electrode, and a hole transport layer, a light-emitting layer, an electron transport layer, and a metal electrode layer are laminated in the opening surrounded by the partition wall. On the other hand, the top emission type can be produced by forming a partition wall on a glass substrate laminated with a metal electrode layer as a reflective layer, and an electron transport layer, a light-emitting layer, a hole transport layer, and a transparent electrode layer are laminated in the opening surrounded by the partition wall. In most cases, an anode is provided on the support, but it is not limited to this.

[0726] Examples of the light-emitting layer include organic electroluminescent layers described in Japanese Patent Application Publication No. 2009-146691 and Japanese Patent No. 5734681. In addition, quantum dots described in Japanese Patent No. 5653387 and Japanese Patent No. 5653101 may also be used.

[0727] The layer structure is not limited thereto, for example, from the viewpoint of luminous efficiency, each of the hole transport layer and the electron transport layer may be a stacked structure including two or more layers. The thickness of each layer is not particularly limited, but is preferably 1 to 500 nm from the viewpoint of luminous efficiency and brightness.

[0728] The organic electroluminescent element can be formed into RGB colors separately in each opening, or two or more colors can be stacked in one opening. From the viewpoint of improving reliability, the organic electroluminescent element can have a sealing layer. The sealing layer has the function of preventing moisture in the air from being adsorbed on the organic electroluminescent element and reducing the luminous efficiency. From the viewpoint of improving light extraction efficiency, the organic electroluminescent element can have a low-reflection film at the interface with the air. By configuring the low-reflection film at the interface between the air and the element, the difference in refractive index can be reduced and the reflection at the interface can be suppressed. Such a low-reflection film can, for example, apply the technology of moth-eye structure and super multilayer film.

[0729] When an organic electroluminescent element is used as a pixel of an image display device, it is necessary to prevent light from the light-emitting layer of some pixels from leaking to other pixels. Furthermore, when electrodes etc. are made of metal, it is necessary to prevent a reduction in image quality due to reflection of external light. Therefore, it is preferred to impart light-shielding properties to the partition walls constituting the organic electroluminescent element.

[0730] In an organic electroluminescent element, since electrodes need to be provided on the upper and lower surfaces of the partition wall, from the viewpoint of insulation, the partition wall is preferably high-resistance and low-dielectric-constant. Therefore, when a colorant is used to provide light-shielding properties to the partition wall, it is preferred to use the aforementioned organic pigment having high resistance and low dielectric constant.

[0731] [Color filter containing luminescent nanocrystal particles]

[0732] The color filter containing the light-emitting nanocrystal particles of the present invention is not particularly limited as long as it includes the partition walls of the present invention, and examples thereof include color filters in which pixels are formed in regions partitioned by the partition walls.

[0733] Figure 1 Schematic cross-sectional view of an example of a color filter having a partition wall of the present invention. Figure 1 As shown in FIG. 1 , the color filter 100 includes a substrate 10, a partition wall 20 provided on the substrate, a red pixel 30, a green pixel 40, and a blue pixel 50. The red pixel 30, the green pixel 40, and the blue pixel 50 are arranged in a grid shape in a sequentially repeated manner. The partition wall 20 is provided between these mutually adjacent pixels. In other words, these mutually adjacent pixels are divided by the partition wall 20.

[0734] The red pixel 30 includes red luminescent nanocrystal particles 2, and the green pixel 40 includes green luminescent nanocrystal particles 1. The blue pixel 50 is a pixel that can transmit blue light from a light source.

[0735] These nanocrystal particles are nano-sized crystals that absorb excitation light and emit fluorescence or phosphorescence, and have a maximum particle size of 100 nm or less as measured by, for example, a transmission electron microscope or a scanning electron microscope.

[0736] Luminescent nanocrystal particles can emit light of a wavelength different from the absorption wavelength by absorbing light of a specified wavelength (fluorescence or phosphorescence). For example, red luminescent nanocrystal particles 2 emit light with a luminescence peak wavelength in the range of 605 to 665 nm (red light), and green luminescent nanocrystal particles 1 emit light with a luminescence peak wavelength in the range of 500 to 560 nm (green light).

[0737] According to the solution of the Schrodinger wave equation of the trap potential model, the wavelength (luminescent color) of the light emitted by the luminescent nanocrystal particle depends on the size (for example particle diameter) of the luminescent nanocrystal particle, and also depends on the energy gap possessed by the luminescent nanocrystal particle.Therefore, by changing the constituent material and the size of the luminescent nanocrystal particle used, luminescent color can be selected.As the luminescent nanocrystal particle, quantum dot etc. can be listed.

[0738] The method for manufacturing the color filter containing luminescent nanocrystal particles is not particularly limited, and examples thereof include: preparing a substrate having a partition wall formed by the cured product of the present invention, and forming a layer containing luminescent nanocrystal particles in the region divided by the partition wall. The method for forming the layer containing luminescent nanocrystal particles is not particularly limited, and the color filter can be manufactured by, for example, selectively attaching an ink composition containing luminescent nanocrystal particles by inkjet method, and curing the ink composition by irradiation or heating with active energy rays.

[0739] [Image display device]

[0740] Examples of the image display device of the present invention include an organic EL display device having a partition wall made of the cured product of the present invention and an organic electroluminescent element.

[0741] As long as the organic EL display device includes the above-mentioned organic electroluminescent element, there is no particular restriction on the model and structure of the image display device. For example, an active drive type organic electroluminescent element can be used and assembled according to a conventional method. For example, it can be formed by the method described in "Organic EL Display" (OHM Co., Ltd., issued on August 20, 2001, by Shizuo Tokito, Chiba Ya Anda, and Hideyuki Murata). For example, an organic electroluminescent element emitting white light can be combined with a color filter to display an image, or organic electroluminescent elements with different luminescent colors such as RGB can be combined to display an image.

[0742] Example

[0743] The present invention will be described in more detail below with reference to Examples and Comparative Examples. However, the present invention is not limited to the following Examples unless the gist of the invention is exceeded.

[0744] The constituent components of the photosensitive coloring resin composition used in the following Examples and Comparative Examples, and their evaluation methods are as follows.

[0745] <Alkali Soluble Resin-I>

[0746]

[0747] 70 parts by mass of an epoxy compound (epoxy equivalent 273) having a repeating unit shown in the above formula, 18.5 parts by mass of acrylic acid, 1.77 parts by mass of triphenylphosphine, 0.0442 parts by mass of 4-methoxyphenol and 59 parts by mass of propylene glycol monomethyl ether acetate were put into a reaction vessel and stirred. Then, 7.6 parts by mass of phthalic anhydride and 37.1 parts by mass of propylene glycol monomethyl ether acetate were further added to react. The alkali-soluble resin-I thus obtained had a weight average molecular weight Mw of 2456 measured by GPC and an acid value of 64 mgKOH / g, which was equivalent to resin (C1) and the structure shown in formula (C1-1).

[0748] <Alkali Soluble Resin-II>

[0749] 155 parts by mass of EPICLON HP7200 HH (polyglycidyl ether of dicyclopentadiene-phenol polymer, weight average molecular weight 1000, epoxy equivalent 270) manufactured by DIC Corporation, 41 parts by mass of acrylic acid, 0.1 parts by mass of p-methoxyphenol, 2.5 parts by mass of triphenylphosphine, and 270 parts by mass of propylene glycol monomethyl ether acetate were placed in a reaction vessel, and heated and stirred at 100°C until the acid value became 3.0 mgKOH / g or less. It took 9 hours for the acid value to reach the target (acid value 2.9 mgKOH / g). Then, 74 g of tetrahydrophthalic anhydride was further added, and the mixture was reacted at 120°C for 4 hours. The weight average molecular weight Mw of the alkali-soluble resin-II thus obtained was 3500, and the acid value was 60 mgKOH / g, which did not belong to resin (C1).

[0750] <Alkali-soluble resin-III>

[0751] “ZCR-1664H” manufactured by Nippon Kayaku Co., Ltd. (weight average molecular weight Mw=5200, acid value=60 mgKOH / g) has a partial structure represented by the following formula, in which * represents a connecting bond.

[0752] Alkali-soluble resin-III does not belong to resin (C1).

[0753]

[0754] <Alkali-soluble resin-IV>

[0755] Nippon Kayaku Co., Ltd. "CCR-1342H" (weight average molecular weight Mw = 6500, acid value = 60 mgKOH / g) has a partial structure represented by the following formula, in which * represents a connecting bond.

[0756] Alkali-soluble resin-IV does not belong to resin (C1).

[0757]

[0758] <Alkali soluble resin-V>

[0759]

[0760] 240 parts by mass of the epoxy compound (epoxy equivalent 264) of the above structure, 68.3 parts by mass of acrylic acid, 263.1 parts by mass of methoxybutyl acetate, 6.4 parts by mass of triphenylphosphine and 0.16 parts by mass of p-methoxyphenol were placed in a flask equipped with a thermometer, a stirrer and a condenser, and reacted at 90°C for 12 hours while stirring until the acid value was 5 mgKOH / g or less.

[0761] Next, in a flask equipped with a thermometer, a stirrer, and a condenser, 9.2 parts by mass of trimethylolpropane (TMP), 115.6 parts by mass of biphenyltetracarboxylic dianhydride (BPDA), and 25.1 parts by mass of tetrahydrophthalic anhydride (THPA) were added to the reaction solution obtained by the above reaction, and the temperature was slowly raised to 105° C. while stirring to react, thereby obtaining an alkali-soluble resin-V having a solid content acid value of 104 mgKOH / g and a polystyrene-equivalent weight average molecular weight (Mw) of 2660 measured by GPC. The alkali-soluble resin-V belongs to (C2) epoxy (meth) acrylate resin.

[0762] <Alkali Soluble Resin-VI>

[0763] "KBR-201" manufactured by KISCO. A resin having a fluorene bisphenol skeleton. Weight average molecular weight 5107, acid value 113 mgKOH / g. Alkali-soluble resin-VI belongs to (C2) epoxy (meth)acrylate resin.

[0764] <Alkali-soluble resin-VII>

[0765]

[0766] While nitrogen substitution was performed, 50.0 parts by mass of the epoxy compound having the chemical structure represented by the above formula, 170.3 parts by mass of propylene glycol monomethyl ether acetate, 0.89 parts by mass of 2,4,6-tris(dimethylaminomethyl)phenol, and 0.050 parts by mass of p-methoxyphenol were stirred and heated to 100°C. 44.3 parts by mass of methacrylic acid was added dropwise over 30 minutes. The mixture was further reacted at 100°C for 8 hours until the acid value became 10 mgKOH / g or less, thereby obtaining epoxy (meth)acrylate solution A.

[0767]

[0768] While nitrogen replacement was performed, 50.0 parts by mass of epoxy (meth) acrylate solution A (35.9% by mass solid content concentration) containing the epoxy (meth) acrylate compound of the above chemical structure and 3.1 parts by mass of propylene glycol monomethyl ether acetate were stirred. 3.48 parts by mass of pyromellitic dianhydride (PDMA) and 2.36 parts by mass of phthalic anhydride were added, the temperature was raised to 80°C, and the reaction was carried out for 5 hours to obtain an alkali-soluble resin-VII having a solid content of 40% by mass, an acid value of 145 mgKOH / g, and a weight average molecular weight (Mw) of 2800 in terms of polystyrene measured by GPC. Alkali-soluble resin-VII belongs to (C3) resins containing isocyanuric acid skeletons.

[0769] <Alkali-soluble resin-VIII>

[0770]

[0771] 100 parts by mass of an epoxy compound (epoxy equivalent 273) having a repeating unit shown in the above formula, 26.42 parts by mass of acrylic acid, 2.53 parts by mass of triphenylphosphine, 0.0632 parts by mass of 4-methoxyphenol and 84.28 parts by mass of propylene glycol monomethyl ether acetate were put into a reaction vessel and stirred. Then, 22.8 parts by mass of trimellitic anhydride and 48.9 parts by mass of propylene glycol monomethyl ether acetate were further added to react. The alkali-soluble resin-I thus obtained had a weight average molecular weight Mw of 1668 measured by GPC and an acid value of 96.3 mgKOH / g, which was equivalent to resin (C1) and the structure shown in formula (C1-1).

[0772] <Colorant-I>

[0773] Irgaphor (registered trademark) Black S 0100CF manufactured by BASF (having a chemical structure represented by the following formula (A-1-2)).

[0774]

[0775] <Dispersant-I>

[0776] A block copolymer formed of an A block comprising a repeating unit having a solvent-philic group and a B block comprising a repeating unit having a tertiary amino group.

[0777] <Dispersant-II>

[0778] A block copolymer formed of an A block comprising a repeating unit having a solvent-philic group and a B block comprising a repeating unit having a tertiary amino group and a quaternary ammonium group.

[0779] <Solvent-I>

[0780] PGMEA: propylene glycol monomethyl ether acetate.

[0781] <Solvent-II>

[0782] MB: 3-methoxy-1-butanol.

[0783] <Solvent-III>

[0784] MBA: 3-methoxy-butyl acetate.

[0785] <Photopolymerization Initiator-I>

[0786] The oxime ester photopolymerization initiator has the following chemical structure.

[0787]

[0788] <Ethylenically Unsaturated Compound-1>

[0789] DPHA: manufactured by Nippon Kayaku Co., Ltd., a mixture of dipentaerythritol pentaacrylate and dipentaerythritol hexaacrylate.

[0790] <Surfactant-I>

[0791] DIC Corporation, MEGAFAC F-559

[0792] <Viscosity Evaluation>

[0793] The viscosity of the pigment dispersion was measured using a RE-85L viscometer manufactured by Toki Sangyo Co., Ltd. (measurement conditions: 23° C., 20 rpm) immediately after the pigment dispersion was prepared, after the pigment dispersion was allowed to stand at room temperature (24° C.) for 1 day, and after the pigment dispersion was allowed to stand for 3 days, and the judgment was made as follows.

[0794] The pigment dispersion preferably has a low viscosity from the viewpoint of coating properties and temporal stability of the photosensitive color resin composition.

[0795] A: Viscosity is less than 10 mPa·s

[0796] B: Viscosity greater than 10mPa·s

[0797] C: Unable to disperse and solidified

[0798] <Preparation of Substrate for Evaluation of Residual Film Rate>

[0799] On a substrate having an indium tin oxide (ITO) film formed on the surface of a glass substrate having a film thickness of 0.7 mm, the photosensitive colored resin composition of each Example / Comparative Example was applied using a spin coater in such a manner that the thickness became 1.5 μm after heat curing (baking). Then, a drying treatment was performed for 60 seconds in a vacuum dryer. Next, the coating was dried for 100 seconds on a hot plate heated to 100° C. to obtain a coated substrate.

[0800] The film thickness of the coating film after heat drying was measured by the method described later to determine the film thickness T1 (μm).

[0801] The obtained coating film substrate was exposed using a photomask. A mirror projection type exposure machine (MPA-600FA) manufactured by Canon Inc. was used at an exposure dose of 80 mJ / cm 2 The exposure was performed for 20 seconds. The illumination was 500mW / cm 2 The slit width was 1.6 mm. A mask having a lattice-shaped opening (having a 50 μm square-shaped cover portion and a plurality of the cover portions separated by a 50 μm exposure portion) was used as the photomask.

[0802] Next, a developer containing an aqueous solution containing 0.05% by mass of potassium hydroxide and 0.08% by mass of a nonionic surfactant ("A-60" manufactured by Kao Corporation) was used, and after spray development at a water pressure of 0.05 MPa was performed at 24°C, the developer was washed away with pure water to stop the development, and the film was washed with a water washing sprayer for 10 seconds. The spray development time was set to 1.6 times the time for the unexposed part of the coating film to be dissolved and removed. The portion corresponding to the square light shielding portion was exposed to the ITO substrate because the photosensitive coloring resin composition was washed away after development, forming a hole portion.

[0803] The substrate was heat-cured (baked) in an oven at 230° C. for 30 minutes to obtain a pattern substrate for patterning property measurement. The film thickness T2 (μm) at this time was measured.

[0804] <Calculation of Residual Film Ratio>

[0805] The film thickness of the coating film of the pattern substrate in each process (after drying and after baking) was measured using the non-contact surface / layer cross-section shape measurement system VertScan(R)2.0 manufactured by Ryoka Systems Inc. The ratio of the film thickness after baking (T2) to the film thickness after drying (T1) in the measured film thickness was calculated as the residual film ratio.

[0806] Residual film rate (%) = (T2 / T1) × 100 (%)

[0807] The calculated residual film ratio was judged as follows: A means that the residual film ratio is the highest and is good, and if the residual film ratio is 75% or more, there is a tendency that there is no problem in practical use.

[0808] A: Residual film rate is more than 80%

[0809] B: The residual film rate is less than 80% and more than 75%

[0810] C: Residual film rate is less than 75%

[0811] The residual film ratio is related to the exposure sensitivity of the resist, the solubility in a developer, and the thermal decomposition property during baking, and the higher the residual film ratio, the more preferable it is.

[0812] <Measurement of Optical Density per Unit Film Thickness (Unit OD Value)>

[0813] The optical density per unit film thickness was measured in the following manner.

[0814] The photosensitive colored resin composition of each example / comparative example was applied onto a glass substrate using a spin coater to a thickness of 1.5 μm after heat curing (baking), and then dried in a vacuum dryer for 60 seconds and then heated and dried on a hot plate heated to 100° C. for 100 seconds.

[0815] The obtained coating film was exposed without using an exposure mask. A mirror projection type exposure machine (MPA-600FA) manufactured by Canon Inc. was used as an irradiation light source, and the exposure amount was 80 mJ / cm 2 The exposure was performed for 20 seconds. The illumination was 500mW / cm 2 Next, the resist-coated substrate 1 was obtained by heating and curing the resultant at 230° C. in an oven for 30 minutes.

[0816] The optical density (OD value) of the resist-coated substrate 1 was measured using a 361T(V) transmission densitometer manufactured by X-Rite (color temperature of the illumination light source: about 2850K (equivalent to CIE standard light source A), spectral sensitivity characteristics of the light receiving part: ISO Visual density under ISO 5-3 standard), and the film thickness was measured using the non-contact surface / layer profile measurement system VertScan(R)2.0 manufactured by Ryoka Systems Inc. The optical density (OD value) per unit film thickness (1 μm) was calculated from the optical density (OD value) and the film thickness. It should be noted that the OD value is a numerical value indicating the light-shielding ability, and a larger numerical value indicates a higher light-shielding property.

[0817] <Production of Patterned Substrate for Organic Electroluminescent Element>

[0818] The photosensitive colored resin composition of each Example / Comparative Example was applied to a substrate on which an indium tin oxide (ITO) transparent conductive film was deposited with a thickness of 70 nm on glass and an anode was formed using a conventional photolithography technique and hydrochloric acid etching. Then, a vacuum dryer was used to dry the composition for 60 seconds. Next, the composition was heated and dried on a hot plate heated to 100° C. for 100 seconds.

[0819] The obtained coating film substrate was exposed using a photomask. A mirror projection type exposure machine (MPA-600FA) manufactured by Canon Inc. was used at an exposure dose of 80 mJ / cm 2 The exposure was performed for 20 seconds. The illumination was 500mW / cm 2 The slit width was 1.6 mm. A mask having a lattice-shaped opening (having a rectangular cover portion of 40 μm in length×80 μm in width, with a plurality of such cover portions spaced 20 μm apart from each other in the major and minor axis directions) was used as the photomask.

[0820] Next, a developer containing an aqueous solution containing 0.05 mass % potassium hydroxide and 0.08 mass % nonionic surfactant ("A-60" manufactured by Kao Corporation) was used to perform shower development at a water pressure of 0.05 MPa at 24° C., and then the developer was washed away with pure water to stop the development, and the film was washed with a water washing spray for 10 seconds. The shower development time was set to 1.6 times the time it took for the unexposed portion of the coating film to be dissolved and removed.

[0821] The openings were developed and removed by these operations to obtain an electrode substrate with patterned partition walls. The electrode substrate with the pattern was heat-cured (baked) in an oven at 230° C. for 30 minutes to obtain a patterned substrate for an organic electroluminescent element.

[0822] <Fabrication of Device for Evaluation of Organic Electroluminescent Element>

[0823] On the entire surface of the pattern substrate for the produced organic electroluminescent element, molybdenum oxide with a film thickness of 10 nm as a hole injection layer, N-([1,1'-biphenyl]-4-yl)-9,9-dimethyl-N-[4-(9-phenyl-9H-carbazole-3-yl)phenyl]-9H-fluorene-2-amine with a film thickness of 60 nm as a hole transport layer, tri(8-hydroxyquinoline)aluminum with a film thickness of 60 nm as a light-emitting layer, 8-hydroxyquinoline-lithium with a film thickness of 1 nm as an electron injection layer, and aluminum with a film thickness of 80 nm as a cathode are sequentially stacked by vacuum evaporation to produce an organic electroluminescent element.

[0824] Next, a desiccant is attached to the concave portion of the sealing glass having a concave portion at the center, and a UV curing resin is applied to the frame portion around the concave portion. The sealing glass is arranged so that the concave portion of the sealing glass covers all the organic electroluminescent elements on the aforementioned electrode substrate, the sealing glass is attached to the aforementioned electrode substrate, and the UV curing resin is irradiated with UV to cure it, thereby sealing the hollow structure, thereby manufacturing a device for evaluating an organic electroluminescent element.

[0825] <Evaluation of Light Emitting Characteristics of Organic Electroluminescent Element>

[0826] A direct current was supplied to the produced device for evaluating the organic electroluminescent element, and the current density at a driving voltage of 4 V was measured.

[0827] The current density measured was determined as follows. The higher the current density, the more preferable it is. If the current density is 0.6 mA / cm 2 The above tends to be practically problem-free.

[0828] A: Current density 0.8mA / cm 2 above

[0829] B: Current density 0.6mA / cm 2 Above and below 0.8mA / cm 2

[0830] C: Current density is less than 0.6 / cm 2

[0831] <Preparation of Pigment Dispersions 1 to 9>

[0832] The pigments, dispersants, alkali-soluble resins and solvents listed in Tables 1 and 2 were mixed in the mass ratios listed in Table 1. The mixed solution was dispersed at 25 to 45° C. for 3 hours using a paint shaker. Zirconia beads of 2.5 times the mass of the dispersion were added. After the dispersion was completed, the beads were separated from the dispersion using a filter. Pigment dispersions 1 to 9 were prepared.

[0833] It should be noted that the amount of the solvent in Table 1 and Table 2 also includes the amount of the solvent derived from the dispersant and the alkali-soluble resin.

[0834] [Table 1]

[0835]

[0836] [Table 2]

[0837]

[0838] As shown in Table 1, Examples 1 to 4 using alkali-soluble resin-I showed low viscosity and excellent dispersibility. On the other hand, Comparative Examples 1, 3, and 4 were not dispersed but solidified, and Comparative Example 2 was dispersed but had high viscosity and poor dispersibility.

[0839] As shown in Table 2, the viscosity of Examples 3 to 5 was stable even 3 days after the preparation of the pigment dispersion, but in Comparative Example 5, a gradual increase in viscosity was observed immediately after the preparation of the pigment dispersion.

[0840] Regarding the above phenomenon, it is believed that resin (C1) contains a large number of aromatic rings in the main chain, so it has high affinity with the pigment. In addition, since the main chain also contains methylene, it has flexibility that can follow the surface shape of the pigment, and has a high pigment dispersibility effect. It is believed that alkali-soluble resin-I and alkali-soluble resin-VIII belong to resin (C1) and show high pigment dispersibility. Furthermore, it is believed that alkali-soluble resin-VIII has more hydroxyl groups with high solvent affinity than alkali-soluble resin-I, so pigment dispersibility and viscosity stability become good.

[0841] It is considered that the alkali-soluble resin-II also has a low content of aromatic rings in the main chain and has a bulky dicyclopentane skeleton, so the pigment dispersibility effect is low.

[0842] In addition, although alkali-soluble resins III and IV contain a large number of aromatic rings in the main chain, the main chain is rigid and lacks flexibility, which is disadvantageous in following the surface shape of the pigment, and thus the pigment dispersibility effect is considered to be low.

[0843] [Examples 5 to 9, Comparative Examples 6 and 7]

[0844] In Examples 5 to 9 and Comparative Examples 6 and 7, each component was added to the pigment dispersions 7 to 9 so that the solid content of each component in the total solid content became the value described in Table 2, and a solvent was added so that PGMEA / MB / MBA=72 / 20 / 8 and the content ratio of the total solid content became 17% by mass, and the mixture was stirred and dissolved to prepare photosensitive color resin compositions of Examples 5 to 10 and Comparative Examples 6 and 7.

[0845] The evaluation results of the unit OD value and the residual film rate are shown in Tables 3 and 4.

[0846] [Table 3]

[0847]

[0848] [Table 4]

[0849]

[0850] As shown in Tables 3 and 4, it was observed that the residual film rates of Examples 6 to 12 were better than those of Comparative Examples 6 and 7. This is considered to be because the resin (C1) contains a large number of aromatic rings in the main chain, so the developer resistance during development is improved, and the residual film rate becomes higher. It is considered that the alkali-soluble resin-I belongs to the resin (C1) and shows a high residual film rate.

[0851] From the comparison between Examples 8 to 10 and 12, it can be seen that the residual film rate is further improved when the alkali-soluble resin-VI is used. This is considered to be because the alkali-soluble resin-VI contains more aromatic rings in its structure than the alkali-soluble resins-V and -VII.

[0852] Table 5 shows the evaluation results of the organic electroluminescent elements produced using the prepared photosensitive coloring resin compositions of Examples 6, 8, and 10 and Comparative Examples 6 and 7.

[0853] [Table 5]

[0854]

[0855] Examples 6, 8, and 10 in Table 5 tend to have high current densities during light emission. This is presumably because the alkali-soluble resin-I and alkali-soluble resin-VIII contain a large number of aromatic rings in the main chain, which improves the developer resistance during development, thereby reducing the accumulation of decomposition products during development of the organic electroluminescent element in the pixel portion.

[0856] In addition, it is considered that the alkali-soluble resin-VII has an isocyanuric acid skeleton with high heat resistance, and the accumulation of thermal decomposition products in the pixel during baking is reduced, thereby showing a higher value of the current density.

[0857] On the other hand, the current density tended to be low in Comparative Examples 6 and 7. This is presumably because the number of aromatic rings contained in the main chain decreased the developer resistance, which increased the accumulation of decomposition products in the pixel portion of the organic electroluminescent element during development.

[0858] Description of Reference Numerals

[0859] 1 Green luminescent nanocrystal particles

[0860] 2 Red luminescent nanocrystal particles

[0861] 10 substrate

[0862] 20 Divider Wall

[0863] 30 red pixels

[0864] 40 green pixels

[0865] 50 blue pixels

[0866] 100 Color Filters

Claims

1. A photosensitive colored resin composition, characterized in that Contains (A) a colorant, (B) a dispersant, (C) an alkali-soluble resin, and (D) a photopolymerization initiator, The (A) colorant comprises an organic pigment (A-1), The (C) alkali-soluble resin contains a resin (C1) having a structural unit represented by the following general formula (1): In formula (1), R 1 represents a hydrogen atom or a methyl group, R 2 each independently represents an alkyl group having 1 to 4 carbon atoms, L represents an alkylene group having 2 to 6 carbon atoms, and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent, * Each represents a connecting key.

2. The photosensitive colored resin composition according to claim 1, wherein The resin (C1) has a structural unit represented by the following general formula (2): In formula (2), A represents a hydrogen atom or a polyacid residue, R 1 represents a hydrogen atom or a methyl group, R 2 each independently represents an alkyl group having 1 to 4 carbon atoms, * Each represents a connecting key.

3. The photosensitive colored resin composition according to claim 1 or 2, wherein The organic pigment (A-1) includes an organic black pigment.

4. The photosensitive colored resin composition according to claim 3, wherein The organic black pigment includes a benzodifuranone-based organic black pigment.

5. The photosensitive colored resin composition according to claim 4, wherein The organic black pigment includes an organic black pigment which is a compound represented by the following general formula (A-1-1), a geometric isomer thereof, a salt thereof, or a salt of a geometric isomer thereof, In formula (A-1-1), R 611 and R 616 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom or a chlorine atom; R 612 , R 613 , R 614 , R 615 , R 617 , R 618 , R 619 and R 620 Each independently represents a hydrogen atom, a halogen atom, R 621 、COOH、COOR 621 、COO - ,CONH2,CONHR 611 ,CONR 621 R 622 、CN、OH、OR 621 、COCR 621 、OOCNH2、OOCNHR 621 、OOCNR 621 R 622 、NO2、NH2、NHR 621 NR 621 R 622 、NHCOR 622 NR 621 COR 622 、N=CH2、N=CHR 621 、N=CR 621 R 622 , SH, SR 621 , SOR 621 、SO2R 621 、SO3R 621 、SO3H、SO3 - 、SO2NH2、SO2NHR 621 or SO2NR 621 R 622 ; Choose from R 612 With R 613 , R 613 With R 614 , R 614 With R 615 , R 617 With R 618 , R 618 With R 619 , and R 619 With R 620 At least one of the groups consisting of the above may be directly bonded to each other, or may be bonded to each other through an oxygen atom, a sulfur atom, NH or NR 621 Bridges bonded to each other; R 621 and R 622 Each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

6. The photosensitive colored resin composition according to claim 1 or 2, wherein The (B) dispersant includes an acrylic dispersant having a tertiary amino group and / or a quaternary ammonium group.

7. The photosensitive colored resin composition according to claim 1 or 2, wherein The (C) alkali-soluble resin contains (C2) epoxy (meth)acrylate resin.

8. The photosensitive colored resin composition according to claim 1 or 2, wherein The (C) alkali-soluble resin contains (C3) an isocyanuric acid skeleton-containing resin.

9. The photosensitive colored resin composition according to claim 1 or 2, wherein The content of the resin (C1) in the (C) alkali-soluble resin is in the range of 4 to 80% by mass.

10. A pigment dispersion, characterized in that: Containing (A) a colorant, (B) a dispersant and (C) an alkali-soluble resin, The (A) colorant comprises an organic pigment (A-1), The (C) alkali-soluble resin contains a resin (C1) having a structural unit represented by the following general formula (1): In formula (1), R 1 represents a hydrogen atom or a methyl group, R 2 each independently represents an alkyl group having 1 to 4 carbon atoms, L represents an alkylene group having 2 to 6 carbon atoms, and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent, * Each represents a connecting key.

11. The pigment dispersion according to claim 10, wherein The resin (C1) has a structural unit represented by the following general formula (2): In formula (2), A represents a hydrogen atom or a polyacid residue, R 1 represents a hydrogen atom or a methyl group, R 2 each independently represents an alkyl group having 1 to 4 carbon atoms, * Each represents a connecting key.

12. The pigment dispersion according to claim 10 or 11, wherein The organic pigment (A-1) includes an organic black pigment.

13. The pigment dispersion according to claim 12, wherein The organic black pigment includes a benzodifuranone-based organic black pigment.

14. The pigment dispersion according to claim 13, wherein The organic black pigment includes an organic black pigment which is a compound represented by the following general formula (A-1-1), a geometric isomer thereof, a salt thereof, or a salt of a geometric isomer thereof, In formula (A-1-1), R 611 and R 616 each independently represents a hydrogen atom, CH3, CF3, a fluorine atom or a chlorine atom; R 612 , R 613 , R 614 , R 615 , R 617 , R 618 , R 619 and R 620 Each independently represents a hydrogen atom, a halogen atom, R 621 、COOH、COOR 621 、COO - ,CONH2,CONHR 621 ,CONR 621 R 622 、CN、OH、OR 621 、COCR 621 、OOCNH2、OOCNHR 621 、OOCNR 621 R 622 、NO2、NH2、NHR 621 NR 621 R 622 、NHCOR 622 NR 621 COR 622 、N=CH2、N=CHR 621 、N=CR 621 R 622 , SH, SR 621 , SOR 621 、SO2R 621 、SO3R 621 、SO3H、SO3 - 、SO2NH2、SO2NHR 621 or SO2NR 621 R 622 ; Choose from R 612 With R 613 , R 613 With R 614 , R 614 With R 615 , R 617 With R 618 , R 618 With R 619 , and R 619 With R 620 At least one of the groups of the composition may be directly bonded to each other, or may be bonded to each other through an oxygen atom, a sulfur atom, NH or NR 621 Bridges bonded to each other; R 621 and R 622 Each independently represents an alkyl group having 1 to 12 carbon atoms, a cycloalkyl group having 3 to 12 carbon atoms, an alkenyl group having 2 to 12 carbon atoms, a cycloalkenyl group having 3 to 12 carbon atoms, or an alkynyl group having 2 to 12 carbon atoms.

15. The pigment dispersion according to claim 10 or 11, wherein The (B) dispersant includes an acrylic dispersant having a tertiary amino group and / or a quaternary ammonium group. 16 . A cured product obtained by curing the photosensitive color resin composition according to claim 1 .

17. A partition wall formed from the cured product according to claim 16. An organic electroluminescent element comprising the partition wall according to claim 17 . 19 . A color filter comprising the partition wall according to claim 18 and light-emitting nanocrystal particles. 20 . An image display device comprising the partition wall according to claim 18 .

21. A compound having a structural unit represented by the following general formula (1): In formula (1), R 1 represents a hydrogen atom or a methyl group, R 2 each independently represents an alkyl group having 1 to 4 carbon atoms, L represents an alkylene group having 2 to 6 carbon atoms, and has at least a hydroxyl group or an ester group of a hydroxyl group and a polybasic acid as a substituent, * Each represents a connecting key.

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